Composition, film, optical filter, solid-state imaging device, image display device, and infrared sensor

Abstract

Provided is a composition capable of forming a film having excellent IR-blocking capability. Also provided are a film, an optical filter, a solid-state imaging element, an image display device, and an IR sensor. The composition contains an IR absorber and a curable compound. The IR absorber contains a compound represented by formula (1), and the content of the compound represented by formula (1) is at least 3 mass% of the total solid content of the composition.

Description

[Technical Field]

[0001] The present invention relates to a composition containing an infrared absorber and a curable compound. The present invention also relates to a film, an optical filter, a solid-state imaging device, an image display device, and an infrared sensor using the composition. [Background technology]

[0002] Video cameras, digital still cameras, and mobile phones with camera functions use solid-state color imaging devices such as CCDs (charge-coupled devices) and CMOSs ​​(complementary metal-oxide semiconductors). These solid-state imaging devices use silicon photodiodes sensitive to infrared light in their light-receiving sections. For this reason, infrared cut filters are sometimes used to correct visibility. Infrared cut filters are manufactured using compositions containing an infrared absorber and a curable compound.

[0003] In addition, an infrared transmission filter is also produced using a composition containing an infrared absorber and a curable compound. By incorporating an infrared absorber into an infrared transmission filter, the infrared region of the light (infrared rays) transmitted by the infrared transmission filter can be shifted to the longer wavelength side.

[0004] In this way, optical filters such as infrared cut filters and infrared transmission filters are formed using compositions containing an infrared absorbent and a curable compound.

[0005] Non-Patent Document 1 describes that a compound having the following structure has a maximum absorption wavelength at a wavelength of 922 nm in dichloromethane, and has no significant absorption band in the visible region. [ka] [Prior art documents] [Patent documents]

[0006] [Non-Patent Document 1] Hiroyuki Shimogawa, Yasujiro Murata, and Atsushi Wakamiya, "NIR-Absorbing Dye Based on BF2-Bridged Azafulvene Dimer as a Strong Electron-Accepting Unit", "Organic Letters", American Chemical Society, 2018, Vol. 20, No. 17, pp. 5135-5138 Summary of the Invention [Problem to be solved by the invention]

[0007] In recent years, there has been a demand for further improvements in the spectral properties of films obtained using compositions containing an infrared absorber and a curable compound, such as excellent shielding properties for infrared rays of longer wavelengths.

[0008] Therefore, an object of the present invention is to provide a composition capable of forming a film having excellent infrared shielding properties, and also to provide a film, an optical filter, a solid-state imaging device, an image display device, and an infrared sensor using the composition. [Means for solving the problem]

[0009] The present inventors have conducted research into compositions containing an infrared absorber and a curable compound and have found that a film having excellent infrared shielding properties can be formed by using the composition described below, leading to the completion of the present invention. Accordingly, the present invention provides the following.

[0010] <1> A composition containing an infrared absorber and a curable compound, The infrared absorber contains a compound represented by formula (1), a composition in which the content of the compound represented by formula (1) is 3 mass% or more based on the total solid content of the composition; [ka] In formula (1), Ar 1 and Ar 2 each independently represents a nitrogen-containing heterocycle which may be condensed to form a polycycle, R 1 and R 2 each independently represents a substituent, n1 and n2 each independently represent an integer of 0 or more, Y 1 and Y 2 are each independently -O-, -S-, or -NR Y1 - represents R Y1 represents a hydrogen atom or a substituent, X 1 and X 2 are each independently a hydrogen atom, -BR X1 R X2 or a metal atom optionally coordinated with a ligand, R X1 and R X2 each independently represents a hydrogen atom or a substituent, R X1 and R X2 may be bonded to form a ring. <2> In the above formula (1), n1 and n2 each independently represent an integer of 1 or more, R in the above formula (1) 1 and R 2 each independently represents an aryl group or a heteroaryl group; <1> The composition described in <3> Y in the above formula (1) 1 and Y 2 is -O-, <1> or <2> The composition described in <4> X in the above formula (1) 1 and X 2 are independently -BR X1 R X2 represents R X1 and R X2 each independently represents a hydrogen atom or a substituent, R X1 and R X2 may be bonded to form a ring, <1> ~ <3> The composition according to any one of the preceding claims. <5> R X1 and R X2 each independently represents a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group, or an aryloxy group; R X1 and R X2 may be bonded to form a ring, <1> ~ <4> The composition according to any one of the preceding claims. <6> The maximum absorption wavelength of the compound represented by the above formula (1) in dichloromethane is in the wavelength range of 1000 to 1600 nm. <1> ~ <5> The composition according to any one of the preceding claims. <7> The infrared absorber contains a compound other than the compound represented by formula (1). <1> ~ <6> The composition according to any one of the preceding claims. <8> Further, a chromatic colorant is included. <1> ~ <7> The composition according to any one of the preceding claims. <9> The curable compound contains a resin having an acid group, <1> ~ <8> The composition according to any one of the preceding claims. <10> The curable compound includes a polymerizable compound. <1> ~ <9> The composition according to any one of the preceding claims. <11> The curable compound contains a resin having a glass transition temperature of 150°C or higher. <1> ~ <10> The composition according to any one of the preceding claims. <12> It is for infrared sensors, <1> ~ <11> The composition according to any one of the preceding claims. <13> <1> ~ <12> A film obtained by using the composition according to any one of the above. <14> <13> An optical filter comprising the film according to claim 1. <15> <13> A solid-state imaging device comprising the film according to claim 1. <16> <13> An image display device comprising the film according to claim 1. <17> <13> An infrared sensor comprising the film according to claim 1. [Effects of the Invention]

[0011] According to the present invention, it is possible to provide a composition capable of forming a film having excellent infrared shielding properties, a film, an optical filter, a solid-state imaging device, an image display device, and an infrared sensor. [Brief explanation of the drawings]

[0012] [Figure 1] FIG. 1 is a schematic diagram illustrating an embodiment of an infrared sensor. DETAILED DESCRIPTION OF THE INVENTION

[0013] The present invention will be described in detail below. In this specification, the symbol "to" is used to mean that the numerical values ​​before and after it are included as the lower limit and upper limit. In the description of groups (atomic groups) in this specification, when a notation does not specify whether they are substituted or unsubstituted, it encompasses both unsubstituted groups (atomic groups) and substituted groups (atomic groups). For example, the term "alkyl group" encompasses not only alkyl groups without a substituent (unsubstituted alkyl groups) but also alkyl groups with a substituent (substituted alkyl groups). In this specification, unless otherwise specified, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. Examples of light used for exposure include the bright line spectrum of a mercury lamp, far ultraviolet light typified by excimer lasers, extreme ultraviolet light (EUV light), X-rays, electron beams, and other actinic rays or radiation. In this specification, "(meth)acrylate" refers to either or both of acrylate and methacrylate, "(meth)acrylic" refers to either or both of acrylic and methacrylic, and "(meth)acryloyl" refers to either or both of acryloyl and methacryloyl. In this specification, the weight average molecular weight and number average molecular weight are defined as values ​​converted into polystyrene by gel permeation chromatography (GPC) measurement. In this specification, Me in the chemical formulas represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, infrared rays refer to light (electromagnetic waves) with a wavelength of 700 to 2500 nm. In this specification, the total solid content refers to the total mass of all components of the composition excluding the solvent. In this specification, a pigment means a coloring material that is difficult to dissolve in a solvent. In this specification, the term "process" includes not only an independent process but also a process that cannot be clearly distinguished from other processes as long as the intended effect of the process is achieved.

[0014] <Composition> The composition of the present invention is a composition containing an infrared absorber and a curable compound, The infrared absorber comprises a compound represented by formula (1), The composition is characterized in that the content of the compound represented by formula (1) in the total solid content of the composition is 3 mass % or more.

[0015] The composition of the present invention can form a film with excellent infrared shielding properties. In particular, it can form a film with excellent infrared shielding properties, particularly for longer wavelengths of 1100 nm or more. While the detailed reasons for this effect are unclear, it is presumed that the composition of the present invention has a compound represented by formula (1) content of 3 mass% or more relative to the total solid content of the composition, and therefore, when a film is formed using the composition, association of the compound represented by formula (1) in the film is promoted. The formation of an association of the compound represented by formula (1) in the film shifts the absorption peak of the compound represented by formula (1) to a longer wavelength side than in the monomolecular state, and as a result, it is presumed that a film with excellent infrared shielding properties can be formed that can shield longer wavelength infrared rays.

[0016] The composition of the present invention can be used as a composition for an optical filter. Examples of optical filters include an infrared cut filter and an infrared transmission filter. The composition of the present invention is also preferably used for an infrared sensor. More specifically, the composition is preferably used as a composition for the optical filter of an infrared sensor having an optical filter.

[0017] Each component used in the composition of the present invention will be described below.

[0018] <<Infrared absorber>> The composition of the present invention contains an infrared absorber. The infrared absorber used in the composition of the present invention contains a compound represented by formula (1). Hereinafter, the compound represented by formula (1) is also referred to as a specific infrared absorbing compound. [ka] In formula (1), Ar 1 and Ar 2 each independently represents a nitrogen-containing heterocycle, R 1 and R 2 each independently represents a substituent, n1 and n2 each independently represent an integer of 0 or more, Y 1 and Y 2 are each independently -O-, -S-, or -NR Y1 - represents R Y1 represents a hydrogen atom or a substituent, X 1 and X 2 are each independently a hydrogen atom, -BR X1 R X2 or a metal atom optionally coordinated with a ligand, R X1 and R X2 each independently represents a hydrogen atom or a substituent, R X1 and R X2 may be bonded to form a ring.

[0019] Ar in formula (1) 1 and Ar 2 The nitrogen-containing heterocycle represented by may be a monocycle or a condensed ring. The number of condensed rings is preferably 2 to 8, more preferably 2 to 4, and even more preferably 2 or 3. Ar 1 and Ar 2 The nitrogen-containing heterocyclic ring represented by is preferably a nitrogen-containing heteroaromatic ring.

[0020] Ar 1 and Ar 2 Examples of the nitrogen-containing heterocycle represented by the formula (I) include a pyrrole ring, an imidazole ring, a pyrazole ring, an oxazole ring, a thiazole ring, a triazole ring, a tetrazole ring, a pyridine ring, a pyridazine ring, a pyrimidine ring, a pyrazine ring, and fused rings containing these rings. Examples of the fused ring include an indole ring, an isoindole ring, a benzimidazole ring, a benzoxazole ring, a benzothiazole ring, a benzotriazole ring, a purine ring, a quinoline ring, an isoquinoline ring, a quinazoline ring, a quinoxaline ring, a cinnoline ring, and a pteridine ring. 1 and Ar 2 The nitrogen-containing heterocycle represented by is preferably a pyrrole ring, an imidazole ring or a condensed ring containing these rings, more preferably a pyrrole ring, an imidazole ring or a condensed ring containing these rings.

[0021] R in Equation (1) 1 and R 2 each independently represents a substituent. Examples of the substituent include the groups exemplified as the substituent T described below, and are preferably an aryl group or a heteroaryl group, and more preferably a heteroaryl group because the absorption wavelength can be shifted to a longer wavelength.

[0022] The number of carbon atoms in the aryl group is preferably 6 to 20, more preferably 6 to 12. The aryl group may have a substituent. The heteroaryl group is preferably a monocyclic or fused ring heteroaryl group having 2 to 8 rings, more preferably a monocyclic or fused ring heteroaryl group having 2 to 4 rings. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3. Examples of heteroatoms constituting the ring of the heteroaryl group include a nitrogen atom, an oxygen atom, and a sulfur atom. The number of carbon atoms constituting the ring of the heteroaryl group is preferably 3 to 20, more preferably 3 to 18, and even more preferably 3 to 12. The heteroaryl group is preferably a 5- or 6-membered ring heteroaryl group. Specific examples of the heteroaryl group include a pyrrole ring group, a furan ring group, a thiophene ring group, an imidazole ring group, a pyrazole ring group, an oxazole ring group, a thiazole ring group, a triazole ring group, a tetrazole ring group, a pyridine ring group, a pyridazine ring group, a pyrimidine ring group, a pyrazine ring group, and fused rings containing these rings.

[0023] The above aryl group and heteroaryl group may further have a substituent. Examples of the further substituent include -NR 101 R 102 , alkoxy groups, and aryloxy groups, and -NR 101 R 102 It is preferable that R 101 and R 102 each independently represents a hydrogen atom or a substituent, R 101 and R 102 may be bonded to form a ring.

[0024] R 101 and R 102 Preferably, each R is independently a substituent. 101 and R 102 Examples of the substituent represented by include the groups exemplified as the substituent T described below, and are preferably an alkyl group, an alkenyl group, an alkynyl group or an aryl group, and more preferably an alkyl group or an aryl group.

[0025] R 101 and R 102The number of carbon atoms in the alkyl group represented by is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 6. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include the groups exemplified for the substituent T described below, and a halogen atom, an aryl group, an alkoxy group, or the like is preferred. There may be multiple substituents. R 101 and R 102 The number of carbon atoms in the alkenyl group represented by is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 6. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may have a substituent. Examples of the substituent include the groups exemplified for the substituent T described below, and a halogen atom, an aryl group, an alkoxy group, or the like is preferred. There may be multiple substituents. R 101 and R 102 The number of carbon atoms in the alkynyl group represented by is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 6. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may have a substituent. Examples of the substituent include the groups exemplified for the substituent T described below, and a halogen atom, an aryl group, an alkoxy group, or the like is preferred. There may be multiple substituents. R 101 and R 102 The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent T described below include a halogen atom, an alkyl group, or an alkoxy group. The number of substituents may be multiple.

[0026] In formula (1), n1 and n2 each independently represent an integer of 0 or greater. n1 and n2 each independently represent an integer of 1 or greater, more preferably an integer of 1 to 3, even more preferably 1 or 2, and particularly preferably 1.

[0027] Y in equation (1) 1 and Y 2 are each independently -O-, -S-, or -NR Y1- represents R Y1 represents a hydrogen atom or a substituent.

[0028] R Y1 Examples of the substituent represented by R include the groups exemplified as the substituent T described below, and R is preferably an alkyl group, an aryl group, or a heteroaryl group, more preferably an alkyl group or an aryl group, and even more preferably an alkyl group. Y1 is preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom.

[0029] Y in equation (1) 1 and Y 2 are each independently preferably -O- or -S-, more preferably -O-.

[0030] X in equation (1) 1 and X 2 are each independently a hydrogen atom, -BR X1 R X2 or a metal atom optionally coordinated with a ligand, and R X1 and R X2 each independently represents a hydrogen atom or a substituent, R X1 and R X2 may be bonded to form a ring. 1 and X 2 are each independently -BR X1 R X2 or a metal atom which may be coordinated with a ligand, is preferably -BR X1 R X2 It is more preferable that X in formula (1) is 1 Ga-BR X1 R X2 or when the ligand is a metal atom which may be coordinated, X 1 Ar 1 In addition, X in formula (1) may be coordinated to the nitrogen atom of the nitrogen-containing heterocycle represented by 2 Ga-BR X1 R X2or when the ligand is a metal atom which may be coordinated, X 2 Ar 2 may be coordinated to a nitrogen atom of the nitrogen-containing heterocycle represented by

[0031] R X1 and R X2 The substituent includes the groups listed as the substituent T described below, and is preferably a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group, or an aryloxy group, more preferably a halogen atom, an aryl group, or an alkoxy group, and even more preferably an aryl group or an alkoxy group because it is easy to form a film having excellent heat resistance and light resistance.

[0032] Examples of halogen atoms include fluorine atoms, chlorine atoms, bromine atoms, and iodine atoms, with fluorine atoms being preferred. The number of carbon atoms in the alkyl group and alkoxy group is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 6. The alkyl group and alkoxy group may be linear, branched, or cyclic. The alkyl group and alkoxy group may have a substituent. Examples of the substituent include the groups exemplified for the substituent T described below, and a halogen atom or an acyl group is preferred. There may be multiple substituents. The number of carbon atoms in the alkenyl group is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 6. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may have a substituent. Examples of the substituent include the groups exemplified for the substituent T described below, and a halogen atom, an acyl group, an alkoxy group, or the like is preferred. The number of substituents may be multiple. The number of carbon atoms in the alkynyl group is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 6. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may have a substituent. Examples of the substituent include the groups exemplified for the substituent T described below, and a halogen atom, an acyl group, an alkoxy group, or the like is preferred. The number of substituents may be multiple. The number of carbon atoms in the aryl group and aryloxy group is preferably 6 to 20, and more preferably 6 to 12. The aryl group and aryloxy group may have a substituent. Examples of the substituent include the groups exemplified as the substituent T described below, and a halogen atom, an acyl group, an alkoxy group, or the like is preferred. There may be multiple substituents. The heteroaryl group is preferably a monocyclic or fused ring heteroaryl group having 2 to 8 rings, more preferably a monocyclic or fused ring heteroaryl group having 2 to 4 rings. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3. Examples of heteroatoms constituting the ring of the heteroaryl group include a nitrogen atom, an oxygen atom, and a sulfur atom, and a nitrogen atom is preferred. The number of carbon atoms constituting the ring of the heteroaryl group is preferably 3 to 20, more preferably 3 to 18, and more preferably 3 to 12. The heteroaryl group is preferably a 5- or 6-membered ring heteroaryl group. The heteroaryl group may have a substituent. Examples of the substituent T described below include a halogen atom, an acyl group, or an alkoxy group. The number of substituents may be multiple.

[0033] R X1 and R X2 may be bonded to form a ring. Examples include the structures shown in the following (X-1) to (X-4). In the following, Rx represents a substituent, 1 ~Rx 4 each independently represents a hydrogen atom or a substituent, x1 to x3 each independently represents an integer of 0 to 4, * represents Y in formula (1), 1 or Y 2 Rx and Rx 1 ~Rx 4 Examples of the substituent represented by include the groups exemplified as the substituent T described below, and are preferably a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group, or an aryloxy group, and more preferably a halogen atom, an alkyl group, or an alkoxy group. [ka]

[0034] X 1 and X 2 Examples of the metal atom represented by include Mg, Al, Si, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Mo, Ru, Rh, Pd, Ag, Pt, Au, and Er, and Zn, Cu, or Co is preferred because it has an appropriate atomic radius, and the complex has high stability and increased durability.

[0035] These metal atoms may be coordinated with a ligand (substituent). Examples of the ligand include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, -OR X11 , -OC(=O)R X12 , -OP(=O)R X13 R X14 and -OS(=O)2R X15 Examples include: R X11 and R X12 R each independently represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heteroaryl group. X13 ~R X15 each independently represents a hydroxy group, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group, or an aryloxy group; R X13 and R X14 may be bonded to each other to form a ring. Preferred embodiments of the halogen atom, alkyl group, alkenyl group, alkynyl group, aryl group, heteroaryl group, alkoxy group, and aryloxy group are described above in relation to R X1 and R X2 The embodiments are the same as those described for the substituent represented by.

[0036] Examples of the substituent T include the following groups: a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom), an alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), an alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), an alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), an aryl group (preferably an aryl group having 6 to 30 carbon atoms), a heteroaryl group (preferably a heteroaryl group having 1 to 30 carbon atoms), an amino group (preferably an amino group having 0 to 30 carbon atoms), an alkoxy group (preferably an alkoxy group having 1 to 30 carbon atoms), an aryloxy group (preferably or an aryloxy group having 6 to 30 carbon atoms), a heteroaryloxy group (preferably a heteroaryloxy group having 1 to 30 carbon atoms), an acyl group (preferably an acyl group having 2 to 30 carbon atoms), an alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), an aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), a heteroaryloxycarbonyl group (preferably a heteroaryloxycarbonyl group having 2 to 30 carbon atoms), an acyloxy group (preferably an acyloxy group having 2 to 30 carbon atoms). group), acylamino group (preferably an acylamino group having 2 to 30 carbon atoms), aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), sulfamoyl group (preferably a sulfamoyl group having 0 to 30 carbon atoms), sulfamoylamino group (preferably a sulfamoylamino group having 0 to 30 carbon atoms), carboxylic acid a bamoyl group (preferably a carbamoyl group having 1 to 30 carbon atoms), an alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), an arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), a heteroarylthio group (preferably a heteroarylthio group having 1 to 30 carbon atoms), an alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), an alkylsulfonylamino group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms), an arylsulfonyl group (preferably an arylsulfonyl group having 6 to 30 carbon atoms),An arylsulfonylamino group (preferably an arylsulfonylamino group having 6 to 30 carbon atoms), a heteroarylsulfonyl group (preferably a heteroarylsulfonyl group having 1 to 30 carbon atoms), a heteroarylsulfonylamino group (preferably a heteroarylsulfonylamino group having 1 to 30 carbon atoms), an alkylsulfinyl group (preferably an alkylsulfinyl group having 1 to 30 carbon atoms), an arylsulfinyl group (preferably an arylsulfinyl group having 6 to 30 carbon atoms), a heteroarylsulfinyl group Examples of the substituent include an alkyl group (preferably a heteroarylsulfinyl group having 1 to 30 carbon atoms), a ureido group (preferably a ureido group having 1 to 30 carbon atoms), a hydroxy group, a nitro group, a carboxyl group, a sulfo group, a phosphoric acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imido group, a phosphino group, a mercapto group, a cyano group, an alkylsulfino group, an arylsulfino group, an arylazo group, a heteroarylazo group, a phosphinyl group, a phosphinyloxy group, a phosphinylamino group, a silyl group, a hydrazino group, and an imino group. When these groups are further substitutable, they may further have a substituent. Examples of the further substituent include the groups described above for the substituent T.

[0037] The compound represented by formula (1) is preferably a compound represented by formula (1-1). [ka]

[0038] In formula (1-1), Ar 1 and Ar 2 each independently represents a nitrogen-containing heterocycle, R 3 and R 4 each independently represents a substituent, n3 and n4 each independently represent an integer of 0 or more, Ar 11 and Ar 12 each independently represents an aromatic hydrocarbon ring or a heteroaromatic ring; R 11 and R 12 each independently represents a substituent, n11 and n12 each independently represent an integer of 0 or more; R 111 ~R 114 each independently represents a hydrogen atom or a substituent, R 111 and R 112 , R 113 and R 114 may be bonded to form a ring, Y 1 and Y 2 are each independently -O-, -S-, or -NR Y1 - represents R Y1 represents a hydrogen atom or a substituent, X 1 and X 2 are each independently a hydrogen atom, -BR X1 R X2 or a metal atom optionally coordinated with a ligand, R X1 and R X2 each independently represents a hydrogen atom or a substituent, R X1 and R X2 may be bonded to form a ring.

[0039] Ar in formula (1-1) 1 , Ar 2 , Y 1 , Y 2 , X 1 and X 2 is the Ar in formula (1). 1 , Ar 2 , Y 1 , Y 2 , X 1 and X 2 The same applies to the preferred range.

[0040] R in formula (1-1) 3 , R 4 , R 11 and R 12 Examples of the substituent represented by include the groups listed above as the substituent T.

[0041] In formula (1-1), n3 and n4 each independently represent an integer of 0 or greater, preferably 0 to 2, more preferably 0 or 1, and even more preferably 0.

[0042] In formula (1-1), n11 and n12 each independently represent an integer of 0 or more, preferably 0 to 2, more preferably 0 or 1, and even more preferably 0.

[0043] Ar in formula (1-1) 11 and Ar 12 each independently represents an aromatic hydrocarbon ring or a heteroaromatic ring, and preferably represents a heteroaromatic ring. 11 and Ar 12 The aromatic hydrocarbon ring and aromatic heterocycle represented by the formula (I) may be a single ring or a fused ring. The number of fused rings in the fused ring is preferably 2 to 8, more preferably 2 to 4, and even more preferably 2 or 3. Specific examples of the aromatic hydrocarbon ring include a benzene ring and a naphthalene ring. Specific examples of the heteroaromatic ring include a pyrrole ring, a furan ring, a thiophene ring, an imidazole ring, a pyrazole ring, an oxazole ring, a thiazole ring, a triazole ring, a tetrazole ring, a pyridine ring, a pyridazine ring, a pyrimidine ring, a pyrazine ring, and fused rings containing these rings, and a pyrrole ring, a furan ring, or a thiophene ring is preferred.

[0044] R in formula (1-1) 111 ~R 114 are each independently a hydrogen atom or a substituent, and are preferably a substituent. Examples of the substituent include the groups exemplified for the substituent T above, and are preferably an alkyl group, an alkenyl group, an alkynyl group, or an aryl group, and more preferably an alkyl group or an aryl group.

[0045] R 111 ~R 114The number of carbon atoms in the alkyl group represented by is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 6. The alkyl group and alkoxy group may be linear, branched, or cyclic. The alkyl group and alkoxy group may have a substituent. Examples of the substituent include the groups exemplified above for the substituent T, and a halogen atom, an aryl group, an alkoxy group, or the like is preferred. There may be multiple substituents. R 111 ~R 114 The number of carbon atoms in the alkenyl group represented by is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 6. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may have a substituent. Examples of the substituent include the groups exemplified for the substituent T above, and preferred are a halogen atom, an aryl group, or an alkoxy group. The number of substituents may be multiple. R 111 ~R 114 The number of carbon atoms in the alkynyl group represented by is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 6. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may have a substituent. Examples of the substituent include the groups exemplified for the substituent T above, and a halogen atom, an aryl group, an alkoxy group, or the like is preferred. There may be multiple substituents. R 111 ~R 114 The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12. The aryl group and the aryloxy group may have a substituent. Examples of the substituent include those listed above for the substituent T, and a halogen atom, an alkyl group, an alkoxy group, or the like is preferred. There may be multiple substituents. R 111 ~R 114The heteroaryl group represented by is preferably a heteroaryl group having a single ring or 2 to 8 fused rings, more preferably a heteroaryl group having a single ring or 2 to 4 fused rings. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3. Examples of heteroatoms constituting the ring of the heteroaryl group include a nitrogen atom, an oxygen atom, and a sulfur atom, and a nitrogen atom is preferred. The number of carbon atoms constituting the ring of the heteroaryl group is preferably 3 to 20, more preferably 3 to 18, and more preferably 3 to 12. The heteroaryl group is preferably a 5- or 6-membered ring heteroaryl group. The heteroaryl group may have a substituent. Examples of the substituent T include groups exemplified above, and a halogen atom, an alkyl group, or an alkoxy group is preferred. The number of substituents may be multiple.

[0046] The maximum absorption wavelength of the specific infrared absorbing compound in dichloromethane is preferably in the wavelength range of 1000 to 1600 nm, more preferably in the wavelength range of 1100 to 1550 nm, and even more preferably in the wavelength range of 1200 to 1500 nm.

[0047] The slope of the long wavelength end of the absorption spectrum of the specific infrared absorbing compound is preferably steep. In the absorption spectrum normalized by the absorbance at the maximum absorption wavelength, the difference between the wavelength at which the absorbance is 0.5 on the long wavelength side and the maximum absorption wavelength is preferably 200 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less.

[0048] The molar absorption coefficient (ε) of the specific infrared absorbing compound is preferably high. The molar absorption coefficient at the maximum absorption wavelength is preferably 20,000 or more, more preferably 50,000 or more, and even more preferably 100,000 or more.

[0049] Specific examples of the specific infrared absorbing compound include compounds having the following structures: In the following structural formula, Ph represents a phenyl group. [ka] [ka] [ka] [ka]

[0050] The infrared absorber used in the composition of the present invention may contain compounds other than the specific infrared absorbing compounds described above (hereinafter also referred to as other infrared absorbing compounds).

[0051]

[0047] The other infrared absorbing compound may be a compound having an absorption maximum on the longer wavelength side than that of the specific infrared absorbing compound. However, for reasons such as enabling the formation of a film that is excellent in shielding infrared rays over a wide wavelength range and is more excellent in light fastness, the other infrared absorbing compound is preferably a compound having an absorption maximum on the shorter wavelength side than that of the specific infrared absorbing compound.

[0052] The difference between the maximum absorption wavelength of the specific infrared absorbing compound and the maximum absorption wavelength of the other infrared absorbing compound is preferably 50 to 800 nm, more preferably 100 to 750 nm, and even more preferably 150 to 700 nm.

[0053] The maximum absorption wavelength of the other infrared absorbing compound is preferably in the wavelength range of 700 to 1500 nm, more preferably in the wavelength range of 750 to 1400 nm, and even more preferably in the wavelength range of 800 to 1300 nm.

[0054] The other infrared absorbing compound may be a dye or a pigment. Examples of the other infrared absorbing compound include a pyrrolopyrrole compound, a cyanine compound, a squarylium compound, a phthalocyanine compound, a naphthalocyanine compound, a quaterrylene compound, a merocyanine compound, a croconium compound, an oxonol compound, an iminium compound, a dithiol compound, a triarylmethane compound, a pyrromethene compound, an azomethine compound, an anthraquinone compound, a dibenzofuranone compound, a dithiolene metal complex, a metal oxide, a metal boride, etc., and the pyrrolopyrrole compound, a squarylium compound, a phthalocyanine compound, or an oxonol compound is preferred, and the pyrrolopyrrole compound is more preferred, because they are more likely to promote the association formation of the specific infrared absorbing compound in the film during film formation and are more likely to form a film that is excellent in infrared shielding property, heat resistance, and light resistance. Examples of pyrrolopyrrole compounds include compounds described in paragraphs 0016 to 0058 of JP 2009-263614 A, compounds described in paragraphs 0037 to 0052 of JP 2011-068731 A, and compounds described in paragraphs 0010 to 0033 of WO 2015 / 166873 A. Examples of squarylium compounds include compounds described in paragraphs 0044 to 0049 of JP 2011-208101 A, compounds described in paragraphs 0060 to 0061 of Japanese Patent No. 6065169 A, compounds described in paragraph 0040 of WO 2016 / 181987 A, compounds described in JP 2015-176046 A, and compounds described in paragraph 0072 of WO 2016 / 190162 A. compounds described in paragraphs 0196 to 0228 of JP 2016-074649 A, compounds described in paragraph 0124 of JP 2017-067963 A, compounds described in WO 2017 / 135359 A, compounds described in JP 2017-114956 A, compounds described in Japanese Patent No. 6197940 A, compounds described in WO 2016 / 120166 A, and the like.Examples of cyanine compounds include those described in paragraphs 0044 to 0045 of JP 2009-108267 A, those described in paragraphs 0026 to 0030 of JP 2002-194040 A, those described in JP 2015-172004 A, those described in JP 2015-172102 A, those described in JP 2008-088426 A, those described in paragraph 0090 of WO 2016 / 190162 A, and those described in JP 2017-031394 A. Examples of croconium compounds include those described in JP 2017-082029 A. Examples of iminium compounds include compounds described in JP-T-2008-528706, compounds described in JP-A-2012-012399, compounds described in JP-A-2007-092060, and compounds described in paragraphs 0048 to 0063 of WO 2018 / 043564. Examples of phthalocyanine compounds include compounds described in paragraph 0093 of JP-A-2012-077153, oxytitanium phthalocyanine described in JP-A-2006-343631, compounds described in paragraphs 0013 to 0029 of JP-A-2013-195480, vanadium phthalocyanine compounds described in Japanese Patent No. 6081771, and compounds described in WO 2020 / 071470. Examples of naphthalocyanine compounds include the compounds described in paragraph 0093 of JP 2012-077153 A. Examples of dithiolene metal complexes include the compounds described in Japanese Patent No. 5733804 A. Examples of metal oxides include indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, and tungsten oxide. For details on tungsten oxide, see paragraph 0080 of JP 2016-006476 A, the contents of which are incorporated herein by reference. Examples of metal borides include lanthanum boride. Commercially available lanthanum boride products include LaB6-F (manufactured by Japan New Metals Co., Ltd.). In addition, compounds described in WO 2017 / 119394 A can also be used as metal borides.Commercially available indium tin oxide products include F-ITO (manufactured by DOWA Hi-Tech Co., Ltd.).

[0055] Other examples of the infrared absorbing compound include squarylium compounds described in JP 2017-197437 A, squarylium compounds described in JP 2017-025311 A, squarylium compounds described in WO 2016 / 154782 A, squarylium compounds described in Japanese Patent No. 5884953 A, squarylium compounds described in Japanese Patent No. 6036689 A, squarylium compounds described in Japanese Patent No. 5810604 A compounds, squarylium compounds described in paragraphs 0090 to 0107 of WO 2017 / 213047, pyrrole ring-containing compounds described in paragraphs 0019 to 0075 of JP 2018-054760 A, pyrrole ring-containing compounds described in paragraphs 0078 to 0082 of JP 2018-040955 A, pyrrole ring-containing compounds described in paragraphs 0043 to 0069 of JP 2018-002773 A, squarylium compounds having an aromatic ring at the amide α-position described in paragraphs 0024 to 0086 of JP-A-041047; amide-linked squarylium compounds described in JP-A-2017-179131; compounds having a pyrrole bis-type squarylium skeleton or a croconium skeleton described in JP-A-2017-141215; dihydrocarbazole bis-type squarylium compounds described in JP-A-2017-082029; It is also possible to use the asymmetric compounds described in paragraphs 0027 to 0114 of JP 2017-068120 A, the pyrrole ring-containing compounds (carbazole type) described in JP 2017-067963 A, the phthalocyanine compounds described in Japanese Patent No. 6251530 A, the squarylium compounds described in JP 2020-075959 A, and the copper complexes described in Korean Patent Publication No. 10-2019-0135217.

[0056] The content of the infrared absorber is preferably 3% by mass or more, more preferably 3 to 70% by mass, of the total solid content of the composition of the present invention. The upper limit is preferably 65% ​​by mass or less, more preferably 60% by mass or less. The lower limit is preferably 4% by mass or more, more preferably 5% by mass or more.

[0057] The content of the specific infrared absorbing compound is 3% by mass or more, and more preferably 3 to 70% by mass or more, of the total solid content of the composition. The upper limit is preferably 65% ​​by mass or less, and more preferably 60% by mass or less. The lower limit is preferably 4% by mass or more, and more preferably 5% by mass or more. The composition of the present invention may contain only one type of specific infrared absorbing compound, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably in the above range.

[0058] When the composition of the present invention contains another infrared absorbing compound, the content of the other infrared absorbing compound is preferably 10 to 1,000 parts by mass relative to 100 parts by mass of the specific infrared absorbing compound. The upper limit is preferably 500 parts by mass or less, and more preferably 300 parts by mass or less. The lower limit is preferably 20 parts by mass or more, and more preferably 30 parts by mass or more. The composition of the present invention may contain only one type of other infrared absorbing compound, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably in the above range.

[0059] <<Curable compound>> The composition of the present invention contains a curable compound. Examples of the curable compound include polymerizable compounds and resins. The resin may be a non-polymerizable resin (a resin without a polymerizable group) or a polymerizable resin (a resin with a polymerizable group). Examples of the polymerizable group include an ethylenically unsaturated bond-containing group, a cyclic ether group, a methylol group, and an alkoxymethyl group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a vinylphenyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, and a (meth)acryloylamide group. Preferred are a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group, and more preferred are a (meth)acryloyloxy group. Examples of the cyclic ether group include an epoxy group and an oxetanyl group. Preferred is an epoxy group. The polymerizable compound preferably contains a polymerizable monomer.

[0060] As the curable compound, it is preferable to use one that contains at least a resin. When the composition of the present invention is used as a composition for photolithography, it is preferable to use a resin and a polymerizable monomer (a monomer-type polymerizable compound) as the curable compound, and it is more preferable to use a resin and a polymerizable monomer (a monomer-type polymerizable compound) having an ethylenically unsaturated bond-containing group.

[0061] (polymerizable compound) Examples of the polymerizable compound include a compound having an ethylenically unsaturated bond-containing group, a compound having a cyclic ether group, a compound having a methylol group, and a compound having an alkoxymethyl group. A compound having an ethylenically unsaturated bond-containing group can be preferably used as a radical polymerizable compound. A compound having a cyclic ether group can be preferably used as a cationically polymerizable compound.

[0062] Examples of resin-type polymerizable compounds include resins containing repeating units having polymerizable groups.

[0063] The molecular weight of the monomer-type polymerizable compound (polymerizable monomer) is preferably less than 2000, and more preferably 1500 or less. The lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, and more preferably 200 or more. The weight-average molecular weight (Mw) of the resin-type polymerizable compound is preferably 2000 to 2,000,000. The upper limit of the weight-average molecular weight is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit of the weight-average molecular weight is preferably 3,000 or more, and more preferably 5,000 or more.

[0064] The compound having an ethylenically unsaturated bond-containing group as a polymerizable monomer is preferably a 3- to 15-functional (meth)acrylate compound, more preferably a 3- to 6-functional (meth)acrylate compound. Specific examples include compounds described in paragraphs 0095 to 0108 of JP 2009-288705 A, paragraph 0227 of JP 2013-029760 A, paragraph 0254 to 0257 of JP 2008-292970 A, paragraphs 0034 to 0038 of JP 2013-253224 A, paragraph 0477 of JP 2012-208494 A, JP 2017-048367 A, Japanese Patent No. 6057891 A, Japanese Patent No. 6031807 A, and JP 2017-194662 A, the contents of which are incorporated herein by reference.

[0065] Examples of compounds having an ethylenically unsaturated bond-containing group include dipentaerythritol tri(meth)acrylate (commercially available product: KAYARAD D-330, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available product: KAYARAD D-320, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available product: KAYARAD D-310, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available products: KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd., and NK Ester A-DPH-12E, manufactured by Shin-Nakamura Chemical Co., Ltd.), and compounds in which the (meth)acryloyl groups of these compounds are bonded via ethylene glycol and / or propylene glycol residues (e.g., SR454, SR499, commercially available from Sartomer).

[0066] Examples of compounds having an ethylenically unsaturated bond-containing group include diglycerin EO (ethylene oxide)-modified (meth)acrylate (commercially available product: M-460, manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (NK Ester A-TMMT, manufactured by Shin-Nakamura Chemical Co., Ltd.), and 1,6-hexanediol diacrylate (KAYARAD, manufactured by Nippon Kayaku Co., Ltd.). HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), Light Acrylate POB-A0, UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (all manufactured by Kyoeisha Chemical Co., Ltd.), and the like can also be used.

[0067] Furthermore, as the compound having an ethylenically unsaturated bond-containing group, it is also preferable to use a trifunctional (meth)acrylate compound such as trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide-modified tri(meth)acrylate, trimethylolpropane ethylene oxide-modified tri(meth)acrylate, isocyanuric acid ethylene oxide-modified tri(meth)acrylate, or pentaerythritol tri(meth)acrylate. Commercially available trifunctional (meth)acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, and M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, and TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), and KAYARAD GPO-303, TMPTA, THE-330, TPA-330, and PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

[0068] Furthermore, as the compound having an ethylenically unsaturated bond-containing group, a compound having an acid group such as a carboxyl group, a sulfo group, or a phosphate group can also be used. Commercially available products of such compounds include Aronix M-305, M-510, M-520, and Aronix TO-2349 (manufactured by Toagosei Co., Ltd.).

[0069] As the compound having an ethylenically unsaturated bond-containing group, a compound having a caprolactone structure can also be used.For compounds having a caprolactone structure, the description in paragraphs 0042 to 0045 of JP 2013-253224 A can be referred to, and the contents thereof are incorporated herein.Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, DPCA-120, etc., which are commercially available from Nippon Kayaku Co., Ltd. as the KAYARAD DPCA series.

[0070] The compound having an ethylenically unsaturated bond-containing group may also be a compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group. Such a compound is preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and / or a propyleneoxy group, more preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group, and even more preferably a tri- to hexa-functional (meth)acrylate compound having 4 to 20 ethyleneoxy groups. Commercially available products include SR-494 (manufactured by Sartomer), a tetrafunctional (meth)acrylate having four ethyleneoxy groups, and KAYARAD TPA-330 (manufactured by Nippon Kayaku Co., Ltd.), a trifunctional (meth)acrylate having three isobutyleneoxy groups.

[0071] The compound having an ethylenically unsaturated bond-containing group may also be a polymerizable compound having a fluorene skeleton. Commercially available products include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

[0072] It is also preferable to use a compound having an ethylenically unsaturated bond-containing group that is substantially free of environmentally restricted substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

[0073] Examples of compounds having a cyclic ether group include compounds having an epoxy group and compounds having an oxetanyl group, with compounds having an epoxy group being preferred. Examples of compounds having an epoxy group include compounds having 1 to 100 epoxy groups per molecule. The upper limit of the number of epoxy groups can be, for example, 10 or less, or 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more. Examples of compounds having an epoxy group include compounds described in JP 2013-011869 A, paragraphs 0034 to 0036, JP 2014-043556 A, paragraphs 0147 to 0156, JP 2014-089408 A, paragraphs 0085 to 0092, and JP 2017-179172 A, the contents of which are incorporated herein by reference.

[0074] The compound having a cyclic ether group may be a low molecular weight compound (for example, a molecular weight of less than 1000) or a high molecular weight compound (macromolecule) (for example, a molecular weight of 1000 or more, and in the case of a polymer, a weight average molecular weight of 1000 or more). The weight average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

[0075] Examples of compounds having a cyclic ether group that can be used include the compounds described in paragraphs 0034 to 0036 of JP 2013-011869 A, the compounds described in paragraphs 0147 to 0156 of JP 2014-043556 A, the compounds described in paragraphs 0085 to 0092 of JP 2014-089408 A, and the compounds described in JP 2017-179172 A.

[0076] Commercially available compounds having a cyclic ether group include Denacol EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX-850L, and EX-850 (all manufactured by Nagase ChemteX Corporation), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, and EP-4011S (all manufactured by ADEKA Corporation), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, and EPPN-502 (all manufactured by ADEKA Corporation), Celloxide 2021P, Celloxide 2081, Celloxide 2083, Celloxide 2085, EHPE3150, and EPOLEAD PB. 3600, PB 4700 (all manufactured by Daicel Corporation), Cyclomer P ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (all manufactured by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (all manufactured by Mitsubishi Chemical Corporation), Aron Oxetane OXT-121, OXT-221, OX-SQ, PNOX (all manufactured by Toagosei Co., Ltd.), Adeka Glycirol Examples of suitable monomers include ED-505 (manufactured by ADEKA Corporation, epoxy group-containing monomer), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (manufactured by NOF Corporation, epoxy group-containing polymers), OXT-101, OXT-121, OXT-212, and OXT-221 (all manufactured by Toagosei Co., Ltd., oxetanyl group-containing monomers), and OXE-10 and OXE-30 (all manufactured by Osaka Organic Chemical Industry Ltd., oxetanyl group-containing monomers).

[0077] Examples of compounds having a methylol group (hereinafter also referred to as methylol compounds) include compounds in which a methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Furthermore, compounds having an alkoxymethyl group (hereinafter also referred to as alkoxymethyl compounds) include compounds in which the alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Compounds in which an alkoxymethyl group or a methylol group is bonded to a nitrogen atom include alkoxymethylated melamine, methylolated melamine, alkoxymethylated benzoguanamine, methylolated benzoguanamine, alkoxymethylated glycoluril, methylolated glycoluril, alkoxymethylated urea, and methylolated urea. Compounds described in paragraphs

[0134] to

[0147] of JP 2004-295116 A and paragraphs

[0095] to

[0126] of JP 2014-089408 A can also be used.

[0078] (resin) The composition of the present invention can use a resin as the curable compound. It is preferable to use a curable compound that contains at least a resin. Resins are blended, for example, for purposes such as dispersing pigments and the like in the composition or as binders. Resins used primarily to disperse pigments and the like in the composition are also called dispersants. However, these uses of resins are merely examples, and resins can also be used for purposes other than these uses. Resins having polymerizable groups also fall under the category of polymerizable compounds.

[0079] The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit is preferably 4,000 or more, more preferably 5,000 or more.

[0080] Examples of resins include (meth)acrylic resins, epoxy resins, enethiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, vinyl acetate resins, polyvinyl alcohol resins, polyvinyl acetal resins, polyurethane resins, and polyurea resins. These resins may be used alone or in combination of two or more. Norbornene resins are preferred as cyclic olefin resins in terms of improving heat resistance. Commercially available norbornene resins include, for example, the ARTON series (e.g., ARTON F4520) manufactured by JSR Corporation. Further, examples of the resin include resins described in the examples of International Publication No. 2016 / 088645, resins described in JP-A-2017-057265, resins described in JP-A-2017-032685, resins described in JP-A-2017-075248, resins described in JP-A-2017-066240, resins described in JP-A-2017-167513, resins described in JP-A-2017-173787, and resins described in paragraphs 0041 to 0060 of JP-A-2017-206689. Resins described in paragraphs 0022 to 0071 of JP 2018-010856 A, blocked polyisocyanate resins described in JP 2016-222891 A, resins described in JP 2020-122052 A, resins described in JP 2020-111656 A, resins described in JP 2020-139021 A, and resins containing a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain, as described in JP 2017-138503 A, can also be used. Furthermore, resins having a fluorene skeleton can also be preferably used as the resin. For resins having a fluorene skeleton, please refer to the description of U.S. Patent Application Publication No. 2017 / 0102610, the contents of which are incorporated herein by reference.

[0081] It is also preferable to use a resin having a glass transition temperature of 150°C or higher as the resin. By using such a resin, it is easier to promote the association formation of the specific infrared absorbing compound in the film during film formation, and a film excellent in infrared shielding property, heat resistance, and light resistance can be formed. The glass transition temperature of the resin is preferably 180°C or higher, and more preferably 200°C or higher. In this specification, the glass transition temperature (Tg) of a resin is used as the theoretical value represented by the following formula for resins whose structure is known, and as the catalog value for resins whose structure is unknown. 1 / Tg=(W1 / Tg1)+(W2 / Tg2)+...+(Wn / Tgn) The above formula is a calculation formula when the resin is composed of n types of monomer components, namely, Monomer 1, Monomer 2, ..., Monomer n. In the above formula, Tg represents the glass transition temperature (unit: K) of the resin, Tg1 to Tgn represent the glass transition temperatures (unit: K) of the homopolymers of each monomer, and W1 to Wn represent the mass fraction of each monomer in all the monomer components.

[0082] It is preferable to use a resin having an acid group as the resin. Examples of the acid group include a carboxyl group, a phosphate group, a sulfo group, and a phenolic hydroxy group. These acid groups may be of one type or two or more types. The resin having an acid group can also be used as a dispersant. The acid value of the resin having an acid group is preferably 30 to 500 mgKOH / g. The lower limit is preferably 50 mgKOH / g or more, and more preferably 70 mgKOH / g or more. The upper limit is preferably 400 mgKOH / g or less, more preferably 200 mgKOH / g or less, even more preferably 150 mgKOH / g or less, and most preferably 120 mgKOH / g or less.

[0083] The resin preferably includes a resin containing a repeating unit derived from a compound represented by formula (ED1) and / or a compound represented by formula (ED2) (hereinafter, these compounds may be referred to as "ether dimers").

[0084] [ka]

[0085] In formula (ED1), R 1 and R 2 each independently represents a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent. [ka] In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. Specific examples of formula (ED2) can be found in JP-A No. 2010-168539.

[0086] For specific examples of ether dimers, reference can be made to paragraph 0317 of JP2013-029760A, the contents of which are incorporated herein by reference.

[0087] It is also preferable to use a resin having a polymerizable group as the resin. The polymerizable group is preferably an ethylenically unsaturated bond-containing group or a cyclic ether group, and more preferably an ethylenically unsaturated bond-containing group.

[0088] As the resin, it is also preferable to use a resin containing a repeating unit derived from a compound represented by formula (X). [ka] In the formula, R 1 represents a hydrogen atom or a methyl group, and R 21 and R 22 each independently represents an alkylene group, and n represents an integer of 0 to 15. 21 and R 22 The number of carbon atoms in the alkylene group represented by is preferably 1 to 10, more preferably 1 to 5, even more preferably 1 to 3, and particularly preferably 2 or 3. n represents an integer of 0 to 15, preferably an integer of 0 to 5, more preferably an integer of 0 to 4, and even more preferably an integer of 0 to 3.

[0089] Examples of the compound represented by formula (X) include ethylene oxide or propylene oxide modified (meth)acrylate of paracumylphenol, etc. Commercially available products include Aronix M-110 (manufactured by Toagosei Co., Ltd.).

[0090] The resin preferably contains a resin as a dispersant. Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, the acidic dispersant (acidic resin) refers to a resin in which the amount of acid groups is greater than the amount of basic groups. As the acidic dispersant (acidic resin), a resin in which the amount of acid groups is 70 mol % or more is preferred, when the total amount of the acid groups and the basic groups is 100 mol %. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH / g. Furthermore, the basic dispersant (basic resin) refers to a resin in which the amount of basic groups is greater than the amount of acid groups. As the basic dispersant (basic resin), a resin in which the amount of basic groups is greater than 50 mol % is preferred, when the total amount of the acid groups and the basic groups is 100 mol %. The basic group possessed by the basic dispersant is preferably an amino group.

[0091] The resin used as the dispersant is preferably a graft resin. For details of the graft resin, please refer to paragraphs 0025 to 0094 of JP-A No. 2012-255128, the contents of which are incorporated herein by reference.

[0092] The resin used as the dispersant is preferably a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain. The polyimine-based dispersant is preferably a resin having a main chain with a partial structure having a functional group with a pKa of 14 or less and a side chain having 40 to 10,000 atoms, and having a basic nitrogen atom in at least one of the main chain and the side chain. There are no particular restrictions on the basic nitrogen atom, as long as it is a nitrogen atom that exhibits basicity. For details about polyimine-based dispersants, please refer to the description in paragraphs 0102 to 0166 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

[0093] The resin used as a dispersant is preferably a resin having a structure in which multiple polymer chains are bonded to a core portion. Examples of such resins include dendrimers (including star-shaped polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP 2013-043962 A.

[0094] The resin used as a dispersant is also preferably a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in a side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in a side chain is preferably 10 mol % or more, more preferably 10 to 80 mol %, and even more preferably 20 to 70 mol %, of all repeating units of the resin.

[0095] Further, as the dispersant, the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077, resins described in JP 2018-087939 A, polyethyleneimine having a polyester side chain described in WO 2016 / 104803, block copolymers described in WO 2019 / 125940 A, block polymers having an acrylamide structural unit described in JP 2020-066687 A, block polymers having an acrylamide structural unit described in JP 2020-066688 A, dispersants described in WO 2016 / 104803, resins described in JP 2019-095548 A, and the like can also be used.

[0096] Dispersants are also commercially available, and specific examples include the DISPERBYK series manufactured by BYK Japan, the SOLSPERSE series manufactured by Lubrizol Japan, the Efka series manufactured by BASF, and the AJISPER series manufactured by Ajinomoto Fine-Techno Co., Ltd. In addition, the products described in paragraph 0129 of JP 2012-137564 A and the products described in paragraph 0235 of JP 2017-194662 A can also be used as dispersants.

[0097] The content of the curable compound is preferably 1 to 95% by mass of the total solid content of the composition. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 94% by mass or less, more preferably 90% by mass or less, even more preferably 85% by mass or less, and particularly preferably 80% by mass or less.

[0098] When the composition of the present invention contains a polymerizable compound as a curable compound, the content of the polymerizable compound is preferably 1 to 85% by mass of the total solid content of the composition. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less.

[0099] When the composition of the present invention contains a polymerizable monomer as a curable compound, the content of the polymerizable monomer is preferably 1 to 50% by mass of the total solid content of the composition. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 30% by mass or less, more preferably 20% by mass or less.

[0100] When the composition of the present invention contains a compound having an ethylenically unsaturated bond-containing group as a curable compound, the content of the compound having an ethylenically unsaturated bond-containing group is preferably 1 to 70% by mass of the total solid content of the composition. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 65% ​​by mass or less, more preferably 60% by mass or less.

[0101] When the composition of the present invention contains a resin as a curable compound, the content of the resin is preferably 1 to 85% by mass of the total solid content of the composition. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, even more preferably 70% by mass or less, and particularly preferably 40% by mass or less.

[0102] When the composition of the present invention contains a resin as a dispersant, the content of the resin as a dispersant is preferably 0.1 to 40 mass% of the total solid content of the composition. The upper limit is preferably 25 mass% or less, and more preferably 20 mass% or less. The lower limit is preferably 0.5 mass% or more, and more preferably 1 mass% or more. Furthermore, the content of the resin as a dispersant is preferably 1 to 100 parts by mass relative to 100 parts by mass of the specific infrared absorbing compound. The upper limit is preferably 80 mass% or less, and more preferably 75 mass% or less. The lower limit is preferably 2.5 mass% or more, and more preferably 5 mass% or more.

[0103] The composition of the present invention may contain only one type of curable compound or may contain two or more types of curable compounds. When two or more types of curable compounds are contained, the total amount thereof is preferably within the above range.

[0104] <<Dye derivatives>> The composition of the present invention may further contain a dye derivative. The dye derivative is used as a dispersing aid. Examples of the dye derivative include compounds having a structure in which an acid group or a basic group is bonded to a dye skeleton.

[0105] Examples of dye skeletons constituting the dye derivative include a squarylium dye skeleton, a pyrrolopyrrole dye skeleton, a diketopyrrolopyrrole dye skeleton, a quinacridone dye skeleton, an anthraquinone dye skeleton, a dianthraquinone dye skeleton, a benzisoindole dye skeleton, a thiazine indigo dye skeleton, an azo dye skeleton, a quinophthalone dye skeleton, a phthalocyanine dye skeleton, a naphthalocyanine dye skeleton, a dioxazine dye skeleton, a perylene dye skeleton, a perinone dye skeleton, a benzimidazolone dye skeleton, a benzothiazole dye skeleton, a benzimidazole dye skeleton, and a benzoxazole dye skeleton. Of these, a squarylium dye skeleton, a pyrrolopyrrole dye skeleton, a diketopyrrolopyrrole dye skeleton, a phthalocyanine dye skeleton, a quinacridone dye skeleton, and a benzimidazolone dye skeleton are preferred, and a squarylium dye skeleton and a pyrrolopyrrole dye skeleton are more preferred.

[0106] Examples of the acid group include a carboxyl group, a sulfo group, a phosphoric acid group, a boronic acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imidic acid group, and salts thereof. Examples of the atom or atomic group constituting the salt include an alkali metal ion (Li + , Na + , K. + etc.), alkaline earth metal ions (Ca 2+ , Mg 2+ Examples of the carboxylic acid amide group include -NHCOR X1 As the sulfonamide group, a group represented by -NHSO2R is preferred. X2 As the imide acid group, a group represented by -SO2NHSO2R is preferred. X3 , -CONHSO2R X4 , -CONHCOR X5 or -SO2NHCOR X6 A group represented by the formula: -SO2NHSO2R is preferred. X3 is more preferable. X1 ~R X6 R each independently represents an alkyl group or an aryl group. X1 ~R X6 The alkyl group and aryl group represented by may have a substituent. The substituent is preferably a halogen atom, more preferably a fluorine atom.

[0107] Examples of basic groups include amino groups, pyridinyl groups and their salts, ammonium salts, and phthalimidomethyl groups. Examples of atoms or atomic groups that constitute salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

[0108] Examples of the dye derivatives include compounds described in JP-A-56-118462, compounds described in JP-A-63-264674, compounds described in JP-A-01-217077, compounds described in JP-A-03-009961, compounds described in JP-A-03-026767, compounds described in JP-A-03-153780, compounds described in JP-A-03-045662, compounds described in JP-A-04-285669, and the like. compounds described in JP-A-06-145546, compounds described in JP-A-06-212088, compounds described in JP-A-06-240158, compounds described in JP-A-10-030063, compounds described in JP-A-10-195326, compounds described in paragraphs 0086 to 0098 of WO 2011 / 024896, and compounds described in paragraphs 0063 to 009 of WO 2012 / 102399 4, the compound described in paragraph 0082 of WO 2017 / 038252, the compound described in paragraph 0171 of JP 2015-151530 A, the compound described in paragraphs 0162 to 0183 of JP 2011-252065 A, the compound described in JP 2003-081972 A, the compound described in Japanese Patent No. 5299151 A, the compound described in JP 2015-172732 A, the compound described in JP 2014 -199308, compounds described in JP-A-2014-085562, compounds described in JP-A-2014-035351, compounds described in JP-A-2008-081565, compounds described in JP-A-2019-109512, compounds described in JP-A-2019-133154, and diketopyrrolopyrrole compounds having a thiol linking group described in WO 2020 / 002106.

[0109] The content of the dye derivative is preferably 1 to 50 parts by mass relative to 100 parts by mass of the specific infrared absorbing compound. The lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. Only one type of dye derivative may be used, or two or more types may be used. When two or more types are used, the total amount preferably falls within the above range.

[0110] <<Solvent>> The composition of the present invention preferably contains a solvent. Examples of the solvent include water and organic solvents, and organic solvents are preferred. Examples of organic solvents include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents. For details, see paragraph 0223 of WO 2015 / 166779, the contents of which are incorporated herein by reference. Furthermore, ester solvents substituted with a cyclic alkyl group and ketone solvents substituted with a cyclic alkyl group can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, and propylene glycol. Examples of suitable organic solvents include alcohol monomethyl ether, propylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol, 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol. However, aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents may be reduced for environmental reasons (for example, the concentration of the total organic solvent may be reduced to 50 ppm (parts per million) by mass or less, 10 ppm by mass or less, or 1 ppm by mass or less).

[0111] In the present invention, it is preferable to use an organic solvent with a low metal content, and the metal content of the organic solvent is preferably 10 mass ppb (parts per billion) or less. If necessary, organic solvents with a mass ppt (parts per trillion) level may be used, and such organic solvents are provided, for example, by Toyo Gosei Co., Ltd. (The Chemical Daily, November 13, 2015).

[0112] Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using a filter. The pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0113] The organic solvent may contain isomers (compounds with the same number of atoms but different structures), and may contain only one type of isomer or multiple types of isomers.

[0114] The organic solvent preferably has a peroxide content of 0.8 mmol / L or less, and more preferably contains substantially no peroxide.

[0115] The content of the solvent in the composition is preferably 10 to 97% by mass. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, even more preferably 50% by mass or more, still more preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96% by mass or less, more preferably 95% by mass or less. The composition may contain only one type of solvent, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0116] <<Photopolymerization initiator>> When the composition of the present invention contains a polymerizable compound, it is preferable that the composition of the present invention further contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, a compound having photosensitivity to light in the ultraviolet to visible region is preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0117] Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, a benzyl dimethyl ketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a triarylimidazole dimer, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound, or a 3-aryl-substituted coumarin compound, more preferably a compound selected from an oxime compound, an α-hydroxyketone compound, an α-aminoketone compound, and an acylphosphine compound, and even more preferably an oxime compound. In addition, examples of the photopolymerization initiator include the compounds described in paragraphs 0065 to 0111 of JP-A No. 2014-130173, the compounds described in Japanese Patent No. 6301489, and the MATERIAL STAGE 37 to 60pp, vol. 19, No. 3, 2019, peroxide-based photopolymerization initiators described in, for example, WO 2018 / 221177, WO 2018 / 110179, photopolymerization initiators described in, for example, JP 2019-043864 A, photopolymerization initiators described in, for example, JP 2019-044030 A, peroxide-based initiators described in, for example, JP 2019-167313 A, aminoacetophenone-based initiators having an oxazolidine group described in, for example, JP 2020-055992 A, oxime-based photopolymerization initiators described in, for example, JP 2013-190459 A, and the like. The contents of these initiators are incorporated herein by reference.

[0118] Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (manufactured by IGM Resins BV), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (manufactured by BASF), etc. Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (manufactured by IGM Resins BV), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (manufactured by BASF), etc. Commercially available acylphosphine compounds include Omnirad 819 and Omnirad TPO (both manufactured by IGM Resins BV), Irgacure 819 and Irgacure TPO (both manufactured by BASF).

[0119] Examples of the oxime compound include compounds described in JP-A-2001-233842, compounds described in JP-A-2000-080068, compounds described in JP-A-2006-342166, compounds described in J.C.S. Perkin II (1979, pp. 1653-1660), compounds described in J.C.S. Perkin II (1979, pp. 156-162), compounds described in Journal of Photopolymer Science and Technology (1995, pp. 202-232), compounds described in JP-A-2000-066385, compounds described in JP-T-2004-534797, compounds described in JP-A-2017-019766, compounds described in Japanese Patent No. 6065596, compounds described in WO 2015 / 152153, compounds described in WO 2017 / 051680, compounds described in JP-A-2017-198865, compounds described in paragraphs 0025 to 0038 of WO 2017 / 164127, compounds described in WO 2013 / 167515, and the like. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, and 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one. Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, and Irgacure OXE04 (all manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Strong Electronic New Materials Co., Ltd.), and Adeka Optomer N-1919 (manufactured by ADEKA Corporation, photopolymerization initiator 2 described in JP 2012-014052 A). It is also preferable to use, as the oxime compound, a compound that is not colorable or a compound that is highly transparent and does not easily discolor. Commercially available products include Adeka Arcles NCI-730, NCI-831, and NCI-930 (all manufactured by ADEKA Corporation).

[0120] As the photopolymerization initiator, an oxime compound having a fluorene ring can also be used. Specific examples of the oxime compound having a fluorene ring include the compounds described in JP 2014-137466 A, JP 6636081 A, and Korean Patent Publication No. 10-2016-0109444 A.

[0121] As the photopolymerization initiator, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is replaced with a naphthalene ring can also be used. Specific examples of such oxime compounds include the compounds described in WO 2013 / 083505.

[0122] As the photopolymerization initiator, an oxime compound having a fluorine atom can also be used. Specific examples of the oxime compound having a fluorine atom include the compounds described in JP-A-2010-262028, compounds 24, 36 to 40 described in JP-A-2014-500852, and compound (C-3) described in JP-A-2013-164471.

[0123] As the photopolymerization initiator, an oxime compound having a nitro group can be used. The oxime compound having a nitro group is preferably a dimer. Specific examples of the oxime compound having a nitro group include the compounds described in paragraphs 0031 to 0047 of JP 2013-114249 A, paragraphs 0008 to 0012, and 0070 to 0079 of JP 2014-137466 A, the compounds described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071 A, and ADEKA ARCLES NCI-831 (manufactured by ADEKA Corporation).

[0124] As the photopolymerization initiator, an oxime compound having a benzofuran skeleton can also be used. Specific examples include OE-01 to OE-75 described in WO 2015 / 036910.

[0125] The photopolymerization initiator may be an oxime compound having a carbazole skeleton to which a hydroxyl-containing substituent is bonded. Examples of such a photopolymerization initiator include the compounds described in WO 2019 / 088055.

[0126] Specific examples of oxime compounds that can be preferably used in the present invention are shown below, but the present invention is not limited to these.

[0127] [ka] [ka] [ka]

[0128] The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm. Furthermore, from the viewpoint of sensitivity, the molar absorption coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high, more preferably 1,000 to 300,000, even more preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar absorption coefficient of the compound can be measured using a known method. For example, it is preferably measured using a spectrophotometer (Varian Cary-5 spectrophotometer) at a concentration of 0.01 g / L using ethyl acetate as a solvent.

[0129] As the photopolymerization initiator, a bifunctional, trifunctional or higher functional photoradical polymerization initiator may be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, resulting in good sensitivity. Furthermore, when a compound with an asymmetric structure is used, crystallinity is reduced, improving solubility in solvents and the like, making it less likely to precipitate over time, thereby improving the stability of the composition over time. Specific examples of bifunctional or trifunctional or higher functional photoradical polymerization initiators include the dimers of oxime compounds described in JP-A Nos. 2010-527339, 2011-524436, WO 2015 / 004565, and WO 2016-532675, paragraphs 0407 to 0412, and WO 2017 / 033680, paragraphs 0039 to 0055; Compound (E) and Compound (G) described in JP-A No. 2013-522445; and Compound (G) described in WO 2017 / 033680. Examples of such initiators include Cmpd1 to 7 described in Patent Publication No. 2016 / 034963, the oxime ester photoinitiators described in paragraph 0007 of JP-T-2017-523465, the photoinitiators described in paragraphs 0020 to 0033 of JP-A-2017-167399, the photopolymerization initiator (A) described in paragraphs 0017 to 0026 of JP-A-2017-151342, and the oxime ester photoinitiators described in Japanese Patent No. 6469669.

[0130] The content of the photopolymerization initiator is preferably 0.1 to 40% by mass, more preferably 0.5 to 35% by mass, and even more preferably 1 to 30% by mass, of the total solid content of the composition. The composition may contain only one type of photopolymerization initiator, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0131] <<Curing agent>> When the composition of the present invention contains a compound having a cyclic ether group, it is preferable that the composition further contains a curing agent. Examples of the curing agent include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polycarboxylic acids, and thiol compounds. Specific examples of the curing agent include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, and pentaerythritol tetrakis(3-mercaptopropionate). The curing agent may also be the compounds described in paragraphs 0072 to 0078 of JP 2016-075720 A or the compounds described in JP 2017-036379 A.

[0132] The content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 6.0 parts by mass, relative to 100 parts by mass of the compound having a cyclic ether group.

[0133] <<Chromatic colorants>> The composition of the present invention may contain a chromatic colorant. In the present invention, the chromatic colorant means a colorant other than a white colorant or a black colorant. The chromatic colorant is preferably a colorant that has absorption in the wavelength range of 400 nm or more and less than 650 nm.

[0134] Examples of chromatic colorants include red colorants, green colorants, blue colorants, yellow colorants, purple colorants, and orange colorants. Chromatic colorants may be pigments or dyes. Pigments and dyes may be used in combination. Furthermore, pigments may be either inorganic or organic pigments. Furthermore, materials in which inorganic pigments or organic-inorganic pigments are partially substituted with organic chromophores can also be used as pigments. Substituting inorganic pigments or organic-inorganic pigments with organic chromophores makes it easier to design the hue.

[0135] The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. When the average primary particle diameter of the pigment is within the above range, the dispersion stability of the pigment in the composition is good. In the present invention, the primary particle diameter of the pigment can be determined from an image photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of ​​the primary particles of the pigment is determined, and the corresponding circle-equivalent diameter is calculated as the primary particle diameter of the pigment. In the present invention, the average primary particle diameter is the arithmetic mean value of the primary particle diameters of 400 primary particles of the pigment. In addition, primary particles of the pigment refer to independent particles that are not aggregated.

[0136] The chromatic colorant preferably contains a pigment. The content of the pigment in the chromatic colorant is preferably 50% by mass or more, more preferably 70% by mass or more, even more preferably 80% by mass or more, and particularly preferably 90% by mass or more. Examples of pigments include the following.

[0137] Color Index (CI) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 140, 141, 142, 143, 144, 145, 146, 147, 148, 149, 150, 151, 152, 153, 154, 155, 156, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 178 8,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214,215,228,231,232 (methine type), 233 (quinoline type), 234 (amino ketone type), 235 (amino ketone type), 236 (amino ketone type), etc. (all yellow pigments), CIPigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. (orange pigments), CIPigment Red 1,2,3,4,5,6,7,9,10,14,17,22,23,31,38,41,48:1,48:2,48:3,48:4,49,49:1,49:2,52:1,52:2,5 3:1,57:1,60:1,63:1,66,67,81:1,81:2,81:3,83,88,90,105,112,119,122,123,144,146,149,150, 155,166,168,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,269,270,272,279,291,294 (xanthene, Organo Ultramarine, Bluish Red), 295 (monoazo), 296 (diazo), 297 (aminoketone), etc. (all red pigments), CI Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine type), 65 (phthalocyanine type), 66 (phthalocyanine type), etc. (all green pigments), CI Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane type), 61 (xanthene type), etc. (all purple pigments), CI Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo type), 88 (methine type), etc. (all blue pigments).

[0138] Alternatively, a halogenated zinc phthalocyanine pigment having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms per molecule can be used as a green colorant. Specific examples include the compounds described in International Publication No. 2015 / 118720. Other examples of green colorants that can be used include the compounds described in Chinese Patent Application No. 106909027, the phthalocyanine compounds having a phosphate ester as a ligand described in International Publication No. 2012 / 102395, the phthalocyanine compounds described in Japanese Patent Application Laid-Open No. 2019-008014, the phthalocyanine compounds described in Japanese Patent Application Laid-Open No. 2018-180023, the compounds described in Japanese Patent Application Laid-Open No. 2019-038958, and the core-shell dyes described in Japanese Patent Application Laid-Open No. 2020-076995.

[0139] Furthermore, an aluminum phthalocyanine compound having a phosphorus atom can also be used as the blue colorant. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP-A No. 2012-247591 and paragraph 0047 of JP-A No. 2011-157478.

[0140] Further, as the yellow colorant, compounds described in JP-A-2017-201003, compounds described in JP-A-2017-197719, compounds described in paragraphs 0011 to 0062 and 0137 to 0276 of JP-A-2017-171912, compounds described in paragraphs 0010 to 0062 and 0138 to 0295 of JP-A-2017-171913, compounds described in paragraphs 0011 to 0062 and 0139 to 0190 of JP-A-2017-171914, compounds described in paragraphs 0010 to 0065 and 0142 to 0222 of JP-A-2017-171915, compounds described in JP 2013-054339 A, paragraphs 0011 to 0034; quinophthalone compounds described in JP 2014-026228 A, paragraphs 0013 to 0058; isoindoline compounds described in JP 2018-062644 A; quinophthalone compounds described in JP 2018-203798 A; quinophthalone compounds described in JP 2018-062578 A; quinophthalone compounds described in Japanese Patent No. 6432076; quinophthalone compounds described in JP 2018-155881 A; 57, quinophthalone compounds described in JP 2018-040835 A, quinophthalone compounds described in JP 2017-197640 A, quinophthalone compounds described in JP 2016-145282 A, quinophthalone compounds described in JP 2014-085565 A, quinophthalone compounds described in JP 2014-021139 A, quinophthalone compounds described in JP 2013-209614 A, quinophthalone compounds described in JP 2013-209435 A, quinophthalone compounds described in JP 2013-181015 A Quinophthalone compounds, quinophthalone compounds described in JP 2013-061622 A, quinophthalone compounds described in JP 2013-032486 A, quinophthalone compounds described in JP 2012-226110 A, quinophthalone compounds described in JP 2008-074987 A, quinophthalone compounds described in JP 2008-081565 A, quinophthalone compounds described in JP 2008-074986 A, quinophthalone compounds described in JP 2008-074985 A, quinophthalone compounds described in JP 2008-050420 A,Quinophthalone compounds described in JP 2008-031281 A, JP 48-032765 B, JP 2019-008014 A, JP 6607427 A, methine dyes described in JP 2019-073695 A, methine dyes described in JP 2019-073696 A methine dyes described in JP 2019-073697 A, methine dyes described in JP 2019-073698 A, compounds described in Korean Patent Publication No. 10-2014-0034963 A, compounds described in JP 2017-095706 A, compounds described in Taiwan Patent Publication No. 201920495 A, compounds described in Japanese Patent No. 6607427 A Compounds described in JP 2020-033525 A, compounds described in JP 2020-033524 A, compounds described in JP 2020-033523 A, compounds described in JP 2020-033522 A, compounds described in JP 2020-033521 A, compounds described in WO 2020 / 045200, compounds described in WO 2020 / 045199, compounds described in WO 2020 / 045197, azo compounds described in JP 2020-093994 A, perylene compounds described in JP 2020-083982 A, perylene compounds described in WO 2020 / 105346, quinophthalone compounds described in JP-T-2020-517791 can also be used. Furthermore, polymerized versions of these compounds are also preferably used from the viewpoint of improving color value.

[0141] As red colorants, diketopyrrolopyrrole compounds having at least one bromine atom substituted in the structure described in JP 2017-201384 A, diketopyrrolopyrrole compounds described in paragraphs 0016 to 0022 of Japanese Patent No. 6248838, diketopyrrolopyrrole compounds described in WO 2012 / 102399, diketopyrrolopyrrole compounds described in WO 2012 / 117965, naphthol azo compounds described in JP 2012-229344 A, Other examples of red colorants that can be used include the red pigments described in Patent Publication No. 6516119, Japanese Patent Publication No. 6525101, the brominated diketopyrrolopyrrole compounds described in paragraph 0229 of JP 2020-090632 A, the anthraquinone compounds described in Korean Patent Publication No. 10-2019-0140741, the anthraquinone compounds described in Korean Patent Publication No. 10-2019-0140744, and the perylene compounds described in JP 2020-079396 A. Furthermore, compounds having a structure in which an aromatic ring group, in which a group in which an oxygen atom, sulfur atom, or nitrogen atom is bonded to the aromatic ring, is bonded to a diketopyrrolopyrrole skeleton, can also be used as red colorants.

[0142] For the diffraction angles that various pigments preferably have, please refer to the descriptions in Japanese Patent Nos. 6561862, 6413872, 6281345, and JP-A-2020-026503, the contents of which are incorporated herein by reference. It is also preferable to use a pyrrolopyrrole pigment in which the crystallite size in the plane direction corresponding to the maximum peak in the X-ray diffraction pattern among the eight (±1±1±1) crystal lattice planes is 140 Å or less. It is also preferable to set the physical properties of the pyrrolopyrrole pigment as described in paragraphs 0028 to 0073 of JP-A-2020-097744.

[0143] Dyes can also be used as the chromatic colorant. There are no particular limitations on the dyes, and known dyes can be used. Examples include pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, and pyrromethene dyes. In addition, the dyes may preferably be the thiazole compounds described in JP 2012-158649 A, the azo compounds described in JP 2011-184493 A, the azo compounds described in JP 2011-145540 A, the triarylmethane dye polymers described in Korean Patent Publication No. 10-2020-0028160, or the xanthene compounds described in JP 2020-117638 A. As a chromatic colorant, the phthalocyanine compounds described in WO 2020 / 174991 can be used.

[0144] When the composition of the present invention contains a chromatic colorant, the content of the chromatic colorant is preferably 1 to 50 mass % of the total solid content of the composition of the present invention. When the composition of the present invention contains two or more chromatic colorants, the total amount thereof is preferably within the above range.

[0145] <<Coloring material that transmits infrared light but blocks visible light>> The composition of the present invention may also contain a coloring material that transmits infrared light and blocks visible light (hereinafter also referred to as a coloring material that blocks visible light). A composition containing a coloring material that blocks visible light is preferably used as a composition for forming an infrared transmission filter.

[0146] The coloring material that blocks visible light is preferably a coloring material that absorbs light in the violet to red wavelength region. Furthermore, the coloring material that blocks visible light is preferably a coloring material that blocks light in the wavelength region of 450 to 650 nm. Furthermore, the coloring material that blocks visible light is preferably a coloring material that transmits light in the wavelength region of 900 to 1500 nm. The coloring material that blocks visible light preferably satisfies at least one of the following requirements (A) and (B): (A): Contains two or more chromatic colorants, and forms black by combining two or more chromatic colorants. (B): Contains an organic black colorant.

[0147] Examples of chromatic colorants include those mentioned above. Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. Examples of bisbenzofuranone compounds include compounds described in JP-A-2010-534726, JP-A-2012-515233, and JP-A-2012-515234, and are available, for example, as "Irgaphor Black" manufactured by BASF. Examples of perylene compounds include compounds described in paragraphs 0016 to 0020 of JP-A-2017-226821, CI Pigment Black 31, 32, and the like. Examples of the azomethine compound include compounds described in JP-A Nos. 01-170601 and 02-034664, and are available as "Chromofine Black A1103" manufactured by Dainichiseika Color & Chemicals Co., Ltd.

[0148] When black is formed by combining two or more chromatic colorants, the combination of chromatic colorants may be, for example, the following embodiments (1) to (8). (1) An embodiment containing a yellow colorant, a blue colorant, a purple colorant, and a red colorant. (2) An embodiment containing a yellow colorant, a blue colorant, and a red colorant. (3) An embodiment containing a yellow colorant, a purple colorant, and a red colorant. (4) An embodiment containing a yellow colorant and a purple colorant. (5) An embodiment containing a green colorant, a blue colorant, a purple colorant, and a red colorant. (6) An embodiment containing a purple colorant and an orange colorant. (7) An embodiment containing a green colorant, a purple colorant, and a red colorant. (8) An embodiment containing a green colorant and a red colorant.

[0149] When the composition of the present invention contains a coloring material that blocks visible light, the content of the coloring material that blocks visible light is preferably 1 to 50% by mass of the total solid content of the composition. The lower limit is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 20% by mass or more, and particularly preferably 30% by mass or more.

[0150] <<Surfactants>> The composition of the present invention preferably contains a surfactant. Various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone-based surfactants can be used as the surfactant. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant. Examples of the surfactant include those described in paragraphs 0238 to 0245 of International Publication No. 2015 / 166779 and those described in JP-A-2020-008634, the contents of which are incorporated herein by reference.

[0151] Examples of fluorine-based surfactants include those described in paragraphs 0060 to 0064 of JP 2014-041318 A (corresponding paragraphs 0060 to 0064 of WO 2014 / 017669 A), those described in paragraphs 0117 to 0132 of JP 2011-132503 A, and those described in JP 2020-008634 A, the contents of which are incorporated herein by reference. Commercially available fluorine-based surfactants include, for example, Megafac F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F-144, F-437, F-475, F-477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F-560, F-561, F-565, F-563, F-568, F-575, F-780, EXP, MFS-330, R-01, and R- 40, R-40-LM, R-41, R-41-LM, RS-43, R-43, TF-1956, RS-90, R-94, RS-72-K, DS-21 (all manufactured by DIC Corporation), Fluorard FC430, FC431, FC171 (all manufactured by Sumitomo 3M Limited), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (all manufactured by AGC Inc.), PolyFox Examples include PF636, PF656, PF6320, PF6520, and PF7002 (all manufactured by OMNOVA), Ftergent 208G, 215M, 245F, 601AD, 601ADH2, 602A, 610FM, 710FL, 710FM, 710FS, and FTX-218 (all manufactured by NEOS Corporation).

[0152] Also suitable for use as a fluorosurfactant are acrylic compounds that have a molecular structure with a functional group containing a fluorine atom, and when heated, the functional group containing the fluorine atom is cleaved and the fluorine atom volatilizes. Examples of such fluorosurfactants include the Megafac DS series manufactured by DIC Corporation (The Chemical Daily, February 22, 2016; The Nikkei Business Daily, February 23, 2016), such as Megafac DS-21.

[0153] It is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound as the fluorine-containing surfactant. Examples of such a fluorine-containing surfactant include the fluorine-containing surfactants described in JP 2016-216602 A, the contents of which are incorporated herein by reference.

[0154] A block polymer can also be used as the fluorine-based surfactant. A fluorine-containing polymer compound containing a repeating unit derived from a (meth)acrylate compound having a fluorine atom and a repeating unit derived from a (meth)acrylate compound having two or more (preferably five or more) alkyleneoxy groups (preferably ethyleneoxy groups or propyleneoxy groups) can also be preferably used as the fluorine-based surfactant. Further, the fluorine-containing surfactants described in paragraphs 0016 to 0037 of JP-A No. 2010-032698 and the following compounds are also exemplified as the fluorine-based surfactants usable in the present invention. [ka] The weight average molecular weight of the above compound is preferably 3000 to 50000, for example, 14000. In the above compound, % indicating the proportion of repeating units is mol %.

[0155] In addition, a fluorine-containing polymer having an ethylenically unsaturated bond-containing group in a side chain can also be used as a fluorine-containing surfactant. Specific examples include the compounds described in paragraphs 0050 to 0090 and 0289 to 0295 of JP 2010-164965 A, and Megafac RS-101, RS-102, RS-718K, and RS-72-K manufactured by DIC Corporation. In addition, the compounds described in paragraphs 0015 to 0158 of JP 2015-117327 A can also be used as a fluorine-containing surfactant.

[0156] In addition, it is also preferable from the viewpoint of environmental regulations to use the surfactants described in WO 2020 / 084854 as a substitute for surfactants having a perfluoroalkyl group having 6 or more carbon atoms.

[0157] It is also preferable to use a fluorine-containing imide salt compound represented by formula (fi-1) as a surfactant. [ka] In formula (fi-1), m represents 1 or 2, n represents an integer of 1 to 4, a represents 1 or 2, and X a+ is a valent metal ion, primary ammonium ion, secondary ammonium ion, tertiary ammonium ion, quaternary ammonium ion or NH4 + Represents.

[0158] Nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane, and their ethoxylates and propoxylates (for example, glycerol propoxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, and sorbitan fatty acid. Examples of suitable surfactants include esters, Pluronic L10, L31, L61, L62, 10R5, 17R2, and 25R2 (manufactured by BASF), Tetronic 304, 701, 704, 901, 904, and 150R1 (manufactured by BASF), Solsperse 20000 (manufactured by Lubrizol Japan Co., Ltd.), NCW-101, NCW-1001, and NCW-1002 (manufactured by Fujifilm Wako Pure Chemical Industries Co., Ltd.), Paionin D-6112, D-6112-W, and D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.), Olfine E1010, and Surfynol 104, 400, and 440 (manufactured by Nissin Chemical Industry Co., Ltd.).

[0159] Examples of cationic surfactants include tetraalkylammonium salts, alkylamine salts, benzalkonium salts, alkylpyridium salts, imidazolium salts, etc. Specific examples include dihydroxyethylstearylamine, 2-heptadecenyl-hydroxyethylimidazoline, lauryldimethylbenzylammonium chloride, cetylpyridinium chloride, and stearamidomethylpyridium chloride.

[0160] Examples of anionic surfactants include dodecylbenzenesulfonic acid, sodium dodecylbenzenesulfonate, sodium lauryl sulfate, sodium alkyldiphenyletherdisulfonate, sodium alkylnaphthalenesulfonate, sodium dialkylsulfosuccinate, sodium stearate, potassium oleate, sodium dioctyl sulfosuccinate, sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkylphenyl ether sulfate, sodium dialkylsulfosuccinate, sodium stearate, sodium oleate, and sodium t-octylphenoxyethoxypolyethoxyethyl sulfate.

[0161] Silicone surfactants include DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, SH29PA, SH30PA, SH8400, SH 8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, and SF 8419. OIL (all manufactured by DuPont Toray Specialty Materials Co., Ltd.), TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (all manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-3760, BYK-UV3510 (all manufactured by BYK-Chemie).

[0162] Furthermore, the silicone surfactant may also be a compound having the following structure: [ka]

[0163] The content of the surfactant is preferably 0.001 to 1 mass % of the total solid content of the composition, more preferably 0.001 to 0.5 mass %, and even more preferably 0.001 to 0.2 mass %. The composition may contain only one type of surfactant, or two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0164] <<Polymerization inhibitor>> The composition of the present invention may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.), with p-methoxyphenol being preferred. The content of the polymerization inhibitor is preferably 0.0001 to 5 mass% of the total solid content of the composition. The composition may contain only one type of polymerization inhibitor, or two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0165] <<Silane coupling agents>> The composition of the present invention may contain a silane coupling agent. In this specification, the term "silane coupling agent" refers to a silane compound having a hydrolyzable group and other functional groups. The term "hydrolyzable group" refers to a substituent directly bonded to a silicon atom that can form a siloxane bond through at least one of a hydrolysis reaction and a condensation reaction. Examples of hydrolyzable groups include halogen atoms, alkoxy groups, and acyloxy groups, with alkoxy groups being preferred. In other words, the silane coupling agent is preferably a compound having an alkoxysilyl group. Examples of functional groups other than the hydrolyzable group include vinyl groups, styryl groups, (meth)acryloyl groups, mercapto groups, epoxy groups, oxetanyl groups, amino groups, ureido groups, sulfide groups, isocyanate groups, and phenyl groups, with (meth)acryloyl groups and epoxy groups being preferred. Examples of silane coupling agents include the compounds described in paragraphs 0018 to 0036 of JP-A No. 2009-288703 and paragraphs 0056 to 0066 of JP-A No. 2009-242604, the contents of which are incorporated herein by reference. The content of the silane coupling agent is preferably 0.01 to 15.0 mass% of the total solid content of the composition, more preferably 0.05 to 10.0 mass%. The composition may contain only one type of silane coupling agent, or two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0166] <<Ultraviolet absorber>> The composition of the present invention may contain an ultraviolet absorber. Examples of ultraviolet absorbers include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, and triazine compounds. Specific examples of such compounds include those described in paragraphs 0038 to 0052 of JP 2009-217221 A, paragraphs 0052 to 0072 of JP 2012-208374 A, paragraphs 0317 to 0334 of JP 2013-068814 A, and paragraphs 0061 to 0080 of JP 2016-162946 A, the contents of which are incorporated herein by reference. Commercially available ultraviolet absorbers include, for example, UV-503 (manufactured by Daito Chemical Co., Ltd.), the Tinuvin series, and the Uvinul series manufactured by BASF. Benzotriazole compounds include the MYUA series manufactured by Miyoshi Oil & Fats (The Chemical Daily, February 1, 2016). The ultraviolet absorber may also be a compound described in paragraphs 0049-0059 of Japanese Patent No. 6268967, a compound described in paragraphs 0059-0076 of International Publication No. 2016 / 181987, or a thioaryl group-substituted benzotriazole ultraviolet absorber described in International Publication No. 2020 / 137819. The content of the ultraviolet absorber is preferably 0.01 to 30% by mass, more preferably 0.05 to 25% by mass, of the total solid content of the composition. The composition may contain only one type of ultraviolet absorber, or two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0167] <<Antioxidants>> The composition of the present invention may contain an antioxidant. Examples of antioxidants include phenolic compounds, phosphite ester compounds, and thioether compounds. Any phenolic compound known as a phenolic antioxidant can be used as the phenolic compound. Preferred phenolic compounds include hindered phenolic compounds. Compounds having a substituent at the position adjacent to the phenolic hydroxy group (ortho position) are preferred. The substituent is preferably a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms. Furthermore, compounds having a phenolic group and a phosphite ester group in the same molecule are also preferred as the antioxidant. Furthermore, phosphorus-based antioxidants can also be suitably used as the antioxidant. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, and ethyl bis(2,4-di-tert-butyl-6-methylphenyl)phosphite. Commercially available antioxidants include, for example, ADK STAB AO-20, ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-60G, ADK STAB AO-80, and ADK STAB AO-330 (all manufactured by ADEKA Corporation). The antioxidant may also be a compound described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, a compound described in International Publication No. WO 2017 / 006600, or a compound described in International Publication No. WO 2017 / 164024. The content of the antioxidant is preferably 0.01 to 20% by mass, more preferably 0.3 to 15% by mass, of the total solids content of the composition. The composition may contain only one antioxidant or two or more antioxidants. When two or more types are contained, the total amount thereof is preferably within the above range.

[0168] <<Other ingredients>> The composition of the present invention may optionally contain a sensitizer, a curing accelerator, a filler, a thermosetting accelerator, a plasticizer, and other auxiliary agents (e.g., conductive particles, antifoaming agents, flame retardants, leveling agents, release accelerators, fragrances, surface tension modifiers, chain transfer agents, etc.). By appropriately incorporating these components, film properties and other characteristics can be adjusted. For details of these components, please refer to, for example, paragraphs 0183 and after of JP 2012-003225 A (corresponding to paragraph 0237 of U.S. Patent Application Publication No. 2013 / 0034812), and paragraphs 0101-0104 and 0107-0109 of JP 2008-250074 A, the contents of which are incorporated herein by reference. The composition of the present invention may also optionally contain a latent antioxidant. Examples of latent antioxidants include compounds in which the moiety functioning as an antioxidant is protected with a protecting group, and the compound functions as an antioxidant when heated at 100 to 250°C or at 80 to 200°C in the presence of an acid / base catalyst, resulting in the elimination of the protecting group. Examples of latent antioxidants include the compounds described in WO 2014 / 021023, WO 2017 / 030005, and JP 2017-008219 A. Commercially available latent antioxidants include ADEKA ARCLES GPA-5001 (manufactured by ADEKA Corporation).

[0169] <Containment Container> The container for storing the composition of the present invention is not particularly limited, and known containers can be used. Furthermore, in order to prevent impurities from being mixed into the raw materials or the composition, it is also preferable to use a multi-layer bottle whose inner wall is made of six types of six-layer resin or a bottle with a seven-layer structure made of six types of resin. Examples of such containers include the container described in JP 2015-123351 A. Furthermore, it is also preferable to make the inner wall of the container out of glass or stainless steel in order to prevent metal elution from the inner wall, improve the stability of the composition over time, and prevent deterioration of the components.

[0170] <Method for preparing the composition> The composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the composition, all components may be simultaneously dissolved or dispersed in a solvent to prepare the composition, or, if necessary, two or more solutions or dispersions in which the respective components are appropriately blended may be prepared in advance, and these may be mixed at the time of use (application) to prepare the composition.

[0171] The preparation of the composition may include a process for dispersing the pigment. Mechanical forces used to disperse the pigment in the process include compression, squeezing, impact, shear, and cavitation. Specific examples of these processes include a bead mill, a sand mill, a roll mill, a ball mill, a paint shaker, a microfluidizer, a high-speed impeller, a sand grinder, a flow jet mixer, high-pressure wet atomization, and ultrasonic dispersion. When grinding the pigment in a sand mill (bead mill), it is preferable to use small-diameter beads or increase the bead packing ratio to increase grinding efficiency. After the grinding process, it is preferable to remove coarse particles by filtration, centrifugation, or the like. In addition, the process and disperser for dispersing pigments can be suitably used, for example, the process and disperser described in "Dispersion Technology Encyclopedia," published by Joho Kiko Co., Ltd., July 15, 2005, or "Dispersion Technology and Industrial Applications Focused on Suspension (Solid / Liquid Dispersion System) - Comprehensive Data Collection," published by the Management Development Center Publishing Department, October 10, 1978, or paragraph 0022 of JP 2015-157893 A. In addition, in the process for dispersing pigments, the pigment may be subjected to a salt milling process to reduce its particle size. The materials, equipment, and processing conditions used in the salt milling process can be found, for example, in JP 2015-194521 A and JP 2012-046629 A.

[0172] When preparing the composition, it is preferable to filter the composition for the purpose of removing foreign matter and reducing defects. Any filter that has been conventionally used for filtration purposes can be used without any particular limitation. Examples include filters made of materials such as fluororesins such as polytetrafluoroethylene (PTFE) and polyvinylidene fluoride (PVDF), polyamide resins such as nylon (e.g., nylon-6, nylon-6,6), and polyolefin resins (including high-density and ultra-high-molecular-weight polyolefin resins) such as polyethylene and polypropylene (PP). Among these materials, polypropylene (including high-density polypropylene) and nylon are preferred.

[0173] The pore size of the filter is preferably 0.01 to 7.0 μm, more preferably 0.01 to 3.0 μm, and even more preferably 0.05 to 0.5 μm. If the pore size of the filter is within the above range, fine foreign matter can be removed more reliably. The nominal value of the filter manufacturer can be referred to for the pore size value of the filter. Various filters provided by Nippon Pall Corporation (DFA4201NIEY, DFA4201NAEY, DFA4201J006P, etc.), Advantech Toyo Co., Ltd., Nippon Integris Co., Ltd. (formerly Nippon Microlith Co., Ltd.), Kitz Microfilter Co., Ltd., etc. can be used.

[0174] It is also preferable to use a fibrous filter medium as the filter. Examples of fibrous filter medium include polypropylene fiber, nylon fiber, and glass fiber. Commercially available products include the SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by ROKI TECHNO CORPORATION.

[0175] When using filters, different filters (for example, a first filter and a second filter) may be combined. In this case, filtration with each filter may be performed only once or two or more times. Filters with different pore sizes within the above-mentioned range may also be combined. Furthermore, filtration with the first filter may be performed on the dispersion alone, and after mixing with other components, filtration with the second filter may be performed.

[0176] <Membrane> Next, the film of the present invention will be described. The film of the present invention is obtained from the composition of the present invention described above. The film of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, but examples include infrared cut filters and infrared transmission filters. Examples of infrared cut filters include infrared cut filters on the light-receiving side of a solid-state imaging device (e.g., as an infrared cut filter for a wafer-level lens), infrared cut filters on the back side (opposite the light-receiving side) of a solid-state imaging device, and infrared cut filters for ambient light sensors (e.g., an illuminance sensor that senses the illuminance and color tone of the environment in which an information terminal device is placed and adjusts the color tone of the display, or a color correction sensor that adjusts the color tone). In particular, it can be preferably used as an infrared cut filter on the light-receiving side of a solid-state imaging device. Examples of infrared transmission filters include filters that block visible light and can selectively transmit infrared rays of a specific wavelength or more.

[0177] The film of the present invention preferably has an average transmittance in the wavelength range of 700 to 1500 nm of less than 10%, more preferably less than 5%.

[0178] The film of the present invention may have a pattern or may be a film without a pattern (flat film). The film of the present invention may be used by being laminated on a support, or may be used by being peeled off from the support. Examples of the support include semiconductor substrates such as silicon substrates and transparent substrates.

[0179] A charge-coupled device (CCD), a complementary metal-oxide semiconductor (CMOS), a transparent conductive film, or the like may be formed on the semiconductor substrate used as a support. A black matrix for isolating each pixel may also be formed on the semiconductor substrate. An underlayer may also be formed on the surface of the semiconductor substrate. The surface contact angle of the underlayer is preferably 20 to 70° when measured with diiodomethane, and is preferably 30 to 80° when measured with water.

[0180] The transparent substrate used as the support is not particularly limited as long as it is made of a material that can transmit at least visible light. Examples of substrates include glass, resin, and other materials. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate; polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer; acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate; urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Examples of copper-containing glass include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass can also be used. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Technoglass Co., Ltd.).

[0181] The thickness of the film of the present invention can be adjusted appropriately depending on the purpose. The thickness of the film is preferably 20 μm or less, more preferably 10 μm or less, and even more preferably 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more.

[0182] The film of the present invention can also be used in combination with a color filter containing a chromatic colorant. The color filter can be produced using a coloring composition containing a chromatic colorant. When the film of the present invention is used as an infrared cut filter and is used in combination with the film of the present invention and a color filter, it is preferable that the color filter is arranged on the optical path of the film of the present invention. For example, it is preferable that the film of the present invention and a color filter are laminated together to form a laminate. In the laminate, the film of the present invention and the color filter may or may not be adjacent to each other in the thickness direction. When the film of the present invention and the color filter are not adjacent to each other in the thickness direction, the film of the present invention may be formed on a support other than the support on which the color filter is formed, and other members constituting a solid-state imaging device (e.g., microlenses, planarization layers, etc.) may be interposed between the film of the present invention and the color filter.

[0183] The film of the present invention can be used in various devices such as solid-state imaging devices such as CCDs (charge coupled devices) and CMOSs ​​(complementary metal oxide semiconductors), infrared sensors, and image display devices.

[0184] <Membrane manufacturing method> The film of the present invention can be produced through a step of applying the composition of the present invention.

[0185] Examples of the support include those described above. Known methods can be used to apply the composition. Examples include a dropping method (drop casting), a slit coating method, a spray method, a roll coating method, a rotary coating method (spin coating), a casting coating method, a slit and spin method, a pre-wetting method (for example, the method described in JP-A-2009-145395), various printing methods such as inkjet (for example, on-demand method, piezo method, thermal method) and nozzle jet printing, flexographic printing, screen printing, gravure printing, reverse offset printing, and metal mask printing, a transfer method using a mold, and a nanoimprint method. The inkjet application method is not particularly limited, and examples thereof include the method described in "Expanding and Usable Inkjet - Infinite Possibilities Seen in Patents -", ​​published in February 2005 by Sumibe Techno Research (particularly pages 115 to 133), and the methods described in JP-A Nos. 2003-262716, 2003-185831, 2003-261827, 2012-126830, and 2006-169325.

[0186] The composition layer formed by applying the composition may be dried (prebaked). When prebaking is performed, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or can be 80°C or higher. The prebaking time is preferably 10 to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed using a hot plate, an oven, or the like.

[0187] The film manufacturing method may further include a step of forming a pattern. Examples of the pattern forming method include a pattern forming method using a photolithography method and a pattern forming method using a dry etching method, and a pattern forming method using a photolithography method is preferred. Note that when the film of the present invention is used as a flat film, the step of forming a pattern does not need to be performed. The step of forming a pattern will be described in detail below.

[0188] (When forming patterns using photolithography) The pattern formation method by photolithography preferably includes a step of patternwise exposing a composition layer formed by applying the composition of the present invention (exposure step), and a step of developing and removing the unexposed portions of the composition layer to form a pattern (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Each step will be described below.

[0189] In the exposure step, the composition layer is exposed to light in a pattern. For example, the composition layer can be exposed to light in a pattern by using a stepper exposure machine, a scanner exposure machine, or the like, through a mask having a predetermined mask pattern. This allows the exposed portion to be cured.

[0190] Examples of radiation (light) that can be used for exposure include g-rays and i-rays. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF rays (wavelength 248 nm) and ArF rays (wavelength 193 nm), with KrF rays (wavelength 248 nm) being preferred. Long-wave light sources with wavelengths of 300 nm or more can also be used.

[0191] Furthermore, the exposure may be performed by continuous irradiation with light or by pulsed irradiation (pulse exposure), which is an exposure method in which light irradiation and pauses are repeated in short cycles (for example, milliseconds or less).

[0192] The irradiation amount (exposure amount) is, for example, 0.03 to 2.5 J / cm 2 is preferable, and 0.05 to 1.0 J / cm 2The oxygen concentration during exposure can be appropriately selected. In addition to exposure in the atmosphere, exposure may be performed in a low-oxygen atmosphere with an oxygen concentration of 19% by volume or less (e.g., 15% by volume, 5% by volume, or substantially oxygen-free), or in a high-oxygen atmosphere with an oxygen concentration of more than 21% by volume (e.g., 22% by volume, 30% by volume, or 50% by volume). The exposure illuminance can be appropriately set, and is usually 1000 W / m 2 ~100,000W / m 2 (e.g., 5000W / m 2 , 15000W / m 2 , or 35,000 W / m 2 The oxygen concentration and exposure illuminance may be appropriately combined. For example, an oxygen concentration of 10% by volume and an illuminance of 10,000 W / m 2 , oxygen concentration 35% by volume, illuminance 20000W / m 2 etc.

[0193] Next, the unexposed portions of the composition layer after exposure are developed and removed to form a pattern. The unexposed portions of the composition layer can be developed and removed using a developer. As a result, the unexposed portions of the composition layer in the exposure step are dissolved into the developer, and only the photocured portions remain on the support. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, to improve residue removal, the process of shaking off the developer every 60 seconds and then supplying fresh developer may be repeated several times.

[0194] Examples of the developer include organic solvents and alkaline developers, with alkaline developers being preferred. The alkaline developer is preferably an alkaline aqueous solution (alkaline developer) prepared by diluting an alkaline agent with pure water. Examples of the alkaline agent include organic alkaline compounds such as ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxyamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, pyrrole, piperidine, and 1,8-diazabicyclo[5.4.0]-7-undecene, as well as inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate, and sodium metasilicate. Alkaline agents with high molecular weights are preferred from an environmental and safety perspective. The concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, more preferably 0.01 to 1% by mass. The developer may further contain a surfactant. A nonionic surfactant is preferred as the surfactant. For ease of transportation and storage, the developer may be prepared as a concentrated solution and then diluted to the required concentration before use. The dilution ratio is not particularly limited, but may be set, for example, in the range of 1.5 to 100 times. It is also preferred to wash (rinse) the developed layer with pure water. Rinsing is preferably performed by supplying a rinse solution to the developed composition layer while rotating the support on which the developed composition layer is formed. It is also preferred to perform this by moving the nozzle ejecting the rinse solution from the center of the support to the periphery of the support. In this case, the nozzle movement speed may be gradually reduced as the nozzle moves from the center to the periphery of the support. Rinsing in this manner can suppress in-plane variations in rinsing. The same effect can also be obtained by gradually decreasing the rotation speed of the support while moving the nozzle from the center to the periphery of the support.

[0195] After development and drying, it is preferable to perform additional exposure treatment or heating treatment (post-baking). The additional exposure treatment or post-baking is a post-development curing treatment to ensure complete curing. The heating temperature in post-baking is, for example, preferably 100 to 240°C, more preferably 200 to 240°C. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, convection oven (hot air circulation dryer), or high-frequency heater to achieve the above conditions for the developed film. When additional exposure treatment is performed, it is preferable that the light used for exposure has a wavelength of 400 nm or less. The additional exposure treatment may also be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

[0196] (When patterning using dry etching) The pattern formation by the dry etching method can be carried out by applying the composition to a support, forming a composition layer, curing the formed composition layer to form a cured layer, then forming a patterned photoresist layer on the cured layer, and then dry etching the cured layer using an etching gas with the patterned photoresist layer as a mask. In forming the photoresist layer, it is preferable to perform a pre-baking treatment. For details on pattern formation by the dry etching method, please refer to the description in paragraphs 0010 to 0067 of JP 2013-064993 A, the contents of which are incorporated herein by reference.

[0197] <Optical filters> The optical filter of the present invention has the above-mentioned film of the present invention. Types of the optical filter include an infrared cut filter and an infrared transmission filter.

[0198] In addition to the above-described film of the present invention, the optical filter of the present invention may further include a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, etc. Examples of ultraviolet absorbing layers include the absorbing layers described in paragraphs 0040-0070 and 0119-0145 of International Publication No. 2015 / 099060. Examples of dielectric multilayer films include the dielectric multilayer films described in paragraphs 0255-0259 of Japanese Patent Application Laid-Open No. 2014-041318. Examples of copper-containing layers include glass substrates made of copper-containing glass (copper-containing glass substrates) and layers containing copper complexes (copper complex-containing layers). Examples of copper-containing glass substrates include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass products include NF-50 (manufactured by AGC Technoglass Co., Ltd.), BG-60, and BG-61 (all manufactured by Schott Corporation), and CD5000 (manufactured by HOYA Corporation).

[0199] <Solid-state imaging element> The solid-state imaging device of the present invention includes the above-described film of the present invention. The configuration of the solid-state imaging device is not particularly limited as long as it has a configuration including the film of the present invention and functions as a solid-state imaging device. For example, the following configurations can be mentioned.

[0200] The solid-state imaging device has a support on which a plurality of photodiodes constituting a light-receiving area of ​​the solid-state imaging element and transfer electrodes formed of polysilicon or the like are disposed; a light-shielding film formed of tungsten or the like, with only the light-receiving portions of the photodiodes exposed, is disposed on the photodiodes and transfer electrodes; a device protective film formed of silicon nitride or the like is disposed on the light-shielding film so as to cover the entire light-shielding film and the light-receiving portions of the photodiodes; and a film of the present invention is disposed on the device protective film. Furthermore, the device protective film may have a light-focusing means (e.g., a microlens, etc.; the same applies hereinafter) below the film of the present invention (on the side closer to the support), or a light-focusing means may be disposed on the film of the present invention. Furthermore, the color filter may have a structure in which a film forming each pixel is embedded in spaces partitioned, for example, in a lattice pattern, by partition walls. In this case, the partition walls preferably have a lower refractive index than the pixels. Examples of imaging devices having such a structure include those described in JP 2012-227478 A and JP 2014-179577 A.

[0201] <Image display device> The image display device of the present invention includes the film of the present invention. Examples of image display devices include liquid crystal display devices and organic electroluminescence (organic EL) display devices. Definitions and details of image display devices are described, for example, in "Electronic Display Devices" (written by Akio Sasaki, published by Kogyo Chosakai Co., Ltd. in 1990) and "Display Devices" (written by Nobuaki Ibuki, published by Sangyo Tosho Co., Ltd. in 1989). Liquid crystal display devices are described, for example, in "Next Generation Liquid Crystal Display Technology" (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994). The liquid crystal display device to which the present invention can be applied is not particularly limited, and the present invention can be applied to various types of liquid crystal display devices described in the above-mentioned "Next Generation Liquid Crystal Display Technology." The image display device may include a white organic EL element. The white organic EL element preferably has a tandem structure. The tandem structure of organic EL elements is described in, for example, JP 2003-045676 A and Akiyoshi Mikami, editor, "The Frontline of Organic EL Technology Development - High Brightness, High Precision, Long Life, Know-How Collection," Technical Information Association, pp. 326-328, 2008. The spectrum of white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430-485 nm), green region (530-580 nm), and yellow region (580-620 nm). In addition to these emission peaks, it is more preferable that the organic EL element further has a maximum emission peak in the red region (650-700 nm).

[0202] <Infrared sensor> The infrared sensor of the present invention includes the above-described film of the present invention. The configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, one embodiment of the infrared sensor of the present invention will be described with reference to the drawings.

[0203] In Fig. 1, reference numeral 110 denotes a solid-state imaging element. An infrared cut filter 111 and an infrared transmission filter 114 are disposed on an imaging region of the solid-state imaging element 110. A color filter 112 is disposed on the infrared cut filter 111. A microlens 115 is disposed on the incident light hν side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed to cover the microlens 115.

[0204] The infrared cut filter 111 can be formed using the composition of the present invention. The color filter 112 is a color filter formed with pixels that transmit and absorb light of specific wavelengths in the visible range. There are no particular limitations on the color filter 112, and conventionally known color filters for pixel formation can be used. For example, a color filter formed with red (R), green (G), and blue (B) pixels can be used. For example, the description in paragraphs 0214 to 0263 of JP 2014-043556 A can be referred to, and the contents of this specification are incorporated herein. The characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the composition of the present invention.

[0205] 1, an infrared cut filter (another infrared cut filter) other than the infrared cut filter 111 may be further disposed on the planarization layer 116. Examples of the other infrared cut filter include those having a copper-containing layer and / or a dielectric multilayer film. Details of these filters are as described above. Furthermore, a dual bandpass filter may be used as the other infrared cut filter. [Example]

[0206] The present invention will be explained in more detail below with reference to examples. The materials, amounts used, ratios, treatment details, treatment procedures, etc. shown in the following examples can be appropriately changed without departing from the spirit of the present invention. In addition, Ph in the structural formula represents a phenyl group.

[0207] <Measurement of weight average molecular weight and number average molecular weight> The weight-average molecular weight of the resin was measured using an HPC-8220GPC (manufactured by Tosoh Corporation) as the measuring device, a TSKguardcolumn SuperHZ-L as the guard column, and a column directly connected to TSKgel SuperHZM-M, TSKgel SuperHZ4000, TSKgel SuperHZ3000, or TSKgel SuperHZ2000. The column temperature was set to 40°C, and 10 μL of a tetrahydrofuran solution with a sample concentration of 0.1% by mass was injected into the column. Tetrahydrofuran was then flowed as the eluent at a flow rate of 0.35 mL per minute. The sample peak was detected with an RI (differential refractive index) detector, and calculations were performed using a calibration curve prepared using standard polystyrene.

[0208] <Preparation of pigment dispersion> The materials shown in the table below were mixed in the amounts shown in the table below, and the mixture was mixed and dispersed for 3 hours using zirconia beads with a diameter of 0.3 mm in a bead mill (a high-pressure disperser with a pressure reduction mechanism, NANO-3000-10, manufactured by Nippon BEE Co., Ltd.) to prepare each pigment dispersion.

[0209] [Table 1]

[0210] The details of the materials listed in the table are as follows:

[0211] (pigment) P001 to P004: Compounds with the following structure (infrared absorbers) [ka]

[0212] PR254: CI Pigment Red 254 (red pigment) PB15:6: CI Pigment Blue 15:6 (blue pigment)

[0213] (pigment derivatives) B-1 to B-3: Compounds having the following structures [ka]

[0214] (dispersant) D-1: Resin with the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 28,000) [ka] D-2: Resin with the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 28,000) [ka]

[0215] (solvent) S001: Propylene glycol monomethyl ether acetate

[0216] <Preparation of Composition> The materials other than the solvent shown in the table below were mixed in the proportions shown in the table below, and the solvent shown in the table below was added to adjust the solids concentration to 20 mass %, followed by stirring and filtering through a nylon filter (manufactured by Nippon Pall Co., Ltd.) with a pore size of 0.45 μm to prepare a composition. The values ​​in the blending amount column in the table are parts by mass converted to solids.

[0217] [Table 2]

[0218] [Table 3]

[0219] [Table 4]

[0220] Details of the materials listed in the table above are as follows:

[0221] (infrared absorber) [Compound represented by formula (1)] A001: Compound with the following structure (maximum absorption wavelength in dichloromethane: 920 nm) A002: Compound with the following structure (maximum absorption wavelength in dichloromethane: 900 nm) A003: Compound with the following structure (maximum absorption wavelength in dichloromethane: 910 nm) A004: Compound with the following structure (maximum absorption wavelength in dichloromethane: 980 nm) A005: Compound with the following structure (maximum absorption wavelength in dichloromethane: 990 nm) A006: Compound with the following structure (maximum absorption wavelength in dichloromethane: 970 nm) A007: Compound with the following structure (maximum absorption wavelength in dichloromethane: 1000 nm) A008: Compound with the following structure (maximum absorption wavelength in dichloromethane: 990 nm) A009: Compound with the following structure (maximum absorption wavelength in dichloromethane: 930 nm) A010: Compound with the following structure (maximum absorption wavelength in dichloromethane: 960 nm) A011: Compound with the following structure (maximum absorption wavelength in dichloromethane: 940 nm) A012: Compound with the following structure (maximum absorption wavelength in dichloromethane: 900 nm) A013: Compound with the following structure (maximum absorption wavelength in dichloromethane: 910 nm) A014: Compound with the following structure (maximum absorption wavelength in dichloromethane: 870 nm) A015: Compound with the following structure (maximum absorption wavelength in dichloromethane: 1080 nm) A016: Compound with the following structure (maximum absorption wavelength in dichloromethane: 1010 nm) A017: Compound with the following structure (maximum absorption wavelength in dichloromethane: 1030 nm) [ka] [ka] [ka] [ka]

[0222] [Infrared absorbers other than the compound represented by formula (1)] A101: A compound of the following structure [ka]

[0223] (pigment dispersion) IR1 to IR4, Red1, Blue1: the above-mentioned pigment dispersions IR1 to IR4, Red1, Blue1

[0224] (resin) B001: Polymethyl methacrylate (weight average molecular weight 24000, dispersity 1.8, glass transition temperature 75°C) B002: Resin with the following structure (resin having an acid group. The number attached to the main chain is the molar ratio of the repeating unit. Weight average molecular weight: 20,000, dispersity: 1.9, glass transition temperature: 100°C) [ka] B003: Resin with the following structure (resin with acid groups. The numbers attached to the main chain are the molar ratios of repeating units. Weight average molecular weight: 15,000, dispersity: 2.1, glass transition temperature: 120°C) [ka] B004: Resin with the following structure (polyimide resin, weight average molecular weight 25,000, dispersity 2.2, glass transition temperature 310°C) [ka]

[0225] (polymerizable compound) M-1: Aronix M-305 (manufactured by Toagosei Co., Ltd., a mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate. The pentaerythritol triacrylate content is 55% by mass to 63% by mass.) M-2: KAYARAD RP-1040 (manufactured by Nippon Kayaku Co., Ltd., ethylene oxide-modified pentaerythritol tetraacrylate) M-3: Aronix M-510 (manufactured by Toagosei Co., Ltd., polybasic acid-modified acrylic oligomer)

[0226] (Photopolymerization initiator) C-1: Irgacure OXE01 (BASF, oxime ester initiator) C-2: Irgacure OXE02 (BASF, oxime ester initiator)

[0227] (surfactant) F-1: Megafac RS-72-K (DIC Corporation, fluorine-based surfactant) F-2: Compound having the following structure (weight average molecular weight: 14,000, the percentage indicating the proportion of repeating units is mol%) [ka] F-3: KF-6001 (Shin-Etsu Chemical Co., Ltd., carbinol-modified polydimethylsiloxane at both ends, hydroxyl value 62 mg KOH / g)

[0228] (polymerization inhibitor) G-1: p-Methoxyphenol

[0229] (Other additives) U-1: Uvinul 3050 (manufactured by BASF, ultraviolet absorber) U-2: Tinuvin 477 (BASF, hydroxyphenyltriazine UV absorber) U-3: Tinuvin 326 (manufactured by BASF, UV absorber) EP-1: Compound with the following structure (epoxy compound, weight average molecular weight 4000) [ka] EP-2: EHPE3150 (manufactured by Daicel Corporation, 1,2-epoxy-4-(2-oxiranyl)cyclohexane adduct of 2,2-bis(hydroxymethyl)-1-butanol)

[0230] (solvent) S001: Propylene glycol monomethyl ether acetate S002: Propylene glycol monomethyl ether

[0231] <Evaluation of infrared shielding properties, light resistance, and heat resistance> Each composition was spin-coated onto a glass substrate so that the film thickness after formation would be 1.0 μm, and then exposed to light at 1000 mJ / cm using an i-line stepper exposure system FPA-3000i5+ (Canon Corporation). 2 The entire surface was exposed to an exposure amount of 1000 μg / cm 2. Then, the film was heated at 200° C. for 2 minutes using a hot plate to produce a film.

[0232] -Evaluation of infrared shielding properties- The transmittance of the glass substrate on which the above film was formed was measured in the wavelength range of 400 to 1600 nm using an ultraviolet-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Corporation), and the average value of the transmittance in the wavelength range of 1000 to 1200 nm was calculated, and the infrared shielding ability was evaluated according to the following criteria. A: The average transmittance is less than 5% B: The average transmittance is 5% or more and less than 10% C: The average transmittance is 10% or more

[0233] -Evaluation of light resistance- The transmittance of the glass substrates coated with the above-mentioned films was measured in the wavelength range of 400 to 1600 nm using a UV-Visible-Near-Infrared Spectrophotometer (U-4100, Hitachi High-Technologies Corporation). Next, the glass substrates coated with the above-mentioned films were irradiated with light from a xenon lamp at 100,000 lux for 20 hours (equivalent to 2,000,000 lux·h), and the transmittance of the films after irradiation with the xenon lamp was measured. The change in transmittance (ΔT1) at each wavelength in the 1000 to 1500 nm range before and after xenon lamp irradiation was determined, and lightfastness was evaluated using the largest ΔT1 value across the entire measured wavelength range according to the following criteria: A smaller ΔT1 value indicates better lightfastness. Change in transmittance (ΔT1) = |Transmittance of film before irradiation with xenon lamp - Transmittance of film after irradiation with xenon lamp| A: ΔT1 is less than 3% B: ΔT1 is 3% or more and less than 5% C: ΔT1 is 5% or more

[0234] -Evaluation of heat resistance- The transmittance of the glass substrate on which the above film was formed was measured in the wavelength range of 400 to 1600 nm using an ultraviolet-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Corporation). Next, the glass substrate on which the above film was formed was heated at 200°C for 10 minutes using a hot plate. The change in transmittance (ΔT2) at each wavelength in the wavelength range of 1000 to 1500 nm before and after heating was determined, and the heat resistance was evaluated based on the largest ΔT2 value across the entire measured wavelength range using the following criteria: The smaller the ΔT2 value, the better the heat resistance. Change in transmittance (ΔT2) = |Transmittance of film before heating - Transmittance of film after heating| A: ΔT2 is less than 5% B: ΔT2 is 5% or more and less than 10% C: ΔT2 is 10% or more

[0235] <Evaluation of pattern forming ability> Each composition was spin-coated onto a glass substrate so that the resulting film would have a thickness of 1.0 μm, and then heated on a hot plate at 100° C. for 2 minutes. Next, using an i-line stepper exposure system FPA-3000i5+ (manufactured by Canon Corporation), the film was exposed to 1000 mJ / cm 2 through a mask with a 1 μm Bayer pattern. 2 The glass substrate was exposed to an exposure amount of 10,000 times. Next, puddle development was performed using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH) at 23°C for 60 seconds. After that, the substrate was rinsed with a spin shower and further washed with pure water, and then heated on a hot plate at 200°C for 5 minutes to form a pattern (pixels). The glass substrate on which the pixels had been formed was observed at a magnification of 10,000 times using a microscope, and the pattern formability was evaluated according to the following evaluation criteria. A: A pattern was formed. B: Unable to form a pattern

[0236] [Table 5]

[0237] [Table 6]

[0238] As shown in the above table, the compositions of the examples were able to form films with excellent infrared shielding properties. [Explanation of symbols]

[0239] 110: solid-state imaging element, 111: infrared cut filter, 112: color filter, 114: infrared transmission filter, 115: microlens, 116: flattening layer

Claims

1. A composition containing an infrared absorber and a curable compound, The infrared absorber contains a compound represented by formula (1-1), a composition in which the content of the compound represented by formula (1-1) is 3 mass% or more based on the total solid content of the composition; 【Chemical 1】 In formula (1-1), Ar １ and Ar ２ each independently represents a nitrogen-containing heterocycle, R ３ and R ４ each independently represents a substituent, n3 and n4 each independently represent an integer of 0 or more; Ar １１ and Ar １２ each independently represents a pyrrole ring or a furan ring, R １１ and R １２ each independently represents a substituent, n11 and n12 each independently represent an integer of 0 or more; R １１１ ~R １１４ each independently represents a hydrogen atom or a substituent, R １１１ and R １１２ , R １１３ and R １１４ may be bonded to form a ring, Y １ and Y ２ are each independently —O—, —S—, or —NR Ｙ１ represents -, R Ｙ１ represents a hydrogen atom or a substituent, X １ and X ２ are each independently a hydrogen atom, -BR Ｘ１ R Ｘ２ or a metal atom optionally coordinated with a ligand, R Ｘ１ and R Ｘ２ each independently represents a hydrogen atom or a substituent, R Ｘ１ and R Ｘ２ may be bonded to form a ring.

2. A composition containing an infrared absorber and a curable compound, The infrared absorber contains a compound represented by formula (1-1)', a composition in which the content of the compound represented by formula (1-1)′ is 3 mass% or more based on the total solid content of the composition; 【Chemistry 2】 In formula (1-1)', Ar １ and Ar ２ each independently represents a nitrogen-containing heterocycle, R ３ and R ４ each independently represents a substituent, n3 and n4 each independently represent an integer of 0 or more; Ar １１ and Ar １２ each independently represents an aromatic hydrocarbon ring or a heteroaromatic ring; R １１ and R １２ each independently represents a substituent, n11 and n12 each independently represent an integer of 0 or more; R １１１ ~R １１４ each independently represents an alkyl group or an aryl group, and R １１１ and R １１２ and at least one of R １１３ and R １１４ at least one of is an alkyl group, R １１１ and R １１２ , R １１３ and R １１４ may be bonded to form a ring, Y １ and Y ２ are each independently —O—, —S—, or —NR Ｙ１ represents -, R Ｙ１ represents a hydrogen atom or a substituent, X １ and X ２ are each independently a hydrogen atom, -BR Ｘ１ R Ｘ２ or a metal atom optionally coordinated with a ligand, R Ｘ１ and R Ｘ２ each independently represents a hydrogen atom or a substituent, R Ｘ１ and R Ｘ２ may be bonded to form a ring.

3. A composition containing an infrared absorber and a curable compound, The infrared absorber comprises a compound represented by formula (1-1)', a composition in which the content of the compound represented by formula (1-1)'' is 3 mass% or more based on the total solid content of the composition; 【Chemistry 3】 In formula (1-1)'', Ar １ and Ar ２ each independently represents a nitrogen-containing heterocycle, R ３ and R ４ each independently represents a substituent, n3 and n4 each independently represent an integer of 0 or more; Ar １１ and Ar １２ each independently represents an aromatic hydrocarbon ring or a heteroaromatic ring; R １１ and R １２ each independently represents a substituent, n11 and n12 each independently represent an integer of 0 or more; R １１１ ~R １１４ each independently represents a hydrogen atom or a substituent, R １１１ and R １１２ , R １１３ and R １１４ may be bonded to form a ring, Y １ and Y ２ are each independently —O—, —S—, or —NR Ｙ１ represents -, R Ｙ１ represents a hydrogen atom or a substituent, X １ and X ２ are each independently a hydrogen atom, -BR Ｘ１ R Ｘ２ or a metal atom optionally coordinated with a ligand, R Ｘ１ and R Ｘ２ each independently represents an aryl group or an alkoxy group, R Ｘ１ and R Ｘ２ may be bonded to form a ring.

4. A composition containing an infrared absorber and a curable compound, The infrared absorber comprises a compound represented by formula (1-1)''', a composition in which the content of the compound represented by formula (1-1)′″ is 3 mass% or more based on the total solid content of the composition; 【Chemistry 4】 In formula (1-1)'''', Ar １ and Ar ２ each independently represents a nitrogen-containing heterocycle, R ３ and R ４ each independently represents a substituent, n3 and n4 each independently represent an integer of 0 or more; Ar １１ and Ar １２ each independently represents an aromatic hydrocarbon ring or a heteroaromatic ring; R １１ and R １２ each independently represents a substituent, n11 and n12 each independently represent an integer of 0 or more; R １１１ ~R １１４ each independently represents a hydrogen atom or a substituent, R １１１ and R １１２ , R １１３ and R １１４ may be bonded to form a ring, Y １ and Y ２ are each independently —S— or —NR Ｙ１ represents -, R Ｙ１ represents a hydrogen atom or a substituent, X １ and X ２ are each independently a hydrogen atom, -BR Ｘ１ R Ｘ２ or a metal atom optionally coordinated with a ligand, R Ｘ１ and R Ｘ２ each independently represents a hydrogen atom or a substituent, R Ｘ１ and R Ｘ２ may be bonded to form a ring.

5. 2. The composition according to claim 1, wherein the compound represented by formula (1-1) has a maximum absorption wavelength in dichloromethane in the wavelength range of 1000 to 1600 nm.

6. The composition according to claim 1, wherein the infrared absorber comprises a compound other than the compound represented by formula (1-1).

7. The composition according to any one of claims 1 to 6, further comprising a chromatic colorant.

8. The composition according to any one of claims 1 to 7, wherein the curable compound comprises a resin having an acid group.

9. The composition according to any one of claims 1 to 8, wherein the curable compound comprises a polymerizable compound.

10. The composition according to any one of claims 1 to 9, wherein the curable compound comprises a resin having a glass transition temperature of 150°C or higher.

11. The composition according to any one of claims 1 to 10, which is used for an infrared sensor.

12. A film obtained using the composition according to any one of claims 1 to 11.

13. An optical filter comprising the film of claim 12.

14. A solid-state imaging device comprising the film according to claim 12.

15. An image display device comprising the film according to claim 12.

16. An infrared sensor comprising the film of claim 12.

Images