Processing waste fluid treatment equipment and processing fluid regeneration system

Abstract

To easily replace a filter of a working waste liquid treatment device.SOLUTION: First fresh water recycled as a working liquid is produced by filtrating a working waste liquid from a working device 2 with a first backwash filter 13. At this time, a worked waste contained in the working waste liquid is accumulated in the first backwash filter 13. A first cleaning mechanism 17 produces a concentrated waste liquid containing the worked waste and cleaning water from a water supply source 5 by compression-feeding the cleaning water with the first backwash filter 13, and discharges the produced concentrated waste liquid to a centralized treatment device 6 outside a clean room. The worked waste can be taken out from the first backwash filter 13 using the cleaning water, which can reduce labor and time required for replacing the first backwash filter 13 in the clean room.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present invention relates to a machining waste fluid treatment device and a machining fluid regeneration system. [Background technology]

[0002] As disclosed in Patent Documents 1 and 2, a processing waste fluid treatment device removes processing debris from processing waste fluid that is discharged from a processing device that processes a workpiece with a processing tool while supplying processing fluid, thereby regenerating the processing fluid.

[0003] This processing waste fluid treatment system is installed near the processing equipment in a clean room. The processing equipment and the processing waste fluid treatment system are connected to each other by piping within the clean room, and the processing fluid is circulated to reduce its consumption. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2014-124753 [Patent Document 2] Japanese Patent Application Laid-Open No. 2009-190128 Summary of the Invention [Problem to be solved by the invention]

[0005] In processing waste fluid treatment equipment, it is necessary to replace the filters that remove processing debris from processing waste fluid. This filter replacement work is carried out in a clean room. This requires filter transportation work, such as carrying a new filter into the clean room and carrying the replaced filter out of the clean room, which is inefficient.

[0006] Furthermore, when multiple processing devices are installed, the processing devices are connected to the processing waste liquid treatment devices one-to-one, which means that when replacing the filters in each processing waste liquid treatment device, the worker must travel to the multiple locations where each processing waste liquid treatment device is installed, which reduces work efficiency.

[0007] Furthermore, the processing wastewater treatment device is equipped with ion exchange resin, and the replacement of this ion exchange resin also requires the same transportation work, which is inefficient.

[0008] SUMMARY OF THE INVENTION It is therefore an object of the present invention to facilitate replacement of consumable parts such as filters in a processing waste liquid treatment device connected to a plurality of processing devices. [Means for solving the problem]

[0009] The processing waste fluid treatment device of the present invention (the processing waste fluid treatment device) is a processing waste fluid treatment device that removes processing debris from processing waste fluid that contains processing debris discharged from a processing device that processes a workpiece using processing fluid, and regenerates the processing fluid, and includes a waste fluid tank that stores the processing waste fluid, a case that includes a cylindrical body, an upper plate that closes the upper surface of the cylindrical body, and a lower plate that closes the lower surface of the cylindrical body, and a bottomed cylindrical filtering member that is housed in the case and has its upper end bonded to the upper plate. , at least two a backwash filter, a pressure pump that pressure-feeds the processing waste liquid stored in the waste liquid tank to the backwash filter, an ultraviolet irradiation unit that irradiates ultraviolet light onto clean water that is discharged after filtering the processing waste liquid with the filtering member, and a filter that irradiates the ultraviolet light onto the clean water. and discharged to the outside of the processing waste liquid treatment device. An ion removal unit that removes ions contained in the clean water, and by stopping the pressure-feeding of the processing waste liquid to the backwash filter by the pressure-feed pump and by causing the pressure-feed pump to pump cleaning water to the backwash filter in the opposite direction to the pressure-feeding direction of the processing waste liquid, the processing debris is separated from the filtering member, and concentrated waste liquid containing the processing debris and the cleaning water is removed from the case. On the outside of the backwash filter A first cleaning mechanism that performs the draining. and a first pipe and a second pipe for pressure-feeding the processing waste liquid to each of the backwash filters by the pressure pump, a first valve disposed in the first pipe, a second valve disposed in the second pipe, and a second cleaning mechanism for controlling the first valve and the second valve to clean one of the backwash filters, wherein the second cleaning mechanism closes one of the first valve and the second valve and opens the other valve, and uses clean water discharged from the backwash filter to which the pipe in which the other valve is disposed as the cleaning water to clean the processing waste liquid from one of the backwash filters to which the pipe in which the one valve is disposed is connected. a first cleaning control unit that cleans one of the backwash filters by separating the processing debris from the other backwash filter connected to the pipe in which the other valve is located, and discharging the concentrated waste liquid containing the processing debris from the case of the other backwash filter to the outside of the backwash filter; and a second cleaning control unit that cleans the other backwash filter by closing the other valve and opening the one valve, and using fresh water discharged from the backwash filter connected to the pipe in which the one valve is located as the cleaning water to separate the processing debris from the other backwash filter connected to the pipe in which the other valve is located, and discharging the concentrated waste liquid containing the processing debris from the case of the other backwash filter to the outside of the backwash filter. and has a function of removing the processing debris from the backwash filter. The machining fluid regeneration system of the present invention (the present machining fluid regeneration system) is a machining fluid regeneration system that regenerates machining fluid from machining waste fluid discharged from a plurality of machining devices, and is equipped with the present machining waste fluid treatment device that is arranged one-to-one with the machining devices, a centralized treatment device that has a filtration filter that removes the machining debris from the concentrated waste fluid and centrally receives the concentrated waste fluid discharged from the machining waste fluid treatment devices, a first water supply pipe for sending the concentrated waste fluid from the machining waste fluid treatment device to the centralized treatment device, and a second water supply pipe for sending clean water from which the machining debris has been removed by the filtration filter to the machining waste fluid treatment device as cleaning water, and circulates the machining fluid and the machining waste fluid between the machining devices, the machining waste fluid treatment device, and the centralized treatment device. The machining fluid regeneration system may further include an ion exchange resin unit that removes ions from the clean water discharged from the filtration filter, and the clean water from which ions have been removed by the ion exchange resin unit may be supplied as cleaning water to the machining waste fluid treatment device through the second water supply pipe. The ion removal unit may be an electrodeionization exchange unit that electrically removes ions from the clean water and discharges ionized water containing ions and pure water from which the ions have been removed, and the ions may be removed from the ionized water by sending the ionized water to the ion exchange resin unit. [Effects of the Invention]

[0010] In this machining waste fluid treatment device, clean water is generated to be reused as machining fluid by filtering machining waste fluid from a machining device using a backwash filter. During this filtration, machining debris contained in the machining waste fluid is received by the filtering element of the backwash filter and accumulated there. In this machining waste fluid treatment device, the first cleaning mechanism pumps cleaning water through the backwash filter in the opposite direction to the pumping direction of the machining waste fluid using the pressure pump, thereby separating the machining debris from the filtering element and generating concentrated waste fluid containing the machining debris and cleaning water. This concentrated waste fluid is then discharged from the case of the backwash filter.

[0011] The processing waste liquid treatment device having such a configuration is installed, for example, in a clean room. In this case, the processing waste liquid treatment device uses cleaning water to remove the processing debris from the backwash filter, and then pumps the concentrated waste liquid out of the clean room for disposal, allowing the backwash filter to be used for a long period of time. In this machining fluid regeneration system including this machining waste fluid treatment device, the centralized treatment device is located, for example, outside a clean room. The concentrated waste fluid pumped outside the clean room is filtered through the filter of the centralized treatment device to produce clean water from which machining debris has been removed, and this clean water can be returned to the machining waste fluid treatment device as cleaning water. This reduces the consumption of cleaning water. [Brief explanation of the drawings]

[0012] [Figure 1] 1 is a block diagram showing a configuration of a machining system according to an embodiment of the present invention; [Figure 2] FIG. 2 is a block diagram showing the configuration of a first processing waste liquid treatment apparatus. [Figure 3] FIG. 3(a) is a top view showing the configuration of the first backwash filter, FIG. 3(b) is a side view of the same, and FIG. 3(c) is a cross-sectional view of the same. [Figure 4] FIG. 2 is a block diagram showing the configuration of a centralized processing device. [Figure 5] FIG. 2 is a perspective view showing the configuration of a filtration filter. [Figure 6] FIG. 2 is a block diagram showing the configuration of a second processing waste liquid treatment apparatus. [Figure 7] FIG. 10 is a block diagram showing the configuration of a third machining fluid regeneration system. DETAILED DESCRIPTION OF THE INVENTION

[0013] As shown in Figure 1, the processing system 1 of this embodiment includes a processing device 2 that processes a workpiece using a processing fluid (pure water in this embodiment), and a first processing fluid regeneration system 3 connected to the processing device 2.

[0014] The processing device 2 is placed inside a clean room (not shown). The processing device 2 is used, for example, in the manufacturing process of semiconductor devices. The processing device 2 is, for example, a grinding device that grinds and thins a workpiece such as a silicon wafer while supplying a processing fluid, or a cutting device that cuts the workpiece with a cutting blade while supplying a processing fluid. This processing fluid also includes a cleaning fluid used to clean the workpiece.

[0015] The first machining fluid regeneration system 3 is a system that regenerates machining fluid by removing machining debris from the machining waste fluid discharged from the machining device 2.

[0016] The first processing fluid regeneration system 3 includes a first processing waste fluid treatment device 4 that treats processing waste fluid, and a water supply source 5 and a centralized treatment device 6 connected to the first processing waste fluid treatment device 4. The first processing waste fluid treatment device 4 is located inside a clean room together with the processing device 2. On the other hand, the water supply source 5 and the centralized treatment device 6 are located outside the clean room.

[0017] The first processing waste fluid treatment device 4 regenerates the processing fluid by removing the processing debris from the processing waste fluid containing the processing debris discharged from the processing device 2, and supplies the regenerated processing fluid to the processing device 2.

[0018] 2, the first processing waste liquid treatment device 4 is provided with a waste liquid tank 11 that stores processing waste liquid discharged from the processing device 2. The waste liquid tank 11 is connected to the processing device 2 via a waste liquid piping 51. The processing waste liquid discharged from the processing device 2 is sent to the waste liquid tank 11 by this waste liquid piping 51 and stored therein. The processing waste liquid stored in the waste liquid tank 11 contains foreign matter such as processing chips (e.g., silicon chips) and ions (impurity ions) generated when the workpiece is processed by the processing device 2.

[0019] The waste liquid tank 11 is connected to a pressure pump 12 via a tank pipe 52. The pressure pump 12 is connected to a first backwash filter 13 via a first pipe 53, and pressure-feeds the processing waste liquid to the first backwash filter 13. A first valve 21 is disposed in the first pipe 53.

[0020] The first pipe 53 is a pipe for pressure-feeding the machining waste liquid to the first backwash filter 13 by the pressure-feed pump 12. The amount of machining waste liquid sent from the waste liquid tank 11 to the first backwash filter 13 is controlled by this pressure-feed pump 12.

[0021] The first backwash filter 13 generates clean water by filtering the processing waste liquid sent from the waste liquid tank 11. Hereinafter, the clean water generated by the first backwash filter 13 will be referred to as first clean water.

[0022] FIG. 3(a) is a top view showing the configuration of the first backwash filter 13. FIG. 3(b) is a side view of the first backwash filter 13 as seen from the direction of arrow A1 shown in FIG. 3(a). Furthermore, FIG. 3(c) is a cross-sectional view of the first backwash filter 13 taken along line A2-A2 shown in FIG. 3(a). As shown in FIGS. 3(a) to 3(c), the first backwash filter 13 comprises a cylindrical case 30 and a bottomed cylindrical mesh 40 within the case 30. The case 30 includes a cylindrical body 31, an upper plate 32 that closes the upper surface of the cylindrical body 31, and a lower plate 33 that closes the lower surface of the cylindrical body 31. An inlet 35 is provided on the side of the cylindrical body 31 for introducing processing waste liquid into the case 30.

[0023] The mesh 40 is an example of a filtering member. The mesh 40 is formed of a cylindrical net with a bottom, is housed in the case 30, and has one end (upper end) bonded to the upper plate 32. That is, the upper end of the mesh 40 is closed by the upper plate 32. On the other hand, the lower end of the mesh 40 is closed by a closing plate 42. The closing plate 42 is made of, for example, the same material as the mesh 40.

[0024] The mesh 40 can be made of metal or resin.

[0025] A central space 41 is formed on the inner periphery side of the mesh 40. Above the central space 41, a fresh water outlet 36 is provided on the upper plate 32 of the case 30.

[0026] That is, in this embodiment, the machining waste liquid stored in the waste liquid tank 11 is pressure-fed by the pressure pump 12 shown in Fig. 2 through the inlet 35 into the case 30 of the first backwash filter 13, and is accumulated in the case 30. Then, the machining waste liquid accumulated in the case 30 is pressure-fed from the outer surface 402 side, which is one side surface of the mesh 40 shown in Fig. 3(c), into the central space 41 inside the mesh 40.

[0027] As a result, the machining waste liquid passes through the mesh 40 from the outer surface 402 side toward the inner surface 401, which is the other side of the mesh 40. As a result, the machining debris in the machining waste liquid is received and accumulated by the outer surface 402 of the mesh 40 and removed from the machining waste liquid. In this way, the machining debris in the machining waste liquid pressure-fed to the first backwash filter 13 is filtered by the mesh 40, and first fresh water is produced from the machining waste liquid. The first fresh water is discharged to the outside of the first backwash filter 13 through the fresh water outlet 36 provided in the upper plate 32 of the case 30 above the central space 41.

[0028] Above the central space 41, the upper plate 32 of the case 30 is also provided with a cleaning water inlet 38 for introducing cleaning water into the central space 41. Furthermore, the lower plate 33 of the case 30 is provided with a drain port 37 for discharging concentrated waste liquid, which will be described later. The cleaning water inlet 38 and drain port 37 will be described later.

[0029] 2, the first backwash filter 13 is connected to the ultraviolet irradiation unit 14 via a first filter piping 54. The first fresh water discharged from the fresh water outlet 36 of the first backwash filter 13 is sent to the ultraviolet irradiation unit 14 via the first filter piping 54. A third valve 23 is disposed in the first filter piping 54.

[0030] The ultraviolet irradiation unit 14 includes, for example, a plurality of UV lamps (such as low-pressure mercury lamps), and irradiates ultraviolet rays onto the first clean water discharged from the first backwash filter 13. When ultraviolet rays are irradiated by the ultraviolet irradiation unit 14, organic matter contained in the first clean water is decomposed and ionized.

[0031] The ultraviolet irradiation unit 14 is connected to the electrodeionization exchange unit 15 via deionization piping 55. The electrodeionization exchange unit 15 functions as an ion removal unit that removes ions contained in the first clean water that has been irradiated with ultraviolet rays and sent from the ultraviolet irradiation unit 14. The electrodeionization exchange unit 15 electrically removes ions from the first clean water that has been irradiated with ultraviolet rays, and generates and discharges ionized water (concentrated water) containing ions and pure water from which ions have been removed.

[0032] The ionized water produced by the electrodeionization exchange unit 15 is sent to the centralized treatment device 6 via an ionized water supply pipe 72 .

[0033] Meanwhile, the pure water produced by the electrodeionization exchange unit 15 is sent to a temperature regulator 16. The temperature regulator 16 is connected to the processing device 2. The temperature regulator 16 adjusts the temperature of the pure water sent from the electrodeionization exchange unit 15 and supplies the pure water to the processing device 2 as a processing fluid. The processing fluid supplied from the temperature regulator 16 to the processing device 2 is used within the processing device 2.

[0034] As described above, in the processing system 1 according to the present embodiment, the used processing waste liquid discharged from the processing device 2 is regenerated by the first processing waste liquid treatment device 4 and then reused in the processing device 2.

[0035] 2, the first backwash filter 13 of the first processing waste liquid treatment apparatus 4 is connected to the water supply source 5 via a second water supply pipe 71. Specifically, the water supply source 5 is connected via the second water supply pipe 71 to the cleaning water inlet 38 provided in the upper plate 32 of the case 30 of the first backwash filter 13 shown in FIGS. 3(a) to 3(c). A fourth valve 24 is disposed in the second water supply pipe 71.

[0036] The first backwash filter 13 is connected to the centralized treatment device 6 via a first concentrated waste liquid pipe 61. Specifically, the centralized treatment device 6 is connected to the drain port 37 provided in the lower plate 33 of the case 30 of the first backwash filter 13 shown in Figures 3(b) and 3(c) via the first concentrated waste liquid pipe 61. A fifth valve 25 is disposed in the first concentrated waste liquid pipe 61.

[0037] 2, the first processing waste liquid treatment device 4 has a first cleaning mechanism 17. This first cleaning mechanism 17 controls the operations of the components of the first processing waste liquid treatment device 4, the water supply source 5, and the centralized treatment device 6 to perform a cleaning operation for cleaning the first backwash filter 13.

[0038] The following describes the cleaning operation performed by the first cleaning mechanism 17. This cleaning operation is an operation for removing, from the first backwash filter 13, the processing debris received by the mesh 40 of the first backwash filter 13.

[0039] In the cleaning operation by the first cleaning mechanism 17, first, the first cleaning mechanism 17 closes, for example, the first valve 21 to stop the pressure-feeding of the processing waste liquid to the first backwash filter 13 by the pressure-feeding pump 12. Furthermore, the first cleaning mechanism 17 closes the third valve 23. Then, the first cleaning mechanism 17 pressure-feeds cleaning water from the inner surface 401, which is the other side surface of the mesh 40 of the first backwash filter 13 shown in FIG. 3(c), toward the outer surface 402, which is one side surface.

[0040] That is, the first cleaning mechanism 17 opens the fourth valve 24 and the fifth valve 25 shown in Fig. 2 to connect the water supply source 5 to the first backwash filter 13. As a result, cleaning water is pumped from the water supply source 5 through the cleaning water inlet 38 of the first backwash filter 13 shown in Fig. 3(c) to the central space 41 of the mesh 40. The pumped cleaning water then passes through the mesh 40 from the inner surface 401 side of the mesh 40 toward the outer surface 402 of the mesh 40.

[0041] By pumping the cleaning water in this manner, the first cleaning mechanism 17 separates the processing debris received by the outer surface 402 of the mesh 40 from the outer surface 402, and discharges the concentrated waste liquid containing the processing debris and the cleaning water from the case 30 of the first backwash filter 13. That is, the first cleaning mechanism 17 pumps the cleaning water to the first backwash filter 13 in the direction opposite to the pumping direction in which the pressure pump 12 pumps the processing waste liquid, thereby separating the processing debris from the mesh 40. Specifically, concentrated waste liquid is generated between the mesh 40 and the case 30 shown in Fig. 3(c) by pumping cleaning water into the central space 41 of the mesh 40. The first cleaning mechanism 17 sends this concentrated waste liquid to the centralized treatment device 6 via the drain outlet 37 and the first concentrated waste liquid pipe 61 (see Fig. 2). As described above, the first processing waste liquid treatment device 4 of this embodiment has a function of removing processing debris from the first backwash filter 13.

[0042] Here, the configuration of the centralized processing device 6 will be described. 4, the centralized treatment device 6 is provided with a concentrated waste liquid tank 62 that stores concentrated waste liquid discharged from the first processing waste liquid treatment device 4. The concentrated waste liquid tank 62 is connected to the first processing waste liquid treatment device 4 via a first concentrated waste liquid pipe 61, which serves as a first water supply pipe used to send concentrated waste liquid from the first processing waste liquid treatment device 4 to the centralized treatment device 6.

[0043] The concentrated waste liquid tank 62 is connected to the filtration filter 64 via the first pump 63. The first pump 63 pumps the concentrated waste liquid stored in the concentrated waste liquid tank 62 toward the filtration filter 64.

[0044] 5, filtration filter 64 has a cylindrical case 90 and a substantially cylindrical filter member 96. Case 90 includes a cylindrical body 91, an upper plate 92 that closes the upper surface of cylindrical body 91, and a lower plate 93 that closes the lower surface of cylindrical body 91. A plurality of openings 94 are formed in the side surface of cylindrical body 91. In addition, a waste liquid inlet 95 for introducing concentrated waste liquid into case 90 is provided in the center of upper plate 92.

[0045] The filter member 96 is housed in the case 90. The filter member 96 is formed by folding a strip of filter material (for example, a resin mesh material or filter paper) in an accordion-like shape so that it has a generally cylindrical shape as a whole.

[0046] The upper end of the filter member 96 is adhered to an upper plate 92 of the case 90 and is closed by this upper plate 92. Meanwhile, the lower end of the filter member 96 is adhered to a lower plate 93 and is closed by this lower plate 93. A central space 97 is formed on the inner periphery of the filter member 96. A waste liquid inlet 95 is disposed above the central space 97.

[0047] In this embodiment, the concentrated waste liquid pumped by the first pump 63 is pumped into the case 90 of the filtration filter 64 through the waste liquid inlet 95, sent to the inside of the filter member 96 through the central space 97, and passes through the filter member 96 from the inside to the outside.

[0048] As a result, processing debris in the concentrated waste liquid is received and accumulated on the inner surface of filter member 96 and removed from the concentrated waste liquid. In this way, the concentrated waste liquid is filtered by filter member 96, and clean water is produced from the concentrated waste liquid. This clean water is discharged to the outside of filtration filter 64 through opening 94 provided in cylindrical body 91 of case 90 located outside filter member 96.

[0049] The fresh water discharged outside the filtration filter 64 is stored in a fresh water tank 65 shown in Figure 4. This fresh water tank 65 is connected to an ion exchange resin unit 67 via a second pump 66. The second pump 66 pumps the fresh water stored in the fresh water tank 65 toward the ion exchange resin unit 67.

[0050] The ion exchange resin unit 67 has a plurality of ion exchange resin bottles filled with ion exchange resin. The ion exchange resin unit 67 uses the ion exchange resin to remove ions from the fresh water discharged from the filtration filter 64 and pumped through the fresh water tank 65 and the second pump 66, thereby producing pure water.

[0051] 2 and 4, ionized water generated by the electrodeionization exchange unit 15 of the first processing waste liquid treatment apparatus 4 is supplied to the ion exchange resin unit 67 via an ionized water supply pipe 72. The ion exchange resin unit 67 generates pure water by removing ions from the ionized water using an ion exchange resin. That is, when the ionized water is supplied to the ion exchange resin unit 67, ions are removed from the ionized water to generate pure water. The ion exchange resin unit 67 supplies the generated pure water to the water supply source 5 shown in FIG. 2.

[0052] As described above, the pure water sent to the water supply source 5 is pressure-fed as cleaning water to the first processing waste liquid treatment device 4 via the second water supply pipe 71. In this way, the second water supply pipe 71 supplies the pure water obtained by removing processing debris by the filtration filter 64 of the centralized treatment device 6 and by removing ions by the ion exchange resin unit 67 to the first processing waste liquid treatment device 4 as cleaning water.

[0053] As described above, the first processing fluid regeneration system 3, which includes the first processing waste fluid treatment device 4 and the centralized treatment device 6, circulates processing fluid and processing waste fluid (including concentrated waste fluid) between the processing device 2, the first processing waste fluid treatment device 4, and the centralized treatment device 6.

[0054] In particular, in this embodiment, first clean water to be reused as machining fluid is generated by filtering machining waste fluid from the machining device 2 using the first backwash filter 13. During this filtration, machining debris contained in the machining waste fluid is received by the mesh 40 of the first backwash filter 13 and accumulated therein. In this embodiment, the first cleaning mechanism 17 pumps cleaning water from the water supply source 5 to the first backwash filter 13 in the direction opposite to the pumping direction of the machining waste fluid using the pressure pump 12, thereby separating the machining debris from the mesh 40 and generating concentrated waste fluid containing the machining debris and cleaning water. This concentrated waste fluid is then discharged from the case 30 of the first backwash filter 13 to the centralized processing device 6 located outside the clean room.

[0055] In this manner, in this embodiment, processing debris can be removed using cleaning water from the first backwash filter 13 provided in the first processing waste liquid treatment device 4 in the clean room. Therefore, the first backwash filter 13 can be used for a long period of time.

[0056] In this embodiment, processing debris from the concentrated waste liquid is removed by the filtration filter 64 of the centralized processing device 6 located outside the clean room and accumulates in the filter member 96 of this filtration filter 64. Then, by replacing the filtration filter 64 in which the processing debris has accumulated, the functionality of the centralized processing device 6 (the processing debris removal ability) can be maintained.

[0057] In addition, in this embodiment, the function (ion removal ability) of the ion exchange resin unit 67 of the centralized treatment device 6 can be maintained by replacing the ion exchange resin, which is a consumable part, one by one.

[0058] In this embodiment, consumable parts such as the filtration filter 64 and ion exchange resin are disposed in the centralized processing device 6 outside the clean room. Therefore, there is no need to bring these consumable parts into the clean room, eliminating the need for thorough cleaning of the consumable parts and reducing the effort and time required for replacement. Furthermore, because the replacement of consumable parts can be performed in one place, work efficiency can be further improved.

[0059] In the first machining fluid regeneration system 3, a part or all of the pure water generated in the centralized treatment device 6 may be discharged. In this case, pure water supplied from outside the first machining fluid regeneration system 3 may be pumped through the water supply source 5 to the first machining waste fluid treatment device 4 as cleaning water.

[0060] 6, instead of the first machining fluid regeneration system 3. The second machining fluid regeneration system 8 does not include the water supply source 5 shown in FIG. 2, and has a second machining waste fluid treatment device 7 instead of the first machining waste fluid treatment device 4.

[0061] The second processing waste liquid treatment device 7 has the same configuration as the first processing waste liquid treatment device 4 shown in Figure 2, but is newly equipped with a second backwash filter 18 and has a second cleaning mechanism 80 instead of the first cleaning mechanism 17.

[0062] The second backwash filter 18 has a configuration similar to that of the first backwash filter 13 shown in Figures 3(a) to 3(c) and is disposed in parallel with the first backwash filter 13. That is, in the second processing waste liquid treatment apparatus 7, the pressure-feed pump 12 is connected to the first backwash filter 13 via a first pipe 53, and is also connected to the second backwash filter 18 via a second pipe 56. The second pipe 56 is a pipe for pressure-feeding the processing waste liquid to the second backwash filter 18 by the pressure-feed pump 12. That is, in the second processing waste liquid treatment apparatus 7, the first pipe 53 and the second pipe 56 are pipes for pressure-feeding the processing waste liquid to one backwash filter each by the pressure-feed pump 12. A second valve 22 is disposed in the second pipe 56.

[0063] Similar to the first backwash filter 13, the second backwash filter 18 filters the processing waste liquid sent from the waste liquid tank 11 by the pressure pump 12 to produce fresh water. Hereinafter, the fresh water produced by the second backwash filter 18 will be referred to as second fresh water.

[0064] The second backwash filter 18 is connected to the centralized treatment device 6 via a second concentrated waste liquid pipe 68. Specifically, the drain outlet 37 provided in the lower plate 33 of the case 30 of the second backwash filter 18 shown in Figures 3(b) and 3(c) is connected to the concentrated waste liquid tank 62 (see Figure 4) of the centralized treatment device 6 via the second concentrated waste liquid pipe 68. A sixth valve 26 is disposed in the second concentrated waste liquid pipe 68.

[0065] 6, the second backwash filter 18 is connected to the ultraviolet irradiation unit 14 via a second filter piping 57. The second clean water discharged from the second backwash filter 18 is sent to the ultraviolet irradiation unit 14. A seventh valve 27 is disposed in the second filter piping 57.

[0066] In the second processing waste liquid treatment apparatus 7, a first bypass pipe 58 is provided between the first filter pipe 54 extending from the first backwash filter 13 to the ultraviolet irradiation unit 14 and the second backwash filter 18.

[0067] Specifically, one end of the first bypass piping 58 is connected to the first filter piping 54 on the downstream side of the third valve 23, and the other end is connected to the cleaning water inlet 38 of the case 30 of the second backwash filter 18 shown in Figures 3(a) to 3(c). Therefore, part of the first clean water discharged from the first backwash filter 13 is sent to the ultraviolet irradiation unit 14, while the other part is sent to the second backwash filter 18 via the first bypass piping 58.

[0068] Similarly, a second bypass pipe 59 is provided between a second filter pipe 57 extending from the second backwash filter 18 to the ultraviolet irradiation unit 14 and the first backwash filter 13. Specifically, one end of the second bypass pipe 59 is connected to the second filter pipe 57 downstream of the seventh valve 27, and the other end is connected to the cleaning water inlet 38 of the case 30 of the first backwash filter 13. Therefore, a portion of the second fresh water discharged from the second backwash filter 18 is sent to the ultraviolet irradiation unit 14, while the other portion is sent to the first backwash filter 13 via the second bypass pipe 59.

[0069] The second cleaning mechanism 80 controls the valves of the second processing waste liquid treatment device 7, including the first valve 21 and the second valve 22, to clean either the first backwash filter 13 or the second backwash filter 18. The second cleaning mechanism 80 includes a first cleaning control unit 81 and a second cleaning control unit 82. The cleaning operation by the second cleaning mechanism 80 will be described below.

[0070] In the cleaning operation by the second cleaning mechanism 80, the first cleaning control unit 81 cleans the second backwash filter 18 by controlling each valve, and the second cleaning control unit 82 cleans the first backwash filter 13 by controlling each valve.

[0071] The first cleaning control unit 81 opens the first valve 21 as the other valve, closes the second valve 22 as one valve, and further closes the seventh valve 27. This stops the pressure-feeding of the processing waste liquid to the second backwash filter 18 by the pressure-feeding pump 12, and stops the pressure-feeding of clean water from the second backwash filter 18 to the ultraviolet irradiation unit 14.

[0072] Furthermore, the first cleaning control unit 81 sends the first fresh water discharged from the first backwash filter 13 to the second backwash filter 18 using the first bypass piping 58. The first cleaning control unit 81 also opens the sixth valve 26 provided in the second concentrated waste liquid pipe 68. As a result, the first cleaning control unit 81 uses the first fresh water to separate the processing debris from the second backwash filter 18, and cleans the second backwash filter 18 by discharging the concentrated waste liquid containing the processing debris from the case 30 of the second backwash filter 18 (see FIGS. 3(a) to 3(c)).

[0073] 6, the first cleaning control unit 81 opens the first valve 21 and closes the second valve 22, closes the fifth valve 25 provided in the first concentrated waste liquid pipe 61, and opens the sixth valve 26 provided in the second concentrated waste liquid pipe 68. Furthermore, the first cleaning control unit 81 opens the third valve 23 provided in the first filter piping 54 and closes the seventh valve 27 provided in the second filter piping 57.

[0074] As a result, the pressure pump 12 pressure-feeds the processing waste liquid through the first piping 53 to the first backwash filter 13, and first clean water is produced by the first backwash filter 13. This first clean water is sent to the first filter piping 54, and a portion of it is pressure-feed to the second backwash filter 18 through the first bypass piping 58.

[0075] In the second backwash filter 18, the pressure-fed first fresh water passes through the mesh 40 as cleaning water via the cleaning water inlet 38 of the case 30 shown in FIGS. 3(a) to 3(c) from the inner surface 401 of the mesh 40 toward the outer surface 402. As a result, concentrated waste liquid containing processing debris and cleaning water is discharged from the case 30 and sent to the centralized treatment device 6 via the drain outlet 37 and the second concentrated waste liquid pipe 68 (see FIG. 6). As a result, the processing debris is removed from the second backwash filter 18. In this way, the first cleaning control unit 81 controls each valve, thereby cleaning the second backwash filter 18. In the centralized treatment device 6, pure water is produced from the concentrated waste liquid and discharged to the outside.

[0076] Thereafter, the second cleaning control unit 82 of the second cleaning mechanism 80 controls each valve to clean the first backwash filter 13. As shown in the right side of the parentheses in Fig. 6, the second cleaning control unit 82 closes the first valve 21 as the other valve, opens the second valve 22 as one valve, and further closes the third valve 23. This stops the pressure-feeding of the processing waste liquid to the first backwash filter 13 by the pressure-feed pump 12, and stops the pressure-feeding of fresh water from the first backwash filter 13 to the ultraviolet irradiation unit 14.

[0077] Furthermore, the second cleaning control unit 82 sends the second fresh water discharged from the second backwash filter 18 to the first backwash filter 13 using the second bypass piping 59. The second cleaning control unit 82 also opens the fifth valve 25 provided in the first concentrated waste liquid pipe 61. As a result, the second cleaning control unit 82 uses the second fresh water to separate the processing debris from the first backwash filter 13, and cleans the first backwash filter 13 by discharging the concentrated waste liquid containing the processing debris from the case 30 of the first backwash filter 13 (see FIGS. 3(a) to 3(c)).

[0078] 6, the second cleaning control unit 82 closes the first valve 21 and opens the second valve 22, opens the fifth valve 25 provided in the first concentrated waste liquid pipe 61, and closes the sixth valve 26 provided in the second concentrated waste liquid pipe 68. Furthermore, the second cleaning control unit 82 closes the third valve 23 provided in the first filter piping 54 and opens the seventh valve 27 provided in the second filter piping 57.

[0079] As a result, the pressure pump 12 pressure-feeds the processing waste liquid through the second piping 56 to the second backwash filter 18, and second fresh water is produced by the second backwash filter 18. This second fresh water is sent to the second filter piping 57, and a portion of it is pressure-feed to the first backwash filter 13 through the second bypass piping 59.

[0080] In the first backwash filter 13, the second fresh water pumped under pressure passes through the mesh 40 as cleaning water via the cleaning water inlet 38 of the case 30 shown in FIGS. 3(a) to 3(c) from the inner surface 401 of the mesh 40 toward the outer surface 402. As a result, concentrated waste liquid containing processing debris and cleaning water is discharged from the case 30 and sent to the centralized treatment device 6 via the drain outlet 37 and the first concentrated waste liquid pipe 61 (see FIG. 6). As a result, the processing debris is removed from the first backwash filter 13. In this way, the second cleaning control unit 82 controls each valve to clean the first backwash filter 13. In the centralized treatment device 6, pure water is produced from the concentrated waste liquid and discharged to the outside.

[0081] 6, processing debris can also be removed using cleaning water from the first backwash filter 13 and the second backwash filter 18 provided in the second processing waste liquid treatment device 7 in the clean room. This allows the first backwash filter 13 and the second backwash filter 18 to be used for a long period of time.

[0082] Furthermore, in the second machining waste fluid treatment device 7, the clean water discharged from either the first backwash filter 13 or the second backwash filter 18 is used as wash water for cleaning the other one of them. Therefore, it is not necessary to supply the pure water generated by the centralized treatment device 6 to the second machining waste fluid treatment device 7 via the water supply source 5. This allows the configuration of the second machining fluid regeneration system 8 to be simplified.

[0083] The second machining fluid regeneration system 8 may include the water supply source 5 shown in Fig. 2. The pure water generated by the centralized treatment device 6 may be sent to the water supply source 5 and then pressure-fed to the second machining waste fluid treatment device 7 as cleaning water via the second water supply pipe 71 (see Fig. 2). In this case, the first backwash filter 13 (second backwash filter 18) of the second machining waste fluid treatment device 7 may be washed with cleaning water obtained by mixing the pure water from the second backwash filter 18 (first backwash filter 13) and the cleaning water from the water supply source 5. In this configuration, the machining fluid and machining waste fluid are circulated among the machining device 2, the second machining waste fluid treatment device 7, and the centralized treatment device 6.

[0084] The second processing waste liquid treatment device 7 is also provided with two backwash filters, a first backwash filter 13 and a second backwash filter 18. In this regard, the second processing waste liquid treatment device 7 is only required to be provided with at least two backwash filters, and may be provided with three or more backwash filters.

[0085] 7, the processing system 1 may include a plurality of processing devices 2 (two in the example of FIG. 7) and a third processing fluid regeneration system 9. The third processing fluid regeneration system 9 includes a water supply source 5, a centralized processing device 6, and a plurality of first processing waste fluid processing devices 4 arranged in a one-to-one correspondence with the processing devices 2.

[0086] In this case, the centralized treatment device 6 is connected to the first backwash filters 13 (see FIG. 2) of the plurality of first processing waste liquid treatment devices 4 via the respective first concentrated waste liquid pipes 61, and centrally receives the concentrated waste liquid discharged from each of the first processing waste liquid treatment devices 4. Then, the centralized treatment device 6 produces pure water from these concentrated waste liquids as described above, and sends it to the water supply source 5.

[0087] In addition, the water supply source 5 is connected to the first backwash filters 13 (see Figure 2) of multiple first processing waste liquid treatment devices 4 via respective second water supply pipes 71, and is configured to be able to pressure-feed cleaning water to each first backwash filter 13.

[0088] In this configuration, even when a plurality of processing devices 2 and first processing waste liquid treatment devices 4 are provided, the concentrated waste liquid discharged from these devices can be treated using one centralized treatment device 6 including the filtration filter 64 and the ion exchange resin unit 67. Therefore, replacement of consumable parts such as the filtration filter 64 and the ion exchange resin can be performed in one place, thereby improving work efficiency.

[0089] 7, the third processing fluid regeneration system 9 may have the second processing fluid treatment device 7 shown in FIG. 6 instead of the first processing fluid waste treatment device 4. In this case, the water supply source 5 may not be provided.

[0090] Furthermore, in this embodiment, the ratio of the amount of processing waste liquid sent from the processing device 2 to the first processing waste liquid treatment device 4 or the second processing waste liquid treatment device 7 to the amount of concentrated waste liquid sent from the first processing waste liquid treatment device 4 or the second processing waste liquid treatment device 7 to the centralized treatment device 6 via the first concentrated waste liquid pipe 61 is approximately 10:1. Therefore, in this embodiment, the amount of processing waste liquid treated by treatment devices equipped with consumable parts such as filtration filters and ion exchange resins can be reduced to one-tenth of that in the conventional configuration.

[0091] Therefore, in this embodiment, processing waste liquid (concentrated waste liquid) from 10 processing devices 2 can be processed using a centralized processing device 6 having the same processing capacity as the processing device that was previously installed for each processing device 2.

[0092] In this embodiment, the first machining fluid regeneration system 3 and the third machining fluid regeneration system 9 each include a water supply source 5 and a centralized processing device 6. In this regard, the water supply source 5 may be included in the centralized processing device 6 as a part of the centralized processing device 6. [Explanation of symbols]

[0093] 1: Processing system, 2: Processing equipment, 3: First processing fluid regeneration system, 8: Second machining fluid regeneration system, 9: Third machining fluid regeneration system, 5: Water supply source, 6: Centralized treatment device, 4: First processing waste liquid treatment device, 7: Second processing waste liquid treatment device, 11: Waste liquid tank, 12: Pressure pump, 13: First backwash filter, 14: Ultraviolet irradiation unit, 15: Electrodeionization exchange unit 16: temperature regulator, 17: first cleaning mechanism, 18: Second backwash filter, 21: First valve, 22: Second valve, 23: Third valve, 24: 4th valve, 25: 5th valve, 26: 6th valve, 27: 7th valve, 30: Case, 31: Cylinder, 32: Upper plate, 33: Lower plate, 35: Inlet port, 36: fresh water outlet, 37: drain outlet, 38: cleaning water inlet, 40: Mesh, 42: Closure plate, 401: inner surface, 402: outer surface, 41: central space, 51: waste liquid piping, 52: tank piping, 53: first piping, 54: First filter piping, 55: Deionization piping, 56: Second piping, 57: second filter piping, 58: first bypass piping, 59: second bypass piping, 61: First concentrated waste pipe, 62: Concentrated waste tank, 63: First pump, 65: Fresh water tank, 66: Second pump, 67: Ion exchange resin unit, 68: second concentrated waste liquid pipe, 71: second water supply pipe, 72: ionized water supply pipe, 80: second cleaning mechanism, 81: first cleaning control unit, 82: second cleaning control unit, 64: filtration filter, 90: case, 91: cylinder, 92: upper plate, 93: lower plate, 94: Opening, 95: Waste liquid inlet, 96: Filter member, 97: Central space

Claims

1. A processing waste fluid treatment device that removes processing debris from processing waste fluid that contains processing debris discharged from a processing device that processes a workpiece using processing fluid and regenerates the processing fluid, a waste liquid tank for storing the processing waste liquid; At least two backwash filters each having a case including a cylindrical body, an upper plate that closes the upper surface of the cylindrical body, and a lower plate that closes the lower surface of the cylindrical body, and a bottomed cylindrical filtering member housed in the case and having an upper end bonded to the upper plate; a pressure pump that pressure-feeds the processing waste liquid stored in the waste liquid tank to the backwash filter; an ultraviolet irradiation unit that irradiates ultraviolet rays onto clean water that is discharged after filtering the processing wastewater through the filtering member and removing the processing chips from the processing wastewater that has been pressure-fed to the backwash filter; an ion removal unit for removing ions contained in the clean water that is irradiated with ultraviolet light and discharged to the outside of the processing waste liquid treatment device; a first cleaning mechanism that stops the pressure-feeding of the processing waste liquid to the backwash filter by the pressure-feeding pump, and causes the pressure-feeding pump to pump cleaning water to the backwash filter in a direction opposite to the pressure-feeding direction of the processing waste liquid, thereby separating the processing debris from the filtering member and discharging concentrated waste liquid containing the processing debris and the cleaning water from the case to the outside of the backwashing filter; a first pipe and a second pipe for pumping the processing waste liquid to each of the backwash filters by the pump; a first valve disposed in the first pipe; a second valve disposed in the second pipe; a second cleaning mechanism that controls the first valve and the second valve to clean any of the backwash filters; The second cleaning mechanism includes: a first cleaning control unit that closes one of the first valve and the second valve and opens the other valve, and uses the clean water discharged from the backwash filter connected to the pipe in which the other valve is disposed as the cleaning water to separate the processing debris from the one backwash filter connected to the pipe in which the one valve is disposed, and discharges the concentrated waste liquid containing the processing debris from the case of the one backwash filter to the outside of the one backwash filter, thereby cleaning the one backwash filter; a second cleaning control unit that closes the other valve and opens the one valve, uses clean water discharged from the backwash filter connected to the pipe in which the one valve is disposed as the cleaning water, separates the processing debris from the other backwash filter connected to the pipe in which the other valve is disposed, and discharges concentrated waste liquid containing the processing debris from the case of the other backwash filter to the outside of the backwash filter, thereby cleaning the other backwash filter. The processing waste liquid treatment device has a function of removing the processing debris from the backwash filter.

2. A machining fluid regeneration system that regenerates machining fluid by removing machining debris from machining waste fluid discharged from a plurality of machining devices, The processing waste liquid treatment apparatus according to claim 1, which is disposed one-to-one with the processing apparatus; a centralized treatment device that is provided with a filter for removing processing debris from the concentrated waste liquid and that centrally receives the concentrated waste liquid discharged from the processing waste liquid treatment device; a first water supply pipe for supplying the concentrated waste liquid from the processing waste liquid treatment device to the centralized treatment device; a second water supply pipe for supplying the clean water from which the processing debris has been removed by the filtration filter to the processing waste liquid treatment device as the cleaning water, The processing fluid and the processing waste fluid are circulated between the processing equipment, the processing waste fluid treatment device, and the centralized treatment device. Machining fluid regeneration system.

3. The system further includes an ion exchange resin unit that removes ions from the fresh water discharged from the filtration filter, and the fresh water from which ions have been removed by the ion exchange resin unit is sent as the cleaning water to the processing waste liquid treatment device through the second water supply pipe. The machining fluid regeneration system according to claim 2.

4. The ion removal unit is an electrodeionization exchange unit that electrically removes ions from the clean water and discharges ionized water containing ions and pure water from which ions have been removed; The ionized water is sent to the ion exchange resin unit, thereby removing ions from the ionized water. The machining fluid regeneration system according to claim 3.

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