Exhaust gas control system, exhaust gas control method, and exhaust gas control device

Abstract

To provide new technique which enables suitable humidity of a target space to be achieved irrespective of the environment of the target space.SOLUTION: An exhaust gas control system comprises: a combustion portion that combusts fuel for adjusting the temperature inside a target space; a supply portion that supplies, as the fuel, hydrogen gas or a mixed gas formulated with hydrogen gas and LP gas to the combustion portion; and an exhaust portion that introduces into the target space exhaust gas generated by combustion of the hydrogen gas or the mixed gas.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to an exhaust gas control system, an exhaust gas control method, and an exhaust gas control device. [Background technology]

[0002] Conventionally, there has been known a technique for promoting plant growth by supplying exhaust gas generated by burning fuel to a plant growing facility. An example of such a technique is disclosed in Patent Document 1, for example.

[0003] Patent Document 1 describes, for example, that exhaust gas generated in a combustion furnace 21 is discharged from an exhaust port via a first exhaust gas passage 11, while a portion of the exhaust gas is supplied to a horticultural greenhouse 81 via a second exhaust gas passage 12, and that the opening of a damper is adjusted based on the measurement results of the CO2 concentration measured by a CO2 meter 43 and the flow rate of the exhaust gas measured by a gas flow meter 44 to control the amount of exhaust gas supplied to the horticultural greenhouse. [Prior art documents] [Non-patent literature]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2017-93393 Summary of the Invention [Problem to be solved by the invention]

[0005] However, for efficient plant growth, the saturation deficit in the space is important. Here, saturation deficit is the value obtained by subtracting absolute humidity (amount of saturated water vapor x relative humidity) from the amount of saturated water vapor in the space. Generally, the appropriate saturation deficit level is 3 to 6 g / m 3 However, in Patent Document 1, the absolute amount of moisture contained in the exhaust gas can be reduced but cannot be increased, and therefore, depending on the environment of the target space, it is not possible to achieve an appropriate humidity level.

[0006] In view of the above problems, an object of the present invention is to provide a novel technique that can achieve an appropriate humidity level regardless of the environment of the target space. [Means for solving the problem]

[0007] In order to solve the above problems, the present invention comprises a combustion section that burns fuel to adjust the temperature within a target space, a supply section that supplies hydrogen gas or a mixed gas of hydrogen gas and LP gas as the fuel to the combustion section, and an exhaust section that guides exhaust gas generated by the combustion of the hydrogen gas or the mixed gas into the target space.

[0008] With this configuration, the water vapor generated by burning hydrogen gas can be appropriately guided into the target space or exhausted outside the space, thereby achieving an appropriate humidity level regardless of the environment of the space.

[0009] In a more preferred embodiment, the exhaust gas control system further includes a control unit, and the exhaust unit has an intra-space exhaust path that guides exhaust gas into the target space, an extra-space exhaust path that guides exhaust gas outside the target space, and a flow rate adjustment means that adjusts the flow rate of the path through which the exhaust gas flows, and the control unit acquires the temperature and humidity within the target space and controls the flow rate adjustment means based on the acquired temperature and humidity.

[0010] With this configuration, the flow rate of the exhaust gas flowing into and out of the target space can be adjusted by adjusting the flow rate adjusting means according to the temperature and humidity in the target space, thereby achieving an appropriate humidity level in the target space.

[0011] In a more preferred embodiment, the fuel is a mixed gas, and the control unit controls the flow rate adjustment means based on the acquired temperature and humidity, and the blending ratio of hydrogen gas and LP gas in the supplied mixed gas.

[0012] This configuration allows the blending ratio of hydrogen gas and LP gas to be adjusted according to the temperature and humidity in the target space, thereby adjusting the absolute amount of water vapor contained in the exhaust gas.

[0013] In a more preferred embodiment, the control unit controls the flow rate adjusting means based on a vapor pressure deficit obtained from the acquired temperature and humidity.

[0014] With this configuration, the flow rate adjusting means can be controlled in accordance with the saturation deficit calculated from the temperature and humidity.

[0015] In a more preferred embodiment, the fuel is a mixed gas, the supply unit has a blending degree adjustment means for adjusting the blending degree of hydrogen gas and LP gas, and the control unit controls the blending degree adjustment means based on the acquired temperature and humidity.

[0016] In a more preferred embodiment, the control unit controls the blending degree adjusting means based on a vapor pressure deficit obtained from the acquired temperature and humidity.

[0017] With this configuration, the blending degree adjusting means can be controlled in accordance with the saturation deficit calculated from the temperature and humidity.

[0018] In a more preferred embodiment, the fuel is a mixed gas, the supply unit has a blending ratio adjustment means for adjusting the blending ratio of hydrogen gas and LP gas, and the control unit controls the blending ratio adjustment means according to the time of day.

[0019] In a more preferred embodiment, the control unit controls the blending degree adjusting means so as not to mix hydrogen gas into the fuel depending on the time of day.

[0020] This configuration makes it possible to achieve appropriate humidity depending on the time of day. In some cases, humidity is not necessary, and in such cases, burning only LP gas can minimize the amount of water vapor emitted into the target space.

[0021] In a more preferred embodiment, the control unit controls the blending degree adjusting means so as not to mix LP gas into the fuel depending on the time of day.

[0022] This configuration makes it possible to prevent CO2 from being emitted outside the space depending on the time of day. There are times when CO2 is not needed, and in such cases, by burning only hydrogen gas, it is possible to prevent CO2 from being emitted outside the target space as much as possible.

[0023] In a more preferred embodiment, the target space is a growing space of a plant growing facility.

[0024] This configuration can provide a more suitable environment for plant growth. [Effects of the Invention]

[0025] The present invention has the effect of providing a novel technique that can achieve an appropriate humidity level regardless of the environment of a space. [Brief explanation of the drawings]

[0026] [Figure 1] FIG. 1 is a block diagram illustrating a configuration of a system according to an embodiment. [Figure 2] FIG. 1 is a hardware configuration diagram of a system according to an embodiment. [Figure 3] 1 is a processing flowchart of a system according to an embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0027] The present invention will now be described more fully with reference to the accompanying drawings, in which preferred embodiments are shown, but which may be embodied in many different forms and are not limited to the embodiments set forth herein.

[0028] For example, while the configuration, operation, etc. of an exhaust gas control system are described in this embodiment, methods, devices, computer programs, etc. with similar configurations can also achieve similar effects. The program may also be stored on a recording medium. Using this recording medium, the program can be installed on a computer, for example, to configure an exhaust gas control device and an index estimation system. Here, the recording medium storing the program may be a non-transitory recording medium, such as a CD-ROM.

[0029] The present invention relates to a system for controlling exhaust gas generated by burning fuel and guiding it to a target space. The fuel in the present invention is hydrogen gas or a mixed gas containing hydrogen gas and LP gas. The present invention guides exhaust gas to a target space for growing plants. While the target space in this embodiment is a plant growing facility, it may also be any other space requiring humidity control. The fuel may also contain other combustible gases in addition to hydrogen gas and LP gas. While the main component of LP gas is propane, the blending ratio of components (e.g., propane, butane) can be arbitrarily changed depending on the region where the LP gas is used, and butane may be the main component.

[0030] <1. System configuration> FIG. 1 is a block diagram showing the configuration of a system according to one embodiment. As shown in FIG. 1, the exhaust gas control system 0 includes an exhaust gas control device 1, a supply unit 2, a combustion unit 3, and an exhaust unit 4. The supply unit 2 includes an LPG cylinder 21, a hydrogen gas cylinder 22, and a blending ratio adjustment unit 23 for adjusting the blending ratio of the mixed gas. In this embodiment, the blending ratio adjustment unit 23 is a blending valve. Here, the blending ratio refers to the blending amount (molar number or mass number) or blending ratio (molar ratio or mass ratio) of each gas in the mixed gas. The combustion unit 3 includes a combustion chamber 31 and an air inlet 32. The exhaust unit 4 includes a flow rate adjustment unit 41 for adjusting the flow rate of the exhaust gas, an external space exhaust path 42, a first internal space exhaust path 43, and a second internal space exhaust path 44. In this embodiment, the flow rate adjustment unit 41 is an exhaust damper. In this embodiment, the exhaust gas control device 1 is configured to be capable of wireless communication to control the blending degree adjusting means 23 and the flow rate adjusting means 41, but there are no restrictions on the wireless standard and wired communication may also be used. Furthermore, the exhaust gas control device 1 is configured with the supply unit 2, combustion unit 3, and exhaust unit 4 as separate entities, but the exhaust gas control device 1, supply unit 2, combustion unit 3, and exhaust unit 4 may also be integrated. In other words, the exhaust gas control device 1 may have the supply unit 2, combustion unit 3, and exhaust unit 4 in addition to the functional configuration described below.

[0031] <1.1. Exhaust gas control device 1> The exhaust gas control device 1 is a device in which the exhaust gas control program of the present invention is installed, and can be implemented using a general-purpose server computer, a personal computer, a smartphone, a tablet terminal, etc. The exhaust gas control device 1 may be configured by a plurality of computers that are capable of sending and receiving information via a communication network NW or another network.

[0032] <1.2. Supply section 2> The supply unit 2 supplies fuel to the combustion unit 3. In this embodiment, the supply unit 2 supplies a mixed gas containing hydrogen gas and LP gas as fuel to the combustion unit.

[0033] <1.3. Combustion section 3> The combustion unit 3 combusts the mixed gas supplied from the supply unit 2. In this embodiment, the mixed gas is combusted in the combustion chamber 31 by supplying outside air from outside the facility through the air inlet 32. In addition, high-temperature exhaust gas generated by the combustion of the mixed gas is guided to the heat exchanger 33, whereby the taken-in outside air is heated and discharged as warm air into the target space.

[0034] <1.4. Exhaust section 4> The exhaust unit 4 exhausts exhaust gas into and / or outside the target space. In this embodiment, the exhaust gas is exhausted outside the equipment via the external exhaust path 42, and the exhaust gas is exhausted into the equipment via the first internal exhaust path 43 and the second internal exhaust path 44. The flow rate of the exhaust gas flowing through the external exhaust path 42 and the first internal exhaust path 43 is adjusted by adjusting the valve opening of the flow rate adjustment means 41. Adjustment of the valve opening by controlling the flow rate adjustment means 41 will be described later. A predetermined proportion of the exhaust gas is always exhausted into the space via the second internal exhaust path 44. The predetermined proportion can be changed arbitrarily by manually or automatically adjusting the valve opening of the valve installed in the second internal exhaust path 44, depending on the ratio between the valve opening of the flow rate adjustment means 41 of the external exhaust path 42, the valve opening of the flow rate adjustment means 41 of the first internal exhaust path 43, and the valve opening of the valve of the second internal exhaust path 44.

[0035] <1.5. Hardware configuration of exhaust gas control device 1> 2 is a hardware configuration diagram of the exhaust gas control device 1. As shown in FIG.

[0036] The control unit 11 has a processor such as a CPU (Central Processing Unit) that can execute an instruction set, and executes an exhaust gas control program and an OS (Operating System) according to the present invention to control the overall operation processing of the exhaust gas control device 1. In this embodiment, the control unit 11 controls the overall operation processing in accordance with the measurement results of the measurement unit 14. The storage unit 12 has a volatile memory such as a RAM capable of storing an instruction set, and a non-volatile recording medium such as a flash memory capable of recording an OS, an exhaust gas control program, and the like. The communication unit 13 has a communication interface device for outputting information for controlling the blending degree adjusting means 23 and the flow rate adjusting means 41 . The measurement unit 14 has a temperature sensor that measures the temperature inside the equipment, a humidity sensor that measures the humidity, and a CO2 concentration meter that measures the CO2 concentration, and passes the measured temperature, humidity, and CO2 concentration to the control unit 11.

[0037] <1.6. Functional configuration of exhaust gas control device 1> 2, the exhaust gas control device 1 of this embodiment includes, as functional components, a damper control unit 111, a valve control unit 112, and a temperature control unit 113. This is information processing executed by software stored in the storage unit 12, which is specifically realized by hardware (control unit 11).

[0038] <1.6.1. Damper control unit 111> The damper control unit 111 controls the flow rate adjustment means 41 based on the temperature and humidity inside the facility. The damper control unit 111 controls the flow rate adjustment means 41 based on the temperature and humidity inside the facility and the blending ratio of hydrogen gas and LP gas in the supplied mixed gas. Specifically, the damper control unit 111 controls the flow rate adjustment means 41 so as to reach a target vapor saturation deficit based on the vapor pressure deficit calculated from the temperature and humidity inside the facility and the amount of water vapor obtained based on the blending ratio of hydrogen gas and LP gas in the mixed gas.

[0039] <1.6.2. Valve control unit 112> The valve control unit 112 controls the blending degree adjusting means 23 based on the temperature and humidity inside the facility. The valve control unit 112 controls the blending degree adjusting means 23 to adjust the humidity inside the facility based on the saturation deficit calculated from the temperature and humidity inside the facility.

[0040] <1.6.3. Temperature control unit 113> The temperature control unit 113 controls the temperature inside the equipment. The temperature control unit 113 controls the combustion chamber 31 based on the temperature inside the equipment.

[0041] <2. Processing Flowchart> The exhaust gas control method of the present invention will be described below with reference to Fig. 3. Fig. 3 is a flowchart showing the process from starting the exhaust gas control device 1, burning hydrogen gas and / or LP gas, to controlling the flow rate adjusting means 41 (exhaust damper) and the blending degree adjusting means 23 (blending valve) by the exhaust gas control device 1, to adjusting the temperature and humidity inside the facility.

[0042] <2.1. Determination of the blending degree of the mixed gas and control of the blending valve 23> First, in step S1 (hereinafter, "step SX" will be referred to as "SX"), the valve control unit 112 determines the blending ratio of hydrogen gas and LP gas in the mixed gas. In this embodiment, the blending ratio in the mixed gas at the time of starting the exhaust gas control device 1 can be set arbitrarily. Then, in S2, the valve control unit 112 adjusts the valve opening degree of the blending valve 23 based on the determined blending ratio.

[0043] 2.2. Combustion of mixed gases In S3, the supply unit 2 supplies the mixed gas, in which hydrogen gas and LP gas are blended at the blending ratio determined in S2, to the combustion unit 3, and the combustion unit 3 combusts the mixed gas.

[0044] <2.3. Temperature and humidity measurement> Next, in S4, the measurement unit 14 measures the temperature, humidity, and CO2 concentration inside the equipment.

[0045] <2.4. Saturation Deficit Adjustment by Controlling the Exhaust Damper 41> In S5, the damper control unit 111 controls the exhaust damper 41 so that the vapor pressure deficit in the facility reaches a target value. In this embodiment, the damper control unit 111 controls the exhaust damper 41 so that the vapor pressure deficit in the facility reaches a target vapor pressure deficit (3 to 6 g / m) suitable for growing plants, based on the vapor pressure deficit calculated based on the temperature and humidity measured in S4 and the amount of water vapor obtained from the blending ratio of hydrogen gas and LP gas determined in S1. 3 The valve opening of the exhaust damper 41 is controlled so that the temperature becomes equal to or higher than the temperature of the exhaust gas. Then, the exhaust gas containing water vapor is discharged into the facility.

[0046] Specifically, the flow rate of exhaust gas flowing through the external exhaust path 42 and the flow rate of exhaust gas flowing through the first internal exhaust path 43 can be expressed as follows: if the valve opening of the external exhaust path 42 is θ1 (fully open is 1) and the valve opening of the first internal exhaust path 43 is θ2 (fully open is 1), and the flow rate of exhaust gas is proportional to the valve opening of the exhaust damper 41, the amount of water vapor exhausted outside the equipment via the external exhaust path 42 can be expressed as in equation (1).

number

number

[0047] The absolute amount of water vapor exhausted is determined by the hydrogen gas combustion formula and the gaseous water production formula: [ka] The chemical formula obtained from [ka] and the combustion formula of propane, which is the main component of general LP gas. [ka] and the equation obtained from Eq. (4) [ka] For example, if the blending ratio of hydrogen gas and LP gas (propane gas) is 1g of hydrogen gas and 1g of propane gas, the absolute amount of water vapor emitted will be 9g (amount of water vapor generated by combustion of hydrogen gas) + 18 / 11g (amount of water vapor generated by combustion of propane gas) ≒ 10.6g. If the LP gas contains butane, the amount of water vapor generated and the heat of combustion can be calculated using the component ratio of propane gas and butane gas and the combustion formulas for propane gas and butane gas.

[0048] The damper control unit 111 controls the valve opening of the exhaust damper 41 by using the formulas (1) and (2) to adjust the saturation deficit in the facility to a target saturation deficit (3 to 6 g / m 3 The amount of water vapor released into the space is controlled so that the temperature is equal to the air temperature.

[0049] <2.4. Saturation Deficit Adjustment by Controlling the Mixing Valve 23> If, after controlling the exhaust damper 41 in S5, the saturation deficit within the equipment is not appropriate (NO in S6: for example, the absolute amount of water vapor exhausted is insufficient with the valve opening of the exhaust damper 41 set in S5, and sufficient humidity cannot be maintained within the equipment), in S7 the valve control unit 112 controls the blending valve 23 based on the temperature and humidity within the equipment.

[0050] In this embodiment, in order to adjust the humidity inside the equipment based on the saturation deficit calculated based on the temperature and humidity measured in S4, the valve control unit 112 controls the valve aperture of the blending valve 23 to adjust the amount of hydrogen gas contained in the mixed gas. Specifically, when the saturation deficit inside the equipment decreases (increases), the valve control unit 112 controls the valve aperture of the blending valve 23 to increase (decrease) the blending degree of hydrogen gas. This increases (decreases) the absolute amount of water vapor to be exhausted.

[0051] On the other hand, if the result of controlling the exhaust damper 41 in S5 is that the saturation deficit in the equipment is appropriate (YES in S6), the valve control unit 112 controls the blending valve 23 to maintain the blending degree determined in S1.

[0052] As described above, by executing S1 to S7, the absolute amount of water vapor contained in the exhaust gas can be adjusted, and the amount of water vapor discharged into the equipment can be adjusted, making it possible to achieve an appropriate humidity level regardless of the environment of the equipment. While the exhaust gas control device 1 is operating, S4 to S7 are repeatedly executed to adjust the amount of water vapor introduced into the equipment. In the processing of S4 to S7 in this embodiment, the exhaust damper 41 is controlled before the blending valve 23 is controlled, but the exhaust damper 41 may be controlled after the blending valve 23 is controlled. Alternatively, the amount of water vapor introduced into the equipment may be adjusted by executing only one of the blending valve 23 and the exhaust damper 41.

[0053] <2.5. Preferred embodiments of the present invention> For plant growth, a minimum CO2 concentration is sufficient, and CO2 concentrations higher than necessary are unnecessary from a cost-effectiveness perspective. Furthermore, from equations (5) and (7), it can be seen that the ratio of the heat of combustion (energy ratio) generated from hydrogen gas and propane gas per mass is hydrogen gas:propane gas = 121:2177 / 44 ≒ 121:49.

[0054] In a preferred embodiment of the present invention, the valve control unit 112 adjusts the blending ratio of hydrogen gas and LP gas in the mixed gas by controlling the blending valve 23 based on the humidity within the facility, as well as the CO2 concentration and combustion efficiency (energy ratio) within the facility.

[0055] Specifically, the valve control unit 112 receives the temperature, humidity, and CO2 concentration inside the facility as inputs, and uses a blending learning model that estimates the optimal blending ratio of hydrogen gas and LP gas in the mixed gas and the valve opening of the exhaust damper 41 based on the energy ratio of the combustion heat, the mass ratio of water vapor generated by the combustion of hydrogen gas and LP gas, and the amount of CO2 generated by the combustion of LP gas, to output the blending ratio of hydrogen gas and LP gas in the mixed gas and the valve opening of the exhaust damper 41 from the measured temperature, humidity, and CO2 concentration inside the facility. Note that a correspondence table between the temperature, humidity, and CO2 concentration inside the facility and the blending ratio of hydrogen gas and LP gas and the valve opening of the exhaust damper 41 may be stored in the memory unit 12, and the blending ratio of hydrogen gas and LP gas in the mixed gas may be output based on the correspondence table.

[0056] In this way, the valve control unit 112 controls the valve openings of the blending valve 23 and the exhaust damper 41 so that hydrogen gas, which has good combustion efficiency, is included in the mixed gas to prevent the concentration of CO2 generated by the combustion of LP gas from becoming too high, and so that LP gas is included in the mixed gas to prevent the humidity inside the facility from becoming too high. This makes it possible to efficiently provide an environment that is effective for growing plants.

[0057] In a more preferred embodiment, the damper control unit 111 and the valve control unit 112 control the exhaust damper 41 and the blending valve 23, respectively, depending on the time of day.

[0058] Specifically, it is preferable to prevent the humidity inside the equipment from becoming too high at night. To achieve this, the damper control unit 111 controls the exhaust damper 41 so that the valve opening degree of the external exhaust path 42 is 0 and the valve opening degree of the internal first exhaust path 43 is 1. In addition, the valve control unit 112 controls the valve opening degree of the blending valve 23 so that hydrogen gas, which generates a large amount of water vapor, is not included in the mixed gas.

[0059] Furthermore, at night, when plants are not photosynthesizing, it is not necessary to burn LP gas, and it is preferable to burn only hydrogen gas and exhaust the exhaust gas outside the facility. To achieve this, the damper control unit 111 controls the exhaust damper 41 so that the valve opening of the external exhaust path 42 is 1 and the valve opening of the first internal exhaust path 43 is 0, and the valve control unit 112 controls the valve opening of the blending valve 23 so that LP gas is not included in the mixed gas.

[0060] To allow plants to perform photosynthesis effectively immediately after the start of photosynthesis, the LP gas may be burned slightly before sunrise to increase the CO2 concentration inside the greenhouse. Specifically, the valve control unit 112 controls the valve aperture of the blending valve 23 so that the LP gas is supplied to the combustion unit 3 slightly before sunrise, when photosynthesis begins. The damper control unit 111 then controls the valve apertures of the external space exhaust path 42 and the first internal space exhaust path 43 to guide the CO2 generated by the combustion of the LP gas into the greenhouse, thereby increasing the CO2 concentration inside the greenhouse before sunrise, when photosynthesis begins. [Explanation of symbols]

[0061] 0: Emissions control system 1: Exhaust gas control device 11: Control section 111: Damper control section 112: Valve control section 12: Storage section 13: Communications Department 14: Measurement section 2: Supply section 21: LP gas cylinder 22: Hydrogen gas cylinder 23: Blending degree adjusting means (blending valve) 3: Combustion section 31: Combustion chamber 32: Supply port 4: Exhaust section 41: Flow rate adjusting means (exhaust damper) 42: Exhaust route outside the space 43: First exhaust route in the space 44: Second exhaust route within the space

Claims

1. a combustion unit that burns fuel to adjust the temperature in the target space; A supply unit that supplies hydrogen gas or a mixed gas containing hydrogen gas and LP gas as the fuel to the combustion unit; an exhaust section that guides exhaust gas generated by burning hydrogen gas or the mixed gas into the target space; a control unit, the exhaust unit has an internal exhaust path that guides exhaust gas into the target space, an external exhaust path that guides exhaust gas out of the target space, and a flow rate adjusting means that adjusts the flow rate of the path through which the exhaust gas flows, The control unit acquires the temperature and humidity within the target space, and based on the acquired temperature and humidity and the amount of water vapor obtained by combustion of the hydrogen gas or the mixed gas, controls the flow rate adjustment means so that the vapor pressure deficit within the target space becomes a vapor pressure deficit suitable for growing plants, thereby adjusting the flow rate of the exhaust gas.

2. The fuel is the mixed gas, 2. The exhaust gas control system according to claim 1, wherein the control unit controls the flow rate adjustment means and adjusts the flow rate of the exhaust gas using the acquired temperature and humidity, and the amount of water vapor obtained based on the blending degree of hydrogen gas and LP gas in the supplied mixed gas.

3. 2. The exhaust gas control system according to claim 1, wherein the control unit controls the flow rate adjusting means to adjust the flow rate of the exhaust gas based on a vapor pressure deficit obtained from the acquired temperature and humidity and the amount of water vapor.

4. The fuel is the mixed gas, The supply unit has a blending ratio adjusting means for adjusting the blending ratio of hydrogen gas and LP gas, 3. The exhaust gas control system according to claim 2, wherein the control unit controls the blending degree adjusting means and adjusts the amount of the hydrogen gas so as to maintain the humidity in the target space based on the acquired temperature and humidity.

5. 5. The exhaust gas control system according to claim 4, wherein the control unit controls the blending degree adjusting means to adjust the amount of the hydrogen gas based on a vapor pressure deficit obtained from the acquired temperature and humidity and the amount of water vapor.

6. The fuel is a mixed gas, The supply unit has a blending ratio adjusting means for adjusting the blending ratio of hydrogen gas and LP gas, 3. The exhaust gas control system according to claim 2, wherein the control unit controls the blending degree adjusting means to adjust the amount of the hydrogen gas so as to maintain humidity in the target space depending on the time of day.

7. 7. The exhaust gas control system according to claim 6, wherein the control unit controls the blending degree adjusting means so as not to mix hydrogen gas into the fuel depending on the time of day.

8. 7. The exhaust gas control system according to claim 6, wherein the control unit controls the blending degree adjusting means so as not to mix LPG into the fuel depending on the time of day.

9. 9. The exhaust gas control system according to claim 1, wherein the target space is a growing space of a plant growing facility.

10. Burn fuel to adjust the temperature within the target space, As the fuel, hydrogen gas or a mixed gas of hydrogen gas and LP gas is supplied to the combustion section, controlling a flow rate adjusting means so as to guide exhaust gas generated by the combustion of hydrogen gas or the mixed gas into and out of the target space; acquiring a temperature and humidity in the target space, and controlling the flow rate adjusting means to adjust the flow rate of the exhaust gas so that a vapor pressure deficit in the target space becomes a vapor pressure deficit suitable for growing plants, based on the acquired temperature and humidity and the amount of water vapor obtained by combustion of the hydrogen gas or the mixed gas. Emissions control methods.

11. a combustion unit that burns fuel to adjust the temperature in the target space; A supply unit that supplies hydrogen gas or a mixed gas containing hydrogen gas and LP gas as the fuel to the combustion unit; an exhaust section that guides exhaust gas generated by burning hydrogen gas or the mixed gas into the target space; a control unit, the exhaust unit has an internal exhaust path that guides exhaust gas into the target space, an external exhaust path that guides exhaust gas out of the target space, and a flow rate adjusting means that adjusts the flow rate of the path through which the exhaust gas flows, The control unit acquires the temperature and humidity within the target space, and based on the acquired temperature and humidity and the amount of water vapor obtained by combustion of the hydrogen gas or the mixed gas, controls the flow rate adjustment means so that the vapor pressure deficit within the target space becomes a vapor pressure deficit suitable for growing plants, and adjusts the flow rate of the exhaust gas.

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