Module for chemical treatment of substrates

Abstract

The present invention relates to a module for chemical treatment of substrates, a method for chemical treatment of substrates, and the use of the module for chemical treatment of substrates, particularly large substrates. The module for chemical treatment of substrates comprises an immersion chamber, a spray unit, and a movement unit (14). The immersion chamber is configured to accommodate a first liquid and a substrate and to immerse the substrate in the liquid. The spray unit includes a plurality of spray nozzles configured to spray a second liquid into the immersion chamber. The movement unit is configured to cause relative movement between the substrate and the spray unit.

Description

[Technical Field]

[0001] The present invention relates to a module for the chemical treatment of substrates, to a method for the chemical treatment of substrates and to the use of a module for the chemical treatment of substrates, in particular large substrates. [Background technology]

[0002] Multipurpose or so-called "all-in-one" process chambers, primarily for chemical processing of substrates, would enable the application of various process techniques (e.g., liquid spray and immersion-type processing combined with rinsing and drying functions) within the same process chamber. These process chambers would be able to achieve excellent substrate processing results without the need to move the processed substrate from chamber to chamber. However, the realization of such multipurpose chambers presents significant problems that have hindered their implementation to date. Notable examples of the problems / challenges are as follows: (1) The inability to efficiently separate chemicals for each individual processing step results in undesirable chemical mixing in the chemical drain. (2) Inadequate chemical recovery for partial or total reuse of chemicals leads to very high chemical consumption and associated very high chain of custody (CoC) for equipment. (3) Insufficient and ineffective rinsing capabilities (complex mechanical design and implementation within the chamber creates areas that are difficult to rinse effectively from chemical residues and leads to high DI (deionized) water consumption (high CoC)), resulting in chemical cross-contamination through chemical residues within the process chamber. (4) The complexity of the exhaust system can lead to chemical cross-contamination and the formation of residues and salt deposits throughout the equipment (especially when incompatible chemicals are used during subsequent processing steps, such as acids and bases). Salt deposits, especially in the exhaust pipe, have led to potentially unsafe conditions and unwanted contamination of the substrates. Additional problems arise when solvent applications (flammable or non-flammable) are implemented in the process flow. (5) A drying process that is inefficient and potentially contaminating the substrate, as well as being very slow, results in low yields and very long process times, resulting in low substrate throughput per hour (high CoC, cost of ownership). (6) Uneven temperature distribution and cooling effect on the chemicals due to chamber and airflow design and chamber and substrate size.

[0003] Several systems have been proposed to overcome these limitations, but none of the prior art has been successful. Summary of the Invention [Problem to be solved by the invention]

[0004] Therefore, there is a need to provide an improved module for chemical processing of substrates that allows for the application of various process techniques within a single processing unit to achieve superior substrate processing results. [Means for solving the problem]

[0005] This problem is solved by the subject matter of the independent claims, further embodiments are incorporated in the dependent claims. It is to be noted that the aspects of the invention described below also apply to a module for chemical treatment of substrates, to a method for chemical treatment of substrates and to the use of a module for chemical treatment of substrates.

[0006] According to the invention, a module for chemical treatment of a substrate is presented, which comprises an immersion chamber, a spray unit and a movement unit.

[0007] The immersion chamber is configured to accommodate a first liquid and a substrate and immerse the substrate in the liquid. The spray unit includes a plurality of spray nozzles configured to spray a second liquid into the immersion chamber. The first and second liquids may be the same or different. The motion unit is configured to move the substrate and the spray unit relative to each other.

[0008] The result is an "all-in-one" multipurpose module or process chamber for liquid processing that can integrate and combine various process techniques. For example, immersion processing, liquid spray processing (sequential or simultaneous / parallel), and even ultrasonic agitation can be performed in the same chamber. Furthermore, efficient and effective rinsing and drying are achieved without the need to transfer substrates between different processing vessels. The "all-in-one" multipurpose module can accelerate many procedures while reducing costs and improving product quality. Furthermore, many different substrate sizes can be processed without requiring mechanical modifications to the chamber.

[0009] The spray nozzle of the spray unit is preferably positioned so that the second liquid is sprayed in the thickness direction of the substrate, i.e., approximately in front of the substrate in the thickness direction. In particular, the spray nozzle is configured to spray the second liquid in a direction approximately perpendicular or normal to the surface of the substrate to be processed. "Approximately perpendicular" can be understood to mean spraying the liquid not parallel to the substrate, but preferably at an angle between 70° and 110° relative to the surface of the substrate. This reduces or prevents blind spots or flow intersections on the substrate, thereby improving the uniform distribution of the second liquid on the surface of the substrate. Compared to spraying the liquid from the side, i.e., parallel to the substrate, approximately perpendicular spraying significantly increases the impact energy of the chemical spray on the surface of the substrate to be processed. This significantly reduces the boundary layer thickness. That is, the thickness of the high-viscosity layer of the first chemical liquid in contact with the surface can be significantly reduced. This reduction in boundary layer thickness can, for example, facilitate the removal of particles embedded in this viscous boundary layer. When the chemical spray is directed substantially perpendicular to the surface, the thinner boundary layer can result in faster chemical exchange, meaning that the mixing of the second chemical and the first chemical can be much faster.

[0010] Generally, the boundary layer thickness can be adjusted by adjusting the impact energy through the selection of the spray volume and spray energy directed at the surface. In some cases, it may be advantageous to reduce the boundary layer thickness only slightly, for example, when the particles embedded in the boundary layer are large and the boundary layer is formed on a surface with very small, fragile structures. In this way, large particles can be removed with the significantly higher impact energy of the second liquid, while the fragile structures are protected by the still-sufficiently thick viscous boundary layer of the first liquid. In other cases, it may be necessary to remove very small particles embedded in the boundary layer while leaving significantly larger, less sensitive device structures on the substrate surface. In this case, a nearly perpendicular chemical spray with extremely high impact energy may be appropriate for removing such particles. The same applies to the exchange or mixing of a first chemical with a second chemical, for example, when only slow mixing of both chemicals is required, or when a fast chemical quench is required, for example, to very rapidly slow down or stop a chemical reaction between the first chemical and one or more materials on the surface of the substrate.

[0011] The implementation of a combined chemical (liquids, vapors, gases) and physical (agitation and transport between the substrate and the spray unit) system can improve many procedures for chemically processing substrates. For example, it is now possible to combine previously unintegrable process steps in one chamber: (1) photoresist development, (2) etching, and (3) photoresist removal. In particular, photoresist removal can be improved and accelerated without significant material loss from the underlying layers.

[0012] The module is configured for chemical treatment of at least one substrate, which may be held in a substrate holder. The substrate may be treated on one side or both sides. The substrate holder may also hold two substrates, which may then be treated simultaneously by the module according to the invention.

[0013] In one embodiment, the module for chemical treatment of substrates further comprises an ultrasonic or acoustic agitation unit configured to provide ultrasonic waves for agitating the first liquid in the immersion chamber. The term "ultrasonic" may be understood to refer to a frequency range from kHz to lower MHz range. The ultrasonic range may include 10 kHz to 100 MHz, preferably 80 kHz to 10 MHz, more preferably 900 kHz to 3 MHz.

[0014] The ultrasonic or acoustic agitation unit may include one transducer, e.g., a full-area transducer, or multiple smaller transducers. There may be two, three, or four ultrasonic units. These may be distributed over two, three, or four outer surfaces of the immersion chamber. Of course, a greater number is possible. The transducer(s) may be directly connected and attached to the immersion chamber or indirectly, such as by a transducer plate.

[0015] In one embodiment, the ultrasonic unit is disposed on the outer surface of the immersion chamber. In other words, the ultrasonic unit can be mounted outside the immersion chamber so that acoustic propagation can be achieved from the nozzle bar or spray bar of the spray unit through the open space between the nozzle bar or spray bar. Of course, attachment to the inner surface of the immersion chamber is also possible. In another embodiment, the ultrasonic unit and the spray unit are at least partially disposed on a detachable plate element configured to move relative to the immersion chamber. For example, several ultrasonic transducers and several spray nozzles can be disposed on the plate element, which is separate from the immersion chamber wall. The plate element can be movable within the immersion chamber and also movable in and out of the immersion chamber. In either case, the ultrasonic unit can include multiple ultrasonic transducers disposed between adjacent spray bars.

[0016] The motion unit is configured to cause relative motion between the substrate and the spray unit, and can thus move the substrate (possibly including the substrate holder) and / or the spray unit, in particular the spray nozzle and / or the spray bar.

[0017] In one embodiment, the motion unit is configured to move the substrate relative to the immersion chamber and the spray unit in a first direction, which may be understood as the Z direction, which is vertically in and out of the immersion chamber. In one embodiment, the motion unit is additionally or alternatively configured to move the substrate relative to the immersion chamber in another or second direction, which may be understood as the X direction, which is different from the first direction and particularly perpendicular to the first direction. The second or X direction may be understood as being horizontal to the thickness of the substrate, the growth of the coating layer, and the direction from the front side to the back side of the substrate. In one embodiment, the motion unit is further configured to move the substrate relative to the immersion chamber in yet another or third direction, or Y direction, which is perpendicular to the first and second directions. The third or Y direction may be understood as being horizontal to the width direction of the substrate. Moving or shaking the substrate or substrate holder in the Z and / or Y directions can further reduce or eliminate the shadowing effect of ultrasonic radiation from the immersion chamber walls to the substrate, for example through the spray bar of the spray unit, and even out the spray across the substrate surface. The distance from the substrate to the ultrasonic radiation source can be controlled depending on the frequency range applied to the process.

[0018] The spray unit may include a number of spray nozzles configured to spray a liquid for cleaning the substrate, for example. There may be only one or two spray units, although a greater number of spray units is also possible.

[0019] In one embodiment, the spray nozzle is at least partially disposed in a wall of the immersion chamber, in other words, the spray nozzle can be incorporated into the wall of the immersion chamber, which can be ultrasonically agitated.

[0020] In one embodiment, the spray unit is configured to spray the second liquid in a spray direction that is inclined non-perpendicularly relative to the substrate and / or the wall of the immersion chamber. The wall of the immersion chamber may be parallel to the substrate being processed. The spray unit, and in particular the spray nozzle, may be configured to spray the second liquid in a spray direction toward the bottom of the immersion chamber. Preferably, the spray direction is inclined at an angle of 20° to 70° relative to the substrate and / or the wall of the immersion chamber, more preferably at an angle of approximately 45° relative to the substrate or wall. The spray unit or spray nozzle may be configured to spray the second liquid in a spray direction that is inclined in the Z direction (in the direction of entry and exit from the immersion chamber) and / or angled in the Y direction (along the width of the substrate). The inclination in the Z direction further enables residual chemical liquid to be discharged by gravity drainage from the spray nozzle after processing. In other words, the spray nozzle may be inclined downward at an angle of approximately 45° and angled sideways at an angle of approximately 25°. The spray nozzle may be fixedly mounted at an inclination, or it may be movable by a motion unit to change the inclination angle.

[0021] In one embodiment, the spray nozzles are at least partially disposed on a spray bar disposed within the immersion chamber, either as an alternative to or in addition to being integrated into the chamber wall. The term "spray bar" can be understood as a hollow rod with multiple openings that serve as spray nozzles and / or a hollow rod with at least one slit extending at least partially along the length of the rod (slit bar). In one embodiment, a movement unit or another device is configured to move at least some of the spray bars relative to the substrate or the immersion chamber wall. The movement of the spray bars can be configured to allow liquid to be discharged from the spray bars. Accordingly, the movement unit can be configured to rotate and tilt at least some of the spray bars to a non-horizontal position. 360° rotation is also possible. The liquid can then be discharged, for example, into a recirculation tank, particularly before a cleaning rinse, for example with water. This can help avoid insufficient chemical recovery for partial or total reuse of the chemicals, which would lead to a very high chemical consumption and therefore a very high cost of materials (CoC) for the equipment.

[0022] As described above, the motion unit or another device can move the spray bar or spray nozzle relative to the substrate or the wall of the immersion chamber in a rotational motion about the longitudinal axis of the spray bar. Additionally or alternatively, the motion unit or another device can move the spray bar or spray nozzle relative to the substrate or the wall of the immersion chamber in a fan-out motion perpendicular to the longitudinal axis of the spray bar. This can be understood as a side-to-side motion when viewed along the Y direction (the width of the substrate and immersion chamber) and / or an up-and-down motion when viewed along the Z direction (the direction of entry and exit from the immersion chamber). The fan-out motion range can be 10° to 40°, preferably 20° to 30°. The rotational and fan-out motions can be performed simultaneously or alternately, i.e., in combination or sequentially. Such a motion allows residual chemicals to be drained from the spray nozzle in the lowered position after processing, i.e., the spray bar can be emptied before a rinsing process, reducing chemical dilution and waste. An advantage of the fan-out motion is that movement or shaking of the substrate holder and substrate along the Y direction can be reduced or avoided entirely, making the handling system easier to design and manufacture.

[0023] Tilting or movement of the spray nozzle or spray bar to an inclined position allows for efficient drainage of chemicals from the spray bar prior to, for example, a water cleaning rinse. There are several options for achieving the tilt, such as tilting the spray nozzle relative to the spray bar, or tilting the spray nozzle relative to the chamber wall, or tilting the spray bar relative to the chamber wall, etc. Combinations are also possible.

[0024] In one embodiment, in adjacent first, second, and third spray nozzle rows, the first and third spray nozzles are inclined in a similar direction relative to each other, while the second spray nozzle is positioned and inclined differently from the first and third spray nozzles. In this situation, the spray nozzle rows may extend along the Z direction and / or the Y direction. In other words, the spray nozzles with different inclinations or orientations may be positioned above or below each other or left or right of each other.

[0025] When the spray nozzle arrangement includes multiple rows of spray nozzles (located on the submersion chamber wall or spray bar), the spray nozzles may be aligned horizontally and vertically. Alternatively, the spray nozzles may be aligned vertically on every other spray row or spray bar. There may be a displacement between the spray nozzles of adjacent spray rows, for example, half the distance between adjacent spray nozzles of the same spray row.

[0026] The spray units, or spray nozzles, or spray bars, may be positioned within the immersion chamber and may extend along the substrate to be treated. There may also be an additional cleaning unit, bar, or nozzle extending above the other "standard" spray nozzle or spray bar and the substrate not to be treated. This additional cleaning unit, bar, or nozzle may be configured to clean the lower "standard" spray nozzle or spray bar and the substrate. Thus, the additional cleaning unit, bar, or nozzle may have a row of nozzles facing the opening of the immersion chamber and / or a row of nozzles facing the other lower spray nozzle or spray bar, and / or may be capable of a fanning motion as described above.

[0027] The module for chemical treatment of substrates may further comprise a fast-fill inlet or valve configured for fast filling of the immersion chamber. The term "fast" may be understood in this context as, for example, less than 10 seconds for 20 liters of liquid. The module for chemical treatment of substrates may alternatively or additionally be filled by a spray unit and in particular a spray bar.

[0028] In one embodiment, the module for chemical treatment of substrates further comprises a valve unit having a plurality of valves. Each valve is connected to a separate tank or drain. The valves can be configured for drainage or exhaust (switching). The valve unit is configured for rapid drainage to enhance process uniformity. Rapid in this context can be understood as, for example, less than 10 seconds, 5 seconds, or 3 seconds for 40-60 liters of liquid. The valve unit helps to avoid undesirable chemical mixing in the chemical drain, which can occur due to an inability to efficiently separate the chemicals for each individual processing step. The valve unit can be a valve block for drainage control, in particular a so-called quick dump rinsing (QDR) valve block.

[0029] The valve unit or valve may be located at the bottom or lower end of the immersion chamber. The chamber bottom may be sloped towards the valve. The lowest point of the liquid in the module may be within the valve. As a result, gravity drainage is used, which may be further augmented with optional suction to increase the drainage rate. There may be one, two or three valves. More valves are also possible. In general, there may be at least n+1 valves, where n is the number of different liquids used. There may also be at least n+2 or n+3 valves. The additional valve(s) may be, for example, exhaust valve(s) per side wall of the immersion chamber.

[0030] In one embodiment, the module for chemically processing substrates further includes an exhaust unit. The exhaust unit can provide effective and efficient exhaust flow, for example, during substrate drying, by providing a predetermined pressure gradient from the outside of the processing chamber to the waste system at the fabrication level to prevent chemical fumes from contaminating the outside of the processing chamber and, in the worst case, the fabrication level. The fabrication level is defined as an environment in which one, several, or many tools are operating simultaneously. As a result of a well-functioning exhaust unit at the equipment level, chemical cross-contamination, chemical residue, and salt formation within the equipment, particularly in the exhaust piping leading from the equipment level to the fabrication level exhaust system, which can potentially lead to unsafe conditions and contamination of substrates, are avoided. The exhaust unit can include one, two, or at least two or more exhaust devices. In one example, upper and lower exhaust devices are provided and can be used depending on the operating mode. In the immersion mode, an upper exhaust device located directly above or above the liquid surface is used. The upper exhaust device can be a "total" exhaust device located in the upper region of the immersion chamber, preferably directly below the idle exhaust device. In spray mode, a bottom exhaust located at the bottom of the immersion chamber may preferably be used.

[0031] Each exhaust device, particularly the bottom exhaust device, can include one or more exhaust valves. At least one exhaust valve can be opened or closed, or in other words, switchable between an open and a closed state. Different and incompatible chemical solutions can be used with the all-in-one chamber, so that the exhaust valve(s) can be switched between, for example, acidic, basic, and neutral media. At least one or all of the valves can be two-way or three-way valves, or a combination thereof. The valves can be rinseable, closable, and / or breathable.

[0032] The exhaust unit may also include at least an exhaust line that can be rinsed, cleaned, or filled with a liquid or gas. In one example, the exhaust line up to the switchover point between the equipment level and the fabrication floor level can be cleaned, for example, with water. This can be done by filling the exhaust line with water or other liquid from the process chamber, spraying water or other liquid into the exhaust line, etc. In the case of two or more exhaust lines, the exhaust valves can be switched to different exhaust lines. In other words, the exhaust valves can be switched between a first exhaust line and a second exhaust line.

[0033] A drain line can be provided and connected to one or more exhaust lines (preferably at their lowest point and / or lowest common point) to remove cleaning water or other cleaning liquids from the exhaust lines. The drain line can be switchable by a valve configured to turn the drain on and off. Because the exhaust can be turned on and off, for example, between acidic and basic, the load on the fabrication-level exhaust line can vary greatly, which can be problematic for the overall management of the fabrication-level exhaust system including other systems and tools. To alleviate this situation, the equipment-level exhaust unit can further include a bypass that can be opened when the chamber is not using exhaust and / or can be adjusted by the equipment-level exhaust regulation system depending on the exhaust load.

[0034] The module for chemical treatment of substrates may further comprise a liquid separator arranged in a lower part of the module and the exhaust unit, which can help to avoid clogging of the system and in particular the exhaust unit, preferably even without the need for a rinsing unit.

[0035] In one embodiment, the module for chemical treatment of substrates further includes a drain, rinse, and dry unit. The drain, rinse, and dry unit may be understood as a unit configured for draining and / or rinsing and / or drying. In other words, all functions need not be provided. The drain, rinse, and dry unit may be configured for rinsing between applications of different chemical solutions, for example, by spray rinsing, overflow rinsing with or without ultrasonic agitation, a combination of spray and overflow rinsing, waterfall rinsing, waterfall chemical treatment, waterfall quench, etc. The rinse and dry unit may include four valves located on two opposite sides of the immersion chamber. For example, the drain, rinse, and dry unit may additionally or alternatively provide for waterfall chemical treatment of substrates, i.e., allowing water or chemical solutions to flow from top to bottom of the substrate under the action of gravity. The drain, rinse, and dry unit may be used to quench or stop a chemical reaction.

[0036] The drain, rinse, and dry unit may also be configured to rinse and clean the immersion chamber. At least a portion of the drain, rinse, and dry unit may be located at the top or upper portion of the immersion chamber and / or the chamber cover unit to enable cleaning of the immersion chamber and / or the chamber cover unit. In other words, rinsing of the cover is possible, i.e., an uppermost or additional spray or nozzle bar may be implemented for rinsing the movable cover element. This may be achieved by a spray direction directed to both sides with a liquid surface overflow below the top two spray or nozzle bars. In other words, the top spray or nozzle bar for rinsing the cover unit may be configured for two different spray directions. A second spray or nozzle bar one below the top may spray toward the substrate. The top two spray or nozzle bars may alternatively have the ability to fan out as described above. There may also be a guide plate configured to guide and / or improve the flow of the liquid or gas provided by the drain, rinse, and dry unit. Drain-rinse-dry units can help avoid chemical cross-contamination through chemical residues within the process chamber. This is achieved through their efficient and effective rinsing capabilities, which can address complex mechanical designs within the chamber that traditionally make it difficult to rinse from chemical residues, leading to high DI (deionized) water consumption and high CoC.

[0037] The drain, rinse, and dry unit may further be configured to blow liquid and / or gas into and / or suck liquid and / or gas out of the submerged chamber and / or spray unit. The drain, rinse, and dry unit may, for example, enable back-suction of liquid from, for example, the spray bar and / or spray nozzle. The drain, rinse, and dry unit may additionally or alternatively enable blowing of chemical liquid from the spray bar or any kind of nozzle tube. The drain, rinse, and dry unit may also enable back-suction and blowing simultaneously. As a result, efficient chemical recovery for partial or total reuse of the chemical is possible, i.e., reduced chemical consumption and reduced CoC.

[0038] The drain-rinse-dry unit can further be configured for efficient and effective drying of the substrate and / or substrate holder. This can be achieved, for example, by a laminar airflow from top to bottom while the substrate and / or substrate holder (repeatably) passes through the drying zone at the top of the immersion chamber. The laminar airflow can be understood to be provided by an air knife. The air knife can be fixed or non-fixed / moving for different substrate and substrate holder geometries. The air knife can be a gas knife for a gas other than air. There can be additional exhaust opening(s) behind the air knife for optimized exhaust during drying. Furthermore, there can be, for example, two additional valves on the bottom side of the immersion chamber for exhaust during the drying-only step. These additional valves can be closed during other process steps. As a result, insufficient drying processes and / or drying processes that may contaminate the substrate and / or are slow are avoided, resulting in shorter process times and higher substrate throughput per hour.

[0039] In one embodiment, the drain, rinse, and dry unit includes a temperature control element configured to heat or cool the liquid and / or gas blown or pumped through the immersion chamber and / or spray unit. The temperature control element can be configured, for example, to heat a pre-rinse liquid to bring the entire module to the temperature before the actual chemical is dispensed. The temperature control element can also be configured, for example, to heat a post-rinse liquid to avoid cooling the entire module between different process steps. The temperature control element can also be a chamber heating device that heats or cools at least one of the chamber walls. As a result, the temperature control element helps to avoid uneven temperature distribution along the substrate surface, the immersion chamber, and / or within the spray unit. In particular, the temperature control element helps to avoid cooling effects on, by, or through the chemicals due to chamber and airflow design, chamber and substrate size.

[0040] In one embodiment, the module for chemical treatment of substrates further comprises a chamber cover unit including a plurality of cover elements, preferably movable cover elements, e.g., four cover elements. The cover elements are configured to close the opening of the immersion chamber in a closed position. The cover elements are further configured to closely surround the substrate in a transfer position during transfer through the opening. The cover elements are further configured to open the opening to an open position, i.e., the cover elements can move or flip laterally to open the opening.

[0041] In one embodiment, the chamber cover unit is further configured to fully open the opening to a fully open position. Unlike the standard "open" position described above, the chamber cover unit is provided with an additional degree of freedom for the "fully open" position to fully open the immersion chamber, for example, to avoid turbulent airflow areas at the upper corners of the immersion chamber. The additional degree of freedom means that in addition to the cover movement in the Y direction coupled with the motion unit and its substrate handling / shaking in the Y direction, additional cover movement in the X and / or Y directions independent of the motion unit and its substrate handling / shaking is possible to fully open the top of the immersion chamber. This fully open position is particularly suitable for drying, substrate loading and unloading, maintenance, module maintenance and repair, etc.

[0042] The movable cover elements may press against the immersion chamber, against each other, and / or against the substrate contained in the immersion chamber. The pressing force may be exerted by at least a spring, a pneumatic cylinder, a hydraulic cylinder, or the like. When the movable cover elements press against the substrate, a gap may be created between the movable cover elements and the rim of the immersion chamber. Rather than being mechanically closed, the gap may be controlled by a flow of sealing air or another sealing gas to prevent the flow of contaminant gas from the inside to the outside of the immersion chamber. Thus, the sealing air / gas flow may be directed from the outside to the inside of the immersion chamber. The sealing air / gas flow may be in the range of 3 m / s to 10 m / s, preferably about 5 m / s. Another option for controlling the gap between the movable cover elements and the rim of the immersion chamber is to correspondingly use an exhaust unit to supply a sealing air / gas flow from the outside to the inside of the immersion chamber to prevent the flow of contaminant gas from the inside to the outside.

[0043] The cover element may be sealed to the immersion chamber or to the rim or contact surface of the immersion chamber. The sealing may be achieved by a sealing element, for example at least as a resilient lip, a labyrinth seal, etc. The seal may be liquid-tight and / or gas-tight. A chamber cover unit with any seal may reduce or eliminate chemical contamination of the environment, in particular splashing of chemicals outside the immersion chamber.

[0044] In one embodiment, the chamber cover unit further includes a processing element configured to control movement of the chamber cover element in response to movement data received from a movement unit that controls the relative movement between the substrate and the spray unit. In other words, the cover unit or element(s) can move integrally with or together with the substrate movement system, e.g., in the X and / or Y directions. This relative movement can be based on movement data transmitted by a mechanical coupling or at least by a motor control, e.g., an electric motor that moves the chamber cover element.

[0045] In one embodiment, the module for chemical treatment of substrates further comprises a lifting unit configured to lift at least a portion, a side, or a corner of the submersion chamber to drain the liquid from the spray unit. For example, one side of the submersion chamber can be lifted several degrees in the Y direction, so that the liquid or chemical solution flows by gravity out of the "initially" horizontal tubes or bars, which are then tilted to a non-horizontal orientation. As a result, lifting or tilting the submersion chamber allows for draining the submersion chamber, spray bar, etc., saving the chemical solution. Therefore, chemical recovery for partial or total reuse of the chemistry becomes even more efficient, which means less chemical consumption and a reduced CoC.

[0046] In one embodiment, the module for chemical treatment of substrates further comprises a shielding unit configured to shield the array of spray nozzles, which can also direct the fluid or gas flow, e.g., to protect specific areas, rinse hard-to-reach areas, drain in a directed direction, etc.

[0047] The present invention also provides a method for chemically treating a substrate, the method comprising, but not necessarily in this order: inserting a first liquid and a substrate into an immersion chamber such that the substrate is immersed in the liquid; removing the first liquid from the immersion chamber; spraying a second liquid into the submersion chamber with a spray unit including a spray nozzle; Relatively moving the substrate and / or the spray unit by the motion unit; Includes.

[0048] In one embodiment, the method for chemically processing a substrate further comprises providing ultrasound to agitate the first liquid.

[0049] In one embodiment, the step of spraying the second liquid occurs while the substrate is at least partially immersed in the first liquid, i.e., immersion and spraying may occur simultaneously, or spraying may occur before the first liquid is removed from the immersion chamber.

[0050] In one embodiment, the method for chemically processing a substrate further includes removing the substrate from the immersion chamber while rinsing or cleaning the immersion chamber for subsequent processing of the same substrate. Furthermore, rinsing and / or drying steps for the substrate are also possible while the substrate is in the empty immersion chamber and outside the immersion chamber or passing through the opening of the immersion chamber. Furthermore, the substrate may continue to be sparged during removal from the immersion chamber. Sparging can be performed with any liquid, particularly with a change of liquid, e.g., first with a chemical solution and then with water. Furthermore, it is possible to quench (stop) a chemical reaction on the substrate surface (e.g., when changing liquids), cool or heat the substrate.

[0051] The present invention also provides the use of the module for chemical treatment of substrates, which can be used in particular for large substrates having dimensions in the range of 300 mm x 300 mm or more, preferably with a diagonal or diameter of 350 mm or more, more preferably 500 mm or more, even more preferably 800 mm or more, and even more preferably 1000 mm or more.

[0052] It is to be understood that the modules, uses and methods set out in the independent claims have similar and / or identical preferred embodiments, in particular as set out in the dependent claims, and that a preferred embodiment of the invention can also be any combination of the dependent claims with the respective independent claim.

[0053] These and other aspects of the invention will be apparent from and elucidated with reference to the embodiments described hereinafter.

[0054] Exemplary embodiments of the present invention are described below with reference to the accompanying drawings. [Brief explanation of the drawings]

[0055] [Figure 1a] 1 shows a schematic and exemplary embodiment of a module for chemical treatment of a substrate according to the invention; [Figure 1b] 1 shows a schematic and exemplary embodiment of a module for chemical treatment of a substrate according to the invention; [Figure 2a] 1 shows a schematic and exemplary cross-section of a module for chemical treatment of substrates according to the invention; [Figure 2b] 1 shows a schematic and exemplary side view of a module for chemical treatment of substrates according to the invention; [Figure 2c] 1 shows a schematic and exemplary cross-section of a module for chemical treatment of substrates according to the invention; [Figure 3] 2b shows a schematic and exemplary detail of FIG. 2a focusing on the spray unit; [Figure 4] 1 shows a detailed view focusing on a valve unit, in a schematic and exemplary manner. [Figure 5] 10 shows a detailed view focusing on a chamber cover unit, in a schematic and exemplary manner. DETAILED DESCRIPTION OF THE INVENTION

[0056] Figures 1a and 1b show schematically and exemplarily an embodiment of a module 10 for chemical treatment of a substrate 20 according to the invention. Figures 2a, 2b and 2c show schematically and exemplarily various embodiments of the invention in cross-section, side and another cross-section of a module 10 for chemical treatment of a substrate 20. The module 10 for chemical treatment of a substrate 20 comprises an immersion chamber 11, a spray unit 13 and a movement unit 14.

[0057] The substrate 20 is held by a substrate holder 21 or chuck and inserted into the immersion chamber 11. The immersion chamber 11 can contain a chemical liquid as a first liquid, so that the substrate 20 is immersed in the liquid. The substrate 20 can be treated on one side or both sides, i.e., one surface of the substrate or two surfaces of the substrate opposite each other can be treated.

[0058] The spray unit 13 includes multiple spray nozzles 15, which spray a second liquid 22 into the immersion chamber 11 and onto the substrate 20. The second liquid 22 hits both sides of the substrate 20 approximately perpendicularly, thereby treating / processing two opposite surfaces of the substrate. The first and second liquids 22 may be the same or different. The spray nozzles 15 are arranged on spray bars 16 along the two long side walls of the immersion chamber 11. The spray nozzles 15 are arranged opposite each other, with the substrate 20 positioned therebetween, so that the spray nozzles spray the second liquid approximately perpendicularly onto the two opposite surfaces of the substrate 20. "Approximately perpendicular" can be understood to mean spraying the liquid not parallel to the substrate, but preferably at an angle ranging from 70° to 110° relative to each surface of the substrate 20. The spray nozzles 15 can also be arranged on the walls of the immersion chamber 11. Figure 3 shows a detailed view of the spray unit 13, schematically and exemplarily. The spray nozzle 15 may be tilted relative to the substrate 20 or immersion chamber 11 to direct the spray or allow drainage. There are several options for achieving the tilt, such as tilting the spray nozzle 15 relative to the spray bar 16, or tilting the spray nozzle 15 relative to the chamber wall, or tilting the spray bar 16 relative to the chamber wall, etc. Combinations are also possible. The tilting movement preferably corresponds to a rotational movement about the Y and / or Z axis (see FIG. 1 ).

[0059] 1a, 1b, and 2a, 2b, and 2c, the motion unit 14 can move the substrate 20 and the spray unit 13 relative to each other. Thus, the motion unit 14 can move the substrate 20 including the substrate holder 21 and / or move the spray unit 13. To move the substrate 20 including the substrate holder 21, the motion unit 14 is illustrated as a gate or framework that allows the substrate 20 to move up and down in the Z direction.

[0060] Moving the spray unit 13 may be understood as moving the spray nozzle 15 and / or spray bar 16 of the spray unit 13 relative to the substrate 20 or the wall of the immersion chamber 11. The spray nozzle 15 and / or spray bar 16 may be moved to direct a spray of liquid at a particular angle onto the substrate 20 or into the immersion chamber 11. The purpose may be chemical treatment of the substrate 20 or cleaning of the substrate 20, the immersion chamber 11, and / or other components of the module 10. The purpose may also be to allow gravity drainage of liquid from the spray nozzle 15 and / or spray bar 16. Thus, the spray bars 16 may be rotated about their respective longitudinal axes. The spray bars 16 may also perform a fanning movement perpendicular to the longitudinal axis of the spray bar 16. This may be understood as a side-to-side movement when viewed along the Y direction and the width of the substrate 20 and the immersion chamber 11.

[0061] Moving the substrate 20 includes: a first Z direction vertically into and out of the immersion chamber 11; in a second X direction parallel to the thickness of the substrate from the front side to the back side of the substrate 20; and / or In the Y direction parallel to the width direction of the substrate 20, This may be understood as moving the substrate 20 including the substrate holder 21 relative to the immersion chamber 11 and the spray unit 13 .

[0062] The module 10 for chemical treatment of substrates 20 further comprises an ultrasonic unit 12 that supplies ultrasonic waves to agitate the first liquid in the immersion chamber 11. The ultrasonic unit 12 may include one full-area transducer or multiple smaller transducers. Here, as shown, two full-area transducers are provided as the ultrasonic unit 12. The transducer(s) may be connected to the immersion chamber 11 directly or indirectly via a transducer plate. The transducer(s) may be arranged on the outer surface of the immersion chamber 11 or between adjacent spray bars 16 of the spray unit 13. Here, as shown, the two transducers of the ultrasonic unit 12 are arranged on the outer (outer) surface of the immersion chamber 11.

[0063] The result is an "all-in-one" multi-purpose liquid processing module 10 or process chamber that can incorporate a variety of process techniques. For example, immersion processing, liquid spray processing (sequential or simultaneous / parallel), and ultrasonic agitation can be performed in the same chamber. Furthermore, efficient and effective rinsing and drying are achieved without the need to transfer the substrate 20 between different processing vessels. The "all-in-one" multi-purpose module 10 can accelerate many procedures while reducing costs and improving product quality. Furthermore, many different substrate sizes can be processed without requiring mechanical modifications to the chamber.

[0064] As shown in Figures 1b, 2b and 2c, the module 10 for chemical treatment of substrates 20 further comprises an exhaust unit 25 for exhaust flow, for example during substrate drying. The exhaust unit 25 here comprises a bottom exhaust pipe arranged at the bottom of the immersion chamber 11. The exhaust unit 25 comprises an exhaust valve and a plurality of exhaust lines 26. The exhaust lines 26 can be rinsed, cleaned or filled with a liquid or gas. The exhaust valve here is switchable between the different exhaust lines 26.

[0065] The module 10 for chemical treatment of substrates 20 further comprises a drain, rinse and dry unit configured to control draining, rinsing and / or drying, for example, between chemicals or after completion of a process step. The drain, rinse and dry unit may further be configured to inject liquid and / or gas into and / or suction liquid and / or gas from the immersion chamber 11 and / or spray unit 13. For example, the drain, rinse and dry unit may enable back-suction of liquid from the spray bar 16 and / or spray nozzle 15 and / or blowing of chemicals from the spray bar 16, either sequentially or simultaneously.

[0066] As shown in Figures 1b, 2b and 2c, the drain-rinse-dry unit now further comprises an air knife 32, e.g., for drying the substrate 20 and / or substrate holder 21. The air knife 32 is shown in Figure 2c and provides a laminar air flow from top to bottom while the substrate 20 and / or substrate holder 21 pass (repeatably) through the drying zone at the top of the immersion chamber 11.

[0067] The drain, rinse, and dry unit further includes waterfall elements 33 and 34. The waterfall elements 33 and 34 may be understood as spray or nozzle bars or slit bars that supply liquid in the form of a waterfall. The upper waterfall element 33 is disposed on the upper part of the chamber cover unit 17 to enable cleaning of the movable cover element 18 of the chamber cover unit 17 and / or the immersion chamber 11. The lower waterfall elements 34 are disposed, for example, on two opposite sides within the immersion chamber 11 to enable waterfall rinsing, waterfall chemical treatment, waterfall quenching, etc. The lower waterfall elements 34 cause water or chemical liquid to flow from above to below the substrate under the action of gravity. These elements may also be used to rinse and clean the immersion chamber 11. The drain, rinse, and dry unit further includes an overflow portion 35 as a liquid surface overflow portion, for example, below the upper two waterhole spray or nozzle bars 33 and 34.

[0068] The module 10 for chemical processing of substrates 20 further comprises a valve unit 30. Figure 4 shows a detailed view of the valve unit 30 in a schematic and exemplary manner. The valve unit 30 is here a quick damp rinsing (QDR) valve block for drainage and evacuation. The valve unit 30 has a plurality of valves 31. Each valve 31 is connected to a separate tank or drain. The valves 31 are located at the bottom or lower end of the immersion chamber 11. The lowest point of the liquid in the module 10 is within the valve 31. As a result, gravity drainage can be used.

[0069] 5 shows a schematic and exemplary detailed view of the chamber cover unit 17. The module 10 for chemical treatment of substrates 20 further comprises a chamber cover unit 17 including four movable cover elements 18. The movable cover elements 18 are capable of closing an opening at the top of the immersion chamber 11 in a closed position. The movable cover elements 18 are further capable of tightly surrounding the substrate 20 in a transfer position during transfer through the opening. The movable cover elements 18 are further capable of opening the opening in an open position. The movable cover elements 18 are pressed against the substrate 20 or the substrate holder 21 by, for example, a pneumatic cylinder 19.

[0070] In the closed position, the movable cover element 18 may be sealed against the immersion chamber 11 or against a rim or contact surface of the immersion chamber 11. The seal between the movable cover element 18 and the immersion chamber 11 is essentially liquid-tight and / or gas-tight to avoid, for example, leakage of toxic gases. The seal may be provided by a sealing element, for example as at least an elastic lip, a labyrinth seal, etc. The seal may be Stretchable seals, particularly easy to implement Enclosure of the upper area or tank, which can be easily and completely sealed, Collar fittings with reservoirs that can easily accommodate any kind of movement of the module 10; Adjustable cover, a cover that essentially covers the entire upper part of the substrate holder 21 and that is movable horizontally and vertically, e.g. by means of rails and a step motor and a movable nozzle; Spring-loaded vertical blinds, for example coupled to the substrate holder 21, which can be easily and completely sealed, Complete encapsulation of the motion unit 14 and the loading position of the substrate holder 21, which can be easily and completely sealed and can easily accommodate any kind of movement of the module 10; -Air curtains that allow for greater mobility; A simple cover for a fixed substrate holder 21 with multiple spray nozzles 15 that can be moved, tilted and / or rotated to any position and controlled separately; another simple cover for a fixed substrate holder 21 having a plurality of spray nozzles 15 arranged on a manifold or plate within the immersion chamber 11 and which can be displaced horizontally and vertically, for example by means of a poker; ·others It can also be done by

[0071] In the transfer position, the movable cover element presses against the substrate, leaving a gap between the movable cover element and the rim of the immersion chamber. The gap is controlled by a flow of seal gas from the outside to the inside of the immersion chamber to prevent the flow of contaminant gas from the inside to the outside of the immersion chamber. The gap is not mechanically closed.

[0072] It should be noted that embodiments of the present invention are described with reference to different subject matters. In particular, some embodiments are described with reference to method claims, while other embodiments are described with reference to apparatus claims. However, from the above and following description, those skilled in the art will understand that, unless otherwise specified, any combination of features belonging to one type of subject matter, as well as any combination between features relating to different subject matters, is considered to be disclosed in this application. However, all features can be combined to provide a synergistic effect that exceeds the mere sum of the features.

[0073] While the invention has been shown and described in detail in the drawings and foregoing description, such illustration and description are intended to be illustrative or exemplary and not restrictive. The invention is not limited to the disclosed embodiments. Those skilled in the art who practice the claimed invention can understand and effect other variations to the disclosed embodiments, from a study of the drawings, the disclosure, and the dependent claims.

[0074] In the claims, the word "comprising" does not exclude other elements or steps, and the indefinite article "a" or "an" does not exclude a plurality. A single processor or other unit may fulfill the functions of several items recited in the claims. The mere fact that certain measures are recited in mutually different dependent claims does not indicate that a combination of these measures cannot be used to advantage. Any reference signs in the claims should not be construed as limiting the scope.

Claims

1. A module (10) for chemical treatment of a substrate (20), comprising: an immersion chamber (11); a spray unit (13); A motor unit (14); a valve unit (30); Drainage, rinsing and drying unit, an exhaust unit (25); the immersion chamber (11) is configured to contain a first liquid and the substrate (20) and to immerse the substrate (20) in the first liquid; the spray unit (13) comprises a plurality of spray nozzles (15) configured to spray a second liquid (22) into the immersion chamber (11); and The motion unit (14) is configured to move the substrate (20) and the spray unit (13) relative to each other; the spray unit (13) extends along the substrate (20) and is configured to spray the second liquid (22) onto the substrate (20) substantially in a thickness direction (X) of the substrate (20); The spray unit (13) comprises a plurality of rows of spray nozzles (15) arranged in the immersion chamber (11) along a height direction (Z) of the immersion chamber (11), the spray nozzles (15) being arranged at least partially on the walls of the immersion chamber (11); The valve unit (30) has a plurality of valves (31), each valve (31) connected to a separate tank or drain, the valves (31) being configured for drainage and exhaust; the spray unit (13) is configured to spray the second liquid (22) in a spray direction inclined non-perpendicularly to the wall of the immersion chamber (11) and towards the bottom of the immersion chamber (11); the draining, rinsing and drying unit is configured to rinse and clean the immersion chamber (11), and at least a part of the draining, rinsing and drying unit is arranged at a top or upper part of the immersion chamber (11) and / or at a top or upper part of a chamber cover unit (17); the exhaust unit (25) comprises an upper exhaust device arranged above the first liquid and a lower exhaust device arranged at the bottom of the immersion chamber (11), each exhaust device comprising one or more exhaust valves, at least one of which can be opened and closed or switched between an open state and a closed state; the draining, rinsing and drying unit is configured for drying the substrate (20) or the substrate holder, and the drying process is carried out by a top-to-bottom laminar airflow provided by an air knife while the substrate (20) or the substrate holder passes through a drying zone at the top of the immersion chamber (11); the drain, rinse and dry unit includes a temperature control element configured to heat or cool liquids and / or gases blown or sucked through the immersion chamber (11) and / or the spray unit (13); Module for chemical treatment of substrates.

2. 2. The module (10) of claim 1, further comprising an ultrasonic unit (12) configured to provide ultrasonic waves to agitate the first liquid in the immersion chamber (11).

3. 3. The module (10) according to claim 2, wherein the ultrasonic unit (12) is arranged on the outer surface of the immersion chamber (11).

4. 3. The module (10) of claim 2, wherein the ultrasonic unit (12) and the spray unit (13) are at least partially arranged on a detachable plate element configured to move relative to the immersion chamber (11).

5. 5. The module (10) according to claim 1, wherein the exhaust unit (25) provides a predetermined pressure gradient from the outside of the immersion chamber (11) towards the exhaust unit (25).

6. A module (10) according to any one of claims 1 to 5, wherein the movement unit (14) is configured to move the substrate (20) relative to the immersion chamber (11) in a first direction (Z) into and out of the immersion chamber (11).

7. 7. The module (10) of claim 6, wherein the motion unit (14) is configured to move the substrate (20) relative to the immersion chamber (11) in another direction (X, Y) perpendicular to the first direction (Z).

8. A module (10) according to any one of the preceding claims, wherein the spray nozzles (15) are at least partially arranged on a spray bar (16).

9. The module (10) of claims 2-4 and 8, wherein the ultrasonic unit (12) includes a plurality of ultrasonic transducers positioned between adjacent spray bars (16).

10. 10. The module (10) of claim 1, wherein in adjacent rows of first, second, and third spray nozzles (15), the first and third spray nozzles (15) are inclined in the same manner, and the second spray nozzles are positioned differently from the first and third spray nozzles (15).

11. 11. The module (10) according to any one of claims 1 to 10, further comprising a chamber cover unit (17) including a plurality of cover elements (18) configured to close the opening of the immersion chamber (11) in a closed position and to closely surround a substrate (20) being transferred through the opening in a transfer position.

12. 12. The module (10) of claim 11, wherein the gap between the cover element and the rim of the submerged chamber is controlled by a seal gas flow.

13. 13. The module (10) of claim 11 or 12, wherein the chamber cover unit (17) is further configured to essentially fully open the opening in an open position.

14. 14. The module (10) according to any one of claims 11 to 13, wherein the chamber cover unit (17) further comprises a processing element configured to control the movement of the cover element (18) in response to movement data received from the movement unit (14) controlling the relative movement between the substrate (20) and the spray unit (13).

15. A module (10) according to any one of claims 1 to 14, The draining, rinsing and drying unit is configured to inject liquid and / or gas into the immersion chamber (11) and / or the spray unit (13) and / or to suck liquid and / or gas out of the immersion chamber (11) and / or the spray unit (13), the module.

16. 16. The module (10) of claim 15, wherein the drain, rinse and dry unit is configured for waterfall rinse, waterfall chemical treatment, and / or waterfall quench.

17. The module (10) according to any one of claims 1 to 16, further comprising a lifting unit configured to lift at least a portion of the immersion chamber (11) to drain the spray unit (13).

18. Use of a module (10) according to any one of claims 1 to 17 in a substrate for chemical processing having a diagonal or diameter of 300 mm or more.

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