Phase shift mask and method of manufacturing the same

Abstract

To provide a phase shift mask having less haze defect, that is, can sufficiently suppress generation of haze, and a method for manufacturing the phase shift mask.SOLUTION: A phase shift mask 100 according to the embodiment comprises: a substrate 11; a phase shift film 12 which is formed on the substrate 11, and equipped with a circuit pattern; and a protection film 13 formed on a top face 12t and a side face 12s of the phase shift film 12, where the phase shift film 12 is capable of adjusting a predetermined quantity of phase and transmittance to transmitting exposure light, the protection film 13 contains at least one kind selected from tantalum metal, tantalum compound, tungsten metal, tungsten compound, tellurium metal, and tellurium compound, and when the film thickness of the phase shift film 12 is d1, and the film thickness of the protection film 13 is d2, d2 is thinner than d1, and d2 is 15nm or less.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a phase shift mask used in the manufacture of semiconductor devices and the like, and a method for manufacturing a phase shift mask. [Background technology]

[0002] In recent years, in semiconductor processing, the increasing integration of large-scale integrated circuits has necessitated the miniaturization of circuit patterns, and there has been an increasing demand for miniaturization technology for the wiring patterns and contact hole patterns that make up the circuits. As a result, the exposure light source used in the manufacture of semiconductor devices, etc. has been shortening in wavelength from KrF excimer lasers (wavelength 248 nm) to ArF excimer lasers (wavelength 193 nm).

[0003] Another example of a mask with improved wafer transfer characteristics is a phase shift mask. With a phase shift mask, both the phase difference and transmittance can be adjusted, such that the phase difference (hereinafter simply referred to as "phase difference") between the ArF excimer laser light that passes through the transparent substrate and the ArF excimer laser light that passes through both the transparent substrate and the phase shift film is 180 degrees, and the ratio (hereinafter simply referred to as "transmittance") of the amount of ArF excimer laser light that passes through both the transparent substrate and the phase shift film to the amount of ArF excimer laser light that passes through the transparent substrate is 6%.

[0004] For example, when manufacturing a phase shift mask with a phase difference of 180 degrees, a known method is to set the thickness of the phase shift film so that the phase difference is around 177 degrees, then dry-etch the phase shift film with a fluorine-based gas while simultaneously processing the transparent substrate by about 3 nm, thereby finally adjusting the phase difference to around 180 degrees.

[0005] In phase shift masks that use exposure light with wavelengths of 200 nm or less, exposure can cause foreign matter called "haze" to gradually form, grow, and become apparent on the mask, rendering the mask unusable. In particular, when the phase shift film is made up of silicon, transition metals, and light elements such as oxygen and nitrogen, foreign matter can appear on the surface of the phase shift film. Techniques for suppressing haze include those described in Patent Documents 1 and 2, for example. However, the techniques described in Patent Documents 1 and 2 may not be effective enough to suppress the above-mentioned haze. [Prior art documents] [Patent documents]

[0006] [Patent Document 1] Japanese Patent Application Publication No. 2018-173621 [Patent Document 2] Patent No. 4579728 Summary of the Invention [Problem to be solved by the invention]

[0007] The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a phase shift mask with few haze defects, that is, capable of sufficiently suppressing the occurrence of haze, and a method for manufacturing such a phase shift mask. [Means for solving the problem]

[0008] The present invention has been made to solve the above-mentioned problems. One aspect of the present invention provides a phase shift mask having a circuit pattern and adapted for exposure light with a wavelength of 200 nm or less. The phase shift mask comprises a transparent substrate, a phase shift film having a circuit pattern formed on the transparent substrate, and a gas-permeable protective film formed on the upper and side surfaces of the phase shift film. The phase shift film is capable of adjusting a predetermined amount of phase and transmittance for the exposure light passing through it, and the gas-permeable protective film contains at least one selected from tantalum metal, a tantalum compound, a tungsten metal, a tungsten compound, a tellurium metal, and a tellurium compound. When the thickness of the phase shift film is d1 and the thickness of the gas-permeable protective film is d2, d2 is thinner than d1 and is 15 nm or less.

[0009] a step of forming a gas permeable protective film on the top and side surfaces of the phase shift film on which the pattern has been formed; and a step of performing a defect inspection after forming the gas permeable protective film. The method for manufacturing a phase shift mask according to one aspect of the present invention is the same as the method for manufacturing a phase shift mask described above, comprising the steps of: forming a phase shift film on the transparent substrate; forming a light-shielding film on the phase shift film; forming a resist pattern on the light-shielding film formed on the phase shift film; forming a pattern on the light-shielding film by oxygen-containing chlorine-based etching after forming the resist pattern; forming a pattern on the phase shift film by fluorine-based etching after forming the pattern on the light-shielding film; removing the resist pattern after forming the pattern on the phase shift film; removing the light-shielding film from above the phase shift film on which the pattern has been formed by oxygen-containing chlorine-based etching after removing the resist pattern; forming the gas permeable protective film on the top and side surfaces of the phase shift film on which the pattern has been formed after removing the light-shielding film; and performing a defect inspection after forming the gas permeable protective film. If a defect is detected in the defect inspection, the phase shift film and the gas permeable protective film at the defective portion are subjected to electron beam correction etching using a fluorine-based gas. [Effects of the Invention]

[0010] By using a phase shift mask according to one embodiment of the present invention, it is possible to sufficiently suppress the occurrence of haze on the mask, and by using a phase shift mask according to one embodiment of the present invention, electron beam correction becomes extremely easy. [Brief explanation of the drawings]

[0011] [Figure 1] 1 is a cross-sectional schematic diagram showing the configuration of a phase shift mask blank according to an embodiment of the present invention. [Figure 2] 1 is a schematic cross-sectional view showing a configuration of a phase shift mask according to an embodiment of the present invention. [Figure 3] 1A to 1C are cross-sectional schematic diagrams illustrating a manufacturing process of a phase shift mask using a phase shift mask blank according to an embodiment of the present invention. [Figure 4] FIG. 10 is a schematic cross-sectional view showing the configuration of a phase shift mask according to a modified example of an embodiment of the present invention. [Figure 5] 1A is a schematic plan view showing a structure of a phase shift mask according to an embodiment of the present invention before a repair process, and FIG. 1B is a schematic cross-sectional view showing the structure of the phase shift mask according to the embodiment of the present invention before a repair process. [Figure 6] 5A to 5C are schematic cross-sectional views showing a repair process of a phase shift mask according to an embodiment of the present invention. [Figure 7] 5A to 5C are schematic cross-sectional views showing a repair process of a phase shift mask according to an embodiment of the present invention. [Figure 8] 1A is a schematic plan view showing a structure of a phase shift mask according to an embodiment of the present invention after a repair process, and FIG. 1B is a schematic cross-sectional view showing the structure of the phase shift mask according to the embodiment of the present invention after a repair process. DETAILED DESCRIPTION OF THE INVENTION

[0012] The inventors of the present application believed that the occurrence of haze in a mask blank or mask can be reduced if all three elements are present: the constituent material of the phase shift film that constitutes the phase shift mask blank or phase shift mask, an oxidizing gas such as water or oxygen, and exposure energy, and therefore configured the phase shift mask blank or phase shift mask as follows: In other words, the phase shift mask and its manufacturing method according to this embodiment are based on the technical idea of ​​reducing the occurrence of haze by providing a gas-permeable protective film (a so-called gas barrier layer) on the top and side surfaces of a phase shift film having a circuit pattern (a so-called phase shift film pattern) to prevent the oxidizing gas from coming into contact with the constituent material of the phase shift film.

[0013] Hereinafter, embodiments of the present invention will be described with reference to the drawings. Note that the cross-sectional schematic diagrams do not accurately reflect the actual dimensional ratios or number of patterns, and the amount of recession in the transparent substrate and the amount of damage to the film are omitted. Preferred embodiments of the phase shift mask blank of the present invention include the following.

[0014] (Overall structure of phase shift mask blank) Fig. 1 is a cross-sectional schematic diagram showing the configuration of a phase shift mask blank according to an embodiment of the present invention. Phase shift mask blank 10 shown in Fig. 1 is a phase shift mask blank used to fabricate a phase shift mask to which exposure light having a wavelength of 200 nm or less is applied, and includes a substrate (hereinafter simply referred to as "substrate") 11 that is transparent to the exposure wavelength, and a phase shift film 12 formed on substrate 11. Phase shift film 12 has the function of enabling the phase and transmittance to be adjusted to predetermined amounts for the exposure light that passes through it. Each layer constituting the phase shift mask blank 10 according to the embodiment of the present invention will be described in detail below.

[0015] (substrate) There are no particular limitations on the substrate 11, and as the substrate 11, for example, quartz glass, CaF2, aluminosilicate glass, or the like is generally used.

[0016] (Phase shift film) The phase shift film 12 is formed on the substrate 11 with or without other films interposed therebetween. The phase shift film 12 is, for example, a film that is resistant to oxygen-containing chlorine-based etching (Cl / O-based) and can be etched with fluorine-based etching (F-based).

[0017] The transmittance of the phase shift film 12 is, for example, in the range of 3% to 80% of the transmittance of the substrate 11, and the optimum transmittance can be appropriately selected depending on the desired wafer pattern. The phase difference of the phase shift film 12 is, for example, in the range of 160 degrees to 220 degrees, and preferably in the range of 175 degrees to 190 degrees. That is, the phase shift film 12 may have a transmittance of 3% to 80% with a phase difference of 160 degrees to 220 degrees. If the transmittance of the phase shift film 12 with respect to the exposure light is less than 3%, good exposure performance may not be obtained. Furthermore, if the phase difference is in the range of 160 degrees to 220 degrees, the required exposure performance can be easily maintained.

[0018] In other words, the phase shift film 12 is a layer that can adjust the phase and transmittance of the transmitted exposure light by a predetermined amount. Here, "adjusting the phase" means, for example, inverting the phase. Also, "transmittance" means the transmittance of the exposure light. The phase shift film 12 is, for example, a single layer film containing silicon and at least one element selected from a transition metal, nitrogen, oxygen, and carbon, or a multilayer film or gradient film thereof, and the transmittance and phase difference for the exposure wavelength are adjusted by appropriately selecting the composition and film thickness. The phase shift film 12 preferably contains silicon in the range of 20 atomic % to 60 atomic % inclusive, transition metal in the range of 0 atomic % to 20 atomic % inclusive, nitrogen in the range of 30 atomic % to 80 atomic % inclusive, oxygen in the range of 0 atomic % to 30 atomic % inclusive, and carbon in the range of 0 atomic % to 10 atomic % inclusive, based on the elemental ratio of the entire phase shift film 12. More preferred content ranges of each element in the phase shift film 12 are: silicon in the range of 30 atomic % to 50 atomic % inclusive, transition metal in the range of 0 atomic % to 10 atomic % inclusive, nitrogen in the range of 40 atomic % to 70 atomic % inclusive, oxygen in the range of 0 atomic % to 20 atomic % inclusive, and carbon in the range of 0 atomic % to 5 atomic % inclusive, based on the elemental ratio of the entire phase shift film 12. If the content of each element in the phase shift film 12 falls within the above numerical ranges, the transmittance and retardation of the phase shift film 12 can be easily controlled. The phase shift film 12 may contain at least one of oxide, carbide, and nitride of a metal silicide. In this case, the metal constituting the metal silicide may be any of the above-mentioned transition metals.

[0019] The transition metal contained in the phase shift film 12 is preferably at least one selected from molybdenum, titanium, vanadium, cobalt, nickel, zirconium, niobium, and hafnium, and more preferably molybdenum. When the transition metal contained in the phase shift film 12 is at least one selected from molybdenum, titanium, vanadium, cobalt, nickel, zirconium, niobium, and hafnium, the phase shift film 12 becomes easier to process, and when the transition metal is molybdenum, the phase shift film 12 becomes easier to process, for example, by etching.

[0020] (Overall structure of phase shift mask) The configuration of a phase shift mask 100 according to an embodiment of the present invention will be described below. FIG. 2(a) is a schematic cross-sectional view showing the configuration of a phase shift mask according to an embodiment of the present invention. FIG. 2(b) is a schematic cross-sectional view showing an enlarged portion of the configuration of a phase shift mask according to an embodiment of the present invention. The phase shift mask 100 shown in FIG. 2 is a phase shift mask (i.e., a patterned phase shift mask) having a circuit pattern and adapted for exposure light with a wavelength of 200 nm or less. It includes a substrate 11 transparent to the exposure wavelength, a phase shift film 12 having a circuit pattern formed on the substrate 11, and a gas-permeable protective film (hereinafter also referred to simply as a "protective film") 13 formed on an upper surface 12t and a side surface 12s of the phase shift film 12. The phase shift film 12 has the function of adjusting the phase and transmittance of the transmitted exposure light to a predetermined amount. The protective film 13 has the function of preventing gas from passing through the phase shift film 12. When the thickness of the phase shift film 12 is d1 and the thickness of the protective film 13 is d2, d1 is thicker than d2, and d2 is 15 nm or less. The phase shift mask 100 has a phase shift film pattern 12a (a phase shift film 12 having a circuit pattern) formed by removing a portion of the phase shift film 12 constituting the phase shift mask blank 10 to expose the surface of the substrate 11. The compositions of substrate 11 and phase shift film 12 having a circuit pattern that constitute phase shift mask 100 according to an embodiment of the present invention are the same as the compositions of substrate 11 and phase shift film 12 that constitute phase shift mask blank 10 according to the above-described embodiment of the present invention. Therefore, detailed descriptions of the compositions of substrate 11 and phase shift film 12 having a circuit pattern will be omitted. Hereinafter, protective film 13, which is a different part of phase shift mask 100 from phase shift mask blank 10, will be described in detail.

[0021] (protective film) The protective film 13 is formed on the phase shift film 12 with or without other films interposed therebetween, and is a layer for preventing or suppressing gas permeation (particularly permeation of oxidizing gases such as water and oxygen) into the phase shift film 12, i.e., a gas barrier layer. In this embodiment, the intrusion of gases, which are considered to be one of the factors causing haze, into the phase shift film 12 can be prevented or suppressed, and therefore the mask can be used for a long period of time. (For example, if the dose on the mask is 100 kJ / cm 2 Even if the haze exceeds 100%, the generation of haze on the surface of the phase shift mask can be prevented or suppressed. The gas (atmospheric gas) whose permeation is blocked or suppressed by the protective film 13 is an oxidizing gas, specifically oxygen-containing molecules, and more specifically water molecules. The protective film 13 is preferably a layer that can be repaired by electron beam repair etching using a fluorine-based gas (F-based). The protective film 13 is preferably a single layer film made of one or more compounds selected from tantalum metal, tantalum compounds, tungsten metal, tungsten compounds, tellurium metal, and tellurium compounds, or a mixed film or multi-layer film of these compounds, but the composition is not particularly limited as long as it is a layer that has a barrier function. Note that the above-mentioned tantalum metal, tungsten metal, and tellurium metal refer to the simple substance of each metal.

[0022] The protective film 13 made of a tantalum compound is a single layer film containing tantalum and one or more elements selected from oxygen, nitrogen, and carbon, or a multilayer film or gradient film thereof. The protective film 13 made of a tantalum compound preferably contains tantalum in the range of 10 atomic % to 90 atomic % inclusive, oxygen in the range of 0 atomic % to 90 atomic % inclusive, nitrogen in the range of 0 atomic % to 70 atomic % inclusive, and carbon in the range of 0 atomic % to 20 atomic % inclusive, based on the elemental ratio of the entire protective film 13. More preferred content ranges of each element in the protective film 13 made of a tantalum compound are tantalum in the range of 20 atomic % to 80 atomic % inclusive, oxygen in the range of 0 atomic % to 80 atomic % inclusive, nitrogen in the range of 0 atomic % to 60 atomic % inclusive, and carbon in the range of 0 atomic % to 10 atomic % inclusive, based on the elemental ratio of the entire protective film 13. When the content of each element in the protective film 13 made of a tantalum compound falls within the above numerical ranges, the barrier property of the protective film 13 against gas permeation into the phase shift film 12 is enhanced.

[0023] The protective film 13 made of a tungsten compound is a single layer film containing tungsten and one or more elements selected from oxygen, nitrogen, and carbon, or a multi-layer film or gradient film thereof. The protective film 13 made of a tungsten compound preferably contains tungsten in a range of 10 atomic % to 70 atomic % inclusive, oxygen in a range of 30 atomic % to 90 atomic % inclusive, nitrogen in a range of 0 atomic % to 20 atomic % inclusive, and carbon in a range of 0 atomic % to 20 atomic % inclusive, based on the elemental ratio of the entire protective film 13. More preferred content ranges of each element in the protective film 13 made of a tungsten compound are 20 atomic % to 60 atomic % inclusive for tungsten, 50 atomic % to 80 atomic % inclusive for oxygen, 0 atomic % to 10 atomic % inclusive for nitrogen, and 0 atomic % to 10 atomic % inclusive for carbon, based on the elemental ratio of the entire protective film 13. When the content of each element in the protective film 13 made of a tungsten compound falls within the above numerical ranges, the barrier properties of the protective film 13 against gas permeation into the phase shift film 12 are enhanced.

[0024] The protective film 13 made of a tellurium compound is a single layer film containing tellurium and one or more elements selected from oxygen, nitrogen, and carbon, or a multi-layer film or gradient film thereof. The protective film 13 made of a tellurium compound preferably contains tellurium in a range of 20 atomic % to 70 atomic % inclusive, oxygen in a range of 30 atomic % to 90 atomic % inclusive, nitrogen in a range of 0 atomic % to 20 atomic % inclusive, and carbon in a range of 0 atomic % to 20 atomic % inclusive, based on the elemental ratio of the entire protective film 13. More preferred content ranges of each element in the protective film 13 made of a tellurium compound are 30 atomic % to 60 atomic % inclusive for tellurium, 50 atomic % to 80 atomic % inclusive for oxygen, 0 atomic % to 10 atomic % inclusive for nitrogen, and 0 atomic % to 10 atomic % inclusive for carbon, based on the elemental ratio of the entire protective film 13. When the content of each element in the protective film 13 made of a tellurium compound falls within the above numerical ranges, the barrier property of the protective film 13 against gas permeation into the phase shift film 12 is improved. As described above, if the protective film 13 is a single layer film made of one or more compounds selected from tantalum metal, tantalum compounds, tungsten metal, tungsten compounds, tellurium metal, and tellurium compounds, or a mixed film or multi-layer film of these compounds, it can effectively prevent gas from permeating into the phase shift film 12.

[0025] When the thickness of the phase shift film 12 is d1 and the thickness of the protective film 13 is d2, the thickness d1 of the phase shift film 12 is thicker than the thickness d2 of the protective film 13, and the thickness d2 of the protective film 13 is 15 nm or less. Furthermore, the thickness d2 of the protective film 13 is preferably 1 nm or more. If the thickness d2 of the protective film 13 is within the above-mentioned range, the optical characteristics and repair characteristics (particularly, electron beam repair) can be maintained while also maintaining the barrier properties against gas permeation into the phase shift film 12. If the thickness d2 of the protective film 13 is made thicker than 15 nm, the optical characteristics and repair characteristics may be affected. Furthermore, the thickness d1 of the phase shift film 12 may be greater than 15 nm. When the thickness d1 of the phase shift film 12 is greater than 15 nm, it becomes easier to adjust the phase and transmittance. Furthermore, the total thickness of phase shift film 12 and protective film 13 is preferably 50 nm or more, and more preferably 70 nm or more. If the total thickness of phase shift film 12 and protective film 13 is within the above numerical range, the functions of phase shift mask 100 can be easily set to desired values.

[0026] In this embodiment, the thickness d2 of the protective film 13 means "the thickness d2t of the protective film 13 formed on the upper surface 12t of the phase shift film 12." In this embodiment, the thickness d2t of the protective film 13 formed on the upper surface 12t of the phase shift film 12 and the thickness d2s of the protective film 13 formed on the side surface 12s of the phase shift film 12 may be the same or different. For example, the ratio (d2t / d2s) of the thickness d2t of the protective film 13 to the thickness d2s of the protective film 13 is preferably within a range of 0.2 to 2.0, more preferably within a range of 0.5 to 1.5, and most preferably 1. When the ratio of the thickness d2t of the protective film 13 to the thickness d2s of the protective film 13 is within the above-mentioned range, the protective film 13 functions more satisfactorily as a gas barrier layer.

[0027] The protective film 13 can be formed by a known method. Atomic layer deposition (ALD) is a preferred method for obtaining a film with excellent homogeneity and uniformity of film thickness most easily, but the method is not limited to atomic layer deposition (ALD) in this embodiment.

[0028] (Method of manufacturing a phase shift mask) A method for manufacturing a phase shift mask 100 using a phase shift mask blank 10 according to this embodiment includes the steps of forming a phase shift film 12 on a substrate 11, forming a light-shielding film 15 on the phase shift film 12, forming a resist pattern 16 on the light-shielding film 15 formed on the phase shift film 12, forming a pattern in the light-shielding film 15 by oxygen-containing chlorine-based etching (Cl / O-based) after forming the resist pattern 16, forming a pattern in the light-shielding film 15 by fluorine-based etching (F-based) after forming the pattern in the light-shielding film 15, removing the resist pattern 16 after forming the pattern in the phase shift film 12, removing the resist pattern 16 from above the phase shift film 12 by oxygen-containing chlorine-based etching (Cl / O-based) after removing the resist pattern 16, forming a protective film 13 on the top surface 12t and side surfaces 12s of the phase shift film 12 on which the pattern has been formed after removing the light-shielding film 15, and performing defect inspection after forming the protective film 13. Furthermore, in the method for manufacturing a phase shift mask 100 using the phase shift mask blank 10 of this embodiment, if a defect is detected in the above-mentioned defect inspection, the phase shift film 12 and protective film 13 at the defective portion are subjected to electron beam correction etching using a fluorine-based gas. Here, the light-shielding film 15 according to the embodiment of the present invention will be described.

[0029] (Light-shielding film) The light-shielding film 15 is a layer formed on the phase shift mask blank 10 (phase shift film 12) according to the embodiment of the present invention described above. The light-shielding film 15 is, for example, a single-layer film made of chromium alone or a chromium compound, or a multi-layer film or gradient film thereof. More specifically, the light-shielding film 15 made of a chromium compound is a single-layer film containing chromium and one or more elements selected from nitrogen and oxygen, or a multi-layer film or gradient film thereof. The light-shielding film 15 made of a chromium compound preferably contains chromium in a range of 30 atomic % to 100 atomic % inclusive, oxygen in a range of 0 atomic % to 50 atomic % inclusive, nitrogen in a range of 0 atomic % to 50 atomic % inclusive, and carbon in a range of 0 atomic % to 10 atomic % inclusive, relative to the elemental ratio of the entire light-shielding film 15. More preferred content ranges of each element in the light-shielding film 15 made of a chromium compound are 50 atomic % to 100 atomic % inclusive, oxygen in a range of 0 atomic % to 40 atomic % inclusive, nitrogen in a range of 0 atomic % to 40 atomic % inclusive, and carbon in a range of 0 atomic % to 5 atomic % inclusive, relative to the elemental ratio of the entire light-shielding film 15. If the content of each element in the light-shielding film 15 made of a chromium compound falls within the above numerical ranges, the light-shielding property of the light-shielding film 15 is enhanced.

[0030] The thickness of the light-shielding film 15 is preferably, for example, in the range of 35 nm to 80 nm, particularly in the range of 40 nm to 75 nm. The light-shielding film 15 can be formed by a known method. A sputtering film formation method is preferred as the easiest method for obtaining a film with excellent uniformity, but the method is not limited to the sputtering film formation method in this embodiment. The target and sputtering gas are selected depending on the film composition. For example, a method for forming a film containing chromium can be exemplified by using a chromium-containing target and performing reactive sputtering in only an inert gas such as argon gas, only a reactive gas such as oxygen, or a mixed gas of an inert gas and a reactive gas. The flow rate of the sputtering gas can be adjusted according to the film characteristics, and may be kept constant during film formation. However, if the amount of oxygen or nitrogen is to be varied in the thickness direction of the film, it may be changed according to the desired composition. In addition, the power applied to the target, the distance between the target and the substrate, and the pressure in the film formation chamber may be adjusted.

[0031] Each step of the method for manufacturing the phase shift mask 100 according to the embodiment of the present invention will be described in detail below.

[0032] FIG. 3 is a cross-sectional schematic diagram showing a manufacturing process of a phase shift mask 100 using the phase shift mask blank 10 shown in FIG. 1. FIG. 3(a) shows a process of forming a light-shielding film 15 on a phase shift film 12. FIG. 3(b) shows a process of applying a resist film to the light-shielding film 15, drawing the resist pattern, and then developing the resist pattern 16. FIG. 3(c) shows a process of patterning the light-shielding film 15 by oxygen-containing chlorine-based dry etching (Cl / O-based) along the resist pattern 16. FIG. 3(d) shows a process of patterning the phase shift film 12 by fluorine-based etching (F-based) along the pattern of the light-shielding film 15 to form a phase shift film pattern 12a. FIG. 3(e) shows a process of peeling and removing the resist pattern 16 and then cleaning the resulting film. FIG. 3(f) shows a process of removing the light-shielding film 15 from above the patterned phase shift film 12 (phase shift film pattern 12a) by oxygen-containing chlorine-based etching (Cl / O-based). 3(g) shows a process of forming a protective film 13 on the upper surface 12t and side surfaces 12s of the patterned phase shift film 12 (phase shift film pattern 12a) after removing the light-shielding film 15. In this way, the phase shift mask 100 according to this embodiment is manufactured. The present manufacturing process includes a step of performing a defect inspection after forming protective film 13. If a defect is detected in this defect inspection, phase shift film 12 and protective film 13 at the defective portion are subjected to electron beam correction etching using a fluorine-based gas, thereby manufacturing phase shift mask 100 according to this embodiment.

[0033] The phase shift mask 100 according to this embodiment thus manufactured is a phase shift mask for use with exposure light having a wavelength of 200 nm or less, and includes a substrate 11, a phase shift film 12 formed on the substrate 11 with or without other films interposed therebetween, and a protective film 13 formed on an upper surface 12t and a side surface 12s of the phase shift film 12 (phase shift film pattern 12a). Furthermore, the phase shift film 12 having the circuit pattern has the function of being able to adjust the phase and transmittance to a predetermined amount for the transmitted exposure light. Furthermore, the protective film 13 has the function of preventing gas from passing through the phase shift film 12. Phase shift mask 100 also includes phase shift film pattern 12a formed by removing a portion of phase shift film 12 to expose a portion of substrate 11. When phase shift film 12 has a thickness d1 and protective film 13 has a thickness d2, phase shift film 12 has a thickness d1 that is thicker than protective film 13's thickness d2, and protective film 13 has a thickness d2 that is 15 nm or less.

[0034] In the step of FIG. 3(b), either a positive or negative resist can be used as the resist film material, but it is preferable to use a chemically amplified resist for electron beam lithography, which enables the formation of high-precision patterns. The thickness of the resist film is, for example, in the range of 50 nm to 250 nm. In particular, when fabricating a phase shift mask that requires the formation of fine patterns, it is necessary to thin the resist film so that the aspect ratio of the resist pattern 16 does not become large in order to prevent pattern collapse, and a thickness of 200 nm or less is preferable. On the other hand, the lower limit of the resist film thickness is determined by comprehensively considering conditions such as the etching resistance of the resist material used, and is preferably 60 nm or more. When a chemically amplified resist for electron beam lithography is used as the resist film, the energy density of the electron beam during lithography is 35 μC / cm. 2 to 100 μC / cm 2 After this drawing, a heat treatment and a development treatment are carried out to obtain a resist pattern 16. In the step of FIG. 3(e), the resist pattern 16 may be removed by wet removal using a remover, or by dry removal using dry etching.

[0035] 3(c), the conditions for the oxygen-containing chlorine-based dry etching (Cl / O-based) for patterning the light-shielding film 15 made of chromium or a chromium compound may be the well-known conditions used for removing chromium compound films, and in addition to chlorine gas and oxygen gas, an inert gas such as nitrogen gas or helium gas may be mixed as needed. The underlying phase shift film 12 is resistant to the oxygen-containing chlorine-based dry etching (Cl / O-based), and therefore remains without being removed or patterned in this process.

[0036] In the step shown in FIG. 3(d), the fluorine-based dry etching (F-based) conditions for patterning the phase shift film 12 may be those known for dry etching silicon-based compound films, tantalum compound films, molybdenum compound films, etc. The fluorine-based gas is typically CF4, C2F6, or SF6. If necessary, an active gas such as oxygen or an inert gas such as nitrogen or helium may be mixed. In the case of FIG. 3(d), the upper light-shielding film 15 or resist pattern 16 is resistant to the fluorine-based dry etching (F-based) and therefore remains without being removed or patterned in this step. In the step shown in FIG. 3(d), the substrate 11 is typically recessed by approximately 1 to 3 nm to prevent poor removal of the phase shift film 12 and to fine-tune the phase difference.

[0037] 3(f), the conditions for the oxygen-containing chlorine-based dry etching (Cl / O-based) for removing the light-shielding film 15 may be the well-known conditions used for removing chromium compound films, and in addition to chlorine gas and oxygen gas, an inert gas such as nitrogen gas or helium gas may be mixed as necessary. The underlying phase shift film 12 and substrate 11 are both resistant to the oxygen-containing chlorine-based dry etching (Cl / O-based), and therefore remain without being removed or patterned in this process.

[0038] (Other embodiments) In this embodiment, the protective film 13 is formed on the upper surface 12t and side surface 12s of the phase shift film 12 (phase shift film pattern 12a), but the present invention is not limited to this. For example, as shown in FIG. 4, the protective film 13 may be formed on the upper surface 12t and side surface 12s of the phase shift film 12, and also on the exposed substrate 11. In this embodiment, the reference for both the phase difference and the transmittance is the exposed portion of the substrate, and the portion where the pattern is formed brings about a phase change / transmittance change, respectively, making it unnecessary (or easy) to adjust the phase difference and transmittance. Furthermore, the composition of the protective film 13 formed on the substrate 11 may be the same as the composition of the protective film 13 formed on the top surface 12t and the side surface 12s of the phase shift film 12. Furthermore, there may be no interface between the protective film 13 formed on the substrate 11 and the protective film 13 formed on the top surface 12t and side surfaces 12s of the phase shift film 12, and the protective film 13 may be a continuous film.

[0039] In addition, although the present embodiment has been described with reference to a case where the protective film 13 is a single layer, the present invention is not limited to this. For example, the protective film 13 may be a multi-layer (laminated film). In this case, the density of the film located on the surface side of the protective film 13 may be higher than the density of the film located on the phase shift film 12 side of the protective film 13.

[0040] In this embodiment, the protective film 13 is formed on the upper surface 12t and the side surface 12s of the phase shift film 12 (phase shift film pattern 12a), but the present invention is not limited to this. For example, in the step of forming the protective film 13, the protective film 13 may be formed on the upper surface 12t and the side surface 12s of the phase shift film 12, and also on the exposed substrate 11. In the above embodiment, the reference for both the phase difference and the transmittance is the exposed portion of the substrate, and the portion where the pattern is formed brings about a phase change / transmittance change, respectively, making it unnecessary (or easy) to adjust the phase difference and transmittance. Furthermore, the protective film 13 formed on the substrate 11 may be formed so that its composition is the same as the composition of the protective film 13 formed on the top surface 12t and the side surface 12s of the phase shift film 12. Alternatively, a continuous film (protective film 13) having no interface between the protective film 13 formed on the substrate 11 and the protective film 13 formed on the upper surface 12t and side surfaces 12s of the phase shift film 12 may be formed.

[0041] In addition, in this embodiment, the case where a single-layer protective film 13 is formed has been described, but the present invention is not limited to this. For example, a multi-layer (laminated film) protective film 13 may be formed. In this case, the density of the film located on the surface side of protective film 13 may be higher than the density of the film located on the phase shift film 12 side of protective film 13.

[0042] [Example] Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to the following examples. Example 1 A 70-nm-thick phase shift film consisting of silicon, molybdenum, oxygen, and nitrogen was deposited on a quartz substrate using a DC sputtering system with two targets. The targets were molybdenum and silicon, and the sputtering gas was argon, oxygen, and nitrogen. The composition of this phase shift film was analyzed by ESCA and found to be Si:Mo:O:N = 40:8:7:45 (atomic percentage).

[0043] The phase shift film thus formed had a transmittance of 6% for exposure light and a phase difference of 180 degrees. In this example, the term "transmittance of exposure light" refers to the transmittance of exposure light through non-openings relative to openings in the phase shift film. The term "phase difference" refers to the phase difference between non-openings and openings in the phase shift film. Next, a 50-nm-thick light-shielding film consisting of chromium, oxygen, and nitrogen was deposited on the phase shift film using a DC sputtering system. Chromium was used as the target, and argon, oxygen, and nitrogen were used as the sputtering gas. ESCA analysis of the composition of this light-shielding film revealed a Cr:O:N ratio of 55:35:10 (atomic percentage).

[0044] Next, a negative chemically amplified electron beam resist was spin-coated onto the light-shielding film to a thickness of 200 nm, and the pattern was formed at a dose of 35 μC / cm 2 The resist was subjected to electron beam writing at 100° C. for 10 minutes, followed by puddle development for 90 seconds to form a resist pattern. Next, the light-shielding film was patterned using a dry etching system. The etching gas used was chlorine, oxygen, and helium, and the gas pressure was set to 5 mTorr, the ICP power to 400 W, and the bias power to 40 W. Over-etching was performed to 100%.

[0045] Next, the phase shift film was patterned using a dry etching system. The etching gas was CF4 and oxygen, and the gas pressure was set to 5 mTorr, the ICP power to 400 W, and the bias power to 40 W. The dry etching was stopped when the quartz substrate was dug to an average depth of 3 nm.

[0046] Next, the resist pattern was stripped and washed by washing with sulfuric acid and water. Next, the light-shielding film was removed using a dry etching device. The etching gas used was chlorine, oxygen, and helium, and the gas pressure was set to 10 mTorr, the ICP power to 500 W, and the bias power to 10 W. Overetching was performed by 200%. During this process, no damage occurred to the underlying phase shift film or quartz substrate. Next, a protective film was formed on the top and side surfaces of the phase shift film and on the exposed quartz substrate. The protective film was formed by plasma ALD using a precursor pentaethoxytantalum (Ta(OC2H5)5) and O2 plasma for 72 cycles to form an 8-nm thick layer of tantalum oxide (Ta2O5). In this way, the phase shift mask according to Example 1 was obtained. Next, the dose at which haze occurred due to accelerated exposure of this phase shift mask was measured and found to be 155 kJ / cm 2 It was.

[0047] The "dose at which haze occurs due to accelerated exposure" means that the larger the value, the less likely haze occurs. 2 If the dose is 100 kJ / cm or more, there is no problem in using a phase shift mask. 2 If the dose is 110 kJ / cm or more, it can be said that the phase shift mask is less likely to generate haze. 2 If the above is true, it can be said that the phase shift mask is extremely resistant to haze. From the above measurement results, it was found that the dose for the phase shift mask of Example 1 was 155 kJ / cm 2 2 Therefore, it was confirmed that the occurrence of haze can be reduced.

[0048] Next, this phase shift mask was subjected to electron beam correction, as will be described below. (How to fix) A method for correcting the phase shift mask 100 with an electron beam will be described with reference to FIGS. 5 shows an enlarged view of a portion of phase shift film 12 (phase shift film pattern 12a) in phase shift mask 100. More specifically, Fig. 5(a) is a schematic plan view showing the structure of phase shift mask 100 according to this embodiment before the repair process, and Fig. 5(b) is a schematic cross-sectional view showing the structure of phase shift mask 100 according to this embodiment before the repair process. Hereinafter, a specific method for performing electron beam correction etching on the phase shift film 12 (phase shift film pattern 12a) formed by dry etching using the resist pattern 16 will be described. In Fig. 5(a), "L" indicates the region where the phase shift film 12 is formed, and "S" indicates the region where the substrate 11 is exposed. Also in Fig. 5, "12b" indicates the location where electron beam correction etching is performed.

[0049] First, as shown in FIG. 6, the protective film 13, which is the outermost layer, was irradiated with an electron beam in a fluorine-based gas atmosphere, such as a gas atmosphere consisting of fluorine and xenon (XeF2), using an electron beam etching machine (MeRiT MG45: manufactured by Carl Zeiss) to perform electron beam etching. The fluorine-based gas flow rate was controlled by a cold trap technique using temperature. In this example, the temperature of the fluorine-based gas was set to 0°C (hereinafter referred to as the controlled temperature). The EB current was set to 50 pA, and the EB acceleration voltage was set to 1 kV. Next, as shown in Figure 7, the phase shift film 12, which is the second layer from the top surface, was subjected to electron beam correction etching using the same device, with the controlled temperature set to 0°C, by irradiating it with an electron beam in a fluorine-based gas atmosphere, in the same manner as the electron beam correction etching of the top protective film 13. In this way, phase shift mask 100 was obtained by electron beam correction etching of phase shift film 12, as shown in Figure 8. The Qz etching selectivity of phase shift film 12 in the electron beam correction etching was confirmed to be 2.2. The Qz etching selectivity of protective film 13 in the electron beam correction etching was confirmed to be 3.3. Here, the "Qz etching selectivity" refers to the ratio of the correction etching rate of phase shift film 12 and protective film 13 to the correction etching rate of the quartz (Qz) substrate.

[0050] The higher the "Qz etching selectivity," the easier it is to perform electron beam etching for the phase shift film and the protective film. If the Qz etching selectivity is 1.2 or higher (evaluated as "○" in the table below), the phase shift film and the protective film are easily corrected with electron beams. If the Qz etching selectivity is 1.5 or higher (evaluated as "◎" in the table below), the phase shift mask (phase shift film and protective film) is extremely easy to correct with electron beams. If the Qz etching selectivity is less than 1.2 (evaluated as "△" in the table below), the phase shift mask (phase shift film and protective film) is difficult to correct with electron beams. From the above measurement results, it was confirmed that for the phase shift mask of Example 1, the Qz etching selectivity ratios of the phase shift film and the protective film were 2.2 and 3.3, respectively, and therefore electron beam correction of the phase shift mask (phase shift film and protective film) was extremely easy. The evaluation results of the haze resistance and repair processability are shown in Table 1.

[0051] Example 2 A 70-nm-thick phase shift film consisting of silicon, molybdenum, oxygen, and nitrogen was deposited on a quartz substrate using a DC sputtering system with two targets. The targets were molybdenum and silicon, and the sputtering gas was argon, oxygen, and nitrogen. The composition of this phase shift film was analyzed by ESCA and found to be Si:Mo:O:N = 40:8:7:45 (atomic percentage).

[0052] The phase shift film thus formed had a transmittance of 6% for the exposure light and a phase difference of 180 degrees. Next, a 50-nm-thick light-shielding film consisting of chromium, oxygen, and nitrogen was deposited on the phase shift film using a DC sputtering system. Chromium was used as the target, and argon, oxygen, and nitrogen were used as the sputtering gas. ESCA analysis of the composition of this light-shielding film revealed a Cr:O:N ratio of 55:35:10 (atomic percentage).

[0053] Next, a negative chemically amplified electron beam resist was spin-coated onto the light-shielding film to a thickness of 200 nm, and the pattern was formed at a dose of 35 μC / cm 2 The resist was subjected to electron beam writing at 100° C. for 10 minutes, followed by puddle development for 90 seconds to form a resist pattern. Next, the light-shielding film was patterned using a dry etching system. The etching gas used was chlorine, oxygen, and helium, and the gas pressure was set to 5 mTorr, the ICP power to 400 W, and the bias power to 40 W. Over-etching was performed to 100%.

[0054] Next, the phase shift film was patterned using a dry etching system. The etching gas was CF4 and oxygen, and the gas pressure was set to 5 mTorr, the ICP power to 400 W, and the bias power to 40 W. The dry etching was stopped when the quartz substrate was dug to an average depth of 3 nm.

[0055] Next, the resist pattern was stripped and washed by washing with sulfuric acid and water. Next, the light-shielding film was removed using a dry etching device. The etching gas used was chlorine, oxygen, and helium, and the gas pressure was set to 10 mTorr, the ICP power to 500 W, and the bias power to 10 W. Overetching was performed by 200%. During this process, no damage occurred to the underlying phase shift film or quartz substrate. Next, a protective film was formed on the top and side surfaces of the phase shift film and on the exposed quartz substrate. The protective film was formed by plasma ALD, where a precursor, pentaethoxytantalum (Ta(OC2H5)5), reacted with O2 plasma for 128 cycles to form a 14 nm thick layer of tantalum oxide (Ta2O5). In this way, a phase shift mask according to Example 2 was obtained. Next, the dose at which haze occurred due to accelerated exposure of this phase shift mask was measured and found to be 200 kJ / cm 2 That was all.

[0056] From the above results, it can be seen that the dose of the phase shift mask of Example 2 is 200 kJ / cm 2 For these reasons, it was confirmed that the occurrence of haze could be reduced. Next, this phase shift mask was subjected to electron beam correction, and the Qz etching selectivity ratios of the phase shift film and the protective film after electron beam correction were measured and found to be 2.2 and 3.3, respectively. From the above results, it was confirmed that the phase shift mask of Example 2 has an electron beam correction of the phase shift mask (phase shift film and protective film) extremely easy because the Qz etching selectivity ratios of the phase shift film and protective film are 2.2 and 3.3, respectively.

[0057] Example 3 A 70-nm-thick phase shift film consisting of silicon, molybdenum, oxygen, and nitrogen was deposited on a quartz substrate using a DC sputtering system with two targets. The targets were molybdenum and silicon, and the sputtering gas was argon, oxygen, and nitrogen. The composition of this phase shift film was analyzed by ESCA and found to be Si:Mo:O:N = 40:8:7:45 (atomic percentage).

[0058] The phase shift film thus formed had a transmittance of 6% for the exposure light and a phase difference of 180 degrees. Next, a 50-nm-thick light-shielding film consisting of chromium, oxygen, and nitrogen was deposited on the phase shift film using a DC sputtering system. Chromium was used as the target, and argon, oxygen, and nitrogen were used as the sputtering gas. ESCA analysis of the composition of this light-shielding film revealed a Cr:O:N ratio of 55:35:10 (atomic percentage).

[0059] Next, a negative chemically amplified electron beam resist was spin-coated onto the light-shielding film to a thickness of 200 nm, and the pattern was formed at a dose of 35 μC / cm 2 The resist was subjected to electron beam writing at 100° C. for 10 minutes, followed by puddle development for 90 seconds to form a resist pattern. Next, the light-shielding film was patterned using a dry etching system. The etching gas used was chlorine, oxygen, and helium, and the gas pressure was set to 5 mTorr, the ICP power to 400 W, and the bias power to 40 W. Over-etching was performed to 100%.

[0060] Next, the phase shift film was patterned using a dry etching system. The etching gas was CF4 and oxygen, and the gas pressure was set to 5 mTorr, the ICP power to 400 W, and the bias power to 40 W. The dry etching was stopped when the quartz substrate was dug to an average depth of 3 nm.

[0061] Next, the resist pattern was stripped and washed by washing with sulfuric acid and water. Next, the light-shielding film was removed using a dry etching device. The etching gas used was chlorine, oxygen, and helium, and the gas pressure was set to 10 mTorr, the ICP power to 500 W, and the bias power to 10 W. Overetching was performed by 200%. During this process, no damage occurred to the underlying phase shift film or quartz substrate. Next, a protective film was formed on the top and side surfaces of the phase shift film and on the exposed quartz substrate. The protective film was formed by plasma ALD using a precursor, bis(tert-butylimino)bis(dimethylamino)tungsten ((tBuN)2(Me2N)2W), reacted with O2 plasma for 70 cycles to form a 5-nm thick layer of tungsten oxide (WO3). In this way, a phase shift mask according to Example 3 was obtained. Next, the dose at which haze occurred due to accelerated exposure of this phase shift mask was measured and found to be 112 kJ / cm 2 It was.

[0062] From the above results, it can be seen that the dose of the phase shift mask of Example 3 is 112 kJ / cm 2 2 Therefore, it was confirmed that the occurrence of haze can be reduced. Next, this phase shift mask was subjected to electron beam correction, and the Qz etching selectivity ratios of the phase shift film and the protective film after electron beam correction were measured and found to be 2.2 and 7.0, respectively. From the above results, it was confirmed that the phase shift mask of Example 3 has an electron beam correction of the phase shift mask (phase shift film and protective film) extremely easy because the Qz etching selectivity ratios of the phase shift film and protective film are 2.2 and 7.0, respectively.

[0063] Example 4 A 70-nm-thick phase shift film consisting of silicon, molybdenum, oxygen, and nitrogen was deposited on a quartz substrate using a DC sputtering system with two targets. The targets were molybdenum and silicon, and the sputtering gas was argon, oxygen, and nitrogen. The composition of this phase shift film was analyzed by ESCA and found to be Si:Mo:O:N = 40:8:7:45 (atomic percentage).

[0064] The phase shift film thus formed had a transmittance of 6% for the exposure light and a phase difference of 180 degrees. Next, a 50-nm-thick light-shielding film consisting of chromium, oxygen, and nitrogen was deposited on the phase shift film using a DC sputtering system. Chromium was used as the target, and argon, oxygen, and nitrogen were used as the sputtering gas. ESCA analysis of the composition of this light-shielding film revealed a Cr:O:N ratio of 55:35:10 (atomic percentage).

[0065] Next, a negative chemically amplified electron beam resist was spin-coated onto the light-shielding film to a thickness of 200 nm, and the pattern was formed at a dose of 35 μC / cm 2 The resist was subjected to electron beam writing at 100° C. for 10 minutes, followed by puddle development for 90 seconds to form a resist pattern. Next, the light-shielding film was patterned using a dry etching system. The etching gas used was chlorine, oxygen, and helium, and the gas pressure was set to 5 mTorr, the ICP power to 400 W, and the bias power to 40 W. Over-etching was performed to 100%.

[0066] Next, the phase shift film was patterned using a dry etching system. The etching gas was CF4 and oxygen, and the gas pressure was set to 5 mTorr, the ICP power to 400 W, and the bias power to 40 W. The dry etching was stopped when the quartz substrate was dug to an average depth of 3 nm.

[0067] Next, the resist pattern was stripped and washed by washing with sulfuric acid and water. Next, the light-shielding film was removed using a dry etching device. The etching gas used was chlorine, oxygen, and helium, and the gas pressure was set to 10 mTorr, the ICP power to 500 W, and the bias power to 10 W. Overetching was performed by 200%. During this process, no damage occurred to the underlying phase shift film or quartz substrate. Next, a protective film was formed on the top and side surfaces of the phase shift film and on the exposed quartz substrate. The protective film was formed by reacting the precursor tetraethoxytellurium (Te(OC2H5)4) with H2O 75 times using the thermal ALD method to form a 3 nm thick tellurium oxide (TeO2). In this way, a phase shift mask according to Example 4 was obtained. Next, the dose at which haze occurred due to accelerated exposure of this phase shift mask was measured and found to be 107 kJ / cm 2 It was.

[0068] From the above results, it can be seen that the dose of the phase shift mask of Example 4 is 107 kJ / cm 2 Therefore, it was confirmed that the occurrence of haze can be reduced. Next, this phase shift mask was subjected to electron beam correction, and the Qz etching selectivity ratios of the phase shift film and the protective film after electron beam correction were measured and found to be 2.2 and 4.9, respectively. From the above results, it was confirmed that the phase shift mask of Example 4 has an electron beam correction of the phase shift mask (phase shift film and protective film) extremely easy because the Qz etching selectivity ratios of the phase shift film and protective film are 2.2 and 4.9, respectively.

[0069] Example 5 A 70-nm-thick phase shift film consisting of silicon, molybdenum, oxygen, and nitrogen was deposited on a quartz substrate using a DC sputtering system with two targets. The targets were molybdenum and silicon, and the sputtering gas was argon, oxygen, and nitrogen. The composition of this phase shift film was analyzed by ESCA and found to be Si:Mo:O:N = 40:8:7:45 (atomic percentage).

[0070] The phase shift film thus formed had a transmittance of 6% for the exposure light and a phase difference of 180 degrees. Next, a 50-nm-thick light-shielding film consisting of chromium, oxygen, and nitrogen was deposited on the phase shift film using a DC sputtering system. Chromium was used as the target, and argon, oxygen, and nitrogen were used as the sputtering gas. ESCA analysis of the composition of this light-shielding film revealed a Cr:O:N ratio of 55:35:10 (atomic percentage).

[0071] Next, a negative chemically amplified electron beam resist was spin-coated onto the light-shielding film to a thickness of 200 nm, and the pattern was formed at a dose of 35 μC / cm 2 The resist was subjected to electron beam writing at 100° C. for 10 minutes, followed by puddle development for 90 seconds to form a resist pattern. Next, the light-shielding film was patterned using a dry etching system. The etching gas used was chlorine, oxygen, and helium, and the gas pressure was set to 5 mTorr, the ICP power to 400 W, and the bias power to 40 W. Over-etching was performed to 100%.

[0072] Next, the phase shift film was patterned using a dry etching system. The etching gas was CF4 and oxygen, and the gas pressure was set to 5 mTorr, the ICP power to 400 W, and the bias power to 40 W. The dry etching was stopped when the quartz substrate was dug to an average depth of 3 nm.

[0073] Next, the resist pattern was stripped and washed by washing with sulfuric acid and water. Next, the light-shielding film was removed using a dry etching device. The etching gas used was chlorine, oxygen, and helium, and the gas pressure was set to 10 mTorr, the ICP power to 500 W, and the bias power to 10 W. Overetching was performed by 200%. During this process, no damage occurred to the underlying phase shift film or quartz substrate. Next, a protective film was formed on the top and side surfaces of the phase shift film, and on the exposed quartz substrate. The protective film was formed by plasma ALD using a precursor, pentakisdimethylaminotantalum (Ta(NMe2)5), reacting with O2 / N2 / H2 plasma for 30 cycles to form a 2-nm thick layer of tantalum oxynitride (TaON). In this way, a phase shift mask according to Example 5 was obtained. Next, the dose at which haze occurred due to accelerated exposure of this phase shift mask was measured and found to be 130 kJ / cm 2 It was.

[0074] From the above results, it can be seen that the dose of the phase shift mask of Example 5 is 130 kJ / cm 2 2 Therefore, it was confirmed that the occurrence of haze can be reduced. Next, this phase shift mask was subjected to electron beam correction, and the Qz etching selectivity ratios of the phase shift film and the protective film after electron beam correction were measured and found to be 2.2 and 4.0, respectively. From the above results, it was confirmed that the phase shift mask of Example 5 has extremely easy electron beam correction of the phase shift mask (phase shift film and protective film) because the Qz etching selectivity ratios of the phase shift film and protective film are 2.2 and 4.0, respectively.

[0075] (Comparative Example 1) A 70-nm-thick phase shift film consisting of silicon, molybdenum, oxygen, and nitrogen was deposited on a quartz substrate using a DC sputtering system with two targets. The targets were molybdenum and silicon, and the sputtering gas was argon, oxygen, and nitrogen. The composition of this phase shift film was analyzed by ESCA and found to be Si:Mo:O:N = 40:8:7:45 (atomic percentage).

[0076] The phase shift film thus formed had a transmittance of 6% for the exposure light and a phase difference of 180 degrees. Next, a 50-nm-thick light-shielding film consisting of chromium, oxygen, and nitrogen was deposited on the phase shift film using a DC sputtering system. Chromium was used as the target, and argon, oxygen, and nitrogen were used as the sputtering gas. ESCA analysis of the composition of this light-shielding film revealed a Cr:O:N ratio of 55:35:10 (atomic percentage).

[0077] Next, a negative chemically amplified electron beam resist was spin-coated onto the light-shielding film to a thickness of 200 nm, and the pattern was formed at a dose of 35 μC / cm 2 The resist was subjected to electron beam writing at 100° C. for 10 minutes, followed by puddle development for 90 seconds to form a resist pattern. Next, the light-shielding film was patterned using a dry etching system. The etching gas used was chlorine, oxygen, and helium, and the gas pressure was set to 5 mTorr, the ICP power to 400 W, and the bias power to 40 W. Over-etching was performed to 100%.

[0078] Next, the phase shift film was patterned using a dry etching system. The etching gas was CF4 and oxygen, and the gas pressure was set to 5 mTorr, the ICP power to 400 W, and the bias power to 40 W. The dry etching was stopped when the quartz substrate was dug to an average depth of 3 nm.

[0079] Next, the resist pattern was stripped and washed by washing with sulfuric acid and water. Next, the light-shielding film was removed using a dry etching device. The etching gas used was chlorine, oxygen, and helium, and the gas pressure was set to 10 mTorr, the ICP power to 500 W, and the bias power to 10 W. Overetching was performed by 200%. During this process, no damage occurred to the underlying phase shift film or quartz substrate. In this way, a phase shift mask according to Comparative Example 1 was obtained. That is, the phase shift mask according to Comparative Example 1 is a phase shift mask that does not include the protective film formed in Examples 1 to 4. Next, the dose at which haze occurred due to accelerated exposure of this phase shift mask was measured and found to be 58 kJ / cm 2 It was.

[0080] From the above results, it can be seen that the dose of the phase shift mask of Comparative Example 1 was 58 kJ / cm 2 Therefore, it was confirmed that the occurrence of haze could not be sufficiently reduced. As described above, it is clear that forming a protective film on the top and side surfaces of the phase shift film is effective in reducing the amount of haze generated in the phase shift mask. Next, this phase shift mask was subjected to electron beam correction, and the Qz etching selectivity of the phase shift film after electron beam correction was measured and found to be 2.2. From the above results, it was confirmed that in the phase shift mask of Comparative Example 1, the Qz etching selectivity of the phase shift film was 2.2, and therefore electron beam correction of the phase shift mask (phase shift film) was extremely easy.

[0081] [Table 1]

[0082] Although the phase shift mask blank of the present invention and the phase shift mask produced using the same have been described above using the above examples, the above examples are merely examples for carrying out the present invention, and the present invention is not limited to these. Furthermore, modifications of these examples are within the scope of the present invention, and it is clear from the above description that various other embodiments are possible within the scope of the present invention. [Industrial Applicability]

[0083] In the present invention, the composition, film thickness, and layer structure of the phase shift mask blank, as well as the manufacturing process and conditions for the phase shift mask using the same, are selected within appropriate ranges, making it possible to provide a phase shift mask on which fine patterns are formed with high precision, suitable for the manufacture of logic devices of 28 nm or less, or memory devices of 30 nm or less. [Explanation of symbols]

[0084] 10. Phase shift mask blank 11... Substrate (substrate) transparent to the exposure wavelength 12. Phase shift film 12a··Phase shift film pattern 13 Protective film (gas permeable protective film) 15. Light-shielding film 16. Resist pattern 100 Phase Shift Mask d1: Phase shift film thickness d2: Thickness of protective film (gas permeable protective film)

Claims

1. A phase shift mask having a circuit pattern and adapted to be exposed with exposure light having a wavelength of 200 nm or less, a transparent substrate; a phase shift film having a circuit pattern formed on the transparent substrate; and a gas permeable protective film formed on an upper surface and a side surface of the phase shift film, the phase shift film is capable of adjusting a predetermined amount of phase and transmittance for the transmitted exposure light, the gas permeable protective film contains at least one selected from tantalum metal, a tantalum compound, tungsten metal, a tungsten compound, tellurium metal, and a tellurium compound; When the thickness of the phase shift film is d1 and the thickness of the gas permeable protective film is d2, d2 is thinner than d1 and is 15 nm or less; the phase shift film contains silicon and at least one element selected from a transition metal, nitrogen, oxygen, and carbon; the transition metal is at least one selected from titanium, vanadium, cobalt, nickel, zirconium, niobium, and hafnium; The tantalum compound contains tantalum and at least one element selected from the group consisting of nitrogen and carbon.

2. 2. The phase shift mask according to claim 1, wherein said phase shift film is resistant to oxygen-containing chlorine-based etching and can be etched with fluorine-based etching.

3. 3. The phase shift mask according to claim 1, wherein said tungsten compound contains tungsten and at least one element selected from the group consisting of oxygen, nitrogen, and carbon.

4. 3. The phase shift mask according to claim 1, wherein said tellurium compound contains tellurium and at least one element selected from the group consisting of oxygen, nitrogen, and carbon.

5. 5. The phase shift mask according to claim 1, wherein said phase shift film and said gas permeable protective film are capable of being subjected to electron beam correction etching using a fluorine-based gas.

6. 6. The phase shift mask according to claim 1, wherein the gas permeable protective film is also formed on the transparent substrate.

7. A phase shift mask having a circuit pattern and adapted to be exposed with exposure light having a wavelength of 200 nm or less, a transparent substrate; a phase shift film having a circuit pattern formed on the transparent substrate; and a gas permeable protective film formed on an upper surface and a side surface of the phase shift film, the phase shift film is capable of adjusting a predetermined amount of phase and transmittance for the transmitted exposure light, The gas permeable protective film contains a tungsten compound, When the thickness of the phase shift film is d1 and the thickness of the gas permeable protective film is d2, d2 is thinner than d1 and is 15 nm or less; The tungsten compound contains tungsten and at least one element selected from the group consisting of oxygen, nitrogen, and carbon.

8. A phase shift mask having a circuit pattern and adapted to be exposed with exposure light having a wavelength of 200 nm or less, a transparent substrate; a phase shift film having a circuit pattern formed on the transparent substrate; and a gas permeable protective film formed on an upper surface and a side surface of the phase shift film, the phase shift film is capable of adjusting a predetermined amount of phase and transmittance for the transmitted exposure light, The gas-permeable protective film contains a tellurium compound, When the thickness of the phase shift film is d1 and the thickness of the gas permeable protective film is d2, d2 is thinner than d1 and is 15 nm or less; The tellurium compound contains tellurium and at least one element selected from the group consisting of oxygen, nitrogen, and carbon.

9. A phase shift mask according to claim 1, wherein d2 is in the range of 2 nm to 8 nm.

10. A phase shift mask to which exposure light having a wavelength of 200 nm or less is applied and which has a circuit pattern, a transparent substrate; a phase shift film having a circuit pattern formed on the transparent substrate; and a gas permeable protective film formed on an upper surface and a side surface of the phase shift film, the phase shift film is capable of adjusting a predetermined amount of phase and transmittance for the transmitted exposure light, the gas permeable protective film contains at least one selected from tantalum metal, a tantalum compound, tungsten metal, a tungsten compound, tellurium metal, and a tellurium compound; a method for manufacturing a phase shift mask, wherein when the thickness of the phase shift film is d1 and the thickness of the gas permeable protective film is d2, d2 is thinner than d1 and d2 is 15 nm or less, forming a phase shift film on the transparent substrate; forming a light-shielding film on the phase shift film; forming a resist pattern on the light-shielding film formed on the phase shift film; forming a pattern on the light-shielding film by oxygen-containing chlorine-based etching after forming the resist pattern; forming a pattern on the phase shift film by fluorine-based etching after forming a pattern on the light-shielding film; removing the resist pattern after forming a pattern in the phase shift film; removing the resist pattern, and then removing the light-shielding film from above the phase shift film on which the pattern has been formed by oxygen-containing chlorine-based etching; a step of forming the gas permeable protective film on the upper surface and side surfaces of the phase shift film on which the pattern is formed after removing the light-shielding film; and a step of inspecting the gas permeable protective film for defects after the gas permeable protective film is formed, When a defect is detected in the defect inspection, the phase shift film and the gas permeable protective film at the defective portion are subjected to electron beam correction etching using a fluorine-based gas.

11. 11. The method for manufacturing a phase shift mask according to claim 10, wherein in the step of forming the gas permeation protective film, the gas permeation protective film is also formed on the exposed transparent substrate.

Images