Recessed heated faceplate
The faceplate design with a flexure and thermal choke accommodates thermal expansion and maintains vacuum integrity at high temperatures, addressing the challenge of structural integrity and vacuum maintenance in substrate processing chambers.
Patent Information
- Application Number
- JP2021505949
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2018-08-06
- Filing Date
- 2019-07-13
- Publication Date
- 2026-01-16
- Estimated Expiration
- 2039-07-13
AI Technical Summary
Existing substrate processing chamber components face challenges in withstanding high temperatures exceeding 350 degrees Fahrenheit, necessitating improved designs to maintain structural integrity and vacuum integrity at elevated temperatures.
The faceplate design incorporates a flexure that partially circumscribes apertures, with a cutout and bores allowing for thermal expansion without overstressing, and uses seals maintained at a lower temperature to prevent thermal degradation, while tubes and caps isolate heater leads from the vacuum.
The design enables faceplates to withstand high temperatures without thermal degradation of seals and maintains vacuum integrity, accommodating thermal expansion and isolating heater leads, thus supporting advanced semiconductor processing.
Smart Images
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Abstract
Description
[Technical Field]
[0001] FIELD OF THE DISCLOSURE
[0001] Embodiments of the present disclosure relate to faceplates for use in substrate processing chambers, and more particularly to thermal chokes for use in heated faceplates. [Background technology]
[0002] In the manufacture of integrated circuits, deposition processes such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) are used to deposit films of various materials on semiconductor substrates. In other processes, layer modification processes such as etching are used to expose portions of the deposited layer for further deposition. Often, these deposition or etching processes are used repeatedly to fabricate various layers of electronic devices such as semiconductor devices.
[0003] As technology advances, new chemistries and processes are used to fabricate increasingly complex circuits and semiconductor devices. Often, these new processes involve higher processing temperatures. Thus, the processing components used to carry out the processes are regularly exposed to high temperatures, such as temperatures in excess of 350 degrees Fahrenheit.
[0004]
[0004] Therefore, there is a need for improved substrate processing chamber components for use at high temperatures. Summary of the Invention
[0005] In one embodiment, the processing chamber has a body with a sidewall and a bottom. A lid is coupled to the body and defines a processing region therein. A faceplate is coupled to the lid. The faceplate has a body with a first surface, a second surface, and an outer surface extending between the first and second surfaces. A plurality of apertures are formed through the body between the first and second surfaces. A flexure is formed in the body surrounding and partially circumscribing the plurality of apertures. A cutout is formed through the body and abuts the flexure. The cutout has a common radius with the flexure.
[0006] In another embodiment, a faceplate for a processing chamber has a body with a first surface, a second surface, and an outer surface extending between the first and second surfaces. A plurality of apertures are formed through the body between the first and second surfaces. A flexure is formed in the body surrounding the plurality of apertures. The flexure partially circumscribes the plurality of apertures. A cutout is formed through the body and abuts the flexure, defining a radially inner surface and a radially outer surface therein. The cutout has a common radius with the flexure.
[0007] In yet another embodiment, a faceplate for a processing chamber has a body with a first surface, a second surface, and an outer surface extending between the first and second surfaces. A plurality of apertures are formed through a central portion of the body between the first and second surfaces. A flexure is formed in the body that partially circumscribes the plurality of apertures. A cutout is formed between the first and second surfaces of the body. A radially inner surface and a radially outer surface are defined within the cutout. The cutout and the flexure are located at a common radius. One or more bores extend between the outer surface of the body and the radially outer surface of the cutout. A tube extends from the radially inner surface of the cutout through each of the one or more bores. A cap is disposed in each of the one or more bores and surrounds a portion of each tube.
[0008]
[0008] In order that the above-described features of the present disclosure may be understood in detail, the above-summarized disclosure will be more particularly described by reference to embodiments, some of which are illustrated in the accompanying drawings. It should be noted, however, that the accompanying drawings merely illustrate exemplary embodiments and therefore should not be considered as limiting the scope of the embodiments, as the present disclosure may admit of other equally effective embodiments. [Brief explanation of the drawings]
[0009] [Figure 1] 1 is a schematic cross-sectional view of a processing chamber according to an embodiment of the present disclosure. [Figure 2]FIG. 10 is a top view of a face plate according to another embodiment of the present disclosure. [Figure 3] FIG. 3 is a cross-sectional view showing a portion of the face plate of FIG. 2. [Figure 4] FIG. 3 is a cross-sectional view showing a portion of the face plate of FIG. 2. [Figure 5] FIG. 3 is a perspective view showing a portion of the face plate of FIG. 2. DETAILED DESCRIPTION OF THE INVENTION
[0010]
[0014] For ease of understanding, where possible, the same reference numerals have been used to designate identical elements common to the figures. It is contemplated that elements and features of one embodiment may be beneficially incorporated in other embodiments without further recitation.
[0011]
[0015] The present disclosure relates to a faceplate for a processing chamber. The faceplate has a body with a plurality of apertures formed therethrough. A flexure is formed in the body that partially circumscribes the plurality of apertures. A cutout is formed through the body at a common radius with the flexure. One or more bores extend from a radially inner surface of the cutout to an outer surface of the body. A heater is disposed between the flexure and the plurality of apertures. A plurality of seals are disposed radially outward of the flexure and are maintained at a temperature lower than the temperature of a central portion of the body.
[0012]
[0016] 1 shows a schematic layout of a processing chamber 100 in partial cross section according to one embodiment. The processing chamber 100 includes a body 102 having a sidewall 104 and a bottom 106. A lid 108 couples to the body 102 to define a process region 110 therein. In one embodiment, the body 102 is formed from a metal such as aluminum or stainless steel. However, any material suitable for use in the processes performed in the process chamber 100 may be used.
[0013]
[0017] A faceplate 136 is coupled to the lid 108. A plurality of apertures 150 are formed through the faceplate 136 and are in fluid communication with the process region 110 via openings 146 formed in the lid 108. A cover plate 132 is coupled to the faceplate 136 to define a plenum 148 therebetween. Gases enter the plenum 148 from the gas panel 140 through inlet ports 160 formed in the cover plate 132. A power supply 154 is in communication with a heater (not shown) located on the faceplate 136 to increase the temperature of the heater. Gases flow from the plenum 148 through the apertures 150 in the heated faceplate 136 to the process region 110.
[0014]
[0018] A substrate support 115 is positioned within the process region 110 to support a substrate W thereon. The substrate support 115 includes a support 114 coupled to a shaft 116. The shaft 116 is coupled to the support 114 and extends out of the chamber body 102 through an opening 118 in the bottom 106. The shaft 116 is coupled to an actuator 120, which vertically actuates the shaft 116 and the support 114 coupled to the shaft 116 between a substrate load position and a processing position. A bellows 190 is coupled to the actuator 120, surrounding the bottom 106 and the shaft 116, and sealing the process region 110 therein. A vacuum system (not shown) is fluidly coupled to the process region 110 through an opening 130 to evacuate effluent from the process region 110.
[0015]
[0019] To facilitate processing of the substrate W in the processing chamber 100, the substrate W is disposed on the support 114 opposite the shaft 116. Optionally, an electrode 126 is disposed within the support 114 and electrically coupled to a power source 128 via the shaft 116. The electrode 126 is selectively biased by the power source 128 to generate an electromagnetic field to electrostatically chuck the substrate W to the support 114. In certain embodiments, the electrode 126 is a heating electrode capable of increasing the temperature of the support 114 and the substrate W supported thereon.
[0016]
[0020] FIG. 2 is a top view of a face plate 200 that can be used as face plate 136 of FIG. 1. Face plate 200 has a circular body 202, although other shapes, such as square or oval, can also be used. Body 202 is formed from a metal, such as aluminum or stainless steel. In one embodiment, body 202 is formed from two portions 202a and 202b (FIGS. 3 and 4), which are joined together by brazing, bonding, or welding, among other methods. A plurality of apertures 204 are formed through body 202 in a central portion 250 of body 202.
[0017]
[0021] Flexure 206 is formed in body 202 and partially circumscribes the plurality of apertures 204. Seal 210 is disposed radially outward from and surrounds flexure 206 on the upper surface 304 (FIGS. 3 and 4) of body 202. A second seal 212 (FIGS. 3 and 4) is similarly disposed on the lower surface 306 (FIGS. 3 and 4) of body 202. In one embodiment, seals 210 and 212 are disposed in respective seal grooves 220 and 222 (FIG. 3). In this configuration, seals 210 and 212 are O-rings formed from an elastomeric material such as polytetrafluoroethylene (PTFE), rubber, or silicone. Other seal designs, such as sheet gaskets or bonds, are also contemplated.
[0018]
[0022] FIG. 3 is a cross-sectional view of a portion of faceplate 200 showing flexure 206. Flexure 206 is formed from a series of interleaved channels 300a, 300b, and 300c formed partially through body 202. Each of channels 300a, 300b, and 300c forms a thin bridge between its end and the respective opposing surface of body 202. For example, channels 300a and 300b extend from top surface 304 of body portion 202a, through body portion 202a, and into body portion 202b. In this embodiment, channels 300a and 300b extend into body portion 202b, but do not extend through the entire thickness of body portion 202b. Thus, channels 300a and 300b extend from top surface 304, through the entire body portion 202a and a portion of body portion 202b, and short of bottom surface 306. Channel 300c extends from the lower surface 306 of body portion 202b through body portion 202b and into body portion 202a. In this embodiment, channel 300c extends into body portion 202a, but less than the entire thickness of body portion 202a. Channel 300c extends from the lower surface 306 through the entire body portion 202b and a portion of body portion 202a short of the upper surface 304. In one embodiment, channels 300a, 300b, and 300c are interleaved such that channel 300c is located between channels 300a and 300b. In the illustrated embodiment, three channels 300a, 300b, and 300c form flexure 206, although other numbers of channels, such as 1, 2, 4, 5, or more, may be used.
[0019]
[0023] The heater 302 is disposed within a groove 310 formed in the portion 202b of the body 202. The heater 302 has heater leads 302a disposed therein. The flexure 206 functions as a thermal choke, limiting heat transfer from areas proximate the heater 302, such as the central portion 250 (FIG. 2), to areas radially outward of the thermal choke, proximate the seals 210, 212. The temperature differential across the flexure 206 can be, for example, 50°F, 100°F, 150°F, or more. Thus, the central portion 250 of the faceplate 200 is heated by the heater 302 to a high temperature, such as 350°F, 400°F, 500°F, or more, while the areas of the entire flexure 200 proximate the seals 210, 212 are maintained at a temperature below the thermal degradation temperature of the seals 210, 212. Exemplary temperatures for the seal are below 250°F, such as about 200°F, or such as about 150°F.
[0020]
[0024] The thermal degradation temperature is considered to be the temperature at which the material used to form the seals 210, 212 begins to thermally degrade. Thus, the seals 210, 212 provide isolation and help maintain a vacuum in the plenum 148 (FIG. 1) and process volume 110 (FIG. 1). It is understood that the seals 210, 212 may be located elsewhere, such as on the surface of the lid 108 or on the cover plate 132 opposite the faceplate 200.
[0021]
[0025] Additionally, faceplate 200 expands as its temperature increases. This thermal expansion can overstress conventional faceplate designs due to insufficient room for thermal expansion, such as constraints imposed by mounting hardware. Flexure 206 accommodates the thermal expansion, allowing faceplate 200 to thermally expand without overstress when heated by heater 302.
[0022]
[0026] 2, flexure 206 is partially circumscribed by a plurality of apertures 204. Cutouts 240 are formed in flexure 206 through body 202. That is, a first end 206a of flexure 206 begins at cutout 240, and a second end 206b of flexure 206 terminates at cutout 240 after traversing the arc of faceplate 200. As shown in the shading in FIG. 4, cutout 240 has a width greater than the width of flexure 206, such that channels 300a, 300b, 300c open into cutout 240 at first end 206a and second end 206b.
[0023]
[0027] The flexure 206 and the cutout 240 form a ring having a circumference that surrounds the aperture 204. In one example, the flexure 206 forms more than 75%, e.g., about 85%, of the circumference of the ring, while the cutout 240 forms the remaining portion of the circumference. In another example, the flexure 206 forms about 95% of the circumference of the ring, and the cutout 240 forms about 5% of the circumference of the ring. The cutout 240 and the flexure 206 are disposed on a common radius. That is, the cutout 240 and the flexure 206 are located at a common radial distance from the center point of the body 202.
[0024]
[0028] FIG. 4 is a cross-sectional view of a portion of faceplate 200 showing cutout 240. As shown, cutout 240 extends through both portions 202a, 202b of body 202 and defines a radially inner surface 402 and a radially outer surface 404 within cutout 240. A bore 408 is formed between outer surface 406 of body 202 and radially outer surface 404 of cutout 240. A tube 410 extends from radially inner surface 402 of cutout 240 through bore 408. Heater lead 302a of heater 302 is disposed within tube 410 and allows communication between the portion of heater 302 disposed within body 202 and an external power source, such as power supply 154 of FIG. 1. In FIG. 4, heater 302 and heater lead 302a are shown as simplified shapes for clarity.
[0025]
[0029] The cap 420 is disposed within the bore 408 to surround a portion of the tube 410. The cap 420 has a tubular extension 424 having a first diameter sized to fit within the bore 408. The cap 420 also has a shoulder 422 having a second diameter larger than the first diameter of the tubular extension 424. The shoulder 422 is seated against the outer surface 406 of the body 202. An opening 426 is formed through the cap 420 and sized to accommodate a portion of the tube 410. The cap 420 occupies a space defined between the bore 408 and the tube 410.
[0026]
[0030] The seal 430 is disposed in a seal groove 430a formed in the shoulder 422 and is compressed between the outer surface 406 and the shoulder 422. Similarly, the seal 432 is disposed in a seal groove 432a in the tubular extension 424 and is compressed between the tubular extension 424 and the tube 410. The seals 430, 432 prevent fluid leakage between the cap 420 and the body 202, thereby facilitating maintenance of a vacuum in the plenum 148 (FIG. 1) and the process region 110 (FIG. 1). The cutout 240 functions as a thermal choke to prevent heat transfer from the heater 302 to the seals 430, 432 disposed in the cap 420. Thus, while the heater 302 heats the central portion of the faceplate 200 to a high temperature, the seals 430, 432 can be maintained below their thermal degradation temperature. It is understood that the seals 430, 432 may be disposed in other locations, such as on the surface of the body 202 opposite the cap 420.
[0027]
[0031] Additionally, the tube 410 isolates the leads 302a of the heater 302 from the vacuum within the plenum 148 (FIG. 1) and the process region 110 (FIG. 1). Therefore, the heater 302 may be coupled to a power source, such as the power source 154 (FIG. 1), that is external to the process region 110 but that may heat the portion of the faceplate 200 exposed to the process region 110. As discussed above, the flexure 206 allows for thermal expansion of the body 202 when heated by the heater 302 without overstressing the body 202. The formation of the bore 408 also allows for thermal expansion of the tube 410 without overstressing it. The cap 420 accommodates the thermal expansion of the tube 410 while maintaining a seal between the tube 410 and the body 202.
[0028]
[0032] 5 is a side view of face plate 200 showing tubes 410 with caps 420 removed. As shown, two tubes 410 extend through respective bores 408 formed in body 202. The bores 408 are disposed within cutouts 240 (shown in shading). It is understood that other numbers of tubes 410 can be used, along with other numbers of bores 408. For example, two tubes 410 can be disposed through a single bore 408.
[0029]
[0033] The embodiments described herein advantageously provide faceplates that can be used in high temperature processes, such as above 350°F. The use of flexures described herein allows faceplates to reach the high temperatures used by advanced processes. The flexures allow for thermal expansion of the faceplate without overstressing it. Additionally, the flexures provide a thermal choke between a central heated portion of the faceplate and a seal located radially outward of the flexure. The seal is maintained at a temperature below the thermal degradation temperature of the material used to form the seal. The tubes and caps described herein are used to house the heater leads and isolate the heater from the vacuum in the processing chamber. The caps advantageously allow for thermal expansion of the tube without overstressing it, helping to maintain the vacuum in the processing chamber.
[0030]
[0034] While the forgoing is directed to embodiments of the present disclosure, other and further embodiments of the present disclosure may be devised without departing from the basic scope thereof, which scope is determined by the following claims.
Claims
1. 1. A processing chamber comprising: a body having a sidewall and a bottom; a lid coupled to the body and defining a processing region therein; a face plate coupled to the lid; wherein the face plate is a body having a first surface, a second surface, and an exterior surface extending between the first surface and the second surface, the body comprising: a central portion having a plurality of apertures formed through the body between the first surface and the second surface and a heater; a ring portion surrounding the central portion, the ring portion having a first ring portion surrounding the plurality of apertures, partially circumscribing the plurality of apertures, and configured to accommodate thermal expansion of the face plate; and a second ring portion abutting a first end and a second end of the first ring portion and having a common radius with the first ring portion, wherein leads from the heater to an exterior of the body are arranged through the second ring portion.
2. 2. The processing chamber of claim 1, wherein the first ring portion forms about 95% of the circumference of the ring portion and the second ring portion forms about 5% of the circumference of the ring portion.
3. 2. The processing chamber of claim 1, wherein the first ring portion includes a channel having an opening in the first surface and a channel having an opening in the second surface, the channels being arranged radially of the body of the faceplate, the channels opening into the second ring portion at the first end and the second end of the first ring portion, respectively.
4. 10. The processing chamber of claim 1, wherein the body of the faceplate includes a first body portion and a second body portion coupled together to form the body.
5. A face plate, a body having a first surface, a second surface, and an exterior surface extending between the first surface and the second surface, the body comprising: a central portion having a plurality of apertures formed through the body between the first surface and the second surface and a heater; a ring portion surrounding the central portion, the ring portion having a first ring portion surrounding and partially circumscribing the plurality of apertures and configured to accommodate thermal expansion of the face plate, and a second ring portion abutting first and second ends of the first ring portion, defining radially inner and outer surfaces therein and having a common radius with the first ring portion, wherein leads from the heater to an exterior of the body are disposed through the second ring portion.
6. 6. The face plate of claim 5, wherein said first ring portion forms approximately 95% of the circumference of said ring portion and said second ring portion forms approximately 5% of the circumference of said ring portion.
7. 6. The face plate of claim 5, wherein the first ring portion includes a channel having an opening in the first surface and a channel having an opening in the second surface, arranged radially of the body of the face plate, the channels opening into the second ring portion at the first end and the second end of the first ring portion, respectively.
8. The face plate of claim 5 , wherein the body of the face plate includes a first body portion and a second body portion joined together to form the body.
9. 6. The face plate of claim 5, further comprising a first seal groove formed in said first surface and a second seal groove formed in said second surface, said first seal groove and said second seal groove circumscribing said first ring portion and said second ring portion.
10. A face plate, a body having a first surface, a second surface, and an exterior surface extending between the first surface and the second surface, the body comprising: a central portion having a heater and a plurality of apertures formed through a central portion of the body between the first surface and the second surface; a ring portion surrounding the central portion, the ring portion having a first ring portion that partially circumscribes the plurality of apertures and is configured to accommodate thermal expansion of the face plate, and a second ring portion formed between the first surface and the second surface of the body and abutting first and second ends of the first ring portion, the second ring portion defining radially inner and outer surfaces therein and having a common radius with the first ring portion; a main body comprising: one or more bores extending between the outer surface of the body and the radially outer surface of the second ring portion; a tube extending from the radially inner surface of the second ring portion through each of the one or more bores, the tube having disposed therein leads from the heater to the exterior of the body; a cap disposed in each of the one or more bores and surrounding a portion of each tube; A face plate comprising:
11. 11. The face plate of claim 10, further comprising a first seal groove formed in the first surface and a second seal groove formed in the second surface, the first seal groove and the second seal groove circumscribing the first ring portion and the second ring portion.
12. 11. The face plate of claim 10, wherein the first ring portion includes a channel having an opening in the first surface and a channel having an opening in the second surface, arranged radially about the body of the face plate, the channels opening into the second ring portion at the first end and the second end of the first ring portion, respectively.
13. The faceplate of claim 10 , wherein the first ring portion functions to limit heat transfer from the central portion of the body radially outward of the first ring portion.
14. The face plate of claim 10 , wherein each cap comprises a shoulder and a tubular extension.
15. The faceplate of claim 10 , wherein the second ring portion functions to limit heat transfer from the central portion of the body to the cap.
16. 11. The face plate of claim 10, wherein the first ring portion forms approximately 95% of the circumference of the ring portion and the second ring portion forms approximately 5% of the circumference of the ring portion.