Flash glass and its manufacturing method, and electronic device housing and its manufacturing method

Abstract

The flash glass includes a glass body (10), a first surface (10a) of the glass body (10) includes a plurality of first frosted regions (101) distributed at intervals, two adjacent first frosted regions (101) are connected by a second frosted region (102), the first frosted region (101) and the second frosted region (102) are linear strips, the first frosted region (101) has a plurality of first protrusion structures (11), the second frosted region (102) has a plurality of second protrusion structures (12), the first protrusion structures (11) and the second protrusion structures (12) each independently include at least one edge, and the height and length of the second protrusion structures (12) are both smaller than the first protrusion structures (11). Also provided are a method for manufacturing the flash glass and an electronic device housing including the flash glass.

Description

[Technical Field]

[0001] This application claims priority to a Chinese patent application bearing application number 202210049208.7 and entitled "Flash glass and its manufacturing method, and electronic device housing," filed with the State Intellectual Property Office of the People's Republic of China on January 17, 2022, the entire contents of which are incorporated herein by reference.

[0002] The present application relates to the technical field of glass processing, and more particularly to flash glass and its manufacturing method, and electronic device housings. [Background technology]

[0003] With the continuous development of electronic devices such as mobile phones and laptops, users' requirements for the appearance of electronic device housings are also becoming increasingly higher. Glass is a commonly used housing material for electronic devices, and can be used, for example, as a cover plate or back plate. However, glass currently available on the market has a monotonous appearance and cannot meet the diverse aesthetic needs of users, resulting in weak product competitiveness. Summary of the Invention [Problem to be solved by the invention]

[0004] In view of this, the present application provides a flash glass that can exhibit various flash effects with different flash levels, thereby improving the appearance of electronic device housings that use the flash glass and increasing product competitiveness. [Means for solving the problem]

[0005] Specifically, in a first aspect, the flash glass of the present application includes a glass body, the glass body including a first surface having a texture, the first surface including a plurality of first frosted regions distributed at intervals, two adjacent first frosted regions being connected by a second frosted region, the first frosted region and the second frosted region being linear strips, the first frosted region including a plurality of first protrusion structures, the second frosted region including a plurality of second protrusion structures, the first protrusion structures and the second protrusion structures independently including at least one ridge, and the height and length of the second protrusion structures being both smaller than the first protrusion structures.

[0006] The first surface of the flash glass has a frosted effect and two types of alternating linear strip-shaped frosted areas, and the protrusion structures that make up the two types of frosted areas have different heights and lengths. When light is irradiated onto the first surface of the flash glass, the two types of protrusion structures, each with at least one edge, can reflect the light in different directions, thereby creating a sparkling appearance and presenting various flash effects with different flash levels, greatly improving the appearance.

[0007] In a second aspect, a method for producing flash glass according to the present application includes: performing a first frost etching on a first surface of the glass body to form a plurality of first protrusion structures on the first surface, each protrusion structure including at least one ridge; forming a photoresist pattern on the first surface after the first frost etching, the photoresist pattern being a plurality of parallel, spaced apart strips; and performing a second frost etching on the first surface having the photoresist pattern thereon to convert the portions of the first surface not covered by the photoresist pattern into second frost regions having a plurality of second protrusion structures, and then removing the photoresist pattern to obtain first frost regions having a plurality of first protrusion structures on the surface between adjacent second frost regions, wherein the second protrusion structures include at least one ridge and are both smaller in height and length than the first protrusion structures.

[0008] The above-mentioned method for manufacturing flash glass is simple to operate, and the flash glass manufactured by this method has a frosted effect and can exhibit various flash effects with different flash degrees when irradiated with light, improving the visual impression of the user.

[0009] In a third aspect, an electronic device housing according to the present application includes the flash glass according to the first aspect of the present application, or a flash glass manufactured by the manufacturing method according to the second aspect of the present application. [Effects of the Invention]

[0010] The electronic device housing including the flash glass has a stylish and cool appearance effect, and can improve the appearance expressiveness and product competitiveness of the electronic device. [Brief explanation of the drawings]

[0011] [Figure 1] 1 is a metallurgical microscope photograph of a flash glass according to an example of the present application. [Figure 2] 1 is a cross-sectional schematic view of a flash glass according to an embodiment of the present application. [Figure 3] 1 is a flowchart of a method for manufacturing flash glass according to one embodiment of the present application. [Figure 4] 1 is a metallurgical microscope photograph of a glass body after a first frost etching according to Example 1 of the present application. [Figure 5]5 is a metallurgical microscope photograph of the glass body of FIG. 4 after a photoresist pattern has been formed on the surface thereof. [Figure 6] 6 is a metallurgical microscope photograph of the flash glass obtained after a second frost etch is performed on the glass body of FIG. 5. [Figure 7] FIG. 2 is a diagram showing the appearance effect of the flash glass of Example 1 of the present application. [Figure 8] FIG. 5 is a diagram showing the appearance effect of the glass body of FIG. [Figure 9] FIG. 10 is a diagram showing the appearance effect of the flash glass in Example 5 of the present application. DETAILED DESCRIPTION OF THE INVENTION

[0012] The following description is an exemplary embodiment of the present application, and it should be noted that those skilled in the art can make some further improvements and modifications without departing from the principles of the present application, and these improvements and modifications are also deemed to be within the protection scope of the present application.

[0013] FIG. 1 is a metallurgical microscope photograph of a flash glass according to an embodiment of the present application. FIG. 2 is a cross-sectional schematic diagram of a flash glass according to an embodiment of the present application. As shown in FIGS. 1 and 2, a flash glass 100 according to an embodiment of the present application includes a glass body 10. The glass body 10 has a first surface 10a. The first surface 10a includes a plurality of first frosted regions 101 spaced apart from one another. Two adjacent first frosted regions 101 are connected by a second frosted region 102. The first frosted regions 101 and the second frosted regions 102 are linear strips. The first frosted regions 101 include a plurality of first protrusion structures 11. The second frosted regions 102 include a plurality of second protrusion structures 12. The first protrusion structures 11 and the second protrusion structures 12 each include at least one ridge. The height and length of the second protrusion structures 12 are both smaller than those of the first protrusion structures 11. In the present application, the first protrusion structure may be referred to as a "large protrusion" and the second protrusion structure may be referred to as a "small protrusion."

[0014] The first surface 10a of the flash glass has two alternating linear strip-shaped frosted regions, each with a different height and length of protrusions, creating a frosted effect on the first surface. When light is irradiated onto the first surface of the flash glass, the two protrusion structures, each with at least one edge, reflect the light off the side of each edge. The different angles of the side of each edge allow the light to be reflected in different directions, creating a sparkling appearance. The combined reflection of the two protrusion structures creates a variety of flash effects with different flash levels, improving the gradation and flexibility of the flash effect, enriching the visual effect of the flash glass, and improving its aesthetic appearance. Furthermore, the alternating linear strip-shaped arrangement of the first frosted region 101, each with a plurality of first protrusion structures 11, and the second frosted region 102, each with a plurality of second protrusion structures 12, enhances the decorative effect of the glass and improves the market prospects for the flash glass. Furthermore, the presence of multiple first protrusion structures 11 and multiple second protrusion structures 12 reduces the contact area between a person's finger and the glass surface, improving the effect of preventing fingerprints from being left on the glass, improving the diffuse reflection effect of the glass, and improving the anti-glare effect.

[0015] In the present application, when the first surface 10a is irradiated with light, flash points are formed on the first protrusion structure 11 and the second protrusion structure 12, specifically, on the side surfaces of the ridges of each protrusion structure.

[0016] In the present application, the phrase "the protrusion structure includes at least one edge" refers to the protrusion structure including at least two intersecting faces that are oriented in different directions, and the intersection (also referred to as "connection") of the two faces forms an edge. The protrusion structure has a shape similar to a diamond, and can effectively perform mirror reflection, thereby creating a sparkling appearance. Specifically, the shape of the protrusion structure having at least one edge includes, but is not limited to, a prism (e.g., a triangular prism, a square prism, a pentagonal prism, a hexagonal prism, etc.), a truncated pyramid (e.g., a triangular pyramid, a square pyramid, a pentagonal pyramid, etc.), a cube, a pyramid (e.g., a triangular pyramid, a square pyramid), or similar structures. In some embodiments of the present application, the shapes of the first protrusion structure 11 and the second protrusion structure 12 may independently include a prism, a truncated pyramid, etc., and specifically may include a triangular prism, a triangular pyramid, etc.

[0017] In an embodiment of the present application, the morphologies of the first protrusion structure 11 and the second protrusion structure 12 independently belong to at least one of a hexagonal crystal form, a cubic crystal form, a trigonal crystal form, a tetragonal crystal form, and an orthorhombic crystal form. A protrusion structure having such a crystal form has an improved flash effect under light irradiation conditions, which is advantageous in improving the aesthetic appearance. The cubic crystal form is also called an isometric crystal form. The orthorhombic crystal form is also called an orthorhombic crystal form. Note that the phrase "the morphology of the protrusion structure belongs to at least one of a hexagonal crystal form, a cubic crystal form, a trigonal crystal form, a tetragonal crystal form, and an orthorhombic crystal form" should be understood in a broad sense. That is, the morphology of the protrusion structure does not necessarily completely match a hexagonal crystal form, a cubic crystal form, a trigonal crystal form, or a tetragonal crystal form; it is sufficient if it approximately matches the above crystal forms, and a certain degree of deviation is allowed.

[0018] As can be seen, at least one surface of the glass body 10 has the first frosted region 101 and the second frosted region 102. 2 As shown in FIG. 1, the glass body 10 has a first surface 10a and a second surface 10b on opposite sides. 2Although the first surface 10a has been illustrated as having the first frosted region 101 and the second frosted region 102, it is understood that the second surface 10b may or may not have the first frosted region 101 and the second frosted region 102, and is not limited thereto. Also, in this application, the terms "first" and "second" are used for explanatory purposes only.

[0019] In the present application, the height of the first protrusion structures 11 is greater than the height of the second protrusion structures 12, and the length of the first protrusion structures 11 is greater than the length of the second protrusion structures 12. In an embodiment of the present application, the length of the first protrusion structures 11 may be in the range of 100 μm to 150 μm, and the height may be in the range of 10 μm to 16 μm. In an embodiment of the present application, the length of the second protrusion structures 12 may be in the range of 30 μm to 60 μm, and the height may be in the range of 3 μm to 6 μm.

[0020] By controlling the length of the first protrusion structures 11 within the above range, the cut surface can have a protrusion shape similar to that of a diamond, with excellent light reflection and diffused reflection effects, and the first frosted region can have a good frosted feel. By controlling the height of the first protrusion structures 11 within the above range, the first protrusion structures 11 can have an appropriate three-dimensional effect, improve the appearance of the first frosted region, enhance fingerprint prevention and anti-glare properties, and ensure a comfortable grip without affecting these. In embodiments of the present application, the length-to-height ratio of the first protrusion structures 11 is within a range of 6 to 15, and in some embodiments, the length-to-height ratio is within a range of 8 to 15.

[0021] By controlling the length and height of the second protrusion structures 12 within the above range, they can be distinguished from the first protrusion structures 11, and the two different protrusion structures ensure that the glass flash effect is enriched. The length of the second protrusion structures 12 ensures that there are many second protrusion structures closely arranged in the second frosted area, ensuring high brightness of the flash points on the glass surface and a delicate flash effect, and also improving the anti-fingerprint effect. The narrower height range ensures high uniformity in the shape of the second protrusion structures 12 and uniformity in the flash effect caused by the second protrusion structures 12. In this embodiment, the ratio of the length to the height of the second protrusion structures 12 is within the range of 5 to 20. In this case, the variation in height is due to the second protrusion structures 12 In some embodiments, the length to height ratio may be in the range of 6 to 15, specifically in the range of 6 to 10.

[0022] The first protrusion structure 11 has a length equal to the maximum distance between any two points on the contour line of its orthogonal projection onto the second surface 10b, and a height equal to the Top and bottom Specifically, the length of the first protrusion structure 11 may be 105 μm, 110 μm, 115 μm, 120 μm, 130 μm, 140 μm, 145 μm, 150 μm, etc. The height of the first protrusion structure 11 may be 10 μm, 11 μm, 12 μm, 13 μm, 14 μm, 15 μm, 16 μm, etc.

[0023] Similarly, the second protrusion structure 12 has a length that is the maximum distance between any two points on the contour line of its orthogonal projection onto the second surface 10b, and a height that is the maximum distance between any two points on the contour line of its orthogonal projection onto the second surface 10b. Top and bottom Specifically, the length of the second protrusion structure 12 may be 32 μm, 40 μm, 45 μm, 50 μm, 55 μm, 60 μm, etc. The height of the second protrusion structure 12 may be 3 μm, 3.5 μm, 4 μm, 5 μm, 5.5 μm, 6 μm, etc.

[0024] In the present application, adjacent first protrusion structures 11 or adjacent second protrusion structures 12 may be seamlessly connected (i.e., adjacent) or may have a certain gap therebetween. In the embodiment of the present application, adjacent first protrusion structures 11 are adjacent to each other, and adjacent second protrusion structures 12 are adjacent to each other. This ensures a rich flash effect and a good gripping feel on the first surface having the first frosted region 101 and the second frosted region 102.

[0025] In the present embodiment, the width of the first frosted regions 101 is 100 μm to 500 μm, and the width of the second frosted regions 102 is 100 μm to 500 μm. The first frosted regions 101 are arranged parallel to one another in a first direction, that is, they extend along the first direction. The first direction may be the length direction, width direction, or other linear direction of the glass body 10. In this case, the width of the first frosted region 101 is the size of its orthogonal projection onto the second surface 10b along a direction perpendicular to the first direction. The definition of the width of the second frosted region 102 is similar. As can be understood, the width of the second frosted region 102 is the spacing between two adjacent first frosted regions 101, and the width of the first frosted region 101 is the spacing between two adjacent second frosted regions 102. Since the height and length of the first protrusion structures 11 are both greater than those of the second protrusion structures 12, the first frosted region may be referred to as a "protrusion region" and the second frosted region may be referred to as a "recessed region" accordingly. The width of the first frosted region 101 may or may not be equal to the width of the second frosted region 102.

[0026] By controlling the widths of the first frosted region 101 and the second frosted region 102 within the above ranges, the two frosted regions can be spaced apart and a large number of corresponding protrusion structures can be ensured, which in turn ensures that the flash glass has a rich flash effect and anti-glare effect, and also provides a good three-dimensional effect, a comfortable grip, anti-fingerprint effects, etc. In some embodiments, the widths of the first frosted region 101 and the second frosted region 102 can be independently 100 μm, 110 μm, 130 μm, 140 μm, 150 μm, 200 μm, 250 μm, 300 μm, 400 μm, 450 μm, or 500 μm, etc.

[0027] In some embodiments of the present application, the haze of the second frosted region is greater than the haze of the first frosted region. In some embodiments of the present application, the first frosted region 101 has a haze in the range of 80% to 90% and a light transmittance in the range of 75% to 93%, and the second frosted region 102 has a haze in the range of 90% to 95% and a light transmittance in the range of 75% to 93%.

[0028] When the haze of the two frosted regions is within the above range, the glass produces a dim visual effect, improves aesthetics, and achieves excellent anti-glare and anti-fingerprint effects, while also providing a sparkling appearance effect, providing a strong visual impact.When the light transmittance of the two frosted regions is within the above range, these frosted regions have a matte effect, and their respective transmittances are improved, improving transparency and enhancing the appearance expression.

[0029] In some embodiments of the present application, the light transmittance of the first frosted region 101 and the second frosted region 102 is independently in the range of 80% to 90%, and in some embodiments, the light transmittance of the first frosted region 101 and the second frosted region 102 is independently in the range of 85% to 90%.

[0030] In some embodiments of the present application, the roughness Ra of the first frosted region 101 is greater than the roughness Ra of the second frosted region 102. In some embodiments, the roughness Ra of the first frosted region 101 is in the range of 1.5 μm to 4 μm, and the roughness Ra of the second frosted region 102 is in the range of 0.3 μm to 1 μm. The first frosted region 101, which has a greater roughness, improves the flash effect and anti-glare effect, as well as providing a clear feel and improved anti-fingerprint and anti-slip effects, while the second frosted region 102, which has a lesser roughness, improves the frost effect and provides a finer and more uniform flash effect. Specifically, the surface roughness Ra of the first frost region 101 may be, but is not limited to, 1.8 μm, 2 μm, 2.1 μm, 2.3 μm, 2.5 μm, 2.7 μm, 2.8 μm, 3 μm, 3.2 μm, 3.5 μm, or 3.9 μm. The surface roughness Ra of the second frost region 102 may be, but is not limited to, 0.4 μm, 0.45 μm, 0.5 μm, 0.6 μm, 0.7 μm, 0.8 μm, 0.9 μm, or 0.95 μm. In some embodiments, the roughness Ra of the first frost region 101 is in the range of 2 μm to 3 μm, and the roughness Ra of the second frost region 102 is in the range of 0.45 μm to 0.8 μm. In some embodiments, the roughness Ra of the second frost region 102 is in the range of 0.45 μm to 0.6 μm.

[0031] The examples of the present application further provide a method for producing flash glass that can produce the flash glass described in any of the above embodiments.

[0032] As shown in FIGS. 3 and 4, the method for manufacturing flash glass according to the embodiment of the present application includes the following steps S10, S20, and S30.

[0033] In S10, a first frost etching is performed on the first surface 10a of the glass body 10. 10a forming a plurality of first protrusion structures 11, each of which includes at least one ridge, on the surface of the substrate; In step S20, a plurality of parallel, spaced apart strip-shaped photoresist patterns 30 are formed on the first surface 10a after the first frost etching; In S30, a second frost etching is performed on the first surface 10a with the photoresist pattern 30 to form a plurality of second protrusion structures 12 in the portions of the first surface not covered by the photoresist pattern 30 (i.e., to convert them into second frosted regions 102 having a plurality of second protrusion structures 12), and then the photoresist pattern 30 is removed to obtain a flash glass. The first surface 10a of the flash glass includes the second frosted regions 102 and a first frosted region 101 having a plurality of first protrusion structures 11, the first frosted region 101 and the second frosted region 102 being linear strips and spaced apart, two adjacent first frosted regions 101 being connected by the second frosted region 102, and the second protrusion structures 12 including at least one edge and both having a height and a length smaller than the first protrusion structures 11.

[0034] In some embodiments of the present application, a step of providing a protective layer on the surface of the glass body that is not to be frost-etched to prevent contact with the frost liquid may be further included before the first frost etching. For example, as shown in FIG. 3, an acid-resistant protective layer 20 may be provided on the second surface 10b of the glass body 10 opposite to the first surface 10a. Accordingly, step S 30 After the second frost etching is completed, the acid-resistant protective layer 20 needs to be removed. The acid-resistant protective layer 20 may be an acid-resistant polymer film (e.g., polyethylene terephthalate (PET)), an ink layer, or the like. Preferably, the thickness of the acid-resistant protective layer 20 may be 20 μm to 50 μm. The method for removing the acid-resistant protective layer 20 may be a physical removal method such as sand milling or grinding, or a chemical removal method such as alkaline etching.

[0035] In step S10, after the first frost etching, the entire first surface 10a is frosted and has a plurality of first protrusion structures 11. In some embodiments, the first surface 10a includes a plurality of closely spaced first protrusion structures 11. In this case, the first surface 10a may be referred to as a "frosted surface."

[0036] The frost liquid used in the first frost etching (hereinafter collectively referred to as "first frost liquid") includes metaaluminate, nitric acid, hydrochloric acid, sulfuric acid, ammonium bifluoride, and water. In some embodiments, the first frost liquid further includes an organic acid.

[0037] In the first frosting liquid, nitric acid, hydrochloric acid, and sulfuric acid mainly generate hydrogen ions to provide a strong acidic environment, and ammonium hydrogen fluoride etches the glass surface in the strong acidic environment and forms fluorosilicic acid radicals together with silicon elements in the glass. The fluorosilicic acid radicals react with metal ions (e.g., Na) in the glass to form a fluorosilicic acid radical. + , K. + , Li + , Mg 2+ , Al 3+ , Ca 2+(e.g., etc.) to form fluorosilicates. The sparingly soluble or insoluble fluorosilicates are deposited and attached to the glass surface in the manner of growing microcrystalline nuclei, forming polygonal shielding crystals. This inhibits etching of the glass surface where the shielding crystals are formed, while the areas without the shielding crystals continue to be etched. The frosting solution gradually etches inward along the periphery of the shielding crystals, i.e., the frosting solution etches along the contours of the shielding crystals. After the frost etching is complete, the shielding crystals attached to the glass surface are removed by a cleaning process, resulting in an etched glass with a plurality of protrusion structures on the surface, thereby restoring the original smooth and transparent surface of the glass body to a frosted and flashed effect. Metaaluminates can adjust the size and distribution of the fluorosilicate shielding crystals and control the size and distribution of the primary protrusion structures, thereby adjusting the frosted and flashed effects on the glass surface. Hydrochloric acid and sulfuric acid can control the rate of crystal precipitation by adjusting the hydrogen ion concentration. The presence of an organic acid stabilizes the acidity of the frosting liquid, improves the dispersibility of each component in the frosting liquid in the system, ensures that the frosting liquid can be stored for a long time, promotes the uniform distribution of fluorosilicic acid crystals on the glass surface, and further ensures the uniform distribution of the primary protrusion structures.

[0038] In some embodiments of the present application, the first frosting liquid contains, by weight, 1 to 3 parts metaaluminate, 25 to 40 parts nitric acid, 1 to 3 parts hydrochloric acid, 0.5 to 1.5 parts sulfuric acid, 20 to 40 parts ammonium bifluoride, 1 to 3 parts organic acid, and water. In some embodiments, the weight parts of water contained in the first frosting liquid may be 10 to 30 parts. The appropriate water content not only ensures sufficient dissolution of each component, but also allows the fluorosilicate produced in the etching process to adhere to the glass body, crystallize, and grow, thereby providing a shielding effect.

[0039] By controlling the metaaluminate content in the first frosting liquid within the above-mentioned low range, the size of the fluorosilicate crystals formed during the etching process can be increased, which helps to form primary protrusion structures with larger lengths and widths, and also ensures that the fluorosilicate crystals are regularly aggregated and deposited on the glass surface and connected in a sheet-like manner, and further ensures that the primary protrusion structures are regularly and tightly distributed.In addition, when the ammonium bifluoride content is within the above-mentioned range, the mass ratio of ammonium bifluoride to metaaluminate is appropriate, which helps to regularly arrange the fluorosilicate crystals, and also ensures that the ammonium bifluoride is sufficiently dissolved in the frosting liquid and does not precipitate, which can prevent large differences in the flash effect at different positions on the glass surface due to the influence on the fluorosilicate crystals.

[0040] Specifically, in the first frost liquid, the weight parts of metaaluminate may be 1.1 parts, 1.2 parts, 1.5 parts, 1.8 parts, 2 parts, 2.5 parts, 2.8 parts, or 3 parts, etc.; the weight parts of ammonium hydrogen fluoride may be 22 parts, 25 parts, 30 parts, 32 parts, 35 parts, or 38 parts, etc.; the weight parts of nitric acid may be 25 parts, 27 parts, 30 parts, 32 parts, 35 parts, or 38 parts, etc.; the weight parts of sulfuric acid may be 0.8 parts, 1 part, 1.2 parts, or 1.4 parts, etc.; and the weight parts of hydrochloric acid or organic acid may independently be 1.1 parts, 1.2 parts, 1.5 parts, 1.8 parts, 2 parts, 2.5 parts, 2.8 parts, or 3 parts, etc. In some embodiments, in the first frost liquid, the parts by weight of ammonium hydrogen fluoride is 30 to 38 parts, and the parts by weight of nitric acid is 30 to 38 parts.

[0041] The metaaluminate may include at least one of magnesium metaaluminate, sodium metaaluminate, potassium metaaluminate, and calcium metaaluminate. In some embodiments of the present application, the metaaluminate in the first frosting liquid is magnesium metaaluminate. A frosting liquid including magnesium metaaluminate can ensure that the size of the fluorosilicate shielding crystals is large during the etching process and can help form large-sized protrusion structures on the glass surface. The organic acid may include at least one of tartaric acid, citric acid, sorbic acid, sulfamic acid, and maleic acid. In some embodiments, the organic acid is tartaric acid.

[0042] In an embodiment of the present application, the first frost etching may be performed by leaving the glass at 25 to 30°C for 2 to 5 minutes. The leaving condition helps fluorosilicic acid crystals to uniformly and stably adhere and grow on the glass surface to achieve a uniform and effective shielding effect. Specifically, the temperature of the first frost etching may be 25°C, 27°C, 28°C, or 30°C, for example. The first frost etching does not have high temperature requirements, and etching of the glass can be performed at room temperature, reducing process costs. The time period for the first frost etching may be 2 minutes, 2.5 minutes, 3 minutes, 4 minutes, or 4.5 minutes, for example.

[0043] In step S20, the photoresist patterns 30 distributed at intervals may be formed by a photolithography process, which specifically includes steps S201 and S202.

[0044] In step S201, a photoresist layer is formed on the first surface after the first frost etching; In step S202, the photoresist layer is exposed and developed to remove a portion of the photoresist layer, thereby obtaining a plurality of parallel, spaced apart strip-shaped photoresist patterns.

[0045] A photoresist layer may be formed after coating and drying, which completely covers the first surface of the glass body after the first frost etching. Preferably, the thickness of the photoresist layer (i.e., the thickness of the photoresist pattern) is 3 μm to 10 μm, specifically, 4 μm, 5 μm, 6 μm, 7 μm, 8 μm, or 9 μm. In some embodiments, the thickness is 6 μm to 8 μm. The coating method may be brush coating, spray coating, knife coating, spin coating, or the like. Drying can volatilize the solvent in the photoresist used to form the photoresist layer and reduce its fluidity. Preferably, the temperature of the drying treatment may be 80 to 120°C, for example, 90°C, 100°C, or 110°C.

[0046] Exposure can cause the photosensitive component in the photoresist layer to undergo a crosslinking reaction, forming a crosslinked structure, which then allows the exposed area to be dissolved in a developer (if the photoresist is a positive photoresist) or the unexposed area to be dissolved in a developer (if the photoresist is a negative photoresist). The exposure method can be conventional exposure (irradiating the photoresist layer with ultraviolet light through a designated mask plate) or LDI (Laser Direct Imaging). LDI does not require exposure using a mask plate; the desired image is directly formed using a laser scanning method, and the image displayed after development is precise and diverse in shape.

[0047] The developer used for development is usually an alkaline solution. Specifically, solutions of inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, and aqueous ammonia may be used, or organic bases such as tetramethylammonium hydroxide (TMAH), trimethylamine, and triethanolamine may be used. In some specific examples, the developer may be a KOH solution with a conductivity of 30 to 50 mS / cm or a TMAH solution with a concentration of 2.38%. In the development process, the developer may be sprayed onto one side of the glass body, or the glass body may be immersed in the developer. The development time may be 2 to 10 minutes. In some embodiments, a post-baking treatment may be performed after development to improve the curing of the photoresist pattern and its adhesion, hardness, etc. The post-baking treatment may be performed at a temperature of 140°C to 180°C (e.g., 150°C or 160°C) for 20 to 50 minutes (e.g., 30 minutes, 45 minutes, etc.).

[0048] In the present application, the shape of the photoresist pattern 30 projected onto the second surface 10b of the glass body 10 is strip-shaped. In the present embodiment, the maximum cross-sectional width W1 of the photoresist pattern 30 is 100 μm to 500 μm, and the spacing distance W2 between two adjacent photoresist patterns 30 is 100 μm to 500 μm. The maximum cross-sectional width here refers to the maximum lateral size of the photoresist pattern 30, i.e., the maximum width of the cross section in a direction perpendicular to the extension direction of the photoresist pattern 30 (i.e., the width direction). Specifically, it refers to the maximum distance between any two points on the outline of the photoresist pattern 30 orthogonally projected onto the second surface 10b of the glass body. The "spacing distance between two adjacent photoresist patterns 30" refers to the minimum distance between two points on the outline of the photoresist pattern 30 orthogonally projected onto the glass body.

[0049] By controlling the maximum cross-sectional width and spacing of the photoresist pattern 30 within the above ranges, the first frosted region 101 and the second frosted region 102 having large widths and large spacings can be formed after the second frost etching, and these two frosted regions can be guaranteed to have many protrusion structures, thereby enhancing the glass flash effect and improving the anti-fingerprint effect, etc. Specifically, W1 and W2 of the photoresist pattern 30 can be independently 100 μm, 110 μm, 130 μm, 140 μm, 150 μm, 200 μm, 300 μm, 400 μm, or 500 μm, etc.

[0050] In some embodiments of the present application, in step S30, the frost liquid used in the second frost etching (hereinafter collectively referred to as "second frost liquid") includes metaaluminate, nitric acid, hydrochloric acid, sulfuric acid, ammonium bifluoride, and water. 2 The frost liquid further contains an organic acid. In an embodiment of the present application, the mass percentage of metaaluminate in the second frost liquid is greater than the mass percentage of metaaluminate in the frost liquid used in the first frost etching. Therefore, when the second frost etching is performed, the first protrusion structures formed in the first frost etching can be etched and converted into many small protrusion structures (i.e., second protrusion structures).

[0051] In some embodiments of the present application, the second frosting fluid contains, by weight, 5 to 10 parts metaaluminate, 25 to 40 parts nitric acid, 1 to 3 parts hydrochloric acid, 0.5 to 1.5 parts sulfuric acid, 20 to 40 parts ammonium bifluoride, 1 to 3 parts organic acid, and water. In some embodiments, the weight parts of water contained in the second frosting fluid may be 10 to 30 parts. The appropriate water content not only ensures sufficient dissolution of each component, but also allows the fluorosilicate produced in the etching process to smoothly precipitate from the frosting fluid and adhere to the glass body, thereby providing a shielding effect.

[0052] The mechanism of action of the second frosting liquid is the same as that of the first frosting liquid, and therefore will not be described here. By controlling the metaaluminate content in the second frosting liquid within the above-mentioned high range, the size of the fluorosilicate crystals formed during the etching process can be reduced, i.e., the area of ​​the shielding generated by the reaction can be reduced, which is helpful in forming second protrusion structures with smaller length and width, thereby increasing the brightness of the flash points on the glass surface and making the flash effect more delicate.

[0053] The metaaluminate in the second frost liquid may include at least one of magnesium metaaluminate, sodium metaaluminate, potassium metaaluminate, and calcium metaaluminate. In some embodiments of the present application, the metaaluminate in the second frost liquid is sodium metaaluminate or potassium metaaluminate. Sodium metaaluminate or potassium metaaluminate not only have high solubility but also can provide good stability to the frost liquid. When sodium metaaluminate is used, the particle size of the protrusion structures formed on the glass surface by the frost liquid is smaller than when potassium metaaluminate is used, and the degree of flashing on the glass surface is higher than when potassium metaaluminate is used. In some specific embodiments, the metaaluminate in the second frost liquid is sodium metaaluminate. Compared to potassium metaaluminate, when using a frost liquid containing sodium metaaluminate, the etching rate is slightly slower, which is more conducive to etching finer protrusion structures and reduces the probability of structural collapse when etching the portions of the first protrusion structures 11 not covered by the photoresist pattern 30 to form the second protrusion structures 12.

[0054] Specifically, in the second frost liquid, the weight parts of metaaluminate may be 5 parts, 5.5 parts, 6 parts, 7 parts, 8 parts, 9 parts, 9.5 parts, or 10 parts, etc. The weight parts of ammonium hydrogen fluoride may be 22 parts, 25 parts, 30 parts, 32 parts, 35 parts, or 38 parts, etc. The weight parts of nitric acid may be 25 parts, 27 parts, 30 parts, 32 parts, 35 parts, or 38 parts, etc. The weight parts of sulfuric acid may be 0.8 parts, 1 part, 1.2 parts, or 1.4 parts, etc. The weight parts of hydrochloric acid or organic acid may independently be 1.1 parts, 1.2 parts, 1.5 parts, 1.8 parts, 2 parts, 2.5 parts, 2.8 parts, or 3 parts, etc. In some embodiments, in the second frost liquid, the weight parts of ammonium hydrogen fluoride are 30 to 38 parts, and the weight parts of nitric acid are 30 to 38 parts.

[0055] Similar to the first frost etching, the second frost etching may be performed by leaving the solution at 25 to 30°C for 2 to 5 minutes. The leaving condition helps fluorosilicic acid crystals to adhere and grow uniformly and stably on the glass surface, thereby achieving a uniform and effective shielding effect. Specifically, the temperature of the second frost etching may be 25°C, 27°C, 28°C, or 30°C. The frost solution does not have high temperature requirements, allowing etching of glass at room temperature, reducing process costs. The time for the second frost etching may be 2 minutes, 2.5 minutes, 3 minutes, 4 minutes, or 4.5 minutes.

[0056] In step S30, the first frosted region is formed after a first frost etching is performed on the glass surface, and the second frosted region is formed after the first frost etching and the second frosted region are sequentially performed on the glass surface. The material of the first frosted region 101 and the second frosted region 102 is the same as the material of the glass body 10.

[0057] In the second frost etching process of step S30, the portion of the glass surface covered by the photoresist pattern 30 is hardly affected by the etching by the second frost solution, indicating that the photoresist pattern 30 is resistant to acid etching. Therefore, the photoresist pattern can be removed using an alkaline solution. In some embodiments, the method for removing the photoresist pattern includes ultrasonic plating layer removal using a strong alkaline solution with a concentration of 8 to 20 wt % at 40 to 90°C for 2 to 8 minutes. The strong alkaline may be NaOH or KOH.

[0058] In some embodiments of the present application, after the second frost etching in step S30 is completed, the glass body may be subjected to a tempering treatment. Specific treatments after the tempering treatment may be performed according to common techniques (e.g., ion exchange, etc.), and will not be described here. This can increase the surface stress of the glass and improve its mechanical strength.

[0059] The manufacturing method of the flash glass according to the above embodiment of the present application is simple, suitable for processing glass bodies of various materials, with a short overall manufacturing / processing time and low cost. The frosted surface on one surface of the flash glass manufactured by the above manufacturing method has two frosted areas alternately distributed, and each frosted area has two types of protrusion structures of different sizes, so that the flash glass has a rich flash effect, a strong appearance expression, and good anti-fingerprint and anti-glare effects.

[0060] Furthermore, the first frosted region 101 having the first protrusion structure 11 and the second frosted region 102 having the second protrusion structure 12 are made of the same material as the glass body, i.e., the final flash glass is integrally molded, which avoids the problem that if an additional film made of a material different from the glass is laminated to create a flash effect, the film is likely to fall off and the sparkling appearance effect cannot be sustained.

[0061] An embodiment of the present application further provides an electronic device housing including the flash glass described above in the present application or the flash glass manufactured by the manufacturing method described above in the present application.

[0062] The electronic device housing including the flash glass has a stylish and cool appearance effect, and can improve the appearance expressiveness and product competitiveness of the electronic device.

[0063] In some embodiments of the present application, when the flash glass of the present application is applied to an electronic device housing, the flash glass may be further subjected to a process of plating an anti-fingerprint film, for example, the anti-fingerprint film is provided on the first surface having the first frosted area and the second frosted area.

[0064] In addition, in order to improve the appearance of the housing, the electronic device housing may further include a decorative layer provided on the second surface 10b of the glass body 10. Specifically, the decorative layer includes at least one of an optical film layer, a protective layer, and a hidden ink layer, but is not limited thereto.

[0065] The electronic device housing may be a display cover plate, a rear cover, a middle frame, or a composite housing in which the rear cover and the middle frame are integrally molded, etc. The electronic device using the electronic device housing may be various consumer electronic products, such as mobile phones, tablet computers, laptops, wearable devices (e.g., smart watches and smart bracelets), virtual reality (VR) terminal devices, augmented reality (AR) terminal devices, e-readers, televisions, video cameras, projectors, etc.

[0066] For example, when the electronic device is a portable electronic device such as a mobile phone, a tablet computer, or a wearable product, the electronic device housing may be a display cover plate that covers a display module and is assembled to the front side of the electronic device, or a rear cover that is assembled to the rear side of the electronic device. In some embodiments, when the electronic device is an electronic device with an imaging function (e.g., a mobile phone or a digital camera), the electronic device housing may be a camera protective cover plate.

[0067] The technical means of the present application will be further described below with specific examples. [Example]

[0068] This is a manufacturing method for flash glass. The manufacturing flow, as shown in Figure 3, includes the following steps:

[0069] (1) Preparation of first frost liquid: Tartaric acid (C4H6O6) and ammonium hydrogen fluoride (NH4HF2) were mixed uniformly, and nitric acid was added while stirring, and the mixture was stirred uniformly. Then, hydrochloric acid, water, and magnesium metaaluminate (Mg(AlO2)2) were added in that order and stirred, and finally sulfuric acid was added and stirred uniformly. After leaving it for 4 hours, the first frost liquid was obtained. The first frost liquid contained, by mass percentage, 2% magnesium metaaluminate, 36% nitric acid, 2% hydrochloric acid, 1% sulfuric acid, 36% ammonium hydrogen fluoride, 2% tartaric acid, and 21% water.

[0070] First, a 35 μm-thick acid-resistant ink layer was applied to one surface (which may be referred to as the “rear surface”) of a 0.6 mm-thick glass body (specifically, a lithium aluminosilicate glass plate, grade Panda-1681). The glass body was then immersed in the first frosting solution and left to stand at 25°C for 2 minutes to etch the other surface (which may be referred to as the “front surface” or “first surface”) of the glass body opposite the rear surface. The glass body was then removed and thoroughly washed with purified water to obtain the glass body after the first frost etching (shown in FIG. 4 ). The front surface of the glass body now has a plurality of first protrusion structures (which may be referred to as “large sand grain-like protrusions”), each having at least one ridge. The front surface has become frosted instead of being originally smooth, and this may be referred to as the “frosted surface.”

[0071] (2) A photoresist pattern was formed on the surface after the first frost etching.

[0072] A layer of photoresist approximately 7 μm thick was applied to the frosted surface and baked in an oven at 100° C. for 4 minutes to dry the photoresist. Then, LDI exposure was performed to create a linear stripe pattern with a width of 150 μm, with the exposed patterns spaced apart at intervals of approximately 165 μm. The exposed photoresist was then removed by immersion development in a KOH solution (12 wt %) with a conductivity of 50 mS / cm for 3 minutes. Finally, the photoresist was post-baked in an oven at 150° C. for 30 minutes to harden the photoresist. As a result, a pattern of parallel stripes of photoresist spaced apart appeared on the frosted surface, as shown in FIG. 5.

[0073] (3) A second frost etching was performed.

[0074] Preparation of second frost liquid: Ammonium hydrogen fluoride and nitric acid were mixed uniformly, tartaric acid was added and stirred uniformly, hydrochloric acid, water, and sodium metaaluminate (NaAlO2) were added in that order and stirred, and finally sulfuric acid was added and stirred uniformly, and after leaving it to stand for 4 hours, the second frost liquid was obtained. The second frost liquid contained, by mass percentage, 7% sodium metaaluminate, 37% nitric acid, 2% hydrochloric acid, 1% sulfuric acid, 32% ammonium hydrogen fluoride, 2% tartaric acid, and 19% water.

[0075] The glass body was immersed in a second frosting solution and left to stand at 25°C for 2 minutes, and a second etching was performed on the parts of the frosted surface area that were not covered by the photoresist pattern, forming a plurality of second protrusion structures (which may also be called "sand grain-like small protrusions" as shown in Figure 6).The glass body was then removed and thoroughly washed with purified water, and the photoresist pattern and the acid-resistant ink layer were removed (specifically, the removal method was to use a 20 wt% NaOH solution at 80°C with ultrasonic plating removal for 10 minutes, followed by thorough washing with purified water), resulting in the flash glass shown in Figure 6 and Figure 1.

[0076] 1 and 6 are metallurgical microscope photographs at different magnifications of the flash glass obtained in Example 1. As can be seen from FIGS. 1 and 6, one side of the flash glass includes a first frosted region 101 having a plurality of first protrusion structures (large sand-grain-like protrusions) and a second frosted region 102 having a plurality of second protrusion structures (small sand-grain-like protrusions). The first frosted region 101 and the second frosted region 102 are linear strips and are spaced apart. Two adjacent first frosted regions 101 are connected by the second frosted region 102. The height and length of the second protrusion structures are both smaller than the first protrusion structures. The width of the first frosted region 101 was approximately 140 μm to 165 μm, and the width of the second frosted region 102 was approximately 150 μm to 180 μm.

[0077] As can be seen from Figures 1, 4, and 6, the large sand grain-like protrusions formed by the first frost etching were approximately 120 μm to 140 μm in length and approximately 10 μm to 16 μm in height. As can be seen from Figures 6 and 1, the small sand grain-like protrusions formed by the second frost etching were approximately 30 μm to 60 μm in length and approximately 3 μm to 6 μm in height.

[0078] Furthermore, after step (1), the haze, transmittance, and roughness of the glass body after the first frost etching shown in Figure 4 were measured to obtain the results related to the first frost region. Furthermore, the glass of Figure 4 was subjected to a second frost etching without applying a photoresist mask, resulting in frosted glass with small sand grain-like protrusions on the entire surface. The haze, transmittance, and roughness of this frosted glass were then measured to obtain the results related to the second frost region. Naturally, the roughness parameters of the first frost region and the second frost region may also be obtained by directly measuring the glass of Figure 1 or Figure 6.

[0079] The haze and transmittance were measured by a German BYK haze meter BYK-4725, and the roughness was measured by a SJ411 surface roughness meter, and the measurement results are shown in Table 1 below. The parameters representing the roughness are R a , R z and R t where R a is the arithmetic mean value, and R z is the average peak and valley depth, and R t is the sum of the maximum value of the contour peak and the minimum value of the contour valley. [Table 1]

[0080] As can be seen from Table 1, one side of the glass surface has two frosted areas with distinctly different roughness, both of which have high haze and light transmittance, a dim visual effect, good transparency, and a strong appearance.

[0081] In addition, the flash glass of Example 1 of the present application was photographed to obtain the appearance effect diagram shown in Figure 7. Furthermore, in the manufacturing process of the flash glass of Example 1, the glass body (i.e., the glass of Figure 4) after the first frost etching was photographed, and the appearance effect is shown in Figure 8. The above appearance effect diagram specifically refers to the macro visual effect of the glass.

[0082] As can be seen from Figures 7 and 8, after the first frost etching of the glass body, its surface has a certain flash effect, but the flash effect is uniform. The flash glass produced by the method of the embodiment of the present application has a clear flash effect, and also has various flash effects with different flash degrees. The area with small protrusions has a fine flash because the protrusion structures are small in size and numerous, and can be said to have a fine flash effect. [Example]

[0083] This is a manufacturing method of flash glass, which differs from Example 1 in the following points: sodium metaaluminate in the second frost liquid is replaced with magnesium metaaluminate, that is, the type of metaaluminate contained in the first frost liquid and the second frost liquid is the same. [Example]

[0084] This is a method for manufacturing flash glass, and it differs from Example 1 in the following two points: 1) The first frosting liquid contains, by mass percentage, 3% magnesium metaaluminate, 37% nitric acid, 1% hydrochloric acid, 0.5% sulfuric acid, 38% ammonium hydrogen fluoride, 2.5% tartaric acid, and 18% water; 2) The second frost liquid contains, by mass percentage, 10% sodium metaaluminate, 39% nitric acid, 2% hydrochloric acid, 1% sulfuric acid, 35% ammonium hydrogen fluoride, 3% tartaric acid, and 10% water. [Example]

[0085] This is a method for manufacturing flash glass, and it differs from Example 1 in the following two points: 1) The first frosting liquid contains, by mass percentage, 1% magnesium metaaluminate, 32% nitric acid, 2% hydrochloric acid, 1% sulfuric acid, 32% ammonium hydrogen fluoride, 2% tartaric acid, and 30% water; 2) The second frost liquid contains, by mass percentage, 5% potassium metaaluminate, 35% nitric acid, 2% hydrochloric acid, 1% sulfuric acid, 30% ammonium hydrogen fluoride, 2% tartaric acid, and 25% water. [Example]

[0086] This is a manufacturing method of flash glass, which differs from Example 1 in the following points: S20 In the example, the maximum cross-sectional width of the photoresist pattern is about 400 μm, and the spacing between adjacent photoresist patterns is about 450 μm.

[0087] The flash glass obtained in Example 5 differs from Example 1 mainly in the following respects: The widths of the first frosted region and the second frosted region are different from those in Example 1. The width of the first frosted region of the flash glass obtained in Example 5 is in the range of 390 to 420 μm, and the width of the second frosted region is in the range of 450 to 480 μm.

[0088] Figure 9 shows the appearance effect of the flash glass of Example 5 of the present application. As can be seen from Figure 9, the width of the two frosted areas is wider than that of Example 1, making it easier for the naked eye to distinguish the two frosted areas compared to Example 1. The darker area is the second frosted area with small protrusions, and its flash effect is finer than that of the first frosted area.

[0089] Table 2 below shows Examples 2 to 5 Table 3 below summarizes the measurement results of haze, transmittance, and roughness of the flash glasses of Examples 2 to 5. [Table 2] [Table 3]

[0090] As can be seen from Table 3, the surface of the flash glass of the above example of the present application has two frosted areas with different roughness, both of which have high haze and suitable light transmittance, which indicates that the flash glass of the example of the present application has a good frosted effect and good transmittance, and can achieve a special appearance effect. Furthermore, the existence of two frosted areas with different roughness allows the flash glass to have a rich and soft flash effect, good anti-glare effect, anti-fingerprint effect, etc.

[0091] Furthermore, as can be seen from a comparison between Example 1 and Example 2, when the types of metaaluminate in the first frost liquid and the second frost liquid are different, the small protrusion structures in the second frost region formed by the second frost etching are more closely arranged, the roughness Ra is smaller, and the haze is higher than in the first frost region formed by the first frost etching.

[0092] The above merely illustrates some exemplary embodiments of the present application, and although the description is specific and detailed, it should not be understood as limiting the scope of the claims of the present application. It should be noted that a person skilled in the art can make some further modifications and improvements without departing from the concept of the present application, and all of these should be considered to be within the protection scope of the present application. [Explanation of symbols]

[0093] 10 Glass body 10a 1st surface 101 First Frost Region 102 Second Frost Region 11 First protrusion structure 12 Second protrusion structure 10a 1st surface 10b 2nd surface

Claims

1. A flash glass comprising a glass body (10), the glass body (10) having a first surface (10a), the first surface (10a) comprising a plurality of first frosted regions (101) distributed at intervals, two adjacent first frosted regions (101) being connected by a second frosted region (102), the first frosted regions (101) and the second frosted regions (102) being linear strip-like, each first frosted region (101) having a plurality of first protrusion structures (11), each second frosted region (102) having a plurality of second protrusion structures (12), each first protrusion structure (11) and each second protrusion structure (12) independently comprising at least one edge, the height and length of each of the second protrusion structures (12) being smaller than the height and length of the first protrusion structures (11); A flash glass characterized in that the width of the first frosted area (101) is 100 μm to 500 μm, and the width of the second frosted area (102) is 100 μm to 500 μm.

2. 2. The flash glass according to claim 1, wherein the shapes of the first protrusion structure (11) and the second protrusion structure (12) each include at least one of a prism, a truncated pyramid, a cube, and a pyramid.

3. 2. The flash glass according to claim 1, wherein the first protruding structure (11) has a length in the range of 100 μm to 150 μm and a height in the range of 10 μm to 16 μm.

4. 2. The flash glass according to claim 1, wherein the second protrusion structure (12) has a length in the range of 30 μm to 60 μm and a height in the range of 3 μm to 6 μm.

5. 5. The flash glass according to claim 1, wherein the first frosted area (101) has a haze in the range of 80% to 90% and a light transmittance in the range of 75% to 93%, and the second frosted area (102) has a haze in the range of 90% to 95% and a light transmittance in the range of 75% to 93%.

6. 5. The flash glass according to claim 1, wherein the roughness Ra of the first frosted area (101) is in the range of 1.5 μm to 4 μm, and the roughness Ra of the second frosted area (102) is in the range of 0.3 μm to 1 μm.

7. performing a first frost etching on a first surface (10a) of the glass body (10) to form a plurality of first protrusion structures (11) on the first surface (10a), each of the first protrusion structures including at least one edge; forming a plurality of parallel, spaced apart photoresist strip patterns on the first surface (10a) after the first frost etching; performing a second frost etching on the first surface (10a) on which the photoresist pattern is present to convert the portions of the first surface (10a) not covered by the photoresist pattern into second frost regions (102) having a plurality of second protrusion structures (12); and then removing the photoresist pattern to obtain first frost regions (101) having a plurality of first protrusion structures (11) on the surface between adjacent second frost regions (102); Each second protrusion structure (12) includes at least one edge, and the height and length of the second protrusion structure (12) are both smaller than the height and length of the first protrusion structure (11); a frost liquid used in the first frost etching and the second frost etching each containing metaaluminate, nitric acid, hydrochloric acid, sulfuric acid, ammonium hydrogen fluoride, and water, and a mass percentage of metaaluminate in the frost liquid used in the second frost etching is greater than a mass percentage of metaaluminate in the frost liquid used in the first frost etching.

8. The frost liquid used in the first frost etching contains, by weight, 1 to 3 parts of metaaluminate, 25 to 40 parts of nitric acid, 1 to 3 parts of hydrochloric acid, 0.5 to 1.5 parts of sulfuric acid, 20 to 40 parts of ammonium hydrogen fluoride, 1 to 3 parts of tartaric acid, and water, 8. The method for producing flash glass according to claim 7, wherein the frost liquid used in the second frost etching contains, by weight, 5 to 10 parts of metaaluminate, 25 to 40 parts of nitric acid, 1 to 3 parts of hydrochloric acid, 0.5 to 1.5 parts of sulfuric acid, 20 to 40 parts of ammonium hydrogen fluoride, 1 to 3 parts of tartaric acid, and water.

9. 8. The method for producing flash glass according to claim 7, wherein the metaaluminate includes at least one of magnesium metaaluminate, sodium metaaluminate, potassium metaaluminate, and calcium metaaluminate.

10. 8. The method for producing flash glass according to claim 7, wherein the metaaluminate in the frost liquid used in the first frost etching is magnesium metaaluminate, and the metaaluminate in the frost liquid used in the second frost etching is sodium metaaluminate or potassium metaaluminate.

11. The method for producing flash glass according to any one of claims 7 to 10, wherein the first frost etching is performed by leaving the glass at 25°C to 30°C for 2 minutes to 5 minutes, and the second frost etching is performed by leaving the glass at 25°C to 30°C for 2 minutes to 5 minutes.

12. An electronic device housing comprising the flash glass according to claim 1.

13. A method for manufacturing an electronic device housing, comprising the method for manufacturing flash glass according to claim 7.

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