Holding method, exposure apparatus, and article manufacturing method

Abstract

To provide a method for holding that is advantageous for holding an object.SOLUTION: A method for holding an object by a plurality of holding portions is provided, the method including: a first acquisition step of acquiring information regarding a first shape of the object in a state where the plurality of holding portions support a lower surface of the object without pressing an upper surface of the object; a second acquisition step of acquiring information regarding a second shape of the object in a state where the plurality of holding portions press the upper surface and the lower surface of the object; and a driving step of driving the plurality of holding portions from the state where the plurality of holding portions press the upper surface and the lower surface of the object so as to reduce a difference between the first shape and the second shape.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a holding method, an exposure apparatus, and a method for manufacturing an article. [Background technology]

[0002] Exposure apparatus are known as one type of lithography equipment used in the manufacturing process of semiconductor devices, flat panel displays (FPDs), etc. Exposure apparatuses perform an exposure process in which a substrate is exposed to light through an original, thereby transferring (forming) the circuit pattern formed on the original onto the substrate.

[0003] In recent years, there has been an increase in the exposure performance required of exposure apparatuses, and in order to improve exposure performance, it is necessary to reduce the imaging error (exposure error) of the pattern in the optical system (for example, the projection optical system). For this reason, exposure apparatuses can be provided with multiple optical units (objects) for correcting the imaging error of the optical system.

[0004] Patent Document 1 discloses an exposure apparatus equipped with a high-order correction mechanism (optical unit) that can correct high-order aberrations by deforming an optical element (flat glass) using multiple actuators. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Japanese Patent Application Publication No. 2023-162947 Summary of the Invention [Problem to be solved by the invention]

[0006] However, when an optical element is deformed using a plurality of actuators, stress is applied to the optical element, which may result in damage (cracks) to the optical element. In order to reduce the risk of damage, it is desirable that the stress applied to the optical element is small in the initial position before the optical element is deformed, but there is a risk that unintended stress may be applied to the optical element due to the relative difference in the drive amounts of the plurality of actuators, manufacturing errors of the optical element, etc.

[0007] Therefore, an object of the present invention is to provide a holding method that is advantageous for holding an object. [Means for solving the problem]

[0008] In order to achieve the above-mentioned object, one aspect of the present invention provides a holding method for holding an optical element with a plurality of holding portions, comprising: a first acquisition step for acquiring information regarding a first shape of the optical element in a state in which the plurality of holding portions support the lower surface of the optical element without pressing the upper surface of the optical element; a second acquisition step for acquiring information regarding a second shape of the optical element in a state in which the plurality of holding portions press the upper surface and the lower surface of the optical element; a calculation step for calculating the drive amounts of the plurality of holding portions so as to reduce the difference between the first shape and the second shape based on the relationship between the drive amounts of the plurality of holding portions and the deformation amount of the optical element relative to the drive amount; and a drive step for driving the plurality of holding portions from a state in which the plurality of holding portions press the upper surface and the lower surface of the optical element based on the drive amounts of the plurality of holding portions calculated in the calculation step. In order to achieve the above-mentioned object, a holding method as one aspect of the present invention is a holding method for holding an optical element with a plurality of holding portions, characterized in that it includes: a first acquisition step for acquiring information regarding a first shape of the optical element placed on the plurality of holding portions when the optical element is not fixed to the plurality of holding portions; a second acquisition step for acquiring information regarding a second shape of the optical element when the optical element is fixed to the plurality of holding portions; a calculation step for calculating drive amounts of the plurality of holding portions so as to reduce the difference between the first shape and the second shape based on the relationship between the drive amounts of the plurality of holding portions and the deformation amount of the optical element relative to the drive amount; and a drive step for driving the plurality of holding portions based on the drive amounts of the plurality of holding portions calculated in the calculation step when the optical element is fixed to the plurality of holding portions. [Effects of the Invention]

[0009] According to the present invention, it is possible to provide a holding method that is advantageous for holding an object. [Brief explanation of the drawings]

[0010] [Figure 1] FIG. 2 is a schematic diagram illustrating a configuration of an optical unit. [Figure 2] 1 is a flowchart of a holding method. [Figure 3] 10A and 10B are diagrams for explaining a process of acquiring information indicating the shape of an optical element in the second embodiment. [Figure 4] FIG. 1 is a schematic diagram showing the configuration of an exposure apparatus. [Figure 5] 1 is a flowchart of a method for manufacturing an article. DETAILED DESCRIPTION OF THE INVENTION

[0011] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will now be described in detail with reference to the accompanying drawings. In the drawings, the same reference numerals are used to designate the same components, and redundant explanations will be omitted.

[0012] First Embodiment FIG. 1 illustrates an optical unit 50 for implementing a method for holding an optical element according to this embodiment. FIG. 1(a) is a top view of the optical unit 50, and FIG. 1(b) is a front view of the optical unit 50. The optical unit 50 is a unit that can be used in an exposure apparatus used in a lithography process, which is a manufacturing process for semiconductor devices, liquid crystal display devices, and the like. A detailed configuration of the exposure apparatus will be described later. The optical unit 50 includes an optical element 1 (object) that can be deformed by applying stress, multiple holders 2 that hold the optical element 1 at multiple points, and a support 3 that supports the multiple holders 2. The optical unit 50 may also include a measurement unit 4 that can measure the positions of multiple measurement points 5 on the optical element 1 and acquire the shape of the optical element 1. Each of the multiple holders 2 includes a holding member 2a, an actuator 2b that applies a driving force to the holding member 2a (holding unit 2), and a position detection unit 2c.

[0013] The optical element 1 can be a flat glass. Specifically, it is made of quartz glass or the like, which has a substantially uniform refractive index and high light transmission efficiency. The thickness is such that it does not substantially affect the imaging performance of the exposure apparatus other than the deviation of the imaging position.

[0014] The multiple holding units 2 are positioned outside the effective area of ​​the light beam 10 passing through the optical element 1. The multiple holding units 2 hold the optical element 1 by sandwiching the surface of the optical element 1 between holding members 2a in the thickness direction. The support unit 3 has an opening so as not to block the effective area of ​​the light beam 10 passing through the support unit 3. At least one of the multiple holding units 2 can be driven in the traveling direction of the light beam 10 by driving multiple actuators 2b, thereby deforming the optical element 1. The deformation of the optical element 1 refracts the light beam 10, thereby changing the imaging position on the substrate in the exposure apparatus. This allows for control of imaging performance. The actuator 2b can be, for example, a pulse motor, a ball screw, a linear guide, a cross roller guide, etc. Each of the multiple holding units 2 also has a position detection unit 2c, such as an encoder, that detects the position of the holding unit 2 itself. The position detection unit 2c compares the difference between the command value to the actuator 2b and the actual drive amount, and drives the holding unit 2 so that the difference between the command value and the drive amount is reduced, thereby achieving accurate drive of the holding unit 2.

[0015] Here, in order to generate deformation of the optical element 1 more locally and control the imaging performance more complexly, it is desirable to increase the number of holders 2 and arrange the holders 2 as closely as possible. However, applying localized deformation generates large stress on the optical element 1, and if the load exceeds a certain tolerance, the optical element 1 is more likely to crack. Furthermore, since the deformation of the optical element 1 imposes a load on the optical element 1 and the holders 2, if the load exceeds a certain tolerance, it will have an adverse effect on the durability of the optical element 1 and the holders 2. Furthermore, there is a risk that unintended stress will be applied to the optical element due to relative differences in the drive amounts of multiple actuators or manufacturing errors of the optical element. Therefore, in order to reduce the risk of damage to the optical element 1, it is desirable to minimize the stress applied to the optical element 1 by clamping and holding the optical element 1 between the holders 2 in the initial position (home position) before the optical element is deformed.

[0016] Therefore, in this embodiment, the stress applied to the optical element 1 can be reduced at the initial position before the optical element is deformed by holding the optical element 1 according to the flowchart shown in Fig. 2. Fig. 2 is a flowchart showing each step of the method for holding the optical element 1 in this embodiment.

[0017] In step S21, information about the shape (first shape) of the optical element 1 placed on the multiple holders 2 is acquired (measured) (first acquisition step). Specifically, information about the first shape is acquired when the bottom surface of the optical element 1 is supported by the multiple holders 2 without pressing the top surface of the optical element 1. The optical element 1 is not fixed to the holders 2. The first shape is a state in which stress on the optical element 1 is small. The first acquisition step can be performed by measuring measurement points 5, which are positions on the surface of the optical element 1, with the measurement unit 4. The measurement unit 4 is a displacement sensor such as a coordinate measuring machine or an interferometer, or a strain gauge. The measurement unit 4 may be provided in the optical unit 50 or may not be provided in the optical unit 50 (external). Furthermore, as shown in FIG. 1(a), it is preferable that the measurement points 5 are located in multiple locations in order to accurately acquire information about the shape of the optical element 1. Furthermore, the measuring unit 4 may be a load cell or the like that measures the reaction force applied to the holding unit 2 due to the deformation of the optical element 1.

[0018] In step S22, the optical element 1 is held by sandwiching it between holding members 2a. Specifically, the upper surface and the lower surface of the optical element 1 are pressed by the multiple holding members 2 so that the optical element 1 is fixed to the holding members 2. Methods for fixing the optical element 1 include fastening the holding members 2a together with bolts and applying pressure to the surfaces that come into contact with the optical element 1, or sandwiching the optical element 1 with a leaf spring. Furthermore, instead of pressing the upper surface of the optical element 1, as in fastening with an adhesive, a method in which the lower surface of the optical element 1 is fixed with the holding members 2a may also be used.

[0019] In step S23, information about the shape (second shape) of the optical element 1 when held by the holding unit is acquired (measured) (second acquisition process). Specifically, information about the second shape when the upper and lower surfaces of the optical element 1 are pressed is acquired. The optical element 1 is in a state where it is fixed to the holding unit 2. The second shape is a state where greater stress is applied to the optical element 1 than in the first shape. The second acquisition process can be performed by measuring measurement point 5, which is the position of the surface of the optical element 1, with the measurement unit 4. The difference between the first shape and the second shape is the amount of deformation of the optical element 1 caused by holding it by the holding unit 2.

[0020] In step S24, the driving amount of the holding portion 2 is calculated to minimize the deformation of the optical element 1 that occurs in step S23 (calculation step). Details of step S24 will be described.

[0021] As a premise, a coupling sensitivity matrix C for calculating the deformation amount at the measurement points 5 of the optical element 1 in response to the drive amount of the holder 2 is obtained in advance by analysis or the like from the specifications of each part of the optical unit 50 (for example, at least one piece of information on the shape, material, rigidity value, and arrangement of the optical element 1 or the holder 2). Alternatively, the coupling sensitivity matrix C is obtained experimentally. In the following, assuming that the number of holders 2 is n and the number of measurement points 5 is m, the deformation amount of the optical element 1 at each j-th (1≦j≦m) measurement point 5 when the ith (1≦i≦n) holder 2 is driven by a unit amount is expressed as C ij The joint sensitivity matrix C is an m-row, n-column matrix expressed by the following equation (1).

[0022]

number

[0023] Here, if the drive amount of each of the multiple holding units 2 is D (an n×1 vector), the deformation amount S (a 1×m vector) of the optical element at the measurement point 5 relative to the drive amount D of the holding unit 2 can be obtained by matrix calculation using the following equation (2). S=CD (2)

[0024] Furthermore, when the deformation amount S is known, the drive amount D' of the holding unit 2 required to generate the deformation amount S can be calculated by equation (3) using C', which is the pseudo-inverse matrix (or generalized inverse matrix) of the coupling sensitivity matrix C. Note that the method of solving simultaneous equations using this pseudo-inverse matrix is ​​mathematically equivalent to the least squares method. D´=C´S ···(3)

[0025] Then, based on the measurement results of the optical element 1 and calculation of equation (3), the drive amount of the holding part 2 is calculated so that ideally the second shape coincides with the first shape.

[0026] In step S25, the drive amount calculated in step S24 is input from the controller to the actuator 2b to drive the holding units 2 (driving step). At this time, the plurality of holding units 2 are driven so as to reduce the difference between the first shape and the second shape from the state in which the plurality of holding units 2 press the upper and lower surfaces of the optical element 1 (the state in which the second shape is acquired in step S23).

[0027] Ideally, by performing steps S21 to S25, the stress on the optical element can be reduced to below a predetermined value. However, if the stress on the optical element does not decrease to below the predetermined value, the stress on the optical element can be reduced to below the predetermined value by performing the following steps S26 and onward.

[0028] In step S26, information about the shape (third shape) of the optical element 1 after the holding unit 2 is driven in step S25 is acquired (measured) (third acquisition step). Specifically, information about the third shape in a state where the upper and lower surfaces of the optical element 1 are pressed is acquired. The third acquisition step can be performed by measuring measurement point 5, which is the position of the surface of the optical element 1, with the measurement unit 4.

[0029] In step S27, it is determined whether the difference between the first shape and the third shape is equal to or less than a predetermined value. If it is equal to or less than the predetermined value, the process proceeds to step S28, and if it is greater than the predetermined value, the process returns to step S24 and the driving step (also called the second driving step) of S24 is performed again.

[0030] In step S28, the positions of the plurality of holders 2 driven in step S25 are set as initial positions in the controller (setting step).

[0031] In step S29, the set position is read out from the controller at a predetermined timing, and the actuator 2b is driven, thereby reproducing a state in which the deformation under holding is minimized.

[0032] As described above, in this embodiment, the stress applied to the optical element 1 can be reduced, and therefore the risk of the optical element 1 being damaged can be reduced.

[0033] Second Embodiment In the first embodiment, an example was described in which information about the shape of the optical element 1 is obtained by measuring the position of the optical element 1. In the present embodiment, an example will be described in which information about the shape of the optical element 1 is obtained from the shape of a pattern formed by passing through the optical element 1. Note that the configuration of the optical unit 50 is the same as in the first embodiment, and therefore description thereof will be omitted. Furthermore, matters not mentioned in this embodiment follow the first embodiment.

[0034] In this embodiment, information about the first shape, second shape, and third shape described in the first embodiment can be obtained by measuring the amount of change in the image pattern obtained by passing through the optical element 1. The optical unit 50 is mounted in the projection optical system of the exposure apparatus. In the exposure apparatus, light rays that have passed through the optical element 1 of the optical unit 50 form an image on the substrate, so the amount of deformation of the optical element 1 can be calculated backward from the amount of change in the image pattern.

[0035] In this embodiment, an example will be described in which at least one of a plurality of holding units 2 is replaced within an exposure apparatus. The work of replacing the holding unit 2 involves separating the holding member 2a and replacing the holding unit 2, which causes deformation due to holding by the holding unit 2. As mentioned above, deformation due to holding that occurs during the replacement work has the problem of damaging the optical element 1 and adversely affecting the durability of the optical element 1 and the holding unit 2, and furthermore, the replacement work may lead to a change (deterioration) in the imaging pattern of the exposure apparatus.

[0036] FIG. 3 shows the change in the imaging pattern on the substrate that occurs during the replacement of the holder 2. Grating 11 indicates the imaging pattern (first pattern) before the replacement of the holder 2, and grating 12 indicates the imaging pattern (second pattern) after the replacement of the holder 2. In this embodiment, first, gratings 11 and 12 are measured using an inspection device included in the exposure apparatus or external to the exposure apparatus. Next, the drive amount of the holder 2 is calculated from the information on gratings 11 and 12 to minimize the deformation caused by the holding during the replacement operation. In this embodiment, the coupling sensitivity matrix C is obtained using information on the change amount S of the imaging grating on the substrate P, rather than the deformation amount of the optical element 1. As with the first embodiment, the coupling sensitivity matrix C can be obtained by an analytical method or an experimental method.

[0037] Equation (2) determines the amount of change S of the imaging grating on substrate P relative to the amount of drive D of holder 2, and conversely, if the amount of change S of the imaging grating on substrate P is known, the amount of drive D' of holder 2 required to generate amount of change S can also be determined by equation (3). Then, by calculating the measurement result of the imaging grating on substrate P and equation (3), the amount of drive of holder 2 is calculated so that the measurement results of gratings 11 and 12 match.

[0038] Next, the calculated drive amount is instructed from the controller to the actuator 2b, and the holding unit 2 is driven by the calculated drive amount. Through the above steps, it is possible to minimize deformation of the optical element 1 due to holding during the replacement work. Also in this embodiment, by performing step S24 and subsequent steps in the flowchart of FIG. 2, it is possible to achieve higher accuracy.

[0039] The optical unit 50 actively drives the holding portion 2 to deform the optical element 1 using the position where deformation due to holding during replacement work is minimized by the above-mentioned method as a reference.

[0040] As described above, in this embodiment, it is possible to reduce the stress applied to the optical element 1, thereby reducing the risk of damaging the optical element 1. Furthermore, when replacing the holding part 2, the replacement work can be performed while minimizing changes in the imaging performance of the exposure apparatus.

[0041] <Embodiments of exposure apparatus> The configuration of an exposure apparatus EXP equipped with the above-described optical unit 50 will now be described. Fig. 4 is a schematic diagram showing the configuration of the exposure apparatus EXP. The exposure apparatus EXP has an original stage 40 that holds an original M (mask, reticle), a projection optical system PO that projects the pattern of the original M illuminated by an illumination optical system (not shown) onto a substrate P, and a substrate stage 44 that holds the substrate P. The projection optical system PO is a projection optical system that projects and transfers the pattern drawn (formed) on the original M onto the substrate P, which is coated with a photosensitive material.

[0042] The exposure tool EXP uses a projection optical system based on an Offner optical system. In the Offner optical system, the original M is illuminated in an arc shape to ensure a good image area. The illumination shape of the exposure light that reaches the substrate P is also arc shape.

[0043] Light that has passed through original M is reflected in this order by trapezoidal mirror 41, concave mirror 42, convex mirror 43, concave mirror 42, and trapezoidal mirror 41, before reaching substrate P, and the pattern on original M is transferred onto substrate P. In exposure apparatus EXP according to this embodiment, optical unit 50 is placed on the optical path within the projection optical system, and it is possible to control imaging errors in projection optical system PO and the entire exposure apparatus EXP.

[0044] <Embodiments of manufacturing methods of articles> The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing articles such as flat panel displays (FPDs), semiconductor devices, sensors, and optical elements. FIG. 5 is a flowchart of the method for manufacturing an article according to this embodiment. The method for manufacturing an article according to this embodiment includes a step of forming a latent image pattern on a photosensitive material coated on a substrate by exposure using the exposure apparatus EXP to obtain an exposed substrate (exposure step, step S11). The method also includes a step of developing the substrate exposed in this step to obtain a developed substrate (development step, step S12). The manufacturing method further includes other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.) (processing step, step S13). The method for manufacturing an article according to this embodiment is advantageous over conventional methods in at least one of the performance, quality, productivity, and production cost of the article.

[0045] Although the preferred embodiments of the present invention have been described above, it goes without saying that the present invention is not limited to these embodiments, and various modifications and changes are possible within the scope of the gist of the present invention.

[0046] The disclosure of the present specification includes at least the following holding method, exposure apparatus, and article manufacturing method.

[0047] (Item 1) A holding method for holding an object with a plurality of holding parts, a first acquisition step of acquiring information about a first shape of the object in a state where a lower surface of the object is supported by the plurality of holding parts without pressing an upper surface of the object; a second acquisition step of acquiring information about a second shape of the object in a state in which the upper surface and the lower surface of the object are pressed by the plurality of holding units; a driving step of driving the plurality of holding units so that a difference between the first shape and the second shape is reduced from a state in which the plurality of holding units press the upper surface and the lower surface of the object; A holding method comprising:

[0048] (Item 2) 2. The holding method according to item 1, wherein the object is an optical element arranged in a projection optical system of an exposure apparatus that exposes an image of a pattern of an original onto a substrate.

[0049] (Item 3) 3. The holding method according to item 2, wherein the optical element is a flat glass.

[0050] (Item 4) the first obtaining step obtains information about the first shape by measuring a position of the object; the second acquisition step acquires information about the second shape by measuring a position of the object; 4. The method for holding a sample according to any one of items 1 to 3.

[0051] (Item 5) the first obtaining step obtains information about the first shape by measuring a first pattern formed on the substrate using light that has passed through the optical element having the first shape; the second acquisition step acquires information about the second shape by measuring a second pattern formed on the substrate using light that has passed through the optical element having the second shape; 4. The method for holding according to item 2 or 3.

[0052] (Item 6) 6. The holding method according to any one of items 1 to 5, further comprising a setting step of setting the positions of the plurality of holding parts driven in the driving step as initial positions.

[0053] (Item 7) a third acquisition step of acquiring information about a third shape of the object in a state in which the plurality of holding units are driven in the driving step; a second driving step of driving the plurality of holding units so that a difference between the first shape and the third shape is reduced from a state in which the plurality of holding units press the upper surface and the lower surface of the object; 7. The method for holding according to any one of items 1 to 6, further comprising:

[0054] (Item 8) 8. The holding method according to any one of items 1 to 7, wherein the driving step further includes a calculation step of determining a coupling sensitivity matrix that calculates a change in the shape of the object relative to the driving amount of the plurality of holding units based on at least one piece of information regarding the shape, material, stiffness value, and arrangement of the plurality of holding units or the object, and calculating the driving amounts of the plurality of holding units to be driven in the driving step based on the coupling sensitivity matrix.

[0055] (Item 9) the plurality of holding units each have a position detection unit that detects the amount of drive of the holding unit; 9. The holding method according to any one of items 1 to 8, wherein the driving step compares a command value for an actuator that applies a driving force to the holding unit with a drive amount of the holding unit detected by the position detection unit, and drives the plurality of holding units so as to reduce a difference between the command value and the drive amount.

[0056] (Item 10) 10. The holding method according to any one of items 1 to 9, wherein the holding method is performed when the plurality of holding parts are replaced.

[0057] (Item 11) A holding method for holding an object with a plurality of holding parts, a first acquisition step of acquiring information about a first shape of the object placed on the plurality of holders in a state where the object is not fixed to the plurality of holders; a second acquisition step of acquiring information about a second shape of the object in a state where the object is fixed to the plurality of holders; a driving step of driving the plurality of holding parts so that the difference between the first shape and the second shape is reduced while the object is fixed to the plurality of holding parts; A holding method comprising:

[0058] (Item 12) An exposure apparatus that projects an image of a pattern of an original onto a substrate, 12. An exposure apparatus comprising an object held by the holding method according to any one of items 1 to 11.

[0059] (Item 13) an exposure step of exposing a substrate using the exposure apparatus according to item 12 to obtain an exposed substrate; a developing step of developing the exposed substrate to obtain a developed substrate, A method for manufacturing an article, comprising manufacturing an article from the developed substrate. [Explanation of symbols]

[0060] 1 Optical element (object) 2 Holding part 2a Holding member 2b Actuator 50 Optical Unit

Claims

1. A holding method for holding an optical element with a plurality of holding parts, a first acquisition step of acquiring information about a first shape of the optical element in a state where a lower surface of the optical element is supported by the plurality of holding portions without pressing an upper surface of the optical element; a second acquisition step of acquiring information about a second shape of the optical element in a state in which the upper surface and the lower surface of the optical element are pressed by the plurality of holding portions; a calculation step of calculating drive amounts of the plurality of holders based on a relationship between drive amounts of the plurality of holders and a deformation amount of the optical element relative to the drive amounts so that a difference between the first shape and the second shape is reduced; a driving step of driving the plurality of holding units based on the drive amounts of the plurality of holding units calculated in the calculation step from a state in which the plurality of holding units press the upper surface and the lower surface of the optical element; A holding method comprising:

2. 2. The holding method according to claim 1, wherein the optical element is arranged in a projection optical system of an exposure apparatus that exposes an image of a pattern of an original onto a substrate.

3. 2. The holding method according to claim 1, wherein the optical element is a flat glass plate.

4. the first obtaining step obtains information about the first shape by measuring a position of the optical element; the second acquisition step acquires information about the second shape by measuring the position of the optical element; 2. The holding method according to claim 1.

5. the first acquisition step acquires information about the first shape by measuring a first pattern formed on the substrate using light that has passed through the optical element having the first shape; the second acquisition step acquires information about the second shape by measuring a second pattern formed on the substrate using light that has passed through the optical element having the second shape; 3. The holding method according to claim 2.

6. 2. The holding method according to claim 1, further comprising a setting step of setting the positions of the plurality of holding parts driven in the driving step as initial positions.

7. a third acquisition step of acquiring information about a third shape of the optical element in a state in which the plurality of holding units are driven in the driving step; a second driving step of driving the plurality of holding portions from a state in which the plurality of holding portions press the upper surface and the lower surface of the optical element so that a difference between the first shape and the third shape is reduced; 2. The method of claim 1, further comprising:

8. 2. The holding method according to claim 1, wherein the calculation step determines a coupling sensitivity matrix that calculates a change in the shape of the optical element relative to a drive amount of the plurality of holding units based on at least one piece of information regarding the shape, material, rigidity value, and arrangement of the plurality of holding units or the optical element, and calculates the drive amounts of the plurality of holding units to be driven in the drive step based on the coupling sensitivity matrix.

9. the plurality of holding units each have a position detection unit that detects the amount of drive of the holding unit; 2. The holding method according to claim 1, wherein the driving step compares a command value for an actuator that applies a driving force to the holding unit with a drive amount of the holding unit detected by the position detection unit, and drives the plurality of holding units so as to reduce a difference between the command value and the drive amount.

10. The holding method according to claim 1 , wherein the holding method is performed when the plurality of holding units are replaced.

11. A holding method for holding an optical element with a plurality of holding parts, a first acquisition step of acquiring information about a first shape of the optical element placed on the plurality of holding portions in a state where the optical element is not fixed to the plurality of holding portions; a second acquisition step of acquiring information about a second shape of the optical element in a state where the optical element is fixed to the plurality of holders; a calculation step of calculating drive amounts of the plurality of holders based on a relationship between drive amounts of the plurality of holders and a deformation amount of the optical element relative to the drive amounts so that a difference between the first shape and the second shape is reduced; a driving step of driving the plurality of holding units based on the drive amounts of the plurality of holding units calculated in the calculation step, with the optical element fixed to the plurality of holding units; A holding method comprising:

12. An exposure apparatus that projects an image of a pattern of an original onto a substrate, An exposure apparatus comprising an optical element held by the holding method according to any one of claims 1 to 11.

13. an exposure step of exposing a substrate using the exposure apparatus according to claim 12 to obtain an exposed substrate; a developing step of developing the exposed substrate to obtain a developed substrate, A method for manufacturing an article, comprising manufacturing an article from the developed substrate.

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