Decorative film, molded body, decorative panel, and display device
The decorative film with a selective reflective layer and cholesteric liquid crystal structure addresses visibility issues by minimizing external light reflection and maintaining decoration visibility, ensuring clear display and decoration visibility from various angles.
Patent Information
- Application Number
- JP2021158310
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2021-09-28
- Publication Date
- 2026-02-20
- Estimated Expiration
- 2041-09-28
AI Technical Summary
Conventional decorative films reflect external light when displays are turned on, making the display difficult to see, and fail to maintain visibility of decoration from various viewing angles when displays are turned off.
A decorative film with a reflective layer that selectively reflects light in the 380 nm to 780 nm range, having a maximum integrated reflectance of 30% or less, a half-width of the peak reflectance of 200 nm or more, and a ratio of diffuse reflectance to total light reflectance of 80% or more, utilizing a cholesteric liquid crystal structure with varying helical pitch.
The film enhances display visibility by reducing external light reflection and maintains decoration visibility from different angles, achieving excellent visibility of both display and decoration.
Smart Images

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Figure 0007818370000002
Abstract
Description
[Technical Field]
[0001] The present disclosure relates to a decorative film, a molded body, a decorative panel, and a display device. [Background technology]
[0002] A known conventional reflective sheet is described in Patent Document 1. Patent Document 1 describes a reflective sheet including at least one cholesteric liquid crystal layer having wavelength selective reflectivity, in which at least one of the cholesteric liquid crystal layers is a pitch gradient layer in which the helical pitch changes in the film thickness direction, and the half width of the integrated reflection spectrum of the reflective sheet is 100 nm or more, and the wavelength on the short wavelength side that defines the half width is λα, the wavelength on the long wavelength side is λβ, and the central wavelength is λ. C Then, λ1=(λα+λ C ) / 2, λ2=(λ C +λβ) / 2, a reflective sheet that satisfies the following formulas (1) and (2) is described. IR(λ1)>IR(λ2) Equation (1) SCE(λ1) / IR(λ1)>SCE(λ2) / IR(λ2)...Equation (2) Here, IR(λ) represents the integrated reflectance at a wavelength of λ nm. SCE(λ) represents the SCE integrated reflectance at a wavelength of λ nm.
[0003] A conventional decorative sheet is known from Patent Document 2. Patent Document 2 describes a decorative sheet that has a cholesteric liquid crystal layer with wavelength-selective reflectivity and satisfies the following formula (1). R[-45,20](λ1) / R[-45,20](λ2)≧5 Equation (1) Here, R[-45,20](λ) represents the reflectance at wavelength λ measured at a light receiving angle of a polar angle of 20° at an azimuth angle shifted by 180° from the azimuth angle of incident light at a polar angle of -45° to the decorative sheet. λ1 represents the peak wavelength in the wavelength range of 380 nm to 780 nm of the characteristic reflectance measured by allowing light to enter from the viewing side surface of the decorative sheet, When λ21=λ1+200 nm and λ22=λ1-200 nm, R[-45,20](λ21) and R[-45,20](λ22) are compared, and either λ21 or λ22 that shows the smaller value is defined as λ2. [Prior art documents] [Patent documents]
[0004] [Patent Document 1] International Publication No. 2019 / 073974 [Patent Document 2] International Publication No. 2018 / 043678 Summary of the Invention [Problem to be solved by the invention]
[0005] An object of one embodiment of the present disclosure is to provide a decorative film that is excellent in the visibility of a display and the visibility of a decoration. The problem that another embodiment of the present disclosure aims to solve is to provide a molded body obtained by molding the above-mentioned decorative film, a decorative panel equipped with the above-mentioned decorative film or its molded body, and a display device equipped with the above-mentioned decorative panel. [Means for solving the problem]
[0006] The means for solving the above problems include the following aspects. <1> A decorative film having a reflective layer that selectively reflects at least a portion of light in the wavelength range of 380 nm to 780 nm, and having a maximum integrated reflectance of 30% or less in the wavelength range of 380 nm to 780 nm. <2> The ratio of diffuse reflectance to total light reflectance is 80% or more <1> The decorative film according to claim 1. <3> In the reflectance spectrum of the decorative film taken by an integrating sphere, the half-width of the peak showing the maximum integrated reflectance is 200 nm or more. <1> or <2> The decorative film according to claim 1. <4> The decorative film has an integrated reflectance of 3% to 30% at a wavelength of 800 nm. <1> ~ <3> 10. The decorative film according to claim 9, wherein the decorative film is a film having a thickness of 100 nm or less. <5> The maximum integrated reflectance in the wavelength range of 380nm to 780nm is 5% or more. <1> ~ <4> 10. The decorative film according to claim 9, wherein the decorative film is a film having a thickness of 100 nm or less. <6> The reflective layer contains a cholesteric liquid crystal compound. <1> ~ <5> 10. The decorative film according to claim 9, wherein the decorative film is a film having a thickness of 100 nm or less. <7> The reflective layer has a portion in which the helical pitch of the cholesteric liquid crystal structure changes in the thickness direction. <6> The decorative film according to claim 1. <8> Further comprising a scattering layer that scatters at least a portion of light in the wavelength range of 380 nm to 780 nm. <1> ~ <7> 10. The decorative film according to claim 9, wherein the decorative film is a film having a thickness of 100 nm or less. <9> <1> ~ <8> 10. A molded article obtained by molding the decorative film according to any one of the above items. <10> <1> ~ <8> The decorative film according to any one of the above items, or <9> A decorative panel comprising the molded body according to claim 1. <11> <10> A display device comprising the decorative panel according to claim 1. [Effects of the Invention]
[0007] According to one embodiment of the present disclosure, a decorative film having excellent visibility of a display and visibility of a decoration can be provided. According to other embodiments of the present disclosure, it is possible to provide a molded body obtained by molding the decorative film, a decorative panel including the decorative film or its molded body, and a display device including the decorative panel. [Brief explanation of the drawings]
[0008] [Figure 1] 1 is a schematic cross-sectional view showing an example of a decorative film according to the present disclosure. DETAILED DESCRIPTION OF THE INVENTION
[0009] The decorative film according to the present disclosure will be described below. However, the present disclosure is not limited to the following embodiments and can be implemented with appropriate modifications within the scope of the object of the present disclosure. When describing the embodiments of the present disclosure with reference to the drawings, explanations of overlapping components and symbols may be omitted. Components indicated by the same symbols in the drawings are the same components. The dimensional ratios in the drawings do not necessarily represent the actual dimensional ratios.
[0010] In the present disclosure, when a group (atomic group) is represented without specifying whether it is substituted or unsubstituted, it encompasses both unsubstituted and substituted groups. For example, the term "alkyl group" encompasses not only alkyl groups without a substituent (unsubstituted alkyl groups) but also alkyl groups with a substituent (substituted alkyl groups). In this disclosure, "light" means actinic rays or radiation. In the present disclosure, "actinic rays" or "radiation" refers to, for example, the bright line spectrum of a mercury lamp, far ultraviolet light represented by an excimer laser, extreme ultraviolet light (EUV light: Extreme Ultraviolet), X-rays, and electron beams (EB). Unless otherwise specified, "exposure" in this disclosure includes not only exposure to the bright line spectrum of a mercury lamp, far ultraviolet light typified by an excimer laser, extreme ultraviolet light, X-rays, EUV light, and the like, but also exposure to particle beams such as electron beams and ion beams. In the present disclosure, the symbol "to" is used to mean that the numerical values before and after it are included as the lower limit and upper limit.
[0011] In this disclosure, (meth)acrylate refers to acrylate and methacrylate, and (meth)acrylic refers to acrylic and methacrylic. In the present disclosure, the weight average molecular weight (Mw) of a resin component, the number average molecular weight (Mn) of a resin component, and the dispersity (also referred to as molecular weight distribution) (Mw / Mn) of a resin component are defined as polystyrene-equivalent values measured using a Gel Permeation Chromatography (GPC) apparatus (HLC-8120GPC manufactured by Tosoh Corporation) (solvent: tetrahydrofuran, flow rate (sample injection amount): 10 μL, column: TSK gel Multipore HXL-M manufactured by Tosoh Corporation, column temperature: 40°C, flow rate: 1.0 mL / min, detector: refractive index detector).
[0012] In the present disclosure, the amount of each component in a composition means the total amount of the corresponding substances present in the composition, unless otherwise specified, when multiple substances corresponding to each component are present in the composition. In the present disclosure, the term "step" includes not only an independent step but also a step that cannot be clearly distinguished from other steps, as long as the intended purpose of the step is achieved. In the present disclosure, the term "total solid content" refers to the total mass of the components of the composition excluding the solvent. Also, the term "solid content" refers to the components of the composition excluding the solvent, and may be solid or liquid at 25°C, for example. In the present disclosure, "% by mass" and "% by weight" are synonymous, and "parts by mass" and "parts by weight" are synonymous. Also, in the present disclosure, a combination of two or more preferred embodiments is a more preferred embodiment.
[0013] (decorative film) The decorative film according to the present disclosure has a reflective layer that selectively reflects at least a portion of light in the wavelength range of 380 nm to 780 nm, and has a maximum integrated reflectance of 30% or less in the wavelength range of 380 nm to 780 nm.
[0014] The uses of the decorative film according to the present disclosure are not particularly limited, and can be used, for example, to decorate display devices such as electronic devices (e.g., wearable devices and smartphones), home appliances, audio products, computers, displays, and in-vehicle products. In particular, the decorative film according to the present disclosure can be suitably used to decorate electronic devices (e.g., wearable devices and smartphones). Furthermore, since the decorative film according to the present disclosure also has excellent three-dimensional formability, it is suitable as a decorative film for molding used in molding such as three-dimensional molding and insert molding, and is more suitable as a decorative film for three-dimensional molding.
[0015] With conventional decorative films, when the display is turned on and displayed, external light is reflected by the reflective layer, making the decoration by the decorative film visible and making the display difficult to see. Therefore, when the display is turned on and displayed, the visibility of the display, which is blocked by the decorative film, is insufficient. Furthermore, it has been particularly difficult to achieve both the visibility of the display and the visibility of the decoration from various viewing angles when the display is turned off and not displayed. As a result of detailed studies by the present inventors, the present inventors have found that by adopting the above embodiment, a decorative film excellent in the visibility of the display and the visibility of the decoration can be obtained. Although the detailed mechanism is unknown, the maximum integrated reflectance in the wavelength range of 380 nm to 780 nm is low at 30% or less, so that the deterioration of the visibility of the display due to the reflection of external light when the display is turned on can be suppressed, and the visibility of the display is excellent. * ) 2 +(b * ) 2} 1 / 2 ) is low, the change in reflected color depending on the observation angle is suppressed, and it is estimated that a decorative film with excellent visibility of the decoration from various viewing angles (also simply referred to as "visibility of the decoration") can be obtained. Also, saturation ({(a * ) 2 +(b * ) 2} 1 / 2) is low, which suppresses changes in reflected color depending on the observation angle, resulting in a decorative film with excellent decorative design. The visibility of the display includes not only ordinary displays but also displays in display devices of smartphones, home appliances, audio products, computers, in-vehicle products, and the like.
[0016] In addition, the decorative film according to the present disclosure has a low maximum integrated reflectance of 30% or less in the wavelength range of 380 nm to 780 nm, and therefore the saturation ({(a * ) 2 +(b * ) 2} 1 / 2 ) is lower, and the color difference when the observation angle is changed is ΔE={(L * ) 2 +(a * ) 2 +(b * ) 2} 1 / 2 It is estimated that this will result in a decorative film with reduced color change due to the viewing angle. In this disclosure, "color" refers to reflected color and saturation.
[0017] [Maximum integrated reflectance in the wavelength range of 380nm to 780nm] The decorative film according to the present disclosure has a maximum integrated reflectance of 30% or less in the wavelength range of 380 nm to 780 nm, and from the viewpoints of visibility of the display and suppression of color shift due to the viewing angle, it is preferably 25% or less, more preferably 20% or less, and particularly preferably 18% or less. The lower limit is preferably 5% or more, more preferably 10% or more, from the viewpoints of visibility of the display and suppression of color shift due to the viewing angle.
[0018] In the present disclosure, the maximum integrated reflectance of the decorative film in the wavelength range of 380 nm to 780 nm is measured by the following method. The integrated reflectance spectrum of the reflective layer in the decorative film is measured using a spectrophotometer equipped with an integrating sphere ("V-670" manufactured by JASCO Corporation) so that light is incident from the liquid crystal layer side of the reflective layer in the decorative film, including specularly reflected light. In the obtained integrated spectrum, the maximum reflectance in the wavelength range of 380 nm to 780 nm is defined as the maximum integrated reflectance. The wavelength range for measurement should be at least 380 nm to 780 nm, preferably 300 nm to 1,200 nm, and can be appropriately selected taking into consideration the half-width and integrated reflectance at a wavelength of 800 nm, which will be described later.
[0019] The peak wavelength at which the decorative film according to the present disclosure exhibits the maximum integrated reflectance is not particularly limited as long as it is in the wavelength range of 380 nm to 780 nm, and can be appropriately selected depending on the desired design. In particular, the effects of the present disclosure can be more effectively exhibited with designs that have a subdued color scheme that blends in with living spaces, such as wood grain or fabric.
[0020] [Ratio of diffuse reflectance to total reflectance] In the decorative film according to the present disclosure, the ratio of diffuse reflectance to total light reflectance is preferably 50% or more, more preferably 80% or more, and particularly preferably 90% or more, from the viewpoints of visibility of the decoration and suppression of color change due to viewing angle, with the upper limit being 100%.
[0021] In the present disclosure, the ratio of diffuse reflectance to total light reflectance is measured and calculated by the following method. The diffuse integrated reflectance spectrum of the reflective layer in the decorative film was measured using a spectrophotometer equipped with an integrating sphere ("V-670" manufactured by JASCO Corporation) so that specular reflection light was not included during measurement. In the obtained integrated spectrum, the maximum reflectance at wavelengths of 380 nm to 780 nm was defined as the maximum diffuse integrated reflectance. The ratio of the maximum diffuse integrated reflectance to the maximum integrated reflectance measured above was defined as the ratio of the diffuse reflectance to the total light reflectance of the decorative film in the present disclosure. That is, the ratio of the diffuse reflectance to the total light reflectance was calculated using the following formula: Percentage of diffuse reflectance to total light reflectance (%) = Maximum diffuse integral reflectance above / Maximum integral reflectance x 100
[0022] [FWHM of the peak showing the maximum integrated reflectance] In the reflectance spectrum of the decorative film according to the present disclosure measured by an integrating sphere, the half-width of the peak exhibiting the maximum integrated reflectance is preferably 80 nm or more, more preferably 150 nm or more, even more preferably 200 nm or more, and particularly preferably 200 nm to 600 nm, from the viewpoints of visibility of the decoration and suppression of color change due to viewing angle.
[0023] In the present disclosure, the half-value width of the peak indicating the maximum integrated reflectance of the decorative film is measured by the following method. From the integrated spectrum measured by the above-mentioned method for measuring the integrated reflectance, the half-width of the peak showing the above-mentioned maximum integrated reflectance is measured.
[0024] [Integrated reflectance at a wavelength of 800 nm] The integrated reflectance of the decorative film according to the present disclosure at a wavelength of 800 nm is preferably 3% to 30%, more preferably 5% to 25%, and particularly preferably 8% to 20%, from the viewpoints of visibility of the decoration and suppression of color change due to viewing angle.
[0025] In the present disclosure, the integrated reflectance of a decorative film at a wavelength of 800 nm is measured by the following method. From the integrated spectrum measured by the above-mentioned method for measuring integrated reflectance, the integrated reflectance at a wavelength of 800 nm is measured.
[0026] [Reflective layer] The decorative film according to the present disclosure has a reflective layer that selectively reflects at least a portion of light in the wavelength range of 380 nm to 780 nm. Examples of the reflective layer are not particularly limited, and suitable examples include an organic multilayer film layer, an inorganic multilayer film layer, a cholesteric liquid crystal layer, etc. Among these, an inorganic multilayer film layer or a cholesteric liquid crystal layer is more preferred, and a cholesteric liquid crystal layer is particularly preferred.
[0027] Methods for expanding the half-value width of the peak showing the maximum integrated reflectance in the decorative film of the present disclosure to a preferred range include a method of stacking multiple reflective films as a reflective layer, each having different numbers and film thicknesses of cholesteric liquid crystal compound layers, and thereby different helical pitches of the cholesteric liquid crystal structure, and a method of forming a reflective layer in which the helical pitch of the cholesteric liquid crystal structure changes in the layer thickness direction of the reflective layer, preferably in a gradational manner. Among these, preferred are a method of laminating multiple reflective films having different helical pitches of cholesteric liquid crystal structures due to differences in the number and film thickness of cholesteric liquid crystal compound layers as the reflective layer, and a method of forming a reflective layer in which the helical pitch of the cholesteric liquid crystal structure changes in the thickness direction of the reflective layer, preferably in a gradational manner, and more preferred are a method of forming a reflective layer in which the helical pitch of the cholesteric liquid crystal structure changes in the thickness direction of the reflective layer, preferably in a gradational manner.
[0028] From the viewpoint of visibility of the display, the reflective layer preferably contains a cholesteric liquid crystal compound. Furthermore, from the viewpoints of visibility of the display, visibility of the decoration, and suppression of color change due to viewing angle, it is particularly preferable that the reflective layer has a portion in which the helical pitch of the cholesteric liquid crystal structure changes in the thickness direction. Preferred means for changing the helical pitch of the cholesteric liquid crystal structure, preferably for causing a gradation change, include a means for preventing diffusion of the photosensitive chiral agent by exposure at low temperature, and a means for controlling the activation of the photopolymerization initiator to appropriately maintain the time for the cholesteric liquid crystal compound to align in a gradational manner.
[0029] <<Organic multilayer film layer>> A suitable example of the organic multilayer film layer is a layer having a structure in which a resin layer with a high refractive index (layer A) and a resin layer with a low refractive index (layer B) are laminated together. From the viewpoints of visibility of pale color tones and suppression of color change due to viewing angle, Layer B is preferably a layer having a refractive index lower than Layer A by 0.1 or more, more preferably a layer having a refractive index lower by 0.15 or more, even more preferably a layer having a refractive index lower by 0.2 or more, particularly preferably a layer having a refractive index lower by 0.25 or more, and most preferably a layer having a refractive index lower by 0.25 or more and 0.60 or less. From the viewpoints of visibility of pale colors and suppression of color change due to viewing angle, the refractive index of Layer A is preferably 1.5 or more, more preferably 1.6 or more, even more preferably 1.65 or more, and particularly preferably 1.70 or more, and the upper limit is preferably 2.3 or less, more preferably 1.9 or less. From the viewpoints of visibility of pale colors and suppression of color change due to viewing angle, the refractive index of Layer B is preferably 1.5 or less, more preferably less than 1.5, even more preferably 1.4 or less, particularly preferably 1.35 or less, and most preferably 1.32 or less. The lower limit is preferably 1.1 or more, more preferably 1.2 or more, and particularly preferably 1.28 or more.
[0030] The resin used in each layer such as Layer A and Layer B is not particularly limited, but examples thereof include acrylic resin, polycarbonate resin, polyester resin, polyolefin resin, epoxy resin, urethane resin, and silicone resin. The number of layers in the organic multilayer film is not particularly limited as long as it is 2 or more, but is preferably 2 to 20 layers, more preferably 4 to 16 layers, and even more preferably 6 to 14 layers. The thickness of Layer A and Layer B is preferably 50 nm to 1,000 nm, more preferably 80 nm to 800 nm, even more preferably 100 nm to 500 nm, and particularly preferably 100 nm to 300 nm, from the viewpoint of visibility of pale color tones and suppression of color change due to viewing angle.
[0031] <<Inorganic multilayer film layer>> A suitable example of the inorganic multilayer film is a layer having a structure in which two types of inorganic compounds are alternately laminated. In addition, from the viewpoint of visibility of pale color tones and suppression of color change due to the viewing angle, the two inorganic compounds are preferably compounds with different refractive indices. Examples of inorganic compounds include silicon dioxide, aluminum oxide, gallium oxide, tungsten oxide, magnesium oxide, barium fluoride, calcium fluoride, cerium fluoride, lanthanum fluoride, lithium fluoride, sodium fluoride, magnesium fluoride, neodymium fluoride, ytterbium fluoride, yttrium fluoride, gadolinium fluoride, calcium carbonate, potassium bromide, titanium monoxide, titanium dioxide, niobium pentoxide, chromium oxide, cerium oxide, silicon, and gallium arsenide. Among these, from the viewpoints of visibility of pale colors and suppression of color change due to viewing angles, a combination of inorganic oxides is preferred as the two inorganic compounds, a combination of niobium pentoxide (NbO) or titanium dioxide (TiO) with silicon dioxide (SiO) or aluminum oxide (AlO) is more preferred, and a combination of niobium pentoxide with silicon dioxide is particularly preferred.
[0032] The number of laminations in the inorganic multilayer film is not particularly limited as long as it is 2 or more, but is preferably 2 to 20 layers, more preferably 4 to 16 layers, and even more preferably 6 to 14 layers. The thickness of each layer in the inorganic multilayer film is preferably 50 nm to 1,000 nm, more preferably 80 nm to 800 nm, even more preferably 100 nm to 500 nm, and particularly preferably 100 nm to 300 nm, from the viewpoints of visibility of pale color tones and suppression of color change due to viewing angle.
[0033] <<Cholesteric Liquid Crystal Layer>> The reflective layer is preferably a cholesteric liquid crystal layer. The cholesteric liquid crystal layer is a layer containing a cholesteric liquid crystal phase. The cholesteric liquid crystal phase can be confirmed by known means (for example, a polarizing microscope or a scanning electron microscope).
[0034] It is known that a cholesteric liquid crystal phase is formed by arranging a plurality of liquid crystal compounds in a helical configuration. The orientation state of the liquid crystal compounds in the cholesteric liquid crystal phase may be an orientation state that reflects right-handed circularly polarized light, left-handed circularly polarized light, or both right-handed and left-handed circularly polarized light. The orientation state of the liquid crystal compounds in the cholesteric liquid crystal phase may be fixed. The orientation state of the liquid crystal compounds is fixed, for example, by polymerization or crosslinking of the liquid crystal compounds. The liquid crystallinity of the liquid crystal compounds may be lost in some or all of the liquid crystal compounds whose orientation state is fixed.
[0035] The cholesteric liquid crystal layer contributes to the design of the decorative material. For example, the color of the decorative material and the degree of color change of the decorative material depending on the viewing angle can be adjusted by the helical pitch in the cholesteric liquid crystal phase, the refractive index of the cholesteric liquid crystal layer, and the thickness of the cholesteric liquid crystal layer. The helical pitch can be adjusted by the amount of chiral agent added. The relationship between the helical structure and the chiral agent is described, for example, in "Fujifilm Research Report, No. 50 (2005), pp. 60-63." The helical pitch can also be adjusted by conditions such as temperature, illuminance, and exposure time when fixing the cholesteric liquid crystal phase.
[0036] The decorative film according to the present disclosure may include two or more cholesteric liquid crystal layers, and the compositions of the two or more cholesteric liquid crystal layers may be the same or different from each other.
[0037] From the viewpoint of reflectance, the thickness of the cholesteric liquid crystal layer is preferably 0.3 μm to 15 μm, more preferably 0.5 μm to 9 μm, and even more preferably 0.6 μm to 7 μm. When the decorative film includes two or more cholesteric liquid crystal layers, the thicknesses of the two or more cholesteric liquid crystal layers preferably each independently fall within the above-mentioned ranges.
[0038] The components of the cholesteric liquid crystal layer are selected from known cholesteric liquid crystal layer components, depending on the desired properties of the cholesteric liquid crystal layer. Examples of the components of the cholesteric liquid crystal layer include the components of the liquid crystal composition described below. However, when the cholesteric liquid crystal layer is formed by curing the liquid crystal composition, some or all of the polymerizable compounds in the liquid crystal composition may form a polymer (including an oligomer) in the cholesteric liquid crystal layer. Examples of the polymerizable compound include compounds having a polymerizable group.
[0039] The cholesteric liquid crystal layer is preferably a layer formed by curing a composition containing a liquid crystal compound (hereinafter, sometimes referred to as a "liquid crystal composition.") Hereinafter, embodiments of the liquid crystal composition will be specifically described.
[0040] The liquid crystal composition contains a liquid crystal compound. The type of liquid crystal compound may be selected from known compounds having cholesteric liquid crystal properties (i.e., cholesteric liquid crystal compounds) depending on the desired properties of the cholesteric liquid crystal layer. Examples of the liquid crystal compound include liquid crystal compounds having at least one group selected from the group consisting of an ethylenically unsaturated group and a cyclic ether group. From the viewpoint of improving moldability, the liquid crystal compound preferably contains a cholesteric liquid crystal compound having one ethylenically unsaturated group or one cyclic ether group (hereinafter, sometimes referred to as a "specific liquid crystal compound").
[0041] Examples of the ethylenically unsaturated group in the specific liquid crystal compound include a (meth)acryloyloxy group, a (meth)acrylamide group, a vinyl group, a vinyl ester group, and a vinyl ether group. From the viewpoint of reactivity, the ethylenically unsaturated group is preferably a (meth)acryloyloxy group, a (meth)acrylamide group, or a vinyl group, more preferably a (meth)acryloyloxy group or a (meth)acrylamide group, even more preferably a (meth)acryloyloxy group, and particularly preferably an acryloyloxy group.
[0042] Examples of the cyclic ether group in the specific liquid crystal compound include an epoxy group and an oxetanyl group. From the viewpoint of reactivity, the cyclic ether group is preferably an epoxy group or an oxetanyl group, and more preferably an oxetanyl group.
[0043] From the viewpoint of improving reactivity and moldability, the liquid crystal compound preferably contains a liquid crystal compound having one ethylenically unsaturated group, and the ratio of the total amount of the liquid crystal compound having one ethylenically unsaturated group to the total amount of solids in the liquid crystal composition is preferably 25 mass% or more.
[0044] When the number of ethylenically unsaturated groups contained in the molecule is one, the specific liquid crystal compound may have a functional group other than the ethylenically unsaturated group (e.g., a polymerizable group). For example, a liquid crystal compound having one ethylenically unsaturated group may have one or more cyclic ether groups.
[0045] When the number of cyclic ether groups contained in the molecule is one, the specific liquid crystal compound may have a functional group other than the cyclic ether group (e.g., a polymerizable group). For example, a liquid crystal compound having one cyclic ether group may have one or more ethylenically unsaturated groups.
[0046] From the viewpoint of improving moldability, the liquid crystal compound preferably includes a liquid crystal compound having one ethylenically unsaturated group and no cyclic ether group, a liquid crystal compound having one cyclic ether group and no ethylenically unsaturated group, or a liquid crystal compound having one ethylenically unsaturated group and one cyclic ether group. Furthermore, the liquid crystal compound preferably includes a liquid crystal compound having one ethylenically unsaturated group and no cyclic ether group.
[0047] The specific liquid crystal compound may be a rod-shaped liquid crystal compound or a discotic liquid crystal compound. From the viewpoints of ease of adjusting the helical pitch in the cholesteric liquid crystal phase and suppressing changes in reflectance and color after molding, a rod-shaped liquid crystal compound is preferred.
[0048] Preferable rod-shaped liquid crystal compounds include, for example, azomethine compounds, azoxy compounds, cyanobiphenyl compounds, cyanophenyl esters, benzoic acid esters, cyclohexanecarboxylic acid phenyl esters, cyanophenylcyclohexane compounds, cyano-substituted phenylpyrimidine compounds, alkoxy-substituted phenylpyrimidine compounds, phenyldioxane compounds, tolane compounds, and alkenylcyclohexylbenzonitrile compounds. The rod-shaped liquid crystal compounds are not limited to low-molecular-weight compounds, but may also be high-molecular-weight compounds.
[0049] Rod-shaped liquid crystal compounds are described, for example, in "Makromol. Chem., Vol. 190, p. 2255 (1989)" and "Advanced Materials 5, p. 107 (1993),” U.S. Pat. No. 4,683,327, U.S. Pat. No. 5,622,648, U.S. Pat. No. 5,770,107, WO 95 / 22586, WO 95 / 24455, WO 97 / 00600, WO 98 / 23580, WO 98 / 52905, JP-A Nos. 1-272551, 6-16616, 7-110469, 11-80081, and 2001-328973. Preferred rod-shaped liquid crystal compounds may be selected from compounds having one ethylenically unsaturated group and compounds having one cyclic ether group, for example, as described in JP-A-11-513019 and JP-A-2007-279688.
[0050] Preferred discotic liquid crystal compounds may be selected from compounds having one ethylenically unsaturated group and compounds having one cyclic ether group, for example, as described in JP-A-2007-108732 and JP-A-2010-244038.
[0051] Specific examples of the specific liquid crystal compound are shown below, but the type of the specific liquid crystal compound is not limited to the following specific examples.
[0052] [ka]
[0053] [ka]
[0054] [ka]
[0055] [ka]
[0056] [ka]
[0057] [ka]
[0058] [ka]
[0059] [ka]
[0060] [ka]
[0061] The liquid crystal composition may contain one or more cholesteric liquid crystal compounds.
[0062] From the viewpoint of improving stretchability and thermal durability, the ratio of the total amount of the specific liquid crystal compound to the total amount of solids in the liquid crystal composition is preferably 25% by mass or more, more preferably 30% by mass or more, and even more preferably 40% by mass or more. Furthermore, the ratio of the total amount of the specific liquid crystal compound to the total amount of solids in the liquid crystal composition is preferably 60% by mass to 99% by mass, and more preferably 80% by mass to 98% by mass.
[0063] The liquid crystal composition may contain other liquid crystal compounds. The other liquid crystal compounds refer to liquid crystal compounds other than the specific liquid crystal compound. Examples of the other liquid crystal compounds include liquid crystal compounds having no ethylenically unsaturated group and no cyclic ether group, liquid crystal compounds having two or more ethylenically unsaturated groups and no cyclic ether group, liquid crystal compounds having two or more cyclic ether groups and no ethylenically unsaturated group, and liquid crystal compounds having two or more ethylenically unsaturated groups and two or more cyclic ether groups.
[0064] From the viewpoint of suppressing changes in reflectance and color after molding, the other liquid crystal compound is preferably at least one selected from the group consisting of liquid crystal compounds having no ethylenically unsaturated group and no cyclic ether group, liquid crystal compounds having two or more ethylenically unsaturated groups but no cyclic ether group, and liquid crystal compounds having two or more cyclic ether groups but no ethylenically unsaturated group. The other liquid crystal compound is more preferably at least one selected from the group consisting of liquid crystal compounds having no ethylenically unsaturated group and no cyclic ether group, liquid crystal compounds having two ethylenically unsaturated groups but no cyclic ether group, and liquid crystal compounds having two cyclic ether groups but no ethylenically unsaturated group. The other liquid crystal compound is even more preferably at least one selected from the group consisting of liquid crystal compounds having no ethylenically unsaturated group and no cyclic ether group, and liquid crystal compounds having two ethylenically unsaturated groups but no cyclic ether group.
[0065] The rod-shaped liquid crystal compound in the other liquid crystal compound may be selected from compounds described in, for example, "Makromol. Chem., Vol. 190, p. 2255 (1989)", "Advanced Materials, Vol. 5, p. 107 (1993)", U.S. Pat. No. 4,683,327, U.S. Pat. No. 5,622,648, U.S. Pat. No. 5,770,107, WO 95 / 22586, WO 95 / 24455, WO 97 / 00600, WO 98 / 23580, WO 98 / 52905, JP-A-1-272551, JP-A-6-16616, JP-A-7-110469, JP-A-11-80081, and JP-A-2001-328973. Preferred rod-shaped liquid crystal compounds among the other liquid crystal compounds may be selected from compounds described in, for example, JP-A-11-513019 and JP-A-2007-279688.
[0066] Preferred discotic liquid crystal compounds among the other liquid crystal compounds may be selected from compounds described in, for example, JP-A-2007-108732 or JP-A-2010-244038.
[0067] Specific examples of other liquid crystal compounds are shown below, but the types of other liquid crystal compounds are not limited to the following specific examples.
[0068] [ka]
[0069] [ka]
[0070] [ka]
[0071] [ka]
[0072] [ka]
[0073] The liquid crystal composition may contain one or more other liquid crystal compounds.
[0074] The ratio of the total amount of other liquid crystal compounds to the total amount of solids in the liquid crystal composition is preferably 70% by mass or less, more preferably 50% by mass or less, even more preferably 30% by mass or less, and particularly preferably 20% by mass or less, with the lower limit of the ratio being 0% by mass.
[0075] The liquid crystal composition may contain one or more liquid crystal compounds, or may contain a compound for a specific liquid and other liquid crystal compounds.
[0076] The ratio of the total amount of liquid crystal compounds to the total amount of solids in the liquid crystal composition is preferably 25% by mass or more, more preferably 30% by mass or more, and even more preferably 40% by mass or more. Furthermore, the ratio of the total amount of liquid crystal compounds to the total amount of solids in the liquid crystal composition is preferably 60% to 99% by mass, and more preferably 80% to 98% by mass.
[0077] -Chiral agent- From the viewpoint of ease of forming a cholesteric liquid crystal layer and ease of adjusting the helical pitch, the liquid crystal composition preferably contains a chiral agent (ie, an optically active compound).
[0078] The type of chiral agent may be determined depending on, for example, the type of liquid crystal compound and the desired helical structure (e.g., the twisting method and helical pitch of the helix). Examples of the chiral agent include known compounds (e.g., compounds described in Liquid Crystal Device Handbook, Chapter 3, Section 4-3, "Chiral Agents for TN (Twisted Nematic) and STN (Super-Twisted Nematic)," p. 199, edited by the 142nd Committee of the Japan Society for the Promotion of Science, 1989), isosorbide derivatives, and isomannide derivatives.
[0079] Chiral agents generally contain an asymmetric carbon atom. However, axially asymmetric compounds and planar asymmetric compounds that do not contain an asymmetric carbon atom can also be used as chiral agents. Preferred examples of axially asymmetric compounds and planar asymmetric compounds include binaphthyl compounds, helicene compounds, and paracyclophane compounds.
[0080] From the viewpoint of improving thermal durability, the liquid crystal composition may contain a chiral agent having a polymerizable group. From the viewpoint of improving reactivity and thermal durability, the polymerizable group is preferably an ethylenically unsaturated group or a cyclic ether group, and more preferably an ethylenically unsaturated group. Preferred embodiments of the ethylenically unsaturated group in the chiral agent are the same as the preferred embodiments of the ethylenically unsaturated group in the specific liquid crystal compound described above. Preferred embodiments of the cyclic ether group in the chiral agent are the same as the preferred embodiments of the cyclic ether group in the specific liquid crystal compound described above.
[0081] When the chiral agent has a polymerizable group, from the viewpoint of improving reactivity and thermal durability, the type of the polymerizable group in the chiral agent is preferably the same as the type of the polymerizable group in the specific liquid crystal compound.Furthermore, the polymerizable group in the chiral agent is preferably the same as the polymerizable group in the specific liquid crystal compound.
[0082] From the viewpoint of improving moldability, the chiral agent having a polymerizable group preferably includes a chiral agent having one ethylenically unsaturated group and no cyclic ether group, a chiral agent having one cyclic ether group and no ethylenically unsaturated group, or a chiral agent having one ethylenically unsaturated group and one cyclic ether group.Furthermore, the chiral agent having a polymerizable group preferably includes a chiral agent having one ethylenically unsaturated group and no cyclic ether group.
[0083] The chiral agent may be a liquid crystal compound.
[0084] --Photosensitive chiral agent-- The cholesteric liquid crystal layer or the reflective layer preferably contains a photosensitive chiral agent. We will describe in detail the photosensitive chiral dopants whose helical twisting power changes upon irradiation with light. The helical twisting power (HTP) of a chiral agent is a factor that indicates the helical orientation ability, which is expressed by the following formula (A). Formula (A) HTP = 1 / (helical pitch length (unit: μm) × concentration of chiral agent relative to liquid crystal compound (mass%)) [μm -1 ] The helical pitch length refers to the length of the pitch P (=helical period) of the helical structure of the cholesteric liquid crystal phase, and can be measured by the method described on page 196 of Liquid Crystal Handbook (published by Maruzen Co., Ltd.).
[0085] The photosensitive chiral agent whose helical twisting power changes upon irradiation with light may be liquid crystalline or non-liquid crystalline. The photosensitive chiral agent generally contains an asymmetric carbon atom. The photosensitive chiral agent may be an axially asymmetric compound or a planar asymmetric compound that does not contain an asymmetric carbon atom.
[0086] The photosensitive chiral agent may be a chiral agent whose helical twisting power increases or decreases upon irradiation with light, and is preferably a chiral agent whose helical twisting power decreases upon irradiation with light. In this specification, "increase and decrease in helical twisting power" refers to an increase or decrease when the initial helical direction (before light irradiation) of the photosensitive chiral agent is considered to be "positive." Therefore, even when the helical twisting power continues to decrease upon light irradiation and exceeds 0, causing the helical direction to become "negative" (i.e., when a helical twist is induced in the opposite helical direction to the initial helical direction (before light irradiation)), this also falls under the category of "a chiral agent whose helical twisting power decreases."
[0087] Examples of photosensitive chiral agents include so-called photoreactive chiral agents, which have a chiral moiety and a photoreactive moiety that undergoes a structural change upon irradiation with light, and which significantly change the twisting power of a liquid crystal compound depending on the amount of irradiation, for example. Examples of photoreactive sites that undergo structural changes upon irradiation with light include photochromic compounds (Kingo Uchida, Masahiro Irie, Chemical Industry, vol. 64, p. 640, 1999; Kingo Uchida, Masahiro Irie, Fine Chemical, vol. 28(9), p. 15, 1999). The structural changes mentioned above refer to decomposition, addition reaction, isomerization, racemization, [2+2] photocyclization, dimerization, and the like that occur upon irradiation of the photoreactive site with light, and the structural changes mentioned above are irreversible. The chiral moiety may be, for example, an asymmetric carbon described in Hiroyuki Nodaira, Chemical Review, No. 22 Chemistry of Liquid Crystals, p. 73, 1994.
[0088] Examples of the photosensitive chiral agent include the photoreactive chiral agents described in paragraphs 0044 to 0047 of JP-A No. 2001-159709, the optically active compounds described in paragraphs 0019 to 0043 of JP-A No. 2002-179669, the optically active compounds described in paragraphs 0020 to 0044 of JP-A No. 2002-179633, the optically active compounds described in paragraphs 0016 to 0040 of JP-A No. 2002-179670, the optically active compounds described in paragraphs 0017 to 0050 of JP-A No. 2002-179668, and the optically active compounds described in paragraph 0018 of JP-A No. 2002-180051. optically active compounds described in paragraphs 0016 to 0055 of JP-A-2002-338575, optically active isosorbide derivatives described in paragraphs 0023 to 0032 of JP-A-2002-080478, photoreactive optically active compounds described in paragraphs 0019 to 0029 of JP-A-2002-080851, optically active compounds described in paragraphs 0022 to 0049 of JP-A-2002-179681, optically active compounds described in paragraphs 0015 to 0044 of JP-A-2002-302487, and JP-A-2002-338668 the optically active polyesters described in paragraphs
[0015] to
[0050] of JP-A No. 2003-055315, the binaphthol derivatives described in paragraphs
[0019] to
[0041] of JP-A No. 2003-073381, the optically active fulgide compounds described in paragraphs
[0008] to
[0043] of JP-A No. 2003-073381, the optically active isosorbide derivatives described in paragraphs
[0015] to
[0057] of JP-A No. 2003-306490, the optically active isosorbide derivatives described in paragraphs
[0015] to
[0041] of JP-A No. 2003-306491, the optically active isosorbide derivatives described in paragraphs
[0015] to
[0049] of JP-A No. 2003-313187, Examples of optically active isosorbide derivatives include the optically active isomannide derivatives described in paragraphs 0015 to 0057 of JP-A No. 2003-313188, the optically active isosorbide derivatives described in paragraphs 0015 to 0049 of JP-A No. 2003-313189, the optically active polyester / amides described in paragraphs 0015 to 0052 of JP-A No. 2003-313292, the optically active compounds described in paragraphs 0012 to 0053 of WO 2018 / 194157, and the optically active compounds described in paragraphs 0020 to 0049 of JP-A No. 2002-179682.
[0089] Among the photosensitive chiral agents, compounds having at least a photoisomerizable moiety are preferred, and the photoisomerizable moiety more preferably has a photoisomerizable double bond. As the photoisomerizable moiety having the photoisomerizable double bond, a cinnamoyl moiety, a chalcone moiety, an azobenzene moiety, or a stilbene moiety is preferred in that photoisomerization is likely to occur and the difference in helical twisting power before and after light irradiation is large, and a cinnamoyl moiety, a chalcone moiety, or a stilbene moiety is more preferred in that the absorption of visible light is small. Note that the photoisomerizable moiety corresponds to the photoreactive moiety that undergoes a structural change upon light irradiation as described above.
[0090] In addition, it is preferable that the photosensitive chiral agent has a trans-type photoisomerizable double bond, since this has a high initial helical twisting power (before light irradiation) and a better change in the helical twisting power due to light irradiation. In addition, it is preferable that the photosensitive chiral agent has a cis-type photoisomerizable double bond, since this has a low initial helical twisting power (before light irradiation) and a better change in the helical twisting power due to light irradiation.
[0091] The photosensitive chiral agent preferably has any partial structure selected from the group consisting of a binaphthyl partial structure, an isosorbide partial structure (a partial structure derived from isosorbide), and an isomannide partial structure (a partial structure derived from isomannide). The binaphthyl partial structure, the isosorbide partial structure, and the isomannide partial structure each refer to the following structures. In the binaphthyl partial structure, the portion where the solid line and the dashed line are parallel represents a single bond or a double bond. In the structures shown below, * represents the bond position.
[0092] [ka]
[0093] The photosensitive chiral agent may have a polymerizable group. The type of the polymerizable group is not particularly limited, and is preferably a functional group capable of undergoing an addition polymerization reaction, more preferably a polymerizable ethylenically unsaturated group or a ring-polymerizable group, and still more preferably a (meth)acryloyl group, a vinyl group, a styryl group, or an allyl group.
[0094] The photosensitive chiral agent is preferably a compound represented by formula (C). Formula (C) RLR Each R independently represents a group having at least one moiety selected from the group consisting of a cinnamoyl moiety, a chalcone moiety, an azobenzene moiety, and a stilbene moiety. L represents a divalent linking group formed by removing two hydrogen atoms from the structure represented by formula (D) (a divalent linking group formed by removing two hydrogen atoms from the binaphthyl partial structure), a divalent linking group represented by formula (E) (a divalent linking group consisting of the isosorbide partial structure), or a divalent linking group represented by formula (F) (a divalent linking group consisting of the isomannide partial structure). In formula (E) and formula (F), * represents a bonding position.
[0095] [ka]
[0096] The reflective layer may be formed in an embodiment using one kind of photosensitive chiral agent alone or in an embodiment using two or more kinds of photosensitive chiral agents.
[0097] The molar absorption coefficient of the photosensitive chiral agent is not particularly limited, but the molar absorption coefficient at the wavelength of light irradiated in the twist change step described below (e.g., 365 nm) is preferably 100 L / (mol cm) to 100,000 L / (mol cm), and more preferably 500 L / (mol cm) to 50,000 L / (mol cm).
[0098] --Polymerizable chiral agent-- The cholesteric liquid crystal layer may contain a polymerizable chiral agent as a chiral agent in order to more easily fix the helical structure of the cholesteric liquid crystal compound. The polymerizable chiral agent refers to a chiral agent having a polymerizable group. The polymerizable chiral agent referred to here is one whose helical twisting power does not change upon irradiation with light, and is distinguished from a photosensitive chiral agent.
[0099] Examples of the polymerizable group contained in the polymerizable chiral agent include a radically polymerizable group and a cationic polymerizable group. The polymerizable group is preferably an ethylenically unsaturated group, an epoxy group, or an aziridinyl group, and more preferably an ethylenically unsaturated group.
[0100] The polymerizable chiral agent is preferably a compound containing an asymmetric carbon atom, but may also be an axially asymmetric compound or a planar asymmetric compound containing no asymmetric carbon atom. Examples of the axially asymmetric compound or the planar asymmetric compound include binaphthyl, helicene, paracyclophane, and derivatives thereof.
[0101] When the cholesteric liquid crystal layer contains a cholesteric liquid crystal compound having a polymerizable group, the polymerizable chiral agent preferably contains the same type of polymerizable group as the cholesteric liquid crystal compound. For example, when the cholesteric liquid crystal compound has a radical polymerizable group, the polymerizable chiral agent preferably also contains a radical polymerizable group. This allows the cholesteric liquid crystal compound having the polymerizable group and the polymerizable chiral agent to polymerize to form a polymer, making it easier to fix the helical structure of the cholesteric liquid crystal compound.
[0102] The polymerizable chiral agent is preferably an isosorbide derivative, an isomannide derivative, or a binaphthyl derivative. Commercially available isosorbide derivatives include "Paliocolor LC756" manufactured by BASF.
[0103] The polymerizable chiral agent may be used alone or in combination of two or more kinds.
[0104] The liquid crystal composition may contain one or more chiral agents.
[0105] The content of the chiral dopant may be determined depending on, for example, the structure of the liquid crystal compound and the desired helical pitch. From the viewpoint of ease of forming a cholesteric liquid crystal layer and ease of adjusting the helical pitch, the ratio of the total amount of the chiral dopant to the total amount of solids in the liquid crystal composition is preferably 1% by mass to 20% by mass, more preferably 2% by mass to 15% by mass, and even more preferably 3% by mass to 10% by mass.
[0106] The helical pitch in the cholesteric liquid crystal phase and the selective reflection wavelength of the reflective layer can be easily adjusted not only by the type of liquid crystal compound but also by the content of the chiral agent. For example, if the content of the chiral agent in the liquid crystal composition is doubled, the helical pitch may be halved and the center value of the selective reflection wavelength may also be halved.
[0107] The liquid crystal composition preferably contains a polymerization initiator, which accelerates the curing reaction of the liquid crystal composition.
[0108] When the liquid crystal composition is cured by exposure to light, the liquid crystal composition preferably contains a photopolymerization initiator, such as a photoradical polymerization initiator or a photocationic polymerization initiator.
[0109] Examples of the photopolymerization initiator include α-carbonyl compounds (e.g., U.S. Pat. Nos. 2,367,661 and 2,367,670), acyloin ether compounds (e.g., U.S. Pat. No. 2,448,828), α-hydrocarbon-substituted aromatic acyloin compounds (e.g., U.S. Pat. No. 2,722,512), polynuclear quinone compounds (e.g., U.S. Pat. Nos. 3,046,127 and 2,951,758), combinations of triarylimidazole dimers and p-aminophenyl ketones (e.g., U.S. Pat. No. 3,549,367), oxadiazole compounds (e.g., U.S. Pat. No. 4,212,970), acridine compounds, and phenazine compounds (e.g., JP-A-60-105667 and U.S. Pat. No. 4,239,850).
[0110] Preferred examples of the photoradical polymerization initiator include an α-hydroxyalkylphenone compound, an α-aminoalkylphenone compound, and an acylphosphine oxide compound.
[0111] Preferred examples of the cationic photopolymerization initiator include iodonium salt compounds and sulfonium salt compounds.
[0112] The liquid crystal composition preferably contains a radical polymerization initiator or a cationic polymerization initiator, and more preferably contains a photoradical polymerization initiator or a photocationic polymerization initiator.
[0113] From the viewpoint of improving thermal durability, the liquid crystal composition containing a liquid crystal compound having one ethylenically unsaturated group preferably contains a radical polymerization initiator, and more preferably contains a photoradical polymerization initiator.
[0114] From the viewpoint of improving thermal durability, the liquid crystal composition containing a liquid crystal compound having one cyclic ether group preferably contains a cationic polymerization initiator, and more preferably contains a photocationic polymerization initiator.
[0115] The liquid crystal composition may contain one or more polymerization initiators.
[0116] The content of the polymerization initiator may be determined depending on, for example, the structure of the specific liquid crystal compound and the desired helical pitch. From the viewpoints of ease of forming a cholesteric liquid crystal layer, ease of adjusting the helical pitch, polymerization rate, and strength of the cholesteric liquid crystal layer, the ratio of the total amount of polymerization initiator to the total amount of solids in the liquid crystal composition is preferably 0.05% by mass to 10% by mass, more preferably 0.05% by mass to 5% by mass or less, even more preferably 0.1% by mass to 2% by mass, and particularly preferably 0.2% by mass to 1% by mass.
[0117] From the viewpoint of improving the strength and durability of the cured cholesteric liquid crystal layer, the liquid crystal composition may contain a crosslinking agent. Preferred examples of the crosslinking agent include compounds that are cured by external factors such as ultraviolet light, heat, and moisture.
[0118] Examples of the crosslinking agent include the compounds shown below. (1) Polyfunctional acrylate compounds (e.g., trimethylolpropane tri(meth)acrylate and pentaerythritol tri(meth)acrylate) (2) Epoxy compounds (e.g., glycidyl (meth)acrylate and ethylene glycol diglycidyl ether) (3) Aziridine compounds (e.g., 2,2-bishydroxymethylbutanol-tris[3-(1-aziridinyl)propionate] and 4,4-bis(ethyleneiminocarbonylamino)diphenylmethane) (4) Isocyanate compounds (e.g., hexamethylene diisocyanate and biuret isocyanate) (5) Polyoxazoline compounds having oxazoline groups in the side chains (6) Alkoxysilane compounds (e.g., vinyltrimethoxysilane and N-(2-aminoethyl)3-aminopropyltrimethoxysilane)
[0119] The liquid crystal composition may contain one or more crosslinking agents.
[0120] From the viewpoint of strength and durability of the cholesteric liquid crystal layer, the ratio of the total amount of crosslinking agent to the total amount of solids in the liquid crystal composition is preferably 1% by mass to 20% by mass, and more preferably 3% by mass to 15% by mass.
[0121] The liquid crystal composition may contain a known catalyst depending on the reactivity of the crosslinking agent. The combined use of a crosslinking agent and a catalyst can improve productivity as well as the strength and durability of the cholesteric liquid crystal layer.
[0122] The liquid crystal composition may contain a polyfunctional polymerizable compound. The polyfunctional polymerizable compound means a compound having two or more polymerizable groups. It is preferable that the types of the two or more polymerizable groups contained in the polyfunctional polymerizable compound are the same.
[0123] Examples of polyfunctional polymerizable compounds include liquid crystal compounds having two or more ethylenically unsaturated groups and no cyclic ether groups, liquid crystal compounds having two or more cyclic ether groups and no ethylenically unsaturated groups, liquid crystal compounds having two or more ethylenically unsaturated groups and two or more cyclic ether groups, chiral agents having two or more polymerizable groups, and crosslinkers having two or more polymerizable groups. The polyfunctional polymerizable compound preferably contains at least one selected from the group consisting of liquid crystal compounds having two or more ethylenically unsaturated groups and no cyclic ether groups, liquid crystal compounds having two or more cyclic ether groups and no ethylenically unsaturated groups, and chiral agents having two or more polymerizable groups, and more preferably contains a chiral agent having two or more polymerizable groups.
[0124] The liquid crystal composition may contain one or more types of polyfunctional polymerizable compounds.
[0125] From the viewpoints of improving moldability and suppressing changes in the alignment structure after polymerization, the ratio of the total amount of polyfunctional polymerizable compounds to the total amount of solids in the liquid crystal composition is preferably 0.5% to 50% by mass, more preferably 1% to 40% by mass, even more preferably 1.5% to 30% by mass, and particularly preferably 2% to 20% by mass. As the ratio of the total amount of polyfunctional polymerizable compounds to the total amount of solids in the liquid crystal composition decreases, the crosslink density of the cholesteric liquid crystal layer decreases. As a result, the stretchability and moldability of the cholesteric liquid crystal layer improve. As the ratio of the total amount of polyfunctional polymerizable compounds to the total amount of solids in the liquid crystal composition increases, the alignment structure of the cholesteric liquid crystal layer is more easily maintained after polymerization. From the viewpoint of improving moldability, it is preferable to control the content of the polyfunctional polymerizable compounds, including compounds having two or more ethylenically unsaturated groups, compounds having two or more cyclic ether groups, and compounds having one or more ethylenically unsaturated groups and one or more cyclic ether groups. That is, the proportion of "the total amount of compounds having two or more ethylenically unsaturated groups, compounds having two or more cyclic ether groups, and compounds having one or more ethylenically unsaturated groups and one or more cyclic ether groups" relative to the total amount of solids in the liquid crystal composition is preferably 0.5% by mass to 50% by mass, more preferably 1% by mass to 40% by mass, even more preferably 1.5% by mass to 30% by mass, and particularly preferably 2% by mass to 20% by mass.
[0126] The liquid crystal composition may contain other additives as needed. Examples of the other additives include surfactants, polymerization inhibitors, antioxidants, horizontal alignment agents, UV absorbers, light stabilizers, colorants, and metal oxide particles. The liquid crystal composition may contain one or more other additives.
[0127] The liquid crystal composition may contain a solvent. The solvent is preferably an organic solvent. Examples of organic solvents include ketones (e.g., methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone), alkyl halides, amides, sulfoxides, heterocyclic compounds, hydrocarbons, esters, and ethers. In consideration of the environmental impact, ketones are preferred.
[0128] The liquid crystal composition may contain one or more solvents.
[0129] The content of the solvent may be determined depending on, for example, the coatability of the liquid crystal composition.
[0130] The ratio of the total amount of solids in the liquid crystal composition to the total amount of the liquid crystal composition is preferably 1% by mass to 90% by mass, more preferably 5% by mass to 80% by mass, and even more preferably 10% by mass to 80% by mass.
[0131] When the liquid crystal composition is cured during the formation of the cholesteric liquid crystal layer, the ratio of the total amount of solvent to the total amount of solids of the liquid crystal composition when the liquid crystal composition is cured is preferably 5% by mass or less, more preferably 3% by mass or less, even more preferably 2% by mass or less, and particularly preferably 1% by mass or less.
[0132] The ratio of the total amount of solvents in the cholesteric liquid crystal layer to the total amount of the cholesteric liquid crystal layer is preferably 5% by mass or less, more preferably 3% by mass or less, even more preferably 2% by mass or less, and particularly preferably 1% by mass or less.
[0133] The method for producing the liquid crystal composition is not limited. The liquid crystal composition is produced, for example, by mixing a liquid crystal compound with a component other than the liquid crystal compound. The mixing method may be selected from known mixing methods.
[0134] The liquid crystal composition is cured, for example, by exposure. The exposure is carried out, for example, by irradiating the liquid crystal composition with light. Preferred light sources include light sources capable of irradiating light containing at least one kind of light selected from the group consisting of 365 nm and 405 nm. Specific light sources include, for example, ultra-high pressure mercury lamps, high pressure mercury lamps, and metal halide lamps. The exposure dose is 5 mJ / cm. 2 ~2,000mJ / cm 2 and preferably 10 mJ / cm 2 ~1,000mJ / cm 2 As the exposure method, for example, the method described in paragraphs 0035 to 0051 of JP-A No. 2006-23696 may be applied.
[0135] To facilitate alignment of the liquid crystal compound, it is preferable to expose the liquid crystal composition while heating it. The heating temperature is determined, for example, depending on the composition of the liquid crystal composition. The heating temperature is, for example, 60°C to 120°C. Examples of heating means include a heater, an oven, a hot plate, an infrared lamp, and an infrared laser.
[0136] The liquid crystal composition may be cured, for example, by heating. The heating temperature is preferably 60° C. to 200° C. The heating time is preferably 5 minutes to 2 hours. Examples of the heating means include the heating means described above.
[0137] The liquid crystal composition may be dried by a known method before curing, by leaving it to stand or by air drying, or by heating.
[0138] The thickness of the reflective layer is not particularly limited, but from the viewpoint of obtaining a more appropriate reflectance, it is preferably 0.1 μm to 10 μm, more preferably 0.3 μm to 8 μm, and even more preferably 0.5 μm to 6 μm.
[0139] [Scattering layer] From the viewpoint of suppressing color variation due to viewing angles, the decorative film according to the present disclosure may further include a scattering layer that scatters light of at least a portion of the wavelength range of 380 nm to 780 nm, or the reflective layer itself may have a scattering structure (for example, an uneven structure). Furthermore, the positional relationship between the scattering layer and the reflective layer in the decorative film according to the present disclosure may be such that either the scattering layer or the reflective layer is on the viewing side, but from the viewpoint of visibility of pale color tones and suppression of color change due to viewing angle, it is preferable that the scattering layer is on the viewing side.
[0140] The scattering layer is only required to scatter (diffuse) light of at least a part of the wavelength range of 380 nm to 780 nm, but is preferably a scattering layer that can scatter light of the entire wavelength range of 380 nm to 780 nm.
[0141] As the scattering layer, from the viewpoints of ease of adjusting the diffuse transmittance and ease of availability, a scattering layer containing a matrix material and particles present in the matrix material (hereinafter also referred to as a scattering layer containing a matrix material and particles), a scattering layer having voids in the matrix material, or a scattering layer having unevenness on at least one surface is preferred, and a scattering layer containing a matrix material and particles present in the matrix material is more preferred.
[0142] - Scattering layer containing matrix material and particles - One embodiment of the scattering layer is a layer containing a matrix material and particles (hereinafter also referred to as specific particles) that are present in the matrix material and that impart light scattering properties to the scattering layer. The scattering layer containing specific particles is preferably a layer in which the specific particles are dispersed in a transparent matrix material. Examples of the matrix material include glass, quartz, and resin materials. When glass or quartz is used as the matrix material, the scattering layer may be formed by kneading and dispersing specific particles into the glass or quartz. When glass or quartz is used as the matrix material, it is preferable that the matrix material be a decorative member as described below. When a resin material is used as the matrix material, it is preferable that the resin be capable of forming an ultraviolet-transmitting resin layer, and examples thereof include acrylic resin, polycarbonate resin, polyester resin, polyethylene resin, polypropylene resin, epoxy resin, urethane resin, and silicone resin. When a resin material is used as the matrix material, the scattering layer can be formed by a known method. For example, resin pellets of the matrix material and specific particles can be melt-kneaded and then injection-molded to obtain a plate-shaped scattering layer. Alternatively, the scattering layer can be formed by curing a resin composition containing a resin precursor monomer and specific particles, or by kneading specific particles into a mixture containing a resin material and an optional solvent, etc., and then curing the resulting resin composition. For example, the scattering layer is preferably formed by curing a resin composition containing specific particles, a polymerizable compound, and a polymerization initiator. The polymerizable compound is not particularly limited, and known polymerizable compounds can be used. However, (meth)acrylate compounds are preferred, and polyfunctional (meth)acrylate compounds are more preferred. The polymerization initiator is not particularly limited, and known polymerization initiators can be used. The method for forming the scattering layer is not limited to the above.
[0143] Examples of specific particles include inorganic particles such as zirconium oxide particles (ZrO2 particles), niobium oxide particles (Nb2O5 particles), titanium oxide particles (TiO2 particles), aluminum oxide particles (Al2O3 particles), and silicon dioxide particles (SiO2 particles), as well as organic particles such as cross-linked styrene resin and cross-linked polymethyl methacrylate.
[0144] The scattering layer may contain only one type of specific particles, or may contain two or more types. There is no particular limitation on the content of the specific particles, and it is preferable to achieve a desired diffuse transmittance or a desired scattering angle by adjusting the type, size, content, shape, refractive index, etc. of the specific particles in the scattering layer. The content of the specific particles is not particularly limited, but is preferably 5% by mass to 70% by mass, and more preferably 10% by mass to 50% by mass, relative to the total mass of the scattering layer.
[0145] - Scattering layer having irregularities on at least one surface - Another embodiment of the scattering layer is a scattering layer having irregularities on at least one surface thereof, whereby the irregularities scatter light. The unevenness in the scattering layer preferably has a distance between the tops of adjacent convex portions of 10 μm to 50 μm. From the viewpoint of light scattering, it is preferable that the bases of adjacent convex portions are in contact with each other and that adjacent convex portions are densely formed without any gaps or other intervals. A desired diffuse transmittance or a desired scattering angle can be achieved by adjusting the size, shape, and formation density per unit area of the convex portions, etc. The shape of the convex portions is not particularly limited, and may be appropriately selected from hemispherical, conical, pyramidal, ridged, etc. depending on the desired diffuse transmittance, scattering angle, etc. For example, the diffusing glass used as the scattering layer having irregularities on at least one surface may be glass whose surface has been subjected to irregularity processing by sandblasting or the like.
[0146] The scattering layer having irregularities on at least one surface may be a commercially available product, such as Lens Diffuser (registered trademark) manufactured by Optical Solutions Co., Ltd., product names: (hereinafter the same) LSD5ACUVT10, LSD10ACUVT10, LSD20ACUVT10, LSD30ACUVT10, LSD40ACUVT10, LSD60ACUVT10, and LSD80ACUVT10 (all made of ultraviolet-transmitting acrylic resin), Lens Diffuser (registered trademark): LSD5AC10, LSD10AC10, LSD20AC10, LSD30AC10, LSD40AC10, LSD60AC10, LSD80AC10 (all made of acrylic resin), Lens Diffuser (registered trademark): LSD5PC10, LSD10PC10, LSD20PC10, LSD30PC10, LSD40PC10, LSD60PC10, LSD80PC10, LSD60×10PC10, LSD60×1PC10, LSD40×1PC10, LSD30×5PC10 (all made of polycarbonate), Lens Diffuser (registered trademark): LSD5U3PS (all made of quartz glass), etc.
[0147] Other scattering layers include the fly-eye lens FE10 manufactured by Nippon Tokushu Kogaku Jushi Co., Ltd., the Diffuser manufactured by Fit Co., Ltd., the SDXK-1FS, SDXK-AFS, and SDXK-2FS manufactured by Suntech Opto Co., Ltd., the light diffusion film MX manufactured by Filplus Co., Ltd., the acrylic diffusion plates ADF901, ADF852, ADF803, ADF754, ADF705, ADF656, ADF607, ADF558, ADF509, and ADF451 manufactured by Shibuya Optical Co., Ltd., and the acrylic diffusion plates ADF901, ADF852, ADF803, ADF754, ADF705, ADF656, ADF607, ADF558, ADF509, and ADF451 manufactured by Oji Fte Co., Ltd. Nano Buckling (registered trademark) manufactured by NX Corporation, light diffusion films HDA060, HAA120, GBA110, DCB200, FCB200, IKA130, EDB200 manufactured by Lintec Corporation, Scotchcal (registered trademark) light diffusion diffuser films 3635-30, 3635-70 manufactured by 3M Japan Ltd., Light Up (registered trademark) SDW, EKW, K2S, LDS, PBU, GM7, SXE, MXE, SP6F, Optosaver manufactured by Kimoto Co., Ltd. (registered trademark) L-9, L-11, L-19, L-20, L-35, L-52, L-57, STC3, STE3, Chemical Mat (registered trademark) 75PWX, 125PW, 75PBA, 75BLB, 75PBB, Opalus (registered trademark) PBS-689G, PBS-680G, PBS-689HF, PBS-680HG, PBS-670G, UDD-147D2, UDD-148D2, SHBS-227C1, SHBS-228C2, UDD-247D manufactured by Keiwa Co., Ltd. 2, PBS-630L, PBS-630A, PBS-632A, BS-539, BS-530, BS-531, BS-910, BS-911, BS-912, Legenda (registered trademark) PC, CL, HC, OC, TR, MC, SQ, EL, OE manufactured by Kuraray Co., Ltd., and D120P, D121UPZ, D121UP, D261SIIIJ1, D261IVJ1, D263SIII, S263SIV, D171, D171S, D174S manufactured by Tsujiden Co., Ltd.
[0148] The thickness of the scattering layer is preferably 5 mm or less, more preferably 2 mm or less, and even more preferably 1.5 mm or less. The thickness of the scattering layer is preferably 0.5 μm or more, more preferably 1 μm or more, and particularly preferably 5 μm or more.
[0149] [Base material] The decorative film may include a substrate. This increases the strength of the decorative film, making it easier to handle. In addition, when the decorative film includes a substrate, the substrate can be used as a component constituting a molded body obtained by molding the decorative film.
[0150] In an embodiment in which the decorative film includes a substrate, the reflective layer may be provided directly on the substrate, or may be provided via another layer.
[0151] The shape and material of the substrate are not particularly limited and may be appropriately selected as desired. When molding the decorative film, the substrate is preferably a resin substrate from the viewpoint of ease of molding.
[0152] Examples of materials for the resin substrate include polyethylene (PE), polyethylene naphthalate (PEN), polyamide (PA), polyethylene terephthalate (PET), polyvinyl chloride (PVC), polyvinyl alcohol (PVA), polyacrylonitrile (PAN), polyimide (PI), polymethyl methacrylate (PMMA), polycarbonate (PC), acrylic-polycarbonate resin, polyacrylate, polymethacrylate, polypropylene (PP), polystyrene (PS), polyacrylonitrile-butadiene-styrene copolymer (ABS), cyclic olefin copolymer (COC), cycloolefin polymer (COP), triacetyl cellulose (TAC), urethane resin, and urethane-acrylic resin. From the viewpoint of the strength of the decorative film and the moldability when molding the decorative film, the material for the substrate is preferably at least one resin selected from the group consisting of polyethylene terephthalate, acrylic resin, urethane resin, urethane-acrylic resin, polycarbonate, acrylic-polycarbonate resin, and polypropylene. The substrate may be a laminate of multiple resin layers made of different materials.
[0153] The resin substrate may contain additives as needed, such as lubricants such as mineral oil, hydrocarbons, fatty acids, alcohols, fatty acid esters, fatty acid amides, metal soaps, natural waxes, and silicones; inorganic flame retardants such as magnesium hydroxide and aluminum hydroxide; organic flame retardants such as halogen-based flame retardants and phosphorus-based flame retardants; organic or inorganic fillers such as metal powder, talc, calcium carbonate, potassium titanate, glass fiber, carbon fiber, and wood flour; antioxidants, ultraviolet inhibitors, lubricants, dispersants, coupling agents, foaming agents, colorants, and resins other than the main resin component.
[0154] The resin substrate may be a commercially available product, such as the Technoloy (registered trademark) series (acrylic resin film, polycarbonate resin film, or acrylic resin / polycarbonate resin laminate film, manufactured by Sumitomo Chemical Co., Ltd.), ABS film (manufactured by Okamoto Corporation), ABS sheet (manufactured by Sekisui Seikei Kogyo Co., Ltd.), Teflex (registered trademark) series (PET film, manufactured by Teijin Film Solutions Co., Ltd.), Lumirror (registered trademark) Easy Forming Type (PET film, manufactured by Toray Industries, Inc.), and Purethermo (polypropylene film, manufactured by Idemitsu Unitech Co., Ltd.).
[0155] The thickness of the substrate is not particularly limited, but from the viewpoint of the strength of the decorative film and the moldability when molding the decorative film, it is preferably 1 μm or more, more preferably 10 μm or more, and even more preferably 20 μm or more. From the same viewpoint, the thickness of the substrate is preferably 300 μm or less, more preferably 200 μm or less, and even more preferably 150 μm or less.
[0156] For example, when the decorative film includes a substrate, the decorative film may be obtained by peeling off the substrate from the decorative film.
[0157] [Colored layer] The decorative film may include a colored layer. This makes it easier to obtain a desired design. The colored layer is a layer containing a colorant. The colored layer may be one layer or two or more layers.
[0158] In the decorative film, the position of the colored layer is not particularly limited and may be provided at a desired position. For example, the colored layer may be provided on the reflective layer. Furthermore, when the decorative film includes a substrate, the colored layer may be provided on the side of the substrate opposite to the side on which the reflective layer is formed. Alternatively, the decorative film may be obtained by peeling the substrate from a decorative film including the substrate, and the colored layer may be provided on the decorative film after the substrate has been peeled off.
[0159] The color of the colored layer is not particularly limited and can be appropriately selected depending on the application of the decorative film, etc. Examples of the color of the colored layer include black, gray, white, red, orange, yellow, green, blue, purple, brown, etc. The color of the colored layer may also be a metallic color.
[0160] -Coloring agent- The colorant may be a pigment or a dye. From the viewpoint of durability, the colorant is preferably a pigment. To give the colored layer a metallic tone, metal particles, pearl pigments, etc. may be used as the colorant.
[0161] The pigment may be an inorganic pigment or an organic pigment.
[0162] Examples of inorganic pigments include white pigments such as titanium dioxide, zinc oxide, lithopone, precipitated calcium carbonate, white carbon, aluminum oxide, aluminum hydroxide, and barium sulfate; black pigments such as carbon black, titanium black, titanium carbon, iron oxide, and graphite; iron oxide, barium yellow, cadmium red, and chrome yellow.
[0163] Examples of inorganic pigments include those described in paragraphs 0015 and 0114 of JP-A No. 2005-7765.
[0164] Examples of organic pigments include phthalocyanine pigments such as phthalocyanine blue and phthalocyanine green; azo pigments such as azo red, azo yellow, and azo orange; quinacridone pigments such as quinacridone red, shinkasha red, and shinkasha magenta; perylene pigments such as perylene red and perylene maroon; carbazole violet, anthrapyridine, flavanthrone yellow, isoindoline yellow, industhrone blue, dibromoanzathrone red, anthraquinone red, and diketopyrrolopyrrole.
[0165] Specific examples of organic pigments include red pigments such as CI Pigment Red 177, 179, 224, 242, 254, 255, and 264; yellow pigments such as CI Pigment Yellow 138, 139, 150, 180, and 185; orange pigments such as CI Pigment Orange 36, 38, and 71; green pigments such as CI Pigment Green 7, 36, and 58; blue pigments such as CI Pigment Blue 15:6; and purple pigments such as CI Pigment Violet 23.
[0166] Examples of the organic pigment include the organic pigments described in paragraph 0093 of JP-A No. 2009-256572.
[0167] The pigment may be a pigment having light transmitting and reflecting properties (so-called luster pigment). Examples of the luster pigment include metallic luster pigments made of aluminum, copper, zinc, iron, nickel, tin, aluminum oxide, and alloys thereof, interference mica pigments, white mica pigments, graphite pigments, and glass flake pigments. The luster pigment may be uncolored or colored.
[0168] The colorant may be used alone or in combination of two or more. When two or more colorants are used, an inorganic pigment and an organic pigment may be combined.
[0169] From the viewpoint of achieving the desired color, the content of the colorant is preferably 1% by mass to 50% by mass, more preferably 5% by mass to 50% by mass, and particularly preferably 10% by mass to 40% by mass, relative to the total amount of the colored layer.
[0170] -Binder resin- The colored layer preferably contains a binder resin from the viewpoints of strength, scratch resistance, and moldability. The type of binder resin is not particularly limited. From the viewpoint of obtaining a desired color, the binder resin is preferably a transparent resin, specifically, a resin having a total light transmittance of 80% or more. The total light transmittance can be measured using a spectrophotometer (for example, a spectrophotometer "UV-2100" manufactured by Shimadzu Corporation).
[0171] Examples of binder resins include acrylic resins, silicone resins, polyesters, polyurethanes, and polyolefins. The binder resin may be a homopolymer or a copolymer.
[0172] The binder resin may be used alone or in combination of two or more kinds.
[0173] From the viewpoint of molding processability, the content of the binder resin is preferably 5% by mass to 70% by mass, more preferably 10% by mass to 60% by mass, and particularly preferably 20% by mass to 60% by mass, relative to the total amount of the colored layer.
[0174] -Dispersant- The colored layer may contain a dispersant to improve the dispersibility of the colorant, particularly the pigment, contained in the colored layer. The inclusion of a dispersant improves the dispersibility of the colorant in the colored layer. This makes it easier to achieve a uniform color in the resulting decorative film.
[0175] The dispersant can be appropriately selected depending on the type, shape, etc. of the colorant, and is preferably a polymer dispersant.
[0176] Examples of polymer dispersants include silicone polymers, acrylic polymers, and polyester polymers. For example, when it is desired to impart heat resistance to the decorative film, the dispersant is preferably a silicone polymer such as a grafted silicone polymer.
[0177] The weight-average molecular weight of the dispersant is preferably 1,000 to 5,000,000, more preferably 2,000 to 3,000,000, and particularly preferably 2,500 to 3,000,000. When the weight-average molecular weight is 1,000 or more, the dispersibility of the colorant is further improved.
[0178] The dispersant may be a commercially available product. Examples of commercially available dispersants include EFKA 4300 (acrylic polymer dispersant) manufactured by BASF Japan; Homogenol L-18, Homogenol L-95, and Homogenol L-100 manufactured by Kao Corporation; Solsperse 20000 and Solsperse 24000 manufactured by Lubrizol Japan; and DISPERBYK-110, DISPERBYK-164, DISPERBYK-180, and DISPERBYK-182 manufactured by BYK-Chemie Japan. Note that "Homogenol," "Solsperse," and "DISPERBYK" are all registered trademarks.
[0179] The dispersant may be used alone or in combination of two or more kinds.
[0180] The content of the dispersant is preferably 1 to 30 parts by mass with respect to 100 parts by mass of the colorant.
[0181] -Additives- The colored layer may contain additives, if necessary, in addition to the above components. The additives are not particularly limited, and examples thereof include surfactants described in paragraph 0017 of Japanese Patent No. 4502784 and paragraphs 0060 to 0071 of JP-A No. 2009-237362, thermal polymerization inhibitors (also referred to as polymerization inhibitors, a preferred example of which is phenothiazine) described in paragraph 0018 of Japanese Patent No. 4502784, and additives described in paragraphs 0058 to 0071 of JP-A No. 2000-310706.
[0182] -Thickness- The thickness of the colored layer is not particularly limited, but from the viewpoint of visibility and three-dimensional formability, it is preferably 0.5 μm or more, more preferably 3 μm or more, even more preferably 3 μm to 50 μm, and particularly preferably 3 μm to 20 μm. When there are two or more colored layers, it is preferable that each colored layer independently has a thickness within the above range.
[0183] -Method for forming colored layer- Examples of methods for forming a colored layer include a method using a colored layer-forming composition, a method of laminating a colored film, etc. Among these, the method for forming a colored layer using a colored layer-forming composition is preferred.
[0184] Examples of methods for forming a colored layer using a colored layer-forming composition include a method of forming a colored layer by applying the colored layer-forming composition, and a method of forming a colored layer by printing the colored layer-forming composition. Examples of printing methods include screen printing, inkjet printing, flexographic printing, gravure printing, and offset printing.
[0185] The colored layer-forming composition may contain a colorant and, if necessary, at least one of a binder resin, a dispersant, and an additive. The types of each component may be the same as those described above for the colored layer. The content of the colorant is preferably 1% by mass to 50% by mass, more preferably 5% by mass to 50% by mass, and particularly preferably 10% by mass to 40% by mass, relative to the total solid content of the composition for forming a colored layer. The content of the binder resin is preferably 5% by mass to 70% by mass, more preferably 10% by mass to 60% by mass, and particularly preferably 20% by mass to 60% by mass, relative to the total solid content of the composition for forming the colored layer. The content of the dispersant is preferably 1 to 30 parts by mass with respect to 100 parts by mass of the colorant.
[0186] The colored layer may be a layer formed by curing a colored layer-forming composition, and for example, a colored layer-forming composition containing a polymerizable compound and a polymerization initiator may be used. The polymerizable compound and polymerization initiator are not particularly limited, and known polymerizable compounds and known polymerization initiators may be used. One type of polymerizable compound may be used alone, or two or more types may be used in combination. One type of polymerization initiator may be used alone, or two or more types may be used in combination.
[0187] The color layer-forming composition may contain an organic solvent to facilitate application. The organic solvent is not particularly limited, and known organic solvents can be used. Examples of the organic solvent include alcohols, esters, ethers, ketones, and aromatic hydrocarbons. One type of organic solvent may be used alone, or two or more types may be used in combination.
[0188] The content of the organic solvent is preferably 5% by mass to 90% by mass, and more preferably 30% by mass to 70% by mass, based on the total amount of the colored layer-forming composition.
[0189] As the colored layer-forming composition, for example, commercially available paints such as nax Real series, nax Admira series, and nax Multi series (manufactured by Nippon Paint Co., Ltd.); Retan PG series (manufactured by Kansai Paint Co., Ltd.) may be used.
[0190] The method for preparing the colored layer-forming composition is not particularly limited, and for example, the colored layer-forming composition may be prepared by mixing each component such as a colorant. Furthermore, when the colored layer-forming composition contains a pigment as a colorant, from the viewpoint of further improving the uniform dispersibility and dispersion stability of the pigment, it is preferable to prepare the colored layer-forming composition by previously preparing a pigment dispersion containing a pigment and a dispersant and mixing other components into the pigment dispersion.
[0191] [Alignment layer] The decorative film may have an alignment layer, which is used to more easily align the molecules of the cholesteric liquid crystal compound in the light-reflecting portion during the formation of the decorative film.
[0192] The alignment layer is provided, for example, by rubbing an organic compound (preferably a polymer), obliquely vapor-depositing an inorganic compound, forming a layer with microgrooves, etc. As the alignment layer, an alignment layer that generates an alignment function by applying an electric field, a magnetic field, or light irradiation is also known.
[0193] The thickness of the alignment layer is not particularly limited, but is preferably 0.01 μm to 10 μm.
[0194] Depending on the type of substrate and underlayer, the underlayer can serve as the alignment layer without providing a separate alignment layer. For example, the substrate can be directly subjected to an alignment treatment (e.g., rubbing treatment) to function as an alignment layer. An example of a substrate that can be directly subjected to an alignment treatment is a layer made of polyethylene terephthalate (PET), which may be subjected to rubbing treatment as described below.
[0195] As preferred examples, a rubbed alignment layer and a photo-alignment layer will be described below.
[0196] -Rubbing treatment alignment layer- The rubbed alignment layer is formed, for example, by rubbing the surface of the substrate onto which the liquid crystal composition is applied. The rubbing treatment can be carried out, for example, by rubbing the surface of a film mainly composed of a polymer in a certain direction with paper or cloth. General methods for rubbing treatment are described, for example, in "Liquid Crystal Handbook" (published by Maruzensha, October 30, 2000).
[0197] Examples of polymers for alignment layers that form films containing the above-mentioned polymers as the main component include methacrylate copolymers, styrene copolymers, polyolefins, polyvinyl alcohol, modified polyvinyl alcohol, poly(N-methylolacrylamide), polyesters, polyimides, vinyl acetate copolymers, carboxymethyl cellulose, and polycarbonates, as described in paragraph 0022 of JP-A-8-338913. The polymer for alignment layers may also be a silane coupling agent. The polymer for alignment layers is preferably a water-soluble polymer (e.g., poly(N-methylolacrylamide), carboxymethyl cellulose, gelatin, polyvinyl alcohol, or modified polyvinyl alcohol), more preferably gelatin, polyvinyl alcohol, or modified polyvinyl alcohol, and particularly preferably polyvinyl alcohol or modified polyvinyl alcohol.
[0198] The rubbing density can be changed by the method described in "Liquid Crystal Handbook" (published by Maruzensha). The rubbing density (L) is quantified by the following formula (A): Formula (A) L=Nl(1+2πrn / 60v) In formula (A), N is the number of rubbings, l is the contact length of the rubbing roller, r is the radius of the roller, n is the number of rotations of the roller (rpm; revolutions per minute), and v is the stage movement speed (per second).
[0199] Methods for increasing the rubbing density include increasing the number of rubbings, increasing the contact length of the rubbing roller, increasing the radius of the roller, increasing the number of roller rotations, and slowing the stage movement speed.Meanwhile, methods for decreasing the rubbing density include decreasing the number of rubbings, shortening the contact length of the rubbing roller, decreasing the radius of the roller, decreasing the number of roller rotations, and increasing the stage movement speed.In addition, the conditions for the rubbing treatment can be found in Japanese Patent No. 4052558.
[0200] -Photo alignment layer- Examples of photo-alignment materials used in the photo-alignment layer formed by light irradiation include azo compounds described in JP-A-2006-285197, JP-A-2007-76839, JP-A-2007-138138, JP-A-2007-94071, JP-A-2007-121721, JP-A-2007-140465, JP-A-2007-156439, JP-A-2007-133184, JP-A-2009-109831, Japanese Patent No. 3883848, and Japanese Patent No. 4151746; Examples of suitable photoalignment materials include aromatic ester compounds described in Japanese Patent Application Laid-Open No. 2002-229039, maleimide and / or alkenyl-substituted nadimide compounds having photoalignment units described in Japanese Patent Application Laid-Open Nos. 2002-265541 and 2002-317013, photocrosslinkable silane derivatives described in Japanese Patent Application Laid-Open Nos. 4205195 and 4205198, and photocrosslinkable polyimides, polyamides, or esters described in Japanese Patent Application Laid-Open Nos. 2003-520878, 2004-529220, and 4162850. Among these, the photoalignment material is preferably an azo compound, photocrosslinkable polyimide, polyamide, or ester.
[0201] A layer formed from a photo-alignment material is exposed to linearly polarized or unpolarized light to produce a photo-alignment layer.
[0202] In the present disclosure, "irradiation with linearly polarized light" refers to an operation for causing a photoreaction in a photoalignment material. The wavelength of the light used varies depending on the photoalignment material used, and is not particularly limited as long as it is the wavelength necessary for the photoreaction. The light used for photoirradiation is preferably light with a peak wavelength of 200 nm to 700 nm, and more preferably ultraviolet light with a peak wavelength of 400 nm or less.
[0203] Examples of light sources used for light irradiation include known light sources, such as lamps such as tungsten lamps, halogen lamps, xenon lamps, xenon flash lamps, mercury lamps, mercury xenon lamps, and carbon arc lamps, various lasers (e.g., semiconductor lasers, helium-neon lasers, argon ion lasers, helium-cadmium lasers, and YAG lasers), light-emitting diodes, and cathode ray tubes.
[0204] Methods for obtaining linearly polarized light include a method using a polarizing plate (e.g., an iodine polarizing plate, a dichroic dye polarizing plate, or a wire grid polarizing plate), a method using a prism-based element (e.g., a Glan-Thompson prism) or a reflective polarizer utilizing the Brewster angle, and a method using light emitted from a polarized laser light source. Alternatively, a filter or a wavelength conversion element may be used to selectively irradiate only light of a required wavelength.
[0205] When the irradiated light is linearly polarized, the light may be irradiated from the top or bottom of the alignment layer in a direction perpendicular or oblique to the surface of the alignment layer. The incident angle of the light varies depending on the photo-alignment material, but is preferably 0° to 90° (perpendicular) to the alignment layer, and more preferably 40° to 90°.
[0206] When non-polarized light is used, the non-polarized light is irradiated obliquely from the top or bottom of the alignment layer. The incident angle is preferably 10° to 80°, more preferably 20° to 60°, and even more preferably 30° to 50°. The irradiation time is preferably 1 minute to 60 minutes, and more preferably 1 minute to 10 minutes.
[0207] [Other layers] The decorative film may have layers other than the reflective layer, the scattering layer, the colored layer, and the alignment layer.
[0208] Other layers include layers known in decorative films, such as a protective layer, an adhesive layer, an easy-adhesion layer, an ultraviolet absorbing layer, a self-repairing layer, an antistatic layer, an antifouling layer, an electromagnetic wave-proof layer, and a conductive layer.
[0209] The other layers can be formed by known methods, for example, by applying a composition containing the components to be contained in the other layers (layer-forming composition) in the form of a layer and drying it.
[0210] <Layout of each layer> The arrangement of each layer of the decorative film is not limited. Each layer of the decorative film may be arranged as follows. " / " indicates the boundary between layers. The left side is the viewing side. (1) Reflective layer (2) Reflective layer / base material (3) Reflective layer / adhesive layer / base material (4) Scattering layer / reflection layer (5) Reflection layer / scattering layer (6) Scattering layer / adhesive layer 1 / reflective layer / adhesive layer 2 / base material (7) Scattering layer / reflection layer / colored layer (8) Reflective layer / scattering layer / colored layer (9) Reflective layer / base material / colored layer (10) Scattering layer / base material 1 / adhesive layer / reflective layer / base material 2 / colored layer (11) Scattering layer / adhesive layer / reflective layer / base material / colored layer
[0211] The above-mentioned example (11) of the decorative film will be explained with reference to FIG. FIG. 1 is a schematic cross-sectional view showing an example of the layer structure of a decorative film according to the present disclosure. The decorative film 20 shown in Figure 1 has a colored layer 22, a substrate 24 on the colored layer 22, a reflective layer 26 on the substrate 24, an adhesive layer 28 on the reflective layer 26, and a scattering layer 30 on the adhesive layer 28.
[0212] <Decorative film manufacturing method> The method for manufacturing a decorative film according to the present disclosure is not particularly limited, and may be a known method or may be produced by adapting a known method. For example, when the reflective layer is a cholesteric liquid crystal layer, a preferred example includes the steps of preparing a liquid crystal material having a substrate, a liquid crystal layer containing a liquid crystal compound oriented in a cholesteric helical configuration, and a photosensitive chiral agent (hereinafter also referred to as a "liquid crystal material preparation step"); irradiating the liquid crystal layer with a first light to deactivate a portion of the photosensitive chiral agent from the surface of the liquid crystal layer toward the inside in the thickness direction (hereinafter also referred to as a "first exposure step"); and irradiating the uncured portion with a second light to cure (hereinafter also referred to as a "second exposure step"). This method makes it easy to produce a decorative film having a reflective layer with a portion in which the helical pitch of the cholesteric liquid crystal structure gradually changes (gradationally) in the thickness direction. The above example will now be described in detail.
[0213] Furthermore, the above-described example of the method for producing a decorative film according to the present disclosure preferably includes a step of heating the liquid crystal layer to form a cholesteric liquid crystal phase (hereinafter also referred to as a "first heating step").
[0214] [Liquid crystal material preparation process] The liquid crystal material preparation step is a step of preparing a liquid crystal material having a base material, a liquid crystal compound oriented in a cholesteric spiral (cholesteric liquid crystal compound), and a liquid crystal layer containing a photosensitive chiral agent.
[0215] -Base material- The substrate can be any of those described above.
[0216] -Liquid crystal layer- The liquid crystal layer preferably contains a cholesteric liquid crystal compound capable of being oriented in a cholesteric helical shape and a photosensitive chiral agent, and may contain other components as necessary.
[0217] The method for preparing the liquid crystal composition is not particularly limited, and for example, the liquid crystal composition may be prepared by mixing components such as a cholesteric liquid crystal compound and a chiral agent. As each component, those described above can be suitably used.
[0218] The method for applying the liquid crystal composition to the substrate is not particularly limited, and examples thereof include spray coating, spin coating, blade coating, dip coating, casting, roll coating, bar coating, die coating, mist coating, inkjet printing, dispenser printing, screen printing, letterpress printing, and intaglio printing.
[0219] When the liquid crystal composition contains a solvent, the liquid crystal composition may be dried after being applied to the substrate. Examples of drying methods include heat drying and vacuum drying. When heat drying is performed, the heating temperature and heating time may be appropriately adjusted depending on the type of solvent. Furthermore, heat drying may be performed as part of the first heating step described below.
[0220] [First heating step] The first heating step is a step of heating the liquid crystal layer to form a cholesteric liquid crystal phase. When a cholesteric liquid crystal compound is heated, as the heating temperature increases, the cholesteric liquid crystal compound changes from a crystalline state to an aligned state, and then from the aligned state to an isotropic state. In the first heating step, the liquid crystal layer containing the cholesteric liquid crystal compound is heated to form an aligned state of the cholesteric liquid crystal compound, thereby forming a cholesteric liquid crystal phase in which the cholesteric liquid crystal compound is aligned.
[0221] The relationship between the above-mentioned change in state of the cholesteric liquid crystal compound and the heating temperature varies depending on the type of cholesteric liquid crystal compound. Therefore, the heating temperature in the first heating step may be appropriately adjusted depending on the type of cholesteric liquid crystal compound so that the cholesteric liquid crystal compound is aligned. The heating time in the first heating step may be appropriately adjusted depending on the heating temperature, etc. Furthermore, the heating means is not particularly limited, and an oven, a hot plate, etc. may be used.
[0222] [First exposure process] The first exposure step is a step of irradiating the liquid crystal layer with a first light to deactivate a part of the photosensitive chiral agent from the surface of the liquid crystal layer toward the inside in the thickness direction. In the first exposure step, for example, the first light is irradiated from either the substrate side or the surface layer side, and the light is absorbed by the photosensitive chiral agent contained in the liquid crystal layer, so that the amount of deactivation of the photosensitive chiral agent on the side closer to the light source is greater than the amount of deactivation of the photosensitive chiral agent on the side farther from the light source, preferably such that the amount of active photosensitive chiral agent increases in a gradational manner from the liquid crystal layer surface on the side irradiated with the first light in the layer thickness direction. In an embodiment in which the amount of the active photosensitive chiral agent increases in a gradational manner from the surface of the liquid crystal layer on the side irradiated with the first light, the helix of the cholesteric liquid crystal structure is rewound in accordance with the amount of the photosensitive chiral agent before the liquid crystal layer is hardened in the second exposure step, resulting in a liquid crystal layer in which the helical pitch changes in a gradational manner. In the first exposure step, the first light may be irradiated only once or twice or more times. When the exposure is performed twice or more times, the exposure conditions (e.g., exposure means, exposure wavelength, exposure dose, exposure atmosphere, etc.) may be appropriately adjusted for each exposure.
[0223] The type of the first light is not particularly limited, but considering the reactivity of the components contained in the liquid crystal layer, ultraviolet light is preferably used. Examples of ultraviolet light sources include an ultra-high pressure mercury lamp, a high pressure mercury lamp, a metal halide lamp, and a light emitting diode (LED).
[0224] The wavelength range of the first light is not particularly limited, but when the first light is ultraviolet light, it is preferably 400 nm or less, more preferably 360 nm or less, and even more preferably 300 nm or less. When light of 300 nm or less is used, light absorption by the cholesteric liquid crystal compound makes it easier to control photocuring in the thickness direction. The wavelength range can be adjusted, for example, by using an optical filter, a method using two or more optical filters, or a method using a light source of a specific wavelength.
[0225] The exposure dose of the first light is not particularly limited, and when the first light is ultraviolet light, it is, for example, 0.1 mJ / cm 2 ~2,000mJ / cm 2 From the viewpoint of controlling the photocuring in the in-plane direction, the parallelism of the ultraviolet rays is preferably 20° or less, and more preferably 10° or less.
[0226] When the first exposure step is performed from the side opposite to the liquid crystal layer side of the substrate, it may be performed in a low-oxygen atmosphere (oxygen concentration 1,000 ppm or less, i.e., an atmosphere containing no oxygen or more than 0 ppm but less than 1,000 ppm of oxygen), and is more preferably performed in an oxygen-containing atmosphere (air or an atmosphere containing 1,000 ppm or more but less than 21% oxygen). Because oxygen inhibits radical polymerization, it becomes easier to control photocuring in the thickness direction.
[0227] From the viewpoint of promoting the curing of the liquid crystal layer, the first exposure step is preferably carried out in a low-oxygen atmosphere (preferably an atmosphere with an oxygen concentration of 1,000 ppm or less, i.e., an atmosphere containing no oxygen or more than 0 ppm but not more than 1,000 ppm of oxygen), and more preferably in a nitrogen atmosphere.
[0228] From the viewpoint of maintaining the change in the helical pitch of the liquid crystal layer, the first exposure step is preferably carried out at 50°C or lower, more preferably at 40°C or lower, and particularly preferably at 0°C or higher and 35°C or lower.
[0229] In the first exposure step, the first light may be irradiated through a first patterning mask having a plurality of regions with different transmittances of the first light, thereby exposing the plurality of regions of the liquid crystal layer with different exposure doses, thereby forming a plurality of regions with different thicknesses in the in-plane direction within a single layer, and collectively controlling the reflectance in the in-plane direction. In the first exposure step, the first light may be irradiated through a filter having a transmittance that varies depending on the wavelength. Furthermore, the filter may be a filter that adjusts the exposure amount of the first light. For example, a mask having a reduced transmittance of wavelengths absorbed by the photopolymerization initiator, for example, 0%, can be used so as to prevent the photopolymerization initiator used from generating polymerization initiating species.
[0230] Examples of the first patterning mask include a photomask in which a pattern is formed by etching a metal film, and a photomask in which a pattern is printed using various printing methods (e.g., printing with a laser printer or inkjet printer, gravure printing, screen printing). A photomask in which a pattern is formed by etching a metal film can be obtained, for example, by forming a metal chromium film on a quartz substrate by sputtering, and then patterning the film using a photoresist. The filter may be a transparent substrate such as glass on which a dielectric multilayer film is deposited. Also, a known bandpass filter may be used as the filter.
[0231] When the first light is irradiated using the first patterning mask or filter, the first patterning mask or filter may be placed on the side of the substrate opposite to the side having the liquid crystal layer, or on the side of the substrate having the liquid crystal layer.
[0232] When the first patterning mask or filter is placed on the side of the substrate having the liquid crystal layer, the first light may be irradiated by bringing the first patterning mask or filter into contact with the liquid crystal layer, or the first light may be irradiated by providing a gap between the liquid crystal layer and the first patterning mask.
[0233] When the first patterning mask or filter is disposed on the opposite side of the substrate from the side having the liquid crystal layer, it is preferable to use a light-transmitting substrate since the liquid crystal layer is exposed to the first light through the substrate. Regarding the light transmittance of the base material, the transmittance of the first light is not particularly limited, but from the viewpoint of more easily curing the liquid crystal layer, the higher the transmittance, the more preferable.
[0234] When the first light is irradiated using the first patterning mask or filter, only one type of first patterning mask or filter may be used, or two or more types may be used. The first patterning mask and a filter may also be used in combination.
[0235] [Second exposure process] The second exposure step is a step of irradiating the liquid crystal layer with second light to harden the liquid crystal layer. The helical pitch of the liquid crystal layer changed in the first exposure step can be hardened and fixed by irradiation with the second light.
[0236] In the second exposure step, not only the uncured portion but also the entire liquid crystal layer may be exposed. For example, the second light may be irradiated from the side of the substrate having the liquid crystal layer.
[0237] The type of the second light is not particularly limited, but considering the reactivity of components that may be contained in the liquid crystal compound, ultraviolet light is preferably used. Examples of ultraviolet light sources include ultra-high pressure mercury lamps, high pressure mercury lamps, metal halide lamps, and light-emitting diodes (LEDs).
[0238] The wavelength range of the second light is not particularly limited, and light in the wavelength range of 250 nm to 400 nm can be used, for example. The wavelength range can be adjusted, for example, by using an optical filter, a method using two or more optical filters, or a method using a light source of a specific wavelength.
[0239] The exposure dose of the second light is not particularly limited, and when the second light is ultraviolet light, it is, for example, 5 mJ / cm 2 ~2,000mJ / cm 2 It is preferable that:
[0240] From the viewpoint of promoting curing, the second exposure step is preferably carried out in a low-oxygen atmosphere (preferably an atmosphere with an oxygen concentration of 1,000 ppm or less, i.e., an atmosphere containing no oxygen or more than 0 ppm but not more than 1,000 ppm of oxygen), and more preferably in a nitrogen atmosphere.
[0241] From the viewpoint of maintaining the change in helical pitch of the liquid crystal layer until curing, the second exposure step is preferably carried out at 50°C or less, more preferably at 40°C or less, and particularly preferably at 0°C or more and 35°C or less.
[0242] [Other processes] The method for producing a decorative film according to the present disclosure may include other steps in addition to the steps described above, as necessary. Examples of such other steps include a step of peeling the substrate from a decorative film produced in a form including a substrate, thereby producing a decorative film in a form not including a substrate. Other steps include a colored layer forming step, an alignment layer forming step, and other layer forming steps. Details of the colored layer and the alignment layer and the method for forming them are as described above. Details of the other layers are as described above, and known methods may be used to form the other layers.
[0243] <Molded bodies, articles, electronic devices> The decorative film according to the present disclosure can be used for various purposes, for example, the decorative film can be molded and used as a molded article. The molded body according to the present disclosure is a molded body obtained by molding a decorative film. The article according to the present disclosure is an article including the decorative film according to the present disclosure or the molded body according to the present disclosure. Such decorative films or moldings can be provided on a variety of articles. Examples of such products include electronic devices such as smartphones, mobile phones, and tablets, automobiles, electrical appliances, and packaging containers, and the present invention is particularly suitable for use in electronic devices, more preferably display devices such as displays, smartphones, mobile phones, and tablets. Among these, the present invention can be particularly suitably used for ordinary displays or displays in display devices for smartphones, home appliances, audio products, computers, in-vehicle products, and the like.
[0244] The means for molding the decorative film to obtain a molded body is not particularly limited, and may be a known method such as three-dimensional molding, insert molding, etc. Furthermore, the means for applying the decorative film to an article is also not particularly limited, and a known method may be used as appropriate depending on the type of article.
[0245] The decorative panel according to the present disclosure includes the decorative film according to the present disclosure or a molded product thereof. The shape of the decorative panel is not limited. The shape of the decorative panel may be determined, for example, depending on the intended use. The decorative panel may be, for example, flat. The decorative panel may also have a curved surface. The decorative panel can be used, for example, in the interior and exterior of various articles (eg, electronic devices, automobiles, and electrical appliances).
[0246] The decorative panel can be manufactured, for example, by bonding the surface of the reflective layer side of a decorative film or a molded body to the surface of a member that will become the surface layer of the decorative panel. An example of a member that will become the surface layer of the decorative panel is a glass panel. The decorative film or molded body can be bonded to the member that will become the surface layer of the decorative panel using, for example, the adhesive layer described above. The molded body may be used alone as the decorative panel without combining the decorative film or molded body with other members. [Example]
[0247] The present disclosure will be described in more detail below with reference to examples, but the scope of the present disclosure is not limited to the specific examples shown below.
[0248] Example 1 [Preparation of substrate] As a support, a polyethylene terephthalate (PET) film (Cosmoshine A4160, manufactured by Toyobo Co., Ltd.) having a thickness of 100 μm and having an easy-adhesion layer on one side was prepared and used as a transparent support 1.
[0249] [Formation of primer layer (adhesive layer)] On the surface of the transparent support 1 without the easy-adhesion layer, the undercoat layer coating solution 1 having the composition described below was applied using a #4 wire bar coater. After that, it was dried at 80°C for 120 seconds, and then irradiated with 180 mJ / cm by an ultraviolet irradiation device using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at 25°C. 2 The substrate was irradiated with ultraviolet light of 1000 kJ / cm to prepare a support 1 with an undercoat layer.
[0250] - Composition of primer layer coating solution 1 - Tricyclodecane dimethanol dimethacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd.): 75 parts by mass KAYARAD PET30 (manufactured by Nippon Kayaku Co., Ltd.): 25 parts by weight IRGACURE 907 (manufactured by Ciba-Geigy): 3 parts by weight Photopolymerization initiator (Kayacure DETX, manufactured by Nippon Kayaku Co., Ltd.): 1 part by mass 1: 0.01 parts by mass of surfactant having the structure shown below Organic solvent 1 (methyl ethyl ketone): 136 parts by mass Organic solvent 2 (cyclohexanone): 156 parts by mass
[0251] Surfactant 1: The following compound
[0252] [ka]
[0253] [Formation of Reflective Layer 1] A liquid crystal composition 1 having the composition described below was prepared.
[0254] -Composition of Liquid Crystal Composition 1- 1:100 parts by mass of a rod-shaped liquid crystal compound having the structure shown below Chiral agent 1 (photosensitive chiral agent, compound having the structure shown below): 8.5 parts by mass Photopolymerization initiator (Kayacure DETX, manufactured by Nippon Kayaku Co., Ltd.): 0.5 parts by mass Surfactant 1 (compound having the structure shown above): 0.054 parts by mass Surfactant 2 (compound having the structure shown below): 0.134 parts by mass Organic solvent 1 (methyl ethyl ketone): 165 parts by mass Organic solvent 2 (cyclohexanone): 10 parts by mass
[0255] Rod-shaped liquid crystal compound 1: the following compound
[0256] [ka]
[0257] Chiral agent 1: the following compound
[0258] [ka]
[0259] Surfactant 2: the following compound
[0260] [ka]
[0261] Liquid crystal composition 1 was applied to the surface of support 1 with an undercoat layer using a #5 wire bar coater. Thereafter, the coating was dried at 80°C for 120 seconds, and then irradiated with 130 mJ / cm2 of ultraviolet light using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 5% or less and 25°C through a bandpass filter 1 having the following characteristics: 2 Furthermore, the sample was irradiated with 500 mJ / cm 2 of ultraviolet light using an ultraviolet light irradiation device using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 5% or less and 25°C. 2 The liquid crystal layer was cured by irradiating it with ultraviolet light, and then the same exposure was performed under a low oxygen concentration (1,000 ppm or less) to completely cure the liquid crystal layer, forming a reflective layer 1 with a thickness of 2.4 μm, thereby producing the decorative film of Example 1. The bandpass filter 1 is formed by depositing a dielectric multilayer film on a glass substrate (SHOTT TEMPAX Float t2.0mm) and has a transmittance of 0% for wavelengths of 350nm to 450nm or more and an average transmittance of 70% to 75% for wavelengths of 310nm to 330nm.
[0262] <Example 2> The preparation of the substrate and the formation of the undercoat layer were carried out in the same manner as in Example 1.
[0263] [Formation of Reflective Layer 2] A liquid crystal composition 2 having the composition described below was prepared.
[0264] -Composition of Liquid Crystal Composition 2- 1:100 parts by mass of a rod-shaped liquid crystal compound having the structure shown above Chiral agent 1 (photosensitive chiral agent, compound having the structure shown above): 4 parts by mass Photopolymerization initiator (Kayacure DETX, manufactured by Nippon Kayaku Co., Ltd.): 0.5 parts by mass Surfactant 1 (compound having the structure shown above): 0.054 parts by mass Surfactant 2 (compound having the structure shown above): 0.134 parts by mass Organic solvent 1 (methyl ethyl ketone): 185 parts by mass Organic solvent 2 (cyclohexanone): 9.7 parts
[0265] Liquid crystal composition 2 was applied to the surface of support 1 with the undercoat layer using a #10 wire bar coater. Thereafter, the mixture was dried at 80°C for 120 seconds, and then irradiated with 620 mJ / cm2 of a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 5% or less and 25°C through a bandpass filter 1 having the following characteristics: 2 Furthermore, the sample was irradiated with 500 mJ / cm 2 of ultraviolet light using an ultraviolet light irradiation device using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 5% or less and 25°C. 2 The liquid crystal layer was cured by irradiating it with ultraviolet light of 500 mJ / cm 2 , and then further cured by using an ultraviolet light irradiation device using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 1,000 ppm or less and 25°C. 2 The liquid crystal layer was completely cured by irradiating it with ultraviolet light, and a reflective layer 2 was formed, thereby producing a decorative film of Example 2.
[0266] Example 3 The preparation of the substrate and the formation of the undercoat layer were carried out in the same manner as in Example 1.
[0267] [Formation of Reflective Layer 3] Liquid crystal composition 2 was applied to the surface of support 1 with the undercoat layer using a #10 wire bar coater. Thereafter, the coating was dried at 80°C for 120 seconds, and then irradiated with 1,400 mJ / cm2 of light using a UV irradiation device using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 1% or less and 25°C through a bandpass filter 1 having the following characteristics: 2 Furthermore, the sample was irradiated with 1,400 mJ / cm of ultraviolet light using a UV irradiation device using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 1% or less and 25°C. 2 The liquid crystal layer was cured by irradiating it with ultraviolet light of 500 mJ / cm 2 , and then further cured by using an ultraviolet light irradiation device using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 1,000 ppm or less and 25°C.2 The liquid crystal layer was completely cured by irradiating it with ultraviolet light, and a reflective layer 3 was formed, thereby producing a decorative film of Example 3.
[0268] Example 4 The preparation of the substrate and the formation of the undercoat layer were carried out in the same manner as in Example 1. The decorative film was produced in the same manner as in Example 1, except that the reflective layer 4 was formed by using an inorganic compound multilayer film as the cholesteric liquid crystal layer.
[0269] [Formation of inorganic compound multilayer film] Using a sputtering film-forming apparatus (RAS-1100C, manufactured by Shincron Co., Ltd.), a niobium oxide film was formed on the alignment layer to a thickness of 100 nm. A silicon oxide film was formed on the niobium oxide layer to a thickness of 100 nm. The process of alternately forming niobium oxide and silicon oxide films was repeated until a total of four layers were formed, thereby producing a reflective layer 4 and a decorative film of Example 4.
[0270] <Example 5> The substrate was prepared in the same manner as in Example 1.
[0271] [Rubbing treatment] The surface of the transparent support 1 that did not have an easy-adhesion layer was subjected to a rubbing treatment. The rubbing treatment can be performed by rubbing the surface of a film whose main component is a polymer with paper or cloth in a certain direction. The rubbing treatment was performed in a direction rotated 3° counterclockwise from the short side direction of the substrate (rayon cloth, pressure 0.1 kgf, rotation speed 1,000 rpm, conveying speed 10 m / min, rubbing once). In this way, a support 5 having an alignment layer formed on the substrate was produced.
[0272] [Formation of Reflective Layer 5] A liquid crystal composition 3 having the following composition was prepared.
[0273] -Composition of Liquid Crystal Composition 3- 1:100 parts by mass of a rod-shaped liquid crystal compound having the structure shown above Chiral agent 1 (photosensitive chiral agent, compound having the structure shown above): 5 parts by mass Photopolymerization initiator (Kayacure DETX, manufactured by Nippon Kayaku Co., Ltd.): 0.5 parts by mass Surfactant 1 (compound having the structure shown above): 0.054 parts by mass Surfactant 2 (compound having the structure shown above): 0.134 parts by mass Organic solvent 1 (methyl ethyl ketone): 373 parts by mass Organic solvent 2 (cyclohexanone): 21 parts by mass
[0274] Liquid crystal composition 3 was applied to the surface of support 5 on which the alignment layer was formed using a #1.6 wire bar coater. Thereafter, the film was dried at 80°C for 120 seconds, and then irradiated with 500 mJ / cm using an ultraviolet ray irradiation device using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 100 ppm or less and 25°C. 2 The liquid crystal layer was cured by irradiating it with ultraviolet light, and a reflective layer 5 was formed, thereby producing a decorative film of Example 5.
[0275] Example 6 The preparation of the substrate and the formation of the undercoat layer were carried out in the same manner as in Example 1.
[0276] [Formation of Reflective Layer 6] Liquid crystal composition 4 having the composition described below was prepared.
[0277] -Composition of Liquid Crystal Composition 4- 1:100 parts by mass of a rod-shaped liquid crystal compound having the structure shown above Chiral agent 1 (photosensitive chiral agent, compound having the structure shown above): 5 parts by mass Photopolymerization initiator (Kayacure DETX, manufactured by Nippon Kayaku Co., Ltd.): 0.5 parts by mass Surfactant 1 (compound having the structure shown above): 0.054 parts by mass Surfactant 2 (compound having the structure shown above): 0.134 parts by mass Organic solvent 1 (methyl ethyl ketone): 273 parts by mass Organic solvent 2 (cyclohexanone): 16 parts
[0278] Liquid crystal composition 4 was applied to the surface of support 1 with the undercoat layer using a #1.6 wire bar coater. Thereafter, the coating was dried at 80°C for 120 seconds, and then irradiated with 500 mJ / cm using an ultraviolet ray irradiation device using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 100 ppm or less and 25°C. 2 The liquid crystal layer was cured by irradiating it with ultraviolet light of 1000 kJ / cm 2 , thereby forming a reflective layer 6, and thus a decorative film of Example 6 was produced.
[0279] Example 7 The preparation of the substrate and the formation of the undercoat layer were carried out in the same manner as in Example 1.
[0280] [Formation of Reflective Layer 7] Liquid crystal composition 1 was applied to the surface of support 1 with the undercoat layer using a #5 wire bar coater. Thereafter, the mixture was dried at 80°C for 120 seconds, and then irradiated with 50 mJ / cm2 of light using an ultraviolet ray irradiation device using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 5% or less and 25°C through a bandpass filter 1 having the following characteristics: 2 Furthermore, the sample was irradiated with 500 mJ / cm 2 of ultraviolet light using an ultraviolet light irradiation device using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 5% or less and 25°C. 2 The liquid crystal layer was cured by irradiating it with ultraviolet light of 500 mJ / cm 2 , and then further cured by using an ultraviolet light irradiation device using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 1,000 ppm or less and 25°C. 2 The liquid crystal layer was completely cured by irradiating it with ultraviolet light, and a reflective layer 7 was formed, thereby producing a decorative film of Example 7.
[0281] Example 8 The reflective layer 8 was formed in the same manner as the reflective layer 6 in Example 6.
[0282] [Formation of scattering layer 1] A scattering layer-forming coating solution 1 having the composition described below was prepared.
[0283] -Composition of coating liquid 1 for forming scattering layer- Photocurable acrylic polymer (KAYARAD PET-30, manufactured by Nippon Kayaku Co., Ltd.): 100 parts by mass Acrylic particles (Micropearl KB515, size 15 μm, manufactured by Sekisui Chemical Co., Ltd.): 0.54 parts by mass Photopolymerization initiator (Irgacure 127, manufactured by BASF): 1.0 parts by mass Surfactant (Megafac F553, solid content 2%, manufactured by DIC Corporation): 0.2 parts by mass Organic solvent 1 (methyl ethyl ketone): 233.7 parts by mass
[0284] The prepared scattering layer-forming coating solution 1 was applied to the surface of a 125 μm-thick PMMA film using a #14 wire bar coater so that the binder thickness would be 7 μm. After that, the film was dried at 80°C for 120 seconds, and then irradiated with 500 mJ / cm using an ultraviolet ray irradiation device using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 100 ppm or less and 25°C. 2 By irradiating the coating solution 1 for forming a scattering layer with ultraviolet rays of 1000 kJ / cm, the scattering layer was hardened to form a scattering layer. The surface condition of the obtained scattering layer was analyzed using a laser microscope (manufactured by Keyence Corporation). It was found that the number of areas with a convex height of 1 μm or more was 300 μm. 2 Among them, one was observed. After peeling off the protective film on one side of an adhesive sheet (G25, thickness 25 μm, manufactured by Nichiei Shinka Co., Ltd.) having protective films on both sides of the adhesive layer, the adhesive sheet was attached to the reflective layer 8 of the decorative film, and after peeling off the protective film on the other side, the adhesive sheet was attached to the substrate surface of the prepared scattering layer, thereby bonding the two together.
[0285] Example 9 The preparation of the substrate and the formation of the undercoat layer were carried out in the same manner as in Example 1. [Formation of Reflective Layer 9] Liquid crystal composition 5 having the composition shown below was prepared.
[0286] -Composition of Liquid Crystal Composition 5- A mixture of rod-shaped liquid crystal compounds having the structure shown below: 100 parts by mass Chiral agent 1 (photosensitive chiral agent, compound having the structure shown below): 8.5 parts by mass Photopolymerization initiator (Kayacure DETX, manufactured by Nippon Kayaku Co., Ltd.): 0.5 parts by mass Surfactant 1 (compound having the structure shown above): 0.054 parts by mass Surfactant 2 (compound having the structure shown above): 0.134 parts by mass Organic solvent 1 (methyl ethyl ketone): 165 parts by mass Organic solvent 2 (cyclohexanone): 10 parts by mass
[0287] A mixture of rod-shaped liquid crystal compounds:
[0288] [ka]
[0289] Liquid crystal composition 5 was applied to the surface of support 1 with the undercoat layer using a #5 wire bar coater. Thereafter, the mixture was dried at 80°C for 120 seconds, and then irradiated with 130 mJ / cm2 of ultraviolet light using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 5% or less and 25°C through a bandpass filter 1 having the following characteristics: 2 Furthermore, the sample was irradiated with 500 mJ / cm 2 of ultraviolet light using an ultraviolet light irradiation device using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 5% or less and 25°C. 2 The liquid crystal layer was cured by irradiating it with ultraviolet light, and then the same exposure was performed under a low oxygen concentration (1,000 ppm or less) to completely cure the liquid crystal layer, forming a reflective layer 9, and the decorative film of Example 9 was produced.
[0290] Example 10 The preparation of the substrate and the formation of the undercoat layer were carried out in the same manner as in Example 1.
[0291] [Formation of Reflective Layer 10] A liquid crystal composition 6 having the composition described below was prepared.
[0292] -Composition of Liquid Crystal Composition 6- 1:100 parts by mass of a rod-shaped liquid crystal compound having the structure shown above Chiral agent 2 (photosensitive chiral agent, compound having the structure shown below): 8.5 parts by mass Photopolymerization initiator (Kayacure DETX, manufactured by Nippon Kayaku Co., Ltd.): 0.5 parts by mass Surfactant 1 (compound having the structure shown above): 0.054 parts by mass Surfactant 2 (compound having the structure shown above): 0.134 parts by mass Organic solvent 1 (methyl ethyl ketone): 165 parts by mass Organic solvent 2 (cyclohexanone): 10 parts by mass
[0293] Chiral agent 2: structure shown below
[0294] [ka]
[0295] Liquid crystal composition 6 was applied to the surface of support 1 with the undercoat layer using a #5 wire bar coater. After that, it was dried at 80°C for 120 seconds, and then irradiated with 130 mJ / cm2 of ultraviolet light using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 5% or less and 25°C through a bandpass filter 1 having the following characteristics: 2 Furthermore, the sample was irradiated with 500 mJ / cm 2 of ultraviolet light using an ultraviolet light irradiation device using a metal halide lamp (MAL625NAL, manufactured by GS Yuasa Corporation) at an oxygen concentration of 5% or less and 25°C. 2 The liquid crystal layer was cured by irradiating it with ultraviolet light, and then the same exposure was performed under a low oxygen concentration (1,000 ppm or less) to completely cure the liquid crystal layer, forming a reflective layer 10, and the decorative film of Example 10 was produced.
[0296] <Comparative Example 1> Using the technology described in Patent Document 2 (JP 2020-131666 A, decorative sheet, display device with decorative sheet), the decorative film and light-shielding film were removed by irradiating them with laser light (Nd:YAG laser with a wavelength of 1,064 nm), and the through holes were designed and manufactured to account for 10% of the area of the decorative film.
[0297] <Comparative Example 2> The preparation of the substrate and the rubbing treatment were carried out in the same manner as in Example 5. The decorative film of Comparative Example 2 was produced in the same manner as in the formation of the reflective layer 5 in Example 5, except that the film thickness of the reflective layer C2 was controlled using a wire bar coater and the wavelength was adjusted by increasing or decreasing the amount of ultraviolet light irradiation.
[0298] <Integrated reflectance measurement> The integrated reflectance spectrum of the reflective layer in the decorative film was measured using a spectrophotometer equipped with an integrating sphere ("V-670" manufactured by JASCO Corporation) so that light was incident from the liquid crystal layer side of the reflective layer in the decorative film, including specularly reflected light. In the obtained integrated spectrum, the maximum reflectance in the wavelength range of 380 nm to 780 nm was taken as the maximum integrated reflectance.
[0299] <Measurement of diffuse reflectance> The diffuse integrated reflectance spectrum of the reflective layer was measured using the spectrophotometer, while excluding specular reflection during measurement. In the obtained integrated spectrum, the maximum reflectance at wavelengths of 380 nm to 780 nm was defined as the maximum diffuse integrated reflectance, and the ratio of the maximum diffuse integrated reflectance to the maximum integrated reflectance was defined as the ratio of the diffuse reflectance to the total light reflectance.
[0300] <Measurement of the half-width of the peak showing the maximum integrated reflectance> From the integrated spectrum measured by the above-mentioned method for measuring the integrated reflectance, the half-value width of the peak showing the above-mentioned maximum integrated reflectance was measured.
[0301] <Measurement of integrated reflectance at a wavelength of 800 nm> The integrated reflectance at a wavelength of 800 nm was measured from the integrated spectrum measured by the above-mentioned method for measuring the integrated reflectance.
[0302] <Evaluation method> [Display visibility] The visibility of the display when the display was on was evaluated by attaching the resulting decorative film to a display device (11-inch iPad Pro third generation) using an adhesive (SK2057, manufactured by Soken Chemical & Engineering Co., Ltd.), displaying 12-font size characters with the display on, and evaluating the visibility of the characters. Observation was carried out at a distance of 1 m from the front of the decorative film. A sensory evaluation was conducted because, even when the display was on, external light was reflected by the reflective layer, making the decoration visible and making the display difficult to see, so a comprehensive judgment was required. B was preferable, and A was more preferable. A: The characters were clearly recognized. B: The text is slightly blurry, but it is recognized. C: Blurred and difficult to recognize characters
[0303] [Visibility of decoration] The visibility of the decoration when the display is off was checked by attaching the decorative film to a display (11-inch iPad Pro 3rd generation) using an adhesive (SK2057, manufactured by Soken Chemical & Engineering Co., Ltd.) and irradiating it with an LED light source (LA-HDF108AA, manufactured by Hayashi Revic Co., Ltd.). A rating of B is preferable, and A is more preferable. A: The decorative film was clearly visible from all angles. B: The visibility of the decorative film was low, but the decoration was still recognizable. C: The visibility of the decorative film was low, and there were areas where the decoration was not visible.
[0304] [Viewing angle dependency (color change depending on viewing angle)] Under a fluorescent light source, the reflected color of the reflective layer of each of the decorative films prepared above was visually observed from the front (0°) to an oblique angle of 55° and photographs were taken, and evaluated from the following perspectives. A: No change in the reflected color can be detected. B: The change in the color of the reflected color is small and acceptable. C: The reflected color has changed significantly and is unacceptable.
[0305] The evaluation results are summarized in Table 1.
[0306] [Table 1]
[0307] The reflective layers in the decorative films of Examples 1 to 10 selectively reflect at least a portion of light in the wavelength range of 380 nm to 780 nm.
[0308] As shown in Table 1, the decorative films of the examples were superior in visibility of the display and visibility of the decoration compared to the decorative films of the comparative examples. [Explanation of symbols]
[0309] 20: Decorative film, 22: Colored layer, 24: Base material, 26: Reflective layer, 28: Adhesive layer, 30: Scattering layer, 200: Decorative film
Claims
1. a reflective layer that selectively reflects at least a portion of light in the wavelength range of 380 nm to 780 nm; and a scattering layer that scatters at least a portion of light in the wavelength range of 380 nm to 780 nm; The maximum integrated reflectance including specular reflection light in the wavelength range of 380 nm to 780 nm is 30% or less, The reflective layer is a reflective layer in which the helical pitch of the cholesteric liquid crystal structure changes in a gradational manner in the layer thickness direction, or an inorganic multilayer film layer. Decorative film.
2. 2. The decorative film according to claim 1, wherein the ratio of diffuse reflectance to total light reflectance is 80% or more.
3. 3. The decorative film according to claim 1, wherein in a reflectance spectrum of the decorative film obtained by an integrating sphere, a half-value width of a peak exhibiting the maximum integrated reflectance is 200 nm or more.
4. The decorative film according to any one of claims 1 to 3, wherein the decorative film has an integrated reflectance of 3% to 30% at a wavelength of 800 nm.
5. The decorative film according to any one of claims 1 to 4, wherein the maximum integrated reflectance in the wavelength range of 380 nm to 780 nm is 5% or more.
6. The decorative film according to any one of claims 1 to 5, wherein the reflective layer contains a cholesteric liquid crystal compound.
7. The decorative film according to claim 6 , wherein the reflective layer has a portion in which the helical pitch of the cholesteric liquid crystal structure varies in the thickness direction.
8. A molded article obtained by molding the decorative film according to any one of claims 1 to 7.
9. A decorative panel comprising the decorative film according to any one of claims 1 to 7 or the molded body according to claim 8.
10. A display device comprising the decorative panel according to claim 9.
Citation Information
Patent Citations
Reflective film, optical member, display, and image display device
JP2016114765A
Decorative sheet and article
JP2017205988A
Optical Camouflage Filter
JP2019507899A
Optical film, liquid crystal display, automobile interior package and method for manufacturing optical film
JP2020060627A
Decorative sheet, liquid crystal display device, and interior for automobile
WO2018043678A1