Propylene glycol monomethyl ether acetate composition
A controlled production process for propylene glycol monomethyl ether acetate compositions maintains low light absorption, addressing storage-related issues in semiconductor manufacturing.
JP7821378B2Active Publication Date: 2026-02-26KH NEOCHEM CO LTD
Patent Information
- Application Number
- JP2025539375
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2023-12-27
- Filing Date
- 2024-12-26
- Publication Date
- 2026-02-26
- Estimated Expiration
- 2044-12-26
AI Technical Summary
Technical Problem
Propylene glycol monomethyl ether acetate (PMA) compositions exhibit increased absorption of short-wavelength light after long-term storage, leading to issues in semiconductor device manufacturing.
Method used
A propylene glycol monomethyl ether acetate composition with specific absorbance and impurity levels, controlled through a production process involving distillation and gas chromatography, to maintain low light absorption.
Benefits of technology
The composition effectively prevents an increase in short-wavelength light absorption after long-term storage, ensuring consistent quality in semiconductor device manufacturing.
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Smart Images
Figure 0007821378000001
Abstract
This propylene glycol monomethyl ether acetate composition contains propylene glycol 1-monomethyl ether 2-acetate, and has an absorbance of 0.030 or less at 259 nm as measured after the propylene glycol monomethyl ether acetate composition has been submitted to the following test. (Test) The propylene glycol monomethyl ether acetate composition is heated to 80°C in a container made of borosilicate glass in a nitrogen atmosphere, and kept in that condition for 275 hours.
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Citation Information
Patent Citations
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