Support device, support method, and support program

Abstract

To provide a supporting device that allows a maintenance worker to rapidly perform a proper maintenance work on a substrate processor regardless of the degree of skills.SOLUTION: A supporting device 4 supports the maintenance work of at least one substrate processor 1. Also, the supporting device 4 acquires separation degree information. The separation degree information shows the degree of separation between plural pieces of processing information predicted on the basis of the invariant relationship among plural pieces of processing information showing operations or states related to processing of the substrate W of at least one substrate processor 1 and plural pieces of processing information actually collected from the substrate processor 1 and the actually collected pieces of processing information. The supporting device 4 generates supporting information on the maintenance work of at least one substrate processor 1 on the basis of the acquired separation degree information.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to an assistance device, an assistance method, and an assistance program for assisting maintenance work on one or more substrate processing apparatuses. [Background technology]

[0002] Substrate processing apparatuses are used to perform various processes on various substrates such as semiconductor substrates. In the substrate processing apparatus, a series of processes are performed on the substrates according to, for example, a predetermined processing procedure (processing recipe). In order to prevent the occurrence of substrate processing defects due to an abnormality in the substrate processing apparatus, a data processing system for determining an abnormality in the substrate processing apparatus has been proposed (see, for example, Patent Document 1).

[0003] In the data processing system, a plurality of physical quantities related to the substrate processing apparatus are measured during substrate processing, and the measurement results are arranged in chronological order to generate a plurality of time-series data. The plurality of time-series data includes data on physical quantities such as the flow rate of the processing liquid discharged from the nozzle and the pressure inside the chamber. Each time-series data is compared with predetermined reference data to calculate an evaluation value. Whether or not there is an abnormality in the time-series data is determined based on the calculated evaluation value. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Publication No. 2020-47847 Summary of the Invention [Problem to be solved by the invention]

[0005] In the following description, a person who performs maintenance work on a substrate processing apparatus is referred to as a maintenance worker. The maintenance worker of the substrate processing apparatus can determine whether an abnormality has occurred in the substrate processing apparatus based on the abnormality determination results obtained by the data processing system. However, an inexperienced maintenance worker may be able to determine that an abnormality has occurred in the substrate processing apparatus, but may not be able to identify the cause of the abnormality. Alternatively, an inexperienced maintenance worker may be able to identify the cause of the abnormality, but may not be able to identify the appropriate work to resolve the abnormality. In these cases, the maintenance worker may need a long time to perform maintenance work on the substrate processing apparatus.

[0006] An object of the present invention is to provide a support device, a support method, and a support program that enable a maintenance worker, regardless of the level of skill, to perform appropriate maintenance work on a substrate processing apparatus in a short time. [Means for solving the problem]

[0007] (1) According to one aspect of the present invention, an assistance device assists in maintenance work of a substrate processing apparatus, and includes a deviation degree acquiring unit that acquires deviation degree information that indicates an invariant relationship between a plurality of pieces of processing information that indicate operations or states related to substrate processing of the substrate processing apparatus and a plurality of pieces of processing information that are actually collected from the substrate processing apparatus, and a deviation degree information that indicates a degree of deviation between a plurality of pieces of processing information predicted based on the plurality of pieces of processing information that are actually collected from the substrate processing apparatus, and a generation unit that generates assistance information related to the maintenance work of the substrate processing apparatus based on the deviation degree information. and transmits the generated support information to the substrate processing apparatus. and a support information generating unit for generating the support information. The substrate processing apparatus includes a plurality of components related to a plurality of pieces of processing information, and the support apparatus further includes a target determination unit that determines one or more components among the plurality of components to be subject to maintenance work as one or more maintenance target components based on the deviation information, and a required value calculation unit that acquires, for each of the one or more maintenance target components determined by the target determination unit, information on the state of the maintenance target component that changes over time as aging component information, and calculates a required value indicating the degree of necessity of maintenance work for the maintenance target component based on the acquired aging component information, and the support information generation unit includes, in the support information, information indicating the one or more maintenance target components determined by the target determination unit, and determines, for each of the one or more maintenance target components determined by the target determination unit, to which of a plurality of predetermined required levels the required value calculated by the required value calculation unit belongs, and includes, in the support information, information indicating a procedure for maintenance work for the maintenance target component that is predetermined in accordance with the determined required level. do.

[0008] The support device generates support information based on the deviation information, thereby enabling a maintenance worker performing maintenance work on the substrate processing apparatus to perform appropriate maintenance work on the substrate processing apparatus in a short time based on the generated support information, regardless of the level of skill.

[0010] Furthermore, according to the above configuration,Based on the generated support information, the maintenance worker can quickly identify one or more parts that require maintenance.

[0011] ( 2 ) For the plurality of pieces of processing information, a plurality of combinations of two pieces of processing information different from each other are determined, each combination including first processing information and second processing information, the first processing information predicted based on the second processing information actually collected from the substrate processing apparatus and the invariant relationship for each combination is generated as first predicted processing information, a degree of deviation between the generated first predicted processing information and the first processing information actually collected from the substrate processing apparatus is calculated as a first deviation degree, the second processing information predicted based on the first processing information actually collected from the substrate processing apparatus and the invariant relationship for each combination is generated as second predicted processing information, and a degree of deviation between the generated second predicted processing information and the first processing information actually collected from the substrate processing apparatus is calculated as a first deviation degree. The degree of deviation between the predicted processing information and the second processing information actually collected is calculated as a second deviation, the deviation acquisition unit acquires the multiple first deviations calculated for the multiple combinations and the multiple second deviations calculated for the multiple combinations as deviation information, and the target determination unit extracts one or more combinations whose first deviation exceeds a predetermined first threshold value and one or more combinations whose second deviation exceeds a predetermined second threshold value from the multiple combinations, and for each of the extracted one or more combinations, determines one or more parts commonly related to the first processing information and the second processing information included in the combination as one or more maintenance target parts. In this case, the one or more maintenance target parts are appropriately determined based on the multiple processing information actually collected.

[0012] ( 3 ) An assistance device according to another aspect of the present invention is an assistance device that assists in maintenance work of a substrate processing apparatus, and includes: a deviation degree acquisition unit that acquires deviation degree information that indicates an invariant relationship between a plurality of pieces of processing information that indicate operations or states related to substrate processing of the substrate processing apparatus and a degree of deviation between a plurality of pieces of processing information predicted based on a plurality of pieces of processing information actually collected from the substrate processing apparatus and the plurality of pieces of processing information that have actually been collected; and an assistance information generation unit that generates assistance information related to maintenance work of the substrate processing apparatus based on the deviation degree information, wherein the substrate processing apparatus includes a plurality of components related to the plurality of pieces of processing information, and the assistance device includes: a target determination unit that determines one or more components among the plurality of components that are to be subject to maintenance work based on the deviation degree information; For each of the one or more maintenance target parts determined by the target determination unit, information on the state of the maintenance target part that changes over time is acquired as aging part information, and the acquired aging part information and a weight that is determined in advance in consideration of the effect that an abnormality in the maintenance target part has on the human body.a necessary value calculation unit that calculates a necessary value indicating the degree of necessity of maintenance work for the maintenance target part based on the and The support information generation unit The support information includes information indicating one or more maintenance target parts determined by the target determination unit, and For each of one or more maintenance target parts determined by the target determination unit, it is determined to which of a plurality of predetermined necessary levels the necessary value calculated by the necessary value calculation unit belongs, and information on the maintenance work of the maintenance target part, which is predetermined according to the determined necessary level, is included in the support information. do.

[0013] In this case, the maintenance worker can quickly determine the appropriate maintenance work according to the state of each of one or more maintenance target components based on the generated support information.

[0014] ( 4 Each substrate processing apparatus may be a substrate cleaning apparatus that cleans a substrate using a cleaning liquid, and the plurality of processing information may include at least one of the amount of cleaning liquid supplied to the substrate, the temperature of the cleaning liquid supplied to the substrate, and the concentration of the cleaning liquid supplied to the substrate. In this case, support information corresponding to the substrate cleaning apparatus is generated.

[0015] ( 5 ) The present invention moreover A support method according to another aspect is a support method for supporting maintenance work of a substrate processing apparatus, comprising the steps of: acquiring discrepancy information indicating a degree of discrepancy between a plurality of pieces of processing information predicted based on an invariant relationship between a plurality of pieces of processing information indicating an operation or state related to substrate processing of the substrate processing apparatus and a plurality of pieces of processing information actually collected from the substrate processing apparatus; and generating support information related to the maintenance work of the substrate processing apparatus based on the discrepancy information. and transmits the generated support information to the substrate processing apparatus. and The substrate processing apparatus includes a plurality of components related to a plurality of pieces of processing information, and the support method further includes the steps of determining, based on the deviation information, one or more components among the plurality of components that are to be subjected to maintenance work as one or more maintenance target components, and acquiring, for each of the determined one or more maintenance target components, information relating to a state of the maintenance target component that changes over time as aging component information, and calculating a requirement value indicating a degree of necessity of maintenance work for the maintenance target component based on the acquired aging component information, and the step of generating support information and transmitting the generated support information to the substrate processing apparatus includes including, in the support information, information indicating the determined one or more maintenance target components, and determining to which of a plurality of predetermined requirement levels the calculated requirement value for each of the determined one or more maintenance target components belongs, and including, in the support information, information indicating a procedure for maintenance work for the predetermined maintenance target component in accordance with the determined requirement level. nothing.

[0016] According to this support method, support information is generated based on the deviation information, thereby enabling a maintenance worker performing maintenance work on the substrate processing apparatus to perform appropriate maintenance work on the substrate processing apparatus in a short time based on the generated support information, regardless of the level of skill. (6 ) The present invention moreover Other aspects of the support methods include: A method for assisting maintenance work of a substrate processing apparatus, the method comprising the steps of: acquiring deviation information indicating a degree of deviation between a plurality of pieces of processing information predicted based on an invariant relationship between a plurality of pieces of processing information indicating an operation or state related to substrate processing of the substrate processing apparatus and a plurality of pieces of processing information actually collected from the substrate processing apparatus; and generating support information related to the maintenance work of the substrate processing apparatus based on the deviation information, wherein the substrate processing apparatus includes a plurality of components related to the plurality of pieces of processing information; and determining one or more components among the plurality of components that are to be subjected to maintenance work as one or more maintenance target components based on the deviation information; and a step of acquiring, for each of the target parts, information relating to the state of the target parts that changes over time as part-time information, and calculating a required value indicating the degree of necessity of maintenance work for the target parts based on the acquired part-time information and a weight that is predetermined taking into account the impact that an abnormality in the target parts will have on the human body, wherein the step of generating support information includes including, in the support information, information indicating the determined one or more target parts for maintenance, and determining to which of a plurality of predetermined required levels the required value calculated for each of the determined one or more target parts for maintenance belongs, and including, in the support information, information on the maintenance work for the target parts that is predetermined according to the determined required level.

[0017] (7) A support program according to yet another aspect of the present invention is a support program that causes a computer to execute support processing for supporting maintenance work of a substrate processing apparatus, the support processing including: a process of acquiring deviation information indicating a degree of deviation between a plurality of pieces of processing information predicted based on an invariant relationship between a plurality of pieces of processing information indicating an operation or state related to substrate processing of the substrate processing apparatus and a plurality of pieces of processing information actually collected from the substrate processing apparatus; and a process of generating support information related to maintenance work of the substrate processing apparatus based on the deviation information. and transmits the generated support information to the substrate processing apparatus. Including the processing The substrate processing apparatus includes a plurality of components related to a plurality of pieces of processing information, and the support process further includes a process of determining, based on the deviation information, one or more components among the plurality of components that are to be subjected to maintenance work as one or more maintenance target components, and a process of acquiring, for each of the determined one or more maintenance target components, information on the state of the maintenance target component that changes over time as aging component information, and calculating a requirement value indicating the degree of necessity of maintenance work for the maintenance target component based on the acquired aging component information, and the process of generating support information and transmitting the generated support information to the substrate processing apparatus includes including, in the support information, information indicating the determined one or more maintenance target components, and determining to which of a plurality of predetermined requirement levels the calculated requirement value for each of the determined one or more maintenance target components belongs, and including, in the support information, information indicating a procedure for maintenance work for the predetermined maintenance target component in accordance with the determined requirement level. nothing.

[0018] According to the assistance program, assistance information is generated based on the deviation information, thereby enabling a maintenance worker performing maintenance work on the substrate processing apparatus to perform appropriate maintenance work on the substrate processing apparatus in a short time based on the generated assistance information, regardless of the level of skill. (8) An assistance program according to yet another aspect of the present invention is an assistance program that causes a computer to execute assistance processing to assist in maintenance work of a substrate processing apparatus, the assistance processing including: a process of acquiring deviation information indicating a degree of deviation between a plurality of pieces of processing information predicted based on an invariant relationship between a plurality of pieces of processing information indicating an operation or state related to substrate processing of the substrate processing apparatus and a plurality of pieces of processing information actually collected from the substrate processing apparatus; and a process of generating assistance information related to maintenance work of the substrate processing apparatus based on the deviation information, wherein the substrate processing apparatus includes a plurality of components related to the plurality of pieces of processing information, and the assistance processing includes determining, based on the deviation information, one or more components among the plurality of components that are to be subject to maintenance work as one or more maintenance target components. and a process of determining, for each of the determined one or more maintenance target parts, information relating to the state of the maintenance target part that changes over time as maintenance target part information, and calculating a required value indicating the degree of necessity of maintenance work for the maintenance target part based on the obtained maintenance target part information and a weight that is predetermined in consideration of the impact that an abnormality in the maintenance target part has on the human body; and the process of generating support information includes including, in the support information, information indicating the determined one or more maintenance target parts, and determining to which of a plurality of predetermined required levels the required value calculated for each of the determined one or more maintenance target parts belongs, and including, in the support information, information on the maintenance work for the maintenance target part that is predetermined in accordance with the determined required level. [Effects of the Invention]

[0019] According to the present invention, maintenance workers can perform appropriate maintenance work on substrate processing apparatuses in a short time, regardless of their level of skill. [Brief explanation of the drawings]

[0020] [Figure 1] 1 is a diagram for explaining an overall configuration of a substrate processing apparatus management system according to an embodiment of the present invention; [Figure 2] FIG. 10 is a diagram for explaining a specific example of calculating the degree of deviation. [Figure 3] FIG. 10 is a diagram for explaining a specific example of calculation of an abnormality score. [Figure 4] FIG. 10 is a diagram illustrating an example of data-related part information. [Figure 5] FIG. 10 is a diagram illustrating an example of aged part information. [Figure 6] FIG. 2 is a block diagram illustrating the functional configuration of an information analysis device and a support device. [Figure 7] 7 is a flowchart showing an example of a process executed by the control device of FIG. 6 regarding abnormality determination of the substrate processing apparatus. [Figure 8] 7 is a flowchart showing an example of a process executed by an information analyzing device to determine an abnormality in the substrate processing apparatus of FIG. 6. [Figure 9] 7 is a flowchart showing an example of a process executed by a support device to support maintenance work on the substrate processing apparatus of FIG. 6. [Figure 10] 7 is a flowchart showing an example of a process executed by a support device to support maintenance work on the substrate processing apparatus of FIG. 6. DETAILED DESCRIPTION OF THE INVENTION

[0021] An assistance device, an assistance method, and an assistance program according to an embodiment of the present invention will be described below with reference to the drawings. In the following description, the term "substrate" refers to a semiconductor substrate, a substrate for an FPD (Flat Panel Display) such as a liquid crystal display device or an organic EL (Electro Luminescence) display device, a substrate for an optical disk, a substrate for a magnetic disk, a substrate for a magneto-optical disk, a substrate for a photomask, a ceramic substrate, or a substrate for a solar cell. In the following description, a person who performs maintenance work on a substrate processing apparatus will be referred to as a maintenance worker.

[0022] 1. Overall configuration of substrate processing equipment management system First, the overall configuration of a substrate processing apparatus management system including an assisting device according to this embodiment will be described. FIG. 1 is a diagram illustrating the overall configuration of a substrate processing apparatus management system according to one embodiment of the present invention. As shown in FIG. 1, a substrate processing apparatus management system 2 is mainly composed of an information analyzing device 3 and an assisting device 4, and is used to manage one or more (three in the example of FIG. 1) substrate processing apparatuses 1. In the following description, when distinguishing between the three substrate processing apparatuses 1 shown in FIG. 1, the three substrate processing apparatuses 1 will be referred to as substrate processing apparatuses 1A, 1B, and 1C, respectively. In this embodiment, the substrate processing apparatuses 1A to 1C have the same configuration.

[0023] The support device 4 according to this embodiment is used to support a maintenance worker in performing maintenance work on each substrate processing apparatus 1. The support device 4 is connected to each of one or more substrate processing apparatuses 1 and information analyzing apparatuses 3 via a wired or wireless communication line or communication network. For example, the support device 4 is connected to each of one or more substrate processing apparatuses 1 and information analyzing apparatuses 3 via a communication network such as the Internet. In this embodiment, the support device 4 is connected to one or more substrate processing apparatuses 1 and information analyzing apparatuses 3 via a wired or wireless LAN.

[0024] 2. An example of the configuration of the substrate processing apparatus 1A 1, substrate processing apparatus 1A is a batch-type substrate cleaning apparatus, and includes a control device 100, a processing tank 111, a substrate holder 112, an elevator 112a, a bubbler tube 115, a heater 117, and a heater driver 118. In addition to the above-mentioned components, substrate processing apparatus 1A is also provided with a display device, an audio output device, and an operation unit, all of which are not shown.

[0025] The substrate holder 112 is configured to be able to hold a plurality of substrates W. The processing tank 111 is configured to be able to accommodate a plurality of substrates W held by the substrate holder 112. A cleaning liquid for cleaning the substrates W is stored in the processing tank 111.

[0026] The lifting device 112a supports the substrate holding part 112 so that it can move up and down, and moves the substrate holding part 112 up and down under the control of the control device 100. In this way, the lifting device 112a can immerse the plurality of substrates W held by the substrate holding part 112 in the cleaning liquid stored in the processing bath 111, and can lift the plurality of substrates W immersed in the cleaning liquid from the processing bath 111. The plurality of substrates W are cleaned by being immersed in the cleaning liquid. The lifting device 112a is also provided with a motor (not shown) as a power source for moving the substrate holding part 112 up and down.

[0027] A chemical liquid pipe 113 and a pure water pipe 114 are connected to the processing tank 111. A chemical liquid valve 113a and a flow meter 124 are provided on the chemical liquid pipe 113. The chemical liquid valve 113a is a control valve whose opening can be adjusted under the control of the control device 100.

[0028] When a chemical valve 113a is opened, the chemical pipe 113 guides the chemical supplied from a chemical supply system (not shown) to the processing tank 111. The flow rate (amount supplied per unit time) of the chemical supplied to the processing tank 111 through the chemical pipe 113 varies depending on the opening of the chemical valve 113a. The chemical may be buffered hydrofluoric acid (BHF), diluted hydrofluoric acid (DHF), hydrofluoric acid, hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, acetic acid, oxalic acid, or ammonia. The flow meter 124 detects the flow rate of the chemical in the portion of the chemical pipe 113 downstream of the chemical valve 113a and provides the detection result to the control device 100.

[0029] The pure water pipe 114 is provided with a pure water valve 114a and a flow meter 125. The pure water valve 114a is a control valve whose opening can be adjusted under the control of the control device 100.

[0030] When a pure water valve 114a is opened, the pure water pipe 114 guides pure water supplied from a pure water supply system (not shown) to the processing tank 111. The flow rate (amount supplied per unit time) of pure water supplied to the processing tank 111 through the pure water pipe 114 varies depending on the opening of the pure water valve 114a. A flow meter 125 detects the flow rate of pure water in a portion of the pure water pipe 114 downstream of the pure water valve 114a and provides the detection result to the control device 100.

[0031] A bubbler tube 115 is fixed by a bubbler fixture (not shown) near the bottom end of the processing tank 111. A gas pipe 116 is connected to the bubbler tube 115. The gas pipe 116 is provided with a gas valve 116a, a flow meter 126, and a pressure gauge 127. The gas valve 116a is a control valve whose opening can be adjusted under the control of the control device 100.

[0032] When gas valve 116a is opened, gas pipe 116 guides nitrogen gas supplied from a gas supply system (not shown) to bubbler pipe 115 in processing tank 111. The flow rate (amount supplied per unit time) of nitrogen gas supplied to bubbler pipe 115 through gas pipe 116 changes depending on the opening of gas valve 116a.

[0033] The flow meter 126 detects the flow rate of nitrogen gas in the portion of the gas pipe 116 downstream of the gas valve 116a, and provides the detection result to the control device 100. In this case, the control device 100 adjusts the opening of the gas valve 116a based on the flow rate provided by the flow meter 126 so that nitrogen gas is supplied to the bubbler tube 115 at a predetermined flow rate. In addition, the pressure meter 127 detects the internal pressure in the portion of the gas pipe 116 downstream of the gas valve 116a, and provides the detection result to the control device 100.

[0034] By adjusting the openings of chemical solution valve 113a and pure water valve 114a, the chemical solution and pure water are supplied into processing tank 111 at a predetermined ratio. In this state, gas valve 116a is also opened. As a result, nitrogen gas is supplied to bubbler tube 115, and a large amount of bubbles is generated from bubbler tube 115. As the generated bubbles rise within processing tank 111, the chemical solution and pure water supplied into processing tank 111 are mixed, and a cleaning liquid is generated. Note that, instead of nitrogen gas, another inert gas such as argon gas may be supplied to bubbler tube 115.

[0035] A heater 117 is further provided near the lower end of the processing tank 111. A heater driving unit 118 drives the heater 117 by supplying power to the heater 117. The amount of power supplied from the heater driving unit 118 to the heater 117 is controlled by the control device 100.

[0036] A drain pipe is connected to the bottom of the processing tank 111. A valve (not shown) is provided in the drain pipe. When the valve provided in the drain pipe is opened, the cleaning liquid inside the processing tank 111 is discharged to the outside of the substrate processing apparatus 1A.

[0037] The treatment tank 111 is further provided with a liquid level meter 121, a concentration meter 122, and a thermometer 123 as a plurality of detectors for detecting the state of the cleaning liquid stored in the treatment tank 111.

[0038] The liquid level meter 121 detects the liquid level (liquid level) of the cleaning liquid stored in the treatment tank 111 and provides the detection result to the control device 100. The concentration meter 122 detects the concentration (chemical liquid concentration) of the cleaning liquid stored in the treatment tank 111 and provides the detection result to the control device 100. The thermometer 123 detects the temperature of the cleaning liquid stored in the treatment tank 111 and provides the detection result to the control device 100.

[0039] The control device 100 includes, for example, a CPU (Central Processing Unit) and a memory, and controls the operation of the lifting device 112a, the operation of the heater driving unit 118, and the openings of the chemical valve 113a, the pure water valve 114a, and the gas valve 116a. The memory of the control device 100 stores a substrate processing program for executing a cleaning process for a substrate W by the substrate processing apparatus 1A.

[0040] Furthermore, the control device 100 adjusts the openings of the chemical valve 113a, the pure water valve 114a, the gas valve 116a, and the valve of a drain pipe (not shown) based on the detection results of the flow meters 124, 125, and 126, the detection result of the liquid level meter 121, and the detection result of the concentration meter 122. As a result, the liquid level of the cleaning liquid is maintained at a predetermined height while the cleaning liquid having a predetermined chemical concentration is stored in the processing tank 111. Furthermore, the control device 100 controls the heater driving unit 118 based on the temperature given by the thermometer 123 so that the temperature of the cleaning liquid stored in the processing tank 111 is maintained at a predetermined temperature.

[0041] Furthermore, the control device 100 has an emergency stop function that stops the operation of the substrate processing device 1A when a person enters a specified space inside the substrate processing device 1A or when a specified detector (e.g., concentration meter 122) installed inside the substrate processing device 1A is not functioning.

[0042] 3. Processing Information Each substrate processing apparatus 1 is provided with a plurality of pieces of processing information indicating operations or states related to the processing of substrates W, as information for detecting abnormalities in the substrate processing apparatus 1. As indicated by thick solid arrows in Fig. 1, these pieces of processing information are transmitted from the control device 100 of each substrate processing apparatus 1 to the information analysis device 3 of the substrate processing apparatus management system 2 at predetermined intervals.

[0043] As shown in the speech bubble in Figure 1, the processing information transmitted from the substrate processing apparatus 1 to the information analysis apparatus 3 includes "a. liquid level," "b. chemical valve opening degree," "c. chemical valve opening / closing signal," "d. chemical concentration," "e. cleaning liquid temperature," "f. chemical flow rate," "g. nitrogen gas flow rate," and "h. nitrogen gas pressure."

[0044] "a. Liquid level" indicates the liquid level of the cleaning liquid in the processing tank 111 detected by the liquid level gauge 121. "b. Chemical valve opening" indicates the opening of the chemical valve 113a provided in the chemical pipe 113. "c. Chemical valve opening / closing signal" is a signal given from the control device 100 to the chemical valve 113a to instruct the chemical valve 113a to open or close.

[0045] "d. Chemical concentration" indicates the chemical concentration of the cleaning liquid in the treatment tank 111 detected by the concentration meter 122. "e. Cleaning liquid temperature" indicates the temperature of the cleaning liquid in the treatment tank 111 detected by the thermometer 123. "f. Chemical flow rate" indicates the flow rate of the chemical liquid flowing through the chemical pipe 113 detected by the flow meter 124.

[0046] "g. Nitrogen gas flow rate" indicates the flow rate of nitrogen gas flowing through the gas pipe 116 detected by the flow meter 126. "h. Nitrogen gas pressure" indicates the pressure of nitrogen gas in the gas pipe 116 detected by the pressure meter 127.

[0047] 4. Abnormality detection of substrate processing apparatus 1 by information analysis device 3 1 is, for example, a server, and includes a CPU and a memory. The information analyzing device 3 collects a plurality of pieces of processing information transmitted from each substrate processing apparatus 1. In the information analyzing device 3, a plurality of combinations of two different pieces of processing information are predetermined for the plurality of pieces of processing information transmitted from each substrate processing apparatus 1 to the information analyzing device 3. A predetermined invariant relationship (hereinafter referred to as an invariant relationship) is maintained between the two pieces of processing information constituting each combination.

[0048] Here, it is assumed that inappropriate substrate processing is being performed as a result of substrate processing being performed while an abnormality has occurred in the substrate processing apparatus 1. In this case, the relationship between two pieces of processing information constituting at least one combination among the plurality of combinations deviates from the invariant relationship.

[0049] Therefore, the information analyzing device 3 calculates, as a plurality of deviation degrees, the degree of deviation between the relationships between a plurality of combinations of a plurality of pieces of processing information that have actually been collected and a plurality of predetermined invariant relationships for the plurality of pieces of processing information. Furthermore, the information analyzing device 3 calculates, based on the calculated plurality of deviation degrees, the degree of abnormality of the substrate processing apparatus 1 as an abnormality score. A specific example of a method for calculating the abnormality score will be described later.

[0050] 1, the information analyzing device 3 transmits the abnormality score calculated for each substrate processing apparatus 1 to the substrate processing apparatus 1. The abnormality score is transmitted each time an abnormality score is calculated by the information analyzing device 3. At this time, the abnormality score transmitted from the information analyzing device 3 is stored in each substrate processing apparatus 1.

[0051] Furthermore, the information analyzing device 3 determines whether the abnormality score for each substrate processing apparatus 1 exceeds a predetermined abnormality determination threshold. If the abnormality score exceeds the abnormality determination threshold, the information analyzing device 3 transmits an alarm to the substrate processing apparatus 1 corresponding to the abnormality score, as indicated by the wavy dotted arrow in Fig. 1. In the example of Fig. 1, the information analyzing device 3 transmits an alarm only to the substrate processing apparatus 1C among the substrate processing apparatuses 1A to 1C. At this time, an alarm is output in the substrate processing apparatus 1C that receives the alarm.

[0052] In this embodiment, the anomaly score (degree of anomaly) is lower the less attention is required from a maintenance worker, and higher the more attention is required from a maintenance worker.

[0053] A state in which the abnormality score is low is a state in which all of the plurality of processing conditions fall within a range predicted to be normal from the invariant relationships corresponding to the plurality of combinations described above.

[0054] On the other hand, a state with a high anomaly score includes, for example, a state in which the actual change over time in "d. Chemical concentration" is significantly larger than the change over time predicted based on the change over time in "f. Chemical flow rate." Continuing this state may cause, for example, poor processing of substrates W, generation of harmful gases, and damage to components of the substrate processing apparatus 1 due to an inability to adjust the chemical concentration of the cleaning liquid.

[0055] Furthermore, a state in which the abnormality score is high includes, for example, a state in which the actual value of "a. liquid level" is significantly different from the temporal change predicted based on the temporal change of "g. nitrogen gas flow rate." Continuing this state may cause, for example, poor processing of the substrate W due to an inability to ensure that the substrate W is immersed in the cleaning liquid, generation of harmful gases, and damage to components of the substrate processing apparatus 1.

[0056] 5. Specific example of how to calculate anomaly scores As described above, the information analysis device 3 defines multiple combinations of two different pieces of processing information. To calculate the anomaly score, a deviation is calculated for each combination. FIG. 2 is a diagram for explaining a specific example of how the deviation is calculated. Here, an example of how the deviation corresponding to the combination of "b. Liquid chemical valve opening" and "f. Liquid chemical flow rate" in FIG. 1 is calculated will be described. In the following explanation, the data for "b. Liquid chemical valve opening" will be referred to as "b" data as appropriate, and the data for "f. Liquid chemical flow rate" will be referred to as "f" data as appropriate.

[0057] To calculate the deviation, information indicating the invariant relationship between "b. Chemical valve opening" and "f. Chemical flow rate" is required. In the following description, information indicating the invariant relationship between two pieces of processing information is referred to as invariant information. It is preferable that the invariant information be created by, for example, machine learning.

[0058] It is assumed that machine learning is performed to obtain invariant information between "b. Chemical valve opening" and "f. Chemical flow rate." In this case, before each substrate W is actually processed in the substrate processing apparatus 1, the information analysis apparatus 3 is provided with "b" data and "f" data obtained when the substrate processing apparatus 1 is operating ideally (normally) according to the recipe.

[0059] The upper part of Figure 2 shows graphs illustrating an example of changes over time in normal "b" data and normal "f" data. In the graph of "b" data, the horizontal axis represents time, and the vertical axis represents the opening of chemical valve 113a in Figure 1. In the graph of "f" data, the horizontal axis represents time, and the vertical axis represents the flow rate of chemical in the portion of chemical piping 113 in Figure 1 downstream of chemical valve 113a. The horizontal axis (time axis) is the same for the graph of "b" data and the graph of "f" data.

[0060] The two graphs at the top of FIG. 2 show that as the opening of the chemical valve 113a increases, the flow rate of the chemical liquid flowing through the chemical liquid pipe 113 also increases at a substantially constant rate. In this case, the relationship between the normal "b" data and the normal "f" data represents an invariant relationship. Thus, when the substrate processing apparatus 1 operates normally, the relationship between the data in each combination of multiple pieces of processing information is equal to the invariant relationship. Therefore, multiple pieces of normal processing information are input in advance to the information analyzing apparatus 3. As a result, the invariant relationship for each combination of multiple pieces of processing information is modeled by machine learning, and invariant information is generated. As a result, the invariant relationship compatible with each substrate processing apparatus 1 is stored in the information analyzing apparatus 3.

[0061] In addition, without being limited to the above example, the invariant information may be generated, for example, by a simulation assuming that the substrate processing apparatus 1 is operating normally, or may be determined by an administrator who manages each substrate processing apparatus 1.

[0062] With the invariant information stored in the information analysis device 3, substrates W are processed in each substrate processing apparatus 1, and actual "b" data and "f" data are collected by the information analysis device 3. An example of the time-dependent changes in the actually collected "b" data and "f" data is shown in the graph in the middle part of Fig. 2.

[0063] When actual "b" data is collected, "f" data is predicted based on the pre-stored invariant information. Also, when actual "f" data is collected, "b" data is predicted based on the pre-stored invariant information. The bottom graph of Figure 2 shows an example of the temporal changes in "b" data and "f" data predicted based on the invariant information. In the bottom graph of Figure 2, the predicted "b" data and "f" data are shown by solid lines, and the actually collected "b" data and "f" data are shown by dotted lines.

[0064] When the substrate processing apparatus 1 is operating normally, the actual "b" data and the predicted "b" data will match or nearly match. Also, the actual "f" data and the predicted "f" data will match or nearly match. However, when an abnormality occurs in the substrate processing apparatus 1, there is a high possibility that the actual "b" data will deviate from the predicted "b" data. Also, there is a high possibility that the actual "f" data will deviate from the predicted "f" data. It is considered that the degree of this deviation is greater as the degree of abnormality occurring in the substrate processing apparatus 1 is greater, and is smaller as the degree of abnormality occurring in the substrate processing apparatus 1 is smaller.

[0065] Therefore, in this embodiment, the difference value between the actually collected processing information data and the predicted processing information data is calculated as the deviation. In the example of Fig. 2, when calculating the deviation at a certain point in time, the information analysis device 3 calculates the difference value between the actual "b" data and the predicted "b" data as the deviation. In addition, the score calculation unit 32 calculates the difference value between the actual "f" data and the predicted "f" data as the deviation.

[0066] In the following explanation, the processing information "a. liquid level," "b. chemical valve opening degree," "c. chemical valve opening / closing signal," "d. chemical concentration," "e. cleaning liquid temperature," "f. chemical flow rate," "g. nitrogen gas flow rate," and "h. nitrogen gas pressure" will be referred to as processing information "a," "b," "c," "d," "e," "f," "g," and "h," respectively.

[0067] FIG. 3 is a diagram for explaining a specific example of calculating an anomaly score. The information analysis device 3 calculates the above-mentioned deviation degree for all combinations of multiple pieces of processing information. The multiple values ​​arranged in the rows to the right of each piece of processing information "a" to "h" in the left vertical column of FIG. 3 represent the deviation degree between the processing information predicted from each piece of processing information "a" to "h" in the upper horizontal column and the processing information actually acquired. vinegar.

[0068] For example, the value "52" in the column at the intersection of the row to the right of processing information "a" in the left vertical column and the column below processing information "g" in the upper horizontal column represents the degree of discrepancy between processing information "a" predicted from processing information "g" and the actually acquired processing information "a." Also, the value "50" in the column at the intersection of the column below processing information "a" in the upper horizontal column and the row to the right of processing information "g" in the left horizontal column represents the degree of discrepancy between processing information "g" predicted from processing information "a" and the actually acquired processing information "g."

[0069] 3 shows multiple deviation degrees calculated for all combinations of multiple pieces of processing information. After all deviation degrees have been calculated, the information analysis device 3 calculates the sum of the calculated deviation degrees as the anomaly score. In the example of FIG. 3, the anomaly score is 102.

[0070] 6. Support for maintenance work of the substrate processing apparatus 1 by the support device 4 1 is, for example, a personal computer, and includes a CPU and a memory. The support device 4 also includes a display unit 4a and an operation unit 4b. A plurality of maintenance workers, each in charge of a plurality of substrate processing apparatuses 1, can understand the degree of abnormality in the substrate processing apparatus 1 for which they are responsible by checking the abnormality scores transmitted from the information analysis device 3. Furthermore, each maintenance worker can understand that a serious abnormality has occurred in the substrate processing apparatus 1 for which they are responsible, when the substrate processing apparatus 1 for which they are responsible receives an alarm from the information analysis device 3.

[0071] However, even if each maintenance worker can grasp the degree of abnormality in the substrate processing apparatus 1, there are cases where they are unable to identify the cause of the abnormality in the substrate processing apparatus 1. Alternatively, even if an inexperienced maintenance worker can identify the cause of the abnormality, there are cases where they are unable to recognize the appropriate work content to resolve the abnormality. In these cases, each maintenance worker takes a long time to perform maintenance work on the substrate processing apparatus.

[0072] Therefore, the information analyzing device 3 according to this embodiment transmits each of the multiple deviation degrees calculated for each substrate processing apparatus 1 to the support device 4 along with a combination of two pieces of processing information corresponding to the deviation degrees, as indicated by the thick dotted arrows in Fig. 1. Furthermore, the support device 4 generates support information for each substrate processing apparatus 1 to support maintenance work for the substrate processing apparatus 1 based on the multiple deviation degrees received from the information analyzing device 3, data-related component information (described later), and aged component information (described later). Furthermore, the support device 4 provides the generated support information to the substrate processing apparatus 1 corresponding to the support information, as indicated by the thick dashed-dotted arrows in Fig. 1. Specific examples of support information and a method for generating the support information will be described below.

[0073] In order to generate the above-mentioned support information, data-related component information and aging component information are stored in advance in the memory of the support device 4. The data-related component information is information indicating each of the plurality of pieces of processing information collected by the information analysis device 3 and one or more components associated with the processing information. The data-related component information is determined in advance, for example, before substrate processing in one of the substrate processing apparatuses 1 by a maintenance worker of the substrate processing apparatus 1 or a manager who manages the substrate processing apparatus 1. Specifically, the data-related component information is generated and updated by the maintenance worker or manager operating the operation unit of the substrate processing apparatus 1 or the operation unit 4b of the support device 4.

[0074] Fig. 4 is a diagram showing an example of data-related part information. According to the data-related part information in Fig. 4, the liquid level gauge 121, the chemical liquid valve 113a, and the bubbler fixture are shown as parts related to processing information "a." The chemical liquid valve 113a and the chemical liquid piping 113 are shown as parts related to processing information "b." The chemical liquid valve 113a is shown as a part related to processing information "c."

[0075] Furthermore, the chemical liquid pipe 113 and the concentration meter 122 are shown as parts related to the processing information "d." The chemical liquid pipe 113, the heater 117, and the thermometer 123 are shown as parts related to the processing information "e." The chemical liquid pipe 113 is shown as a part related to the processing information "f."

[0076] Furthermore, the bubbler tube 115, the bubbler fixture, the gas flow meter 126, and the gas piping 116 are shown as parts related to the process information "g." The bubbler tube 115, the bubbler fixture, and the gas piping 116 are shown as parts related to the process information "h."

[0077] The aging part information is information about the deterioration state that changes over time for each of a plurality of parts related to at least some of the plurality of processing information in the data-related part information. In the support device 4, the aging part information is updated to the latest state at a predetermined period.

[0078] Fig. 5 is a diagram showing an example of aging part information. The aging part information in Fig. 5 includes, for each of the multiple parts listed in the data-related part information in Fig. 4, "related processing information," "elapsed time," "expected years," "number of failures," and "number of operations" as information related to the deterioration state of the part.

[0079] "Related processing information" indicates processing information related to each component, and the relationship between a component and its associated processing information is the same as the relationship between each piece of processing information and the component shown in the data-related component information in Figure 4. "Elapsed time" is information indicating the time elapsed since each component was installed in the substrate processing apparatus 1. "Expected years" is information indicating the expected lifespan of each component. "Number of faults" is information indicating, for each of multiple components, the number of faults that have occurred in components of the same type (same model) as the component from the time the component began to be used until the present time. "Number in operation" is information indicating, for each of multiple components, the number of all components of the same type (same model) as the component that are currently in operation.

[0080] A specific example of generating support information will be described. Here, in the support device 4 according to this embodiment, one or more deviation thresholds, which are either common or individually determined, are stored for the multiple deviation degrees provided from the information analysis device 3. Each deviation threshold is determined so as to make it possible to determine whether or not an abnormality of a predetermined degree has occurred in a part related to two pieces of processing information used to calculate the corresponding deviation degree.

[0081] The support device 4 determines whether or not each of the multiple deviation degrees provided by the information analysis device 3 exceeds a corresponding deviation degree threshold. If there is a deviation degree that exceeds the deviation degree threshold, the support device 4 determines, as a maintenance target component, a component that is commonly related to the two pieces of processing information, based on the combination of the two pieces of processing information used to calculate the deviation degree and the data-related component information.

[0082] For example, assume that the common deviation threshold for the multiple deviations in FIG. 3 is set to "40." In this case, the deviation "52" between the processing information "a" predicted from the processing information "g" and the actually acquired processing information "a" exceeds the deviation threshold "40." Furthermore, the deviation "50" between the processing information "g" predicted from the processing information "a" and the actually acquired processing information "g" also exceeds the deviation threshold "40." Meanwhile, all other deviations are "0," so they do not exceed the deviation threshold "40." Therefore, in the example of multiple deviations in FIG. 3, the component "bubbler fixture" related to the processing information "a" and the processing information "g" is determined as a maintenance target component based on the data-related component information in FIG. 4.

[0083] Next, the support device 4 calculates the degree of necessity of maintenance work for each of the one or more determined maintenance target parts as a maintenance necessity value. The maintenance necessity value is calculated based on the aging part information of the maintenance target parts, for example, by using the following formula (1).

[0084] Required maintenance value = ((elapsed time / expected years) + (number of failures / number of operating units)) x weight (1) The "weight" in the above formula (1) is determined for each maintenance target component according to the type of abnormality expected to occur due to damage or loss of the maintenance target component. The types of abnormality include "chemical leakage," "substrate damage," and "delay in processing time." In this case, "chemical leakage" is likely to have an adverse effect on the human body of a maintenance worker or the like of the substrate processing apparatus 1. Therefore, a high weight (e.g., "3") is assigned to a maintenance target component that may cause "chemical leakage" due to damage or loss. On the other hand, "substrate damage" is unlikely to have an adverse effect on the human body of a maintenance worker or the like of the substrate processing apparatus 1. Therefore, a medium weight (e.g., "2") is assigned to a maintenance target component that may cause "substrate damage" due to damage or loss. On the other hand, "delay in processing time" does not have an adverse effect on the human body of a maintenance worker or the like of the substrate processing apparatus 1, and is unlikely to cause damage to the substrate processing apparatus 1 and the substrate. Therefore, a low weight (e.g., "1") is assigned to a maintenance target component that may cause "delay in processing time" due to damage or loss.

[0085] Thereafter, the support device 4 generates support information including instructions for maintenance work corresponding to each of one or more maintenance target parts based on the calculated maintenance requirement value, and transmits the support information to the substrate processing apparatus 1.

[0086] Specifically, the support device 4 determines to which of a plurality of predetermined levels (for example, three levels: high, medium, and low) the calculated maintenance necessity value for each of one or more maintenance target parts belongs. Such level classification can be performed by, for example, setting a plurality of different reference values ​​for the maintenance necessity value.

[0087] When the part to be maintained is the "liquid level meter 121" and the level of the maintenance requirement value is "large," the support device 4 generates support information including, for example, "maintenance work instructions to replace the liquid level meter 121." Furthermore, in this case, the support device 4 may generate support information including, for example, "work information for presenting the replacement procedure for the liquid level meter 121 to the maintenance worker," and "report information for creating a report on the replacement of the liquid level meter 121."

[0088] Furthermore, when the part to be maintained is the "liquid level meter 121" and the level of the maintenance requirement value is "medium," the support device 4 generates support information including, for example, "maintenance work instructions to perform a detailed operation check of the liquid level meter 121." Furthermore, in this case, the support device 4 may generate support information including, for example, "work information for presenting the maintenance worker with a detailed operation check procedure for the liquid level meter 121," and "report information for creating a report on the operation check of the liquid level meter 121."

[0089] Furthermore, when the part to be maintained is the "liquid level meter 121" and the level of the maintenance requirement value is "small," the support device 4 generates support information including, for example, "maintenance work instructions to perform a simple operation check of the liquid level meter 121." Furthermore, in this case, the support device 4 may generate support information including, for example, "work information for presenting a simple operation check procedure for the liquid level meter 121 to the maintenance worker."

[0090] The support information as described above is transmitted from the support device 4 to each substrate processing apparatus 1. In this case, the support information is presented to the maintenance worker by a display device or a voice output device in each substrate processing apparatus 1. This allows the maintenance worker of the substrate processing apparatus 1 to easily and quickly grasp what kind of maintenance work should be performed on which component in the substrate processing apparatus 1 based on the received support information.

[0091] 7. Example of Functional Configuration and Operation of Substrate Processing Apparatus Management System 2 Fig. 6 is a block diagram for explaining the functional configuration of the information analyzing device 3 and the support device 4. Fig. 7 is a flowchart showing an example of processing executed by the control device 100 of Fig. 6 regarding abnormality determination of the substrate processing apparatus 1. Fig. 8 is a flowchart showing an example of processing executed by the information analyzing device 3 to determine abnormality of the substrate processing apparatus 1 of Fig. 6. Figs. 9 and 10 are flowcharts showing an example of processing executed by the support device 4 to support maintenance work of the substrate processing apparatus 1 of Fig. 6.

[0092] In the following description, it is assumed that the substrate processing apparatus management system 2 manages only one substrate processing apparatus 1. Therefore, the series of processes shown in Fig. 8 to Fig. 10 are executed for only one substrate processing apparatus 1 shown in Fig. 6.

[0093] As described with reference to Fig. 1, the substrate processing apparatus 1 includes the control device 100. As shown in Fig. 7, the control device 100 transmits a plurality of pieces of processing information generated in the substrate processing apparatus 1 during processing of the substrate W to the information analysis device 3 at predetermined intervals (step S10). At this time, the control device 100 may store the plurality of pieces of processing information in association with their transmission times.

[0094] Next, the control device 100 determines whether or not an abnormality score has been received from the information analysis device 3 (step S11). If an abnormality score has not been received, the control device 100 repeats the determination of step S11. If an abnormality score has been received, the control device 100 stores the received abnormality score in association with its reception time (step S12).

[0095] The control device 100 also determines whether or not an alarm has been received from the information analysis device 3 (step S13). If an alarm has not been received, the control device 100 proceeds to step S15, which will be described later. If an alarm has been received, the control device 100 outputs the alarm in the form of video or sound from a display device or audio output device of the substrate processing apparatus 1 (step S14).

[0096] Furthermore, the control device 100 determines whether or not support information has been received from the support device 4 (step S15). If support information has not been received, the control device 100 returns the process to step S10. If support information has been received, the control device 100 presents instructions for maintenance work corresponding to the maintenance target component to the maintenance worker on the display device or audio output device based on the received support information (step S16). Thereafter, the control device 100 returns the process to step S10.

[0097] 6, the information analysis device 3 includes an information collection unit 31, a score calculation unit 32, a score transmission unit 33, and an alarm transmission unit 34. An abnormality determination program for determining an abnormality in the substrate processing apparatus 1 is stored in the memory of the information analysis device 3. The CPU of the information analysis device 3 executes the abnormality determination program, thereby realizing the functions of the components (31 to 34) of the information analysis device 3. Some or all of the components (31 to 34) of the information analysis device 3 in FIG. 6 may be realized by hardware such as an electronic circuit.

[0098] 8, the information collecting unit 31 first collects a plurality of pieces of processing information transmitted from the substrate processing apparatus 1 (step S20). Next, the score calculating unit 32 calculates a plurality of deviation degrees from the collected plurality of pieces of processing information (step S21) and transmits the calculated plurality of deviation degrees to the support apparatus 4 (step S22). At this time, the score calculating unit 32 stores the plurality of deviation degrees calculated in step S22 in the memory of the information analyzing apparatus 3.

[0099] Next, the score calculation unit 32 calculates an abnormality score for the substrate processing apparatus 1 based on the multiple deviation degrees stored in the memory of the information analysis device 3 (step S23), and transmits the calculated abnormality score to the substrate processing apparatus 1 (step S24).

[0100] The memory of the information analyzing device 3 stores the above-mentioned abnormality determination threshold value that is preset according to the substrate processing apparatus 1. Then, the alarm transmitting unit 34 determines whether or not the abnormality score calculated in step S23 exceeds the abnormality determination threshold value (step S25). If the abnormality score does not exceed the abnormality determination threshold value, the alarm transmitting unit 34 returns the process to step S21. On the other hand, if the abnormality score exceeds the abnormality determination threshold value, the alarm transmitting unit 34 transmits an alarm to the substrate processing apparatus 1 (step S26), and returns the process to step S20.

[0101] 6, the support device 4 includes a deviation degree acquisition unit 41, a target determination unit 42, a required value calculation unit 43, a level determination unit 44, an instruction generation unit 45, a first storage unit 46, a second storage unit 47, a third storage unit 48, and an information update unit 49. A maintenance support program for supporting maintenance work of the substrate processing apparatus 1 is stored in the memory of the support device 4. The CPU of the support device 4 executes the maintenance support program, thereby realizing the functions of the components (41 to 49) of the support device 4. Some or all of the components (41 to 49) of the support device 4 in FIG. 6 may be realized by hardware such as electronic circuits.

[0102] The first storage unit 46 stores data-related component information (FIG. 4) corresponding to the substrate processing apparatus 1 before substrate processing is started by the substrate processing apparatus 1 of Fig. 6. The second storage unit 47 stores aged component information (FIG. 5) corresponding to the substrate processing apparatus 1 before substrate processing is started by the substrate processing apparatus 1 of Fig. 6. The third storage unit 48 stores a plurality of maintenance work instructions corresponding to a plurality of levels of the maintenance requirement value for each of a plurality of components of the substrate processing apparatus 1 before substrate processing is started by the substrate processing apparatus 1 of Fig. 6.

[0103] As described above, the data-related component information is determined by a maintenance worker, a manager, or the like. Furthermore, the time-varying component information changes over time. Therefore, as shown in FIGS. 9 and 10, the information update unit 49 determines whether or not there has been a change to the data-related component information stored in the first storage unit 46 (step S30). This determination is made based on whether or not a change to the data-related component information has been instructed by a maintenance worker, a manager, or the like.

[0104] If there is no change in the data-related component information, the information update unit 49 proceeds to step S32, which will be described later. On the other hand, if there is a change in the data-related component information, the information update unit 49 updates the data-related component information stored in the first storage unit 46 with the new data-related component information after the change (step S31).

[0105] Next, the information update unit 49 updates the aged part information stored in the second storage unit 47 (step S32). This update process includes updating the elapsed time, the number of faults, and the number of operating parts from the current time point.

[0106] Next, the deviation degree acquiring unit 41 determines whether or not it has received multiple deviation degrees from the information analyzing device 3 for the substrate processing apparatus 1 of FIG. 6 (step S33). One or more deviation degree thresholds preset according to the substrate processing apparatus 1 are stored in the memory of the support apparatus 4. In this example, it is assumed that the one or more deviation degree thresholds are common values. If the deviation degree acquiring unit 41 does not receive multiple deviation degrees in step S33, it returns the process to step S30. On the other hand, if the deviation degree acquiring unit 41 receives multiple deviation degrees in step S33, it determines whether each of the deviation degrees exceeds a predetermined deviation degree threshold, and extracts the deviation degrees that exceed the deviation degree threshold (step S34).

[0107] Next, the target determination unit 42 determines components to be maintained based on the extracted deviations and the data-related component information stored in the first storage unit 46 (step S35). Specifically, for each of one or more deviations extracted in step S34, the target determination unit 42 determines components that are commonly related to the two pieces of processing information used to calculate the deviations as components to be maintained.

[0108] Next, the required value calculation unit 43 calculates the required maintenance value of the maintenance target parts based on the determined maintenance target parts and the aging part information stored in the second storage unit 47 (step S36). Specifically, the required value calculation unit 43 calculates the required maintenance value for each of the one or more maintenance target parts determined in step S35 using the aging part information of the maintenance target part and a predetermined calculation formula (for example, the above formula (1) or the like).

[0109] Next, the instruction generating unit 45 generates support information corresponding to the maintenance target components based on the maintenance requirement values ​​calculated in the process of step S36 (step S37). Specifically, first, the level determining unit 44 of FIG. 6 determines to which of a plurality of predetermined levels the calculated maintenance requirement values ​​for each of one or more maintenance target components belong. Thereafter, the instruction generating unit 45 extracts, for each of one or more maintenance target components, maintenance work instruction contents corresponding to the level of the maintenance requirement values ​​from the plurality of maintenance work instruction contents stored in the third storage unit 48, and generates support information. Finally, the instruction generating unit 45 transmits the generated support information to the substrate processing apparatus 1 of FIG. 6 (step S38), and the process returns to step S30.

[0110] In the above example, the series of processes shown in Fig. 8 is executed for only one substrate processing apparatus 1 in Fig. 6. In contrast, when the substrate processing apparatus management system 2 manages a plurality of substrate processing apparatuses 1, the series of processes shown in Fig. 8 is executed for, for example, the plurality of substrate processing apparatuses 1 sequentially or in parallel.

[0111] 9 and 10 is executed only for one substrate processing apparatus 1 in Fig. 6. In contrast, when the substrate processing apparatus management system 2 manages a plurality of substrate processing apparatuses 1, the series of processes shown in Fig. 9 and 10 is executed sequentially or in parallel for the plurality of substrate processing apparatuses 1, for example.

[0112] 8. Effects of the embodiment In the information analysis device 3, for each of one or more substrate processing apparatuses 1, the degree of abnormality of the substrate processing apparatus 1 is calculated as an abnormality score based on the invariant relationships between the plurality of pieces of processing information and the plurality of pieces of processing information that are actually collected. If the abnormality score exceeds an abnormality determination threshold, an alarm is sent to the substrate processing apparatus 1. When calculating the abnormality score, for each of a plurality of combinations of two predetermined different pieces of processing information, the degree of deviation between one piece of processing information predicted based on the invariant information and the processing information that is actually collected is calculated.

[0113] The support device 4 appropriately determines one or more maintenance target parts from among the multiple parts constituting the substrate processing apparatus 1 based on the multiple deviation degrees calculated by the information analysis device 3 and the data-related part information.

[0114] Furthermore, for each of the determined one or more maintenance target parts, a maintenance requirement value is calculated based on the aging part information, and support information is generated according to the level of the calculated maintenance requirement value. This allows maintenance workers of the substrate processing apparatus 1 to easily identify the maintenance target parts based on the generated support information, regardless of their level of skill. Furthermore, maintenance workers can perform appropriate maintenance work on the substrate processing apparatus 1 in a short amount of time.

[0115] 9. Other Embodiments (1) In the above embodiment, the substrate processing apparatuses 1A-1C in FIG. 1 have the same configuration, but the present invention is not limited to this. Some or all of the substrate processing apparatuses 1A-1C may have different configurations. Furthermore, at least one of the substrate processing apparatuses 1A-1C in FIG. 1 may be a single-wafer substrate cleaning apparatus rather than a batch-type, or may be configured to perform a process other than cleaning. For example, the substrate processing apparatus 1 may be another substrate processing apparatus such as a coating apparatus, a developing apparatus, a heating apparatus, a cooling apparatus, or a transport apparatus.

[0116] (2) In the substrate processing apparatus management system 2 according to the above embodiment, the series of processes performed by the information analysis apparatus 3 may be performed by the support apparatus 4. Also, the series of processes performed by the information analysis apparatus 3 may be performed by any one of the one or more substrate processing apparatuses 1. In this case, the information analysis apparatus 3 is not necessary.

[0117] (3) In the substrate processing apparatus management system 2 according to the above embodiment, the abnormality score does not have to be transmitted from the information analyzing apparatus 3 to the substrate processing apparatus 1.

[0118] (4) In the substrate processing apparatus management system 2 according to the above embodiment, the degree of necessity for maintenance work on the maintenance target parts is classified into levels, and a maintenance requirement value is calculated to determine maintenance work instructions according to the level, but the present invention is not limited to this.

[0119] The maintenance requirement value may not be calculated, and in this case, support information including instructions for a plurality of possible maintenance works for the determined maintenance target parts may be generated.

[0120] Alternatively, the maintenance requirement value may be calculated based on other conditions instead of the above formula (1). For example, the maintenance requirement value may be the "elapsed time," the "number of failures," or a value obtained by dividing the "elapsed time" by the "expected number of years."

[0121] (5) In addition to or instead of the specific examples described in the above embodiments, the plurality of pieces of processing information may include at least one physical quantity among the temperature inside the processing chamber in which the substrate W is accommodated, the pressure inside the processing chamber in which the substrate W is accommodated, the pressure of the gas exhausted from the processing chamber in which the substrate W is accommodated, and the moving speed of the substrate transported by the robot. The plurality of pieces of processing information may also include information regarding at least one of a drive pulse signal for driving the robot that transports the substrate W and an output signal of a detector provided on the robot that transports the substrate W.

[0122] (6) In the above embodiment, the first storage unit 46 of the support device 4 stores data-related component information corresponding to each of one or more substrate processing apparatuses 1. The second storage unit 47 of the support device 4 stores aged component information corresponding to each of one or more substrate processing apparatuses 1. The third storage unit 48 of the support device 4 stores instructions for a plurality of maintenance operations.

[0123] However, the present invention is not limited to the above example. Some or all of the data-related component information, aged component information, and instructions for the multiple maintenance tasks may be stored in another server provided outside the support device 4. Alternatively, some or all of the data-related component information, aged component information, and instructions for the multiple maintenance tasks may be stored in one or more substrate processing apparatuses 1, or may be stored in the information analysis device 3. In this case, the target determination unit 42, the required value calculation unit 43, and the instruction generation unit 45 of the support device 4 each obtain information required to achieve the corresponding function from outside the support device 4.

[0124] (7) The support device 4 according to the above embodiment may have an instruction output device that outputs instructions for maintenance work based on the support information. In this case, the instruction output device may be, for example, a printer that prints the instructions for maintenance work on a paper medium, or a portable terminal that has a display unit that displays the instructions for maintenance work and is configured to be capable of wireless communication with the CPU of the support device 4. Alternatively, the instruction output device may be an audio output device that announces the instructions for maintenance work.

[0125] (8) When report information is generated as support information in the support device 4, the support device 4 may have a report output device that outputs reports on various maintenance tasks based on the support information. In this case, the report output device may be, for example, a printer that prints the report information on a paper medium, or a portable terminal that has a display unit that displays the report information and is configured to be able to wirelessly communicate with the CPU of the support device 4. Alternatively, the report output device may be an audio output device that announces the report information.

[0126] 10. Correspondence between each element of the claims and each part of the embodiment Below, examples of correspondence between each element of the claims and each element of the embodiments will be described, but the present invention is not limited to the following examples. Various other elements having the configuration or function described in the claims can also be used as each element of the claims.

[0127] In the above embodiment, the substrate processing apparatuses 1, 1A to 1C are examples of substrate processing apparatuses, the support apparatus 4 is an example of a support apparatus, the deviation degree acquisition unit 41 is an example of a deviation degree acquisition unit, the level determination unit 44 and the instruction generation unit 45 are examples of a support information generation unit, the target determination unit 42 is an example of a target determination unit, the required value calculation unit 43 is an example of a required value calculation unit, and the CPU and memory of the support apparatus 4 are examples of a computer. 11. Reference form (1) An assistance device according to one aspect of the present reference form is an assistance device that assists in maintenance work of a substrate processing apparatus, and includes: a deviation degree acquisition unit that acquires deviation degree information that indicates an invariant relationship between a plurality of processing information that indicates operations or states related to substrate processing of the substrate processing apparatus and a degree of deviation between a plurality of processing information predicted based on a plurality of processing information actually collected from the substrate processing apparatus and the plurality of processing information that is actually collected; and an assistance information generation unit that generates assistance information related to maintenance work of the substrate processing apparatus based on the deviation degree information. The support device generates support information based on the deviation information, thereby enabling a maintenance worker performing maintenance work on the substrate processing apparatus to perform appropriate maintenance work on the substrate processing apparatus in a short time based on the generated support information, regardless of the level of skill. (2) The substrate processing apparatus includes a plurality of components related to a plurality of processing information, and the support apparatus further includes a target determination unit that determines one or more components among the plurality of components that are to be subject to maintenance work based on the deviation information as one or more maintenance target components, and the support information may include information indicating the one or more maintenance target components determined by the target determination unit. In this case, the maintenance worker can quickly identify one or more parts that require maintenance based on the generated support information. (3) For the plurality of pieces of processing information, a plurality of combinations of two pieces of processing information different from each other are determined, each combination including first processing information and second processing information, for each combination, the first processing information predicted based on the second processing information actually collected from the substrate processing apparatus and the invariant relationship is generated as first predicted processing information, a degree of deviation between the generated first predicted processing information and the first processing information actually collected from the substrate processing apparatus is calculated as a first deviation degree, for each combination, the second processing information predicted based on the first processing information actually collected from the substrate processing apparatus and the invariant relationship is generated as second predicted processing information, and a degree of deviation between the generated second predicted processing information and the substrate processing apparatus is calculated as a first deviation degree. The degree of deviation from the second processing information actually collected from the target processing information is calculated as the second deviation degree, the deviation degree acquisition unit acquires the multiple first deviation degrees calculated for the multiple combinations and the multiple second deviation degrees calculated for the multiple combinations as deviation degree information, and the target determination unit extracts one or more combinations whose first deviation degree exceeds a predetermined first threshold value and one or more combinations whose second deviation degree exceeds a predetermined second threshold value from the multiple combinations, and for each of the extracted one or more combinations, determines one or more parts commonly related to the first processing information and the second processing information included in the combination as one or more maintenance target parts. In this case, the one or more maintenance target parts are appropriately determined based on the multiple processing information actually collected. (4) The support device may further include a required value calculation unit that acquires, for each of one or more maintenance target parts determined by the target determination unit, information regarding the state of the maintenance target part that changes over time as the maintenance target part changes over time, and calculates a required value indicating the degree of necessity of maintenance work for the maintenance target part based on the acquired aging part information, and the support information generation unit may determine, for each of one or more maintenance target parts determined by the target determination unit, to which of multiple predetermined required levels the required value calculated by the required value calculation unit belongs, and include information on the predetermined maintenance work for the maintenance target part in the support information according to the determined required level. In this case, the maintenance worker can quickly determine the appropriate maintenance work according to the state of each of one or more maintenance target components based on the generated support information. (5) Each substrate processing apparatus may be a substrate cleaning apparatus that cleans a substrate using a cleaning liquid, and the plurality of processing information may include at least one of a supply amount of the cleaning liquid supplied to the substrate, a temperature of the cleaning liquid supplied to the substrate, and a concentration of the cleaning liquid supplied to the substrate. In this case, support information corresponding to the substrate cleaning apparatus is generated. (6) A support method according to another aspect of the present reference form is a support method for supporting maintenance work of a substrate processing apparatus, and includes a step of acquiring deviation information indicating an invariant relationship between a plurality of processing information indicating operations or states related to substrate processing of the substrate processing apparatus and a degree of deviation between a plurality of processing information predicted based on a plurality of processing information actually collected from the substrate processing apparatus and the plurality of processing information actually collected, and a step of generating support information related to maintenance work of the substrate processing apparatus based on the deviation information. According to this support method, support information is generated based on the deviation information, thereby enabling a maintenance worker performing maintenance work on the substrate processing apparatus to perform appropriate maintenance work on the substrate processing apparatus in a short time based on the generated support information, regardless of the level of skill. (7) According to yet another aspect of the present embodiment, an assistance program causes a computer to execute assistance processing to assist in maintenance work of a substrate processing apparatus, the assistance processing including: acquiring deviation information indicating an invariant relationship between a plurality of pieces of processing information indicating operations or states related to substrate processing of the substrate processing apparatus and a degree of deviation between a plurality of pieces of processing information predicted based on a plurality of pieces of processing information actually collected from the substrate processing apparatus and the plurality of pieces of processing information actually collected; and generating assistance information related to maintenance work of the substrate processing apparatus based on the deviation information. According to the assistance program, assistance information is generated based on the deviation information, thereby enabling a maintenance worker performing maintenance work on the substrate processing apparatus to perform appropriate maintenance work on the substrate processing apparatus in a short time based on the generated assistance information, regardless of the level of skill. [Explanation of symbols]

[0128] 1, 1A to 1C... substrate processing apparatus, 2... substrate processing apparatus management system, 3... information analysis apparatus, 4... support apparatus, 4a... display unit, 4b... operation unit, 31... information collection unit, 32... score calculation unit, 33... score transmission unit, 34... alarm transmission unit, 41... deviation degree acquisition unit, 42... target determination unit, 43... required value calculation unit, 44... level determination unit, 45... instruction generation unit, 46... first memory unit, 47... second memory unit, 48... third memory unit, 49... information Update unit, 100...control device, 111...processing tank, 112...substrate holder, 112a...lifting device, 113...chemical liquid piping, 113a...chemical liquid valve, 114...pure water piping, 114a...pure water valve, 115...bubbler tube, 116...gas piping, 116a...gas valve, 117...heater, 118...heater drive unit, 121...liquid level meter, 122...concentration meter, 123...thermometer, 124-126...flow meter, 127...pressure meter, W...substrate

Claims

1. A support device for supporting maintenance work of a substrate processing apparatus, a deviation degree acquiring unit that acquires deviation degree information that indicates an invariant relationship between a plurality of pieces of processing information that indicate an operation or state related to substrate processing of the substrate processing apparatus and a degree of deviation between a plurality of pieces of processing information predicted based on a plurality of pieces of processing information actually collected from the substrate processing apparatus and the plurality of pieces of processing information that are actually collected; a support information generating unit that generates support information related to maintenance work of the substrate processing apparatus based on the deviation degree information and transmits the generated support information to the substrate processing apparatus, the substrate processing apparatus includes a plurality of components associated with the plurality of processing information; The support device includes: a target determination unit that determines one or more parts to be subjected to the maintenance work among the plurality of parts based on the deviation degree information as one or more maintenance target parts; a required value calculation unit that acquires, for each of the one or more maintenance target parts determined by the target determination unit, information on the state of the maintenance target part that changes over time as aging part information, and calculates a required value that indicates the degree of necessity of the maintenance work for the maintenance target part based on the acquired aging part information; The support information generation unit includes in the support information information indicating one or more maintenance target parts determined by the target determination unit, and for each of the one or more maintenance target parts determined by the target determination unit, determines to which of multiple predetermined requirement levels the required value calculated by the required value calculation unit belongs, and includes in the support information information indicating the predetermined maintenance work procedure for the maintenance target part in accordance with the determined requirement level.

2. A plurality of combinations of two different pieces of processing information are determined for the plurality of pieces of processing information; each combination includes first processing information and second processing information; for each combination, the second processing information actually collected from the substrate processing apparatus and the first processing information predicted based on the invariant relationship are generated as first predicted processing information, and a degree of deviation between the generated first predicted processing information and the first processing information actually collected from the substrate processing apparatus is calculated as a first deviation degree; for each combination, the first processing information actually collected from the substrate processing apparatus and the second processing information predicted based on the invariant relationship are generated as second predicted processing information, and a degree of deviation between the generated second predicted processing information and the second processing information actually collected from the substrate processing apparatus is calculated as a second deviation degree; the deviation degree acquisition unit acquires, as the deviation degree information, a plurality of first deviation degrees calculated for the plurality of combinations and a plurality of second deviation degrees calculated for the plurality of combinations, The target determination unit extracting, from the plurality of combinations, one or more combinations in which the first deviation degree exceeds a predetermined first threshold value and one or more combinations in which the second deviation degree exceeds a predetermined second threshold value; The support device according to claim 1 , wherein for each of the extracted one or more combinations, one or more components commonly related to the first processing information and the second processing information included in the combination are determined as the one or more maintenance target components.

3. A support device for supporting maintenance work of a substrate processing apparatus, comprising: a deviation degree acquiring unit that acquires deviation degree information that indicates an invariant relationship between a plurality of pieces of processing information that indicate an operation or state related to substrate processing of the substrate processing apparatus and a degree of deviation between a plurality of pieces of processing information predicted based on a plurality of pieces of processing information actually collected from the substrate processing apparatus and the plurality of pieces of processing information that are actually collected; a support information generating unit that generates support information related to maintenance work of the substrate processing apparatus based on the deviation degree information, the substrate processing apparatus includes a plurality of components associated with the plurality of processing information; The support device includes: a target determination unit that determines one or more parts to be subjected to the maintenance work among the plurality of parts based on the deviation degree information as one or more maintenance target parts; a required value calculation unit that acquires, for each of the one or more maintenance target parts determined by the target determination unit, information on the state of the maintenance target part that changes over time as the maintenance target part changes over time, and calculates a required value that indicates the degree of necessity of the maintenance work for the maintenance target part based on the acquired aging part information and a weight that is predetermined in consideration of the influence that an abnormality in the maintenance target part has on the human body; The support information generation unit includes in the support information information indicating one or more maintenance target parts determined by the target determination unit, and for each of the one or more maintenance target parts determined by the target determination unit, determines to which of multiple predetermined requirement levels the required value calculated by the required value calculation unit belongs, and includes in the support information information on maintenance work for the maintenance target parts that is predetermined according to the determined requirement level.

4. Each substrate processing apparatus is a substrate cleaning apparatus that cleans a substrate using a cleaning liquid, The support device according to any one of claims 1 to 3, wherein the plurality of processing information includes at least one of the amount of cleaning liquid supplied to the substrate, the temperature of the cleaning liquid supplied to the substrate, and the concentration of the cleaning liquid supplied to the substrate.

5. A method for supporting maintenance work of a substrate processing apparatus, comprising: acquiring deviation degree information indicating an invariant relationship between a plurality of pieces of processing information indicating an operation or state related to substrate processing of the substrate processing apparatus and a degree of deviation between a plurality of pieces of processing information predicted based on a plurality of pieces of processing information actually collected from the substrate processing apparatus and the plurality of pieces of processing information actually collected; generating support information related to maintenance work of the substrate processing apparatus based on the deviation degree information, and transmitting the generated support information to the substrate processing apparatus; the substrate processing apparatus includes a plurality of components associated with the plurality of processing information; The support method includes: determining one or more parts to be subjected to the maintenance work among the plurality of parts as one or more maintenance target parts based on the deviation degree information; and acquiring, for each of the one or more determined maintenance target parts, information on the state of the maintenance target part that changes over time as aging part information, and calculating a necessary value that indicates the degree of necessity of the maintenance work for the maintenance target part based on the acquired aging part information, The support method includes the steps of generating support information and transmitting the generated support information to the substrate processing apparatus, including information indicating the determined one or more maintenance target parts in the support information, determining to which of a plurality of predetermined requirement levels the calculated requirement value for each of the determined one or more maintenance target parts belongs, and including in the support information information indicating a maintenance work procedure for the maintenance target part that is predetermined according to the determined requirement level.

6. A method for supporting maintenance work of a substrate processing apparatus, comprising: acquiring deviation degree information indicating an invariant relationship between a plurality of pieces of processing information indicating an operation or state related to substrate processing of the substrate processing apparatus and a degree of deviation between a plurality of pieces of processing information predicted based on a plurality of pieces of processing information actually collected from the substrate processing apparatus and the plurality of pieces of processing information actually collected; generating support information related to maintenance work of the substrate processing apparatus based on the deviation degree information, the substrate processing apparatus includes a plurality of components associated with the plurality of processing information; The support method includes: determining one or more parts to be subjected to the maintenance work among the plurality of parts as one or more maintenance target parts based on the deviation degree information; and acquiring, for each of the one or more determined maintenance target parts, information relating to the state of the maintenance target part that changes over time as aging part information, and calculating a necessary value indicating the degree of necessity of the maintenance work for the maintenance target part based on the acquired aging part information and a weight that is predetermined in consideration of the influence that an abnormality in the maintenance target part has on the human body, The support method includes the step of generating support information including information indicating the determined one or more maintenance target parts in the support information, determining to which of a plurality of predetermined requirement levels the calculated requirement value for each of the determined one or more maintenance target parts belongs, and including in the support information information on maintenance work for the maintenance target parts that is predetermined according to the determined requirement level.

7. A support program that causes a computer to execute a support process for supporting maintenance work of a substrate processing apparatus, The support process includes: acquiring deviation degree information indicating an invariant relationship between a plurality of pieces of processing information indicating an operation or state related to substrate processing of the substrate processing apparatus and a degree of deviation between a plurality of pieces of processing information predicted based on a plurality of pieces of processing information actually collected from the substrate processing apparatus and the plurality of pieces of processing information actually collected; generating support information related to maintenance work of the substrate processing apparatus based on the deviation degree information, and transmitting the generated support information to the substrate processing apparatus; the substrate processing apparatus includes a plurality of components associated with the plurality of processing information; The support process includes: a process of determining one or more parts to be subjected to the maintenance work among the plurality of parts based on the deviation degree information as one or more maintenance target parts; and acquiring, for each of the one or more determined maintenance target parts, information on the state of the maintenance target part that changes over time as aging part information, and calculating a necessary value that indicates the degree of necessity of the maintenance work for the maintenance target part based on the acquired aging part information, The process of generating the support information and transmitting the generated support information to the substrate processing apparatus includes including information indicating the determined one or more maintenance target parts in the support information, determining to which of a plurality of predetermined requirement levels the calculated requirement value for each of the determined one or more maintenance target parts belongs, and including in the support information information indicating the procedure for maintenance work for the maintenance target parts, which is predetermined according to the determined requirement level.

8. A support program that causes a computer to execute support processing for supporting maintenance work of a substrate processing apparatus, The support process includes: acquiring deviation degree information indicating an invariant relationship between a plurality of pieces of processing information indicating an operation or state related to substrate processing of the substrate processing apparatus and a degree of deviation between a plurality of pieces of processing information predicted based on a plurality of pieces of processing information actually collected from the substrate processing apparatus and the plurality of pieces of processing information actually collected; generating support information related to maintenance work of the substrate processing apparatus based on the deviation degree information, the substrate processing apparatus includes a plurality of components associated with the plurality of processing information; The support process includes: a process of determining one or more parts to be subjected to the maintenance work among the plurality of parts based on the deviation degree information as one or more maintenance target parts; and acquiring, for each of the one or more determined maintenance target parts, information relating to the state of the maintenance target part that changes over time as aging part information, and calculating a necessary value indicating the degree of necessity of the maintenance work for the maintenance target part based on the acquired aging part information and a weight that is predetermined in consideration of the influence that an abnormality in the maintenance target part has on the human body, The process of generating the support information includes including information indicating the one or more determined maintenance target parts in the support information, determining to which of multiple predetermined requirement levels the calculated required value for each of the one or more determined maintenance target parts belongs, and including in the support information information on maintenance work for the maintenance target parts that is predetermined according to the determined requirement level.

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