Liquid crystal display device

Abstract

To provide a liquid crystal display device which is resistant to physical impact and can retain high-quality display characteristics and also provide a liquid crystal display device with high reliability and high performance.SOLUTION: In a liquid crystal display device in which a liquid crystal composition is interposed between a pair of substrates, a spacer for keeping a gap between the substrates is provided over a structure body provided under a pixel electrode layer or a common electrode layer. The structure body is provided to make the pixel electrode layer and the common electrode layer project into the liquid crystal composition, and the structure body is provided to extend to a region where the spacer is provided. Since the structure body is formed using one continuous film, regions of the surface thereof have substantially the same height continued and the spacer can be stably provided with good adhesion.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a liquid crystal display device and a method for manufacturing the liquid crystal display device. [Background technology]

[0002] In recent years, liquid crystal elements, which have liquid crystal sandwiched between a pair of electrodes, have been applied to a variety of devices, and thin Liquid crystal display devices (LCDs) are characterized by their small size and light weight and are used in a wide range of applications. It is used in this context.

[0003] In a liquid crystal display device, the thickness of the liquid crystal in the liquid crystal element (cell thickness) affects the display and operating characteristics. The cell thickness is an important factor in determining the distance between the pair of substrates that sandwich the liquid crystal element. It is controlled by the

[0004] Therefore, in order to realize a desired cell thickness that meets the required characteristics of a liquid crystal display device, Methods for forming and arranging sensors have been studied (see, for example, Patent Document 1). [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Japanese Patent Application Laid-Open No. 2010-237660 Summary of the Invention [Problem to be solved by the invention]

[0006] Liquid crystal display devices are also used in touch panels that are operated by touching the display screen, and in portable mobile devices. In such cases, the LCD Display devices are often subjected to physical shocks, and LCD displays are highly resistant to such shocks. It is required to be prepared.

[0007] The object of the present invention is to provide a liquid crystal display device that is resistant to physical impact and can maintain high-quality display characteristics. It shall be one.

[0008] An object of the present invention is to provide a highly reliable and high-performance liquid crystal display device. [Means for solving the problem]

[0009] In a liquid crystal display device in which a liquid crystal composition is sandwiched between a pair of substrates, a space for supporting the gap between the substrates is provided. The sensor is provided under the pixel electrode layer (first electrode layer) or the common electrode layer (second electrode layer). The structure is provided on the pixel electrode layer and the common electrode layer so as to protrude into the liquid crystal composition. The structure is provided to extend to the area where the spacers are disposed. are the same continuous film, the surface of the structure becomes a continuous region with approximately the same surface height, The spacer can be provided with good adhesion and stability.

[0010] The spacer is a liquid crystal material sandwiched between opposing substrates in a liquid crystal display device. In addition to controlling the spatial distance (also called the cell gap), it also protects the device from external pressure and other shocks. It has the function of maintaining distance.

[0011] Furthermore, by providing the structure continuously and widely up to the spacer formation region, When the spacers formed on the surface of the substrate are arranged on the element substrate side, the spacers can be stably arranged. The spacer can be provided on the upper surface of the structure (the highest protruding surface). ) is placed on the same surface as the opposing substrate, so the spacers on the opposing substrate are used for alignment. Even if the element substrate side is moved, there is no risk of damaging the adjacent structures.

[0012] When the structure is divided into a plurality of parts, the structure is continuously provided up to the spacer formation region. The structure in the display panel is at least one of a structure provided under a pixel electrode layer or a common electrode layer. That would be good.

[0013] Therefore, defects due to the spacer placement process and misalignment of the placement position can be reduced, and the yield can be improved. This can improve the quality.

[0014] In this specification, a substrate on which an element layer is provided is referred to as an element substrate, and a substrate provided opposite to the element substrate is referred to as a substrate. The substrate that is supported is also called the opposing substrate.

[0015] The spacers are stably arranged in a nearly horizontal area with few steep irregularities or steps in the liquid crystal display device. Therefore, the spacer is less likely to be damaged or misshapen due to physical impact, It is possible to impart high resistance to physical impacts.

[0016] Therefore, it is an object of the present invention to provide a liquid crystal display device that is resistant to physical impacts and can maintain high-quality display characteristics. Furthermore, it is possible to provide a highly reliable and high performance liquid crystal display device.

[0017] As the liquid crystal composition, a liquid crystal composition that exhibits a blue phase can be suitably used.

[0018] The blue phase appears in a liquid crystal composition having a strong twisting power and has a double twist structure. Depending on the conditions, it exhibits a cholesteric phase, a cholesteric blue phase, an isotropic phase, etc.

[0019] The cholesteric blue phase is a blue phase, which is classified into three types from the low temperature side: blue phase I, blue phase II, and blue phase III. The blue phase, cholesteric blue phase, is optically equivalent to phase III. Although the blue phases are isotropic, blue phase I has body-centered cubic symmetry, and blue phase II has simple cubic symmetry. Blue phase I and blue phase II exhibit Bragg diffraction in the ultraviolet to visible light region.

[0020] The chiral agent induces a twist in the liquid crystal composition, aligning the liquid crystal composition in a helical structure and forming a blue phase. A chiral agent is a compound that has an asymmetric center and is used to express the chirality of a liquid crystal composition. The chiral agent is an optically active compound. The higher the optical purity, the more preferable, and 99% or more is the most preferable.

[0021] One embodiment of the configuration of the invention disclosed in this specification is a liquid crystal display device comprising a first substrate and a second substrate sandwiching a liquid crystal composition therebetween. a first structure protruding from a surface of the first substrate facing the liquid crystal composition into the liquid crystal composition; The first substrate is provided between the first structures and protrudes into the liquid crystal composition from the liquid crystal composition side of the first substrate. a pixel electrode layer on the first structure; and a common electrode layer on the second structure. , a spacer on the first structure or the second structure, and The pixel electrode layer or the common electrode layer and the spacer are continuous. The liquid crystal display device is provided on the upper surface of the first structure or the second structure.

[0022] Another embodiment of the configuration of the present invention disclosed in this specification is a liquid crystal display device comprising: first substrates sandwiching a liquid crystal composition; a second substrate; and a plurality of first substrates protruding into the liquid crystal composition from the surface of the first substrate facing the liquid crystal composition. and a liquid crystal layer formed between the first substrate and the plurality of first structures, the liquid crystal layer being formed on the liquid crystal composition side of the first substrate. a plurality of second structures protruding into the composition; a pixel electrode layer on the plurality of first structures; a common electrode layer on the plurality of second structures and a plurality of first structures or a plurality of second structures; At least one of the first structures or the second structures has a spacer on it. In at least one embodiment, the pixel electrode layer or the common electrode layer and the spacer are formed by a plurality of continuous first The liquid crystal display device is provided on the upper surface of at least one of the structural body or the plurality of second structural bodies.

[0023] The first structure and the second structure are connected to a pixel electrode layer or a common electrode layer formed on the top surface and side surface of the first structure and the second structure. The shape of the electrode layer is reflected, and the opening pattern includes bent portions and branched comb-like shapes. do.

[0024] The first structure and the second structure are rib-shaped with a tapered shape, and the rib-shaped first structure and a pixel electrode layer and a common electrode layer are provided so as to cover the top surface and side surface of the second structure, The area of ​​the pixel electrode layer and the common electrode layer can be expanded in the film thickness direction of the liquid crystal composition (three-dimensionally). Therefore, when a voltage is applied between the pixel electrode layer and the common electrode layer, A wide electric field can be formed between the layer and the common electrode layer.

[0025] Furthermore, when a second common electrode layer is provided on the second substrate side, the pixel electrode layer and the second common electrode layer Since an electric field can be applied obliquely to the liquid crystal (diagonally to the substrate) between the This allows for more efficient control of the liquid crystal molecules.

[0026] Therefore, it is possible to make the liquid crystal molecules in the entire liquid crystal composition, including the film thickness direction, respond, and white transparency is obtained. Therefore, the ratio of white transmittance to black transmittance (light transmittance when black is displayed) is The trust ratio can also be increased. In addition, liquid crystal materials (liquid crystal mixtures) that exhibit a high viscosity blue phase can be used. Even if the material is a silicon compound, an electric field can be applied effectively, so low power consumption can be achieved. do.

[0027] The structure is made of insulating materials (organic and inorganic materials) and conductive materials (organic materials). It can be formed from a conductor using a material such as a visible light curing material, a purple material, or an inorganic material. It is preferable to use a radiation-curable or thermosetting resin. For example, acrylic resin, epoxy resin, etc. It is possible to use a silicone resin, an amine resin, etc. It is also possible to use a conductive resin or a metal material. The structure may be a laminated structure of a plurality of thin films.

[0028] The shape of the structure is a columnar shape, a trapezoidal cross section with a flat cone tip, or a dome with a rounded cone tip. In this specification, the pixel electrode layer and the common electrode layer are structural bodies. Since the structure is formed to cover the surface (top and side surfaces) of the pixel electrode layer and the common electrode It is preferable that the surface has a curved surface with few steps so that the layer coverage is good. However, if the structure is made of a material that is transparent to visible light, the aperture ratio and white transmittance will decrease. This is preferable because it does not

[0029] The structure may be a portion that protrudes into the liquid crystal composition from the surface of the substrate facing the liquid crystal composition. The interlayer film may be processed to form an uneven surface on the liquid crystal composition side, forming a protruding structure. .

[0030] In this specification, the pixel electrode layer and the common electrode layer have a shape that does not form a closed space. The pixel electrode layer and the common electrode layer are not in contact with each other. The comb-like patterns of the It will be established.

[0031] Furthermore, by polymerizing the liquid crystal composition to form a polymer, the liquid crystal composition is stabilized and the blue light is removed. The temperature range in which the liquid crystal composition exhibits a phase can be expanded. The process of stabilizing the blue phase is called polymer stabilization treatment. A liquid crystal composition containing a chiral liquid crystal and a chiral agent is used. When polymer stabilization treatment is performed, A liquid crystal composition is used in which a polymerizable monomer and a polymerization initiator are further added to the liquid crystal composition. The polymer stabilization treatment is carried out by, for example, using a photopolymerizable monomer and a photopolymerization initiator, and then irradiating the polymer with light. Therefore, this can be achieved by polymerizing the liquid crystal composition.

[0032] The liquid crystal composition that has been polymer stabilized loses (or decreases) its fluidity and becomes a solid with poor buffering properties. In the liquid crystal composition with low buffering properties, the spacer movement Since the impact of the physical shock has a significant effect on the display failure, the present invention A stable spacer that is resistant to impact shock is beneficial. [Effects of the Invention]

[0033] One aspect of the present invention is to improve the resistance of a liquid crystal display device to physical impacts and to improve high-quality display characteristics. We can provide technology that can maintain this.

[0034] One embodiment of the present invention can impart high reliability and high performance to a liquid crystal display device. [Brief explanation of the drawings]

[0035] [Figure 1] 1A to 1C are conceptual diagrams illustrating a liquid crystal display device and a method for manufacturing the liquid crystal display device. [Figure 2] 1A and 1B illustrate one embodiment of a liquid crystal display device. [Figure 3] 1A and 1B illustrate one mode of an electrode structure of a liquid crystal display device. [Figure 4] 1A and 1B illustrate one embodiment of a liquid crystal display device. [Figure 5] 1A and 1B illustrate one mode of a spacer structure of a liquid crystal display device. [Figure 6] 1A to 1C illustrate electronic devices. DETAILED DESCRIPTION OF THE INVENTION

[0036] The embodiments will be described in detail with reference to the drawings. However, the present invention is not limited to the following description. Those skilled in the art will recognize that various changes in form and details may be made without departing from the spirit and scope of the present invention. Therefore, the present invention should be interpreted as being limited to the following description of the embodiments. In the configuration described below, parts that have the same parts or similar functions are not included. The same reference numerals are used in common between different drawings for corresponding parts, and repeated explanations thereof will be omitted.

[0037] The ordinal numbers such as 1st, 2nd, and 3rd are used for convenience and do not indicate the order of steps or does not indicate the order of stacking. It does not indicate a specific name.

[0038] (Embodiment 1) A liquid crystal composition according to one aspect of the present invention and a liquid crystal display device using the liquid crystal composition are shown in FIG. This will be used to explain.

[0039] The spacer is a liquid crystal material sandwiched between opposing substrates in a liquid crystal display device. In addition to controlling the spatial distance (also called the cell gap), it also protects the device from external pressure and other shocks. It has the function of maintaining distance.

[0040] The spacer is formed on the opposing substrate side, and the element substrate and the opposing substrate are attached with the spacer on the inside. By matching them together, they can be placed inside a liquid crystal display device.

[0041] However, the element layer is provided under the insulating film on which the spacers are arranged, and the insulating film surface The transistors and conductive films provided in the element layer, and the materials for adjusting the cell gap, etc. The spacers provided in the unstable area with unevenness or steps are If physical impact is applied to the liquid crystal display, it may be damaged or displaced due to localized concentration of force, and the liquid crystal composition may be damaged. This causes the alignment of objects to be disturbed, resulting in display defects.

[0042] Therefore, the spacer must be resistant to physical impacts to prevent damage or deformation due to physical impacts. It is important that the device has high resistance to light and that it is stably installed in the horizontal region of the liquid crystal display device. is.

[0043] In this embodiment, a liquid crystal composition that exhibits a blue phase is used as the liquid crystal composition. In a liquid crystal display device containing a liquid crystal composition that exhibits the above-mentioned A method of controlling gradation by generating a vertical electric field to move liquid crystal molecules in a plane parallel to the substrate. Such a method is called IPS (In-Plane Switching The electrode configuration used in the HF mode can be applied.

[0044] The horizontal electric field mode shown in the IPS mode has an opening pattern below the liquid crystal composition. A first electrode layer (for example, a pixel electrode layer in which a voltage is controlled for each pixel) and a second electrode layer (for example, For example, a common electrode layer to which a common voltage is supplied to all pixels is arranged. The electrode layer is not flat, but has various opening patterns, including bent portions and branched comb-like shapes. The first electrode layer and the second electrode layer are overlapped with each other and have the same shape to generate an electric field between the electrodes. The layout should not be such that

[0045] The liquid crystal is controlled by applying an electric field between the pixel electrode layer and the common electrode layer. The electric field is applied in the direction parallel to the substrate, and the liquid crystal molecules can be controlled using this electric field. The viewing angle is widened because the aligned liquid crystal molecules can be controlled in a direction parallel to the substrate.

[0046] 1A to 1C show a liquid crystal composition 208 between a first substrate 200 and a second substrate 201. The liquid crystal display device is arranged so that the first substrate 200 and the liquid crystal Between the composition 208, the first structures 233a and 233b, the pixel electrode layers 230a and 230b, and the b, second structures 235a, 235b, and common electrode layers 232a, 232b are provided. The first structures 233a and 233b and the second structures 235a and 235b are formed on the first substrate. The liquid crystal layer 208 is provided so as to protrude into the liquid crystal composition 208 from the surface of the liquid crystal layer 200 facing the liquid crystal composition 208 .

[0047] The pixel electrode layers 230a and 230b are formed on the surface of the first substrate 200 facing the liquid crystal composition 208 (the liquid crystal composition a first structure protruding from the surface facing the object 208 toward the liquid crystal composition 208; The common electrode layers 232a and 232b are formed to cover the upper and side surfaces of the first electrodes 233a and 233b. The second substrate 200 is provided so as to protrude into the liquid crystal composition 208 from the surface of the substrate 200 facing the liquid crystal composition 208. The insulating film 234 is formed to cover the upper and side surfaces of the structures 235a and 235b.

[0048] In this embodiment, a spacer is provided on the first structure and / or the second structure. A) is an example in which the spacer 250 is provided on the second structure 235a. On the substrate 5a, a spacer 250 and a common electrode layer 232a are formed adjacent to each other on the same surface. .

[0049] FIG. 1B shows an example in which a spacer 250 is provided on the first structure 233b. On the substrate 233b, a spacer 250 and a pixel electrode layer 230b are formed adjacent to the same surface. are.

[0050] FIG. 1C shows a structure in which a spacer 250a is placed on the second structure 235a and a spacer 250b is placed on the first structure 235b. In this example, the spacer 250a and the second structure 235a are provided on the first structure 233b. and a common electrode layer 232a are formed adjacent to the same surface, and on the first structure 233b The spacer 250b and the pixel electrode layer 230b are formed adjacent to the same surface.

[0051] In this way, when the structure is extended to the region where the spacer is arranged, the structure has the same structure. Since the surface of the structure is a continuous film, the surface of the structure is a continuous region with almost the same surface height, and the spacer The adhesive layer can be provided with good adhesion and stability.

[0052] Furthermore, by providing the structure continuously and widely up to the spacer formation region, When the spacers formed on the surface of the substrate are arranged on the element substrate side, the spacers can be stably arranged. can be widely established.

[0053] The spacer is placed on a surface at the same height as the top surface (highest protruding surface) of the structure. Therefore, even if the spacer provided on the opposing substrate moves on the element substrate side for alignment, There is no risk of damaging adjacent structures.

[0054] Therefore, defects due to the spacer placement process and misalignment of the placement position can be reduced, and the yield can be improved. This can improve the quality.

[0055] The spacers are stably arranged in a nearly horizontal area with few steep irregularities or steps in the liquid crystal display device. Therefore, the spacer is less likely to be damaged or misshapen due to physical impact, It is possible to impart high resistance to physical impacts.

[0056] Therefore, it is an object of the present invention to provide a liquid crystal display device that is resistant to physical impacts and can maintain high-quality display characteristics. Furthermore, it is possible to provide a highly reliable and high performance liquid crystal display device.

[0057] In this embodiment, the first structures 233a and 233b and the second structures 235a and 235b b uses a rib-shaped structure having a tapered shape. Rib-shaped first structure and second structure The body is formed with an aperture pattern that reflects the shape of the pixel electrode layer or the common electrode layer formed on the top surface and side surface. It has turns and a shape that includes bent portions and branched comb-like shapes.

[0058] The first structures 233a and 233b and the second structures 235a and 235b have cross sections that are nearly semicircular. The structure is a dome-shaped structure with a rounded tip. The pixel electrode layer and the common electrode layer to be stacked can be formed with good coverage and good shape.

[0059] The pixel electrode layers 230a and 230b and the common electrode layers 232a and 232b are not flat but have openings. Because it has a patterned shape, it is shown as multiple separated electrode layers in the cross section. will be done.

[0060] The pixel electrode layers 230a and 230b and the common electrode layers 232a and 232b in the pixel region are The shape of the pixel is preferably an open comb-like pattern that does not form a closed space. The electrode layers 230a and 230b and the common electrode layers 232a and 232b are not in contact with each other, and are interdigitated. The patterns are provided on the same insulating surface, the first substrate 200, so as to interlock with each other. .

[0061] In the liquid crystal display device of FIG. 1, the first structures 233a and 233b are covered with a thin film. The pixel electrode layers 230a and 230b are provided as shown in FIG. By providing common electrode layers 232a and 232b so as to cover the side surfaces, The areas where the common electrode layers 230b and 232a and 232b are formed are in the thickness direction of the liquid crystal composition 208. Therefore, as shown in FIG. 1, the pixel electrode layer 230a and the common electrode layer 230b can be expanded (three-dimensionally). An electric field indicated by an arrow 202a is generated between the pixel electrode layer 230a and the common electrode layer 232a. An electric field indicated by an arrow 202b is generated between the pixel electrode layer 230b and the common electrode layer 232b. An electric field indicated by an arrow 202c is applied between the liquid crystal composition layers in a wide range in the film thickness direction. As shown by arrows 202a, 202b, and 202c, the pixel electrode layers 230a and 230b are The potential line wraps around in a circular shape on the upper surfaces (upper regions) of the common electrode layers 232a and 232b. It is formed as follows.

[0062] Therefore, when a voltage is applied between the pixel electrode layers 230a and 230b and the common electrode layers 232a and 232b, When the liquid crystal composition 208 is applied, the pixel electrode layers 230a and 230b and the common electrode layer 23 A wide electric field can be formed between 2a and 2b, and the electric field is used to control the liquid crystal molecules. Can be controlled.

[0063] Therefore, it is possible to make the liquid crystal molecules in the entire liquid crystal composition 208 respond, including in the film thickness direction. Therefore, the ratio of the white transmittance to the black transmittance (transmittance of light when black is displayed) is The contrast ratio can also be increased. Even if the liquid crystal mixture is used, an electric field can be applied effectively, so low power consumption can be achieved. It can be achieved.

[0064] The structures (first structure, second structure) are made of insulating materials (organic and inorganic materials). It can be made of insulators and conductors using conductive materials (organic and inorganic materials). Typically, it is preferable to use a visible light curable, ultraviolet curable or thermosetting resin. For example, acrylic resin, epoxy resin, amine resin, etc. can be used. The structure may be formed of a conductive resin or a metal material. Good too.

[0065] The shape of the structure is a columnar shape, a trapezoidal cross section with a flat cone tip, or a dome with a rounded cone tip. In this specification, the pixel electrode layer and the common electrode layer are structural bodies. Since the structure is formed to cover the surface (top and side surfaces) of the pixel electrode layer and the common electrode It is preferable that the surface has a curved surface with few steps so that the layer coverage is good. However, if the structure is made of a material that is transparent to visible light, the aperture ratio and white transmittance will decrease. This is preferable because it does not

[0066] The structure may be a portion that protrudes into the liquid crystal composition from the surface of the substrate facing the liquid crystal composition. The interlayer film may be processed to form an uneven surface on the liquid crystal composition side, forming a protruding structure. .

[0067] The shapes of the pixel electrode layer and the common electrode layer formed on the structure reflect the shape of the structure. It is also affected by the etching method.

[0068] The first structures 233a and 233b and the second structures 235a and 235b are formed in the same process and with the same material. The pixel electrode layers 230a and 230b and the common electrode layers 232a and 232b are formed by the same method. Of course, the first structures 233a, 233b, and The second structures 235a and 235b are formed by different processes and materials, and the pixel electrode layer 2 The common electrode layers 30a and 230b and the common electrode layers 232a and 232b can be formed by different processes and materials. A liquid crystal display device can be manufactured by appropriately combining any of the above.

[0069] The spacer 250 may be formed by an ink jet method or a printing method, or may be formed on the opposing substrate. After forming a film on the entire surface of the second substrate 201 by coating or the like, a part of the film is removed using a mask. Alternatively, the second insulating layer 11 may be selectively formed.

[0070] The spacer 250 can be made of an organic or inorganic material, and is typically made of a visible light curable material. Resins such as thermosetting, ultraviolet curing, and thermosetting resins, and photosensitive resins can be used. Photosensitive materials such as acrylic resin, epoxy resin, and amine resin can be used. In the embodiment, a photosensitive polyimide is used.

[0071] The liquid crystal composition 208 can be formed by a dispenser method (dropping method) or a method of dispensing the liquid crystal composition 208 onto the first substrate 20. 0 and the second substrate 201 are bonded together, and then liquid crystal is injected using capillary action or the like. can be used.

[0072] In this embodiment, the liquid crystal composition 208 contains a blue liquid crystal containing a nematic liquid crystal and a chiral agent. A liquid crystal composition that exhibits a liquid crystal phase is used.

[0073] Nematic liquid crystals include biphenyl compounds, terphenyl compounds, phenylcyclohexane compounds, and cyclohexyl compounds, biphenylcyclohexyl compounds, phenylbicyclohexyl compounds compounds, phenyl benzoate compounds, cyclohexyl phenyl benzoate compounds, phenyl Phenyl benzoate compounds, phenyl bicyclohexyl carboxylate compounds, azomethine compounds, azo compounds, azooxy compounds, stilbene compounds, bicyclo Hexyl compounds, phenylpyrimidine compounds, biphenylpyrimidine compounds, pyrimidine compounds Examples of the compounds include phenylene compounds and biphenylethyne compounds.

[0074] The chiral agent induces a twist in the liquid crystal composition, aligning the liquid crystal composition in a helical structure and forming a blue phase. A chiral agent is a compound that has an asymmetric center and is used to express the chirality of a liquid crystal composition. The chiral agent is an optically active compound. The higher the optical purity, the more preferable, and 99% or more is the most preferable.

[0075] In addition, in order to widen the temperature range in which the blue phase appears in a liquid crystal display device, It is preferable to add a polymerizable monomer to the material and perform a polymer stabilization treatment. Examples of the polymerizable monomers include thermopolymerizable (thermosetting) monomers, which are polymerized by heat, and photopolymerizable (photosetting) monomers. Photopolymerizable (photocurable) monomers that undergo polymerization, or polymerization that occurs when polymerized by heat and light A polymerization initiator may be added to the liquid crystal composition. .

[0076] The polymerizable monomer may be a monofunctional monomer such as an acrylate or a methacrylate, or a difunctional monomer such as a di- Multifunctional moieties such as acrylate, triacrylate, dimethacrylate, and trimethacrylate The polymer may be a liquid crystalline polymer or a mixture of these. It may be either one of them or a mixture of them.

[0077] The polymerization initiator may be a radical polymerization initiator that generates radicals upon irradiation with light, or an acid. The agent may be an acid generator that generates a base, or a base generator that generates a base.

[0078] For example, a photopolymerizable monomer and a photopolymerization initiator are added to the liquid crystal composition to form a photopolymerizable monomer. Polymer stabilization treatment can be performed by irradiating light of a wavelength that reacts with the polymer and photopolymerization initiator. As the photopolymerizable monomer, a UV-polymerizable monomer can be typically used. When an ultraviolet-polymerizable monomer is used as the photopolymerizable monomer, the liquid crystal composition is irradiated with ultraviolet light. It should be irradiated.

[0079] The polymer stabilization treatment may be performed on a liquid crystal composition that exhibits an isotropic phase, or on a liquid crystal composition that exhibits a blue phase by controlling the temperature. The liquid crystal composition may be a liquid crystal composition which exhibits a phase transition from a blue phase to an isotropic phase when the temperature is increased. The temperature at which the isotropic phase transitions to the blue phase during temperature or cooling is called the phase transition temperature between the blue phase and the isotropic phase. As an example of polymer stabilization treatment, a liquid crystal composition containing a photopolymerizable monomer is After heating to the isotropic phase, the temperature is gradually lowered to cause a phase transition to the blue phase, and the blue phase appears. This can be done by irradiating the substrate with light while maintaining the temperature.

[0080] Between the first substrate 200 and the liquid crystal composition 208, a pixel electrode layer and a common electrode layer are provided adjacent to each other. In this configuration, an electric field is generated that is approximately parallel to the substrate (i.e., horizontal direction), and the substrate and A method of controlling the gradation by moving liquid crystal molecules in a parallel plane can be used. The liquid crystal is controlled by forming an electric field between the liquid crystal layer and the common electrode layer. The liquid crystal molecules can be controlled using the electric field. The composition is capable of high-speed response, making it possible to improve the performance of liquid crystal elements and liquid crystal displays. In addition, the liquid crystal molecules that are aligned to exhibit a blue phase can be controlled in a direction parallel to the substrate. This allows for a wider viewing angle.

[0081] The liquid crystal display device according to the embodiment is capable of high-speed response, and therefore, an RG B. Light-emitting diodes (LEDs) are arranged to display colors in a time-division manner using the time-sequential additive color mixing method. (field sequential method) or time division to alternate between left eye and right eye images. This can be suitably adopted for a 3D display method using shutter glasses.

[0082] In addition, the blue phase is optically isotropic, so it is not dependent on the viewing angle and does not require the formation of an alignment film. This allows for improved display image quality and reduced costs.

[0083] The distance between the pixel electrode layer and the common electrode layer adjacent to each other through the liquid crystal composition 208 is When a predetermined voltage is applied to the pixel electrode layer and the common electrode layer, The distance is set to a distance at which the liquid crystal of the liquid crystal composition 208 responds. The voltage to be applied is appropriately controlled according to the distance. Control.

[0084] The maximum thickness (film thickness) of the liquid crystal composition 208 is preferably 1 μm or more and 20 μm or less. The thickness of the liquid crystal composition 208 is controlled by the spacers 250, 250a, 250b, and 250c. can be controlled by

[0085] Although not shown in FIG. 1, optical films such as polarizing plates, retardation plates, and anti-reflection films are also included. For example, circularly polarized light produced by a polarizing plate and a retardation plate may be used. A backlight or the like can be used.

[0086] As a liquid crystal display device, a transmissive liquid crystal display device that displays by transmitting light from a light source A reflective liquid crystal display device that displays by reflecting incident light, or a transmissive liquid crystal display device that displays by reflecting incident light, Therefore, it is possible to provide a semi-transmissive liquid crystal display device having both a reflective and a reflective type.

[0087] In the case of a transmissive liquid crystal display device, the element substrate, the pixel electrode layer, and the like, which are present in the pixel area through which light passes, The common electrode layer, the opposing substrate, other insulating films, conductive films, etc. are transparent to light in the visible wavelength range. Although light-transmitting is preferable, if there is an opening pattern, a non-light-transmitting material such as a metal film may be used depending on the shape. Fees may also be used.

[0088] On the other hand, in the case of a reflective liquid crystal display device, the liquid crystal composition is applied to the side opposite to the viewing side. A reflective member (such as a reflective film or substrate) that reflects the transmitted light may be provided. Therefore, the light-transmitting substrate, insulating film, and conductive film provided from the visible side to the reflective member are It is transparent to light in the wavelength range of visible light. The optical property refers to the property of transmitting light at least in the visible wavelength range.

[0089] The pixel electrode layer and common electrode layer are made of indium tin oxide, indium oxide and zinc oxide (ZnO). Conductive material made by mixing indium oxide and silicon oxide (SiO2), Indium oxides including organoindium, organotin, and tungsten oxides, tungsten oxides Indium zinc oxide containing titanium oxide, Indium oxide containing titanium oxide Indium tin oxide, graphene, or tungsten (W), molybdenum (Mo), silica Zirconium (Zr), Hafnium (Hf), Vanadium (V), Niobium (Nb), Tantalum (Ta), Chromium (Cr), Cobalt (Co), Nickel (Ni), Titanium (Ti), White Metals such as gold (Pt), aluminum (Al), copper (Cu), silver (Ag), or their alloys, Alternatively, it can be formed using one or more of these metal nitrides.

[0090] The first substrate 200 and the second substrate 201 are made of barium borosilicate glass or aluminoborosilicate. Glass substrates such as acid glass, quartz substrates, plastic substrates, etc. can be used. In the case of a reflective liquid crystal display device, the first substrate 200 or the second substrate 201, which is not on the viewing side, A metal substrate such as an aluminum substrate or a stainless steel substrate may be used.

[0091] As described above, it is an object of the present invention to provide a liquid crystal display device that is resistant to physical impacts and can maintain high-quality display characteristics. It is possible.

[0092] A highly reliable and high-performance liquid crystal display device can be provided.

[0093] This embodiment mode can be implemented by being appropriately combined with the configurations described in other embodiments. is.

[0094] (Embodiment 2) The liquid crystal display device according to one aspect of the present invention includes a passive matrix liquid crystal display device, an active matrix liquid crystal display device, and a This embodiment of the present invention provides a liquid crystal display device of a sub-matrix type. An example of such an active matrix liquid crystal display device will be described with reference to FIGS.

[0095] FIG. 2(A) is a plan view of a liquid crystal display device, showing one pixel. 2(A) is a cross-sectional view taken along line X1-X2.

[0096] In FIG. 2A, a plurality of source wiring layers (including the wiring layer 405a) are arranged parallel to each other ( The gate wiring layers (extending in the left-right direction) are arranged at a distance from each other. The source electrode layer 401 (including the source electrode layer 401) extends in a direction substantially perpendicular to the source wiring layer (the vertical direction in the drawing), The common wiring layer 408 is a layer including a plurality of gate wiring layers. The gate electrodes are arranged adjacent to each other and are oriented in a direction roughly parallel to the gate wiring layer, i.e., The common wiring layer extends in a direction (vertical direction in the figure) that is roughly perpendicular to the source wiring layer. The line layer 408 and the gate wiring layer surround a substantially rectangular space. The pixel electrode layer and the common electrode layer of the liquid crystal display device are arranged. The pixel electrode layer and the transistor are arranged in the upper right corner of the figure. Multiple units are arranged in a trix shape.

[0097] In the liquid crystal display device of FIG. 2, the first electrode layer 44 electrically connected to the transistor 420 7 functions as a pixel electrode layer, and although the connection structure is not shown in FIG. 2, the common wiring layer 408 The second electrode layer 446 electrically connected to the first electrode functions as a common electrode layer. The capacitance is formed by the layer 447, the wiring layer 405b, the common wiring layer 408, and the gate insulating layer 402. The common electrode layer operates in a floating state (electrically isolated state). However, it is possible to set the potential to a fixed potential, preferably an intermediate potential of the image signal sent as data. It may be set to a level that does not cause flicker in the vicinity. It may also be provided on the second substrate (442) side, in which case it is provided on the element substrate (first substrate 441) side. The common electrode layer (second electrode layer 446) is provided on the opposing substrate (second substrate 442) side. It is preferable that the potential is the same as that of the common electrode layer.

[0098] An electric field is generated that is roughly parallel to the substrate (i.e., horizontal direction), and the liquid crystal molecules move in a plane parallel to the substrate. A method of controlling the gradation by moving the pixel can be used. The electrode configuration used in the IPS mode as shown in FIG. 3 can also be applied.

[0099] The horizontal electric field mode shown in the IPS mode is a mode in which the liquid crystal composition 444 is formed on the first substrate 441. A first electrode layer 447 (for example, a pixel electrode layer in which a voltage is controlled for each pixel) having an opening pattern therebelow is formed. a pixel electrode layer) and a second electrode layer 446 (for example, a common electrode layer to which a common voltage is supplied to all pixels) The first electrode layer 447 and the second electrode layer 446 are not planar but have various shapes. The first electrode layer 447 and the second electrode layer 448 have an opening pattern, and include bent portions and branched comb-like portions. The electrode layers 446 generate an electric field between the electrodes, so an arrangement in which they are completely overlapped with each other and have the same shape should be avoided. do.

[0100] Another example of the first electrode layer 447 and the second electrode layer 446 is shown in FIG. As shown in the top view, the first electrode layers 447a and 447b and the second electrode layers 446a and 446b are 3A, the first electrode layer 447a and the second electrode layer 6b are formed alternately. The second electrode layer 446a has a wavy shape having undulations. In FIG. 3(B), the first electrode layer 4 The second electrode layer 47b and the second electrode layer 446b are comb-shaped and have a shape in which the electrodes interdigitate with each other.

[0101] The first electrode layer 447 and the second electrode layer 446 have an opening pattern. Therefore, in the cross-sectional view of FIG. 2(B), it is shown as a plurality of separated electrode layers. The same applies to other drawings in this specification.

[0102] The first electrode layer 447, which is a pixel electrode layer, is an interlayer on the first substrate 441 (also called an element substrate). The first structure is provided so as to protrude into the liquid crystal composition 444 from the surface of the film 413 on the side of the liquid crystal composition 444. The second electrode layer 446 is formed on the structure 449, and the second electrode layer 446 is formed on the liquid crystal layer 413 of the interlayer film 413 on the first substrate 441. On the second structure 445 provided protruding into the liquid crystal composition 444 from the surface on the liquid crystal composition 444 side is formed.

[0103] The first structure 449 and the second structure 445 are examples having a rib shape. 449 and the second structure 445 are connected to the first electrode layer 447 or the second electrode layer 448 formed thereon. The shape of the electrode layer 446 is reflected, and the opening pattern includes bent portions and branched comb-like shapes. It is in this state.

[0104] In addition, the first structure 449 and the second structure 445 are formed by a series of square pyramids as shown in FIG. In this embodiment, the polarizing plate 443a is The polarizing plate 443b has a first polarization axis, and the polarizing plate 443b has a second polarization axis. The axis refers to the vibration direction of the linearly polarized light that is converted when light passes through a polarizer such as a polarizing plate. .

[0105] The interface between the side surface of the first structure 449 and the first electrode layer 447, and the side surface of the second structure 445 The interface between the surface and the second electrode layer 446 is parallel to the first direction or the second direction, and The first electrode layer 447 and the second electrode layer 446 are connected to each other. The direction of the electric field generated in the liquid crystal composition 444 between the first direction and the second direction is It is provided so as to be the third direction for dividing equally.

[0106] By using the configuration shown in Figure 5, light leakage occurring in pixels that display black is reduced, and contrast It is possible to provide a liquid crystal display device that improves the storage ratio.

[0107] A first electrode layer 447 is provided so as to cover the top and side surfaces of the first structure 449, and a second structure The second electrode layer 446 is provided to cover the upper and side surfaces of the body 445, thereby The formation areas of the second electrode layer 447 and the second electrode layer 446 are set in the film thickness direction of the liquid crystal composition 444 (three-dimensionally). Therefore, when a voltage is applied between the first electrode layer 447 and the second electrode layer 446, At this time, a wide electric field can be formed between the first electrode layer 447 and the second electrode layer 446. Cut.

[0108] Therefore, it is possible to make the liquid crystal molecules in the entire liquid crystal composition, including the film thickness direction, respond. The white transmittance of the display device is improved. Therefore, the contrast ratio, which is the ratio of the white transmittance to the black transmittance, can also be made higher.

[0109] The spacers 450 are provided to control the film thickness (cell gap) of the liquid crystal composition 444. In a liquid crystal display device using the liquid crystal composition 444, the thickness of the liquid crystal composition 444 is The cell gap is preferably 1 μm or more and 20 μm or less. Here, the thickness of the cell gap is the maximum value of the thickness (film thickness) of the liquid crystal composition.

[0110] The spacers may be provided on the first structure 449 and / or the second structure 445 . In this embodiment, the spacer 450 is provided on the first structure 449. On the structure 449, a spacer 450 and a first electrode layer 447, which is a pixel electrode layer, are formed on the same surface. are formed adjacent to each other.

[0111] In this way, the first structure 449 is extended to the area where the spacer 450 is disposed. Since the first structure 449 is the same continuous film, the surface of the first structure 449 is approximately The same surface height is formed as a continuous area, and the spacers 450 are provided with good adhesion and stability. can be done.

[0112] In addition, by providing the first structure 449 continuously and widely up to the formation region of the spacer 450, Therefore, when the spacer 450 formed on the opposing substrate side is arranged on the element substrate side, the spacer The spacer 450 can be stably arranged in a wide area. Since it is arranged on a surface at the same height as the upper surface (highest protruding surface) of the first structure 449, Even if the spacer 450 provided on the opposing substrate moves on the element substrate side for alignment, There is no risk of damaging the adjacent first structure 449 and second structure 445.

[0113] Therefore, defects caused by the process of arranging the spacers 450 and misalignment of the arrangement position can be reduced. The yield can be improved.

[0114] The spacer 450 is placed in a nearly horizontal area in the liquid crystal display device with few steep irregularities or steps. Since the spacer 450 can be stably installed, it is not easily damaged or misshapen due to physical impact. This reduces the resistance to physical shocks, making it possible to provide high resistance to physical shocks.

[0115] Therefore, it is an object of the present invention to provide a liquid crystal display device that is resistant to physical impacts and can maintain high-quality display characteristics. Furthermore, it is possible to provide a highly reliable and high performance liquid crystal display device.

[0116] In this embodiment, the liquid crystal composition 444 is a mixture of nematic liquid crystal, a chiral agent, and a polymerizable monomer. A liquid crystal composition that contains a polymerization initiator and exhibits a blue phase is used, and the liquid crystal composition is subjected to a polymer stabilization treatment. Therefore, the state in which the blue phase is expressed (also referred to as the state in which the blue phase is exhibited or the state in which the blue phase is shown) The liquid crystal composition 444 contains a polymer compound. can be.

[0117] The transistor 420 is an inverted staggered thin film transistor and is formed on a substrate having an insulating surface. A gate electrode layer 401, a gate insulating layer 402, a semiconductor layer 403, and a gate insulating layer 404 are formed on a first substrate 441. 403, wiring layers 405a and 405b functioning as source and drain electrode layers, nothing.

[0118] The structure of a transistor applicable to the liquid crystal display device disclosed in this specification is not particularly limited. For example, a top gate structure or a staggered or planar type of bottom gate structure may be used. In addition, the transistor has a single gate structure in which one channel forming region is formed. The structure can be either a double gate structure with two gates or a triple gate structure with three gates. In addition, two gate insulating layers may be disposed above and below the channel region. It may be a dual gate type having a gate electrode layer.

[0119] An insulating film 407 is provided to cover the transistor 420 and to be in contact with the semiconductor layer 403. An interlayer film 413 is laminated on the substrate 07.

[0120] The method for forming the interlayer film 413 is not particularly limited, and may be spin coating, dipping, or the like depending on the material. , spray coating, droplet ejection method (inkjet method), screen printing, offset printing, etc. Coating methods such as roll coating, curtain coating, and knife coating can be used.

[0121] A liquid crystal composition 444 is sandwiched between a first substrate 441 and a second substrate 442 which is an opposing substrate. The liquid crystal composition 444 is formed by a dispenser method (dropping or by bonding the first substrate 441 and the second substrate 442 together and then using capillary action or the like. A liquid crystal injection method can be used.

[0122] As the sealing material, a visible light curing, ultraviolet curing or thermosetting resin is typically used. It is preferable to use an acrylic resin, an epoxy resin, an amine resin, or the like. In addition, photopolymerization initiators (typically ultraviolet light), heat curing agents, fillers, coupling agents, etc. The composition may also contain a blocking agent.

[0123] When a photo-curable resin such as ultraviolet light is used as a sealing material and a liquid crystal composition is formed by a dropping method, The sealing material may also be hardened by the light irradiation step of the molecular stabilization treatment.

[0124] In this embodiment, a polarizing plate 44 is provided on the outer side of the first substrate 441 (on the side opposite to the liquid crystal composition 444). 3a, a polarizing plate 443b is provided on the outer side of the second substrate 442 (on the side opposite to the liquid crystal composition 444). In addition to the polarizing plate, optical films such as a retardation plate and an anti-reflection film may be provided. For example, circularly polarized light produced by a polarizing plate and a retardation plate may be used. can be completed.

[0125] In addition, when multiple liquid crystal display devices are manufactured using large substrates (so-called multiple panel manufacturing), The cutting step can be carried out before the polymer stabilization treatment or before the polarizing plate is provided. Considering the influence on the liquid crystal composition (such as alignment disorder due to the force applied during the dividing process) Preferably, the treatment is performed after the first substrate and the second substrate are bonded together and before the polymer stabilization treatment.

[0126] Although not shown, a backlight, a sidelight, or the like may be used as the light source. The substrate is a first substrate 441, and the second substrate 442 is a visible substrate. It is irradiated.

[0127] The first electrode layer 447 and the second electrode layer 446 are made of an indium oxide containing tungsten oxide. oxide, indium zinc oxide with tungsten oxide, indium oxide with titanium oxide Indium tin oxide containing titanium oxide, indium tin oxide, indium zinc oxide , silicon oxide-doped indium tin oxide, graphene, and other transparent conductive materials Fees can be used.

[0128] The first electrode layer 447 and the second electrode layer 446 are made of tungsten (W) or molybdenum. (Mo), zirconium (Zr), hafnium (Hf), vanadium (V), niobium (N b), Tantalum (Ta), Chromium (Cr), Cobalt (Co), Nickel (Ni), Titanium Metals such as titanium (Ti), platinum (Pt), aluminum (Al), copper (Cu), and silver (Ag), It can be formed by using one or more of the metals, alloys thereof, or metal nitrides thereof. Cut.

[0129] The first electrode layer 447 and the second electrode layer 446 are made of a conductive polymer (conductive polymer). The conductive composition can be formed by using a conductive composition containing a conductive material. The pixel electrode formed by this method has a sheet resistance of 10,000 Ω / □ or less and a transparency at a wavelength of 550 nm. The conductive polymer contained in the conductive composition preferably has a light efficiency of 70% or more. The resistivity is preferably 0.1 Ω·cm or less.

[0130] As the conductive polymer, a so-called π-electron conjugated conductive polymer can be used. For example, polyaniline or its derivatives, polypyrrole or its derivatives, polythiophene or its derivatives, derivatives thereof, or copolymers or copolymers of two or more of aniline, pyrrole and thiophene and derivatives thereof.

[0131] An insulating film serving as a base film may be provided between the first substrate 441 and the gate electrode layer 401. The film has a function of preventing the diffusion of impurity elements from the first substrate 441, and the silicon nitride film , a silicon oxide film, a silicon nitride oxide film, a silicon oxynitride film, or an aluminum oxide film The gate electrode can be formed as a single layer or a laminate structure using one or more films selected from the following. The materials of the port electrode layer 401 and the common wiring layer 408 are molybdenum, titanium, chromium, tantalum, and the like. Metallic materials such as zinc, tungsten, aluminum, copper, neodymium, scandium, etc., or The layer can be formed as a single layer or a multilayer using an alloy material containing the material as a main component. The gate electrode layer 401 and the common wiring layer 408 are made of a multi-crystal material doped with an impurity element such as phosphorus. Semiconductor films such as crystalline silicon films and silicide films such as nickel silicide can also be used. good.

[0132] The gate electrode layer 401 and the common wiring layer 408 are made of indium oxide, tin oxide, and tin oxide. Indium oxide containing tungsten oxide, Indium zinc oxide containing tungsten oxide , indium oxide containing titanium oxide, indium tin oxide containing titanium oxide, indium oxide Conductive materials such as indium zinc oxide and indium tin oxide doped with silicon oxide are used. Alternatively, the conductive material and the metallic material may be laminated together.

[0133] The gate electrode layer 401 and the common wiring layer 408 are formed of a metal oxide containing nitrogen, specifically These include nitrogen-containing In-Ga-Zn-O films, nitrogen-containing In-Sn-O films, and nitrogen-containing In-Ga-O films containing nitrogen, In-Zn-O films containing nitrogen, Sn-O films containing nitrogen, An In-O film containing InN or a metal nitride film (InN, SnN, etc.) can be used.

[0134] For example, the two-layer laminate structure of the gate electrode layer 401 and the common wiring layer 408 may be aluminum. Two-layer laminate structure with a molybdenum layer laminated on an aluminum layer, or a molybdenum layer laminated on a copper layer a two-layer structure in which a titanium nitride layer or a tantalum nitride layer is laminated on a copper layer; It is preferable to use a two-layer structure in which a titanium nitride layer and a molybdenum layer are laminated. The structure is a tungsten layer or a tungsten nitride layer and an alloy of aluminum and silicon. A laminated structure in which a layer or an alloy layer of aluminum and titanium is laminated with a titanium nitride layer or a titanium layer. It is preferable to use this structure.

[0135] The gate insulating layer 402 is formed by depositing silicon oxide using a plasma CVD method, a sputtering method, or the like. silicon film, gallium oxide film, aluminum oxide film, silicon nitride film, silicon oxynitride film, The insulating film can be formed using an aluminum nitride film, a silicon nitride oxide film, or the like. , hafnium oxide, yttrium oxide, lanthanum oxide as the material of the gate insulating layer 402; Hafnium Silicate (HfSi x O y (x>0, y>0)), hafnium aluminate (HfAl x O y (x>0, y>0)), nitrogen-doped hafnium silicate, nitrogen High-k materials such as hafnium aluminate doped with Cr may also be used. The use of high-k materials can reduce gate leakage current.

[0136] The gate insulating layer 402 is formed by depositing silicon oxide by a CVD method using organic silane gas. It is also possible to form a layer. The organic silane gas is tetraethoxysilane (TE OS: Chemical formula Si(OC2H5)4), tetramethylsilane (TMS: Chemical formula Si(CH 3) 4), Tetramethylcyclotetrasiloxane (TMCTS), Octamethylcyclotetrasiloxane Triethoxysilane (OMCTS), hexamethyldisilazane (HMDS), triethoxysilane Silane (SiH(OC2H5)3), tris(dimethylamino)silane (SiH(N(CH3) The gate insulating layer 402 can be formed of a silicon-containing compound such as 2) or 3). It may have a single layer structure or a laminated structure.

[0137] The material used for the semiconductor layer 403 is not particularly limited, and may be selected depending on the characteristics required for the transistor 420. Examples of materials that can be used for the semiconductor layer 403 will be described below.

[0138] The semiconductor layer 403 is formed from a semiconductor material gas such as silane or germane. Amorphous (Al) films are produced by physical vapor deposition methods such as chemical vapor deposition and sputtering. (Also called amorphous semiconductors.) Polycrystalline semiconductors are those that are crystallized by the process of annealing, or microcrystalline semiconductors that have a mixture of fine crystalline and amorphous phases. The semiconductor layer can be formed by sputtering, LPCVD, or plating. The film can be formed by the Zuma CVD method or the like.

[0139] Representative amorphous semiconductors include hydrogenated amorphous silicon and crystalline semiconductors. A typical example is polysilicon. Polysilicon (polycrystalline silicon) has the following features: , which uses polysilicon as the main material and is formed through a process temperature of 800°C or higher. The main materials are high-temperature polysilicon and polysilicon formed at process temperatures below 600°C. The so-called low-temperature polysilicon is used as a material for the crystallization of amorphous silicon. It contains polysilicon, which is made by crystallizing silicon. Of course, as mentioned above, A semiconductor or a semiconductor layer containing a crystalline phase in part can also be used.

[0140] Alternatively, an oxide semiconductor film may be used as the semiconductor layer 403. It is preferable that the alloy contains at least indium (In), and particularly preferably contains In and zinc (Zn). A stabilizer for reducing variations in the electrical characteristics of transistors using oxide semiconductors It is preferable that the stabilizer further contains gallium (Ga). It is preferable to have tin (Sn) as a stabilizer. It is preferable to use aluminum (Al) as a stabilizer. It is preferable that the stabilizer contains zirconium (Zr). is preferred.

[0141] Other stabilizers include lanthanides such as lanthanum (La) and cerium ( Ce), praseodymium (Pr), neodymium (Nd), samarium (Sm), europium (Eu), gadolinium (Gd), terbium (Tb), dysprosium (Dy), hol Mium (Ho), Erbium (Er), Thulium (Tm), Ytterbium (Yb), Ru It may contain one or more of tetraethion (Te) and tetraethion (Tb).

[0142] For example, oxide semiconductors include indium oxide, tin oxide, zinc oxide, and oxides of binary metals. In-Zn oxides, In-Mg oxides, In-Ga oxides, and ternary metal oxides In-Ga-Zn oxide (also written as IGZO), In-Al-Zn oxide Oxides, In-Sn-Zn oxides, In-Hf-Zn oxides, In-La-Zn oxides oxides, In-Ce-Zn oxides, In-Pr-Zn oxides, In-Nd-Zn oxides In-Sm-Zn oxides, In-Eu-Zn oxides, In-Gd-Zn oxides , In-Tb-Zn oxide, In-Dy-Zn oxide, In-Ho-Zn oxide, In-Er-Zn oxide, In-Tm-Zn oxide, In-Yb-Zn oxide, I n-Lu-Zn ​​oxide, In-Sn-Ga-Zn oxide, which is an oxide of a quaternary metal, In-Hf-Ga-Zn oxide, In-Al-Ga-Zn oxide, In-Sn-Al -Zn-based oxides, In-Sn-Hf-Zn-based oxides, In-Hf-Al-Zn-based oxides It can be used.

[0143] Here, for example, In-Ga-Zn oxide is a material containing In, Ga, and Zn as its main components. The ratio of In, Ga, and Zn is not important. Metal elements other than a and Zn may be included.

[0144] In addition, as an oxide semiconductor, InMO3(ZnO) m (m>0 and m is not an integer) It is also possible to use a material represented by the formula: where M is selected from Ga, Fe, Mn, and Co. It refers to one or more metal elements. In addition, as an oxide semiconductor, In2SnO5 (ZnO) n A material expressed as (n>0 and n is an integer) may be used.

[0145] For example, In:Ga:Zn=1:1:1 (=1 / 3:1 / 3:1 / 3), In:Ga:Z n=2:2:1 (=2 / 5:2 / 5:1 / 5), or In:Ga:Zn=3:1:2 In-Ga-Zn oxides with atomic ratios of (=1 / 2:1 / 6:1 / 3) and their neighboring compositions Alternatively, an oxide of In:Sn:Zn=1:1:1 (=1 / 3: 1 / 3:1 / 3), In:Sn:Zn=2:1:3(=1 / 3:1 / 6:1 / 2) or is In-Sn with an atomic ratio of In:Sn:Zn=2:1:5 (=1 / 4:1 / 8:5 / 8). It is preferable to use a -Zn-based oxide or an oxide having a composition close to that.

[0146] However, oxide semiconductors are not limited to these, and may have the required semiconductor properties (mobility, threshold In addition, it is possible to use a material with an appropriate composition depending on the required semiconductor characteristics. In order to obtain the carrier density, impurity concentration, defect density, atomic ratio of metal elements to oxygen, atomic It is preferable to set the spacing, density, etc. appropriately.

[0147] For example, high mobility can be obtained relatively easily with In-Sn-Zn oxides. Therefore, even in In-Ga-Zn oxides, the mobility can be increased by reducing the defect density in the bulk. It can be done.

[0148] For example, when the atomic ratio of In, Ga, and Zn is In:Ga:Zn=a:b:c(a+b+ The composition of the oxide with c=1) is In:Ga:Zn=A:B:C (A+B+C = 1), the oxide composition is close to (aA) 2 +(bB) 2 + (cC) 2 ≦r 2 The above condition is satisfied, and r can be set to 0.05, for example. The same is true for monsters.

[0149] The oxide semiconductor film may be in a single-crystal, polycrystalline (also referred to as polycrystalline), amorphous, or other state. Take a stance.

[0150] Preferably, the oxide semiconductor film is a CAAC-OS (C Axis Aligned Cr The film is a crystalline oxide semiconductor.

[0151] The CAAC-OS film is neither completely single crystalline nor completely amorphous. The oxide semiconductor film has a crystalline-amorphous mixed phase structure in which a crystalline portion is included in an amorphous phase. The crystal portion is often sized to fit within a cube with one side less than 100 nm. Transmission Electron Microscope (TEM) In the observation image using a microscope, the boundary between the amorphous and crystalline parts in the CAAC-OS film was The grain boundaries in the CAAC-OS film were not clearly observed by TEM. Therefore, the CAAC-OS film is not affected by electron transfer due to grain boundaries. The decrease in mobility is suppressed.

[0152] The crystal part included in the CAAC-OS film has a c-axis that is the normal vector of the surface on which the CAAC-OS film is formed. The triangle is aligned parallel to the normal vector of the sphere or surface and perpendicular to the ab plane. The metal atoms are arranged in a layered or hexagonal shape when viewed perpendicular to the c-axis. Metal atoms and oxygen atoms are arranged in layers. The orientation of the a and b axes may be different. The range of 5° to 95° is also included. This also includes the range of 10° to 5°.

[0153] In the CAAC-OS film, the distribution of the crystal parts may not be uniform. In the process of forming the C-OS film, when crystal growth is performed from the surface side of the oxide semiconductor film, The proportion of crystalline parts may be higher near the surface than near the growth surface. By adding impurities to the AC-OS film, the crystalline part in the impurity-doped region becomes amorphous. It may also be pawned.

[0154] The c-axis of the crystalline part in the CAAC-OS film is the normal vector of the surface on which the CAAC-OS film is formed. The CAAC-OS film shape (on which the film is formed) is Depending on the cross-sectional shape of the surface or the cross-sectional shape of the surface, they may face in different directions. The direction of the c-axis of the crystal is the normal vector of the surface on which the CAAC-OS film is formed. The direction of the crystal is parallel to the normal vector of the film or surface. is formed by carrying out a crystallization treatment such as a heat treatment after the film formation.

[0155] The electrical characteristics of a transistor using a CAAC-OS film change when irradiated with visible or ultraviolet light. Therefore, the transistor has high reliability.

[0156] Note that part of oxygen contained in the oxide semiconductor film may be substituted with nitrogen.

[0157] In addition, in oxide semiconductors with crystalline parts such as CAAC-OS, defects in the bulk can be further reduced. By improving the surface flatness, the movement can be reduced more than that of an amorphous oxide semiconductor. To improve the flatness of the surface, it is necessary to deposit an oxide semiconductor on a flat surface. Specifically, it is preferable to form a surface having an average surface roughness (Ra) of 1 nm or less, preferably 0 It is preferable to form it on the surface with a thickness of 0.3 nm or less, more preferably 0.1 nm or less.

[0158] In the manufacturing process of semiconductor layers and wiring layers, etching is performed to process thin films into the desired shape. The etching process can be dry etching or wet etching. can.

[0159] The etching conditions (etching) are adjusted to suit the material so that the desired processing shape can be etched. The etching conditions (liquid, etching time, temperature, etc.) are adjusted appropriately.

[0160] The wiring layers 405a and 405b functioning as source and drain electrode layers are made of is an element selected from Al, Cr, Ta, Ti, Mo, and W, or a material containing the above elements as a component. The alloy may be a film of a combination of the above elements. For this purpose, it is preferable to provide the conductive film with heat resistance that can withstand this heat treatment. However, since it has poor heat resistance and is prone to corrosion, it is necessary to combine it with a heat-resistant conductive material. The heat-resistant conductive materials that can be combined with Al include titanium (Ti), tantalum (Ta), and Ta (Ta), Tungsten (W), Molybdenum (Mo), Chromium (Cr), Neodymium (N d), scandium (Sc), or an alloy containing the above elements; The film is formed from an alloy film of a combination of the above elements, or a nitride film containing the above elements as components.

[0161] The gate insulating layer 402, the semiconductor layer 403, and the semiconductor layer 404 function as a source electrode layer or a drain electrode layer. The wiring layers 405a and 405b may be formed successively without being exposed to the atmosphere. By continuously forming films without contact, the film is free from atmospheric components and polluting impurity elements floating in the air. Since each layer interface can be formed without contamination, variations in transistor characteristics can be reduced. This can reduce the amount of work required.

[0162] The semiconductor layer 403 is a semiconductor layer that is only partially etched and has a groove (recess). do.

[0163] The insulating film 407 and the interlayer film 413 covering the transistor 420 are formed by a dry method or a wet method. Inorganic insulating films and organic insulating films can be used. For example, CVD methods and sputtering methods can be used. Silicon nitride film, silicon oxide film, silicon oxynitride film, aluminum oxide film, etc. The film may be a tantalum oxide film or a polyimide film. Organic materials such as benzocyclobutene resin, polyamide, and epoxy can be used. In addition to the above organic materials, low-k materials, siloxane resins, PSG ( phosphosilicate glass, BPSG (boron phosphosilicate glass), etc. can be used. Alternatively, the insulating film 407 may be a gallium oxide film.

[0164] Siloxane-based resin is a Si-OS compound formed using siloxane-based materials as starting materials. The siloxane resin corresponds to a resin containing an i bond. Alternatively, an organic group having a fluoro group may be used. The siloxane resin may be formed into a film by coating and then baked to form an insulating film 407. It can be used as:

[0165] Note that by stacking a plurality of insulating films made of these materials, the insulating film 407 and the interlayer film For example, a structure in which an organic resin film is laminated on an inorganic insulating film may be used. stomach.

[0166] Also, a resist having regions of multiple thicknesses (typically two types) formed by a multi-tone mask is used. By using a photomask, the number of photolithography steps can be reduced, simplifying the process. This allows for simplification and cost reduction.

[0167] As described above, it is an object of the present invention to provide a liquid crystal display device that is resistant to physical impacts and can maintain high-quality display characteristics. It is possible.

[0168] A highly reliable and high-performance liquid crystal display device can be provided.

[0169] This embodiment mode can be implemented by being appropriately combined with the configurations described in other embodiments. is.

[0170] (Embodiment 3) A transistor is manufactured, and the transistor is used in a pixel portion and a driver circuit to realize a display function. In addition, a liquid crystal display device having a transistor can be manufactured. The entire display unit or the entire display unit can be formed on the same substrate as the pixel unit to form a system-on-panel. can.

[0171] A liquid crystal display device includes a liquid crystal element (also called a liquid crystal display element) as a display element.

[0172] The liquid crystal display device comprises a panel in which a display element is sealed, and a controller for the panel. Furthermore, the liquid crystal display device includes a module in which an IC including a controller is mounted. Regarding the element substrate corresponding to one form before the display element is completed in the manufacturing process, The daughter substrate includes means for supplying a current to each of the plurality of pixels. Specifically, only the pixel electrodes of the display element may be formed, or the pixel electrodes may be formed. Even after the conductive film is formed and before the pixel electrode is formed by etching, Yes, all forms apply.

[0173] In this specification, the liquid crystal display device is an image display device, a display device, or refers to a light source (including lighting equipment). Also, connectors, such as FPC (Flexible Printed Circuit) printed circuit) or TAB (Tape Automated B Tape or TCP (Tape Carrier Package) A module with a printed wiring board attached to the end of a TAB tape or TCP. The module or display element is mounted on an IC (integrated circuit) using the COG (Chip On Glass) method. The liquid crystal display device also includes all modules on which a display device (such as a display circuit) is directly mounted.

[0174] The appearance and cross section of a liquid crystal display panel, which is one form of liquid crystal display device, will be described with reference to FIG. 4A1 and 4A2 show a transistor 4 formed on a first substrate 4001. The liquid crystal element 4013 is disposed between the second substrate 4006 and the liquid crystal display panel 4008. 4(A1) and 4(A2). This corresponds to a cross-sectional view at MN.

[0175] A pixel portion 4002 and a scanning line driver circuit 4004 are provided on a first substrate 4001. In this way, a sealing material 4005 is provided. A second substrate 4006 is provided on the path 4004. The line driver circuit 4004 is made up of a first substrate 4001, a sealing material 4005, and a second substrate 4006. The liquid crystal composition 4008 is sealed together with the liquid crystal composition 4008 .

[0176] FIG. 4(A1) shows an area surrounded by a sealing material 4005 on a first substrate 4001. A single crystal semiconductor film or a polycrystalline semiconductor film is formed on a separately prepared substrate in a region different from the region. A signal line driver circuit 4003 is mounted. In this example, a part of the transistor is formed by a transistor provided on a first substrate 4001. A signal line driver circuit 4003b is formed on the board 4001, and a single-ended signal line driver circuit 4003b is formed on a separately prepared substrate. A signal line driver circuit 4003a formed of a crystalline semiconductor film or a polycrystalline semiconductor film is mounted. .

[0177] The method of connecting the separately formed drive circuit is not particularly limited, and may be a COG method, The wire bonding method or the TAB method can be used. 4A2 shows an example of mounting a signal line driver circuit 4003 by the COG method. This is an example in which the signal line driver circuit 4003a is implemented by Method B.

[0178] A pixel portion 4002 and a scanning line driver circuit 4004 are provided on a first substrate 4001. The pixel portion 4002 includes a plurality of transistors. 4004 and a transistor 4010 included in the scanning line driver circuit 4004. An insulating layer 4020 and an interlayer film 4021 are provided over the transistors 4010 and 4011. are.

[0179] The transistors 4010 and 4011 can be the transistors described in Embodiment 2. can.

[0180] In addition, the transistor 40 for the driver circuit is formed over the interlayer film 4021 or the insulating layer 4020. A conductive layer may be provided at a position overlapping with the channel formation region of the semiconductor layer 11. The gate electrode layer of the second transistor 4011 may be the same as or different from the gate electrode layer of the second transistor 4012. It can also function as a gate electrode layer. The conductive layer may be in a floating state.

[0181] In addition, a first structure 40 provided on the interlayer film 4021 so as to protrude into the liquid crystal composition 4008 A pixel electrode layer 4030 is formed on the transistor 37. On the interlayer film 4021, a common electrode layer 4031 is formed, and the liquid crystal composition 40 The liquid crystal element 401 is provided on a second structure 4038 that is provided protruding into the liquid crystal element 401. 3 includes a pixel electrode layer 4030, a common electrode layer 4031, and a liquid crystal composition 4008. The first substrate 4001 and the second substrate 4006 are provided with polarizing plates 4032a and 4033 on the outer surfaces thereof, respectively. 2b is provided.

[0182] In this embodiment, the liquid crystal composition 4008 is a mixture of nematic liquid crystal, chiral agent, and polymerizable monomer. A liquid crystal composition that contains a polymer and a polymerization initiator and exhibits a blue phase is used, and polymer stabilization treatment is performed. Therefore, the state in which the blue phase is expressed (the state in which the blue phase is exhibited or the state in which the blue phase is exhibited) The liquid crystal composition 4008 contains an organic compound. It can be enjoyed.

[0183] The pixel electrode layer 4030 and the common electrode layer 4031 are formed of the pixel electrode layer 4030 and the common electrode layer 4031. The pixel electrode layer 4030 and the common electrode layer can be configured as follows. The pole layer 4031 has a shape with an opening pattern.

[0184] a pixel electrode layer 4030 provided to cover the top surface and side surfaces of the first structure body 4037; and a common electrode layer 4031 provided to cover the upper and side surfaces of the two structures 4038. By this, in the liquid crystal composition 4008, the pixel electrode layer 4030 and the common electrode layer 40 A wide electric field can be formed between the electrode 31 and the electrode 32.

[0185] Therefore, it is possible to make the liquid crystal molecules in the entire liquid crystal composition, including the film thickness direction, respond, and white transparency is obtained. Therefore, the contrast ratio, which is the ratio of white transmittance to black transmittance, can also be increased. can be done.

[0186] The spacer 4035 is used to control the film thickness (cell gap) of the liquid crystal composition 4008. In the liquid crystal display device using the liquid crystal composition 4008, the thickness of the liquid crystal composition is The cell gap is preferably 1 μm or more and 20 μm or less. Here, the thickness of the cell gap is the maximum value of the thickness (film thickness) of the liquid crystal composition.

[0187] The spacers 4035 can be provided on the first structure and / or the second structure. In this embodiment, the spacer 4035 is provided on the second structure 4038. On the structure 4038, a spacer 4035 and a common electrode layer 4031 are formed adjacent to each other on the same surface. It has been done.

[0188] In this way, the second structure 4038 is extended to the region where the spacer 4035 is disposed. Since the second structure 4038 is the same continuous film, the second structure 4038 The surface becomes a continuous area with almost the same surface height, and the spacer 4035 is attached with good adhesion and stability. It can be established.

[0189] In addition, the second structure 4038 is provided continuously and widely up to the formation region of the spacer 4035. By this, when the spacer 4035 formed on the opposing substrate side is arranged on the element substrate side, It is possible to provide a wide area where the spacer 4035 can be stably arranged. 035 is disposed on a surface at the same height as the upper surface (highest protruding surface) of the second structure 4038. Therefore, the spacer 4035 provided on the opposing substrate is positioned on the element substrate side for alignment. Even if the first structure 4037 and the second structure 4038 are moved in this manner, there is a risk of damaging the adjacent first structure 4037 and the second structure 4038. There is no leak.

[0190] Therefore, defects caused by the process of arranging the spacers 4035 and misalignment of the arrangement position can be reduced. , the yield can be improved.

[0191] The spacer 4035 is placed in a nearly horizontal area with few steep irregularities or steps in the liquid crystal display device. Since the spacer 4035 can be stably installed, it is not easily damaged or deformed by physical impact. Defects can be reduced and high resistance to physical shocks can be imparted.

[0192] Therefore, it is an object of the present invention to provide a liquid crystal display device that is resistant to physical impacts and can maintain high-quality display characteristics. Furthermore, it is possible to provide a highly reliable and high performance liquid crystal display device.

[0193] Although FIG. 4 shows an example of a transmissive liquid crystal display device, the invention disclosed in this specification is applicable to a semi-transmissive liquid crystal display device. The present invention can be applied to both liquid crystal display devices and reflective liquid crystal display devices.

[0194] The first substrate 4001 and the second substrate 4006 are made of a transparent material such as glass or plastic. As for plastic, PVF (polyvinyl fluoride) ) film, polyester film or acrylic resin film can be used. Also, a sheet with a structure in which aluminum foil is sandwiched between PVF film or polyester film. and FRP (Fiberglass-Reinforced Plastics) plates. In the case of a reflective liquid crystal display device, the first substrate 400, which is not the viewing side, The first or second substrate 4006 is a metal substrate such as an aluminum substrate or a stainless steel substrate. It's fine.

[0195] In addition, in the liquid crystal display device of FIG. 4, an example in which a polarizing plate is provided on the outer side (viewing side) of the substrate is shown. The polarizing plate may be provided on the inside of the substrate. In addition, a light-shielding layer that functions as a black matrix may be provided.

[0196] In FIG. 4, a light-shielding layer 4034 is provided to cover the upper portions of the transistors 4010 and 4011. In this example, the light-shielding layer 4034 is provided on the substrate 4006 side. Furthermore, the effects of improving contrast and stabilizing transistors can be enhanced.

[0197] Furthermore, a color filter layer or a light-shielding layer may be formed as part of the interlayer film 4021 .

[0198] The transistor may be covered with an insulating layer 4020 which functions as a protective film. Not determined.

[0199] The protective film is designed to prevent the intrusion of polluting impurities such as organic matter, metals, and water vapor from the atmosphere. The protective film is preferably a dense film. film, silicon nitride film, silicon oxynitride film, silicon nitride oxide film, aluminum oxide film, A single layer of an aluminum nitride film, an aluminum oxynitride film, or an aluminum nitride oxide film, or may be formed by laminating layers.

[0200] In addition, when a light-transmitting insulating layer is further formed as a planarizing insulating film, polyimide, acrylic Heat-resistant organic materials such as benzocyclobutene resin, polyamide, and epoxy are used. In addition to the above organic materials, low dielectric constant materials (low-k materials), siloxane San-based resin, PSG (phosphosilicate glass), BPSG (borophosphosilicate glass), etc. In addition, by stacking multiple insulating films made of these materials, it is possible to achieve high insulation. A border layer may be formed.

[0201] The method for forming the insulating layer to be laminated is not particularly limited, and may be a sputtering method, a sintering method, or the like, depending on the material. Pin coating, dip method, spray coating method, droplet ejection method (inkjet method), screen Printing, offset printing, roll coating, curtain coating, knife coating, etc. This can be done.

[0202] The pixel electrode layer 4030 and the common electrode layer 4031 are made of indium oxide containing tungsten oxide. Indium zinc oxide containing tungsten oxide, Indium oxide containing titanium oxide , indium tin oxide containing titanium oxide, indium tin oxide, indium zinc oxide, Conductive materials with light transmission properties, such as silicon oxide-doped indium tin oxide and graphene can be used.

[0203] The pixel electrode layer 4030 and the common electrode layer 4031 are made of tungsten (W), molybdenum ( Mo), zirconium (Zr), hafnium (Hf), vanadium (V), niobium (Nb ), Tantalum (Ta), Chromium (Cr), Cobalt (Co), Nickel (Ni), Titanium (Ti), platinum (Pt), aluminum (Al), copper (Cu), silver (Ag), and other metals, can be formed using one or more of the alloys or metal nitrides thereof. do.

[0204] The pixel electrode layer 4030 and the common electrode layer 4031 are made of a conductive polymer (conductive polymer The conductive layer can be formed using a conductive composition containing (also referred to as "a conductive layer").

[0205] A signal line driver circuit 4003 and a scanning line driver circuit 4004 or a pixel portion 40 Various signals and potentials applied to O2 are supplied from FPC4018.

[0206] In addition, since transistors are easily damaged by static electricity, etc., It is preferable to provide a protection circuit for protecting the drive circuit on the same substrate. It is preferable to use linear elements.

[0207] In FIG. 4, the connection terminal electrode 4015 is formed from the same conductive film as the pixel electrode layer 4030. The electrode 4016 is a source electrode layer and a drain electrode layer of the transistors 4010 and 4011. It is formed of the same conductive film as

[0208] The connection terminal electrode 4015 is connected to the terminal of the FPC 4018 via the anisotropic conductive film 4019. are electrically connected.

[0209] In FIG. 4, a signal line driver circuit 4003 is formed separately and mounted on the first substrate 4001. However, the present invention is not limited to this configuration. Alternatively, only a part of the signal line driver circuit or a part of the scanning line driver circuit may be separately formed. It may also be worn.

[0210] As described above, it is an object of the present invention to provide a liquid crystal display device that is resistant to physical impacts and can maintain high-quality display characteristics. It is possible.

[0211] A highly reliable and high-performance liquid crystal display device can be provided.

[0212] This embodiment mode can be implemented by being appropriately combined with the configurations described in other embodiments. is.

[0213] (Fourth embodiment) In this embodiment, an electronic device according to one embodiment of the present invention will be described. An electronic device to which the liquid crystal display device shown in this embodiment is applied will be described with reference to FIG.

[0214] As an electronic device to which a liquid crystal display device is applied, for example, a television device (television or television) (also called revision receivers), monitors for computers, digital cameras, digital Video cameras, digital photo frames, mobile phones (also called mobile phones or mobile phone devices) ), portable game machines, personal digital assistants, audio playback devices, large game machines such as pachinko machines, etc. Specific examples of these electronic devices are shown in Figure 6.

[0215] FIG. 6A shows an example of a television device. The television device 7100 is A display unit 7103 is built into the body 7101. The display unit 7103 displays images. The liquid crystal display device described in the above embodiment mode can be used for the display portion 7103. The liquid crystal display device described in the above embodiment has a high physical strength. Even if a physical shock is applied to the television, no display defects occur, and the television is highly reliable. In addition, a configuration in which the housing 7101 is supported by a stand 7105 is shown here. is doing.

[0216] The television device 7100 can be operated using an operation switch provided on the housing 7101 or a separate remote control. This can be done using the remote control operation device 7110. The channel and volume can be controlled by the 7109, and the information displayed on the display 7103 is In addition, the remote control unit 7110 can be used to operate the video. A display unit 7107 for displaying information output from 7110 may be provided.

[0217] The television device 7100 is configured to include a receiver, a modem, etc. It can receive more general TV broadcasts and can also receive them via wired or wireless modems. By connecting to a communication network, it can be one-way (sender to receiver) or two-way. It is also possible to communicate information (between a sender and a receiver, or between receivers).

[0218] FIG. 6B shows a computer, which includes a main body 7201, a housing 7202, a display unit 7203, and a keyboard. It includes a board 7204, an external connection port 7205, a pointing device 7206, and the like. The liquid crystal display device described in the above embodiment mode can be used for the display portion 7203 of a computer. The liquid crystal display device described in the above embodiment has a high physical strength, and therefore, it is possible to carry or use the display. Even if physical shock is applied to the display, the display will not be damaged, making the computer highly reliable. This can be done.

[0219] FIG. 6C shows a portable gaming machine, which is composed of two housings, a housing 7301 and a housing 7302. The housing 7301 is connected to the display unit 7302 by a connecting portion 7303 so as to be openable and closable. 304 is incorporated in the housing 7302, and a display portion 7305 is incorporated in the housing 7302. The portable gaming machine shown in (C) also includes a speaker unit 7306, a recording medium insertion unit 7307, LED lamp 7308, input means (operation keys 7309, connection terminal 7310, sensor 731 1 (force, displacement, position, velocity, acceleration, angular velocity, rotation speed, distance, light, liquid, magnetism, temperature, chemistry Material, sound, time, hardness, electric field, current, voltage, power, radiation, flow rate, humidity, gradient, vibration, (including the function of measuring odor or infrared rays), microphone 7312) Of course, the configuration of the portable gaming machine is not limited to the above, and at least the display unit 73 The liquid crystal display device described in the above embodiment mode is used for both or either of the display portion 7304 and the display portion 7305. The display units 7304 and 7305 can be equipped with other accessories. The portable gaming machine shown in FIG. 6(C) can be configured to have a suitable configuration. It has the function of reading out the programs or data stored in the It has the function of sharing information with gaming machines through wireless communication. The functions of the gaming machine are not limited to these, and the gaming machine may have a variety of functions.

[0220] FIG. 6D shows an example of a mobile phone. A mobile phone 7400 is provided in a housing 7401. In addition to the built-in display unit 7402, operation buttons 7403, external connection port 7404, The liquid crystal display device described in the above embodiment mode is The liquid crystal display device can be used for the display portion 7402 of the mobile phone 7400. The display device is physically strong, so it can withstand physical shocks when carried or used. This results in a highly reliable mobile phone without display defects.

[0221] In a mobile phone 7400 shown in FIG. 6D, information can be displayed by touching the display portion 7402 with a finger or the like. You can also make a call or write an email using the This can be done by touching the display portion 7402 with a finger or the like.

[0222] The screen of the display unit 7402 has three main modes. The first is a display mode that mainly displays images. The first mode is a display mode, and the second mode is an input mode that mainly inputs information such as characters. This is a display + input mode that combines two modes: display mode and input mode.

[0223] For example, when making a call or creating an email, the display unit 7402 is used to input characters. This is the main character input mode, and you can input characters displayed on the screen. It is preferable to display a keyboard or number buttons on most of the screen of the display portion 7402. I wish.

[0224] In addition, the mobile phone 7400 is equipped with a sensor that detects tilt, such as a gyro or acceleration sensor. By providing a detection device having the above, the orientation of the mobile phone 7400 (portrait or landscape) can be determined and the display The screen display of the display unit 7402 can be automatically switched.

[0225] The screen mode can be switched by touching the display portion 7402 or by operating the housing 7401. The type of image displayed on the display unit 7402 can be selected by operating the create button 7403. For example, the image signal to be displayed on the display unit can be switched by If the data is text data, the mode switches to display mode, and if the data is text data, the mode switches to input mode.

[0226] In the input mode, the optical sensor of the display unit 7402 detects a signal and displays it. If there is no input by touch operation on the part 7402 for a certain period of time, the screen mode is changed to the input mode. Alternatively, the display mode may be switched from the normal mode to the display mode.

[0227] The display portion 7402 can also function as an image sensor. By touching the device with your palm or fingers and capturing an image of your palm print or fingerprint, you can authenticate your identity. In addition, a backlight that emits near-infrared light to the display unit or a sensing light that emits near-infrared light By using a source, it is also possible to image finger veins, palm veins, etc.

[0228] FIG. 6(E) shows an example of a flat-panel computer. 0 includes a housing 7451L and a housing 7451R connected by a hinge 7454. , operation button 7453, left speaker 7455L and right speaker 7455R, The computer 7450 has an external connection port 7456 (not shown) on its side. , a display unit 7452L provided in the housing 7451L, and a display unit 7451R provided in the housing 7451R. When the hinge 7454 is folded so that the 7452R faces each other, the display is protected by the housing. It is possible.

[0229] The display unit 7452L and the display unit 7452R not only display images but also input information when touched with a finger or the like. For example, you can touch and select an icon representing an installed program, You can start the program. Or, you can change the distance between your fingers touching two points on the displayed image. You can zoom in or out on the image, or you can zoom in or out by touching a point on the displayed image and moving your finger. You can also display a keyboard image and use your fingers to touch the displayed letters and symbols. The liquid crystal display device shown in the above embodiment can be a flat panel display. The display unit 7452L and the display unit 7452R of the computer 7450 can be used. The liquid crystal display device described in the above embodiment has a high physical strength, and therefore, the display portion is not touched. Even if the display is not good, the display does not become defective, and the computer can be made highly reliable.

[0230] In addition, the computer 7450 is equipped with a gyro, an acceleration sensor, and a GPS (Global Positioning System). It must be equipped with a GPS receiver, fingerprint sensor, and video camera. For example, a detection device having a sensor for detecting tilt, such as a gyro or an acceleration sensor, By providing this, the orientation of the computer 7450 (portrait or landscape) can be determined and the screen to be displayed can be adjusted. You can have it switch orientation automatically.

[0231] The computer 7450 can also be connected to a network. In addition to being able to display information on the Internet, it can also remotely operate other devices connected to the network. It can be used as a terminal for

[0232] This embodiment mode can be implemented by being appropriately combined with the configurations described in other embodiments. is.

Claims

1. a first substrate and a second substrate; a liquid crystal composition sandwiched between the first substrate and the second substrate; a pixel electrode layer and a common electrode layer which have a function of applying an electric field to the liquid crystal composition; a first structure and a second structure provided on the first substrate; a spacer provided on the second substrate; a light-shielding layer provided on the second substrate side, the first structure does not overlap the spacer; the second structure has a planar shape different from that of the first structure and is provided so as to extend to a region overlapping with the spacer, in a cross section including the first structure, the second structure, the spacer, and the light-shielding layer, the first structure, the second structure, and the spacer are provided at positions that do not overlap with the light-shielding layer, the pixel electrode layer is in contact with an upper surface and a side surface of the first structure, and is not in contact with the second structure and the spacer; The common electrode layer is in contact with the top surface and side surfaces of the second structure, and is not in contact with the first structure and the spacer.

2. In claim 1, A transistor is included. The transistor is provided at a position that overlaps the light-shielding layer and does not overlap the first structure and the second structure in the cross section.

Images