Operating device and pitch compensation method

Abstract

The embodiment of the present application provides an operating device and a pitch compensation method for relative motion between two workpieces, which are related to the technical fields of measurement, control and precision machining. In the control system, the control system drives a first workpiece combination and a second workpiece combination, and a first sensor to move the first workpiece combination to a target measurement position, and measures a first distance between the first workpiece combination and the second workpiece combination by the first sensor. The control system controls the first workpiece combination and the second workpiece combination to move relative to each other in a first direction, moves the second sensor to the target measurement position, and measures a second distance between the first workpiece combination and the second workpiece combination by the second sensor. The control system generates a control signal based on a first difference obtained by subtracting the second distance from the first distance, and the pitch compensation device adjusts the vertical pitch between the first workpiece combination and the second workpiece combination in the second direction according to the control signal. The present application improves the measurement and machining accuracy of the operating device.

Description

[Technical Field]

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS This patent application claims priority to a Chinese patent application filed on February 15, 2022, with application number 2022101382385 and title "Method for pitch compensation in relative movement between an operating device and two workpieces," the entire text of which is incorporated herein by reference.

[0002] The present application relates to the technical fields of measurement, control and precision machining, and in particular to a method for pitch compensation in the relative motion between an operating device and two workpieces. [Background technology]

[0003] When using a processed workpiece (including a measurement sensor) to perform operations such as measurement and processing on a workpiece or sample to be measured and / or processed that is placed on a table, the processed workpiece is generally smaller than the workpiece to be processed, so it is necessary to control the processed workpiece to always move horizontally relative to the workpiece to be processed so that operations such as measurement and processing are completed on the entire workpiece to be processed, which places high demands on the positioning accuracy when moving the processed workpiece horizontally.

[0004] Here, machining operations refer to measuring a surface to be measured, cutting the surface of a workpiece with a tool, irradiating the surface to be machined with an electron beam, photon beam or ion beam, for example, irradiating a photoresist-coated surface to perform photolithography, or irradiating a surface with an electron beam, photon beam or ion beam to form an etched surface.

[0005] Generally, when a workpiece is moved horizontally with high precision relative to the sample, the vertical pitch between the workpiece and the sample being measured is likely to deviate. For example, when a workpiece is moved horizontally by 300 mm, the vertical pitch deviation can reach 10 microns. The deviation range currently permitted for precise positioning is 10-30 nm. This micron-level vertical pitch deviation is superimposed on the pitch between the workpiece and the sample being measured. As a result, the sum of these deviations far exceeds the allowable deviation range, significantly reducing the measurement and processing accuracy of the workpiece. This is one of the reasons why nano-level precision is so difficult to achieve. Summary of the Invention [Problem to be solved by the invention]

[0006] The object of the present application is to provide an operating device and a pitch compensation method during relative movement of two workpieces, which can compensate for the deviation in relative pitch that occurs during the relative movement of a first workpiece combination and a second workpiece combination in a first direction, reduce the deviation in vertical pitch between the first workpiece combination and the second workpiece combination in a second direction, and improve the measurement and processing accuracy of the operating device.

[0007] In order to achieve the above object, the present application provides a control system, a pitch compensation device, a first workpiece combination, and a second workpiece combination, the control system being communicatively connected to the first workpiece combination and / or the second workpiece combination, the first workpiece combination being provided with a first sensor and a second sensor facing the second workpiece combination, the first workpiece combination and / or the second workpiece combination being provided with a pitch compensation device, the control system being communicatively connected to the pitch compensation device, the first sensor, and the second sensor, respectively, the control system controlling the first workpiece combination and the second workpiece combination to move relative to each other in a first direction, and driving the first sensor to move to a target measurement position, a control system for controlling the first work combination and the second work combination to move relative to each other in a first direction, driving the second sensor to move the first work combination to the target measurement position, and measuring a second distance between the first work combination and the second work combination by the second sensor; the control system for generating a control signal based on a first difference obtained by subtracting the second distance from the first distance, and sending the control signal to the pitch compensation device; the pitch compensation device for adjusting the vertical pitch of the first work combination and the second work combination in a second direction according to the control signal, and the first direction being perpendicular to the second direction or having a perpendicular component to the second direction;

[0008] The present application further provides a pitch compensation method for relative movement of two workpieces, which is applicable to the above-mentioned operating device and includes the steps of controlling a first workpiece combination and a second workpiece combination to move relatively in a first direction, driving a first sensor to move it to a target measurement position, and measuring a first distance between the first workpiece combination and the second workpiece combination by the first sensor; controlling the first workpiece combination and the second workpiece combination to move relatively in the first direction, driving a second sensor to move it to the target measurement position, and measuring a second distance between the first workpiece combination and the second workpiece combination by the second sensor; and generating a control signal based on a first difference obtained by subtracting the second distance from the first distance, and using the control signal to control the pitch compensation device to adjust the vertical pitch in the second direction between the first workpiece combination and the second workpiece combination, wherein the first direction is perpendicular to the second direction or has a perpendicular component to the second direction.

[0009] In this embodiment, the control system first controls the first workpiece combination and the second workpiece combination to move relative to each other in a first direction, drives the first sensor to move to a target measurement position, and measures a first distance between the first workpiece combination and the second workpiece combination by the first sensor, then controls the first workpiece combination and the second workpiece combination to move relative to each other in the first direction, drives the second sensor to move to the target measurement position, and then measures a second distance between the first workpiece combination and the second workpiece combination by the second sensor, and a first difference obtained by subtracting the second distance from the first distance is calculated when the first workpiece combination and the second workpiece combination move relative to each other in the first direction. represents the deviation amount occurring in a second direction perpendicular to the first direction or having a vertical component, whereby the control system generates a corresponding control signal based on the first difference and sends the control signal to the pitch compensation device, which adjusts the vertical pitch in the second direction between the first workpiece combination and the second workpiece combination based on the control signal, where the first direction is perpendicular to the second direction; that is, compensation is realized for the relative pitch deviation amount occurring during the relative movement process between the first workpiece combination and the second workpiece combination in the first direction, and the deviation in the vertical pitch in the second direction between the first workpiece combination and the second workpiece combination is reduced, thereby improving the measurement or processing accuracy of the operating device.

[0010] In one embodiment, the control system generates a control signal to adjust the vertical pitch between the first workpiece combination and the second workpiece combination so as to increase the first difference when the first difference is greater than zero, and the pitch compensation device generates a control signal to adjust the vertical pitch between the first workpiece combination and the second workpiece combination so as to decrease the absolute value of the first difference when the first difference is less than zero.

[0011] In one embodiment, the first workpiece combination is further provided with a third sensor facing the second workpiece combination, and the third sensor is communicatively connected with the control system. The control system controls the first workpiece combination and the second workpiece combination to move relatively in a first direction, and drives the third sensor to move to the target measurement position. The third sensor measures a third distance between the first workpiece combination and the second workpiece combination. The control system calculates a second difference by subtracting the third distance from the first distance, and determines whether it is necessary to recompensate the vertical pitch between the first workpiece combination and the second workpiece combination based on the first difference and the second difference.

[0012] In one embodiment, the control system determines that there is no need to perform vertical pitch compensation between the first workpiece combination and the second workpiece combination again when the absolute value of the difference between the first difference and the second difference is less than a predetermined difference threshold, and determines that there is a need to perform vertical pitch compensation between the first workpiece combination and the second workpiece combination again when the absolute value of the difference between the first difference and the second difference is equal to or greater than a predetermined difference threshold.

[0013] In one embodiment, the speed of the relative movement between the first workpiece combination and the second workpiece combination in the first direction is smaller than the speed at which the pitch compensation device adjusts the vertical pitch change between the first workpiece combination and the second workpiece combination in the second direction.

[0014] In one embodiment, the first workpiece combination comprises a first base, a first workpiece fixed to the first base, and a plurality of probes provided on the first workpiece, the first sensor and the second sensor being two different probes of the first workpiece, respectively; the second workpiece combination comprises a second base and a second workpiece placed on the second base, the pitch compensation device being provided between the first base and the first workpiece, and / or the pitch compensation device being provided between the second base and the second workpiece, the target measurement position corresponding to a predetermined area on the surface of the second workpiece to be operated, the probes being for measuring the distance between the tip of the probe and the surface of the second workpiece to be operated, and the pitch compensation device being for adjusting the vertical pitch between the first workpiece and the second workpiece in response to the control signal.

[0015] In one embodiment, the first work combination comprises a first base, a first work fixed to the first base, and a sensor auxiliary tool fixed to the first work, the first sensor and the second sensor being respectively fixed to the sensor auxiliary tool, the second work combination comprises a second base, a second work placed on the second base, and a measured auxiliary tool fixed to the second work, the pitch compensation device is provided between the first base and the first work, and / or the pitch compensation device is provided between the second base and the second work, the target measurement position corresponds to a predetermined area on the measured auxiliary tool, the first sensor measures the distance between the sensor auxiliary tool and the predetermined area on the measured auxiliary tool, the second sensor measures the distance between the sensor auxiliary tool and the predetermined area on the measured auxiliary tool, and the pitch compensation device adjusts the vertical pitch between the first work and the second work in accordance with the control signal.

[0016] In one embodiment, the first workpiece combination includes a first base, a first workpiece fixed to the first base, a first base auxiliary tool fixed to the first base, and a sensor auxiliary tool fixed to the first base auxiliary tool, and the first sensor and the second sensor are respectively fixed to the sensor auxiliary tools, and the second workpiece combination includes a second base, a second workpiece placed on the second base, a second base auxiliary tool fixed to the second base, and a measured auxiliary tool fixed to the second base auxiliary tool, and the first base and the first workpiece are connected to each other. The pitch compensation device is provided between the first base and the second work, and / or the pitch compensation device is provided between the second base and the second work, the target measurement position corresponds to a predetermined area on the auxiliary tool to be measured, the first sensor measures the distance between the sensor auxiliary tool and the predetermined area on the auxiliary tool to be measured, the second sensor measures the distance between the sensor auxiliary tool and the predetermined area on the auxiliary tool to be measured, and the pitch compensation device adjusts the vertical pitch between the first work and the second work in response to the control signal.

[0017] In one embodiment, the machine tool includes a first base, a first workpiece fixed to the first base, and a workpiece fixed to the first workpiece, the first sensor and the second sensor are each fixed to the first workpiece, the second workpiece combination includes a second base, a workpiece fixing portion, and a second workpiece fixed to the second base via the workpiece fixing portion, the pitch compensation device is provided between the first base and the first workpiece, and / or the pitch compensation device is provided between the second base and the workpiece fixing portion, the workpiece is used to machine the second workpiece, the target measurement position corresponds to a predetermined area of ​​an unmachined portion on the second workpiece, or the target test position corresponds to a predetermined area of ​​an already machined portion on the second workpiece, the first sensor measures the distance between the first workpiece and the predetermined area on the second workpiece, and the second sensor measures the distance between the first workpiece and the predetermined area on the second workpiece, and the pitch compensation device adjusts the vertical pitch between the first workpiece and the second workpiece in response to the control signal.

[0018] In one embodiment, the pitch compensation device comprises one of a piezoelectric element, a thermal expansion element, and a flat plate capacitor. [Brief explanation of the drawings]

[0019] [Figure 1] 1 is a schematic block diagram of an operating device according to a first embodiment of the present application. [Figure 2] 1 is a schematic diagram of an operating device according to a first embodiment of the present application, in which a first base and a first workpiece are connected via a pitch compensation device. [Figure 3] FIG. 1 is a schematic diagram of an operating device according to a first embodiment of the present application, in which a second base and a second workpiece are connected via a pitch compensation device. [Figure 4] FIG. 1 is a schematic diagram of an operating device according to a first embodiment of the present application, in which a first base and a first workpiece are connected via a pitch compensation device, and a second base and a second workpiece are connected via a pitch compensation device. [Figure 5] 1 is a schematic diagram of an operating device according to a first embodiment of the present application, in which a first sensor and a second sensor are both fixed to a sensor aid. [Figure 6] FIG. 1 is a schematic diagram of an operating device according to a first embodiment of the present application, in which a sensor auxiliary device is fixed to a first base by a first base auxiliary device, and a measured auxiliary device is fixed to a second base by a second base auxiliary device. [Figure 7] 1 is a schematic diagram of an operating device according to a first embodiment of the present application, in which a target measurement position corresponds to a machined portion of a second workpiece. [Figure 8] 1 is a schematic diagram of an operating device according to a first embodiment of the present application, in which a target measurement position corresponds to an unmachined portion of a second workpiece. [Figure 9] 10 is a specific flowchart of a pitch compensation method for relative movement of two workpieces according to a third embodiment of the present application. [Figure 10] 10 is a specific flowchart of a pitch compensation method for relative movement of two workpieces according to a fourth embodiment of the present application. DETAILED DESCRIPTION OF THE INVENTION

[0020] In order to better understand the objectives, features and advantages of the present application, the following detailed description will be given of the embodiments of the present invention in conjunction with the drawings. It should be understood that the embodiments shown in the drawings are not intended to limit the protection scope of the present invention, but merely to describe the essential spirit of the technical solution of the present invention.

[0021] In the following description, for the purpose of explaining each disclosed embodiment, certain specific details are set forth to provide a thorough understanding of each disclosed embodiment. However, those skilled in the art should recognize that an embodiment may be implemented in one or more of these specific details. In other instances, well-known devices, configurations, and techniques related to the present application may not be shown or described in detail to avoid unnecessarily obscuring the description of the embodiments.

[0022] Unless the context otherwise requires, throughout the specification and claims, the word "comprises" and variations thereof, such as "includes" and "having," are to be understood in their open and inclusive sense, i.e., to be interpreted as "including, but not limited to."

[0023] References throughout the specification to "one embodiment" or "one embodiment" mean that a particular feature, structure, or characteristic described in the embodiment is included in at least one embodiment. Thus, the appearances of "one embodiment" or "one embodiment" in various places throughout the specification do not necessarily all refer to the same embodiment. Also, particular features, structures, or characteristics may be combined in any manner in one or more embodiments.

[0024] As used in this specification and the appended claims, the singular forms "a," "an," and "an" include plural referents unless the context clearly dictates otherwise. The term "or" is generally used in its sense including "and / or" unless the context clearly dictates otherwise.

[0025] In the following description, many directional terms are used to clearly indicate the configuration and operation of the present invention, but terms such as "front," "rear," "left," "right," "outside," "inside," "outward-facing," "inward-facing," "up," and "down" should be understood as terms of convenience rather than as limiting terms.

[0026] A first embodiment of the present application relates to a manipulation device for performing measurements and processing of a manipulated sample, such as measuring the surface shape of the manipulated sample, lithography exposure of the surface of the manipulated sample, and cutting of the manipulated sample.

[0027] The manipulation device includes a control system, a pitch compensation device, a first workpiece assembly, and a second workpiece assembly, one of which is used to assemble the manipulation workpiece and the other is used to place the manipulation target sample. In this embodiment and the following embodiments, an example will be described in which the first workpiece assembly is used to assemble the manipulation workpiece, the second workpiece assembly is used to place the manipulation target sample, and the first workpiece assembly is placed directly above the second workpiece assembly. Here, the control system may be a computer host, laptop, etc., including a controller, processor, etc.

[0028] 1, the operating device includes a control system 1, a pitch compensation device 2 (only one pitch compensation device 2 is schematically illustrated in FIG. 1), a first workpiece combination 3, and a second workpiece combination 4, and the control system 1 is communicatively connected to the first workpiece combination 3 and / or the second workpiece combination 4, i.e., the control system 1 is communicatively connected to either the first workpiece combination 3 or the second workpiece combination 4, or the control system 1 is communicatively connected to both the first workpiece combination 3 and the second workpiece combination 4 simultaneously (as an example shown in FIG. 1), and may cause relative movement between the first workpiece combination 3 and the second workpiece combination 4 in a first direction. The first workpiece combination 3 is provided with a first sensor and a second sensor facing the second workpiece combination 4, and the first workpiece combination 3 and / or the second workpiece combination 4 is provided with a pitch compensation device 2, and the control system 1 and the pitch compensation device 2 are communicatively connected, and the first sensor and the second sensor are each communicatively connected to the control system 1. Here, the first sensor and the second sensor are both sensors having a distance measurement function, such as a photon sensor, a laser distance measurement sensor, an electron sensor, an ion sensor, a nuclear sensor (scanning probe sensor), etc. Here, the first direction may be a direction parallel to each other between the first workpiece combination 3 and the second workpiece combination 4, or may be, for example, a horizontal direction.

[0029] For example, the manipulation device can be used to scan and measure the surface topography of a sample to be manipulated, i.e., the manipulation device can measure physical and chemical quantities with nanoscale spatial resolution on the surface of a sample (e.g., wafer, silicon wafer, quartz wafer, etc.). Scanning probe lithography (SPL), electron emission to the surface, photon emission, and even ion formation and ion implantation to the surface may also be performed on the surface to be manipulated. The accuracy of all these measurements and manipulations is related to the precise control of the pitch between the manipulation device and the surface to be manipulated.

[0030] Another example includes improving the machining accuracy of machine tools used in machining, where machine tools refer to lathes, planers, milling machines, etc. The present application can improve machining accuracy by improving dynamic precision control of the pitch between the work tool and the workpiece.

[0031] Referring to Figures 2 to 4 (control system 1 is not shown), the first workpiece combination 3 comprises a first base, a first workpiece 32 fixed to the first base 31, and a plurality of probes (the tips of the plurality of probes are located on the same horizontal plane) arranged on the first workpiece 32; the plurality of probes may form a probe array, but Figure 2 shows an example in which seven probes are arranged on the first workpiece 32, and the seven probes are respectively designated probes C1 to C7; here, the distance between two adjacent probes may be equal or unequal; but in this and subsequent examples, the distance between the tips of two adjacent probes is equal, and the distance is a.

[0032] The first sensor and the second sensor are two different probes among the multiple probes, and in the following description, the first sensor is referred to as probe C1 and the second sensor is referred to as probe C2. The second workpiece combination 4 includes a second base 41 and a second workpiece 42, which is a sample to be manipulated and is placed on the second base 41. The multiple probes are used on the manipulated surface of the second workpiece 42 to measure the pitch between the first and second workpieces (naturally, these probes may also perform other measurements, such as measuring the shape of the manipulated surface), and each probe is used to measure the distance between the probe tip and the manipulated surface of the second workpiece 42. Specifically, each probe measures a corresponding area on the manipulated surface, and height information of the corresponding area can be obtained. Here, the area on the surface to be operated is either one pixel point, a line consisting of multiple pixel points, or a surface consisting of multiple pixel points; that is, the area on the surface of the object can be divided into pixel points, with each pixel point being one area, or the area on the surface of the object can be divided into lines formed by multiple adjacent pixel points, or the area on the surface of the object can be divided into surfaces, with each area being a surface formed by combining multiple adjacent pixel points.

[0033] In this embodiment, the target measurement position corresponds to a predetermined area on the surface of the second workpiece 43. It should be noted that in this embodiment and the following embodiments, the area is exemplified as one pixel point, that is, the probe is used to measure the distance to one point on the surface of the object, and in FIG. 2, the target measurement position corresponds to point P i (X i ,Y i ), for example, X i is point P i indicates the horizontal coordinate on the surface to be operated, and Y i is point P i indicates the ordinate on the surface of the object to be operated.

[0034] In this embodiment, the pitch compensation device 2 is provided between the first base 31 and the first workpiece 32, and / or the pitch compensation device 2 is provided between the second base 41 and the second workpiece . That is, in the operating device, the first base 31 and the first workpiece 32 can be connected via the pitch compensation device 2, thereby allowing the height of the first workpiece 32 to be adjusted by the pitch compensation device 2 and realizing pitch adjustment between the first workpiece 32 and the second workpiece 42, see FIG. 2; or, by connecting the second base 41 and the second workpiece 42 via the pitch compensation device 2, the height of the second workpiece 42 can be adjusted by the pitch compensation device 2 and realizing pitch adjustment between the first workpiece 32 and the second workpiece 42, see FIG. 3; or, by connecting the first base 31 and the first workpiece 32 via the pitch compensation device 2 and connecting the second base 41 and the second workpiece 42 via the pitch compensation device 2, the pitch between the first workpiece 32 and the second workpiece 42 can be adjusted by these two pitch compensation devices 2 or by any one of the pitch compensation devices 2, see FIG. 4. It should be noted that in this embodiment and the subsequent embodiments, an example will be described in which the pitch compensation device 2 is provided only between the first base 31 and the first workpiece 32, as shown in FIG. 2.

[0035] In this embodiment, the operating device may use a pitch compensation device 2 to compensate for the pitch between the first workpiece 32 and the second workpiece 42. The specific pitch compensation process will be described below. The X direction shown in Figures 2 to 4 is the first direction in which the first workpiece combination body 3 and the second workpiece combination body 4 move relative to each other.

[0036] The control system 1 controls the relative movement of the first workpiece combination 3 and the second workpiece combination 4 in a first direction, drives the first sensor to move to a target measurement position, and uses the first sensor to measure a first distance between the first workpiece combination 3 and the second workpiece combination 4. Specifically, the first base 31 of the first workpiece combination 3 is connected to a drive device, or the first base 31 includes a drive device, and the control system 1 is connected to the drive device and controls the drive device to drive and move the first base 31 in the first direction at a preset speed, so that the probe C1 (i.e., the first sensor) moves to the target measurement position at time t; when the probe C1 is at the target measurement position, the tip of the probe C1 and point P i (X i ,Y i ) and the distance D C1Pi The distance D may be measured. C1Pi is the first distance between the first workpiece assembly 3 and the second workpiece assembly 4, i.e., the distance D C1Pi is the first distance between the first workpiece 32 and the second workpiece 42.

[0037] It should be noted that in this embodiment, the first base 31 is driven by a driving device (this example will also be used in the following explanations), but this is not limited to this, and it is also possible to drive the second base 41 by a driving device connected to or installed on the second base 41, thereby generating relative motion between the first workpiece 32 and the second workpiece 42 and moving the first sensor to the target measurement position.

[0038] The control system 1 controls the relative movement of the first workpiece combination 3 and the second workpiece combination 4 in a first direction, drives the second sensor to move it to a target measurement position, and measures a second distance between the first workpiece combination 3 and the second workpiece combination 4 by the second sensor. Specifically, the control system 1 controls the drive device to move the first base 31 in the first direction at a preset speed, and moves the probe C2 (i.e., the second sensor) to the target measurement position at time (t+Δt), i.e., the first base 31 moves a distance a within the time Δt; when the probe C2 is at the target measurement position, the tip of the probe C2 and point P i (X i ,Y i ) and the distance DC2Pi can be measured, and the distance D C2Pi is the second distance between the first workpiece assembly 3 and the second workpiece assembly 4, i.e., the distance D C2Pi is the second distance between the first workpiece 32 and the second workpiece 42.

[0039] Next, the control system 1 calculates the first distance D C1Pi Second distance D from C2Pi The first difference △D C1C2Pi , i.e., the first difference △D C1C2Pi =D C1Pi -D C2Pi Calculate the first difference △D C1C2Pi represents the amount of deviation that occurs in the second direction perpendicular to the first direction when the first base 31 moves in the first direction in time Δt, and the control system 1 calculates the first difference ΔD C1C2Pi and transmits the generated control signal to the pitch compensation device 2. Specifically, C1C2Pi When is greater than zero, in the process in which the probe C2 (i.e., the second sensor) moves to the target measurement position at the time (t+Δt), the vertical pitch in the second direction between the first workpiece 32 and the second workpiece 42 (the vertical pitches described below all refer to the vertical distance in the second direction) is equal to or greater than the first difference ΔD C1C2Pi The control system 1 adjusts the vertical pitch between the first workpiece combination body 3 and the second workpiece combination body 4 to reduce the first difference ΔD C1C2PiThe control signal for increasing the vertical pitch between the first workpiece 32 and the second workpiece 42 is generated and transmitted to the pitch compensation device 2. Upon receiving the control signal, the pitch compensation device 2 increases the vertical pitch between the first workpiece 32 and the second workpiece 42, and the increase in the vertical pitch is equal to the first difference ΔD. C1C2Pi It should be noted that, although the present embodiment and the following embodiments have been described with reference to an example in which the first direction is perpendicular to the second direction, the second direction may be any direction that has a perpendicular component between it and the first direction.

[0040] 1st difference △D C1C2Pi is less than zero, the vertical pitch between the first workpiece 32 and the second workpiece 42 is the first difference ΔD during the process in which the probe C2 (i.e., the second sensor) moves to the target measurement position at the time (t+Δt). C1C2Pi The control system 1 adjusts the vertical pitch between the first workpiece combination body 3 and the second workpiece combination body 4 to increase the first difference ΔD C1C2Pi When the pitch compensation device 2 receives this control signal, it reduces the vertical pitch between the first workpiece 32 and the second workpiece 42, and the amount of reduction in the vertical pitch is equal to the first difference ΔD. C1C2Pi is the absolute value of

[0041] 5-8, in another embodiment, the pitch measurement between the first workpiece 32 and the second workpiece 42 can be realized by using a sensor auxiliary tool provided on the side of the first workpiece 32 and a measured auxiliary tool provided on the side of the second workpiece 42 as auxiliary extensions set specifically for measurement, and this may be suitable for application scenarios where it is difficult to provide a sensor on the first workpiece 32. For example, if the first workpiece 32 is a machining tool and the surface of the second workpiece 42 facing the first workpiece 32 is the surface to be operated, and it is not easy to provide a sensor on the machining tool, the pitch measurement can be performed using the sensor auxiliary tool on the side of the first workpiece 32 and the measured auxiliary tool on the side of the second workpiece 42.

[0042] 5, the first workpiece combination 3 includes a first base 31, a first workpiece 32 fixed to the first base 31, and a sensor auxiliary tool 33 fixed to the first workpiece 32, and the first sensor 5 and the second sensor 6 are each fixed to the sensor auxiliary tool 33. The second workpiece assembly 4 includes a second base 41, a second workpiece 42 placed on the second base 41, and a measurement auxiliary tool 43 fixed to the second workpiece 42. Here, in the viewing angle of FIG. 5, the first sensor 5 and the second sensor 6 overlap, and the direction of relative movement between the first workpiece combination 3 and the second workpiece combination 4 is perpendicular to the Y direction in FIG. 5.

[0043] In this embodiment, the first workpiece 32 may be set as the operation workpiece, and the second workpiece 42 may be set as the operation target sample.

[0044] A pitch compensation device 2 is provided between the first base 31 and the first workpiece 32, and / or a pitch compensation device 2 is provided between the second base 41 and the second workpiece 42. In Fig. 5, the pitch compensation device 2 is provided between the first base 31 and the first workpiece 32 as an example, and if a pitch compensation device 2 is provided between the second base 41 and the second workpiece 42, and if a pitch compensation device 2 is provided between the first base 31 and the first workpiece 32, and if a pitch compensation device 2 is provided between the second base 41 and the second workpiece 42, it will be the same as Figs. 3 and 4, and a description thereof will be omitted here.

[0045] The target measurement position corresponds to a predetermined area on the top surface of the auxiliary tool 43 to be measured, and the predetermined area can be provided with a surface structure that is easy to measure, which allows the first sensor 5 and the second sensor 6 to position the predetermined area on the surface to be measured of the second workpiece more easily and accurately, contributing to more accurate distance measurement.

[0046] The first sensor 5 is used to measure the distance between the sensor auxiliary tool 33 and a predetermined area on the measured auxiliary tool 43. The second sensor 6 is used to measure the distance between the sensor auxiliary tool 33 and a predetermined area on the measured auxiliary tool 43. In FIG. 5, the predetermined area on the measured auxiliary tool 43 is designated as point P i (X i ,Y i ), the first sensor 5 and the second sensor 6 are both located at a point P i (X i ,Y i ) is used to measure the distance between

[0047] The pitch compensation device 2 is for adjusting the vertical pitch between the first workpiece 32 and the second workpiece 42 in response to a control signal.

[0048] It should be noted that the specific process of compensating for the vertical pitch between the first workpiece 32 and the second workpiece 42 using the second sensor 5, the third sensor 6 and the pitch compensation device 2 is the same as that described above, and will not be repeated here.

[0049] 6, in another embodiment, the first workpiece combination 3 includes a first base 31, a first workpiece 32 fixed to the first base 31, a first base auxiliary tool 33 fixed to the first base 31, and a sensor auxiliary tool 34 fixed to the first base auxiliary tool 33, and the first sensor 5 and the second sensor 6 are each fixed to the sensor auxiliary tool 34. The second workpiece combination 4 includes a second base 41, a second workpiece 42 placed on the second base 41, a second base auxiliary tool 43 fixed to the second base 41, and a measured auxiliary tool 44 fixed to the second base auxiliary tool 43. Here, the first base 31 and the first base auxiliary tool 33 may be fixed by a first base fixing part 35, and the second base 41 and the second base auxiliary tool 43 may be fixed by a second base fixing part 45; from the viewpoint of Figure 6, the first sensor 5 and the second sensor 6 overlap, and the relative movement direction between the first work combination body 3 and the second work combination body 4 is perpendicular to the Y direction in Figure 5.

[0050] In this embodiment, the first workpiece 32 may be set as the operation workpiece, and the second workpiece 42 may be set as the operation target sample.

[0051] A pitch compensation device 2 is provided between the first base 31 and the first workpiece 32, and / or a pitch compensation device 2 is provided between the second base 41 and the second workpiece 42. In Fig. 6, the pitch compensation device 2 is provided between the first base 31 and the first workpiece 32 as an example, and if a pitch compensation device 2 is provided between the second base 41 and the second workpiece 42, and if a pitch compensation device 2 is provided between the first base 31 and the first workpiece 32, and if a pitch compensation device 2 is provided between the second base 41 and the second workpiece 42, it is the same as Figs. 3 and 4, and therefore a description thereof will be omitted here.

[0052] The target measurement position corresponds to a predetermined area on the top surface of the auxiliary tool 44 to be measured, and the predetermined area can be provided with a surface structure that is easy to measure, which allows the first sensor 5 and the second sensor 6 to more easily and accurately position the position of the predetermined area on the surface to be measured of the second workpiece, contributing to more accurate distance measurement.

[0053] The first sensor 5 is used to measure the distance between the sensor auxiliary tool 34 and a predetermined area on the measured auxiliary tool 44. The second sensor 6 is used to measure the distance between the sensor auxiliary tool 34 and a predetermined area on the measured auxiliary tool 44. In FIG. 6, the predetermined area on the measured auxiliary tool 44 is designated as point P i (X i ,Y i ), the first sensor 5 and the second sensor 6 are both located at a point P i (X i ,Y i ) is used to measure the distance between

[0054] The pitch compensation device 2 is for adjusting the vertical pitch between the first workpiece 32 and the second workpiece 42 in response to a control signal.

[0055] It should be noted that the specific process of compensating for the vertical pitch between the first workpiece 32 and the second workpiece 42 using the second sensor 5, the third sensor 6 and the pitch compensation device 2 is the same as that described above, and will not be repeated here.

[0056] 7 and 8, in another embodiment, the first workpiece combination 3 includes a first base 31, a first workpiece 32 fixed to the first base 31, and a workpiece 33 fixed to the first workpiece 32, and the first sensor 5 and the second sensor 6 are each fixed to the first workpiece 32. Here, the first sensor 5 and the second sensor 6 can be fixed to the first workpiece 32 via another fixing member 7, and the pitch between the first sensor 5 and the second sensor 6 is a. In one example, a baffle plate 8 is provided between the fixing member 7 and the workpiece 33 to prevent solid particles generated during processing from affecting the first sensor 5 and the second sensor 6.

[0057] The second workpiece combination 4 includes a second base 41, a second workpiece 42, and a workpiece fixing portion, and the second workpiece 42 is fixed to the second base 41 via the workpiece fixing portion. Specifically, the workpiece fixing portion includes a first fixing portion 431, a second fixing portion 432, and a third fixing portion 433, and one surface of the first fixing portion 431 is fixed to the second base 41, and the second fixing portion 432 and the third fixing portion 433 are fixed to both ends of the other surface of the first fixing portion 431, respectively. As a result, the first fixing portion 431, the second fixing portion 432, and the third fixing portion 433 form a groove, and the second workpiece 42 is fixed to this groove.

[0058] Figure 7- The X direction shown in FIG. 8 is the direction in which the first workpiece combination 3 and the second workpiece combination 4 move relative to each other.

[0059] The pitch compensation device 2 is provided between the first base 31 and the first workpiece 32, and / or the pitch compensation device 2 is provided between the second base 42 and the workpiece fixing portion, i.e., the pitch compensation device 2 is provided between the second base 42 and the first fixing portion 431. In both of FIGS. 7 and 8, the pitch compensation device 2 is provided between the first base 31 and the first workpiece 32 as an example, and the case where the pitch compensation device 2 is provided between the second base 42 and the first fixing portion 431, the pitch compensation device 2 is provided between the first base 31 and the first workpiece 32, and the pitch compensation device 2 is provided between the second base 42 and the first fixing portion 431 is the same as in FIGS. 3 and 4, and therefore description thereof will be omitted here.

[0060] The workpiece 33 is used to process the second workpiece 42, and the workpiece 33 is, for example, a cutting tool, and is used to cut the second workpiece 42.

[0061] The target measurement position corresponds to a predetermined area of ​​an unmachined portion on the second workpiece 42, or the target measurement position corresponds to a predetermined area of ​​an already-machined portion on the second workpiece 42. Specifically, the second workpiece 42 may be divided into a machined portion 421 and an unmachined portion 422. In FIG. 7 , in the direction in which the first workpiece 32 moves relative to the second workpiece 42, the fixed piece 7 to which the first sensor 5 and the second sensor 6 are fixed is located on the left side of the workpiece 33. In this case, the target measurement position corresponds to a predetermined area on the machined portion 421 on the second workpiece 42, and the first sensor 5 and the second sensor 6 are both used to measure the distance between the first workpiece 32 and the predetermined area on the machined portion 421. In Figure 8, in the direction in which the first workpiece 32 moves relative to the second workpiece 42, the fixed piece 7 to which the first sensor 5 and the second sensor 6 are fixed is located on the right side of the workpiece 33, and at this time, the target measurement position corresponds to a predetermined area on the unmachined portion 422 on the second workpiece 42, and both the first sensor 5 and the second sensor 6 are used to measure the distance between the first workpiece 32 and the predetermined area on the unmachined portion 422.

[0062] The first fixing portion 431, the second fixing portion 432 and the third fixing portion 433 do not affect the machined portion 421 and the unmachined portion 422 of the second workpiece 42, and the second workpiece 42 may be fixed relative to the workpiece fixing portion or may rotate relative to the workpiece fixing portion.

[0063] The first sensor 5 is used to measure the distance between the first workpiece 32 and a predetermined area on the second workpiece .

[0064] The second sensor 6 is used to measure the distance between the first workpiece 32 and a predetermined area on the second workpiece .

[0065] The pitch compensation device 2 is for adjusting the vertical pitch between the first workpiece and the second workpiece in response to a control signal.

[0066] It should be noted that the specific process of compensating for the vertical pitch between the first workpiece 32 and the second workpiece 42 using the second sensor 5, the third sensor 6 and the pitch compensation device 2 is the same as that described above, and will not be repeated here.

[0067] 7 and 8, when controlling a workpiece 33 (e.g., a machine tool) on a first workpiece 32, such as a cutting tool, to cut a second workpiece 42 placed on a second base 41, the pitch between the cutting tool and the surface of the second workpiece 42 can be reliably maintained, preventing changes in the cutting depth of the tool due to accidental vibration of the first workpiece 32 and / or the second workpiece 42, improving the machining accuracy of the workpiece 33 on the second workpiece 42 and making the device suitable for ultra-precision machining of samples on ultra-precision machine tools. Among these, the workpiece 33 may be a workpiece such as a grinding head of a grinder, a planer head, or a cutting head of a milling machine.

[0068] In this embodiment, the relative movement speed in the first direction between the first workpiece combination body 3 and the second workpiece combination body 4 is smaller than the speed at which the pitch compensation device 2 adjusts the change in the vertical pitch between the first workpiece combination body 3 and the second workpiece combination body 4 in the second direction, thereby achieving excellent real-time performance in the measurement and processing processes and highly accurate vertical pitch compensation. In this embodiment, the pitch compensation device 2 is composed of any one of a piezoelectric element, a thermal expansion element, and a flat plate capacitor.

[0069] When the pitch compensation device 2 is configured with a piezoelectric element, the piezoelectric element can deform in the thickness direction (i.e., the second direction) in response to the applied voltage, and at this time, the control system 1 calculates the first difference ΔD C1C2Pi Based on the magnitude of the signal, a corresponding voltage control signal can be generated, and this voltage is applied to the piezoelectric element so that the thickness of the piezoelectric element changes, thereby adjusting the height of the first workpiece 32 in the second direction, i.e., adjusting the vertical pitch between the first workpiece 32 and the second workpiece 42 in the second direction.

[0070] When the pitch compensation device 2 is composed of a thermal expansion element and a heating element disposed adjacent to the thermal expansion element, the thermal expansion element can deform in the thickness direction (i.e., the second direction) according to the temperature. In this case, the control system 1 calculates the first difference ΔD C1C2Pi A corresponding voltage control signal is generated based on the magnitude of the voltage, and this control signal is applied to the heating element to control the temperature of the heating element, which in turn heats the thermal expansion element, thereby changing the thickness of the thermal expansion element and adjusting the height of the first workpiece 32 in the second direction, thereby adjusting the vertical distance between the first workpiece 32 and the second workpiece 42 in the second direction.

[0071] When the pitch compensation device 2 is configured as a flat plate capacitor, the pitch of the two flat plates of the flat plate capacitor can change in the thickness direction (i.e., the second direction) depending on the applied voltage, so the control system 1 calculates the first difference ΔD C1C2PiBased on the magnitude of the voltage, a corresponding voltage control signal is generated, and the voltage is applied to the plate capacitor so that the pitch of the two plates of the plate capacitor changes accordingly, thereby adjusting the height of the first workpiece 32 in the second direction, i.e., adjusting the vertical pitch in the second direction between the first workpiece 32 and the second workpiece 42.

[0072] It should be noted that the pitch compensation device 2 in this embodiment can be the drive device of the first workpiece combination 3, for example the drive device of the first base 31, so that a control signal can be sent directly to this drive device, and vertical pitch compensation in the second direction between the first workpiece combination and the second workpiece combination can be realized.

[0073] It should be further noted that in this embodiment, the operating device may periodically perform vertical pitch compensation according to a preset cycle or a preset horizontal movement distance. In the process of periodically performing vertical pitch compensation, the target measurement position may be updated each time vertical pitch compensation needs to be performed. As an updating method, the target measurement position may be set based on the current position of the first sensor. For example, when vertical pitch compensation needs to be performed, the next measurement position corresponding to the first sensor is set as the target measurement position, and vertical pitch compensation is performed at the updated target measurement position.

[0074] This embodiment provides an operating device, in which a control system controls a first workpiece combination and a second workpiece combination to move relative to each other in a first direction, drives a first sensor to move the first workpiece combination to a target measurement position, and then measures a first distance between the first workpiece combination and the second workpiece combination using the first sensor; controls the first workpiece combination and the second workpiece combination to move relative to each other in the first direction, drives a second sensor to move the first workpiece combination to a target measurement position, and then measures a second distance between the first workpiece combination and the second workpiece combination using the second sensor; and a first difference obtained by subtracting the second distance from the first distance is a first difference between the first workpiece combination and the second workpiece combination. represents the deviation amount occurring in a second direction perpendicular to or having a perpendicular component to the first direction when the first workpiece combination moves relatively in the first direction, whereby the control system generates a corresponding control signal based on the first difference and sends the control signal to the distance compensation device, and the pitch compensation device adjusts the vertical pitch in the second direction between the first workpiece combination and the second workpiece combination based on the control signal, where the first direction is perpendicular to the second direction, i.e., the amount of deviation in relative pitch occurring during the relative movement between the first workpiece combination and the second workpiece combination in the first direction is compensated for, and the deviation in the vertical pitch in the second direction between the first workpiece combination and the second workpiece combination is reduced, so as to improve the measurement or processing accuracy of the operating device.

[0075] A second embodiment of the present application relates to an operating device, and the main improvements of the second embodiment compared to the first embodiment are as follows: the first work assembly further includes a third sensor directed toward the second work assembly.

[0076] Taking the operating device of Figure 2 as an example, the third sensor may be a probe among multiple probes that is different from the first sensor and the second sensor, and the distance between the third sensor and the second sensor in the same direction may be the same as the distance between the first sensor and the second sensor. In this embodiment, probe C3 is selected as the third sensor.

[0077] In this embodiment, the control system 1 sends a control signal to the pitch compensation device 2. After the pitch compensation device 2 completes adjusting the vertical pitch between the first workpiece 32 and the second workpiece 42 based on the control signal, the control system 1 controls the first workpiece combination 3 and the second workpiece combination 4 to move relative to each other in the first direction, drives the third sensor to move it to a target measurement position, and measures the third distance between the first workpiece combination and the second workpiece combination through the third sensor. Specifically, after completing the vertical pitch compensation, the control system 1 controls the driving device to move the first base 31 in the first direction at a preset speed, thereby moving the probe C3 (i.e., the third sensor) to the target measurement position at time (t+2Δt). That is, the first base 31 moves a distance a within the time Δt; when the probe C3 is at the target measurement position, the tip of the probe C3 and point P i (X i ,Y i ) and the distance D C3Pi can be measured, and the distance D C3Pi is the third distance between the first workpiece assembly 3 and the second workpiece assembly 4, i.e., the distance D C2Pi is the second distance between the first workpiece 32 and the second workpiece 42.

[0078] Next, the control system 1 calculates the first distance D C1Pi Third distance D from C3Pi The second difference △D C1C3Pi Calculate the second difference △D C1C3Pi represents the amount of deviation that occurs in the vertical direction when the first base 31 moves in the horizontal direction within the time Δt after the vertical pitch compensation is performed, and the control system 1 then calculates the first difference ΔD C1C2Pi and the second difference △D C1C3Pi By comparing with the above, the effect of the vertical pitch compensation can be obtained, that is, the first difference △D C1C2Pi and the second difference △D C1C3Pi Based on this, it can be determined whether compensation for the vertical pitch in the second direction between the first workpiece combination 3 and the second workpiece combination 4 needs to be performed again.

[0079] In this embodiment, the control system 1 calculates the first difference ΔD C1C2Pi and the second difference △D C1C3Pi If the absolute value of the difference between the first difference ΔD and the second difference ΔD is smaller than a preset difference threshold, it is determined that there is no need to perform compensation for the vertical pitch between the first workpiece combination 3 and the second workpiece combination 4 again. C1C2Pi and the second difference △D C1C3Pi If the absolute value of the difference between the first difference ΔD and the second difference ΔD is equal to or greater than a preset difference threshold, it is determined that compensation for the vertical pitch between the first work assembly 3 and the second work assembly 4 needs to be performed again. C1C2Pi and the second difference △D C1C3Pi and then compare the absolute value of the difference with a preset difference threshold. If the absolute value of the difference is smaller than the preset difference threshold, it indicates that the current vertical pitch compensation is valid and there is no need to repeat the pitch compensation; if the absolute value of the difference is greater than or equal to the preset difference threshold, the current vertical pitch compensation is invalid, and it is necessary to use probes C1 and C2 again to perform vertical pitch compensation, or to reselect the first and second sensors, for example, by using probe C3 as the first sensor and probe C4 as the second sensor to perform vertical pitch compensation again, thereby forming a closed-loop control of vertical pitch compensation between the first workpiece combination body 3 and the second workpiece combination body 4.

[0080] A third embodiment of the present application relates to a method for pitch compensation during relative movement of two workpieces, which is applied to the manipulation device of the first or second embodiment. The manipulation device may employ the pitch compensation method during relative movement of two workpieces in this embodiment to compensate for vertical pitch.

[0081] A specific flow of the method for pitch compensation during relative movement of two workpieces in this embodiment is shown in FIG. 9. This method for pitch compensation during relative movement of two workpieces will be described as an example in which it is applied to the operating device of the first embodiment in FIG. 2.

[0082] Step 101: Control the first workpiece combination and the second workpiece combination to move relative to each other in a first direction, drive the first sensor to move to a target measurement position, and measure a first distance between the first workpiece combination and the second workpiece combination using the first sensor.

[0083] Specifically, the control system 1 is connected to a driving device and controls the driving device to move the first base 31 in a first direction at a preset speed, and move the probe C1 (i.e., the first sensor) to a target measurement position at time t; when the probe C1 is at the target measurement position, the tip of the probe C1 and the point P i (X i ,Y i ) and the distance D C1Pi The distance D can be measured. C1Pi is the first distance between the first workpiece assembly 3 and the second workpiece assembly 4, that is, the distance D C1Pi is the first distance between the first workpiece 32 and the second workpiece 42.

[0084] Step 102: Control the first workpiece combination and the second workpiece combination to move relative to each other in a first direction, drive the second sensor to move to a target measurement position, and measure a second distance between the first workpiece combination and the second workpiece combination by the second sensor.

[0085] Specifically, the control system 1 controls the driving device again to move the first base 31 in the first direction at a preset speed, and move the probe C2 (i.e., the second sensor) to the target measurement position at time (t+Δt). That is, the first base 31 moves a distance a within the time Δt; when the probe C2 is at the target measurement position, the tip of the probe C2 and the point P i (X i ,Y i ) and the distance DC2Pi can be measured, and the distance D C2Pi is the second distance between the first workpiece assembly 3 and the second workpiece assembly 4, i.e., the distance D C2Pi is the second distance between the first workpiece 32 and the second workpiece 42.

[0086] Step 103: Generate a control signal based on a first difference obtained by subtracting the second distance from the first distance, and use the control signal to control the pitch compensation device to adjust the vertical pitch of the first work combination and the second work combination in a second direction, where the first direction is perpendicular to the second direction or has a vertical component.

[0087] In one example, a control signal is generated based on a first difference obtained by subtracting the second distance from the first distance, and if the first difference is greater than zero, a control signal is generated to adjust the vertical pitch between the first workpiece combination and the second workpiece combination to increase the first difference; and if the first difference is less than zero, a control signal is generated to adjust the vertical pitch between the first workpiece combination and the second workpiece combination to decrease the absolute value of the first difference.

[0088] Specifically, the first difference △D C1C2Pi is greater than zero, the vertical pitch of the first workpiece 32 and the second workpiece 42 in the second direction is the first difference ΔD in the process of the probe C2 (i.e., the second sensor) moving to the target measurement position at the time (t+Δt). C1C2Pi The control system 1 adjusts the vertical pitch between the first workpiece combination body 3 and the second workpiece combination body 4 to reduce the first difference ΔD C1C2Pi and transmits the control signal to the pitch compensation device 2. Upon receiving the control signal, the pitch compensation device 2 increases the vertical pitch between the first workpiece 32 and the second workpiece 42, and the increase in the vertical pitch is equal to the first difference ΔD C1C2Pi is.

[0089] 1st difference △D C1C2Pi is less than zero, the vertical pitch in the second direction between the first workpiece 32 and the second workpiece 42 is the first difference ΔD during the process in which the probe C2 (i.e., the second sensor) moves to the target measurement position at the time (t+Δt). C1C2Pi The control system 1 adjusts the vertical pitch between the first workpiece combination body 3 and the second workpiece combination body 4 to increase the first difference ΔDC1C2Pi When the pitch compensation device 2 receives this control signal, it reduces the vertical pitch between the first workpiece 32 and the second workpiece 42, and the reduction amount of the vertical pitch is the first difference ΔD. C1C2Pi is the absolute value of

[0090] It should be noted that in this embodiment and the following embodiments, the first direction is perpendicular to the second direction, but the second direction may be any direction that has a perpendicular component between it and the first direction.

[0091] Since the first embodiment and this embodiment correspond to each other, this embodiment can be implemented in cooperation with the first embodiment. Note that the technical details mentioned in the first embodiment are also valid in this embodiment, and the technical effects achievable in the first embodiment can also be achieved in this embodiment, so they will not be mentioned here to reduce redundancy. Correspondingly, the technical details described in this embodiment can also be applied to the first embodiment.

[0092] In this embodiment, the control system controls the relative movement of the first workpiece combination and the second workpiece combination in a first direction, drives a first sensor to move the first workpiece combination to a target measurement position, and then measures a first distance between the first workpiece combination and the second workpiece combination by the first sensor, controls the relative movement of the first workpiece combination and the second workpiece combination in the first direction, drives a second sensor to move the first workpiece combination to a target measurement position, and then measures a second distance between the first workpiece combination and the second workpiece combination by the second sensor, and determines whether the first workpiece combination and the second workpiece combination are moving in the first direction. the first difference represents the deviation amount occurring in a second direction that is perpendicular to or has a perpendicular component to the first direction when the first workpiece combination and the second workpiece combination move relatively in the first direction, whereby the control system generates a control signal based on the first difference and sends the control signal to the pitch compensation device, and the pitch compensation device adjusts the vertical pitch in the second direction between the first workpiece combination and the second workpiece combination based on the control signal, where the first direction is perpendicular to the second direction, i.e., the compensation for the deviation amount of the relative pitch occurring during the relative movement between the first workpiece combination and the second workpiece combination in the first direction is realized, and the deviation of the vertical pitch in the second direction between the first workpiece combination and the second workpiece combination is reduced, thereby improving the measurement or processing accuracy of the operating device.

[0093] The fourth embodiment of the present application relates to a pitch compensation method during relative movement of two workpieces, and the fourth embodiment is improved compared to the third embodiment mainly in that it increases the determination of the pitch compensation effect.

[0094] The specific flow of the pitch compensation method during relative movement of two workpieces in this embodiment is shown in Figure 10. This will be explained by taking the example of applying the pitch compensation method during relative movement of two workpieces to the operating device of Figure 2 in the first embodiment, where the first workpiece combination body 3 is further provided with a third sensor facing the second workpiece combination body 4, and the third sensor may be a probe different from the first sensor and the second sensor among multiple probes, and in the same direction, the distance between the third sensor and the second sensor is the same as the distance between the first sensor and the second sensor, and in this case, probe C3 is selected as the third sensor.

[0095] Step 201: The first workpiece combination and the second workpiece combination are controlled to move relative to each other in a first direction, and the first sensor is driven to move to a target measurement position, and the first sensor measures a first distance between the first workpiece combination and the second workpiece combination. Note that this step is substantially the same as step 101 in the third embodiment, and therefore will not be repeated here.

[0096] Step 202: The first workpiece combination and the second workpiece combination are controlled to move relative to each other in the first direction, and the second sensor is driven to move to a target measurement position, and the second sensor measures a second distance between the first workpiece combination and the second workpiece combination. Note that this step is substantially the same as step 102 in the third embodiment, and therefore will not be repeated here.

[0097] Step 203: Generate a control signal based on a first difference obtained by subtracting the second distance from the first distance, and use the control signal to control the pitch compensation device to adjust the vertical pitch of the first workpiece combination and the second workpiece combination in a second direction, where the first direction is perpendicular to the second direction or has a perpendicular component. Note that this step is substantially the same as step 103 in the third embodiment, and therefore will not be repeated here.

[0098] Step 204: Control the first workpiece combination and the second workpiece combination to move relative to each other in a first direction, drive the third sensor to move it to a target measurement position, and measure a third distance between the first workpiece combination and the second workpiece combination using the third sensor.

[0099] Specifically, the control system 1 sends a control signal to the pitch compensation device 2, and after the pitch compensation device 2 completes adjusting the vertical pitch between the first workpiece 32 and the second workpiece 42 based on this control signal, the control system 1 controls the first workpiece combination 3 and the second workpiece combination 4 to move relatively in the first direction, drives the third sensor to move it to a target measurement position, and measures the third distance between the first workpiece combination and the second workpiece combination using the third sensor. Specifically, after completing the vertical pitch compensation, the control system 1 controls the drive device to move the first base 31 in the first direction at a preset speed, thereby moving the probe C3 (i.e., the third sensor) to the target measurement position at time (t+2Δt), that is, the first base 31 moves a distance a within the time Δt; when the probe C3 is at the target measurement position, the tip of the probe C3 and point P i (X i ,Y i ) and the distance D C3Pi can be measured, and the distance D C3Pi is the third distance between the first workpiece assembly 3 and the second workpiece assembly 4, i.e., the distance D C2Pi is the third distance between the first workpiece 32 and the second workpiece 42.

[0100] Step 205: Calculate a second difference by subtracting the third distance from the first distance, and determine whether or not the vertical pitch between the first workpiece combination and the second workpiece combination needs to be compensated again based on the first difference and the second difference. If yes, directly end the process; if no, return to step 201.

[0101] In one example, step 205 specifically calculates a second difference by subtracting the third distance from the first distance, and determines whether the absolute value of the difference between the first difference and the second difference is smaller than a preset difference threshold. If it is smaller, the process ends directly; if it is not smaller, the process returns to step 201.

[0102] Specifically, the control system 1 determines the first distance D C1Pi Third distance D from C3Pi The second difference △D C1C3Pi Calculate the second difference △D C1C3Pi represents the amount of deviation that occurs in the vertical direction when the first base 31 moves in the horizontal direction within the time Δt after the vertical pitch compensation, and then the control system 1 calculates the first difference ΔD C1C2Pi and the second difference △D C1C3Pi By comparing the first difference ΔD C1C2Pi and the second difference △D C1C3Pi Based on this, it can be determined whether the vertical pitch between the first workpiece combination 3 and the second workpiece combination 4 needs to be compensated again.

[0103] In this embodiment, the control system 1 calculates the first difference ΔD C1C2Pi and the second difference △D C1C3Pi If the absolute value of the difference between the first workpiece combination 3 and the second workpiece combination 4 is smaller than a preset difference threshold, it is determined that there is no need to perform compensation for the vertical pitch between the first workpiece combination 3 and the second workpiece combination 4 again. C1C2Pi and the second difference △D C1C3Pi If the absolute value of the difference between the first workpiece combination 3 and the second workpiece combination 4 is equal to or greater than the preset difference threshold, it is determined that the vertical pitch compensation between the first workpiece combination 3 and the second workpiece combination 4 needs to be performed again, that is, the process returns to step 201, and a closed-loop control for the vertical pitch compensation between the first workpiece combination 3 and the second workpiece combination 4 is established. Specifically, the control system 1 first calculates the first difference ΔD C1C2Pi and the second difference △D C1C3Piand then compare the absolute value of the difference with a preset difference threshold. If the absolute value of the difference is smaller than the preset difference threshold, it indicates that the current vertical pitch compensation is valid and there is no need to repeat pitch compensation; if the absolute value of the difference is greater than or equal to the preset difference threshold, it indicates that the current vertical pitch compensation is invalid and it is necessary to use probes C1 and C2 again to perform vertical pitch compensation, or to reselect the first and second sensors, for example, by using probe C3 as the first sensor and probe C4 as the second sensor, and perform vertical pitch compensation again.

[0104] Since the second embodiment and this embodiment correspond to each other, this embodiment can be implemented in cooperation with the second embodiment. The technical details mentioned in the second embodiment are also valid in this embodiment, and the technical effects achievable in the second embodiment can also be achieved in this embodiment, so they will not be mentioned here to reduce redundancy. Correspondingly, the technical details described in this embodiment can also be applied to the second embodiment.

[0105] Although preferred embodiments of the present invention have been described in detail above, it should be understood that aspects of the embodiments can be modified, if necessary, to provide additional embodiments using aspects, features, and concepts from various patents, applications, and publications.

[0106] These and other changes can be made to the embodiments in light of the above detailed description. In general, in the claims, the terms used should not be construed as being limited to the specific embodiments disclosed in the specification and claims, but should be understood to include all possible embodiments along with all equivalents to which these claims are entitled.

Claims

1. A control system, a pitch compensation device, a first workpiece combination, and a second workpiece combination, the control system is communicatively connected to the first workpiece combination and / or the second workpiece combination, the first workpiece combination is provided with a first sensor, a second sensor, and a third sensor facing the second workpiece combination, a pitch compensation device is installed in the first workpiece combination and / or the second workpiece combination, and the control system is communicatively connected to the pitch compensation device, the first sensor, the second sensor, and the third sensor, respectively; the control system controls the first workpiece combination and the second workpiece combination to move relative to each other in a first direction, and drives the first sensor to move to a target measurement position, and measures a first distance between the first workpiece combination and the second workpiece combination by the first sensor; the control system controls the first workpiece combination and the second workpiece combination to move relative to each other in a first direction, drives the second sensor to move to the target measurement position, and measures a second distance between the first workpiece combination and the second workpiece combination by the second sensor; The control system further generates a control signal based on a first difference obtained by subtracting the second distance from the first distance, and transmits the control signal to the pitch compensation device; the pitch compensation device adjusts the vertical pitch of the first workpiece combination and the second workpiece combination in a second direction in response to the control signal, the first direction being perpendicular to the second direction or having a perpendicular component to the second direction; the control system controls the first workpiece combination and the second workpiece combination to move relative to each other in a first direction, drives the third sensor to move to the target measurement position, and measures a third distance between the first workpiece combination and the second workpiece combination by the third sensor; the control system calculates a second difference by subtracting the third distance from the first distance, and determines whether or not compensation for the vertical pitch between the first workpiece combination and the second workpiece combination needs to be performed again based on the first difference and the second difference; An operating device characterized in that the first direction is a direction parallel to each other between the first workpiece combination and the second workpiece combination, and the first sensor, the second sensor, and the third sensor are arranged along the first direction.

2. the control system generates a control signal to adjust the vertical pitch between the first workpiece combination and the second workpiece combination so as to increase the first difference when the first difference is greater than zero; 2. The operating device according to claim 1, wherein the pitch compensation device generates a control signal to adjust the vertical pitch between the first workpiece combination and the second workpiece combination so as to reduce the absolute value of the first difference when the first difference is less than zero.

3. the control system determines that there is no need to re-compensate the vertical pitch between the first workpiece combination and the second workpiece combination when an absolute value of the difference between the first difference and the second difference is less than a preset difference threshold value; 2. The operating device according to claim 1, wherein the control system determines that compensation for the vertical pitch between the first workpiece combination and the second workpiece combination needs to be performed again when an absolute value of a difference between the first difference and the second difference is equal to or greater than a predetermined difference threshold.

4. 2. The operating device according to claim 1, wherein a speed of relative movement between the first workpiece combination and the second workpiece combination in a first direction is smaller than a speed at which the pitch compensation device adjusts for a vertical pitch change between the first workpiece combination and the second workpiece combination in a second direction.

5. the first workpiece combination includes a first base, a first workpiece fixed to the first base, and a plurality of probes provided on the first workpiece, the first sensor and the second sensor being two different probes of the first workpiece, respectively; the second workpiece combination comprises a second base and a second workpiece placed on the second base, the pitch compensation device is provided between the first base and the first workpiece, and / or the pitch compensation device is provided between the second base and the second workpiece, the target measurement position corresponds to a predetermined area on an operation target surface of the second workpiece, the probe is for measuring a distance between a tip of the probe and a surface of the second workpiece to be operated, 2. The operating device according to claim 1, wherein the pitch compensation device is for adjusting the vertical pitch between the first workpiece and the second workpiece in response to the control signal.

6. the first workpiece combination includes a first base, a first workpiece fixed to the first base, and a sensor auxiliary tool fixed to the first workpiece, and the first sensor and the second sensor are each fixed to the sensor auxiliary tool; the second workpiece combination includes a second base, a second workpiece placed on the second base, and a measurement auxiliary tool fixed to the second workpiece; The pitch compensation device is provided between the first base and the first workpiece, and / or the pitch compensation device is provided between the second base and the second workpiece, the target measurement position corresponds to a predetermined area on the auxiliary tool to be measured; the first sensor measures the distance between the sensor auxiliary tool and a predetermined area on the measurement auxiliary tool; the second sensor measures the distance between the sensor auxiliary tool and a predetermined area on the measurement auxiliary tool; 2. The operating device according to claim 1, wherein the pitch compensation device adjusts the vertical pitch between the first workpiece and the second workpiece in response to the control signal.

7. the first workpiece combination includes a first base, a first workpiece fixed to the first base, a first base auxiliary tool fixed to the first base, and a sensor auxiliary tool fixed to the first base auxiliary tool, the first sensor and the second sensor being fixed to the sensor auxiliary tool, the second workpiece combination includes a second base, a second workpiece placed on the second base, a second base auxiliary tool fixed to the second base, and a measured auxiliary tool fixed to the second base auxiliary tool; The pitch compensation device is provided between the first base and the first workpiece, and / or the pitch compensation device is provided between the second base and the second workpiece, the target measurement position corresponds to a predetermined area on the auxiliary tool to be measured; the first sensor measures the distance between the sensor auxiliary tool and a predetermined area on the measurement auxiliary tool; the second sensor measures the distance between the sensor auxiliary tool and a predetermined area on the measurement auxiliary tool; 2. The operating device according to claim 1, wherein the pitch compensation device adjusts the vertical pitch between the first workpiece and the second workpiece in response to the control signal.

8. the first workpiece combination includes a first base, a first workpiece fixed to the first base, and a processing object fixed to the first workpiece, the first sensor and the second sensor being fixed to the first workpiece, the second workpiece combination includes a second base, a workpiece fixing portion, and a second workpiece fixed to the second base via the workpiece fixing portion; The pitch compensation device is provided between the first base and the first workpiece, and / or the pitch compensation device is provided between the second base and the workpiece fixing portion, the workpiece is used to machine the second workpiece; the target measurement position corresponds to a predetermined area of ​​an unmachined portion on the second workpiece, or the target measurement position corresponds to a predetermined area of ​​an already machined portion on the second workpiece; the first sensor measures a distance between the first workpiece and a predetermined area on the second workpiece; the second sensor measures a distance between the first workpiece and a predetermined area on the second workpiece; 2. The operating device according to claim 1, wherein the pitch compensation device adjusts the vertical pitch between the first workpiece and the second workpiece in response to the control signal.

9. 9. The operating device according to claim 1, wherein the pitch compensation device is made of one of a piezoelectric element, a thermal expansion element, and a flat plate capacitor.

10. A pitch compensation method for relative movement of two workpieces, which is applied to the operating device according to any one of claims 1 to 8, controlling a first workpiece combination and a second workpiece combination to move relative to each other in a first direction, driving a first sensor to move the first sensor to a target measurement position, and measuring a first distance between the first workpiece combination and the second workpiece combination by the first sensor; controlling the first workpiece combination and the second workpiece combination to move relative to each other in a first direction, driving a second sensor to move it to the target measurement position, and measuring a second distance between the first workpiece combination and the second workpiece combination by the second sensor; generating a control signal based on a first difference obtained by subtracting the second distance from the first distance, and using the control signal to control the pitch compensation device to adjust a vertical pitch in a second direction between the first workpiece combination and the second workpiece combination, wherein the first direction is perpendicular to the second direction or has a perpendicular component to the second direction; controlling the first workpiece combination and the second workpiece combination to move relatively in a first direction, driving a third sensor to move it to the target measurement position, and measuring a third distance between the first workpiece combination and the second workpiece combination by the third sensor; calculating a second difference by subtracting the third distance from the first distance, and determining whether or not compensation for the vertical pitch between the first workpiece combination and the second workpiece combination needs to be performed again based on the first difference and the second difference.

11. The step of generating a control signal based on a first difference obtained by subtracting the second distance from the first distance includes: When the first difference is greater than zero, generating a control signal to adjust the vertical pitch between the first workpiece combination and the second workpiece combination so that the first difference increases; and if the first difference is less than zero, generating a control signal to adjust the vertical pitch between the first workpiece combination and the second workpiece combination so as to reduce the absolute value of the first difference.

12. The step of determining whether or not it is necessary to perform compensation for the vertical pitch between the first workpiece combination and the second workpiece combination again based on the first difference and the second difference includes: determining that there is no need to recompensate the vertical pitch between the first workpiece combination and the second workpiece combination when an absolute value of the difference between the first difference and the second difference is less than a preset difference threshold value; and determining that compensation for the vertical pitch between the first workpiece combination and the second workpiece combination needs to be performed again when an absolute value of a difference between the first difference and the second difference is equal to or greater than a preset difference threshold value.

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