Resist composition and method for forming a resist pattern

The resist composition addresses the need for improved lithographic characteristics by generating acid upon exposure, enhancing sensitivity and resolution while reducing roughness in resist pattern formation.

JP7837154B2Active Publication Date: 2026-03-30TOKYO OHKA KOGYO CO LTD
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2021-09-30
Publication Date
2026-03-30

AI Technical Summary

Technical Problem

As lithography technology advances and resist patterns become increasingly miniaturized, there is a growing need to improve lithographic characteristics such as sensitivity, resolution, and roughness without any trade-offs.

Method used

A resist composition that generates acid upon exposure, comprising a resin component with a specific constituent unit and an acid generating agent component, which changes solubility in a developer due to acid action, enhancing sensitivity, resolution, and reducing roughness.

Benefits of technology

The resist composition provides improved sensitivity, resolution, and reduced roughness in resist pattern formation, suitable for both alkaline development and solvent development processes.

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Patent Text Reader

Abstract

To provide a resist composition excellent in all of sensitivity, resolution, and roughness reduction, and a resist pattern forming method using the resist composition.SOLUTION: The resist composition contains: a resin component (A1) having a constituent unit (a01) derived from a compound represented by general formula (a0-1); and one or more compounds selected from the group consisting of a compound (B01) represented by general formula (b0-1) and a compound (B02) represented by general formula (b0-2). W01 represents a polymerizable group-containing group; Ya01 represents a single bond or the like; Rx01 represents an acid-dissociable group; Rb1 and Rb4 each represent an aryl group having a fluorine atom, or the like; Rb2, Rb3 and Rb5 each represent an optionally substituted aryl group or the like; and X01- and X02- each represent a counter anion.SELECTED DRAWING: None
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Description

[Technical Field]

[0001] The present invention relates to a resist composition and a resist pattern forming method. [Background technology]

[0002] In recent years, advances in lithography technology have led to rapid miniaturization of patterns in the manufacturing of semiconductor devices and liquid crystal display elements. Generally, miniaturization is achieved by shortening the wavelength (increasing the energy) of the exposure light source.

[0003] Resist materials are required to possess lithography characteristics such as sensitivity to these exposure light sources and resolution that can reproduce patterns of fine dimensions. Conventionally, chemically amplified resist compositions have been used as resist materials that satisfy these requirements. These compositions contain a base component whose solubility in a developer changes due to the action of an acid, and an acid generator component that generates acid upon exposure.

[0004] In chemically amplified resist compositions, resins having multiple constituent units are generally used to improve lithography properties and other characteristics. Furthermore, in the formation of resist patterns, the behavior of acids generated from acid-generating agent components upon exposure is considered a significant factor influencing lithography characteristics. For example, Patent Document 1 describes how to improve sensitivity by employing an onium salt-based acid generator having a sulfonium cation into which a sulfonyl group has been introduced. [Prior art documents] [Patent Documents]

[0005] [Patent Document 1] Patent No. 4411042 [Overview of the project] [Problems that the invention aims to solve]

[0006] As lithography technology continues to advance and resist patterns become increasingly miniaturized, for example, EUV and EB lithography aim to form fine patterns of tens of nanometers. As resist pattern dimensions become smaller, there is a growing need to improve lithographic characteristics such as sensitivity, resolution, and roughness without any trade-offs.

[0007] The present invention has been made in view of the above circumstances, and aims to provide a resist composition that is good in terms of sensitivity, resolution, and roughness reduction, and a method for forming a resist pattern using the resist composition. [Means for solving the problem]

[0008] To solve the above problems, the present invention employs the following configuration. In other words, a first aspect of the present invention is a resist composition that generates acid upon exposure and whose solubility in a developer changes due to the action of the acid, comprising a resin component (A1) whose solubility in a developer changes due to the action of the acid and an acid generating agent component (B) that generates acid upon exposure, wherein the resin component (A1) has a constituent unit (a01) derived from a compound represented by the following general formula (a0-1), and the acid generating agent component (B) comprises one or more compounds selected from the group consisting of a compound (B01) represented by the following general formula (b0-1) and a compound (B02) represented by the following general formula (b0-2).

[0009] [ka] [In the formula, W 01 This is a polymerizable group-containing group. 01 Rx is a single bond or a divalent linking group. 01 is an acid-dissociating group. q is an integer between 0 and 3. n is an integer greater than or equal to 1, where n ≤ q × 2 + 4.

[0010] [ka] [In formula (b0-1), R b1 is an aryl group having a fluorine atom or an aryl group having a fluorinated alkyl group. R b2 and R b3 are each independently an aryl group which may have a substituent, an alkyl group which may have a substituent or an alkenyl group which may have a substituent. Two of R b1 ~R b3 may be bonded to each other to form a ring together with the sulfur atom in the formula. X 01 - is a counter anion. In formula (b0-2), R b4 is an aryl group having a fluorine atom or an aryl group having a fluorinated alkyl group. R b5 is an aryl group which may have a substituent, an alkyl group which may have a substituent or an alkenyl group which may have a substituent. X 02 - is a counter anion. ]

[0011] A second aspect of the present invention is a resist pattern forming method including a step of forming a resist film on a support using the resist composition according to the first aspect, a step of exposing the resist film, and a step of developing the exposed resist film to form a resist pattern.

Advantages of the Invention

[0012] According to the present invention, it is possible to provide a resist composition having good sensitivity, resolution, and roughness reduction properties, and a resist pattern forming method using the resist composition.

Embodiments for Carrying Out the Invention

[0013] In the present specification and the claims, "aliphatic" is a relative concept with respect to aromatic, and is defined to mean a group, a compound, etc. having no aromaticity. "Alkyl group" shall include linear, branched, and cyclic monovalent saturated hydrocarbon groups unless otherwise specified. The same applies to the alkyl group in an alkoxy group. "Alkylene group" shall include linear, branched, and cyclic divalent saturated hydrocarbon groups unless otherwise specified. "Halogen atom" includes fluorine atom, chlorine atom, bromine atom, and iodine atom. "Structural unit" means a monomer unit (monomeric unit) that constitutes a high molecular compound (resin, polymer, copolymer). When it is described as "may have a substituent", it includes both the case where a hydrogen atom (-H) is substituted with a monovalent group and the case where a methylene group (-CH2-) is substituted with a divalent group. "Exposure" is a concept that includes all irradiations of radiation.

[0014] "Acid-decomposable group" is a group having acid-decomposability such that at least a part of the bonds in the structure of the acid-decomposable group can be cleaved by the action of an acid. Examples of the acid-decomposable group whose polarity increases by the action of an acid include a group that decomposes by the action of an acid to generate a polar group. Examples of the polar group include a carboxy group, a hydroxy group, an amino group, a sulfo group (-SO3H), etc. More specifically, examples of the acid-decomposable group include a group in which the polar group is protected by an acid-dissociable group (for example, a group in which a hydrogen atom of an OH-containing polar group is protected by an acid-dissociable group).

[0015] "Acid-dissociable group" means both (i) a group having acid-dissociability such that the bond between the acid-dissociable group and the atom adjacent to the acid-dissociable group can be cleaved by the action of an acid, or (ii) a group in which, after a part of the bonds are cleaved by the action of an acid, a decarboxylation reaction further occurs, whereby the bond between the acid-dissociable group and the atom adjacent to the acid-dissociable group can be cleaved. The acid dissociable group that constitutes the acid decomposable group needs to be a group with a lower polarity than the polar group generated by the dissociation of the acid dissociable group. As a result, when the acid dissociable group dissociates due to the action of an acid, a polar group with a higher polarity than the acid dissociable group is generated, increasing the polarity. As a result, the polarity of the entire (A1) component increases. When the polarity increases, relatively, the solubility in the developer changes. When the developer is an alkaline developer, the solubility increases, and when the developer is an organic developer, the solubility decreases.

[0016] The "base material component" is an organic compound having a film-forming ability. The organic compounds used as the base material component are roughly classified into non-polymers and polymers. As the non-polymer, usually, those with a molecular weight of 500 or more and less than 4000 are used. Hereinafter, when referring to a "low molecular compound", it means a non-polymer with a molecular weight of 500 or more and less than 4000. As the polymer, usually, those with a molecular weight of 1000 or more are used. Hereinafter, when referring to "resin", "high molecular compound" or "polymer", it means a polymer with a molecular weight of 1000 or more. The molecular weight of the polymer shall be the weight average molecular weight in terms of polystyrene by GPC (gel permeation chromatography).

[0017] The "derived structural unit" means a structural unit formed by the cleavage of a multiple bond between carbon atoms, for example, an ethylenic double bond. The "acrylic acid ester" may have a hydrogen atom bonded to the α-position carbon atom substituted with a substituent. The substituent (R αx ) is an atom or group other than a hydrogen atom. Also, it includes itaconic acid diesters in which the substituent (R αx ) is substituted with a substituent containing an ester bond, and α-hydroxyacrylic esters in which the substituent (R αx ) is substituted with a hydroxyalkyl group or a group obtained by modifying its hydroxyl group. The α-position carbon atom of the acrylic acid ester means the carbon atom to which the carbonyl group of acrylic acid is bonded, unless otherwise specified. Hereafter, acrylic acid esters in which the hydrogen atom bonded to the α-carbon atom is replaced by a substituent are sometimes called α-substituted acrylic acid esters.

[0018] The term "derivative" refers to a compound in which the α-position hydrogen atom of the target compound is substituted with another substituent such as an alkyl group or alkyl halide, as well as derivatives thereof. Examples of such derivatives include those in which the hydrogen atom of the hydroxyl group of the target compound (which may have the α-position hydrogen atom substituted with a substituent) is substituted with an organic group; and those in which a substituent other than a hydroxyl group is bonded to the target compound (which may have the α-position hydrogen atom substituted with a substituent). Unless otherwise specified, the α-position refers to the first carbon atom adjacent to the functional group. As substituents that substitute the hydrogen atom at the α-position of hydroxystyrene, R αx Similar examples include the above.

[0019] In this specification and in the claims, depending on the structure represented by the chemical formula, an asymmetric carbon may be present, and enantioisomers or diastereomers may exist. In such cases, a single chemical formula will represent all of these isomers. These isomers may be used individually or as a mixture.

[0020] (Resist composition) The resist composition of this embodiment generates acid upon exposure, and its solubility in the developer changes due to the action of the acid. The resist composition contains a base component (A) (hereinafter also referred to as "component (A)") whose solubility in a developer solution changes due to the action of an acid, and an acid generating agent component (B) (hereinafter also referred to as "component (B)") that generates acid upon exposure.

[0021] When a resist film is formed using the resist composition of this embodiment and selective exposure is performed on the resist film, acid is generated from component (B) in the exposed areas of the resist film, and the solubility of component (A) in the developer changes due to the action of this acid, while the solubility of component (A) in the developer does not change in the unexposed areas of the resist film. As a result, a difference in solubility in the developer occurs between the exposed and unexposed areas of the resist film.

[0022] The resist composition of this embodiment may be a positive-type resist composition or a negative-type resist composition. Furthermore, the resist composition of this embodiment may be for an alkaline development process that uses an alkaline developer for the development process during resist pattern formation, or it may be for a solvent development process that uses an organic developer for the development process. In other words, the resist composition of this embodiment is a "positive-type resist composition for alkaline development processes" that forms a positive-type resist pattern in an alkaline development process, and a "negative-type resist composition for solvent development processes" that forms a negative-type resist pattern in a solvent development process.

[0023] <(A) component> In the resist composition of this embodiment, component (A) contains a resin component (A1) (hereinafter also referred to as "component (A1)") whose solubility in a developer solution changes due to the action of an acid, and the resin component (A1) has a constituent unit (a01) derived from a compound represented by the general formula (a0-1). (A) The component used is at least component (A1), and at least one of other high-molecular-weight compounds and low-molecular-weight compounds may be used in combination with component (A1).

[0024] In the resist composition of this embodiment, component (A) may be used alone or in combination of two or more types.

[0025] (A1) About the ingredients Component (A1) has a constituent unit (a01).

[0026] ≪Component Unit (a01)≫ The constituent unit (a01) is a constituent unit derived from the compound represented by the following general formula (a0-1).

[0027] [ka] [In the formula, W 01 This is a polymerizable group-containing group. 01 Rx is a single bond or a divalent linking group. 01 is an acid-dissociating group. q is an integer between 0 and 3. n is an integer greater than or equal to 1, where n ≤ q × 2 + 4.

[0028] In formula (a0-1), W 01 This is a polymerizable group-containing group. W 01 In this context, a "polymerizable group" refers to a group that enables a compound having a polymerizable group to be polymerized by radical polymerization or the like, and includes, for example, a group containing multiple bonds between carbon atoms, such as an ethylenic double bond. In the constituent unit (a01), the multiple bond in the polymerizable group is cleaved to form the main chain.

[0029] W 01 Examples of polymerizable groups in this material include vinyl group, allyl group, acryloyl group, methacryloyl group, fluorovinyl group, difluorovinyl group, trifluorovinyl group, difluorotrifluoromethylvinyl group, trifluoroallyl group, perfluoroallyl group, trifluoromethylacryloyl group, nonylfluorobutylacryloyl group, vinyl ether group, fluorinated vinyl ether group, allyl ether group, fluorinated allyl ether group, styryl group, vinylnaphthyl group, fluorinated styryl group, fluorinated vinylnaphthyl group, norbornyl group, fluorinated norbornyl group, and silyl group.

[0030] W 01As the "group containing a polymerizable group" in [the relevant context], a group composed only of polymerizable groups may be used, or a group composed of a polymerizable group and other groups other than the polymerizable group may be used. Examples of the other groups other than the polymerizable group include a divalent hydrocarbon group that may have a substituent, a divalent linking group containing a heteroatom, and the like.

[0031] ·Divalent hydrocarbon group that may have a substituent: When the other group other than the polymerizable group is a divalent hydrocarbon group that may have a substituent, the hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group.

[0032] ··Aliphatic hydrocarbon group in the other group other than the polymerizable group The aliphatic hydrocarbon group means a hydrocarbon group having no aromaticity. The aliphatic hydrocarbon group may be saturated or unsaturated, and is usually preferably saturated. Examples of the aliphatic hydrocarbon group include a linear or branched aliphatic hydrocarbon group, or an aliphatic hydrocarbon group containing a ring in its structure, and the like.

[0033] ···Linear or branched aliphatic hydrocarbon group The linear aliphatic hydrocarbon group preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, still more preferably 1 to 4 carbon atoms, and most preferably 1 to 3 carbon atoms. The linear aliphatic hydrocarbon group is preferably a linear alkylene group. Specifically, examples include a methylene group [-CH2-], an ethylene group [-(CH2)2-], a trimethylene group [-(CH2)3-], a tetramethylene group [-(CH2)4-], a pentamethylene group [-(CH2)5-], and the like. The branched aliphatic hydrocarbon group preferably has 2 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, still more preferably 3 or 4 carbon atoms, and most preferably 3 carbon atoms. Preferred branched aliphatic hydrocarbon groups include branched alkylene groups, specifically alkylmethylene groups such as -CH(CH3)-, -CH(CH2CH3)-, -C(CH3)2-, -C(CH3)(CH2CH3)-, -C(CH3)(CH2CH2CH3)-, and -C(CH2CH3)2-; alkylethylene groups such as -CH(CH3)CH2-, -CH(CH3)CH(CH3)-, -C(CH3)2CH2-, -CH(CH2CH3)CH2-, and -C(CH2CH3)2-CH2-; alkyltrimethylene groups such as -CH(CH3)CH2CH2- and -CH2CH(CH3)CH2-; and alkylalkylene groups such as alkyltetramethylene groups such as -CH(CH3)CH2CH2CH2- and -CH2CH(CH3)CH2CH2-. In the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferred.

[0034] The linear or branched aliphatic hydrocarbon group described above may or may not have substituents. Examples of substituents include fluorine atoms, fluorinated alkyl groups having 1 to 5 carbon atoms substituted with fluorine atoms, and carbonyl groups.

[0035] ...Aliphatic hydrocarbon groups containing a ring in their structure Examples of aliphatic hydrocarbon groups containing a ring in the structure include cyclic aliphatic hydrocarbon groups that may contain substituents containing heteroatoms in the ring structure (groups obtained by removing two hydrogen atoms from an aliphatic hydrocarbon ring), groups in which the cyclic aliphatic hydrocarbon group is bonded to the end of a linear or branched aliphatic hydrocarbon group, and groups in which the cyclic aliphatic hydrocarbon group is interposed in the middle of a linear or branched aliphatic hydrocarbon group. Examples of the linear or branched aliphatic hydrocarbon group are the same as those described above. The cyclic aliphatic hydrocarbon group preferably has 3 to 20 carbon atoms, and more preferably has 3 to 12 carbon atoms. The cyclic aliphatic hydrocarbon group may be a polycyclic group or a monocyclic group. A preferred monocyclic alicyclic hydrocarbon group is a group obtained by removing two hydrogen atoms from a monocycloalkane. The monocycloalkane is preferably one having 3 to 6 carbon atoms, specifically cyclopentane, cyclohexane, etc. A preferred polycyclic alicyclic hydrocarbon group is a group obtained by removing two hydrogen atoms from a polycycloalkane, and the polycycloalkane is preferably one having 7 to 12 carbon atoms, specifically adamantane, norbornane, isobornane, tricyclodecane, tetracyclododecane, etc.

[0036] The cyclic aliphatic hydrocarbon group may or may not have substituents. Examples of substituents include alkyl groups, alkoxy groups, halogen atoms, alkyl halides, hydroxyl groups, and carbonyl groups. The alkyl group used as the substituent is preferably an alkyl group having 1 to 5 carbon atoms, and most preferably a methyl group, ethyl group, propyl group, n-butyl group, or tert-butyl group. As the alkoxy group used as the substituent, an alkoxy group having 1 to 5 carbon atoms is preferred, a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, and a tert-butoxy group are more preferred, and a methoxy group and an ethoxy group are most preferred. Examples of halogen atoms used as substituents include fluorine atoms, chlorine atoms, bromine atoms, iodine atoms, and the like, with fluorine atoms being preferred. Examples of halogenated alkyl groups as substituents include groups in which some or all of the hydrogen atoms of the alkyl group are substituted with halogen atoms. A cyclic aliphatic hydrocarbon group may have some of the carbon atoms constituting its ring structure replaced by substituents containing heteroatoms. Preferred substituents containing heteroatoms are -O-, -C(=O)-O-, -S-, -S(=O)2-, and -S(=O)2-O-.

[0037] Aromatic hydrocarbon groups in groups other than the polymerizable group. The aromatic hydrocarbon group is a hydrocarbon group having at least one aromatic ring. The aromatic ring is not particularly limited as long as it is a cyclic conjugated system having 4n+2 π electrons, and may be monocyclic or polycyclic. The number of carbon atoms in the aromatic ring is preferably 5 to 30, more preferably 5 to 20, even more preferably 6 to 15, and particularly preferably 6 to 12. However, this number of carbon atoms does not include the number of carbon atoms in substituents. Specific examples of aromatic rings include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic heterocycles in which some of the carbon atoms constituting the aromatic hydrocarbon ring are substituted with heteroatoms. Examples of heteroatoms in aromatic heterocycles include oxygen atoms, sulfur atoms, and nitrogen atoms. Specific examples of aromatic heterocycles include pyridine rings and thiophene rings. Specific examples of aromatic hydrocarbon groups include groups obtained by removing two hydrogen atoms from the aromatic hydrocarbon ring or aromatic heterocycle (arylene group or heteroarylene group); groups obtained by removing two hydrogen atoms from aromatic compounds containing two or more aromatic rings (e.g., biphenyl, fluorene, etc.); and groups in which one hydrogen atom of an aryl group or heteroaryl group obtained by removing one hydrogen atom from the aromatic hydrocarbon ring or aromatic heterocycle (aryl group or heteroaryl group) is substituted with an alkylene group (e.g., groups obtained by removing one more hydrogen atom from an aryl group in an arylalkyl group such as benzyl group, phenethyl group, 1-naphthylmethyl group, 2-naphthylmethyl group, 1-naphthylethyl group, 2-naphthylethyl group, etc.). The number of carbon atoms in the alkylene group bonded to the aryl group or heteroaryl group is preferably 1 to 4, more preferably 1 to 2, and particularly preferably 1.

[0038] The aromatic hydrocarbon group may have its hydrogen atoms substituted with substituents. For example, the hydrogen atoms bonded to the aromatic ring in the aromatic hydrocarbon group may be substituted with substituents. Examples of such substituents include alkyl groups, alkoxy groups, halogen atoms, alkyl halides, and hydroxyl groups. The alkyl group used as the substituent is preferably an alkyl group having 1 to 5 carbon atoms, and most preferably a methyl group, ethyl group, propyl group, n-butyl group, or tert-butyl group. Examples of the substituents include alkoxy groups, halogen atoms, and alkyl halogens that substitute for hydrogen atoms on the cyclic aliphatic hydrocarbon group.

[0039] • Divalent linking groups containing heteroatoms: If the group other than the polymerizable group is a divalent linking group containing a heteroatom, preferred linking groups include -O-, -C(=O)-O-, -C(=O)-, -OC(=O)-O-, -C(=O)-NH-, -NH-, -NH-C(=NH)- (H may be substituted with substituents such as alkyl groups or acyl groups), -S-, -S(=O)2-, -S(=O)2-O-, and the general formula -Y 21 -OY 22 -, -Y 21 -O-, -Y 21 -C(=O)-O-, -C(=O)-OY 21 -,-[Y 21 -C(=O)-O] m” -Y 22 -, -Y 21 -OC(=O)-Y 22 - or -Y 21 -S(=O)2-OY 22 - is represented by the base [wherein Y 21 and Y 22 Each of these is a divalent hydrocarbon group which may have substituents independently, O is an oxygen atom, and m'' is an integer from 0 to 3. When the aforementioned divalent linking group containing a heteroatom is -C(=O)-NH-, -C(=O)-NH-C(=O)-, -NH-, or -NH-C(=NH)-, the H may be substituted with substituents such as alkyl groups or acyl groups. The substituent (alkyl group, acyl group, etc.) preferably has 1 to 10 carbon atoms, more preferably 1 to 8, and particularly preferably 1 to 5. General formula-Y 21 -OY 22 -, -Y21 -O-, -Y 21 -C(=O)-O-, -C(=O)-OY 21 -,-[Y 21 -C(=O)-O] m” -Y 22 -, -Y 21 -OC(=O)-Y 22 - or -Y 21 -S(=O)2-OY 22 - Middle, Y 21 and Y 22 These are, independently, divalent hydrocarbon groups which may have substituents. Examples of such divalent hydrocarbon groups are the same as those listed in the description of divalent linking groups (divalent hydrocarbon groups which may have substituents). Y 21 Preferably, the group is a linear aliphatic hydrocarbon group, more preferably a linear alkylene group, even more preferably a linear alkylene group having 1 to 5 carbon atoms, and particularly preferably a methylene group or an ethylene group. Y 22 The group is preferably a linear or branched aliphatic hydrocarbon group, more preferably a methylene group, an ethylene group, or an alkylmethylene group. The alkyl group in the alkylmethylene group is preferably a linear alkyl group having 1 to 5 carbon atoms, more preferably a linear alkyl group having 1 to 3 carbon atoms, and most preferably a methyl group. Formula - [Y 21 -C(=O)-O] m” -Y 22 In the base represented by -, m'' is an integer between 0 and 3, preferably between 0 and 2, more preferably 0 or 1, and particularly preferably 1. That is, in the formula -[Y 21 -C(=O)-O] m” -Y 22 As a base represented by -, formula -Y 21 -C(=O)-OY 22 Groups represented by - are particularly preferred. Among them, the group represented by formula -(CH2) a’ -C(=O)-O-(CH2) b’A base represented by - is preferred. In the formula, a' is an integer from 1 to 10, preferably an integer from 1 to 8, more preferably an integer from 1 to 5, even more preferably 1 or 2, and most preferably 1. b' is an integer from 1 to 10, preferably an integer from 1 to 8, more preferably an integer from 1 to 5, even more preferably 1 or 2, and most preferably 1.

[0040] W 01 For example, the chemical formula is C(R X11 )(R X12 )=C(R X13 )-Ya x0 The group represented by - is preferably mentioned. In this chemical formula, R X11 , R X12 and R X13 These are, respectively, a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, and Ya x0 It is a single bond or a divalent linking group.

[0041] R X11 , R X12 and R X13 The alkyl group having 1 to 5 carbon atoms is preferably a linear or branched alkyl group having 1 to 5 carbon atoms, specifically including methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl, isopentyl, and neopentyl groups. The halogenated alkyl group having 1 to 5 carbon atoms is a group in which some or all of the hydrogen atoms of the alkyl group having 1 to 5 carbon atoms are substituted with halogen atoms. Fluorine atoms are particularly preferred as the halogen atoms. Among these, R X11 and R X12 Preferably, these are a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms, respectively. From the standpoint of industrial availability, a hydrogen atom and a methyl group are more preferred, and a hydrogen atom is particularly preferred. Also, R X13Preferably, the group is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms. Due to their industrial availability, a hydrogen atom or a methyl group is more preferable, and a hydrogen atom is particularly preferable.

[0042] Ya x0 The divalent linking group in is not particularly limited, but suitable examples include a divalent hydrocarbon group which may have substituents, a divalent linking group which contains a heteroatom, etc., and the same applies to each of these as described above.

[0043] Among the above, Ya x0 Preferably, the bonds are ester bonds [-C(=O)-O-, -OC(=O)-], ether bonds (-O-), linear or branched alkylene groups, aromatic hydrocarbon groups or combinations thereof, or single bonds. Among these, Ya x0 The ester bond [-C(=O)-O-, -OC(=O)-], a combination of an ester bond [-C(=O)-O-, -OC(=O)-] and a linear alkylene group, or a single bond is more preferable, and an ester bond [-C(=O)-O-, -OC(=O)-] or a single bond is even more preferable.

[0044] In equation (a0-1), Ya 01 It is a single bond or a divalent linking group. 01 The divalent linking group in is not particularly limited, but suitable examples include a divalent hydrocarbon group which may have substituents, a divalent linking group which contains a heteroatom, etc., and the same applies to each of these as described above.

[0045] In equation (a0-1), Ya 01 Among the above, it is preferable that the ester bond [-C(=O)-O-, -OC(=O)-], ether bond (-O-), linear or branched alkylene group, aromatic hydrocarbon group or a combination thereof, or single bond. Among these, Ya 01As for this, a combination of an ester bond [-C(=O)-O-, -O-C(=O)-] and a linear alkylene group, or a single bond is more preferable, and a single bond is even more preferable.

[0046] In formula (a0-1), Rx 01 is an acid dissociable group. Specific examples of the acid dissociable group include the "acetal type acid dissociable group" and "tertiary alkyl ester type acid dissociable group" described below.

[0047] Acetal type acid dissociable group: Examples of the acid dissociable group for protecting a carboxy group or a hydroxy group include an acid dissociable group represented by the following general formula (a0-r-1) (hereinafter sometimes referred to as "acetal type acid dissociable group").

[0048] [Chemical formula] [In formula (a0-r-1), Ra 01 and Ra 02 are each independently a hydrogen atom or an alkyl group. Ra 03 is a hydrocarbon group, and Ra 01 or Ra 02 may combine with any one of them to form a ring. * indicates a bond.]

[0049] In formula (a0-r-1), Ra 01 and Ra 02 are each independently a hydrogen atom or an alkyl group. In formula (a0-r-1), Ra 01 and Ra 02 are preferably at least one of them is a hydrogen atom, and more preferably both are hydrogen atoms. Ra 01 or Ra 02If the alkyl group is an alkyl group having 1 to 5 carbon atoms, then an alkyl group having 1 to 5 carbon atoms is preferred. Specifically, linear or branched alkyl groups are preferred. More specifically, examples include methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, pentyl group, isopentyl group, neopentyl group, etc., with methyl or ethyl groups being more preferred, and methyl groups being particularly preferred. In formula (a0-r-1), Ra 01 and Ra 02 Among the above, each is preferably a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and more preferably a hydrogen atom or a methyl group.

[0050] In formula (a0-r-1), Ra 03 Examples of hydrocarbon groups include linear or branched alkyl groups, or cyclic hydrocarbon groups. The linear alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 4 carbon atoms, and even more preferably 1 or 2 carbon atoms. Specifically, examples include methyl group, ethyl group, n-propyl group, n-butyl group, n-pentyl group, etc. Among these, methyl group, ethyl group, or n-butyl group is preferred, and methyl group or ethyl group is more preferred.

[0051] The branched alkyl group preferably has 3 to 10 carbon atoms, and more preferably 3 to 5 carbon atoms. Specifically, examples include isopropyl group, isobutyl group, tert-butyl group, isopentyl group, neopentyl group, 1,1-diethylpropyl group, 2,2-dimethylbutyl group, etc., with isopropyl group being preferred.

[0052] Ra 03 When the hydrocarbon group is a cyclic hydrocarbon group, the hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group, and may be a polycyclic group or a monocyclic group. As a monocyclic aliphatic hydrocarbon group, a group obtained by removing one hydrogen atom from a monocycloalkane is preferred. The monocycloalkane is preferably one having 3 to 6 carbon atoms, and specific examples include cyclopentane and cyclohexane. The polycyclic aliphatic hydrocarbon group is preferably a polycycloalkane from which one hydrogen atom has been removed, and the polycycloalkane is preferably one having 7 to 12 carbon atoms, specifically including adamantane, norbornane, isobornane, tricyclodecane, tetracyclododecane, and the like.

[0053] Ra 03 When the cyclic hydrocarbon group becomes an aromatic hydrocarbon group, the aromatic hydrocarbon group is a hydrocarbon group having at least one aromatic ring. This aromatic ring is not particularly limited as long as it is a cyclic conjugated system having 4n+2 π electrons, and may be monocyclic or polycyclic. The aromatic ring preferably has 5 to 30 carbon atoms, more preferably 5 to 20, even more preferably 6 to 15, and particularly preferably 6 to 12. Examples of aromatic rings include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic heterocycles in which some of the carbon atoms constituting the aromatic hydrocarbon ring are replaced by heteroatoms. Examples of heteroatoms in aromatic heterocycles include oxygen atoms, sulfur atoms, and nitrogen atoms. Examples of aromatic heterocycles include pyridine rings and thiophene rings. Ra 03Specific examples of aromatic hydrocarbon groups in this context include: a group obtained by removing one hydrogen atom from the aromatic hydrocarbon ring or aromatic heterocycle (aryl group or heteroaryl group); a group obtained by removing one hydrogen atom from an aromatic compound containing two or more aromatic rings (e.g., biphenyl, fluorene, etc.); and a group in which one of the hydrogen atoms of the aromatic hydrocarbon ring or aromatic heterocycle is substituted with an alkylene group (e.g., arylalkyl groups such as benzyl group, phenethyl group, 1-naphthylmethyl group, 2-naphthylmethyl group, 1-naphthylethyl group, 2-naphthylethyl group, etc.). The number of carbon atoms in the alkylene group bonded to the aromatic hydrocarbon ring or aromatic heterocycle is preferably 1 to 4, more preferably 1 to 2, and particularly preferably 1.

[0054] Ra 03 The cyclic hydrocarbon group in may have substituents. Examples of substituents include -R P1 ,-R P2 -OR P1 ,-R P2 -CO-R P1 ,-R P2 -CO-OR P1 ,-R P2 -O-CO-R P1 ,-R P2 -OH, -R P2 -CN or -R P2 -COOH (These substituents are collectively referred to as "Ra" below) x5 It is also called "[...]." Examples include [...]. Here, R P1 This is a monovalent linear saturated hydrocarbon group having 1 to 10 carbon atoms, a monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms, or a monovalent aromatic hydrocarbon group having 6 to 30 carbon atoms. Also, R P2 This refers to a single bond, a divalent chain saturated hydrocarbon group having 1 to 10 carbon atoms, a divalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms, or a divalent aromatic hydrocarbon group having 6 to 30 carbon atoms. However, R P1 and R P2Some or all of the hydrogen atoms in the chain-like saturated hydrocarbon group, aliphatic cyclic saturated hydrocarbon group, and aromatic hydrocarbon group may be substituted with fluorine atoms. The aliphatic cyclic hydrocarbon group may have one or more of the substituents individually, or it may have one or more of each of the substituents. Examples of monovalent chain-like saturated hydrocarbon groups having 1 to 10 carbon atoms include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, and decyl groups. Examples of monovalent aliphatic cyclic saturated hydrocarbon groups having 3 to 20 carbon atoms include monocyclic aliphatic saturated hydrocarbon groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclodecyl, and cyclododecyl groups; and polycyclic aliphatic saturated hydrocarbon groups such as bicyclo[2.2.2]octanyl, tricyclo[5.2.1.02,6]decanyl, tricyclo[3.3.1.13,7]decanyl, tetracyclo[6.2.1.13,6.02,7]dodecanyl, and adamantyl groups. Examples of monovalent aromatic hydrocarbon groups with 6 to 30 carbon atoms include groups obtained by removing one hydrogen atom from an aromatic hydrocarbon ring, such as benzene, biphenyl, fluorene, naphthalene, anthracene, and phenanthrene.

[0055] Ra 03 However, Ra 01 Ra 02 When the cyclic group is bonded to any of the above to form a ring, the cyclic group is preferably a 4- to 7-membered ring, and more preferably a 4- to 6-membered ring. Specific examples of the cyclic group include a tetrahydropyranyl group and a tetrahydrofuranyl group.

[0056] Specific examples of acetal-type acid-dissociating groups are shown below. * indicates a bond.

[0057] [ka]

[0058] Tertiary alkyl ester type acid-dissociating group: Examples of acid-dissociable groups that protect the carboxyl group include the acid-dissociable group represented by the following general formula (a0-r-2). Furthermore, among the acid-dissociable groups represented by the following formula (a0-r-2), those composed of alkyl groups may, for convenience, be referred to below as "tertiary alkyl ester type acid-dissociable groups."

[0059] [ka] [In formula (a0-r-2), Ra 04 ~Ra 06 Each of these is independently a hydrocarbon group, and Ra 05 and Ra 06 These elements may join with each other to form a ring. * indicates a bonding hand.

[0060] Ra 04 Examples of hydrocarbon groups include linear or branched alkyl groups, linear or cyclic alkenyl groups, or cyclic hydrocarbon groups. Ra 04 In the above, linear or branched alkyl groups, cyclic hydrocarbon groups (monocyclic aliphatic hydrocarbon groups, polycyclic aliphatic hydrocarbon groups, aromatic hydrocarbon groups) are defined as Ra 03 Similar examples include the above. Ra 04 The linear or cyclic alkenyl group in this is preferably an alkenyl group having 2 to 10 carbon atoms. Ra 05 Ra 06 As for the hydrocarbon group, the Ra 03 Similar examples include the above.

[0061] Ra 05 and Ra 06 When these groups bond to each other to form a ring, the following groups are preferred: the group represented by the general formula (a0-r2-01), the group represented by the general formula (a0-r2-02), and the group represented by the general formula (a0-r2-03). Meanwhile, Ra 04 ~Ra 06When these are independent hydrocarbon groups that are not bonded to each other, the group represented by the following general formula (a0-r2-04) is preferred.

[0062] [ka] [In formula (a0-r2-01), Ra 001 This is a linear or branched alkyl group which may have substitutions. 0 Xaa is a carbon atom. 0 Yaa 0 It is a group that forms a cyclic hydrocarbon group together with other groups. Some or all of the hydrogen atoms in this cyclic hydrocarbon group may be substituted, and some of the carbon atoms constituting the ring may be substituted with heteroatoms. * indicates a bond. In formula (a0-r2-02), Yab 0 Xab is a carbon atom. 0 Yab 0 It is a group that forms a cyclic hydrocarbon group together with [another group]. Some or all of the hydrogen atoms in this cyclic hydrocarbon group may be substituted, and some of the carbon atoms constituting the ring may be substituted with heteroatoms. 002 ~Ra 004 Each of these is independently a hydrogen atom, a monovalent linear saturated hydrocarbon group having 1 to 10 carbon atoms, or a monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms. Some or all of the hydrogen atoms in these linear saturated hydrocarbon groups and aliphatic cyclic saturated hydrocarbon groups may be substituted. 002 ~Ra 004 Two or more of these may be joined together to form a ring structure. * indicates a bonding hand. In formula (a0-r2-03), Yac 0 Xac is a carbon atom. 0 Yac 0 It is a group that forms a cyclic hydrocarbon group together with [another group]. Some or all of the hydrogen atoms in this cyclic hydrocarbon group may be substituted, and some of the carbon atoms constituting the ring may be substituted with heteroatoms. 005is an aromatic hydrocarbon group. Some or all of the hydrogen atoms in this aromatic hydrocarbon group may be substituted, and some of the carbon atoms constituting the ring may be substituted with heteroatoms. * indicates a bond. In formula (a0-r2-04), Ra 006 and Ra 007 Each of these is independently a monovalent, chain-like saturated hydrocarbon group having 1 to 10 carbon atoms. Some or all of the hydrogen atoms in this chain-like saturated hydrocarbon group may be substituted. 008 This is a hydrocarbon group that may have substituents. * indicates a bond.

[0063] In formula (a0-r2-01), Ra 001 This is a linear or branched alkyl group which may have substitutions. The linear alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 4 carbon atoms, and even more preferably 1 or 2 carbon atoms. Specifically, examples include methyl group, ethyl group, n-propyl group, n-butyl group, n-pentyl group, etc. Among these, methyl group, ethyl group, or n-butyl group is preferred, and methyl group or ethyl group is more preferred.

[0064] The branched alkyl group preferably has 3 to 10 carbon atoms, and more preferably 3 to 5 carbon atoms. Specifically, examples include isopropyl group, isobutyl group, tert-butyl group, isopentyl group, neopentyl group, 1,1-diethylpropyl group, 2,2-dimethylbutyl group, etc., with tert-butyl group being preferred.

[0065] Ra 001 Examples of substituents that the linear or branched alkyl group in the above-mentioned Ra may have include x5 These are some examples.

[0066] In formula (a0-r2-01), Ra 001Among the above, it is preferable that the alkyl group is a linear alkyl group having 1 to 5 carbon atoms or a branched alkyl group having 3 to 10 carbon atoms, and more preferably a linear alkyl group having 1 to 4 carbon atoms or a branched alkyl group having 3 to 5 carbon atoms.

[0067] In formula (a0-r2-01), Yaa 0 Xaa is a carbon atom, 0 Yaa 0 It is a group that, together with other groups, forms a cyclic hydrocarbon group. The cyclic hydrocarbon group may be an aliphatic hydrocarbon group, a fused cyclic hydrocarbon group formed by an aliphatic hydrocarbon group and an aromatic hydrocarbon group, and may be a polycyclic or monocyclic group.

[0068] As a monocyclic aliphatic hydrocarbon group, a group obtained by removing two or more hydrogen atoms from a monocycloalkane is preferred. The monocycloalkane is preferably one having 3 to 6 carbon atoms, and preferably one having 5 or 6 carbon atoms, and specific examples include cyclopentane and cyclohexane. The polycyclic aliphatic hydrocarbon group is preferably a polycycloalkane from which two or more hydrogen atoms have been removed, and the polycycloalkane is preferably one having 7 to 12 carbon atoms, specifically including adamantane, norbornane, isobornane, tricyclodecane, tetracyclododecane, and the like.

[0069] In a fused cyclic hydrocarbon group formed by an aliphatic hydrocarbon group and an aromatic hydrocarbon group, the aromatic hydrocarbon group is a hydrocarbon group having at least one aromatic ring. This aromatic ring is not particularly limited as long as it is a cyclic conjugated system having 4n+2 π electrons, and may be monocyclic or polycyclic. The aromatic ring preferably has 5 to 30 carbon atoms, more preferably 5 to 20, even more preferably 6 to 15, and particularly preferably 6 to 12. Examples of aromatic rings include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic heterocycles in which some of the carbon atoms constituting the aromatic hydrocarbon ring are replaced by heteroatoms. Examples of heteroatoms in aromatic heterocycles include oxygen atoms, sulfur atoms, and nitrogen atoms. Examples of aromatic heterocycles include pyridine rings and thiophene rings.

[0070] The following are specific examples of fused cyclic hydrocarbon groups formed by the combination of an aliphatic hydrocarbon group and an aromatic hydrocarbon group.

[0071] [ka]

[0072] Some or all of the hydrogen atoms in the above-mentioned cyclic hydrocarbon group may be substituted, and some of the carbon atoms constituting the ring may be substituted with heteroatoms. Specifically, as substituents that replace some or all of the hydrogen atoms of the above-mentioned cyclic hydrocarbon group, the above-mentioned Ra x5 Examples include oxygen atoms, sulfur atoms, and nitrogen atoms when some of the carbon atoms constituting the ring are substituted with heteroatoms.

[0073] In formula (a0-r2-01), Xaa 0 And, Yaa 0 Among the above, the cyclic hydrocarbon group formed by the two is preferably a monocyclic or polycyclic aliphatic hydrocarbon group, more preferably a monocyclic aliphatic hydrocarbon group, and even more preferably a monocyclic aliphatic hydrocarbon group having 5 or 6 carbon atoms.

[0074] In formula (a0-r2-02), Yab 0 Xab is a carbon atom, 0 Yab 0 It is a group that forms a cyclic hydrocarbon group together with the above. This cyclic hydrocarbon group is Xaa 0 And, Yaa 0 Examples include cyclic hydrocarbon groups similar to those formed by [the compound].

[0075] In formula (a0-r2-02), Ra 002 ~Ra 004 Each of these is independently a hydrogen atom, a monovalent linear saturated hydrocarbon group having 1 to 10 carbon atoms, or a monovalent aliphatic cyclic saturated hydrocarbon group having 3 to 20 carbon atoms.

[0076] Ra 002 ~Ra 004 Examples of monovalent chain-like saturated hydrocarbon groups having 1 to 10 carbon atoms include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, and decyl groups. Ra 002 ~Ra 004 Examples of monovalent aliphatic cyclic saturated hydrocarbon groups having 3 to 20 carbon atoms include monocyclic aliphatic saturated hydrocarbon groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclodecyl, and cyclododecyl groups; and polycyclic aliphatic saturated hydrocarbon groups such as bicyclo[2.2.2]octanyl, tricyclo[5.2.1.02,6]decanyl, tricyclo[3.3.1.13,7]decanyl, tetracyclo[6.2.1.13,6.02,7]dodecanyl, and adamantyl groups.

[0077] Ra 002 ~Ra 004 In the above, some or all of the hydrogen atoms of the chain-like saturated hydrocarbon group and the aliphatic cyclic saturated hydrocarbon group may be substituted. Specifically, as substituents that substitute some or all of the hydrogen atoms of the chain-like saturated hydrocarbon group and the aliphatic cyclic saturated hydrocarbon group, the above-mentioned Ra x5 Examples include oxygen atoms, sulfur atoms, and nitrogen atoms, when some of the carbon atoms constituting the ring are substituted with heteroatoms.

[0078] Ra 002 ~Ra 004Groups containing a carbon-carbon double bond formed by two or more of these groups bonding to each other to form a cyclic structure include, for example, cyclopentenyl group, cyclohexenyl group, methylcyclopentenyl group, methylcyclohexenyl group, cyclopentylideneethenyl group, and cyclohexyllideneethenyl group. Among these, cyclopentenyl group, cyclohexenyl group, and cyclopentylideneethenyl group are preferred from the viewpoint of ease of synthesis.

[0079] In formula (a0-r2-02), Ra 002 ~Ra 004 Among the above, hydrogen atoms and monovalent chain saturated hydrocarbon groups having 1 to 10 carbon atoms are preferred, hydrogen atoms, methyl groups, and ethyl groups are more preferred, and hydrogen atoms are even more preferred.

[0080] In formula (a0-r2-03), Yac 0 Xac is a carbon atom, 0 Yac 0 It is a group that forms a cyclic hydrocarbon group together with the above. This cyclic hydrocarbon group is Xaa 0 And, Yaa 0 Examples include cyclic hydrocarbon groups similar to those formed by [the compound].

[0081] In formula (a0-r2-03), Ra 005 The aromatic hydrocarbon group is preferably an aromatic hydrocarbon ring having 6 to 15 carbon atoms from which one or more hydrogen atoms have been removed, more preferably a group from which one or more hydrogen atoms have been removed from benzene, naphthalene, anthracene, or phenanthrene, even more preferably a group from which one or more hydrogen atoms have been removed from benzene or naphthalene, and particularly preferably a group from which one or more hydrogen atoms have been removed from benzene.

[0082] Some or all of the hydrogen atoms in the above aromatic hydrocarbon group may be substituted, and some of the carbon atoms constituting the ring may be substituted with heteroatoms. Specifically, as substituents that replace some or all of the hydrogen atoms of the above aromatic hydrocarbon group, the above-mentioned Ra x5Examples include oxygen atoms, sulfur atoms, and nitrogen atoms, when some of the carbon atoms constituting the ring are substituted with heteroatoms.

[0083] In formula (a0-r2-04), Ra 006 and Ra 007 These are, independently, monovalent, chain-like saturated hydrocarbon groups having 1 to 10 carbon atoms. Ra 006 and Ra 007 In this context, the monovalent chain-like saturated hydrocarbon group having 1 to 10 carbon atoms is the aforementioned Ra 002 ~Ra 004 Examples include monovalent, chain-like saturated hydrocarbon groups having 1 to 10 carbon atoms.

[0084] In formula (a0-r2-04), Ra 006 and Ra 007 Among the above, alkyl groups having 1 to 5 carbon atoms are preferred, methyl groups and ethyl groups are more preferred, and methyl groups are even more preferred. Ra 006 and Ra 007 When a chain-like saturated hydrocarbon group represented by is substituted, the substituent may be, for example, the above-mentioned Ra x5 Similar bases can be cited.

[0085] In formula (a0-r2-04), Ra 008 Ra is a hydrocarbon group which may have substituents. 008 Examples of hydrocarbon groups in this context include linear or branched alkyl groups, or cyclic hydrocarbon groups.

[0086] Ra 008 The linear alkyl group in this compound preferably has 1 to 5 carbon atoms, more preferably 1 to 4, and even more preferably 1 or 2 carbon atoms. Specifically, examples include methyl, ethyl, n-propyl, n-butyl, and n-pentyl groups. Among these, methyl, ethyl, or n-butyl groups are preferred, and methyl or ethyl groups are more preferred.

[0087] Ra 008The branched alkyl group in the compound preferably has 3 to 10 carbon atoms, and more preferably 3 to 5 carbon atoms. Specifically, examples include isopropyl group, isobutyl group, tert-butyl group, isopentyl group, neopentyl group, 1,1-diethylpropyl group, 2,2-dimethylbutyl group, etc., with isopropyl group being preferred.

[0088] Ra 008 When the hydrocarbon group is a cyclic hydrocarbon group, the hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group, and may be a polycyclic group or a monocyclic group. As a monocyclic aliphatic hydrocarbon group, a group obtained by removing one hydrogen atom from a monocycloalkane is preferred. The monocycloalkane is preferably one having 3 to 6 carbon atoms, and specific examples include cyclopentane and cyclohexane. The polycyclic aliphatic hydrocarbon group is preferably a polycycloalkane from which one hydrogen atom has been removed, and the polycycloalkane is preferably one having 7 to 12 carbon atoms, specifically including adamantane, norbornane, isobornane, tricyclodecane, tetracyclododecane, and the like.

[0089] Ra 008 As for aromatic hydrocarbon groups in this context, Ra 005 Examples include those similar to aromatic hydrocarbon groups in [the text]. Among them, Ra 008 The group is preferably an aromatic hydrocarbon ring having 6 to 15 carbon atoms from which one or more hydrogen atoms have been removed; more preferably a group from which one or more hydrogen atoms have been removed from benzene, naphthalene, anthracene, or phenanthrene; even more preferably a group from which one or more hydrogen atoms have been removed from benzene, naphthalene, or anthracene; particularly preferably a group from which one or more hydrogen atoms have been removed from naphthalene or anthracene; and most preferably a group from which one or more hydrogen atoms have been removed from naphthalene. Ra 008 A substituent that may be present is Ra 005 Examples of substituents that may be present include those similar to those that the molecule may have.

[0090] Ra in equation (a0-r2-04)008 If is a naphthyl group, the position where it bonds with the tertiary carbon atom in formula (a1-r2-4) may be either position 1 or position 2 of the naphthyl group. Ra in equation (a0-r2-04) 008 If is an anthyl group, the position where it bonds with the tertiary carbon atom in formula (a0-r2-04) may be position 1, 2, or 9 of the anthyl group.

[0091] Specific examples of the group represented by the above formula (a0-r2-01) are given below.

[0092] [ka]

[0093] [ka]

[0094] [ka]

[0095] Specific examples of the group represented by the formula (a0-r2-02) are given below.

[0096] [ka]

[0097] [ka]

[0098] [ka]

[0099] Specific examples of the group represented by the above formula (a0-r2-03) are given below.

[0100] [ka]

[0101] Specific examples of the group represented by the above formula (a0-r2-04) are given below.

[0102] [ka]

[0103] In the above equation (a0-1), Rx 01 The acid-dissociable group in is preferably a tertiary alkyl ester type acid-dissociable group, and more preferably an acid-dissociable group represented by any of the above formulas (a0-r2-01) to (a0-r2-03).

[0104] In the above formula (a0-1), q is an integer between 0 and 3. When q is 0, it is a benzene structure; when q is 1, it is a naphthalene structure; when q is 2, it is an anthracene structure; and when q is 3, it is a tetracene structure.

[0105] In the above formula (a0-1), n ​​is an integer of 1 or more, preferably 1 to 5, more preferably 1 to 3, and even more preferably 1 or 2.

[0106] In the above equation (a0-1), n ​​≤ q × 2 + 4. For example, if q is 1 and the structure is naphthalene, then the naphthalene is a polymerizable group containing (W 01 ) and -Ya 01 -(C=O)-O-Rx 01 All hydrogen atoms other than those substituted with a hydroxyl group may be substituted with a hydroxyl group. In addition, in the naphthalene, polymerizable group-containing group (W 01 ), -Ya 01 -(C=O)-O-Rx 01 The substitution positions of the group and the hydroxyl group are not particularly limited.

[0107] The constituent unit (a01) is preferably a constituent unit represented by the following general formula (a0-1-1) among the above.

[0108] [ka] [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkyl halogen having 1 to 5 carbon atoms. 001 It is a single bond or a divalent linking group. 01 It is a single bond or a divalent linking group. Rax 01 is an acid-dissociable group represented by the general formula (a0-r-1) or (a0-r-2) described above. q is an integer between 0 and 3. n is an integer greater than or equal to 1, where n ≤ q × 2 + 4.

[0109] In formula (a0-1-1), the C1-C5 alkyl group of R is preferably a linear or branched alkyl group having 1 to 5 carbon atoms, specifically including methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl, isopentyl, and neopentyl groups. The C1-C5 halogenated alkyl group is a group in which some or all of the hydrogen atoms of the C1-C5 alkyl group are substituted with halogen atoms. Fluorine atoms are particularly preferred as the halogen atoms. R is preferably a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms, with a hydrogen atom or a methyl group being the most preferred due to their industrial availability.

[0110] In equation (a0-1-1), Ya 001 It is a single bond or a divalent linking group. Ya 001 The divalent linking group in is not particularly limited, but suitable examples include a divalent hydrocarbon group which may have substituents, and a divalent linking group which contains a heteroatom, respectively. 01 This is similar to the divalent hydrocarbon group and the divalent linking group containing a heteroatom in [the given material].

[0111] Among the above, Ya001 Preferably, the bonds are ester bonds [-C(=O)-O-, -OC(=O)-], ether bonds (-O-), linear or branched alkylene groups, aromatic hydrocarbon groups or combinations thereof, or single bonds. Among these, Ya 001 The ester bond [-C(=O)-O-, -OC(=O)-], a combination of an ester bond [-C(=O)-O-, -OC(=O)-] and a linear alkylene group, or a single bond is more preferable, and an ester bond [-C(=O)-O-, -OC(=O)-] or a single bond is even more preferable.

[0112] In equation (a0-1-1), Ya 01 This is Ya in the above equation (a0-1) 01 It is identical to [the other one].

[0113] In formula (a0-1-1), Rax 01 This is an acid-dissociable group represented by the general formula (a0-r-1) or (a0-r-2) described above. In formula (a0-1-1), Rax 01 Among the above, it is preferable that the acid-dissociable group is represented by any of the above formulas (a0-r2-01) to (a0-r2-03).

[0114] In equation (a0-1-1), q and n are the same as q and n in equation (a0-1) above.

[0115] The following are specific examples of constituent units (a01). In each of the following equations, R α This represents a hydrogen atom, a methyl group, or a trifluoromethyl group.

[0116] [ka]

[0117] [ka]

[0118] [ka]

[0119] [ka]

[0120] [ka]

[0121] [ka]

[0122] [ka]

[0123] [ka]

[0124] In the resist composition of this embodiment, the constituent unit (a01) is preferably a constituent unit represented by any of the above formulas (a01-1a-1) to (a01-1a-46), more preferably a constituent unit represented by any of the above formulas (a01-1a-1) to (a01-1a-40), and even more preferably a constituent unit represented by any of the above formulas (a01-1a-2), (a01-1a-4), (a01-1a-8), (a01-1a-25), (a01-1a-28), (a01-1a-31), (a01-1a-34), (a01-1a-37), (a01-1a-39), or (a01-1a-40).

[0125] The constituent units (a01) of component (A1) may be one type or two or more types. The proportion of constituent units (a01) in component (A1) is preferably 50 mol% or more, and may be 100 mol%, relative to the total amount (100 mol%) of all constituent units that make up component (A1). Among these, the proportion of constituent units (a01) in component (A1) is more preferably 60 to 90 mol%, and even more preferably 60 to 80 mol%. By setting the proportion of the constituent unit (a01) within the aforementioned preferred range, sensitivity can be further improved without reducing resolution. Furthermore, since appropriate solubility in the developer can be ensured, fine resolution can be further improved.

[0126] <<Other constituent units>> Component (A1) may have other constituent units in addition to the constituent unit (a01) as needed. Other constituent units include, for example, constituent units (a1) containing acid-degradable groups whose polarity increases with the action of acid (excluding those corresponding to constituent unit (a01)); constituent units (a10) represented by the general formula (a10-1) described later; constituent units (a8) derived from compounds represented by the general formula (a8-1) described later; constituent units (a2) containing lactone-containing cyclic groups, -SO2--containing cyclic groups, or carbonate-containing cyclic groups (excluding those corresponding to constituent units (a01) or (a1)); constituent units (a3) ​​containing polar group-containing aliphatic hydrocarbon groups (excluding those corresponding to constituent units (a01), (a1), (a2), or (a8)); constituent units (a4) containing acid-nondissociable aliphatic cyclic groups; and constituent units (st) derived from styrene or styrene derivatives.

[0127] Regarding the constituent unit (a1): Component (A1) may have, in addition to the aforementioned constituent unit (a01), further constituent unit (a1). The constituent unit (a1) is a constituent unit that contains an acid-degradable group whose polarity increases due to the action of an acid (excluding those corresponding to the aforementioned constituent unit (a01)).

[0128] Examples of acid-dissociable groups include those previously proposed as acid-dissociable groups for base resins used in chemically amplified resist compositions. Specifically, examples of acid-dissociable groups proposed for base resins used in chemically amplified resist compositions include the aforementioned "acetal-type acid-dissociable groups" and "tertiary alkyl ester-type acid-dissociable groups," as well as the "tertiary alkyloxycarbonyl acid-dissociable groups" described below.

[0129] Tertiary alkyloxycarbonyl acid dissociable group: Examples of acid-dissociating groups that protect hydroxyl groups include the acid-dissociating group represented by the following general formula (a1-r-3) (hereinafter sometimes referred to as the "tertiary alkyloxycarbonyl acid dissociating group" for convenience).

[0130] [ka] [In the formula, Ra' 7 ~Ra' 9 These are each alkyl groups.

[0131] In formula (a1-r-3), Ra' 7 ~Ra' 9 Each of these is preferably an alkyl group having 1 to 5 carbon atoms, and more preferably an alkyl group having 1 to 3 carbon atoms. Furthermore, the total number of carbon atoms in each alkyl group is preferably 3 to 7, more preferably 3 to 5, and most preferably 3 to 4.

[0132] Examples of constituent units (a1) include constituent units derived from acrylic acid esters in which the hydrogen atom bonded to the α-carbon atom may be substituted with a substituent, constituent units derived from acrylamide, constituent units derived from hydroxystyrene or hydroxystyrene derivatives in which at least a portion of the hydrogen atoms in the hydroxyl group of a constituent unit are protected by a substituent containing the acid-degradable group, and constituent units derived from vinyl benzoic acid or vinyl benzoic acid derivatives in which at least a portion of the hydrogen atoms in the -C(=O)-OH group are protected by a substituent containing the acid-degradable group.

[0133] As for the constituent unit (a1), among the above, a constituent unit derived from an acrylic acid ester in which the hydrogen atom bonded to the α-carbon atom may be substituted with a substituent is preferred. A preferred specific example of such a constituent unit (a1) is a constituent unit represented by the following general formula (a1-1) or (a1-2).

[0134] [ka] [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Va 1 n is a divalent hydrocarbon group which may have an ether bond. a1 is an integer between 0 and 2. 1 This is an acid-dissociable group represented by the general formula (a0-r-1) or (a0-r-2) described above. 1 is n a2 It is a +1 valent hydrocarbon group, n a2 is an integer between 1 and 3, and Ra 2 This is an acid-dissociable group represented by the general formula (a0-r-1) or (a1-r-3) mentioned above.

[0135] In formula (a1-1), the C1-C5 alkyl group of R is preferably a linear or branched alkyl group having C1-C5, specifically including methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl, isopentyl, and neopentyl groups. The C1-C5 halogenated alkyl group is a group in which some or all of the hydrogen atoms of the C1-C5 alkyl group are substituted with halogen atoms. Fluorine atoms are particularly preferred as the halogen atoms. R is preferably a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms, with a hydrogen atom or a methyl group being the most preferred due to their industrial availability.

[0136] In the above formula (a1-1), Va 1 The divalent hydrocarbon group in this expression may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group.

[0137] Va 1 The aliphatic hydrocarbon group as a divalent hydrocarbon group in this compound may be saturated or unsaturated, but is usually preferred to be saturated. More specifically, examples of the aliphatic hydrocarbon group include linear or branched aliphatic hydrocarbon groups, or aliphatic hydrocarbon groups containing a ring in their structure.

[0138] The linear aliphatic hydrocarbon group preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, even more preferably 1 to 4 carbon atoms, and most preferably 1 to 3 carbon atoms. As for the linear aliphatic hydrocarbon group, linear alkylene groups are preferred, specifically the methylene group [-CH2-], ethylene group [-(CH2)2-], trimethylene group [-(CH2)3-], tetramethylene group [-(CH2)4-], pentamethylene group [-(CH2)5-], etc. The branched aliphatic hydrocarbon group preferably has 2 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, even more preferably 3 or 4 carbon atoms, and most preferably 3 carbon atoms. Preferred branched aliphatic hydrocarbon groups include branched alkylene groups, specifically alkylmethylene groups such as -CH(CH3)-, -CH(CH2CH3)-, -C(CH3)2-, -C(CH3)(CH2CH3)-, -C(CH3)(CH2CH2CH3)-, and -C(CH2CH3)2-; alkylethylene groups such as -CH(CH3)CH2-, -CH(CH3)CH(CH3)-, -C(CH3)2CH2-, -CH(CH2CH3)CH2-, and -C(CH2CH3)2-CH2-; alkyltrimethylene groups such as -CH(CH3)CH2CH2- and -CH2CH(CH3)CH2-; and alkylalkylene groups such as alkyltetramethylene groups such as -CH(CH3)CH2CH2CH2- and -CH2CH(CH3)CH2CH2-. In the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferred.

[0139] Examples of aliphatic hydrocarbon groups containing a ring in the aforementioned structure include alicyclic hydrocarbon groups (groups obtained by removing two hydrogen atoms from an aliphatic hydrocarbon ring), groups in which an alicyclic hydrocarbon group is bonded to the end of a linear or branched aliphatic hydrocarbon group, and groups in which an alicyclic hydrocarbon group is interposed in the middle of a linear or branched aliphatic hydrocarbon group. Examples of the linear or branched aliphatic hydrocarbon group include those similar to the linear or branched aliphatic hydrocarbon group described above. The alicyclic hydrocarbon group preferably has 3 to 20 carbon atoms, and more preferably has 3 to 12 carbon atoms. The alicyclic hydrocarbon group may be polycyclic or monocyclic. A preferred monocyclic alicyclic hydrocarbon group is a monocycloalkane from which two hydrogen atoms have been removed. The monocycloalkane is preferably one having 3 to 6 carbon atoms, specifically cyclopentane, cyclohexane, etc. A preferred polycyclic alicyclic hydrocarbon group is a polycycloalkane from which two hydrogen atoms have been removed, and the polycycloalkane is preferably one having 7 to 12 carbon atoms, specifically adamantane, norbornane, isobornane, tricyclodecane, tetracyclododecane, etc.

[0140] Va 1 In this context, an aromatic hydrocarbon group as a divalent hydrocarbon group is a hydrocarbon group having an aromatic ring. The aromatic hydrocarbon group preferably has 3 to 30 carbon atoms, more preferably 5 to 30, even more preferably 5 to 20, particularly preferably 6 to 15, and most preferably 6 to 12. However, this carbon number does not include the carbon atoms of substituents. Specific examples of aromatic rings in aromatic hydrocarbon groups include aromatic hydrocarbon rings such as benzene, biphenyl, fluorene, naphthalene, anthracene, and phenanthrene; and aromatic heterocycles in which some of the carbon atoms constituting the aromatic hydrocarbon ring are replaced by heteroatoms. Examples of heteroatoms in aromatic heterocycles include oxygen atoms, sulfur atoms, and nitrogen atoms. Specific examples of the aromatic hydrocarbon group include a group obtained by removing two hydrogen atoms from the aromatic hydrocarbon ring (arylene group); and a group obtained by removing one hydrogen atom from the aromatic hydrocarbon ring (aryl group) in which one hydrogen atom is replaced by an alkylene group (for example, a group obtained by removing one more hydrogen atom from the aryl group in an arylalkyl group such as a benzyl group, phenethyl group, 1-naphthylmethyl group, 2-naphthylmethyl group, 1-naphthylethyl group, 2-naphthylethyl group, etc.). The number of carbon atoms in the alkylene group (alkyl chain in the arylalkyl group) is preferably 1 to 4, more preferably 1 to 2, and particularly preferably 1.

[0141] In the above formula (a1-1), Ra 1 This is an acid-dissociable group represented by the above formula (a0-r-1) or (a0-r-2).

[0142] In the above formula (a1-2), Wa 1 n in a2The +1 valent hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group. The aliphatic hydrocarbon group means a hydrocarbon group that does not have aromaticity, and may be saturated or unsaturated, but is usually preferred to be saturated. Examples of the aliphatic hydrocarbon group include a linear or branched aliphatic hydrocarbon group, an aliphatic hydrocarbon group containing a ring in its structure, or a group that is a combination of a linear or branched aliphatic hydrocarbon group and an aliphatic hydrocarbon group containing a ring in its structure. The aforementioned n a2 The +1 valent is preferably 2 to 4 valent, and more preferably 2 or 3 valent.

[0143] In the above formula (a1-2), Ra 2 This is an acid-dissociable group represented by the general formula (a0-r-1) or (a1-r-3) above.

[0144] The following are specific examples of the constituent units represented by the above formula (a1-1). In each of the following formulas, R α This represents a hydrogen atom, a methyl group, or a trifluoromethyl group.

[0145] [ka]

[0146] [ka]

[0147] [ka]

[0148] [ka]

[0149] [ka]

[0150] [ka]

[0151] [ka]

[0152] [ka]

[0153] The constituent units (a1) of component (A1) may be one type or two or more types. As for the constituent unit (a1), the constituent unit represented by formula (a1-1) is more preferable because it is easier to improve the characteristics (sensitivity, shape, etc.) in electron beam or EUV lithography.

[0154] The proportion of constituent units (a1) in component (A1) is preferably 1 to 50 mol%, more preferably 5 to 40 mol%, and even more preferably 10 to 30 mol%, relative to the total amount (100 mol%) of all constituent units that make up component (A1). By setting the proportion of the constituent unit (a1) to be above the lower limit of the preferred range described above, lithography characteristics such as sensitivity, resolution, and roughness improvement are enhanced. On the other hand, if it is below the upper limit of the preferred range described above, a balance can be achieved with other constituent units, resulting in good lithography characteristics in various aspects.

[0155] Regarding the constituent unit (a10): Component (A1) may further have a constituent unit (a10) represented by the following general formula (a10-1).

[0156] [ka] [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkyl halogen having 1 to 5 carbon atoms. x1 Wa is a single bond or a divalent linking group.x1 n is an aromatic hydrocarbon group which may have substituents. ax1 [ is an integer greater than or equal to 1.]

[0157] In the above formula (a10-1), R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkyl halogen having 1 to 5 carbon atoms. The C1-C5 alkyl group in R is preferably a linear or branched alkyl group having C1-C5, specifically including methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl, isopentyl, and neopentyl groups. The C1-C5 alkyl halide in R is a group in which some or all of the hydrogen atoms of the C1-C5 alkyl group are substituted with halogen atoms. Fluorine atoms are particularly preferred as the halogen atoms. For R, a hydrogen atom, a C1-C5 alkyl group, or a C1-C5 fluorinated alkyl group is preferred, and for ease of industrial availability, a hydrogen atom, a methyl group, or a trifluoromethyl group is more preferred, a hydrogen atom or a methyl group is even more preferred, and a methyl group is particularly preferred.

[0158] In the above formula (a10-1), Ya x1 It is a single bond or a divalent linking group. In the above chemical formula, Ya x1 The divalent linking group in this is not particularly limited, but suitable examples include divalent hydrocarbon groups which may have substituents, and divalent linking groups which contain heteroatoms.

[0159] • Divalent hydrocarbon groups which may have substituents: Ya x1 If is a divalent hydrocarbon group which may have substituents, the hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group.

[0160] ··Ya x1 Aliphatic hydrocarbon groups in An aliphatic hydrocarbon group refers to a hydrocarbon group that does not possess aromaticity. The aliphatic hydrocarbon group may be saturated or unsaturated, but is usually preferable to be saturated. Examples of the aliphatic hydrocarbon group include linear or branched aliphatic hydrocarbon groups, or aliphatic hydrocarbon groups containing a ring in their structure.

[0161] ...linear or branched aliphatic hydrocarbon groups The linear aliphatic hydrocarbon group preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, even more preferably 1 to 4 carbon atoms, and most preferably 1 to 3 carbon atoms. As for the linear aliphatic hydrocarbon group, linear alkylene groups are preferred, specifically the methylene group [-CH2-], ethylene group [-(CH2)2-], trimethylene group [-(CH2)3-], tetramethylene group [-(CH2)4-], pentamethylene group [-(CH2)5-], etc. The branched aliphatic hydrocarbon group preferably has 2 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, even more preferably 3 or 4 carbon atoms, and most preferably 3 carbon atoms. Preferred branched aliphatic hydrocarbon groups include branched alkylene groups, specifically alkylmethylene groups such as -CH(CH3)-, -CH(CH2CH3)-, -C(CH3)2-, -C(CH3)(CH2CH3)-, -C(CH3)(CH2CH2CH3)-, and -C(CH2CH3)2-; alkylethylene groups such as -CH(CH3)CH2-, -CH(CH3)CH(CH3)-, -C(CH3)2CH2-, -CH(CH2CH3)CH2-, and -C(CH2CH3)2-CH2-; alkyltrimethylene groups such as -CH(CH3)CH2CH2- and -CH2CH(CH3)CH2-; and alkylalkylene groups such as alkyltetramethylene groups such as -CH(CH3)CH2CH2CH2- and -CH2CH(CH3)CH2CH2-. In the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferred.

[0162] The linear or branched aliphatic hydrocarbon group may or may not have substituents. Examples of substituents include fluorine atoms, fluorinated alkyl groups having 1 to 5 carbon atoms substituted with fluorine atoms, and carbonyl groups.

[0163] ...Aliphatic hydrocarbon groups containing a ring in their structure Examples of aliphatic hydrocarbon groups containing a ring in the structure include cyclic aliphatic hydrocarbon groups that may contain substituents containing heteroatoms in the ring structure (groups obtained by removing two hydrogen atoms from an aliphatic hydrocarbon ring), groups in which the cyclic aliphatic hydrocarbon group is bonded to the end of a linear or branched aliphatic hydrocarbon group, and groups in which the cyclic aliphatic hydrocarbon group is interposed in the middle of a linear or branched aliphatic hydrocarbon group. Examples of the linear or branched aliphatic hydrocarbon group are the same as those described above. The cyclic aliphatic hydrocarbon group preferably has 3 to 20 carbon atoms, and more preferably has 3 to 12 carbon atoms. The cyclic aliphatic hydrocarbon group may be a polycyclic group or a monocyclic group. A preferred monocyclic alicyclic hydrocarbon group is a group obtained by removing two hydrogen atoms from a monocycloalkane. The monocycloalkane is preferably one having 3 to 6 carbon atoms, specifically cyclopentane, cyclohexane, etc. A preferred polycyclic alicyclic hydrocarbon group is a group obtained by removing two hydrogen atoms from a polycycloalkane, and the polycycloalkane is preferably one having 7 to 12 carbon atoms, specifically adamantane, norbornane, isobornane, tricyclodecane, tetracyclododecane, etc.

[0164] The cyclic aliphatic hydrocarbon group may or may not have substituents. Examples of substituents include alkyl groups, alkoxy groups, halogen atoms, alkyl halides, hydroxyl groups, and carbonyl groups. The alkyl group used as the substituent is preferably an alkyl group having 1 to 5 carbon atoms, and more preferably a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group. As the alkoxy group used as the substituent, an alkoxy group having 1 to 5 carbon atoms is preferred, a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, and a tert-butoxy group are more preferred, and a methoxy group and an ethoxy group are even more preferred. A fluorine atom is preferred as the halogen atom used as the substituent. Examples of halogenated alkyl groups as substituents include groups in which some or all of the hydrogen atoms of the alkyl group are substituted with halogen atoms. A cyclic aliphatic hydrocarbon group may have some of the carbon atoms constituting its ring structure replaced by substituents containing heteroatoms. Preferred substituents containing heteroatoms are -O-, -C(=O)-O-, -S-, -S(=O)2-, and -S(=O)2-O-.

[0165] ··Ya x1 Aromatic hydrocarbon groups in The aromatic hydrocarbon group is a hydrocarbon group having at least one aromatic ring. The aromatic ring is not particularly limited as long as it is a cyclic conjugated system having 4n+2 π electrons, and may be monocyclic or polycyclic. The aromatic ring preferably has 5 to 30 carbon atoms, more preferably 5 to 20, even more preferably 6 to 15, and particularly preferably 6 to 12. However, this carbon number does not include the carbon atoms in substituents. Examples of aromatic rings include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic heterocycles in which some of the carbon atoms constituting the aromatic hydrocarbon ring are replaced by heteroatoms. Examples of heteroatoms in aromatic heterocycles include oxygen atoms, sulfur atoms, and nitrogen atoms. Examples of aromatic heterocycles include pyridine rings and thiophene rings. Specific examples of aromatic hydrocarbon groups include groups obtained by removing two hydrogen atoms from the aromatic hydrocarbon ring or aromatic heterocycle (arylene group or heteroarylene group); groups obtained by removing two hydrogen atoms from aromatic compounds containing two or more aromatic rings (e.g., biphenyl, fluorene, etc.); and groups in which one hydrogen atom of an aryl group or heteroaryl group obtained by removing one hydrogen atom from the aromatic hydrocarbon ring or aromatic heterocycle (aryl group or heteroaryl group) is substituted with an alkylene group (e.g., groups obtained by removing one more hydrogen atom from an aryl group in an arylalkyl group such as benzyl group, phenethyl group, 1-naphthylmethyl group, 2-naphthylmethyl group, 1-naphthylethyl group, 2-naphthylethyl group, etc.). The number of carbon atoms in the alkylene group bonded to the aryl group or heteroaryl group is preferably 1 to 4, more preferably 1 to 2, and particularly preferably 1.

[0166] The aromatic hydrocarbon group may have its hydrogen atoms substituted with substituents. For example, the hydrogen atoms bonded to the aromatic ring in the aromatic hydrocarbon group may be substituted with substituents. Examples of such substituents include alkyl groups, alkoxy groups, halogen atoms, alkyl halides, hydroxyl groups, and the like. The alkyl group used as the substituent is preferably an alkyl group having 1 to 5 carbon atoms, and more preferably a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group. Examples of the substituents include alkoxy groups, halogen atoms, and alkyl halides that substitute for hydrogen atoms on the cyclic aliphatic hydrocarbon group.

[0167] • Divalent linking groups containing heteroatoms: Ya x1When is a divalent linking group containing a heteroatom, preferred linking groups include -O-, -C(=O)-O-, -OC(=O)-, -C(=O)-, -OC(=O)-O-, -C(=O)-NH-, -NH-, -NH-C(=NH)- (H may be substituted with substituents such as alkyl groups or acyl groups), -S-, -S(=O)2-, -S(=O)2-O-, and the general formula -Y 21 -OY 22 -, -Y 21 -O-, -Y 21 -C(=O)-O-, -C(=O)-OY 21 -,-[Y 21 -C(=O)-O] m” -Y 22 -, -Y 21 -OC(=O)-Y 22 - or -Y 21 -S(=O)2-OY 22 - is represented by the base [wherein Y 21 and Y 22 Each of these is a divalent hydrocarbon group which may have substituents independently, O is an oxygen atom, and m'' is an integer from 0 to 3. When the divalent linking group containing the heteroatom is -C(=O)-NH-, -C(=O)-NH-C(=O)-, -NH-, or -NH-C(=NH)-, the H may be substituted with substituents such as alkyl groups or acyl groups. The substituent (alkyl group, acyl group, etc.) preferably has 1 to 10 carbon atoms, more preferably 1 to 8, and particularly preferably 1 to 5 carbon atoms. General formula-Y 21 -OY 22 -, -Y 21 -O-, -Y 21 -C(=O)-O-, -C(=O)-OY 21 -,-[Y 21 -C(=O)-O] m” -Y 22 -, -Y 21 -OC(=O)-Y 22 - or -Y 21 -S(=O)2-OY 22 - Middle, Y 21 and Y 22Each of these is independently a divalent hydrocarbon group which may have substituents. The divalent hydrocarbon group is the aforementioned Ya x1 Examples include those similar to the divalent linking groups (divalent hydrocarbon groups that may have substituents) mentioned in the description of divalent linking groups in [the relevant section]. Y 21 Preferably, the group is a linear aliphatic hydrocarbon group, more preferably a linear alkylene group, even more preferably a linear alkylene group having 1 to 5 carbon atoms, and particularly preferably a methylene group or an ethylene group. Y 22 The group is preferably a linear or branched aliphatic hydrocarbon group, more preferably a methylene group, an ethylene group, or an alkylmethylene group. The alkyl group in the alkylmethylene group is preferably a linear alkyl group having 1 to 5 carbon atoms, more preferably a linear alkyl group having 1 to 3 carbon atoms, and most preferably a methyl group. Formula - [Y 21 -C(=O)-O] m” -Y 22 In the base represented by -, m'' is an integer between 0 and 3, preferably between 0 and 2, more preferably 0 or 1, and particularly preferably 1. That is, in the formula -[Y 21 -C(=O)-O] m” -Y 22 As a base represented by -, formula -Y 21 -C(=O)-OY 22 Groups represented by - are particularly preferred. Among them, the group represented by formula -(CH2) a’ -C(=O)-O-(CH2) b’ A base represented by - is preferred. In the formula, a' is an integer from 1 to 10, preferably an integer from 1 to 8, more preferably an integer from 1 to 5, even more preferably 1 or 2, and most preferably 1. b' is an integer from 1 to 10, preferably an integer from 1 to 8, more preferably an integer from 1 to 5, even more preferably 1 or 2, and most preferably 1.

[0168] Among the above, Ya x1Preferably, the group is a single bond, an ester bond [-C(=O)-O-, -OC(=O)-], an ether bond (-O-), a linear or branched alkylene group, or a combination thereof, with single bonds and ester bonds [-C(=O)-O-, -OC(=O)-] being more preferred.

[0169] In the above formula (a10-1), Wa x1 This is an aromatic hydrocarbon group which may have substituents. Wa x1 The aromatic hydrocarbon group in this context may be an aromatic ring that may have substituents (n ax1 Examples include groups with 1+1 hydrogen atoms removed. The aromatic ring here is not particularly limited as long as it is a cyclic conjugated system with 4n+2 π electrons, and may be monocyclic or polycyclic. The aromatic ring preferably has 5 to 30 carbon atoms, more preferably 5 to 20, even more preferably 6 to 15, and particularly preferably 6 to 12. Specific examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic heterocycles in which some of the carbon atoms constituting the aromatic hydrocarbon ring are replaced by heteroatoms. Examples of heteroatoms in aromatic heterocycles include oxygen atoms, sulfur atoms, and nitrogen atoms. Specific examples of aromatic heterocycles include pyridine rings and thiophene rings. Also, Wa x1 The aromatic hydrocarbon group in this context is an aromatic compound containing an aromatic ring which may have two or more substituents (e.g., biphenyl, fluorene, etc.) (n ax1 Another example is a group with (+1) hydrogen atoms removed. Among the above, Wa x1 Examples include benzene, naphthalene, anthracene, or biphenyl (n ax1 A group with (+1) hydrogen atoms removed is preferred, and (n ax1 A group with (+1) hydrogen atoms removed is more preferable, and from benzene (n ax1 A group with (+1) hydrogen atoms removed is even more preferable.

[0170] Wa x1The aromatic hydrocarbon group in may or may not have substituents. Examples of substituents include alkyl groups, alkoxy groups, halogen atoms, and alkyl halides. Examples of alkyl groups, alkoxy groups, halogen atoms, and alkyl halides as substituents include Ya x1 Examples of substituents for cyclic aliphatic hydrocarbon groups in are similar to those listed above. The substituents are preferably linear or branched alkyl groups having 1 to 5 carbon atoms, more preferably linear or branched alkyl groups having 1 to 3 carbon atoms, even more preferably ethyl or methyl groups, and particularly preferably methyl groups. x1 In this context, it is preferable that the aromatic hydrocarbon group does not have substituents.

[0171] In the above formula (a10-1), n ax1 is an integer greater than or equal to 1, preferably an integer between 1 and 10, more preferably an integer between 1 and 5, even more preferably 1, 2, or 3, and particularly preferably 1 or 2.

[0172] The following are specific examples of the constituent unit (a10) represented by the above formula (a10-1). In the following equations, R α This represents a hydrogen atom, a methyl group, or a trifluoromethyl group.

[0173] [ka]

[0174] [ka]

[0175] [ka]

[0176] [ka]

[0177] The constituent units (a10) of component (A1) may be one type or two or more types. If component (A1) has constituent units (a10), the proportion of constituent units (a10) in component (A1) is preferably 1 to 50 mol%, and more preferably 10 to 40 mol%, relative to the total amount (100 mol%) of all constituent units that make up component (A1). By setting the proportion of constituent unit (a10) above the lower limit, sensitivity can be more easily increased. On the other hand, by setting it below the upper limit, it becomes easier to balance it with other constituent units.

[0178] Regarding the constituent unit (a8): The constituent unit (a8) is a constituent unit derived from the compound represented by the following general formula (a8-1).

[0179] [ka] [In the formula, W 2 This is a polymerizable group-containing group. x2 is a single bond or (n ax2 It is a linking group with a +1 valence. x2 and W 2 It may form a fused ring with R. 1 R is a fluorinated alkyl group having 1 to 12 carbon atoms. 2 n is an organic group having 1 to 12 carbon atoms, which may contain a fluorine atom, or a hydrogen atom. ax2 [This is an integer between 1 and 3.]

[0180] In formula (a8-1), W 2 The polymerizable group in the above formula (a01-1) is W 01 This is similar to the polymerizable group-containing group in [the relevant context].

[0181] In formula (a8-1), Ya x2 is a single bond or (n ax2 +1)Valvity, i.e., a divalent, trivalent, or tetravalent linking group.

[0182] Ya x2The divalent linking group in formula (a01-1) is W 01 Ya x0 Examples similar to those described as divalent linking groups in Ya include the following. x2 Examples of trivalent linking groups include a group obtained by removing one hydrogen atom from the divalent linking group, and a group in which another divalent linking group is bonded to the divalent linking group. Examples of tetravalent linking groups include a group obtained by removing two hydrogen atoms from the divalent linking group.

[0183] Ya x2 and W 2 It may also form a fused ring. Ya x2 and W 2 When these two elements form a fused ring, the resulting ring structure can be, for example, a fused ring of an alicyclic hydrocarbon and an aromatic hydrocarbon. x2 and W 2 The fused ring formed by these may have heteroatoms. Ya x2 and W 2 The alicyclic hydrocarbon portion in the condensed ring formed by these two compounds may be monocyclic or polycyclic. Ya x2 and W 2 The condensed ring formed by these is W 2 Polymerizable groups of the site and Ya x2 The condensed ring formed by and W 2 Other groups besides the polymerizable group of the site and Ya x2 Examples include condensed rings formed by these compounds. Specifically, these include a two-ring condensed ring of a cycloalkene and an aromatic ring, a three-ring condensed ring of a cycloalkene and two aromatic rings, a two-ring condensed ring of a cycloalkane having a polymerizable group as a substituent and an aromatic ring, and a three-ring condensed ring of a cycloalkane having a polymerizable group as a substituent and an aromatic ring.

[0184] Ya x2 and W 2The condensed ring formed by these may have substituents. Examples of such substituents include methyl groups, ethyl groups, propyl groups, hydroxyl groups, hydroxyalkyl groups, carboxyl groups, halogen atoms (fluorine atoms, chlorine atoms, bromine atoms, etc.), alkoxy groups (methoxy groups, ethoxy groups, propoxy groups, butoxy groups, etc.), acyl groups, alkyloxycarbonyl groups, alkylcarbonyloxy groups, and the like.

[0185] Below, Ya x2 and W 2 A specific example of the fused ring formed by W is shown. α This indicates a polymerizable group.

[0186] [ka]

[0187] In formula (a8-1), R 1 These are fluorinated alkyl groups having 1 to 12 carbon atoms. A fluorinated alkyl group having 1 to 12 carbon atoms is a group in which some or all of the hydrogen atoms of an alkyl group having 1 to 12 carbon atoms are replaced with fluorine atoms. The alkyl group may be linear or branched. Examples of linear fluorinated alkyl groups having 1 to 12 carbon atoms include groups in which some or all of the hydrogen atoms of a methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, or dodecyl group are substituted with fluorine atoms. Examples of branched fluorinated alkyl groups having 1 to 12 carbon atoms include groups in which some or all of the hydrogen atoms of a 1-methylethyl group, 1,1-dimethylethyl group, 1-methylpropyl group, 2-methylpropyl group, 1-methylbutyl group, 2-methylbutyl group, 3-methylbutyl group, 1-ethylbutyl group, 2-ethylbutyl group, 1-methylpentyl group, 2-methylpentyl group, 3-methylpentyl group, or 4-methylpentyl group are substituted with fluorine atoms.

[0188] R 1Among the above, fluorinated alkyl groups having 1 to 12 carbon atoms are more preferred, and specifically, trifluoromethyl groups are particularly preferred.

[0189] In formula (a8-1), R 2 This is an organic group having 1 to 12 carbon atoms, which may contain a fluorine atom, or a hydrogen atom.

[0190] R 2 Examples of C1-C12 organic groups that may have a fluorine atom include C1-C12 monovalent hydrocarbon groups that may have a fluorine atom. Examples of hydrocarbon groups include linear or branched alkyl groups, or cyclic hydrocarbon groups. Examples of the linear alkyl group include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl, and dodecyl groups. Examples of the branched alkyl group include 1-methylethyl group, 1,1-dimethylethyl group, 1-methylpropyl group, 2-methylpropyl group, 1-methylbutyl group, 2-methylbutyl group, 3-methylbutyl group, 1-ethylbutyl group, 2-ethylbutyl group, 1-methylpentyl group, 2-methylpentyl group, 3-methylpentyl group, and 4-methylpentyl group.

[0191] R 2 When the hydrocarbon group is a cyclic hydrocarbon group, the hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group, and may be a polycyclic group or a monocyclic group. As a monocyclic aliphatic hydrocarbon group, a group obtained by removing one hydrogen atom from a monocycloalkane is preferred. The monocycloalkane is preferably one having 3 to 6 carbon atoms, and specific examples include cyclopentane and cyclohexane. The polycyclic aliphatic hydrocarbon group is preferably a polycycloalkane from which one hydrogen atom has been removed, and the polycycloalkane is preferably one having 7 to 12 carbon atoms, specifically including adamantane, norbornane, isobornane, tricyclodecane, tetracyclododecane, and the like.

[0192] R 2 When a cyclic hydrocarbon group becomes an aromatic hydrocarbon group, the aromatic hydrocarbon group is a hydrocarbon group having at least one aromatic ring. Specifically, examples of such aromatic hydrocarbon groups include groups obtained by removing one hydrogen atom from an aromatic hydrocarbon ring, such as benzene, naphthalene, anthracene, phenanthrene, biphenyl, and fluorene.

[0193] R 2 The C1-C12 organic group may have substituents other than a fluorine atom. Examples of such substituents include hydroxyl groups, carboxyl groups, halogen atoms (chlorine atoms, bromine atoms, etc.), alkoxy groups (methoxy groups, ethoxy groups, propoxy groups, butoxy groups, etc.), and alkyloxycarbonyl groups.

[0194] R 2 It is preferably a fluorinated alkyl group having 1 to 12 carbon atoms, more preferably a fluorinated alkyl group having 1 to 5 carbon atoms, and even more preferably a trifluoromethyl group.

[0195] In formula (a8-1), n ax2 is an integer between 1 and 3, preferably 1 or 2, and more preferably 1.

[0196] The constituent unit (a8) is preferably a constituent unit (a81) derived from a compound represented by the following general formula (a8-1-1).

[0197] [ka] [In formula (a8-1-1), W 2 Wa is a polymerizable group-containing group. x2 is, (n ax2+1) There is a cyclic group with a valence of W. 2 and Wa x2 It may form a fused ring with R. 1 R is a fluorinated alkyl group having 1 to 12 carbon atoms. 2 n is an organic group having 1 to 12 carbon atoms, which may contain a fluorine atom, or a hydrogen atom. ax2 [This is an integer between 1 and 3.]

[0198] In formula (a8-1-1), W 2 , R 1 , R 2 , and n ax2 This is W in the above general formula (a8-1). 2 , R 1 , R 2 , and n ax2 It is similar to that.

[0199] In equation (a8-1-1), Wa x2 is, (n ax2 There is a cyclic group with a +1 valence. Wa x2 Examples of cyclic groups in this context include aliphatic cyclic groups and aromatic cyclic groups, which may be monocyclic or polycyclic.

[0200] As a monocyclic aliphatic cyclic group, a group obtained by removing one hydrogen atom from a monocycloalkane is preferred. The monocycloalkane is preferably one having 3 to 6 carbon atoms, and specific examples include cyclopentane and cyclohexane. As for the polycyclic aliphatic cyclic group, a group obtained by removing one hydrogen atom from a polycycloalkane is preferred, and as for the polycycloalkane, one with 7 to 12 carbon atoms is preferred, and specifically, examples include groups obtained by removing one or more hydrogen atoms from polycycloalkanes such as decalin, perhydroazulene, and perhydroanthracene.

[0201] An aromatic cyclic group is a hydrocarbon group having at least one aromatic ring. This aromatic ring is not particularly limited as long as it is a cyclic conjugated system having 4n+2 π electrons. The number of carbon atoms in the aromatic ring is preferably 5 to 30, more preferably 5 to 20, even more preferably 6 to 15, and particularly preferably 6 to 12. Specific examples of aromatic rings include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic heterocycles in which some of the carbon atoms constituting the aromatic hydrocarbon ring are substituted with heteroatoms. Examples of heteroatoms in aromatic heterocycles include oxygen atoms, sulfur atoms, and nitrogen atoms. Specific examples of aromatic heterocycles include pyridine rings and thiophene rings. Specific examples of the aromatic hydrocarbon group include a group obtained by removing one hydrogen atom from the aromatic hydrocarbon ring or aromatic heterocycle (aryl group or heteroaryl group); a group obtained by removing one hydrogen atom from an aromatic compound containing two or more aromatic rings (e.g., biphenyl, fluorene, etc.); and a group in which one of the hydrogen atoms of the aromatic hydrocarbon ring or aromatic heterocycle is substituted with an alkylene group (e.g., arylalkyl groups such as benzyl group, phenethyl group, 1-naphthylmethyl group, 2-naphthylmethyl group, 1-naphthylethyl group, 2-naphthylethyl group, etc.). The number of carbon atoms in the alkylene group bonded to the aromatic hydrocarbon ring or aromatic heterocycle is preferably 1 to 4, more preferably 1 to 2, and particularly preferably 1.

[0202] Wa x2 Examples of substituents that the cyclic group in the compound may have include carboxyl groups, halogen atoms (fluorine atoms, chlorine atoms, bromine atoms, etc.), alkoxy groups (methoxy groups, ethoxy groups, propoxy groups, butoxy groups, etc.), and alkyloxycarbonyl groups.

[0203] W 2 and Wa x2 This may form a fused ring, and Ya in formula (a8-1) x2 and W 2 This is similar to what was explained regarding the condensed ring formed by and .

[0204] The following are specific examples of constituent units (a8). In the following formula, R α This represents a hydrogen atom, a methyl group, or a trifluoromethyl group.

[0205] [ka]

[0206] Among the examples above, the constituent unit (a8) is preferably the constituent unit represented by the chemical formula (a8-1-01).

[0207] The constituent units (a8) of component (A1) may be one type or two or more types. If component (A1) has constituent units (a8), the proportion of constituent units (a8) is preferably 1 to 40 mol%, more preferably 1 to 30 mol%, and even more preferably 5 to 15 mol%, relative to the total amount (100 mol%) of all constituent units that make up component (A1). By setting the proportion of the constituent unit (a8) above a preferred lower limit, the affinity with the developer and rinsing solution can be increased. On the other hand, if it is below a preferred upper limit, a balance with other constituent units can be achieved, resulting in good lithography characteristics.

[0208] Regarding the constituent unit (a2): Component (A1) may further have a constituent unit (a2) containing a lactone-containing cyclic group, an -SO2-- containing cyclic group, or a carbonate-containing cyclic group (excluding those corresponding to the aforementioned constituent unit (a01) or the aforementioned constituent unit (a1)). The lactone-containing cyclic group, -SO2--containing cyclic group, or carbonate-containing cyclic group of the constituent unit (a2) is effective in improving the adhesion of the resist film to the substrate when component (A1) is used to form a resist film. Furthermore, the presence of constituent unit (a2) improves lithography characteristics, for example, by appropriately adjusting the acid diffusion length, improving the adhesion of the resist film to the substrate, and appropriately adjusting the solubility during development.

[0209] A "lactone-containing cyclic group" refers to a cyclic group that contains a ring (lactone ring) containing -OC(=O)- within its cyclic skeleton. The lactone ring is counted as the first ring. If it consists only of a lactone ring, it is called a monocyclic group. If it also has other ring structures, it is called a polycyclic group regardless of those structures. A lactone-containing cyclic group may be a monocyclic group or a polycyclic group. Any lactone-containing cyclic group can be used in the constituent unit (a2) without any particular limitations. Specifically, examples include the groups represented by the following general formulas (a2-r-1) to (a2-r-7).

[0210] [ka] [In the formula, Ra' 21 Each of these is independently a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, -COOR'', -OC(=O)R'', a hydroxyalkyl group, or a cyano group; R'' is a hydrogen atom, an alkyl group, a lactone-containing cyclic group, a carbonate-containing cyclic group, or a -SO2--containing cyclic group; A'' is a C1-C5 alkylene group which may contain an oxygen atom (-O-) or a sulfur atom (-S-), an oxygen atom, or a sulfur atom, where n' is an integer from 0 to 2 and m' is 0 or 1.

[0211] In the general formulas (a2-r-1) to (a2-r-7), Ra' 21 The alkyl group in is preferably an alkyl group having 1 to 6 carbon atoms. The alkyl group is preferably linear or branched. Specifically, examples include methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, pentyl group, isopentyl group, neopentyl group, hexyl group, etc. Among these, the methyl group or ethyl group is preferred, and the methyl group is particularly preferred. Ra' 21 The alkoxy group in is preferably an alkoxy group having 1 to 6 carbon atoms. The alkoxy group is preferably linear or branched. Specifically, the Ra' 21Examples of alkyl groups in this context include groups formed by linking an alkyl group with an oxygen atom (-O-). Ra' 21 In this mixture, a fluorine atom is preferred as the halogen atom. Ra' 21 The halogenated alkyl group in is the Ra' 21 Examples include groups in which some or all of the hydrogen atoms of the alkyl group are substituted with the halogen atoms. Fluorinated alkyl groups are preferred as the halogenated alkyl group, and perfluoroalkyl groups are particularly preferred.

[0212] Ra' 21 In -COOR'' and -OC(=O)R'', R'' is either a hydrogen atom, an alkyl group, a lactone-containing cyclic group, a carbonate-containing cyclic group, or a -SO2--containing cyclic group. The alkyl group in R'' can be linear, branched, or cyclic, and preferably has 1 to 15 carbon atoms. When R'' is a linear or branched alkyl group, it is preferably 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, and particularly preferably a methyl group or an ethyl group. When R'' is a cyclic alkyl group, it is preferably 3 to 15 carbon atoms, more preferably 4 to 12 carbon atoms, and most preferably 5 to 10 carbon atoms. Specifically, examples include groups obtained by removing one or more hydrogen atoms from monocycloalkanes which may or may not be substituted with a fluorine atom or a fluorinated alkyl group; and groups obtained by removing one or more hydrogen atoms from polycycloalkanes such as bicycloalkanes, tricycloalkanes, and tetracycloalkanes. More specifically, examples include groups obtained by removing one or more hydrogen atoms from monocycloalkanes such as cyclopentane and cyclohexane; and groups obtained by removing one or more hydrogen atoms from polycycloalkanes such as adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane. Examples of lactone-containing cyclic groups in R'' include those similar to those represented by the general formulas (a2-r-1) to (a2-r-7) mentioned above. The carbonate-containing cyclic groups in R'' are the same as those described later, and specifically include the groups represented by the general formulas (ax3-r-1) to (ax3-r-3), respectively. The -SO2-containing cyclic groups in R'' are the same as the -SO2-containing cyclic groups described later, and specifically include the groups represented by the general formulas (a5-r-1) to (a5-r-4), respectively. Ra' 21 The hydroxyalkyl group in is preferably one having 1 to 6 carbon atoms, specifically the Ra' 21 Examples include groups in which at least one hydrogen atom of the alkyl group is substituted with a hydroxyl group.

[0213] In the general formulas (a2-r-2), (a2-r-3), and (a2-r-5) above, the alkylene group having 1 to 5 carbon atoms in A'' is preferably a linear or branched alkylene group, such as a methylene group, ethylene group, n-propylene group, or isopropylene group. When the alkylene group contains an oxygen atom or a sulfur atom, specific examples include a group in which -O- or -S- is interposed at the end or between carbon atoms of the alkylene group, such as -O-CH2-, -CH2-O-CH2-, -S-CH2-, or -CH2-S-CH2-. A'' is preferably an alkylene group having 1 to 5 carbon atoms or -O-, more preferably an alkylene group having 1 to 5 carbon atoms, and most preferably a methylene group.

[0214] The following are specific examples of groups represented by the general formulas (a²-r-1) to (a²-r-7).

[0215] [ka]

[0216] [ka]

[0217] A "-SO2-containing cyclic group" refers to a cyclic group that contains a ring with -SO2- in its cyclic skeleton. Specifically, it is a cyclic group in which the sulfur atom (S) in -SO2- forms part of the cyclic skeleton. The ring containing -SO2- in its cyclic skeleton is counted as the first ring. If it consists only of this ring, it is called a monocyclic group. If it has other ring structures, it is called a polycyclic group regardless of those structures. A -SO2-containing cyclic group may be a monocyclic group or a polycyclic group. The -SO2--containing cyclic group is preferably a cyclic group that contains -O-SO2- in its cyclic skeleton, that is, a cyclic group that contains a sultone ring in which the -OS- in -O-SO2- forms part of the cyclic skeleton. More specifically, examples of -SO2- containing cyclic groups include the groups represented by the following general formulas (a5-r-1) to (a5-r-4).

[0218] [ka] [In the formula, Ra' 51 Each of these is independently a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, -COOR'', -OC(=O)R'', a hydroxyalkyl group, or a cyano group; R'' is a hydrogen atom, an alkyl group, a lactone-containing cyclic group, a carbonate-containing cyclic group, or a -SO2--containing cyclic group; A'' is a C1-C5 alkylene group which may contain an oxygen atom or a sulfur atom, an oxygen atom, or a sulfur atom, and n' is an integer from 0 to 2.

[0219] In the general formulas (a5-r-1) to (a5-r-2) above, A'' is the same as A'' in the general formulas (a2-r-2), (a2-r-3), and (a2-r-5) above. Ra' 51 In this context, the alkyl group, alkoxy group, halogen atom, halogenated alkyl group, -COOR'', -OC(=O)R'', and hydroxyalkyl group are, respectively, Ra' in the general formula (a2-r-1) to (a2-r-7). 21 The same things mentioned in the explanation about this topic can be cited. Specific examples of the groups represented by the general formulas (a5-r-1) to (a5-r-4) are given below. In the formulas, "Ac" indicates an acetyl group.

[0220] [ka]

[0221] [ka]

[0222] [ka]

[0223] A "carbonate-containing cyclic group" refers to a cyclic group that contains a ring (carbonate ring) containing -OC(=O)-O- within its cyclic framework. The carbonate ring is counted as the first ring. If it consists only of a carbonate ring, it is called a monocyclic group. If it also has other ring structures, it is called a polycyclic group regardless of those structures. A carbonate-containing cyclic group may be a monocyclic group or a polycyclic group. Any carbonate ring-containing cyclic group can be used without any particular limitations. Specifically, examples include the groups represented by the following general formulas (ax3-r-1) to (ax3-r-3).

[0224] [ka] [In the formula, Ra' x31 Each of the following is independently a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, -COOR'', -OC(=O)R'', a hydroxyalkyl group, or a cyano group; R'' is a hydrogen atom, an alkyl group, a lactone-containing cyclic group, a carbonate-containing cyclic group, or a -SO2--containing cyclic group; A'' is a C1-C5 alkylene group which may contain an oxygen atom or a sulfur atom, an oxygen atom or a sulfur atom, p' is an integer from 0 to 3, and q' is 0 or 1.

[0225] In the above general formulas (ax3-r-2) to (ax3-r-3), A'' is the same as A'' in the above general formulas (a2-r-2), (a2-r-3), and (a2-r-5). Ra' 31 In this context, the alkyl group, alkoxy group, halogen atom, halogenated alkyl group, -COOR'', -OC(=O)R'', and hydroxyalkyl group are, respectively, Ra' in the general formula (a2-r-1) to (a2-r-7). 21 The same things mentioned in the explanation about this topic can be cited. The following are specific examples of groups represented by the general formulas (ax3-r-1) to (ax3-r-3).

[0226] [ka]

[0227] Among the constituent units (a2), those derived from acrylic acid esters in which the hydrogen atom bonded to the α-carbon atom may be substituted with a substituent are preferred. The constituent unit (a2) is preferably a constituent unit represented by the following general formula (a2-1).

[0228] [ka] [In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkyl halogen having 1 to 5 carbon atoms. 21 It is a single bond or a divalent linking group. 21 The R' is -O-, -COO-, -CON(R')-, -OCO-, -CONHCO-, or -CONHCS-, where R' represents a hydrogen atom or a methyl group. However, La 21 If -O-, Ya 21 It does not become -CO-. 21 This is a lactone-containing cyclic group, a carbonate-containing cyclic group, or a -SO2--containing cyclic group.

[0229] In formula (a2-1) above, R is the same as described above. R is preferably a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorinated alkyl group having 1 to 5 carbon atoms, and a hydrogen atom or a methyl group is particularly preferred due to their industrial availability.

[0230] In the above formula (a2-1), Ya 21 The divalent linking group in this is not particularly limited, but preferred examples include divalent hydrocarbon groups which may have substituents, and divalent linking groups which contain heteroatoms.

[0231] • Divalent hydrocarbon groups which may have substituents: Ya 21 If is a divalent hydrocarbon group which may have substituents, the hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group.

[0232] ··Ya 21 Aliphatic hydrocarbon groups in An aliphatic hydrocarbon group refers to a hydrocarbon group that does not possess aromaticity. The aliphatic hydrocarbon group may be saturated or unsaturated, but is usually preferable to be saturated. Examples of the aliphatic hydrocarbon group include linear or branched aliphatic hydrocarbon groups, or aliphatic hydrocarbon groups containing a ring in their structure.

[0233] ...linear or branched aliphatic hydrocarbon groups The linear aliphatic hydrocarbon group preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, even more preferably 1 to 4 carbon atoms, and most preferably 1 to 3 carbon atoms. As for the linear aliphatic hydrocarbon group, linear alkylene groups are preferred, specifically the methylene group [-CH2-], ethylene group [-(CH2)2-], trimethylene group [-(CH2)3-], tetramethylene group [-(CH2)4-], pentamethylene group [-(CH2)5-], etc. The branched aliphatic hydrocarbon group preferably has 2 to 10 carbon atoms, more preferably 3 to 6 carbon atoms, even more preferably 3 or 4 carbon atoms, and most preferably 3 carbon atoms. Preferred branched aliphatic hydrocarbon groups include branched alkylene groups, specifically alkylmethylene groups such as -CH(CH3)-, -CH(CH2CH3)-, -C(CH3)2-, -C(CH3)(CH2CH3)-, -C(CH3)(CH2CH2CH3)-, and -C(CH2CH3)2-; alkylethylene groups such as -CH(CH3)CH2-, -CH(CH3)CH(CH3)-, -C(CH3)2CH2-, -CH(CH2CH3)CH2-, and -C(CH2CH3)2-CH2-; alkyltrimethylene groups such as -CH(CH3)CH2CH2- and -CH2CH(CH3)CH2-; and alkylalkylene groups such as alkyltetramethylene groups such as -CH(CH3)CH2CH2CH2- and -CH2CH(CH3)CH2CH2-. In the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferred.

[0234] The linear or branched aliphatic hydrocarbon group may or may not have substituents. Examples of substituents include fluorine atoms, fluorinated alkyl groups having 1 to 5 carbon atoms substituted with fluorine atoms, and carbonyl groups.

[0235] ...Aliphatic hydrocarbon groups containing a ring in their structure Examples of aliphatic hydrocarbon groups containing a ring in the structure include cyclic aliphatic hydrocarbon groups that may contain substituents containing heteroatoms in the ring structure (groups obtained by removing two hydrogen atoms from an aliphatic hydrocarbon ring), groups in which the cyclic aliphatic hydrocarbon group is bonded to the end of a linear or branched aliphatic hydrocarbon group, and groups in which the cyclic aliphatic hydrocarbon group is interposed in the middle of a linear or branched aliphatic hydrocarbon group. Examples of the linear or branched aliphatic hydrocarbon group are the same as those described above. The cyclic aliphatic hydrocarbon group preferably has 3 to 20 carbon atoms, and more preferably has 3 to 12 carbon atoms. The cyclic aliphatic hydrocarbon group may be a polycyclic group or a monocyclic group. A preferred monocyclic alicyclic hydrocarbon group is a group obtained by removing two hydrogen atoms from a monocycloalkane. The monocycloalkane is preferably one having 3 to 6 carbon atoms, specifically cyclopentane, cyclohexane, etc. A preferred polycyclic alicyclic hydrocarbon group is a group obtained by removing two hydrogen atoms from a polycycloalkane, and the polycycloalkane is preferably one having 7 to 12 carbon atoms, specifically adamantane, norbornane, isobornane, tricyclodecane, tetracyclododecane, etc.

[0236] The cyclic aliphatic hydrocarbon group may or may not have substituents. Examples of substituents include alkyl groups, alkoxy groups, halogen atoms, alkyl halides, hydroxyl groups, and carbonyl groups. The alkyl group used as the substituent is preferably an alkyl group having 1 to 5 carbon atoms, and more preferably a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group. As the alkoxy group used as the substituent, an alkoxy group having 1 to 5 carbon atoms is preferred, a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, and a tert-butoxy group are more preferred, and a methoxy group and an ethoxy group are even more preferred. A fluorine atom is preferred as the halogen atom used as the substituent. Examples of halogenated alkyl groups as substituents include groups in which some or all of the hydrogen atoms of the alkyl group are substituted with halogen atoms. A cyclic aliphatic hydrocarbon group may have some of the carbon atoms constituting its ring structure replaced by substituents containing heteroatoms. Preferred substituents containing heteroatoms are -O-, -C(=O)-O-, -S-, -S(=O)2-, and -S(=O)2-O-.

[0237] ··Ya 21 Aromatic hydrocarbon groups in The aromatic hydrocarbon group is a hydrocarbon group having at least one aromatic ring. The aromatic ring is not particularly limited as long as it is a cyclic conjugated system having 4n+2 π electrons, and may be monocyclic or polycyclic. The aromatic ring preferably has 5 to 30 carbon atoms, more preferably 5 to 20, even more preferably 6 to 15, and particularly preferably 6 to 12. However, this carbon number does not include the carbon atoms in substituents. Examples of aromatic rings include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, and phenanthrene; and aromatic heterocycles in which some of the carbon atoms constituting the aromatic hydrocarbon ring are replaced by heteroatoms. Examples of heteroatoms in aromatic heterocycles include oxygen atoms, sulfur atoms, and nitrogen atoms. Examples of aromatic heterocycles include pyridine rings and thiophene rings. Specific examples of aromatic hydrocarbon groups include groups obtained by removing two hydrogen atoms from the aromatic hydrocarbon ring or aromatic heterocycle (arylene group or heteroarylene group); groups obtained by removing two hydrogen atoms from aromatic compounds containing two or more aromatic rings (e.g., biphenyl, fluorene, etc.); and groups in which one hydrogen atom of an aryl group or heteroaryl group obtained by removing one hydrogen atom from the aromatic hydrocarbon ring or aromatic heterocycle (aryl group or heteroaryl group) is substituted with an alkylene group (e.g., groups obtained by removing one more hydrogen atom from an aryl group in an arylalkyl group such as benzyl group, phenethyl group, 1-naphthylmethyl group, 2-naphthylmethyl group, 1-naphthylethyl group, 2-naphthylethyl group, etc.). The number of carbon atoms in the alkylene group bonded to the aryl group or heteroaryl group is preferably 1 to 4, more preferably 1 to 2, and particularly preferably 1.

[0238] The aromatic hydrocarbon group may have its hydrogen atoms substituted with substituents. For example, the hydrogen atoms bonded to the aromatic ring in the aromatic hydrocarbon group may be substituted with substituents. Examples of such substituents include alkyl groups, alkoxy groups, halogen atoms, alkyl halides, hydroxyl groups, and the like. The alkyl group used as the substituent is preferably an alkyl group having 1 to 5 carbon atoms, and more preferably a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group. Examples of the substituents include alkoxy groups, halogen atoms, and alkyl halides that substitute for hydrogen atoms on the cyclic aliphatic hydrocarbon group.

[0239] • Divalent linking groups containing heteroatoms: Ya 21 When is a divalent linking group containing a heteroatom, preferred linking groups include -O-, -C(=O)-O-, -OC(=O)-, -C(=O)-, -OC(=O)-O-, -C(=O)-NH-, -NH-, -NH-C(=NH)- (H may be substituted with substituents such as alkyl groups or acyl groups), -S-, -S(=O)2-, -S(=O)2-O-, and the general formula -Y 21 -OY 22 -, -Y 21 -O-, -Y 21 -C(=O)-O-, -C(=O)-OY 21 -,-[Y 21 -C(=O)-O] m” -Y 22 -, -Y 21 -OC(=O)-Y 22 - or -Y 21 -S(=O)2-OY 22 - is represented by the base [wherein Y 21 and Y 22 Each of these is a divalent hydrocarbon group which may have substituents independently, O is an oxygen atom, and m'' is an integer from 0 to 3. When the divalent linking group containing the heteroatom is -C(=O)-NH-, -C(=O)-NH-C(=O)-, -NH-, or -NH-C(=NH)-, the H may be substituted with substituents such as alkyl groups or acyl groups. The substituent (alkyl group, acyl group, etc.) preferably has 1 to 10 carbon atoms, more preferably 1 to 8, and particularly preferably 1 to 5 carbon atoms. General formula-Y 21 -OY22 -, -Y 21 -O-, -Y 21 -C(=O)-O-, -C(=O)-OY 21 -,-[Y 21 -C(=O)-O] m” -Y 22 -, -Y 21 -OC(=O)-Y 22 - or -Y 21 -S(=O)2-OY 22 - Middle, Y 21 and Y 22 Each of these is independently a divalent hydrocarbon group which may have substituents. The divalent hydrocarbon group is the aforementioned Ya 21 Examples include those similar to the divalent linking groups (divalent hydrocarbon groups that may have substituents) mentioned in the description of divalent linking groups in [the relevant section]. Y 21 Preferably, the group is a linear aliphatic hydrocarbon group, more preferably a linear alkylene group, even more preferably a linear alkylene group having 1 to 5 carbon atoms, and particularly preferably a methylene group or an ethylene group. Y 22 The group is preferably a linear or branched aliphatic hydrocarbon group, more preferably a methylene group, an ethylene group, or an alkylmethylene group. The alkyl group in the alkylmethylene group is preferably a linear alkyl group having 1 to 5 carbon atoms, more preferably a linear alkyl group having 1 to 3 carbon atoms, and most preferably a methyl group. Formula - [Y 21 -C(=O)-O] m” -Y 22 In the base represented by -, m'' is an integer between 0 and 3, preferably between 0 and 2, more preferably 0 or 1, and particularly preferably 1. That is, in the formula -[Y 21 -C(=O)-O] m” -Y 22 As a base represented by -, formula -Y 21 -C(=O)-OY 22 Groups represented by - are particularly preferred. Among them, the group represented by formula -(CH2) a’ -C(=O)-O-(CH2) b’A base represented by - is preferred. In the formula, a' is an integer from 1 to 10, preferably an integer from 1 to 8, more preferably an integer from 1 to 5, even more preferably 1 or 2, and most preferably 1. b' is an integer from 1 to 10, preferably an integer from 1 to 8, more preferably an integer from 1 to 5, even more preferably 1 or 2, and most preferably 1.

[0240] Among the above, Ya 21 Preferably, the group is a single bond, an ester bond [-C(=O)-O-], an ether bond (-O-), a linear or branched alkylene group, or a combination thereof.

[0241] In the above formula (a2-1), Ra 21 This is a lactone-containing cyclic group, an -SO2-- containing cyclic group, or a carbonate-containing cyclic group. Ra 21 In this context, suitable examples of lactone-containing cyclic groups, -SO2--containing cyclic groups, and carbonate-containing cyclic groups include the groups represented by the general formulas (a2-r-1) to (a2-r-7), (a5-r-1) to (a5-r-4), and (ax3-r-1) to (ax3-r-3), respectively. Among these, lactone-containing cyclic groups or -SO2--containing cyclic groups are preferred, and the groups represented by the general formulas (a2-r-1), (a2-r-2), (a2-r-6), or (a5-r-1) are more preferred. Specifically, any of the groups represented by the chemical formulas (r-lc-1-1) to (r-lc-1-7), (r-lc-2-1) to (r-lc-2-18), (r-lc-6-1), (r-sl-1-1), and (r-sl-1-18) are more preferred, and the group represented by the chemical formula (r-lc-1-1) is even more preferred.

[0242] The constituent units (a2) of component (A1) may be one type or two or more types. If component (A1) has constituent units (a2), the proportion of constituent units (a2) is preferably 5 to 40 mol%, and more preferably 5 to 30 mol%, relative to the total amount (100 mol%) of all constituent units that make up component (A1). If the proportion of constituent unit (a2) is set above a preferred lower limit, the effects of including constituent unit (a2) are sufficiently obtained due to the effects described above, and if it is below the upper limit, a balance can be achieved with other constituent units, resulting in good lithography characteristics.

[0243] Regarding the constituent unit (a3): Component (A1) may further have a constituent unit (a3) ​​containing a polar group-containing aliphatic hydrocarbon group (excluding those corresponding to constituent units (a01), (a1), (a2), or (a8)). The presence of constituent unit (a3) ​​in component (A1) increases the hydrophilicity of component (A1), contributing to improved resolution. Furthermore, the acid diffusion length can be appropriately adjusted.

[0244] Examples of polar groups include hydroxyl groups, cyano groups, and carboxyl groups, with hydroxyl groups being particularly preferred. Examples of aliphatic hydrocarbon groups include linear or branched hydrocarbon groups having 1 to 10 carbon atoms (preferably alkylene groups) and cyclic aliphatic hydrocarbon groups (cyclic groups). The cyclic group may be monocyclic or polycyclic, and can be appropriately selected from among the many proposed options for resins used in resist compositions for ArF excimer lasers.

[0245] When the cyclic group is a monocyclic group, it is more preferable that it has 3 to 10 carbon atoms. Among these, structural units derived from acrylic acid esters containing an aliphatic monocyclic group containing a hydroxyl group, a cyano group, or a carboxyl group are more preferred. Examples of such monocyclic groups include groups obtained by removing two or more hydrogen atoms from a monocycloalkane. Specifically, these include groups obtained by removing two or more hydrogen atoms from monocycloalkanes such as cyclopentane, cyclohexane, and cyclooctane. Among these monocyclic groups, groups obtained by removing two or more hydrogen atoms from cyclopentane and groups obtained by removing two or more hydrogen atoms from cyclohexane are industrially preferred.

[0246] If the cyclic group is a polycyclic group, it is more preferable that the number of carbon atoms in the polycyclic group is 7 to 30. Among these, structural units derived from acrylic acid esters containing aliphatic polycyclic groups containing a hydroxyl group, a cyano group, or a carboxyl group are more preferred. Examples of such polycyclic groups include groups obtained by removing two or more hydrogen atoms from bicycloalkanes, tricycloalkanes, tetracycloalkanes, etc. Specifically, examples include groups obtained by removing two or more hydrogen atoms from polycycloalkanes such as adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane. Among these polycyclic groups, groups obtained by removing two or more hydrogen atoms from adamantane, norbornane, and tetracyclododecane are industrially preferred.

[0247] As for the constituent unit (a3), any unit containing a polar group-containing aliphatic hydrocarbon group can be used without any particular limitations. The constituent unit (a3) ​​is preferably a constituent unit derived from an acrylic acid ester in which the hydrogen atom bonded to the α-carbon atom may be substituted with a substituent, and which includes a polar group-containing aliphatic hydrocarbon group. As for the constituent unit (a3), when the hydrocarbon group in the polar group-containing aliphatic hydrocarbon group is a linear or branched hydrocarbon group having 1 to 10 carbon atoms, a constituent unit derived from hydroxyethyl ester of acrylic acid is preferred. Furthermore, preferred constituent units (a3) ​​include those represented by the following formulas (a3-1) and (a3-2).

[0248] [ka] [In the formula, R is the same as above, j is an integer between 1 and 3, and k is an integer between 1 and 3.]

[0249] In formula (a3-1), j is preferably 1 or 2, and more preferably 1. When j is 2, it is preferable that the hydroxyl group is bonded to the 3rd and 5th positions of the adamantyl group. When j is 1, it is preferable that the hydroxyl group is bonded to the 3rd position of the adamantyl group. It is preferable that j is 1, and it is particularly preferable that the hydroxyl group is bonded to the 3-position of the adamantyl group.

[0250] In formula (a3-2), k is preferably 1. The cyano group is preferably bonded to the 5th or 6th position of the norbornyl group.

[0251] (A1) The constituent units (a3) ​​of component (A1) may be one type or two or more types. If component (A1) has constituent units (a3), the proportion of constituent units (a3) ​​is preferably 1 to 30 mol%, more preferably 2 to 25 mol%, and even more preferably 5 to 20 mol%, relative to the total (100 mol%) of all constituent units that make up component (A1). By setting the proportion of constituent unit (a3) ​​above a preferred lower limit, the effects of including constituent unit (a3) ​​are sufficiently obtained through the aforementioned effects. If it is below a preferred upper limit, a balance with other constituent units can be maintained, resulting in good lithography characteristics.

[0252] Regarding the constituent unit (a4): Component (A1) may further have a constituent unit (a4) containing an acid-nondissociable aliphatic cyclic group. The presence of component (A1) as a constituent unit (a4) improves the dry etching resistance of the formed resist pattern. Furthermore, the hydrophobicity of component (A1) increases. This improved hydrophobicity contributes to improvements in resolution, resist pattern shape, and other properties, particularly in solvent development processes. In the constituent unit (a4), the "acid-non-dissociating cyclic group" is a cyclic group that remains in the constituent unit without dissociating when acid is generated in the resist composition due to exposure (for example, when acid is generated from a constituent unit or component (B) that generates acid due to exposure).

[0253] As the constituent unit (a4), for example, a constituent unit derived from an acrylic acid ester containing an acid-nondissociable aliphatic cyclic group is preferred. Many of the cyclic groups that have been conventionally known to be used as resin components in resist compositions for ArF excimer lasers, KrF excimer lasers (preferably for ArF excimer lasers), etc., can be used. The cyclic group is preferably at least one selected from a tricyclodecyl group, an adamantyl group, a tetracyclododecyl group, an isobornyl group, and a norbornyl group, due to their industrial availability and other factors. These polycyclic groups may have linear or branched alkyl groups having 1 to 5 carbon atoms as substituents. Specifically, the constituent units (a4) can be exemplified by the constituent units represented by the following general formulas (a4-1) to (a4-7).

[0254] [ka] [In the formula, R α This is the same as above.

[0255] (A1) The constituent units (a4) of component (A1) may be one type or two or more types. If component (A1) has constituent units (a4), the proportion of constituent units (a4) is preferably 1 to 40 mol%, and more preferably 1 to 20 mol%, relative to the total amount (100 mol%) of all constituent units that make up component (A1). By setting the proportion of constituent unit (a4) above a preferred lower limit, the effects of including constituent unit (a4) can be fully obtained. On the other hand, by setting it below a preferred upper limit, it becomes easier to balance it with other constituent units.

[0256] Regarding the constituent unit (st): The constituent unit (st) is a constituent unit derived from styrene or a styrene derivative. "Constituent unit derived from styrene" means a constituent unit formed by the cleavage of the ethylenic double bond of styrene. "Constituent unit derived from a styrene derivative" means a constituent unit formed by the cleavage of the ethylenic double bond of a styrene derivative (excluding those corresponding to constituent unit (a10)).

[0257] A "styrene derivative" refers to a compound in which at least some of the hydrogen atoms of styrene are substituted with substituents. Examples of styrene derivatives include those in which the hydrogen atom at the α-position of styrene is substituted with a substituent, those in which one or more hydrogen atoms of the benzene ring of styrene are substituted with substituents, and those in which the hydrogen atom at the α-position of styrene and one or more hydrogen atoms of the benzene ring are substituted with substituents.

[0258] Examples of substituents that substitute for the α-hydrogen atom of styrene include C1-C5 alkyl groups or C1-C5 halogenated alkyl groups. The C1-C5 alkyl group is preferably a linear or branched alkyl group having C1-C5. Specifically, examples include methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, pentyl group, isopentyl group, neopentyl group, and the like. The C1-C5 alkyl halide is a group in which some or all of the hydrogen atoms of the C1-C5 alkyl group are substituted with halogen atoms. Fluorine atoms are particularly preferred as the halogen atoms. Preferably, the substituent that substitutes the α-hydrogen atom of styrene is an alkyl group having 1 to 5 carbon atoms or a fluorinated alkyl group having 1 to 5 carbon atoms, more preferably an alkyl group having 1 to 3 carbon atoms or a fluorinated alkyl group having 1 to 3 carbon atoms, and even more preferably a methyl group due to its industrial availability.

[0259] Examples of substituents that substitute for hydrogen atoms in the benzene ring of styrene include alkyl groups, alkoxy groups, halogen atoms, and alkyl halides. The alkyl group used as the substituent is preferably an alkyl group having 1 to 5 carbon atoms, and more preferably a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group. As the alkoxy group used as the substituent, an alkoxy group having 1 to 5 carbon atoms is preferred, a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group, and a tert-butoxy group are more preferred, and a methoxy group and an ethoxy group are even more preferred. A fluorine atom is preferred as the halogen atom used as the substituent. Examples of halogenated alkyl groups as substituents include groups in which some or all of the hydrogen atoms of the alkyl group are substituted with halogen atoms. As substituents to substitute hydrogen atoms in the benzene ring of styrene, C1-C5 alkyl groups are preferred, methyl groups or ethyl groups are more preferred, and methyl groups are even more preferred.

[0260] The constituent unit (st) is preferably a constituent unit derived from styrene, or a constituent unit derived from a styrene derivative in which the hydrogen atom at the α position of styrene is substituted with an alkyl group having 1 to 5 carbon atoms or a halogenated alkyl group having 1 to 5 carbon atoms. More preferably, the constituent unit is derived from styrene, or a constituent unit is derived from a styrene derivative in which the hydrogen atom at the α position of styrene is substituted with a methyl group. A constituent unit derived from styrene is even more preferable.

[0261] (A1) The constituent units (st) of the component may be one type or two or more types. If component (A1) has constituent units (st), the proportion of constituent units (st) is preferably 1 to 30 mol%, and more preferably 1 to 20 mol%, relative to the total amount (100 mol%) of all constituent units that make up component (A1).

[0262] The (A1) component contained in the resist composition may be used alone or in combination of two or more types. In the resist composition of this embodiment, component (A1) is a resin component having a constituent unit (a01). Examples of such (A1) components include polymer compounds consisting only of a repeating structure of constituent unit (a01); polymer compounds having a repeating structure of constituent unit (a01) and constituent unit (a10); polymer compounds having a repeating structure of constituent unit (a01), constituent unit (a10), and constituent unit (a2); polymer compounds having a repeating structure of constituent unit (a01), constituent unit (a10), and constituent unit (a8); polymer compounds having a repeating structure of constituent unit (a01), constituent unit (a2), and constituent unit (a3); and polymer compounds having a repeating structure of constituent unit (a01) and constituent unit (a1). Among these, polymer compounds having a repeating structure of constituent unit (a01) and constituent unit (a10) are preferred.

[0263] In a polymer compound having a repeating structure of constituent units (a01) and constituent units (a10), the proportion of constituent units (a01) in the polymer compound is preferably 50 to 95 mol%, more preferably 60 to 80 mol%, and even more preferably 65 to 75 mol%, based on the total amount (100 mol%) of all constituent units that make up the polymer compound. Furthermore, the proportion of constituent units (a10) in the polymer compound is preferably 5 to 50 mol%, more preferably 20 to 40 mol%, and even more preferably 25 to 35 mol%, relative to the total amount (100 mol%) of all constituent units that make up the polymer compound.

[0264] In a polymer compound having a repeating structure of constituent units (a01), (a10), and (a2), the proportion of constituent unit (a01) in the polymer compound is preferably 50 to 80 mol%, more preferably 60 to 80 mol%, and even more preferably 65 to 75 mol%, based on the total amount (100 mol%) of all constituent units that make up the polymer compound. Furthermore, the proportion of constituent units (a10) in the polymer compound is preferably 1 to 40 mol%, more preferably 10 to 30 mol%, and even more preferably 15 to 25 mol%, relative to the total amount (100 mol%) of all constituent units that make up the polymer compound. Furthermore, the proportion of constituent units (a2) in the polymer compound is preferably 1 to 30 mol%, more preferably 3 to 20 mol%, and even more preferably 5 to 15 mol%, relative to the total amount (100 mol%) of all constituent units that make up the polymer compound.

[0265] In a polymer compound having a repeating structure of constituent units (a01), (a10), and (a8), the proportion of constituent unit (a01) in the polymer compound is preferably 50 to 80 mol%, more preferably 60 to 80 mol%, and even more preferably 65 to 75 mol%, based on the total amount (100 mol%) of all constituent units that make up the polymer compound. Furthermore, the proportion of constituent units (a10) in the polymer compound is preferably 1 to 40 mol%, more preferably 10 to 30 mol%, and even more preferably 15 to 25 mol%, relative to the total amount (100 mol%) of all constituent units that make up the polymer compound. Furthermore, the proportion of constituent units (a8) in the polymer compound is preferably 1 to 30 mol%, more preferably 3 to 20 mol%, and even more preferably 5 to 15 mol%, relative to the total amount (100 mol%) of all constituent units that make up the polymer compound.

[0266] In a polymer compound having a repeating structure of constituent units (a01), (a2), and (a3), the proportion of constituent unit (a01) in the polymer compound is preferably 65 to 95 mol%, more preferably 70 to 90 mol%, and even more preferably 75 to 85 mol%, relative to the total amount (100 mol%) of all constituent units that make up the polymer compound. Furthermore, the proportion of constituent units (a2) in the polymer compound is preferably 1 to 30 mol%, more preferably 3 to 20 mol%, and even more preferably 5 to 15 mol%, relative to the total amount (100 mol%) of all constituent units that make up the polymer compound. Furthermore, the proportion of constituent units (a3) ​​in the polymer compound is preferably 1 to 30 mol%, more preferably 3 to 20 mol%, and even more preferably 5 to 15 mol%, relative to the total amount (100 mol%) of all constituent units that make up the polymer compound.

[0267] In a polymer compound having a repeating structure of constituent units (a01) and constituent units (a1), the proportion of constituent units (a01) in the polymer compound is preferably 50 to 95 mol%, more preferably 60 to 90 mol%, and even more preferably 75 to 85 mol%, based on the total amount (100 mol%) of all constituent units that make up the polymer compound. Furthermore, the proportion of constituent units (a1) in the polymer compound is preferably 5 to 50 mol%, more preferably 10 to 40 mol%, and even more preferably 15 to 25 mol%, relative to the total amount (100 mol%) of all constituent units that make up the polymer compound.

[0268] Such component (A1) can be produced by dissolving monomers that induce each constituent unit in a polymerization solvent and then adding a radical polymerization initiator such as azobisisobutyronitrile (AIBN) or dimethyl azobisisobutyrate (e.g., V-601) to the mixture and polymerizing it. Alternatively, such component (A1) can be produced by dissolving a monomer that induces the constituent unit (a01) and, if necessary, a monomer that induces a constituent unit other than the constituent unit (a01) (for example, a compound in which the hydroxyl group of the monomer that induces the constituent unit (a10) is protected) in a polymerization solvent, adding a radical polymerization initiator as described above to this solution, polymerizing the mixture, and then carrying out a deprotection reaction. Furthermore, during polymerization, a chain transfer agent such as HS-CH2-CH2-CH2-C(CF3)2-OH may be used in combination to introduce a -C(CF3)2-OH group at the terminal. Copolymers in which a hydroxyalkyl group, in which some of the hydrogen atoms of the alkyl group are replaced with fluorine atoms, are introduced are effective in reducing development defects and LER (line edge roughness: uneven unevenness of the line sidewall).

[0269] The weight-average molecular weight (Mw) of component (A1) (based on polystyrene conversion by gel permeation chromatography (GPC)) is not particularly limited, but is preferably 1,000 to 50,000, more preferably 2,000 to 30,000, and even more preferably 3,000 to 20,000. If the Mw of component (A1) is below the preferred upper limit of this range, it has sufficient solubility in the resist solvent for use as a resist, and if it is above the preferred lower limit of this range, it has good dry etching resistance and a good cross-sectional shape of the resist pattern. (A1) The degree of dispersion of component (Mw / Mn) is not particularly limited, but is preferably 1.0 to 4.0, more preferably 1.0 to 3.0, and particularly preferably 1.0 to 2.0. Mn represents the number-average molecular weight.

[0270] (A2) About the ingredients The resist composition of this embodiment may also include, as component (A), a base component (hereinafter referred to as "component (A2)") that does not correspond to component (A1) and whose solubility in the developer changes due to the action of an acid. (A2) The component is not particularly limited and can be arbitrarily selected from a large number of components that have been conventionally known as base components for chemically amplified resist compositions. (A2) Component may be a single high-molecular-weight compound or a low-molecular-weight compound, or two or more may be used in combination.

[0271] The proportion of component (A1) in component (A) is preferably 25% by mass or more, more preferably 50% by mass or more, even more preferably 75% by mass or more, and may also be 100% by mass, based on the total mass of component (A). When the proportion is 25% by mass or more, it becomes easier to form a resist pattern that is excellent in various lithography characteristics such as high sensitivity, resolution, and roughness improvement.

[0272] In the resist composition of this embodiment, the content of component (A) may be adjusted according to the resist film thickness to be formed.

[0273] <Acid generating agent component (B)> The resist composition of this embodiment further contains an acid-generating agent component (B) that generates acid upon exposure, in addition to component (A). In this embodiment, component (B) includes a compound (B01) represented by the following general formula (b0-1) (hereinafter also referred to as "compound (B01)") or a compound (B02) represented by the following general formula (b0-2) (hereinafter also referred to as "compound (B02)").

[0274] [ka] [In formula (b0-1), R b1 R is an aryl group having a fluorine atom or an aryl group having a fluorinated alkyl group. b2 and R b3 Each of these is independently an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. b1 ~R b3 Two of these may bond to each other to form a ring with the sulfur atom in the formula. 01 - It is an anti-anion. In formula (b0-2), R b4 This is an aryl group having a fluorine atom or an aryl group having a fluorinated alkyl group.b5 X is an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. 02 - It is an anti-anion.

[0275] ≪Compound (B01)≫ Compound (B01) is a compound represented by the following general formula (b0-1).

[0276] [ka] [In formula (b0-1), R b1 This is an aryl group having a fluorine atom or an aryl group having a fluorinated alkyl group. b2 and R b3 Each of these is independently an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. b1 ~R b3 Two of these may bond to each other to form a ring with the sulfur atom in the formula. 01 - It is an anti-anion.

[0277] • About the cation part In formula (b0-1), R b1 This is an aryl group having a fluorine atom or an aryl group having a fluorinated alkyl group. R b1 The aryl group in this compound preferably has 5 to 30 carbon atoms, more preferably 5 to 20, particularly preferably 6 to 15, and most preferably 6 to 10. However, this carbon number does not include the carbon atoms in the substituent. R b1 The aryl group in this compound is preferably a phenyl group, naphthyl group, anthryl group, phenanthryl group, or biphenyl group, more preferably a phenyl group or naphthyl group, and even more preferably a phenyl group.

[0278] R b1Specifically, the fluorinated alkyl group in the aryl group includes groups in which some or all of the hydrogen atoms of an alkyl group having 1 to 12 carbon atoms are substituted with fluorine atoms. The alkyl group may be linear or branched. Examples of linear fluorinated alkyl groups having 1 to 12 carbon atoms include groups in which some or all of the hydrogen atoms of a methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, or dodecyl group are substituted with fluorine atoms. Examples of branched fluorinated alkyl groups having 1 to 12 carbon atoms include groups in which some or all of the hydrogen atoms of a 1-methylethyl group, 1,1-dimethylethyl group, 1-methylpropyl group, 2-methylpropyl group, 1-methylbutyl group, 2-methylbutyl group, 3-methylbutyl group, 1-ethylbutyl group, 2-ethylbutyl group, 1-methylpentyl group, 2-methylpentyl group, 3-methylpentyl group, or 4-methylpentyl group are substituted with fluorine atoms.

[0279] R b1 Among the above, the fluorinated alkyl group of the aryl group is preferably a group in which some or all of the hydrogen atoms of an alkyl group having 1 to 5 carbon atoms are substituted with fluorine atoms, more preferably a group in which some or all of the hydrogen atoms of an alkyl group having 1 to 3 carbon atoms are substituted with fluorine atoms, and even more preferably a trifluoromethyl group.

[0280] R b1 The aryl group in may have substituents other than a fluorine atom or a fluorinated alkyl group. These substituents may include alkyl groups, halogen atoms other than fluorine atoms, halogenated alkyl groups other than fluorinated alkyl groups, carbonyl groups, cyano groups, amino groups, aryl groups, groups represented by the following general formulas (ca-r-1) to (ca-r-7), and -SO2-R b0 (R b0 Examples include monovalent groups represented by optionally substituted linear or branched alkyl groups, optionally substituted alicyclic hydrocarbon groups, or optionally substituted aromatic hydrocarbon groups.

[0281] [ka] [In the formula, R' 201 Each of these is independently a hydrogen atom, an optionally substituted cyclic group, an optionally substituted linear alkyl group, or an optionally substituted linear alkenyl group.

[0282] Cyclic groups that may have substituents: The cyclic group is preferably a cyclic hydrocarbon group, which may be an aromatic hydrocarbon group or an aliphatic hydrocarbon group. An aliphatic hydrocarbon group means a hydrocarbon group that does not have aromaticity. Furthermore, the aliphatic hydrocarbon group may be saturated or unsaturated, but is usually preferred to be saturated.

[0283] R' 201 The aromatic hydrocarbon group in this formula is a hydrocarbon group having an aromatic ring. The aromatic hydrocarbon group preferably has 3 to 30 carbon atoms, more preferably 5 to 30, even more preferably 5 to 20, particularly preferably 6 to 15, and most preferably 6 to 10. However, this carbon number does not include the carbon atoms in substituents. R' 201 Specific examples of aromatic rings in aromatic hydrocarbon groups include benzene, fluorene, naphthalene, anthracene, phenanthrene, biphenyl, or aromatic heterocycles in which some of the carbon atoms constituting these aromatic rings are substituted with heteroatoms. Examples of heteroatoms in aromatic heterocycles include oxygen atoms, sulfur atoms, nitrogen atoms, etc. R' 201Specific examples of aromatic hydrocarbon groups in this context include groups obtained by removing one hydrogen atom from the aromatic ring (aryl groups: e.g., phenyl group, naphthyl group, etc.), and groups in which one of the hydrogen atoms of the aromatic ring is replaced by an alkylene group (e.g., arylalkyl groups such as benzyl group, phenethyl group, 1-naphthylmethyl group, 2-naphthylmethyl group, 1-naphthylethyl group, 2-naphthylethyl group, etc.). The number of carbon atoms in the alkylene group (alkyl chain in the arylalkyl group) is preferably 1 to 4, more preferably 1 to 2, and particularly preferably 1.

[0284] R' 201 In this context, cyclic aliphatic hydrocarbon groups include aliphatic hydrocarbon groups that contain a ring in their structure. Examples of aliphatic hydrocarbon groups containing a ring in this structure include alicyclic hydrocarbon groups (groups from which one hydrogen atom has been removed from an aliphatic hydrocarbon ring), groups in which an alicyclic hydrocarbon group is bonded to the end of a linear or branched aliphatic hydrocarbon group, and groups in which an alicyclic hydrocarbon group is interposed in the middle of a linear or branched aliphatic hydrocarbon group. The alicyclic hydrocarbon group preferably has 3 to 20 carbon atoms, and more preferably 3 to 12 carbon atoms. The alicyclic hydrocarbon group may be a polycyclic group or a monocyclic group. A preferred monocyclic alicyclic hydrocarbon group is a group obtained by removing one or more hydrogen atoms from a monocycloalkane. The monocycloalkane is preferably one having 3 to 6 carbon atoms, specifically cyclopentane, cyclohexane, etc. A preferred polycyclic alicyclic hydrocarbon group is a group obtained by removing one or more hydrogen atoms from a polycycloalkane, and the polycycloalkane is preferably one having 7 to 30 carbon atoms. Among these, polycycloalkanes having a bridging ring polycyclic skeleton such as adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane; and polycycloalkanes having a fused ring polycyclic skeleton such as a steroid skeleton are more preferred.

[0285] The linear or branched aliphatic hydrocarbon group, which may be bonded to the alicyclic hydrocarbon group, preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, even more preferably 1 to 4 carbon atoms, and particularly preferably 1 to 3 carbon atoms. As for the linear aliphatic hydrocarbon group, linear alkylene groups are preferred, specifically the methylene group [-CH2-], ethylene group [-(CH2)2-], trimethylene group [-(CH2)3-], tetramethylene group [-(CH2)4-], pentamethylene group [-(CH2)5-], etc. Preferred branched aliphatic hydrocarbon groups include branched alkylene groups, specifically alkylmethylene groups such as -CH(CH3)-, -CH(CH2CH3)-, -C(CH3)2-, -C(CH3)(CH2CH3)-, -C(CH3)(CH2CH2CH3)-, and -C(CH2CH3)2-; alkylethylene groups such as -CH(CH3)CH2-, -CH(CH3)CH(CH3)-, -C(CH3)2CH2-, -CH(CH2CH3)CH2-, and -C(CH2CH3)2-CH2-; alkyltrimethylene groups such as -CH(CH3)CH2CH2- and -CH2CH(CH3)CH2-; and alkylalkylene groups such as alkyltetramethylene groups such as -CH(CH3)CH2CH2CH2- and -CH2CH(CH3)CH2CH2-. In the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferred.

[0286] Also, R' 201 The cyclic hydrocarbon group in the above formula may contain heteroatoms, such as heterocycles. Specifically, examples include lactone-containing cyclic groups represented by the general formulas (a2-r-1) to (a2-r-7), -SO2--containing cyclic groups represented by the general formulas (a5-r-1) to (a5-r-4), and other heterocyclic groups represented by the above chemical formulas (r-hr-1) to (r-hr-16).

[0287] R' 201 Examples of substituents on the cyclic group include alkyl groups, alkoxy groups, halogen atoms, alkyl halides, hydroxyl groups, carbonyl groups, and nitro groups.

[0288] Chain-like alkyl groups that may have substituents: R' 201 The chain-like alkyl group may be either linear or branched. The linear alkyl group preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and most preferably 1 to 10 carbon atoms. The branched alkyl group preferably has 3 to 20 carbon atoms, more preferably 3 to 15 carbon atoms, and most preferably 3 to 10 carbon atoms. Specifically, examples include 1-methylethyl group, 1-methylpropyl group, 2-methylpropyl group, 1-methylbutyl group, 2-methylbutyl group, 3-methylbutyl group, 1-ethylbutyl group, 2-ethylbutyl group, 1-methylpentyl group, 2-methylpentyl group, 3-methylpentyl group, and 4-methylpentyl group.

[0289] A chain-like alkenyl group which may have substituents: R' 201 The linear alkenyl group may be linear or branched, preferably having 2 to 10 carbon atoms, more preferably 2 to 5 carbon atoms, even more preferably 2 to 4 carbon atoms, and particularly preferably 3 carbon atoms. Examples of linear alkenyl groups include vinyl groups, propenyl groups (allyl groups), and butynyl groups. Examples of branched alkenyl groups include 1-methylvinyl groups, 2-methylvinyl groups, 1-methylpropenyl groups, and 2-methylpropenyl groups. Among the above, linear alkenyl groups are preferred, vinyl groups and propenyl groups are more preferred, and vinyl groups are particularly preferred.

[0290] R' 201 Substituents in the chain-like alkyl or alkenyl group include, for example, alkoxy groups, halogen atoms, alkyl halides, hydroxyl groups, carbonyl groups, nitro groups, amino groups, and the above R' 201 Examples include cyclic groups in this context.

[0291] -SO2-R b0 In a monovalent group represented by R b0 This is a linear or branched alkyl group which may have substituents, an alicyclic hydrocarbon group which may have substituents, or an aromatic hydrocarbon group which may have substituents. R b0 Examples of linear or branched alkyl groups include methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl, isopentyl, and neopentyl groups, with methyl or ethyl groups being preferred, and methyl groups being more preferred. R b0 Substituents that the linear or branched alkyl group may have include halogen atoms, C1-C5 halogenated alkyl groups, C1-C5 alkoxy groups, hydroxyl groups, carbonyl groups, carboxyl groups, and the like. R b0 The alicyclic hydrocarbon group preferably has 3 to 20 carbon atoms, more preferably 3 to 12 carbon atoms, and may be polycyclic or monocyclic. A preferred monocyclic alicyclic hydrocarbon group is a monocycloalkane from which one or more hydrogen atoms have been removed. The monocycloalkane preferably has 3 to 6 carbon atoms, specifically cyclobutane, cyclopentane, cyclohexane, etc. A preferred polycyclic alicyclic hydrocarbon group is a polycycloalkane from which one or more hydrogen atoms have been removed, and the polycycloalkane preferably has 7 to 12 carbon atoms, specifically adamantane, norbornane, isobornane, tricyclodecane, tetracyclododecane, etc. R b0 The alicyclic hydrocarbon group may have substituents such as the above-mentioned Ra x5 Similar bases can be cited. R b0 Examples of aromatic hydrocarbon groups include groups obtained by removing one hydrogen atom from an aromatic hydrocarbon ring, such as benzene, naphthalene, anthracene, phenanthrene, biphenyl, and fluorene. R b0 The substituents that the aromatic hydrocarbon group may have include the above-mentioned Ra x5Similar bases can be cited.

[0292] In formula (b0-1), R b2 and R b3 These are, independently, an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. R b2 and R b3 The aryl group in R b1 Examples include those similar to the aryl group in R. b2 and R b3 Among the aryl groups in this compound, phenyl, naphthyl, anthryl, phenanthryl, and biphenyl groups are preferred, phenyl or naphthyl groups are more preferred, and phenyl groups are even more preferred.

[0293] R b2 and R b3 The alkyl group in is preferably a chain-like or cyclic alkyl group having 1 to 30 carbon atoms. R b2 and R b3 In this context, an alkenyl group having 2 to 10 carbon atoms is preferred.

[0294] In formula (b0-1), R b2 and R b3 Examples of substituents that may be present include alkyl groups, halogen atoms, alkyl halides, carbonyl groups, cyano groups, amino groups, aryl groups, and the groups represented by the above general formulas (ca-r-1) to (ca-r-7).

[0295] In formula (b0-1), R b2 and R b3 Among the above, it is preferable that the aryl group may have substituents. If the aryl group has substituents, the substituents may be a fluorine atom, a fluorinated alkyl group, or the above-mentioned -SO2-R b0 A monovalent group represented by is preferred, and a fluorine atom, a fluorinated alkyl group, or a methanesulfonyl group (mesyl group) is more preferred. That is, in formula (b0-1), R b2and R b3 Particularly preferred are unsubstituted aryl groups, aryl groups having a fluorine atom, aryl groups having a fluorinated alkyl group, and aryl groups having a methanesulfonyl group (mesyl group).

[0296] In formula (b0-1), R b1 ~R b3 Two of these may bond to each other to form a ring with the sulfur atom in the formula. b1 ~R b3 When two of these atoms bond to each other and form a ring with the sulfur atom in the formula, heteroatoms such as sulfur, oxygen, nitrogen, or -SO-, -SO2-, -SO3-, -C(=O)-, -COO-, -CONH-, or -N(R N )-(applicable R N is an alkyl group having 1 to 5 carbon atoms. It may also be bonded via functional groups such as ). The formed ring is preferably a 3 to 10-membered ring, and particularly preferably a 5 to 7-membered ring, including the sulfur atom in its ring skeleton. Specific examples of the formed ring include, for example, a thiophene ring, a thiazole ring, a benzothiophene ring, a dibenzothiophene ring, a 9H-thioxanthene ring, a thianthlene ring, a phenoxatiyne ring, a tetrahydrothiophenium ring, and a tetrahydrothiopyranium ring. Note, R b1 and R b2 or R b3 When the two groups bond to each other to form a ring with the sulfur atom in the formula, it is sufficient that the ring structure has a fluorine atom or a fluorinated alkyl group, and the hydrogen atoms of the structure derived from the aryl group (for example, a benzene ring structure) do not need to be substituted with a fluorine atom or a fluorinated alkyl group.

[0297] In compound (B01), the cation portion is preferably a cation represented by the following general formula (ca-b01-1).

[0298] [ka] [In the formula, R b2 and Rb3 Each of these is independently an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. b2 and R b3 These atoms may be bonded to each other, forming a ring with the sulfur atom in the formula. 011 R is a fluorine atom or a fluorinated alkyl group. 011 is a substituent. nb is an integer greater than or equal to 1. pb is an integer greater than or equal to 0. qb is an integer between 0 and 3, where nb + pb ≤ qb × 2 + 5.

[0299] In formula (ca-b01-1), R b2 and R b3 This is R in the above equation (b0-1). b2 and R b3 These are identical to each other.

[0300] In formula (ca-b01-1), X 011 R is a fluorine atom or a fluorinated alkyl group, and R in formula (b0-1) above b1 Examples include fluorine atoms or fluorinated alkyl groups similar to those found in [the substance].

[0301] In formula (ca-b01-1), R 011 is a substituent, and examples include alkyl groups, halogen atoms other than fluorine atoms, halogenated alkyl groups other than fluorinated alkyl groups, carbonyl groups, cyano groups, amino groups, aryl groups, and the groups represented by the general formulas (ca-r-1) to (ca-r-7) mentioned above. Among these, the above-mentioned -SO2-R b0 A monovalent group represented by is preferred, and a methanesulfonyl group (mesyl group) is more preferred.

[0302] In formula (ca-b01-1), nb is an integer greater than or equal to 1, preferably between 1 and 3, and more preferably 1 or 2. In formula (ca-b01-1), pb is a non-negative integer, preferably between 0 and 2. In formula (ca-b01-1), qb is an integer between 0 and 3. When q is 0, it is a benzene structure; when q is 1, it is a naphthalene structure; when q is 2, it is an anthracene structure; and when q is 3, it is a tetracene structure.

[0303] The following are particularly preferred cations for the cation portion in compound (B01).

[0304] [ka]

[0305] As the cation portion in component (B01), a cation represented by any of the above formulas (ca-b01-11) to (ca-b01-20) is preferred.

[0306] About the Anion Club In formula (b0-1), X 01 - This is a counter anion. Anions known as the anionic portion of acid generator components for resist compositions can be used as appropriate. For example, X 01 - Examples include the anion represented by the following general formula (b0-1-an1), the anion represented by the general formula (b0-1-an2), or the anion represented by the general formula (b0-1-an3).

[0307] [ka] [In the formula, R 101 and R 104 ~R 108 Each of these is independently a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents. 104 and R 105 These may be bonded to each other to form a ring structure. 102 This is a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom. 101This is a divalent linking group or single bond containing an oxygen atom. 101 ~V 103 These are, independently, a single bond, an alkylene group, or a fluorinated alkylene group. 101 ~L 102 Each of these is independently either a single bond or an oxygen atom. 103 ~L 105 These are, independently, single bonds, -CO-, or -SO2-.

[0308] Anions represented by the general formula (b0-1-an1) In formula (b0-1-an1), R 101 This is a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents.

[0309] Cyclic groups which may have substituents: The cyclic group is preferably a cyclic hydrocarbon group, which may be an aromatic hydrocarbon group or an aliphatic hydrocarbon group. An aliphatic hydrocarbon group means a hydrocarbon group that does not have aromaticity. Furthermore, the aliphatic hydrocarbon group may be saturated or unsaturated, but is usually preferred to be saturated.

[0310] R 101 The aromatic hydrocarbon group in this context is a hydrocarbon group having an aromatic ring. The aromatic hydrocarbon group preferably has 3 to 30 carbon atoms, more preferably 5 to 30, even more preferably 5 to 20, and particularly preferably 6 to 18 carbon atoms. However, this carbon number does not include the carbon atoms in substituents. R 101 Specific examples of aromatic rings in aromatic hydrocarbon groups include benzene, fluorene, naphthalene, anthracene, phenanthrene, biphenyl, or aromatic heterocycles in which some of the carbon atoms constituting these aromatic rings are substituted with heteroatoms. Examples of heteroatoms in aromatic heterocycles include oxygen atoms, sulfur atoms, nitrogen atoms, etc. R 101Specific examples of aromatic hydrocarbon groups in this context include groups obtained by removing one hydrogen atom from the aromatic ring (aryl groups: for example, phenyl groups, naphthyl groups, etc.), groups in which one hydrogen atom of the aromatic ring is substituted with an alkylene group (for example, arylalkyl groups such as benzyl groups, phenethyl groups, 1-naphthylmethyl groups, 2-naphthylmethyl groups, 1-naphthylethyl groups, 2-naphthylethyl groups, etc.), and groups obtained by removing one hydrogen atom from a condensed ring in which the aromatic ring is fused to a crosslinked aliphatic ring such as bicycloheptane or bicyclooctane. The number of carbon atoms in the alkylene group (alkyl chain in the arylalkyl group) is preferably 1 to 4, more preferably 1 to 2, and particularly preferably 1.

[0311] R 101 In this context, cyclic aliphatic hydrocarbon groups include aliphatic hydrocarbon groups that contain a ring in their structure. Examples of aliphatic hydrocarbon groups containing a ring in this structure include alicyclic hydrocarbon groups (groups from which one hydrogen atom has been removed from an aliphatic hydrocarbon ring), groups in which an alicyclic hydrocarbon group is bonded to the end of a linear or branched aliphatic hydrocarbon group, and groups in which an alicyclic hydrocarbon group is interposed in the middle of a linear or branched aliphatic hydrocarbon group. The alicyclic hydrocarbon group preferably has 3 to 20 carbon atoms, and more preferably 3 to 12 carbon atoms. The alicyclic hydrocarbon group may be a polycyclic group or a monocyclic group. A preferred monocyclic alicyclic hydrocarbon group is a group obtained by removing one or more hydrogen atoms from a monocycloalkane. The monocycloalkane is preferably one having 3 to 6 carbon atoms, specifically cyclopentane, cyclohexane, etc. A preferred polycyclic alicyclic hydrocarbon group is a group obtained by removing one or more hydrogen atoms from a polycycloalkane, and the polycycloalkane is preferably one having 7 to 30 carbon atoms. Among these, polycycloalkanes having a bridging ring polycyclic skeleton such as adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane; and polycycloalkanes having a fused ring polycyclic skeleton such as a steroid skeleton are more preferred.

[0312] Among them, R 101 The cyclic aliphatic hydrocarbon group in is preferably a monocycloalkane or polycycloalkane from which one or more hydrogen atoms have been removed, more preferably a polycycloalkane from which one hydrogen atom has been removed, and particularly preferably an adamantyl group or a norbornyl group.

[0313] The linear aliphatic hydrocarbon group, which may be bonded to the alicyclic hydrocarbon group, preferably has 1 to 10 carbon atoms, more preferably 1 to 6, even more preferably 1 to 4, and most preferably 1 to 3. Examples of linear aliphatic hydrocarbon groups include linear alkylene groups, specifically methylene groups [-CH2-], ethylene groups [-(CH2)2-], trimethylene groups [-(CH2)3-], tetramethylene groups [-(CH2)4-], pentamethylene groups [-(CH2)5-], and the like. The branched aliphatic hydrocarbon group, which may be bonded to the alicyclic hydrocarbon group, preferably has 2 to 10 carbon atoms, more preferably 3 to 6, even more preferably 3 or 4, and most preferably 3. Preferred branched aliphatic hydrocarbon groups include branched alkylene groups, specifically alkylmethylene groups such as -CH(CH3)-, -CH(CH2CH3)-, -C(CH3)2-, -C(CH3)(CH2CH3)-, -C(CH3)(CH2CH2CH3)-, and -C(CH2CH3)2-; alkylethylene groups such as -CH(CH3)CH2-, -CH(CH3)CH(CH3)-, -C(CH3)2CH2-, -CH(CH2CH3)CH2-, and -C(CH2CH3)2-CH2-; alkyltrimethylene groups such as -CH(CH3)CH2CH2- and -CH2CH(CH3)CH2-; and alkylalkylene groups such as alkyltetramethylene groups such as -CH(CH3)CH2CH2CH2- and -CH2CH(CH3)CH2CH2-. In the alkylalkylene group, a linear alkyl group having 1 to 5 carbon atoms is preferred.

[0314] R 101The cyclic hydrocarbon group in may be a fused ring group containing a fused ring formed by the fusion of an aliphatic hydrocarbon ring and an aromatic ring. Examples of the fused ring include a polycycloalkane having a crosslinked polycyclic skeleton to which one or more aromatic rings are fused. Specific examples of the crosslinked polycycloalkane include bicycloalkanes such as bicyclo[2.2.1]heptane (norbornane) and bicyclo[2.2.2]octane. The fused ring group is preferably a group containing a fused ring formed by the fusion of two or three aromatic rings to a bicycloalkane, and more preferably a group containing a fused ring formed by the fusion of two or three aromatic rings to bicyclo[2.2.2]octane. 101 Specific examples of fused ring groups in this context include those represented by the following formulas (r-br-1) to (r-br-2). In the formulas, * represents Y in formula (b0-1-an1). 101 This represents a coupling that connects to something.

[0315] [ka]

[0316] Also, R 101 The cyclic hydrocarbon group in the above formula may contain heteroatoms, such as heterocycles. Specifically, examples include lactone-containing cyclic groups represented by the general formulas (a2-r-1) to (a2-r-7), -SO2--containing cyclic groups represented by the general formulas (a5-r-1) to (a5-r-4), and other heterocyclic groups represented by the above chemical formulas (r-hr-1) to (r-hr-16).

[0317] R 101 Examples of substituents on the cyclic group include alkyl groups, alkoxy groups, halogen atoms, alkyl halides, hydroxyl groups, carbonyl groups, and nitro groups. Preferably, alkyl groups having 1 to 5 carbon atoms are used as substituents, with methyl, ethyl, propyl, n-butyl, and tert-butyl groups being the most preferred. As the substituent, alkoxy groups having 1 to 5 carbon atoms are preferred, methoxy groups, ethoxy groups, n-propoxy groups, iso-propoxy groups, n-butoxy groups, and tert-butoxy groups are more preferred, and methoxy groups and ethoxy groups are most preferred. The halogen atom used as a substituent is preferably a bromine atom, an iodine atom, or a fluorine atom, with bromine or iodine atoms being more preferred. Examples of alkyl halides used as substituents include alkyl groups having 1 to 5 carbon atoms, such as methyl, ethyl, propyl, n-butyl, and tert-butyl groups, in which some or all of the hydrogen atoms are substituted with halogen atoms. A carbonyl group as a substituent is a group that substitutes for a methylene group (-CH2-) that constitutes a cyclic hydrocarbon group.

[0318] R 101 As substituents on the cyclic group, hydroxyl groups, alkoxy groups, bromine atoms, or iodine atoms are preferred among the above, and hydroxyl groups, bromine atoms, or iodine atoms are more preferred.

[0319] Chain-like alkyl groups which may have substituents: R 101 The chain-like alkyl group may be either linear or branched. The linear alkyl group preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and most preferably 1 to 10 carbon atoms. Specifically, examples include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decanyl group, undecyl group, dodecyl group, tridecyl group, isotridecyl group, tetradecyl group, pentadecyl group, hexadecyl group, isohexadecyl group, heptadecyl group, octadecyl group, nonadecyl group, eicosyl group, henicosyl group, docosyl group, and the like. The branched alkyl group preferably has 3 to 20 carbon atoms, more preferably 3 to 15 carbon atoms, and most preferably 3 to 10 carbon atoms. Specifically, examples include 1-methylethyl group, 1-methylpropyl group, 2-methylpropyl group, 1-methylbutyl group, 2-methylbutyl group, 3-methylbutyl group, 1-ethylbutyl group, 2-ethylbutyl group, 1-methylpentyl group, 2-methylpentyl group, 3-methylpentyl group, and 4-methylpentyl group.

[0320] A chain-like alkenyl group which may have substituents: R 101 The linear alkenyl group may be linear or branched, and preferably has 2 to 10 carbon atoms, more preferably 2 to 5, even more preferably 2 to 4, and particularly preferably 3 carbon atoms. Examples of linear alkenyl groups include vinyl groups, propenyl groups (allyl groups), and butynyl groups. Examples of branched alkenyl groups include 1-methylvinyl groups, 2-methylvinyl groups, 1-methylpropenyl groups, and 2-methylpropenyl groups. Among the above, linear alkenyl groups are preferred, vinyl groups and propenyl groups are more preferred, and vinyl groups are particularly preferred.

[0321] R 101 Examples of substituents in the chain-like alkyl or alkenyl group include alkoxy groups, halogen atoms, alkyl halides, hydroxyl groups, carbonyl groups, nitro groups, amino groups, and the above R 101 Examples include cyclic groups in this context.

[0322] Among the above, R 101 A cyclic group which may have substituents is preferred. Also, R 101 From the viewpoint of reducing roughness, it is more preferable that the polycyclic hydrocarbon group may have substituents, and even more preferable that it is a polycyclic hydrocarbon group of a crosslinked ring system which may have substituents. The cyclic group (polycyclic hydrocarbon group) may contain heteroatoms, such as a heterocycle. Also, R 101From the viewpoint of improving sensitivity, a cyclic group having an iodine atom or a bromine atom is preferred, and an aromatic hydrocarbon group having an iodine atom or a bromine atom is more preferred.

[0323] Examples of polycyclic hydrocarbon groups include groups obtained by removing one hydrogen atom from a polycyclic alkane having a polycyclic skeleton, and groups obtained by removing one hydrogen atom from a fused ring formed by the fusion of an aromatic ring with a polycyclic alkane having a polycyclic skeleton. Examples of such polycycloalkanes include polycycloalkanes having a bridging ring system, such as adamantane, norbornane (bicycloheptane), and bicyclooctane; and polycycloalkanes having a fused ring system, such as a cyclic group having a steroid skeleton. Among these, polycycloalkanes having a bridging ring system are preferred. Suitable specific examples of polycyclic aliphatic hydrocarbon groups include the adamantyl group and the norbornyl group.

[0324] An example of a group obtained by removing one hydrogen atom from a fused ring formed by the fusion of a polycyclic alkane with an aromatic ring is a group obtained by removing one hydrogen atom from a fused ring formed by the above-mentioned polycycloalkane and a benzene ring.

[0325] As for polycyclic hydrocarbon groups having heterocycles, polycyclic hydrocarbon groups with a crosslinked ring system having heterocycles are preferred, and specifically, examples include polycyclic groups with a -SO2- containing crosslinked ring system represented by the above general formula (a5-r-1).

[0326] In formula (b0-1-an1), Y 101 It is a single bond or a divalent linking group containing an oxygen atom. Y 101 If Y is a divalent linking group containing an oxygen atom, 101 It may contain atoms other than oxygen atoms. Examples of atoms other than oxygen atoms include carbon atoms, hydrogen atoms, sulfur atoms, nitrogen atoms, etc. Examples of divalent linking groups containing an oxygen atom include non-hydrocarbon oxygen-containing linking groups such as oxygen atoms (ether bond: -O-), ester bonds (-C(=O)-O-), oxycarbonyl groups (-OC(=O)-), amide bonds (-C(=O)-NH-), carbonyl groups (-C(=O)-), and carbonate bonds (-OC(=O)-O-); and combinations of such non-hydrocarbon oxygen-containing linking groups with alkylene groups. A sulfonyl group (-SO2-) may be further linked to this combination. Examples of such divalent linking groups containing an oxygen atom include the linking groups represented by the following general formulas (y-al-1) to (y-al-7).

[0327] [ka] [In the formula, V' 101 V' is a single bond or an alkylene group having 1 to 5 carbon atoms. 102 It is a divalent saturated hydrocarbon group having 1 to 30 carbon atoms.

[0328] V' 102 The divalent saturated hydrocarbon group in is preferably an alkylene group having 1 to 30 carbon atoms, more preferably an alkylene group having 1 to 10 carbon atoms, and even more preferably an alkylene group having 1 to 5 carbon atoms.

[0329] V' 101 and V' 102 The alkylene group in this product may be a linear alkylene group or a branched alkylene group, but a linear alkylene group is preferred. V' 101 and V' 102Specifically, the alkylene groups in these include: methylene group [-CH2-]; alkylmethylene groups such as -CH(CH3)-, -CH(CH2CH3)-, -C(CH3)2-, -C(CH3)(CH2CH3)-, -C(CH3)(CH2CH2CH3)-, -C(CH2CH3)2-; ethylene group [-CH2CH2-]; -CH(CH3)CH2-, -CH(CH3)CH(CH3)-, -C(CH3)2CH2-, -CH(CH2CH3)CH2 Examples include alkylethylene groups such as -CH2CH2CH2-; trimethylene groups (n-propylene groups) [-CH2CH2CH2-]; alkyltrimethylene groups such as -CH(CH3)CH2CH2- and -CH2CH(CH3)CH2-; tetramethylene groups [-CH2CH2CH2CH2-]; alkyltetramethylene groups such as -CH(CH3)CH2CH2CH2- and -CH2CH(CH3)CH2CH2-; and pentamethylene groups [-CH2CH2CH2CH2CH2-]. Also, oshiV' 101 or V' 102 Some of the methylene groups in the alkylene group may be substituted with a divalent aliphatic cyclic group having 5 to 10 carbon atoms. The aliphatic cyclic group is Ra' in formula (a1-r-1). 3 A divalent group is preferred, which is obtained by removing one more hydrogen atom from a cyclic aliphatic hydrocarbon group (monocyclic aliphatic hydrocarbon group, polycyclic aliphatic hydrocarbon group), and a cyclohexylene group, a 1,5-adamantilene group, or a 2,6-adamantilene group is more preferred.

[0330] Among the above, Y 101 The bond is preferably a single bond, an ester bond (-C(=O)-O-), or an oxycarbonyl group (-OC(=O)-).

[0331] In formula (b0-1-an1), V 101 This is a single bond, an alkylene group, or a fluorinated alkylene group. 101 The alkylene group and fluorinated alkylene group in this case preferably have 1 to 4 carbon atoms. 101 As for the fluorinated alkylene group in V 101Examples include groups in which some or all of the hydrogen atoms of the alkylene group are replaced with fluorine atoms. Among these, V 101 It is preferable that the bond is a single bond or a fluorinated alkylene group having 1 to 3 carbon atoms.

[0332] In formula (b0-1-an1), R 102 R is a fluorine atom or a fluorinated alkyl group having 1 to 5 carbon atoms. 102 It is preferably a fluorine atom or a perfluoroalkyl group having 1 to 5 carbon atoms, and more preferably a fluorine atom.

[0333] Anions represented by the general formula (b0-1-an2) In formula (b0-1-an2), R 104 , R 105 Each of these is independently a cyclic group which may have a substituent, a linear alkyl group which may have a substituent, or a linear alkenyl group which may have a substituent, and each of them is R in formula (b0-1-an1). 101 Similar examples can be given. However, R 104 , R 105 These may be bonded to each other to form a ring. R 104 , R 105 The alkyl group is preferably a linear alkyl group which may have substituents, and more preferably a linear or branched alkyl group, or a linear or branched fluorinated alkyl group. The number of carbon atoms in the chain-like alkyl group is preferably 1 to 10, more preferably 1 to 7, and even more preferably 1 to 3. 104 , R 105 The number of carbon atoms in the chain-like alkyl group is preferably small within the above range of carbon atoms, for reasons such as good solubility in the resist solvent. 104 , R 105In the chain-like alkyl group, a higher number of hydrogen atoms substituted with fluorine atoms is preferable because it increases the acid strength. The proportion of fluorine atoms in the chain-like alkyl group, i.e., the fluorination rate, is preferably 70 to 100%, more preferably 90 to 100%, and most preferably a perfluoroalkyl group in which all hydrogen atoms are substituted with fluorine atoms. In formula (b0-1-an2), V 102 , V 103 These are, independently, a single bond, an alkylene group, or a fluorinated alkylene group, and each is V in formula (b0-1-an1). 101 Similar examples include the above. In formula (b0-1-an2), L 101 , L 102 Each of these is either a single bond or an oxygen atom, independently of the others.

[0334] Anions represented by the general formula (b0-1-an3) In formula (b0-1-an3), R 106 ~R 108 Each of these is independently a cyclic group which may have a substituent, a linear alkyl group which may have a substituent, or a linear alkenyl group which may have a substituent, and each of them is R in formula (b0-1-an1). 101 Similar examples include the above. In formula (b0-1-an3), L 103 ~L 105 These are, independently, single bonds, -CO-, or -SO2-.

[0335] In formula (b0-1), X 01 - Among the above, the anion represented by the general formula (b0-1-an1) is preferred.

[0336] The following are some preferred specific examples of anions represented by the general formula (b0-1-an1).

[0337] [ka]

[0338] X in equation (b0-1) 01 - From the viewpoint of improving sensitivity, among the above, the anion represented by the following general formula (b0-1-an4) is preferred.

[0339] [ka] [where, X 0 R is a bromine atom or an iodine atom. m nb1 is an integer between 1 and 5, nb2 is an integer between 0 and 4, and 1 ≤ nb1 + nb2 ≤ 5. 0 This is a divalent linking group or a single bond. Vb 0 R is a single bond, an alkylene group, or a fluorinated alkylene group. 0 This is a hydrogen atom, a fluorinated alkyl group having 1 to 5 carbon atoms, or a fluorine atom.

[0340] In the above general formula (b0-1-an4), X 0 This atom is either a bromine atom or an iodine atom, and is preferably an iodine atom.

[0341] In the above general formula (b0-1-an4), R m R is a hydroxyl group, an alkyl group, a fluorine atom, or a chlorine atom. m The alkyl group in is preferably an alkyl group having 1 to 5 carbon atoms, and more preferably a methyl group or an ethyl group. In the above general formula (b0-1-an4), R m Among the above, a hydroxyl group is preferred.

[0342] In the above general formula (b0-1-an4), nb1 is an integer between 1 and 5, nb2 is an integer between 0 and 4, and 1 ≤ nb1 + nb2 ≤ 5. nb1 is preferably an integer between 1 and 3, more preferably 2 or 3, and even more preferably 3. nb2 is preferably an integer between 0 and 3, more preferably 0 or 1, and even more preferably 0.

[0343] In the above general formula (b0-1-an4), Yb 0 Yb is a divalent linking group or a single bond. 0 In this context, a divalent linking group containing an oxygen atom is preferred. Yb 0 If Yb is a divalent linking group containing an oxygen atom, 0 It may contain atoms other than oxygen atoms. Examples of atoms other than oxygen atoms include carbon atoms, hydrogen atoms, sulfur atoms, nitrogen atoms, etc. Examples of divalent linking groups containing an oxygen atom include non-hydrocarbon oxygen-containing linking groups such as oxygen atoms (ether bond: -O-), ester bonds (-C(=O)-O-), oxycarbonyl groups (-OC(=O)-), amide bonds (-C(=O)-NH-), carbonyl groups (-C(=O)-), and carbonate bonds (-OC(=O)-O-); and combinations of such non-hydrocarbon oxygen-containing linking groups with alkylene groups. A sulfonyl group (-SO2-) may be further linked to this combination.

[0344] In the above general formula (b0-1-an4), Vb 0 This is an alkylene group, a fluorinated alkylene group, or a single bond. Vb 0 The alkylene group and fluorinated alkylene group in each are preferably having 1 to 4 carbon atoms, and more preferably having 1 to 3 carbon atoms. Vb 0 Examples of fluorinated alkylene groups include groups in which some or all of the hydrogen atoms of the alkylene group are replaced with fluorine atoms. Among these, Vb 0 It is preferably an alkylene group having 1 to 4 carbon atoms, a fluorinated alkylene group having 1 to 4 carbon atoms, or a single bond, and more preferably an alkylene group having 1 to 3 carbon atoms in which some of the hydrogen atoms are replaced by fluorine atoms, or a single bond.

[0345] In the above equation (b0), R 0 R is a hydrogen atom, a fluorinated alkyl group having 1 to 5 carbon atoms, or a fluorine atom. 0 It is preferably a fluorine atom or a perfluoroalkyl group having 1 to 5 carbon atoms, and more preferably a fluorine atom.

[0346] X in equation (b0-1) 01 - From the viewpoint of improving sensitivity, an anion represented by the following general formula (b0-an0) is more preferable.

[0347] [ka] [where, X 0 R is a bromine atom or an iodine atom. m nb1 is a hydroxyl group, an alkyl group, a fluorine atom, or a chlorine atom. nb1 is an integer from 1 to 5, nb2 is an integer from 0 to 4, and 1 ≤ nb1 + nb2 ≤ 5. 01 and L 02 These are, independently, single bonds, alkylene groups, -O-, -CO-, -OCO-, -COO-, -SO2-, and -N(R) a )-C(=O)-,-N(R a )-,-C(R a )(R a )-N(R a )-,-C(R a )(N(R a )(R a ))-, or -C(=O)-N(R a )- is. R a Each of these is independently either a hydrogen atom or an alkyl group. z is an integer between 0 and 10. Vb 0 R is a single bond, an alkylene group, or a fluorinated alkylene group. 0 This is a hydrogen atom, a fluorinated alkyl group having 1 to 5 carbon atoms, or a fluorine atom.

[0348] X in the above general formula (b0-an0) 0 , R m , nb1, nb2, Vb 0 , and R 0These are the X in the general formula (b0) mentioned above. 0 , R m , nb1, nb2, Vb 0 , and R 0 These are identical to each other.

[0349] In the above general formula (b0-an0), L 01 and L 02 These are, independently, single bonds, alkylene groups, -O-, -CO-, -OCO-, -COO-, -SO2-, and -N(R) a )-C(=O)-,-N(R a )-,-C(R a )(R a )-N(R a )-,-C(R a )(N(R a )(R a ))-, or -C(=O)-N(R a )- is. R a Each of these is independently either a hydrogen atom or an alkyl group. L 01 and L 02 The alkylene group in, and R a The alkyl groups in each are preferably having 1 to 4 carbon atoms, and more preferably having 1 to 3 carbon atoms.

[0350] In the above general formula (b0-an0), L 01 and L 02 Among the above, it is preferable that one of them is -OCO- or -COO-, L 01 However, it is -OCO- or -COO-, L 02 However, a single bond, -OCO-, or -COO- is more preferable.

[0351] More specifically, in the above general formula (b0-an0), -L 01 -(CH2)zL 02 -Vb 0 - is -COO-Vb 0 -, -OCO-Vb 0 -, or -COO-(CH2)z-COO-Vb 0 - is preferable.

[0352] In the above general formula (b0-an0), z is an integer between 0 and 10, preferably between 0 and 5, and more preferably between 0 and 3.

[0353] The following are specific examples of anions represented by the general formula (b0-1-an4).

[0354] [ka]

[0355] [ka]

[0356] Of the above, compound (B01) is preferably compound (B011) represented by the following general formula (b0-1-1) (hereinafter also referred to as "compound (B011)").

[0357] [ka] [In the formula, R b2 and R b3 Each of these is independently an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. b2 and R b3 These atoms may be bonded to each other, forming a ring with the sulfur atom in the formula. 011 R is a fluorine atom or a fluorinated alkyl group. 011 is a substituent. nb is an integer greater than or equal to 1. pb is an integer greater than or equal to 0. qb is an integer between 0 and 3, where nb + pb ≤ qb × 2 + 5. X 01 - It is an anti-anion.

[0358] The anionic portion of compound (B011) is identical to that of compound (B01). The cation portion of compound (B011) is identical to the cation represented by the general formula (ca-b01-1) above.

[0359] The following are preferred specific examples of compound (B01).

[0360] [ka]

[0361] [ka]

[0362] [ka]

[0363] As for compound (B01), among the above, a compound represented by any of the above formulas (B01-1) to (B01-6) is preferred, and a compound represented by any of the above formulas (B01-1), (B01-3) to (B01-6) is more preferred.

[0364] In the resist composition of this embodiment, compound (B01) may be used alone or in combination of two or more types. The content of compound (B01) is preferably 5 to 40 parts by mass, more preferably 10 to 40 parts by mass, and even more preferably 15 to 35 parts by mass, per 100 parts by mass of component (A1). When the content of compound (B01) is above the lower limit of the preferred range described above, lithography characteristics such as sensitivity, resolution performance, and LWR (linewise roughness) reduction are further improved in resist pattern formation. On the other hand, when it is below the upper limit of the preferred range, a uniform solution is more easily obtained when each component of the resist composition is dissolved in an organic solvent, and the storage stability of the resist composition is further improved.

[0365] If compound (B01) has an anion represented by the above general formula (b0-1-an4), the content of compound (B01) is preferably 5 to 40 parts by mass, more preferably 10 to 40 parts by mass, and even more preferably 15 to 40 parts by mass, per 100 parts by mass of component (A1). When the content of compound (B01) is above the lower limit of the preferred range described above, the sensitivity in resist pattern formation is particularly improved. On the other hand, when it is below the upper limit of the preferred range, a homogeneous solution is more easily obtained when each component of the resist composition is dissolved in an organic solvent, and the storage stability of the resist composition is further improved.

[0366] ≪Compound (B02)≫ Compound (B02) is a compound represented by the following general formula (b0-2).

[0367] [ka] [In formula (b0-2), R b4 This is an aryl group having a fluorine atom or an aryl group having a fluorinated alkyl group. b5 X is an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. 02 - It is an anti-anion.

[0368] • About the cation part In formula (b0-2), R b4 R is an aryl group having a fluorine atom or an aryl group having a fluorinated alkyl group, and in the above formula (b0-1) R b1 Similar examples include the above. In formula (b0-2), R b5 R in formula (b0-2) above is an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. b2 and R b3 Similar examples include the above.

[0369] In formula (b0-2), R b4Among the above, it is preferable that the phenyl group has a fluorine atom or a phenyl group in which some or all of the hydrogen atoms of an alkyl group having 1 to 5 carbon atoms are substituted with fluorine atoms, and it is more preferable that the phenyl group has a fluorine atom. In formula (b0-2), R b5 Among the above, it is preferable that the phenyl group has a fluorine atom or a phenyl group in which some or all of the hydrogen atoms of an alkyl group having 1 to 5 carbon atoms are substituted with fluorine atoms, and it is more preferable that the phenyl group has a fluorine atom.

[0370] The following are preferred specific examples of the cation moiety of compound (B02).

[0371] [ka]

[0372] About the Anion Club In formula (b0-2), X 02 - is a pair anion, and X in the above equation (b0-1) 01 - Similar examples include the above.

[0373] The following are some preferred examples of compound (B02).

[0374] [ka]

[0375] In the resist composition of this embodiment, compound (B02) may be used alone or in combination of two or more types. The content of compound (B02) is preferably 5 to 40 parts by mass, more preferably 10 to 40 parts by mass, and even more preferably 15 to 35 parts by mass, per 100 parts by mass of component (A1). When the content of compound (B02) is above the lower limit of the preferred range described above, lithography characteristics such as sensitivity, resolution performance, and LWR (linewise roughness) reduction are further improved in resist pattern formation. On the other hand, when it is below the upper limit of the preferred range, a uniform solution is more easily obtained when each component of the resist composition is dissolved in an organic solvent, and the storage stability of the resist composition is further improved.

[0376] In the resist composition of this embodiment, either compound (B01) or compound (B02) may be used alone, or compound (B01) and compound (B02) may be used in combination. When compound (B01) and compound (B02) are used in combination, the total content of compound (B01) and compound (B02) is preferably 5 to 40 parts by mass, more preferably 10 to 40 parts by mass, and even more preferably 15 to 35 parts by mass, per 100 parts by mass of component (A1). When the total content of compound (B01) and compound (B02) is above the lower limit of the preferred range described above, lithography characteristics such as sensitivity, resolution performance, and LWR (linewise roughness) reduction are further improved in resist pattern formation. On the other hand, when it is below the upper limit of the preferred range, a uniform solution is more easily obtained when each component of the resist composition is dissolved in an organic solvent, and the storage stability of the resist composition is further improved.

[0377] ≪(B2) Component≫ The resist composition of this embodiment may contain acid generating agent components other than the above-mentioned compounds (B01) and (B02) (hereinafter referred to as "component (B2)"), to the extent that the effects of the present invention are not impaired. The (B2) component is not particularly limited, and any acid generators previously proposed for chemically amplified resist compositions can be used. Examples of such acid generators include onium salt-based acid generators such as iodonium salts and sulfonium salts; oximesulfonate-based acid generators; diazomethane-based acid generators such as bisalkyl or bisarylsulfonyl diazomethanes and poly(bissulfonyl) diazomethanes; nitrobenzyl sulfonate-based acid generators, iminosulfonate-based acid generators, and disulfone-based acid generators, among many others.

[0378] Examples of onium salt-based acid generators include X in formula (b0-1) above. 01 - Examples include compounds consisting of a cation represented by one of the following chemical formulas (Ca-1-1) to (Ca-1-93). In the chemical formula below, g3 represents the number of repetitions, and g3 is an integer between 0 and 20. 201 is a hydrogen atom or a substituent. Examples of substituents include alkyl groups, halogen atoms other than fluorine atoms, alkyl halides other than fluorinated alkyl groups, carbonyl groups, cyano groups, amino groups, aryl groups, and the like.

[0379] [ka]

[0380] [ka]

[0381] [ka] [In the formula, g2 and g3 represent the number of repetitions, where g2 is an integer between 0 and 20, and g3 is an integer between 0 and 20.]

[0382] [ka]

[0383] [ka]

[0384] [ka] [In the formula, R” 201 is a hydrogen atom or a substituent, and the substituent is the aforementioned R 201 ~R 207 , and R 210 ~R 212 These are the same as those listed as substituents that may be present.

[0385] [ka]

[0386] In the resist composition of this embodiment, component (B2) may be used alone or in combination of two or more types. If the resist composition contains component (B2), the content of component (B2) in the resist composition is preferably 40 parts by mass or less, more preferably 30 parts by mass or less, and even more preferably 20 parts by mass or less, per 100 parts by mass of component (A1).

[0387] <Other ingredients> The resist composition of this embodiment may further contain other components in addition to the above-described components (A) and (B). Examples of other components include components (D), (E), (F), and (S) shown below.

[0388] ≪Basic component (D)≫ The resist composition of this embodiment may further contain a basic component (component (D)) that traps (i.e., controls the diffusion of) the acid generated by exposure. Component (D) acts as a quencher (acid diffusion control agent) that traps the acid generated by exposure in the resist composition. Examples of component (D) include a photo-disintegrating base (D1) (hereinafter referred to as "component (D1)") that decomposes upon exposure and loses its ability to control acid diffusion, and a nitrogen-containing organic compound (D2) (hereinafter referred to as "component (D2)") that does not fall under component (D1). Among these, a photo-disintegrating base (component (D1)) is preferred because it is easier to improve the characteristics of high sensitivity, roughness reduction, and suppression of coating defects.

[0389] • About the (D1) component By using a resist composition containing component (D1), the contrast between the exposed and unexposed areas of the resist film can be further improved when forming a resist pattern. The (D1) component is not particularly limited as long as it decomposes upon exposure and loses its acid diffusion controllability, and is preferably one or more compounds selected from the group consisting of the compound represented by the following general formula (d1-1) (hereinafter referred to as "(d1-1) component"), the compound represented by the following general formula (d1-2) (hereinafter referred to as "(d1-2) component"), and the compound represented by the following general formula (d1-3) (hereinafter referred to as "(d1-3) component"). Components (d1-1) to (d1-3) decompose in the exposed areas of the resist film and lose their acid diffusion control properties (basicity), so they do not act as quenchers, but they act as quenchers in the unexposed areas of the resist film.

[0390] [ka] [In the formula, Rd 1 ~Rd 4 Rd in formula (d1-2) is a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents. 2 In this example, assume that no fluorine atoms are bonded to the carbon atoms adjacent to the sulfur atoms. 1 is a single bond or a divalent linking group. m is an integer greater than or equal to M m+ These are each independently m-valent organic cations.

[0391] {(d1-1) component} ··Anion Club In formula (d1-1), Rd 1 R' is a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents, and each of the above R' is... 201 Similar examples include the above. Among these, Rd 1 Preferred substituents are optionally substituted aromatic hydrocarbon groups, optionally substituted aliphatic cyclic groups, or optionally substituted linear alkyl groups. Examples of substituents these groups may have include hydroxyl groups, oxo groups, alkyl groups, aryl groups, fluorine atoms, iodine atoms, bromine atoms, fluorinated alkyl groups, lactone-containing cyclic groups represented by the general formulas (a2-r-1) to (a2-r-7), ether bonds, ester bonds, or combinations thereof. When ether bonds or ester bonds are included as substituents, they may be mediated via alkylene groups, and in this case, preferred substituents are the linking groups represented by the general formulas (y-al-1) to (y-al-5). Suitable examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, and a polycyclic structure containing a bicyclooctane skeleton (a polycyclic structure consisting of a bicyclooctane skeleton and other ring structures). The aliphatic cyclic group is more preferably a group obtained by removing one or more hydrogen atoms from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane, or tetracyclododecane. The linear alkyl group preferably has 1 to 10 carbon atoms, and specifically includes linear alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, and decyl groups; and branched alkyl groups such as 1-methylethyl, 1-methylpropyl, 2-methylpropyl, 1-methylbutyl, 2-methylbutyl, 3-methylbutyl, 1-ethylbutyl, 2-ethylbutyl, 1-methylpentyl, 2-methylpentyl, 3-methylpentyl, and 4-methylpentyl groups.

[0392] When the chain-like alkyl group is a fluorinated alkyl group having a fluorinated alkyl group as a substituent, the number of carbon atoms in the fluorinated alkyl group is preferably 1 to 11, more preferably 1 to 8, and even more preferably 1 to 4. The fluorinated alkyl group may contain atoms other than fluorine. Examples of atoms other than fluorine include oxygen atoms, sulfur atoms, nitrogen atoms, and the like.

[0393] The following are some preferred specific examples of the anionic portion of component (d1-1).

[0394] [ka]

[0395] ··Cation section In formula (d1-1), M m+ This is an m-valent organic cation. M m+ Suitable organic cations include those similar to the cations represented by the chemical formulas (ca-b01-11) to (ca-b01-22) and (ca-1-1) to (ca-1-93), respectively. Among these, cations similar to the cation portion in formula (b0-1) and the cation portion in formula (b0-2) are preferred, and cations represented by the chemical formulas (ca-b01-11) to (ca-b01-24) are more preferred. In other words, a combination in which both component (B) and component (D1) have a fluorine atom in the cation portion is particularly preferred, and specifically, a combination of compound (B01) or compound (B02) and component (d1-1) having a fluorine atom in the cation portion is particularly preferred.

[0396] From the viewpoint of improving sensitivity, component (d1-1) preferably includes a compound represented by the following general formula (d0-1) (hereinafter also referred to as "component (D0)").

[0397] [ka] [In the formula, X 0 R is a bromine atom or an iodine atom. m This is a hydroxyl group, an alkyl group, a fluorine atom, or a chlorine atom. nd1 is an integer from 1 to 5, nd2 is an integer from 0 to 4, and 1 ≤ nd1 + nd2 ≤ 5. Yd 0 This is a divalent linking group or a single bond. m+ This represents an m-valent organic cation, where m is an integer greater than or equal to 1.

[0398] {(D0) component anion part} In the above general formula (d0-1), X 0 This atom is either a bromine atom or an iodine atom, and is preferably an iodine atom.

[0399] In the above general formula (d0-1), R m R is a hydroxyl group, an alkyl group, a fluorine atom, or a chlorine atom. m The alkyl group in is preferably an alkyl group having 1 to 5 carbon atoms, and more preferably a methyl group or an ethyl group.

[0400] In the above general formula (d0-1), nd1 is an integer between 1 and 5, nd2 is an integer between 0 and 4, and 1 ≤ nd1 + nd2 ≤ 5. nd1 is preferably an integer between 1 and 3, more preferably 2 or 3, and even more preferably 3, from the viewpoint of radiation absorption. nd2 is preferably an integer between 0 and 3, more preferably 0 or 1, and even more preferably 0.

[0401] In the above general formula (d0-1), Yd 0 Yd is a divalent linking group or a single bond. 0 In this context, a divalent linking group containing an oxygen atom is preferred. Yd 0 If Yd is a divalent linking group containing an oxygen atom, 0It may contain atoms other than oxygen atoms. Examples of atoms other than oxygen atoms include carbon atoms, hydrogen atoms, sulfur atoms, nitrogen atoms, etc. Examples of divalent linking groups containing an oxygen atom include non-hydrocarbon oxygen-containing linking groups such as oxygen atoms (ether bond: -O-), ester bonds (-C(=O)-O-), oxycarbonyl groups (-OC(=O)-), amide bonds (-C(=O)-NH-), carbonyl groups (-C(=O)-), and carbonate bonds (-OC(=O)-O-); combinations of the non-hydrocarbon oxygen-containing linking group with an alkylene group; and combinations of the non-hydrocarbon oxygen-containing linking group with a fluorinated alkylene group. A sulfonyl group (-SO2-) may be further linked to these combinations. Yd 0 Preferably, the linking group is a divalent linking group containing an oxygen atom, and more preferably a single bond.

[0402] The following shows a specific example of the anion portion of component (D0).

[0403] [ka]

[0404] {(D0) component cation} In the above general formula (d0-1), M m+ This is an m-valent organic cation. M m+ Suitable organic cations include those similar to the cations represented by the chemical formulas (ca-b01-11) to (ca-b01-22) and (ca-1-1) to (ca-1-93), respectively. Among these, cations similar to the cation portion in formula (b0-1) and the cation portion in formula (b0-2) are preferred, and cations represented by the chemical formulas (ca-b01-11) to (ca-b01-24) are more preferred.

[0405] As compound (D0), the compound represented by the following formula (d0-1-1) is preferred.

[0406] [ka] [In the formula, X 0 , R m nd1 and nd2 are X in formula (d0-1) above. 0 , R m , the same as nd1 and nd2. R 201 ~R 203 R in the above formula (ca-1) is 201 ~R 203 It is similar to [this].

[0407] Specific examples of the (D0) component are listed below, but are not limited to these.

[0408] [ka]

[0409] (d1-1) Component may be used alone or in combination of two or more types.

[0410] {(d1-2) component} ··Anion Club In formula (d1-2), Rd 2 R' is a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents. 201 Similar examples include the above. However, Rd 2 In this mixture, we assume that the carbon atom adjacent to the S atom is not bonded to a fluorine atom (i.e., not fluorine-substituted). This results in the anions of components (d1-2) becoming appropriately weak acid anions, improving the quenching ability of component (D). Rd 2Preferably, the group is a chain-like alkyl group which may have substituents, or an aliphatic cyclic group which may have substituents. The chain-like alkyl group preferably has 1 to 10 carbon atoms, and more preferably 3 to 10 carbon atoms. The aliphatic cyclic group preferably has one or more hydrogen atoms removed from adamantane, norbornane, isobornane, tricyclodecane, tetracyclododecane, etc. (which may have substituents); more preferably has one or more hydrogen atoms removed from camphor, etc. Rd 2 The hydrocarbon group may have substituents, and such substituents may be Rd of formula (d1-1). 1 Examples include substituents similar to those that may be present on hydrocarbon groups (aromatic hydrocarbon groups, aliphatic cyclic groups, and linear alkyl groups) in the above.

[0411] The following are preferred specific examples of the anionic portion of component (d1-2).

[0412] [ka]

[0413] ··Cation section In formula (d1-2), M m+ is an m-valent organic cation, and M in formula (d1-1) above. m+ It is similar to that. (d1-2) Components may be used individually or in combination of two or more.

[0414] {(d1-3) components} ··Anion Club In formula (d1-3), Rd 3 R' is a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents, and the R' 201 Similar to the above, it is preferable that the group is a cyclic group containing a fluorine atom, a linear alkyl group, or a linear alkenyl group. Among these, a fluorinated alkyl group is preferred, and the above Rd 1A fluorinated alkyl group similar to the one shown is more preferable.

[0415] In formula (d1-3), Rd 4 R' is a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents. 201 Similar examples include the above. In particular, alkyl groups, alkoxy groups, alkenyl groups, and cyclic groups, which may have substituents, are preferred. Rd 4 The alkyl group in is preferably a linear or branched alkyl group having 1 to 5 carbon atoms. Specifically, examples include methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, pentyl group, isopentyl group, neopentyl group, etc. 4 Some of the hydrogen atoms in the alkyl group may be substituted with hydroxyl groups, cyano groups, etc. Rd 4 The alkoxy group in is preferably an alkoxy group having 1 to 5 carbon atoms. Specifically, examples of alkoxy groups having 1 to 5 carbon atoms include the methoxy group, ethoxy group, n-propoxy group, iso-propoxy group, n-butoxy group, and tert-butoxy group. Among these, the methoxy group and ethoxy group are preferred.

[0416] Rd 4 The alkenyl group in R' 201 Examples of alkenyl groups similar to those in the above include vinyl groups, propenyl groups (allyl groups), 1-methylpropenyl groups, and 2-methylpropenyl groups, which are preferred. These groups may further have a C1-C5 alkyl group or a C1-C5 halogenated alkyl group as substituents.

[0417] Rd 4 The cyclic group in is R' 201Examples of cyclic groups similar to those in the above include alicyclic groups obtained by removing one or more hydrogen atoms from cycloalkanes such as cyclopentane, cyclohexane, adamantane, norbornane, isobornane, tricyclodecane, and tetracyclododecane, or aromatic groups such as phenyl groups and naphthyl groups. 4 When Rd is an alicyclic group, the resist composition dissolves well in organic solvents, resulting in good lithography properties. 4 When the group is an aromatic group, the resist composition exhibits excellent light absorption efficiency and good sensitivity and lithographic characteristics in lithography using EUV or the like as the exposure light source.

[0418] In formula (d1-3), Yd 1 It is a single bond or a divalent linking group. Yd 1 The divalent linking group in formula (a2-1) is not particularly limited, but may include divalent hydrocarbon groups (aliphatic hydrocarbon groups, aromatic hydrocarbon groups) which may have substituents, and divalent linking groups containing heteroatoms. 21 Examples include divalent hydrocarbon groups that may have substituents, and divalent linking groups containing heteroatoms, as mentioned in the explanation of divalent linking groups in [reference]. Yd 1 The preferred members are carbonyl groups, ester bonds, amide bonds, alkylene groups, or combinations thereof. The alkylene group is more preferably a linear or branched alkylene group, and even more preferably a methylene group or an ethylene group.

[0419] The following are preferred specific examples of the anionic parts of components (d1-3).

[0420] [ka]

[0421] [ka]

[0422] ··Cation section In formula (d1-3), M m+ is an m-valent organic cation, and M in formula (d1-1) above. m+ It is similar to that. (d1-3) Components may be used individually or in combination of two or more.

[0423] Component (D1) may consist of only one of the above components (d1-1) to (d1-3), or it may consist of a combination of two or more components. Among the above, component (d1-1) is preferred as component (D1). If the resist composition contains component (D1), the content of component (D1) in the resist composition is preferably 0.5 to 20 parts by mass, more preferably 1 to 15 parts by mass, and even more preferably 2 to 8 parts by mass, per 100 parts by mass of component (A1). When the content of component (D1) is above the preferred lower limit, particularly good lithography characteristics and resist pattern shape are easily obtained. On the other hand, when it is below the upper limit, good sensitivity can be maintained and throughput is also excellent.

[0424] If the resist composition contains component (D0), the content of component (D0) in the resist composition is preferably 0.5 to 20 parts by mass, more preferably 1 to 15 parts by mass, and even more preferably 2 to 10 parts by mass, per 100 parts by mass of component (A1). When the content of component (D0) is above the preferred lower limit, particularly good lithography characteristics and resist pattern shape are easily obtained. On the other hand, when it is below the upper limit, good sensitivity can be maintained and throughput is also excellent.

[0425] (D1) Method for producing component: The methods for producing the aforementioned components (d1-1) and (d1-2) are not particularly limited and can be produced by known methods. Furthermore, the method for producing components (d1-3) is not particularly limited and may be, for example, similar to the method described in US2012-0149916.

[0426] • About the (D2) component Component (D) may include nitrogen-containing organic compounds that do not fall under component (D1) above (hereinafter referred to as "component (D2)"). Component (D2) is not particularly limited as long as it acts as an acid diffusion control agent and does not fall under component (D1), and any known component may be used. Among these, aliphatic amines are preferred, and among these, secondary aliphatic amines and tertiary aliphatic amines are more preferred. An aliphatic amine is an amine having one or more aliphatic groups, and it is preferable that the aliphatic groups have 1 to 12 carbon atoms. Examples of aliphatic amines include amines (alkylamines or alkyl alcoholamines) or cyclic amines in which at least one hydrogen atom of ammonia (NH3) is substituted with an alkyl group or hydroxyalkyl group having 12 or fewer carbon atoms. Specific examples of alkylamines and alkyl alcoholamines include monoalkylamines such as n-hexylamine, n-heptylamine, n-octylamine, n-nonylamine, and n-decylamine; dialkylamines such as diethylamine, di-n-propylamine, di-n-heptylamine, di-n-octylamine, and dicyclohexylamine; trialkylamines such as trimethylamine, triethylamine, tri-n-propylamine, tri-n-butylamine, tri-n-pentylamine, tri-n-hexylamine, tri-n-heptylamine, tri-n-octylamine, tri-n-nonylamine, tri-n-decylamine, and tri-n-dodecylamine; and alkyl alcoholamines such as diethanolamine, triethanolamine, diisopropanolamine, triisopropanolamine, di-n-octanolamine, and tri-n-octanolamine. Among these, trialkylamines having 5 to 10 carbon atoms are more preferred, and tri-n-pentylamine or tri-n-octylamine are particularly preferred.

[0427] Examples of cyclic amines include heterocyclic compounds containing a nitrogen atom as a heteroatom. These heterocyclic compounds may be monocyclic (aliphatic monocyclic amines) or polycyclic (aliphatic polycyclic amines). Examples of aliphatic monocyclic amines include piperidine and piperazine. As aliphatic polycyclic amines, those having 6 to 10 carbon atoms are preferred, and specifically include 1,5-diazabicyclo[4.3.0]-5-nonene, 1,8-diazabicyclo[5.4.0]-7-undecene, hexamethylenetetramine, and 1,4-diazabicyclo[2.2.2]octane.

[0428] Other aliphatic amines include tris(2-methoxymethoxyethyl)amine, tris{2-(2-methoxyethoxy)ethyl}amine, tris{2-(2-methoxyethoxymethoxy)ethyl}amine, tris{2-(1-methoxyethoxy)ethyl}amine, tris{2-(1-ethoxyethoxy)ethyl}amine, tris{2-(1-ethoxypropoxy)ethyl}amine, tris[2-{2-(2-hydroxyethoxy)ethoxy}ethyl]amine, triethanolamine triacetate, etc., with triethanolamine triacetate being preferred.

[0429] Furthermore, an aromatic amine may be used as component (D2). Examples of aromatic amines include 4-dimethylaminopyridine, pyrrole, indole, pyrazole, imidazole or their derivatives, trimenzylamine, 2,6-diisopropylaniline, and N-tert-butoxycarbonylpyrrolidine.

[0430] (D2) Component may be used alone or in combination of two or more types. When the resist composition contains component (D2), the content of component (D2) in the resist composition is usually in the range of 0.01 to 5 parts by mass per 100 parts by mass of component (A1). By using this range, the resist pattern shape, settling stability over time, etc., are improved.

[0431] <<At least one compound (E) selected from the group consisting of organic carboxylic acids, phosphorus oxoacids and their derivatives>> The resist composition of this embodiment may contain, as an optional component, at least one compound (E) selected from the group consisting of organic carboxylic acids and phosphorus oxoacids and their derivatives (hereinafter referred to as "component (E)"). Suitable organic carboxylic acids include, for example, acetic acid, malonic acid, citric acid, malic acid, succinic acid, benzoic acid, and salicylic acid. Examples of phosphorus oxoacids include phosphoric acid, phosphonic acid, and phosphinic acid, with phosphonic acid being particularly preferred among these. Examples of derivatives of phosphorus oxoacids include esters obtained by substituting the hydrogen atoms of the above oxoacid with hydrocarbon groups, and examples of hydrocarbon groups include alkyl groups having 1 to 5 carbon atoms and aryl groups having 6 to 15 carbon atoms. Examples of phosphoric acid derivatives include phosphate esters such as di-n-butyl phosphate and diphenyl phosphate. Examples of phosphonic acid derivatives include phosphonic acid esters such as dimethyl phosphonate, di-n-butyl phosphonate, phenylphosphonic acid, diphenyl phosphonate, and dibenzyl phosphonate. Examples of phosphinic acid derivatives include phosphinic acid esters and phenylphosphinic acid. In the resist composition of this embodiment, component (E) may be used alone or in combination of two or more types. When the resist composition contains component (E), the content of component (E) is usually in the range of 0.01 to 5 parts by mass per 100 parts by mass of component (A1).

[0432] ≪Fluorine additive component (F)≫ The resist composition of this embodiment may contain a fluorine additive component (hereinafter referred to as "component (F)") in order to impart water repellency to the resist film or to improve lithography properties. As component (F), for example, fluorine-containing polymer compounds described in Japanese Patent Publication No. 2010-002870, Japanese Patent Publication No. 2010-032994, Japanese Patent Publication No. 2010-277043, Japanese Patent Publication No. 2011-13569, and Japanese Patent Publication No. 2011-128226 can be used. More specifically, component (F) includes polymers having a constituent unit (f1) represented by the following general formula (f1-1). Preferably, this polymer is a polymer (homopolymer) consisting only of the constituent unit (f1) represented by the following formula (f1-1); a copolymer of the constituent unit (f1) and the constituent unit (a1); or a copolymer of the constituent unit (f1) and a constituent unit derived from acrylic acid or methacrylic acid and the constituent unit (a1). Here, the constituent unit (a1) copolymerized with the constituent unit (f1) is preferably a constituent unit derived from 1-ethyl-1-cyclooctyl (meth)acrylate or a constituent unit derived from 1-methyl-1-adamantyl (meth)acrylate.

[0433] [ka] [In the formula, R is the same as above, and Rf 102 and Rf 103 Each of these independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, and Rf 102 and Rf 103 They may be the same or different. 1 Rf is an integer between 0 and 5. 101 It is an organic group containing a fluorine atom.

[0434] In formula (f1-1), R bonded to the α-carbon atom is the same as described above. R is preferably a hydrogen atom or a methyl group. In formula (f1-1), Rf 102 and Rf 103A fluorine atom is preferred as the halogen atom. Rf 102 and Rf 103 Examples of C1-C5 alkyl groups for R include those similar to those for R above, with methyl or ethyl groups being preferred. 102 and Rf 103 Specifically, examples of C1-C5 halogenated alkyl groups include groups in which some or all of the hydrogen atoms of the C1-C5 alkyl group are substituted with halogen atoms. Fluorine atoms are preferred as the halogen atoms, particularly Rf. 102 and Rf 103 Preferably, the element is a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 5 carbon atoms, and more preferably a hydrogen atom, a fluorine atom, a methyl group, or an ethyl group. In formula (f1-1), nf 1 is an integer between 0 and 5, preferably between 0 and 3, and more preferably 1 or 2.

[0435] In formula (f1-1), Rf 101 This is an organic group containing a fluorine atom, and preferably a hydrocarbon group containing a fluorine atom. The hydrocarbon group containing a fluorine atom may be linear, branched, or cyclic, and preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and particularly preferably 1 to 10 carbon atoms. Furthermore, in hydrocarbon groups containing fluorine atoms, it is preferable that 25% or more of the hydrogen atoms in the hydrocarbon group are fluorinated, more preferably 50% or more are fluorinated, and particularly preferable that 60% or more are fluorinated, as this increases the hydrophobicity of the resist film during immersion exposure. Among them, Rf 101 More preferably, a fluorinated hydrocarbon group having 1 to 6 carbon atoms is preferred, and trifluoromethyl, -CH2-CF3, -CH2-CF2-CF3, -CH(CF3)2, -CH2-CH2-CF3, and -CH2-CH2-CF2-CF2-CF2-CF3 are particularly preferred.

[0436] The weight-average molecular weight (Mw) of component (F) (based on polystyrene conversion by gel permeation chromatography) is preferably 1,000 to 50,000, more preferably 5,000 to 40,000, and most preferably 10,000 to 30,000. If it is below the upper limit of this range, it has sufficient solubility in resist solvents for use as a resist, and if it is above the lower limit of this range, the water repellency of the resist film is good. The degree of dispersion of component (F) (Mw / Mn) is preferably 1.0 to 5.0, more preferably 1.0 to 3.0, and most preferably 1.0 to 2.5.

[0437] In the resist composition of this embodiment, component (F) may be used alone or in combination of two or more types. When the resist composition contains component (F), the amount of component (F) is usually 0.5 to 10 parts by mass per 100 parts by mass of component (A1).

[0438] ≪Organic solvent component (S)≫ The resist composition of this embodiment can be manufactured by dissolving the resist material in an organic solvent component (hereinafter referred to as "component (S)"). The (S) component can be any solvent that can dissolve each component used to form a homogeneous solution, and any solvent that is conventionally known as a solvent for chemically amplified resist compositions can be appropriately selected and used. (S) components include, for example, lactones such as γ-butyrolactone; ketones such as acetone, methyl ethyl ketone, cyclohexanone, methyl-n-pentyl ketone, methyl isopentyl ketone, and 2-heptanone; polyhydric alcohols such as ethylene glycol, diethylene glycol, propylene glycol, and dipropylene glycol; compounds having ester bonds such as ethylene glycol monoacetate, diethylene glycol monoacetate, propylene glycol monoacetate, or dipropylene glycol monoacetate; monoalkyl ethers such as monomethyl ether, monoethyl ether, monopropyl ether, monobutyl ether, or monophenyl ether of the aforementioned polyhydric alcohols or compounds having ester bonds; etc. Examples include derivatives of polyhydric alcohols [of which propylene glycol monomethyl ether acetate (PGMEA) and propylene glycol monomethyl ether (PGME) are preferred]; cyclic ethers such as dioxane, and esters such as methyl lactate, ethyl lactate (EL), methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, ethyl pyruvate, methyl methoxypropionate, and ethyl ethoxypropionate; aromatic organic solvents such as anisole, ethyl benzyl ether, cresyl methyl ether, diphenyl ether, dibenzyl ether, phenethole, butylphenyl ether, ethylbenzene, diethylbenzene, pentylbenzene, isopropylbenzene, toluene, xylene, cymene, and mesitylene, and dimethyl sulfoxide (DMSO). In the resist composition of this embodiment, component (S) may be used alone or as a mixture of two or more solvents. Among these, PGMEA, PGME, γ-butyrolactone, EL, and cyclohexanone are preferred.

[0439] Furthermore, a mixed solvent obtained by mixing PGMEA and a polar solvent is also preferred as component (S). The mixing ratio (mass ratio) can be appropriately determined considering the compatibility of PGMEA and the polar solvent, but it is preferably in the range of 1:9 to 9:1, and more preferably in the range of 2:8 to 8:2. More specifically, when EL or cyclohexanone is used as the polar solvent, the mass ratio of PGMEA to EL or cyclohexanone is preferably 1:9 to 9:1, more preferably 2:8 to 8:2. When PGME is used as the polar solvent, the mass ratio of PGMEA to PGME is preferably 1:9 to 9:1, more preferably 2:8 to 8:2, and even more preferably 3:7 to 7:3. Furthermore, a mixed solvent of PGMEA, PGME, and cyclohexanone is also preferred. Furthermore, as the (S) component, a mixed solvent of at least one selected from PGMEA and EL and γ-butyrolactone is also preferred. In this case, the mass ratio of the former to the latter is preferably 70:30 to 95:5. The amount of component (S) used is not particularly limited and is set appropriately according to the coating thickness, at a concentration that can be applied to a substrate or the like. Generally, component (S) is used so that the solid content concentration of the resist composition is in the range of 0.1 to 20% by mass, preferably 0.2 to 15% by mass.

[0440] The resist composition of this embodiment may further contain, if desired, miscible additives such as additional resins to improve the performance of the resist film, dissolution inhibitors, plasticizers, stabilizers, colorants, anti-halation agents, dyes, etc.

[0441] The resist composition of this embodiment may be subjected to removal of impurities after dissolving the resist material in component (S), using a polyimide porous membrane, a polyamide-imide porous membrane, or the like. For example, the resist composition may be filtered using a filter made of a polyimide porous membrane, a filter made of a polyamide-imide porous membrane, or a filter made of a polyimide porous membrane and a polyamide-imide porous membrane. Examples of the polyimide porous membrane and the polyamide-imide porous membrane include those described in Japanese Patent Application Publication No. 2016-155121.

[0442] The resist composition of this embodiment described above contains a resin component (A1) having the above-mentioned structural unit (a01), and a compound (B01) or compound (B02). Since the constituent unit (a01) has both an acid-dissociable group and a phenolic hydroxyl group, the content of phenolic hydroxyl groups in the resin component (A1) can be increased without reducing the content of acid-dissociable groups. Therefore, sensitivity can be improved without reducing resolution. In addition, the increase in phenolic hydroxyl groups in the resin component (A1) improves affinity with the developer, thereby improving fine resolution. In addition, since the cation portions of compounds (B01) and (B02) are cations having a fluorine atom or a fluorinated alkyl group, the reactivity of the cation portion decomposing upon exposure is enhanced, and the sensitivity is increased by improving the acid generation efficiency. Furthermore, the interaction between the phenolic hydroxyl group in the constituent unit (a01) and the fluorine atoms in the cation portions of compounds (B01) and (B02) increases the uniformity of the distribution of the acid generator component in the resist film, thereby improving the reduction of roughness. According to the resist composition of this embodiment, sensitivity, resolution, and roughness reduction can all be improved through the synergistic effect of the resin component (A1) having the constituent unit (a01) and compound (B01) or compound (B02).

[0443] (Method for forming resist patterns) A resist pattern formation method according to a second aspect of the present invention is a method comprising the steps of forming a resist film on a support using the resist composition according to the first aspect of the present invention described above, exposing the resist film, and developing the exposed resist film to form a resist pattern. One embodiment of such a resist pattern formation method is, for example, a resist pattern formation method carried out as follows.

[0444] First, the resist composition of the above-described embodiment is applied onto a support using a spinner or the like, and a bake (post-application bake (PAB)) treatment is performed for 40 to 120 seconds, preferably 60 to 90 seconds, at a temperature of, for example, 80 to 150°C, to form a resist film. Next, the resist film is subjected to selective exposure using an exposure apparatus such as an electron beam lithography apparatus or an EUV exposure apparatus, either through exposure via a mask (mask pattern) on which a predetermined pattern has been formed, or by direct irradiation with an electron beam without going through a mask pattern. After this, a bake (post-exposure bake (PEB)) treatment is performed for 40 to 120 seconds, preferably 60 to 90 seconds, at a temperature of, for example, 80 to 150°C. Next, the resist film is subjected to a developing process. In the case of an alkaline developing process, an alkaline developer is used, and in the case of a solvent developing process, a developer containing an organic solvent (organic developer) is used.

[0445] After the developing process, a rinsing process is preferably performed. In the case of an alkaline developing process, a water rinse using pure water is preferred, and in the case of a solvent developing process, a rinsing solution containing an organic solvent is preferred. In the case of a solvent development process, after the development or rinsing process, a process may be performed to remove the developer or rinse solution adhering to the pattern using a supercritical fluid. After development or rinsing, the film is dried. In some cases, a bake (post-bake) process may be performed after the development process. In this way, a resist pattern can be formed.

[0446] The support material is not particularly limited and can be any conventionally known material, such as a substrate for electronic components or a substrate on which a predetermined wiring pattern has been formed. More specifically, examples include silicon wafers, metal substrates such as copper, chromium, iron, and aluminum, and glass substrates. As for the wiring pattern material, for example, copper, aluminum, nickel, and gold can be used. Furthermore, the support may be a substrate as described above on which an inorganic and / or organic film is provided. An example of an inorganic film is an inorganic anti-reflective film (inorganic BARC). An example of an organic film is an organic anti-reflective film (organic BARC) or an organic film such as the underlayer organic film in the multilayer resist method. Here, the multilayer resist method is a method in which at least one organic film (lower organic film) and at least one resist film (upper resist film) are placed on a substrate, and the resist pattern formed on the upper resist film is used as a mask to pattern the lower organic film, and it is said that a high aspect ratio pattern can be formed. In other words, with the multilayer resist method, the required thickness can be secured by the lower organic film, so the resist film can be made thinner, and a fine pattern with a high aspect ratio can be formed. Multilayer resist methods can be broadly divided into two types: a two-layer resist method consisting of an upper resist film and a lower organic film, and a three-layer resist method consisting of three or more layers, with one or more intermediate layers (such as a thin metal film) placed between the upper resist film and the lower organic film.

[0447] The wavelength used for exposure is not particularly limited, and the process can be carried out using radiation such as ArF excimer lasers, KrF excimer lasers, F2 excimer lasers, EUV (extreme ultraviolet), VUV (vacuum ultraviolet), EB (electron beam), X-rays, and soft X-rays. The resist composition is highly useful for KrF excimer lasers, ArF excimer lasers, EB, or EUV, even more useful for ArF excimer lasers, EB, or EUV, and particularly useful for EB or EUV. In other words, the resist pattern formation method of this embodiment is particularly useful when the step of exposing the resist film includes an operation of exposing the resist film with EUV (extreme ultraviolet) or EB (electron beam).

[0448] The method for exposing the resist film may be conventional exposure (dry exposure) performed in an inert gas such as air or nitrogen, or it may be liquid immersion lithography. Immersion lithography is an exposure method in which the space between the resist film and the lens at the lowest position of the exposure apparatus is first filled with a solvent (immersion medium) that has a refractive index greater than that of air, and then exposure (immersion exposure) is performed in that state. As the immersion medium, a solvent having a refractive index greater than that of air and less than that of the resist film being exposed is preferred. The refractive index of such a solvent is not particularly limited as long as it is within the aforementioned range. Examples of solvents having a refractive index greater than that of air and less than that of the resist film include water, fluorine-based inert liquids, silicon-based solvents, and hydrocarbon-based solvents. Specific examples of fluorinated inert liquids include liquids mainly composed of fluorinated compounds such as C3HCl2F5, C4F9OCH3, C4F9OC2H5, and C5H3F7, with a boiling point of 70 to 180°C being preferred, and more preferably 80 to 160°C. Having a boiling point within the above range of the fluorinated inert liquid is preferable because it allows for the easy removal of the immersion medium after exposure. As fluorinated inert liquids, perfluoroalkyl compounds in which all hydrogen atoms of the alkyl group are replaced with fluorine atoms are particularly preferred. Specific examples of perfluoroalkyl compounds include perfluoroalkyl ether compounds and perfluoroalkylamine compounds. More specifically, perfluoroalkyl ether compounds include perfluoro(2-butyl-tetrahydrofuran) (boiling point 102°C), and perfluoroalkylamine compounds include perfluorotributylamine (boiling point 174°C). Water is preferred as the immersion medium from the viewpoints of cost, safety, environmental issues, and versatility.

[0449] Examples of alkaline developers used in the alkaline development process include 0.1 to 10% by mass of tetramethylammonium hydroxide (TMAH) aqueous solution. The organic solvent contained in the organic developer solution used in the solvent development process can be any solvent capable of dissolving component (A) (component (A) before exposure), and can be appropriately selected from known organic solvents. Specifically, examples include polar solvents such as ketone solvents, ester solvents, alcohol solvents, nitrile solvents, amide solvents, and ether solvents, as well as hydrocarbon solvents. Ketone solvents are organic solvents that contain CC(=O)-C in their structure. Ester solvents are organic solvents that contain CC(=O)-OC in their structure. Alcohol solvents are organic solvents that contain an alcoholic hydroxyl group in their structure. An "alcoholic hydroxyl group" refers to a hydroxyl group bonded to a carbon atom of an aliphatic hydrocarbon group. Nitrile solvents are organic solvents that contain a nitrile group in their structure. Amide solvents are organic solvents that contain an amide group in their structure. Ether solvents are organic solvents that contain COC in their structure. Some organic solvents contain multiple functional groups in their structure that characterize each of the above-mentioned solvents. In such cases, the organic solvent shall be considered to belong to any of the solvent categories that contain the functional groups it possesses. For example, diethylene glycol monomethyl ether shall belong to either the alcohol-based solvent or the ether-based solvent category in the above classification. Hydrocarbon solvents consist of hydrocarbons that may be halogenated and do not have substituents other than halogen atoms. Fluorine atoms are preferred as the halogen atom. Among the above, polar solvents are preferred as organic solvents contained in organic developers, and ketone solvents, ester solvents, nitrile solvents, etc., are preferred.

[0450] Examples of ketone solvents include 1-octanone, 2-octanone, 1-nonanone, 2-nonanone, acetone, 4-heptanone, 1-hexanone, 2-hexanone, diisobutyl ketone, cyclohexanone, methylcyclohexanone, phenylacetone, methyl ethyl ketone, methyl isobutyl ketone, acetylacetone, acetonylacetone, ionone, diacetonyl alcohol, acetylcarbinol, acetophenone, methyl naphthyl ketone, isophorone, propylene carbonate, γ-butyrolactone, and methyl amyl ketone (2-heptanone). Among these, methyl amyl ketone (2-heptanone) is preferred as the ketone solvent.

[0451] Examples of ester solvents include methyl acetate, butyl acetate, ethyl acetate, isopropyl acetate, amyl acetate, isoamyl acetate, ethyl methoxyethyl acetate, ethyl ethoxyethyl acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monobutyl ether acetate, ethylene glycol monophenyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monopropyl ether acetate, diethylene glycol monophenyl ether acetate, diethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, 2-methoxybutyl acetate, 3-methoxybutyl acetate, 4-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, 3-ethyl-3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, 2-ethoxybutyl 4-Ethoxybutyl acetate, 4-Propoxybutyl acetate, 2-Methoxypentyl acetate, 3-Methoxypentyl acetate, 4-Methoxypentyl acetate, 2-Methyl-3-Methoxypentyl acetate, 3-Methyl-3-Methoxypentyl acetate, 3-Methyl-4-Methoxypentyl acetate, 4-Methyl-4-Methoxypentyl acetate, Propylene glycol diacetate, Methyl formate, Ethyl formate, Butyl formate, Propyl formate, Ethyl lactate, Butyl lactate, Propyl lactate Examples include butyl acetate, ethyl carbonate, propyl carbonate, butyl carbonate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, butyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl propionate, ethyl propionate, propyl propionate, isopropyl propionate, methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, methyl-3-methoxypropionate, ethyl-3-methoxypropionate, ethyl-3-ethoxypropionate, propyl-3-methoxypropionate, etc. Among these, butyl acetate is preferred as the ester solvent.

[0452] Examples of nitrile solvents include acetonitrile, propionitrile, valeronitrile, and butyronitrile.

[0453] Organic developers may contain known additives as needed. Examples of such additives include surfactants. While not particularly limited, surfactants such as ionic or nonionic fluorine-based and / or silicone-based surfactants can be used. Nonionic surfactants are preferred, with nonionic fluorine-based surfactants or nonionic silicone-based surfactants being more preferred. When a surfactant is added, the amount added is usually 0.001 to 5% by mass, preferably 0.005 to 2% by mass, and more preferably 0.01 to 0.5% by mass, relative to the total amount of the organic developer.

[0454] The development process can be carried out by known development methods, such as immersing the support in a developer solution for a certain period of time (dip method), piling the developer solution onto the surface of the support using surface tension and leaving it still for a certain period of time (paddle method), spraying the developer solution onto the surface of the support (spray method), or continuously dispensing the developer solution onto a support rotating at a constant speed while scanning the developer dispensing nozzle at a constant speed (dynamic dispensing method).

[0455] As for the organic solvent contained in the rinsing solution used for rinsing after development in the solvent development process, for example, organic solvents that do not easily dissolve the resist pattern can be appropriately selected and used from among the organic solvents listed as organic solvents used in the organic developer solution. Typically, at least one solvent selected from hydrocarbon solvents, ketone solvents, ester solvents, alcohol solvents, amide solvents, and ether solvents is used. Among these, at least one selected from hydrocarbon solvents, ketone solvents, ester solvents, alcohol solvents, and amide solvents is preferred, at least one selected from alcohol solvents and ester solvents is more preferred, and alcohol solvents are particularly preferred. The alcohol-based solvent used in the rinsing solution is preferably a monohydric alcohol having 6 to 8 carbon atoms, and this monohydric alcohol may be linear, branched, or cyclic. Specifically, examples include 1-hexanol, 1-heptanol, 1-octanol, 2-hexanol, 2-heptanol, 2-octanol, 3-hexanol, 3-heptanol, 3-octanol, 4-octanol, and benzyl alcohol. Among these, 1-hexanol, 2-heptanol, and 2-hexanol are preferred, and 1-hexanol and 2-hexanol are more preferred. These organic solvents may be used individually or in combination of two or more. They may also be mixed with other organic solvents or water. However, considering the developing characteristics, the amount of water in the rinse solution is preferably 30% by mass or less, more preferably 10% by mass or less, even more preferably 5% by mass or less, and particularly preferably 3% by mass or less, relative to the total volume of the rinse solution. The rinse solution may contain known additives as needed. Examples of such additives include surfactants. Examples of surfactants are the same as those described above, with nonionic surfactants being preferred, and nonionic fluorine-based surfactants or nonionic silicone-based surfactants being more preferred. When a surfactant is added, the amount added is usually 0.001 to 5% by mass, preferably 0.005 to 2% by mass, and more preferably 0.01 to 0.5% by mass, relative to the total volume of the rinse solution.

[0456] Rinsing (cleaning) using a rinsing solution can be carried out by known rinsing methods. Examples of such rinsing methods include continuously applying the rinsing solution onto a support rotating at a constant speed (rotary coating method), immersing the support in the rinsing solution for a certain period of time (dip method), and spraying the rinsing solution onto the surface of the support (spray method).

[0457] According to the resist pattern formation method of this embodiment described above, since the resist composition of the above-described embodiment is used, it is possible to form a resist pattern that is good in terms of sensitivity, resolution, and roughness reduction. [Examples]

[0458] The present invention will be described in more detail below with reference to examples, but the present invention is not limited to these examples.

[0459] <Synthesis Example 1> [Example of synthesis of polymer compound (A1-1)] 5.9 g of monomer (a01-1m-01), 2.2 g of monomer (a10-1-1pre), and 0.5 g of azobis(isobutyrate)dimethyl (V-601) as a polymerization initiator were dissolved in 30 g of MEK (methyl ethyl ketone) and stirred at 70°C for 5 hours under a nitrogen atmosphere. The reaction mixture was then cooled to room temperature. Next, 2.0 g of acetic acid and 60 g of methanol were added to the obtained polymerization solution, and a deprotection reaction was carried out at 30°C for 8 hours. After the reaction was complete, the obtained reaction solution was precipitated in 1200 g of a mixed solvent of methanol and water and washed. The resulting white solid was filtered and dried under reduced pressure overnight to obtain the target polymer compound (A1-1).

[0460] [ka]

[0461] For the obtained polymer compound (A1-1), the weight-average molecular weight (Mw) on a standard polystyrene basis, determined by GPC measurement, was 6500, and the molecular weight dispersion (Mw / Mn) was 1.57. 13 The copolymerization ratio (the proportion (molar ratio) of constituent units derived from each monomer) determined by 13C-NMR was l / m = 70 / 30.

[0462] <Examples of polymer compound synthesis 2-20> Using the same method as in Polymer Synthesis Example 1, polymer compounds (A1-2) to (A1-18), (A2-1), and (A2-2) were synthesized in the composition ratios shown in Table 1, using the compounds (a01-1m-02) to (a01-1m-12) shown below, and the compounds represented by the following formulas (a10-1-1pre), (a10-1-2pre), (a2-1m), (a3-1m), (a8-1m), and (a1-1m) to (a1-3m). Regarding the obtained polymer compound, 13 Table 1 shows the copolymerization composition ratio (molar ratio of constituent units derived from each monomer) of the polymer compound determined by 13C-NMR, as well as the weight-average molecular weight (Mw) and molecular weight dispersion (Mw / Mn) in terms of standard polystyrene, determined by GPC measurement.

[0463] [ka]

[0464] [ka]

[0465] [ka]

[0466] [ka]

[0467] [ka]

[0468] [ka]

[0469] [ka]

[0470] Furthermore, the constituent units represented by the following chemical formulas (a10-1-1) and (a10-1-2) that constitute the above copolymer are constituent units derived from the monomer represented by the above chemical formula (a10-1-1pre) and (a10-1-2pre).

[0471] [ka]

[0472] [Table 1]

[0473] <Preparation of the resist composition> (Examples 1-32, Comparative Examples 1-5) Each of the components shown in Tables 2-6 was mixed and dissolved to prepare the resist compositions for each example.

[0474] [Table 2]

[0475] [Table 3]

[0476] [Table 4]

[0477] [Table 5]

[0478] [Table 6]

[0479] In Tables 2-6, each abbreviation has the following meaning. The numbers in brackets [ ] represent the amount (parts by mass) of the ingredients. (A1)-1 to (A1)-18: The above polymer compounds (A1-1) to (A1-18). (A2)-1, (A2)-2: the above-mentioned polymer compounds (A2-1), (A2-2).

[0480] (B01)-1 to (B01)-10: Acid generators consisting of compounds represented by the following chemical formulas (B01-1) to (B01-10). (B02)-1: An acid generator consisting of a compound represented by the following chemical formula (B02-1). (B2)-1~(B2)-3: Acid generators consisting of compounds represented by the following chemical formulas (B2-1)~(B2-3), respectively.

[0481] [ka]

[0482] [ka]

[0483] [ka]

[0484] [ka]

[0485] [ka]

[0486] (D)-1 to (D)-4: Acid diffusion control agents consisting of compounds represented by the following chemical formulas (D-1) to (D-4). (S)-1: A mixed solvent of propylene glycol monomethyl ether acetate / propylene glycol monomethyl ether = 60 / 40 (mass ratio).

[0487] [ka]

[0488] [ka]

[0489] <Resist pattern formation> Each example of the resist composition was applied to an 8-inch silicon substrate treated with hexamethyldisilazane (HMDS) using a spinner, and a 50 nm thick resist film was formed by pre-baking (PAB) on a hot plate at 110°C for 60 seconds and drying. Next, the resist film was subjected to lithography (exposure) using an electron beam lithography system JEOL-JBX-9300FS (manufactured by JEOL Ltd.) at an acceleration voltage of 100kV, with a target size of a 1:1 line-and-space pattern (hereinafter referred to as "LS pattern") with a line width of 50nm. Subsequently, a post-exposure heating (PEB) treatment was performed at 90°C for 60 seconds. Next, alkaline development was performed at 23°C for 60 seconds using a 2.38% by mass aqueous solution of tetramethylammonium hydroxide (TMAH) "NMD-3" (product name, manufactured by Tokyo Ohka Kogyo Co., Ltd.). Afterward, a 15-second rinse was performed using pure water. As a result, a 1:1 LS pattern with a line width of 50 nm was formed.

[0490] [Evaluation of optimal exposure (Eop)] The optimal exposure amount Eop(μC / cm²) for forming the target-sized LS pattern through the above <resist pattern formation> method is to form the resist pattern. 2 We calculated this as "Eop(μC / cm²)". 2 )" is shown in Tables 7-11.

[0491] [Evaluation of limiting resolution] The critical resolution in the above Eop, specifically the minimum size of the pattern that resolves without collapsing when gradually increasing the exposure from the optimal exposure Eop to form the LS pattern, was determined using a scanning electron microscope S-9380 (Hitachi High-Technologies Corporation). This is shown as "critical resolution (nm)" in Tables 7-11.

[0492] [LWR (Line Wise Roughness) Evaluation] For the LS patterns formed in the above <Formation of Resist Pattern>, 3σ, a measure of LWR, was determined. This is shown as "LWR(nm)" in Tables 7-11. "3σ" represents three times the standard deviation (σ) (unit: nm) obtained from measurements of 400 line positions along the longitudinal direction of the line using a scanning electron microscope (acceleration voltage 800V, product name: S-9380, manufactured by Hitachi High-Technologies Corporation). A smaller value of 3σ indicates less roughness on the line sidewalls, resulting in a more uniformly wide LS pattern.

[0493] [Table 7]

[0494] [Table 8]

[0495] [Table 9]

[0496] [Table 10]

[0497] [Table 11]

[0498] As shown in Tables 7-11, it was confirmed that the resist compositions of the examples were able to form resist patterns with better sensitivity, resolution, and roughness reduction compared to the resist compositions of the comparative examples.

[0499] Specifically, as shown in Tables 7 and 8, when using the same acid generator (compound (B01-1)), it was confirmed that the resist compositions of Examples 1 to 19 containing a resin component (A1) having a constituent unit (a01) could form resist patterns with better sensitivity, resolution, and roughness reduction than the resist compositions of Comparative Examples 1 and 2 containing a resin component without a constituent unit (a01). Furthermore, a comparison between the resist composition of Example 2 and the resist composition of Example 18, and a comparison between the resist composition of Example 5 and the resist composition of Example 19, confirmed that the resist compositions of Example 18 and Example 19, which have fluorine atoms in the cation portion of the acid diffusion control agent in addition to the acid generator component (B), can form resist patterns with better sensitivity and roughness reduction.

[0500] Furthermore, as shown in Tables 9 and 10, when using the same resin component (polymer compound (A1-2)), it was confirmed that the resist compositions of Examples 2, 20-27 containing compound (B01) or compound (B02) could form resist patterns with better sensitivity and roughness reduction than the resist compositions of Comparative Examples 3-5 containing acid generator component (B) that does not have a fluorine atom in the cation portion.

Claims

1. A resist composition that generates acid upon exposure and whose solubility in a developer changes due to the action of the acid, A resin component (A1) whose solubility in the developer changes due to the action of acid, It contains an acid-generating agent component (B) that generates acid upon exposure, The resin component (A1) has a constituent unit (a01) derived from a compound represented by the following general formula (a0-1-1), The acid generator component (B) is a resist composition comprising a compound (B01) represented by the following general formula (b0-1). 【Chemistry 1】 [In the formula, R is a hydrogen atom, a C1-C5 alkyl group, or a C1-C5 halogenated alkyl group. Ya 001 is a single bond or a divalent linking group. Rax 01 is an acid-dissociable group represented by the following general formula (a0-r-2). q is an integer from 0 to 3. n is an integer of 1 or more, where n ≤ q × 2 + 4.] 【Chemistry 2】 [In formula (a0-r-2), Ra 04 to Ra 06 are each independently hydrocarbon groups, and Ra 05 and Ra 06 are bonded to each other to form a ring. * indicates a bond.] 【Transformation 3】 [In formula (b0-1), R b1 R is an aryl group having a fluorine atom or an aryl group having a fluorinated alkyl group. b2 and R b3 Each of these is independently an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. b1 ~R b3 Two of these may bond to each other to form a ring with the sulfur atom in the formula. 01 - This is the pair anion represented by the following general formula (b0 - an0). 【Chemistry 4】 [wherein, X 0 is an iodine atom. R m is a hydroxy group, an alkyl group, a fluorine atom, or a chlorine atom. nb1 is an integer between 1 and 5, nb2 is an integer between 0 and 4, and 1 ≤ nb1 + nb2 ≤ 5. 01 and L 02 These are, independently, a single bond, an alkylene group, -O-, -CO-, -OCO-, -COO-, and -SO-, respectively. 2 -, -N(R a )-C(=O)-,-N(R a )-,-C(R a ) (Caution a )-N(R a )-, or -C(R a ) (N(R a ) (Caution a )) - is. R a Each of these is independently either a hydrogen atom or an alkyl group. z is an integer between 0 and 10. Vb 0 R is a single bond, an alkylene group, or a fluorinated alkylene group. 0 This is a hydrogen atom, a fluorinated alkyl group having 1 to 5 carbon atoms, or a fluorine atom.

2. The resist composition according to claim 1, wherein the compound (B01) is a compound represented by the following general formula (b0-1-1). 【Transformation 5】 [In the formula, R b2 and R b3 Each of these is independently an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. b2 and R b3 These atoms may be bonded to each other, forming a ring with the sulfur atom in the formula. 011 R is a fluorine atom or a fluorinated alkyl group. 011 is a substituent. nb is an integer greater than or equal to 1. pb is an integer greater than or equal to 0. qb is an integer between 0 and 3, where nb + pb ≤ qb × 2 + 5. X 01 - This is the pair anion represented by the following general formula (b0 - an0). 【Transformation 6】 [In the formula, X 0 This is an iodine atom. m This is a hydroxyl group, an alkyl group, a fluorine atom, or a chlorine atom. nb1 is an integer between 1 and 5, nb2 is an integer between 0 and 4, and 1 ≤ nb1 + nb2 ≤ 5. 01 and L 02 These are, independently, a single bond, an alkylene group, -O-, -CO-, -OCO-, -COO-, and -SO-, respectively. 2 -, -N(R a )-C(=O)-,-N(R a )-,-C(R a ) (Caution a )-N(R a )-, or -C(R a ) (N(R a ) (Caution a )) - is. R a Each of these is independently either a hydrogen atom or an alkyl group. z is an integer between 0 and 10. Vb 0 R is a single bond, an alkylene group, or a fluorinated alkylene group. 0 This is a hydrogen atom, a fluorinated alkyl group having 1 to 5 carbon atoms, or a fluorine atom.

3. The resist composition according to claim 1 or 2, wherein the proportion of the constituent unit (a01) in the resin component (A1) is 50 mol% or more with respect to the total amount (100 mol%) of all constituent units that make up the resin component (A1).

4. The resist composition according to any one of claims 1 to 3, wherein the content of the compound (B01) is 5 to 40 parts by mass per 100 parts by mass of the resin component (A1).

5. A method for forming a resist pattern, comprising the steps of: forming a resist film on a support using a resist composition according to any one of claims 1 to 4; exposing the resist film; and developing the exposed resist film to form a resist pattern.

6. The resist pattern forming method according to claim 5, wherein in the step of exposing the resist film, the resist film is exposed to EUV (extreme ultraviolet) or EB (electron beam).

Citation Information

Patent Citations

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