Manufacturing method for force sensors
The method of fusing electromagnetic wave-transmitting and reflecting substrates with spacer members and metal layers addresses the instability of polyimide tape fixation, ensuring a secure and consistent gap distance for force measurement.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2022-02-24
- Publication Date
- 2026-04-08
AI Technical Summary
Existing methods for manufacturing force sensors using polyimide tape fixation are insufficient, leading to variable distances between substrates under different load conditions.
A method involving the use of electromagnetic wave-transmitting and reflecting substrates with spacer members and metal layers, fused together to maintain a constant distance between substrates, using electromagnetic waves to measure external forces.
Ensures a secure and constant positional relationship between substrates, enhancing fixation and maintaining consistent gap distances regardless of load fluctuations.
Smart Images

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Abstract
Description
Technical Field
[0001] The present disclosure relates to a method for manufacturing a force sensor.
Background Art
[0002] Patent Document 1 discloses a method for manufacturing a displacement sensor having an air gap structure in which the gap between a metal array and a metal thin film can be changed by an external force. This manufacturing method includes a step of forming a metal array on a first substrate, a step of forming a metal thin film and a spacer member on a second substrate, and a step of overlapping the first substrate and the second substrate and fixing the first substrate and the second substrate with a polyimide tape.
Prior Art Documents
Patent Documents
[0003]
Patent Document 1
Summary of the Invention
Problems to be Solved by the Invention
[0004] By the way, it is assumed that loads are applied to the force sensor from a plurality of directions. Fixing with a polyimide tape as in the manufacturing method described in Patent Document 1 is a simple method used for prototyping, and there is a risk that the fixing becomes insufficient. For this reason, the distance between the first substrate and the second substrate in the initial state (when no load is applied) may change depending on the use. The present disclosure provides a method for manufacturing a force sensor that can maintain the positional relationship between the first substrate and the second substrate so that the distance between the first substrate and the second substrate when no load is applied is constant.
Means for Solving the Problems
[0005] The method for manufacturing a force sensor according to one aspect of the present disclosure includes the following steps (1) to (5). (1) A step of preparing a first substrate having a metal array on its surface that is made of a material that transmits electromagnetic waves and arranged in a periodic pattern, and a second substrate having a metal layer on its surface that reflects electromagnetic waves. (2) A step of forming a spacer member around the metal array on the surface of the first substrate. (3) A step of forming a first metal layer thinner than the spacer member around the spacer member on the surface of the first substrate. (4) A step of forming a second metal layer thinner than the spacer member in the region of the second substrate that corresponds to the first metal layer. (5) A step of fusing the first metal layer and the second metal layer together, and fixing the first substrate and the second substrate together with the spacer member formed on the surface of the first substrate abutting against the surface of the second substrate.
[0006] In this force sensor manufacturing method, the first metal layer of the first substrate and the second metal layer of the second substrate are fused together, and the first and second substrates are fixed together with the spacer member of the first substrate abutting against the surface of the second substrate. The fusion of the first and second metal layers provides a more secure fixation between the first and second substrates than fixing with polyimide tape. Furthermore, because the spacer member of the first substrate abuts against the surface of the second substrate, the distance between the first and second substrates is kept constant even if the thickness of the first and second metal layers fluctuates due to the fusion. Therefore, this force sensor manufacturing method can maintain the positional relationship between the first and second substrates so that the distance between them remains constant when no load is applied.
[0007] A method for manufacturing a force sensor relating to other aspects of this disclosure comprises the following steps (1) to (5). (1) A step of preparing a first substrate having a metal array on its surface that is made of a material that transmits electromagnetic waves and arranged in a periodic pattern, and a second substrate having a metal layer on its surface that reflects electromagnetic waves. (2) A step of forming a spacer member around the metal layer on the surface of the second substrate. (3) A step of forming a first metal layer thinner than the spacer member around the spacer member on the surface of the second substrate. (4) A step of forming a second metal layer thinner than the spacer member in the region of the first substrate corresponding to the first metal layer. (5) A step of fusing the first metal layer and the second metal layer and fixing the spacer member formed on the surface of the second substrate in a state where it abuts against the surface of the first substrate.
[0008] In this force sensor manufacturing method, the first metal layer of the first substrate and the second metal layer of the second substrate are fused together, and the first and second substrates are fixed together with the spacer member of the second substrate abutting against the surface of the first substrate. The fusion of the first and second metal layers provides a more secure fixation between the first and second substrates than fixing with polyimide tape. Furthermore, because the spacer member of the second substrate abuts against the surface of the first substrate, the distance between the first and second substrates is kept constant even if the thickness of the first and second metal layers fluctuates due to the fusion. Therefore, this force sensor manufacturing method can maintain the positional relationship between the first and second substrates so that the distance between them remains constant when no load is applied.
[0009] A method for manufacturing a force sensor relating to yet other aspects of this disclosure comprises the following steps (1) to (5). (1) A step of preparing a first substrate having a metal array on its surface that is made of a material that transmits electromagnetic waves and arranged in a periodic pattern, and a second substrate having a metal layer on its surface that reflects electromagnetic waves. (2) A step of forming a first spacer member around the metal array on the surface of the first substrate. (3) A step of forming a first metal layer around the first spacer member on the surface of the first substrate. (4) A step of forming a second spacer member on the surface of the second substrate in a region that is around the metal layer and corresponding to the first spacer member. (5) A step of forming a second metal layer on the surface of the second substrate in a region that is around the second spacer member and corresponds to the first metal layer. (6) A step of fusing the first metal layer and the second metal layer together, fixing the first substrate and the second substrate in a state where the first spacer member formed on the surface of the first substrate abuts against the second spacer member formed on the surface of the second substrate.
[0010] In this force sensor manufacturing method, the first metal layer of the first substrate and the second metal layer of the second substrate are fused together, and the first and second substrates are fixed together with the first spacer member of the first substrate abutting against the second spacer member of the second substrate. The fusion of the first and second metal layers provides a more secure fixation between the first and second substrates than fixing with polyimide tape. Furthermore, because the first spacer member of the first substrate abuts against the second spacer member of the second substrate, the distance between the first and second substrates remains constant even if the thickness of the first and second metal layers fluctuates due to the fusion. Therefore, this force sensor manufacturing method can maintain the positional relationship between the first and second substrates so that the distance between them remains constant when no load is applied.
[0011] In one embodiment, the first metal layer and the second metal layer may be made of the same material. In this case, since the first metal layer and the second metal layer are made of the same material, they are firmly fused together. Therefore, this method for manufacturing a force sensor can more reliably fix the first substrate and the second substrate. [Effects of the Invention]
[0012] According to this disclosure, it is possible to manufacture a force sensor that can maintain the positional relationship between the first substrate and the second substrate so that the distance between the first substrate and the second substrate remains constant when no load is applied. [Brief explanation of the drawing]
[0013] [Figure 1] This is a cross-sectional view showing an example of a force sensor. [Figure 2] This is a cross-sectional view along line II-II in Figure 1. [Figure 3] This flowchart shows an example of a manufacturing method according to one embodiment. [Figure 4] This is a cross-sectional view illustrating the steps of a manufacturing method according to one embodiment. [Figure 5] This is a cross-sectional view illustrating the steps of a manufacturing method according to one embodiment.
Best Mode for Carrying Out the Invention
[0014] Hereinafter, embodiments of the present disclosure will be described with reference to the drawings. In the following description, the same or corresponding elements are denoted by the same reference numerals, and redundant descriptions are not repeated. The dimensional ratios in the drawings do not necessarily match those in the description.
[0015] [Force Sensor] The force sensor manufactured by the manufacturing method according to the present embodiment is a force sensor using electromagnetic waves. The electromagnetic waves are visible light, infrared light, terahertz waves, or microwaves. The force sensor has an air gap structure in which a gap is formed between a metal array and a metal layer. Electromagnetic waves are incident on the air gap structure and reflected waves are measured. A resonance wavelength is obtained based on the incident wave and the reflected wave. The resonance wavelength changes according to the size of the gap. The gap changes due to an external force. That is, the force sensor using electromagnetic waves is a sensor that measures an external force based on a change in the resonance wavelength.
[0016] FIG. 1 is a cross-sectional view showing an example of a force sensor according to an embodiment. FIG. 2 is a cross-sectional view taken along line II-II of FIG. 1. As shown in FIG. 1, the force sensor 1 includes a lower substrate 10 (an example of a first substrate) and an upper substrate 20 (an example of a second substrate). The lower substrate 10 is made of a material that transmits light (an example of electromagnetic waves). The lower substrate 10 is, for example, a glass substrate. The lower substrate 10 has a metal array 11 arranged in a periodic pattern on its upper surface (an example of a surface). The metal array 11 is, for example, a rod array or a dot array. The metal array 11 may be configured by a pattern in which a substantially square array with a side length of 350 nm is periodically arranged at intervals of 400 nm. The material of the metal array 11 is, for example, Au (gold) or Al (aluminum). The upper substrate 20 does not necessarily need to be made of a material that transmits light, and may be a glass substrate, a silicon substrate, or the like. The upper substrate 20 has a metal layer 21 that reflects light on its lower surface (an example of a surface). The material of the metal layer 21 is, for example, Au or Al. The lower substrate 10 and the upper substrate 20 may be formed from non-alkali glass or quartz that does not contain an alkali component.
[0017] As shown in FIGS. 1 and 2, the lower substrate 10 and the upper substrate 20 are fixed to each other at a distance by a spacer member 30, a first metal layer 31, and a second metal layer 32 provided around the metal array 11 and the metal layer 21. Thereby, a gap is formed between the metal array 11 and the metal layer 21. The spacer member 30 is formed of a metal that is difficult to oxidize and has a high melting point. The spacer member 30 is, for example, composed of a three-layer structure of Mo (molybdenum) / Al / Mo. The spacer member 30 may be a single layer of Al, Mo, Ag (silver), Ti (titanium), or Cr (chromium).
[0018] A portion of the light transmitted through the lower substrate 10 and the metal array 11 is reflected by the metal layer 21 and absorbed by resonance between the metal array 11 and the metal layer 21. The wavelength of the absorbed light changes depending on the distance between the metal array 11 and the metal layer 21. The force sensor 1 is configured so that the orientation of the upper substrate 20 relative to the lower substrate 10 changes in response to an external load. Therefore, the load applied to the force sensor 1 is indicated by the change in the wavelength of the light absorbed by the force sensor 1.
[0019] [Manufacturing method for force sensors] Figure 3 is a flowchart showing an example of a manufacturing method according to one embodiment. In manufacturing method M1, first, a lower substrate 10 having a metal array 11 and an upper substrate 20 having a metal layer 21 are prepared (step S10).
[0020] Next, a spacer member 30 is formed on the upper surface of the lower substrate 10 (step S20). Figure 4 is a cross-sectional view illustrating the steps of a manufacturing method according to one embodiment. As shown in Figure 4, a spacer member 30 is formed on the upper surface of the lower substrate 10 around the metal array 11. The spacer member 30 is provided so as to surround the area where the metal array 11 is formed and is spaced apart from the metal array 11 (see Figure 2). The spacer member 30 is formed to be thicker than the metal array 11. For example, the thickness of the metal array 11 is 25 nm and the thickness of the spacer member 30 is 30 nm. The spacer member 30 is formed by photolithography after being deposited by sputtering. The spacer member 30 may also be deposited by thermal deposition or electron beam deposition.
[0021] Next, a first metal layer 31 is formed on the upper surface of the lower substrate 10 (step S30). As shown in Figure 4, the first metal layer 31 is formed around the spacer member 30 on the upper surface of the lower substrate 10. The first metal layer 31 is provided so as to surround the spacer member 30 and spaced apart from the spacer member 30 (see Figure 2). The first metal layer 31 is formed to be thinner than the spacer member 30. The thickness of the first metal layer 31 is set so that the sum of the thickness of the first metal layer 31 and the thickness of the second metal layer 32, which will be described later, is approximately the same as the thickness of the spacer member 30. Approximately the same means that an error of a few nanometers is allowed. If the thickness of the spacer member 30 is 30 nm, the thickness of the first metal layer 31 can be arbitrarily set in the range of, for example, 1 nm to 29 nm. As an example, the first metal layer 31 is set to 15 nm, which is half the thickness of the spacer member 30. The first metal layer 31 is formed by photolithography after being deposited by sputtering. The first metal layer 31 may also be deposited by thermal deposition or electron beam deposition.
[0022] Next, a second metal layer 32 is formed on the lower surface of the upper substrate 20 (step S40). Figure 5 is a cross-sectional view illustrating the steps of a manufacturing method according to one embodiment. As shown in Figure 5, a second metal layer 32 is formed on the lower surface of the upper substrate 20 in a region corresponding to the first metal layer 31, surrounding the periphery of the metal layer 21. The second metal layer 32 is provided so as to surround the region where the metal layer 21 is formed, and is spaced apart from the metal layer 21. The second metal layer 32 is formed to be thinner than the spacer member 30. The thickness of the second metal layer 32 is set such that the sum of the thickness of the second metal layer 32 and the thickness of the first metal layer 31 described above is approximately the same as the thickness of the spacer member 30. If the first metal layer 31 is set to 15 nm, which is half the thickness of the spacer member 30, then the second metal layer 32 is set to 15 nm. The second metal layer 32 is formed by photolithography after being deposited by sputtering. The second metal layer 32 may also be deposited by thermal deposition or electron beam deposition.
[0023] Next, the first metal layer 31 of the lower substrate 10 and the second metal layer 32 of the upper substrate 20 are fused together (step S50). First, the upper surface of the lower substrate 10 and the lower surface of the upper substrate 20 are positioned facing each other and stacked. This brings the first metal layer 31 of the lower substrate 10 and the second metal layer 32 of the upper substrate 20 into contact, and the tip of the spacer member 30 of the lower substrate 10 abuts against the lower surface of the upper substrate 20. The spacer member 30 maintains a gap between the lower substrate 10 and the upper substrate 20 equal to the thickness of the spacer member 30. In this state, the first metal layer 31 and the second metal layer 32 are fused together. The first metal layer 31 and the second metal layer 32 are fused together, for example, by laser welding. The first metal layer 31 and the second metal layer 32 may also be fused together by room temperature bonding or direct bonding. As described above, the force sensor 1 is manufactured. Furthermore, manufacturing method M1 may include a cleaning step of cleaning the metal array 11 before step S50.
[0024] [Summary of Embodiments] In the manufacturing method M1 of the force sensor 1 according to this disclosure, the first metal layer 31 of the lower substrate 10 and the second metal layer 32 of the upper substrate 20 are fused together, and the lower substrate 10 and the upper substrate 20 are fixed together with the spacer member 30 of the lower substrate 10 abutting against the lower surface of the upper substrate 20. The fusion of the first metal layer 31 and the second metal layer 32 provides more secure fixation between the lower substrate 10 and the upper substrate 20 than fixing with polyimide tape. Furthermore, because the spacer member 30 of the lower substrate 10 abuts against the lower surface of the upper substrate, the distance between the lower substrate 10 and the upper substrate 20 is kept constant even if the thickness of the first metal layer 31 and the second metal layer 32 fluctuates due to the fusion. Therefore, the manufacturing method M1 can maintain the positional relationship between the lower substrate 10 and the upper substrate 20 such that the distance between them remains constant when no load is applied.
[0025] Furthermore, in the force sensor 1, since the first metal layer 31 and the second metal layer 32 are made of the same material, they can be firmly fused to each other. Therefore, manufacturing method M1 can more securely fix the lower substrate 10 and the upper substrate 20.
[0026] Although various exemplary embodiments have been described above, the invention is not limited to the embodiments described above, and various omissions, substitutions, and modifications may be made.
[0027] [Example 1] In the embodiment described above, the spacer member 30 is formed on the upper surface of the lower substrate 10, but the spacer member 30 may also be formed on the lower surface of the upper substrate 20. In this case, in step S20 of Figure 3, the spacer member 30 is formed around the metal layer 21 on the lower surface of the upper substrate 20. Then, in step S50, the lower end of the spacer member 30 on the upper substrate 20 abuts against the upper surface of the lower substrate 10. The other steps of the manufacturing method are the same.
[0028] [Differentiation 2] In the embodiment described above, a spacer member 30 is formed on the upper surface of the lower substrate 10, but the spacer member 30 may also be formed on the lower surface of the upper substrate 20. That is, a first spacer member is formed on the upper surface of the lower substrate 10, and a second spacer member is formed on the lower surface of the upper substrate 20. In this case, in step S20 of Figure 3, the first spacer member is formed around the metal array 11 on the lower surface of the lower substrate 10. The second spacer member is formed around the metal layer 21 on the upper surface of the upper substrate 20. Then, in step S50, the lower end of the second spacer member of the upper substrate 20 abuts against the upper end of the first spacer member of the lower substrate 10. The other steps of the manufacturing method are the same.
[0029] Even when manufactured as in the modified examples 1 and 2, a force sensor 1 can be manufactured that maintains a constant positional relationship between the lower substrate 10 and the upper substrate 20, so that the distance between the lower substrate 10 and the upper substrate 20 remains constant when no load is applied.
[0030] The force sensor 1 may be used as a pressure sensor, force gauge, contact sensor, etc. In the above embodiment, the spacer member 30 is provided so as to continuously surround the region where the metal array 11 is formed, the first metal layer 31 is provided so as to continuously surround the spacer member 30, and the second metal layer 32 is provided so as to continuously surround the region where the metal layer 21 is formed. However, it is not limited to being continuous, and may be discontinuous.
[0031] The force sensor 1 may include a protective layer covering the surface of the metal array 11. By including a protective layer, the cleaning step described above can be omitted in the manufacturing process of the force sensor 1. The protective layer is formed from, for example, quartz. The protective layer protects the metal array 11 from damage or oxidation. The protective layer may be formed from polydimethylsiloxane (PDMS). In this case, the protective layer may be filled into the gap between the metal layer 21 and the metal array 11. The protective layer formed from polydimethylsiloxane changes in response to external force.
[0032] The thickness of the spacer member 30 may be 190 nm. The thickness of the metal layer 21 may be 100 nm. The thickness of the metal array 11 may be 30 nm. The thickness of the protective layer formed from quartz may be 35 nm. The gap between the metal layer 21 and the protective layer may be 30 nm. The distance between the metal layer 21 and the metal array 11 may be 65 nm. [Explanation of Symbols]
[0033] 1...force sensor, 10...lower substrate (example of first substrate), 11...metal array, 20...upper substrate (example of second substrate), 21...metal layer, 30...spacer member, 31...first metal layer, 32...second metal layer.
Claims
1. The process involves preparing a first substrate having a metal array on its surface that is made of a material that transmits electromagnetic waves and arranged in a periodic pattern, and a second substrate having a metal layer on its surface that reflects electromagnetic waves. A step of forming a spacer member made of metal on the surface of the first substrate so as to surround the region in which the metal array is formed, A step of forming a first metal layer thinner than the spacer member on the surface of the first substrate so as to surround the spacer member, The process of forming a second metal layer thinner than the spacer member in a region of the second substrate corresponding to the first metal layer, A step of fusing the first metal layer and the second metal layer, and fixing the first substrate and the second substrate with the spacer member formed on the surface of the first substrate abutting against the surface of the second substrate, A method for manufacturing a force sensor, including the method described above.
2. The process involves preparing a first substrate having a metal array on its surface that is made of a material that transmits electromagnetic waves and arranged in a periodic pattern, and a second substrate having a metal layer on its surface that reflects electromagnetic waves. A step of forming a spacer member made of metal on the surface of the second substrate so as to surround the metal layer, A step of forming a first metal layer thinner than the spacer member on the surface of the second substrate so as to surround the spacer member, The first step of forming a second metal layer thinner than the spacer member in a region corresponding to the first metal layer on the first substrate, A step of fusing the first metal layer and the second metal layer, and fixing the spacer member formed on the surface of the second substrate in a state where it abuts against the surface of the first substrate, A method for manufacturing a force sensor, including the method described above.
3. The process involves preparing a first substrate having a metal array on its surface that is made of a material that transmits electromagnetic waves and arranged in a periodic pattern, and a second substrate having a metal layer on its surface that reflects electromagnetic waves. A step of forming a first spacer member made of metal on the surface of the first substrate so as to surround the metal array, A step of forming a first metal layer on the surface of the first substrate so as to surround the first spacer member, A step of forming a second spacer member made of metal in a region corresponding to the first spacer member on the surface of the second substrate so as to surround the metal layer, A step of forming a second metal layer in a region corresponding to the first metal layer on the surface of the second substrate so as to surround the second spacer member, A step of fusing the first metal layer and the second metal layer, and fixing the first substrate and the second substrate in a state where the first spacer member formed on the surface of the first substrate abuts against the second spacer member formed on the surface of the second substrate, A method for manufacturing a force sensor, including the method described above.
4. A method for manufacturing a force sensor according to any one of claims 1 to 3, wherein the first metal layer and the second metal layer are made of the same material.
Citation Information
Patent Citations
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