Pigment dispersion composition for black matrix, resist composition for black matrix, and black resist film

Abstract

To provide a pigment dispersion composition for black matrix that can give a resist composition having excellent fine-line adhesion.SOLUTION: A pigment dispersion composition for black matrix contains carbon black, a basic group-containing pigment dispersant, an acidic group-containing pigment dispersion aid, an epoxy resin, an alkali-soluble resin, and a solvent. The carbon black is surface-treated carbon black treated with an inorganic aluminum salt.SELECTED DRAWING: None

Description

Technical Field

[0001] The present invention relates to a pigment dispersion composition for a black matrix, a resist composition for a black matrix, and a black resist film.

Background Art

[0002] Conventionally, a resist composition using a pigment dispersion composition for a black matrix containing carbon black, a pigment dispersant containing a basic group, a pigment dispersion aid containing an acidic group, an epoxy resin, a polyfunctional thiol compound, and a solvent has been known (Patent Document 1). Further, it is known that the concealability of a black matrix can be improved by using carbon black for a black matrix whose surface is coated (fixed) with a dye via a metal salt or the like.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Patent Document 2

Summary of the Invention

Problems to be Solved by the Invention

[0004] In Patent Document 1, it is disclosed that a resist composition using a pigment dispersion composition for a black matrix is excellent in fine line adhesion. However, since the composition contains a polyfunctional thiol compound as an essential component, there are problems such as odor. Therefore, there has been a demand for a pigment dispersion composition for a black matrix that can provide a resist composition excellent in fine line adhesion by a method different from such a composition.

[0005] The present invention has been made in view of the above circumstances, and an object thereof is to provide a pigment dispersion composition for a black matrix that can provide a resist composition excellent in fine line adhesion. [Means for solving the problem]

[0006] In other words, the present invention relates to a pigment dispersion composition for a black matrix, comprising carbon black, a basic group-containing pigment dispersant, an acidic group-containing pigment dispersion aid, an epoxy resin, an alkali-soluble resin, and a solvent, wherein the carbon black is surface-treated carbon black treated with an inorganic aluminum salt.

[0007] Furthermore, the present invention relates to a black matrix resist composition containing the black matrix pigment dispersion composition, a photopolymerizable compound, and a photopolymerization initiator.

[0008] Furthermore, the present invention relates to a black resist film obtained using a black matrix resist composition. [Effects of the Invention]

[0009] The pigment dispersion composition for black matrix of the present invention contains carbon black, a basic group-containing pigment dispersant, an acidic group-containing pigment dispersion aid, an epoxy resin, an alkali-soluble resin, and a solvent, wherein the carbon black is surface-treated carbon black treated with an inorganic aluminum salt. In particular, the surface-treated carbon black has moderately reduced hydrophilicity compared to untreated carbon black, which can suppress the elution and peeling of the pattern formed by alkaline development and washing with water, so the pigment dispersion composition for black matrix of the present invention has excellent adhesion to fine lines. [Modes for carrying out the invention]

[0010] The pigment dispersion composition for black matrix of the present invention contains carbon black, a basic group-containing pigment dispersant, an acidic group-containing pigment dispersion aid, an epoxy resin, an alkali-soluble resin, and a solvent, wherein the carbon black is surface-treated carbon black treated with an inorganic aluminum salt.

[0011] <Surface treatment carbon black> The aforementioned surface-treated carbon black is a carbon black whose surface has been treated with an inorganic aluminum salt.

[0012] As the carbon black, known carbon blacks used in pigment dispersion compositions for black matrices can be used, such as acetylene black, channel black, furnace black, and Ketjen black. Specific examples of the aforementioned carbon black include MA7, MA8, MA11, MA14, #1000, #2350, etc. from Mitsubishi Chemical Corporation; SpecialBlack350, SpecialBlack250, SpecialBlack550, NEROX2500, NEROX3500, NEROX305, etc. from Orion Engineered Carbons Corporation; MOGULL, REGAL400R, TPK1101R, TPK1104R, TPK1227R, etc. from Cabot Corporation; and RAVEN1200, RAVEN1250, RAVEN1255, RAVEN1190U, RAVEN1170, RAVEN1035, RAVEN1080U, RAVEN1060U, RAVEN1100U, etc. from Colombian Carbon Corporation. The carbon black has a pH of 5 or less, is preferably acidic carbon black having acidic groups such as carboxyl groups, and has a particle size of 20 to 60 nm. Examples of acidic carbon black include NEROX2500, NEROX3500, TPK1101R, TPK1104R, and TPK1227R. The particle size refers to the average primary particle size measured or calculated by microscopic observation, but in the case of commercially available products, the catalog value should be used as a reference. The carbon black can be used alone or in combination of two or more types.

[0013] The inorganic aluminum salt can be any known inorganic aluminum salt, such as aluminum sulfate, (poly)aluminum chloride, or aluminum nitrate.

[0014] In the surface-treated carbon black, the amount of inorganic aluminum used is preferably 0.5 parts by mass or more, more preferably 8 parts by mass or more, per 100 parts by mass of carbon black, from the viewpoint of adhesion to fine wires, and preferably 200 parts by mass or less, more preferably 150 parts by mass or less, from the viewpoint of blackness.

[0015] The surface-treated carbon black is preferably 3% by mass or more, more preferably 10% by mass or more, from the viewpoint of enhancing the light-shielding properties when a black matrix film is formed in the black matrix pigment dispersion composition, and preferably 70% by mass or less, more preferably 50% by mass or less, from the viewpoint of pigment dispersion.

[0016] The surface treatment method for the surface-treated carbon black is not particularly limited, and examples include: 1) adding the inorganic aluminum salt or an aqueous solution containing the inorganic aluminum salt while stirring (fluidizing) the carbon black in a mixer or blender and stirring the mixture; 2) spraying the aqueous solution containing the inorganic aluminum salt using a sprayer or similar device; and 3) adding the inorganic aluminum salt to the water used in the granulation process of the carbon black and treating it.

[0017] <Basic group-containing pigment dispersant> The basic group-containing pigment dispersant only needs to be able to disperse the carbon black, and any known basic group-containing pigment dispersant used in pigment dispersion compositions for black matrices can be used. Examples include anionic surfactants, basic group-containing polyester pigment dispersants, basic group-containing acrylic pigment dispersants, basic group-containing urethane pigment dispersants, and basic group-containing carbodiimide pigment dispersants. Primary, secondary, or tertiary amino groups are particularly preferred as the basic group from the viewpoint of excellent dispersibility. The basic group-containing pigment dispersant can be used alone or in combination of two or more types.

[0018] From the viewpoint of obtaining good pigment dispersibility, the basic group-containing pigment dispersant is preferably a polymer-type basic group-containing pigment dispersant. Examples of the polymer-type basic group-containing pigment dispersant include a basic group-containing urethane-based polymer pigment dispersant, a basic group-containing polyester-based polymer pigment dispersant, a basic group-containing acrylic-based polymer pigment dispersant, and the like. Among these, a basic group-containing urethane-based polymer pigment dispersant and a basic group-containing acrylic-based polymer pigment dispersant are preferred. The basic group-containing urethane-based polymer pigment dispersant is more preferably a basic group-containing urethane-based polymer pigment dispersant having at least one selected from the group consisting of a polyester chain, a polyether chain, and a polycarbonate chain.

[0019] The basic group-containing pigment dispersant is preferably 1 to 100 parts by mass, and more preferably 2 to 50 parts by mass, based on 100 parts by mass of the surface-treated carbon black.

[0020] <Acidic Group-Containing Pigment Dispersing Aid> The acidic group-containing pigment dispersing aid is used for the purpose of further improving the dispersibility of the pigment. Examples thereof include compounds in which acidic groups such as carboxyl groups and sulfonic acid groups are introduced into dyes such as lactam black, perylene-based compounds, diketopyrrolopyrrole-based compounds, azonaphthol-based compounds, dioxazine-based compounds, quinacridone-based compounds, phthalocyanine-based compounds and their metal complexes, anthraquinone, naphthalene, acridone, or triazine (dye derivatives having acidic groups), and compounds obtained by neutralizing them with organic amines or the like. From the viewpoint of good dispersibility of carbon black, the dye derivative having a sulfonic acid group and being phthalocyanine-based (having a phthalocyanine skeleton) is preferred. The acidic group-containing pigment dispersing aid can be used alone or in combination of two or more.

[0021] The acidic group-containing pigment dispersing aid is preferably 0.1 to 20 parts by mass, and more preferably 1 to 10 parts by mass, based on 100 parts by mass of the surface-treated carbon black.

[0022] <Epoxy resin> The epoxy resin is a polyfunctional epoxy resin having two or more epoxy groups. Examples of the epoxy resin include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, biphenol type epoxy resin, alicyclic epoxy resin, aliphatic chain epoxy resin, glycidyl ester type epoxy resin, glycidyl ether derivatives of condensates of phenol compounds (phenol, cresol, alkylphenol, catechol, bisphenol F, bisphenol A, bisphenol S, etc.) and aldehyde compounds (formaldehyde, salicylaldehyde, etc.), glycidyl ether derivatives of difunctional phenols, glycidyl ether derivatives of difunctional alcohols, glycidyl ether derivatives of trifunctional or more polyphenols, and hydrogenated or halogenated versions thereof. The epoxy resin may be a polyfunctional epoxy resin having an alicyclic or aromatic ring, or a polyfunctional epoxy resin having a dicyclopentadiene skeleton which is an alicyclic ring. Among these, a polyfunctional epoxy resin having an aromatic ring is preferred from the viewpoint of improving adhesion to fine wires. Specific examples of the epoxy resins mentioned above include Epolite 40E, Epolite 100E, Epolite 200E, Epolite 400E, Epolite 70P, Epolite 200P, Epolite 400P, Epolite 1500NP, Epolite 80MF, Epolite 4000, Epolite 3002 (all manufactured by Kyoeisha Chemical Co., Ltd.), Denacol EX-212L, Denacol EX-214L, Denacol EX-216L, Denacol EX-850L, Denacol EX-321L (all manufactured by Nagase ChemteX Corporation), GAN, GOT, NC3000, NC6 Examples include 000, EPPN502H (all manufactured by Nippon Kayaku Co., Ltd.), Epicote 828, Epicote 1002, Epicote 1750, Epicote 1007, YX8100-BH30, E1256, E4250, E4275 (all manufactured by Japan Epoxy Resin Co., Ltd.), Epiclon EXA-9583, Epiclon N695, HP7200, HP4032 (all manufactured by Dainippon Ink and Chemicals, Inc.), VG3101 (manufactured by Mitsui Chemicals, Inc.), Tepic S, Tepic G, Tepic P (all manufactured by Nissan Chemical Industries, Ltd.), and Potote YH-434L (manufactured by Toto Kasei Co., Ltd.).Incidentally, it is preferable that the epoxy resin does not have an indane structure or a biphenyl structure in terms of reactivity and the like.

[0023] As the epoxy resin, for example, polyfunctional epoxy resins having an aromatic ring represented by the following formulas 1 to 7 are preferably mentioned.

[0024]

Chemical Formula

[0025]

Chemical Formula

[0026]

Chemical Formula

[0027]

Chemical Formula

[0028]

Chemical Formula

[0029]

Chemical Formula

[0030]

Chemical Formula

[0031] The epoxy resin is preferably in an amount of 1 part by mass or more, more preferably 2 parts by mass or more, and even more preferably 5 parts by mass or more, relative to 100 parts by mass of carbon black contained in the black matrix pigment dispersion composition or the black matrix resist composition described later, from the viewpoint of resistance as a black matrix, and preferably 30 parts by mass or less, more preferably 20 parts by mass or less, and even more preferably 15 parts by mass or less, from the viewpoint of blackness depending on pigment concentration.

[0032] <Alkali-soluble resin> The alkali-soluble resin is not particularly limited as long as it can dissolve in an alkaline developer, but a resin containing one or more anionic groups such as a carboxyl group, a sulfonic acid group, or a phosphonic acid group (-P(=O)(OH2)) is preferred. The alkali-soluble resin can be used alone or in combination of two or more types.

[0033] From the viewpoint of alkali developability, the acid value of the alkali-soluble resin is preferably 10 mg KOH / g or more and 300 mg KOH / g or less, and more preferably 20 mg KOH / g or more and 200 mg KOH / g or less.

[0034] The weight-average molecular weight of the alkali-soluble resin is preferably 5,000 or more, and more preferably 10,000 or more, from the viewpoint of resist film formation. The weight-average molecular weight of the alkali-soluble resin is preferably 100,000 or less, and more preferably 50,000 or less, from the viewpoint of improving solubility in alkaline developer.

[0035] The aforementioned weight-average molecular weight can be measured by gel permeation chromatography (GPC). For example, using a Water2690 GPC instrument (Waters Corporation) and a PLgel, 5 μm, MIXED-D column (Polymer Laboratories), chromatography can be performed under the following conditions: tetrahydrofuran as the developing solvent, column temperature 25°C, flow rate 1 ml / min, RI detector, sample injection concentration 10 mg / ml, and injection volume 100 microliters. The weight-average molecular weight can then be determined as polystyrene equivalent.

[0036] Examples of the alkali-soluble resins include alkali-soluble polyimide resins, alkali-soluble polyimide precursors, alkali-soluble polybenzoxazole resins, alkali-soluble polybenzoxazole precursors, alkali-soluble cardo resins, alkali-soluble epoxy (meth)acrylate resins, alkali-soluble polysiloxane resins, alkali-soluble novolac resins, alkali-soluble (meth)acrylic resins, alkali-soluble polyurethane resins, and alkali-soluble polyester resins. Among these, alkali-soluble cardo resins and alkali-soluble epoxy (meth)acrylate resins are preferred from the viewpoint of heat resistance of the coating film.

[0037] The aforementioned alkali-soluble cardi resin refers to an alkali-soluble resin having a cardi skeleton, which is a skeleton in which two aromatic groups are connected by single bonds to a quaternary carbon atom, which is a ring carbon atom constituting a cyclic structure. Specific examples of alkali-soluble cardi resins include, for example, ADEKA ARKLS WR-301 (manufactured by ADEKA), and Ogzol CR-TR1, CR-TR2, CR-TR3, CR-TR4, CR-TR5, and CR-TR6 (all manufactured by Osaka Gas Chemical).

[0038] The alkali-soluble epoxy (meth)acrylate resin refers to an acid-modified epoxy resin obtained by introducing an ethylenically unsaturated group by ring-opening addition of a carboxyl group from an ethylenically unsaturated monocarboxylic acid to an epoxy group from an epoxy resin, and further introducing a carboxyl group by adding a polybasic carboxylic acid (or its anhydride) to at least a portion of the hydroxyl groups generated by ring-opening of the epoxy group, which does not have the above-mentioned cardo skeleton and corresponds to the above-mentioned alkali-soluble resin. In the alkali-soluble epoxy (meth)acrylate resin, the epoxy resin used as the base material is preferably, for example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, epoxy resin having a biphenyl structure, phenol novolac type epoxy resin, or cresol novolac type epoxy resin. The ethylenically unsaturated monocarboxylic acid used to modify the epoxy resin is preferably, for example, acrylic acid or methacrylic acid. The polybasic carboxylic acid (or its anhydride) is preferably, for example, maleic anhydride, succinic anhydride, or tetrahydrophthalic anhydride. Among these, alkali-soluble epoxy (meth)acrylate resins having a biphenyl skeleton are preferred from the viewpoint of improving adhesion to fine wires. Specific examples of the alkali-soluble epoxy (meth)acrylate resins include, for example, ZAR-1494H, ZAR-2001H, ZFR-1491H, ZCR-1797H, ZCR-1569H, and ZCR-1798H (all manufactured by Nippon Kayaku). Another preferred example is an alkali-soluble epoxy (meth)acrylate resin having a substructure represented by any of the following structural formulas.

[0039] [ka]

[0040] The alkali-soluble resin is preferably in an amount of 1 to 70 parts by mass, and more preferably in an amount of 5 to 30 parts by mass, per 100 parts by mass of the surface-treated carbon black.

[0041] <Solvent> The solvent can be any known solvent used in pigment dispersion compositions for black matrices. From the viewpoint of stably dispersing the pigment and sufficiently dissolving the basic group-containing pigment dispersant and the alkali-soluble resin, ester solvents, ether solvents, ether ester solvents, ketone solvents, aromatic hydrocarbon solvents, nitrogen-containing solvents, etc., are preferred. The solvent can be used alone or in combination of two or more.

[0042] Examples of the ester-based solvents include methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, methyl-3-methoxybutylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyethyl acetate, hydroxyacetic acid ester, and n-amyl formate. Examples of the ether-based solvents include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, and diethylene glycol methyl ethyl ether. Examples of the ether ester solvents include ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, and propylene glycol monoethyl ether acetate. Examples of the ketone solvents include methyl isobutyl ketone, cyclohexanone, 2-heptanone, and δ-butyrolactone. Examples of the aromatic hydrocarbon solvents include toluene, xylene, and alkylnaphthalene. Examples of the nitrogen-containing solvents include N-methylpyrrolidone, N,N-dimethylformamide, and N,N-dimethylacetamide.

[0043] The proportion of the solvent in the black matrix pigment dispersion composition is preferably 40% by mass or more, more preferably 50% by mass or more, from the viewpoint of processability, and preferably 90% by mass or less, more preferably 80% by mass or less, from the viewpoint of dispersion stability.

[0044] The pigment dispersion composition for the black matrix may further contain, if necessary, additives such as leveling agents, resins other than the epoxy resin and alkali-soluble resin, antioxidants, and defoamers. However, from the viewpoint of odor, it is preferable not to include thiol compounds (for example, thiol compounds with a molecular weight of 1000 or less).

[0045] In the pigment dispersion composition for the black matrix, the total proportion of the carbon black, the basic group-containing pigment dispersant, the acid group-containing pigment dispersion aid, the epoxy resin, the alkali-soluble resin, and the solvent is preferably 75% by mass or more, more preferably 85% by mass or more, and even more preferably 95% by mass or more.

[0046] The aforementioned pigment dispersion composition for the black matrix may be prepared by dispersing each of the above components using a roll mill, kneader, high-speed stirrer, bead mill, ball mill, sand mill, ultrasonic disperser, high-pressure dispersion device, etc.

[0047] <Black Matrix Resist Composition> The black matrix resist composition of the present invention comprises the black matrix pigment dispersion composition, a photopolymerizable compound, and a photopolymerization initiator. Preferably, the proportion of the surface-treated carbon black is 30% by mass or more and 80% by mass or less of the solid content of the black matrix resist composition.

[0048] <Photopolymerizable compound> The photopolymerizable compound can be a known photopolymerizable compound used in black matrix resist compositions, such as monomers or oligomers having photopolymerizable unsaturated bonds. The photopolymerizable compound can be used alone or in combination of two or more.

[0049] Examples of monomers having one photopolymerizable unsaturated bond include alkyl methacrylates or acrylates such as methyl methacrylate, butyl methacrylate, 2-ethylhexyl methacrylate, methyl acrylate, butyl acrylate, and 2-ethylhexyl acrylate; aralkyl methacrylates or acrylates such as benzyl methacrylate and benzyl acrylate; alkoxyalkyl methacrylates or acrylates such as butoxyethyl methacrylate and butoxyethyl acrylate; and aminoalkyl methacrylates such as N,N-dimethylaminoethyl methacrylate and N,N-dimethylaminoethyl acrylate. Examples include methacrylate or acrylate; methacrylate or acrylic acid esters of polyalkylene glycol monoalkyl ethers such as diethylene glycol monoethyl ether, triethylene glycol monobutyl ether, and dipropylene glycol monomethyl ether; methacrylate or acrylic acid esters of polyalkylene glycol monoaryl ethers such as hexaethylene glycol monophenyl ether; isovonyl methacrylate or acrylate; glycerol methacrylate or acrylate; and 2-hydroxyethyl methacrylate or acrylate.

[0050] Examples of monomers having two or more photopolymerizable unsaturated bonds include bisphenol A dimethacrylate, 1,4-butanediol dimethacrylate, 1,3-butylene glycol dimethacrylate, diethylene glycol dimethacrylate, glycerol dimethacrylate, neopentyl glycol dimethacrylate, polyethylene glycol dimethacrylate, polypropylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol tetramethacrylate, dipentaerythritol hexamethacrylate, and dipentaerythritol hexamethacrylate. Examples include erythritol pentamethacrylate, bisphenol A diacrylate, 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, diethylene glycol diacrylate, glycerol diacrylate, neopentyl glycol diacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, tetraethylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, and dipentaerythritol pentaacrylate.

[0051] Examples of oligomers having photopolymerizable unsaturated bonds include those obtained by appropriately polymerizing the monomers.

[0052] The photopolymerizable compound is preferably present in an amount of 2 to 20% by mass, and more preferably 4 to 15% by mass, of the solid content of the black matrix resist composition.

[0053] The photopolymerization initiator can be a known photopolymerization initiator used in black matrix resist compositions, such as benzophenone, N,N'-tetraethyl-4,4'-diaminobenzophenone, 4-methoxy-4'-dimethylaminobenzophenone, benzyl, 2,2-diethoxyacetophenone, benzoin, benzoin methyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, α-hydroxyisobutylphenone, thioxanthone, 2-chlorothioxanthone, 1-hydroxycyclohexylphenyl ketone, t-butylanthraquinone, 1-chloroanthraquinone, 2,3-dichloroanthraquinone, 3-chlor-2-methylanthraquinone, 2-ethylanthraquinone, 1,4-naphthoquinone, 1,2-benzoanthraquinone, 1,4-dimethylanthraquinone, 2-phenylanthraquinone, triazine-based photopolymerization initiators, oxime ester-based photopolymerization initiators, etc. The photopolymerization initiator can be used alone or in combination of two or more.

[0054] The photopolymerization initiator is preferably present in an amount of 0.1 to 15% by mass, and more preferably 1 to 10% by mass, of the solid content of the black matrix resist composition.

[0055] The black matrix resist composition may further contain the above-mentioned alkali-soluble resin from the viewpoint of developability with an alkaline developer. Furthermore, the total amount of the alkali-soluble resin is preferably 10% by mass or more and 50% by mass or less of the solid content of the black matrix resist composition. Furthermore, the black matrix resist composition may further contain the above-mentioned solvent from the viewpoint of improving paintability. The total proportion of the solvent is preferably 50% by mass or more, and more preferably 70% by mass or more, of the black matrix resist composition.

[0056] The black matrix resist composition may further contain additives such as leveling agents, antioxidants, and defoaming agents, as needed.

[0057] The black matrix resist composition may be prepared by stirring and mixing the black matrix pigment dispersion composition, the photopolymerizable compound, and the photopolymerization initiator using a stirring device or the like. [Examples]

[0058] The present invention will be described below with reference to examples, but the present invention is not limited to these examples.

[0059] <Preparation examples A to E> <Preparation of surface-treated carbon black> The various raw materials shown in Table 1 were mixed to achieve the blending composition (parts by mass) shown in Table 1, and then stirred at room temperature for 12 hours. After that, suction filtration was performed, followed by repeated washing with purified water, and drying to obtain surface-treated carbon blacks A to E.

[0060] [Table 1]

[0061] In Table 1, TPK1104R is acidic carbon black (oil absorption: 38 ml / 100 g, pH approximately 3.0, manufactured by Cabot). SS12000S is a phthalocyanine-based dye derivative containing a sulfonic acid group (manufactured by Lubrizol). Alphain 83 is an aqueous solution of polyaluminum chloride (23% in terms of aluminum oxide equivalent, manufactured by Daimei Chemical Industry Co., Ltd.); The liquid sulfate band indicates an aqueous solution of aluminum sulfate (8% in terms of aluminum oxide, manufactured by Daimei Chemical Industry Co., Ltd.).

[0062] <Examples 1-1 to 4-1, Comparative Examples 1-1 to 2-1> <Preparation of Pigment Dispersion Composition for Black Matrix> The various raw materials shown in Table 2 were mixed to achieve the blending composition (mass%) shown in Table 2, and then kneaded in a bead mill to prepare the black matrix pigment dispersion compositions for each preparation example and comparative preparation example.

[0063] [Table 2]

[0064] In Table 2, DB167 is an amino group-containing polyurethane polymer dispersant with polyester chains (manufactured by Bic Chemie, solids content 52% by mass); SS12000S is a phthalocyanine-based dye derivative containing a sulfonic acid group (manufactured by Lubrizol). VG3101L is an epoxy resin (100% solids content, manufactured by Printec Co., Ltd.). ZCR-1569H is an alkali-soluble epoxy (meth)acrylate resin with a biphenyl skeleton (solids content 69%, manufactured by Nippon Kayaku Co., Ltd.). PGMEA represents propylene glycol monomethyl ether acetate.

[0065] <Examples 1-2 to 4-2, Comparative Examples 1-2 to 2-2> <Preparation of black matrix resist composition> The various raw materials shown in Table 3 were mixed using a high-speed stirrer to achieve the blending composition (mass%) shown in Table 3, and then filtered through a 0.5 μm pore size filter to prepare the black matrix resist compositions for each example and comparative example.

[0066] <Evaluation of the adhesion of black resist film to fine lines> Each black matrix resist composition prepared in the examples and comparative examples was coated onto a glass substrate (EAGLE XG) using a spin coater to a thickness of 1 μm and pre-baked at 100°C for 3 minutes. Then, using a photomask with a line pattern spaced 1 μm apart for line widths from 1 μm to 20 μm, UV light was applied using a high-pressure mercury lamp at an integrated UV intensity of 100 mJ / cm². 2 Exposure was performed. Subsequently, at 23°C, in a 0.05% potassium hydroxide aqueous solution, at 1 kgf / cm². 2 Development begins at the time when the development pattern starts to appear (breakpoint) using a shower developing pressure of 1 kgf / cm², and ends when twice the breakpoint time has elapsed. 2Pressure spray washing was performed. The size (μm) of the smallest line pattern remaining on the glass substrate was evaluated. The results are shown in Table 3.

[0067] [Table 3]

[0068] In Table 3, DPHA is dipentaerythritol hexaacrylate; OXE02 is an oxime ester-based photopolymerization initiator (manufactured by BASF Japan). WR-301 is an alkali-soluble cardo resin (44% solids content, manufactured by ADEKA). PGMEA represents propylene glycol monomethyl ether acetate.

Claims

1. It contains carbon black, a basic group-containing pigment dispersant, an acidic group-containing pigment dispersant, an epoxy resin, an alkali-soluble resin, and a solvent. It does not contain thiol compounds. The alkali-soluble resin is an alkali-soluble epoxy (meth)acrylate resin having a substructure represented by any of the following structural formulas: 【Chemistry 1】 The pigment dispersion composition for a black matrix is ​​characterized in that the carbon black is surface-treated carbon black treated with an inorganic aluminum salt.

2. The pigment dispersion composition for black matrix according to claim 1, characterized in that the inorganic aluminum salt is one or more selected from the group consisting of aluminum chloride and aluminum sulfate.

3. The pigment dispersion composition for a black matrix according to claim 1 or 2, characterized in that the carbon black is acidic carbon black.

4. The pigment dispersion composition for a black matrix according to any one of claims 1 to 3, characterized in that the epoxy resin is a polyfunctional epoxy resin having an aromatic ring.

5. The pigment dispersion composition for black matrix according to any one of claims 1 to 4, characterized in that the acidic group-containing pigment dispersion aid has a phthalocyanine skeleton.

6. A black matrix resist composition characterized by containing the black matrix pigment dispersion composition according to any one of claims 1 to 5, a photopolymerizable compound, and a photopolymerization initiator.

7. The black matrix resist composition according to claim 6, further characterized by containing an alkali-soluble resin.

8. A black resist film characterized by being obtained using the black matrix resist composition described in Claim 6 or 7.

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