Observation system, microscope, observation method, and program

JP7863469B2Active Publication Date: 2026-05-21EVIDENT CORP
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
EVIDENT CORP
Filing Date
2022-07-20
Publication Date
2026-05-21

AI Technical Summary

Technical Problem

Conventional methods for observing surface irregularities in samples using microscopes are prone to missed observations due to manual switching between microscopy methods, leading to incomplete sample inspection and cumbersome operations.

Method used

An observation system that acquires multiple images using different microscopy methods, calculates brightness differences, and displays partial images with significant differences automatically, eliminating the need for manual method switching.

Benefits of technology

Ensures comprehensive observation of surface irregularities without missing details, automating the process and reducing operational complexity.

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Patent Text Reader

Abstract

To provide a technique that prevents omissions in observation and eliminates the need to repeat discovery of irregularities in a sample and detailed observation of the discovered irregularities while switching microscopy methods.SOLUTION: An observation system includes a microscope that acquires a first image, which is an image of a sample using a first microscopy method and acquires a second image, which is an image of the sample using a second microscopy method different from the first microscopy method, and a control unit that is communicably connected to the microscope. The control unit sets a plurality of common areas between the first image and the second image, calculates, for each area, a first brightness value, which is the brightness value of the first image, and a second brightness value, which is the brightness value of the second image, and calculates a difference between the first brightness value and the second brightness value.SELECTED DRAWING: Figure 1
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