Dielectric layer for digital microfluidic devices

JP7863554B2Active Publication Date: 2026-05-21ヌークレラ リミテッド
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
ヌークレラ リミテッド
Filing Date
2021-11-04
Publication Date
2026-05-21

AI Technical Summary

Technical Problem

Conventional digital microfluidic devices face challenges in protecting dielectric layers from electrochemical degradation due to high voltages and corrosive reagents, which is exacerbated in active matrix electrowetting systems, leading to device degradation and operational limitations.

Method used

A multilayer dielectric stack with alternating layers of low and high dielectric constants, fabricated using atomic layer deposition, is employed to enhance protection against electrochemical degradation while maintaining operational efficiency.

Benefits of technology

The multilayer dielectric stack effectively prevents electrochemical degradation, enabling stable operation at higher voltages and reducing manufacturing costs, thus extending the lifespan and performance of digital microfluidic devices.

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Abstract

An electrowetting system is disclosed. The system includes electrodes configured to manipulate droplets of fluid within a microscopic fluid space. Each electrode is coupled to circuitry operative to selectively apply a drive voltage to the electrode. The system includes a dielectric stack including a first dielectric pair comprising a first layer having a first dielectric constant and a second layer having a second dielectric constant. The dielectric stack includes a second dielectric pair comprising a third layer having a third dielectric constant and a fourth layer having a fourth dielectric constant.
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