Microparticle device

Abstract

To provide an atomization device which performs primary atomization which utilizes collision energy of a jetted material at a maximum and secondary atomization in which the material is ground in a gap between a sphere and a sphere holder.SOLUTION: An atomization device includes: a jet chamber 5 in which a material M is processed and which has a front chamber holder 10 disposed at the material M introduction side and a rear chamber holder 11 disposed at the material M discharge side; a sphere 14 with which the material M collides; and nozzle holders 15, 16 which are disposed in the jet chamber 5, house the sphere 14, and include a protection holder 15 disposed at the material M introduction side and a sphere holder 16 disposed at the material M discharge side.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to an atomization device that atomizes a raw material jetted at high pressure from a nozzle.

Background Art

[0002] Conventionally, an atomization device that atomizes particles of a raw material by utilizing the impact when the raw material is jetted at high pressure is known.

[0003] The fluid collision device described in Japanese Patent No. 3686528 (hereinafter, "Patent Document 1") utilizes the collision force against a rigid body. In the fluid collision device of Patent Document 1, high-pressure fluid jetted from an injection nozzle is made to collide with a rigid sphere supported rotatably in an eccentric state within a chamber. Then, while rotating the ball to release the impact by the rotation of the ball, an atomization process is performed.

[0004] The atomization device described in Japanese Patent Application Laid-Open No. 2010-36119 (hereinafter, "Patent Document 2") has a chamber that holds a ball holder that is placed within a housing and rotatably supports a spherical rigid body, gripping it front and back.

[0005] The atomization device described in Japanese Patent No. 5086203 (hereinafter, "Patent Document 3") atomizes by jetting a raw material onto a rotatably supported sphere, and has a chamber that sets the diameter and length of a flow path within the chamber under specific conditions.

Summary of the Invention

Problems to be Solved by the Invention

[0006] In Patent Document 1, the collision energy of the raw material in a high-pressure state may damage a part of the surface of the sphere. Therefore, it is necessary to secure the distance between the nozzle and the sphere, and the collision distance becomes long. This gives priority to the life of the chamber rather than atomization.

[0007] In Patent Documents 2 and 3, if the hard body is spherical or otherwise has a curved impact surface that allows fluid to escape around the impact point, then the impact distance can be substantially set to 0 mm, and the outlet opening of the high-speed flow path can be brought into contact with the hard body impact point. In this case, the impact energy increases, and atomization can be performed efficiently. However, while Patent Documents 2 and 3 disclose a structure for supporting the hard body, they do not disclose the specific structure of the chamber.

[0008] The present invention aims to provide an atomization apparatus that performs primary atomization by making maximum use of the collision energy of the ejected raw material, and secondary atomization by grinding the raw material in the gap between the sphere and the sphere holder. [Means for solving the problem]

[0009] The first aspect of the present invention is, An injection chamber for processing raw materials, A front chamber holder positioned on the raw material introduction side, A rear chamber holder positioned on the discharge side of the raw material, An injection chamber having, A sphere into which the aforementioned raw materials collide, A nozzle holder disposed within the injection chamber and housing the sphere, A protective holder is positioned on the side where the raw material is introduced. A spherical holder positioned on the discharge side of the raw material, A nozzle holder having, This is an atomizing device that has [a specific feature / ability]. [Effects of the Invention]

[0010] The atomizing apparatus of the present invention can perform primary atomization, which makes maximum use of the collision energy of the ejected raw material, and secondary atomization, which grinds the raw material in the gap between the sphere and the sphere holder. [Brief explanation of the drawing]

[0011] [Figure 1]Configuration diagram of the atomizing apparatus according to the embodiment. [Figure 2] Cross-sectional view of the injection chamber of the embodiment [Figure 3] Detailed cross-sectional view of the injection chamber of the embodiment. [Figure 4] Cross-sectional view of the injection chamber in the embodiment before collision distance adjustment. [Figure 5] Cross-sectional view of the injection chamber in the embodiment after collision distance adjustment. [Figure 6] Cross-sectional view of the injection chamber in the embodiment before eccentric position adjustment. [Figure 7] Cross-sectional view of the injection chamber in the embodiment after eccentric position adjustment. [Modes for carrying out the invention]

[0012] The embodiments will be described below with reference to the drawings as appropriate.

[0013] As shown in Figure 1, the atomizing apparatus 1 of this embodiment performs pulverization, dispersion, emulsification, etc., of the raw material M to be processed. The atomizing apparatus 1 includes a raw material tank 2, a liquid supply pump P, a pressure booster 3, a high-pressure filter 4, an injection chamber 5, a heat exchanger 6, and a discharge port 7.

[0014] Raw material tank 2 stores raw material M. The shape and size of raw material tank 2 can be changed considering the physical properties (acidity, alkalinity) and quantity of raw material M. The liquid supply pump P supplies raw material M, which is supplied from the raw material tank 2, to the pressurizer 3.

[0015] The pressure intensifier 3 increases or decreases the pressure inside the pressurizing chamber by the reciprocating motion of a piston. As a result, the pressure intensifier 3 pressurizes the fluid passing through the atomizer 1 within a range of 10 to 300 MPa. The high-pressure filter 4 removes contaminants such as coarse particles and impurities present in the raw material M that has been pressurized by the pressurizer 3.

[0016] As shown in FIGS. 2 to 7, the injection chamber 5 injects the raw material M, from which contaminants such as coarse particles and impurities have been removed by the high-pressure filter 4, from the nozzle tip 12. Thereby, the injection chamber 5 primarily atomizes the raw material M. The nozzle tip 12 injects the raw material M by disposing an orifice or the like inside.

[0017] The injection chamber 5 has a front chamber holder 10 and a rear chamber holder 11. The front chamber holder 10 is disposed on the introduction side of the raw material M. The raw material M is introduced from a chamber holder inlet 10a formed on the introduction side of the front chamber holder 10. The chamber holder inlet 10a communicates with the nozzle tip 12. The inner diameter of the chamber holder inlet 10a is larger than that of the nozzle tip 12. The raw material M can be sequentially introduced into the chamber holder inlet 10a.

[0018] The front chamber holder 10 has a groove on the discharge side. It is desirable that part or all of the nozzle tip 12 be embedded in the groove of the front chamber holder 10. The intermediate support member 13 has a groove on the introduction side. It is desirable that part or all of the nozzle tip 12 on the side opposite to the portion embedded in the front chamber holder 10 be embedded in the groove of the intermediate support member 13.

[0019] When connecting the front chamber holder 10 and the intermediate support member 13, a gap is provided. The front chamber holder 10 may have a through hole 10b so that the raw material M leaking into this gap does not stay in the details of the injection chamber 5. The through hole 10b may be a hole through which the raw material M in the gap formed by the front chamber holder 10 and the intermediate support member 13 leaks minimally.

[0020] The rear chamber holder 11 is disposed on the discharge side of the raw material M. The front chamber holder 10 and the rear chamber holder 11 are connected by a fixture (not shown) to keep the inside of the injection chamber 5 airtight. The fixture may be one that arranges irregularities or the like inside the front chamber holder 10 and the rear chamber holder 11 for connection, or one that fixes from the outside.

[0021] The injection chamber 5 has a nozzle holder inside which a sphere 14 into which the raw material M is impacted is housed. The nozzle holder has a protective holder 15 and a sphere holder 16. The protective holder 15 is located on the introduction side of the raw material M. The sphere holder 16 is located on the discharge side of the raw material M. The protective holder 15 and the sphere holder 16 are fitted and fixed inside the front chamber holder 10 and the rear chamber holder 11. The sphere 14 is positioned in the space formed inside the protective holder 15 and the sphere holder 16.

[0022] A nozzle receiving member 17 is positioned behind the spherical holder 16. Within the spherical holder 16, atomization is performed by collision between the raw material M and the spheres 14. Afterward, when discharging the processed raw material M to the discharge port 7, direct discharge would make it difficult to maintain the pressurized state inside the injection chamber 5. Therefore, the processed raw material M is temporarily received within the nozzle receiving member 17. Subsequently, the processed raw material M is discharged from the chamber holder discharge port 11a formed behind the rear chamber holder 11.

[0023] The spherical holder 16 has an outlet on the discharge side that connects to the discharge port 7. As shown in Figure 3, the spherical holder 16 has multiple spherical holder discharge ports (16c, 16d) on the discharge side of the housing groove 16a. If the spherical holder 16 has only one spherical holder discharge port, the spherical holder discharge port may be blocked by the sphere 14. Therefore, it is desirable for the spherical holder 16 to have multiple spherical holder discharge ports (16c, 16d). The spherical holder 16 in this embodiment has a first spherical holder discharge port 16c and a second spherical holder discharge port 16d. The first spherical holder discharge port 16c and the second spherical holder discharge port 16d discharge the processed raw material M to the discharge port 7. For example, when the sphere 14 is fitted into the sphere holder 16, it is preferable to form the outlets (16c, 16d) for each sphere holder at positions separated either above or below the center line L1 of the sphere 14.

[0024] The nozzle receiving member 17 temporarily stores the processed raw material M discharged from the spherical holder discharge ports (16c, 16d) and then discharges it from the discharge port 7. The nozzle receiving member 17 has a nozzle receiving member storage ring 17a and a nozzle receiving member discharge port 17b. The nozzle receiving member storage ring 17a defines a space for temporarily storing the processed raw material M discharged from the spherical holder discharge ports (16c, 16d). The nozzle receiving member discharge port 17b communicates with the discharge port 7 and discharges the processed raw material M stored in the nozzle receiving member storage ring 17a.

[0025] The spheres 14 atomize the raw material M. It is desirable that the spheres 14 have a size that matches the shape of the receiving groove 16a of the sphere holder 16. The size of the spheres 14 is 0.1 to 20 mm, more preferably 10 to 20 mm. To minimize the inclusion of coarse particles and impurities, it is desirable that the material of the spheres 14 be resin or ceramic. The shape of the spheres 14 can be circular, elliptical, etc., and preferably circular. By applying various coatings to the surface of the spheres 14, hardness enhancement and improved wear resistance can be achieved.

[0026] An intermediate support member 13 may be placed between the front chamber holder 10 and the rear chamber holder 11. The intermediate support member 13 secures the nozzle tip 12 and the protective holder 15 while providing cushioning. High-pressure raw material M is ejected from the nozzle tip 12. Therefore, by stably supporting the nozzle tip 12, the atomization performance is stabilized. The nozzle tip 12 is supported by the intermediate support member 13, and the intermediate support member 13 is fixed to the front chamber holder 10, providing a cushioning function while being firmly fixed. In addition, the intermediate support member 13 secures the front chamber holder 10 and the rear chamber holder 11 while providing cushioning.

[0027] The intermediate support member 13 has a recessed portion 15a for accommodating the sphere 14. This shortens the distance between the nozzle tip 12 and the sphere 14. The recessed portion 15a only needs to be large enough to accommodate a portion of the sphere 14.

[0028] The sphere holder 16 has a receiving groove 16a for accommodating the sphere 14. The sphere 14 rotates while supported within the receiving groove 16a, dispersing the collision energy of the raw material M with respect to the sphere 14. The containment groove 16a has a spherical shape. When the raw material M under high pressure collides with the sphere 14, the sphere 14 rotates within the containment groove 16a, and the raw material M is crushed in the gap between the sphere 14 and the containment groove 16a. The containment groove 16a only needs to have a shape that matches the shape of the sphere 14. The containment groove 16a is not limited to a spherical shape, but may also have a curved or polygonal shape.

[0029] As shown in Figures 2 and 3, the depth of the containment groove 16a is shallower than the diameter of the sphere 14. A portion of the sphere 14 protrudes from the containment groove 16a, allowing the sphere 14 to be stably contained within the groove 16a. This enables secondary pulverization of the raw material M by grinding. A portion of the sphere 14 protruding from the housing groove 16a is housed in the recess 15a. This stabilizes the position of the sphere 14. As shown in Figure 3, in a cross-sectional view, the outer circumference line L3 of the sphere 14, starting from the front end of the sphere 14, is located in front of the opening line L4 of the intermediate support member 13. This stabilizes the position of the sphere 14 within the sphere holder 16. In other words, if the housing groove 16a of the sphere holder 16 is deep, the sphere 14 will move unnecessarily inside the housing groove 16a, and the surface of the housing groove 16a and the surface of the sphere 14 will collide more frequently. As a result, the sphere 14 and the housing groove 16a are prone to damage. On the other hand, by positioning the outer circumference line L3 of the sphere 14 in front of the opening line L4 of the intermediate support member 13, the range of movement of the sphere 14 is restricted, and the position of the sphere 14 is stabilized. As a result, the gap between the sphere 14 and the receiving groove 16a stabilizes, and the raw material M passing through the gap is uniformly atomized. The sphere 14 rotates within the receiving groove 16a while protruding from it. This suppresses the sphere 14 from being directly impacted by the high-pressure raw material M, thereby reducing damage caused by collision.

[0030] A protective film 16b for curved sections is formed on the surface of the accommodating groove 16a. This suppresses damage caused by collisions and friction between the sphere 14 and the accommodating groove 16a. The protective film 16b for curved sections is made of a material or film that is harder than the sphere 14. The protective film 16b for curved sections is attached to the surface of the accommodating groove 16a. Furthermore, the configuration is not limited to attaching the protective film 16b for curved sections externally; the atomization of the raw material M may also be promoted by applying dimples or surface roughening to the surface of the receiving groove 16a.

[0031] Similar to the accommodating groove 16a, a protective film or the like may also be formed on the surface of the recessed portion 15a. When a portion of the sphere 14 is contained within the recessed portion 15a, the surface of the accommodating groove 16a and the sphere 14 may come into contact due to the recoil from the high-pressure raw material M colliding with the sphere 14. By forming a protective film on the surface of the recessed portion 15a, damage caused by collision or friction between the recessed portion 15a and the sphere 14 can be suppressed.

[0032] As shown in Figures 4 and 5, the injection chamber 5 may have collision distance adjustment units 11b and 13a. The collision distance adjustment units 11b and 13a adjust the collision distance of the raw material M to the sphere 14 by adjusting the distance between the front chamber holder 10 and the rear chamber holder 11. For example, a recess 13a is formed on the outside of the intermediate support member 13, and a protrusion 11b is formed on the inside of the rear chamber holder 11. By interlocking the recess 13a and the protrusion 11b and adjusting their position in the front-rear direction, the collision distance can be changed. Figure 4 shows the injection chamber 5 with the shortest collision distance. From this state, by adjusting the collision distance adjustment units 13a and 11b, the distance between the front chamber holder 10 and the rear chamber holder 11 increases, as shown in Figure 5, and the collision distance increases.

[0033] Furthermore, if the protective holder 15 and the spherical holder 16 are no longer sealed due to the adjustment of the collision distance, processing cannot be performed within the specified pressure range. For this reason, it is desirable to provide a collision distance adjustment connecting part 18 at the contact point between the protective holder 15 and the spherical holder 16. The collision distance adjustment connecting part 18 can be a connector that extends and retracts in conjunction with the collision distance adjustment parts 13a and 11b, or a connector that extends and retracts independently.

[0034] As shown in Figures 6 and 7, the sphere holder 16 may have a housing section 16e for housing the sphere 14 and eccentric position adjustment sections 16f and 16g. The eccentric position adjustment sections 16f and 16g adjust the collision position of the raw material M with the sphere 14 by adjusting the position of the housing section 16e. For example, by adjusting the eccentric position adjustment section (eccentricity adjustment handle) 16g, the eccentric position of the housing section 16e can be changed vertically. In addition, the sphere holder 16 has an eccentric position adjustment connecting section 16h to prevent the raw material M from entering the housing section 16e as it moves up and down. By making the center line L1 of the sphere 14 and the center line L2 of the intermediate support member 13 eccentric, the sphere 14 rotates within the sphere holder 16. Figure 6 shows a state in which the collision position of the raw material M with respect to the sphere 14 is eccentric. By adjusting the eccentric position adjustment parts 16g and 16h, the position of the sphere 14 placed in the housing part 16e is lowered, as shown in Figure 7.

[0035] The heat exchanger 6 adjusts the temperature so that the raw material M reaches an appropriate temperature after atomization. Many raw materials M can have their physical properties negatively affected if they become too hot. Therefore, it is desirable to adjust the temperature of the raw material M to between 5 and 35°C.

[0036] The discharge port 7 discharges the raw material M that has been processed in the injection chamber 5. If the raw material M is processed only once, the raw material M discharged from the discharge port 7 is stored in a recovery tank (not shown). If the raw material M is processed multiple times, the raw material M discharged from the discharge port 7 is returned to the injection chamber 5, subjected to atomization treatment again, and then the raw material M discharged from the discharge port 7 is stored in a recovery tank (not shown).

[0037] The atomization process in the atomization apparatus 1 of this embodiment will be described below. First, the raw material M to be processed is placed in the raw material tank 2 and adjusted into a slurry. Next, the raw material M in the raw material tank 2 is supplied to the pressurizer 3 by the liquid supply pump P. The supplied raw material M is pressurized by the pressurizer 3. After passing through the high-pressure filter 4, the pressurized raw material M is supplied to the injection chamber 5 and injected. This process may be repeated multiple times.

[0038] Here, the procedure for atomization within the injection chamber 5 will be explained in detail.

[0039] First, the raw material M sprayed from the nozzle tip 12 collides with the sphere 14. This temporarily atomizes the raw material M. Furthermore, the raw material M is sprayed not towards the center of the sphere 14, but at an eccentric position on the sphere 14. As a result, when the raw material M collides with the sphere 14, the sphere 14 rotates within the sphere holder 16. The housing groove 16a of the sphere holder 16 has a curved shape similar to the curved surface of the sphere 14. Therefore, the sphere 14 rotates without excessively colliding with the housing groove 16a. As the sphere 14 rotates, the raw material M is crushed in the gap between the sphere 14 and the housing groove 16a, and is secondarily atomized.

[0040] As stated above, the present invention is not limited to the embodiments described above, and it goes without saying that the present invention can be modified as appropriate without departing from its spirit. [Explanation of Symbols]

[0041] 1 Atomization device 2 Raw material tanks 3. Pressure booster 4. High-pressure filter 5. Injection Chamber 6 Heat exchanger 7 Outlet 10 Front chamber holder 10a Chamber holder inlet 11 Rear chamber holder 11a Chamber holder outlet 11b Collision distance adjustment section (protruding part) 12 nozzle tips 13 Intermediate support member 13a Collision distance adjustment section (recess) 14 spheres 15 Protective holder 15a Recess 16 Sphere holders 16a Retaining groove 16b Protective film for curved parts 16c Discharge port for the first spherical holder 16d Second spherical holder outlet 16e Storage Unit 16f Eccentricity adjustment section (screw part) 16g Eccentric position adjustment part (handle for eccentric adjustment) 16h Connection for eccentric position adjustment 17 Nozzle receiving member 17a Retention ring for nozzle receiving member 17b Discharge port for nozzle receiving member 18 Collision distance adjustment connection part L1 Centerline of the sphere L2 Centerline of the intermediate support member L3 Outer circumference of the sphere L4 Opening line of intermediate support member M Raw material

Claims

1. An injection chamber for processing raw materials, A front chamber holder positioned on the raw material introduction side, A rear chamber holder positioned on the discharge side of the raw material, An injection chamber having, A sphere into which the aforementioned raw materials collide, A protective holder positioned on the raw material introduction side within the injection chamber, A spherical holder positioned on the discharge side of the raw material within the injection chamber, housing the sphere together with the protective holder, and having a spherical housing groove for housing the sphere, wherein the sphere rotates upon impact with the raw material, and the raw material is crushed in the gap between the sphere and the housing groove, A micronizing device having

2. The system further includes an intermediate support member positioned between the front chamber holder and the rear chamber holder. The intermediate support member has a recess for accommodating the sphere, The atomizing apparatus according to claim 1.

3. A protective film for curved sections is formed on the surface of the aforementioned accommodating groove. The atomizing apparatus according to claim 1 or 2.

4. In a cross-sectional view, the outer circumference of the sphere, starting from the front end of the sphere, is located in front of the opening line of the intermediate support member. The atomizing apparatus according to claim 2.

5. The spherical holder further comprises a nozzle receiving member positioned on the rear side of the spherical holder. The atomizing apparatus according to claim 1 or 2.

6. The system further includes a collision distance adjustment unit that adjusts the distance between the front chamber holder and the rear chamber holder, thereby adjusting the collision distance of the raw material with the sphere. The atomizing apparatus according to claim 1 or 2.

7. The sphere holder has a housing portion for housing the sphere, By adjusting the position of the housing, the collision position of the raw material with the sphere is adjusted. It further has a position adjustment unit, The atomizing apparatus according to claim 1 or 2.

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