Cleaning device and method for monitoring the same

Abstract

To provide a cleaning device with a small number of parts, a compact configuration, and a new configuration, and a monitoring method therefor.SOLUTION: A cleaning device includes: a holding unit which holds a cleaning object; a cleaning nozzle which has an injection part of injecting cleaning fluid into the cleaning object held by the holding unit; and a housing chamber which houses the holding unit and the cleaning nozzle. The housing chamber has an air outlet connected to a suction source. The cleaning device includes: a piezoelectric element located adjacent to the air outlet; and a positioning unit which positions the injection part at a cleaning position facing the cleaning object, at an injection pressure detection position facing the piezoelectric element, and at an evacuated position other than the cleaning position and the injection pressure detection position. The piezoelectric element detects the pressure of the cleaning fluid injected from the cleaning nozzle positioned at the injection pressure detection position, and detects at least the pressure of exhaust exhausted from the air outlet during cleaning of the cleaning object.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to a cleaning device for cleaning a workpiece and a monitoring method thereof.

Background Art

[0002] Conventionally, as disclosed in Patent Documents 1 and 2 for example, after machining a plate-shaped workpiece with a cutting device or a laser processing device, a cleaning device is used to clean and remove cutting chips, protective fluid, etc. adhering to the surface of the workpiece.

[0003] The cleaning device is provided with a cleaning nozzle for injecting a cleaning fluid onto the workpiece accommodated in the accommodation chamber, and an exhaust port connected to a suction source through an exhaust duct. During cleaning, contaminated mist (mist containing cleaning fluid, cutting chips, etc.) generated is sucked from the exhaust port and exhausted.

[0004] However, if sufficient exhaust is not achieved due to a failure of the suction source or the like, the contaminated mist may adhere to the object to be cleaned and may contaminate the object to be cleaned. Also, when the supply amount of the cleaning fluid is less than a predetermined value, the object to be cleaned cannot be sufficiently cleaned.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Patent Document 2

Summary of the Invention

Problems to be Solved by the Invention

[0006] In view of the above problems, it has been considered to monitor the exhaust volume of the exhaust duct and the flow rate of the cleaning fluid supplied to the cleaning nozzle.

[0007] In this case, it is necessary to install means to monitor the exhaust volume of the exhaust duct and means to monitor the flow rate of the cleaning fluid in the cleaning nozzle. However, if each of these means is to be installed individually, there are concerns about an increase in the number of parts and an increase in the overall size of the device.

[0008] In view of the above problems, the object of the present invention is to provide a novel cleaning device with a small number of parts and a compact configuration, and a method for monitoring the same. [Means for solving the problem]

[0009] The problems that this invention aims to solve are as described above, and the means for solving these problems will now be explained.

[0010] According to one aspect of the present invention, a cleaning device comprises a holding unit for holding an object to be cleaned, a cleaning nozzle having an injection part for injecting a cleaning fluid onto the object to be cleaned held by the holding unit, and a housing chamber for housing the holding unit and the cleaning nozzle, wherein the housing chamber has an exhaust port connected to a suction source, and the cleaning device comprises a piezoelectric element disposed adjacent to the exhaust port, and a positioning unit for positioning the injection part of the cleaning nozzle at a cleaning position facing the object to be cleaned, an injection pressure detection position facing the piezoelectric element, and a retracted position other than the cleaning position and the injection pressure detection position, wherein the piezoelectric element detects the pressure of the cleaning fluid injected from the cleaning nozzle positioned at the injection pressure detection position, and also detects the pressure of the exhaust gas discharged from the exhaust port at least during the cleaning of the object to be cleaned.

[0011] Furthermore, according to one aspect of the present invention, an abnormality is determined when the exhaust pressure detected by the piezoelectric element is lower than an allowable value.

[0012] Furthermore, according to one aspect of the present invention, an abnormality is determined when the pressure of the cleaning fluid detected by the piezoelectric element is higher than the upper limit allowable value, or when the pressure of the cleaning fluid detected by the piezoelectric element is lower than the lower limit allowable value.

[0013] Furthermore, according to one aspect of the present invention, a warning is issued when an abnormality is detected.

[0014] Furthermore, according to one aspect of the present invention, the holding unit is a spinner table, and the spinner table and Piezoelectric element A cover wall will be provided in between.

[0015] Furthermore, according to one aspect of the present invention, there is a method for monitoring a cleaning apparatus comprising a holding unit for holding an object to be cleaned, a cleaning nozzle having an injection port for spraying a cleaning fluid onto the object to be cleaned held by the holding unit, and a housing chamber for housing the holding unit and the cleaning nozzle, the method comprising the steps of: detecting the pressure of exhaust gas discharged from an exhaust port using a piezoelectric element positioned adjacent to an exhaust port formed in the housing chamber; determining an abnormality based on the detected value from the piezoelectric element; and issuing a warning if an abnormality is determined. [Effects of the Invention]

[0016] The present invention provides the following effects: In other words, according to one aspect of the present invention, a single piezoelectric element can detect the pressure of the mist exhaust and the pressure and flow rate of the cleaning fluid, enabling a small number of parts and a compact configuration. Furthermore, it is possible to calculate the exhaust pressure and the exhaust volume of the exhaust duct from the output of the piezoelectric element and monitor whether the appropriate exhaust pressure and volume are being maintained. It is also possible to calculate the pressure and injection volume of the cleaning fluid from the output of the piezoelectric element and monitor whether the cleaning fluid is being injected at the appropriate pressure and flow rate. [Brief explanation of the drawing]

[0017] [Figure 1] A perspective view showing the configuration of a cleaning device according to one embodiment of the present invention. [Figure 2] A plan view showing the configuration of a cleaning device according to one embodiment of the present invention. [Figure 3] A diagram illustrating the arrangement of the exhaust port and piezoelectric element. [Figure 4] A diagram for explaining the arrangement of the exhaust port and the piezoelectric element. [Figure 5] A diagram for explaining the detection of the pressure of the cleaning fluid. [Figure 6] A diagram for explaining the state where the cleaning nozzle is positioned at the injection pressure detection position. [Figure 7] A flowchart showing an example of the monitoring method. [Figure 8] A diagram for explaining the change in the voltage detected by the piezoelectric element in the exhaust pressure detection step. [Figure 9] A diagram for explaining an example when an injection pressure shortage occurs in the cleaning fluid pressure detection step. [Figure 10] A diagram for explaining an example when the injection pressure is too high in the cleaning fluid pressure detection step. [Figure 11] A diagram for explaining an example when it is confirmed that the injection pressure is within an appropriate range in the cleaning fluid pressure detection step.

Embodiments for Carrying Out the Invention

[0018] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. FIG. 1 is a perspective view of a cleaning apparatus according to the present embodiment, and FIG. 2 is a plan view.

[0019] As shown in FIG. 1, the cleaning apparatus 1 is configured to clean the surface of the object to be cleaned held by the holding unit 3. As shown in FIG. 2, the object to be cleaned W is, for example, a wafer which is a disk-shaped plate-like object. In the object to be cleaned W, a cutting groove S is formed along a division planned line arranged in a lattice shape and is divided into a plurality of device chips C.

[0020] The object to be cleaned W is not particularly limited; for example, it may be a semiconductor wafer on which devices such as ICs and LSIs are formed on a semiconductor substrate such as silicon or gallium arsenide, or it may be an optical device wafer on which optical devices such as LEDs are formed on a sapphire-based inorganic material substrate. It may also be a substrate such as ceramic or glass. The object to be cleaned W shown in Figure 2 is supported by an annular frame F via tape T.

[0021] As shown in Figure 1, the cleaning device 1 has a bottomed cylindrical storage chamber 2 having a cylindrical peripheral wall portion 21 and a bottom wall portion 22. The storage chamber 2 is supported by a plurality of (three in this embodiment) legs 23 extending from the lower surface of the bottom wall portion 22. A holding unit 3 and a cleaning nozzle 4 are housed inside the storage chamber 2. In addition to the cleaning nozzle 4, an air nozzle may be provided to dry the surface of the object to be cleaned W after cleaning.

[0022] As shown in Figures 1 and 2, the holding unit 3 is configured as a high-speed rotating disc-shaped spinner table, and a holding surface 3a made of a porous material is formed on its upper surface. The holding surface 3a is connected to a suction source (not shown), and the object to be cleaned W (Figure 2) is sucked and held via the tape T (Figure 2) by the negative pressure generated on the holding surface 3a.

[0023] As shown in Figures 1 and 2, the side of the holding unit 3 is provided with four pendulum-type clamps 3b, 3b. As shown in Figure 2, the clamps 3b, 3b tilt as the holding unit 3 rotates, clamping and holding the annular frame F.

[0024] As shown in Figure 1, the upper end of the drive shaft 32 of the electric motor 31 is fixed to the lower center of the holding unit 3. The drive shaft 32 extends upward from the electric motor 31 located below the housing chamber 2 and is connected to the holding unit 3 through an opening 22k formed through the center of the bottom wall 22. A cylindrical cover 33 is also provided on the upper end side of the drive shaft 32, which opens downward to cover the opening 22k formed in the bottom wall 22.

[0025] As shown in Figure 1, multiple (three in this embodiment) air cylinders 34 are attached to the outer surface of the electric motor 31. The electric motor 31 is supported by a piston rod 35 via each air cylinder 34, and is driven to move up and down by the extension and retraction of the piston rod 35. In this way, the holding unit 3 is configured to rotate at high speed within the storage chamber 2 by the electric motor 31, and is configured to move up and down between a placement position (up position) where the object to be cleaned W (Figure 2) is placed and a cleaning position (down position) where cleaning is performed, by the multiple air cylinders 34.

[0026] As shown in Figure 1, the cleaning nozzle 4 is configured to have a swivel arm 41 that can rotat above the holding unit 3 and a spray unit 42 located at the tip of the swivel arm 41. As shown in Figure 2, the swivel arm 41 is driven to rotat by a positioning unit 47, and during cleaning, the swivel arm 41 is rotated so that the spray unit 42 moves above the holding surface 3a of the holding unit 3, and cleaning fluid is sprayed from the spray unit 42 toward the object to be cleaned W. When cleaning is not performed, the spray unit 42 is positioned in a retracted position P1 (Figure 2) away from above the holding surface 3a of the holding unit 3.

[0027] As shown in Figure 2, the positioning unit 47 can be configured, for example, with a drive motor that rotates the swivel arm 41 in a horizontal plane, and the spray portion 42 of the cleaning nozzle 4 is positioned at a cleaning position facing the object to be cleaned W, at a spray pressure detection position P2 (Figure 6) facing the piezoelectric element 61 (described later), and at a retracted position P1 (Figure 2) other than the cleaning position and the spray pressure detection position.

[0028] As shown in Figure 1, a drain hose 28 is connected to a drain hole 22a formed in the bottom wall 22 of the containment chamber 2, and the wastewater generated during cleaning is discharged to the outside through the drain hose 28.

[0029] As shown in Figures 1 and 2, the containment chamber 2 has an exhaust port 26 connected to the suction source 27b. In this embodiment, the exhaust port 26 is composed of a circular through-hole formed in the peripheral wall portion 21 of the containment chamber 2. As shown in Figure 1, the exhaust port 26 is connected to the suction source 27b via a control valve 27a provided outside the containment chamber 2. While the cleaning device 1 is in operation, the control valve 27a is always open, and mist, air, etc. are exhausted from inside the containment chamber 2.

[0030] As shown in Figures 3 and 4, a piezoelectric element 61 is provided adjacent to the exhaust port 26. The piezoelectric element 61 can be made of a commercially available thin force sensor using piezoelectric ceramics such as barium titanate, lead zirconate titanate, or lithium tantalate, and can be installed covered with a waterproof film or similar cover. The piezoelectric element outputs a negative voltage when compressed, resulting in a voltage lower than the reference voltage, and conversely, a positive voltage is output when the compression is released. Thus, with a piezoelectric element, the higher the detected pressure, the lower the voltage (negative voltage) output, and the lower the detected pressure, the higher the voltage (positive voltage) output.

[0031] As shown in Figures 3 and 4, the piezoelectric element 61 is mounted on the upper surface of a support plate 24 that protrudes horizontally from the inner wall surface 21a of the peripheral wall portion 21, and is positioned so that the pressure-sensitive surface 61a formed on the upper surface of the piezoelectric element 61 is exposed upwards and is horizontal. As shown in Figure 4, the pressure-sensitive surface 61a is positioned so that it is within the range of the opening of the exhaust port 26 in a side view.

[0032] As shown in Figures 3 and 4, the support plate 24 has a front wall portion 25a that is positioned opposite the exhaust port 26 with the piezoelectric element 61 in between, and a side wall portion 25b that is continuous with one end of the front wall portion 25a and fills the gap between the front wall portion 25a and the inner wall surface 21a. In this embodiment, the front wall portion 25a and the side wall portion 25b form a cover wall 25 that is substantially L-shaped in plan view, and a sensor housing space 29 is formed surrounded by this cover wall 25 (front wall portion 25a, side wall portion 25b), the support plate 24, and the inner wall surface 21a of the peripheral wall portion 21.

[0033] As shown in Figures 3 and 4, the side wall portion 25b of the cover wall 25 is positioned upstream of the holding unit 3 (Figure 2) in the rotational direction L on the front wall portion 25a, and the upstream side of the sensor housing space 29 is closed by the side wall portion 25b. On the other hand, the downstream side of the front wall portion 25a is open to form the suction passage 25c.

[0034] With the above configuration, the holding unit 3, which is composed of a spinner table, Piezoelectric element 61 A cover wall 25 is formed between them, and the airflow generated when the holding unit 3 (Figure 2) rotates in the rotational direction L is blocked by the cover wall 25 (side wall portion 25b), preventing the airflow from entering the sensor housing space 29. This prevents the measured value of the piezoelectric element 61 from fluctuating due to the influence of airflow.

[0035] On the other hand, as shown in Figures 3 and 4, mist M floating inside the containment chamber 2 is drawn in through the suction passage 25c by the negative pressure in the sensor containment space 29 and discharged to the outside of the containment chamber 2 through the exhaust port 26.

[0036] The piezoelectric element 61 constantly detects the pressure of the exhaust gas flowing into the exhaust port 26 through the sensor housing space 29, and the detected pressure is monitored by the controller 80.

[0037] As shown in Figure 5, the spray section 42 of the cleaning nozzle 4 is equipped with a fluid spray nozzle 44 and an air nozzle 46. The fluid spray nozzle 44 is connected to an air supply source 71 and a liquid supply source 72, and a cleaning fluid 45 (two fluids) made by mixing air and liquid (cleaning fluid such as pure water) is sprayed from the fluid spray nozzle 44, and the surface of the object to be cleaned is cleaned by the cleaning fluid 45.

[0038] In Figure 5, the cleaning nozzle 4 is positioned at the injection pressure detection position P2, and the fluid injection nozzle 44 is positioned to face the piezoelectric element 61. When cleaning fluid 45 is injected from the fluid injection nozzle 44 toward the piezoelectric element 61, the piezoelectric element 61 detects the pressure of the cleaning fluid 45 (cleaning pressure), and the detected pressure is monitored by the controller 80.

[0039] As shown in Figure 5, the air nozzle 46 is connected to the air supply source 73, and dry air is ejected from the air nozzle 46 to dry the surface of the object to be cleaned after washing.

[0040] In addition, in the above configuration, the upper part of the sensor housing space 29 is left open. Alternatively, an upper cover may be provided to cover the upper part of the sensor housing space 29, leaving only the suction passage 25c open. In this case, a mechanism is provided to open the upper cover when detecting the pressure of the cleaning fluid 45, exposing the piezoelectric element 61.

[0041] In the above configuration, monitoring can be performed as follows. Figure 7 is a flowchart showing an example of a monitoring method.

[0042] <Exhaust pressure detection step> As shown in Figure 4, the piezoelectric element 61 is used to detect the pressure of the exhaust gas discharged from the exhaust port 26 during the cleaning of the object to be cleaned.

[0043] This allows monitoring whether mist is being properly exhausted through the exhaust port 26. The exhaust pressure detection step is performed continuously, except during the cleaning fluid pressure detection step, or it may be performed at any time.

[0044] <Step for detecting the pressure of the cleaning fluid> As shown in Figures 5 and 6, this step involves detecting the pressure of the cleaning fluid 45 being sprayed from the cleaning nozzle 4 located at the spray pressure detection position P2.

[0045] As a result, as shown in Figure 5, it is possible to monitor whether cleaning fluid 45 at a predetermined pressure is being properly sprayed from the cleaning nozzle 4 (fluid injection nozzle 44). The step of detecting the pressure of the cleaning fluid is performed before cleaning the object to be cleaned, or after each cleaning of the object to be cleaned, or after a predetermined number of cleaning cycles or time has elapsed, or at any arbitrary timing.

[0046] <Anomaly detection step> This step involves determining an abnormality based on the detected value detected by the piezoelectric element 61.

[0047] The controller 80 (Figure 5) in Figure 8 refers to predetermined allowable values ​​(upper and lower limits) and determines an abnormality if the exhaust pressure detected by the piezoelectric element is lower than the allowable value.

[0048] Figure 8 shows an example of a graph of the voltage detected by the piezoelectric element during the exhaust pressure detection step, and the time change of the exhaust pressure calculated based on this voltage. In the vertical axis of Figure 8, the voltage detected from the piezoelectric element is negative at the top and positive at the bottom, and the exhaust pressure is high at the top and low at the bottom.

[0049] When the exhaust pressure detection step is performed, the controller (Figure 5) refers to a preset upper limit tolerance J1 and lower limit tolerance K1, calculates the exhaust pressure based on the output of the piezoelectric element, and makes an abnormality determination when the exhaust pressure falls below the upper limit tolerance J1 and further falls below the lower limit tolerance K1 after a predetermined time T1 has elapsed. In this example, the pressure of the mist discharged from the exhaust port 26 is too low, causing the exhaust pressure calculated based on the voltage output by the piezoelectric element to fall below the lower limit tolerance K1, resulting in an abnormality determination that sufficient exhaust is not being performed.

[0050] For example, in the configuration shown in Figure 1, if the exhaust port 26 becomes clogged, the path leading to the control valve 27a or suction source 27b becomes clogged, or if there is a malfunction in the control valve 27a or suction source 27b, the behavior shown in Figure 8 will be observed, and an abnormality will be detected.

[0051] As shown in Figures 9 to 11, the controller 80 (Figure 5) is Referencing predetermined tolerance values ​​(upper limit tolerance, lower limit tolerance), If the pressure of the cleaning fluid detected by the piezoelectric element is higher than the upper limit of the permissible value, Or, If the pressure of the cleaning fluid detected by the piezoelectric element is lower than the lower limit allowable value, This is what determines that it is abnormal.

[0052] Figures 9 to 11 show examples of graphs of the voltage detected by the piezoelectric element during the cleaning fluid pressure detection step and the time change of the cleaning fluid pressure calculated based on this voltage, illustrating that different detections are performed in each of the figures 9 to 11. In the vertical axes of Figures 9 to 11, the voltage detected from the piezoelectric element is negative at the top and positive at the bottom, and the pressure of the cleaning fluid is high at the top and low at the bottom.

[0053] As shown in Figure 9, when the cleaning fluid pressure detection step is performed, the controller (Figure 5) refers to the preset upper limit tolerance J2 and lower limit tolerance K2, and as shown in Graph D1, if the cleaning fluid pressure calculated based on the voltage is lower than the lower limit tolerance K2, it is determined to be an abnormality due to insufficient injection pressure.

[0054] Furthermore, as shown in graph D2 of Figure 10, if the pressure of the cleaning fluid calculated based on the voltage is higher than the upper limit allowable value J2, it is determined to be an abnormality due to excessive injection pressure.

[0055] On the other hand, as shown in graph D3 of Figure 11, if the fluid pressure falls between the upper limit tolerance J2 and the lower limit tolerance K2, it is confirmed that the injection pressure is within the appropriate range, and no abnormality is detected, as the appropriate injection pressure is ensured.

[0056] For example, in the configuration shown in Figure 5, if the fluid injection nozzle 44 becomes clogged and abnormalities occur such as the pressure of the cleaning fluid 45 being too low or the flow rate being too low, the behavior shown in graph D1 in Figure 9 will be checked and an abnormality will be detected.

[0057] Figures 9 to 11 show that when the cleaning fluid pressure detection step is performed, the voltage drops sharply (pressure rises sharply) as the cleaning fluid is injected into the piezoelectric element.

[0058] Furthermore, as described above, the upper limit tolerance J1 and lower limit tolerance K1 shown in Figure 8 are referenced as criteria values ​​for abnormality determination when the exhaust pressure detection step is performed, and the upper limit tolerance J2 and lower limit tolerance K2 shown in Figures 9 to 11 are referenced as criteria values ​​for abnormality determination when the cleaning fluid pressure detection step is performed, with each tolerance value being set to a different value.

[0059] <Warning Step> This step involves issuing a warning when an abnormality is detected. Specifically, when the controller (Figure 5) detects an abnormality, it sends a warning signal, emits a warning sound from a speaker (not shown), illuminates a warning light (not shown), or displays an abnormality on a monitor (not shown).

[0060] This allows the operator to recognize abnormalities and address problems such as poor exhaust due to a drop in exhaust pressure and the resulting risk of mist adhering to the workpiece, insufficient cleaning due to a drop in cleaning fluid pressure, or excessive cleaning due to an increase in cleaning fluid pressure or excessive flow rate. The controller (Figure 5) may also be configured to automatically shut down the device simultaneously with issuing a warning.

[0061] As described above, according to the present invention, the pressure of the mist exhaust and the pressure and flow rate of the cleaning fluid can be detected by a single piezoelectric element, resulting in a smaller number of parts and a more compact configuration.

[0062] Furthermore, as shown in Figure 8, for example, it is possible to calculate the exhaust pressure and exhaust volume of the exhaust duct from the output of the piezoelectric element and monitor whether the appropriate exhaust pressure and volume are being maintained. Also, as shown in Figures 9 to 11, for example, it is possible to calculate the pressure of the cleaning fluid and the amount of cleaning fluid injected from the output of the piezoelectric element and monitor whether cleaning fluid at the appropriate pressure and flow rate is being injected. [Explanation of symbols]

[0063] 1. Washing device 2 containment chambers 3. Holding Unit 3a Holding surface 3b Clamp 4. Cleaning nozzle 21 Peripheral wall section 21a Inner wall surface 24 Support plate 25 Cover wall 25a Front wall 25b Side wall part 25c suction path 26 Exhaust vents 29 Sensor housing space 41 Swivel Arm 42 Injection part 44 Fluid injection nozzles 45 Cleaning fluid 46 Air Nozzles 61 Piezoelectric element 61a Pressure-sensitive surface 80 Controller C device chip F Circular Frame L Rotation direction M Mist S cutting groove T Tape W Items to be washed

Claims

1. A holding unit for holding the object to be cleaned, A cleaning nozzle having a spray section for spraying cleaning fluid onto an object to be cleaned held by the holding unit, A housing chamber that houses the holding unit and the cleaning nozzle, A cleaning device equipped with, The containment chamber has an exhaust port connected to a suction source. The cleaning device is A piezoelectric element is disposed adjacent to the exhaust port, The cleaning nozzle comprises a positioning unit that positions the spray portion of the cleaning nozzle in a cleaning position facing the object to be cleaned, a spray pressure detection position facing the piezoelectric element, and a retracted position other than the cleaning position and the spray pressure detection position. The piezoelectric element detects the pressure of the cleaning fluid ejected from the cleaning nozzle positioned at the injection pressure detection position, At least the pressure of the exhaust gas discharged from the exhaust port during the cleaning of the object being cleaned is detected. Washing device.

2. An abnormality is determined when the exhaust pressure detected by the piezoelectric element is lower than the allowable value. The cleaning apparatus according to feature 1.

3. If the pressure of the cleaning fluid detected by the piezoelectric element is higher than the upper limit allowable value, Or, If the pressure of the cleaning fluid detected by the piezoelectric element is lower than the lower limit allowable value, It is determined to be abnormal. The cleaning apparatus according to claim 1 or 2.

4. When an abnormality is detected, a warning is issued. The cleaning apparatus according to feature 2.

5. When an abnormality is detected, a warning is issued. The cleaning apparatus according to feature 3.

6. The holding unit is a spinner table, A cover wall is provided between the spinner table and the piezoelectric element. The cleaning apparatus according to claim 1 or 2.

7. The holding unit is a spinner table, A cover wall is provided between the spinner table and the piezoelectric element. The cleaning apparatus according to feature 3.

8. When an abnormality is detected, a warning is issued. The cleaning apparatus according to feature 6.

9. When an abnormality is detected, a warning is issued. The cleaning apparatus according to feature 7.

10. A holding unit for holding the object to be cleaned, A cleaning nozzle having an injection port for spraying cleaning fluid onto an object to be cleaned held by the holding unit, and a housing chamber that houses the holding unit and the cleaning nozzle, A method for monitoring a cleaning device, comprising: A piezoelectric element positioned adjacent to the exhaust port formed in the containment chamber is used to detect the pressure of the exhaust gas being discharged from the exhaust port. The steps include: determining an abnormality based on the detected value detected by the piezoelectric element; A step to issue a warning if an abnormality is detected, A method for monitoring a cleaning device, including the monitoring of the cleaning device.

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