Layout analysis apparatus and layout analysis method

Abstract

A layout analysis device (2) generates information indicating the result of analyzing a layout including a plurality of sets of equipment (E). The layout analysis device comprises a storage unit (21) that stores a first layout indicating the arrangement of the plurality of sets of equipment, and a control unit (20) that acquires a second layout calculated from the first layout by numerical calculation for optimizing the arrangement of the plurality of sets of equipment. The control unit compares the first layout with the second layout to specify a characteristic part of the second layout and generates analysis information indicating a relationship between optimization and at least one of the specified part of the second layout and a part of the first layout corresponding to the specified part.

Description

[Technical Field]

[0001] This disclosure relates to a layout analysis apparatus and a layout analysis method. [Background technology]

[0002] Patent Document 1 discloses a placement optimization system that performs analysis on the placement of multiple placement targets. The database server in the placement optimization system stores a work performance table showing the placement target, actual placement location, and actual work time for each task, as well as location information showing multiple placement locations where the placement target can be placed. The analysis server in the placement optimization system acquires an interaction search policy that includes multiple interaction occurrence patterns that affect the work time required for the task, and generates a placement plan that shows proposed placement locations for the placement target based on the work performance information, location information, and interaction search policy. The purpose of Patent Document 1 is to provide a placement optimization system that can improve work efficiency. [Prior art documents] [Patent Documents]

[0003] [Patent Document 1] Japanese Patent Publication No. 2020-119166 [Overview of the Initiative] [Problems that the invention aims to solve]

[0004] This disclosure provides a layout analysis device and a layout analysis method that make it easier for users to analyze layouts in which the arrangement of equipment is optimized. [Means for solving the problem]

[0005] The layout analysis device in this disclosure generates information showing the results of an analysis of the layout of multiple pieces of equipment. The layout analysis device comprises a storage unit that stores a first layout showing the arrangement of multiple pieces of equipment, and a control unit that acquires a second layout calculated by numerical calculation to optimize the arrangement of multiple pieces of equipment from the first layout. The control unit identifies characteristic parts in the second layout compared to the first layout, and generates analysis information showing the relationship between the identified parts in the second layout and at least one of the parts corresponding to the identified parts in the first layout and the optimization.

[0006] These general and specific embodiments may be implemented by systems, methods, and computer programs, or combinations thereof. [Effects of the Invention]

[0007] According to the layout analysis apparatus and layout analysis method described herein, it is possible to make it easier for users to analyze layouts in which the arrangement of equipment is optimized. [Brief explanation of the drawing]

[0008] [Figure 1] A diagram showing an overview of the movement flow analysis system according to Embodiment 1 of this disclosure. [Figure 2] Block diagram illustrating the configuration of the layout analysis device in Embodiment 1. [Figure 3] A diagram illustrating the general operation of the layout analysis device. [Figure 4] Flowchart for explaining the operation of the layout analysis device [Figure 5] A diagram illustrating the graph information in a layout analysis device. [Figure 6] A diagram showing an example of a display in a layout analysis device. [Figure 7] A flowchart illustrating the layout optimization process in a layout analysis device. [Figure 8] A diagram illustrating map graph information in layout optimization processing. [Figure 9] Flowchart exemplifying the analysis process of partial structures in a layout analyzer [Figure 10] Diagram for explaining the analysis process of partial structures in a layout analyzer [Figure 11] Diagram exemplifying the centrality table of the current layout in a layout analyzer [Figure 12] Flowchart exemplifying the analysis process of centrality metrics in a layout analyzer [Figure 13] Diagram exemplifying the centrality table of the current layout in a layout analyzer

Embodiments for Carrying Out the Invention

[0009] Hereinafter, embodiments will be described in detail with reference to the drawings as appropriate. However, detailed descriptions that are more than necessary may be omitted. For example, detailed descriptions of well-known matters and redundant descriptions of substantially the same configurations may be omitted. This is to avoid making the following description unnecessarily redundant and to facilitate the understanding of those skilled in the art.

[0010] Note that the applicant provides the accompanying drawings and the following description for those skilled in the art to fully understand the present disclosure, and does not intend to limit the subject matter described in the claims by these.

[0011] (Embodiment 1) Hereinafter, Embodiment 1 of the present disclosure will be described with reference to the drawings.

[0012] 1. Configuration A system using the layout analyzer according to Embodiment 1 will be described with reference to FIG. 1.

[0013] 1-1. System Overview Figure 1 shows an overview of the movement flow analysis system 1 according to this embodiment. The system 1 comprises, for example, a camera 11, a movement flow management server 12, and a layout analysis device 2, as shown in Figure 1. The system 1 is applied to a workplace 10 equipped with various facilities, such as a factory, logistics warehouse, or store.

[0014] In this embodiment, the movement analysis system 1 stores information such as the trajectory, i.e., movement path, of one or more workers W in a workplace 10 that includes multiple pieces of equipment E, for analysis purposes. This system 1 can be applied to data analysis, for example, by a user 15 such as a manager or analyst of the workplace 10, to analyze the layout in which each piece of equipment E is arranged in the workplace 10, from the viewpoint of improving the efficiency of work performed by workers W. Each part of this system 1 is connected to a communication network 13 such as a LAN, WAN, or the Internet, and is capable of data communication.

[0015] In this system 1, the camera 11 is positioned, for example, in the workspace 10 so as to capture an area including each piece of equipment E. The camera 11 is connected to the movement management server 12 via a communication network 13 so as to be able to transmit the image data of the workspace 10. The camera 11 may be, for example, an omnidirectional camera or a box camera. Furthermore, this system 1 may include multiple cameras 11.

[0016] The movement management server 12 is a server device equipped with a storage unit that stores and manages information such as image data from the camera 11 and movement data D1 indicating various movement routes based on the image data.

[0017] The layout analysis device 2 according to this embodiment presents information for analysis by the user 15 from the accumulated information such as movement data D1 in the system 1. The layout analysis device 2 is composed of an information processing device such as a PC (personal computer). The configuration of the layout analysis device 2 will be explained with reference to Figure 2.

[0018] 1-2. Configuration of the layout analysis device Figure 2 is a block diagram illustrating the configuration of the layout analysis device 2. The layout analysis device 2 illustrated in Figure 2 comprises a control unit 20, a storage unit 21, an operation unit 22, a display unit 23, a device interface 24, and a network interface 25. Hereinafter, interfaces will be abbreviated as "I / F".

[0019] The control unit 20 includes, for example, a CPU or MPU that works in cooperation with software to realize predetermined functions. The control unit 20 controls, for example, the overall operation of the layout analysis device 2. The control unit 20 reads data and programs stored in the storage unit 21, performs various calculations, and realizes various functions.

[0020] The control unit 20 executes a program that includes a set of instructions for realizing each of the above functions. This program may be provided from the communication network 13 or stored on a portable recording medium. The control unit 20 may also be a dedicated electronic circuit or a hardware circuit such as a reconfigurable electronic circuit designed to realize each of the above functions. The control unit 20 may be composed of various semiconductor integrated circuits such as a CPU, MPU, GPU, GPGPU, TPU, microcontroller, DSP, FPGA, and ASIC.

[0021] The memory unit 21 is a storage medium that stores the programs and data necessary to realize the functions of the layout analysis device 2. As shown in Figure 2, the memory unit 21 includes a storage unit 21a and a temporary storage unit 21b.

[0022] The storage unit 21a stores parameters, data, and control programs for realizing predetermined functions. The storage unit 21a is composed of, for example, an HDD or an SSD. For example, the storage unit 21a stores the above-mentioned programs and map information D2. The map information D2 shows the arrangement of each piece of equipment E in the workplace 10, for example, in a predetermined coordinate system.

[0023] The temporary storage unit 21b is composed of RAM such as DRAM or SRAM, and temporarily stores (i.e., holds) data. For example, the temporary storage unit 21b holds movement data D1 received from the movement management server 12 (Figure 1). The temporary storage unit 21b may also function as a work area for the control unit 20, or it may be composed of a storage area in the internal memory of the control unit 20.

[0024] The operation unit 22 is a general term for the operating components that the user operates. The operation unit 22 may be, for example, a keyboard, mouse, touchpad, touch panel, buttons, and switches. The operation unit 22 is an example of an acquisition unit that acquires various information input by the user's operation.

[0025] The display unit 23 is an example of an output unit, which may be composed of, for example, a liquid crystal display or an organic EL display. The display unit 23 may display various types of information, such as various icons for operating the operation unit 22 and information input from the operation unit 22.

[0026] The device interface 24 is a circuit for connecting external devices to the layout analysis device 2. The device interface 24 communicates according to a predetermined communication standard. The predetermined standard includes USB, HDMI (registered trademark), IEEE1394, WiFi, Bluetooth, etc. The device interface 24 may constitute an acquisition unit that receives various information from external devices or an output unit that transmits various information to external devices in the layout analysis device 2.

[0027] The network interface 25 is a circuit for connecting the layout analysis device 2 to the communication network 13 via a wireless or wired communication line. The network interface 25 performs communication in accordance with a predetermined communication standard. The predetermined communication standard includes communication standards such as IEEE 802.3, IEEE 802.11a / 11b / 11g / 11ac, etc. The network interface 25 may constitute an acquisition unit that receives various information or an output unit that transmits information via the communication network 13 in the layout analysis device 2.

[0028] The configuration of the layout analysis device 2 described above is just one example, and the configuration of the layout analysis device 2 is not limited to this. For example, the layout analysis device 2 may be composed of various computers, including a server device. The layout analysis device 2 may also be configured integrally with the traffic flow management server 12.

[0029] Furthermore, the acquisition unit in the layout analysis device 2 may be implemented through cooperation with various software in the control unit 20, etc. The acquisition unit in the layout analysis device 2 may acquire various information by reading various information stored in various storage media (e.g., storage unit 21a) into the work area of ​​the control unit 20 (e.g., temporary storage unit 21b).

[0030] Furthermore, the display unit 23 of the layout analysis device 2 may utilize various display devices such as a projector and a head-mounted display. Additionally, if an external display device is used, the display unit 23 of the layout analysis device 2 may be an output interface circuit for video signals compliant with standards such as HDMI.

[0031] 2. Operation The operation of the movement flow analysis system 1 and layout analysis device 2, which are configured as described above, will be explained below.

[0032] In the movement flow analysis system 1 of this embodiment (Figure 1), for example, camera 11 sequentially captures images of the work area 10 frame by frame and transmits the captured data to the movement flow management server 12. The movement flow management server 12 performs image recognition to recognize the position of worker W in the captured images for each frame shown by the captured data from camera 11 and generates movement flow data D1. The movement flow management server 12 accumulates the movement flow data D1 by sequentially storing the generated movement flow data D1 in the storage unit.

[0033] The layout analysis device 2 of this embodiment performs a numerical calculation simulation to optimize the layout in which each piece of equipment E is placed in the workspace 10 under predetermined optimization conditions, based on the movement data D1 accumulated as described above. The optimization condition is, for example, to minimize the total distance traveled by the worker W between multiple pieces of equipment E in the movement data D1.

[0034] 2-1. Overview of Operation The operation of the layout analysis device 2 in this embodiment will be explained using Figure 3.

[0035] Figure 3(A) illustrates map information D2 showing the current layout when movement data D1 is accumulated in this system 1. The current layout is an example of a first layout targeted for layout optimization by the layout analysis device 2. The current layout shows the positional relationship in which multiple pieces of equipment E1 to E7 were actually placed in the workspace 10. Hereinafter, the collective term for equipment E1 to E7 will be equipment E. Although Figure 3 illustrates seven pieces of equipment E1 to E7, the number of pieces of equipment E in the workspace 10 is not particularly limited and may be eight or more, or six or less.

[0036] The current layout illustrated in Figure 3(A) includes a regular arrangement where equipment E3, E4, and E5 are adjacent to equipment E7 and aligned with each other. Such current layouts may be constructed based on rules of thumb used by workers W or operators of the workshop 10.

[0037] Figure 3(B) illustrates the map information D2a of the optimal layout in the layout analysis device 2. The optimal layout is an example of a second layout generated as a result of numerical simulation processing of layout optimization by the layout analysis device 2. In the optimal layout illustrated in Figure 3(B), the arrangement of equipment E1 to E7, which is the same as in the current layout in Figure 3(A), has been changed, and the regular arrangement of equipment E3 to E7 described above has been eliminated. Such an optimal layout may appear to be a chaotic arrangement at first glance. The inventors of this application have identified the problems that arise from diligently studying numerical simulations of such layout optimization.

[0038] In other words, the optimal layout is obtained as a result of the comprehensive adjustment of the placement of multiple pieces of equipment E1 to E7 in a numerical simulation of layout optimization. The inventors of this invention found a problem with the conventional technology in that the causal relationships—such as which parts of the optimal layout contribute what benefits and how they improve the on-site layout—were unclear. Specifically, the conventional technology presented a new problem: for example, when a user 15 proposes an optimal layout to the operator of the workshop 10, it is difficult to make a persuasive proposal, and it is difficult to propose partial implementation when the entire optimal layout cannot be implemented.

[0039] Therefore, the layout analysis device 2 of this embodiment compares the optimal layout with the current layout and presents information that allows users to understand which parts of the optimal layout have what kind of effect. This makes it easier for users 15 to analyze the optimal layout and provides useful information when users 15 propose the optimal layout. The operation of the layout analysis device 2 of this embodiment will be described in detail below.

[0040] 2-2. Overall Operation The overall operation of the layout analysis device 2 of this embodiment will be explained using Figures 4 to 6. In the layout analysis device 2 of this embodiment, the above-mentioned information is presented by data analysis using graph theory.

[0041] Figure 4 is a flowchart illustrating the operation of the layout analysis device 2. Figure 5 is a diagram illustrating the graph information G1 and G2 in the layout analysis device 2. Figure 6 shows an example of the display in the layout analysis device 2. The process shown in the flowchart of Figure 4 is started, for example, when the map information D2 of the current layout is stored in the storage unit 21 of the layout analysis device 2, and is executed by the control unit 20.

[0042] First, the control unit 20 of the layout analysis device 2 acquires movement data D1 from, for example, the movement management server 12 via the network interface 25 (S1). The acquisition of movement data D1 is not limited to the above; for example, the control unit 20 of the layout analysis device 2 may extract movement data from the image data of the camera 11. Alternatively, the user 15 may input movement data D1 stored on a portable recording medium to the layout analysis device 2.

[0043] Next, the control unit 20 performs a numerical simulation of layout optimization based on the acquired movement data D1 and the current layout map information D2 to calculate the optimal layout, i.e., performs layout optimization processing (S2). In this embodiment, an algorithm is employed that enables layout optimization of equipment E1 to E7, which are of different sizes, by equally dividing the area in the map information D2 where multiple pieces of equipment E1 to E7 are arranged. In step S2, the characteristics of the current layout are analyzed using graph theory. Details of the processing in step S2 will be described later.

[0044] Figure 5(A) illustrates the graph information G1 of the current layout obtained in step S2. Figure 5(B) illustrates the graph information G2 of the optimal layout. Graph information G1 and G2 show the characteristics of the layout of the equipment E according to graph theory. Graph information G1 and G2 for each layout include nodes Gn representing each piece of equipment E and edges Ge connecting the two nodes Gn. Each edge Ge shows the characteristics of the movement of the worker W between the two corresponding pieces of equipment E. For example, in Figure 5, edges Ge shown as solid lines indicate relatively short travel distances, and edges Ge shown as dashed lines indicate relatively long travel distances.

[0045] The control unit 20 performs a process (S3) to analyze the structure of characteristic parts in the graph information G2 of the optimal layout, based on the calculation results of the layout optimization process (S2). In the substructure analysis process (S3), characteristic substructures P10, P11, and P12 are extracted from the graph information G2 of the optimal layout using the information obtained during the calculation in the layout optimization process (S2). In Figure 5(A), the locations P13 and P14 corresponding to the substructures P11 and P12 of the optimal layout are shown in the graph information G1 of the current layout, along with the substructure P10 common to all layouts.

[0046] As described above, among the substructures P10 to P12 extracted from the graph information G2 of the optimal layout, substructures P11 and P12 that are not present in the graph information G1 of the current layout are considered to indicate factors that improved the optimal layout from the current layout. On the other hand, substructure P10, which is common to both the optimal layout and the current layout, is considered to be a point that should be evaluated as good in the current layout. Details of the processing in step S3 will be described later.

[0047] Furthermore, the control unit 20 performs a process to analyze the centrality index in the graph information G2 of the optimal layout from the perspective of comparison with the current layout (S4). The centrality index is an index that shows the central features in the graph information G2. In the centrality index analysis process (S4) of this embodiment, PageRank and proximity centrality are used as the centrality index.

[0048] In step S4 of this embodiment, the degree to which worker W can easily access equipment that functions as a hub for worker W to move between equipment E1 to E7 and access a desired equipment E in the workplace 10 is quantitatively evaluated using the above centrality index. PageRank is an example of a centrality index used in this embodiment to measure the degree to which each piece of equipment E in the workplace 10 is assumed to be a hub piece of equipment. Proximity centrality is an example of a centrality index used in this embodiment to measure the ease with which worker W can access each piece of equipment E in various layouts of the workplace 10. Details of the processing in step S4 will be described later.

[0049] Next, the control unit 20 controls the display unit 23 to display information showing the analysis results comparing the current layout with the optimal layout, based on the information obtained from the partial structure analysis process (S3) and the centrality index analysis process (S4) (S5). An example of the display of the layout analysis device 2 in step S5 is shown in Figure 6.

[0050] In the example shown in Figure 6, the display unit 23 displays an analysis screen where the map information D2 of the current layout and the map information D2a of the optimal layout are displayed side by side. Based on the processing results of the partial structure analysis process (S3), the control unit 20 displays improvement factor lines L1, L2, bottleneck factor lines L3, L4, and evaluation line L5 on the analysis screen of the display unit 23 (S5). In addition, based on the processing results of the centrality index analysis process (S4), the control unit 20 displays hub equipment messages M1, M2 on the above analysis screen (S5).

[0051] The control unit 20 terminates the process shown in this flowchart upon displaying this analysis screen (S5).

[0052] Through the above process, the layout analysis device 2 uses graph theory-based data analysis to compare the current layout with the optimal layout (S3, S4), generating information that allows users to understand which parts of the optimal layout have what kind of effect, and displays it on the analysis screen (S5). The various lines L1 to L5 and messages M1 and M2 displayed on the analysis screen are examples of analysis information that, in this embodiment, suggest the causal relationship between the corresponding parts in the optimal layout or the current layout and the layout optimization.

[0053] For example, in the analysis screen illustrated in Figure 6, the hub equipment messages M1 and M2 indicate that the hub equipment in the workspace 10 is equipment E7, and that the proximity centrality of hub equipment E7 has improved from a value of "7.0" in the current layout to a value of "8.4" in the optimal layout. As shown in these hub equipment messages M1 and M2, the user 15 can quantitatively understand the degree to which the ease of access to hub equipment E7 improves in the optimal layout based on the results of the centrality index analysis process (S4).

[0054] Furthermore, in the example shown in Figure 6, for example, improvement factor lines L1 and L2 indicate that in the optimal layout, the travel distance between equipment E3 and E5 and hub equipment E7 is relatively short, respectively. Bottleneck factor lines L3 and L4 indicate that in the current layout, the travel distance between equipment E3 and E5 and hub equipment E7 is relatively long, respectively. Evaluation line L5 indicates that in both the current layout and the optimal layout, the travel distance between equipment E6 and hub equipment E7 is relatively short.

[0055] According to the bottleneck factor lines L3 and L4 above, the current layout, with its adjacent placement of equipment E3 and E5 and hub equipment E7, actually necessitates workers W having to go around when moving. In contrast, according to the improvement factor lines L1 and L2, the optimal layout creates a passageway by spacing out equipment E3 and E5 and hub equipment E7, eliminating the need for workers to go around as in the current layout.

[0056] Based on the analysis process of these substructures (S3) for each line L1 to L5, user 15 can understand that the portion of the optimal layout with a gap between equipment E7 and equipment E3, E5, and E6 from the initial layout can improve the ease of movement for worker W. User 15 can then make a persuasive proposal, for example, by presenting factors for improving the optimal layout. Furthermore, in the example shown in Figure 6, even if adopting the entire optimal layout is difficult, it becomes possible to propose a partial layout, such as placing a gap between equipment E3 and E5 and hub equipment E7.

[0057] 2-2-1. Layout Optimization Process The layout optimization process in step S2 of Figure 4 will be explained using Figures 7 and 8.

[0058] Figure 7 is a flowchart illustrating the layout optimization process (S2) in the layout analysis device 2. Figure 8 is a diagram illustrating the map graph information G5 in the layout optimization process (S2). The map graph information G5 is graph information for treating each facility E1 to E7 as equally divided.

[0059] First, the control unit 20 sets the map graph information G5 based on the map information D2 of the current layout (S11). Figure 8 shows an example of the map graph information G5 in step S11.

[0060] Figure 8 illustrates map graph information G5 corresponding to map information D2 of the current layout illustrated in Figure 3(A). Map graph information G5 includes multiple equipment nodes G51, multiple passage nodes G52, and multiple movement edges G53. Hereinafter, equipment nodes G51 and passage nodes G52 are collectively referred to as "divided nodes G50".

[0061] The division nodes G50 are arranged at predetermined intervals to equally divide the area in the coordinate system (x,y) corresponding to the map information D2. The equipment nodes G51 are nodes located within the area where equipment E is located in the map information D2. Equipment nodes G51 are managed to identify individual equipment E1 to E7. The passage nodes G52 are nodes located in passages where there is no equipment E in the map information D2.

[0062] The predetermined pitch of the division node G50 is set from the perspective of representing each facility E1 to E7 in the map information D2 with an integer number of facility nodes G51, and is set, for example, by user operation in the operation unit 22. The predetermined pitch may also be set automatically by the control unit 20 based on the least common multiple of each facility E1 to E7. The predetermined pitch of the map graph information G5 may be set separately in the x and y directions, in which case the moving edge G53 may have a weight corresponding to the pitch in the corresponding direction.

[0063] The movement edge G53 is an edge that indicates whether a worker W can move between two adjacent division nodes G50. For example, a passage node G52 and an equipment node G51 are connected by the movement edge G53 if the equipment E of equipment node G51 is accessible from the position of passage node G52, and not connected if it is not accessible (for example, a passage behind equipment E). Also, no movement edge G53 is provided between two equipment nodes G51. Furthermore, two passage nodes G52 are connected by a movement edge if the worker W can pass through the corresponding passage, and not connected otherwise.

[0064] Returning to Figure 7, the control unit 20 obtains the number of moves and the distance traveled by worker W between two pieces of equipment E for each combination of two pieces of equipment E in all equipment E1 to E7, based on the movement data D1 and map graph information G5 (S12). The distance traveled is the distance that worker W is assumed to be able to travel between two pieces of equipment E through a passage where equipment E1 to E7 is not located in each layout.

[0065] For example, the control unit 20 calculates the number of movements by counting the number of movement paths from one of two pieces of equipment E to the other piece of equipment E in the movement path data D1. The control unit 20 also calculates the shortest possible path between the two pieces of equipment E on the map by applying Dijkstra's algorithm to the map graph information G5. The above calculations are performed for each piece of equipment node G51, for example, and are managed on a piece of equipment E basis. The counting of the number of movements may be performed by distinguishing the direction in which the movement paths move between the two pieces of equipment E. Furthermore, the calculation of the travel distance may be limited to combinations of two pieces of equipment E where the number of movements is a predetermined number (e.g., 1) or more.

[0066] Next, the control unit 20 converts the map graph information G5 of the current layout into graph information G1 of the current layout, as illustrated in Figure 5(A), based on the calculated number of moves and distance traveled (S13).

[0067] In this graph information G1, an edge Ge is set, for example, between two pieces of equipment E whose number of movements is greater than or equal to a predetermined number, and not between two pieces of equipment E whose number of movements is less than the predetermined number. The predetermined number is, for example, the number of times that a worker W has moved, and is, for example, one time. This predetermined number may be multiple times, set from the viewpoint of limiting steady movement due to work difference W. For each edge Ge, for example, the distance traveled and the number of movements between the two corresponding pieces of equipment E can be set as weight values, respectively. In addition, the presence or absence of an edge Ge may be reset by performing a threshold check on the distance traveled, etc.

[0068] Next, the control unit 20 calculates the centrality index of the current layout based on the graph information G1 of the current layout (S14). The process in step S14 is a preprocessing step for performing the centrality index analysis process (S4 in Figure 4), and the details will be described later.

[0069] Next, the control unit 20 performs numerical calculations for layout optimization based on, for example, the calculated number of moves and distance between the facilities E, and the map graph information G5 (S15). For example, the control unit 20 solves the optimization problem represented by the following equation (1) using the map graph information G5 of the current layout as the initial value.

number

[0070] In equation (1) above, N is the number of partition nodes G50 that include equipment node G51 and passage node G52, and i, j, k, l are integers from 1 to N, and their sum is Σ. ik ,X jl This is a variable that indicates a provisional solution for the layout. For example, X ik This is "1" if the k-th partition node G50 is placed at the i-th position, and "0" otherwise. kl f is the number of moves between the k-th division node G50 and the l-th division node G50. For example, if the k-th and l-th division nodes G50 are equipment nodes G51, then f kl is the number of moves between the two equipment E units, each including equipment node G51; otherwise, f kl = 0. d ij This is the distance traveled between the i-th position and the j-th position.

[0071] Here, f kl This is set to a predetermined value M if the k-th and l-th equipment nodes G51 are included in the same equipment E. The predetermined value M is set to a sufficiently large value such that the objective function in equation (1) above becomes large when the two equipment nodes G51 are separated. This ensures that provisional solutions in which multiple equipment nodes G51 that should be included in the same equipment E are placed far apart are eliminated from the perspective of minimizing the objective function.

[0072] In step S15, the control unit 20 repeatedly performs a calculation process to calculate the objective function by setting a provisional solution of equation (1) above, for example, by swapping the arrangement between equipment nodes G51 using simulated annealing. The swapping of arrangement is not limited to between equipment nodes G51, but may also be between equipment node G51 and passage node G52, or between passage nodes G52. In the repeated calculation process described above, the control unit 20 of the layout analysis device 2 of this embodiment sequentially stores in the storage unit 21 information indicating a provisional solution layout in which the value of the objective function is smaller than the initial value (i.e., the value in the case of the current layout). The information thus stored, indicating multiple layouts, i.e., a group of optimal layouts, is used in the subsequent substructure analysis process (S3).

[0073] The control unit 20 repeats the above calculation process, for example, until the termination conditions of the simulated annealing method are met, and in step S15, stores the provisional solution that ultimately minimizes the objective function as the optimal layout in the storage unit 21.

[0074] Upon completion of the numerical calculation for layout optimization (S15) described above, the control unit 20 terminates the layout optimization process (S2) and proceeds to step S3, for example, in Figure 4.

[0075] According to the layout optimization process (S2) described above, by using map graph information G5 obtained by dividing each facility E into equal parts at a predetermined pitch using the division node G50 (S11), numerical calculations for layout optimization can be performed for multiple facilities E1 to E7 of various sizes. In addition, information for use in the subsequent substructure analysis process (S3) and centrality index analysis process (S4) can also be obtained (S14, S15).

[0076] 2-2-2. Analysis of substructures The substructure analysis process in step S3 of Figure 4 will be explained using Figures 9 to 10.

[0077] Figure 9 is a flowchart illustrating the analysis process of substructures (S3 in Figure 4) in the layout analysis device 2. Figure 10 is a diagram illustrating the analysis process of substructures (S3).

[0078] First, the control unit 20 generates graph information of the optimal layout group based on the information obtained in the layout optimization process (S2), for example (S21). The graph information generated in step S21 is illustrated in Figure 10(A).

[0079] Figure 10(A) illustrates the graph information G3 of the optimal layout group obtained in the layout optimization example of Figures 5(A) and (B). The graph information G3 of the optimal layout group includes graph information G2, G31, and G32 corresponding to each layout included in the optimal layout group. The edges Ge in the graph information G3 of the optimal layout group are limited to nodes Gn in the graph information G2, G31, and G32 of each layout where the number of moves is greater than or equal to a predetermined number, and the distance traveled between the equipment E is less than or equal to a threshold. The threshold is set in advance, for example, as a criterion for a relatively short distance traveled. Each edge Ge does not have, for example, any weighting or orientation.

[0080] Next, the control unit 20 performs a graph theory analysis on the graph information G3 of the generated optimal layout group, for example, to extract characteristic substructures in the optimal layout (S22). The substructures extracted in step S22 are illustrated in Figure 10(B).

[0081] Figure 10(B) illustrates characteristic substructures P10, P11, and P12 of the optimal layout in the graph information G3 of the optimal layout group illustrated in Figure 10(A). The control unit 20 analyzes the graph information G3 of the optimal layout group using, for example, the Cl-GBI (Chunkless Graph Based Induction) method and extracts substructures P10 to P12 that are common among multiple graph information G2, G31, and G32 in the optimal layout group (S22). For example, substructure P10 is a structure in which node Gn of equipment E6 and node Gn of equipment E7 are connected by edge Ge, indicating an arrangement in which the number of movements between equipment E6 and E7 is relatively high and the movement distance is relatively short.

[0082] Next, the control unit 20 performs a process to compare the current layout with the current layout based on the substructures P10 to P12 extracted using the optimal layout group as described above (S23 to S27). For example, the control unit 20 first sequentially selects one of the substructures P10 to P12 extracted in the optimal layout as the comparison target (S23).

[0083] The control unit 20 determines whether the substructure selected in the optimal layout is included in the graph information G1 of the current layout (Figure 3(A)) (S24). In the processing of step S3, even in the graph information G1 of the current layout, only edges Ge with relatively short travel distances are considered, and the dashed edges Ge in Figure 3(A) are not considered.

[0084] For example, in the graph information G1 of the current layout, the nodes Gn of equipment E6 and E7 are connected to each other by an edge Ge, so the control unit 20 determines that the substructure P10 is included in the current layout (YES in S24). On the other hand, in the graph information G1 of the current layout, there is no edge Ge between equipment E7 and equipment E3 and E4, so the control unit 20 determines that the substructures P11 and P12 are not included in the current layout (NO in S24).

[0085] The control unit 20 determines that the substructure P10 included in the current layout is an evaluation point of the current layout (S25), based on the comparison result of the substructure P10 (YES in S24). For example, the control unit 20 decides to display the evaluation line L5 corresponding to the substructure P10 on the analysis screen of the display unit 23 (Figure 6).

[0086] On the other hand, the control unit 20 determines that the substructure P11, which is not included in the current layout, is an improvement factor for the optimal layout (S26), based on the comparison result of the substructure P11 (NO in S24). The control unit 20 also determines that the corresponding location P13 of the substructure P11 in the graph information G1 of the current layout is a bottleneck factor for the current layout (S26). For example, the control unit 20 decides to display the improvement factor line L1 corresponding to the substructure P11 and the bottleneck factor line L3 corresponding to the corresponding location P13 (see Figure 6).

[0087] The control unit 20 determines whether the comparison between the current layout and the optimal layout using substructures P10 to P12 has been completed, for example, depending on whether the above comparison results have been determined for all substructures P10 to P12 (S27). If there are any substructures P12 for which the comparison results have not been determined (NO in S27), the control unit 20 repeats the processing from step S24 onwards for that substructure P12. By repeating steps S23 to S27, the comparison results for each substructure P10 to P12 are determined (YES in S27).

[0088] Once the control unit 20 has completed comparing the current layout with the optimal layout using the substructures P10 to P12 (YES in S27), it generates information indicating the decision result in steps S25 and S26 and records it in the storage unit 21 (S28).

[0089] The control unit 20 completes the analysis process of the substructures (S3) by recording the determination information of these substructures P10 to P12 (S28), and proceeds to step S4 in Figure 4, for example. Subsequently, the control unit 20 refers to the determination information from step S28 and displays the evaluation line L5 corresponding to substructure P10 on the analysis screen in Figure 6 (S5). Similarly, the control unit 20 displays the improvement factor lines L1 and L2 corresponding to substructures P11 and P12, and the bottleneck factor lines L3 and L4 corresponding to the corresponding locations P13 and P14 (S5).

[0090] According to the above substructure analysis process (S3), characteristic parts of the optimal layout can be identified by extracting the substructures P10 to P12 of the optimal layout from the graph information G3 of the optimal layout group optimized from the current layout using, for example, the Cl-GBI method (S22). In this embodiment, the extraction of substructures P10 to P12 (S22) is not limited to the Cl-GBI method, but may also be performed using, for example, the GBI method or the B-GBI method.

[0091] 2-2-3. Analysis of Centrality Indicators The analysis process of the centrality index in step S4 of Figure 4 will be explained using Figures 11 to 13.

[0092] Figure 11 illustrates the centrality table D31 of the current layout in the layout analysis device 2. Figure 12 is a flowchart illustrating the centrality index analysis process (S4 in Figure 4) in this embodiment. Figure 13 illustrates the centrality table D31 of the optimal layout.

[0093] The flowchart illustrated in Figure 12 starts with the current layout centrality table D31, illustrated in Figure 11, stored in the storage unit 21. The current layout centrality table D31 shows the calculation result of the current layout centrality index in step S14 of Figure 7.

[0094] In step S14 of Figure 7, the control unit 20 calculates the page rank of all equipment E1 to E7 based on the graph information G1 of the current layout obtained in step S13, for example. For example, the control unit 20 records information identifying each equipment E in the centrality table D31, starting with equipment E7 which has the highest page rank. The control unit 20 also calculates the proximity centrality of each equipment E based on the graph information G1 of the current layout and records the calculated proximity centrality values ​​in the centrality table D31. The calculation of proximity centrality may be limited to a predetermined number of equipment E in descending order of page rank.

[0095] Subsequently, in the centrality index analysis process (S4 in Figure 4), as shown in Figure 12, for example, the control unit 20 first calculates the proximity centrality of each piece of equipment E in the optimal layout based on the graph information G2 of the optimal layout (S31). The control unit 20 then stores the calculated proximity centrality for each piece of equipment E in the centrality table D32 of the optimal layout, as shown in Figure 13.

[0096] In the centrality table D32 of the optimal layout, the identification information of equipment E is arranged in the same order as in the centrality table D31 of the current layout (Figure 11), according to PageRank, as shown in Figure 13, for example. PageRank does not change between the current layout and the optimal layout and can be used as a common indicator when comparing the two.

[0097] Next, the control unit 20 performs a process to compare the current layout with the optimal layout based on the calculation results of the centrality index for each layout as described above (S32-S33). For example, the control unit 20 first selects one piece of equipment E as the comparison target, in descending order of page rank (S32).

[0098] The control unit 20 refers to each centrality table D31 and D32 and determines whether the proximity centrality of the optimal layout is higher than the centrality of the current layout for the selected equipment E (S33).

[0099] If the control unit 20 determines that the proximity centrality of the optimal layout for the selected equipment E is higher than that of the current layout (YES in S33), it generates hub equipment information indicating the selected equipment E as a hub equipment and records it in the storage unit 21 (S34). The hub equipment information includes, for example, the proximity centrality of the current layout for the hub equipment and identification information for the hub equipment.

[0100] On the other hand, if the control unit 20 determines that the proximity centrality of the optimal layout for the selected equipment E is not higher than that of the current layout (NO in S33), it selects the next highest-ranked equipment E (S32) and repeats step S33. In this embodiment, the optimal layout is obtained by optimizing to minimize the total travel distance of the worker W, so it is considered that at least one of the equipment E1 to E7 in the workplace 10 has higher proximity centrality than the current layout.

[0101] The control unit 20 terminates the centrality index analysis process (S4) by, for example, recording the hub equipment information (S34) and proceeds to step S5 in Figure 4. At this time, based on the hub equipment information from step S34, the control unit 20 displays hub equipment messages M1 and M2 on the analysis screen in Figure 6 (S5).

[0102] According to the analysis process of the centrality index described above (S4), for example, hub equipment E7 can be automatically extracted using PageRank, and it can be confirmed that the proximity centrality of hub equipment E7 has improved by comparing the current layout with the optimal layout (S34).

[0103] The PageRank in this embodiment will be explained in more detail below. According to PageRank, for example, the degree to which node Gn is important in graph information G1 and G2 is measured from the following perspectives. (1) Important nodes Gn are connected to, i.e., linked to, edge Ge by more nodes Gn. (2) Important node Gn is linked from more important node Gn. (3) Important nodes Gn are linked to from nodes Gn with fewer edge Ge connections, i.e., fewer links.

[0104] In this embodiment, the above-described PageRank is applied to the graph information G1 and G2 of various layouts in which the node Gn represents the facility E and the edge Ge represents the presence or absence of movement. As a result, among the plurality of facilities E1 to E7 in the graph information G1 and G2, the degree of importance of each facility E, that is, the degree of functioning as a hub facility, can be measured based on the idea that the facility E where the movement from other facilities E is more concentrated is more important. Since such PageRank measures the importance of the layout only from the presence or absence of movement, it has a common value before and after changing the layout.

[0105] For example, the PageRank is calculated by matrix operation using the adjacency matrix of a directed graph in which the edge Ge indicates the presence or absence of movement from one facility E to another facility E in the graph information G1 and G2. Specifically, the control unit 20 calculates the value of each element of the eigenvector with the largest eigenvalue in the eigenvector of the matrix B = (b ij ) having the matrix element b ij as the PageRank (S14). b ij =a ij / Σ k (a kj ) …(2)

[0106] In the above formula (2), a ij is the matrix element of the matrix A obtained by transposing the adjacency matrix of the above directed graph. The sum Σ by k is taken over the number of nodes Gn, that is, the number of facilities E1 to E7.

[0107] Also, in this embodiment, the closeness centrality is calculated by the control unit 20, for example, by calculating the following formula (3) (S14, S31).

Equation

[0108] In equation (3) above, CCi indicates the proximity centrality of the i-th equipment E. n is the number of equipment E. d(i,j) is the distance traveled between the i-th equipment E and the j-th equipment E. The summation Σ by j is taken over the n-1 equipment E other than the i-th equipment E.

[0109] This proximity centrality CCi increases as other equipment E that workers W may move to are clustered near the i-th equipment E in question. Therefore, the higher the proximity centrality CCi of the hub equipment E, the easier it is for workers W to access the hub equipment E, and the more efficient the workers W can be.

[0110] 3. Summary As described above, the layout analysis device 2 in this embodiment generates information showing the analysis results of the layout of multiple pieces of equipment E. The layout analysis device 2 includes a storage unit 21 that stores map information D2 of the current layout, which is an example of a first layout showing the arrangement of multiple pieces of equipment E, and a control unit 20 that acquires an optimal layout, which is an example of a second layout calculated by numerical calculation (S2) that optimizes the arrangement of multiple pieces of equipment E from the current layout. The control unit 20 identifies a substructure or hub equipment as an example of a part that is characteristic of the optimal layout compared to the current layout (S3, S4). The control unit 20 generates various lines L1 to L5 and messages M1, M2 as examples of analysis information showing the relationship between the identified part in the optimal layout and the part corresponding to the identified part in the current layout and the optimization (S3 to S5).

[0111] According to the layout analysis device 2 described above, the user 15 can understand the parts related to optimization in the optimal layout based on various analysis information, and the optimized layout in which the equipment placement is optimized through numerical calculations can be easily analyzed by the user 15.

[0112] In the layout analysis device 2 of this embodiment, the numerical calculation for optimization is performed to minimize the total distance traveled by an example of a moving object, a worker W, between multiple pieces of equipment E. The control unit 20 identifies characteristic parts in the optimal layout related to movement between the multiple pieces of equipment E. Specifically, the control unit 20 identifies characteristic parts in the optimal layout based on graph information G1 and G2 corresponding to each layout. Graph information G1 and G2 include multiple nodes Gn corresponding to each of the multiple pieces of equipment E, and multiple edges Ge set between each node Gn. By performing graph theory data analysis based on this graph information G1 and G2, it is possible to automatically identify which parts of the optimal layout are considered to have a causal relationship with layout optimization.

[0113] In the layout analysis device 2 of this embodiment, the control unit 20 acquires information indicating an optimal layout group as an example of layout group information indicating a group of multiple layouts, including an optimal layout that is calculated to be more optimized than the first layout in the numerical calculation of optimization (S15). Based on the acquired layout group information, the control unit 20 identifies substructures P10 to P12 as characteristic parts, which are common parts among the multiple layouts (S22). This makes it possible to grasp characteristic parts in the optimal layout by utilizing the information obtained during the numerical calculation of layout optimization.

[0114] In the layout analysis apparatus 2 of this embodiment, the graph information G3 of the optimal layout group, as an example of layout group information, includes graph information G2, G31, and G32 corresponding to multiple layouts. The control unit 20 applies at least one of the Cl-GBI method, the GBI method, and the B-GBI method to the graph information G3 of the optimal layout group to identify substructures P10 to P12 (S22). For example, by applying the Cl-GBI method, characteristic substructures P10 to P12 in the optimal layout can be extracted with high accuracy.

[0115] In the layout analysis device 2 of this embodiment, the improvement factor lines L1 and L2, which are an example of the analysis information, indicate that if the substructures P11 and P12 are not included in the current layout (NO in S24), the substructures P11 and P12 are shown as factors that have improved the optimal layout from the current layout (S26). This allows the user 15 to understand the improvement factors in the optimal layout.

[0116] In the layout analysis device 2 of this embodiment, bottleneck factor lines L3 and L4, which are an example of analysis information, indicate that if the substructure P10 is not included in the current layout (NO in S24), the corresponding locations P13 and P14 are shown as factors indicating that the current layout is not optimal (S26). This allows the user 15 to understand the bottleneck factors in the current layout.

[0117] In the layout analysis device 2 of this embodiment, the evaluation line L5, an example of the analysis information, indicates that if the substructure P10 is included in the current layout (YES in S24), the substructure P10 is shown as a part common to both the current layout and the optimal layout. This allows the user 15 to identify good evaluation points in the current layout from the perspective of comparison with the optimal layout.

[0118] In the layout analysis device 2 of this embodiment, the control unit 20 compares the centrality index of the current layout with the centrality index of the optimal layout (S32-S33) to identify a hub facility, which is an example of a characteristic part in the optimal layout (S34). By utilizing the centrality index of each layout, it is possible to identify characteristic parts in the optimal layout in relation to layout optimization.

[0119] In the layout analysis device 2 of this embodiment, the hub equipment messages M1 and M2, which are examples of analysis information, indicate that the centrality index (e.g., proximity centrality) of a specified part in the optimal layout is higher than the centrality index of the corresponding part in the current layout. From this improvement in centrality index, the user 15 can identify the factors for improvement in the optimal layout.

[0120] In the layout analysis device 2 of this embodiment, the numerical calculation for optimization (S2) is performed to minimize the total distance traveled by a worker W, an example of a moving object, between multiple pieces of equipment E. The identified area is, for example, a hub piece of equipment E where the movement of the moving object is concentrated among the multiple pieces of equipment E. The analysis information shows that for the hub piece of equipment E, proximity centrality, an example of a centrality index related to the ease of movement of the moving object, is higher in the optimal layout than in the current layout. As a result, the user 15 can understand that the ease of access to the hub piece of equipment E has improved in the optimal layout as an improvement factor.

[0121] In the layout analysis device 2 of this embodiment, the centrality index includes PageRank and proximity centrality. By using this centrality index, for example, hub equipment E in the workspace 10 can be extracted and its accessibility can be understood.

[0122] In the layout analysis device 2 of this embodiment, the numerical calculation for optimization (S2) is performed by setting the area where each piece of equipment E is located in the current layout as an initial state in which the area is divided into divided areas of a predetermined size by dividing nodes G50 at a predetermined pitch, and then arranging the divided areas corresponding to each piece of equipment E together (S11, S15). This makes it possible to perform numerical calculations for layout optimization, such as simulated annealing, for multiple pieces of equipment E1 to E7 that have different sizes, and makes it easier to perform layout optimization.

[0123] In the layout analysis device 2 of this embodiment, the control unit 20 performs numerical calculations to optimize the arrangement of multiple pieces of equipment E from the current layout and calculates the optimal layout (S2). In this way, the layout analysis device 2 performs the optimization numerical calculations, making it easier to utilize the information obtained during the numerical calculations.

[0124] In this embodiment, the layout analysis device 2 further includes a display unit 23 that displays analysis information generated by the control unit 20. By checking the analysis information displayed on the display unit 23, the user 15 can easily analyze the optimal layout.

[0125] In this embodiment, a layout analysis method is provided that generates information showing the results of an analysis of the layout of multiple pieces of equipment E. This method includes the steps of: obtaining an optimal layout calculated by numerical calculation to optimize the arrangement of multiple pieces of equipment E from the current layout showing the arrangement of multiple pieces of equipment E (S2); identifying characteristic parts in the optimal layout compared with the current layout (S3, S4); and generating analysis information showing the relationship between the identified parts in the optimal layout and at least one of the parts corresponding to the identified parts in the current layout and the optimization (S3-S5).

[0126] In this embodiment, a program is provided for causing a control unit 20 of a computer, such as a layout analysis device 2, to execute the above layout analysis method. According to the layout analysis method of this embodiment, it is possible to make it easier for the user 15 to analyze a layout in which the arrangement of equipment E is optimized.

[0127] (Other embodiments) As described above, Embodiment 1 has been explained as an example of the technology disclosed in this application. However, the technology in this disclosure is not limited to this and can be applied to embodiments that have been modified, substituted, added, or omitted as appropriate. Furthermore, it is possible to create new embodiments by combining the components described in each of the above embodiments. Therefore, other embodiments are described below as examples.

[0128] In Embodiment 1 described above, PageRank and proximity centrality were exemplified as examples of centrality indicators. In the layout analysis device 2 of this embodiment, the centrality indicator is not limited to any particular indicator and may be, for example, betweenness centrality. For example, the degree of congestion can be calculated for each aisle node G52 based on the betweenness centrality in the map graph information G5. In the layout analysis device 2 of this embodiment, the centrality indicator may include at least one of PageRank, proximity centrality, and betweenness centrality.

[0129] Furthermore, in the above embodiment 1, the calculation formula (3) for nearby centrality was illustrated. In this embodiment, nearby centrality is not limited to the above formula (3), but may be calculated by, for example, the following formula (4).

number

[0130] In equation (4) above, C WF (i) indicates the proximity centrality of the i-th equipment E. n is the number of equipment E. The sum Σ by j is taken over the n-1 equipment E other than the i-th equipment E. f(j) corresponds to the number of movements if there is movement of worker W between the i-th equipment E and the j-th equipment E, and is "1" if there is no movement. f'(j) is the product of the number of movements and the distance traveled if there is movement of worker W between the i-th equipment E and the j-th equipment E, and corresponds to the distance traveled if there is no movement.

[0131] Near-centeredness C of equation (4) above WF According to (i), since the number of movements is taken into consideration in the calculation of proximity centrality, it becomes easier to quantitatively evaluate the importance of equipment E, which has a large number of movements. For example, proximity centrality C in equation (4) above WF (i) may be used without any particular use of PageRank.

[0132] In each of the embodiments described above, an example of an optimization condition was described in which the total distance traveled by worker W is minimized. In this embodiment, the optimization condition is not limited to the above and can be set to various conditions that improve work efficiency in the workplace 10. For example, the optimization condition in this embodiment may be to minimize the degree of congestion in the workplace 10. In this case, the objective function to be minimized in layout optimization may be the sum of the between centralities across all aisle nodes G52. Furthermore, in applications to fields such as logistics, the volume of goods transported may be used in addition to or instead of the number of movements.

[0133] In the embodiments described above, examples of applying an algorithm that divides equipment E equally using map graph information G5 in layout optimization were explained, but the layout analysis device 2 of this embodiment is not particularly limited to this. The layout analysis device 2 of this embodiment does not necessarily use the map graph information G5 described above, and layout optimization may be performed using various algorithms that do not divide equipment E equally. For example, layout optimization may be performed on multiple pieces of equipment E in a workshop 10 of the same size.

[0134] In the embodiments described above, examples were given in which Dijkstra's algorithm was used to calculate the travel distance between equipment E in each layout, but the invention is not limited to this. In this embodiment, various methods such as the Warshall-Floyd algorithm may be used to calculate the travel distance. Furthermore, the travel distance between equipment E may be a set value of the distance set for each combination of positions on the map.

[0135] In each of the embodiments described above, we have explained a case in which simulated annealing is used in the numerical calculation of layout optimization. In the layout analysis device 2 of this embodiment, the numerical calculation of layout optimization is not limited to the above, and various methods can be applied. For example, hill climbing or approximate solution methods using nearest neighbor search such as genetic algorithms may be used. Even in this case, a set of optimal layouts can be obtained from the information obtained during the calculation of the above layout optimization. Furthermore, if a set of optimal layouts is not used, various other numerical methods can be applied.

[0136] In each of the embodiments described above, an example was explained in which the layout analysis device 2 performs numerical calculations for layout optimization. In this embodiment, the numerical calculations for layout optimization may be performed outside the layout analysis device 2, for example, on an external server such as the traffic flow management server 12. In this case, the control unit 20 of the layout analysis device 2 may obtain information such as the optimal layout by receiving the calculated optimal layout or various information during the calculation from the external server, for example via the network I / F 25.

[0137] In the embodiments described above, worker W was described as an example of a mobile entity. In this embodiment, the mobile entity may be a person other than worker W, and may be not limited to a person but may be a living organism, various vehicles or robots, etc.

[0138] As described above, embodiments have been explained as examples of the technology in this disclosure. For this purpose, accompanying drawings and a detailed description have been provided.

[0139] Therefore, the components described in the attached drawings and detailed descriptions may include not only components essential for solving the problem, but also components that are not essential for solving the problem, provided that they illustrate the technology described above. For this reason, the mere presence of these non-essential components in the attached drawings and detailed descriptions should not be immediately assumed to mean that they are essential.

[0140] Furthermore, since the embodiments described above are for illustrative purposes of the technology described herein, various modifications, substitutions, additions, omissions, etc., can be made within the claims or their equivalents. [Industrial applicability]

[0141] This disclosure is applicable to data analysis regarding the layout of equipment placement in various fields, such as factories or logistics.

Claims

1. A layout analysis device that generates information showing the results of layout analysis using multiple pieces of equipment, A storage unit for storing a first layout showing the arrangement of the aforementioned multiple pieces of equipment, The system includes a control unit that obtains a second layout calculated by numerical calculation to optimize the arrangement of the multiple pieces of equipment from the first layout, The control unit, Compared to the first layout, the characteristic parts of the second layout are identified, Analysis information is generated showing the relationship between the identified portion in the second layout and at least one of the portion corresponding to the identified portion in the first layout and the optimization. The numerical calculation for optimization is performed so that the total distance the moving body travels between the multiple pieces of equipment is smaller in the second layout than in the first layout. The identified portion is the equipment in which the movement of the moving body is concentrated among the multiple pieces of equipment, The aforementioned analysis information indicates that, for the equipment where movement is concentrated, the centrality index relating to the ease of movement of the moving body is higher in the second layout than in the first layout. Layout analysis device.

2. The control unit, In the numerical calculation of the optimization, information is obtained showing a group of layouts including the second layout which is calculated to be more optimized than the first layout, Based on the acquired layout group information, the parts common to the multiple layouts are identified as the characteristic parts. The layout analysis apparatus according to claim 1.

3. The layout group information includes graph information corresponding to each of the multiple layouts, The control unit applies at least one of the Cl-GBI method, GBI method, and B-GBI method to the layout group information to identify the common portion. The layout analysis apparatus according to claim 2.

4. The analysis information indicates that, if the common portion is not included in the first layout, the identified portion is the factor that resulted in the second layout being optimized from the first layout. The layout analysis apparatus according to claim 2 or 3.

5. The aforementioned analysis information indicates that if the common portion is not included in the first layout, the corresponding portion is identified as a factor indicating that the first layout is not optimal. The layout analysis apparatus according to claim 2 or 3.

6. The analysis information indicates that if the common portion is included in the first layout, the identified portion is shown as a portion common to both the first and second layouts. The layout analysis apparatus according to claim 2 or 3.

7. The control unit compares the centrality index in the first layout with the centrality index in the second layout to identify the characteristic portion in the second layout. A layout analysis apparatus according to any one of claims 1 to 3.

8. The analysis information indicates that the centrality index of the identified portion in the second layout is higher than the centrality index of the corresponding portion in the first layout. The layout analysis apparatus according to claim 7.

9. The numerical calculation for the optimization is performed to minimize the total distance the moving object travels between the multiple pieces of equipment. The layout analysis apparatus according to claim 8.

10. The aforementioned centrality index includes at least one of PageRank, proximity centrality, and betweenness centrality. The layout analysis apparatus according to claim 7.

11. The numerical calculation for optimization is performed by starting with the state in which the area where each piece of equipment is located in the first layout is divided into divided areas of a predetermined size, and then arranging the divided areas corresponding to each piece of equipment together. A layout analysis apparatus according to any one of claims 1 to 3.

12. The control unit performs numerical calculations to optimize the arrangement of the multiple pieces of equipment from the first layout and calculates the second layout. A layout analysis apparatus according to any one of claims 1 to 3.

13. The system further includes a display unit that displays the analysis information generated by the control unit. A layout analysis apparatus according to any one of claims 1 to 3.

14. A layout analysis method that generates information showing the results of layout analysis using multiple pieces of equipment, A step of obtaining a second layout calculated by numerical calculation to optimize the arrangement of the plurality of equipment from a first layout showing the arrangement of the plurality of equipment, A step of identifying characteristic parts in the second layout compared to the first layout, The process includes the step of generating analytical information showing the relationship between the identified portion in the second layout and at least one of the portion in the first layout corresponding to the identified portion, and the optimization, The numerical calculation for optimization is performed so that the total distance the moving body travels between the multiple pieces of equipment is smaller in the second layout than in the first layout. The identified portion is the equipment in which the movement of the moving body is concentrated among the multiple pieces of equipment, The aforementioned analysis information indicates that, for the equipment where movement is concentrated, the centrality index relating to the ease of movement of the moving body is higher in the second layout than in the first layout. Layout analysis methods.

15. A program for causing a computer control unit to execute the layout analysis method described in claim 14.

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