Method for measuring the relative position of a mark, measuring apparatus, and method for manufacturing an article.

Abstract

To provide a measuring method and measuring device that can measure a relative position even if an occupant area of an alignment mark is made smaller.SOLUTION: A measuring method of measuring a relative position between alignment marks on each of two objects, comprises the steps of: detecting a signal of a light intensity distribution corresponding to an outer periphery of the mark to obtain a first relative position between the marks; imaging a moire fringe to be formed by diffraction light from the mark, and obtaining a second relative position between the marks based on the moire fringe; and obtaining a relative position between the marks on the basis of the first relative position and the second relative position.SELECTED DRAWING: Figure 8

Claims

1. In a measurement method for measuring the relative position between a first alignment mark provided on a first object and a second alignment mark provided on a second object, A step of illuminating the first alignment mark and the second alignment mark, A step of detecting signals of light intensity distributions corresponding to the outer periphery of the first alignment mark and the outer periphery of the second alignment mark, and determining the first relative position of the first alignment mark and the second alignment mark based on the signals, A step of imaging the moiré fringes formed by the diffracted light from the first alignment mark and the second alignment mark, and determining the second relative position between the first alignment mark and the second alignment mark based on the moiré fringes, A measurement method characterized by comprising the step of determining the relative positions of the first alignment mark and the second alignment mark based on the first relative position and the second relative position.

2. The measurement method according to claim 1, characterized in that, after shifting the relative positions of the first alignment mark and the second alignment mark, the first relative position is determined by detecting a signal of the light intensity distribution corresponding to the outer periphery of the alignment mark.

3. The measurement method according to claim 1, characterized in that the first relative position is determined by detecting a signal of the light intensity distribution corresponding to the outer periphery of the alignment mark while the first alignment mark and the second alignment mark do not overlap.

4. The measurement method according to claim 1, characterized in that the relative positions of the first alignment mark and the second alignment mark are changed so that the first alignment mark and the second alignment mark overlap based on the first relative position, and then the moiré fringes are imaged to determine the second relative position.

5. The light from the first alignment mark and the second alignment mark is split, and each of the split light beams is detected by the first image sensor and the second image sensor. Using the first image sensor, the signals of the light intensity distribution corresponding to the outer periphery of the first alignment mark and the outer periphery of the second alignment mark are detected. The measurement method according to claim 1, characterized in that the moiré fringes are imaged using the second image sensor.

6. The signal of the light intensity distribution is detected using the first image sensor via the first aperture diaphragm. The measurement method according to claim 5, characterized in that the moiré fringes are imaged using the second image sensor through a second aperture diaphragm having a different aperture shape from the first aperture diaphragm.

7. The signal of the light intensity distribution is detected using the first image sensor at the first magnification. The measurement method according to claim 5, characterized in that the moiré fringes are imaged using the second image sensor at a second magnification higher than the first magnification.

8. The first effective light source distribution illuminates the first alignment mark and the second alignment mark, and the signal of the light intensity distribution is detected. The measurement method according to claim 1, characterized in that the first alignment mark and the second alignment mark are illuminated with a second effective light source distribution different from the first effective light source distribution, and the moiré fringes are imaged.

9. The measurement method according to claim 1, characterized in that the ratio of the light intensity from the outer periphery of the first alignment mark to the light intensity from the outer periphery of the second alignment mark is changed by adjusting the wavelength of the light illuminating the first alignment mark and the second alignment mark.

10. In a measuring device for measuring the relative position between a first alignment mark provided on a first object and a second alignment mark provided on a second object, A lighting unit that illuminates the first alignment mark and the second alignment mark, A detection unit that detects light from the first alignment mark and the second alignment mark, The system includes a processing unit that determines the relative positions of the first alignment mark and the second alignment mark using the detection results from the detection unit, The detection unit detects signals of light intensity distributions corresponding to the outer periphery of the first alignment mark and the outer periphery of the second alignment mark, and the processing unit determines the first relative position of the first alignment mark and the second alignment mark based on the signals. The detection unit captures moiré fringes formed by diffracted light from the first alignment mark and the second alignment mark, and the processing unit determines the second relative position of the first alignment mark and the second alignment mark based on the moiré fringes. A measuring device characterized in that the processing unit determines the relative positions of the first alignment mark and the second alignment mark based on the first relative position and the second relative position.

11. A step of measuring the relative position between a first alignment mark provided on a mold and a second alignment mark provided on a substrate using the measurement method described in claim 1, A step of aligning the first alignment mark and the second alignment mark based on the measured relative position, A step of forming a pattern on the substrate by curing the imprint material on the substrate while the aligned mold and the substrate are in contact, A method for manufacturing an article, characterized by comprising the steps of manufacturing an article from a substrate on which a pattern has been formed.

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