Hydrogen production equipment and power generation equipment

Abstract

To provide a hydrogen production apparatus capable of continuously producing hydrogen, a hydrogen production method, and a power generation apparatus.SOLUTION: A hydrogen production apparatus comprises a reaction vessel configured to generate hydrogen by reacting a plurality of kinds of materials inside, and a material supply part configured to repeatedly supply the plurality of kinds of materials to the inside of the reaction vessel. The material supply part supplies the plurality of kinds of materials so as not to mix with the plurality of kinds of materials previously supplied before the reaction of the plurality of kinds of materials previously supplied is completed.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present disclosure relates to a hydrogen production device, a method for producing hydrogen, and a power generation device.

Background Art

[0002] A hydrogen production device is disclosed in Patent Document 1. The hydrogen production device includes a water supply tray and a detachable fuel cartridge. The hydrogen production device supplies water from the water supply tray to the fuel cartridge. Hydrogen is generated by the reaction of the hydrogen-generating substance and water in the fuel cartridge.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] However, in such a hydrogen production device, as the hydrogen generation reaction between the hydrogen-generating substance and water in the fuel cartridge ends, the hydrogen production amount also decreases. By replacing the fuel cartridge with another fuel cartridge containing a hydrogen-generating substance that has not yet reacted with water, hydrogen can be produced again. However, when replacing the fuel cartridge, the production of hydrogen stops, and there is a problem that hydrogen cannot be continuously generated.

[0005] In one aspect of the present disclosure, it is preferable to provide a hydrogen production device capable of continuously producing hydrogen, a method for producing hydrogen capable of continuously producing hydrogen, and a power generation device including the hydrogen production device capable of continuously producing hydrogen.

Means for Solving the Problems

[0006] One aspect of the present disclosure is a hydrogen production apparatus comprising a reaction vessel configured to generate hydrogen by reacting multiple types of materials inside, and a material supply unit configured to repeatedly supply the multiple types of materials into the reaction vessel, wherein the material supply unit is configured to supply the multiple types of materials in such a way that they do not mix with the previously supplied multiple types of materials before the reaction of the previously supplied multiple types of materials is completed.

[0007] One aspect of this disclosure, the hydrogen production apparatus, can sustainably produce hydrogen. Another aspect of this disclosure is a method for producing hydrogen, which involves repeatedly supplying the plurality of materials into a reaction vessel to generate hydrogen inside the vessel. In this hydrogen production method, the plurality of materials are supplied in such a way that they do not mix with the previously supplied materials before the reaction of the previously supplied materials is completed.

[0008] Another aspect of this disclosure, the method for producing hydrogen, allows for the sustained production of hydrogen. [Brief explanation of the drawing]

[0009] [Figure 1] This is a block diagram showing the schematic configuration of a power generation device according to the first embodiment. [Figure 2] This is a schematic diagram showing the external appearance of the power generation device according to the first embodiment, viewed from the front. [Figure 3] This is a schematic diagram showing the solid material delivery unit, solid material supply path, and material supply path opening / closing unit according to the first embodiment. [Figure 4] This is a schematic diagram showing the external appearance of the power generation device according to the first embodiment, as seen from the left side. [Figure 5] Figure 5A is a schematic diagram showing the material supply path opening / closing mechanism in the state where the outlet of the solid material supply path is open. Figure 5B is a schematic diagram showing the material supply path opening / closing mechanism in the state where the outlet of the solid material supply path is closed. [Figure 6] This is a schematic diagram showing the hydrogen reaction section according to the first embodiment, with the front wall of the reaction vessel omitted. [Figure 7]This is a schematic side cross-sectional view showing the reaction vessel rotating section and the reaction vessel discharge section of the first embodiment. [Figure 8] Figures 8A to 8E are schematic diagrams showing the position and orientation of the first reaction vessel when the residue R is discharged from the first reaction vessel by the reaction vessel discharge section. [Figure 9] This figure shows the hydrogen production apparatus according to the first embodiment, with the reaction vessel group in a state where it is in the rotational reference position. [Figure 10] This figure shows the hydrogen production apparatus according to the first embodiment, with the first reaction vessel in the supply position. [Figure 11] This figure shows a hydrogen production apparatus according to the first embodiment, where the first reaction vessel is in the reaction position and the second reaction vessel is in the discharge position. [Figure 12] This figure shows the hydrogen production apparatus according to the first embodiment, with the second reaction vessel in the supply position. [Figure 13] This figure shows a hydrogen production apparatus according to the first embodiment, where the second reaction vessel is in the reaction position and the third reaction vessel is in the discharge position. [Figure 14] This figure shows the hydrogen production apparatus according to the first embodiment, with the third reaction vessel in the supply position. [Figure 15] This figure shows a hydrogen production apparatus according to the first embodiment, where the third reaction vessel is in the reaction position and the fourth reaction vessel is in the discharge position. [Figure 16] This figure shows the hydrogen production apparatus according to the first embodiment, with the fourth reaction vessel in the supply position. [Figure 17] This figure shows a hydrogen production apparatus according to the first embodiment, where the fourth reaction vessel is in the reaction position and the first reaction vessel is in the discharge position. [Figure 18] This graph illustrates how the amount of hydrogen produced in each reaction vessel changes over time. [Figure 19] This is a schematic diagram showing the external appearance of the power generation device according to the first embodiment, as viewed from the right side. [Figure 20]Figs. 20A to 20F are diagrams showing the state of the residue discharge section when performing the process of recovering the residue from the reaction tank. [Figure 21] It is a schematic diagram showing the appearance of the power generation device according to the first embodiment as viewed from the back. [Figure 22] It is a control block diagram of the power generation device of the first embodiment. [Figure 23] It is a flowchart showing the schematic flow of the hydrogen production process executed in the control unit of the first embodiment. [Figure 24] It is a block diagram showing the schematic configuration of the power generation device according to the second embodiment. [Figure 25] It is a diagram for explaining the hydrogen reaction section according to the second embodiment. [Figure 26] It is a side view of the column portion according to the second embodiment. [Figure 27] It is a diagram showing the position of the column portion and the partition wall according to the second embodiment. [Figure 28] It is a diagram showing the position of the column portion and the partition wall according to the second embodiment. [Figure 29] Figs. 29A to 29H are diagrams showing the movement of the column portion according to the second embodiment.

Mode for Carrying Out the Invention

[0010] Exemplary embodiments of the present disclosure will be described with reference to the drawings. <First Embodiment> (Configuration of Power Generation Device 10) The configuration of the power generation device 10 will be described based on FIG. 1. FIG. 1 is a block diagram showing the schematic configuration of the power generation device 10. As shown in FIG. 1, the power generation device 10 includes a hydrogen production device 12, a fuel cell 14, an initial power supply unit 16, and a pedestal 18.

[0011] (Hydrogen Production Device 12) The hydrogen production device 12 is a part that generates hydrogen by reacting granular silicon with an aqueous potassium hydroxide solution. Silicon is a hydrogen-generating substance. The aqueous potassium hydroxide solution is a solvent that reacts with silicon.

[0012] The concentration of the potassium hydroxide aqueous solution is preferably 5% or less. When the concentration of the potassium hydroxide aqueous solution is 5% or less, the potassium hydroxide aqueous solution does not violate the Poisonous and Deleterious Substances Control Law. In the following explanation, the hydrogen evolution reaction refers to the reaction in which silicon and an aqueous potassium hydroxide solution react to produce hydrogen. Residue R refers to the residue remaining after the hydrogen evolution reaction has occurred. Residue R may contain unreacted silicon or unreacted aqueous potassium hydroxide solution.

[0013] As shown in Figure 1, the hydrogen production apparatus 12 includes a material supply unit 20, a hydrogen reaction unit 22, a residue discharge unit 24, a hydrogen supply unit 26, an operation display unit 28, and a control unit 30.

[0014] (Material supply section 20) The material supply unit 20 is the part that supplies silicon and potassium hydroxide aqueous solution to the hydrogen reaction unit 22. The material supply unit 20 includes a solid material storage unit 32, a solid material delivery unit 34, a solid material supply passage 36, a liquid material storage unit 38, a liquid material delivery unit 40, a liquid material supply passage 42, and a material supply passage opening / closing unit 44.

[0015] Next, the solid material storage section 32 will be described based on Figures 2 and 3. Figure 2 is a schematic diagram showing the external appearance of the power generation device 10 viewed from the front. As shown in Figures 2 and 3, the solid material storage section 32 is a hopper for storing silicon. The solid material storage section 32 comprises a storage section body 32a and a material flow path 32b. In Figure 3, H represents the reaction material H. The reaction material H is a mixture containing silicon and an aqueous potassium hydroxide solution in which a hydrogen generation reaction is taking place. The same applies to H in Figures 10 to 17 and Figures 20A to 20F.

[0016] The storage section body 32a is a cylindrical component made of stainless steel (SUS304). The lower part of the storage section body 32a is formed in the shape of an inverted cone funnel. Through holes are formed in the upper and lower parts of the storage section body 32a. A lid that can be opened and closed is attached to the through hole in the upper part of the storage section body 32a.

[0017] The material flow path 32b is a stainless steel (SUS304) pipe. The material flow path 32b extends linearly downward from the bottom of the storage body 32a. The inside of the storage body 32a and the inside of the material flow path 32b are connected by a through hole formed in the bottom of the storage body 32a. The silicon stored in the storage body 32a falls to the solid material delivery section 34 through the through hole formed in the bottom of the storage body 32a and the material flow path 32b.

[0018] The solid material storage unit 32 is located on the upper left front side when viewed from the front of the power generation device 10. Figure 2 shows the power generation device 10 in a front view. A front view means viewing from a viewpoint in front of the power generation device 10. The user can open the lid on the top of the storage unit body 32a and replenish the silicon inside the storage unit body 32a through a through hole formed in the top of the storage unit body 32a.

[0019] Next, the solid material delivery unit 34 will be described based on Figure 3. Figure 3 is a schematic diagram showing the solid material delivery unit 34, the solid material supply path 36, and the material supply path opening / closing unit 44. As shown in Figure 3, the solid material delivery unit 34 is a mechanism for delivering a predetermined amount of silicon falling from the material flow path 32b to the solid material supply path 36. The solid material delivery unit 34 comprises a cylindrical outer cylinder 34a, a screw 34b, and a solid material delivery unit motor 34c.

[0020] The outer cylinder portion 34a is a cylindrical member made of polyvinyl chloride (PVC). The lower end of the outer cylinder portion 34a is connected to the lower end of the material flow path 32b. The upper end of the outer cylinder portion 34a is located above the reaction tank 49, which will be described later. The axial direction of the outer cylinder portion 34a is inclined with respect to both the horizontal and vertical directions.

[0021] The screw 34b is a component made of stainless steel (SUS304). The screw 34b has a rotating shaft and blades attached to the outer surface of the rotating shaft. The blades extend spirally along the outer surface of the rotating shaft. Most of the screw 34b is housed inside the outer cylinder 34a. A portion of the rotating shaft of the screw 34b protrudes diagonally upward from the upper end surface of the outer cylinder 34a. The axial direction of the screw 34b is parallel to the axial direction of the outer cylinder 34a.

[0022] The solid material delivery motor 34c is located on the upper side of the outer cylinder portion 34a. The drive shaft of the solid material delivery motor 34c is connected to the portion of the screw 34b's rotation shaft that protrudes from the upper end surface of the outer cylinder portion 34a.

[0023] The screw 34b is driven by the solid material delivery motor 34c and rotates at a predetermined rotational speed for a predetermined time. The solid material delivery motor 34c is controlled by the control unit 30, which will be described later. The rotating screw 34b delivers silicon from the lower end to the upper end of the outer cylinder 34a. Furthermore, the screw 34b delivers a predetermined amount of silicon at a time to the solid material supply passage 36, which will be described later and is connected to the upper end of the outer cylinder 34a.

[0024] The solid material supply passage 36 is a hollow pipe made of stainless steel (SUS304). The solid material supply passage 36 has a hanging section 36a and an inclined section 36b. The hanging section 36a is connected to the upper end of the outer cylinder section 34a. The inside of the hanging section 36a and the inside of the outer cylinder section 34a are in communication. The hanging section 36a extends linearly downward from the upper end of the outer cylinder section 34a. The inclined section 36b is the part that extends diagonally downward from the lower end of the hanging section 36a. The inclined section 36b penetrates the outer wall of the reaction tank 49, which will be described later, and extends into the inside of the reaction tank 49. The lower end of the inclined section 36b is inside the reaction tank 49. Silicon sent out from the upper end of the solid material delivery section 34 passes through the solid material supply passage 36 and falls into the inside of the reaction tank 49. Furthermore, since the solid material supply channel 36 has a downward slope, the silicon moves through the solid material supply channel 36 due to gravity.

[0025] Next, the liquid material storage section 38 will be described based on Figures 2 and 4. Figure 4 is a schematic diagram showing the external appearance of the power generation device 10 as viewed from the left side. As shown in Figures 2 and 4, the liquid material storage section 38 is a tank for storing an aqueous potassium hydroxide solution. The material of the liquid material storage section 38 is polyethylene. The shape of the liquid material storage section 38 is vertically elongated and flattened. As shown in Figure 2, the liquid material storage section 38 is located in the lower left side of the power generation device 10 when viewed from the front. The top of the liquid material storage section 38 is provided with a lidded opening for replenishing the aqueous potassium hydroxide solution.

[0026] The liquid material supply channel 42 is a pipe made of polytetrafluoroethylene (PTFE). The upstream end of the liquid material supply channel 42 is connected to the bottom of the liquid material storage section 38. A through hole is formed in the bottom of the liquid material storage section 38. The inside of the liquid material storage section 38 and the inside of the liquid material supply channel 42 are in communication through this through hole. The downstream end of the liquid material supply channel 42 is connected to the lower side surface of the hanging section 36a.

[0027] The potassium hydroxide aqueous solution stored in the liquid material storage section 38 flows through the liquid material supply passage 42 and the hanging section 36a into the inclined section 36b. Therefore, the inclined section 36b is a passage through which both silicon and the potassium hydroxide aqueous solution pass.

[0028] The liquid material delivery unit 40 is a canned pump for delivering potassium hydroxide aqueous solution from the liquid material storage unit 38 to the liquid material supply passage 42. For example, the NRD-08TE24-R manufactured by Iwaki Corporation can be used as the liquid material delivery unit 40. The control unit 30, which will be described later, controls the liquid material delivery unit 40. The control unit 30 delivers a predetermined amount of potassium hydroxide aqueous solution from the liquid material storage unit 38 to the liquid material supply passage 42 by controlling, for example, the driving time of the liquid material delivery unit 40.

[0029] The liquid material delivery unit 40 is located in the middle of the liquid material supply path 42. As shown in Figure 2, the liquid material delivery unit 40 is located in the lower left of the power generation device 10 when viewed from the front. As shown in Figure 4, the liquid material delivery unit 40 is located in front of the liquid material storage unit 38.

[0030] Next, the material supply path opening / closing section 44 will be described based on Figures 5A and 5B. Figure 5A is a schematic diagram showing the material supply path opening / closing section 44 in the state where the outlet 36c of the solid material supply path 36 is open. Figure 5B is a schematic diagram showing the material supply path opening / closing section 44 in the state where the outlet 36c is closed.

[0031] As shown in Figures 5A and 5B, the material supply path opening / closing section 44 is a component that can open and close the outlet 36c. The material supply path opening / closing section 44 comprises an opening / closing section body 44a and an opening section 44b.

[0032] The opening / closing body 44a is a lid capable of blocking the outlet 36c. The opening / closing body 44a comprises a stainless steel (SUS304) component and an ethylene propylene diene rubber (EPDM) packing. When the opening / closing body 44a blocks the outlet 36c, the packing comes into contact with the outlet 36c. The opening / closing body 44a is fixed to the solid material supply passage 36 by a hinge 37. The opening / closing body 44a is rotatable about the hinge 37 as its pivot point.

[0033] The opening portion 44b is a rod-shaped member fixed to one side of the opening / closing body 44a. The material of the opening portion 44b is stainless steel (SUS304). The axial direction of the opening portion 44b and the thickness direction of the opening / closing body 44a are approximately parallel. The opening portion 44b and the opening / closing body 44a are a single, integrated member with a fixed shape. Therefore, the opening portion 44b and the opening / closing body 44a rotate together as a single unit around the hinge 37 as the center of rotation.

[0034] As shown in Figure 5B, when the opening / closing body 44a closes the outlet 36c, the opening portion 44b extends from the opening / closing body 44a toward the center of the reaction vessel 49, which will be described later. Also, as shown in Figure 5B, when the opening / closing body 44a closes the outlet 36c, the opening portion 44b is located on the movement path of the pressing portion 72, which will be described later.

[0035] The pressing part 72 rotates clockwise around the rotary drive shaft 68a as shown in Figures 5A and 5B. When the opening / closing part body 44a is not pressed by the pressing part 72, gravity acting on the material supply path opening / closing part 44 closes the outlet 36c as shown in Figure 5B.

[0036] Subsequently, as shown in Figure 5A, the opening portion 44b is pressed by the pressing portion 72, causing the material supply path opening / closing portion 44 to rotate counterclockwise around the hinge 37 as the pivot point in Figure 5A. At this time, the opening / closing portion body 44a opens the outlet 36c.

[0037] Subsequently, as shown in Figure 5B, when the pressing portion 72 passes through the opening portion 44b, the material supply path opening / closing portion 44 rotates clockwise around the hinge 37 as the center of rotation, due to gravity acting on the material supply path opening / closing portion 44. As a result, the opening / closing portion body 44a closes the exit 36c.

[0038] (Hydrogen reaction section 22) Next, the hydrogen reaction section 22 will be explained based on Figure 6. Figure 6 is a schematic diagram of the hydrogen reaction section 22, with the front wall of the reaction tank 49 omitted.

[0039] As shown in Figure 6, the hydrogen reaction unit 22 is a part that generates hydrogen by reacting a predetermined amount of silicon supplied from the material supply unit 20 with a predetermined amount of potassium hydroxide aqueous solution. The hydrogen reaction unit 22 comprises a reaction tank 49, a group of reaction vessels 50, a reaction vessel rotating unit 56, and a reaction vessel discharge unit 58.

[0040] The reaction vessel 49 is a vessel that generates hydrogen by reacting a predetermined amount of silicon supplied from the material supply unit 20 with a predetermined amount of potassium hydroxide aqueous solution inside it. The material of the reaction vessel 49 is stainless steel (SUS304). The shape of the reaction vessel 49 is cylindrical. The axial direction of the cylindrical shape is parallel to the front-to-back direction of the power generation device 10. The reaction vessel 49 is housed inside the power generation device 10. The reaction vessel 49 is located in front of the fuel cell 14, which will be described later.

[0041] A hydrogen supply port 49a is provided on the top surface of the reaction vessel 49. Hydrogen generated inside the reaction vessel 49 flows through the hydrogen supply port 49a to the hydrogen supply unit 26, which will be described later. A residue discharge port 49b is provided on the bottom surface of the reaction vessel 49. Residue R is discharged from the reaction vessel group 50 to the bottom side of the inside of the reaction vessel 49. Due to gravity acting on the residue R, it is discharged to the outside of the reaction vessel 49 through the residue discharge port 49b.

[0042] Furthermore, the reaction vessel 49 is equipped with a hydrogen channel 59, a reaction vessel pressure gauge 60, a reaction vessel thermometer 62, and a reaction vessel pressure release section 64. The hydrogen channel 59 is a stainless steel (SUS304) pipe extending upward from the top surface of the reaction vessel 49. The inside of the hydrogen channel 59 and the inside of the reaction vessel 49 are connected via the hydrogen supply port 49a. Hydrogen generated in the reaction vessel 49 flows through the hydrogen supply port 49a and the hydrogen channel 59 to the first hydrogen supply passage 90 of the hydrogen supply unit 26, which will be described later.

[0043] The reaction vessel pressure gauge 60 is a general-purpose fluid pressure sensor that measures the pressure inside the reaction vessel 49. The reaction vessel pressure gauge 60 is installed in the hydrogen flow path 59. For example, an SMC product with part number PSE564-02 can be used as the reaction vessel pressure gauge 60.

[0044] The reaction vessel thermometer 62 is a thermocouple that measures the temperature of the reaction vessel 49. The reaction vessel thermometer 62 is installed on the upper outer surface of the reaction vessel 49. For example, an Omron product with model number E52-CA6D-N 2M can be used as the reaction vessel thermometer 62. The pressure value measured by the reaction vessel pressure gauge 60 and the temperature value measured by the reaction vessel thermometer 62 are input to the control unit 30, which will be described later.

[0045] The reaction vessel pressure release valve 64 is a relief valve that releases hydrogen to the outside of the reaction vessel 49 when the internal pressure of the reaction vessel 49 exceeds a preset value. The reaction vessel pressure release valve 64 is installed in the hydrogen flow path 59. For example, the ACV-S2E-80 model manufactured by Yamamoto Sangyo can be used as the reaction vessel pressure release valve 64.

[0046] The reaction vessel group 50 consists of a first reaction vessel 51, a second reaction vessel 52, a third reaction vessel 53, and a fourth reaction vessel 54. Hereinafter, each of the first reaction vessel 51, the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54 will be referred to as "each reaction vessel." Also, "reaction vessel" refers to any one of the first reaction vessel 51, the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54.

[0047] Each reaction vessel is a container that reacts silicon supplied from the solid material supply passage 36 with an aqueous potassium hydroxide solution to generate hydrogen inside the reaction tank 49. Each reaction vessel is made of stainless steel (SUS304). Each reaction vessel is the same shape and size. Each reaction vessel is a bottomed rectangular box shape with an opening 55 on the top surface. Each reaction vessel is housed inside the reaction tank 49.

[0048] The solid material supply channel 36 sequentially supplies silicon and potassium hydroxide aqueous solution to each reaction vessel. Specifically, the solid material supply channel 36 supplies silicon and potassium hydroxide aqueous solution to the first reaction vessel 51, then to the second reaction vessel 52, then to the third reaction vessel 53, and then to the fourth reaction vessel 54. After that, the solid material supply channel 36 again sequentially supplies silicon and potassium hydroxide aqueous solution to the first reaction vessel 51, the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54.

[0049] For example, when the solid material supply channel 36 is supplying silicon and potassium hydroxide aqueous solution to one of the reaction vessels in the reaction vessel group 50, it does not supply silicon and potassium hydroxide aqueous solution to the other three reaction vessels.

[0050] Each reaction vessel receives silicon and potassium hydroxide aqueous solution through its opening 55. In each reaction vessel, the silicon and potassium hydroxide aqueous solution react independently to generate hydrogen. In each reaction vessel, the generated hydrogen diffuses through the opening 55 into the inside of the reaction tank 49.

[0051] Each reaction vessel is attached to the reaction vessel rotating section 56, which will be described later. As shown in Figure 6, in a front view, each reaction vessel is arranged at 90° intervals along the circumferential direction of a circle centered on the rotating drive shaft 68a, which will be described later.

[0052] The reaction vessel rotating section 56 will be described with reference to Figures 6 and 7. Figure 7 is a schematic side cross-sectional view showing the reaction vessel rotating section 56 and the reaction vessel discharge section 58. The reaction vessel rotating section 56 is a mechanism that rotates and moves each reaction vessel inside the reaction tank 49. As shown in Figure 7, the reaction vessel rotating section 56 comprises a rotating section body 66, a rotation drive section 68, a position measuring section 70, and a pressing section 72.

[0053] The rotating body 66 is the part that rotates and moves each reaction vessel by the driving force of the rotary drive unit 68. The rotating body 66 comprises four vessel support shafts 66a, four bearing parts 66b, and a support member 66c.

[0054] As shown in Figure 6, the support member 66c is a disc-shaped member. The support member 66c is located on the rear side of the inside of the reaction vessel 49. The thickness direction of the support member 66c is parallel to the front-to-back direction of the power generation device 10.

[0055] Each of the four bearing portions 66b is attached to the support member 66c. Each of the four bearing portions 66b is a bearing for rotatably supporting one container support shaft 66a. The four bearing portions 66b are arranged at 90° intervals along the circumference of a circle centered on the rotational drive shaft 68a, when viewed from the thickness direction of the support member 66c. The positions of the four bearing portions 66b are close to the outer edge of the support member 66c.

[0056] Each of the four container support shafts 66a is a rod-shaped member. Each of the four container support shafts 66a is supported by one bearing portion 66b. The bearing portion 66b supports the portion of the container support shaft 66a near the center in the longitudinal direction. The axial directions of each of the four container support shafts 66a are parallel to the thickness direction of the support member 66c. Each of the four container support shafts 66a is rotatable about its central axis relative to the support member 66c.

[0057] The four container support shafts 66a are arranged at 90° intervals along the circumference of a circle centered on the rotation drive shaft 68a, when viewed from the thickness direction of the support member 66c. Each of the four container support shafts 66a is connected to one of the reaction vessels at its front end. The portion of the reaction vessel that connects to the container support shaft 66a is the central part of the rear surface of the reaction vessel.

[0058] The reaction vessel and the vessel support shaft 66a are integrated and rotatable with respect to the support member 66c, with respect to the vessel support shaft 66a as the center.

[0059] The rotary drive unit 68 includes a rotary drive shaft 68a. The axial direction of the rotary drive shaft 68a is parallel to the thickness direction of the support member 66c and the front-rear direction of the power generation device 10. The front end of the rotary drive shaft 68a is connected to the center of the support member 66c. The rotary drive shaft 68a passes through the center of the rear wall 49c of the reaction tank 49. The rear wall 49c is the portion of the outer wall of the reaction tank 49 that is on the rear side of the power generation device 10.

[0060] The rotary drive unit 68 includes an electric motor M for rotating the support member 66c around the rotary drive shaft 68a. The direction of rotation of the support member 66c is clockwise in Figure 6. The electric motor M is connected to the rear end of the rotary drive shaft 68a. The electric motor M is located at the rear of the reaction tank 49.

[0061] The rotary drive unit 68 is controlled by the control unit 30, which will be described later. When the support member 66c is rotated by the rotary drive unit 68, the four container support shafts 66a, the four bearing parts 66b, and each reaction vessel also rotate together with the support member 66c around the rotary drive shaft 68a.

[0062] As described above, each reaction vessel is rotatable around the vessel support shaft 66a relative to the support member 66c. Furthermore, in each reaction vessel, the bottom side is heavier than the side with the opening 55. Therefore, the orientation of each reaction vessel is basically such that the opening 55 is facing upwards (hereinafter referred to as the normal orientation). The orientation of each reaction vessel is not affected by whether or not silicon and potassium hydroxide aqueous solution are contained within them.

[0063] However, when the residue R is discharged by the reaction vessel discharge section 58 described later, the orientation of each reaction vessel will be the residue discharge orientation shown in Figure 8D. The residue discharge orientation is the orientation in which the opening 55 is angled downwards.

[0064] Each reaction vessel, when in the residue discharge position, discharges the residue R contained within it. The rotation reference 71 shown in Figure 7 is fixed to the outer surface of the rotation drive shaft 68a. The rotation reference 71 rotates together with the rotation drive shaft 68a. There are four rotation references 71. The four rotation references 71 are arranged at equal intervals along the circumferential direction of the rotation drive shaft 68a. The distance between two adjacent rotation references 71 is 90°.

[0065] The position measurement unit 70 is a position sensor that detects the rotation reference 71. The position measurement unit 70 outputs information representing the detection result of the rotation reference 71 (hereinafter referred to as rotation reference information) to the control unit 30. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0066] As shown in Figures 6 and 7, the pressing portion 72 is a rod-shaped member. The pressing portion 72 is attached to the outer circumference of the front surface of the support member 66c. The axial direction of the pressing portion 72 is parallel to the radial direction of the support member 66c. The pressing portion 72 protrudes further outward than the outer circumference end of the support member 66c.

[0067] The reaction vessel rotating section 56 is equipped with four pressing sections 72. As shown in Figure 6, the four pressing sections 72 are arranged at equal intervals along the circumferential direction of the support member 66c. The distance between two adjacent pressing sections 72 is 90°.

[0068] In the circumferential direction of the support member 66c, the positions of the four pressing portions 72 are intermediate between the first reaction vessel 51 and the second reaction vessel 52, intermediate between the second reaction vessel 52 and the third reaction vessel 53, intermediate between the third reaction vessel 53 and the fourth reaction vessel 54, and intermediate between the fourth reaction vessel 54 and the first reaction vessel 51.

[0069] When the support member 66c rotates around the rotary drive shaft 68a, the four pressing parts 72 also rotate around the rotary drive shaft 68a. As the pressing parts 72, which are rotating around the rotary drive shaft 68a, pass near the material supply passage opening / closing section 44, they push the opening section 44b, as shown in Figure 5A, causing the material supply passage opening / closing section 44 to rotate around the hinge 37 as the center of rotation. At this time, the outlet 36c of the solid material supply passage 36 is opened.

[0070] After the pressing portion 72 passes near the material supply path opening / closing portion 44, the material supply path opening / closing portion 44 rotates clockwise around the hinge 37 as the center of rotation, as shown in Figure 5B, due to gravity acting on the material supply path opening / closing portion 44. As a result, the opening / closing portion body 44a closes the outlet 36c of the solid material supply path 36.

[0071] Since the reaction vessel rotating section 56 is equipped with four pressing sections 72, when the support member 66c rotates once, the material supply path opening / closing section 44 opens and closes the outlet 36c of the solid material supply path 36 four times. Next, the reaction vessel discharge section 58 will be described based on Figures 7 and 8A to 8E. Figures 8A to 8E show the various states when the residue R is discharged from the first reaction vessel 51 by the reaction vessel discharge section 58.

[0072] As shown in Figures 8A to 8C, the reaction vessel discharge unit 58 includes a posture control unit 58a and a posture changing unit 58b. The posture control unit 58a is provided corresponding to each reaction vessel. This section describes the attitude control unit 58a corresponding to the first reaction vessel 51. The attitude control units 58a corresponding to the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54 have a similar configuration.

[0073] As shown in Figure 7, the attitude control unit 58a is fixed to the container support shaft 66a that supports the first reaction vessel 51. The attitude control unit 58a, the container support shaft 66a, and the first reaction vessel 51 rotate together as a single unit around the container support shaft 66a.

[0074] As shown in Figure 7, the attitude control unit 58a is fixed to the portion of the container support shaft 66a that is rearward of the bearing portion 66b. Also, as shown in Figure 6, the attitude control unit 58a is fixed to the portion of the container support shaft 66a that is on the side of the opening 55.

[0075] As shown in Figure 6, the attitude control unit 58a is a rod-shaped member. The attitude control unit 58a comprises a central portion 58c that extends in a straight line when viewed from the front, and inclined portions 58d at both ends. The longitudinal direction of the central portion 58c is parallel to the width direction of the first reaction vessel 51. The width direction of the first reaction vessel 51 is perpendicular to the direction from the opening 55 toward the bottom. Also, the longitudinal direction of the central portion 58c is perpendicular to the thickness direction of the support member 66c. The inclined portions 58d are inclined toward the bottom of the first reaction vessel 51.

[0076] As shown in Figures 6 and 7, the attitude changing section 58b is a rod-shaped member provided on the rear wall 49c of the reaction vessel 49. The attitude changing section 58b extends forward from the rear wall 49c. The axial direction of the attitude changing section 58b is parallel to the thickness direction of the support member 66c.

[0077] As shown in Figure 6, in a front view, the attitude changing unit 58b is located on the lower left side of the support member 66c. The attitude changing unit 58b lies on the trajectory of the attitude control unit 58a when the support member 66c rotates. In a front view, the support member 66c and each reaction vessel rotate clockwise around the rotation drive shaft 68a. With each rotation of the support member 66c and each reaction vessel, the state of the first reaction vessel 51 changes sequentially from the state shown in Figure 8A to the state shown in Figure 8E.

[0078] In the state shown in Figure 8A, the attitude control unit 58a corresponding to the first reaction vessel 51 is not yet in contact with the attitude changing unit 58b. The attitude of the first reaction vessel 51 is the normal attitude. From the state shown in Figure 8A, when the support member 66c and each reaction vessel rotate further clockwise around the rotation drive shaft 68a in a front view, they reach the state shown in Figure 8B. In the state shown in Figure 8B, the inclined portion 58d of the attitude control unit 58a corresponding to the first reaction vessel 51 contacts the attitude changing portion 58b. The attitude control unit 58a and the first reaction vessel 51 are pushed by the attitude changing portion 58b and begin to rotate counterclockwise around the bearing portion 66b in a front view.

[0079] From the state shown in Figure 8B, when the support member 66c and each reaction vessel are further rotated clockwise around the rotation drive shaft 68a in a front view, they reach the state shown in Figure 8C. In the state shown in Figure 8C, the attitude control unit 58a and the first reaction vessel 51 are further rotated counterclockwise around the bearing portion 66b in a front view.

[0080] From the state shown in Figure 8C, when the support member 66c and each reaction vessel are further rotated clockwise around the rotation drive shaft 68a in a front view, they reach the state shown in Figure 8D. In the state shown in Figure 8D, the attitude control unit 58a and the first reaction vessel 51 are further rotated counterclockwise around the bearing portion 66b in a front view. As a result, the attitude of the first reaction vessel 51 is the residue discharge attitude. The residue R is discharged from the first reaction vessel 51, which is in the residue discharge attitude. The discharged residue R accumulates on the bottom side of the inside of the reaction tank 49.

[0081] From the state shown in Figure 8D, if the support member 66c and each reaction vessel are further rotated clockwise around the rotation drive shaft 68a in a front view, the state shown in Figure 8E is reached. In the state shown in Figure 8E, the attitude control unit 58a corresponding to the first reaction vessel 51 has already passed the position of the attitude change unit 58b. The attitude control unit 58a is not being pushed by the attitude change unit 58b. Therefore, the attitude of the first reaction vessel 51 returns to its normal attitude.

[0082] The second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54 also change their orientation each time the support member 66c rotates, similar to the first reaction vessel 51.

[0083] (Continuous hydrogen generation reaction by hydrogen reaction unit 22) The sustained hydrogen generation reaction by the hydrogen reaction unit 22 will be explained based on Figures 9 to 17. In a front view, the support member 66c and each reaction vessel rotate clockwise around the rotary drive shaft 68a. With each rotation of the support member 66c and each reaction vessel, the state of the hydrogen reaction unit 22 changes sequentially from the state shown in Figure 9 to the state shown in Figure 17.

[0084] In the state shown in Figure 9, all four pressing portions 72 are separated from the opening portion 44b, so the outlet 36c of the solid material supply passage 36 is closed by the material supply passage opening / closing portion 44. Therefore, the material supply portion 20 does not supply silicon and potassium hydroxide aqueous solution to the hydrogen reaction portion 22.

[0085] Furthermore, in the state shown in Figure 9, all four attitude control units 58a are separated from the attitude changing unit 58b, so the attitude of each reaction vessel is in its normal position. Therefore, none of the reaction vessels are discharging any residue R.

[0086] Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 15°. As a result, the arrangement of each reaction vessel is as shown in Figure 10. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0087] In the state shown in Figure 10, the pressing portion 72 located between the first reaction vessel 51 and the fourth reaction vessel 54 pushes the opening portion 44b, opening the outlet 36c of the solid material supply passage 36. In the state shown in Figure 10, the first reaction vessel 51 is located below the outlet 36c of the solid material supply passage 36. Hereafter, the position below the outlet 36c of the solid material supply passage 36 will be referred to as the supply position.

[0088] In the state shown in Figure 10, all four attitude control units 58a are separated from the attitude change unit 58b, so the attitude of each reaction vessel is in its normal position. Therefore, none of the reaction vessels are discharging any residue R. Also, since the attitude of the first reaction vessel 51 is in its normal position, the first reaction vessel 51 can receive silicon and potassium hydroxide aqueous solution from the material supply unit 20.

[0089] In the state shown in Figure 10, the control unit 30 drives the solid material delivery unit 34 for a period of time T1 to deliver a predetermined amount of silicon from the solid material storage unit 32 to the solid material supply passage 36. The silicon is guided into the solid material supply passage 36 and led into the reaction vessel 49, where it falls from the open outlet 36c of the material supply passage opening / closing unit 44 and is supplied to the first reaction vessel 51 through the opening 55.

[0090] Subsequently, the control unit 30 drives the liquid material delivery unit 40 for a period of time T2, thereby sending a predetermined amount of potassium hydroxide aqueous solution from the liquid material storage unit 38 to the middle of the solid material supply line 36 via the liquid material supply line 42. The potassium hydroxide aqueous solution falls from the outlet 36c and is supplied to the first reaction vessel 51. In the first reaction vessel 51, the hydrogen generation reaction between the previously supplied silicon and the potassium hydroxide aqueous solution begins.

[0091] The hydrogen generated in the hydrogen generation reaction in the first reaction vessel 51 exits the first reaction vessel 51, passes through the inside of the reaction tank 49 and the hydrogen supply port 49a, and flows to the hydrogen supply unit 26. In the subsequent state, the hydrogen generated in the hydrogen generation reactions in the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54 also flows to the hydrogen supply unit 26.

[0092] Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 39°. As a result, the arrangement of each reaction vessel is as shown in Figure 11. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0093] Next, the control unit 30 stops the rotation of the support member 66c and each reaction vessel for a predetermined time. The predetermined time is time T3A or time T3B. In the state shown in Figure 11, all four pressing portions 72 are separated from the opening portion 44b, so the outlet 36c of the solid material supply passage 36 is closed by the material supply passage opening / closing portion 44. Therefore, the material supply portion 20 does not supply silicon and potassium hydroxide aqueous solution to the hydrogen reaction portion 22.

[0094] In the state shown in Figure 11, the attitude control unit 58a corresponding to the second reaction vessel 52 is in contact with the attitude change unit 58b, and the attitude of the second reaction vessel 52 becomes the residue discharge attitude. If there is residue R in the second reaction vessel 52, the residue R is discharged from the second reaction vessel 52.

[0095] In the state shown in Figure 11, the positions of the first reaction vessel 51, the third reaction vessel 53, and the fourth reaction vessel 54 are all in their normal positions. Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 51°. As a result, the arrangement of each reaction vessel is as shown in Figure 12. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0096] In the state shown in Figure 12, the pressing portion 72 located between the first reaction vessel 51 and the second reaction vessel 52 pushes the opening portion 44b, opening the outlet 36c of the solid material supply passage 36. In the state shown in Figure 12, the second reaction vessel 52 is in the supply position.

[0097] In the state shown in Figure 12, all four attitude control units 58a are separated from the attitude change unit 58b, so the attitude of each reaction vessel is in its normal position. Therefore, none of the reaction vessels are discharging any residue R. Also, since the attitude of the second reaction vessel 52 is in its normal position, the second reaction vessel 52 can receive silicon and potassium hydroxide aqueous solution from the material supply unit 20.

[0098] In the state shown in Figure 12, the control unit 30 controls the solid material delivery unit 34 to supply silicon to the second reaction vessel 52. The control unit 30 also controls the liquid material delivery unit 40 to supply potassium hydroxide aqueous solution to the second reaction vessel 52. The manner in which silicon and potassium hydroxide aqueous solution are supplied in the state shown in Figure 12 is the same as in the state shown in Figure 10. In the second reaction vessel 52, the hydrogen generation reaction between silicon and potassium hydroxide aqueous solution begins.

[0099] Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 39°. As a result, the arrangement of each reaction vessel is as shown in Figure 13. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0100] Next, the control unit 30 stops the rotation of the support member 66c and each reaction vessel for a predetermined time. The predetermined time is time T3A or time T3B. In the state shown in Figure 13, all four pressing sections 72 are separated from the opening section 44b, so the outlet 36c is closed by the material supply path opening / closing section 44. Therefore, the material supply section 20 does not supply silicon and potassium hydroxide aqueous solution to the hydrogen reaction section 22.

[0101] In the state shown in Figure 13, the attitude control unit 58a corresponding to the third reaction vessel 53 is in contact with the attitude change unit 58b, and the attitude of the third reaction vessel 53 becomes the residue discharge attitude. If there is residue R inside the third reaction vessel 53, the residue R is discharged from the third reaction vessel 53.

[0102] In the state shown in Figure 13, the positions of the first reaction vessel 51, the second reaction vessel 52, and the fourth reaction vessel 54 are all in their normal positions. Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 51°. As a result, the arrangement of each reaction vessel is as shown in Figure 14. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0103] In the state shown in Figure 14, the pressing portion 72 located between the second reaction vessel 52 and the third reaction vessel 53 pushes the opening portion 44b, opening the outlet 36c. In the state shown in Figure 14, the third reaction vessel 53 is in the supply position.

[0104] In the state shown in Figure 14, all four attitude control units 58a are separated from the attitude change unit 58b, so the attitude of each reaction vessel is in its normal position. Therefore, none of the reaction vessels are discharging any residue R. Also, since the attitude of the third reaction vessel 53 is in its normal position, the third reaction vessel 53 can receive silicon and potassium hydroxide aqueous solution from the material supply unit 20.

[0105] In the state shown in Figure 14, the control unit 30 controls the solid material delivery unit 34 to supply silicon to the third reaction vessel 53. The control unit 30 also controls the liquid material delivery unit 40 to supply potassium hydroxide aqueous solution to the third reaction vessel 53. The manner in which silicon and potassium hydroxide aqueous solution are supplied in the state shown in Figure 14 is the same as in the state shown in Figure 10. In the third reaction vessel 53, the hydrogen generation reaction between silicon and potassium hydroxide aqueous solution begins.

[0106] Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 39°. As a result, the arrangement of each reaction vessel is as shown in Figure 15. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0107] Next, the control unit 30 stops the rotation of the support member 66c and each reaction vessel for a predetermined time. The predetermined time is time T3A or time T3B. In the state shown in Figure 15, all four pressing sections 72 are separated from the opening section 44b, so the outlet 36c is closed by the material supply path opening / closing section 44. Therefore, the material supply section 20 does not supply silicon and potassium hydroxide aqueous solution to the hydrogen reaction section 22.

[0108] In the state shown in Figure 15, the attitude control unit 58a corresponding to the fourth reaction vessel 54 is the attitude changing unit 58b, and the attitude of the fourth reaction vessel 54 becomes the residue discharge attitude. If there is residue R inside the fourth reaction vessel 54, the residue R is discharged from the fourth reaction vessel 54.

[0109] In the state shown in Figure 15, the orientations of the first reaction vessel 51, the second reaction vessel 52, and the third reaction vessel 53 are all in their normal orientation. Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 51°. As a result, the arrangement of each reaction vessel is as shown in Figure 16. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0110] In the state shown in Figure 16, the pressing portion 72 located between the third reaction vessel 53 and the fourth reaction vessel 54 pushes the opening portion 44b, opening the outlet 36c. In the state shown in Figure 16, the fourth reaction vessel 54 is in the supply position.

[0111] In the state shown in Figure 16, all four attitude control units 58a are separated from the attitude change unit 58b, so the attitude of each reaction vessel is in its normal position. Therefore, none of the reaction vessels are discharging any residue R. Also, since the attitude of the fourth reaction vessel 54 is in its normal position, the fourth reaction vessel 54 can receive silicon and potassium hydroxide aqueous solution from the material supply unit 20.

[0112] In the state shown in Figure 16, the control unit 30 controls the solid material delivery unit 34 to supply silicon to the fourth reaction vessel 54. The control unit 30 also controls the liquid material delivery unit 40 to supply potassium hydroxide aqueous solution to the fourth reaction vessel 54. The manner in which silicon and potassium hydroxide aqueous solution are supplied in the state shown in Figure 16 is the same as in the state shown in Figure 10. In the fourth reaction vessel 54, the hydrogen generation reaction between silicon and potassium hydroxide aqueous solution begins.

[0113] Next, the control unit 30 controls the rotation drive unit 68 to rotate the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 39°. As a result, the arrangement of each reaction vessel is as shown in Figure 17. The control unit 30 controls the rotation of the rotation drive shaft 68a based on the rotation reference information.

[0114] Next, the control unit 30 stops the rotation of the support member 66c and each reaction vessel for a predetermined time. The predetermined time is time T3A or time T3B. In the state shown in Figure 17, all four pressing sections 72 are separated from the opening 44b, so the outlet 36c is closed by the material supply path opening / closing section 44. Therefore, the material supply section 20 does not supply silicon and potassium hydroxide aqueous solution to the hydrogen reaction section 22.

[0115] In the state shown in Figure 17, the attitude control unit 58a corresponding to the first reaction vessel 51 is in contact with the attitude changing unit 58b, and the attitude of the first reaction vessel 51 becomes the residue discharge attitude. If there is residue R inside the first reaction vessel 51, the residue R is discharged from the first reaction vessel 51.

[0116] In the state shown in Figure 17, the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54 are all in their normal positions. Furthermore, the hydrogen production apparatus 12 repeats a cycle consisting of the states shown in Figures 9 to 17. The hydrogen production apparatus 12 can continuously produce a certain amount or more of hydrogen for a long period of time if a sufficient amount of silicon is stored in the solid material storage section 32 and a sufficient amount of potassium hydroxide aqueous solution is stored in the liquid material storage section 38.

[0117] Figure 18 is a graph showing how the hydrogen production amounts in the first reaction vessel 51, the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54 change over time. In Figure 18, silicon is denoted as "Si" and potassium hydroxide aqueous solution is denoted as "KOH".

[0118] As shown in Figure 18, when silicon and potassium hydroxide aqueous solution are supplied to the first reaction vessel 51, hydrogen production begins in the first reaction vessel 51, and ends after a predetermined time has elapsed. The same applies to the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54.

[0119] As shown in Figure 18, before hydrogen production in the first reaction vessel 51 is completed, silicon and potassium hydroxide aqueous solution are supplied to the second reaction vessel 52, and hydrogen production in the second reaction vessel 52 begins. Before hydrogen production in the second reaction vessel 52 is completed, silicon and potassium hydroxide aqueous solution are supplied to the third reaction vessel 53, and hydrogen production in the third reaction vessel 53 begins. Before hydrogen production in the third reaction vessel 53 is completed, silicon and potassium hydroxide aqueous solution are supplied to the fourth reaction vessel 54, and hydrogen production in the fourth reaction vessel 54 begins. Before hydrogen production in the fourth reaction vessel 54 is completed, silicon and potassium hydroxide aqueous solution are supplied to the first reaction vessel 51, and hydrogen production in the first reaction vessel 51 begins.

[0120] Therefore, the hydrogen production apparatus 12 can continuously produce hydrogen.

[0121] (Residue discharge section 24) The residue discharge unit 24 will be described based on Figure 2. The residue discharge unit 24 is a mechanism for discharging the residue R that is sequentially discharged from each reaction vessel to the bottom of the reaction tank 49 to the outside of the reaction tank 49. The residue discharge unit 24 comprises a reaction tank discharge unit 74, a reaction tank discharge control unit 76, a residue storage unit 78, a storage unit discharge unit 80, a storage unit discharge control unit 82, and a residue recovery unit 84.

[0122] The reaction tank discharge section 74 is a polyvinyl chloride pipeline. The upper end of the reaction tank discharge section 74 is connected to the residue discharge port 49b located at the bottom of the reaction tank 49. The lower end of the reaction tank discharge section 74 is connected to the inlet located on the upper wall of the residue storage section 78. The reaction tank discharge section 74 extends linearly downward from the bottom of the reaction tank 49.

[0123] The residue R discharged from each reaction vessel to the bottom of the reaction tank 49 enters the reaction tank discharge section 74 through the residue discharge port 49b, flows down through the reaction tank discharge section 74, and enters the residue storage section 78. The reaction vessel discharge control unit 76 is a solenoid valve that controls the discharge of residue R from the residue outlet 49b to the residue storage unit 78 by opening and closing the pipeline of the reaction vessel discharge unit 74.

[0124] The residue storage section 78 is a cylindrical container made of polyvinyl chloride. The residue storage section 78 stores the residue R discharged from the reaction vessel 49. An inlet for the residue R is provided on the upper wall of the residue storage section 78. The reaction vessel discharge section 74 is connected to the inlet of the residue storage section 78. An outlet for the residue R is provided at the bottom of the residue storage section 78. The bottom of the residue storage section 78 has a tapered shape. The storage section discharge section 80 is connected to the outlet of the residue storage section 78.

[0125] Here, let V be the volume of each reaction vessel. The sum of the internal volume of the residue storage section 78 and the internal volume of the pipeline of the reaction vessel discharge section 74 is less than V. The storage and discharge section 80 is a polyvinyl chloride pipeline. The storage and discharge section 80 guides the residue R from the residue storage section 78 to the residue recovery section 84. The upper end of the storage and discharge section 80 is connected to the outlet of the residue storage section 78. The lower end of the storage and discharge section 80 is connected to the inlet 84a provided on the upper wall of the residue recovery section 84. The storage and discharge section 80 extends linearly downward from the lower wall of the residue storage section 78.

[0126] The storage unit discharge control unit 82 is a solenoid valve attached to the storage unit discharge unit 80. The storage unit discharge control unit 82 controls the discharge from the residue storage unit 78 to the residue recovery unit 84 by opening and closing the storage unit discharge unit 80.

[0127] The residue recovery unit 84 will be described based on Figure 19. Figure 19 is a schematic diagram showing the external appearance of the power generation device 10 as viewed from the right side. The residue recovery unit 84 is a polyvinyl chloride tank. The shape of the residue recovery unit 84 is a rectangular box shape with a hollow space inside. An inlet 84a through which the residue R flows down is formed on the upper wall of the residue recovery unit 84. The residue recovery unit 84 is equipped with a recovery port 84b.

[0128] The volume of the residue recovery section 84 is larger than the volume of the residue storage section 78. Here, VR is the volume of residue R discharged from either reaction vessel in a single discharge. The volume of the residue recovery section 84 is several tens of times VR. An electric pump or other device can be inserted into the residue recovery section 84 through the recovery port 84b to recover the residue R stored in the residue recovery section 84. (Process to recover residue R from reaction vessel 49) The process of recovering the residue R from the reaction vessel 49 will be explained based on Figures 20A to 20F. The state of the residue discharge section 24 changes sequentially from the state shown in Figure 20A to the state shown in Figure 20F, in conjunction with the rotation of each reaction vessel and the change in the orientation of each reaction vessel. In the state shown in Figure 20A, residue R is being discharged from the first reaction vessel 51. The reaction vessel discharge control unit 76 has closed the reaction vessel discharge section 74. The storage section discharge control unit 82 has opened the storage section discharge section 80. The residue R discharged from the first reaction vessel 51 accumulates at the bottom of the reaction vessel 49. The portion of the reaction vessel discharge section 74 above the reaction vessel discharge control unit 76 is filled with residue R.

[0129] Next, the state shown in Figure 20B is reached. In the state shown in Figure 20B, the discharge of residue R from the first reaction vessel 51 is complete. In the state shown in Figure 20B, first, the storage unit discharge control unit 82 closes the storage unit discharge unit 80. Then, the reaction vessel discharge control unit 76 opens the reaction vessel discharge unit 74. At this time, the residue R that had accumulated at the bottom of the inside of the reaction vessel 49 flows down through the reaction vessel discharge unit 74 and accumulates in the residue storage unit 78.

[0130] Here, the sum of the internal volume of the residue storage section 78 and the internal volume of the pipeline of the reaction tank discharge section 74 is less than V, so the residue R fills both the residue storage section 78 and the reaction tank discharge section 74, and a portion of the residue R remains at the bottom of the inside of the reaction tank 49.

[0131] Next, the system enters the state shown in Figure 20C. In the state shown in Figure 20C, first, the reaction vessel discharge control unit 76 closes the reaction vessel discharge unit 74. Then, the storage unit discharge control unit 82 opens the storage unit discharge unit 80. The residue R that had accumulated in the residue storage unit 78 flows out to the residue recovery unit 84. Next, the state shown in Figure 20D is reached. In the state shown in Figure 20D, each reaction vessel rotates more clockwise around the rotary drive shaft 68a in a front view than in the state shown in Figure 20C. In the state shown in Figure 20D, the residue R is being discharged from the second reaction vessel 52. The reaction vessel discharge control unit 76 has closed the reaction vessel discharge section 74. The storage section discharge control unit 82 has opened the storage section discharge section 80. The residue R discharged from the second reaction vessel 52 accumulates at the bottom of the reaction vessel 49. The portion of the reaction vessel discharge section 74 above the reaction vessel discharge control unit 76 is filled with the residue R.

[0132] Next, the state shown in Figure 20E is reached. In the state shown in Figure 20E, the discharge of residue R from the second reaction vessel 52 is complete. In the state shown in Figure 20E, first, the storage unit discharge control unit 82 closes the storage unit discharge unit 80. Then, the reaction vessel discharge control unit 76 opens the reaction vessel discharge unit 74. At this time, the residue R that had accumulated at the bottom of the inside of the reaction vessel 49 flows down through the reaction vessel discharge unit 74 and accumulates in the residue storage unit 78.

[0133] Here, the sum of the internal volume of the residue storage section 78 and the internal volume of the pipeline of the reaction tank discharge section 74 is less than V, so the residue R fills both the residue storage section 78 and the reaction tank discharge section 74, and a portion of the residue R remains at the bottom of the inside of the reaction tank 49.

[0134] Next, the system enters the state shown in Figure 20F. In the state shown in Figure 20F, first, the reaction vessel discharge control unit 76 closes the reaction vessel discharge unit 74. Then, the storage unit discharge control unit 82 opens the storage unit discharge unit 80. The residue R that had accumulated in the residue storage unit 78 flows out to the residue recovery unit 84.

[0135] Subsequently, the residue R discharged from the third reaction vessel 53 and the fourth reaction vessel 54 is subjected to the same treatment as described above. In the above process, when the residue R is discharged from the residue storage section 78 to the residue recovery section 84, the reaction tank discharge section 74 is closed, which prevents hydrogen generated inside the reaction tank 49 from being discharged along with the residue R.

[0136] (Hydrogen supply unit 26) The hydrogen supply unit 26 is a mechanism for removing water, which is an impurity, from the hydrogen generated inside the reaction vessel 49 and supplying it to the fuel cell 14. As shown in Figure 1, the hydrogen supply unit 26 includes an impurity removal unit 86, a buffer tank 88, a first hydrogen supply passage 90, a second hydrogen supply passage 92, a third hydrogen supply passage 94, and a check valve 96.

[0137] The first hydrogen supply channel 90 is a conduit made of PFA resin (a copolymer of tetrafluoroethylene and perfluoroalkoxyethylene). One end of the first hydrogen supply channel 90 is connected to the hydrogen flow path 59 shown in Figure 2. The other end of the first hydrogen supply channel 90 is connected to the first impurity removal section 86a. The first hydrogen supply channel 90 guides hydrogen from the reaction vessel 49 to the first impurity removal section 86a.

[0138] The impurity removal unit 86 will be explained based on Figure 21. Figure 21 is a schematic diagram of the power generation device 10 as seen from the rear. The impurity removal unit 86 is a part for removing impurities from hydrogen. Examples of impurities include water. The impurity removal unit 86 comprises a first impurity removal unit 86a, a second impurity removal unit 86b, and a connecting passage 86c.

[0139] The first impurity removal section 86a and the second impurity removal section 86b are arranged side by side. The hydrogen generated in the reaction vessel 49 first passes through the first impurity removal section 86a, then through the connecting passage 86c, and then through the second impurity removal section 86b. The first impurity removal section 86a and the second impurity removal section 86b remove water from the hydrogen.

[0140] Water is stored inside the first impurity removal section 86a. The first hydrogen supply channel 90 extends into the interior of the first impurity removal section 86a. The other end of the first hydrogen supply channel 90 is in the water stored inside the first impurity removal section 86a. Relatively high-temperature hydrogen discharged from the other end of the first hydrogen supply channel 90 passes through the water. As it passes through the water, water is removed from the hydrogen.

[0141] The connecting passage 86c is a conduit made of PFA resin. One end of the connecting passage 86c is connected to the upper part of the first impurity removal section 86a. Hydrogen that has passed through the water stored inside the first impurity removal section 86a flows into the connecting passage 86c.

[0142] Silica gel is packed inside the second impurity removal section 86b. The connecting passage 86c extends into the interior of the second impurity removal section 86b. The other end of the connecting passage 86c is located within the silica gel packed inside the second impurity removal section 86b. Hydrogen discharged from the other end of the connecting passage 86c passes through the silica gel. As it passes through the silica gel, water is removed from the hydrogen.

[0143] The second hydrogen supply channel 92 is a pipeline made of polyurethane resin. One end of the second hydrogen supply channel 92 is connected to the upper part of the second impurity removal section 86b. Hydrogen that has passed through the silica gel packed inside the second impurity removal section 86b flows into the second hydrogen supply channel 92.

[0144] The buffer tank 88 is a cylindrical tank made of stainless steel (SUS304). The other end of the second hydrogen supply channel 92 is connected to the buffer tank 88. The second hydrogen supply channel 92 guides hydrogen into the buffer tank 88.

[0145] The buffer tank 88 has the function of suppressing sudden changes in the pressure and flow rate of hydrogen supplied to the fuel cell 14 by temporarily storing hydrogen. The buffer tank 88 is housed inside the power generation device 10. The buffer tank 88 is located on the upper left rear side when viewed from the front. The buffer tank 88 is located above the liquid material storage section 38.

[0146] The buffer tank 88 is equipped with a tank pressure gauge 98 for measuring the pressure inside the buffer tank 88. The measurement information from the tank pressure gauge 98 is input to the control unit 30. The tank pressure gauge 98 is a general-purpose fluid pressure sensor. For example, an SMC product with part number PSE564-02 can be used as the tank pressure gauge 98.

[0147] The third hydrogen supply channel 94 is a pipeline made of polyurethane resin. One end of the third hydrogen supply channel 94 is connected to the buffer tank 88. The other end of the third hydrogen supply channel 94 is connected to the fuel cell 14. The third hydrogen supply channel 94 delivers hydrogen from the buffer tank 88 to the fuel cell 14.

[0148] The check valve 96 will be explained based on Figure 1. As shown in Figure 1, the check valve 96 is located in the middle of the third hydrogen supply line 94. The check valve 96 has the function of suppressing the backflow of hydrogen from the fuel cell 14 to the buffer tank 88.

[0149] The check valve 96 opens the third hydrogen supply channel 94 for the hydrogen flow from the buffer tank 88 to the fuel cell 14. Therefore, the check valve 96 allows hydrogen to move from the buffer tank 88 to the fuel cell 14. The check valve 96 closes the third hydrogen supply channel 94 for the hydrogen flow from the fuel cell 14 to the buffer tank 88. Therefore, the check valve 96 suppresses hydrogen movement from the fuel cell 14 to the buffer tank 88.

[0150] (Operation display section 28) The operation display unit 28 is a part that displays information regarding the operating status of the power generation device 10. The operation display unit 28 also receives commands for the power generation device 10. The operation display unit 28 is equipped with a small touch-panel display.

[0151] (Control Unit 30) The control unit 30 will be described based on Figure 22. Figure 22 is a control block diagram of the power generation device 10. As shown in Figure 22, the control unit 30 is the part that controls the power generation device 10. The control unit 30 includes a CPU 30a, a ROM 30b, a RAM 30c, and an input / output unit 30d.

[0152] The CPU 30a controls the solid material delivery motor 34c, the liquid material delivery unit 40, the rotary drive unit 68, the reaction vessel discharge control unit 76, the storage unit discharge control unit 82, the operation display unit 28, and the fuel cell 14 via the input / output unit 30d. The control unit 30 reads values ​​input from the reaction vessel pressure gauge 60, the reaction vessel thermometer 62, the position measurement unit 70, the tank pressure gauge 98, and the operation display unit 28. The specific processing details of the hydrogen production process performed by the control unit 30 will be described later.

[0153] (fuel cell 14) The fuel cell 14 will be described based on Figures 1 and 2. As shown in Figure 1, the fuel cell 14 is a device that generates electricity by reacting hydrogen with oxygen from the atmosphere. The hydrogen used by the fuel cell 14 is hydrogen generated in the reaction vessel 49 and from which water has been removed by the impurity removal unit 86. The fuel cell 14 is connected to the buffer tank 88 via the third hydrogen supply line 94.

[0154] As shown in Figure 2, the fuel cell 14 is housed inside the power generation device 10. The fuel cell 14 is located on the upper right rear side when viewed from the front. The fuel cell 14 is located to the right of the buffer tank 88 when viewed from the front. The fuel cell 14 is controlled by the control unit 30. For example, a fuel cell 14 with model number H-200 manufactured by Horizon Fuel Cell Japan Co., Ltd. can be used.

[0155] (Initial power supply section 16) The initial power supply unit 16 will be explained based on Figure 1. The initial power supply unit 16 is the part that supplies the necessary power to the hydrogen production device 12 until the fuel cell 14 generates electricity. The initial power supply unit 16 comprises an activation battery 16a and a power supply board 16b.

[0156] The starting battery 16a is the power source when the power switch of the power generator 10 is turned on. The starting battery 16a is equipped with a secondary battery. The power supply board 16b can switch between the power supply line of the starter battery 16a and the power supply line of the fuel cell 14. After the fuel cell 14 starts generating power, the power supply board 16b switches the power source of the hydrogen production device 12 from the starter battery 16a to the fuel cell 14.

[0157] (Stand 18) The support frame 18 will be described with reference to Figures 1 and 2. As shown in Figure 1, the support frame 18 has the function of fixing the hydrogen production device 12, the fuel cell 14, and the initial power supply unit 16. As shown in Figure 2, casters 18a are provided at the four corners of the bottom surface of the support frame 18. The power generation device 10 is movable due to the function of the casters 18a.

[0158] (Hydrogen production process by control unit 30) Next, the hydrogen production process performed by the control unit 30 will be described based on Figure 23. Figure 23 is a flowchart illustrating the general flow of the hydrogen production process performed by the control unit 30.

[0159] The hydrogen production process is achieved by the CPU 30a reading and executing a control program stored in the ROM 30b. The hydrogen production process starts when a user or other user inputs an execution start command to the control unit 30.

[0160] As shown in Figure 23, when the user turns on the power switch, the control unit 30 performs an initialization process in step S100. During the initialization process, the control unit 30 stops the solid material delivery unit motor 34c, the liquid material delivery unit 40, and the rotary drive unit 68. The control unit 30 also closes the reaction tank discharge control unit 76 and opens the storage unit discharge control unit 82. Furthermore, the control unit 30 resets the counter to zero.

[0161] In the following step S101, the control unit 30 performs a reference process. In the reference process, the control unit 30 drives the rotation drive unit 68 to stop each reaction vessel at the rotation reference position for a period of time T4. The rotation reference position is the position where, as shown in Figure 9, the material supply unit 20 is not supplying silicon and potassium hydroxide aqueous solution to the hydrogen reaction unit 22, and the posture of each reaction vessel is in its normal posture. The control unit 30 drives the rotation drive unit 68 based on the rotation reference information.

[0162] In the following step S102, the control unit 30 performs a supply position movement process. In the supply position movement process, the control unit 30 rotates the support member 66c and each reaction vessel around the rotation drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 15°. As a result, as shown in Figures 10, 12, 14, and 16, one of the first reaction vessel 51, second reaction vessel 52, third reaction vessel 53, and fourth reaction vessel 54 comes to the supply position.

[0163] In the following step S103, the control unit 30 performs a solid material supply process. In the solid material supply process, the control unit 30 drives the solid material delivery unit motor 34c for a period of time T1 to supply a predetermined amount of silicon to the reaction vessel located at the supply position.

[0164] In the following step S104, the control unit 30 performs a liquid material supply process. In the liquid material supply process, the control unit 30 drives the liquid material delivery unit 40 for a predetermined time T2 to supply a predetermined amount of potassium hydroxide aqueous solution to the reaction vessel located at the supply position.

[0165] In the following step S105, the control unit 30 performs a counter update process. In the counter update process, the control unit 30 adds "1" to the counter count. In the following step S106, the control unit 30 performs a reaction position movement process. In the reaction position movement process, the control unit 30 rotates the support member 66c and each reaction vessel around the rotary drive shaft 68a. The direction of rotation is clockwise when viewed from the front. The angle of rotation is approximately 39°.

[0166] In the following step S107, the control unit 30 performs a counter determination process. In the counter determination process, the control unit 30 reads the number of counters from the counter. If the number of counters is less than 4, the process proceeds to step S108. If the number of counters is 4 or greater, the process proceeds to step S109. (1) If the number of counters is less than 4 The process proceeds to step S108, where the control unit 30 performs reaction position waiting process A. In reaction position waiting process A, the control unit 30 stops the drive of the rotary drive unit 68 for a predetermined period of time T3A. After that, the process proceeds to step S101. (2) When the number of counters is 4 or more The process proceeds to step S109, where the control unit 30 performs reaction position waiting process B. In reaction position waiting process B, the control unit 30 stops the rotation drive unit 68 for a predetermined time T3B, and then proceeds to step S110.

[0167] In the following step S110, the control unit 30 performs the reaction vessel residue discharge process. In the reaction vessel residue discharge process, the control unit 30 controls the storage unit discharge control unit 82 to close the storage unit discharge unit 80. Then, the control unit 30 controls the reaction vessel discharge control unit 76 to open the reaction vessel discharge unit 74. After that, this state is maintained for a predetermined time T5.

[0168] In the following step S111, the control unit 30 performs the storage unit residue discharge process. In the storage unit residue discharge process, the control unit 30 controls the reaction vessel discharge control unit 76 to close the reaction vessel discharge unit 74. Then, the control unit 30 controls the storage unit discharge control unit 82 to open the storage unit discharge unit 80. After that, the process proceeds to step S101.

[0169] Thereafter, the control unit 30 repeats the process in steps S101 to S111 until the silicon in the solid material storage unit 32 or the potassium hydroxide aqueous solution in the liquid material storage unit 38 is depleted, or until the user stops the operation using the operation display unit 28.

[0170] (How to use the power generator 10) Next, the method of using the power generation device 10 according to the first embodiment will be described. The procedure for using the power generation device 10 is as shown in (A) to (H) below. (A) The user puts silicon into the solid material storage section 32. (B) The user pours potassium hydroxide aqueous solution into the liquid material storage section 38. (C) The user turns on the power by operating the power switch on the operation display unit 28. When the power is turned on, the control unit 30 controls the hydrogen reaction unit 22 to start the hydrogen production process. The hydrogen reaction unit 22 supplies hydrogen to the fuel cell 14 via the hydrogen supply unit 26. The fuel cell 14 generates electricity using the supplied hydrogen. (D) When the amount of silicon stored in the solid material storage section 32 or the potassium hydroxide aqueous solution stored in the liquid material storage section 38 falls below a preset amount, a replenishment guidance indicator is displayed on the operation display section 28 to guide the user to replenish the silicon or potassium hydroxide aqueous solution. (E) When a replenishment guidance indicator is displayed on the operation display unit 28 to guide the user to replenish silicon, the user shall replenish silicon in the solid material storage unit 32. When a replenishment guidance indicator is displayed on the operation display unit 28 to guide the user to replenish potassium hydroxide aqueous solution, the user shall replenish potassium hydroxide aqueous solution in the liquid material storage unit 38. (F) After refilling with silicon or potassium hydroxide solution, the user presses the refill complete switch displayed on the operation display unit 28. (G) When the replenishment complete switch is pressed, the hydrogen reaction unit 22 supplies hydrogen to the fuel cell 14 via the hydrogen supply unit 26. The fuel cell 14 generates electricity using the supplied hydrogen. (H) When the user wishes to stop power generation in the power generation device 10, the user presses the stop switch displayed on the operation display unit 28.

[0171] (Effects of the hydrogen production device 12) (Effect 1A) The hydrogen production apparatus 12 includes a reaction vessel 49. Inside the reaction vessel 49, silicon and an aqueous potassium hydroxide solution react to generate hydrogen. The silicon and aqueous potassium hydroxide solution correspond to multiple types of materials.

[0172] The hydrogen production apparatus 12 is equipped with a material supply unit 20. The material supply unit 20 repeatedly supplies silicon and potassium hydroxide aqueous solution into the reaction vessel 49. Specifically, when the material supply unit 20 is in the state shown in Figure 10, it supplies silicon and potassium hydroxide aqueous solution to the first reaction vessel 51 located inside the reaction vessel 49. Subsequently, when the material supply unit 20 is in the state shown in Figure 12, it supplies silicon and potassium hydroxide aqueous solution to the second reaction vessel 52 located inside the reaction vessel 49. Subsequently, when the material supply unit 20 is in the state shown in Figure 14, it supplies silicon and potassium hydroxide aqueous solution to the third reaction vessel 53 located inside the reaction vessel 49. Subsequently, when the material supply unit 20 is in the state shown in Figure 16, it supplies silicon and potassium hydroxide aqueous solution to the fourth reaction vessel 54 located inside the reaction vessel 49.

[0173] As shown in Figure 18, the material supply unit 20 supplies silicon and potassium hydroxide aqueous solution to the second reaction vessel 52 before the reaction between silicon and potassium hydroxide aqueous solution supplied to the first reaction vessel 51 is completed. The supply of silicon and potassium hydroxide aqueous solution to the first reaction vessel 51 corresponds to the previous supply of silicon and potassium hydroxide aqueous solution to the second reaction vessel 52.

[0174] Therefore, the material supply unit 20 supplies silicon and potassium hydroxide aqueous solution to the second reaction vessel 52 before the reaction between the previously supplied silicon and potassium hydroxide aqueous solution is completed. Similarly, the material supply unit 20 supplies silicon and potassium hydroxide aqueous solution to the third reaction vessel 53 before the reaction between the silicon supplied to the second reaction vessel 52 and the potassium hydroxide aqueous solution is completed (i.e., before the reaction between the silicon supplied previously and the potassium hydroxide aqueous solution is completed).

[0175] Furthermore, the material supply unit 20 supplies silicon and potassium hydroxide aqueous solution to the fourth reaction vessel 54 before the reaction between the silicon supplied to the third reaction vessel 53 and the potassium hydroxide aqueous solution is completed (i.e., before the reaction between the silicon supplied previously and the potassium hydroxide aqueous solution is completed).

[0176] Furthermore, the material supply unit 20 supplies silicon and potassium hydroxide aqueous solution to the first reaction vessel 51 before the reaction between the silicon supplied to the fourth reaction vessel 54 and the potassium hydroxide aqueous solution is completed (i.e., before the reaction between the silicon supplied previously and the potassium hydroxide aqueous solution is completed). Therefore, the hydrogen production device 12 can continuously produce hydrogen.

[0177] (Effect 1B) The silicon and potassium hydroxide aqueous solution supplied to the second reaction vessel 52 does not mix with the silicon and potassium hydroxide aqueous solution supplied to the first reaction vessel 51. The silicon and potassium hydroxide aqueous solution supplied to the first reaction vessel 51 corresponds to the silicon and potassium hydroxide aqueous solution supplied previously. Therefore, the silicon and potassium hydroxide aqueous solution supplied to the second reaction vessel 52 does not mix with the silicon and potassium hydroxide aqueous solution supplied previously.

[0178] Similarly, the silicon and potassium hydroxide aqueous solutions supplied to the first reaction vessel 51, the third reaction vessel 53, and the fourth reaction vessel 54 do not mix with the silicon and potassium hydroxide aqueous solutions supplied previously.

[0179] Therefore, the hydrogen production apparatus 12 can keep the hydrogen generation reaction using the previously supplied silicon and potassium hydroxide aqueous solution and the hydrogen generation reaction using the next supplied silicon and potassium hydroxide aqueous solution in a state of relative independence.

[0180] (Effect 1C) The reaction vessel 49 is equipped with a group of reaction vessels 50 inside. Each reaction vessel in the group of reaction vessels 50 has an opening 55. Before the reaction of the silicon and potassium hydroxide aqueous solution supplied to one of the reaction vessels in the group of reaction vessels 50 is completed, the material supply unit 20 supplies the next silicon and potassium hydroxide aqueous solution to a reaction vessel other than the one supplied to the first reaction vessel. Therefore, independent hydrogen evolution reactions can be easily generated in each reaction vessel.

[0181] (Effect 1D) Each reaction vessel moves to its supply position one by one in sequence. This allows the material supply unit 20 to be fixed in place, simplifying the configuration of the hydrogen production apparatus 12. Note that the fixing of the material supply unit 20 and the movement of each reaction vessel corresponds to the relative movement of each reaction vessel with respect to the material supply unit 20.

[0182] (Effect 1E) Each reaction vessel stops at its supply position. This makes it less likely for the supplied silicon and potassium hydroxide aqueous solution to spill from each reaction vessel at its supply position.

[0183] (Effect 1F) Silicon is a solid material. Potassium hydroxide aqueous solution is a liquid material. Therefore, the materials supplied to each reaction vessel include both a solid material and a liquid material. The material supply unit 20 comprises a solid material storage unit 32, a liquid material storage unit 38, a solid material supply passage 36, and a liquid material supply passage 42.

[0184] The solid material storage section 32 stores silicon. The liquid material storage section 38 stores an aqueous potassium hydroxide solution. The solid material supply channel 36 guides the silicon supplied from the solid material storage section 32 to each reaction vessel. The liquid material supply channel 42 guides the aqueous potassium hydroxide solution supplied from the liquid material storage section 38 to each reaction vessel. The liquid material supply channel 42 is connected to the solid material supply channel 36 midway.

[0185] This allows the silicon remaining in the solid material supply channel 36 to be flushed into each reaction vessel together with the potassium hydroxide solution. Even if the silicon solidifies on the inner wall surface of the solid material supply channel 36 due to moisture, making it difficult for the silicon or potassium hydroxide solution to pass through the solid material supply channel 36, the potassium hydroxide solution can flush the silicon away, and the specified amount of silicon and potassium hydroxide solution can be supplied to each reaction vessel.

[0186] (Effect 1G) The material supply unit 20 includes a solid material storage unit 32 and a liquid material storage unit 38. The solid material storage unit 32 and the liquid material storage unit 38 correspond to material storage units configured to store multiple types of materials.

[0187] The material supply unit 20 is equipped with a solid material supply passage 36. The solid material supply passage 36 guides silicon supplied from the solid material storage unit 32 and aqueous potassium hydroxide solution supplied from the liquid material storage unit 38 to each reaction vessel.

[0188] The material supply unit 20 includes a material supply path opening / closing unit 44. The material supply path opening / closing unit 44 opens and closes the solid material supply path 36. The material supply path opening / closing unit 44 can close the solid material supply path 36 when silicon and potassium hydroxide aqueous solution are not being supplied.

[0189] This allows the solid material supply channel 36 to be closed by the material supply channel opening / closing unit 44, reducing the inflow of moisture from the reaction vessel 49 into the solid material supply channel 36 and suppressing the solidification of silicon in the solid material supply channel 36. As a result, it is possible to prevent the supply of silicon from being obstructed by solidified silicon in the solid material supply channel 36. In addition, since it is possible to prevent hydrogen present inside the reaction vessel 49 from flowing into the solid material supply channel 36, the hydrogen generated inside the reaction vessel 49 can be utilized without waste.

[0190] (Effect lasts 1 hour) The hydrogen production apparatus 12 is equipped with a reaction vessel discharge section 58. The reaction vessel discharge section 58 discharges the residue R from each reaction vessel to the bottom side of the inside of the reaction tank 49.

[0191] Therefore, after the residue R is discharged, silicon and potassium hydroxide aqueous solution can be supplied to each reaction vessel. As a result, hydrogen production can be made even more efficient.

[0192] (Effect 1I) Each reaction vessel is stopped for a predetermined time after silicon and potassium hydroxide aqueous solution are supplied from the material supply unit 20, and before the residue R is discharged by the reaction vessel discharge unit 58. This allows for an even longer period of time for the hydrogen generation reaction to occur.

[0193] Furthermore, when the hydrogen generation reaction lasts for a long time, it is possible to prevent the silicon and potassium hydroxide aqueous solutions, which have not yet completed the hydrogen generation reaction, from being discharged from each moving reaction vessel. As a result, the silicon and potassium hydroxide aqueous solutions can be used effectively, and hydrogen can be produced continuously for a longer period of time. In addition, by stopping each reaction vessel, the electricity used in the hydrogen production apparatus 12 can be saved.

[0194] (Effect 1J) The hydrogen production apparatus 12 comprises a residue storage unit 78, a reaction tank discharge control unit 76, and a storage unit discharge control unit 82. The residue storage unit 78 is connected to the reaction tank 49 via a reaction tank discharge unit 74 and stores the residue R discharged from the reaction tank 49. The reaction tank discharge control unit 76 controls the discharge of the residue R from the reaction tank 49 to the residue storage unit 78. The storage unit discharge control unit 82 controls the discharge of the residue R stored in the residue storage unit 78 to the outside of the residue storage unit 78.

[0195] By storing the residue R accumulated in the reaction vessel 49 in the residue storage section 78, the accumulation of residue R inside the reaction vessel 49 can be suppressed. Furthermore, the residue R stored in the residue storage section 78 can be discarded. As a result, the supply of silicon and potassium hydroxide aqueous solution to each reaction vessel can be prevented from being hindered by the residue R accumulated inside the reaction vessel 49.

[0196] (Effect 1K) When the residue R is discharged from the reaction vessel 49 to the residue storage section 78, the storage section discharge control unit 82 controls the system so that the residue R is not discharged from the residue storage section 78. When the residue R stored in the residue storage section 78 is discharged to the outside of the residue storage section 78, the reaction vessel discharge control unit 76 controls the system so that the residue R is not discharged from the reaction vessel 49.

[0197] When the residue R is discharged from the reaction vessel 49 to the residue storage section 78, the residue R is not discharged from the residue storage section 78, so the residue R can be stored in the residue storage section 78. Furthermore, when the residue R is discharged from the residue storage section 78, the residue R is not discharged from the reaction vessel 49, thus preventing the hydrogen present in the reaction vessel 49 from being released to the outside of the reaction vessel 49 along with the residue R. As a result, the hydrogen present inside the reaction vessel 49 can be utilized without waste.

[0198] (Effective for 1L) The discharge of the residue R from the residue storage section 78 occurs when the residue storage section 78 is filled with the residue R. For example, when the residue storage section 78 is filled with the residue R and some of the residue R remains inside the reaction vessel 49, the storage section discharge control unit 82 prevents the discharge of the residue R from the reaction vessel 49, and then the residue R accumulated in the residue storage section 78 can be discharged to the outside of the residue storage section 78.

[0199] In this case, it is possible to prevent hydrogen present in the reaction vessel 49 from entering the residue storage section 78 and being discharged outside the reaction vessel 49 together with the residue R. As a result, the hydrogen generated inside the reaction vessel 49 can be utilized without waste.

[0200] (Effect 1M) The power generation device 10 comprises a hydrogen production device 12 and a fuel cell 14. The fuel cell 14 generates electricity using hydrogen produced by the hydrogen production device 12. The hydrogen production device 12 can continuously produce hydrogen and continuously supply hydrogen to the fuel cell 14. Therefore, the power generation device 10 can generate electricity continuously.

[0201] <Second Embodiment> (Differences from the first embodiment) The second embodiment has the same basic configuration as the first embodiment, so the differences will be described below. Note that the same reference numerals as in the first embodiment indicate the same components, and refer to the preceding description.

[0202] A power generation device 100 according to the second embodiment will be described with reference to Figure 24. Figure 24 is a block diagram showing the schematic configuration of the power generation device 100. As shown in Figure 24, the power generation device 100 includes a hydrogen production device 112, a fuel cell 14, an initial power supply unit 16, and a support frame 18. The fuel cell 14, the initial power supply unit 16, and the support frame 18 in the second embodiment have the same configuration as the fuel cell 14, the initial power supply unit 16, and the support frame 18 in the first embodiment, respectively.

[0203] The hydrogen production apparatus 112 includes a material supply unit 120, a hydrogen reaction unit 122, a residue discharge unit 24, a hydrogen supply unit 26, an operation display unit 28, and a control unit 30. The residue discharge unit 24, hydrogen supply unit 26, operation display unit 28, and control unit 30 in the second embodiment have the same configuration as the residue discharge unit 24, hydrogen supply unit 26, operation display unit 28, and control unit 30 in the first embodiment, respectively. Furthermore, the material supply unit 120 in the second embodiment has basically the same configuration as the material supply unit 20 in the first embodiment. However, the solid material supply path 136 provided in the material supply unit 120 differs in some respects from the solid material supply path 36 in the first embodiment. Details will be described later.

[0204] The first embodiment included a hydrogen reaction section 22. In contrast, the second embodiment differs in that it includes a hydrogen reaction section 122. The hydrogen reaction section 122 will be explained based on Figures 24 and 25. Figure 25 is a diagram illustrating the hydrogen reaction section 122. Figure 25 is a view of the reaction vessel 149 from the direction of the top surface, with the top surface omitted.

[0205] The hydrogen reaction section 122 is a part that generates hydrogen by reacting a predetermined amount of silicon supplied from the material supply section 120 with a predetermined amount of potassium hydroxide aqueous solution. The hydrogen reaction section 122 comprises a reaction tank 149 and a column section 102.

[0206] As shown in Figure 25, the reaction vessel 149 is a cylindrical vessel made of stainless steel (SUS304). The axial direction of the cylinder is parallel to the vertical direction. A hydrogen supply port 49a is provided on the top surface of the reaction vessel 149. Hydrogen generated inside the reaction vessel 149 flows through the hydrogen supply port 49a to the hydrogen supply unit 26.

[0207] As shown in Figure 24, the reaction vessel 149 is equipped with a reaction vessel pressure gauge 60, a reaction vessel thermometer 62, and a reaction vessel pressure release section 64. The reaction vessel pressure gauge 60, the reaction vessel thermometer 62, and the reaction vessel pressure release section 64 are the same as in the first embodiment.

[0208] As shown in Figure 25, the interior of the reaction vessel 149 is divided into four regions by four partition walls 101. These four regions are designated as the first reaction chamber 151, the second reaction chamber 152, the third reaction chamber 153, and the fourth reaction chamber 154. When viewed from the top of the reaction vessel 149, the four partition walls 101 extend radially from the center of the reaction vessel 149 outwards. When viewed from the top of the reaction vessel 149, the shapes of the first reaction chamber 151, the second reaction chamber 152, the third reaction chamber 153, and the fourth reaction chamber 154 are all arc-shaped. The lower ends of the four partition walls 101 are in contact with the bottom surface of the reaction vessel 149. There is a gap between the upper ends of the four partition walls 101 and the top surface of the reaction vessel 149.

[0209] The column 102 is a cylindrical member extending vertically. The column 102 penetrates the reaction vessel 149 in the vertical direction. As shown in Figure 25, when viewed from the top side of the reaction vessel 149, the column 102 is located in the center of the reaction vessel 149. The inner end faces of the four partition walls 101 are in contact with the outer surface of the column 102. The bottom surface of the reaction vessel 149 slopes downwards as it approaches the column 102.

[0210] The first reaction chamber 151, the second reaction chamber 152, the third reaction chamber 153, and the fourth reaction chamber 154 function similarly to the first reaction vessel 51, the second reaction vessel 52, the third reaction vessel 53, and the fourth reaction vessel 54 in the first embodiment.

[0211] Specifically, silicon and potassium hydroxide aqueous solution are supplied individually to the first reaction chamber 151, the second reaction chamber 152, the third reaction chamber 153, and the fourth reaction chamber 154 by the material supply unit 120 at time intervals. Hydrogen generation reactions occur independently in each of the first reaction chamber 151, the second reaction chamber 152, the third reaction chamber 153, and the fourth reaction chamber 154. Since there is a gap between the upper ends of the four partition walls 101 and the top surface of the reaction vessel 149, hydrogen generated in any of the reaction chambers 151, 2, 3, and 4 diffuses to the other reaction chambers. As a result, hydrogen generated in any of the reaction chambers is supplied to the hydrogen supply unit 26 from the hydrogen supply port 49a.

[0212] In the following, the first reaction chamber 151, the second reaction chamber 152, the third reaction chamber 153, and the fourth reaction chamber 154 will each be referred to as "each reaction chamber." Furthermore, "reaction chamber" refers to any one of the first reaction chamber 151, the second reaction chamber 152, the third reaction chamber 153, and the fourth reaction chamber 154. The column section 102 rotates in a counterclockwise direction when viewed from the top surface of the reaction tank 149, driven by the electric motor M of the rotary drive unit 68. The material supply unit 120 is fixed to the column section 102. Therefore, the material supply unit 120 rotates in conjunction with the rotation of the column section 102.

[0213] Next, the column 102 will be described based on Figure 26. Here, Figure 26 is a side view of the column 102. As shown in Figure 26, the outlet 136a of the solid material supply passage 136 is provided on the outer circumferential surface of the column 102. The portion of the solid material supply passage 136 on the side of the outlet 136a is a hole 136b that penetrates the column 102. The hole 136b is inclined so that it becomes lower as it approaches the outlet 136a. When the column 102 rotates in a counterclockwise direction when viewed from the top surface of the reaction vessel 149, the outlet 136a and the hole 136b also rotate in the same direction as the column 102. The solid material supply passage 136 has basically the same configuration as the solid material supply passage 36 in the first embodiment, but there are differences in the portion around the outlet 136a described above.

[0214] Furthermore, a residue discharge passage 102a is provided in the column 102. The residue discharge passage 102a is a hole that penetrates the column 102. The residue discharge passage 102a extends from an inlet 102b that opens on the outer surface of the column 102 to an outlet 102c that opens on the bottom surface of the column 102. The residue discharge passage 102a is sloped so that it becomes lower as it approaches the outlet 102c. The inlet 102b is located lower than the hole 136b.

[0215] When viewed from the top side of the reaction vessel 149, if the column 102 rotates in a counterclockwise direction, the residue discharge passage 102a also rotates in the same direction as the column 102. The hydrogen reaction section 122 is equipped with a residue discharge section 24, similar to the first embodiment. The residue discharge passage 102a is connected to the reaction vessel discharge section 74. The residue R discharged from the residue discharge passage 102a flows to the reaction vessel discharge section 74.

[0216] Next, the relationship between the positions of hole 136b, residue discharge passage 102a, and partition wall 101 will be explained based on Figure 27. Here, Figure 27 is a view of a portion of the column 102 and partition wall 101 as seen from the top of the reaction tank 149.

[0217] As shown in Figure 27, there are four areas on the outer circumferential surface of the column 102 that are covered by a single partition wall 101. There are also four areas on the outer circumferential surface of the column 102 that are not covered by the partition wall 101. The areas not covered by the partition wall 101 are part of the inner wall of one of the reaction chambers. Let A be the length of the portion of the column 102 covered by a single partition wall 101 in the circumferential direction. Let B be the length of the portion of the column 102 not covered by the partition wall 101 in the circumferential direction. A and B are approximately the same.

[0218] In the state shown in Figure 27, hole 136b is connected to the first reaction chamber 151 via outlet 136a. Silicon and potassium hydroxide aqueous solution are supplied to the first reaction chamber 151. Inlet 102b is covered by partition wall 101. Therefore, the residue R from each reaction chamber is not discharged through the residue discharge passage 102a.

[0219] Next, the relationship between the positions of the solid material supply passage 136, the residue discharge passage 102a, and the partition wall 101 will be further explained based on Figure 28. Here, Figure 28 is a view of the column 102 and a part of the partition wall 101 from the top of the reaction vessel 149. Figure 28 shows the state in which the column 102 has been rotated approximately 45° clockwise from the state shown in Figure 27, when the reaction vessel 149 is viewed from the top.

[0220] In the state shown in Figure 28, outlet 136a is covered by partition wall 101. Therefore, silicon and potassium hydroxide aqueous solution are not supplied to each reaction chamber. Residue discharge passage 102a is connected to the first reaction chamber 151 via outlet 102c. Residue R in the first reaction chamber 151 is discharged from residue discharge passage 102a.

[0221] Next, the operation of supplying silicon and potassium hydroxide aqueous solution, and discharging the residue R after the reaction, will be explained based on Figures 29A to 29H. Here, Figures 29A to 29H are diagrams illustrating the movement of the column 102. In the configuration shown in Figure 29A, hole 136b is connected to the first reaction chamber 151 via outlet 136a. Silicon and potassium hydroxide aqueous solution are supplied to the first reaction chamber 151. Inlet 102b is covered by partition wall 101. Residue R from each reaction chamber is not discharged through the residue discharge passage 102a.

[0222] The state shown in Figure 29B is the state in which the column 102 has been rotated 45° counterclockwise when viewed from the top surface direction, and then stopped, from the state shown in Figure 29A. In the state shown in Figure 29B, the outlet 136a is covered by the partition wall 101. Silicon and potassium hydroxide aqueous solution are not supplied to each reaction chamber. The residue discharge passage 102a is connected to the second reaction chamber 152 via the outlet 102c. The residue R in the second reaction chamber 152 is discharged from the residue discharge passage 102a.

[0223] The state shown in Figure 29C is the state in which the column 102 has been rotated 45° counterclockwise when viewed from the top surface direction, and then stopped, from the state shown in Figure 29B. In the state shown in Figure 29C, the hole 136b is in communication with the second reaction chamber 152 via the outlet 136a. Silicon and potassium hydroxide aqueous solution are supplied to the second reaction chamber 152. The inlet 102b is covered by a partition wall 101. Residue R from each reaction chamber is not discharged through the residue discharge passage 102a.

[0224] The state shown in Figure 29D is the state in which the column 102 has been rotated 45° counterclockwise when viewed from the top surface direction, and then stopped, from the state shown in Figure 29C. In the state shown in Figure 29D, the outlet 136a is covered by the partition wall 101. Silicon and potassium hydroxide aqueous solution are not supplied to each reaction chamber. The residue discharge passage 102a is connected to the third reaction chamber 153 via the outlet 102c. The residue R in the third reaction chamber 153 is discharged from the residue discharge passage 102a.

[0225] The state shown in Figure 29E is the state in which the column 102 has been rotated 45° counterclockwise when viewed from the top surface direction, and then stopped, from the state shown in Figure 29D. In the state shown in Figure 29E, the hole 136b is in communication with the third reaction chamber 153 via the outlet 136a. Silicon and potassium hydroxide aqueous solution are supplied to the third reaction chamber 153. The inlet 102b is covered by a partition wall 101. Residue R from each reaction chamber is not discharged through the residue discharge passage 102a.

[0226] The state shown in Figure 29F is the state in which the column 102 has been rotated 45° counterclockwise when viewed from the top surface direction, and then stopped, from the state shown in Figure 29E. In the state shown in Figure 29F, the outlet 136a is covered by the partition wall 101. Silicon and potassium hydroxide aqueous solution are not supplied to each reaction chamber. The residue discharge passage 102a is connected to the fourth reaction chamber 154 via the outlet 102c. The residue R in the fourth reaction chamber 154 is discharged from the residue discharge passage 102a.

[0227] The state shown in Figure 29G is the state in which the column 102 has been rotated 45° counterclockwise when viewed from the top surface direction, and then stopped, from the state shown in Figure 29F. In the state shown in Figure 29G, the hole 136b is in communication with the fourth reaction chamber 154 via the outlet 136a. Silicon and potassium hydroxide aqueous solution are supplied to the fourth reaction chamber 154. The inlet 102b is covered by a partition wall 101. Residue R from each reaction chamber is not discharged through the residue discharge passage 102a.

[0228] The state shown in Figure 29H is the state in which the column 102 has been rotated 45° counterclockwise when viewed from the top surface direction, and then stopped, from the state shown in Figure 29G. In the state shown in Figure 29H, the outlet 136a is covered by the partition wall 101. Silicon and potassium hydroxide aqueous solution are not supplied to each reaction chamber. The residue discharge passage 102a is connected to the first reaction chamber 151 via the outlet 102c. The residue R in the first reaction chamber 151 is discharged from the residue discharge passage 102a.

[0229] In this manner, the columnar section 102 is rotated 45° counterclockwise when viewed from the top surface, and the silicon and potassium hydroxide aqueous solution are supplied sequentially to each reaction chamber, while the residue R is discharged sequentially from each reaction chamber.

[0230] Before hydrogen production in the first reaction chamber 151 is completed, a silicon and potassium hydroxide aqueous solution is supplied to the second reaction chamber 152, and hydrogen production in the second reaction chamber 152 begins. The silicon and potassium hydroxide aqueous solution supplied to the second reaction chamber 152 does not mix with the silicon and potassium hydroxide aqueous solution supplied to the first reaction chamber 151.

[0231] Before hydrogen production in the second reaction chamber 152 is completed, a silicon and potassium hydroxide aqueous solution is supplied to the third reaction chamber 153, and hydrogen production in the third reaction chamber 153 begins. The silicon and potassium hydroxide aqueous solution supplied to the third reaction chamber 153 does not mix with the silicon and potassium hydroxide aqueous solution supplied to the second reaction chamber 152.

[0232] Before hydrogen production in the third reaction chamber 153 is completed, a silicon and potassium hydroxide aqueous solution is supplied to the fourth reaction chamber 154, and hydrogen production in the fourth reaction chamber 154 begins. The silicon and potassium hydroxide aqueous solution supplied to the fourth reaction chamber 154 does not mix with the silicon and potassium hydroxide aqueous solution supplied to the third reaction chamber 153.

[0233] Before hydrogen production in the fourth reaction chamber 154 is completed, a silicon and potassium hydroxide aqueous solution is supplied to the first reaction chamber 151, and hydrogen production in the first reaction chamber 151 begins. The silicon and potassium hydroxide aqueous solution supplied to the first reaction chamber 151 does not mix with the silicon and potassium hydroxide aqueous solution supplied to the fourth reaction chamber 154.

[0234] Therefore, the hydrogen production apparatus 112 can continuously produce hydrogen. In the second embodiment, the position of the reaction vessel 149 is fixed, and the column 102 is rotated. As the column 102 rotates, the outlet 136a and the inlet 102b also rotate. As the outlet 136a rotates, the reaction chambers to which silicon and potassium hydroxide aqueous solution are supplied from the outlet 136a are switched sequentially. As the inlet 102b rotates, the reaction chambers to which residue R is discharged into the residue discharge passage 102a are switched sequentially. Each reaction chamber moves one by one in sequence relative to the outlet 136a to the supply position to which silicon and potassium hydroxide aqueous solution are supplied from the outlet 136a.

[0235] When silicon and potassium hydroxide aqueous solution are supplied to any of the reaction chambers from outlet 136a, inlet 102b is covered by partition wall 101, so the residue R from either reaction chamber is not discharged from residue discharge passage 102a.

[0236] When the residue R from any of the reaction chambers is being discharged through the residue discharge passage 102a, outlet 136a is covered by the partition wall 101, so neither silicon nor potassium hydroxide aqueous solution is supplied to any of the reaction chambers. Also, when the residue R from any of the reaction chambers is being discharged through the residue discharge passage 102a, outlet 136a is covered by the partition wall 101, so it is possible to suppress hydrogen from entering the solid material supply passage 136.

[0237] (Effects of the hydrogen production device 112) The second embodiment described in detail above achieves the effects of the first embodiment described above, and further achieves the following effects.

[0238] (Effect 2A) In the second embodiment, the inside of the reaction vessel 149 is divided into four sections by partition walls 101, forming each reaction chamber. This reduces the number of components that make up the reaction vessel 149 and lowers the risk of failure of the hydrogen production apparatus 112.

[0239] <Other Embodiments> Although embodiments of the present disclosure have been described above, the present disclosure is not limited to the embodiments described above and can be implemented in various modified forms.

[0240] (1) In the first embodiment, the position of each reaction vessel may be fixed relative to the reaction tank 49. Then, by moving the material supply unit 20, silicon and potassium hydroxide aqueous solution may be supplied to each reaction vessel in sequence. In this case as well, similar to the first embodiment, each reaction vessel moves relative to the material supply unit 20.

[0241] (2) In the first embodiment, when moving each reaction vessel to the supply position in sequence, each reaction vessel may be moved linearly inside the reaction tank 49. Examples of directions for linear movement include the up and down direction, the left and right direction, or the front and back direction.

[0242] (3) In the first embodiment, the material supply path opening / closing section 44 may be opened and closed by an electric device such as a motor or a cylinder. (4) In the first embodiment, the posture of each reaction vessel may be changed by electric devices such as motors and cylinders.

[0243] (5) In the first embodiment, the residue R may be discharged from each reaction vessel by a configuration that opens and closes the bottom of each reaction vessel. In the second embodiment, the residue R may be discharged from each reaction chamber by a configuration that opens and closes the bottom of each reaction chamber.

[0244] (6) In the first embodiment, the number of reaction vessels may be 2, 3, or 5 or more. In the second embodiment, the number of reaction chambers may be 2, 3, or 5 or more. (7) In the first and second embodiments, the supply of the potassium hydroxide aqueous solution was started after the supply of silicon was completed. However, this is not limiting, and the supply of the potassium hydroxide aqueous solution may be started during the supply of silicon, or the supply of silicon and the potassium hydroxide aqueous solution may be started simultaneously, or silicon may be supplied after the supply of the potassium hydroxide aqueous solution is started, or silicon may be supplied after the supply of the potassium hydroxide aqueous solution is completed.

[0245] (8) In the first embodiment, each time the residue R is discharged from each reaction vessel into the inside of the reaction tank 49, the residue discharge unit 24 discharges the residue R from the inside of the reaction tank 49 to the outside. However, this is not limiting, and the residue R discharged from each reaction vessel may be stored inside the reaction tank 49, and when the residue R has been discharged from each reaction vessel a predetermined number of times, the residue discharge unit 24 may discharge the residue R from the inside of the reaction tank 49 to the outside. The same applies to the second embodiment.

[0246] (9) In the first and second embodiments, the temperatures of the reaction tanks 49 and 149 are not actively controlled. However, this is not limiting, and the temperatures of the reaction tanks 49 and 149 may be controlled. When the hydrogen production apparatuses 12 and 112 are installed in cold regions, the hydrogen production efficiency can be improved by heating the reaction tanks 49 and 149 with a heater or the like. Also, when the hydrogen production apparatuses 12 and 112 are installed in hot regions, excessive progress of the hydrogen generation reaction can be suppressed by cooling the reaction tanks 49 and 149 with cooling means such as Peltier elements.

[0247] (10) In the first and second embodiments, the hydrogen supply unit 26 includes the buffer tank 88, but the present invention is not limited to this, and the buffer tank 88 may be omitted. (11) In the first and second embodiments, the power generation devices 10 and 100 including the hydrogen production devices 12 and 112 and the fuel cell 14 have been described. However, the present invention is not limited to this, and the hydrogen production devices 12 and 112 may be a single unit alone, or the hydrogen production devices 12 and 112 may be combined with other devices other than the fuel cell 14.

[0248] (12) In the first and second embodiments, the rotation reference information is generated using the position measurement unit 70 and the rotation reference position 71, and the rotation of the member is controlled based on the rotation reference information. However, the present invention is not limited to this, and the rotation may be controlled using an encoder, a potentiometer, or other means.

[0249] (13) In the first embodiment, each reaction vessel is stopped when silicon and an aqueous potassium hydroxide solution are supplied to each reaction vessel at the supply position. However, the present invention is not limited to this, and each reaction vessel may not be stopped at the supply position.

[0250] In the second embodiment, each reaction chamber is stopped when silicon and an aqueous potassium hydroxide solution are supplied to each reaction chamber at the supply position. However, the present invention is not limited to this, and each reaction chamber may not be stopped at the supply position.

[0251] (14) In the first embodiment, each reaction vessel is temporarily stopped after silicon and an aqueous potassium hydroxide solution are supplied to each reaction vessel. However, the present invention is not limited to this, and each reaction vessel may not be stopped. In the second embodiment, each reaction chamber is temporarily stopped after silicon and an aqueous potassium hydroxide solution are supplied to each reaction chamber. However, the present invention is not limited to this, and each reaction chamber may not be stopped.

[0252] (15) In the first embodiment, the residue discharge posture is maintained for a predetermined time when discharging the residue R from each reaction vessel. However, the present invention is not limited to this, and after setting the reaction vessel in the residue discharge posture, it may immediately return to the normal posture.

[0253] (16) In the first and second embodiments, silicon was used as the hydrogen generating substance and an aqueous potassium hydroxide solution as the solvent, but the invention is not limited to these, and any substance that reacts to generate hydrogen can be appropriately selected.

[0254] Examples of hydrogen-generating materials include solid materials. Examples of solid materials include metallic materials and metal hydrides. Examples of metallic materials include aluminum, magnesium, magnesium hydroxide, sodium borohydride (SBH), and calcium hydroxide. Examples of metal hydrides include MgH2, NaAlH4, and LaNi5H6.

[0255] Examples of solvents include liquid materials. Examples of liquid materials include water, acids, and alkalis. Examples of acids include hydrochloric acid, sulfuric acid, nitric acid, carbonic acid, carboxylic acid, and citric acid. Examples of alkalis include sodium hydroxide, lithium hydroxide, and ammonium hydroxide.

[0256] Examples of combinations of hydrogen-generating substances and solvents include combinations of metallic materials and acids. Examples of metallic materials in this combination include aluminum, magnesium, magnesium hydroxide, sodium borohydride (SBH), and calcium hydroxide. Examples of acids in this combination include hydrochloric acid, sulfuric acid, nitric acid, carbonic acid, carboxylic acid, and citric acid.

[0257] Other combinations include those of nonmetallic materials and alkalis. Examples of nonmetallic materials in these combinations include silicon. Examples of alkalis in these combinations include sodium hydroxide, lithium hydroxide, and ammonium hydroxide. Other combinations include those of metal hydrides such as MgH2, NaAlH4, and LaNi5H6 with water.

[0258] (17) In the first and second embodiments, a potassium hydroxide aqueous solution with a potassium hydroxide concentration of 5% or less is used so that the power generation devices 10 and 100 of this disclosure can be used without filing a notification or appointing a person in charge under the Poisonous and Deleterious Substances Control Act. However, the invention is not limited to this, and a potassium hydroxide aqueous solution with a potassium hydroxide concentration greater than 5% may be used to increase the efficiency of the hydrogen generation reaction. In this case, it is preferable that the components and equipment that come into contact with the high-concentration potassium hydroxide aqueous solution have corrosion resistance that can withstand the high-concentration potassium hydroxide aqueous solution.

[0259] (18) The solid material delivery unit 34 in the first and second embodiments is a screw type that delivers silicon by the rotation of a screw 34b, but is not limited to this, and can be a vibratory feeder, coil feeder, circle feeder, throttling type, sliding door type, or any other type that can supply a fixed amount of solid material.

[0260] (19) In the first and second embodiments, the volume of the residue storage section 78 was set to be smaller than the volume of one batch of residue R discharged from each reaction vessel or reaction chamber. However, the volume of the residue storage section 78 may be set to be larger than the volume of one batch of residue R discharged from each reaction vessel or reaction chamber. For example, the volume of the residue storage section 78 may be set to be multiple times the volume of one batch of residue R discharged from each reaction vessel or reaction chamber.

[0261] (20) In the first and second embodiments, a residue storage unit 78 and a residue recovery unit 84 are provided, but the invention is not limited to these, and the residue recovery unit 84 may be omitted. In this case, the residue R can be discharged from the residue storage unit 78 to the outside of the power generation devices 10 and 100.

[0262] (21) In the first and second embodiments, a secondary battery was used as the starting battery 16a, but the invention is not limited to this, and other power sources such as dry cell batteries or external power supplies may be used.

[0263] (22) In the first and second embodiments, the impurity removal unit 86 removes moisture in hydrogen. However, the present invention is not limited to this, and in addition to, or instead of, removing moisture, oxygen in hydrogen may be removed. When removing oxygen, a deoxidizer may be used as the impurity removal substance of the impurity removal unit 86.

[0264] (23) In the first and second embodiments, the impurity removal unit 86 includes the first impurity removal unit 86a and the second impurity removal unit 86b. However, the present invention is not limited to this, and one of the first impurity removal unit 86a and the second impurity removal unit 86b may not be provided. Further, the impurity removal unit 86 may include three or more impurity removal units.

[0265] (24) In the first and second embodiments, the impurity removal unit 86 connects the first impurity removal unit 86a and the second impurity removal unit 86b in series. However, a plurality of impurity removal units may be connected in parallel. (25) In the first and second embodiments, the substances removed by the first impurity removal unit 86a and the substances removed by the second impurity removal unit 86b are different. However, the present invention is not limited to this, and the substances removed by the first impurity removal unit 86a and the substances removed by the second impurity removal unit 86b may be the same.

[0266] (26) In the first and second embodiments, hydrogen generation reactions may occur simultaneously in three or more reaction vessels or three or more reaction chambers. (27) In the first and second embodiments, silicon and the potassium hydroxide aqueous solution are supplied through one solid material supply path 36, 136. However, the present invention is not limited to this, and the supply path for silicon and the supply path for the potassium hydroxide aqueous solution may be provided independently.

[0267] (28) In the first and second embodiments, the dosage form of silicon is granular. However, the present invention is not limited to this, and the dosage form of silicon may be powder smaller than granules. Further, solid materials such as silicon may be solid substances formed by a method such as compacting powder.

[0268] (29) In the second embodiment, the material supply unit 120 is fixed to the column 102 and rotates along with the rotation of the column 102. However, the material supply unit 120 may be fixed to a member other than the column 102, so that only the column 102 rotates. [Explanation of symbols]

[0269] 10...Power generation device, 12...Hydrogen production device, 14...Fuel cell, 16...Initial power supply unit, 16a...Starting battery, 16b...Power supply board, 18...Stand, 18a...Casters, 20...Material supply unit, 22...Hydrogen reaction unit, 24...Residue discharge unit, 26...Hydrogen supply unit, 28...Operation display unit, 30...Control unit, 30a...CPU, 30b...ROM, 30c...RAM, 30d...Input / output unit, 32...Solid material storage unit, 32a...Storage unit body, 32b...Material flow path, 34...Solid material delivery unit, 34a...Outer cylinder unit, 34b...Screw, 34c...Solid material delivery unit motor, 36...Solid material supply Path, 36a...hanging section, 36b...inclined section, 36c...outlet, 37...hinge, 38...liquid material storage section, 40...liquid material delivery section, 42...liquid material supply path, 44...material supply path opening / closing section, 44a...opening / closing section body, 44b...opening section, 49...reaction vessel, 49a...hydrogen supply port, 49b...residue discharge port, 49c...rear wall, 50...reaction vessel group, 51...first reaction vessel, 52...second reaction vessel, 53...third reaction vessel, 54...fourth reaction vessel, 55...opening, 56...reaction vessel rotation section, 58...reaction vessel discharge section, 58a...attitude control section, 58b...attitude change section, 58c...central section, 58d... Inclined section, 59...Hydrogen flow path, 60...Reaction vessel pressure gauge, 62...Reaction vessel thermometer, 64...Reaction vessel pressure release section, 66...Rotating section body, 66a...Container support shaft, 66b...Bearing section, 66c...Support member, 68...Rotation drive section, 68a...Rotation drive shaft, 70...Position measurement section, 71...Rotation reference, 72...Pressing section, 74...Reaction vessel discharge section, 76...Reaction vessel discharge control section, 78...Residue storage section, 80...Storage section discharge section, 82...Storage section discharge control section, 84...Residue recovery section, 84a...Inlet, 84b...Recovery port, 86...Impurity removal section, 86a...First impurity removal section, 86b...Second impurity removal section, 8 6c...Connection passage, 88...Buffer tank, 90...First hydrogen supply passage, 92...Second hydrogen supply passage, 94...Third hydrogen supply passage, 96...Check valve, 98...Tank pressure gauge, 100...Power generator, 101...Partition wall, 102...Column section, 102a...Residue discharge passage, 102b...Inlet, 102c...Outlet, 112...Hydrogen production equipment, 120...Material supply section, 122...Hydrogen reaction section, 136...Solid material supply passage, 136a...Outlet, 136b...Hole, 149...Reaction vessel, 151...First reaction chamber, 152...Second reaction chamber, 153...Third reaction chamber, 154...Fourth reaction chamber, M...Electric motor, R...Residue

Claims

1. A reaction vessel configured such that multiple types of materials react inside to generate hydrogen, The system comprises a material supply unit configured to repeatedly supply the aforementioned multiple types of materials into the reaction vessel, The material supply unit is configured to supply the multiple types of materials in such a way that they do not mix with the multiple types of materials supplied previously before the reaction of the multiple types of materials supplied previously is complete. The reaction vessel comprises a plurality of reaction vessels having openings inside, The material supply unit is configured to supply the multiple types of materials to a reaction vessel other than the one reaction vessel before the reaction of the multiple types of materials supplied to one of the multiple reaction vessels is completed. Each of the multiple reaction vessels is configured to move one by one in sequence relative to the material supply unit to a position where it can receive the supply of the multiple types of materials from the material supply unit. The aforementioned multiple types of materials include solid materials and liquid materials. Hydrogen production equipment.

2. A hydrogen production apparatus according to claim 1, Each of the plurality of reaction vessels is configured to stop at a position where it can receive the supply of the plurality of materials from the material supply unit. Hydrogen production equipment.

3. A hydrogen production apparatus according to claim 1 or 2, The material supply unit is, A material storage unit configured to store the aforementioned multiple types of materials, A material supply path configured to guide the multiple types of materials supplied from the material storage section to the multiple reaction vessels, The system further comprises a material supply path opening / closing unit configured to open and close the material supply path, Hydrogen production equipment.

4. A hydrogen production apparatus according to claim 1 or 2, The system further includes a reaction vessel discharge unit configured to discharge the residue after the reaction of the multiple types of materials in each of the multiple reaction vessels into the inside of the reaction tank, Hydrogen production equipment.

5. A hydrogen production apparatus according to claim 4, Each of the reaction vessels is configured to be stopped for a predetermined time between the time the multiple types of materials are supplied from the material supply unit and the time the residue is discharged by the reaction vessel discharge unit. Hydrogen production equipment.

6. A hydrogen production apparatus according to claim 4, A residue storage unit is connected to the reaction tank via a reaction tank discharge unit and configured to store the residue discharged from the reaction tank, A reaction tank discharge control unit configured to control the discharge of the residue from the reaction tank to the residue storage unit, The system further comprises a storage unit discharge control unit configured to control the discharge of the residue stored in the residue storage unit to the outside of the residue storage unit. Hydrogen production equipment.

7. A hydrogen production apparatus according to claim 6, When discharging the residue from the reaction vessel to the residue storage section, the storage section discharge control unit controls the system so that the residue is not discharged from the residue storage section. When discharging the residue stored in the residue storage section to the outside of the residue storage section, the reaction vessel discharge control unit controls the discharge so that the residue is not discharged from the reaction vessel. Hydrogen production equipment.

8. A hydrogen production apparatus according to claim 7, The discharge of the residue from the residue storage section is performed when the residue storage section is filled with the residue. Hydrogen production equipment.

9. A hydrogen production apparatus according to claim 1 or 2, A fuel cell that generates electricity using hydrogen produced by the hydrogen production apparatus is provided. A power generator.

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