Light-emitting element, display device, and method for manufacturing light-emitting element

Abstract

A light emitting element (1) is provided with: a light emitting layer (13) which is positioned between a first electrode (11) and a second electrode (15), has quantum dots (2), and contains fluorine; a first functional layer (12) which is positioned between the first electrode and the light emitting layer; a second functional layer (14) which is positioned between the second electrode and the light emitting layer; and a fluorine-containing film (3) which is positioned between the first functional layer (12) and the second functional layer (14).

Description

Light-emitting element, display device, and method for manufacturing light-emitting element

[0001] The present disclosure relates to a light-emitting device and the like.

[0002] Patent Document 1 discloses a quantum dot composition containing quantum dots whose surfaces are modified with fluorine-containing ligands and a fluororesin.

[0003] International Publication No. 2020 / 241112

[0004] Light-emitting devices using conventional quantum dot compositions have the problem of low luminous efficiency.

[0005] A light-emitting element according to one aspect of the present disclosure comprises a first electrode and a second electrode, an emitting layer located between the first electrode and the second electrode, having quantum dots and containing fluorine, a first functional layer located between the first electrode and the emitting layer, a second functional layer located between the second electrode and the emitting layer, and a fluorine-containing film located between the first functional layer and the second functional layer.

[0006] A method for manufacturing a light-emitting element according to one aspect of the present disclosure includes the steps of forming a first functional layer, forming a fluorine-containing film on the first functional layer, and applying a solution containing a fluorine-containing compound and quantum dots onto the fluorine-containing film.

[0007] According to one aspect of the present disclosure, the luminous efficiency of a light-emitting element can be improved.

[0008] 1 is a schematic diagram showing the configuration of a light-emitting element according to embodiment 1. FIG. 2 is a cross-sectional view showing a configuration example of a light-emitting element. FIG. 3 is a cross-sectional view showing a configuration example of a display device including the light-emitting element according to embodiment 1. FIG. 4 is a flowchart showing an example of a method for manufacturing the light-emitting element according to embodiment 1. FIG. 5 is a cross-sectional view showing the configuration and carrier path of a comparative example. FIG. 6 is a cross-sectional view showing the carrier path of the light-emitting element according to embodiment 1. FIG. 7 is a cross-sectional view of a light-emitting element according to embodiment 2. FIG. 8 is a cross-sectional view of a light-emitting element according to a modified example of embodiment 2. FIG. 9 is a flowchart showing an example of a method for manufacturing the light-emitting element according to embodiment 3. FIG. 10 is a cross-sectional view showing an example of a method for manufacturing the light-emitting element according to embodiment 3.

[0009] [Embodiment 1] Fig. 1 is a schematic diagram showing the configuration of a light-emitting element according to embodiment 1. Fig. 2 is a cross-sectional view showing an example configuration of the light-emitting element. As shown in Figs. 1 and 2, the light-emitting element 1 includes a first electrode 11 and a second electrode 15, a light-emitting layer 13 located between the first electrode 11 and the second electrode 15, the light-emitting layer 13 having quantum dots 2 and containing fluorine (F), a first functional layer 12 located between the first electrode 11 and the light-emitting layer 13, a second functional layer 14 located between the second electrode 15 and the light-emitting layer 13, and a fluorine-containing film 3 located between the first functional layer 12 and the second functional layer 14.

[0010] Layers other than the light-emitting layer 13 located between the first electrode 11 and the second electrode 15 are collectively referred to as functional layers. The functional layers may have carrier (electron or hole) transport properties and may be a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), or an electron injection layer (EIL). The first electrode 11 may be an anode, the first functional layer 12 may be a hole transport layer, the second functional layer 14 may be an electron transport layer, and the second electrode 15 may be a cathode. The first electrode 11 may be a cathode, the first functional layer 12 may be an electron transport layer, the second functional layer 14 may be a hole transport layer, and the second electrode 15 may be an anode. The light-emitting element 1 may be formed on a pixel circuit substrate 7. In this case, the first electrode 11 may be located closer to the pixel circuit substrate 7 than the second electrode 15.

[0011] The quantum dots 2 are dots made of nanoparticles with a maximum width of 100 nm or less. They may have the property of generating electroluminescence (luminescence) when a voltage V is applied between the first electrode 11 and the second electrode 15. The quantum dots 2 may be of a core-shell type or a shell-less type (exposed core type).

[0012] The shape of the quantum dots 2 is not particularly limited as long as it satisfies the above-mentioned maximum width, and is not limited to a spherical three-dimensional shape (circular cross-sectional shape). For example, the quantum dots 2 may have a polygonal cross-sectional shape, a rod-like three-dimensional shape, a branch-like three-dimensional shape, a three-dimensional shape with an uneven surface, or a combination thereof.

[0013] The quantum dots 2 may include at least one of crystals of II-VI group semiconductors such as MgS, MgSe, MgTe, CaS, CaSe, CaTe, SrS, SrSe, SrTe, BaS, BaSe, BaTe, ZnS, ZnSe, ZnTe, CdS, CdSe, CdTe, HgS, HgSe, and HgTe, crystals of III-V group semiconductors such as GaAs, GaP, InN, InAs, InP, and InSb, and crystals of IV group semiconductors such as Si and Ge.

[0014] The quantum dots 2 may have a core-shell structure in which the core is made of a semiconductor crystal as described above and is overcoated with a shell material having a wider band gap than the core. Furthermore, the quantum dots 2 may have ligands that are adsorbed (coordinated) on the surface of the quantum dots 2.

[0015] The fluorine-containing film 3 may be a liquid-repellent film containing a liquid-repellent component, or may contain a polymer compound. The fluorine-containing film 3 may be a resist film containing a polymer compound that has liquid repellency.

[0016] The region sandwiched between the first functional layer 12 and the second functional layer 14 may be divided into two equal parts in the thickness direction, with the first region A1 being located closer to the first functional layer 12 and the second region A2 being located closer to the second functional layer 14, and the fluorine-containing film 3 may be included in the first region A1. At least a portion of the fluorine-containing film 3 may be located below the light-emitting layer 13 (between the first functional layer 12 and the quantum dots 2).

[0017] In the light-emitting element 1, since the light-emitting layer 13 contains fluorine, even if the fluorine-containing film 3 is liquid-repellent, the unevenness in the arrangement of the quantum dots 2 on the fluorine-containing film 3 is reduced. This increases the carrier path and suppresses variations in the light emission distribution.

[0018] By providing a liquid-repellent fluorine-containing film 3, a protective function for the first functional layer 12 is obtained when forming the upper layer, and a barrier function (the fluorine-containing film 3 prevents moisture from entering from outside the element) is obtained after the element is completed, thereby improving the reliability of the light-emitting element 1.

[0019] The fluorine-containing film 3 may be insulating, in which case the balance (carrier balance) of holes and electrons supplied to the light-emitting layer 13 can be improved, and the external luminous efficiency (EQE) can be increased.

[0020] The fluorine-containing film 3 may be in the form of a layer in contact with the first functional layer 12. This further enhances the protective function of the first functional layer 12 during processing and the barrier function after the device is completed. The thickness of the fluorine-containing film 3 may be smaller than the thickness of the first functional layer 12. This allows the surface of the first functional layer 12 to have affinity with the light-emitting layer 13 while keeping the thickness low.

[0021] The light-emitting layer 13 may contain a fluorine-terminated organic compound 21 (having a fluorine atom F at the end). The organic compound 21 may be an additive (e.g., a ligand agent). The organic compound 21 may coordinate to the quantum dots 2 as a ligand. This makes it easier for the quantum dots 2 to disperse in the solution, facilitating coating and formation. Note that the light-emitting layer 13 containing the organic compound 21 can be considered to function as a ligand agent (the organic compound 21 is coordinated to the quantum dots 2).

[0022] 2 , the first region A1 may have a higher fluorine concentration than the second region A2. That is, the first region A1 has a higher fluorine concentration due to the presence of the fluorine-terminated organic compound 21 and the fluorine-containing film 3. On the other hand, the second region A2 has a lower fluorine concentration than the first region A1 due to the presence of only the organic compound 21. In this way, by configuring the first region A1 so that the fluorine-terminated organic compound 21 gathers on the fluorine-containing film 3, the wettability of the solution (quantum dot solution containing the quantum dots 2 and the organic compound 21) is improved when the light-emitting layer 13 is formed by coating the solution.

[0023] FIG. 3 is a cross-sectional view showing an example of the configuration of a display device including the light-emitting elements according to the first embodiment. The display device 30 has a plurality of light-emitting elements 1 (1R, 1G, 1B) emitting light of different colors on a pixel circuit substrate 7. The light-emitting element 1 (1R) may include a light-emitting layer 13 (13R) that emits red light, the light-emitting element 1 (1G) may include a light-emitting layer 13 (13G) that emits green light, and the light-emitting element 1 (1B) may include a light-emitting layer 13 (13B) that emits blue light. The plurality of light-emitting elements 1 may have a common first functional layer 12 and a common second functional layer 14. The plurality of light-emitting elements 1 may have a common second electrode 15. A sealing layer 17 may be formed to cover the second electrode 15. The first electrode 11 may be located closer to the pixel circuit substrate 7 than the second electrode 15.

[0024] The light-emitting element 1 in the display device 30 may include an edge cover film 8 in contact with an edge surface of the first electrode 11, and the first functional layer 12 and the second functional layer 14 may extend above the edge cover film 8. The edge cover film 8 may be formed across a plurality of light-emitting elements 1, and a region where the edge cover film 8 is not present may be defined as a pixel opening region K, in which a non-edge portion of the first electrode 11 (e.g., an anode) of each light-emitting element 1 is exposed. In the light-emitting layer 13, a portion located above the pixel opening region K emits light.

[0025] As shown in Figures 2 and 3, the region located above the pixel opening region K and between the first functional layer 12 and the quantum dots 2 is designated as the third region A3, and the region located above the edge cover film 8 and sandwiched between the first functional layer 12 and the second functional layer 14 is designated as the fourth region A4, and the third region A3 may have a higher fluorine concentration than the fourth region A4.

[0026] This effectively protects the portion of the first functional layer 12 located above the pixel opening region K (the portion below the third region A3) during and after the process (after the element is completed), and improves the wettability of the solution when forming the light-emitting layer 13 by applying the solution.

[0027] The third region A3 can have a thickness D (D = 0.5 nm to 20 nm) in the stacking direction from the top surface of the first functional layer 12 toward the second electrode 15 above the pixel opening region K. The fourth region A4 can have a thickness D (D = 0.5 nm to 20 nm) in the stacking direction from the top surface of the first functional layer 12 toward the second electrode 15 above the edge cover film 8, for example.

[0028] The edge cover film 8 includes an insulating material (e.g., polyimide resins, acrylic resins, novolac resins, fluorene resins, etc.). The edge cover film 8 can be formed by patterning a photosensitive resin material using, for example, photolithography. The photosensitive resin may be either negative or positive.

[0029] The fluorine-containing film 3 may be a resist film containing a polymer compound having an alkyl group, and the polymer compound may contain two or more carbon atoms. The thickness of the fluorine-containing film 3 may be 0.5 to 20 nm.

[0030] The fluorine-containing film 3 (resist film) may be formed so as to remain as a single unit (in the form of a continuous film), or so as to have resist components scattered therein (in the form of islands). The fluorine-containing film 3 (resist film) is inserted between the light-emitting layer 13 and the first functional layer 12 for one of the purposes of improving carrier balance, and may not contain quantum dots 2. The fluorine-containing film 3 (resist film) may be inserted (formed) both between the first functional layer 12 and the light-emitting layer 13 and between the light-emitting layer 13 and the second functional layer 14.

[0031] The light-emitting layer 13 may contain a fluorine-terminated (having a fluorine atom F at the end) organic compound 21. The fluorine-terminated organic compound 21 may be represented by the following structural formula (1) or (2). In this case, the wettability and coatability with respect to the fluorine-containing film 3 (resist film) can be further improved.

[0032] (1)

[0033] (2)

[0034] The organic compound 21 preferably contains a chain compound, which improves the dispersibility of the quantum dots 2 coordinated with the organic compound 21 as a ligand in a non-polar solvent.

[0035] The organic compound 21 preferably has a plurality of coordinating functional groups, including at least one of a thiol group, an amino group, a carboxyl group, and a phosphino group, which improves the dispersibility of the quantum dots 2 coordinated with the organic compound 21 in a polar solvent.

[0036] The organic compound 21 preferably contains a polycyclic aromatic hydrocarbon having two or more benzene rings, which improves the dispersibility of the quantum dots 2 coordinated with the organic compound 21 (organic ligand agent) in the aromatic compound solvent.

[0037] The organic compound 21 contained in the light-emitting element 1 can be identified by combining a plurality of analytical techniques, including MALDI-TOF-MS (Matrix Assisted Laser Desorption / Ionization - Time of Flight Mass Spectrometry), LC-MS / MS (Liquid Chromatograph - Mass Spectrometry), and TOF-SIMS (Time-of-Flight Secondary Ion Mass Spectrometry).

[0038] Matrix-assisted laser desorption ionization (MALDI) involves irradiating a matrix mixture with nitrogen laser light (wavelength = 337 nm) to rapidly heat (several nanoseconds) the topmost 100 nm and vaporize it.

[0039] Time-of-flight mass spectrometry (TOF-MS) includes a method of performing mass analysis by utilizing the fact that the flight time of ions differs depending on the mass-to-charge ratio m / z value.

[0040] A liquid chromatograph mass spectrometer (LC-MS / MS) is a device that combines a high-performance liquid chromatograph (HPLC) with a triple quadrupole mass spectrometer (MS / MS). The connected MS section of an LC-MS / MS allows for more separated mass spectra than an LC-MS, making it superior for identifying molecules.

[0041] In time-of-flight secondary ion mass spectrometry (TOF-SIMS), a sample is irradiated with a primary ion beam under ultra-high vacuum, resulting in the emission of secondary ions from the very surface (1-3 nm) of the sample. By introducing the secondary ions into a time-of-flight (TOF) mass spectrometer, a mass spectrum of the sample's outermost surface can be obtained. By keeping the primary ion dose low, surface components can be detected as molecular ions that retain their chemical structure or as partially cleaved fragments, providing information on the elemental composition and chemical structure of the outermost surface.

[0042] 4 is a flowchart showing an example of a method for manufacturing a light-emitting device according to embodiment 1. As shown in FIG. 4, the method for manufacturing a light-emitting device according to embodiment 1 includes a step (S10) of forming a first functional layer 12, a step (S20) of forming a fluorine-containing film 3 on the first functional layer 12, and a step (S30) of applying a solution containing a fluorine-containing organic compound 21 and quantum dots 2 onto the fluorine-containing film 3. The fluorine-containing film 3 may be a liquid-repellent resist film. The organic compound 21 may be a fluorine-terminated ligand agent.

[0043] The quantum dots 2 used in the light-emitting layer 13 can be coordinated with a fluorine-terminated organic compound 21 as a ligand by an organic ligand substitution treatment. The organic ligand substitution treatment can be performed by a general method, in which a solution containing the fluorine-terminated organic compound 21 is added to an initial quantum dot dispersion, followed by ultrasonic treatment or the like. This treatment (ultrasonic treatment, removal of supernatant, re-dispersion, etc.) can be repeated as necessary.

[0044] Coordinating the fluorine-terminated organic compound 21 to the quantum dots 2 in the solution improves the wettability (applicability) of the fluorine-containing film 3 (e.g., a liquid-repellent resist film). Making the fluorine-containing film 3 liquid-repellent can protect the first functional layer 12 (e.g., a hole transport layer) during the formation (process) of an upper layer. The polarity of the fluorine-containing film 3 may be high enough to repel water, which is highly polar.

[0045] When the first functional layer 12 is a hole transport layer, the material of the first functional layer 12 is not particularly limited as long as it is a hole transport material that can transport holes injected from the first electrode 11, which is the anode, to the quantum dot layer 13. For example, TFB, which is a material that does not contain nanoparticles, can be used.

[0046] When the second functional layer 14 is an electron transport layer, the material of the second functional layer 14 is not particularly limited as long as it is an electron transport material that can transport electrons injected from the second electrode 15, which is the cathode, to the quantum dot layer 13. For example, TPBi, which is a material that does not contain nanoparticles, can be used.

[0047] Examples of materials that can be used for the hole transport layer (HTL) include organic materials such as poly[(9,9-dioctylfluorenyl-2,7-diyl)-co-(4,4'-(N-4-sec-butylphenyl))diphenylamine)] (TFB), poly(4-butyltriphenylamine) (p-TPD), poly(9-vinylcarbazole) (PVK), [9,9'-[1,2-phenylenebis(methylene)]bis[N3,N3,N6,N6-tetrakis(4-methoxyphenyl)-9H-carbazole-3,6-diamine] (V886), and 7,7'-bi[1,4]benzoxazino[2,3,4-kl]phenoxazine (HN-D1), and inorganic materials such as NiO nanoparticles.

[0048] Examples of materials that can be used for the electron transport layer (ETL) include organic materials such as (2,2',2''-(1,3,5-benzinetriyl)-tris(1-phenyl-1-H-benzimidazole) (TPBi), bathocuproine (BCP), and nanoparticles of organometallic complexes, and inorganic materials such as nanoparticles of n-type oxide semiconductors. Examples of organometallic complexes include tris(8-quinolinol)aluminum complex (Alq3). Examples of n-type oxide semiconductors include metal oxides such as ZnO and ZnMgO.

[0049] FIG. 5 is a cross-sectional view showing the configuration and carrier paths of a comparative example. FIG. 6 is a cross-sectional view showing the carrier paths of the light-emitting element according to embodiment 1. In the light-emitting layer of the comparative example, the ligands of the quantum dots Q on the liquid-repellent resist layer do not contain fluorine. In this case, gaps are likely to form in the light-emitting layer, leading to an increase in interfacial defects between the resist layer and the light-emitting layer and a deterioration in the flatness of the light-emitting layer. Furthermore, as shown in FIG. 4, the formation of gaps limits the number of carrier paths, making it more likely that in-plane variations in light-emitting brightness will occur.

[0050] In contrast, in the light-emitting element 1 according to the first embodiment, as shown in Fig. 6, gaps are less likely to be formed on the fluorine-containing film 3. This reduces the occurrence of interfacial defects between the fluorine-containing film 3 and the light-emitting layer 13, and improves the flatness of the light-emitting layer 13. Furthermore, since the number of carrier paths CP increases, the light emission distribution of the light-emitting layer 13 becomes more uniform, and the voltage between the first electrode 11 and the second electrode 15 also becomes smaller.

[0051] An ultrathin insulating film can be used for the fluorine-containing film 3. The ultrathin insulating film may be made of, for example, PMMA (poly(methylmethacrylate)), PEIE (polyethylenimine ethoxylated), PEI (polyethylenimine), or the like.

[0052] 7 and 8 are schematic diagrams showing the configuration of a light-emitting device according to a second embodiment. In the second embodiment, a fluorine-terminated organic compound 21 and a halogen atom 23 are coordinated to a quantum dot 2 as ligands. The halogen atom 23 may be a fluorine atom (F) bonded to the surface of the quantum dot 2. The organic compound 21 may be a long-chain ligand, and the halogen atom may be a short-chain ligand. The short-chain ligand binds to the quantum dot 2 so as to intercalate between the long-chain ligands, thereby filling the gaps between the fluorine-containing film 3 and the quantum dot 2.

[0053] In addition to the organic compound 21, the quantum dots 2 are provided with halogen atoms 23 as ligands, which further improves wettability, coating properties, and reliability with respect to the fluorine-containing film 3. The halogen atoms 23 fill in surface defects of the quantum dots 2, thereby improving luminous efficiency. In the manufacturing method of the second embodiment, the organic compound 21 and a halogen element may be added to the solution shown in FIG.

[0054] 7, quantum dots 2 coordinated with fluorine-terminated organic compounds 21 and halogen atoms 23 are disposed throughout the light-emitting layer 13, but this is not limiting. As shown in FIG. 8, quantum dots 2 coordinated with fluorine-terminated organic compounds 21 and halogen atoms 23 may be disposed at the interface with the fluorine-containing film 3 (for example, the first layer), and quantum dots 2 coordinated only with organic compounds 21 may be disposed in other portions. Note that using only halogen atoms as ligands reduces the dispersibility of the quantum dots.

[0055] [Embodiment 3] Fig. 9 is a flowchart illustrating an example of a method for manufacturing a light-emitting device according to embodiment 3. Fig. 10 is a cross-sectional view illustrating an example of a method for manufacturing a light-emitting device according to embodiment 3. In Fig. 9, a step of forming an edge cover film 8 (S50), a step of forming a first functional layer 12 (S60), a step of forming a planar liquid-repellent resist film RZ on the first functional layer 12 (S70, see Fig. 10), a step of patterning the planar resist film RZ (S80, see Fig. 10), and a step of applying a solution YK containing a fluorine-containing organic compound 21 and quantum dots 2 onto the liquid-repellent resist pattern RP obtained in step S80 (S90, see Fig. 10) are performed.

[0056] As shown in FIG. 10 , after patterning the planar resist film RZ, the resist film (e.g., island-shaped resist residue) remaining on the region (pixel opening region K) where the edge cover film 8 is not present is a fluorine-containing film 3, and a solution YK containing quantum dots 2, a fluorine-terminated organic compound 21 (organic ligand agent), and a solvent 25 may be applied to the fluorine-containing film 3, which is the resist residue. The solution YK may be supplied over the entire surface. Because the fluorine-containing film 3, which is the resist residue, has lower liquid repellency than the resist film RZ, the solution YK can be selectively applied to the pixel opening region K. The light-emitting layer 13 can be formed by removing the solvent 25 from the solution (coating liquid) YK.

[0057] The fluorine-terminated organic compound 21 coordinates as a ligand to the quantum dots 2, making it possible to apply the solution YK even on the liquid-repellent remaining resist film (fluorine-containing film 3), and the quantum dots 2 are arranged without large gaps. Furthermore, the fluorine-containing film 3 (insulating liquid-repellent film), which is the remaining resist film, adjusts the mobility of holes or electrons, thereby improving the carrier balance and increasing the luminous efficiency.

[0058] The above-described embodiments are intended to be illustrative and explanatory, and not limiting, and many variations will be apparent to those skilled in the art based on these examples and descriptions.

[0059] REFERENCE SIGNS LIST 1, 1R, 1G, 1B Light-emitting element 2 Quantum dot 3 Fluorine-containing film 8 Edge cover film 7 Pixel circuit substrate 11 First electrode 12 First functional layer 13, 13R, 13G, 13B Light-emitting layer 14 Second functional layer 15 Second electrode 21 Organic compound 23 Halogen atom 30 Display device V Applied voltage A1 First region A2 Second region A3 Third region A4 Fourth region CP Carrier path

Claims

1. A first electrode and a second electrode; a light-emitting layer having quantum dots and containing fluorine, the light-emitting layer being located between the first electrode and the second electrode; a first functional layer located between the first electrode and the light emitting layer; a second functional layer located between the second electrode and the light emitting layer; a fluorine-containing film located between the first functional layer and the second functional layer.

2. The light-emitting element according to claim 1 , wherein the fluorine-containing film contains a liquid-repellent component.

3. The light-emitting element according to claim 1 , wherein the fluorine-containing film contains a polymer compound.

4. The light-emitting device according to claim 1 , wherein the fluorine-containing film is insulating.

5. A region sandwiched between the first functional layer and the second functional layer is divided into two equal parts in a thickness direction, and the part located on the first functional layer side is defined as a first region, and the part located on the second functional layer side is defined as a second region, The light-emitting device according to claim 1 , wherein the fluorine-containing film is included in the first region.

6. The light-emitting device according to claim 5 , wherein the first region has a higher fluorine concentration than the second region.

7. an edge cover film in contact with an end surface of the first electrode; the first functional layer and the second functional layer extend above the edge cover film; a region located between the quantum dots and the first functional layer is a third region; a fourth region is a region located above the edge cover film and sandwiched between the first functional layer and the second functional layer; The light-emitting device according to claim 1 , wherein the third region has a higher fluorine concentration than the fourth region.

8. The light-emitting element according to claim 1 , wherein the fluorine-containing film is in the form of a layer in contact with the first functional layer or the second functional layer.

9. The light-emitting element according to claim 1 , wherein the thickness of the fluorine-containing film is smaller than the thickness of the first functional layer.

10. The light-emitting element according to claim 1 , wherein the fluorine-containing film is a resist film containing fluorine.

11. The light-emitting element according to claim 1 , wherein the light-emitting layer contains an organic compound containing fluorine.

12. The light-emitting device of claim 1 , wherein the light-emitting layer contains a halogen element located on the surface of the quantum dots.

13. The light-emitting element according to claim 1 , wherein the fluorine-containing film contains a polymer compound having an alkyl group.

14. The light-emitting device according to claim 11 , wherein the organic compound is represented by the following structural formula (1) or (2): （１） 【Chemistry 1】 （２） 【Chemistry 2】

15. The light-emitting device according to claim 11 , wherein the organic compound comprises a chain compound.

16. The light-emitting device according to claim 11 , wherein the organic compound has a plurality of coordination functional groups.

17. The light-emitting device according to claim 11 , wherein the organic compound includes a polycyclic aromatic hydrocarbon having two or more benzene rings.

18. The light-emitting device according to claim 1 , wherein the fluorine-containing film is an island-shaped resist residual film.

19. The light-emitting device according to claim 1 , wherein a portion of the fluorine-containing film is located in the light-emitting layer.

20. The light-emitting element according to claim 1 , wherein the first functional layer is an electron transport layer or a hole transport layer.

21. A light emitting device according to claim 1 and a pixel circuit substrate, The display device, wherein the first electrode is provided at a position closer to the pixel circuit substrate than the second electrode.

22. forming a first functional layer; forming a fluorine-containing film on the first functional layer; and applying a solution containing a fluorine-containing compound and quantum dots onto the fluorine-containing film.

23. The method for producing a light-emitting element according to claim 22, wherein the fluorine-containing film is a liquid-repellent resist film.

24. 24. The method for producing a light-emitting element according to claim 22, wherein the compound containing fluorine is an organic compound having the fluorine at a terminal end.

25. The method for producing a light-emitting element according to claim 22 , wherein the solution further contains a halogen element.

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