Object holding device, exposure device, object moving method, and object holding system

Abstract

This object holding device comprises: a holding part that holds an object, and is driven in a first direction that is a scanning direction of the object, and in a second direction that is orthogonal to the first direction in a horizontal plane; and a pair of linear motors that include a first unit and a second unit, and apply thrust in the first direction and thrust in the second direction to the holding part. The first unit has a plurality of armature modules, each including a magnetic core with two or more protruding parts protruding in the second direction, and a coil which is wound around the magnetic core, and through which current of the same phase flows. The second unit has a magnet module that includes a plurality of permanent magnets disposed while changing polarities in the first direction, and that is disposed between the two adjacent protruding parts. At least a portion of each of the plurality of permanent magnets is accommodated in a space between the two adjacent protruding parts.

Description

Object holding device, exposure apparatus, object moving method, and object holding system

[0001] The present invention relates to an object holding device, an exposure apparatus, an object moving method, and an object holding system.

[0002] Conventionally, in the lithography process for manufacturing electronic devices (microdevices) such as liquid crystal display elements and semiconductor elements (integrated circuits, etc.), a step-and-scan exposure apparatus (a so-called scanning stepper (also called a scanner)) has been used, in which a mask or reticle (hereinafter collectively referred to as a "mask") and a glass substrate or wafer (hereinafter collectively referred to as a "substrate") are moved synchronously along a predetermined scanning direction (scanning direction), and a pattern formed on the mask is transferred onto the substrate using an energy beam.

[0003] In exposure equipment, the illuminance of the illumination system has improved dramatically due to the development of light sources such as UV-LEDs (Ultraviolet-Light Emitting Diodes), and since it is now possible to ensure exposure even when driving various stages, including the mask stage, at high speeds, there is an increasing demand for faster driving speeds for the various stages, including the mask stage.Increasing the driving speed of various stages improves throughput.

[0004] As a driving device for driving the mask stage in the scanning direction, for example, a linear motor is used (for example, see Patent Document 1).

[0005] Japanese Patent Application Laid-Open No. 2017-15995

[0006] According to a first aspect of the disclosure, an object holding device includes a holding section that holds an object and is driven in a first direction that is a scanning direction of the object and a second direction that is perpendicular to the first direction in a horizontal plane; a first unit having a plurality of armature modules each including a magnetic core having two or more protrusions that protrude in the second direction and a coil wound around the magnetic core and through which currents of the same phase flow; and a second unit having a magnet module that includes a plurality of permanent magnets arranged with alternating poles in the first direction and that is arranged between two adjacent protrusions, and the object holding device includes a pair of linear motors that apply a thrust in the first direction and a thrust in the second direction to the holding section, and at least a portion of each of the plurality of permanent magnets is contained within a space sandwiched between the two adjacent protrusions.

[0007] According to a second aspect of the disclosure, the exposure apparatus comprises the above-mentioned object holding device, and a pattern forming device that forms a pattern possessed by the object on the exposure object by an exposure operation of exposing the exposure object with an energy beam through the object held by the object holding device.

[0008] According to a third aspect of the disclosure, a method for moving an object includes: arranging a pair of first units, each having a plurality of armature modules, each including a magnetic core having two or more protrusions protruding in a first direction, and a coil wound around the magnetic core and through which currents of the same phase flow, so that the first direction is perpendicular to a scanning direction of an object; arranging a pair of second units, each having a magnet module that includes a plurality of permanent magnets arranged with alternating poles in a second direction and that is arranged between two adjacent protrusions, so that the second direction is parallel to the scanning direction and at least a portion of each of the plurality of permanent magnets is contained in a space sandwiched between the two adjacent protrusions; and applying a thrust in the scanning direction and a thrust in a direction perpendicular to the scanning direction in a horizontal plane to a holder that holds the object by a pair of linear motors each constituted by the first unit and the second unit, thereby moving the object in the scanning direction and the perpendicular direction.

[0009] According to a fourth aspect of the disclosure, an object holding system includes: an object holding device including a holding section that holds an object and is driven in a first direction that is a scanning direction of the object and a second direction that is perpendicular to the first direction in a horizontal plane; a first unit having a plurality of armature modules each including a magnetic core having two or more protrusions protruding in the second direction and a coil wound around the magnetic core and through which currents of the same phase flow; a second unit having a magnet module that includes a plurality of permanent magnets arranged with alternating poles in the first direction and arranged between two adjacent protrusions, and a pair of linear motors that apply thrust in the first direction and thrust in the second direction to the holding section; and a control device that controls the pair of linear motors, wherein at least a portion of each of the plurality of permanent magnets is contained within a space sandwiched between the two adjacent protrusions.

[0010] The configurations of the embodiments described below may be modified as appropriate, and at least a portion of the configuration may be replaced with other components. Furthermore, components that are not particularly limited in terms of their placement may be placed in any position that allows them to achieve their function, not limited to the placement disclosed in the embodiments.

[0011] FIG. 1 is a schematic diagram showing the configuration of an exposure apparatus according to an embodiment. FIG. 2(A) is a plan view of a mask stage device according to an embodiment, and FIG. 2(B) is a side view of the mask stage device according to an embodiment. FIG. 3(A) is a perspective view showing the configuration of a linear motor, and FIG. 3(B) is a side view for explaining the arrangement of a first unit and a second unit in an embodiment. FIGS. 4(A) and 4(B) are side views for explaining the force generated between the first unit and the second unit, and FIG. 4(C) is a side view for explaining the thrust in the Y-axis direction applied to the stage main body. FIG. 5 is a block diagram showing an example of the configuration of a mask stage control device that controls the driving of the first linear motor and the second linear motor. FIG. 6(A) is a plan view of a mask stage device according to a modified example, and FIG. 6(B) is a side view of a mask stage device according to a modified example.

[0012] As described above, a linear motor, for example, is used as a driving device for driving the mask stage in the scanning direction. The mask stage is configured as a three-degree-of-freedom (DOF) planar stage with X-axis, Y-axis, θ-axis, and z-axis degrees of freedom on a plane in order to synchronize with the substrate stage.

[0013] Here, when attempting to employ a cored linear motor, which is a highly efficient linear motor with a high magnetic flux density, in order to meet the demand for faster driving speed of the mask stage, it has been difficult to mount a typical cored linear motor on a 3DOF planar stage such as a mask stage because a strong magnetic attraction force is generated between the core portion and the permanent magnet portion of the motor. In this embodiment, a highly efficient cored linear motor with a high magnetic flux density is mounted on the mask stage, thereby realizing faster driving speed of the mask stage and position control of the mask stage in the X-axis direction, Y-axis direction, and θz direction.

[0014] An exposure apparatus 10 according to one embodiment will be described with reference to FIGS.

[0015] (Configuration of Exposure Apparatus) FIG. 1 is a diagram that shows schematically the configuration of an exposure apparatus 10 according to one embodiment.

[0016] The exposure apparatus 10 is a scanning stepper (scanner) that drives a mask MSK and a glass substrate (hereinafter referred to as "substrate") P in the same direction and at the same speed relative to a projection optical system PL, thereby transferring a pattern formed on the mask MSK onto the substrate P. The substrate P is a rectangular glass substrate used in, for example, a liquid crystal display device (flat panel display), with at least one side or diagonal length of 500 mm or more.

[0017] In the following, the direction in which the mask MSK and substrate P are driven during scanning exposure (scanning direction) is referred to as the X-axis direction, the direction in a horizontal plane perpendicular to this is referred to as the Y-axis direction, the direction perpendicular to the X-axis and Y-axis is referred to as the Z-axis direction, and the directions of rotation (tilt) about the X-axis, Y-axis, and Z-axis are referred to as the θx, θy, and θz directions, respectively. Furthermore, the position in the X-axis direction, the position in the Y-axis direction, and the position in the θz direction of the stage main body 60 provided in the mask stage device MST, which will be described later, may be referred to as the X position, Y position, and θz position, respectively.

[0018] The exposure apparatus 10 includes an illumination system IOP, a mask stage device MST that holds a mask MSK, a projection optical system PL, a body 70 that supports these, a substrate stage PST that holds a substrate P, and a control device 600. The control device 600 includes a mask stage control device 400 that controls the mask stage device MST, and a substrate stage control device 500 that controls the substrate stage PST.

[0019] The body 70 includes a base (vibration isolation table) 71, columns 72A and 72B, and an optical surface plate 73. The base (vibration isolation table) 71 is placed on a floor F and supports the columns 72A, 72B, etc. while isolating vibrations from the floor F. The columns 72A and 72B each have a frame shape, with the column 72A being placed inside the column 72B. The optical surface plate 73 has a flat plate shape and is fixed to the ceiling of the column 72A.

[0020] The illumination system IOP is disposed above the body 70. The illumination system IOP irradiates the mask MSK with illumination light IL.

[0021] The mask stage device MST includes a stage main body 60, to which a mask MSK having a pattern surface (the lower surface in FIG. 1) on which a circuit pattern is formed is fixed, for example, by vacuum suction (or electrostatic suction). The mask stage device MST is driven by a pair of linear motors 100 (described later) at a predetermined stroke in the scanning direction (X-axis direction), and is also driven slightly in the non-scanning directions (Y-axis direction and θz direction). The configuration of the mask stage device MST will be described in detail later.

[0022] The projection optical system PL is supported by an optical surface plate 73 below (on the -Z side of) the mask stage device MST. The projection optical system PL forms, for example, a rectangular image field with its longitudinal direction in the Y-axis direction. The projection area of ​​the projection optical system PL is sometimes called the exposure area.

[0023] When an illumination area on the mask MSK is illuminated by illumination light IL from illumination system IOP, the illumination light IL that has passed through the mask MSK forms a projected image (partial erect image) of the circuit pattern of the mask MSK within that illumination area, via the projection optical system PL, in an irradiation area (exposure area (conjugate to the illumination area)) on the substrate P, which is arranged on the image plane side of the projection optical system PL. Here, a resist (sensitizer) is applied to the surface of the substrate P. By synchronously driving the mask stage device MST and the substrate stage PST, i.e., by driving the mask MSK in the scanning direction (X-axis direction) relative to the illumination area (illumination light IL) and driving the substrate P in the same scanning direction relative to the exposure area (illumination light IL), the substrate P is exposed and the pattern of the mask MSK is transferred onto the substrate P.

[0024] The substrate stage PST is disposed on a base (vibration isolation table) 71 below (on the -Z side of) the projection optical system PL. The substrate P is held on the substrate stage PST via a substrate holder (not shown).

[0025] Position information of the substrate stage PST in the XY plane (including rotation information (yawing amount (rotation amount θz in the θz direction), pitching amount (rotation amount θx in the θx direction), and rolling amount (rotation amount θy in the θy direction))) is measured by an interferometer system. The interferometer system measures the position of the substrate stage PST by irradiating a measurement beam from the optical surface plate 73 onto a movable mirror (or a mirror-finished reflective surface (not shown)) provided at the end of the substrate stage PST, and receiving the reflected light from the movable mirror. The measurement results are supplied to the substrate stage control device 500, which drives the substrate stage PST in accordance with the measurement results of the interferometer system.

[0026] In the exposure apparatus 10, alignment measurement (for example, EGA, etc.) is performed prior to exposure, and the results are used to expose the substrate P in the following procedure. First, the mask stage device MST and the substrate stage PST are synchronously driven in the X-axis direction in accordance with instructions from the mask stage control device 400 and the substrate stage control device 500. This performs scanning exposure on the first shot area on the substrate P. When scanning exposure on the first shot area is completed, the substrate stage control device 500 moves (steps) the substrate stage PST to a position corresponding to the second shot area. Then, scanning exposure is performed on the second shot area. The substrate stage control device 500 similarly repeats stepping between shot areas on the substrate P and scanning exposure on the shot areas. This causes the pattern of the mask MSK to be transferred to all shot areas on the substrate P.

[0027] (Configuration of mask stage device MST) Next, the configuration of mask stage device MST in this embodiment will be explained. Fig. 2(A) is a plan view of mask stage device MST, and Fig. 2(B) is a side view of mask stage device MST. Note that Fig. 2(B) shows a cross section including a permanent magnet 301, which will be described later, for second unit 300, which will be described later. Also, some elements are not shown in Fig. 2(B).

[0028] As shown in Figures 2(A) and 2(B), the mask stage device MST comprises a pair of X beams 61, a stage main body 60 that holds the mask MSK, and a pair of linear motors 100 that apply thrust to the stage main body 60.

[0029] The pair of X beams 61 are fixed to, for example, the column 72 B. The pair of X beams 61 are members extending in the X-axis direction and are arranged parallel to each other and spaced apart in the Y-axis direction.

[0030] The stage main body 60 is made of a plate-like member that is rectangular in plan view, and has a rectangular, elongated hole-shaped opening 60a formed in its center with its longitudinal direction in the X-axis direction. The mask MSK is inserted into the opening 60a. Of the wall surfaces that define the opening 60a, a plurality (e.g., five) of holding members (not shown) including suction pads for suction-holding the mask MSK from below are attached at predetermined intervals in the X-axis direction to each of the +Y side and -Y side wall surfaces.

[0031] Furthermore, air bearings 62, which are a type of gas hydrostatic bearing, are attached to the underside of stage main body 60, for example, near each of the four corners (see FIG. 2B). By ejecting pressurized gas from, for example, the four air bearings 62, stage main body 60 is levitated in a non-contact manner above a base 65 supported by columns 72B via a minute clearance.

[0032] 2A, a pair of X movable mirrors 63X having reflective surfaces perpendicular to the X axis are attached at a predetermined interval in the Y axis direction to the side surface on the -X side of the stage main body 60. Also, a Y movable mirror 63Y (bar mirror) having a reflective surface perpendicular to the Y axis is attached to the side surface on the -Y side of the stage main body 60.

[0033] Position information of stage main body 60 (i.e., mask MSK) in the XY plane is constantly detected with a resolution of, for example, about 0.5 to 1 nm by a laser interferometer system (hereinafter referred to as the mask interferometer system) that includes a pair of X laser interferometers 64X corresponding to each of the pair of X movable mirrors 63X and a Y laser interferometer 64Y corresponding to the Y movable mirror 63Y. Position information of stage main body 60 in the θz direction is found based on the output of the pair of X laser interferometers 64X.

[0034] The stage main body 60 is driven in the X-axis direction, Y-axis direction, and θz direction by a pair of linear motors 100. The pair of linear motors 100 face each other in the Y-axis direction, sandwiching the stage main body 60 therebetween. Specifically, the pair of linear motors 100 includes a first linear motor 100a arranged on the +Y side of the stage main body 60, and a second linear motor 100b arranged on the -Y side of the stage main body 60.

[0035] (Configuration of Linear Motor 100) Next, the configuration of the linear motor 100 will be described. Fig. 3(A) is a perspective view showing the configuration of the linear motor 100. As shown in Fig. 3(A), the linear motor 100 includes a first unit 200 and a second unit 300.

[0036] The first unit 200 includes a plurality of armature module sets 211 arranged in the X-axis direction. Each armature module set 211 includes armature modules 210U, 210V, and 210W. In the following description, unless there is a particular need to distinguish between them, the armature modules 210U, 210V, and 210W will be referred to as armature modules 210. The armature modules 210U, 210V, and 210W are housed in, for example, a housing 250 having an E-shaped cross section (see FIG. 2A).

[0037] Each armature module 210 includes a magnetic core 201 having three protrusions 201a protruding in the Y-axis direction, and a coil 203 wound around the magnetic core 201. A U-phase voltage is applied to the coil 203 of the armature module 210U, a V-phase voltage is applied to the coil 203 of the armature module 210V, and a W-phase voltage is applied to the coil 203 of the armature module 210W. That is, a current of the same phase (U-phase) flows through the coil 203 of the armature module 210U. A current of the same phase (V-phase) flows through the coil 203 of the armature module 210V. A current of the same phase (W-phase) flows through the coil 203 of the armature module 210W.

[0038] In each of the armature modules 210U, 210V, and 210W, the winding direction of each coil 203 through which current of the same phase flows is adjusted so that closed magnetic flux loops are formed with the electromagnets of each protrusion 201 a having different polarities. For example, as shown in armature module 210U in FIG. 3A, the winding direction of each coil 203 is adjusted so that the closed magnetic flux loops formed at a certain point in time are closed magnetic flux loops A1 and A2.

[0039] The second unit 300 includes a magnet module 310 including a plurality of permanent magnets 301. In this embodiment, the second unit 300 includes two magnet modules 310. In each magnet module 310, the plurality of permanent magnets 301 are arranged with their poles alternating in the X-axis direction.

[0040] Fig. 3(B) is a side view illustrating the arrangement of the first unit 200 and the second unit 300 in this embodiment. In Fig. 3(B), a cross section including the permanent magnet 301 is shown for the second unit 300. As shown in Fig. 3(B), each magnet module 310 is arranged between two adjacent protrusions 201a of the magnetic core 201 of the armature module 210. Note that in Figs. 3(A) and 3(B), "N" and "S" represent the north pole and south pole of the permanent magnet 301, respectively.

[0041] A current having a phase different from that of the coils 203 of the other armature modules 210 is supplied to the coils 203 of at least one armature module 210 so that a forward thrust in the X-axis direction is generated by the attractive and repulsive forces between the poles of the electromagnets formed at the ends of the protrusions 201a in each armature module 210 and the corresponding permanent magnets 301. Note that the linear motor disclosed in Japanese Patent No. 5,956,993, for example, can be used as the linear motor 100 having the above configuration.

[0042] In this embodiment, as shown in FIGS. 2B and 3B , the first unit 200 is fixed to the X beam 61, and the second unit 300 is fixed to the stage main body 60. In this embodiment, the first unit 200 and the second unit 300 are arranged such that a portion of each of the multiple permanent magnets 301 provided in the magnet module 310 is accommodated in a space SP1 sandwiched between two adjacent protrusions 201 a of the magnetic core 201, and the other portion of each of the multiple permanent magnets 301 is exposed from the space SP1. As a result, as shown in FIG. 3B , a magnetic attraction force MAF is generated between the first unit 200 and the second unit 300 in the Y-axis direction. Note that it is sufficient that at least a portion of each of the multiple permanent magnets 301 is accommodated in the space SP1 sandwiched between two adjacent protrusions 201 a of the magnetic core 201.

[0043] The magnitude of the magnetic attractive force MAF generated between the first unit 200 and the second unit 300 varies depending on the area of ​​the portion of the permanent magnet 301 that is housed in the space SP1 between the two adjacent protrusions 201a of the magnetic core 201. In the linear motor 100 according to this embodiment, the magnetic attractive force MAF is smallest when the entire permanent magnet 301 is housed in the space SP1. If the magnetic attractive force MAF between the first unit 200 and the second unit 300 is large, it affects the driving of the linear motor 100. Therefore, when using the linear motor 100 according to this embodiment, the first unit 200 and the second unit 300 have conventionally been arranged so that the entire permanent magnet 301 is housed in the space SP1.

[0044] The inventors have discovered that by generating a magnetic attraction force MAF of an appropriate magnitude between the first unit 200 and the second unit 300, it is possible to change the thrust in the Y-axis direction applied to the stage body 60 by the first linear motor 100a and the thrust in the Y-axis direction applied to the stage body 60 by the second linear motor 100b using the d-axis current.

[0045] Therefore, in this embodiment, a magnetic attraction force MAF is intentionally generated between the first unit 200 and the second unit 300, and the d-axis current applied to the coil 203 is changed, and the force resulting from the increase or decrease in magnetic flux due to the d-axis current changes the thrust in the Y-axis direction applied to the stage main body 60 in each of the first linear motor 100a and the second linear motor 100b. This makes it possible to adjust the thrust in the Y-axis direction of the stage main body 60, and to adjust the position of the stage main body 60 in the Y-axis direction.

[0046] Control of the position of the stage main body 60 in the Y-axis direction by controlling the d-axis current will be described in detail below. Figures 4(A) and 4(B) are side views for explaining the force generated between the first unit 200 and the second unit 300, and Figure 4(C) is a side view for explaining the thrust in the Y-axis direction applied to the stage main body 60. Note that in Figures 4(A) to 4(C), a cross section including the permanent magnet 301 is shown for the second unit 300.

[0047] The diagram on the left side of Fig. 4A shows the state before the d-axis current is supplied to the coil 203. The magnetic flux lines shown in Fig. 4A are due to the q-axis current.

[0048] As shown in Fig. 4A, in a state where no d-axis current is supplied to coil 203 (d-axis current = 0), a magnetic attractive force MAF is generated between first unit 200 and second unit 300. Here, when a positive d-axis current is supplied to coil 203 in the state shown in Fig. 4A, a force GF1 is generated between first unit 200 and second unit 300 due to an increase or decrease in magnetic flux, as shown in the center diagram of Fig. 4A. Force GF1 is a force in the opposite direction to magnetic attractive force MAF.

[0049] Although a magnetic attractive force MAF is also generated between the first unit 200 and the second unit 300, the magnetic attractive force MAF is weakened by the force GF1, and therefore the resultant force TF of the force GF1 and the magnetic attractive force MAF is smaller than the magnetic attractive force MAF. As a result, as shown in the diagram on the right side of FIG. 4A , the resultant force TF (<magnetic attractive force MAF) of the force GF1 and the magnetic attractive force MAF is the force generated between the first unit 200 and the second unit 300.

[0050] Similarly to Fig. 4A, the diagram on the left side of Fig. 4B shows the state before a d-axis current is supplied to coil 203. When a negative d-axis current is supplied to coil 203 in the state of Fig. 4B, as shown in the diagram in the center of Fig. 4B, a force GF2 is generated between first unit 200 and second unit 300 due to an increase or decrease in magnetic flux. Force GF2 is a force in the same direction as magnetic attraction force MAF.

[0051] A magnetic attractive force MAF is also generated between the first unit 200 and the second unit 300, and since the magnetic attractive force MAF is strengthened by the force GF2, the resultant force TF of the force GF2 and the magnetic attractive force MAF becomes greater than the magnetic attractive force MAF. As a result, as shown in the diagram on the right side of FIG. 4B , the resultant force TF (>magnetic attractive force MAF) of the force GF2 and the magnetic attractive force MAF is the force generated between the first unit 200 and the second unit 300.

[0052] The first unit 200 and second unit 300 of the first linear motor 100a and the first unit 200 and second unit 300 of the second linear motor 100b may be arranged so that the magnetic attraction force MAF of each is an appropriate magnitude from the viewpoint of position control in the Y-axis direction of the stage main body 60. Furthermore, the magnetic attraction force MAF generated between the first unit 200 and second unit 300 of the first linear motor 100a and the magnetic attraction force MAF generated between the first unit 200 and second unit 300 of the second linear motor 100b may be the same as or different from each other.

[0053] In this embodiment, as shown in FIG. 4C , the first linear motor 100a is disposed on the +Y side of the stage body 60, and the second linear motor 100b is disposed on the −Y side of the stage body 60. Here, for example, assume that the mask stage control device 400 supplies a positive d-axis current to the second linear motor 100b and a negative d-axis current to the first linear motor 100a. In this case, as shown in FIG. 4C , a resultant force TF1 in the +Y direction is applied to the stage body 60 by the first linear motor 100a, and a resultant force TF2 in the −Y direction is applied to the stage body 60 by the second linear motor 100b. In other words, the direction of the thrust in the Y-axis direction applied to the stage body 60 by the first linear motor 100a is opposite to the direction of the thrust in the Y-axis direction applied to the stage body 60 by the second linear motor 100b.

[0054] 4C, since the resultant force TF1 in the +Y direction is greater than the resultant force TF2 in the -Y direction, an overall thrust THF in the +Y direction is applied to the stage main body 60, causing the stage main body 60 to move in the +Y direction. In this way, by controlling the d-axis current supplied to the coil 203 of the first linear motor 100a and the d-axis current supplied to the coil 203 of the second linear motor 100b, the position of the stage main body 60 in the Y-axis direction can be controlled.

[0055] The d-axis current supplied to the coil 203 of the first linear motor 100a and the d-axis current supplied to the coil 203 of the second linear motor 100b can be determined by calculating the thrust applied to the stage body 60 in the Y-axis direction and distributing that thrust to the first linear motor 100a and the second linear motor 100b.

[0056] Specifically, the d-axis current supplied to the coil 203 of the first linear motor 100a and the d-axis current supplied to the coil 203 of the second linear motor 100b can be determined so that the resultant force (resultant force in the direction in which you want to move the stage body 60) of the linear motor 100 located in the direction in which you want to move the stage body 60 (+Y direction or -Y direction) is greater than the resultant force of the other linear motor 100 (resultant force in the opposite direction to the direction in which you want to move the stage body 60).

[0057] Here, when d-axis currents in opposite directions are applied to the coil 203 of the first linear motor 100a and the coil 203 of the second linear motor 100b, the largest thrust can be generated in the Y-axis direction.

[0058] It should be noted that it is not necessary to apply a d-axis current to the coils 203 of both the first linear motor 100a and the second linear motor 100b, but it is sufficient to apply a d-axis current to the coils 203 of at least one of the first linear motor 100a and the second linear motor 100b. In other words, if the resultant force (resultant force in the direction in which you want to move the stage body 60) of the linear motor 100 located in the direction in which you want to move the stage body 60 (+Y direction or −Y direction) is greater than the resultant force (resultant force in the opposite direction to the direction in which you want to move the stage body 60) of the other linear motor 100, it is possible to move the stage body 60 in the desired direction.

[0059] FIG. 5 is a block diagram showing an example of the configuration of a mask stage control device 400 that controls the driving of the first linear motor 100a and the second linear motor 100b.

[0060] The mask stage control device 400 includes adding and subtracting circuits 401 to 403, an X-position control unit 411, a θz-position control unit 412, a Y-position control unit 413, an X-axis thrust force calculation unit 460, a Y-axis thrust force calculation unit 470, a magnetic attraction force calculation unit 480, a q-axis current command value calculation unit 420, a d-axis current command value calculation unit 430, a first current vector control unit 440a, a second current vector control unit 440b, a first motor amplifier 450a, and a second motor amplifier 450b.

[0061] The adding / subtracting circuit 401 determines the deviation (X position deviation) between the target value of the X position of the stage main body 60 input from the outside and the X position (actual X position) of the stage main body 60 detected by the mask interferometer system.

[0062] The adding / subtracting circuit 402 determines the deviation (θz position deviation) between the target value of the θz position of the stage main body 60 input from the outside and the θz position (actual θz position) of the stage main body 60 detected by the mask interferometer system.

[0063] The adding / subtracting circuit 403 determines the deviation (Y position deviation) between the target value of the Y position of the stage main body 60 input from the outside and the Y position (actual Y position) of the stage main body 60 detected by the mask interferometer system.

[0064] The X-position control unit 411 calculates a command value for thrust in the X-axis direction (X-axis thrust) from the deviation of the X-position obtained by the adding / subtracting circuit 401 .

[0065] The θz position control unit 412 calculates a command value for thrust in the θz direction (θz direction thrust) from the deviation of the θz position (θz position deviation) obtained by the adding / subtracting circuit 402 .

[0066] The X-axis thrust calculation unit 460 calculates a command value for the thrust in the X-axis direction of the first linear motor 100a (X-axis thrust command value) and a command value for the thrust in the X-axis direction of the second linear motor 100b (X-axis thrust command value) based on the command value for the thrust in the X-axis direction calculated by the X-position control unit 411 and the command value for the thrust in the θz direction calculated by the θz position control unit 412.

[0067] The q-axis current command value calculation unit 420 calculates a q-axis current command value for the first linear motor 100a and a q-axis current command value for the second linear motor 100b based on the X-axis thrust command value for the first linear motor 100a and the X-axis thrust command value for the second linear motor 100b calculated by the X-axis thrust force calculation unit 460.

[0068] On the other hand, the Y-position control unit 413 calculates a command value for thrust in the Y-axis direction (Y-axis thrust) from the deviation of the Y-position (Y-position deviation) calculated by the adding / subtracting circuit 403 .

[0069] The Y-axis thrust calculation unit 470 calculates a command value for the thrust in the Y-axis direction of the first linear motor 100a (Y-axis thrust command value) and a command value for the thrust in the Y-axis direction of the second linear motor 100b (Y-axis thrust command value) based on the command value for the thrust in the Y-axis direction calculated by the Y position control unit 413.

[0070] The magnetic attraction force calculation unit 480 calculates the magnetic attraction force of the first linear motor 100a and the magnetic attraction force of the second linear motor 100b from the actual position of the stage main body 60. The magnetic attraction force MAF varies depending on the extent to which the permanent magnet 301 is accommodated in the space SP1 between adjacent protrusions 201a of the magnetic core 201. The magnetic attraction force MAF also varies due to slight fluctuations in the positional relationship between the first unit 200 and the second unit 300 caused by driving the stage main body 60 in the X-axis direction. Therefore, in this embodiment, the magnetic attraction force calculation unit 480 calculates the positional relationship between the magnetic core 201 and the permanent magnet 301 based on the actual X position, actual Y position, and actual θz position of the stage main body 60, and calculates the magnetic attraction force of the first linear motor 100a and the magnetic attraction force of the second linear motor 100b from the calculated positional relationship.

[0071] The d-axis current command value calculation unit 430 calculates a d-axis current command value for the first linear motor 100a based on the Y-axis thrust force command value for the first linear motor 100a calculated by the Y-axis thrust force calculation unit 470 and the magnetic attraction force of the first linear motor 100a calculated by the magnetic attraction force calculation unit 480. The d-axis current command value calculation unit 430 also calculates a d-axis current command value for the second linear motor 100b based on the Y-axis thrust force command value for the second linear motor 100b calculated by the Y-axis thrust force calculation unit 470 and the magnetic attraction force of the second linear motor 100b calculated by the magnetic attraction force calculation unit 480.

[0072] The first current vector control unit 440a calculates command values ​​for the U-phase, V-phase, and W-phase voltages to be applied to the first linear motor 100a (first UVW-phase voltage command values) based on the q-axis current command value of the first linear motor 100a calculated by the q-axis current command value calculation unit 420, the d-axis current command value of the first linear motor 100a calculated by the d-axis current command value calculation unit 430, and the actual q-axis current and actual d-axis current of the first linear motor 100a detected by a detection unit (not shown), and outputs the command values ​​to the first motor amplifier 450a.

[0073] Furthermore, the second current vector control unit 440b calculates command values ​​for the U-phase, V-phase, and W-phase voltages to be applied to the second linear motor 100b (second UVW-phase voltage command values) based on the q-axis current command value of the second linear motor 100b calculated by the q-axis current command value calculation unit 420, the d-axis current command value of the second linear motor 100b calculated by the d-axis current command value calculation unit 430, and the actual q-axis current and actual d-axis current of the second linear motor 100b detected by a detection unit (not shown), and outputs these to the second motor amplifier 450b.

[0074] The first motor amplifier 450a applies U-phase, V-phase, and W-phase voltages (first UVW-phase voltages) to the armature modules 210U, 210V, and 210W of the first linear motor 100a, respectively, in accordance with the U-phase, V-phase, and W-phase voltage command values ​​input from the first current vector control unit 440a.

[0075] In addition, the second motor amplifier 450b applies U-phase, V-phase, and W-phase voltages (second UVW-phase voltages) to the armature modules 210U, 210V, and 210W of the second linear motor 100b, respectively, in accordance with the U-phase, V-phase, and W-phase voltage command values ​​input from the second current vector control unit 440b.

[0076] In this way, by controlling the thrust in the X-axis direction of the first linear motor 100a and the thrust in the X-axis direction of the second linear motor 100b with the q-axis current, the X position and θz position of the stage body 60 can be adjusted, and by controlling the thrust in the Y-axis direction of the first linear motor 100a and the thrust in the Y-axis direction of the second linear motor 100b with the d-axis current, the Y position of the stage body 60 can be adjusted.

[0077] As described above in detail, according to this embodiment, the mask stage device MST comprises a stage main body 60 that holds a mask MSK and is driven in the X-axis direction, which is the scanning direction of the mask MSK, and in the Y-axis direction, which is orthogonal to the X-axis direction in a horizontal plane, and a pair of linear motors 100 that apply thrust in the X-axis direction and thrust in the Y-axis direction to the stage main body 60. Each of the pair of linear motors 100 comprises a first unit having a plurality of armature modules 210U, 210V, 210W, each including a magnetic core 201 having three protrusions 201a and a coil 203 wound around the magnetic core 201 and through which currents of the same phase flow, and a second unit 300 having a magnet module 310 that includes a plurality of permanent magnets 301 arranged with alternating poles in the X-axis direction and is housed between two adjacent protrusions 201a. At least a portion of each of the plurality of permanent magnets 301 is housed in a space SP1 sandwiched between two adjacent protrusions 201a of the magnetic core 201. This generates a magnetic attraction force MAF between the first unit 200 and the second unit 300, and by controlling the d-axis current supplied to each of the pair of linear motors 100, the force generated between the first unit 200 and the second unit 300 can be controlled. As a result, the position of the stage body 60 in the Y-axis direction can be controlled by the pair of linear motors 100, and there is no need to provide, for example, a voice coil motor for position control of the stage body 60. In other words, with a simple configuration using a pair of linear motors 100, the position of the stage body 60 can be controlled not only in the X-axis direction and the θz direction, but also in the Y-axis direction. Furthermore, because the linear motor 100 according to this embodiment has a magnetic core 201, it can have a higher magnetic flux density than a coreless linear motor. This allows the stage body 60 to be driven at a higher speed than a coreless linear motor. In this way, in the mask stage device MST of this embodiment, high-speed driving of the stage body 60 and position control of the stage body 60 in three directions (X-axis direction, Y-axis direction, and θz direction) can be achieved with the pair of linear motors 100.

[0078] Furthermore, according to this embodiment, the stage body 60 can rotate about the Z-axis direction, which is perpendicular to the X-axis direction and the Y-axis direction. In other words, the stage body 60 has three degrees of freedom. This allows the driving of the stage body 60 to be synchronized with the driving of the substrate stage.

[0079] Furthermore, according to this embodiment, the pair of linear motors 100 face each other in the Y-axis direction, sandwiching the stage main body 60. This allows the stage main body 60 to move in either the +Y direction or the −Y direction.

[0080] Furthermore, according to this embodiment, the direction of the thrust in the Y-axis direction that one of the pair of linear motors 100 applies to the stage main body 60 is opposite to the direction of the thrust in the Y-axis direction that the other of the pair of linear motors 100 applies to the stage main body 60. As a result, by controlling the magnitude relationship between the two thrust forces in opposite directions, it is possible to move the stage main body 60 in either the +Y direction or the −Y direction.

[0081] Furthermore, according to this embodiment, the mask stage device MST is equipped with a mask stage control device 400 that generates and controls the d-axis current and q-axis current that are supplied to the coil 203, and the mask stage control device 400 changes the thrust in the Y-axis direction that is applied to the stage main body 60 by changing the d-axis current. This makes it possible to change the position of the stage main body 60 in the Y-axis direction.

[0082] Furthermore, according to this embodiment, the mask stage control device 400 adjusts the thrust in the Y-axis direction applied to the stage main body 60 by making the d-axis current supplied to one of the pair of linear motors 100 different from the d-axis current supplied to the other of the pair of linear motors 100. This makes it possible to move the stage main body 60 in both the +Y direction and the −Y direction.

[0083] Furthermore, according to this embodiment, the mask stage control device 400 determines the d-axis current to be supplied to each of the pair of linear motors 100 based on the difference between the target position in the Y-axis direction of the stage body 60 and the actual position in the Y-axis direction of the stage body 60. This makes it possible to bring the position of the stage body 60 closer to the target position in the Y-axis direction.

[0084] It should be noted that, in the above embodiment, the first unit 200 is fixed to the X beam 61, and the second unit 300 is fixed to the stage main body 60, but this is not limited to this. Figure 6(A) is a plan view of a mask stage device MST-1 according to a modified example, and Figure 6(B) is a side view of the mask stage device MST-1 according to the modified example. It should be noted that in Figure 6(B), a cross section including the permanent magnet 301 is shown for the second unit 300.

[0085] 6A and 6B, the first unit 200 may be fixed to the stage main body 60, and the second unit 300 may be fixed to the X beam 61. In this case, the first unit 200 may include one or more armature module sets 211 including armature modules 210U, 210V, and 210W. The other configurations are the same as those in the embodiment, and therefore detailed description thereof will be omitted.

[0086] In the above embodiment, the magnetic core 201 of the armature module 210 of the first unit 200 has three protrusions 201a, and the second unit 300 has two magnet modules 310. However, this is not limiting. For example, the magnetic core 201 of the armature module 210 of the first unit 200 may have two protrusions 201a, and the second unit 300 may have one magnet module 310. In this case, one magnet module 310 may be disposed between the two protrusions 201a. Alternatively, the magnetic core 201 of the armature module 210 of the first unit 200 may have N protrusions 201a (N is a natural number greater than or equal to 4), and the second unit 300 may have N-1 magnet modules 310.

[0087] In addition, in the above embodiment, the exposure apparatus 10 is described as an exposure apparatus that transfers the pattern of the mask MSK onto a glass substrate, but the exposure apparatus 10 may also be, for example, a semiconductor exposure apparatus that forms a pattern formed on a reticle onto a wafer.

[0088] Furthermore, the above embodiment may be applied not only to the exposure apparatus 10 but also to any apparatus that holds an object and controls its position in two intersecting directions within a horizontal plane.

[0089] The above-described embodiment is a preferred example of the present invention, but the present invention is not limited to this and can be modified in various ways without departing from the spirit of the present invention.

[0090] 10 Exposure apparatus 60 Stage body 100 Linear motor 100a First linear motor 100b Second linear motor 200 First unit 201 Magnetic core 201a Protrusion 203 Coil 210, 210U, 210V, 210W Armature module 300 Second unit 301 Permanent magnet 310 Magnet module MSK Mask MST Mask stage device

Claims

1. a holder that holds an object and is driven in a first direction that is a scanning direction of the object and in a second direction that is orthogonal to the first direction in a horizontal plane; a first unit having a plurality of armature modules each including a magnetic core having two or more protrusions protruding in the second direction and a coil wound around the magnetic core and through which currents of the same phase flow; a second unit having a magnet module including a plurality of permanent magnets arranged with alternating poles in the first direction and disposed between two adjacent protrusions; a pair of linear motors each including a first linear motor and a second linear motor, each of which applies a thrust in the first direction and a thrust in the second direction to the holding portion; Equipped with At least a portion of each of the plurality of permanent magnets is accommodated in a space sandwiched between the two adjacent protrusions. Object holding device.

2. Another portion of each of the plurality of permanent magnets, which is opposite to the protruding portion, is exposed from the space. The object holding device according to claim 1 .

3. the holding portion is rotatable around a third direction perpendicular to the first direction and the second direction. The object holding device according to claim 1 or 2.

4. the pair of linear motors face each other in the second direction with the holding portion therebetween; The object holding device according to claim 1 or 2.

5. a direction of a first thrust in the second direction applied to the holding portion by one of the pair of linear motors is opposite to a direction of a second thrust in the second direction applied to the holding portion by the other of the pair of linear motors; The object holding device according to claim 4 .

6. a current control unit that generates and controls a d-axis current and a q-axis current to be supplied to the coil; the current control unit changes the thrust in the second direction applied to the holding unit by changing the d-axis current. The object holding device according to claim 1 or 2.

7. the current control unit adjusts the thrust in the second direction applied to the holding unit by making a d-axis current supplied to one of the pair of linear motors different from a d-axis current supplied to the other of the pair of linear motors. The object holding device according to claim 6 .

8. the current control unit determines a d-axis current to be supplied to each of the pair of linear motors based on a difference between a target position of the holding unit in the second direction and an actual position of the holding unit in the second direction. The object holding device according to claim 6 .

9. The second unit is fixed to the holding portion. The object holding device according to claim 1 or 2.

10. The first unit is fixed to the holding portion. The object holding device according to claim 1 or 2.

11. The object holding device according to claim 1 or 2; a pattern forming device that forms a pattern of an exposure object on the exposure object by an exposure operation of exposing the exposure object with an energy beam through the object held by the object holding device; An exposure apparatus comprising:

12. a pair of first units each having a plurality of armature modules each including a magnetic core having two or more protrusions protruding in a first direction and a coil wound around the magnetic core and through which currents of the same phase flow, and the pair of first units are arranged so that the first direction is perpendicular to a scanning direction of an object; a pair of second units each including a magnet module disposed between two adjacent protrusions, the second unit including a plurality of permanent magnets arranged with poles changed in a second direction, the second unit being disposed such that the second direction is parallel to the scanning direction and at least a portion of each of the plurality of permanent magnets is accommodated within a space sandwiched between the two adjacent protrusions; applying a thrust in the scanning direction and a thrust in a direction orthogonal to the scanning direction within a horizontal plane to a holder that holds the object by a pair of linear motors each constituted by the first unit and the second unit, thereby moving the object in the scanning direction and the orthogonal direction; A method for moving an object, comprising:

13. a holder that holds an object and is driven in a first direction that is a scanning direction of the object and in a second direction that is orthogonal to the first direction in a horizontal plane; a pair of linear motors each including: a first unit having a plurality of armature modules each including a magnetic core having two or more protruding portions protruding in the second direction and a coil wound around the magnetic core and through which currents of the same phase flow; and a second unit having a magnet module including a plurality of permanent magnets arranged with alternating poles in the first direction and arranged between two adjacent protruding portions, the pair of linear motors applying a thrust in the first direction and a thrust in the second direction to the holding portion; an object holding device including: a control device for controlling the pair of linear motors; Equipped with At least a portion of each of the plurality of permanent magnets is accommodated in a space sandwiched between the two adjacent protrusions. Object retention system.