Mounting table and plasma processing apparatus

JPWO2025009403A1Pending Publication Date: 2025-01-09
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Patent Information

Application Number
JP2025531484
Authority / Receiving Office
JP · JP
Patent Type
Applications
Priority Date
2023-07-03
Filing Date
2024-06-20
Publication Date
2025-01-09

AI Technical Summary

Technical Problem

Conventional mounting tables with pins inside through holes experience abnormal discharge during plasma processing, particularly in low-temperature regions where the pins shrink, leading to an expanded electric field space and ineffective suppression of abnormal discharge.

Method used

The mounting table incorporates embedded members with a combination of materials having positive and negative thermal expansion coefficients, arranged along the axial direction of the through holes to maintain a consistent length and prevent abnormal discharge, ensuring the distance between the substrate and the embedded member's tip remains constant.

Benefits of technology

This configuration effectively suppresses abnormal discharge by maintaining a stable electric field space, preventing discharge marks on the substrate and ensuring reliable plasma processing.

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Abstract

Disclosed is a mounting table which comprises: a plate-like member that has a mounting surface on which a substrate is mounted and a rear surface which is on the reverse side from the mounting surface, and that is provided with a through-hole which penetrates the mounting surface and the rear surface; and an embedded member that is disposed inside the through-hole. The embedded member comprises, in the axial direction of the embedded member: a first member that has a positive thermal expansion coefficient; and a second member that has a negative thermal expansion coefficient which has an absolute value generally equal to that of the thermal expansion coefficient of the first member.
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