Substrate support for a substrate processing chamber

USD1071886SActive Publication Date: 2025-04-22APPLIED MATERIALS INC
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Patent Information

Application Number
US29/823917
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Filing Date
2022-01-20
Publication Date
2025-04-22
Estimated Expiration
2040-04-22

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Description

[0001] FIG. 1 is a top isometric view of a substrate support for a substrate processing chamber, showing our new design.

[0002] FIG. 2 is a top plan view thereof.

[0003] FIG. 3 is a bottom plan view thereof.

[0004] FIG. 4 is a front elevation view thereof.

[0005] FIG. 5 is a back elevation view thereof.

[0006] FIG. 6 is a left elevation view thereof.

[0007] FIG. 7 is a right elevation view thereof; and,

[0008] FIG. 8 is an enlarged cross-sectional view taken along line 8-8 in FIG. 2.

[0009] The dashed lines in FIGS. 1-8 illustrate portions of the article that form no part of the claimed design.

Claims

The ornamental design for a substrate support for a substrate processing chamber, as shown and described.

Citation Information

Patent Citations

  • Target profile for a physical vapor deposition chamber target

    USD797067S

  • Target profile for a physical vapor deposition chamber target

    USD798248S

  • Inner shield for a substrate processing chamber

    USD913979S

  • Sputter target for a physical vapor deposition chamber

    USD937329S

  • Base plate for a light emitting diode chip

    US20040095738A1

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