Target profile for a physical vapor deposition chamber target
Patent Information
- Application Number
- US29/769610
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- Filing Date
- 2021-02-06
- Publication Date
- 2025-04-29
- Estimated Expiration
- 2040-04-29
Smart Images

Figure USD1072774-D00000_ABST
Description
[0001] FIG. 1 is a top perspective view of a target profile for a physical vapor deposition chamber target;
[0002] FIG. 2 is a top plan view thereof.
[0003] FIG. 3 is a bottom plan view thereof.
[0004] FIG. 4 is a front elevation thereof.
[0005] FIG. 5 is a back elevation view thereof.
[0006] FIG. 6 is a right elevation view thereof.
[0007] FIG. 7 is a left elevation view thereof.
[0008] FIG. 8 is an enlarged partial front elevation view showing portions of the design in greater detail.
[0009] FIG. 9 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to another embodiment of the novel design.
[0010] FIG. 10 is a top plan view thereof.
[0011] FIG. 11 is a bottom plan view thereof.
[0012] FIG. 12 is a front elevation view thereof.
[0013] FIG. 13 is a back elevation view thereof.
[0014] FIG. 14 is a right elevation view thereof.
[0015] FIG. 15 is a left elevation view thereof; and,
[0016] FIG. 16 is an enlarged partial front elevation view showing portions of the design in greater detail.
[0017] The broken lines shown in the drawings depict portions of the target profile for a physical vapor deposition chamber target that form no part of the claimed design. The dot-dash lines encircling portions of the target profile for a physical vapor deposition chamber target in FIGS. 4 and 8 indicate enlargements and form no part of the claimed design.
Claims
The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.
Citation Information
Patent Citations
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JP1422692S
Magnetron cathode assembly
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