Target profile for a physical vapor deposition chamber target

USD1072774SActive Publication Date: 2025-04-29APPLIED MATERIALS INC

Patent Information

Application Number
US29/769610
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Filing Date
2021-02-06
Publication Date
2025-04-29
Estimated Expiration
2040-04-29

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Description

[0001] FIG. 1 is a top perspective view of a target profile for a physical vapor deposition chamber target;

[0002] FIG. 2 is a top plan view thereof.

[0003] FIG. 3 is a bottom plan view thereof.

[0004] FIG. 4 is a front elevation thereof.

[0005] FIG. 5 is a back elevation view thereof.

[0006] FIG. 6 is a right elevation view thereof.

[0007] FIG. 7 is a left elevation view thereof.

[0008] FIG. 8 is an enlarged partial front elevation view showing portions of the design in greater detail.

[0009] FIG. 9 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to another embodiment of the novel design.

[0010] FIG. 10 is a top plan view thereof.

[0011] FIG. 11 is a bottom plan view thereof.

[0012] FIG. 12 is a front elevation view thereof.

[0013] FIG. 13 is a back elevation view thereof.

[0014] FIG. 14 is a right elevation view thereof.

[0015] FIG. 15 is a left elevation view thereof; and,

[0016] FIG. 16 is an enlarged partial front elevation view showing portions of the design in greater detail.

[0017] The broken lines shown in the drawings depict portions of the target profile for a physical vapor deposition chamber target that form no part of the claimed design. The dot-dash lines encircling portions of the target profile for a physical vapor deposition chamber target in FIGS. 4 and 8 indicate enlargements and form no part of the claimed design.

Claims

The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.

Citation Information

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