Electrode plate for semiconductor manufacturing apparatus

USD1092423SActive Publication Date: 2025-09-09ASM IP HLDG BV

Patent Information

Application Number
US29/839251
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Filing Date
2022-05-19
Publication Date
2025-09-09
Estimated Expiration
2040-09-09

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Description

[0001] FIG. 1 is a top perspective view of an electrode plate for semiconductor manufacturing apparatus, showing our new design;

[0002] FIG. 2 is a bottom perspective view thereof;

[0003] FIG. 3 is a top plan view thereof;

[0004] FIG. 4 is a bottom plan view thereof;

[0005] FIG. 5 is a front side elevational view thereof;

[0006] FIG. 6 is a back side elevational view thereof;

[0007] FIG. 7 is a right side elevational view thereof;

[0008] FIG. 8 is a left side elevational view thereof;

[0009] FIG. 9 is an enlarged portion view taken from encircled portion labeled, “9,” in FIG. 1;

[0010] FIG. 10 is an enlarged portion view taken from encircled portion labeled, “10,” in FIG. 3; and,

[0011] FIG. 11 is a cross-sectional view taken along lines 11-11 in FIG. 3.

[0012] The dot-dashed lines illustrate the boundary of the enlarged portion views of FIGS. 9 and 10 in FIGS. 1, 3, 9, and 10 and form no part of the claimed design.

Claims

The ornamental design for an electrode plate for semiconductor manufacturing apparatus, as shown and described.

Citation Information

Patent Citations

  • Electrodes for semiconductor processing equipment

    KR301138490S

  • Electrode cover, plasma apparatus utilizing the cover, and method of fitting the cover onto the plasma electrode

    US20030066484A1

  • Highly heat-resistant plasma etching electrode and dry etching device including the same

    US6818097B2

  • Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate

    US7479304B2

  • Electrode for a semiconductor processing apparatus

    USD363464S

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