Dynamic vacuum seal system isolation ring for physical vapor deposition sputter applications

USD1109856SActive Publication Date: 2026-01-20TOSOH SMD INC

Patent Information

Application Number
US29/896853
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Filing Date
2023-07-07
Publication Date
2026-01-20
Estimated Expiration
2041-01-20

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Description

[0001] FIG. 1 is a bottom perspective view of a dynamic vacuum seal system isolation ring for physical vapor deposition sputter applications of the present invention;

[0002] FIG. 2 is a top perspective view thereof;

[0003] FIG. 3 is a bottom view thereof;

[0004] FIG. 4 is a top view thereof;

[0005] FIG. 5 is a bottom sectional view thereof;

[0006] FIG. 6 is a top sectional view thereof;

[0007] FIG. 7 is a right side view thereof, wherein the front view, rear view, and left side view are all mirror images thereof; and,

[0008] FIG. 8 is a cross-sectional inner view taken along line 8-8 of FIG. 3 thereof.

[0009] The ornamental design which is claimed is shown in solid lines in the drawings. Any broken lines in the drawings are for illustrative purposes only and form no part of the claimed design.

Claims

The ornamental design for a dynamic vacuum seal system isolation ring for physical vapor deposition sputter applications, as shown and described.

Citation Information

Patent Citations

  • Target assembly structure and magnetron sputtering system

    CN105755437A

  • Process kit having a floating shadow ring

    CN110036136A

  • Semiconductor processing apparatus

    CN112713077A

  • Drain cover sealing ring (01)

    CN307102160S

  • Retaining ring for substrate polishing

    JP1102367S

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