Multizone showerhead for semiconductor processing

Description

[0001] FIG. 1 is an isometric view of a first embodiment of a multi-zone showerhead for semiconductor processing, showing our new design.

[0002] FIG. 2 is another isometric view thereof.

[0003] FIG. 3 is a front view thereof.

[0004] FIG. 4 is a back view thereof.

[0005] FIG. 5 is a right view thereof.

[0006] FIG. 6 is a left view thereof.

[0007] FIG. 7 is a top view thereof.

[0008] FIG. 8 is a bottom view thereof.

[0009] FIG. 9 is an isometric view of a second embodiment of a multi-zone showerhead for semiconductor processing, showing our new design.

[0010] FIG. 10 is another isometric view thereof.

[0011] FIG. 11 is a front view thereof.

[0012] FIG. 12 is a back view thereof.

[0013] FIG. 13 is a right view thereof.

[0014] FIG. 14 is a left view thereof.

[0015] FIG. 15 is a top view thereof; and,

[0016] FIG. 16 is a bottom view thereof.

[0017] The even broken lines shown in the drawings represent portions of the multi-zone showerhead for semiconductor processing that form no part of the claimed design.

Claims

The ornamental design for a multizone showerhead for semiconductor processing, as shown and described.

Images