Plasma confinement tray for plasma processing chamber
Patent Information
- Application Number
- US29/896010
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- Filing Date
- 2023-06-28
- Publication Date
- 2026-11-03
- Estimated Expiration
- 2041-11-03
Smart Images
Figure USD1156335-D00000_ABST
Description
[0001] FIG. 1 is a top isometric view of a plasma confinement tray for plasma processing chamber, according to one embodiment of the novel design.
[0002] FIG. 2 is a bottom isometric view thereof.
[0003] FIG. 3 is a top plan view thereof.
[0004] FIG. 4 is a bottom plan view thereof.
[0005] FIG. 5 is a front elevation view thereof.
[0006] FIG. 6 is a back elevation view thereof.
[0007] FIG. 7 is a left elevation view thereof.
[0008] FIG. 8 is a right elevation view thereof; and,
[0009] FIG. 9 is an enlarged cross-sectional view taken along line 9-9 in FIG. 3. The plasma confinement tray for plasma processing chambers is shown in FIG. 9 with a symbolic break in its length. The appearance of any portion of the article between the break lines forms no part of the claimed design.
Claims
The ornamental design for a plasma confinement tray for plasma processing chamber, as shown and described.
Citation Information
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