Display panel, manufacturing method, and display apparatus

Abstract

Disclosed in the embodiments of the present disclosure are a display panel, a manufacturing method, and a display apparatus. The display panel comprises: a substrate, which comprises a bending area and a non-bending area, the non-bending area comprising a display area having a plurality of sub-pixels; a first refractive index film layer, which is arranged on the substrate, the display area being provided with the first refractive index film layer; and a second refractive index film layer, which is arranged on the side of the first refractive index film layer facing away from the substrate, the second refractive index film layer covering the first refractive index film layer and filling a plurality of openings. The refractive index of the second refractive index film layer is greater than that of the first refractive index film layer; the orthographic projection of the second refractive index film layer on the substrate does not overlap the bending area; the orthographic projection of the second refractive index film layer on the substrate has a first film layer boundary close to the bending area; the bending area has a first bending boundary close to the second refractive index film layer, a first distance between the first film layer boundary and the first bending boundary being greater than 0.

Description

Display panel, manufacturing method and display device

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to the Chinese patent application filed with the State Intellectual Property Office of the People's Republic of China on June 14, 2023, with application number 202310704120.9 and invention name "Display panel, preparation method and display device", the entire contents of which are incorporated by reference into this application. Technical Field

[0003] The present disclosure relates to the field of display technology, and in particular to a display panel, a manufacturing method, and a display device. Background Art

[0004] With the advancement of display technology, consumer demands for display panels are becoming increasingly diverse and personalized. Display panels are popular among consumers due to their flexibility and portability. However, when a display panel is bent, signal lines in the bend area can break due to tension, resulting in display anomalies.

[0005] Summary of the Invention

[0006] The present disclosure provides a display panel, including:

[0007] A base substrate comprises: a bending area and a non-bending area; the non-bending area comprises a display area having a plurality of sub-pixels;

[0008] A first refractive index film layer is provided on the base substrate, the first refractive index film layer is provided in the display area, and the first refractive index film layer has a plurality of openings, and the plurality of openings are provided corresponding to the plurality of sub-pixels;

[0009] a second refractive index film layer, disposed on a side of the first refractive index film layer away from the base substrate, the second refractive index film layer covering the first refractive index film layer and filling at least a portion of the plurality of openings;

[0010] In which, the refractive index of the second refractive index film layer is greater than the refractive index of the first refractive index film layer; the orthographic projection of the second refractive index film layer on the base substrate does not overlap with the bending area, and the orthographic projection of the second refractive index film layer on the base substrate has a first film layer boundary close to the bending area, the bending area has a first bending boundary close to the second refractive index film layer, and a first distance between the first film layer boundary and the first bending boundary is greater than 0.

[0011] In some possible implementations, the non-bending area includes a first non-bending area and a second non-bending area, the first non-bending area and the second non-bending area are arranged on both sides of the bending area, and the first non-bending area includes the display area;

[0012] The second refractive index film layer is disposed in the first non-bending area, and an orthographic projection of the second refractive index film layer on the base substrate covers the display area.

[0013] In some possible embodiments, the first non-bending region is provided with the first refractive index film layer, the orthographic projection of the first refractive index film layer in the first non-bending region on the base substrate has a second film layer boundary close to the bending region, and a second distance between the second film layer boundary and the first bending boundary is not less than 0; and / or,

[0014] The second non-bending area is provided with the first refractive index film layer, and the first refractive index film layer in the second non-bending area has a third film layer boundary close to the bending area on the orthographic projection of the base substrate, and the bending area has a second bending boundary away from the second refractive index film layer, and the third distance between the third film layer boundary and the second bending boundary is not less than 0.

[0015] In some possible implementations, the display panel further includes: a first optical film layer, the first optical film layer being disposed between the first refractive index film layer and the base substrate; and the first optical film layer covering the display area in an orthographic projection of the base substrate.

[0016] In some possible implementations, the orthographic projection of the first optical film layer on the base substrate does not overlap with the bending region;

[0017] The first non-bending region is provided with the first optical film layer, the orthographic projection of the first optical film layer in the first non-bending region on the base substrate has a fourth film layer boundary close to the bending region, and a fourth distance between the fourth film layer boundary and the first bending boundary is not less than 0; and / or,

[0018] The second non-bending area is provided with the first optical film layer, and the first optical film layer in the second non-bending area has a fifth film layer boundary close to the bending area on the orthographic projection of the base substrate, and the bending area has a second bending boundary away from the second refractive index film layer, and the fifth distance between the fifth film layer boundary and the second bending boundary is not less than 0.

[0019] In some possible implementations, the fourth film layer boundary is disposed between the first film layer boundary and the first bending boundary.

[0020] In some possible implementations, the second film layer boundary is disposed between the fourth film layer boundary and the first bending boundary; or,

[0021] The second film layer boundary is disposed between the fourth film layer boundary and the first film layer boundary; or,

[0022] The first film layer boundary is disposed between the second film layer boundary and the first bending boundary, and the fourth film layer boundary is disposed between the second film layer boundary and the first film layer boundary; or,

[0023] The first film layer boundary is disposed between the second film layer boundary and the first bending boundary, and the second film layer boundary is disposed between the fourth film layer boundary and the first film layer boundary.

[0024] In some possible implementations, the display panel further includes: a second optical film layer, the second optical film layer being disposed between the first optical film layer and the base substrate; and the orthographic projection of the second optical film layer on the base substrate covering the display area.

[0025] In some possible implementations, the orthographic projection of the second optical film layer on the base substrate does not overlap with the bending region;

[0026] The first non-bending region is provided with the second optical film layer, the orthographic projection of the second optical film layer in the first non-bending region on the base substrate has a sixth film layer boundary close to the bending region, and a sixth distance between the sixth film layer boundary and the first bending boundary is not less than 0; and / or,

[0027] The second non-bending area is provided with the second optical film layer, and the second optical film layer in the second non-bending area has a seventh film layer boundary close to the bending area on the orthographic projection of the base substrate, and the bending area has a second bending boundary away from the second refractive index film layer, and the seventh distance between the seventh film layer boundary and the second bending boundary is not less than 0.

[0028] In some possible implementations, the sixth film layer boundary is disposed between the fourth film layer boundary and the first film layer boundary; or,

[0029] The sixth film layer boundary is disposed between the fourth film layer boundary and the second film layer boundary; or,

[0030] The sixth film layer boundary is disposed between the fourth film layer boundary and the first bending boundary.

[0031] In some possible implementations, the display panel further includes: a touch insulation layer, the touch insulation layer being disposed between the second optical adhesive and the base substrate; and the touch insulation layer covering the display area in an orthographic projection of the base substrate.

[0032] In some possible implementations, the orthographic projection of the touch insulating layer on the base substrate does not overlap with the bending region;

[0033] The touch insulating layer is provided in the first non-bending region, the touch insulating layer in the first non-bending region has an orthographic projection of the touch insulating layer on the base substrate having an eighth film layer boundary close to the bending region, and an eighth distance between the eighth film layer boundary and the first bending boundary is greater than 0; and / or,

[0034] The touch insulating layer is provided in the second non-bending area, and the touch insulating layer in the second non-bending area has a ninth film layer boundary close to the bending area in the orthographic projection of the base substrate, and the bending area has a second bending boundary away from the second refractive index film layer, and a ninth distance between the ninth film layer boundary and the second bending boundary is not less than 0.

[0035] In some possible implementations, the eighth film layer boundary is disposed between the first film layer boundary and the sixth film layer boundary; or,

[0036] The eighth film layer boundary is disposed between the second film layer boundary and the sixth film layer boundary; or,

[0037] The eighth film layer boundary is disposed between the fourth film layer boundary and the sixth film layer boundary.

[0038] In some possible implementations, the display panel further includes: a thin film encapsulation layer, which is disposed between the base substrate and the touch insulating layer; and the thin film encapsulation layer covers the display area in an orthographic projection of the base substrate.

[0039] In some possible implementations, the display panel further includes:

[0040] A thin film transistor array layer is provided on the base substrate;

[0041] A first planarization layer is provided on a side of the thin film transistor array layer facing away from the base substrate;

[0042] a pixel defining layer disposed on a side of the first planarization layer facing away from the base substrate;

[0043] a light emitting device disposed in the opening of the pixel defining layer;

[0044] The thin film encapsulation layer is provided on a side of the light emitting device away from the base substrate;

[0045] A first touch electrode film layer is provided on a side of the thin film encapsulation layer facing away from the base substrate;

[0046] Disposing the touch insulating layer on the side of the first touch electrode film layer facing away from the base substrate;

[0047] a second touch electrode film layer provided on a side of the touch insulating layer facing away from the base substrate;

[0048] a second optical film layer disposed on a side of the second touch electrode film layer facing away from the base substrate;

[0049] A black matrix and / or a color resist layer is provided on a side of the second optical film layer facing away from the base substrate;

[0050] A first optical film layer is provided on a side of the black matrix and / or color resist layer facing away from the base substrate;

[0051] A first refractive index film layer provided on a side of the first optical film layer away from the base substrate;

[0052] A second refractive index film layer is disposed on a side of the first refractive index film layer away from the base substrate.

[0053] In some possible embodiments, the display panel further includes: a protective layer, the protective layer being arranged on the side of the first refractive index film layer facing away from the base substrate, the orthographic projection of the protective layer on the base substrate covering the bending area, and the orthographic projection of the protective layer on the base substrate and the orthographic projection of the second refractive index film layer on the base substrate not overlapping.

[0054] In some possible implementations, the display panel further includes:

[0055] a first optical film layer, the first optical film layer being disposed between the first refractive index film layer and the base substrate;

[0056] a second optical film layer, the second optical film layer being disposed between the first optical film layer and the base substrate;

[0057] a touch insulating layer, the touch insulating layer being disposed between the second optical adhesive and the base substrate;

[0058] a thin film encapsulation layer, the thin film encapsulation layer being disposed between the base substrate and the touch insulating layer;

[0059] a first inorganic layer, the first inorganic layer being disposed between the thin film encapsulation layer and the base substrate;

[0060] a second inorganic layer, the second inorganic layer being disposed between the thin film encapsulation layer and the base substrate;

[0061] Wherein, the orthographic projection of the first refractive index film layer on the base substrate also covers the bending area and the second non-bending area;

[0062] The orthographic projection of the first optical film layer on the base substrate covers the first non-bending area, the bending area and the second non-bending area;

[0063] The orthographic projection of the second optical film layer on the base substrate covers the first non-bending area, the bending area and the second non-bending area;

[0064] The orthographic projection of the touch insulating layer on the base substrate covers the first non-bending area, the bending area and the second non-bending area;

[0065] The orthographic projection of the thin film encapsulation layer on the base substrate covers the display area;

[0066] The orthographic projection of the first inorganic layer on the base substrate does not overlap with the bending region, and the orthographic projection of the first inorganic layer on the base substrate is aligned with the bending region near a boundary of the bending region;

[0067] The orthographic projection of the second inorganic layer on the base substrate does not overlap with the bending region.

[0068] In some possible implementations, the display panel further includes: a plurality of signal lines; the plurality of signal lines include: a plurality of data lines, a low voltage signal line, an initialization signal line, a plurality of clock signal lines, and a high voltage signal line;

[0069] In the bending area, the orthographic projection of the area where the low voltage signal line is located on the substrate is arranged between the orthographic projection of the area where the multiple data lines are located on the substrate, the orthographic projection of the area where the initialization signal line is located on the substrate, the orthographic projection of the area where the multiple clock signal lines are located on the substrate, and the orthographic projection of the area where the high voltage signal line is located on the substrate, and between the orthographic projections of the areas where two adjacent signal lines are located on the substrate.

[0070] An embodiment of the present disclosure further provides a display device, comprising the above-mentioned display panel.

[0071] The present disclosure also provides a method for manufacturing a display panel, including:

[0072] A first refractive index film layer is formed on a base substrate; wherein the base substrate includes: a bending area and a non-bending area; the non-bending area includes a display area having a plurality of sub-pixels; the first refractive index film layer is disposed in the display area, and the first refractive index film layer has a plurality of openings, and the plurality of openings are disposed corresponding to the plurality of sub-pixels;

[0073] forming a second refractive index film layer on a side of the first refractive index film layer facing away from the base substrate; wherein the second refractive index film layer covers the first refractive index film layer and fills at least a portion of the plurality of openings;

[0074] In which, the refractive index of the second refractive index film layer is greater than the refractive index of the first refractive index film layer; the orthographic projection of the second refractive index film layer on the base substrate does not overlap with the bending area, and the orthographic projection of the second refractive index film layer on the base substrate has a first film layer boundary close to the bending area, the bending area has a first bending boundary close to the second refractive index film layer, and a first distance between the first film layer boundary and the first bending boundary is greater than 0. BRIEF DESCRIPTION OF THE DRAWINGS

[0075] FIG1 is a schematic diagram of some structures of a display panel in an embodiment of the present disclosure;

[0076] FIG2 is a schematic diagram of some further structures of a display panel in an embodiment of the present disclosure;

[0077] FIG3 a is a schematic diagram of some further structures of a display panel in an embodiment of the present disclosure;

[0078] FIG3 b is a schematic diagram of some further structures of a display panel in an embodiment of the present disclosure;

[0079] FIG4 is a schematic diagram of some further structures of a display panel in an embodiment of the present disclosure;

[0080] FIG5 is a schematic diagram of some further structures of a display panel in an embodiment of the present disclosure;

[0081] FIG6 is a schematic diagram of some further structures of a display panel in an embodiment of the present disclosure;

[0082] FIG7 is a schematic diagram of some further structures of a display panel in an embodiment of the present disclosure;

[0083] FIG8 is a schematic diagram of some further structures of a display panel in an embodiment of the present disclosure;

[0084] FIG9 is a schematic diagram of some further structures of a display panel in an embodiment of the present disclosure;

[0085] FIG10 is a schematic diagram of some further structures of a display panel in an embodiment of the present disclosure;

[0086] FIG11 is a schematic diagram of some further structures of a display panel in an embodiment of the present disclosure;

[0087] FIG12 is a schematic diagram of some further structures of a display panel in an embodiment of the present disclosure;

[0088] FIG13a is a schematic diagram of some further structures of a display panel in an embodiment of the present disclosure;

[0089] FIG13 b is a schematic diagram of some further structures of the display panel in the embodiment of the present disclosure;

[0090] FIG14a is a schematic diagram of some further structures of a display panel in an embodiment of the present disclosure;

[0091] FIG14 b is a schematic diagram of some further structures of the display panel in the embodiment of the present disclosure;

[0092] FIG15 is a schematic diagram of some further structures of a display panel in an embodiment of the present disclosure;

[0093] FIG16 is a schematic diagram of some further structures of the display panel in the embodiment of the present disclosure. DETAILED DESCRIPTION

[0094] In order to make the purpose, technical solutions and advantages of the embodiments of the present disclosure clearer, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. And in the absence of conflict, the embodiments in the present disclosure and the features in the embodiments can be combined with each other. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0095] Unless otherwise defined, the technical or scientific terms used in this disclosure should have the usual meanings understood by persons of ordinary skill in the field to which this disclosure belongs. The words "first", "second" and similar terms used in this disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. Words such as "include" or "comprise" mean that the elements or objects preceding the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Words such as "connect" or "connected" are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect.

[0096] It should be noted that the sizes and shapes of the figures in the accompanying drawings do not reflect the actual scale and are only for the purpose of illustrating the present disclosure. The same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions.

[0097] In an embodiment of the present disclosure, a display device includes a display panel. The display panel includes a display area. The display area has a plurality of pixel units, and each pixel unit includes a plurality of sub-pixels. Each sub-pixel may include a light-emitting device and a pixel driving circuit for driving the light-emitting device to emit light. The light-emitting device includes a stacked anode, a light-emitting functional layer, and a cathode. Furthermore, the light-emitting device may include at least one of an organic light-emitting diode (OLED), a quantum dot light-emitting diode (QLED), a Micro LED, and a Mini LED. In addition, a general pixel driving circuit may include a plurality of transistors such as a driving transistor, a switching transistor, and a storage capacitor. Its specific structure and working principle may be the same as those in the prior art, and will not be elaborated here.

[0098] The display device in the embodiments of the present disclosure may be a flexible display device. Optionally, the display panel may be a flexible display panel. Of course, the display device in the embodiments of the present disclosure may also be a display device of other forms, and the display panel may also be a display panel of other forms, which are not limited here.

[0099] Exemplarily, each pixel unit includes a red sub-pixel, a green sub-pixel, and a blue sub-pixel, wherein the red sub-pixel includes a light-emitting device that displays red, the green sub-pixel includes a light-emitting device that displays green, and the blue sub-pixel includes a light-emitting device that displays blue.

[0100] For example, as shown in FIG1 , the display panel may include: a substrate 100, a thin film transistor array layer 110 disposed on the substrate 100, a first planarization layer 150 disposed on a side of the thin film transistor array layer 110 facing away from the substrate 100, a pixel defining layer 120 disposed on a side of the first planarization layer 150 facing away from the substrate 100, a light emitting device 130 disposed in an opening of the pixel defining layer 120, a thin film encapsulation layer 140 disposed on a side of the light emitting device 130 facing away from the substrate 100, a first touch electrode film layer 161 disposed on a side of the thin film encapsulation layer 140 facing away from the substrate 100, a touch insulating layer 170 disposed on a side of the first touch electrode film layer 161 facing away from the substrate 100, and a touch insulating layer 170 disposed on the touch insulating layer 170. 0 The second touch electrode film layer 162 is away from the base substrate 100, the second optical film layer 171 is arranged on the side of the second touch electrode film layer 162 away from the base substrate 100, the black matrix 174 is arranged on the side of the second optical film layer 171 away from the base substrate 100, the color resist layer 175 is arranged on the side of the black matrix 174 away from the base substrate 100, the first optical film layer 172 is arranged on the side of the color resist layer 175 away from the base substrate 100, the first refractive index film layer 180 is arranged on the side of the first optical film layer 172 away from the base substrate 100, the second refractive index film layer 190 is arranged on the side of the first refractive index film layer 180 away from the base substrate 100, and the cover plate 200 is arranged on the side of the second refractive index film layer 190 away from the base substrate 100.

[0101] For example, the first touch electrode layer 161 and the second touch electrode layer 162 are each provided with touch electrodes, thereby enabling capacitive touch functionality through mutual capacitance technology. Furthermore, the orthographic projection of the touch electrodes on the substrate does not overlap with the orthographic projection of the sub-pixel opening area on the substrate, thereby preventing any impact on the display effect. Furthermore, portions of the touch electrodes in one of the first touch electrode layer 161 and the second touch electrode layer 162 can be connected via vias penetrating the touch insulation layer 170.

[0102] Exemplarily, a plurality of signal lines are further provided on the substrate 100, and the plurality of signal lines include a plurality of gate lines, a plurality of data lines, an initialization signal line, and a power signal line. For example, a pixel driving circuit in a row of sub-pixels is connected to a gate line, a pixel driving circuit in a column of sub-pixels is connected to a data line, a pixel driving circuit in a column of sub-pixels is connected to an initialization signal line, and a pixel driving circuit in a column of sub-pixels is connected to a power signal line. In this way, corresponding signals can be input to the pixel driving circuit through these signal lines to control the pixel driving circuit to drive the light-emitting device to emit light.

[0103] Exemplarily, a gate drive circuit connected to a plurality of gate lines is further provided on the substrate. The gate drive circuit inputs gate scanning signals to the gate lines to control the on and off of transistors in the pixel drive circuit. Optionally, the gate drive circuit includes transistors or capacitors, and their specific structure and operating principle can be the same as those in the prior art and are not described in detail here.

[0104] Exemplarily, as shown in FIG1 , the light emitting device 130 includes an anode 131 , a light emitting functional layer 132 , and a cathode 133 , which are stacked.

[0105] Exemplarily, a pixel driving circuit, a gate driving circuit, and a signal line are formed in the thin film transistor array layer. Exemplarily, the thin film transistor array layer may include: a semiconductor layer, a gate conductive layer, a capacitor electrode layer, a first conductive layer, and a second conductive layer. In addition, a buffer layer is provided between the semiconductor layer and the base substrate, a gate insulating layer is provided between the semiconductor layer and the gate conductive layer, an interlayer dielectric layer is provided between the gate conductive layer and the capacitor electrode layer, an interlayer insulating layer is provided between the capacitor electrode layer and the first conductive layer, a second planarizing layer is provided between the first conductive layer and the second conductive layer, and a first planarizing layer is provided between the second conductive layer and the anode. In addition, the two film layers that need to be coupled are coupled to each other through vias penetrating the insulating layer.

[0106] Illustratively, the semiconductor layer includes the active layer of the aforementioned transistor. The semiconductor layer can be patterned using a semiconductor material. The semiconductor layer can be used to form the active layer of the aforementioned transistor. Illustratively, the semiconductor layer can be made of amorphous silicon, polycrystalline silicon, oxide semiconductor materials, etc. It should be noted that the aforementioned source and drain regions can be conductive regions formed by doping with n-type or p-type impurities.

[0107] Exemplarily, the gate conductive layer includes the gate and gate line of the above-mentioned transistor, wherein the gate of some transistors is reused as a plate of a capacitor.

[0108] Exemplarily, the capacitor electrode layer includes another electrode plate in the aforementioned capacitor. Two electrodes with facing areas form a capacitor.

[0109] Illustratively, the first conductive layer includes the above-mentioned data line.

[0110] Illustratively, the second conductive layer includes the aforementioned initialization signal line and power signal line.

[0111] For example, the thin film encapsulation layer 140 may include a first inorganic encapsulation layer (eg, a SiON layer), an organic encapsulation layer (eg, an acrylic layer), and a second inorganic encapsulation layer (eg, a SiN layer) stacked.

[0112] For example, as shown in FIG1 , the black matrix 174 has a plurality of black matrix openings, which are arranged corresponding to the light-emitting areas of the plurality of sub-pixels. The color resist layer 175 covers each black matrix opening, and the color resist layers corresponding to sub-pixels of different colors are different colors. For example, the color resist layer corresponding to the red sub-pixel is red, the color resist layer corresponding to the green sub-pixel is green, and the color resist layer corresponding to the blue sub-pixel is blue. With this arrangement, the display panel provided by the embodiment of the present disclosure can implement polarizer-free technology, namely, a COE (Color Filter On Encapsulation) structure.

[0113] 1 , the display panel may further include a black matrix and / or a color resist layer. For example, the display panel may include only one of the black matrix and the color resist layer.

[0114] For example, referring to FIG1 , a first refractive index film layer 180 and a second refractive index film layer 190 are provided in the display area. The first refractive index film layer 180 has multiple openings corresponding to the light-emitting regions of the multiple sub-pixels. The second refractive index film layer 190 covers the first refractive index film layer 180 and fills the openings of the first refractive index film layer 180. The refractive index of the second refractive index film layer 190 is greater than that of the first refractive index film layer 180, thereby improving the light-emitting angle of the light-emitting device and increasing the light-emitting brightness. As shown in Figure 1, the refractive index of the first refractive index film layer 180 is, for example, 1.47, the refractive index of the second refractive index film layer 190 is, for example, 1.7, the refractive index of the cover plate 200 is, for example, 1.5, and the refractive index of air is, for example, 1. Since the first refractive index film layer 180 is provided with openings corresponding to sub-pixels, the second refractive index film layer 190 covers the first refractive index film layer 180 and fills the openings of the first refractive index film layer 180, the light emitted from the side direction of the sub-pixel is fully emitted at the boundary between the first refractive index film layer 180 and the second refractive index film layer 190, so that the side-emitting light can be emitted in the forward direction, thereby improving the luminous efficiency and increasing the brightness of the light.

[0115] The present disclosure does not limit the materials used for the first and second refractive index film layers. For example, the first refractive index film layer can be made of a low-refractive index optical adhesive, while the second refractive index film layer can be made of a high-refractive index optical adhesive. This arrangement allows the first and second refractive index film layers to form an enhanced lens structure, thereby enabling the display panel provided by the embodiments of the present disclosure to implement an Efficiency Enhance Structure (EES) structure, improving display quality.

[0116] In specific implementation, the display panel can adopt a unilateral form to drive the gate line, that is, only a gate drive circuit is set on one side of the gate line. Or, as shown in Figure 2, the display panel can also adopt a bilateral form to drive the gate line, that is, gate drive circuits 210a and 210b are respectively set on both sides of the gate line GA. Usually, it is also necessary to input corresponding signals to the gate drive circuits 210a and 210b to control the gate drive circuit to input gate scan signals to the gate line. These multiple signal lines also include: multiple clock signal lines, high voltage signal lines and low voltage signal lines connected to the gate drive circuit. For example, as shown in Figure 2, clock signal lines CK1a and CK2a, high voltage signal line VGHa and low voltage signal line VGLa connected to the gate drive circuit 210a can be set, and clock signal lines CK1b and CK2b, high voltage signal line VGHb and low voltage signal line VGLb connected to the gate drive circuit 210b can be set. In this way, a clock signal is transmitted to the gate drive circuit through the clock signal line, a high voltage signal is input to the gate drive circuit through the high voltage signal line, and a low voltage signal is input to the gate drive circuit through the low voltage signal line, thereby controlling the gate drive circuit to input a gate scan signal to the gate line.

[0117] In a specific implementation, the display panel includes a bending region and a non-bending region, with the display region disposed within the non-bending region. Typically, multiple signal lines within the display region need to pass through the bending region and then be connected to a driver chip via bonding, enabling the driver chip to input corresponding signals to these signal lines to control the display panel. However, due to the high elastic modulus of the material of the second refractive index film layer, when the display panel is bent, the second refractive index film layer in the bending region may peel or cause the underlying organic layer to peel, causing the signal lines originally in the neutral layer to move upward. This can lead to the signal lines in the bending region being tensilely fractured during the bending process, resulting in display anomalies on the display panel.

[0118] Based on this, as shown in Figures 3a to 4, in the display panel provided by the embodiment of the present disclosure, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 does not overlap with the bending area WB, and the orthographic projection of the second refractive index film layer 190 on the base substrate 100 has a first film layer boundary SM1 close to the bending area WB, the bending area WB has a first bending boundary SB1 close to the second refractive index film layer 190, and a first distance h1 is present between the first film layer boundary SM1 and the first bending boundary SB1. By making the first distance h1 greater than 0, the first film layer boundary SM1 of the second refractive index film layer 190 is moved to a position with a first distance h1 from the first bending boundary SB1 to avoid the first film layer boundary SM1 falling into the bending area WB, which is equivalent to not setting the second refractive index film layer 190 in the bending area WB, thereby avoiding the signal line in the bending area WB from being pulled and broken during the bending process due to the second refractive index film layer 190 when the bending area WB is bent, thereby reducing the risk of signal line breakage and improving display abnormalities.

[0119] In some embodiments of the present disclosure, as shown in Figures 3a to 4, the non-bending region may include a first non-bending region NWB1 and a second non-bending region NWB2, with the first non-bending region NWB1 and the second non-bending region NWB2 being disposed on either side of the bending region WB. The first non-bending region NWB1 includes the display area AA, and the second non-bending region NWB2 includes a bonding region having multiple bonding terminals (PADs). Multiple signal lines in the first non-bending region NWB1 pass through the bending region WB and enter the second non-bending region NWB2, where they are connected one-to-one to the multiple bonding terminals (PADs). The multiple bonding terminals (PADs) are then connected to a driver chip through bonding, allowing the driver chip to input corresponding signals to these signal lines through the bonding terminals (PADs), thereby controlling the display panel to display images.

[0120] In some embodiments of the present disclosure, as shown in Figures 3a to 8, the second refractive index film layer 190 is disposed in the first non-bending region NWB1, and is not disposed in the second non-bending region NWB2. Furthermore, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 covers the display area AA, and the orthographic projection of the first refractive index film layer 180 on the base substrate 100 overlaps with the display area AA, thereby improving the light output angle of the light-emitting device and increasing the light output brightness.

[0121] In some embodiments of the present disclosure, as shown in Figures 3a to 8, the first non-bending region NWB1 further includes a non-display region BB disposed between the display region AA and the bending region WB. The orthographic projection of the second refractive index film layer 190 on the base substrate 100 covers not only the display region AA but also a portion of the non-display region BB. For example, the present disclosure does not limit the first distance h1; for example, h1 ≥ 0.8 mm. Alternatively, h1 can be 0.8 mm, 0.83 mm, 0.85 mm, 0.88 mm, 0.9 mm, 0.92 mm, 0.95 mm, etc.

[0122] It should be noted that, in conjunction with FIG4 , non-display areas BB are also provided at the remaining boundaries of the display area AA (e.g., BJ1, BJ2, and BJ3), where signal lines and gate drive circuits are provided. The orthographic projection of the second refractive index film layer 190 on the base substrate 100 also covers the non-display areas BB at the remaining boundaries of the display area AA (e.g., BJ1, BJ2, and BJ3). Furthermore, the orthographic projection of the first refractive index film layer 180 on the base substrate 100 also covers the non-display areas BB at the remaining boundaries of the display area AA (e.g., BJ1, BJ2, and BJ3).

[0123] To prevent the first refractive index film layer 180 from affecting the bending process of the bending zone, in some embodiments of the present disclosure, as shown in Figures 3a, 3b, and 5-7, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 can be made not to overlap with the bending zone WB. Alternatively, the first refractive index film layer 180 can be provided in the first non-bending zone NWB1, and not provided in the second non-bending zone NWB2. Furthermore, the orthographic projection of the first refractive index film layer 180 in the first non-bending zone NWB1 on the base substrate 100 has a second film layer boundary SM2 close to the bending zone WB, and a second distance h2 is defined between the second film layer boundary SM2 and the first bending boundary SB1. The second distance h2 can be made not less than 0. For example, the second distance h2 can be made greater than 0, so that the second film layer boundary SM2 is provided between the first film layer boundary SM1 and the first bending boundary SB1. Alternatively, the second film layer boundary SM2 can be aligned with the first film layer boundary SM1, in which case the second distance h2 equals the first distance h1. Alternatively, the second film layer boundary SM2 can be misaligned with the first film layer boundary SM1 and misaligned with the first bending boundary SB1, in which case the second distance h2 is less than the first distance h1. Alternatively, the second distance h2 can be equal to 0, in which case the second film layer boundary SM2 is aligned with the first bending boundary SB1.

[0124] For example, the second refractive index film layer can be provided only in the first non-bending region. Alternatively, the second refractive index film layer can be provided in both the first non-bending region and the second non-bending region. For example, as shown in FIG3b , the orthographic projection of the first refractive index film layer 180 in the second non-bending region NWB2 on the substrate 100 has a third film layer boundary SM3 close to the bending region WB, and the bending region WB has a second bending boundary SB2 away from the second refractive index film layer 190. The third distance h3 between the third film layer boundary SM3 and the second bending boundary SB2 is not less than 0. Optionally, the third distance h3 is the same as the second distance h2. Alternatively, the third distance h3 is greater than or less than the second distance h2.

[0125] In some embodiments of the present disclosure, as shown in Figures 3a to 8, the orthographic projection of the first optical film layer 172 on the base substrate 100 covers the display area AA. Optionally, the orthographic projection of the first optical film layer 172 on the base substrate 100 also covers the non-display area BB at the remaining boundaries (e.g., BJ1, BJ2, and BJ3) of the display area AA.

[0126] To prevent the first optical film layer 172 from affecting the bending process of the bending zone, in some embodiments of the present disclosure, as shown in Figures 3a, 3b, and 5-7, the orthographic projection of the first optical film layer 172 on the base substrate 100 can be configured to not overlap with the bending zone WB. For example, the first optical film layer 172 can be disposed in the first non-bending zone NWB1, and the orthographic projection of the first optical film layer 172 in the first non-bending zone NWB1 on the base substrate 100 has a fourth film layer boundary SM4 proximal to the bending zone WB. A fourth distance h4 is defined between the fourth film layer boundary SM4 and the first bending boundary SB1, and the fourth distance h4 can be no less than zero. For example, the fourth distance h4 can be configured to be greater than zero, such that the fourth film layer boundary SM4 is disposed between the first film layer boundary SM1 and the first bending boundary SB1. Alternatively, the fourth film layer boundary SM4 can be aligned with the first film layer boundary SM1, such that the fourth distance h4 is equal to the first distance h1. Alternatively, the fourth film layer boundary SM4 may be misaligned with the first film layer boundary SM1, and the fourth film layer boundary SM4 may be misaligned with the first bending boundary SB1, in which case the fourth distance h4 is smaller than the first distance h1. Alternatively, the fourth distance h4 may be equal to 0, in which case the fourth film layer boundary SM4 may be aligned with the first bending boundary SB1.

[0127] Exemplarily, as shown in FIGS. 3a and 3b, the fourth film layer boundary SM4 can be disposed between the first film layer boundary SM1 and the second film layer boundary SM2, and the second film layer boundary SM2 can be disposed between the fourth film layer boundary SM4 and the first bending boundary SB1, then h2 < h4 < h1. With this setting, the first refractive index film layer 180 can wrap the fourth film layer boundary SM4 of the first optical film layer 172, and the amount of edge wrapping for each is based on the mechanical influence range. Exemplarily, h2 ≥ 0.2 mm can be set. For example, h2 can be 0.2 mm, 0.22 mm, 0.25 mm, 0.28 mm, 0.3 mm, etc.

[0128] Exemplarily, as shown in FIG. 5, the fourth film layer boundary SM4 can also be disposed between the first film layer boundary SM1 and the first bending boundary SB1, and the second film layer boundary SM2 can be disposed between the fourth film layer boundary SM4 and the first film layer boundary SM1, then h4 < h2 < h1. With this setting, the film layer boundary of the first refractive index film layer 180 can be retracted inward toward the display area AA to a flat position, preventing the risk of Peeling occurring during bending when the boundary of the first refractive index film layer 180 is close to the bending area WB when the thickness of the first refractive index film layer 180 is relatively thin.

[0129] Exemplarily, as shown in FIG. 6, the first film layer boundary SM1 can also be disposed between the second film layer boundary SM2 and the first bending boundary SB1, and the fourth film layer boundary SM4 can be disposed between the second film layer boundary SM2 and the first film layer boundary SM1, then h1 < h4 < h2. With this setting, the second refractive index film layer 190 can wrap the fourth film layer boundary SM4 of the first optical film layer 172 and the second film layer boundary SM2 of the first refractive index film layer 180, and the amount of edge wrapping for each is based on the mechanical influence range.

[0130] Exemplarily, as shown in FIG. 7, the first film layer boundary SM1 can also be disposed between the second film layer boundary SM2 and the first bending boundary SB1, and the second film layer boundary SM2 can be disposed between the fourth film layer boundary SM4 and the first film layer boundary SM1, then h1 < h2 < h4. With this setting, the second refractive index film layer 190 can wrap the second film layer boundary SM2 of the first refractive index film layer 180, and the first refractive index film layer 180 can wrap the fourth film layer boundary SM4 of the first optical film layer 172, and the amount of edge wrapping for each is based on the mechanical influence range.

[0131] For example, the first optical film layer 172 may be provided only in the first non-bending region NWB1. Alternatively, the first optical film layer 172 may be provided in both the first non-bending region NWB1 and the second non-bending region NWB2. For example, as shown in Figures 3a, 3b, and 5 to 7, the first optical film layer 172 is provided in both the first non-bending region NWB1 and the second non-bending region NWB2. The first optical film layer 172 in the second non-bending region NWB2 has a fifth film layer boundary SM5 close to the bending region WB in its orthographic projection on the base substrate 100. The bending region WB has a second bending boundary SB2 away from the second refractive index film layer 190. A fifth distance h5 is defined between the fifth film layer boundary SM5 and the second bending boundary SB2. The fifth distance h5 may be not less than 0. Optionally, the fifth distance h5 may be the same as the fourth distance h4. Of course, the fifth distance h5 may also be greater than or less than the fourth distance h4.

[0132] In some embodiments of the present disclosure, as shown in Figures 3a to 8, the orthographic projection of the second optical film layer 171 on the base substrate 100 can cover the display area AA. Optionally, the orthographic projection of the second optical film layer 171 on the base substrate 100 also covers the non-display area BB at the remaining boundaries (e.g., BJ1, BJ2, and BJ3) of the display area AA.

[0133] To prevent the second optical film layer 171 from affecting the bending process of the bending zone, in some embodiments of the present disclosure, as shown in Figures 3a, 3b, and 5-7, the orthographic projection of the second optical film layer 171 on the base substrate 100 can be made not to overlap with the bending zone WB. Alternatively, the second optical film layer 171 can be disposed in the first non-bending zone NWB1. The orthographic projection of the second optical film layer 171 in the first non-bending zone NWB1 on the base substrate 100 has a sixth film layer boundary SM6 close to the bending zone WB. A sixth distance h6 is defined between the sixth film layer boundary SM6 and the first bending boundary SB1. The sixth distance h6 can be set to be no less than 0. For example, the sixth distance h6 can be set to be greater than 0, such that the sixth film layer boundary SM6 is disposed between the first film layer boundary SM1 and the first bending boundary SB1. Alternatively, the sixth film layer boundary SM6 can be aligned with the first film layer boundary SM1, such that the sixth distance h6 is equal to the first distance h1. Alternatively, the sixth film layer boundary SM6 may be misaligned with the first film layer boundary SM1, and the sixth film layer boundary SM6 may be misaligned with the first bending boundary SB1, in which case the sixth distance h6 is less than the first distance h1. Alternatively, the sixth distance h6 may be equal to 0, in which case the sixth film layer boundary SM6 may be aligned with the first bending boundary SB1.

[0134] Exemplarily, as shown in FIGS. 3a and 3b, the boundary SM6 of the sixth film layer can be disposed between the boundary SM4 of the fourth film layer and the boundary SM1 of the first film layer, so that h4 < h6 < h1. With this setting, the first optical film layer 172 can wrap the boundary SM6 of the sixth film layer of the second optical film layer 171, and the amount of edge wrapping for each is based on the mechanical influence range.

[0135] Exemplarily, as shown in FIG. 5, the boundary SM6 of the sixth film layer can also be disposed between the boundary SM4 of the fourth film layer and the boundary SM2 of the second film layer, so that h4 < h6 < h2. With this setting, the first optical film layer 172 can wrap the boundary SM6 of the sixth film layer of the second optical film layer 171, and the amount of edge wrapping for each is based on the mechanical influence range.

[0136] Exemplarily, as shown in FIGS. 6 and 7, the boundary SM6 of the sixth film layer can also be disposed between the boundary SM4 of the fourth film layer and the first bending boundary SB1, so that h6 < h4.

[0137] Exemplarily, the second optical film layer 171 can be disposed only in the first non-bending region NWB1. Alternatively, the second optical film layer 171 can also be disposed in both the first non-bending region NWB1 and the second non-bending region NWB2. For example, as shown in FIGS. 3a, 3b, 5 to 7, the second optical film layer 171 in the second non-bending region NWB2 has a seventh film layer boundary SM7 in the orthographic projection on the substrate 100 close to the bending region WB, the bending region WB has a second bending boundary SB2 away from the second refractive index film layer 190, and there is a seventh distance h7 between the seventh film layer boundary SM7 and the second bending boundary SB2. The seventh distance h7 can be made not less than 0. Optionally, the seventh distance h7 can be made the same as the sixth distance h6. Of course, the seventh distance h7 can also be made greater than or less than the sixth distance h6.

[0138] In some embodiments of the present disclosure, as shown in FIGS. 3a to FIG. 8, the touch insulating layer 170 can be made to cover the display area AA in the orthographic projection on the substrate 100. Optionally, the touch insulating layer 170 in the orthographic projection on the substrate 100 also covers the non-display area BB at the remaining boundaries (such as BJ1, BJ2, BJ3) of the display area AA.

[0139] To prevent the touch insulation layer 170 from affecting the bending process of the bending zone, in some embodiments of the present disclosure, as shown in Figures 3a, 3b, and 5-7, the orthographic projection of the touch insulation layer 170 on the base substrate 100 can be made not to overlap with the bending zone WB. Optionally, the touch insulation layer 170 can be disposed in the first non-bending zone NWB1. The orthographic projection of the touch insulation layer 170 in the first non-bending zone NWB1 on the base substrate 100 has an eighth film layer boundary SM8 close to the bending zone WB. An eighth distance h8 is defined between the eighth film layer boundary SM8 and the first bending boundary SB1. The eighth distance h8 can be greater than zero. Exemplarily, the eighth distance h8 can be greater than zero, such that the eighth film layer boundary SM8 is disposed between the first film layer boundary SM1 and the first bending boundary SB1. Optionally, the eighth film layer boundary SM8 can be aligned with the first film layer boundary SM1, such that the eighth distance h8 is equal to the first distance h1. Alternatively, the eighth film layer boundary SM8 may be misaligned with the first film layer boundary SM1, and the eighth film layer boundary SM8 may be misaligned with the first bending boundary SB1, in which case the eighth distance h8 is less than the first distance h1. Alternatively, the eighth distance h8 may be equal to 0, in which case the eighth film layer boundary SM8 may be aligned with the first bending boundary SB1.

[0140] For example, as shown in FIG3a and FIG3b, the eighth film layer boundary SM8 can be set between the first film layer boundary SM1 and the sixth film layer boundary SM6, then h6 <h8

[0141] For example, as shown in FIG5 to FIG7, the eighth film layer boundary can also be set between the second film layer boundary SM2 and the sixth film layer boundary SM6, then h6 <h8<h2。

[0142] For example, as shown in FIG6 and FIG7, the eighth film layer boundary can also be set between the fourth film layer boundary SM4 and the sixth film layer boundary SM6, then h6 <h8<h4。

[0143] For example, as shown in FIG. 3 a , FIG. 3 b , and FIG. 5 to FIG. 7 , the second optical film layer 171 may wrap around the eighth film layer boundary SM8 of the touch insulating layer 170 , and the extent of the wrapping is determined by the mechanical influence range.

[0144] ​For example, the touch insulating layer 170 may be provided only in the first non-bending region NWB1. Alternatively, the touch insulating layer 170 may be provided in both the first non-bending region NWB1 and the second non-bending region NWB2. For example, as shown in Figures 3a, 3b, and 5 to 7, the touch insulating layer 170 in the second non-bending region NWB2 has a ninth film layer boundary SM9 close to the bending region WB in the orthographic projection of the base substrate 100. The bending region WB has a second bending boundary SB2 away from the second refractive index film layer 190. A ninth distance h9 is defined between the ninth film layer boundary SM9 and the second bending boundary SB2. The ninth distance h9 may be not less than 0. Optionally, the ninth distance h9 may be the same as the eighth distance h8. Of course, the ninth distance h9 may also be greater than or less than the eighth distance h8.

[0145] In some embodiments of the present disclosure, as shown in Figures 3a to 8, the orthographic projection of the thin film encapsulation layer 140 on the base substrate 100 can cover the display area AA. Optionally, the orthographic projection of the thin film encapsulation layer 140 on the base substrate 100 also covers the non-display area BB at the remaining boundaries (e.g., BJ1, BJ2, and BJ3) of the display area AA.

[0146] In some embodiments of the present disclosure, as shown in Figures 3a, 3b, and 5 to 7, the thin film encapsulation layer 140 is disposed in the first non-bending region NWB1. For example, the thin film encapsulation layer 140 can be disposed only in the first non-bending region NWB1. Furthermore, the thin film encapsulation layer 140 has a tenth film layer boundary SM10 close to the bending region WB on the orthographic projection of the base substrate 100, and a tenth distance h10 is provided between the tenth film layer boundary SM10 and the first bending boundary SB1. The tenth distance h10 can be made not less than 0. For example, the tenth distance h10 can be made greater than 0, and the tenth film layer boundary SM10 is disposed between the first film layer boundary SM1 and the first bending boundary SB1. Optionally, the tenth film layer boundary SM10 can be aligned with the first film layer boundary SM1, and the tenth distance h10 is equal to the first distance h1. Alternatively, the tenth film layer boundary SM10 can be misaligned with the first film layer boundary SM1, and the tenth film layer boundary SM10 can be misaligned with the first bending boundary SB1, so that the tenth distance h10 is less than the first distance h1. Alternatively, the tenth distance h10 can be equal to 0, so that the tenth film layer boundary SM10 can be aligned with the first bending boundary SB1.

[0147] For example, as shown in FIG3a and FIG3b, the tenth film layer boundary SM10 can be set between the eighth film layer boundary SM8 and the first film layer boundary SM1, then h8 <h10

[0148] For example, as shown in FIG5 , the tenth film layer boundary SM10 may be set between the second film layer boundary SM2 and the first film layer boundary SM1 , then h2 <h10<h1。​

[0149] For example, as shown in FIG6 and FIG7, the tenth film layer boundary SM10 can also be set between the eighth film layer boundary SM8 and the fourth film layer boundary SM4, then h8 <h10<h4。

[0150] For example, as shown in Figures 3a, 3b, and 5-7, the touch insulating layer 170 can wrap around the tenth film layer boundary SM10 of the thin film encapsulation layer 140, and the extent of the wrapping is determined by the range of mechanical influence. Furthermore, the touch insulating layer 170 can wrap around the thin film encapsulation layer 140 to a greater extent. If the touch insulating layer 170 wraps around the thin film encapsulation layer 140 to a lesser extent, there is a risk that the touch insulating layer 170 may over-etch the thin film encapsulation layer 140.

[0151] For example, the materials of the first optical film layer 172 , the second optical film layer 171 , the first refractive index film layer 180 , and the second refractive index film layer 190 include, but are not limited to, organic materials.

[0152] It should be noted that, as shown in Figures 3a and 3b, the first refractive index film layer 180, the first optical film layer 172, and the second optical film layer 171 adopt an upper-wrapped lower structure, and the amount of hemming is determined by the mechanical impact range. Furthermore, after all hemming is completed, h2 is at least 0.2mm to ensure that no other film layers in the bending area affect the position of the neutral layer of the signal line.

[0153] It should be noted that, as shown in Figure 6, the boundaries of the encapsulation film layer 140, the touch insulation layer 170, and the second optical film layer 171 remain unchanged near the bend zone. Specifically, the organic film layer, the second optical film layer 171, covers the touch insulation layer 170, while the remaining organic film layers, the first optical film layer 172, the first refractive index film layer 180, and the second refractive index film layer 190, are retracted to a flat area within the boundary of the encapsulation film layer 140. Simultaneously, the second refractive index film layer 190 covers the first refractive index film layer 180 and the first optical film layer 172, ensuring that the second optical film layer 171, the first optical film layer 172, the first refractive index film layer 180, and the second refractive index film layer 190 are completely removed from the bend zone. Furthermore, while ensuring that the touch insulation layer 170 is effectively protected, the other upper organic film layers are all retracted, maintaining the principle of upper layers covering lower layers.

[0154] It should be noted that, as shown in FIG. 7 , the first refractive index film layer 180 may also be designed to cover the first optical film layer 172 .

[0155] It should be noted that, as shown in Figures 3a, 3b, and 5 to 7, the touch insulation layer 170 can wrap more of the thin film encapsulation layer 140. If the touch insulation layer 170 wraps less of the thin film encapsulation layer 140, there is a risk that the touch insulation layer 170 will over-etch the thin film encapsulation layer 140.

[0156] In some embodiments of the present disclosure, as shown in Figures 3a to 8, the display panel further includes a first inorganic layer 114 disposed between the thin-film encapsulation layer 140 and the base substrate 100. Optionally, the first inorganic layer 114 may include one or more of a buffer layer, a gate insulating layer, an interlayer dielectric layer, and an interlayer insulating layer. To prevent the first inorganic layer 114 from affecting the bending process of the bending zone, the orthographic projection of the first inorganic layer 114 on the base substrate 100 may not overlap with the bending zone WB, and the orthographic projection of the first inorganic layer 114 on the base substrate 100 may be aligned with the bending zone WB near the boundary of the bending zone WB. Exemplarily, the orthographic projection of the first inorganic layer 114 on the base substrate 100 covers the display area AA. Optionally, the orthographic projection of the first inorganic layer 114 on the base substrate 100 also covers the non-display area BB at the remaining boundaries of the display area AA (e.g., BJ1, BJ2, and BJ3).

[0157] In some embodiments of the present disclosure, as shown in Figures 3a to 8, the display panel further includes a second inorganic layer 113 disposed between the thin-film encapsulation layer 140 and the base substrate 100. Optionally, the second inorganic layer 113 may include one or more of a buffer layer, a gate insulating layer, an interlayer dielectric layer, and an interlayer insulating layer other than the first inorganic layer 114. To prevent the second inorganic layer 113 from affecting the bending process of the bending zone, the orthographic projection of the second inorganic layer 113 on the base substrate 100 may be configured to not overlap with the bending zone WB.

[0158] For example, as shown in Figures 3a to 8, the first non-bending region NWB1 is provided with a second inorganic layer 113. The orthographic projection of the second inorganic layer 113 in the first non-bending region NWB1 on the base substrate 100 has an eleventh film layer boundary SM11 close to the bending region WB. The eleventh film layer boundary SM11 and the first bending boundary SB1 have an eleventh distance h11, and the eleventh distance h11 can be made not less than 0. For example, the eleventh distance h11 can be made greater than 0, and the eleventh film layer boundary SM11 is provided between the first film layer boundary SM1 and the first bending boundary SB1. Alternatively, the eleventh film layer boundary SM11 can be aligned with the first film layer boundary SM1, and the eleventh distance h11 is equal to the first distance h1. Alternatively, the eleventh film layer boundary SM11 can be misaligned with the first film layer boundary SM1, and the eleventh film layer boundary SM11 and the first bending boundary SB1 are misaligned, and the eleventh distance h11 is less than the first distance h1. Alternatively, the eleventh distance h11 may be set to 0, and the eleventh film layer boundary SM11 may be aligned with the first bending boundary SB1 .

[0159] For example, as shown in FIG3a, FIG3b, and FIG5 to FIG7, the eleventh film layer boundary SM11 can be set between the first film layer boundary SM1 and the first bending boundary SB1, then h11

[0160] For example, as shown in FIG3a and FIG3b, the eleventh film layer boundary SM11 can be set between the second film layer boundary SM2 and the fourth film layer boundary SM4, then h2 <h11<h4。

[0161] For example, as shown in FIG. 5 , the eleventh film layer boundary SM11 may be aligned with the fourth film layer boundary SM4 , and then h11 = h4 .

[0162] For example, as shown in FIG6 , the eleventh film layer boundary SM11 may be set between the sixth film layer boundary SM6 and the first bending boundary SB1 , then h11 <h4<h2。

[0163] For example, as shown in FIG7 , the eleventh film layer boundary SM11 may be set between the sixth film layer boundary SM6 and the first bending boundary SB1 , then h11 <h2<h4。

[0164] For example, the second inorganic layer 113 may be provided only in the first non-bending region NWB1. Alternatively, the second inorganic layer 113 may be provided in both the first non-bending region NWB1 and the second non-bending region NWB2. For example, as shown in Figures 3a, 3b, and 5 to 7, the second non-bending region NWB2 is provided with a second inorganic layer 113, and the second inorganic layer 113 in the second non-bending region NWB2 has a twelfth film layer boundary SM12 close to the bending region WB in the orthographic projection of the base substrate 100, and a twelfth distance h12 is provided between the twelfth film layer boundary SM12 and the second bending boundary SB2, and the twelfth distance h12 can be made not less than 0.

[0165] Optionally, the twelfth distance h12 may be the same as the eleventh distance h11. Of course, the twelfth distance h12 may also be greater than or less than the eleventh distance h11.

[0166] ​In some embodiments of the present disclosure, as shown in Figures 3a to 8, the display panel may further include: a protective layer 173, the protective layer 173 being disposed on the side of the first refractive index film layer 180 facing away from the base substrate 100, and the protective layer 173 being disposed between the first refractive index film layer 180 and the cover plate. The orthographic projection of the protective layer 173 on the base substrate 100 covers the bending area WB, thereby protecting the bending area, and the orthographic projection of the protective layer 173 on the base substrate 100 does not overlap with the orthographic projection of the second refractive index film layer 190 on the base substrate 100. It should be noted that the elastic modulus of the protective layer 173 is relatively low, and its influence on the position of the signal line in the neutral layer can be ignored, which is equivalent to not causing the signal line to break under tension due to the provision of the protective layer 173.

[0167] For example, as shown in FIG. 3 a and FIG. 3 b , the orthographic projection of the protective layer 173 on the base substrate 100 may also cover the portion of the first refractive index film layer 180 close to the bending region WB in the orthographic projection of the base substrate 100 .

[0168] For example, as shown in Figures 3a and 3b, the protective layer 173 can be arranged in contact with the first film layer boundary SM1 of the second refractive index film layer 190. Alternatively, as shown in Figures 5 to 7, a certain distance L1 can be set between the protective layer 173 and the first film layer boundary SM1 of the second refractive index film layer 190, where L1 is less than h1. In some embodiments, the upper surface of the protective layer 173 can be slightly higher than the upper surface of the second refractive index film layer 190. This helps protect the second refractive index film layer 190 from being affected during the assembly process. Of course, the upper surface of the protective layer 173 can also be slightly lower than the upper surface of the second refractive index film layer 190.

[0169] Exemplarily, as shown in FIG. 3 a to FIG. 8 , the second refractive index film layer 190 at least covers the thin film encapsulation layer 140 and / or the touch insulation layer 170 in the first non-bending region NWB1 .

[0170] For example, as shown in FIG. 5 to FIG. 7 , the orthographic projection of the protective layer 173 on the base substrate 100 may not overlap with the orthographic projection of the first refractive index film layer 180 on the base substrate 100 .

[0171] Alternatively, as shown in FIG8 , the orthographic projection of the first refractive index film layer 180 on the base substrate 100 can cover both the bending region WB and the second non-bending region NWB2. Because the elastic modulus of the first refractive index film layer 180 is relatively low, the peeling problem can be ignored. This allows the signal lines, originally located in the neutral layer, to move downward, placing them under pressure during the bending process, making them less susceptible to breakage.

[0172] Alternatively, as shown in FIG8 , the orthographic projection of the first optical film layer 172 on the base substrate 100 can cover the first non-bending region NWB1, the bending region WB, and the second non-bending region NWB2. This can further move the signal lines originally located in the neutral layer downward, placing them under pressure during the bending process, making them less likely to break.

[0173] Alternatively, as shown in FIG8 , the orthographic projection of the second optical film layer 171 on the base substrate 100 can cover the first non-bending region NWB1, the bending region WB, and the second non-bending region NWB2. This can further move the signal line, originally located in the neutral layer, downward, placing it under pressure during the bending process, making it less likely to break.

[0174] Optionally, as shown in FIG8 , the orthographic projection of the touch insulating layer 170 on the base substrate 100 can cover the first non-bending region NWB1, the bending region WB, and the second non-bending region NWB2. This can further move the signal line, which was originally located in the neutral layer, downward, placing it under pressure during the bending process, making it less likely to break.

[0175] It should be noted that, as shown in FIG. 1 , FIG. 3 a , FIG. 3 b , and FIG. 5 to FIG. 8 , 112 represents the second planarization layer, and 111 represents the second conductive layer.

[0176] In some embodiments, the second inorganic layer 113, the second inorganic layers 113 and 112, the second planarization layer 112, and the second conductive layer 111 may be part of the structure of the thin film transistor array layer 110. That is, during the formation of the thin film transistor array layer 110, the second inorganic layer 113, the second inorganic layers 113 and 112, the second planarization layer 112, and the second conductive layer 111 are simultaneously formed. Of course, the thin film transistor array layer 110 may also include other metal film layers or insulating layer structures required to drive the light-emitting element 130, which will not be described in detail here.

[0177] In order to block the flow of the organic encapsulation layer in the thin film encapsulation layer 140 and improve the encapsulation effect, a retaining wall is set around the display area AA. In some embodiments of the present disclosure, as shown in Figure 9, the first non-bending area NWB1 also includes: at least two retaining walls (such as 176, 177) surrounding the display area AA, and the retaining walls (such as 176, 177) are set in the non-display area BB. The number of retaining walls can be two, three, four or more, which is not limited here. Figure 9 takes two retaining walls as an example for explanation, and two retaining walls are set: a first retaining wall 176 and a second retaining wall 177. The first retaining wall 176 is set to surround the display area AA, and the second retaining wall 177 is set in a ring around the periphery of the first retaining wall 176.

[0178] In some examples, the first retaining wall 176 and the second retaining wall 177 can be prepared simultaneously when preparing the first planarization layer 150 and the pixel defining layer 120, so that the first retaining wall 176 and the second retaining wall 177 are formed using the stacked structure of the pixel defining layer 120 and the first planarization layer 150, and the process flow is reduced.

[0179] In other examples, the first and second retaining walls can be fabricated simultaneously with the pixel defining layer, forming an integrated structure with the pixel defining layer and simplifying the process flow. Alternatively, the first and second retaining walls can be fabricated simultaneously with the first planarization layer, forming an integrated structure with the first planarization layer and simplifying the process flow.

[0180] In some embodiments of the present disclosure, as shown in FIG9 , the orthographic projection of the second refractive index film layer 190 on the base substrate 100 can overlap the orthographic projections of all retaining walls on the base substrate 100, thereby enabling the second refractive index film layer 190 to completely cover the display area AA. Furthermore, the orthographic projection of the first refractive index film layer 180 on the base substrate 100 can overlap the orthographic projections of all retaining walls on the base substrate 100, thereby enabling the first refractive index film layer 180 to completely cover the display area AA. For example, as shown in FIG9 , the orthographic projections of the second refractive index film layer 190 and the first refractive index film layer 180 on the base substrate 100 overlap the orthographic projections of the first and second retaining walls on the base substrate 100.

[0181] In some embodiments of the present disclosure, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 may not overlap with the side edge of at least one retaining wall near the bending region WB, and the orthographic projection of the second refractive index film layer 190 on the base substrate 100 may also cover the orthographic projections of the remaining side edges of all retaining walls on the base substrate 100. For example, as shown in FIG10 , the orthographic projection of the second refractive index film layer 190 on the base substrate 100 does not overlap with the orthographic projection of the side edge of the second retaining wall 177 near the bending region WB on the base substrate 100, and the orthographic projection of the second refractive index film layer 190 on the base substrate 100 may also cover the orthographic projections of the remaining side edges of the first retaining wall 176 and the second retaining wall 177 on the base substrate 100.

[0182] In some embodiments of the present disclosure, the first film layer boundary SM1 of the second refractive index film layer 190 can also be located between the retaining walls 177 and 176 near the bending area WB, and the orthographic projection of the second refractive index film layer 190 on the base substrate 100 also covers the orthographic projections of the remaining side edges of all retaining walls on the base substrate 100.

[0183] In some embodiments of the present disclosure, as shown in FIG10 , near the bending region WB, the distance between the first film layer boundary SM1 of the second refractive index film layer 190 and the second retaining wall 177 can be made smaller than the distance h1 from the first film layer boundary SM1 of the second refractive index film layer 190 to the bending region WB. This design provides the second refractive index film layer 190 with sufficient buffer space to avoid splitting.

[0184] In some embodiments of the present disclosure, as shown in Figure 10, the width of the bending zone WB is greater than the distance from the first film layer boundary SM1 of the second refractive index film layer 190 to the bending zone WB (that is, the first distance h1). This design allows the bending of the bending zone to avoid the second refractive index film layer 190 (high elastic modulus) to avoid splitting.

[0185] For example, as shown in FIG4 , in both the bending region WB and the non-bending region, all of the multiple data lines are located in the middle region of the substrate 100. Clock signal lines (e.g., CK1a, CK2a, CK1b, CK2b), initialization signal lines (e.g., VINITa, VINITb), high-voltage signal lines (e.g., VGHa, VGHb), and low-voltage signal lines (e.g., VGLa, VGLb) are sequentially arranged on either side of the data line DA, forming a symmetrical structure. In other words, the orthographic projection of the region containing all of the multiple data lines DA on the substrate 100 is located in the middle region of the substrate 100. On either side of the orthographic projection of the data line DA region on the substrate 100, the orthographic projections of the clock signal lines (e.g., CK1a, CK2a, CK1b, CK2b), the initialization signal lines (e.g., VINITa, VINITb), the high-voltage signal lines (e.g., VGHa, VGHb), and the low-voltage signal lines (e.g., VGLa, VGLb) can be arranged in sequence. Since low-voltage signals are typically located at the outermost edge of the bend region WB, close to the substrate edge, cracks may form after bending in the bend region, allowing moisture to enter through the cracks. However, the voltage transmitted on the low-voltage signal line (negative value) is typically low, resulting in a large voltage difference between the low-voltage signal line and the adjacent signal lines. Under the dual 85 reliability test (e.g., 85% humidity and 85% temperature), the low-voltage signal line can corrode and break, resulting in a black screen.

[0186] To further reduce the corrosion and breakage of the above-mentioned low-voltage signal lines, as shown in FIG. 10, in the bending region WB, the region where the low-voltage signal lines (such as VGLa, VGLb) are located can be set such that the orthographic projection on the substrate 100 is between the orthographic projection of the region where multiple data lines DA are located on the substrate 100 and the edge of the substrate 100. In this way, the region where the low-voltage signal lines (such as VGLa, VGLb) are located is moved inwards, while being far from the edge of the substrate 100, and water and oxygen are blocked by the assistance of other signal lines.

[0187] Exemplarily, as shown in FIG. 10, in the bending region WB, in the row direction of the pixel unit, there is a spacing distance H1a between the orthographic projection of the region where the low-voltage signal line VGLa is located on the substrate 100 and the edge of the substrate 100. The present disclosure does not limit the specific value of H1a. Exemplarily, 832um < H1a ≤ 2000um. For example, H1a can be selected from 850um, 900um, 1000um, 1100um, 1500um, 1800um, 2000um, etc.

[0188] Exemplarily, as shown in FIG. 10, in the bending region WB, in the row direction of the pixel unit, there is a spacing distance H1b between the orthographic projection of the region where the low-voltage signal line VGLb is located on the substrate 100 and the edge of the substrate 100. The present disclosure does not limit the specific value of H1b. Exemplarily, 832um < H1b ≤ 2000um. For example, H1b can be selected from 850um, 900um, 1000um, 1100um, 1500um, 1800um, 2000um, etc.

[0189] Exemplarily, H1a and H1b can be made the same to achieve a symmetric setting.

[0190] In some examples, in the bending region, the orthographic projection of the region where the low-voltage signal line is located on the substrate can be set between the orthographic projection of the region where multiple data lines are located on the substrate and the orthographic projection of the region where the clock signal line is located on the substrate. For example, as shown in FIG. 10, the orthographic projection of the region where the low-voltage signal line VGLa is located on the substrate 100 is set between the orthographic projection of the region where multiple data lines DA are located on the substrate 100 and the orthographic projection of the region where the clock signal lines CK1a, CK2a are located on the substrate 100. The orthographic projection of the region where the low-voltage signal line VGLb is located on the substrate 100 is set between the orthographic projection of the region where multiple data lines DA are located on the substrate 100 and the orthographic projection of the region where the clock signal lines CK1b, CK2b are located on the substrate 100.

[0191] In some other examples, in the bending area, the orthographic projection of the low voltage signal line on the substrate can be set between the orthographic projection of the clock signal line and the orthographic projection of the initialization signal line on the substrate.

[0192] In some other examples, in the bending area, the orthographic projection of the low voltage signal line area on the substrate can be set between the orthographic projection of the initialization signal line area on the substrate and the orthographic projection of the high voltage signal line area on the substrate.

[0193] In some embodiments of the present disclosure, the display panel further includes at least one dummy signal line disposed between the plurality of signal lines and the edge of the substrate. Based on this, one or more dummy signal lines are designed to block water and oxygen, preventing reliability-related corrosion. It should be understood that a dummy signal line is a line that does not input any signal and is in a floating state.

[0194] For example, as shown in FIG11 , in the bend region WB, six virtual signal lines DUMa are arranged between the orthographic projection of the substrate 100 and the edge of the substrate 100 in the region where the low-voltage signal line VGLa resides, and six virtual signal lines DUMb are arranged between the orthographic projection of the substrate 100 and the edge of the substrate 100 in the region where the low-voltage signal line VGLb resides. This means that the number of virtual signal lines on the left and right sides is the same, achieving a symmetrical arrangement. Of course, the number of virtual signal lines on the left and right sides can also be different, and this is not a limitation here.

[0195] For example, as shown in FIG12 , in the bending region WB, six virtual signal lines DUMa are arranged between the orthographic projection of the substrate 100 and the edge of the substrate 100 in the region where the high-voltage signal line VGHa is located, and six virtual signal lines DUMb are arranged between the orthographic projection of the substrate 100 and the edge of the substrate 100 in the region where the high-voltage signal line VGHb is located. That is, the number of virtual signal lines on the left and right sides is the same, achieving a symmetrical arrangement.

[0196] Figures 11 and 12 illustrate the example of setting 6 virtual signal lines on each side. In actual applications, the number of virtual signal lines can be set to 1, 2, 4, 8, 10, 15 or 20, and the present disclosure does not limit the number of virtual signal lines.

[0197] In some examples, as shown in Figures 13a and 13b, in the bending area WB, multiple data lines DA can be set in the first conductive layer, and the low voltage signal lines VGLa, VGLb, initialization signal lines VINITa, VINITb, multiple clock signal lines CK1a, CK2a and CK1b, CK2b and high voltage signal lines VGHa, VGHb can be set in the second conductive layer.

[0198] In yet other examples, as shown in Figures 14a and 14b , multiple data lines DA and low-voltage signal lines VGLa and VGLb can be disposed in the first conductive layer within the bend region WB, further reducing the risk of these low-voltage signal lines being corroded and broken. Furthermore, initialization signal lines VINITa and VINITb, multiple clock signal lines CK1a, CK2a, CK1b, and CK2b, and high-voltage signal lines VGHa and VGHb can be disposed in the second conductive layer.

[0199] In some other examples, in the bending region, the low-voltage signal line includes a first low-voltage signal line and a second low-voltage signal line connected to each other. Multiple data lines and the first low-voltage signal line are arranged on the first conductive layer, and the second low-voltage signal line, the initialization signal line, the multiple clock signal lines, and the high-voltage signal line are arranged on the second conductive layer, which can further reduce the corrosion and disconnection of the above-mentioned low-voltage signal lines. For example, as shown in Figure 15, the low-voltage signal line VGLa includes a first low-voltage signal line VGL1a and a second low-voltage signal line VGL2a connected to each other, and the low-voltage signal line VGLb includes a first low-voltage signal line VGL1b and a second low-voltage signal line VGL2b connected to each other. The first low-voltage signal lines VGL1a and VGL1b are arranged on the first conductive layer, and the second low-voltage signal lines VGL2a and VGL2b are arranged on the second conductive layer. The first low voltage signal line VGL1a and the second low voltage signal line VGL2a are connected to each other through a via penetrating the insulating layer, and the first low voltage signal line VGL1b and the second low voltage signal line VGL2b are connected to each other through a via penetrating the insulating layer.

[0200] When dummy signal lines are provided, they can be provided on the same layer as the low-voltage signal lines. For example, as shown in Figures 13a and 13b , the low-voltage signal lines VGLa and VGLb and the dummy signal lines DUMa and DUMb are all provided on the second conductive layer. For example, as shown in Figures 14a and 14b , the low-voltage signal lines VGLa and VGLb and the dummy signal lines DUMa and DUMb are all provided on the first conductive layer.

[0201] It should be noted that, in the bending region, the first conductive layer may be disposed between the second planarization layer 112 and the second inorganic layer 113 .

[0202] For example, the thickness of the layer containing the low-voltage signal lines can be increased by 10% to 30% from the original set thickness A, so that the thickness of the layer containing the low-voltage signal lines is A*110% to A*130%, thereby reducing the signal line impedance. Moreover, this solution can be implemented through the process without changing the mask.

[0203] For example, the thickness of the layer where the low voltage signal line is located can be A*110%, A*115%, A*120%, A*125%, A*130%, which is not limited here. The thickness of the layer where the low voltage signal line is located is

[0204] In some other examples, as shown in FIG16 , the portion of the low-voltage signal line VGLb in the bending area WB includes: a plurality of low-voltage sub-signal lines VGLZb arranged at intervals from each other. Furthermore, one end of the plurality of low-voltage sub-signal lines is connected to the low-voltage signal line VGLb in the first non-bending area NWB1, and the other end of the plurality of low-voltage sub-signal lines is connected to the low-voltage signal line VGLb in the second non-bending area NWB2. It should be noted that FIG16 is only for the low-voltage signal line VGLb, and the low-voltage sub-signal lines VGLZb are set as an example for explanation. The specific value of the low-voltage sub-signal line VGLZb can be determined according to the needs of the actual application. Furthermore, the low-voltage signal line VGLa can be set in the same way, which will not be described in detail here.

[0205] Based on the same disclosed concept, the embodiment of the present disclosure also provides a method for preparing the above-mentioned display panel, comprising: forming a first refractive index film layer on a base substrate. Forming a second refractive index film layer on the side of the first refractive index film layer away from the base substrate. The base substrate comprises: a bending area and a non-bending area; the non-bending area comprises a display area having a plurality of sub-pixels; a first refractive index film layer is provided in the display area, and the first refractive index film layer has a plurality of openings, and the plurality of openings are provided corresponding to the plurality of sub-pixels. Furthermore, the second refractive index film layer covers the first refractive index film layer and fills at least part of the plurality of openings. Furthermore, the refractive index of the second refractive index film layer is greater than the refractive index of the first refractive index film layer; the orthographic projection of the second refractive index film layer on the base substrate does not overlap with the bending area, and the orthographic projection of the second refractive index film layer on the base substrate has a first film layer boundary close to the bending area, the bending area has a first bending boundary close to the second refractive index film layer, and the first distance between the first film layer boundary and the first bending boundary is greater than 0.

[0206] For example, as shown in FIG1 , the following are sequentially formed on a base substrate: a thin film transistor array layer 110, a first planarization layer 150, a pixel defining layer 120, a light-emitting device 130, a thin film encapsulation layer 140, a first touch electrode layer 161, a touch insulating layer 170, a second touch electrode layer 162, a second optical film layer 171, a black matrix 174, a color resist layer 175, a first optical film layer 172, a first refractive index film layer 180, and a second refractive index film layer 190. The structure and relative positions of each film layer can be found in the above description and are not detailed here.

[0207] Based on the same disclosed concept, embodiments of the present disclosure further provide a display device, including the display panel provided in the embodiments of the present disclosure. The principles of this display device for solving problems are similar to those of the aforementioned display panel, so the implementation of this display device can refer to the implementation of the aforementioned display panel, and the repeated parts will not be repeated here.

[0208] In specific implementations, in the embodiments of the present disclosure, the display device can be any product or component with a display function, such as a mobile phone, a tablet computer, a television, a monitor, a laptop computer, a digital photo frame, a navigation system, or the like. Other essential components of the display device are well understood by those skilled in the art and are not detailed here, nor should they be construed as limitations of the present disclosure.

[0209] Although the preferred embodiments of the present disclosure have been described, those skilled in the art may make additional changes and modifications to these embodiments once they have learned the basic creative concepts. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments and all changes and modifications that fall within the scope of the present disclosure.

[0210] Obviously, those skilled in the art may make various changes and modifications to the embodiments of the present disclosure without departing from the spirit and scope of the embodiments of the present disclosure. Thus, if such changes and modifications of the embodiments of the present disclosure fall within the scope of the claims of the present disclosure and their equivalents, the present disclosure is intended to include such changes and modifications.

Claims

1. A display panel, wherein: include: A substrate, comprising: a bending area and a non-bending area; the non-bending area comprises a display area having a plurality of sub-pixels; A first refractive index film layer is disposed on the base substrate, the first refractive index film layer is disposed in the display area, and the first refractive index film layer has a plurality of openings, and the plurality of openings are disposed correspondingly to the plurality of sub-pixels; A second refractive index film layer is disposed on a side of the first refractive index film layer away from the base substrate, the second refractive index film layer covers the first refractive index film layer and fills at least a portion of the plurality of openings; Among them, the refractive index of the second refractive index film layer is greater than the refractive index of the first refractive index film layer; the orthographic projection of the second refractive index film layer on the base substrate does not overlap with the bending area, and the orthographic projection of the second refractive index film layer on the base substrate has a first film layer boundary close to the bending area, the bending area has a first bending boundary close to the second refractive index film layer, and a first distance between the first film layer boundary and the first bending boundary is greater than 0.

2. The display panel according to claim 1, wherein: The non-bending area includes a first non-bending area and a second non-bending area, the first non-bending area and the second non-bending area are arranged on both sides of the bending area, and the first non-bending area includes the display area; The second refractive index film layer is disposed in the first non-bending area, and the orthographic projection of the second refractive index film layer on the base substrate covers the display area.

3. The display panel according to claim 2, wherein: The first non-bending area is provided with the first refractive index film layer, the orthographic projection of the first refractive index film layer in the first non-bending area on the base substrate has a second film layer boundary close to the bending area, and a second distance between the second film layer boundary and the first bending boundary is not less than 0; and / or, The second non-bending area is provided with the first refractive index film layer, and the first refractive index film layer in the second non-bending area has a third film layer boundary close to the bending area on the orthographic projection of the base substrate, and the bending area has a second bending boundary away from the second refractive index film layer, and a third distance between the third film layer boundary and the second bending boundary is not less than 0.

4. The display panel according to any one of claims 1 to 3, wherein: The display panel further includes: a first optical film layer, which is disposed between the first refractive index film layer and the base substrate; and an orthographic projection of the first optical film layer on the base substrate covers the display area.

5. The display panel according to claim 4, wherein: The orthographic projection of the first optical film layer on the base substrate does not overlap with the bending area; The first non-bending area is provided with the first optical film layer, the orthographic projection of the first optical film layer in the first non-bending area on the base substrate has a fourth film layer boundary close to the bending area, and a fourth distance between the fourth film layer boundary and the first bending boundary is not less than 0; and / or, The second non-bending area is provided with the first optical film layer, the first optical film layer in the second non-bending area has a fifth film layer boundary close to the bending area on the orthographic projection of the base substrate, the bending area has a second bending boundary away from the second refractive index film layer, and the fifth distance between the fifth film layer boundary and the second bending boundary is not less than 0.

6. The display panel according to claim 5, wherein: The fourth film layer boundary is disposed between the first film layer boundary and the first bending boundary.

7. The display panel according to claim 6, wherein: The second film layer boundary is disposed between the fourth film layer boundary and the first bending boundary; or, The second film layer boundary is arranged between the fourth film layer boundary and the first film layer boundary; or, The first film layer boundary is disposed between the second film layer boundary and the first bending boundary, and the fourth film layer boundary is disposed between the second film layer boundary and the first film layer boundary; or, The first film layer boundary is disposed between the second film layer boundary and the first bending boundary, and the second film layer boundary is disposed between the fourth film layer boundary and the first film layer boundary.

8. The display panel according to any one of claims 4 to 7, wherein: The display panel further includes: a second optical film layer, which is disposed between the first optical film layer and the base substrate; and an orthographic projection of the second optical film layer on the base substrate covers the display area.

9. The display panel according to claim 8, wherein: The orthographic projection of the second optical film layer on the base substrate does not overlap with the bending area; The first non-bending area is provided with the second optical film layer, the orthographic projection of the second optical film layer in the first non-bending area on the base substrate has a sixth film layer boundary close to the bending area, and a sixth distance between the sixth film layer boundary and the first bending boundary is not less than 0; and / or, The second non-bending area is provided with the second optical film layer, and the second optical film layer in the second non-bending area has a seventh film layer boundary close to the bending area on the orthographic projection of the base substrate, and the bending area has a second bending boundary away from the second refractive index film layer, and the seventh distance between the seventh film layer boundary and the second bending boundary is not less than 0.

10. The display panel according to claim 9, wherein: The sixth film layer boundary is disposed between the fourth film layer boundary and the first film layer boundary; or, The sixth film layer boundary is disposed between the fourth film layer boundary and the second film layer boundary; or, The sixth film layer boundary is disposed between the fourth film layer boundary and the first bending boundary.

11. The display panel according to any one of claims 8 to 10, wherein: The display panel further includes: a touch insulating layer, which is disposed between the second optical adhesive and the base substrate; and the orthographic projection of the touch insulating layer on the base substrate covers the display area.

12. The display panel according to claim 11, wherein: The orthographic projection of the touch insulating layer on the base substrate does not overlap with the bending area; The touch insulating layer is disposed in the first non-bending area, the touch insulating layer in the first non-bending area has an eighth film layer boundary close to the bending area on the orthographic projection of the base substrate, and an eighth distance between the eighth film layer boundary and the first bending boundary is greater than 0; and / or, The touch insulating layer is provided in the second non-bending area, and the touch insulating layer in the second non-bending area has a ninth film layer boundary close to the bending area on the orthographic projection of the base substrate, and the bending area has a second bending boundary away from the second refractive index film layer, and a ninth distance between the ninth film layer boundary and the second bending boundary is not less than 0.

13. The display panel according to claim 12, wherein: The eighth film layer boundary is arranged between the first film layer boundary and the sixth film layer boundary; or, The eighth film layer boundary is arranged between the second film layer boundary and the sixth film layer boundary; or, The eighth film layer boundary is disposed between the fourth film layer boundary and the sixth film layer boundary.

14. The display panel according to any one of claims 11 to 13, wherein: The display panel further includes: a thin film encapsulation layer, which is disposed between the base substrate and the touch insulating layer; and the thin film encapsulation layer covers the display area on an orthographic projection of the base substrate.

15. The display panel according to claim 14, wherein: The display panel further includes: A thin film transistor array layer is disposed on the base substrate; A first planarization layer disposed on a side of the thin film transistor array layer away from the base substrate; A pixel defining layer disposed on a side of the first planarization layer away from the base substrate; A light emitting device disposed in the opening of the pixel defining layer; The thin film encapsulation layer is arranged on a side of the light emitting device away from the base substrate; A first touch electrode film layer disposed on a side of the thin film encapsulation layer away from the base substrate; Disposing the touch insulating layer on the side of the first touch electrode film layer away from the base substrate; A second touch electrode film layer is disposed on a side of the touch insulating layer away from the base substrate; A second optical film layer disposed on a side of the second touch electrode film layer away from the base substrate; A black matrix and / or a color resist layer disposed on a side of the second optical film layer away from the base substrate; A first optical film layer disposed on a side of the black matrix and / or the color resist layer away from the base substrate; A first refractive index film layer disposed on a side of the first optical film layer away from the base substrate; A second refractive index film layer is disposed on a side of the first refractive index film layer away from the base substrate.

16. The display panel according to any one of claims 1 to 15, wherein: The display panel also includes: a protective layer, which is arranged on the side of the first refractive index film layer away from the base substrate, the orthographic projection of the protective layer on the base substrate covers the bending area, and the orthographic projection of the protective layer on the base substrate does not overlap with the orthographic projection of the second refractive index film layer on the base substrate.

17. The display panel according to claim 2, wherein: The display panel further includes: A first optical film layer, wherein the first optical film layer is disposed between the first refractive index film layer and the base substrate; A second optical film layer, wherein the second optical film layer is disposed between the first optical film layer and the base substrate; A touch insulating layer, the touch insulating layer is disposed between the second optical adhesive and the base substrate; A thin film encapsulation layer, wherein the thin film encapsulation layer is disposed between the base substrate and the touch insulating layer; A first inorganic layer, wherein the first inorganic layer is disposed between the thin film encapsulation layer and the base substrate; A second inorganic layer, wherein the second inorganic layer is disposed between the thin film encapsulation layer and the base substrate; Wherein, the orthographic projection of the first refractive index film layer on the base substrate also covers the bending area and the second non-bending area; The orthographic projection of the first optical film layer on the base substrate covers the first non-bending area, the bending area and the second non-bending area; The orthographic projection of the second optical film layer on the base substrate covers the first non-bending area, the bending area and the second non-bending area; The orthographic projection of the touch insulating layer on the base substrate covers the first non-bending area, the bending area and the second non-bending area; The orthographic projection of the thin film encapsulation layer on the base substrate covers the display area; The orthographic projection of the first inorganic layer on the base substrate does not overlap with the bending region, and the orthographic projection of the first inorganic layer on the base substrate is aligned with the bending region near the boundary of the bending region; The orthographic projection of the second inorganic layer on the base substrate does not overlap with the bending region.

18. The display panel according to any one of claims 1 to 17, wherein: The display panel further comprises: a plurality of signal lines; the plurality of signal lines comprises: a plurality of data lines, a low voltage signal line, an initialization signal line, a plurality of clock signal lines and a high voltage signal line; In the bending area, the orthographic projection of the area where the low voltage signal line is located on the substrate is arranged between the orthographic projection of the area where the multiple data lines are located on the substrate, the orthographic projection of the area where the initialization signal line is located on the substrate, the orthographic projection of the area where the multiple clock signal lines are located on the substrate, and the orthographic projection of the area where the high voltage signal line is located on the substrate.

19. A display device, wherein: Comprising a display panel as described in any one of claims 1-18.

20. A method for preparing a display panel, wherein: include: A first refractive index film layer is formed on a base substrate; wherein the base substrate comprises: a bending area and a non-bending area; the non-bending area comprises a display area having a plurality of sub-pixels; the display area is provided with the first refractive index film layer, and the first refractive index film layer has a plurality of openings, and the plurality of openings are provided correspondingly to the plurality of sub-pixels; Forming a second refractive index film layer on a side of the first refractive index film layer away from the base substrate; wherein the second refractive index film layer covers the first refractive index film layer and fills at least a portion of the plurality of openings; Among them, the refractive index of the second refractive index film layer is greater than the refractive index of the first refractive index film layer; the orthographic projection of the second refractive index film layer on the base substrate does not overlap with the bending area, and the orthographic projection of the second refractive index film layer on the base substrate has a first film layer boundary close to the bending area, the bending area has a first bending boundary close to the second refractive index film layer, and a first distance between the first film layer boundary and the first bending boundary is greater than 0.

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