Coil connector, electrode coil connecting structure and semiconductor process apparatus
Through the design of coil connecting parts with a balanced part and branches, the problem of uneven diversion of the current of the upper electrode coil is solved, and the uniform diversion of the current and the uniform current distribution of the electrode coil are realized, which improves the uniformity of etching.
Patent Information
- Application Number
- PCT/CN2024/103900
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-07-17
- Filing Date
- 2024-07-05
- Publication Date
- 2025-01-23
AI Technical Summary
In the prior art, the current shunt of the upper electrode coil is uneven, resulting in asymmetry in plasma etching.
Design a kind of coil connector, including the branches and the balance parts. The balance parts have the outer wall, and the peripheral wall of the periphery of the portion of the branch arm is distributed. Digestion evenly to the arm.
By uniform diversion current, the current distribution of the electrode coil is uniformly distributed, and the asymmetry of plasma etching is reduced.
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Figure CN2024103900_23012025_PF_FP_ABST
Abstract
Description
Coil connector, electrode coil connection structure and semiconductor process equipment Technical Field
[0001] The present application relates to the field of semiconductor manufacturing, and in particular, to a coil connector, an electrode-coil connection structure, and semiconductor process equipment. Background Art
[0002] Deep silicon etching is a crucial process in industrial production, with applications in integrated circuits, micro-electromechanical systems, and advanced packaging. With the rapid development of semiconductor component manufacturing processes, the requirements for component performance and integration are becoming increasingly stringent. Inductively coupled plasma (ICP) sources, with their high selectivity, high anisotropy, and high etch rates, are widely used in microelectronics processing.
[0003] In the prior art, the upper electrode coil of the etcher uses an inner and outer double-layer coil to provide radio frequency current. The double-layer coil structure is located above the ceramic window surface. An electrode coil connection structure is provided between the upper electrode coil and the matching device for connecting the coil and the upper electrode matching device.
[0004] As shown in Figures 1 and 2, the existing upper electrode coil connection structure uses coil connectors 10' to form four links to connect the matching device 1 to the upper electrode coil. Matching device 1 is connected to inner coil 4 via first link 2 and second link 3 to form a loop. Matching device 1 is connected to outer coil 7 via third link 5 and fourth link 6 to form a loop.
[0005] As shown in Figure 2, the four coil connectors 10' form four links. Each coil connector 10' includes a main flow arm 11' and four branch arms 12'. The main flow arm 11' is connected to the input or output of the matching device 1, and the four branch arms 12' are connected to corresponding coils to achieve RF current diversion. In other words, after the RF current flows out of the output of the matching device 1, it passes through the main flow arm 11' and then flows symmetrically through the four branch arms 12' to the corresponding coils.
[0006] However, due to the unreasonable arrangement of the coil connector in the prior art, the current flowing into the upper electrode coil is asymmetric, which ultimately causes asymmetric plasma etching. Therefore, how to distribute the current more evenly to each arm 12' is an urgent problem to be solved in this field.
[0007] Summary of the Invention
[0008] The present application aims to solve the problem in the prior art that when current is diverted to the electrode coil, more current flows on the branch arm closer to the main flow arm, resulting in uneven current flowing into the electrode coil.
[0009] In order to solve the above problems, according to the first aspect of the present application, a coil connector is disclosed for connecting a radio frequency source and an electrode coil, the coil connector comprising: a support arm, wherein there are multiple support arms, and the first end of each support arm is used to be electrically connected to the electrode coil; a current balancing portion, wherein the current balancing portion has a first end and a second end arranged opposite to each other, the first end of the current balancing portion is used to be electrically connected to the radio frequency source, and the second ends of the support arms are all connected to the second end of the current balancing portion; the current balancing portion further has an outer peripheral wall, and all the support arms are circumferentially spaced along the outer peripheral wall of the current balancing portion, and the current balancing portion is used to disperse the current output by the radio frequency source so that the current is evenly distributed to the support arms.
[0010] Furthermore, the flow balancing portion is cylindrical, and the axis of the flow balancing portion is perpendicular to all the support arms.
[0011] Furthermore, the second ends of all the support arms converge at the second end of the flow balancing portion.
[0012] Furthermore, the flow balancing portion has a through avoidance channel along its axial direction, and the extension lines of all the support arms intersect on the axis of the flow balancing portion.
[0013] Furthermore, the coil connector further includes a main flow arm, the main flow arm is connected to the first end of the current balancing portion, and the current balancing portion is electrically connected to the radio frequency source through the main flow arm.
[0014] Furthermore, the angles formed between all adjacent support arms are equal.
[0015] According to the second aspect of the present application, an electrode coil connection structure is also disclosed, including: the above-mentioned coil connector; a shielding shell, the shielding shell having a accommodating cavity, the shielding shell is electrically connected to the return end of the radio frequency source, and the coil connector is arranged in the accommodating cavity.
[0016] Furthermore, the electrode coil includes a first electrode coil, and the coil connector includes: a first coil connector, the first coil connector is arranged in the accommodating cavity, and the first coil connector is used to connect the first output end of the RF source with the receiving end of the first electrode coil; the electrode coil connection structure also includes: a first plug-in post, the first plug-in post is passed through the shielding shell and is insulated from the shielding shell, the first coil connector is electrically connected to the first plug-in post, and the first coil connector is electrically connected to the receiving end of the first electrode coil through the first plug-in post; a second plug-in post, the second plug-in post is electrically connected to the shielding shell, and the second plug-in post is used to electrically connect to the output end of the first electrode coil, and the RF source forms a current loop between the first coil connector, the first plug-in post, the second plug-in post and the shielding shell and the first electrode coil.
[0017] Furthermore, the first coil connector includes: a first arm, a first end of the first arm is electrically connected to the first plug-in column; a first current balancing part, the first current balancing part is cylindrical, the first end of the first current balancing part is used to be electrically connected to the first output end of the RF source, and the second end of the first arm is connected to the second end of the first current balancing part.
[0018] Furthermore, the shielding shell includes a cylinder, a first end of the cylinder is electrically connected to the return end of the RF source; a shielding plate, the shielding plate is connected to the second end of the cylinder, the cylinder and the shielding plate form the accommodating cavity, the shielding plate is electrically connected to the cylinder, the first plug-in column is passed through the shielding plate, and the second plug-in column is electrically connected to the shielding plate.
[0019] Furthermore, the electrode coil also includes a second electrode coil, the first electrode coil is located inside the second electrode coil, and the coil connector also includes: a second coil connector, the second coil connector is used to connect the second output end of the RF source with the receiving end of the second electrode coil; the electrode coil connection structure also includes: a third plug-in post, the third plug-in post is passed through the shielding shell and is insulated from the shielding shell, the second coil connector is electrically connected to the third plug-in post, and the second coil connector is electrically connected to the receiving end of the second electrode coil through the third plug-in post; the second plug-in post is also used to connect the return end of the RF source with the output end of the second electrode coil, so that a current loop is formed between the RF source and the second electrode coil through the second coil connector, the third plug-in post, the second plug-in post and the shielding shell.
[0020] Furthermore, the second coil connector includes: a second arm, the first end of the second arm is used to be electrically connected to the third plug-in column; a second current balancing part, the second current balancing part is cylindrical, the first end of the second current balancing part is used to be electrically connected to the second output end of the RF source, and the second end of the second arm is connected to the second end of the second current balancing part; the second current balancing part is sleeved on the outside of the first current balancing part, and a gap is formed between the second current balancing part and the first current balancing part.
[0021] Furthermore, the electrode coil connection structure also includes: a mounting seat, the mounting seat is passed through the shielding shell and connected to the shielding shell, the first plug-in column passes through the mounting seat and the shielding shell at the same time, the first plug-in column is connected to the mounting seat, and the first plug-in column and the shielding shell are insulated by the mounting seat.
[0022] Furthermore, the electrode coil includes a first electrode coil, and the coil connector includes: a first coil connector, the first coil connector is used to connect the first output end of the RF source and the receiving end of the first electrode coil; a third coil connector, the third coil connector is used to connect the return end of the RF source and the output end of the first electrode coil to form a current loop between the RF source and the first electrode coil.
[0023] Furthermore, the first coil connector includes: a first arm, the first end of the first arm is used to be electrically connected to the receiving end of the first electrode coil; a first current balancing part, the first current balancing part is cylindrical, the first end of the first current balancing part is used to be electrically connected to the first output end of the RF source, and the second end of the first arm is connected to the second end of the first current balancing part.
[0024] Furthermore, the third coil connecting member includes: a third arm, the first end of the third arm is used to be electrically connected to the output end of the first electrode coil; a third current balancing part, the third current balancing part is cylindrical, the first end of the third current balancing part is used to be electrically connected to the return end of the RF source, and the second end of the third arm is connected to the second end of the third current balancing part; the third current balancing part is arranged on the outside of the first current balancing part, and a gap is formed between the third current balancing part and the first current balancing part.
[0025] Furthermore, the electrode coil also includes a second electrode coil, the first electrode coil is located inside the second electrode coil, and the coil connector also includes: a second coil connector, the second coil connector is used to connect the second output end of the RF source and the receiving end of the second electrode coil, the first electrode coil is located inside the second electrode coil; the third coil connector is also used to connect the return end of the RF source and the output end of the second electrode coil to form a current loop between the RF source and the second electrode coil.
[0026] Furthermore, the second coil connecting member includes: a second arm, the first end of the second arm is used to be electrically connected to the receiving end of the second electrode coil; a second current balancing part, the second current balancing part is cylindrical, the first end of the second current balancing part is used to be electrically connected to the second output of the RF source, and the second end of the second arm is connected to the second end of the second current balancing part; the second current balancing part is arranged on the outside of the third current balancing part, and a gap is formed between the second current balancing part and the third current balancing part; the first end of the third arm is also used to be electrically connected to the output end of the second electrode coil.
[0027] According to a third aspect of the present application, a semiconductor process equipment is also disclosed, including: a shell, the shell being provided with a mounting cavity; the above-mentioned electrode coil connection structure, the electrode coil connection structure being arranged in the mounting cavity.
[0028] In the technical solutions of the coil connector, electrode coil connection structure and semiconductor process equipment provided in the present application, a current balancing part is provided. After the coil connector is assembled, the RF current output by the RF source enters the current balancing part and flows from the first end to the second end of the current balancing part. Due to the skin effect, the RF current will also diffuse along the outer wall of the current balancing part in the process of flowing to the second end. Moreover, since each branch arm is connected to the second end of the current balancing part and is circumferentially spaced on the outer wall of the current balancing part, the distance between the current balancing part and each branch arm is basically the same, so that the current can be evenly diverted to each branch arm, thereby improving the uniformity of the current distribution of the electrode coil. BRIEF DESCRIPTION OF THE DRAWINGS
[0029] FIG1 is a schematic structural diagram of an electrode coil connection structure in the prior art;
[0030] FIG2 is a schematic structural diagram of a coil connector in the prior art;
[0031] FIG3 is an assembly diagram of an electrode coil connection structure in the prior art;
[0032] FIG4 is a current distribution diagram of a coil connector in the prior art;
[0033] FIG5 is a schematic structural diagram of a coil connector according to the first embodiment of the present application;
[0034] FIG6 is a schematic structural diagram of a coil connector according to a second embodiment of the present application;
[0035] FIG7 is a top view of the coil connector according to the second embodiment of the present application;
[0036] FIG8 is a schematic structural diagram of the electrode coil connection structure of Example 3 of the present application;
[0037] FIG9 is a schematic structural diagram of an electrode coil connection structure according to a fourth embodiment of the present application;
[0038] FIG10 is an exploded view of the electrode coil connection structure of the fourth embodiment of the present application;
[0039] FIG11 is an assembly diagram of the cylinder and the shielding plate of the electrode coil connection structure according to the fourth embodiment of the present application;
[0040] FIG12 is an assembly diagram of the shielding plate, mounting base, and coil connector of the electrode-coil connection structure of Example 4 of the present application;
[0041] 13 is a cross-sectional view of the electrode coil connection structure of the fourth embodiment of the present application, and an assembly view of the shielding plate, the mounting base, the first plug-in post, the second plug-in post, and the third plug-in post;
[0042] FIG14 is an equivalent circuit diagram of the electrode coil connection structure of Example 4 of the present application;
[0043] FIG15 is a cross-sectional view of the electrode coil connection structure of the fourth embodiment of the present application;
[0044] FIG16 a shows the etching rate data of an etcher in the prior art;
[0045] FIG16 b is a graph showing etching rate data of a semiconductor process equipment using the electrode-coil connection structure according to the fourth embodiment of the present application;
[0046] FIG17 a shows the eccentricity data of the etching machine in the prior art;
[0047] FIG17b shows the eccentricity data of a semiconductor process equipment using the electrode-coil connection structure according to the fourth embodiment of the present application;
[0048] FIG18 is a schematic structural diagram of an electrode coil connection structure according to a fifth embodiment of the present application;
[0049] FIG19 is a schematic structural diagram of an electrode coil connection structure according to a sixth embodiment of the present application;
[0050] List of reference numerals: 10, coil connector; 11, arm; 12, current equalizing part; 121, avoidance channel; 13, mainstream arm; 10a, first coil connector; 11a, first arm; 12a, first current equalizing part; 10b, second coil connector; 11b, second arm; 12b, second current equalizing part; 121b, second avoidance channel; 13b, second mainstream arm; 10c, third coil connector; 11c, third arm; 12c, third current equalizing part; 121c, third avoidance channel; 20, matcher; 30, electrode coil; 31, first electrode coil; 32, second electrode coil; 40, shielding shell; 41, cylinder; 42, shielding plate; 50, first plug-in post; 60, second plug-in post; 70, third plug-in post; 80, mounting base. DETAILED DESCRIPTION
[0051] In order to enable those skilled in the art to better understand the technical solution of the present application, the coil connector, electrode coil connection structure and semiconductor process equipment provided by the present application are described in detail below with reference to the accompanying drawings.
[0052] As shown in Figure 1, the existing upper electrode coil connection structure uses coil connectors to form four links to connect the matching device 1 to the electrode coil. Matching device 1 is connected to the inner coil 4 via the first link 2 and the second link 3 to form a loop. Matching device 1 is connected to the outer coil 7 via the third link 5 and the fourth link 6 to form a loop.
[0053] Figure 2 shows four coil connectors 10' used to form four links, and each coil connector 10' forms a link. Each coil connector 10' includes a mainstream arm 11' and four branch arms 12'. The mainstream arm 11' is connected to the input end or the output end of the matcher 1, and the four branch arms 12' are respectively connected to the corresponding electrode coils to achieve uniform current diversion. After the radio frequency current flows out from the output end of the matcher 1, it passes through the mainstream arm 11' and then flows symmetrically into the corresponding electrode coils through the four branch arms 12'. However, due to the unreasonable setting of the coil connector 10' in the prior art, there is asymmetry in the current flowing into the coil, which ultimately causes asymmetry in plasma etching.
[0054] After research, it was found that the reason why the coil connector 10' is set irrationally in the prior art is that: as shown in Figure 3, during assembly, the coil connectors need to be stacked, and in order to avoid other coil connectors 10', the mainstream arm 11' will be set to one side. This results in the distance between the mainstream arm 11' and the four branch arms 12' being different. That is, as shown in Figure 4, after being set to one side, the mainstream arm 11' will be close to two of the four branch arms 12' and away from the other two. In this case, when the current flowing out of the output port of the matcher 1 is diverted to the branch arms 12' through the mainstream arm 11', the current on the two branch arms 12' close to the mainstream arm 11' is larger, and the current on the two branch arms 12' far from the mainstream arm 11' is smaller, resulting in asymmetry in the current flowing into the coil, which ultimately causes asymmetry in plasma etching.
[0055] In order to solve the above problems, as shown in FIG5 and FIG6 , the present application discloses a coil connector for connecting a radio frequency source and an electrode coil.
[0056] The coil connector 10 includes a plurality of arms 11, each with a first end electrically connected to the electrode coil 30, and a current equalizer 12. The current equalizer 12 has a first end and a second end oppositely disposed therebetween. The first end of the current equalizer 12 is electrically connected to the RF source, and the second end of the arm 11 is connected to the second end of the current equalizer 12.
[0057] The current balancing portion 12 also has an outer peripheral wall, which extends from the first end to the second end of the current balancing portion 12. All the arms 11 are circumferentially spaced along the outer peripheral wall of the current balancing portion 12. The current balancing portion 12 is used to disperse the current output by the RF source so that the current is evenly distributed to the arms 11.
[0058] As shown in Figures 5 and 6, after the coil connector 10 is assembled, the RF current output by the RF source enters the current balancing portion 12 and flows from the first end to the second end of the current balancing portion 12. Moreover, since each branch arm 11 is connected to the second end of the current balancing portion 12 and is circumferentially spaced on the outer wall of the current balancing portion 12, the distance between the current balancing portion 12 and each branch arm 11 is basically the same, so that the current can be evenly distributed to each branch arm 11, thereby improving the uniformity of the current portion of the electrode coil 30.
[0059] The coil connector of the present application will be described in detail below with reference to specific embodiments.
[0060] As shown in FIG5 , the first embodiment of the present application discloses a coil connector 10 comprising a support arm 11 and a current equalizing portion 12. The current equalizing portion 12 is cylindrical and has a first end and a second end disposed opposite each other. The first end of the cylindrical current equalizing portion 12 is electrically connected to a matcher 20, which is then connected to an RF source via the matcher 20, while the second end is connected to the support arm 11. There are four support arms 11, each with a first end electrically connected to an electrode coil 30 and a second end connected to the second end of the cylindrical current equalizing portion 12. The four support arms 11 are circumferentially spaced along the outer wall of the cylindrical current equalizing portion 12, and each arm 11 is perpendicular to the current equalizing portion 12. In other words, the second ends of the four support arms 11 converge at the second end of the current equalizing portion 12, forming an X-shaped structure. The axis of the current equalizing portion 12 is perpendicular to the plane of the X-shaped structure, thereby reducing the generation of displacement current components and improving the uniformity of current distribution. Furthermore, in order to ensure that the current enters the electrode coil more evenly, the arms are arranged symmetrically with each other.
[0061] As shown in FIG6 , the second embodiment of the present application further discloses a coil connector 10, which is basically the same as the first embodiment, except that, in this embodiment, although the flow equalizing portion 12 is also cylindrical, it is thicker than the flow equalizing portion 12 of the first embodiment, and the flow equalizing portion 12 has a through avoidance channel 121 along its axial direction. In other words, it can also be understood that in this embodiment, the flow equalizing portion 12 is cylindrical and has a through avoidance channel 121 inside. As shown in FIG7 , four arms 11 are arranged on the outer wall of the flow equalizing portion 12 at intervals along the circumference of the cylindrical flow equalizing portion 12. At the same time, the axis of the flow equalizing portion 12 is perpendicular to all the arms 11, and the extension lines of all the arms 11 intersect on the axis of the flow equalizing portion 12.
[0062] In addition, in this embodiment, the coil connector further includes a main flow arm 13 , as shown in FIG6 . The main flow arm 13 is connected to the first end of the current balancing portion 12 , and the current balancing portion 12 is electrically connected to the matcher 20 through the main flow arm 13 .
[0063] After assembly, the RF current flows along the main flow arm 13 into the current equalizing section 12, flowing from the first end of the cylindrical current equalizing section 12 to the second end. The axis of the current equalizing section 12 is perpendicular to all the arms 11, and the extension lines of all the arms 11 intersect on the axis of the current equalizing section 12, making the distance between the current equalizing section 12 and each arm 11 substantially uniform, thereby improving the uniformity of the current distribution. This allows the current to be evenly distributed to each arm 11, improving the uniformity of the current portion of the electrode coil 30. Furthermore, by providing the avoidance channel 121, other current equalizing sections 12 can be avoided during assembly, thereby preventing interference.
[0064] It should be noted that in order to minimize the generation of displacement current components, in this embodiment, the axial length of the current balancing portion 12 must be at least 3 times the radial cross-sectional diameter of the current balancing portion 12 to ensure that the current can have a sufficient axial distance to diffuse evenly on the outer wall surface of the current balancing portion 12.
[0065] In addition, in the above embodiment, the number of arms 11 is four and they are symmetrically distributed. However, this is not restrictive. The number of arms 11 can also be any number between 3 and 6, and is not necessarily symmetrical. For example, when the number of arms 11 is six, the angles between adjacent arms 11 are all 60°, and the arms 11 are symmetrical. However, when the number of arms 11 is three, the angles between adjacent arms 11 are all 120°, and the arms 11 are no longer symmetrical. For another example, the number of arms 11 can be five, and the angles between adjacent arms 11 are all 72°, which is also asymmetrical. In other words, to ensure more uniform current entering the electrode coil, the angles formed between all adjacent arms 11 are equal, which can also be understood as all arms 11 being equally spaced along the outer peripheral wall of the current equalizing portion 12. Therefore, as long as the angles formed between all adjacent arms 11 are equal, they are within the scope of protection of this application.
[0066] It should also be noted that in the above-mentioned second embodiment, the current balancing unit 12 is electrically connected to the matching device 20 via the main flow arm 13, but this is not restrictive. In some other embodiments not shown in the figures, the current balancing unit 12 can be directly electrically connected to the matching device 20. In other words, as long as the current balancing unit 12 is directly or indirectly connected to the matching device 20, it is within the scope of protection of this application.
[0067] According to the second aspect of the present application, as shown in Figure 8, an electrode coil connection structure is also disclosed, including the above-mentioned coil connector and a shielding shell 40, the shielding shell 40 has a accommodating cavity, the shielding shell 40 is electrically connected to the return end of the radio frequency source, and the coil connector is arranged in the accommodating cavity.
[0068] The electrode coil connection structure will be further described below with reference to specific embodiments.
[0069] As shown in FIG8 , the third embodiment of the present application discloses an electrode coil connection structure, which is mainly used in the case where the electrode coil 30 shown in FIG8 is a single first electrode coil 31 .
[0070] In this embodiment, the coil connector includes a first coil connector 10 a , and the electrode coil connection structure further includes a shielding shell 40 , a first plug-in post 50 , and a second plug-in post 60 .
[0071] The shielding shell 40 has a receiving cavity and is electrically connected to the return terminal of the matching unit 20. The first coil connector 10a is disposed in the receiving cavity and is used to connect the first output terminal of the matching unit 20 and the receiving terminal of the first electrode coil 31.
[0072] The first plug post 50 is provided on the shielding shell 40 and is insulated from the shielding shell 40. The first coil connector 10a is electrically connected to the first plug post 50, and the first coil connector 10a is electrically connected to the receiving end of the first electrode coil 31 through the first plug post 50.
[0073] The second plug-in post 60 is electrically connected to the shielding shell 40, and the second plug-in post 60 is used to electrically connect to the output end of the first electrode coil 31. The matcher 20 forms a current loop between the first coil connector 10a, the first plug-in post 50, the second plug-in post 60 and the shielding shell 40 and the first electrode coil 31.
[0074] The electrode coil connection structure provided in the embodiment of the present application electrically connects the second plug-in column 60 to the shielding shell 40, and then electrically connects the shielding shell 40 to the return end of the matcher 20, so that the first electrode coil 31 and the matcher 20 are connected through the shielding shell 40. On the basis of playing a shielding role, the shielding shell 40 can also form a part of the current loop, leading the current loop of the first electrode coil 31 back to the matcher 20, eliminating a layer of link, and structurally making the electrode coil connection structure more concise, which is a typical multi-purpose item.
[0075] In this embodiment, the structure of the first coil connector 10a is the same as that of the coil connector 10 in the first embodiment. That is, the first coil connector 10a includes a first arm 11a and a first current balancing portion 12a.
[0076] The first current balancing portion 12a is cylindrical and has a first end and a second end oppositely disposed. The first end of the first current balancing portion 12a is electrically connected to the first output terminal of the matching device 20. There are four first arms 11a. The first end of each first arm 11a is electrically connected to the first plug-in post 50, and the second end of each first arm 11a is connected to the second end of the first current balancing portion 12a.
[0077] Multiple first arms 11a are circumferentially spaced apart along the outer sidewall of first current balancing portion 12a, and each first arm 11a is perpendicular to current balancing portion 12. In other words, the second ends of the four first arms 11a converge at the second end of first current balancing portion 12a, forming an X-shaped structure. The axis of first current balancing portion 12a is perpendicular to the plane of the X-shaped structure, thereby reducing the generation of displacement current components and improving the uniformity of current distribution.
[0078] In this embodiment, the shielding shell 40 includes a cylindrical body 41 and a shielding plate 42. The first end of the cylindrical body 41 is electrically connected to the return terminal of the matching device 20; the shielding plate 42 is connected to the second end of the cylindrical body 41. The cylindrical body 41 is buckled onto the shielding plate 42, and the cylindrical body 41 and the shielding plate 42 form a receiving cavity. The shielding plate 42 is electrically connected to the cylindrical body 41. The first plug-in post 50 is inserted through the shielding plate 42 and is insulated from the shielding plate 42. The second plug-in post 60 is electrically connected to the shielding plate 42. By using the cylindrical body 41 to symmetrically guide the current loop of the first electrode coil 31 back to the matching device 20, a link layer is eliminated, making the electrode coil connection structure more simple from a structural perspective, and exemplifying a multi-purpose design.
[0079] It should be noted that in this embodiment, the cross-section of the cylinder 41 is circular, but this is not restrictive. In some other embodiments not shown in the figure, the cross-section of the cylinder can also be a rectangular, polygonal or other structure. As long as it can be matched with the second plug-in column 60 so that the current can flow back evenly, it is within the scope of protection of this application.
[0080] Embodiment 4 of the present application, as shown in Figures 9 to 14, further discloses an electrode coil connection structure, primarily for use with the electrode coil 30 shown in Figure 9. Specifically, the electrode coil 30 includes a first electrode coil 31 and a second electrode coil 32, with the first electrode coil 31 located within the second electrode coil 32, i.e., within the space enclosed by the second electrode coil 32. The first output terminal of the matcher 20 is electrically connected to the receiving terminal of the first electrode coil 31, and the second output terminal of the matcher 20 is electrically connected to the receiving terminal of the second electrode coil 32.
[0081] As shown in Figures 9 and 10, in this embodiment, the coil connector includes: a first coil connector 10a and a second coil connector 10b; the electrode coil connection structure includes: a shielding shell 40, a first plug-in post 50, a second plug-in post 60, a third plug-in post 70 and a mounting seat 80.
[0082] The shielding shell 40 has a receiving cavity and is electrically connected to the return terminal of the matching device 20. Specifically, as shown in Figure 10, the shielding shell 40 includes a cylindrical body 41 and a shielding plate 42. The first end (the upper end in Figure 10) of the cylindrical body 41 is electrically connected to the return terminal of the matching device 20; the shielding plate 42 is connected to the second end of the cylindrical body 41. In other words, as shown in Figure 11, the cylindrical body 41 is snapped onto the shielding plate 42, and the cylindrical body 41 and the shielding plate 42 enclose a receiving cavity. The shielding plate 42 is electrically connected to the cylindrical body 41.
[0083] As shown in Figures 12 and 13, the mounting seat 80 is passed through the shielding plate 42 and fixedly connected to the shielding plate 42. The second plug-in column 60 is located outside the accommodating cavity, and its first end is inserted into the mounting seat 80 and fixed by the mounting seat 80. At the same time, the first end of the second plug-in column 60 is electrically connected to the shielding plate 42; the second end of the second plug-in column 60 is divided into two connecting ends, one connecting end is used to electrically connect to the output end of the first electrode coil 31, and the other connecting end is used to electrically connect to the output end of the second electrode coil 32.
[0084] It can be seen that, as shown in Figure 14, Output1 represents the first output end of the matcher 20, Output2 represents the second output end of the matcher 20, the first output end of the matcher 20 is electrically connected to the receiving end of the first electrode coil 31, and the second output end of the matcher 20 is electrically connected to the receiving end of the second electrode coil 32. The shielding plate 42 is electrically connected to the output end of the first electrode coil 31 and the output end of the second electrode coil 32 at the same time through the second plug-in column 60. When the cylinder 41 is buckled on the shielding plate 42, the output end of the first electrode coil 31 is sequentially connected to the return end of the matcher 20 through the second plug-in column 60, the shielding plate 42, and the cylinder 41. The output end of the second electrode coil 32 is also sequentially connected to the return end of the matcher 20 through the second plug-in column 60, the shielding plate 42, and the cylinder 41, forming an equivalent circuit diagram as shown in Figure 14.
[0085] The electrode coil connection structure of the present application electrically connects the second plug-in post 60 to the shielding shell 40, thereby enabling electrical conduction between the first electrode coil 31 and the matching device 20, and between the second electrode coil 32 and the matching device 20, through the shielding shell 40. This allows the radio frequency currents of the first electrode coil 31 and the second electrode coil 32 to be symmetrically directed back to the matching device 20 via the shielding shell 40. It can be seen that the shielding shell 40 of the present application, in addition to providing a shielding function, can also serve as part of the current loop, eliminating a layer of link. This makes the electrode coil connection structure more concise in structure, representing a typical example of a multi-purpose device.
[0086] As shown in FIG. 15 , the first plug-in post 50 is used to connect the first coil connector 10 a and the receiving end of the first electrode coil 31 , and the second plug-in post 60 is used to connect the second coil connector 10 b and the receiving end of the second electrode coil 32 .
[0087] The first plug-in post 50 and the third plug-in post 70 pass through the mounting base 80 and the shielding shell 40 at the same time. The first plug-in post 50 and the third plug-in post 70 are fixedly connected to the mounting base 80 respectively. In this embodiment, the mounting base 80 is an insulating material (for example, rubber). Therefore, the first plug-in post 50 and the shielding plate 42 are insulated by the mounting base 80, and the third plug-in post 70 and the shielding plate 42 are also insulated by the mounting base 80. In other words, the mounting base 80 has the functions of fixing and insulating, and is a typical multi-purpose item.
[0088] As shown in Figure 15, the first coil connector 10a is disposed within the accommodating cavity and is used to connect the first output terminal of the matching unit 20 to the receiving terminal of the first electrode coil 31. The first coil connector 10a is electrically connected to the first plug-in post 50, and the first coil connector 10a is electrically connected to the receiving terminal of the first electrode coil 31 via the first plug-in post 50.
[0089] A current loop is formed between the matcher 20 and the first electrode coil 31 through the first coil connector 10 a , the first plug-in post 50 , the second plug-in post 60 and the shielding shell 40 .
[0090] In this embodiment, the structure of the first coil connector 10a is the same as that of the coil connector 10 in the first embodiment. That is, the first coil connector 10a includes a first arm 11a and a first current equalizing portion 12a. The first current equalizing portion 12a is cylindrical and has a first end and a second end oppositely disposed. The first end of the first current equalizing portion 12a is electrically connected to the first output terminal of the matching device 20. There are four first arms 11a, as shown in Figure 15. The first end of each first arm 11a is electrically connected to the first plug-in post 50, and the second end of each first arm 11a is connected to the second end of the first current equalizing portion 12a.
[0091] Multiple first arms 11a are circumferentially spaced apart along the outer wall of first current balancing portion 12a, and each first arm 11a is perpendicular to first current balancing portion 12a. In other words, the second ends of the four first arms 11a converge at the second end of first current balancing portion 12a, forming an X-shaped structure. The axis of first current balancing portion 12a is perpendicular to the plane of the X-shaped structure, thereby reducing the generation of displacement current components and improving the uniformity of current distribution.
[0092] As shown in Figure 15, in this embodiment, the second coil connector 10b is disposed within the accommodating cavity and is used to connect the second output terminal of the matching unit 20 to the receiving terminal of the second electrode coil 32. It should be noted that the second coil connector 10b is electrically connected to the third plug-in post 70, and the second coil connector 10b is electrically connected to the receiving terminal of the second electrode coil 32 via the third plug-in post 70.
[0093] A current loop is formed between the matching unit 20 and the second electrode coil 32 via the second coil connector 10 b , the third plug-in post 70 , the second plug-in post 60 and the shielding shell 40 .
[0094] In this embodiment, the structure of the second coil connector 10b is the same as that of the coil connector 10 in the second embodiment, that is, the second coil connector 10b includes: a second branch arm 11b, a second current balancing portion 12b and a second main flow arm 13b.
[0095] As shown in Figure 15, the second current balancing part 12b is cylindrical, and the cylindrical second current balancing part 12b has a first end and a second end arranged opposite to each other. The first end of the second current balancing part 12b is connected to the second mainstream arm 13b, and is electrically connected to the second output end of the matcher 20 through the second mainstream arm 13b. There are four second branch arms 11b, and the first end of the second branch arm 11b is electrically connected to the third plug-in column 70, and the second end of the second branch arm 11b is connected to the second end of the second current balancing part 12b.
[0096] Multiple second branch arms 11b are arranged at circumferential intervals along the outer wall of the second flow balancing portion 12b, and each second branch arm 11b is perpendicular to the axis of the second flow balancing portion 12b. In other words, the four second branch arms 11b are arranged at circumferential intervals along the outer wall of the second flow balancing portion 12b on the cylindrical outer wall. At the same time, the axis of the second flow balancing portion 12b is perpendicular to all the second branch arms 11b, and the extension lines of all the second branch arms 11b converge on the axis of the second flow balancing portion 12b, thereby improving the uniformity of the diversion.
[0097] As shown in Figure 15, the second flow balancing part 12b is arranged on the outside of the first flow balancing part 12a, and a gap is formed between the second flow balancing part 12b and the first flow balancing part 12a. In other words, the second flow balancing part 12b has a second avoidance channel 121b running from the first end to the second end, and the first flow balancing part 12a is arranged to run through the second avoidance channel 121b.
[0098] The electrode-coil connection structure provided in the embodiment of the present application utilizes a second current equalizing portion 12b. After assembly, the second current equalizing portion 12b not only connects the matching element 20 to the first electrode coil 31 but also avoids the first current equalizing portion 12a via a second avoidance channel 121b, thereby preventing interference with the first current equalizing portion 12a. This also ensures that the distance between the first current equalizing portion 12a and each first arm 11a is equal, thereby ensuring current uniformity between the first electrode coil 31 and the second electrode coil 32. This effectively addresses the eccentricity of the etching rate caused by the electrode-coil connection structure.
[0099] As shown in Figures 16a and 16b, Figure 16a is an etching rate data diagram of an etcher in the prior art, and Figure 16b is an etching rate data diagram of a semiconductor process equipment (e.g., an etcher) using the electrode coil structure provided in an embodiment of the present application.
[0100] Figures 16a and 16b share the same sampling method: multiple sampling points are distributed across the wafer. Except for the central sampling point, the other sampling points are divided into three groups and arranged in a circular pattern from the inside out. Within each group of sampling points, the distance from the wafer center is the same. In other words, each group of sampling points can be used to determine whether the etching rate is consistent along the circumference of the wafer, given the same distance from the wafer center. Ideally, a more uniform etching rate along the circumference is easier to control and results in better etching results.
[0101] Taking the sampling point in the annular area A as an example, the area A is located within the etching range of the first electrode coil 31. As shown in FIG16a , since the electrode coil structure used in the prior art has the problem of uneven current distribution, the current distribution in the first electrode coil 31 is also uneven, which in turn leads to different etching rates at different circumferential positions of the area A. It can be clearly seen from FIG16a that the etching rate of the upper left part of the area A is significantly greater than the etching rate of the lower right part.
[0102] As shown in Figure 16b , due to the electrode coil structure provided in an embodiment of the present application, the first coil connector 10a evenly distributes the current to the first electrode coil 31, thereby making the etching rate distribution more uniform. This in turn makes the etching rate in region A in Figure 16b substantially the same at different circumferential locations. Figure 16b clearly shows that the etching rate in the upper left portion of region A is substantially the same as that in the lower right portion, significantly improving the uniformity of the etching rate.
[0103] In order to more clearly demonstrate the improvement effect of the present application on the etching rate, the present application also provides eccentricity data diagrams as shown in Figures 17a and 17b. Figure 17a is an eccentricity data diagram of the etcher in the prior art, and Figure 17b is an eccentricity data diagram of a semiconductor process equipment (for example, an etcher) using the electrode coil structure provided in an embodiment of the present application.
[0104] Similar to the sampling method in Figures 16a and 16b, Figures 17a and 17b also have multiple sampling points distributed across the wafer. Except for the central sampling point, the other sampling points are divided into three groups and arranged in a circular pattern from the inside out. Within each group, the sampling points are at the same distance from the wafer center. Furthermore, based on Figures 16a and 16b, the data from all sampling points are summed to calculate the average etch rate. The average etch rate is then subtracted from the etch rate at each sampling point to obtain the data in Figures 17a and 17b. In other words, Figures 17a and 17b show the difference between the etch rate at each sampling point and the average etch rate. Ideally, the smaller the difference, the better.
[0105] As shown in Figure 17a, due to the problem of uneven current distribution in the electrode coil structure used in the prior art, the current distribution in the first electrode coil 31 is also uneven, which in turn leads to different etching rates at different circumferential positions in region A. Moreover, the difference between each sampling point and the average etching rate is large, ranging from -4 to 4.
[0106] As shown in Figure 17b, due to the adoption of the electrode coil structure of the present application, the current can be evenly distributed to the first electrode coil 31 through the first coil connector 10a, thereby making the etching rate distribution more uniform, and thus making the etching rate of area A in Figure 17b basically the same at different circumferential positions, and the difference between each sampling point and the average etching rate is small, between -1 and 1.
[0107] From the comparison between Figure 16a and Figure 16b and the comparison between Figure 17a and Figure 17b, it can be seen that the electrode coil connection structure provided in the embodiment of the present application can not only make the etching rate more uniform, but also greatly reduce the eccentricity difference, thereby greatly improving the etching effect and improving the yield rate.
[0108] As shown in FIG18 , the fifth embodiment of the present application further discloses an electrode coil connection structure, which is mainly used in the case where the electrode coil 30 shown in FIG18 is a single first electrode coil 31 .
[0109] In this embodiment, the shielding case 40 has a housing cavity, which is electrically connected to the return terminal of the RF source. The coil connector 10 is disposed within the housing cavity. The coil connector 10 includes a first coil connector 10a and a third coil connector 10c. The first coil connector 10a is used to connect the first output terminal of the matching unit 20 to the receiving terminal of the first electrode coil 31. The third coil connector 10c is used to connect the return terminal of the matching unit 20 to the output terminal of the first electrode coil 31, thereby forming a current loop between the matching unit 20 and the first electrode coil 31.
[0110] In this embodiment, the structure of the first coil connector 10a is the same as that of the coil connector 10 in the first embodiment. That is, the first coil connector 10a includes a first arm 11a and a first current balancing portion 12a.
[0111] The first current balancing portion 12a is cylindrical and has a first end and a second end oppositely disposed. The first end of the first current balancing portion 12a is electrically connected to the first output terminal of the matching device 20. There are four first arms 11a. The first end of each first arm 11a is electrically connected to the first plug-in post 50, and the second end of each first arm 11a is connected to the second end of the first current balancing portion 12a.
[0112] Multiple first arms 11a are circumferentially spaced apart along the outer sidewall of first current balancing portion 12a, and each first arm 11a is perpendicular to current balancing portion 12. In other words, the second ends of the four first arms 11a converge at the second end of first current balancing portion 12a, forming an X-shaped structure. The axis of first current balancing portion 12a is perpendicular to the plane of the X-shaped structure, thereby reducing the generation of displacement current components and improving the uniformity of current distribution.
[0113] In this embodiment, the structure of the third coil connector 10c is the same as that of the coil connector 10 in the second embodiment. That is, the third coil connector 10c includes a third arm 11c and a third current balancing portion 12c.
[0114] The third current balancing part 12c is cylindrical and has a first end and a second end that are relatively arranged. The first end of the third current balancing part 12c is used to be electrically connected to the return end of the matcher 20. There are four third arms 11c. The first end of the third arm 11c is used to be electrically connected to the output end of the first electrode coil 31. The second end of the third arm 11c is connected to the second end of the third current balancing part 12c.
[0115] It can be seen that the first output end of the matcher 20 is electrically connected to the receiving end of the first electrode coil 31 through the first coil connector 10a, and the output end of the first electrode coil 31 is electrically connected to the return end of the matcher 20 through the third coil connector 10c, thereby forming a current loop between the matcher 20 and the first electrode coil 31.
[0116] The third arms 11c are spaced apart along the outer side wall of the third current balancing portion 12c, and each third arm 11c is perpendicular to the axis of the third current balancing portion 12c. In other words, the four arms 11 are spaced apart circumferentially along the third current balancing portion 12c on the cylindrical outer wall. At the same time, the axis of the third current balancing portion 12c is perpendicular to all the third arms 11c, and the extension lines of all the third arms 11c converge on the axis of the third current balancing portion 12c, thereby reducing the generation of displacement current components and improving the uniformity of the diversion.
[0117] To prevent interference between the first and third current equalizing sections 12a, 12c, the third current equalizing section 12c is sleeved outside the first current equalizing section 12a, with a gap formed between the third current equalizing section 12c and the first current equalizing section 12a. In other words, the third current equalizing section 12c has a third avoidance channel 121c extending from the first end to the second end, and the first current equalizing section 12a is disposed through the third avoidance channel 121c. The electrode coil connection structure provided in the embodiment of the present application utilizes the third current equalizing section 12c. After assembly, the third current equalizing section 12c not only connects the matching element 20 to the first electrode coil 31, but also avoids the first current equalizing section 12a via the third avoidance channel 121c, thereby avoiding interference with the first current equalizing section 12a. This also ensures that the distance between the first current equalizing section 12a and each first arm 11a is equal, thereby ensuring current uniformity between the first and third electrode coils 31, 30.
[0118] As shown in Figure 19, embodiment six of the present application also discloses an electrode coil connection structure, which is mainly used for the case of the electrode coil 30 shown in Figure 19, that is, the electrode coil 30 includes a first electrode coil 31 and a second electrode coil 32, and the first electrode coil 31 is located inside the second electrode coil 32.
[0119] In this embodiment, the electrode coil connection structure is basically the same as that of the fifth embodiment, except that the coil connector further includes: a second coil connector 10b, which is used to connect the second output end of the matcher 20 and the receiving end of the second electrode coil 32, and the first electrode coil 31 is located inside the second electrode coil 32.
[0120] The third coil connector 10c is also used to connect the return end of the matcher 20 and the output end of the second electrode coil 32. That is, the first end of the third arm 11c of the third coil connector 10c is also used to electrically connect to the output end of the second electrode coil 32, so as to form a current loop between the matcher 20 and the second electrode coil 32.
[0121] In this embodiment, the structure of the second coil connector 10b is the same as that of the coil connector 10 in the second embodiment. That is, the second coil connector 10b includes a second arm 11b and a second current balancing portion 12b.
[0122] The second current balancing part 12b is cylindrical and has a first end and a second end that are relatively arranged. The first end of the second current balancing part 12b is used to be electrically connected to the second output end of the matcher 20. There are four second arms 11b. The first end of the second arm 11b is used to be electrically connected to the receiving end of the second electrode coil 32. The second end of the second arm 11b is connected to the second end of the second current balancing part 12b.
[0123] Multiple second arms 11b are circumferentially spaced apart along the outer side wall of the second current balancing portion 12b, and each second arm 11b is perpendicular to the axis of the second current balancing portion 12b. In other words, the four second arms 11b are circumferentially spaced apart along the second current balancing portion 12b on the cylindrical outer wall. At the same time, the axis of the second current balancing portion 12b is perpendicular to all the second arms 11b, and the extension lines of all the second arms 11b converge on the axis of the second current balancing portion 12b, thereby reducing the generation of displacement current components and improving the uniformity of the diversion.
[0124] It can be seen that the second output end of the matcher 20 is electrically connected to the receiving end of the second electrode coil 32 through the second coil connector 10b, and the output end of the second electrode coil 32 is electrically connected to the return end of the matcher 20 through the third coil connector 10c, thereby forming a current loop between the matcher 20 and the first electrode coil 31.
[0125] In order to avoid interference between the second current balancing part 12b and the third current balancing part 12c, the second current balancing part 12b is arranged on the outside of the third current balancing part 12c, and a gap is formed between the second current balancing part 12b and the third current balancing part 12c. In other words, the second current balancing part 12b has a second avoidance channel 121b running from the first end to the second end, and the third current balancing part 12c is arranged to run through the second avoidance channel 121b.
[0126] The electrode coil connection structure of the present application is provided with a second current balancing part 12b. After assembly, the second current balancing part 12b can not only play the role of connecting the matching device 20 and the first electrode coil 31, but also avoid the third current balancing part 12c through the second avoidance channel 121b, thereby avoiding interference with the third current balancing part 12c, making the distance between the third current balancing part 12c and each first arm 11a equal, thereby ensuring uniform return of current.
[0127] The electrode coil connection structure of the present application is provided with a second coil connection member 10b and a third coil connection member 10c, and the third current equalizing part 12c is provided inside the second current equalizing part 12b, thereby avoiding mutual interference between the second coil connection member 10b and the third coil connection member 10c. The output end of the first electrode coil 31 and the return end of the matcher 20, as well as the output end of the second electrode coil 32 and the return end of the matcher 20 can be conducted through the third coil connection member 10c, and the radio frequency current of the first electrode coil 31 and the second electrode coil 32 is symmetrically led back to the matcher 20 through the third coil connection member 10c. It can be seen that through the above structure, the present application merges the original two return links into one return link, eliminating a layer of link, making the electrode coil connection structure more concise in structure, and is a typical example of a multi-purpose object.
[0128] It should be noted that in the above-mentioned embodiments 1 to 6, the RF source includes a matching box 20 and an RF power supply (not shown in the figures), and the return end of the matching box 20 is the housing of the matching box 20. However, this is not restrictive. In some other embodiments not shown in the figures, the RF source may further include a power splitter, the matching box is connected to the power splitter, and the RF current of the matching box is distributed to the two electrode coils in the electrode coil 30 through the power splitter. In other words, any device that can output RF energy is within the scope of protection of the application.
[0129] According to another aspect of the present application, a semiconductor process equipment is also disclosed, including: a shell and the above-mentioned electrode-coil connection structure, the shell is provided with a mounting cavity; the electrode-coil connection structure is arranged in the mounting cavity.
[0130] It can be understood that, in the above embodiment, the semiconductor process equipment is an etcher.
[0131] The semiconductor process equipment provided in the embodiment of the present application, by adopting the above-mentioned electrode coil connection structure, can not only make the etching rate more uniform, but also greatly reduce the eccentricity difference, thereby greatly improving the etching effect and improving the yield rate.
[0132] It is understood that the above embodiments are merely exemplary embodiments for illustrating the principles of the present application, and the present application is not limited thereto. Those skilled in the art may make various modifications and improvements without departing from the spirit and substance of the present application, and such modifications and improvements are also considered to be within the scope of protection of the present application.
Claims
1. A coil connector for connecting a radio frequency source and an electrode coil, characterized in that: The coil connecting member comprises: A support arm, wherein there are a plurality of support arms, and a first end of each support arm is used for being electrically connected to the electrode coil; A current balancing part, the current balancing part having a first end and a second end arranged opposite to each other, the first end of the current balancing part being used to be electrically connected to the RF source, and the second ends of the support arms are both connected to the second end of the current balancing part; The current balancing part also has an outer peripheral wall, and all the branches are circumferentially spaced along the outer peripheral wall of the current balancing part. The current balancing part is used to disperse the current output by the radio frequency source so that the current is evenly distributed to the branches.
2. The coil connecting member according to claim 1, characterized in that: The flow balancing portion is cylindrical, and the axis of the flow balancing portion is perpendicular to all the support arms.
3. The coil connecting member according to claim 2, characterized in that: The second ends of all the support arms meet at the second end of the flow balancing portion.
4. The coil connecting member according to claim 2, characterized in that: The flow balancing part has a through avoidance channel along its axial direction, and the extension lines of all the support arms intersect on the axis of the flow balancing part.
5. The coil connecting member according to claim 1, characterized in that: The coil connector also includes: A main flow arm is connected to a first end of the current balancing portion, and the current balancing portion is electrically connected to the radio frequency source through the main flow arm.
6. The coil connecting member according to claim 1, characterized in that: The included angles formed between all adjacent supporting arms are equal.
7. An electrode coil connection structure, characterized in that: include: The coil connecting member according to any one of claims 1 to 6; The shielding shell has a containing cavity, the shielding shell is electrically connected to the return end of the radio frequency source, and the coil connecting piece is arranged in the containing cavity.
8. The electrode coil connection structure according to claim 7, characterized in that: The electrode coil comprises a first electrode coil, and the coil connector comprises: a first coil connector, which is disposed in the accommodating cavity and is used to connect a first output end of the radio frequency source and a receiving end of the first electrode coil; The electrode coil connection structure also includes: a first plug-in post, the first plug-in post is inserted into the shielding shell and is insulated from the shielding shell, the first coil connector is electrically connected to the first plug-in post, and the first coil connector is electrically connected to the receiving end of the first electrode coil through the first plug-in post; A second plug-in post, the second plug-in post is electrically connected to the shielding shell, and the second plug-in post is used to electrically connect to the output end of the first electrode coil. The RF source forms a current loop between the first electrode coil through the first coil connector, the first plug-in post, the second plug-in post and the shielding shell.
9. The electrode coil connection structure according to claim 8, characterized in that: The first coil connecting member comprises: A first support arm, wherein a first end of the first support arm is electrically connected to the first plug post; The first flow balancing part is cylindrical, and the first end of the first flow balancing part is used for The first arm is electrically connected to the first output end of the radio frequency source, and the second end of the first arm is connected to the second end of the first current equalizing part.
10. The electrode coil connection structure according to claim 8, characterized in that: The shielding shell comprises: A cylinder, a first end of which is electrically connected to a return end of the radio frequency source; A shielding plate, wherein the shielding plate is connected to the second end of the cylinder, the cylinder and the shielding plate form the accommodating cavity, the shielding plate is electrically connected to the cylinder, the first plug-in column is passed through the shielding plate, and the second plug-in column is electrically connected to the shielding plate.
11. The electrode coil connection structure according to claim 9, characterized in that: The electrode coil further includes a second electrode coil, the first electrode coil is located inside the second electrode coil, and the coil connector further includes: a second coil connector, the second coil connector being used to connect a second output end of the radio frequency source and a receiving end of the second electrode coil; The electrode coil connection structure also includes: a third plug-in post, the third plug-in post being inserted through the shielding shell and being insulated from the shielding shell, the second coil connector being electrically connected to the third plug-in post, and the second coil connector being electrically connected to the receiving end of the second electrode coil through the third plug-in post; The second plug-in post is also used to connect the return end of the RF source and the output end of the second electrode coil, so that a current loop is formed between the RF source and the second electrode coil through the second coil connector, the third plug-in post, the second plug-in post and the shielding shell.
12. The electrode coil connection structure according to claim 11, characterized in that: The second coil connecting member comprises: A second support arm, wherein a first end of the second support arm is used for being electrically connected to the third plug-in post; The second flow balancing part is cylindrical, and the first end of the second flow balancing part is used to The second output end of the radio frequency source is electrically connected, and the second end of the second arm is connected to the second end of the second current equalizing part; The second current balancing portion is sleeved on the outside of the first current balancing portion, and a gap is formed between the second current balancing portion and the first current balancing portion.
13. The electrode coil connection structure according to claim 8, characterized in that: The electrode coil connection structure also includes: The mounting seat is passed through the shielding shell and connected to the shielding shell, the first plug-in column passes through the mounting seat and the shielding shell at the same time, the first plug-in column is connected to the mounting seat, and the first plug-in column and the shielding shell are insulated by the mounting seat.
14. The electrode coil connection structure according to claim 7, characterized in that: The electrode coil comprises a first electrode coil, and the coil connector comprises: a first coil connector, the first coil connector being used to connect a first output end of the radio frequency source and a receiving end of the first electrode coil; A third coil connector is used to connect the return end of the radio frequency source and the output end of the first electrode coil to form a current loop between the radio frequency source and the first electrode coil.
15. The electrode coil connection structure according to claim 14, characterized in that: The first coil connecting member comprises: a first arm, wherein a first end of the first arm is used to be electrically connected to a receiving end of the first electrode coil; The first current balancing part is cylindrical, the first end of the first current balancing part is used to be electrically connected to the first output end of the radio frequency source, and the second end of the first arm is connected to the second end of the first current balancing part.
16. The electrode coil connection structure according to claim 15, characterized in that: The third coil connecting member comprises: a third arm, wherein a first end of the third arm is used to be electrically connected to an output end of the first electrode coil; A third current balancing part, wherein the third current balancing part is cylindrical, a first end of the third current balancing part is used to be electrically connected to a return end of the radio frequency source, and a second end of the third branch arm is connected to a second end of the third current balancing part; The third current balancing portion is sleeved on the outside of the first current balancing portion, and a gap is formed between the third current balancing portion and the first current balancing portion.
17. The electrode coil connection structure according to claim 16, characterized in that: The electrode coil further includes a second electrode coil, the first electrode coil is located inside the second electrode coil, and the coil connector further includes: a second coil connector, the second coil connector being used to connect a second output end of the radio frequency source with a receiving end of the second electrode coil, the first electrode coil being located inside the second electrode coil; The third coil connector is further used to connect the return end of the radio frequency source and the output end of the second electrode coil, so as to form a current loop between the radio frequency source and the second electrode coil.
18. The electrode coil connection structure according to claim 17, characterized in that: The second coil connecting member comprises: a second arm, wherein a first end of the second arm is used to be electrically connected to a receiving end of the second electrode coil; A second current balancing part, the second current balancing part is cylindrical, a first end of the second current balancing part is used to be electrically connected to the second output of the RF source, and a second end of the second branch arm is connected to a second end of the second current balancing part; The second current balancing part is sleeved outside the third current balancing part, and a gap is formed between the second current balancing part and the third current balancing part; The first end of the third arm is also used to be electrically connected to the output end of the second electrode coil.
19. A semiconductor process equipment, characterized in that: include: A housing, wherein the housing is provided with a mounting cavity; The electrode coil connection structure according to any one of claims 7 to 18, wherein the electrode coil connection structure is arranged in the installation cavity.
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