Shaping system and shaping method

Abstract

A shaping system (SYS1) comprises a shaping device (20) that can shape an object to be shaped on a workpiece (W) and that includes: a first irradiation unit (21) that has a first irradiation optical system (22) having an optical axis along the vertical direction and that is capable of irradiating the workpiece (W) with processing light (EL) from above the workpiece W; and material nozzles (24) for supplying a shaping material (M) to the position at which the processing light (EL) is projected. The shaping system (SYS1) also comprises a second irradiation unit (150L, 150R) that can heat the object to be shaped and that can irradiate the object to be shaped with heating light. The second irradiation unit (150L, 150R) can project the heating light below the position at which the processing light (EL) is projected.

Description

Modeling system and modeling method

[0001] The present invention relates to a modeling system and a modeling method.

[0002] Conventionally, there have been known modeling systems capable of forming a modeled object, as described in, for example, Patent Document 1. Such modeling systems are required to appropriately form a modeled object.

[0003] US Patent Application Publication No. 2017 / 0001374

[0004] A first aspect of the present invention is a modeling system comprising: a first irradiation unit that includes an irradiation optical system having an optical axis along a first direction and is capable of irradiating a first energy beam toward an object from above the object; and a supply unit that supplies modeling material to the irradiation position of the first energy beam, and is capable of modeling a model on the object; and a second irradiation unit that is capable of heating the model and is capable of irradiating the model with a second energy beam in a second direction that intersects the first direction, and the second irradiation unit is capable of irradiating the second energy beam below the irradiation position of the first energy beam.

[0005] A second aspect of the present invention is a manufacturing method that includes irradiating a first energy beam from above an object toward the object in a first direction, and supplying a manufacturing material to a position irradiated with the first energy beam to manufacture a manufactured object on the object, and heating the manufactured object by irradiating a second energy beam in a second direction intersecting the first direction and below the position irradiated with the first energy beam.

[0006] A third aspect of the present invention is a modeling system comprising: a modeling device having a first irradiation unit capable of irradiating a first energy beam toward the object from above the object and a supply unit that supplies modeling material to an irradiation position of the first energy beam, and capable of modeling a model on the object; a second irradiation unit capable of heating the model and irradiating the model with a second energy beam; and a control device, wherein the modeling device is capable of modeling the model on the object by stacking multiple layers of the model, and the control device controls the second irradiation unit to prevent the area of ​​the model from changing when modeling at least one layer of the multiple layers.

[0007] A fourth aspect of the present invention is a modeling method including: irradiating a first energy beam toward an object from above the object; stacking a plurality of layers of modeled objects on the object by supplying a modeling material to a position irradiated by the first energy beam; heating the modeled object by irradiating a second energy beam toward the modeled object; and controlling the heating area of ​​the modeled object so that it does not change when modeling at least one of the plurality of layers.

[0008] 1 is a perspective view showing an appearance of the modeling system according to the first embodiment. FIG. 2 is a side sectional view showing the configuration of the modeling system according to the first embodiment. FIG. 3 is a block diagram showing the configuration of the modeling system according to the first embodiment. FIG. 4 is a schematic view showing an example of a modeled object. FIG. 5 is a sectional view showing a process of modeling a model. FIG. 6 is a plan view showing an example of a movement trajectory of a target irradiation area within a processing unit area. FIG. 7 is a plan view showing another example of the movement trajectory of the target irradiation area within a processing unit area. FIG. 8 is a side view showing the structure of a heating support unit. FIG. 9 is a perspective view showing the structure of a heating support unit. FIG. 10 is a plan sectional view of the modeling system according to the first embodiment. FIG. 11 is a side view showing the configuration of a second irradiation unit according to the first embodiment. FIG. 12 is a sectional view showing the configuration of a second irradiation optical system. FIG. 13 is a schematic view showing a case where a reflecting mirror according to the second embodiment moves away from a modeled object. FIG. 14 is a schematic view showing a case where a reflecting mirror according to the second embodiment approaches a modeled object. FIG. 15 is a side sectional view of a reflecting mirror according to a first modified example of the second embodiment. FIG. 16 is a schematic view showing the configuration of a second irradiation unit according to the second modified example. FIG. 10 is a schematic diagram showing a state in which a reflecting mirror according to a second modified example is deformed. FIG. 11 is a schematic diagram showing a configuration of a second irradiation unit according to a third modified example. FIG. 12 is a block diagram showing a configuration of a modeling system according to a third embodiment. FIG. 13 is a perspective view showing a configuration of a second irradiation unit according to a third embodiment. FIG. 14 is a schematic diagram showing a state in which a reflecting mirror according to a third embodiment has rotated. FIG. 15 is a side cross-sectional view showing a configuration of a modeling system according to a fourth embodiment. FIG. 16 is a perspective view showing a configuration of a second irradiation unit according to a fourth embodiment.

[0009] Hereinafter, embodiments of the present invention will be described. A manufacturing system according to each embodiment performs additive processing based on laser metal deposition (LMD). Additive processing based on laser metal deposition is additive processing that melts a manufacturing material supplied to a workpiece with processing light (i.e., an energy beam in the form of light) to form a shaped object that is integrated with the workpiece or that can be separated from the workpiece. In each embodiment, the directions indicated by the arrows in FIG. 1 may be referred to as the X-axis direction, the Y-axis direction, and the Z-axis direction, respectively. Furthermore, the rotational directions around the X-axis, the Y-axis, and the Z-axis may be referred to as the θX direction, the θY direction, and the θZ direction, respectively. For ease of explanation, the X-axis direction may be referred to as the left-right direction, the Y-axis direction may be referred to as the front-rear direction, and the Z-axis direction may be referred to as the up-down direction.

[0010] First Embodiment First, the configuration of a modeling system SYS1 according to the first embodiment will be described with reference to FIGS. 1 to 11 . The modeling system SYS1 according to the first embodiment is capable of performing additive processing on a workpiece W. By performing additive processing on the workpiece W, the modeling system SYS1 can form a model that is integrated with the workpiece W or a model that can be separated from the workpiece W. For example, the modeling system SYS1 can form a three-dimensional structure as an example of a model ST (see FIG. 4 ). A three-dimensional structure is a three-dimensional structure that has a size in all three directions, in other words, a structure that has a size in the X-axis direction, Y-axis direction, and Z-axis direction, and is also referred to as a solid object. Specifically, the modeling system SYS1 may be a plate-like three-dimensional structure used, for example, for a jet engine blade, as shown in FIGS. 4 and 5 .

[0011] When the workpiece W is a table 31 (described later), the modeling system SYS1 can perform additional processing on the table 31. When an object is placed on the table 31, the modeling system SYS1 can perform additional processing on the object. The object placed on the table 31 may be another object (i.e., an existing object) modeled by the modeling system SYS1. In this way, the workpiece W, which is the object to be processed, may be the table 31 or an object placed on the table 31. Furthermore, the workpiece W, which is the object to be processed, may be a heating support unit 131 on the table 31 or an object placed on the heating support unit 131. Note that FIGS. 1 and 2 show an example in which the workpiece W is an existing object placed on the heating support unit 131 on the table 31. Hereinafter, the description will be given using an example in which the workpiece W is an existing object placed on the heating support unit 131 on the table 31.

[0012] The workpiece W may be a product that has a missing portion and needs to be repaired. In this case, the modeling system SYS1 may perform repair processing to repair the product that needs to be repaired by performing additional processing to form a shaped object to fill the missing portion. In other words, the additional processing performed by the modeling system SYS1 may include additional processing to add a shaped object to the workpiece W to fill the missing portion.

[0013] As described above, the modeling system SYS1 is capable of performing additive processing based on the laser build-up welding method. In other words, the modeling system SYS1 can also be said to be a 3D printer that processes objects using additive manufacturing technology. The additive manufacturing technology may also be referred to as rapid prototyping, rapid manufacturing, or additive manufacturing. The laser build-up welding method (LMD) may also be referred to as directed energy deposition (DED).

[0014] As shown in Fig. 5, the modeling system SYS1 using the additive manufacturing technology may sequentially form multiple structural layers SL to form a model ST (three-dimensional structure) in which multiple structural layers SL are stacked. In this case, the modeling system SYS1 first sets the surface of the workpiece W as a modeling surface MS on which the model is actually formed, and models the first structural layer SL on the modeling surface MS. Thereafter, the modeling system SYS1 sets the surface of the first structural layer SL as a new modeling surface MS, and models the second structural layer SL on the new modeling surface MS. Thereafter, the modeling system SYS1 repeats the same operation to form the model ST in which multiple structural layers SL are stacked.

[0015] The modeling system SYS1 performs additive processing by processing the modeling material M using processing light EL (which may also be referred to as modeling light), which is a first energy beam. The modeling material M is a material that can be melted by irradiation with processing light EL of a predetermined intensity or higher. For example, a metal material or a resin material may be used as the modeling material M. Examples of metal materials that may be used include titanium aluminide (TiAl), metal materials containing titanium (Ti), metal materials containing aluminum (Al), and metal materials containing copper (Cu). However, materials other than metal materials and resin materials may also be used as the modeling material M. The modeling material M is a powder-like material, i.e., a powder. However, the modeling material M does not have to be a powder. For example, a wire-like modeling material or a gas-like modeling material may be used as the modeling material M.

[0016] Like the forming material M, the workpiece W may also be an object containing a material that can be melted by irradiation with processing light EL of a predetermined intensity or higher. The material of the workpiece W may be the same as or different from the forming material M. The material of the workpiece W may be, for example, a metal material or a resin material. Examples of metal materials that may be used include titanium aluminide (TiAl), a metal material containing titanium (Ti), a metal material containing aluminum (Al), and a metal material containing copper (Cu). However, the material of the workpiece W may be other materials different from metal materials and resin materials.

[0017] As shown in FIGS. 1 to 3 , the modeling system SYS1 includes a material supply source 10, a modeling apparatus 20 including a first irradiation unit 21, a stage device 30, a housing 50, a first light source 60, a gas supply source 70, left and right second irradiation units 150L and 150R, a temperature measurement device 85, and a control device 90. The modeling apparatus 20, the stage device 30, the left and right second irradiation units 150L and 150R, and the temperature measurement device 85 may be housed in a chamber space 50A inside the housing 50. In this case, the modeling system SYS1 may perform additional processing in the chamber space 50A. Note that the modeling system SYS1 does not necessarily have to include at least one of the stage device 30 and the housing 50.

[0018] The material supply source 10 supplies the modeling device 20 with the modeling material M. The material supply source 10 supplies a desired amount of modeling material M according to the required amount so that the amount of modeling material M required per unit time for performing additive processing is supplied to the modeling device 20.

[0019] The modeling device 20 processes the modeling material M supplied from the material supply source 10 to model a model. The modeling device 20 includes a first irradiation unit 21 and a head drive system 121. The first irradiation unit 21 is also referred to as a modeling head. The first irradiation unit 21 includes a first irradiation optical system 22 and a plurality of material nozzles 24. Note that the first irradiation unit 21 may include a plurality of first irradiation optical systems 22 (for example, two first irradiation optical systems 22). The first irradiation unit 21 may include a single material nozzle 24.

[0020] The first irradiation optical system 22 is an optical system for emitting the processing light EL. The first irradiation optical system 22 is optically connected to a first light source 60 that emits (generates) the processing light EL via an optical transmission member 61. Examples of the optical transmission member 61 include an optical fiber and a light pipe. The first irradiation optical system 22 emits the processing light EL propagated from the light source 60 via the optical transmission member 61. The first irradiation optical system 22 irradiates the processing light EL downward (i.e., toward the −Z side) from the first irradiation optical system 22.

[0021] A table 31 is disposed below the first irradiation optical system 22. When a workpiece W is placed on a heating support unit 131 on the table 31, the first irradiation optical system 22 irradiates the emitted processing light EL onto the printing surface MS. Specifically, the first irradiation optical system 22 can irradiate a target irradiation area EA, which is set on the printing surface MS as an area to be irradiated (typically, focused) with the processing light EL. Furthermore, under the control of the control device 90, the state of the first irradiation optical system 22 can be switched between a state in which the processing light EL is irradiated onto the target irradiation area EA and a state in which the processing light EL is not irradiated onto the target irradiation area EA.

[0022] The direction of the processing light EL emitted from the first irradiation optical system 22 is not limited to straight down (i.e., aligned with the -Z-axis direction), but may be, for example, a direction tilted at a predetermined angle with respect to the Z-axis. The first irradiation optical system 22 may form a molten pool MP on the printing surface MS by irradiating the printing surface MS with the processing light EL.

[0023] The first irradiation optical system 22 may also have an optical scanning element (not shown) that deflects the processing light EL to move the target irradiation area EA onto which the processing light EL is irradiated. The optical scanning element may include a galvanometer mirror. In this embodiment, as shown in FIGS. 6 to 8 , a virtual area onto which the galvanometer mirror moves the target irradiation area EA on the printing surface MS is referred to as a processing unit area BSA. Specifically, a virtual area onto which the galvanometer mirror moves the target irradiation area EA while the positional relationship between the first irradiation optical system 22 and the printing surface MS is fixed (i.e., without changing) is referred to as a processing unit area BSA. In this case, the modeling system SYS1 can move the target irradiation area EA within the processing unit area BSA using the galvanometer mirror. Therefore, the operation of deflecting and scanning the processing light EL using the galvanometer mirror may be considered equivalent to the operation of moving the target irradiation area EA within the processing unit area BSA.

[0024] Here, an example of an operation for moving the target irradiation area EA within the processing unit area BSA will be described. For example, assuming that the processing unit area BSA is stationary (i.e., not moving) on ​​the printing surface MS, a galvanometer mirror (not shown) may deflect and scan the processing light EL so that the target irradiation area EA periodically moves back and forth within the processing unit area BSA along a single scanning direction (e.g., the X-axis direction). Specifically, as shown in FIG. 6 , the galvanometer mirror may deflect and scan the processing light EL so that the movement trajectory TR of the target irradiation area EA within the processing unit area BSA is linear. In this case, the shape of the processing unit area BSA through which the target irradiation area EA moves may be a rectangle whose longitudinal direction is the movement direction of the target irradiation area EA. In this case, when at least one of the first irradiation unit 21 and the table 31 moves under the control of the control device 90 and the processing unit area BSA moves in a direction intersecting the scanning direction of the target irradiation area EA (for example, in the Y-axis direction perpendicular to the X-axis direction), the movement trajectory TR of the target irradiation area EA may become a wave-shaped (for example, sinusoidal) movement trajectory.

[0025] For example, assuming that the processing unit area BSA is stationary on the printing surface MS, a galvanometer mirror (not shown) may deflect and scan the processing light EL so that the target irradiation area EA periodically moves back and forth within the processing unit area BSA along the X-axis scanning direction and the Y-axis scanning direction. Specifically, as shown in FIG. 7 , the galvanometer mirror may deflect and scan the processing light EL so that the movement trajectory TR of the target irradiation area EA within the processing unit area BSA is circular. In this case, the shape of the processing unit area BSA along which the target irradiation area EA moves may be circular. Furthermore, in this case, when at least one of the first irradiation unit 21 and the table 31 is moved under the control of the control device 90 to move the processing unit area BSA in the Y-axis direction (or the X-axis direction), the movement trajectory TR of the target irradiation area EA may become a spiral movement trajectory. Specifically, as shown in FIG. 8, the galvanometer mirror may deflect and scan the processing light EL so that the movement locus TR of the target irradiation area EA within the processing unit area BSA has a mesh-like shape. In this case, the shape of the processing unit area BSA along which the target irradiation area EA moves may be rectangular. Note that, as shown in FIGS. 6 to 8, the operation of periodically moving the target irradiation area EA on the printing surface MS may be referred to as a wobbling operation.

[0026] The material nozzle 24 supplies (e.g., injects, jets, spouts, or sprays) the modeling material M. The material nozzle 24 is physically connected to the material supply source 10, which is a supply source of the modeling material M, via the supply pipe 11 and the mixer 12. The material nozzle 24 supplies the modeling material M supplied from the material supply source 10 via the supply pipe 11 and the mixer 12. The material nozzle 24 may pressure-feed the modeling material M supplied from the material supply source 10 via the supply pipe 11. That is, the modeling material M from the material supply source 10 and a conveying gas (i.e., a pressure-feed gas, for example, an inert gas such as nitrogen or argon) may be mixed in the mixer 12 and then pressure-feed to the material nozzle 24 via the supply pipe 11. As a result, the material nozzle 24 supplies the modeling material M together with the conveying gas. For example, a purge gas supplied from the gas supply source 70 is used as the conveying gas. However, a gas supplied from a gas supply source different from the gas supply source 70 may be used as the carrier gas.

[0027] 2, the material nozzle 24 is depicted as a tube, but the shape of the material nozzle 24 is not limited to this. The material nozzle 24 supplies the modeling material M downward (i.e., toward the -Z side) from the material nozzle 24. A table 31 is disposed below the material nozzle 24. When a workpiece W is mounted on the heating support unit 131 on the table 31, the material nozzle 24 supplies the modeling material M toward the workpiece W or the vicinity of the workpiece W. The traveling direction of the modeling material M supplied from the material nozzle 24 is inclined at a predetermined angle (for example, an acute angle) with respect to the Z-axis direction, but may also be toward the -Z side (i.e., directly downward).

[0028] In this embodiment, the material nozzle 24 supplies the building material M to a position (i.e., a target irradiation area EA) where the processing light EL from the first irradiation optical system 22 is irradiated. For this reason, the material nozzle 24 and the first irradiation optical system 22 are aligned so that a target supply area MA, which is set on the building surface MS as an area where the material nozzle 24 supplies the building material M, coincides with (or at least partially overlaps with) the target irradiation area EA. The size of the target supply area MA may be larger than or the same as the size of the target irradiation area EA. Note that the size of the target supply area MA may also be smaller than the size of the target irradiation area EA.

[0029] The material nozzle 24 may supply the building material M to the molten pool MP. However, the material nozzle 24 does not have to supply the building material M to the molten pool MP. For example, the building system SYS1 may melt the building material M from the material nozzle 24 using the processing light EL emitted from the first irradiation optical system 22 before the building material M reaches the workpiece W, and then adhere the molten building material M to the workpiece W.

[0030] The first irradiation optical system 22 and the material nozzle 24 may be housed in a head housing 25 included in the first irradiation unit 21, which is also referred to as a modeling head. The head housing 25 is a housing having an internal storage space for storing the first irradiation optical system 22 and the material nozzle 24. In this case, the first irradiation optical system 22 and the material nozzle 24 may be housed in the internal storage space of the head housing 25.

[0031] The head drive system 121 moves the first irradiation unit 21 under the control of the control device 90. That is, the head drive system 121 moves the first irradiation optical system 22 and the material nozzle 24 under the control of the control device 90. The head drive system 121 moves the first irradiation unit 21, for example, along at least one of the X-axis direction, the Y-axis direction, the Z-axis direction, the θX direction, the θY direction, and the θZ direction. Note that the operation of moving the first irradiation unit 21 along at least one of the θX direction, the θY direction, and the θZ direction may be considered equivalent to the operation of rotating the first irradiation unit 21 around at least one of a rotation axis along the X-axis, a rotation axis along the Y-axis, and a rotation axis along the Z-axis.

[0032] 1 , head drive system 121 moves first irradiation unit 21 along each of the X-axis direction and the Z-axis direction. In this case, head drive system 121 may include, for example, a column 122 which is a wall-like member extending upward along the Z-axis direction from bed 30A which is a base of stage device 30, an X guide member 123 attached to (or formed on) column 122 and extending along the X-axis direction, an X block member 124 attached to X guide member 123 and movable along X guide member 123, a servo motor 125 which generates a driving force for moving X block member 124, a Z guide member (not shown) attached to (or formed on) X block member 124 and extending along the Z-axis direction, a Z block member 127 attached to the Z guide member and movable along the Z guide member, and a servo motor 128 which generates a driving force for moving Z block member 127.

[0033] The first irradiation unit 21 may be attached to the Z-block member 127. Specifically, the head housing 25 of the first irradiation unit 21 may be attached to the Z-block member 127. As a result, the first irradiation unit 21 moves in the X-axis direction in accordance with the movement of the X-block member 124, and moves in the Z-axis direction in accordance with the movement of the Z-block member 127. In other words, the position of the first irradiation unit 21 in the X-axis direction changes with the change in the position of the X-block member 124 in the X-axis direction, and the position of the first irradiation unit 21 in the Z-axis direction changes with the change in the position of the Z-block member 127 in the Z-axis direction.

[0034] The stage device 30 includes a bed 30A, a table 31, a stage drive system 32, and a heating support unit 131. A workpiece W is placed on the table 31. In this embodiment, the workpiece W is placed on the table 31 via the heating support unit 131. Specifically, the workpiece W is supported by the heating support unit 131. The heating support unit 131 that supports the workpiece W is placed on the table 31. In this case, the table 31 may be considered to support the workpiece W via the heating support unit 131.

[0035] The table 31 may be capable of holding the heating support unit 131 placed thereon. In this case, the table 31 may be equipped with at least one of a mechanical chuck, an electrostatic chuck, a vacuum chuck, or the like to hold the heating support unit 131. Alternatively, the table 31 may not be capable of holding the heating support unit 131 placed thereon. In this case, the heating support unit 131 may be placed on the table 31 in a clampless manner. The first irradiation optical system 22 described above emits processing light EL via the heating support unit 131 during at least a portion of the period during which the workpiece W is placed on the table 31. Furthermore, the material nozzle 24 described above supplies the modeling material M via the heating support unit 131 during at least a portion of the period during which the workpiece W is placed on the table 31.

[0036] The stage drive system 32 moves the table 31. The stage drive system 32 moves the table 31, for example, along at least one of the X-axis, Y-axis, Z-axis, θX direction, θY direction, and θZ direction. Note that the operation of moving the table 31 along at least one of the θX direction, θY direction, and θZ direction may be considered equivalent to the operation of rotating the table 31 around at least one of a rotation axis along the X-axis (i.e., the A-axis), a rotation axis along the Y-axis (i.e., the B-axis), and a rotation axis along the Z-axis (i.e., the C-axis).

[0037] In this embodiment, the stage drive system 32 may rotate the table 31 at least around a desired rotation axis. In particular, the stage drive system 32 may rotate the table 31 around a rotation axis that intersects with the optical axis EX of the first irradiation optical system 22. In the example shown in FIGS. 1 to 3 , the optical axis EX of the first irradiation optical system 22 is an axis along the Z axis.

[0038] 1 , the stage drive system 32 moves the table 31 along the Y-axis direction and rotates the table 31 around the respective rotation axes of the A-axis and C-axis. In this case, the stage drive system 32 may include, for example, a Y guide member 35 attached to (or formed on) the bed 30A and extending along the Y-axis direction, a trunnion (Y block member) 36 attached to the Y guide member 35 and movable along the Y guide member 35, a servo motor 37 that generates a driving force for moving the trunnion 36, a cradle 38 attached to the trunnion 36 and rotatable about the A-axis relative to the trunnion 36, and a servo motor (not shown) that generates a driving force for rotating the cradle 38. The table 31 may be attached to the cradle 38 so as to be rotatable about the C-axis relative to the cradle 38 using the driving force generated by the servo motor (not shown). As a result, the table 31 moves in the Y-axis direction in accordance with the movement of the trunnion 36, rotates about the A-axis in accordance with the rotation of the cradle 38, and rotates about the C-axis.

[0039] When the stage drive system 32 moves the table 31, the relative positional relationship between the first irradiation unit 21 and each of the table 31 and the workpiece W changes. As a result, the relative positional relationship between the table 31 and each of the workpiece W and the first irradiation optical system 22 provided in the first irradiation unit 21 changes.

[0040] The heating support unit 131 is capable of supporting the workpiece W. The heating support unit 131 may be capable of holding the workpiece W. In this case, the heating support unit 131 may be equipped with at least one of a mechanical chuck, an electrostatic chuck, a vacuum chuck, or the like to hold the workpiece W. Alternatively, the heating support unit 131 may not be capable of holding the workpiece W. In this case, the workpiece W may be supported by the heating support unit 131 in a clampless manner. The first irradiation optical system 22 described above emits processing light EL during at least a portion of the period during which the heating support unit 131 supports the workpiece W. Furthermore, the material nozzle 24 described above supplies the modeling material M during at least a portion of the period during which the heating support unit 131 supports the workpiece W.

[0041] The heating support unit 131 is capable of supporting the workpiece W and also heating the supported workpiece W. In other words, the heating support unit 131 has the function of supporting the workpiece W and the function of heating the workpiece W. As shown in Figures 9 and 10 , the heating support unit 131 includes a heating device 132, a temperature sensor 133, a force applying device 134, a supporting device 135, and a cooling device 136.

[0042] The heating device 132 is a device capable of heating the workpiece W. The heating device 132 may be any device as long as it is capable of heating the workpiece W. For example, the heating device 132 may be a device capable of heating the workpiece W by transferring heat to the workpiece W. For example, the heating device 132 may include a heater (e.g., a cartridge heater) capable of heating the workpiece W by utilizing heat generated in a conductor through which an electric current flows. For example, the heating device 132 may include a heater (e.g., a cartridge heater) capable of heating the workpiece W by utilizing resistance heating. For example, the heating device 132 may include a heater (e.g., an infrared radiation heater) capable of heating the workpiece W by utilizing electromagnetic waves such as infrared rays. For example, the heating device 132 may include other types of heaters.

[0043] In this embodiment, the heating device 132 is disposed below the workpiece W. In this case, the heating device 132 can heat the workpiece W from below. Specifically, the heating device 132 is disposed so as to face the lower surface (the surface facing the -Z side) of the workpiece W. In this case, the heating device 132 can heat the workpiece W by heating the lower surface of the workpiece W. The heating device 132 heats the workpiece W by contacting at least a portion of the workpiece W. Specifically, the heating device 132 may heat the workpiece W by contacting at least a portion of the lower surface of the workpiece W. However, the heating device 132 may heat the workpiece W without contacting the workpiece W.

[0044] The temperature sensor 133 is a temperature detection device capable of detecting the temperature of the workpiece W. For example, the temperature sensor 133 may be capable of detecting the temperature of a portion of the workpiece W that is heated by the heating device 132. For example, the temperature sensor 133 may be capable of detecting the temperature of the underside of the workpiece W that is heated by the heating device 132. For example, the temperature sensor 133 may be capable of detecting the temperature of a portion of the workpiece W that is irradiated with processing light EL by the modeling device 20. The temperature sensor 133 may be any device as long as it is capable of detecting the temperature of the workpiece W. For example, the temperature sensor 133 may include a thermocouple. Note that the temperature sensor 133 may also detect the temperature of the model ST that is modeled on the workpiece W.

[0045] The force applying device 134 is a device capable of applying a force to the heating device 132. Specifically, the force applying device 134 is a device capable of applying a force to the heating device 132 that acts to press the heating device 132 toward the workpiece W. As described above, the heating device 132 is disposed below the workpiece W. In this case, the force applying device 134 may apply a force to the heating device 132 that acts to press the heating device 132 from below upward. Furthermore, four force applying devices 134 are provided, straddling the four corners of the heating device 132 and the cooling device 136. However, this is not limited to this, and any device may be provided that is capable of applying a uniform force to the heating device 132. The force applying device 134 may be any device as long as it is capable of applying a force to the heating device 132. As an example, the force applying device 134 may be a device capable of applying a force to the heating device 132 using an elastic member. In this case, the force applying device 134 may include an elastic member. Examples of the elastic member include at least one of a spring and a compression coil.

[0046] The support device 135 is a device capable of supporting the workpiece W. The support device 135 supports the workpiece W from below. Four support devices 135 are provided, straddling the four corners of the workpiece W and the cooling device 136, but this is not limitative and any device may be provided that can stably support the workpiece W. By supporting the four corners of the workpiece W, the support devices 135 reduce the contact area with the workpiece W and prevent heat from the workpiece W from being transferred to the table 31 via the support devices 135 (and the cooling device 136).

[0047] The cooling device 136 is a device capable of cooling an object to be cooled. For example, the cooling device 136 may include an air-cooling device capable of cooling an object to be cooled by using a gas as a refrigerant. For example, the cooling device 136 may include a water-cooling device capable of cooling an object to be cooled by using a liquid as a refrigerant. As an example, the cooling device 136 may include a chiller capable of cooling an object to be cooled by circulating a refrigerant including at least one of a gas and a liquid.

[0048] The cooling device 136 may be placed on the table 31. In this case, the cooling device 136 may cool the table 31. That is, the object to be cooled may include the table 31. The object to be cooled may also include the force applying device 134. In this case, the cooling device 136 may cool the force applying device 134. The object to be cooled may also include the support device 135. In this case, the cooling device 136 may cool the support device 135.

[0049] The first light source 60 emits, for example, at least one of infrared light, visible light, and ultraviolet light as the processing light EL. However, other types of light may be used as the processing light EL. The processing light EL may include a plurality of pulsed lights (i.e., a plurality of pulse beams). The processing light EL may be laser light. In this case, the first light source 60 may include a laser light source (e.g., a semiconductor laser such as a laser diode (LD)). Examples of laser light sources include a fiber laser, a CO ２ A laser, a YAG laser, an excimer laser, or the like may be used. However, the processing light EL does not have to be laser light. The first light source 60 may include any light source (for example, at least one of an LED (Light Emitting Diode) and a discharge lamp). The number of first light sources 60 is not limited to one, and multiple first light sources 60 may be provided. For example, if the first irradiation unit 21 includes multiple first irradiation optical systems 22, multiple first light sources 60 may be provided according to the number of first irradiation optical systems 22. The first light source 60 may be referred to as a first energy source.

[0050] The gas supply source 70 is a supply source of purge gas for purging the chamber space 50A inside the housing 50. The purge gas includes an inert gas. Examples of the inert gas include nitrogen gas and argon gas. The gas supply source 70 is connected to the chamber space 50A via a supply port 52 formed in the partition member 51 of the housing 50 and a supply pipe 71 connecting the gas supply source 70 and the supply port 52. The gas supply source 70 supplies purge gas to the chamber space 50A via the supply pipe 71 and the supply port 52. As a result, the chamber space 50A becomes a space purged with the purge gas. The purge gas supplied to the chamber space 50A may be exhausted from an exhaust port (not shown) formed in the partition member 51. The gas supply source 70 may be a cylinder containing an inert gas. When the inert gas is nitrogen gas, the gas supply source 70 may be a nitrogen gas generator that generates nitrogen gas using atmospheric air as a raw material.

[0051] When the molding system SYS1 performs additional processing in an open space rather than in an enclosed space (chamber space 50A), the gas supply source 70 may supply purge gas to the space between the first irradiation optical system 22 and the workpiece W in order to locally purge this space. Note that even when the molding system SYS1 performs additional processing in the chamber space 50A, the gas supply source 70 may supply purge gas to the space between the first irradiation optical system 22 and the workpiece W in order to locally purge this space.

[0052] As described above, when the material nozzle 24 supplies the modeling material M together with a purge gas, the gas supply source 70 may supply the purge gas to the mixer 12 to which the modeling material M is supplied from the material supply source 10. Specifically, the gas supply source 70 may be connected to the mixer 12 via a supply pipe 72 connecting the gas supply source 70 and the mixer 12. As a result, the gas supply source 70 supplies the purge gas to the mixer 12 via the supply pipe 72. In this case, the modeling material M from the material supply source 10 may be supplied (specifically, pressure-fed) through the supply pipe 11 toward the material nozzle 24 by the purge gas supplied from the gas supply source 70 via the supply pipe 72. In other words, the gas supply source 70 may be connected to the material nozzle 24 via the supply pipe 72, the mixer 12, and the supply pipe 11. In this case, the material nozzle 24 supplies the modeling material M together with the purge gas for pressure-fed the modeling material M.

[0053] The left and right second irradiation units 150L and 150R can heat the object ST by irradiating the object ST with heating light HL1 and HL2, which are second energy beams for non-modeling. As shown in FIGS. 2 and 11 , the left second irradiation unit 150L, ​​which is disposed above and to the left rear of the table 31, irradiates the left side of the object ST with heating light HL1 in a right-front direction. The irradiation direction (right-front direction) of the heating light HL1 by the left second irradiation unit 150L intersects with the stacking direction (upward direction) of the object ST. In other words, the irradiation direction (right-front direction) of the heating light HL1 by the left second irradiation unit 150L is different from the stacking direction (upward direction) of the object ST. In addition, the left-side second irradiation unit 150L is not limited to being positioned at the upper left rear of the table 31, but may also be positioned at the upper left front of the table 31, as long as it is positioned in a position that does not interfere with the movement of the first irradiation unit 21 by the head drive system 121.

[0054] Of the left and right second irradiation units 150L, ​​150R, the right second irradiation unit 150R, which is located at the upper right rear of the table 31, irradiates the heating light HL2 in a left-front direction toward the right side of the object ST. The irradiation direction (right-front direction) of the heating light HL2 by the right second irradiation unit 150R intersects with the stacking direction (upward direction) of the object ST. In other words, the irradiation direction (right-front direction) of the heating light HL2 by the right second irradiation unit 150R is a direction different from the stacking direction (upward direction) of the object ST. Note that the right second irradiation unit 150R is not limited to being located at the upper right rear of the table 31, but may also be located at the upper right front of the table 31. It is sufficient that the right second irradiation unit 150R is located in a position that does not interfere with the movement of the first irradiation unit 21 by the head drive system 121.

[0055] The stacking direction of the object ST may be referred to as a first direction, and the irradiation direction of the heating light HL1, HL2 may be referred to as a second direction. The left and right second irradiation units 150L, ​​150R can heat not only the object ST but also the workpiece W supported by the heating support unit 131 (support device 135) by irradiating the workpiece W with the heating light HL1, HL2.

[0056] The temperature measuring device 85 measures the temperature of the object ST. The temperature measuring device 85 outputs temperature data related to the measured temperature of the object ST to the control device 90. The temperature measuring device 85 may be configured using an infrared camera or a thermosensor. The temperature measuring device 85 is disposed above the table 31 in a position that does not interfere with the movement of the first irradiation unit 21 by the head drive system 121. Specifically, as shown in FIGS. 2 and 11 , the temperature measuring device 85 may be disposed above the right front (or above the left front) of the table 31. Note that the temperature measuring device 85 may be any device that can measure the temperature of the object ST, and may be a non-contact temperature measuring device such as an infrared camera or a contact temperature measuring device such as a thermocouple.

[0057] The control device 90 controls the operation of the modeling system SYS1. For example, the control device 90 may control the modeling device 20 (e.g., at least one of the first irradiation unit 21 and the head drive system 121) included in the modeling system SYS1 to perform additional processing on the workpiece W. For example, the control device 90 may control the stage device 30 (e.g., the stage drive system 32) included in the modeling system SYS1 to perform additional processing on the workpiece W. For example, the control device 90 may control the material supply source 10 included in the modeling system SYS1 to perform additional processing on the workpiece W. For example, the control device 90 may control the first light source 60 included in the modeling system SYS1 to perform additional processing on the workpiece W. For example, the control device 90 may control the gas supply source 70 included in the modeling system SYS1 to perform additional processing on the workpiece W. For example, the control device 90 may control the left and right second irradiation units 150L, ​​150R provided in the molding system SYS1 so as to perform additional processing on the workpiece W.

[0058] The control device 90 may include, for example, an arithmetic device and a storage device. The arithmetic device may include, for example, at least one of a CPU (Central Processing Unit) and a GPU (Graphics Processing Unit). The storage device may include, for example, a memory. The control device 90 functions as a device that controls the operation of the modeling system SYS1 by the arithmetic device executing a computer program. This computer program is a computer program that causes the arithmetic device to perform (i.e., execute) the operations to be performed by the control device 90, which will be described later. In other words, this computer program is a computer program that causes the control device 90 to function so as to cause the modeling system SYS1 to perform the operations to be performed by the control device 90. The computer program executed by the arithmetic device may be recorded in a storage device (i.e., a recording medium) included in the control device 90, or may be recorded in any storage medium (e.g., a hard disk or semiconductor memory) built into or externally attachable to the control device 90. Alternatively, the arithmetic device may download the computer program to be executed from a device external to the control device 90 via a network interface.

[0059] The control device 90 may control the irradiation mode of the processing light EL by the first irradiation optical system 22. The irradiation mode may include, for example, at least one of the intensity of the processing light EL, the irradiation position of the processing light EL, and the irradiation timing of the processing light EL. If the processing light EL includes multiple pulsed lights, the irradiation mode may include, for example, at least one of the emission time of the pulsed light, the emission cycle of the pulsed light, and the ratio between the emission time of the pulsed light and the emission cycle of the pulsed light (so-called duty ratio). Furthermore, the control device 90 may control the movement mode of the first irradiation unit 21 by the head drive system 121. The control device 90 may control the movement mode of the table 31 by the stage drive system 32. The movement mode may include, for example, at least one of the movement amount, movement speed, movement direction, and movement timing (movement time). Furthermore, the control device 90 may control the supply mode of the modeling material M by the material nozzle 24. The supply mode may include, for example, at least one of the supply amount (particularly, the supply amount per unit time) and the supply timing (supply time).

[0060] The control device 90 may control the irradiation mode of the heating light HL1, HL2 emitted by the left and right second irradiation units 150L, ​​150R. The irradiation mode may include, for example, at least one of the intensity of the heating light HL1, HL2, the irradiation area of ​​the heating light HL1, HL2, and the irradiation timing of the heating light HL1, HL2. Furthermore, if the left and right second irradiation units 150L, ​​150R emit pulsed heating light HL1, HL2, the irradiation mode may include the pulse emission interval and duty ratio of the heating light HL1, HL2. In this case, the irradiation timing of the heating light HL1, HL2 may include the timing (period) during which a series of pulsed light is emitted. When forming the object ST, the temperature of the molten pool MP becomes higher than the melting point of the forming material M (e.g., approximately 1460°C). The temperature of the solidified area CA (see FIG. 4 ), which solidifies around the molten pool MP in the object ST, becomes slightly lower (e.g., approximately 1300°C) than the melting point of the building material M. The temperature of the portion of the object ST that is located below the molten pool MP becomes even lower than the temperature of the solidified area CA. If the cooling rate of the object ST is fast, the temperature difference within the object ST may cause cracks in the object ST. Therefore, a heat treatment is required to heat the heating area HT below the molten pool MP (the irradiation position of the processing light EL) in the object ST to a predetermined heating temperature (e.g., approximately 800°C) and maintain the temperature. Furthermore, when building the object ST, a heat treatment may be required for the object ST (heated area HT) to obtain a desired composition (e.g., metal composition) for the object ST.

[0061] In this embodiment, for example, the control device 90 feedback-controls the intensity or irradiation area of ​​the heating light beams HL1 and HL2 to adjust the cooling rate of the object ST based on the temperature data of the object ST input from the temperature measuring device 85 (in other words, the measurement results of the temperature of the object ST). Note that, at this time, the control device 90 may control the irradiation area of ​​the heating light beams HL1 and HL2 so that the heating area HT (see FIG. 4 ) for heating the object ST does not change while at least one structure layer SL of the object ST is being formed. This allows the object ST to be appropriately heated, thereby preventing cracks from occurring in the object ST and enabling the object ST to be accurately formed. Furthermore, because the object ST can be appropriately heated, a desired composition (e.g., metal composition) can be obtained for the object ST, enabling the object ST to be accurately formed.

[0062] The control device 90 may also control the emission timing of the heating lights HL1, HL2 so that a modeling period in which the modeling device 20 models the object ST overlaps with a heating period in which the left and right second irradiation units 150L, ​​150R heat the object ST. The control device 90 may also control the emission timing of the heating lights HL1, HL2 so that the modeling device 20 models the object ST from above the workpiece W, while the left and right second irradiation units 150L, ​​150R heat the already-modeled object ST from the side. This allows the modeling object ST to be heated while being modeled.

[0063] The control device 90 does not have to be provided inside the modeling system SYS1. For example, the control device 90 may be provided as a server or the like outside the modeling system SYS1. In this case, the control device 90 and the modeling system SYS1 may be connected via a wired and / or wireless network (or a data bus and / or a communication line). As the wired network, for example, a network using a serial bus interface typified by at least one of IEEE1394, RS-232x, RS-422, RS-423, RS-485, and USB may be used. As the wired network, a network using a parallel bus interface may be used. As the wired network, a network using an interface compliant with Ethernet (registered trademark) typified by at least one of 10BASE-T, 100BASE-TX, and 1000BASE-T may be used. As the wireless network, a network using radio waves may be used. An example of a network using radio waves is a network compliant with IEEE 802.1x (for example, at least one of a wireless LAN and Bluetooth (registered trademark)). A network using infrared rays may be used as the wireless network. A network using optical communication may be used as the wireless network. In this case, the control device 90 and the modeling system SYS1 may be configured to be able to transmit and receive various information via the network. Furthermore, the control device 90 may be able to transmit information such as commands and control parameters to the modeling system SYS1 via the network. The modeling system SYS1 may include a receiving device that receives information such as commands and control parameters from the control device 90 via the network. The modeling system SYS1 may include a transmitting device (i.e., an output device that outputs information to the control device 90) that transmits information such as commands and control parameters to the control device 90 via the network.Alternatively, a first control device that performs part of the processing performed by the control device 90 may be provided inside the modeling system SYS1, while a second control device that performs another part of the processing performed by the control device 90 may be provided outside the modeling system SYS1.

[0064] A computational model that can be constructed by machine learning may be implemented in the control device 90 by the computation device executing a computer program. An example of a computational model that can be constructed by machine learning is a computational model including a neural network (so-called artificial intelligence (AI)). In this case, learning of the computational model may include learning of parameters of the neural network (e.g., at least one of a weight and a bias). The control device 90 may control the operation of the modeling system SYS1 using the computational model. In other words, the operation of controlling the operation of the modeling system SYS1 may include the operation of controlling the operation of the modeling system SYS1 using the computational model. The control device 90 may be implemented with a computational model that has been constructed by offline machine learning using training data. Furthermore, the computational model implemented in the control device 90 may be updated by online machine learning on the control device 90. Alternatively, the control device 90 may control the operation of the modeling system SYS1 using a calculation model implemented in a device external to the control device 90 (i.e., a device provided outside the modeling system SYS1) in addition to or instead of the calculation model implemented in the control device 90.

[0065] The recording medium for recording the computer program executed by the control device 90 may be at least one of the following: a CD-ROM, CD-R, CD-RW, a flexible disk, an MO, a DVD-ROM, a DVD-RAM, a DVD-R, a DVD+R, a DVD-RW, a DVD+RW, or an optical disk such as Blu-ray (registered trademark), a magnetic medium such as a magnetic tape, a magneto-optical disk, a semiconductor memory such as a USB memory, or any other medium capable of storing a program. The recording medium may also include a device capable of recording a computer program (for example, a general-purpose device or a dedicated device in which a computer program is implemented in an executable state in at least one of the forms of software and firmware). Furthermore, each process or function included in the computer program may be realized by a logical processing block realized within the control device 90 (i.e., a computer) when the control device 90 executes the computer program, or may be realized by hardware such as a predetermined gate array (FPGA (Field Programmable Gate Array) or ASIC (Application Specific Integrated Circuit)) provided in the control device 90, or may be realized in a form that combines logical processing blocks and partial hardware modules that realize some elements of the hardware.

[0066] [Configuration of Second Illumination Unit] Next, the specific configuration of the left and right second illumination units 150L, ​​150R will be described with reference to Figures 12 and 13. The right second illumination unit 150R has the same configuration as the left second illumination unit 150L, ​​and detailed illustration and description thereof will be omitted. As shown in Figures 12 and 13, the left second illumination unit 150L includes a second light source 160, a second illumination optical system 170, a lens barrel head 180, a head support unit 181, and a head driver 186.

[0067] The second light source 160 emits light including an infrared region (e.g., infrared light) as the heating light HL1. In this case, the second light source 160 may be configured using, for example, a far-infrared heater (IR heater). Using infrared light as the heating light HL1 makes it possible to heat the model ST. Here, the light in the infrared region may be light with a wavelength of 800 nm or more. Note that other types of light, such as ultraviolet light or visible light, may also be used as the heating light HL1 as long as it is capable of heating the model ST. The second light source 160 may also be referred to as a second energy source.

[0068] 13 , the second irradiation optical system 170 includes a reflecting mirror 171, a focusing optical system 175, and a light-guiding optical system 176. The reflecting mirror 171 has a reflecting surface 172 formed in a parabolic shape. The reflecting surface 172 of the reflecting mirror 171 reflects the heating light HL1 from the second light source 160 toward the model ST. The second light source 160 is disposed at the focal position of the parabolic reflecting surface 172. This allows the heating light HL1 reflected by the reflecting surface 172 to be collimated, thereby reducing unevenness in the irradiation intensity of the heating light HL1 irradiated onto the side surface of the model ST.

[0069] The focusing optical system 175 focuses the heating light HL1 reflected by the reflecting mirror 171. This increases the intensity of the heating light HL1 irradiated onto the model ST. In the example shown in Fig. 13, the focusing optical system 175 is composed of one lens, but is not limited to this and may be composed of multiple lenses.

[0070] The light-guiding optical system 175 guides the heating light HL1 condensed by the condensing optical system 175 to the side surface of the model ST. In the example shown in Fig. 13, the light-guiding optical system 175 is composed of one lens, but the present invention is not limited to this and may be composed of multiple lenses. The front focal position of the light-guiding optical system 175 may be located at the rear focal position of the condensing optical system 175. This allows the heating light HL1 that has passed through the light-guiding optical system 175 to be collimated, thereby reducing unevenness in the intensity of the heating light HL1.

[0071] The light-guiding optical system 175 may be configured to be movable along the optical axis FX of the second irradiation optical system 170 by a lens driving unit (not shown) provided in the light-guiding optical system 175. By moving the light-guiding optical system 175 along the optical axis FX of the second irradiation optical system 170, it is possible to change the size of the heating light HL1 irradiated onto the model ST. Note that the optical axis FX of the second irradiation optical system 170 may intersect with the optical axis EX of the first irradiation optical system 22, or may extend near the optical axis EX of the first irradiation optical system 22.

[0072] 12, the lens barrel head 180 accommodates and holds the second light source 160 and the second irradiation optical system 170 inside the lens barrel head 180. The lens barrel head 180 is formed in a cylindrical shape with an open tip side, and is configured so that the second irradiation optical system 170 can emit heating light HL1 toward the model ST.

[0073] 12 , the head support unit 181 supports the barrel head 180 that houses the second light source 160 and the second irradiation optical system 170. The head support unit 181 has a goniostage 182 and a rotation stage 183. The goniostage 182 supports the barrel head 180 so that it can rotate up and down (around an axis perpendicular to the rotation axis of the rotation stage 183). The rotation stage 183 supports the barrel head 180 and the goniostage 182 so that they can rotate horizontally (around an axis parallel to the Z axis).

[0074] The head driver 186 is configured using, for example, a servo motor. The head driver 186 rotates the barrel head 180 supported by the goniostage 182 in the vertical direction. The head driver 186 rotates the barrel head 180 and the goniostage 182 supported by the rotation stage 183 in the horizontal direction. In this way, the head driver 186 integrally moves the second light source 160 and the second irradiation optical system 170 (i.e., the reflecting mirror 171, the focusing optical system 175, and the light guiding optical system 175) housed in the barrel head 180, thereby two-dimensionally moving the irradiation position of the heating light HL1 on the side surface of the model ST.

[0075] The head driver 186 moves the second light source 160 and the second irradiation optical system 170 housed in the lens barrel head 180 together, or moves the light-guiding optical system 175 along the optical axis FX of the second irradiation optical system 170 using a lens driver (not shown), thereby changing the irradiation area RA to match the model ST. The head driver 186 may change the irradiation position of the heating light HL1 in the direction in which the stacking of the model ST progresses (upward) by rotating the lens barrel head 180 upward. The lens driver (not shown) may move the light-guiding optical system 175 along the optical axis FX of the second irradiation optical system 170, thereby changing the size of the area irradiated with the heating light HL1 to match the direction in which the stacking of the model ST progresses.

[0076] [Modeling Method] Next, a modeling method using the modeling system SYS1 according to the first embodiment will be described. As described above, the control device 90 controls the modeling device 20 so that the modeling period in which the modeling device 20 models the object ST overlaps with the heating period in which the left and right second irradiation units 150L, ​​150R heat the object ST. In other words, the control device 90 controls the modeling device 20 to model the object ST from above the workpiece W, while the left and right second irradiation units 150L, ​​150R heat the already-modeled object ST from the side. In this way, the modeling device 20 models the object ST, while the left and right second irradiation units 150L, ​​150R heat the object ST.

[0077] At this time, the modeling device 20 irradiates the workpiece W with the processing light EL downward toward the workpiece W from above, and supplies the modeling material M to the irradiation position of the processing light EL, thereby forming a model ST on the workpiece W. The left-side second irradiation unit 150L heats the left side surface of the model ST by irradiating the heating light HL1 in a forward right direction toward a position on the left side surface of the model ST below the irradiation position of the processing light EL. The right-side second irradiation unit 150R heats the right side surface of the model ST by irradiating the heating light HL2 in a forward left direction toward a position on the right side surface of the model ST below the irradiation position of the processing light EL.

[0078] For example, in the left-side second irradiation unit 150L, ​​the heating light HL1 emitted from the second light source 160 is reflected by the reflecting surface 172 of the reflecting mirror 171 toward the light-collecting optical system 175 (model ST). The heating light HL1 reflected by the reflecting surface 172 becomes parallel light and enters the light-collecting optical system 175. The heating light HL1 transmitted through the light-collecting optical system 175 is first collected and then enters the light-guiding optical system 175. The heating light HL1 transmitted through the light-guiding optical system 175 becomes parallel light and is irradiated onto the side surface of the model ST.

[0079] The processing light EL is irradiated onto the workpiece W from above, and the modeling material M is supplied to the irradiation position of the processing light EL, thereby stacking a plurality of layers (structural layers SL) of the model ST on the workpiece W. The head driver 186 may rotate the lens barrel head 180 upward to change the irradiation position of the heating light HL1 in the direction in which the model ST is stacked (upward). As described above, the control device 90 may control the heating region HT (see FIG. 4 ) for heating the model ST so that it does not change while forming at least one structural layer SL of the model ST. This allows the model ST to be appropriately heated as the model ST is stacked. Furthermore, the size of the area irradiated with the heating light HL1 may be changed in accordance with the direction in which the model ST is stacked by moving the light-guiding optical system 175 along the optical axis FX of the second irradiation optical system 170 using a lens driver (not shown).

[0080] According to the first embodiment, the left and right second irradiation units 150L, ​​150R irradiate the object ST with the heating light HL1, HL2 to heat the object ST, thereby preventing cracks from occurring in the object ST and enabling the object ST to be accurately molded. Furthermore, by appropriately heating the object ST, a desired composition (e.g., metal composition) can be obtained for the object ST, enabling the object ST to be accurately molded.

[0081] Second Embodiment Next, a modeling system according to a second embodiment will be described with reference to FIGS. 14 to 17. The modeling system according to the second embodiment has the same configuration as the modeling system SYS1 according to the first embodiment, except for the configurations of the left and right second irradiation units 200L and 200R. Therefore, the same components as those in the first embodiment are denoted by the same reference numerals as those in the first embodiment, and detailed descriptions thereof will be omitted. Furthermore, in the modeling system according to the second embodiment, the right second irradiation unit 200R has the same configuration as the left second irradiation unit 200L, and detailed illustrations and descriptions thereof will be omitted.

[0082] 14 , the left-side second irradiation unit 200L according to the second embodiment includes a second light source 210, a second irradiation optical system 220, a reflecting mirror support section 225, a rotational movement section 231, and a translational movement section 236. The second light source 210 is configured in the same manner as the second light source 160 according to the first embodiment. Note that the second light source 210, the second irradiation optical system 220, the reflecting mirror support section 225, the rotational movement section 231, and the translational movement section 236 may be housed inside a lens barrel head (not shown) similar to that of the first embodiment.

[0083] As shown in Fig. 14 , the second irradiation optical system 220 has a reflecting mirror 221. The reflecting mirror 221 has a reflecting surface 222 formed in a parabolic shape. The reflecting surface 222 of the reflecting mirror 221 reflects the heating light HL1 from the second light source 210 toward the model ST. As shown in Fig. 17 , the second light source 210 may be disposed at the focal position of the parabolic reflecting surface 212. This allows the heating light HL1 reflected by the reflecting surface 222 to be collimated, thereby reducing unevenness in the irradiation intensity of the heating light HL1 irradiated onto the side surface of the model ST.

[0084] 17 shows the relationship between the vertical position (Z-axis direction) on the side surface of the object ST and the irradiation intensity Ep of the heating light HL1 irradiated onto the side surface of the object ST. When the reflecting surface 222 is formed in a parabolic shape, the irradiation intensity Ep of the heating light HL1 irradiated onto the side surface of the object ST is distributed over the entire area of ​​the object ST. In this case, the irradiation area of ​​the heating light HL1 is relatively large, but the irradiation intensity Ep of the heating light HL1 is relatively small.

[0085] The reflecting mirror support unit 225 is configured using, for example, a goniostage or the like. As shown in FIG. 14 , the reflecting mirror support unit 225 supports the reflecting mirror 221 of the second irradiation optical system 220 so that it can rotate in the vertical direction (around an axis perpendicular to the optical axis of the second irradiation optical system 220). The rotational movement unit 231 is configured using, for example, a servo motor or the like. The rotational movement unit 231 rotates and moves the reflecting mirror 221 supported by the reflecting mirror support unit 225 in the vertical direction. By rotating and moving the reflecting mirror 221 in the vertical direction, the rotational movement unit 231 can move the irradiation position of the heating light HL1 in the vertical direction on the side surface of the model ST.

[0086] The translation unit 236 is configured using, for example, a linear guide, a servo motor, or the like. The translation unit 236 translates the reflecting mirror 221 of the second irradiation optical system 220, which is supported by the rotational movement unit 231 and the reflecting mirror support unit 225, in the horizontal direction. The translation unit 236 can move the reflecting mirror 221 from the first position shown in FIG. 14 to a second position (see FIG. 15) away from the second light source 210. As a result, as shown in FIG. 15, the irradiation area RA#1 when the reflecting mirror 221 is located at the second position is smaller than the irradiation area RA when the reflecting mirror 221 is located at the first position. The translation unit 236 can also move the reflecting mirror 221 from the first position to a third position (see FIG. 16) closer to the second light source 210. As a result, as shown in FIG. 16, the irradiation area RA#2 when the reflecting mirror 221 is located at the third position is larger than the irradiation area RA when the reflecting mirror 221 is located at the first position.

[0087] The rotational movement unit 231 and the translational movement unit 236 can change the irradiation area RA to match the model ST by rotationally moving or translating the reflecting mirror 221 of the second irradiation optical system 220. For example, the rotational movement unit 231 may change the irradiation position of the heating light HL1 in the direction in which the stacking of the model ST progresses (upward) by rotationally moving the reflecting mirror 221 upward. The translational movement unit 236 may change the size of the area irradiated with the heating light HL1 to match the direction in which the stacking of the model ST progresses by translating the reflecting mirror 221 in the horizontal direction.

[0088] [Modeling Method] Next, a modeling method using a modeling system according to the second embodiment will be described. In the second embodiment, the modeling device 20 models the model ST using the same control as in the first embodiment, while the left and right second irradiation units 200L and 200R heat the model ST. At this time, the left second irradiation unit 200L according to the second embodiment heats the left side surface of the model ST by irradiating the left side surface of the model ST with heating light HL1 in a forward right direction toward a position below the irradiation position of the processing light EL on the left side surface of the model ST. The right second irradiation unit 200R according to the second embodiment heats the right side surface of the model ST by irradiating the right side surface of the model ST with heating light HL2 in a forward left direction toward a position below the irradiation position of the processing light EL on the right side surface of the model ST.

[0089] For example, in the left-side second irradiation unit 200L, the heating light HL1 emitted from the second light source 210 is reflected toward the model ST by the reflecting surface 222 of the reflecting mirror 221. The heating light HL1 reflected by the reflecting surface 222 is irradiated onto the side surface of the model ST (for example, as parallel light when the second light source 210 is disposed at the focal position of the reflecting surface 222).

[0090] The processing light EL is irradiated onto the workpiece W from above, and the forming material M is supplied to the irradiation position of the processing light EL, thereby stacking a plurality of layers (structural layers SL) of the object ST on the workpiece W. The rotational movement unit 231 may rotate the reflecting mirror 221 of the second irradiation optical system 220 upward to change the irradiation position of the heating light HL1 in the direction in which the stacking of the object ST progresses (upward). The translation unit 236 may translate the reflecting mirror 221 horizontally to change the size of the area irradiated with the heating light HL1 in accordance with the direction in which the stacking of the object ST progresses. As in the first embodiment, the control device 90 may control the heating region HT for heating the object ST so that it does not change while at least one structural layer SL of the object ST is being formed. This allows the object ST to be appropriately heated as the object ST is stacked.

[0091] According to the second embodiment, the left and right second irradiation units 200L and 200R irradiate the model ST with heating light to heat the model ST, and therefore, the same effects as those of the first embodiment can be obtained.

[0092] [Modification of Second Embodiment] In the second embodiment described above, the reflecting mirror 221 of the second irradiation optical system 220 has a reflecting surface 222 formed in a parabolic shape. However, this is not limited to this. Therefore, a first modification of the second embodiment will be described with reference to FIG. 18 . As shown in FIG. 18 , the reflecting mirror 241 of the second irradiation optical system according to the first modification has a reflecting surface 242 formed in an ellipsoidal shape. The reflecting surface 242 of the reflecting mirror 241 reflects the heating light HL1 from the second light source 210 toward the object ST. The second light source 210 may be disposed at the focal position of the ellipsoidal reflecting surface 242. This allows the heating light HL1 reflected by the reflecting surface 242 to be concentrated toward the object ST, thereby increasing the irradiation intensity of the heating light HL1 irradiated onto the side surface of the object ST.

[0093] 18 shows the relationship between the vertical position (Z-axis direction) on the side surface of the object ST and the irradiation intensity Ee of the heating light HL1 irradiated onto the side surface of the object ST. When the reflecting surface 242 is formed into an ellipsoidal shape, the irradiation intensity Ee of the heating light HL1 irradiated onto the side surface of the object ST is distributed so that it is concentrated on a part of the object ST. In this case, the irradiation area of ​​the heating light HL1 is relatively small, but the irradiation intensity Ee of the heating light HL1 is relatively large.

[0094] Next, a second modified example of the second embodiment will be described with reference to Figures 19 and 20. As shown in Figures 19 and 20, the left-side second irradiation unit 250L according to the second modified example includes a second light source 260, a second irradiation optical system 270, a light source support unit 265, a light source moving unit 266, a first reflecting mirror support unit 275A, a second reflecting mirror support unit 275B, a first deformation drive unit 280A, and a second deformation drive unit 280B. In the second modified example, the right-side second irradiation unit 250R has the same configuration as the left-side second irradiation unit 250L, and detailed illustrations and descriptions thereof will be omitted.

[0095] The second light source 260 has a configuration similar to that of the second light source 160 according to the first embodiment. The second irradiation optical system 270 includes a reflecting mirror 271. The reflecting mirror 271 is formed of an elastically deformable material (e.g., a metal material) in the shape of a plate curved into an elliptically shape when viewed from the side. The reflecting mirror 271 has a reflecting surface 272 that is elliptically shaped when viewed from the side. The reflecting surface 272 of the reflecting mirror 271 reflects the heating light from the second light source 260 toward the model. The second light source 260 is disposed at one focal position F1 of the reflecting surface 272 that is elliptically shaped when viewed from the side. This allows the heating light reflected by the reflecting surface 272 to be concentrated toward the model (the other focal position F2), thereby increasing the irradiation intensity of the heating light irradiated onto the side surface of the model.

[0096] The light source support part 265 is formed in a crank shape that extends around the side of the reflecting mirror 271. The tip end of the light source support part 265 supports the second light source 260 so that it can move horizontally. The base end of the light source support part 265 is connected to the light source moving part 266. The light source moving part 266 is configured using, for example, a linear guide or a servo motor. The light source moving part 266 moves the second light source 260 supported by the light source support part 265 in the horizontal direction in accordance with one focal position F1 of the elliptical reflecting surface 272.

[0097] The first reflecting mirror support part 275A is arranged in contact with the upper side of the reflecting mirror 271 of the second irradiation optical system 270. The first reflecting mirror support part 275A supports the upper part of the reflecting mirror 271 in a deformable manner. The first reflecting mirror support part 275A is connected to the first deformation drive part 280A so as to be movable in the vertical direction. The second reflecting mirror support part 275B is arranged in contact with the lower side of the reflecting mirror 271. The second reflecting mirror support part 275B supports the lower part of the reflecting mirror 271 in a deformable manner. The second reflecting mirror support part 275B is connected to the second deformation drive part 280B so as to be movable in the vertical direction.

[0098] The first deformation driver 280A and the second deformation driver 280B are configured using, for example, a linear guide, a servo motor, etc. The first deformation driver 280A moves the first reflecting mirror support part 275A in the vertical direction. The second deformation driver 280B moves the second reflecting mirror support part 275B in the vertical direction.

[0099] For example, the first deformation driver 280A moves the first reflecting mirror support 275A upward, and the second deformation driver 280B moves the second reflecting mirror support 275B downward, thereby widening the gap between the first reflecting mirror support 275A and the second reflecting mirror support 275B. As a result, the reflecting mirror 271 is pulled by the first reflecting mirror support 275A and the second reflecting mirror support 275B and deforms, so that, as shown in FIG. 19 , the minor axis of the elliptical reflecting surface 272 becomes relatively longer and the major axis of the elliptical reflecting surface 272 becomes relatively shorter. Furthermore, one focal position F1 and the other focal position F2 of the elliptical reflecting surface 272 move closer to each other. At this time, the light source moving unit 266 moves the second light source 260 supported by the light source support 265 horizontally to one focal position F1 of the elliptical reflecting surface 272.

[0100] For example, the first deformation driver 280A moves the first reflecting mirror support 275A downward, and the second deformation driver 280B moves the second reflecting mirror support 275B upward, thereby narrowing the gap between the first reflecting mirror support 275A and the second reflecting mirror support 275B. As a result, the reflecting mirror 271 is sandwiched between the first reflecting mirror support 275A and the second reflecting mirror support 275B and deforms, so that, as shown in FIG. 20 , the minor axis of the elliptical reflecting surface 272 becomes relatively shorter and the major axis of the elliptical reflecting surface 272 becomes relatively longer. Furthermore, one focal position F1 and the other focal position F2 of the elliptical reflecting surface 272 move away from each other. At this time, the light source moving unit 266 moves the second light source 260 supported by the light source support 265 horizontally to one focal position F1 of the elliptical reflecting surface 272.

[0101] As a result, the first deformation driver 280A and the second deformation driver 280B can change the irradiation area to match the model by deforming the reflecting mirror 271, which has an elliptical shape when viewed from the side. Note that in the second modified example, the reflecting mirror 271 may be formed by connecting plate-like members capable of reflecting the heating light from the second light source 260 in an elliptical shape.

[0102] Next, a third modified example of the second embodiment will be described with reference to Fig. 21. As shown in Fig. 21, the left-side second irradiation unit 290L according to the third modified example includes a second light source 291 and a second irradiation optical system 295 having a lens 296. In the third modified example, the right-side second irradiation unit 290R has the same configuration as the left-side second irradiation unit 290L, and detailed illustration and description thereof will be omitted.

[0103] The second light source 291 is configured similarly to the second light source 160 according to the first embodiment. The lens 296 of the second irradiation optical system 295 guides the heating light HL1 from the second light source 291 to the side surface of the model ST. The lens 296 of the second irradiation optical system 295 may be composed of a single lens or multiple lenses.

[0104] The left-side second irradiation unit 290L may also include a rotational movement unit (not shown) that rotates and moves the second light source 291 and the second irradiation optical system 295 together in the vertical direction (around an axis perpendicular to the optical axis of the second irradiation optical system 295). The rotational movement unit can change the irradiation area RA to match the object ST by rotating the second light source 291 and the second irradiation optical system 295 together in the vertical direction. For example, the rotational movement unit may rotate the second light source 291 and the second irradiation optical system 295 together in the upward direction to change the irradiation position of the heating light HL1 in the direction in which the stacking of the object ST progresses (upward).

[0105] Third Embodiment Next, a modeling system according to a third embodiment will be described with reference to FIGS. 22 to 24. The modeling system SYS3 according to the third embodiment has the same configuration as the modeling system SYS1 according to the first embodiment, except for the configurations of the left and right second irradiation units 350L and 350R. Therefore, the same components as those in the first embodiment are denoted by the same reference numerals as those in the first embodiment, and detailed description thereof will be omitted.

[0106] 23 and 24 , the left-side second irradiation unit 350L according to the third embodiment includes a second irradiation optical system 360L and a reflecting mirror driver 375L. As also shown in Fig. 22 , the second irradiation optical system 360L is optically connected to a second light source 310L that emits (generates) the heating light HL1 via an optical transmission member 315L. An optical fiber, a light pipe, or the like may be used as an example of the optical transmission member 315L.

[0107] The second light source 310L emits light including an infrared region (for example, infrared light) as the heating light HL1. By using infrared light as the heating light HL1, it becomes possible to heat the model ST. Here, the light in the infrared region may be light with a wavelength of 800 nm or more. Note that other types of light, such as ultraviolet light or visible light, may be used as the heating light HL1 as long as it is capable of heating the model ST. The heating light HL1 may be laser light. In this case, the second light source 310L may include a laser light source (for example, a semiconductor laser such as a laser diode). Examples of laser light sources include fiber lasers, CO ２ Laser, YAG laser, excimer laser, etc. may also be used.

[0108] The second irradiation optical system 360L emits the heating light HL1 propagating from the second light source 310L via the optical transmission member 315L. The second irradiation optical system 360L irradiates the heating light HL1 in a right front direction toward the left side surface of the model ST. As shown in FIGS. 23 and 24 , the second irradiation optical system 360L includes a diffusing member 361L and a reflecting mirror 371L. The diffusing member 361L is configured using, for example, a zoom homogenizer. The diffusing member 361L diffuses the heating light HL1 propagating from the second light source 310L. By diffusing the heating light HL1, the diffusing member 361L can change the size of the heating light HL1 irradiated onto the left side surface of the model ST. Note that the diffusing member 361L may also be configured using a beam expander.

[0109] The reflecting mirror 371L is a plane mirror having a planar reflecting surface 372L. The reflecting surface 372L of the reflecting mirror 371L reflects the heating light HL1 diffused by the diffusing member 361L toward the model ST. The reflecting mirror driving unit 375L is configured using, for example, a servo motor. The reflecting mirror driving unit 375L rotates the reflecting mirror 371L of the second irradiation optical system 360L up and down (around a rotation axis perpendicular to the optical axis of the second irradiation optical system 360L). By rotating the reflecting mirror 371L up and down, the reflecting mirror driving unit 375L can move the irradiation position of the heating light HL1 up and down on the left side surface of the model ST.

[0110] The reflecting mirror driver 375L rotates the reflecting mirror 371L of the second irradiation optical system 360L, or the diffusing member 361L diffuses the heating light HL1, thereby changing the left irradiation area RA1 to match the model ST. For example, the reflecting mirror driver 375L may rotate the reflecting mirror 371L upward to change the irradiation position of the heating light HL1 in the direction in which the stacking of the model ST progresses (upward). The diffusing member 361L may further diffuse the heating light HL1 to change the size of the area irradiated with the heating light HL1 to match the direction in which the stacking of the model ST progresses.

[0111] Similar to the left-side second irradiation unit 350L, the right-side second irradiation unit 350R according to the third embodiment includes a second irradiation optical system 360R and a reflecting mirror driver 375R. The second irradiation optical system 360R is optically connected to a second light source 310R that emits (generates) the heating light HL2 via an optical transmission member 315R. An optical fiber, a light pipe, or the like may be used as an example of the optical transmission member 315R.

[0112] The second light source 310R emits light including an infrared region (for example, infrared light) as the heating light HL2. The second light source 310R has the same configuration as the second light source 310L of the left second irradiation unit 350L.

[0113] The second irradiation optical system 360R emits the heating light HL2 propagated from the second light source 310R via the optical transmission member 315R. The second irradiation optical system 360R irradiates the heating light HL2 in a left-front direction toward the right side surface of the model ST. Similar to the second irradiation optical system 360L of the left-side second irradiation unit 350L, the second irradiation optical system 360R includes a diffusing member 361R and a reflecting mirror 371R. The diffusing member 361R diffuses the heating light HL2 propagated from the second light source 310R. By diffusing the heating light HL2, the diffusing member 361R can change the size of the heating light HL2 irradiated toward the right side surface of the model ST. Note that the diffusing member 361R may be configured using a beam expander.

[0114] The reflecting mirror 371R is a plane mirror having a planar reflecting surface 372R. The reflecting surface 372R of the reflecting mirror 371R reflects the heating light HL2 diffused by the diffusing member 361R toward the model ST. The reflecting mirror driving unit 375R rotates the reflecting mirror 371R of the second irradiation optical system 360R up and down (around a rotation axis perpendicular to the optical axis of the second irradiation optical system 360R). By rotating the reflecting mirror 371R up and down, the reflecting mirror driving unit 375R can move the irradiation position of the heating light HL2 up and down on the left side surface of the model ST.

[0115] The reflecting mirror driving unit 375R rotates the reflecting mirror 371R of the second irradiation optical system 360R, or the diffusing member 361R diffuses the heating light HL2, thereby changing the right-side irradiation area RA2 to match the model ST. For example, the reflecting mirror driving unit 375R may rotate the reflecting mirror 371R upward to change the irradiation position of the heating light HL2 in the direction in which the stacking of the model ST progresses (upward). The diffusing member 361R may further diffuse the heating light HL2 to change the size of the area irradiated with the heating light HL2 to match the direction in which the stacking of the model ST progresses.

[0116] [Modeling Method] Next, a modeling method using a modeling system SYS3 according to the third embodiment will be described. In the third embodiment, the modeling device 20 models the model ST using the same control as in the first embodiment, while the left and right second irradiation units 350L and 350R heat the model ST. At this time, the left second irradiation unit 350L according to the third embodiment heats the left side surface of the model ST by irradiating the left side surface of the model ST with heating light HL1 in a forward right direction toward a position lower than the irradiation position of the processing light EL on the left side surface of the model ST. The right second irradiation unit 350R according to the third embodiment heats the right side surface of the model ST by irradiating the right side surface of the model ST with heating light HL2 in a forward left direction toward a position lower than the irradiation position of the processing light EL on the right side surface of the model ST.

[0117] In the left-side second irradiation unit 350L, the heating light HL1 propagating from the second light source 310L via the optical transmission member 315L is diffused by the diffusing member 361L of the left-side second irradiation unit 350L. The heating light HL1 diffused by the diffusing member 361L is reflected toward the model ST by the reflecting surface 372L of the reflecting mirror 371L. The heating light HL1 reflected by the reflecting surface 372L is irradiated onto the left side surface of the model ST.

[0118] In the right-side second irradiation unit 350R, the heating light HL2 propagating from the second light source 310R via the optical transmission member 315R is diffused by the diffusing member 361R of the right-side second irradiation unit 350R. The heating light HL2 diffused by the diffusing member 361R is reflected by the reflecting surface 372R of the reflecting mirror 371R toward the model ST. The heating light HL2 reflected by the reflecting surface 372R is irradiated onto the right side surface of the model ST.

[0119] The processing light EL is irradiated toward the workpiece W from above, and a modeling material M is supplied to the irradiation position of the processing light EL, thereby stacking a plurality of layers (structural layers SL) of a model ST on the workpiece W. In the left-side second irradiation unit 350L, the reflecting mirror drive unit 375L may rotate and move the reflecting mirror 371L of the second irradiation optical system 360L upward to change the irradiation position of the heating light HL1 in the direction in which the stacking of the model ST progresses (upward). The diffusing member 361L may further diffuse the heating light HL1 to change the size of the heating light HL1 irradiated in accordance with the direction in which the stacking of the model ST progresses.

[0120] Furthermore, in the right-side second irradiation unit 350R, the reflecting mirror driving unit 375R may rotate and move the reflecting mirror 371R of the second irradiation optical system 360R upward to change the irradiation position of the heating light HL2 in the direction in which the stacking of the object ST progresses (upward). The diffusing member 361R may further diffuse the heating light HL2 to change the size of the heating light HL2 irradiated in accordance with the direction in which the stacking of the object ST progresses. Note that in this case, as in the first embodiment, the control device 90 may control the heating region HT for heating the object ST not to change while at least one structure layer SL of the object ST is being formed. This allows the object ST to be appropriately heated as the object ST is stacked.

[0121] According to the third embodiment, the left and right second irradiation units 350L, 350R heat the object ST by irradiating the object ST with heating light HL1, HL2, so that the same effect as in the first embodiment can be obtained.

[0122] Fourth Embodiment Next, a modeling system according to a fourth embodiment will be described with reference to Fig. 25 and Fig. 26. The modeling system SYS4 according to the fourth embodiment has the same configuration as the modeling system SYS1 according to the first embodiment, except for the configuration of the second irradiation unit 450. Therefore, the same components as those in the first embodiment are denoted by the same reference numerals as those in the first embodiment, and detailed description thereof will be omitted.

[0123] As shown in Figures 25 and 26, the second irradiation unit 450 according to the fourth embodiment is connected to and held on the outer periphery of the head housing 25 of the first irradiation unit 21. As described above, the first irradiation optical system 22 and the material nozzle 24 are housed and held in the internal storage space of the head housing 25. The head housing 25 may also be referred to as a holder. Four second irradiation units 450 are arranged side by side along the outer periphery of the head housing 25. Each of the four second irradiation units 450 irradiates heating light HL in a direction inclined with respect to the optical axis EX of the first irradiation optical system 22 toward an irradiation area RA set below the first irradiation optical system 22. The irradiation area RA is set in an area that overlaps with the heating area HT (see Figure 4) of the object ST when the object ST is formed.

[0124] The second irradiation unit 450 includes a second light source 460 and a light source connecting member 465. The light source connecting member 465 is formed in the shape of an arm extending laterally from the outer periphery of the head housing 25 and connects the outer periphery of the head housing 25 to the second light source 460. As described above, in the fourth embodiment, a supply path for the modeling material M is established in the space between the optical path of the processing light EL from the first irradiation optical system 22 and the optical path of the heating light HL from the second irradiation unit 450. In other words, in the fourth embodiment, the angle between the optical path of the heating light HL from the second irradiation unit 450 and the optical axis EX of the first irradiation optical system 22 is larger than the angle between the supply path for the modeling material M and the optical axis EX of the first irradiation optical system 22. The second light source 460 emits light including an infrared range (e.g., infrared light) as the heating light HL. In this case, the second light source 460 may be configured using, for example, a far-infrared point heater. By using infrared light as the heating light HL, it is possible to heat the model ST. Here, the light in the infrared region may be light with a wavelength of 800 nm or more. Note that other types of light, such as ultraviolet light or visible light, may also be used as the heating light HL as long as it is capable of heating the model ST.

[0125] [Modeling Method] Next, a modeling method using the modeling system SYS4 according to the fourth embodiment will be described. In the fourth embodiment, the modeling device 20 models the model ST using the same control as in the first embodiment, while the four second irradiation units 450 heat the model ST. At this time, the four second irradiation units 450 heat the side surface of the model ST by irradiating the heating light HL toward a position lower than the irradiation position of the processing light EL on the side surface of the model ST.

[0126] In the second irradiation unit 450, the heating light HL emitted from the second light source 460 is irradiated onto the side surface (irradiation area RA) of the object ST. Processing light EL is irradiated onto the workpiece W from above, and a modeling material M is supplied to the irradiation position of the processing light EL, thereby stacking a plurality of layers (structural layers SL) of the object ST on the workpiece W. As the object ST is stacked, the second irradiation unit 450 (second light source 460) moves upward together with the head housing 25 (first irradiation optical system 22 and material nozzle 24), changing the irradiation position of the heating light HL in the direction in which the object ST is stacked. This allows the object ST to be appropriately heated as the object ST is stacked.

[0127] According to the fourth embodiment, the second irradiation unit 450 heats the object ST by irradiating the object ST with the heating light HL, and therefore, the same effect as in the first embodiment can be obtained. Furthermore, since the second irradiation unit 450 is connected to and held on the outer periphery of the head housing 25 of the first irradiation unit 21, the configuration of the second irradiation unit 450 can be simplified.

[0128] At least some of the components of each of the above-described embodiments can be appropriately combined with at least some of the other components of each of the above-described embodiments. Some of the components of each of the above-described embodiments may not be used.

[0129] The present invention is not limited to the above-described embodiments, but can be modified as appropriate within the scope that does not contradict the gist or idea of ​​the invention that can be read from the claims and the entire specification, and molding systems and molding methods that involve such modifications are also included in the technical scope of the present invention.

[0130] 10 Material supply source 20 Modeling apparatus 21 First irradiation unit 22 First irradiation optical system 24 Material nozzle 25 Head housing 85 Temperature measurement device 90 Control device 150L Left side second irradiation unit (first embodiment) 150R Right side second irradiation unit 200L Left side second irradiation unit (second embodiment) 200R Right side second irradiation unit 250L Left side second irradiation unit (modified example) 250R Right side second irradiation unit 290L Left side second irradiation unit (modified example) 290R Right side second irradiation unit 350L Left side second irradiation unit (third embodiment) 350R Right side second irradiation unit 450 Second irradiation unit (fourth embodiment) SYS1 Modeling system (first embodiment) SYS3 Modeling system (third embodiment) SYS4 Modeling system (fourth embodiment)

Claims

1. A modeling system comprising: a first irradiation unit that includes an irradiation optical system having an optical axis along a first direction, and is capable of irradiating a first energy beam from above the object toward the object, and a supply unit that supplies modeling material to the irradiation position of the first energy beam, and is capable of modeling a model on the object; and a second irradiation unit that is capable of heating the model and is capable of irradiating the model with a second energy beam in a second direction that intersects with the first direction, wherein the second irradiation unit is capable of irradiating the second energy beam below the irradiation position of the first energy beam.

2. The molding system according to claim 1, wherein the second irradiation unit is capable of irradiating a side surface of the object with the second energy beam.

3. An object-making system as described in claim 1 or 2, wherein the energy source of the second irradiation unit and the energy source of the first irradiation unit are different.

4. The molding system according to any one of claims 1 to 3, further comprising a control device.

5. The molding system according to claim 4, wherein the control device controls the second irradiation unit to adjust the cooling rate of the molded object.

6. The molding system according to claim 4 or 5, wherein the control device controls to change the irradiation area of ​​the second energy beam by the second irradiation unit.

7. The molding system described in claim 6, further comprising a temperature measuring device that measures the temperature of the molded object, and the control device changes the irradiation area of ​​the second energy beam based on the measurement result of the temperature measuring device.

8. A molding system according to any one of claims 4 to 7, wherein the control device controls so that a modeling period in which the modeling device models the object and a heating period in which the second irradiation unit heats the object overlap.

9. The molding system according to any one of claims 4 to 8, wherein the control device controls the molding device to mold the object from above the object, while the second irradiation unit heats the already molded object from the side.

10. The molding system of claim 6, wherein changing the irradiation area includes at least one of changing the irradiation position of the second energy beam and changing the size of the area irradiated by the second energy beam.

11. A molding system as described in claim 6 or 10, wherein molding by the molding device is performed by repeatedly stacking the object, and changing the irradiation area includes changing the irradiation position of the second energy beam in the direction in which the stacking of the object progresses.

12. The modeling system according to any one of claims 1 to 11, wherein a direction in which the modeling device stacks the modeled objects is the first direction.

13. The molding system according to any one of claims 1 to 12, wherein the second irradiation unit is capable of concentrating the second energy beam.

14. The molding system of claim 13, wherein the second irradiation unit includes a light source that emits light in the infrared range, and the second energy beam is infrared light.

15. An embodied modeling system according to any one of claims 1 to 12, wherein the second irradiation section includes a diffusion member that diffuses the second energy beam.

16. The molding system of claim 15, wherein the second irradiation unit includes a laser light source and the second energy beam is laser light.

17. The modeling system according to any one of claims 1 to 16, wherein the second energy beam is capable of heating a portion other than the model.

18. The molding system according to any one of claims 1 to 17, wherein the second energy beam is capable of heating the object supported by a support device.

19. The manufacturing system according to any one of claims 1 to 18, wherein the second energy beam is a non-modeling energy beam.

20. An object-making system according to any one of claims 1 to 19, wherein the second irradiation unit includes an irradiation area change unit that changes the irradiation area of ​​the second energy beam on the object.

21. The molding system described in claim 20, wherein the second irradiation unit includes a reflector that reflects the second energy beam from an energy source toward the molded object, and the irradiation area change unit changes the irradiation area by moving the reflector.

22. The molding system described in claim 21, wherein the reflector has a reflecting surface formed in a paraboloid shape to reflect the second energy beam from the energy source toward the object, and the energy source is positioned at a focal position of the paraboloid-shaped reflecting surface.

23. The object-making system of claim 21 or 22, wherein the second irradiation unit includes a focusing optical system that focuses the second energy beam reflected by the reflecting mirror, and a light-guiding optical system that guides the second energy beam focused by the focusing optical system to the object, and the irradiation area changing unit changes the irradiation area by moving the reflecting mirror, the focusing optical system, and the light-guiding optical system together.

24. The modeling system according to claim 23, wherein the light guiding optical system is movable in an optical axis direction of the light guiding optical system.

25. The modeling system of claim 21, wherein the reflector has a reflecting surface formed in an ellipsoid shape to reflect the second energy beam from the energy source toward the model, and the energy source is positioned at a focal position of the reflecting surface in the shape of the ellipsoid.

26. The molding system described in claim 21, wherein the second irradiation unit includes a diffusion member that diffuses the second energy beam, and the reflector is a plane mirror that reflects the second energy beam diffused by the diffusion member toward the molded object.

27. The molding system according to any one of claims 1 to 19, further comprising a holding unit capable of holding and moving the supply unit, the first irradiation unit, and the second irradiation unit above the object.

28. A method for forming a structure comprising: irradiating a first energy beam from above an object toward the object in a first direction, and forming a structure on the object by supplying a modeling material to a position irradiated by the first energy beam; and heating the structure by irradiating a second energy beam in a second direction intersecting the first direction and below the position irradiated by the first energy beam.

29. A modeling system comprising: a modeling device having a first irradiation unit capable of irradiating a first energy beam from above the object towards the object, and a supply unit that supplies modeling material to a position irradiated by the first energy beam, and capable of modeling a model on the object; a second irradiation unit capable of heating the model and irradiating the model with a second energy beam; and a control device, wherein the modeling device is capable of modeling the model on the object by stacking a plurality of layers of the model, and the control device controls the area in which the model is heated by the second irradiation unit so as not to change when modeling at least one layer of the plurality of layers.

30. A modeling method comprising: irradiating a first energy beam toward an object from above the object, and stacking a plurality of layers of models on the object by supplying modeling material to a position irradiated by the first energy beam; heating the model by irradiating a second energy beam onto the model; and controlling the area of ​​the model to be heated so as not to change when modeling at least one of the plurality of layers.

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