Apparatus and method for the thermal conversion and nanostructuring of a first material into a second material

Abstract

Described is an apparatus (1) for the thermal conversion of a first carbon- based material into a second material, having features different from the first material, comprising: a frame (10), including a holding surface (101 ), configured to support the first material, and a supporting structure (102); a operating unit (11), associated with the supporting structure (102) and including an emitter (111), configured for emitting an electromagnetic wave along an operating direction (DL) in a operating sense (VL), oriented by the operating unit (11 ) to the holding surface (101) and an optical system (112), configured for focusing the electromagnetic wave towards the first material, for generating a surface of incidence of the electromagnetic wave on the holding surface (101 ). The holding surface (101) and the operating unit (11 ) are relatively mobile for varying a position (PI) of incidence of the electromagnetic wave on the holding surface (101). The apparatus comprises a control unit (12), configured for sending control signals (S1) to the operating unit (11) or to the holding surface (101), for controlling a reciprocal movement between the operating unit (11) and the holding surface (101 ). The position of incidence (PI) on the holding surface (101) is aligned along the operating direction (DL) with the emitter (111) of the operating unit (11).

Description

[0001] DESCRIPTION

[0002] APPARATUS AND METHOD FOR THE THERMAL CONVERSION AND NANOSTRUCTURING OF A FIRST MATERIAL INTO A SECOND MATERIAL

[0003] Technical field

[0004] This invention relates to an apparatus and a method for the thermal conversion of a first material into a second material. In the thermal conversion sector, various experiments have been carried out with the aim of understanding the best ways of thermal converting materials. In particular, the making of the second material starting from the first material makes significant applications for industrial products possible.

[0005] Background art

[0006] There are prior art academic studies relating to the possibility of making interdigitated micro-supercapacitors and sensors based on the thermal conversion into graphene by laser technology using various techniques. According to a first technique, graphene is obtained by laser conversion of a thin layer of graphite oxide deposited on a plastic support. Graphite oxide is the precursor material commonly used for the chemical synthesis of graphene, since it is a metastable and water soluble system which, if heated quickly, frees its functional groups in the form of gas and exfoliates in the form of monoatomic layers of carbon.

[0007] According to an alternative technique, the possibility is also known of writing in graphene with conversion of graphite oxide by the power of the laser of a burner of a common computer. This technique is known as “Laser-Scribed Graphene” (LSG). Lastly, the LIG technique, Laser Induced Graphene, is also known, in which a CO2 laser is used and in which it is not necessary to deposit the precursor (for example, graphite oxide) on a support. This latter technique, although more effective than the others, shares with the others some common drawbacks which are, amongst other things, the lack of consistency of the laser, the lack of versatility, the lack of repeatability and the lack of integrability in an industrial process aimed at the industrial production of industrial products which use these thermal conversion techniques.

[0008] Aim of the invention

[0009] The aim of this invention is to provide an apparatus and a method which overcome the above-mentioned drawbacks of the prior art.

[0010] Said aim is fully achieved by the apparatus and the method according to the invention as characterised in the appended claims.

[0011] According to an aspect of the invention, the invention provides an apparatus for the thermal conversion and / or nanostructuring of a first carbon-based material for generating a second material, having features different from the first material.

[0012] According to an embodiment, the first material is one of the following materials:

[0013] - graphite oxide;

[0014] - polyimide;

[0015] - biochar

[0016] According to an embodiment, the second material is one of the following materials:

[0017] - graphene;

[0018] - carbon nanostructures

[0019] The apparatus comprises a frame. The frame comprises a holding surface, configured for supporting the first material (that is, for holding a support on which the first material is positioned). The frame comprises a supporting structure. The supporting structure keeps the apparatus on the ground or on any supporting surface on which the apparatus is positioned.

[0020] The apparatus comprises an operating unit, associated with the supporting structure. The operating unit comprises an emitter, designed for emitting an electromagnetic wave along an operating direction in an operating sense, oriented from the operating unit to the holding surface.

[0021] The operating unit comprises an optical system. The optical system is configured for focusing the electromagnetic wave towards the first material, for generating a surface of incidence of the electromagnetic wave on the holding surface.

[0022] The incidence of the electromagnetic wave on the first material allows the thermal conversion of the first material into the second material. Moreover, the electromagnetic wave has an effect on the first material for re-ordering the material which allows a restructuring of the material at a nanometric level, which allows the generation of the second material.

[0023] The holding surface and the operating unit are relatively mobile for varying a position of incidence of the electromagnetic wave on the holding surface. That means that the invention aims to protect both the solutions in which the operating unit moves relative to the holding surface and relative to the supporting structure and those solutions in which it is the holding surface moving relative to the holding surface and relative to the supporting structure.

[0024] The apparatus comprises a control unit. The control unit is configured for sending control signals to the operating unit or to the holding surface, for controlling the reciprocal movement between the operating unit and the holding surface.

[0025] According to an embodiment, the distance travelled by the electromagnetic wave from the emitter up to the holding surface is constant during the thermal conversion operations (nanostructuring). According to an embodiment, the position of incidence on the holding surface is aligned along the operating direction with the emitter of the operating unit.

[0026] These features allow a constant optical path during the operations and considerably increase the quality of the thermal conversion (that is, of the nanostructuring) of the first material.

[0027] According to an embodiment, the supporting structure comprises a fixed element, integral with the frame. The supporting structure comprises a movable element, connected to the operating unit. The movable element is movable relative to the fixed element, for moving the operating unit relative to the holding surface, which is integral with the frame.

[0028] Alternatively (or in addition), the holding surface comprises a fixed part, integral with the frame, and a movable part, movable relative to the frame and relative to the operating unit for varying the position of incidence of the electromagnetic wave on the holding surface.

[0029] Preferably, the emitter is configured for emitting an electromagnetic wave with a power of less than 80 W, preferably 50 W, even more preferably between 30 W and 50 W.

[0030] The control unit is programmed for varying the power of the electromagnetic wave in a range of between 0.5 W and 20 W, preferably between 1 and 15 W or between 2 and 10 W, even more preferably between 3 and 5 W.

[0031] According to an embodiment, the optical system is configured for generating a surface of incidence of the electromagnetic wave which has a point-like, linear, regional and / or circular shape. This allows the emission of the laser to be adapted to the widest range of industrial needs, thus reducing the processing times on the basis of the specific application.

[0032] According to an embodiment, the operating unit is configured for defocusing the electromagnetic wave. This allows an increase in the incidence surface of the laser beam for treating a larger area.

[0033] According to an embodiment, the control unit is programmed for controlling the power of the electromagnetic wave in combination with the defocussing of the electromagnetic wave, in such a way as to define, for each operation, an optimum regional power to obtain the requested thermal conversion.

[0034] According to an embodiment, the emitter comprises one or more of the following features (that is, one or more of the following types of source):

[0035] - sealed source;

[0036] - CO2 source; - fibre source emitting electromagnetic waves at a wavelength of between 900 and 1300 gm;

[0037] - diode source;

[0038] - UV source;

[0039] - magnetic field source (variable or static);

[0040] - cable source for microwaves with a frequency of between 2 GHz and 3 GHz, preferably 2.5 GHz.

[0041] According to a preferred embodiment, the electromagnetic wave is a laser. Advantageously, the apparatus comprises a treatment chamber.

[0042] The treatment chamber includes a base. The base preferably defines the holding surface. The treatment chamber includes an inner space, in which the first material can be positioned.

[0043] The treatment chamber comprises an intermediate wall, interposed, along the operating direction, between the operating unit and the holding surface. The intermediate wall is made of a material transparent to the electromagnetic wave.

[0044] The treatment chamber comprises at least one access, configured to allow an insertion and / or a removal of the first material from the treatment chamber.

[0045] According to a first embodiment, the intermediate wall is removable, to allow an access to the inner space. For this reason, according to this embodiment, the intermediate wall defines said at least one access to the treatment chamber.

[0046] Optionally, the apparatus comprises a conveyor, configured for loading and unloading the first material and the second material, respectively, from the treatment chamber. The conveyor could be, for example, a robotic arm, a conveyor belt, a generic robot conveyor. According to this embodiment, the conveyor removes the intermediate wall, positions the first material, closes the intermediate wall and, after the thermal conversion, again removes the intermediate wall and unloads the second material generated, and then re-introduces, again, a further portion of first material (preferably in a continuous cycle for processing in line).

[0047] According to an embodiment, the apparatus comprises a pump. The treatment chamber comprises a pumping opening. The pump is configured for sucking the air inside the treatment chamber. Moreover, in addition or alternatively, the pump is configured for pumping inside a gas. Preferably, the gas pumped into it is an inert gas.

[0048] The presence of the pump allows a control of the pressure of the treatment chamber and the nature of the gas contained therein which considerably reduce undesired phenomena and reactions and which reduce the quality of the processing operations. The presence of the suction also improves the sealing performance of the intermediate wall and, if necessary, of the first and second door.

[0049] Advantageously, the apparatus comprises a thermal conditioning system. The thermal conditioning system is associated with the holding surface. The thermal conditioning system is configured for dissipating the heat generated by the operating unit. The thermal conditioning system is configured for conditioning thermal and / or hygrometric parameters inside the treatment chamber.

[0050] According to an embodiment, the conditioning system comprises a Peltier cell, for the thermal conditioning of the treatment chamber. According to other particularly advantageous embodiments, the base of the treatment chamber comprises a heat exchanger, through which thermal conditioning fluid flows connected to a thermal conditioning circuit, for example a refrigerating circuit.

[0051] This allows optimum removal of heat in the treatment chamber, which prevents damage to the material being processed.

[0052] Advantageously, the apparatus comprises a user interface.

[0053] The control unit is programmed for receiving operating data, representing a component to be treated and a corresponding operation to be performed, for example using the user interface.

[0054] The control unit is programmed for recovering configuration data in a data archive; the configuration data includes one or more of the following parameters:

[0055] - a power value of the electromagnetic wave;

[0056] - characteristic parameters of the electromagnetic wave;

[0057] - mode of emitting the electromagnetic wave (continuous, pulsed);

[0058] - a distance of the operating unit from the holding surface along a normal direction, perpendicular to the holding surface;

[0059] - parameters for focusing the wave;

[0060] - a trend of the time of incidence of the electromagnetic wave during the operation;

[0061] - the type of first or second material;

[0062] - the type of processing to be performed.

[0063] - a movement profile representing the reciprocal movement between the operating unit and the holding surface.

[0064] The control unit is programmed for generating the control signals, as a function of the configuration data recovered.

[0065] The control unit is programmed to send the control signals to the operating unit for instructing it to vary the power value of the electromagnetic wave and / or the distance of the operating unit from the holding surface.

[0066] This allows an wide flexibility of the machines relative to the processing operations and to the relative applications which make it highly suitable for the industrial context.

[0067] In one embodiment, the control unit is programmed to receive or derive movement data, representing a relative movement between the operating unit and the holding surface (for example included in the configuration data or inserted separately).

[0068] The control unit is programmed for deriving, on the basis of the movement data, an extension of a stroke of the operating unit relative to the holding surface. The control unit is programmed to compare the extension of the stroke of the operating unit with a predetermined value.

[0069] The control unit is programmed to control a movement of the operating unit equal to the entire extent of the stroke for values smaller than the predetermined value or commanding a movement of the operating unit, equal to a portion of the extension of the stroke, for values greater than the predetermined value.

[0070] This aspect of the invention is very important to reduce to a minimum the vibrations due to the inertia of the operating unit which moves relative to the holding surface (the same features also apply to the case in which the holding surface is the movable element). In fact, the control unit has a limit of stroke beyond which it controls the movement with reduced movements which, therefore, reduce the extent of the vibrations. Therefore, when the vibration is on an acceptable level, the stroke is achieved completely. When, on the other hand, the stroke is such as to cause vibrations which are unacceptable for the quality standards, the control unit switches off the movement.

[0071] According to an aspect of the invention, the invention provides a method for the thermal conversion and the nanostructuring of a first carbon-based material for generating a second material, having features different from the first material.

[0072] The method comprises a step of preparing a frame, including a holding surface, on which the first material is held, and a supporting structure.

[0073] The method comprises a step of preparing an operating unit, including an emitter and an optical system.

[0074] The method comprises a step of emitting an electromagnetic wave, using the emitter, along an operating direction in an operating sense, oriented by the emitter towards the holding surface.

[0075] The method comprises a step of focussing the electromagnetic wave, by means of the optical system, towards the first material, for generating a surface of predetermined incidence of the electromagnetic wave on the holding surface. The focusing step may optionally include a step of polarising the electromagnetic wave.

[0076] The method comprises a step of relative movement between the holding surface and the operating unit for varying a position of incidence of the electromagnetic wave on the holding surface.

[0077] The method comprises a step, using a control unit, of sending control signals to the operating unit or to the holding surface, for controlling the relative movement between the operating unit and the holding surface.

[0078] According to an embodiment of this method, during the relative movement step, the distance travelled by the electromagnetic wave from the emitter to the incidence on the holding surface remains constant during the processing.

[0079] According to an embodiment of this method, during the relative movement step, the position of incidence on the holding surface remains aligned, along the operating direction, with the emitter of the operating unit.

[0080] Brief description of the drawings

[0081] These and other features will become more apparent from the following description of a preferred embodiment, illustrated by way of non-limiting example in the accompanying drawings, in which:

[0082] - Figure 1 illustrates an apparatus for the thermal conversion of a first material into a second material;

[0083] - Figure 2 illustrates an embodiment of the apparatus of Figure 1 ;

[0084] - Figure 3 illustrates an embodiment of the apparatus of Figure 1 ;

[0085] - Figure 4 illustrates an embodiment of the apparatus of Figure 1 ;

[0086] - Figure 5 illustrates a treatment chamber of the apparatus of Figure 1 .

[0087] Detailed description of preferred embodiments of the invention

[0088] With reference to the accompanying drawings, the numeral 1 denotes an apparatus for the thermal conversion and nanostructuring a first carbonbased material for generating a second material, having features different from the first material.

[0089] The apparatus comprises a frame 10. The frame 10 comprises a holding surface 101 , configured for supporting the first material (that is, for holding a support on which the first material is positioned). The frame 10 comprises a supporting structure 102. The supporting structure 102 keeps the apparatus 1 on the ground or on any supporting surface on which the apparatus 1 is positioned. The supporting structure 102 is raised above the holding surface 101 along an operating direction DL.

[0090] The apparatus 1 comprises an operating unit 11 associated with the supporting structure 102. According to a non-limiting example embodiment, the supporting structure 102 comprises a first crosspiece 102A, elongate along a longitudinal direction D1 , perpendicular to the operating direction DL. The supporting structure 102 comprises a second crosspiece 102A, elongate along a transversal direction, perpendicular to the longitudinal direction D1. The supporting structure 102 comprises an operating actuator 102C, configured for moving the operating unit along the operating direction DL. The operating actuator 102C is connected to the first crosspiece 102A or to the second crosspiece 102B for moving along the longitudinal direction D1 or along the transversal direction. Further, the second crosspiece 102B is slidable along the first crosspiece 102A, or vice versa. In that way, the operating unit 11 has three degrees of freedom and thus defines to all intents and purposes an emitting pantograph.

[0091] The operating unit 11 comprises an emitter 111 , designed for emitting an electromagnetic wave along the operating direction DL in an operating sense VL, oriented from the operating unit 11 to the holding surface 101. The electromagnetic wave is preferably a laser. The operating unit 11 comprises an optical system 112. The optical system 112 is configured for focusing the electromagnetic wave towards the first material, for generating a surface of incidence of the electromagnetic wave on the holding surface 101. The optical system 112 is variable for varying the focusing of the electromagnetic wave, in such a way as to generate, voluntarily, a defocussing of the wave, which is necessary and functional for specific thermal conversion processing.

[0092] According to the embodiment shown in the drawings, the operating unit 11 moves relative to the holding surface 101 to vary a position of incidence PI of the electromagnetic wave on the holding surface.

[0093] The apparatus 1 comprises a control unit 12. The control unit 12 is configured for sending control signals S1 to the operating unit 11 , for controlling the movement of the operating unit 11 relative to the holding surface 101. For example, the control signals are electrical signals sent to a driver of a continuous or stepping electric motor which determines a movement of the operating unit 11 on the first crosspiece 102A, on the second crosspiece 102B or of the operating actuator 102C.

[0094] The distance travelled by the electromagnetic wave from the emitter up to the holding surface, which may be defined as the optical path of the electromagnetic wave, is constant during the thermal conversion operations. According to an embodiment, the position of incidence PI on the holding surface 101 is aligned along the operating direction DL with the emitter 111 of the operating unit 11 .

[0095] According to an embodiment, the emitter 111 comprises a CO2 source. In order to better control the resolution of the laser writing, it is possible to also couple to the CO2 source of the emitter 111 a fibre source in the nearinfrared (I = 1064 pm). The infrared source would allow the resolution limit to be reduced and the incidence surface of the electromagnetic wave to be further reduced. In addition, the use of an infrared source has greater penetrating capacity than the CO2 source, since it has greater thermal conversion capacity, although, in some cases, with a quality generally less than that obtained with the CO2 source laser. Other sources which can be used are those with blue or UV, Ultraviolet, diodes which are particularly suitable for conversion to polyimide graphene.

[0096] Preferably, the emitter 111 is configured for emitting an electromagnetic wave with a power of less than 80 W, preferably 50 W, even more preferably between 30 W and 50 W. According to other embodiments, the powers involved are much higher, with sources which may reach up to 1 kW of power, preferably between 0.5kW and 1 kW.

[0097] The control unit 12 is programmed for varying the power of the electromagnetic wave in a range of between 0.5 W and 20 W, preferably between 1 and 15 W or between 2 and 10 W, even more preferably between 3 and 5 W.

[0098] According to an embodiment, the optical system 112 is configured for generating a surface of incidence of the electromagnetic wave which has a point-like, linear, regional and / or circular shape. In particular, the optical system 112 may include optical units, configured to receive the electromagnetic wave and to divert it so as to obtain a specific incidence surface.

[0099] According to an embodiment, the operating unit 11 is configured for emitting an electromagnetic wave having a linear surface of incidence, for an extension equal to the longitudinal extension of the apparatus 1 or to the transversal extension of the apparatus 1. This makes it possible to make single strokes which process the first material on its entire longitudinal and / or transversal extension.

[0100] According to an embodiment, the optical system 112 could include filters, which allow the electromagnetic wave to be diverted to define a surface of incidence having a specific design, for the thermal conversion of only specific designs of first material, for example specific graphical representations (such as logos or the like).

[0101] According to an embodiment, the operating unit 11 is configured for defocusing the electromagnetic wave. According to this embodiment, the radius of the incidence surface increases with the increase of the distance between the emitter 111 and the holding surface 101. In other words, the electromagnetic wave is divergent and not convergent, as in the case of focusing.

[0102] According to an embodiment, the control unit 12 is programmed for controlling the power of the electromagnetic wave in combination with the defocussing of the electromagnetic wave, in such a way as to define, for each operation, an optimum regional power to obtain the requested thermal conversion.

[0103] The apparatus 1 comprises a treatment chamber 13.

[0104] The treatment chamber 13 includes a base 131. The base 131 preferably defines the holding surface 101. The treatment chamber 13 includes an inner space VI, in which the first material can be positioned.

[0105] The treatment chamber 13 comprises an intermediate wall 132, interposed, along the operating direction DL, between the operating unit 11 and the holding surface 101. The intermediate wall 132 is made of a material transparent to the electromagnetic wave.

[0106] The treatment chamber 13 comprises at least one access AC, configured to allow an insertion and / or a removal of the first material from the treatment chamber 13.

[0107] According to a first embodiment, the intermediate wall 132 is removable, to allow an access to the inner space VI. For this reason, according to this embodiment, the intermediate wall 132 defines said at least one access AC to the treatment chamber 13.

[0108] Optionally, the apparatus 1 comprises a conveyor, configured for loading and unloading the first material and the second material, respectively, from the treatment chamber 13. The conveyor could be, for example, a robotic arm, a conveyor belt, a generic robot conveyor. According to this embodiment, the conveyor removes the intermediate wall 132, positions the first material, closes the intermediate wall 132 and, after the thermal conversion, again removes the intermediate wall 132 and unloads the second material generated, and then re-introduces, again, a further portion of first material (preferably in a continuous cycle for processing in line).

[0109] According to another embodiment (alternative to or which can be combined with the previous one), the treatment chamber 13 comprises a first side wall 133 and a second side wall 134, connected to the base 131 and to the intermediate wall 132. The first side wall 133 comprises a first door 133A, which allows a lateral insertion of the first material. The first door 133A can move between an open position, wherein the inner space VI of the treatment chamber 13 is accessible from the outside, and a closed position, wherein the access to the treatment chamber 13 is inhibited from the outside. Preferably, in the closed position of the first door 133A, the treatment chamber 13 is fluid-tight, to prevent losses or leaks of air from or into the treatment chamber 13.

[0110] According to an embodiment, the first door 133A may also be used as an outlet door, for picking up the second material obtained from the thermal conversion.

[0111] According to a further embodiment, the second side wall 134 comprises a second door 134A, which allows a lateral removal of the second material. The second door 134A is movable between a respective open position, wherein the inner space VI of the treatment chamber 13 is accessible from the outside, and a respective closed position, wherein access to the treatment chamber 13 is inhibited from the outside. Preferably, in the closed position of the second door 134A, the treatment chamber 13 is fluid-tight, to prevent losses or leaks of air from or into the treatment chamber 13.

[0112] Optionally, the apparatus 1 comprises a first conveyor 135, for conveying the first material from a reserve to the first door 133A. Optionally, the apparatus 1 comprises a second conveyor 136, for conveying the second material from the processing chamber 13 to a storage zone or to another apparatus. The second conveyor 136 therefore faces the second door 134A.

[0113] According to this embodiment, the first material is brought to the first door 133A using the first conveyor 11 , which is switched to the open position. The first material is inserted inside the treatment chamber 13 and the first door 133A is switched to a closed position (the second door 134A is in the closed position). Once the thermal conversion has taken place, the second door 134A is switched to the open position, the second material unloaded onto the second conveyor 136 and the second door 134A again closed for further processing.

[0114] Preferably, according to this embodiment, the holding surface 101 (that is to say, the base 131 of the treatment chamber 13) is a conveyor belt 137, configured for receiving the first material from the first conveyor 135 and for moving the second material towards the second conveyor 136.

[0115] According to an embodiment, the apparatus 1 comprises a pump 14. The treatment chamber 1 comprises a pumping opening 141. The pump 14 is configured for sucking the air inside the treatment chamber 13. Moreover, in addition or alternatively, the pump 14 is configured to pump inside a gas. Preferably, the gas pumped into it is an inert gas. According to an embodiment, the pump 14 comprises a suction 142, for sucking the air inside the treatment chamber 13, and a delivery 143, for pumping the gas inside the treatment chamber 13.

[0116] Advantageously, the base 131 of the treatment chamber 13 is a suction base 131 S, configured for keeping the first material gripped due to the suction of the air inside the treatment chamber 13. For example, the suction of the pump 14 could be integrated with the suction base 131 S, which thus defines the suction 142 of the pump 14.

[0117] The apparatus 1 comprises a thermal conditioning system 15. The thermal conditioning system 15 is associated with the holding surface 101. The thermal conditioning system 15 is configured for dissipating the heat generated by the operating unit 11 (that is to say, by the electromagnetic wave). The thermal conditioning system 15 is configured for conditioning thermal and / or hygrometric parameters inside the treatment chamber 13.

[0118] According to an embodiment, the conditioning system 15 comprises a Peltier cell, for the thermal conditioning of the treatment chamber 13. According to other particularly advantageous embodiments, the base 131 of the treatment chamber 13 comprises a heat exchanger 151 , through which thermal conditioning fluid flows connected to a thermal conditioning circuit, for example a refrigerating circuit. Advantageously, the apparatus comprises a user interface 16.

[0119] According to an aspect of the invention, the invention provides a method for the thermal conversion and the nanostructuring of a first carbon-based material for generating a second material, having features different from the first material.

[0120] The method comprises a step of preparing a frame 10, including a holding surface 101 , on which the first material is held, and a supporting structure 102.

[0121] The method comprises a step of preparing an operating unit 11 , including an emitter 111 and an optical system 112.

[0122] The method comprises a step of emitting an electromagnetic wave, using the emitter 111 , along an operating direction DL in an operating sense VL, oriented by the emitter 111 towards the holding surface 101 .

[0123] The method comprises a step of focussing (or defocussing) the electromagnetic wave, by means of the optical system 102, towards the first material, for generating a surface of predetermined incidence of the electromagnetic wave on the holding surface 101 .

[0124] The method comprises a step of relative movement between the holding surface 101 and the operating unit 11 for varying a position of incidence PI of the electromagnetic wave on the holding surface 101 .

[0125] The method comprises a step, using a control unit 12, of sending control signals S1 to the operating unit 11 or to the holding surface 101 , for controlling the relative movement between the operating unit 11 and the holding surface 101 .

[0126] According to an embodiment of this method, during the relative movement step, the distance travelled by the electromagnetic wave from the emitter 111 to the incidence on the holding surface 101 remains constant during the processing.

[0127] According to an embodiment, the method comprises a modulating step, wherein the control unit 12 modulates the power of the source, preferably in a range of between 2 and 30W. According to an embodiment, the method comprises a step of containing the first and / or the second material, wherein a treatment chamber 13 includes, inside its inner space VI, the first material during the thermal conversion processing.

[0128] The method comprises a pressure conditioning step, wherein a pump 14 sucks air from the treatment chamber 13, to create a negative pressure inside the treatment chamber 13. During the pressure conditioning step, the pump 14 may also pump a gas, preferably inert, into the treatment chamber 13.

[0129] The method comprises a thermal and hygrometric conditioning step, wherein a thermal conditioning system 15 conditions the temperature and / or the humidity inside the treatment chamber 13.

[0130] The method comprises a step of changing the size of the machine, using the user interface 16 and the control unit 12. In particular, the control unit 12 receives operating data S2, representing a component to be treated and a corresponding operation to be performed, for example using the user interface. The control unit 12 recovers configuration data S3 in a data archive. The configuration data includes one or more of the following parameters:

[0131] - a power value of the electromagnetic wave;

[0132] - a distance of the operating unit 11 from the holding surface 102 along a normal direction, perpendicular to the holding surface 101 ;

[0133] - parameters for focusing the wave;

[0134] - a trend of the time of incidence of the electromagnetic wave during the operation;

[0135] - the type of first or second material;

[0136] - the type of processing to be performed.

[0137] - a movement profile representing the reciprocal movement between the operating unit 11 and the holding surface 101 .

[0138] The control unit 12 generates the control signals S1 , as a function of the configuration data S3 recovered. The control unit 12 sends the control signals S1 to the operating unit 11 for instructing it to vary the power value of the electromagnetic wave and / or the distance of the operating unit 11 from the holding surface 101 .

[0139] According to an embodiment, the method comprises a step for optimising vibrations. During the step for optimising vibrations, the control unit 12 receives or derives movement data, representing a relative movement between the operating unit 11 and the holding surface 101 (for example included in the configuration data or inserted separately).

[0140] The control unit 12 derives, on the basis of the movement data, an extension of a stroke of the operating unit 11 relative to the holding surface 101. The control unit 12 compares the extension of the stroke of the operating unit 11 with a predetermined value.

[0141] The control unit 12 controls a movement of the operating unit 11 equal to the entire extension of the stroke for values smaller than the predetermined value or controls a movement of the operating unit 11 , equal to a portion of the extension of the stroke, for values greater than the predetermined value. In particular, the number of portions in which the total stroke is divided is such that each portion of stroke does not exceed the predetermined value.

Claims

CLAIMS1. An apparatus (1 ) for the thermal conversion and nanostructuring of a first carbon-based material for generating a second material, having features different from the first material, wherein the apparatus (1 ) comprises:- a frame (10), including a holding surface (101 ), configured to support the first material, and a supporting structure (102);- an operating unit (11 ), associated with the supporting structure (102) and, including:- an emitter (111 ), designed for emitting an electromagnetic wave along an operating direction (DL) in an operating sense (VL), oriented from the operating unit (11 ) to the holding surface (101 );- an optical system (112), configured for focusing the electromagnetic wave towards the first material, for generating a surface of incidence of the electromagnetic wave on the holding surface (101 ); the holding surface (101 ) and the operating unit (11 ) being relatively mobile for varying a position (PI) of incidence of the electromagnetic wave on the holding surface (101 );- a control unit (12), configured for sending control signals (S1) to the operating unit (11) or to the holding surface (101 ), for controlling a reciprocal movement between the operating unit (11 ) and the holding surface (101 ), wherein the position of incidence (PI) on the holding surface (101 ) is aligned along the operating direction (DL) with the emitter (111 ) of the operating unit (11 ).

2. The apparatus (1 ) according to any one of the preceding claims, wherein the supporting structure (102) comprises a fixed element (102'), integral with the frame (10), and a movable element (102A, 102B, 102C), connected to the operating unit (11 ) and movable relative to the fixed element (102'), for moving the operating unit (11 ) relative to the holding surface (101 ), which is integral with the frame (10).

3. The apparatus (1 ) according to claim 1 or 2, wherein the emitter (111 ) is configured to emit an electromagnetic wave with a power of less than 50 W.

4. The apparatus (1 ) according to claim 3, wherein the control unit (12) is programmed to vary the power of the electromagnetic wave in a range of between 1 W and 15 W.

5. The apparatus (1 ) according to any one of the preceding claims, wherein the optical system (112) is configured to generate a surface of incidence of the electromagnetic wave which has a point-like, linear, regional and / or circular shape.

6. The apparatus (1 ) according to any of the preceding claims, wherein the emitter (111 ) comprises one or more of the following characteristics:- sealed source;- CO2 source;- fibre source emitting electromagnetic waves at a wavelength of between 900 and 1300 pm;- diode source;- UV source;- magnetic field source (variable or static);- cable source for microwaves with a frequency of between 2 GHz and 3 GHz.

7. The apparatus (1 ) according to any one of the preceding claims, comprising a treatment chamber (13), including a base (131 ), defining the holding surface (101 ), an inner space (VI), in which the first material can be positioned, and an intermediate wall (132), interposed, along theoperating direction (DL), between the operating unit (11 ) and the holding surface (101 ) and made of a material transparent to the electromagnetic wave.

8. The apparatus (1 ) according to claim 7, wherein the intermediate wall (132) is removable, to allow access to the inner space (VI).

9. The apparatus (1 ) according to claim 7 or 8, comprising a pump (14) and wherein the treatment chamber (13) comprises a pumping opening (141 ), the pump (14) being configured for sucking the air inside the treatment chamber (13) and pumping inside a gas.

10. The apparatus (1 ) according to any one of claims 7 to 9, wherein the base (131 ) of the treatment chamber (13) is a suction base, configured for keeping the first material gripped due to the suction of the air inside the treatment chamber (13).

11. The apparatus (1 ) according to any one of the preceding claims, comprising a thermal conditioning system (15), associated with the holding surface (101 ) and configured for dissipating the heat generated by the operating unit (11 ) or for conditioning thermal and / or hygrometric parameters inside the treatment chamber (13).

12. The apparatus (1 ) according to any one of the preceding claims, comprising a user interface (16) and wherein the control unit is programmed for:- receiving operating data (S2), representing a component to be treated and a corresponding operation to be performed, using the user interface (16);- recovering configuration data (S3) in a data archive, the configuration data including a power value of the electromagnetic wave and / or adistance of the operating unit (11 ) from the holding surface (101 ) along a normal direction (DN), perpendicular to the holding surface (101 );- generating the control signals (S1), as a function of the configuration data (S3) recovered;- sending the control signals (S1) to the operating unit (11 ) for instructing it to vary the power value of the electromagnetic wave and / or the distance of the operating unit (11 ) from the holding surface (101).

13. The apparatus (1 ) according to any one of the preceding claims, wherein the control unit (12) is programmed to receive or derive movement data (S4), representing a relative movement between the operating unit (11 ) and the holding surface (101 ) and wherein the control unit (12) is programmed for:- deriving, on the basis of the movement data (S4), an extension of a stroke of the operating unit (11 ) relative to the holding surface (101 );- comparing the extension of the stroke of the operating unit (11 ) with a predetermined value;- controlling a movement of the operating unit (11 ) equal to the entire extent of the stroke for values smaller than the predetermined value or commanding a movement of the operating unit (11 ), equal to a portion of the extension of the stroke, for values greater than the predetermined value.

14. A method for the thermal conversion and nanostructuring of a first carbon-based material for generating a second material, having features different from the first material, the method comprising the following steps:- preparing a frame (10), including a holding surface (101 ), on which the first material is held, and a supporting structure (102);- preparing an operating unit (11 ), including an emitter (111 ) and an optical system (112);- by means of the emitter (111 ), emitting an electromagnetic wave alongan operating direction (DL) in an operating sense (VL), oriented by the emitter (111 ) towards the holding surface (101 );- by means of the optical system (112), focusing the electromagnetic wave towards the first material, for generating a surface of predetermined incidence of the electromagnetic wave on the holding surface (101 ),- relative movement between the holding surface (101) and the operating unit (11 ) for varying a position of incidence of the electromagnetic wave on the holding surface (101 );- by mans of a control unit (12), sending control signals (S1) to the operating unit (11 ) or to the holding surface (101 ), for controlling the relative movement between the operating unit (11 ) and the holding surface (101 ), wherein, in the relative movement step, the position of incidence on the holding surface (101 ) remains aligned, along the operating direction (DL) with the emitter (111 ) of the operating unit (11 ).

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