Curved glass and preparation method therefor

Abstract

Curved glass and a preparation method therefor. The curved glass comprises a glass base layer (1) and a texture layer (2) formed on one or both sides of the glass base layer (1), wherein the texture layer (2) and the glass base layer (1) are of an integrated structure, and the thickness of the texture layer (2) is in a range of 1-20 μm.

Description

Curved glass and preparation method thereof

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to Chinese patent application No. 202311277424.8 filed on September 27, 2023, entitled “A Curved Glass and Its Preparation Method,” the entire contents of which are incorporated herein by reference. Technical Field

[0003] The present application relates to the field of glass manufacturing and processing, and in particular to curved glass and a method for preparing the same. Background Art

[0004] Curved glass is a glass with a curved structure that is made by hot bending flat glass through a special-shaped mold.

[0005] Existing decorative processes make it difficult to create fine patterns directly on curved glass. Currently, the existing technology involves flat-plate transfer printing of the texture onto a PET film, followed by coating and silk-screen printing, and finally laminating the film to the curved glass using laminating equipment. This creates curved glass with an optical texture. Laminating the PET film to the glass increases the overall thickness of the glass, and the polyester resin (PET) and adhesive (OCA optical adhesive) separate the texture from the glass, reducing transmittance and resulting in a poor texture effect.

[0006] Application Contents

[0007] The present application aims to solve at least one of the technical problems existing in the prior art. To this end, the present application proposes a curved glass having an integrated glass base and a textured layer, with the textured layer formed directly on the glass surface. This makes the curved glass lighter and thinner overall, provides a better presentation effect, and has good light transmittance.

[0008] This application also proposes a method for preparing the above-mentioned curved glass.

[0009] The present application also proposes a curved glass prepared using the above-mentioned curved glass preparation method.

[0010] The curved glass according to the present application includes a glass substrate and a texture layer formed on one or both surfaces of the glass substrate. The texture layer and the glass substrate are an integral structure, and the thickness of the texture layer ranges from 1 to 20 μm.

[0011] According to the curved glass of the present application, there is no need to use polyester resin (PET) to transfer textures and use adhesives (OCA optical glue) to bond to form a texture layer, so that the curved glass is lighter and thinner as a whole (without PET and OCA layers), the presentation effect is better, and it has better light transmittance.

[0012] In some embodiments, the thickness of the texture layer ranges from 1 to 10 μm.

[0013] In some embodiments, the width of the texture in the texture layer ranges from 1 to 200 μm.

[0014] In some embodiments, the width of the texture in the texture layer ranges from 5 to 150 μm.

[0015] In some embodiments, the distance d between adjacent textures ranges from 1 to 200 μm.

[0016] In some embodiments, the distance d between adjacent textures ranges from 5 μm to 150 μm.

[0017] In some embodiments, the thickness of the curved glass ranges from 0.3 to 3 mm.

[0018] In some embodiments, the thickness of the curved glass ranges from 0.5 to 2 mm.

[0019] In some embodiments, the texture on the texture layer is at least one of a regular pattern and an irregular pattern.

[0020] In some embodiments, the texture on the texture layer is at least one of rectangular and wavy.

[0021] The method for preparing the curved glass according to the present application comprises the following steps:

[0022] (1) forming a film layer on one or both sides of a glass substrate using a crystal nucleating agent;

[0023] (2) removing part of the film layer and retaining a predetermined texture pattern on the glass substrate;

[0024] (3) treating a glass substrate having a texture pattern so that the surface layer of the glass in the texture pattern area is microcrystallized;

[0025] (4) The glass substrate obtained after the treatment in step (3) is subjected to heat bending treatment and then etching.

[0026] According to the preparation method of curved glass of the present application, by performing local microcrystallization treatment on the glass substrate and utilizing the different etching speeds between the microcrystalline layer area and the amorphous area, a texture layer with light and shadow effects can be etched. The texture layer formed in this way is an integrated structure with the glass base layer, making the curved glass as a whole lighter and thinner, and having excellent light transmittance.

[0027] In some embodiments, in step (1), the thickness of the film layer ranges from 10 to 200 nm.

[0028] In some embodiments, in step (1), the thickness of the film layer ranges from 50 to 150 nm.

[0029] In some embodiments, the crystal nucleation agent is selected from at least one of a metal crystal nucleation agent, an oxide crystal nucleation agent, and a fluoride crystal nucleation agent.

[0030] In some embodiments, the metal nucleating agent includes at least one of Ag, Cu, and Pt;

[0031] In some embodiments, the oxide nucleating agent includes at least one of TiO2 and ZrO2;

[0032] In some embodiments, the fluoride nucleating agent includes at least one of CaF2 and MgF2.

[0033] In some embodiments, the glass substrate includes at least one of lithium aluminosilicate glass, calcium aluminosilicate glass, and magnesium aluminosilicate glass.

[0034] In some embodiments, in step (2), part of the film layer is removed by laser engraving.

[0035] In some embodiments, the texture pattern is at least one of a regular pattern and an irregular pattern.

[0036] In some embodiments, the texture pattern is at least one of rectangular and wavy.

[0037] In some embodiments, in step (3), the treatment is performed by heat treatment.

[0038] In some embodiments, the heat treatment process is performed in the presence of a protective gas, and the heat treatment conditions include: a heating rate of 1-10° C. / min; a temperature of 550-880° C.; and a time of 1-6 h.

[0039] In some embodiments, the heat treatment conditions include: a heating rate of 5-10° C. / min.

[0040] In some embodiments, the heat treatment conditions include: a temperature of 600-850°C.

[0041] In some embodiments, the heat treatment conditions include: a time of 2-4 hours.

[0042] In some embodiments, the heat treatment process includes: in the presence of protective gas, heating to 550-650°C at a heating rate of 5-10°C / min, keeping warm for 0.5-2h, then heating to 700-880°C at a heating rate of 1-5°C / min, and keeping warm for 1-4h.

[0043] In some embodiments, in step (4), the conditions of the hot bending treatment include: a temperature of 700-800° C. and a time of 10-30 min.

[0044] In some embodiments, in step (4), the etching process includes: immersing the glass substrate after heat bending treatment in an etching solution.

[0045] In some embodiments, the etching solution contains HF.

[0046] The curved glass prepared by applying the above-mentioned curved glass preparation method according to the present application is lighter and thinner as a whole and has excellent light transmittance.

[0047] Additional aspects and advantages of the present application will be given in part in the description below, and in part will become obvious from the description below, or will be learned through practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0048] FIG1 is a schematic top view of the curved glass provided in the present application;

[0049] FIG2 is a schematic cross-sectional view of the curved glass provided in the present application;

[0050] FIG3 is a schematic cross-sectional view of curved glass prepared by first transferring a texture onto PET and then laminating the transferred texture onto glass in the prior art.

[0051] Reference numerals: glass substrate 1, texture layer 2. DETAILED DESCRIPTION

[0052] The following describes in detail embodiments of the present application. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application and are not to be construed as limiting the present application.

[0053] As shown in Figures 1-2, the curved glass of the present application includes a glass substrate 1 and a texture layer 2 formed on one or both surfaces of the glass substrate 1. The texture layer 2 and the glass substrate 1 are integrally formed. The curved glass designed according to the present application does not require the use of polyester resin (PET) to transfer the texture and adhesive (OCA optical adhesive) to form the texture layer. This makes the curved glass lighter and thinner overall (without the PET and OCA layers), with better presentation and better light transmittance.

[0054] In the curved glass of the present application, the texture layer 2 can be formed on one or both sides of the curved glass. In some embodiments, to prevent single-sided crystallization and deformation of the glass caused by etching, the texture layer 2 is formed on both sides of the curved glass. In this article, "two sides" refers to the two opposing surfaces of the curved glass.

[0055] In the curved glass of the present application, the thickness of the texture layer 2 on the curved glass ranges from 1 to 20 μm.

[0056] In some embodiments, the thickness of the texture layer 2 on the curved glass can be in the range of 1-10 μm, for example, 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, 6 μm, 7 μm, 8 μm, 9 μm, or 10 μm. With such a thickness, the texture layer 2 on the curved glass has a better light and shadow effect.

[0057] In the curved glass of the present application, the width of the texture in the texture layer 2 is not particularly limited, and the width of the texture can be designed as needed.

[0058] Here, the width of the texture in the texture layer 2 may range from 1 to 200 μm.

[0059] In some embodiments, the width of the texture in the texture layer 2 may be in the range of 5-150 μm, for example, 5 μm, 10 μm, 20 μm, 30 μm, 50 μm, 80 μm, 100 μm, 120 μm, 130 μm or 150 μm.

[0060] In the curved glass of the present application, the distance d between adjacent textures is not particularly limited, and the distance between adjacent textures can be designed as needed.

[0061] Here, the distance d between adjacent textures may range from 1 to 200 μm.

[0062] In some embodiments, the spacing d between adjacent textures may range from 5 to 150 μm, for example, 5 μm, 10 μm, 20 μm, 30 μm, 50 μm, 80 μm, 100 μm, 120 μm, 130 μm or 150 μm.

[0063] In the curved glass of the present application, the thickness of the curved glass is not particularly limited, and the appropriate thickness of the curved glass can be determined as needed.

[0064] Here, the thickness of the curved glass may range from 0.3 to 3 mm.

[0065] In some embodiments, the thickness of the curved glass may be in the range of 0.5-2 mm, for example, 0.5 mm, 0.6 mm, 0.8 mm, 1 mm, 1.2 mm, 1.4 mm, 1.5 mm, 1.6 mm, 1.8 mm or 2 mm.

[0066] In the curved glass of the present application, the texture on the texture layer 2 can be determined as an appropriate texture pattern as needed.

[0067] Here, the texture on the texture layer 2 is at least one of a regular pattern and an irregular pattern.

[0068] In some embodiments, the texture on the texture layer 2 is at least one of rectangular and wavy.

[0069] In the present application, the material of the curved glass may be conventional glass material in the art.

[0070] In some embodiments, the material of the curved glass is at least one of lithium aluminosilicate glass, calcium aluminosilicate glass and magnesium aluminosilicate glass. For example, the curved glass can be completely composed of lithium aluminosilicate glass, calcium aluminosilicate glass or magnesium aluminosilicate glass, or it can be composed of any two of lithium aluminosilicate glass, calcium aluminosilicate glass and magnesium aluminosilicate glass. Alternatively, the curved glass contains three components of lithium aluminosilicate glass, calcium aluminosilicate glass and magnesium aluminosilicate glass. The content of lithium aluminosilicate glass, calcium aluminosilicate glass and magnesium aluminosilicate glass can be adjusted according to actual needs so that the curved glass can be used in different environments.

[0071] The method for preparing the curved glass of the present application comprises the following steps:

[0072] (1) forming a film layer on one or both sides of a glass substrate using a crystal nucleating agent;

[0073] (2) removing part of the film layer and retaining a predetermined texture pattern on the glass substrate;

[0074] (3) treating a glass substrate having a texture pattern so that the surface layer of the glass in the texture pattern area is microcrystallized;

[0075] (4) The glass substrate obtained after the treatment in step (3) is subjected to heat bending treatment and then etching.

[0076] According to the preparation method of curved glass of the present application, by performing local microcrystallization treatment on the glass substrate and utilizing the different etching speeds between the microcrystalline layer area and the amorphous area, a texture layer with light and shadow effects can be etched. The texture layer formed in this way is an integrated structure with the glass base layer, making the curved glass as a whole lighter and thinner, and having excellent light transmittance.

[0077] In step (1), the thickness of the texture layer on the prepared curved glass can be adjusted by controlling the thickness of the film layer formed on the glass substrate.

[0078] In the method of the present application, the thickness of the formed film layer may range from 10 to 200 nm.

[0079] In some embodiments, in step (1), the thickness of the film layer is in the range of 50-150 nm. By controlling the thickness of the film layer within this range, the thickness of the texture layer on the prepared curved glass can be adjusted within the range of 1-20 μm, thereby ensuring that the texture layer on the curved glass has a good light and shadow effect.

[0080] In step (1), the film layer can be formed on one side of the glass substrate or on both sides of the glass substrate. In some embodiments, in order to avoid single-sided crystallization of the glass substrate and deformation of the glass during subsequent etching, the film layer is formed on both sides of the glass substrate.

[0081] In step (1), the crystal nucleating agent used may be selected from at least one of a metal crystal nucleating agent, an oxide crystal nucleating agent and a fluoride crystal nucleating agent.

[0082] In some embodiments, the metal nucleating agent may include at least one of Ag, Cu, and Pt.

[0083] In some embodiments, the oxide nucleating agent may include at least one of TiO 2 and ZrO 2 .

[0084] In some embodiments, the fluoride nucleating agent may include at least one of CaF2 and MgF2.

[0085] In the present application, by selecting the above-mentioned nucleating agent, after local microcrystallization is carried out on the surface of the glass substrate, the different etching rates of the microcrystalline layer area and the amorphous area are utilized to directly etch a texture layer with light and shadow effects on the glass substrate, thereby forming a curved glass with an integrated structure of the physical layer and the glass base layer.

[0086] In step (1), the method for forming the film layer on the glass substrate can be any conventional method in the art, as long as a film with uniform thickness can be formed. In some embodiments, the film layer is formed on the glass substrate by at least one of evaporation coating and sputtering coating.

[0087] In step (1), the glass substrate can be a conventional glass substrate in the art. In some embodiments, the glass substrate includes at least one of lithium aluminosilicate glass, calcium aluminosilicate glass, and magnesium aluminosilicate glass.

[0088] In step (2), the process of removing part of the film layer can be carried out according to conventional methods in the art. In some embodiments, in order to form a texture pattern with a clear outline, part of the film layer is removed by laser engraving.

[0089] In step (2), the texture pattern can be selected and determined as needed.

[0090] Here, the texture on the texture layer is in at least one of a regular pattern and an irregular pattern.

[0091] In some embodiments, the texture on the texture layer is at least one of rectangular and wavy.

[0092] In step (3), the treatment is performed by heat treatment.

[0093] In some embodiments, the heat treatment process is performed in the presence of a protective gas, and the heat treatment conditions include: a heating rate of 1-10° C. / min; a temperature of 550-880° C.; and a time of 1-6 h.

[0094] In some embodiments, the heat treatment conditions include: a heating rate of 5-10° C. / min.

[0095] In some embodiments, the heat treatment conditions include a temperature of 600-850°C.

[0096] In some embodiments, the heat treatment conditions include: a time of 2-4 hours.

[0097] In some embodiments, in order to obtain a better microcrystallization effect (such as uniform size of the formed crystals) so that the texture layer on the prepared curved glass has a better light and shadow effect, the heat treatment process includes: in the presence of a protective gas, heating to 550-650°C at a heating rate of 5-10°C / min, keeping warm for 0.5-2h, then heating to 700-880°C at a heating rate of 1-5°C / min, and keeping warm for 1-4h.

[0098] In the present application, the protective gas may be a conventional choice in the art.

[0099] Here, the protective gas may be nitrogen.

[0100] In step (4), the conditions for the hot bending treatment may include: a temperature of 700-800° C. and a time of 10-30 min.

[0101] In step (4), the etching process may include: immersing the glass substrate after the heat bending treatment in an etching solution. The etching conditions may include: a temperature of 15-40°C, preferably 20-25°C; and a time of 100-1000 seconds, preferably 500-800 seconds.

[0102] In the present application, the etching liquid may be an etching liquid commonly used in the glass etching process.

[0103] In some embodiments, the etching solution contains HF solution.

[0104] This application also provides curved glass prepared by the above method. The texture layer of the curved glass is formed directly on the glass surface (one or both sides), and the glass base and the texture layer are an integrated structure. Therefore, there is no need to use polyester resin (PET) to transfer the texture and adhesive (OCA optical adhesive) to form the texture layer. This makes the curved glass lighter and thinner overall (no PET and OCA layers), with better presentation and better light transmittance.

[0105] The following examples further illustrate the curved glass and its preparation method described in this application. The examples are implemented based on the technical solution of this application and provide detailed implementation methods and specific operating processes, but the scope of protection of this application is not limited to the following examples.

[0106] The experimental methods in the following examples, unless otherwise specified, are all conventional methods in the art. The experimental materials used in the following examples, unless otherwise specified, are all commercially available.

[0107] Comparative Example 1

[0108] A lithium aluminum silicon flat glass of 160 mm × 75 mm × 0.6 mm was selected as a glass substrate, and the glass substrate was heat-bent at 780° C. for 20 min to obtain a curved glass substrate.

[0109] The texture effect is transferred onto a PET film, which is then coated and silk-screened. The film is then bonded to the curved glass using OCA optical adhesive using a bonding device, resulting in the curved glass D1 with a textured surface as shown in FIG3 .

[0110] Example 1

[0111] (1) A 160 mm × 75 mm × 0.6 mm lithium aluminum silicon flat glass was selected as the glass substrate, and a TiO2 film layer was formed on both sides of the glass substrate by evaporation deposition. The film layer thickness was 100 nm.

[0112] (2) Part of the film layer is removed by laser engraving, leaving a rectangular texture pattern on the glass substrate.

[0113] (3) In a nitrogen atmosphere, the temperature of the textured glass substrate was raised to 600°C at a rate of 10°C / min, kept at that temperature for 1 hour, and then raised to 750°C at a rate of 2°C / min, and kept at that temperature for another 3 hours.

[0114] (4) The glass substrate obtained after the treatment in step (3) was first subjected to heat bending treatment at 780° C. for 20 min, and then immersed in HF etching solution for etching for 500 s to obtain curved glass A1.

[0115] Example 2

[0116] (1) A 160 mm × 75 mm × 0.6 mm lithium aluminum silicon flat glass was selected as the glass substrate, and an Ag film layer was formed on both sides of the glass substrate by sputtering. The film layer thickness was 50 nm.

[0117] (2) Part of the film layer is removed by laser engraving, leaving a rectangular texture pattern on the glass substrate.

[0118] (3) In a nitrogen atmosphere, the temperature of the textured glass substrate was raised to 650°C at a rate of 8°C / min, kept at this temperature for 0.5 h, and then raised to 700°C at a rate of 1°C / min, and kept at this temperature for another 4 h.

[0119] (4) The glass substrate obtained after the treatment in step (3) was first subjected to a heat bending treatment at 800° C. for 10 min, and then immersed in an HF etching solution for etching for 650 s to obtain a curved glass A2.

[0120] Example 3

[0121] (1) A 160 mm × 75 mm × 0.6 mm lithium aluminum silicon flat glass was selected as the glass substrate, and a CaF2 film layer was formed on both sides of the glass substrate by evaporation deposition. The film layer thickness was 150 nm.

[0122] (2) Part of the film layer is removed by laser engraving, leaving a rectangular texture pattern on the glass substrate.

[0123] (3) In a nitrogen atmosphere, the temperature of the textured glass substrate was raised to 550°C at a rate of 5°C / min, kept at this temperature for 2 h, and then raised to 880°C at a rate of 5°C / min, and kept at this temperature for another 1 h.

[0124] (4) The glass substrate obtained after the treatment in step (3) was first subjected to a heat bending treatment at 700° C. for 30 min, and then immersed in an HF etching solution for etching for 800 s to obtain a curved glass A3.

[0125] Example 4

[0126] (1) A 160 mm × 75 mm × 0.6 mm calcium aluminum silicon flat glass was selected as the glass substrate, and a TiO2 film layer was formed on both sides of the glass substrate by evaporation deposition. The film layer thickness was 100 nm.

[0127] (2) Part of the film layer is removed by laser engraving, leaving a rectangular texture pattern on the glass substrate.

[0128] (3) In a nitrogen atmosphere, the temperature of the textured glass substrate was raised to 620°C at a rate of 7°C / min, kept at this temperature for 1 hour, and then raised to 800°C at a rate of 3°C / min, and kept at this temperature for another 2 hours.

[0129] (4) The glass substrate obtained after the treatment in step (3) was first subjected to a heat bending treatment at 750° C. for 20 min, and then immersed in an HF etching solution and etched for 700 s to obtain a curved glass A4.

[0130] Example 5

[0131] (1) A 160 mm × 75 mm × 0.6 mm magnesium aluminum silicon flat glass was selected as the glass substrate, and a TiO2 film layer was formed on both sides of the glass substrate by evaporation coating. The film layer thickness was 100 nm.

[0132] (2) Part of the film layer is removed by laser engraving, leaving a rectangular texture pattern on the glass substrate.

[0133] (3) In a nitrogen atmosphere, the temperature of the textured glass substrate was raised to 580°C at a rate of 6°C / min, kept at this temperature for 1 hour, and then raised to 820°C at a rate of 4°C / min, and kept at this temperature for another 2.5 hours.

[0134] (4) The glass substrate obtained after the treatment in step (3) was first subjected to a heat bending treatment at 750° C. for 25 min, and then immersed in an HF etching solution for etching for 600 s to obtain a curved glass A5.

[0135] Test Case

[0136] The curved glass prepared in Examples 1-5 and Comparative Example 1 was used as the test object. The transmittance was measured by a spectrophotometer, and the thickness, width, and spacing of the texture on the surface of the curved glass were measured by an optical microscope. The results are shown in Table 1 below.

[0137] Table 1

[0138] It can be seen from the above embodiments and comparative examples that the curved glass prepared according to the method of the present application has a glass base layer and a texture layer as an integrated structure, and the texture layer is directly formed on the glass surface, making the curved glass lighter and thinner as a whole, with a better presentation effect and better light transmittance.

[0139] Throughout this specification, reference to terms such as "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

[0140] Although the embodiments of the present application have been shown and described, those skilled in the art will appreciate that various changes, modifications, substitutions, and variations may be made to the embodiments without departing from the principles and intent of the present application, and that the scope of the present application is defined by the claims and their equivalents.

Claims

1. A curved glass, characterized in that: The curved glass comprises a glass substrate (1) and a texture layer (2) formed on one or both surfaces of the glass substrate (1); the texture layer (2) and the glass substrate (1) are an integral structure, and the thickness of the texture layer (2) is in the range of 1-20 μm.

2. The curved glass according to claim 1, characterized in that: The thickness of the texture layer (2) ranges from 1 to 10 μm.

3. The curved glass according to claim 1 or 2, characterized in that: The width of the texture in the texture layer (2) ranges from 1 to 200 μm.

4. The curved glass according to claim 3, characterized in that: The width of the texture in the texture layer (2) ranges from 5 to 150 μm.

5. The curved glass according to any one of claims 1 to 4, characterized in that: The distance d between adjacent textures ranges from 1 to 200 μm.

6. The curved glass according to claim 5, characterized in that: The distance d between adjacent textures ranges from 5 to 150 μm.

7. The curved glass according to any one of claims 1 to 6, characterized in that: The thickness of the curved glass ranges from 0.3 to 3 mm.

8. The curved glass according to claim 7, characterized in that: The thickness of the curved glass ranges from 0.5 to 2 mm.

9. The curved glass according to any one of claims 1 to 8, characterized in that: The texture on the texture layer (2) is at least one of a regular pattern and an irregular pattern.

10. The curved glass according to claim 9, characterized in that: The texture on the texture layer (2) is at least one of rectangular and wavy.

11. A method for preparing the curved glass according to any one of claims 1 to 10, characterized in that: The method comprises the following steps: (1) using a crystal nucleating agent to form a film layer on one or both sides of a glass substrate; (2) removing part of the film layer and retaining a predetermined texture pattern on the glass substrate; (3) treating a glass substrate having a texture pattern so that a surface layer of the glass in the texture pattern area is microcrystallized; (4) The glass substrate obtained after the treatment in step (3) is subjected to heat bending treatment and then etching.

12. The method for preparing curved glass according to claim 11, characterized in that: In step (1), the thickness of the film layer ranges from 10 to 200 nm.

13. The method for preparing curved glass according to claim 12, characterized in that: In step (1), the thickness of the film layer ranges from 50 to 150 nm.

14. The method for preparing curved glass according to any one of claims 11 to 13, characterized in that: The crystal nucleus agent is selected from at least one of a metal crystal nucleus agent, an oxide crystal nucleus agent and a fluoride crystal nucleus agent.

15. The method for preparing curved glass according to claim 14, characterized in that: The metal nucleus agent includes at least one of Ag, Cu and Pt.

16. The method for preparing curved glass according to claim 14 or 15, characterized in that: The oxide nucleating agent includes at least one of TiO2 and ZrO2.

17. The method for preparing curved glass according to any one of claims 14 to 16, characterized in that: The fluoride nucleating agent includes at least one of CaF2 and MgF2.

18. The method for preparing curved glass according to any one of claims 11 to 17, characterized in that: The glass substrate includes at least one of lithium aluminosilicate glass, calcium aluminosilicate glass and magnesium aluminosilicate glass.

19. The method for preparing curved glass according to any one of claims 11 to 18, characterized in that: In step (2), part of the film layer is removed by laser engraving.

20. The method for preparing curved glass according to any one of claims 11 to 18, characterized in that: The texture pattern is at least one of a regular pattern and an irregular pattern.

21. The method for preparing curved glass according to claim 20, characterized in that: The texture pattern is at least one of a rectangular shape and a wavy shape.

22. The method for preparing curved glass according to any one of claims 11 to 21, characterized in that: In step (3), the treatment is performed by heat treatment.

23. The method for preparing curved glass according to claim 22, characterized in that: The heat treatment process is carried out in the presence of a protective gas, and the heat treatment conditions include: a heating rate of 1-10° C. / min; a temperature of 550-880° C.; and a time of 1-6 h.

24. The method for preparing curved glass according to claim 23, characterized in that: The conditions of the heat treatment include: a heating rate of 5-10°C / min.

25. The method for preparing curved glass according to claim 23 or 24, characterized in that: The heat treatment conditions include: a temperature of 600-850°C.

26. The method for preparing curved glass according to any one of claims 23 to 25, characterized in that: The heat treatment conditions include: time is 2-4h.

27. The method for preparing curved glass according to any one of claims 23 to 26, characterized in that: The heat treatment process includes: in the presence of protective gas, heating to 550-650°C at a heating rate of 5-10°C / min, keeping the temperature for 0.5-2h, then heating to 700-880°C at a heating rate of 1-5°C / min, and keeping the temperature for 1-4h.

28. The method for preparing curved glass according to any one of claims 11 to 27, characterized in that: In step (4), the conditions of the hot bending treatment include: a temperature of 700-800° C. and a time of 10-30 min.

29. The method for preparing curved glass according to any one of claims 11 to 28, characterized in that: In step (4), the etching process includes: immersing the glass substrate after the heat bending treatment in an etching solution.

30. The method for preparing curved glass according to claim 29, characterized in that: The etching solution contains HF.

31. A curved glass prepared by the method for preparing curved glass according to any one of claims 11 to 30.

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