Device and method for releasably connecting at least one mobile clean room to at least one second clean room, clean room, clean room system and lithography system

Abstract

The invention relates to a device (1) for releasably connecting at least one mobile clean room (2) to at least one second clean room (3), said device having a first lock part (4) which is designed to at least partially form a closed lock space (5) between the mobile clean room (2) and the second clean room (3), wherein one or more, preferably more than two, particularly preferably exactly three, openable closure units (9) are provided on the first lock part (4) and are designed to sealingly close the lock space (5) off from the respective clean room (2, 3).

Description

[0001] Device and method for detachably connecting at least one mobile cleanroom to at least one second cleanroom, cleanroom, cleanroom system and lithography system

[0002] This application claims priority from German patent application No. 10 2023 209 418.5, the contents of which are incorporated herein by reference.

[0003] The invention relates to a device for detachably connecting at least one mobile clean room to at least one second clean room.

[0004] The invention further relates to a clean room, in particular a mobile clean room or a stationary clean room.

[0005] The invention also relates to a clean room system.

[0006] The invention further relates to a method for detachably connecting at least one mobile clean room to at least one second clean room.

[0007] The invention also relates to a lithography system, in particular a projection exposure system for producing a semiconductor component, comprising a plurality of components, including in particular an illumination system with a radiation source and an optics system having at least one optical element.

[0008] From DE 10 2020 208 657 A1 a cleanroom transport and storage system is known, comprising a standard container, a cleanroom container accommodated within the standard container and removable from the standard container, and a conditioning device for creating and maintaining cleanroom conditions within the cleanroom container.

[0009] DE 20 2009 017 956 U1 discloses a cleanroom storage system for the upright storage of large-area fragile substrates which have a front functional side and a rear side opposite this.

[0010] It is known from the general state of the art that in order to transport components which must be kept under clean room conditions from a first clean room to a second clean room which is not directly connected to the first clean room, the components are removed from the first clean room and introduced into the second clean room.

[0011] The general state of the art provides for the components to be carefully packaged during the removal process, thus protecting them from the environment that does not meet cleanroom conditions. Upon subsequent re-introduction, the aforementioned packaging must be removed, the corresponding component inspected, and, if necessary, cleaned before it can be used again in the second cleanroom. A disadvantage of the solutions known from the state of the art is that exchanging components that require cleanroom conditions between the involved cleanrooms is both time-consuming and expensive.

[0012] The present invention is based on the object of creating a device for detachably connecting at least one mobile clean room to at least one second clean room, which avoids the disadvantages of the prior art, in particular enabling a simple and reliable connection of the clean rooms.

[0013] According to the invention, this object is achieved by a device having the features mentioned in claim 1.

[0014] The present invention is further based on the object of creating a clean room which avoids the disadvantages of the prior art, in particular enabling a simple and reliable connection to other clean rooms.

[0015] According to the invention, this object is achieved by a clean room having the features mentioned in claim 13.

[0016] The present invention is further based on the object of creating a clean room system which avoids the disadvantages of the prior art, in particular providing stable and reliably connected clean rooms.

[0017] According to the invention, this object is achieved by a clean room system having the features mentioned in claim 14.

[0018] The present invention is also based on the object of creating a method for detachably connecting at least one mobile clean room to at least one second clean room, which avoids the disadvantages of the prior art, in particular enabling a simple and reliable connection of the clean rooms.

[0019] According to the invention, this object is achieved by a method having the features mentioned in claim 15.

[0020] The present invention is also based on the object of creating a lithography system which avoids the disadvantages of the prior art, in particular having precisely manufactured and clean components.

[0021] According to the invention, this object is achieved by a lithography system having the features recited in claim 21. The device according to the invention for detachably connecting at least one mobile cleanroom to at least one second cleanroom comprises a first lock part which is configured to at least partially form a closed lock chamber between the mobile cleanroom and the second cleanroom, wherein one or more, preferably more than two, particularly preferably exactly three, openable closure devices are provided in the first lock part and are configured to tightly seal off the lock chamber from the respective cleanroom. It is provided that cleanroom conditions prevail in the mobile cleanroom and / or the at least one second cleanroom, wherein a cleanliness corresponds to at least one cleanliness class ISO 4 according to ISO 14644-1.

[0022] It can be provided that the device is designed to transport at least one component of a lithography system, in particular a projection exposure system.

[0023] It can be provided that at least one component of a lithography system, in particular a projection exposure system, is arranged in the device as part of the device.

[0024] By means of the device according to the invention, the mobile clean room and the second clean room can be connected to each other, preferably in a continuous clean room atmosphere.

[0025] By means of the openable closure devices, the lock room can be sealed off from the mobile clean room and / or the second clean room at least until clean room conditions have been created in the lock room by means of the lock room cleaning device and / or the overpressure device, which allow the lock room to be merged with the mobile clean room or the second clean room.

[0026] To effectively fulfill the functional principle of the device, two locking device levels or locking devices would be sufficient. However, more locking devices per lock section result in better protection. Therefore, at least two locking devices or door levels are preferably provided.

[0027] To implement the inventive concept in principle, even one sealing device is sufficient. However, from a technical and practical perspective, the presence of at least two levels of sealing devices is advantageous to achieve true cleanroom conditions.

[0028] Within the scope of the invention, clean room conditions can be assumed if the purity corresponds to at least a purity class ISO 4 according to ISO 14644-1.

[0029] It is intended that cleanroom conditions prevail in the mobile cleanroom and / or the second cleanroom. In particular, it is intended that the cleanliness in the mobile cleanroom and / or the second cleanroom and / or the airlock room corresponds to at least a cleanliness class ISO 4 according to ISO 14644-1.

[0030] It may be provided that the lock room is designed to maintain clean room conditions, the cleanliness corresponding to at least a cleanliness class ISO 4 according to ISO 14644-1.

[0031] The ISO 4 purity class according to ISO 14644-1 defines a maximum permissible particle number according to the standard DIN EN ISO 14644-1. The ISO 4 class defines the maximum permissible particle numbers per m shown in Table 1. 3 Air for different particle diameters.

[0032] Table 1

[0033] In general, it can be seen that the number of levels of closure devices should be higher, the cleaner the respective cleanrooms have to be.

[0034] This advantageously avoids time-consuming and costly protective procedures, such as packaging, relocation, and / or cleaning, during loading and / or unloading. In conventional, state-of-the-art methods, such complex protective procedures are necessary to prevent contamination of the parts being transported from the mobile cleanroom to the second cleanroom or vice versa.

[0035] Due to the above-described reduction in the effort required for transferring components, the device according to the invention advantageously increases flexibility in storing or retrieving components.

[0036] Furthermore, by avoiding the aforementioned effort required for protective procedures for components to be transferred, logistics capacities for input and / or output can be increased. This can, for example, lead to an increase in production efficiency.

[0037] The device according to the invention also makes it possible to make the transfer of components more sustainable, since conventional methods require a large amount of packaging material to be disposed of after the components have been transported. The device according to the invention also helps to reduce product risks, which can, for example, result from damage to and / or contamination of the component, since many handling steps in the protective procedures can be avoided using the device according to the invention.

[0038] The device according to the invention is particularly suitable for use in a contaminated environment, for the transport of components of all kinds, tools, mirrors, lenses, mechanics, electronics and also complete lenses in a semiconductor manufacturing area.

[0039] Preferably, the lock room extends from the mobile clean room to the second clean room and / or vice versa.

[0040] It can be provided that the first lock part forms the entire lock chamber. However, it can also be provided that the first lock part forms only part of the enclosed lock chamber, and that additional lock parts, which are preferably part of the device, or external parts, for example parts of the mobile clean room and / or the second clean room, are provided to completely form an enclosed lock chamber.

[0041] It can further be provided that the second lock part consists only of a wall of the mobile clean room and / or the second clean room, against which the first lock part is preferably pressed to form the closed lock room.

[0042] In an advantageous development of the device according to the invention, it can be provided that the first lock part is designed to form, in interaction with a second lock part, which is preferably part of the device, at least partially the closed lock space.

[0043] It is particularly advantageous if a second lock part is provided, in particular as part of the device.

[0044] If lock parts or docking interfaces or docking devices are provided in both cleanrooms, it is particularly advantageous and simple to establish a cleanroom connection between the mobile cleanroom and the second cleanroom without contamination.

[0045] It can be provided that the first lock part and the second lock part form the entire lock chamber and / or an entire lock area. However, it can also be provided that the first and the second lock part form only a part of the enclosed lock chamber, and to completely form an enclosed lock chamber, further lock parts, which are preferably part of the device, or external parts, for example parts of the mobile clean room and / or the second clean room, are provided. In an advantageous development of the device according to the invention, it can be provided that in the first lock part and / or the second lock part, several closure devices are arranged one behind the other, preferably each on the side facing the mobile clean room and / or the second clean room.

[0046] If several closure devices are provided in succession, the cleanroom atmosphere in the lock room can be sequentially adjusted to the requirements for merging with the mobile cleanroom and / or the second cleanroom.

[0047] In an advantageous development of the device according to the invention, it can be provided that the at least one closure device can be opened in such a way that the lock chamber is enlarged and / or the lock chamber is connected to the clean room to form a passage area.

[0048] It is advantageous if several locking devices are provided and these can be opened sequentially. In this case, the locking devices facing the lock chamber are opened first, so that when the inner locking devices are opened, the lock chamber is enlarged.

[0049] Once the airlock cleaning system or the overpressure device have created conditions in the airlock that allow the airlock to merge with the respective clean rooms, a final locking device can be opened. This creates the passageway.

[0050] If only one closure device is provided, the desired cleanroom conditions must preferably be created in the lock chamber without resorting to a sequential expansion of the lock chamber. While this increases the cleaning effort within the lock area, it may be possible to dispense with the need for multiple closure devices in the first lock section and / or the second lock section.

[0051] In an advantageous further development of the device according to the invention, it can be provided that a lock chamber cleaning device is provided and is designed to clean the lock chamber to be formed.

[0052] Particularly low contamination can be achieved in conjunction by blowing out the airlock room or the space between the mobile cleanroom and the second cleanroom with cleanroom air using the airlock room cleaning device.

[0053] In an advantageous development of the device according to the invention, it can be provided that a contact device is provided in the first lock part and is designed to be brought into contact with another contact device for forming the lock chamber in such a way that an internal atmosphere of the lock chamber is separated from an ambient atmosphere.

[0054] It is particularly advantageous if the contact device has at least one elastic element, for example a rubber buffer, or consists of at least one elastic element, for example a rubber buffer. The contact device, especially when designed as a rubber buffer, advantageously seals the lock chamber or the space between the two clean rooms from the environment.

[0055] It can advantageously be provided that the contact device has at least one projection and / or at least one indentation for receiving a projection.

[0056] If projections or steps are provided, the enclosed or sealed design of the lock chamber can be reliably realized.

[0057] In an advantageous development of the device according to the invention, it can be provided that an overpressure device is provided and configured to generate an overpressure in the lock chamber relative to an environment.

[0058] To prevent contaminants or particles from entering the airlock, it is advantageous to create an overpressure in the airlock relative to the ambient air. The overpressure device can, in particular, be identical to the overpressure device of the mobile cleanroom and / or the overpressure device of the second cleanroom. In these cases, the airlock would be supplied with the appropriate overpressure from the mobile cleanroom and / or the second cleanroom to create a cleanroom environment.

[0059] It can advantageously be provided that the at least one locking device is designed as a roller shutter.

[0060] The use of a roller door as a closing device has the advantage that roller doors do not swing out and therefore require less space and reduce the risk of contamination being stirred up or introduced into the lock room and / or the respective clean room.

[0061] In an advantageous development of the device according to the invention, it can be provided that a tunnel-like insertion device is provided and can be introduced into the passage area.

[0062] For this purpose, it is preferably provided that the at least one closure device can be opened in such a way that the lock room is connected to the clean room to form a passage area.

[0063] The use of the tunnel-like insertion device represents a more precise design of the lock chamber. The lock chamber itself often has the inherent property of creating dirty areas during docking of the lock section(s). These areas conflict with clean room requirements.

[0064] The tunnel-like insertion system prevents contaminants from the airlock area from being carried into the mobile cleanroom and / or the second cleanroom. This also prevents contamination of the cleanrooms.

[0065] The tunnel-like insertion device may be designed as a multi-stage tunnel. Thus, the tunnel-like insertion device may be initially arranged in the lock chamber and may be telescopically enlarged upon opening of the respective closure device such that the lock chamber can be successively covered by the tunnel-like insertion device.

[0066] It can be provided that the insertion device has a folding mechanism and / or is formed from more than one part.

[0067] It can also be provided that the tunnel-like insertion device is formed from two or more tunnel-shaped partial insertion devices, which preferably interact to form the tunnel-like insertion device.

[0068] In particular, it can be provided that one of the two tunnel-shaped partial insertion devices is arranged and / or stored in the mobile cleanroom and the second cleanroom. Preferably, each of the two tunnel-shaped partial insertion devices can be introduced into the lock chamber from the side of the respective cleanroom.

[0069] Preferably, each of the two tunnel-shaped partial insertion devices forms one half of the tunnel-like insertion device.

[0070] In an advantageous development of the device according to the invention, it can be provided that the insertion device is designed as a tube, preferably as a square tube with a square or rectangular cross-section of 0.5 mx 0.5 m to 3 mx 3 m.

[0071] Designing the insertion device as a square tube with the aforementioned dimensions has the advantage that standardized parts and components can be inserted through such a rectangular cross-section in a particularly simple manner.

[0072] A rectangular cross-section with edge lengths of 0.7 m x 0.7 m can also be particularly advantageous. In general, it is advantageous if the mobile cleanroom has the external dimensions of a standard ISO container, i.e., a standardized large-capacity container. In particular, it is advantageous if the mobile cleanroom has a width of 8 feet, a height of 8 feet, and a length of 20 feet or 40 feet.

[0073] The mobile cleanroom preferably has the dimensions of a 40-foot container (1-FEU container), a 40-foot container (“high cube”) or a 20-foot container (1-TEU container).

[0074] In this context, it is advantageous if the cross-section of the insertion device is dimensioned such that it can be inserted at one end of the mobile cleanroom. It is therefore particularly advantageous if the cross-section is less than 2.4 m x 2.4 m.

[0075] A smaller cross-section, such as 0.7 m x 0.7 m, has the advantage that a smaller lock chamber has to be cleaned and thus the probability of contamination is reduced.

[0076] Automating the loading and unloading of the mobile cleanroom is particularly advantageous when dealing with small cross-sections. This is especially true since entering the mobile cleanroom through a 0.7 m x 0.7 m opening to remove a component for transport is ergonomically disadvantageous.

[0077] A standardized cross-section of the tunnel-shaped insertion device of 1 m width x 2 m height would be particularly advantageous, if necessary with a deviation of + / - 10%.

[0078] In an advantageous development of the device according to the invention, it can be provided that the insertion device is made of stainless steel and / or aluminum.

[0079] A stainless steel or aluminum version of the tunnel-like insertion device offers the advantage of being easy to clean, thus meeting cleanroom requirements.

[0080] The use of the device in semiconductor manufacturing processes is particularly advantageous.

[0081] In particular, a mirror to be transported in a projection exposure system can weigh hundreds of kilograms. This makes it advantageous to construct the tunnel-like insertion device from a sturdy material, particularly aluminum and / or stainless steel.

[0082] Furthermore, the assembly, disassembly, or maintenance of a projection exposure system may require the transport of several to tens of tons of material. In this case, it is advantageous if the tunnel-like insertion device is made of a correspondingly durable material, such as aluminum and / or stainless steel. The insertion device can, for example, weigh up to 2 tons.

[0083] A transport device may be provided for inserting the insertion device into the passage area.

[0084] It can be provided that the tunnel-like insertion device is arranged on one side of the transport device and is designed to be self-supporting on the other side. This allows the tunnel-like insertion device to be inserted into the passageway from one of the clean rooms. To ensure such maneuverability of the insertion device, it is advantageous if the transport device has a sufficiently high dead weight to prevent the insertion device from tipping towards the unsupported side.

[0085] The transport device may be designed as a crane or comprise a crane. Furthermore, the insertion device may be transported in a rolling or suspended manner by means of the transport device.

[0086] In an advantageous development of the device according to the invention, it can be provided that one or more, preferably expandable, in particular inflatable, sealing lips are provided for sealing the insertion device against the passage area.

[0087] It is advantageous if the tunnel-like insertion device is additionally protected against contamination by the sealing lips. Furthermore, a vacuum can be provided between the tunnel-like insertion device and a wall of the lock chamber to prevent particles from the wall of the lock chamber from coming into contact with the tunnel-like insertion device.

[0088] It can be provided that the sealing lips are made of a flexible material.

[0089] It may advantageously be provided that a secondary container is provided for storing the insertion device.

[0090] If the tunnel-like insertion device is stored in the secondary container, which is arranged, for example, in the mobile clean room and / or the second clean room, any contamination adhering to the insertion device can be contained in the secondary container, which reduces the risk of contamination of the respective clean room.

[0091] In an advantageous development of the device according to the invention, a tunnel cleaning device can be provided for cleaning the insertion device. It is advantageous if the tunnel-like insertion device is cleaned from the outside after the insertion process.

[0092] The tunnel cleaning device can also have brushes in an area of ​​the passage area, which already subject the insertion device to a basic cleaning when the insertion device is removed from the passage area.

[0093] It is particularly advantageous if the cleaning takes place inside the secondary container.

[0094] In this case, the tunnel can advantageously be retracted into the secondary container so that the potentially contaminated outer side of the insertion device is not exposed to the respective clean room.

[0095] Furthermore, cleaning after the insertion process can save time when transferring components. This results from the temporal separation of the transfer and cleaning. In particular, if multiple insertion devices are available, they can be used alternately for insertion and / or cleaning.

[0096] A fully automated tunnel cleaning system is also particularly advantageous in order to further minimize time expenditure.

[0097] The invention further relates to a clean room having the features mentioned in claim 13.

[0098] The clean room according to the invention, which is designed in particular as a mobile clean room or stationary clean room, comprises the above-described device according to the invention and / or at least one of the developments of the device according to the invention described as advantageous, wherein the device is arranged in or at an opening of the clean room.

[0099] The cleanroom according to the invention has the advantage that the device advantageously increases the airlock capacity and thus the material input and output into and out of the cleanroom. This improves the inward and / or outward transfer capacity into and out of the cleanroom.

[0100] Furthermore, the cleanroom according to the invention, particularly when designed as a mobile cleanroom, can improve the flexibility of cleanroom logistics. For example, the cleanroom according to the invention allows for easy relocation of components stored in the cleanroom.

[0101] Furthermore, the cleanroom according to the invention enables a shorter insertion time compared to known cleanrooms. The shortened insertion time is also related to the reduction in the effort required to insert components into the cleanroom that can be achieved with the cleanroom according to the invention.

[0102] Furthermore, a component stored in the cleanroom can be removed from the cleanroom particularly easily.

[0103] It can be provided that the clean room is designed as a standard container, in particular a standard shipping container, for example with the aforementioned dimensions.

[0104] It can be provided that the clean room is equipped for transporting at least one component of a lithography system, in particular a projection exposure system.

[0105] It can be provided that at least one component of a lithography system, in particular a projection exposure system, is arranged in the clean room as part of the clean room.

[0106] The invention further relates to a clean room system having the features mentioned in claim 14.

[0107] The cleanroom system according to the invention comprises at least one mobile cleanroom and at least one second cleanroom. According to the invention, it is provided that a) the at least one mobile cleanroom has a device according to the invention or one of the developments of the device according to the invention, or b) the at least second cleanroom has a device according to the invention or one of the developments of the device according to the invention, or c) the at least one mobile cleanroom has a device according to the invention or one of the developments of the device according to the invention, and the at least one second cleanroom also has a device according to the invention or one of the developments of the device according to the invention, with the proviso that the device of the mobile cleanroom and the device of the second cleanroom are designed such that, in interaction, they can at least partially form a closed airlock space.wherein clean room conditions exist in the mobile clean room and / or the at least one second clean room, wherein a cleanliness corresponds to at least one cleanliness class ISO 4 according to ISO 14644-1.,

[0108] In the cleanroom system according to the invention, a mobile cleanroom can be docked to a second cleanroom, preferably a fixed or stationary cleanroom. The cleanroom system according to the invention allows any contamination present in the airlock to be separated from the cleanroom areas.

[0109] It is particularly advantageous if the mobile cleanroom is designed to maintain itself as a cleanroom.

[0110] For this purpose, a device for generating recirculation, air purification and / or air conditioning may be provided.

[0111] The cleanroom system according to the invention has the advantage that when loading the mobile cleanroom, a component or part to be transported can be brought directly into the mobile cleanroom.

[0112] This allows, in particular, savings in packaging material, thereby improving sustainability. Furthermore, the mobile cleanroom in the cleanroom system according to the invention can be used for transport and docked to the appropriately equipped hall of the second cleanroom.

[0113] It is advantageous if more than two cleanrooms are planned within the cleanroom system. The greater the number of compatible cleanrooms, whether mobile or stationary, the greater the intercompatibility and thus the simplification of a supply chain process.

[0114] It is particularly advantageous if the devices according to the invention are provided in a large number of cleanrooms, whether mobile or stationary, so that all of these cleanrooms can be connected to one another via the airlock, preferably as an industry standard. In particular, for example, a fleet of mobile cleanrooms can be used for supply and exchange between a large number of stationary cleanrooms. If the device to be used is highly uniform or standardized, it does not matter which specific mobile cleanroom docks to which specific stationary cleanroom.

[0115] In particular, an exchange of components between two mobile cleanrooms or a docking of two mobile cleanrooms to each other can also be provided.

[0116] In general, the second cleanroom can also be a mobile cleanroom.

[0117] After loading the mobile cleanroom, it can be locked, undocked, and transported, for example, to a third cleanroom. There, the mobile cleanroom can be docked and reopened; a component or part to be transported can be removed from the mobile cleanroom under cleanroom conditions and transported directly to the third cleanroom. The cleanroom system can be configured to transport at least one component of a lithography system, in particular a projection exposure system.

[0118] It can be provided that in the mobile clean room and / or the second clean room at least one component of a lithography system, in particular a projection exposure system, is arranged as part of the clean room system.

[0119] The invention further relates to a method having the features mentioned in claim 15.

[0120] The method according to the invention serves for the detachable connection of at least one mobile cleanroom to at least one second cleanroom, wherein a closed airlock chamber is formed at least temporarily between the mobile cleanroom and the second cleanroom by means of a first airlock part in cooperation with a second airlock part, wherein the mobile cleanroom and the second cleanroom are tightly sealed off from the airlock chamber and / or an environment by one or more, preferably more than two, particularly preferably exactly three, openable closure devices. It is provided that cleanroom conditions exist in the mobile cleanroom and / or the at least one second cleanroom, wherein a cleanliness corresponds to at least a cleanliness class ISO 4 according to ISO 14644-1.

[0121] The method according to the invention can advantageously be used in the transport of components which require clean room conditions from a first clean room, in particular a mobile clean room, to a second clean room, in particular one which is not directly connected to the mobile clean room.

[0122] As part of the method, a transport of at least one component of a lithography system, in particular a projection exposure system, can be provided. In particular, it can be provided that the at least one component of the lithography system is moved through the lock chamber.

[0123] The method according to the invention can provide for components to be removed from the mobile clean room and introduced into the second clean room or vice versa.

[0124] In the method according to the invention, it can be provided that at least one component of a lithography system, in particular a projection exposure system, is removed from the mobile clean room and introduced into the second clean room or vice versa.

[0125] Advantageously, with the method according to the invention, the components do not need to be extensively packaged during removal to protect them from an environment between the cleanrooms that does not meet cleanroom conditions. Furthermore, with the method according to the invention, no packaging needs to be removed when moving into the mobile or second cleanroom, and the component does not need to be inspected or cleaned for further use in the mobile or second cleanroom.

[0126] To separate areas of different cleanroom levels, it is advantageous to separate areas of different cleanroom levels from each other. This separation can preferably be achieved by roller shutters. It is particularly advantageous if the locking device, in particular roller shutters, are installed in a row directly behind one another.

[0127] In an advantageous development of the method according to the invention, it can be provided that a contact device of the mobile clean room and a contact device of the second clean room are brought into contact to form the lock room in such a way that an internal atmosphere of the lock room is separated from an ambient atmosphere and / or the lock room is cleaned by means of a lock room cleaning device.

[0128] To open the connection between the two cleanrooms, i.e., the mobile cleanroom and the second cleanroom, the spaces between two closure devices are preferably flushed. This is preferably done from the inside, i.e., from the airlock room, to the outside, i.e., toward the cleanrooms.

[0129] The airlock cleaning device can also be used to flush the spaces between the locking devices. This can, in particular, be an air shower, such as the one used for airlocking.

[0130] After cleaning the spaces between the locking devices or between the roller doors, the roller doors are preferably opened.

[0131] This preferably results in a direct cleanroom connection between the cleanrooms.

[0132] By bringing the contact devices into contact, the mobile cleanroom can be docked to the second cleanroom.

[0133] This is preferably done by bringing the two lock parts closer together.

[0134] The lock parts have the contact device, for example a rubber buffer.

[0135] It may be provided that the contact devices are designed to seal the clean rooms and the interior of the resulting airlock room from the outside.

[0136] It is advantageous to conduct intermediate tests before opening the sealing devices. This can be done by specifying that the subsequent sealing device only opens when conditions in the airlock chamber meet the specified cleanliness requirements. The specified cleanliness requirements before opening the next sealing level should preferably be aligned with the specified cleanliness or cleanliness class of the cleanrooms involved.

[0137] In an advantageous development of the method according to the invention, it can be provided that the closure devices are opened sequentially in such a way that first the lock chamber is enlarged and then the lock chamber is connected to the clean rooms to form a passage area.

[0138] By sequentially flushing intermediate areas, in particular by means of the airlock cleaning device, and sequentially opening the locking devices or the roller doors, an air-clean clean room connection can also be established.

[0139] However, those surface areas that were previously exposed to gray and black areas, i.e., areas with less or more severe soiling, may be superficially contaminated. Such superficial soiling often cannot be completely removed by air rinsing.

[0140] In an advantageous development of the method according to the invention, it can be provided that a tunnel-like insertion device is introduced, preferably from one of the clean rooms, into the passage area.

[0141] In order to exclude contaminants adhering to the lock chamber from the respective clean rooms, it can be provided that the tunnel-like insertion device is introduced into the transition or the lock chamber.

[0142] This can be done in particular by inserting the tunnel-like insertion device.

[0143] Preferably, the tunnel-like insertion device is inserted from one of the two clean rooms into the airlock chamber. This allows the tunnel-like insertion device to be cleaned in such a way that, after insertion, all surfaces meet cleanroom conditions.

[0144] The insert can therefore be inserted into the transition tightly and cleanly.

[0145] Thus, the unclean surfaces created in the docking area by the connection can be separated from the respective clean rooms by inserting the tunnel-like insertion device. In an advantageous development of the method according to the invention, it can be provided that the insertion device is sealed against the passage area by means of one or more, preferably expandable, in particular inflatable, sealing lips.

[0146] Appropriate sealing can create a tight connection between the tunnel-shaped insertion device and the airlock chamber. Sealing can be achieved, in particular, in the form of sealing lips. Furthermore, sealing the insertion device prevents contamination of the clean room.

[0147] In an advantageous development of the method according to the invention, it can be provided that at least one component is moved from the mobile clean room into the second clean room and / or is moved from the second clean room into the mobile clean room through the insertion device.

[0148] Since the component would be unduly contaminated during transfer between the mobile clean room and the second clean room without appropriate protective procedures, the protective procedures provided by the method according to the invention are advantageous in order to avoid contamination.

[0149] According to the method according to the invention, the protective procedures ensure that a clean room environment is created or maintained in an area around the component to be transported.

[0150] Compared to the prior art methods, the method according to the invention has the advantage that a clean room environment is not only created or maintained in the immediate vicinity of the component to be transported. This eliminates the need for complex procedures and protective wrapping, which must be disposed of after transport.

[0151] In the method according to the invention, the need for protective enclosures is reduced by the use of a mobile clean room.

[0152] Furthermore, the method according to the invention does not lead to any contamination and therefore also to no damage to the component to be transported.

[0153] Preferably, the mobile cleanroom can be docked to various halls, in particular the second cleanroom. The second cleanroom can be a hall.

[0154] It can be provided that when loading the mobile cleanroom, the component to be transported is brought directly into the mobile cleanroom.

[0155] Preferably, the mobile cleanroom is closed immediately after loading, undocked, and transported to a second cleanroom or hall, where it is docked and reopened. The component or part to be transported can then be moved directly from the mobile cleanroom to the second cleanroom.

[0156] A cleanroom from which the mobile cleanroom is loaded and also a cleanroom into which the mobile cleanroom is unloaded are considered a second cleanroom within the meaning of the invention.

[0157] To implement the method according to the invention, a mobile clean room is therefore advantageous, which is able to maintain itself as a clean room through the use of recirculating air, air circulation, air conditioning, etc.

[0158] Furthermore, it is advantageous to have a second lock part or a docking device on the second, for example non-mobile, cleanroom, which makes it possible to establish a cleanroom connection between the mobile cleanroom and the, for example, stationary or fixed, second cleanroom without causing contamination.

[0159] It can advantageously be provided that the tunnel-like insertion device is moved from the passage area, preferably into one of the clean rooms, after which the insertion device is preferably cleaned.

[0160] When not inserted, the drawer can be kept clean.

[0161] In particular, undocking of the mobile cleanroom or releasing the detachable connection between the mobile cleanroom and the second cleanroom can be carried out in the reverse order of the prescribed steps of docking or establishing the detachable connection.

[0162] The invention further relates to a lithography system having the features mentioned in claim 21.

[0163] The lithography system according to the invention, in particular a projection exposure system for producing a semiconductor component, comprises a plurality of components, including in particular an illumination system with a radiation source and an optical system having at least one optical element. According to the invention, at least one of the components and / or the entire lithography system is manufactured and / or arranged in a cleanroom according to the invention and / or in a cleanroom system according to the invention. Alternatively or additionally, at least one of the components and / or the entire lithography system is manufactured and / or transported by means of a device according to the invention and / or by means of a method according to the invention.

[0164] The lithography system according to the invention is characterized by particularly clean components. Furthermore, the manufacture, processing, repair, operation, and / or installation of the lithography system according to the invention is also possible in a particularly economical and efficient manner if the components can be transported to the lithography system and / or from the lithography system to another location using the device according to the invention, the method according to the invention, the clean room according to the invention, and / or the clean room system according to the invention.

[0165] This makes the lithography system according to the invention particularly easy to maintain.

[0166] As described above, the invention preferably comprises, among other things, a mobile clean room container and, within the scope of the device according to the invention, a door concept which is provided by the lock parts, the at least one closure device and the insertion device.

[0167] The door concept of the device enables the mobile cleanroom to be connected to the second, preferably stationary or fixed cleanroom. In particular, it can enable the mobile cleanroom to be connected to several, preferably stationary and spaced-apart cleanrooms.

[0168] The subject matter of the invention enables transport under clean room conditions within a manufacturing process of lithography systems, but also in a field application of lithography systems.

[0169] Of particular advantage here is the door concept of the device, which is used in combination with the mobile cleanroom and the second cleanroom to be connected.

[0170] The device according to the invention, the clean room according to the invention, the clean room system according to the invention and the method according to the invention are advantageously applicable not only with regard to lithography systems themselves, but also with regard to all other objects, materials and tools that are necessary or advantageous in a clean room for the production and / or movement of lithography systems.

[0171] Thus, the device according to the invention, the cleanroom according to the invention, the cleanroom system according to the invention and the method according to the invention are also applicable to equipment that is typically located in cleanrooms and / or is typically used in cleanrooms.

[0172] The device according to the invention, the clean room according to the invention, the clean room system according to the invention and the method according to the invention can be used advantageously in particular during those times in which the aforementioned equipment has to be brought into the clean room.

[0173] This can be particularly the case if the equipment needs to be moved to another location for repair, service, or temporary storage, or if production is relocated. An exemplary scenario illustrating how the device according to the invention, the cleanroom according to the invention, the cleanroom system according to the invention, and the method according to the invention can be advantageously applied is the delivery of a cleanroom-clean machine directly from a manufacturer. In this case, it is advantageous if the mobile cleanroom and a second cleanroom located at the manufacturer have a device according to the invention, for example, a docking device.

[0174] Other example scenarios include outsourcing of tools that are not currently needed to save space and partial outsourcing of value stream processes.

[0175] Features described in connection with one of the subject matters of the invention, namely the device according to the invention, the cleanroom according to the invention, the cleanroom system according to the invention, the method according to the invention, or the lithography system according to the invention, can also be advantageously implemented for the other subject matters of the invention. Likewise, advantages mentioned in connection with one of the subject matters of the invention can also be understood to relate to the other subject matters of the invention.

[0176] It should also be noted that terms such as "comprising," "having," or "with" do not exclude other features or steps. Furthermore, terms such as "a" or "the," which indicate a singular number of steps or features, do not exclude a plurality of features or steps—and vice versa.

[0177] In a purist embodiment of the invention, however, it may also be provided that the features introduced in the invention with the terms "comprising," "having," or "with" are listed exhaustively. Accordingly, one or more lists of features may be considered complete within the scope of the invention, for example, for each claim. The invention may, for example, consist exclusively of the features mentioned in claim 1.

[0178] It should be noted that terms such as "first" or "second" etc. are used primarily for reasons of distinguishing between respective device or process features and are not necessarily intended to indicate that features are mutually dependent or related to one another.

[0179] In the following, embodiments of the invention are described in more detail with reference to the drawing.

[0180] The figures each show preferred embodiments in which individual features of the present invention are illustrated in combination with one another. Features of one embodiment can also be implemented independently of the other features of the same embodiment and can therefore be readily combined by a person skilled in the art to form further useful combinations and subcombinations with features of other embodiments. In the figures, functionally equivalent elements are provided with the same reference numerals.

[0181] They show:

[0182] Figure 1 shows an EUV projection exposure system in meridional section;

[0183] Figure 2 shows a DUV projection exposure system;

[0184] Figure 3 is a schematic representation of a possible embodiment of a device according to the invention;

[0185] Figure 4 is a schematic representation of another possible embodiment of a device according to the invention;

[0186] Figure 5 shows a further schematic representation of the embodiment of the device according to the invention according to Figure 4;

[0187] Figure 6 shows a further schematic representation of the embodiment of the device according to the invention according to Figure 4;

[0188] Figure 7 shows a further schematic representation of the embodiment of the device according to the invention according to Figure 4;

[0189] Figure 8 shows a further schematic representation of the embodiment of the device according to the invention according to Figure 4;

[0190] Figure 9 is a schematic representation of another possible embodiment of the device according to the invention;

[0191] Figure 10 is a schematic representation of another possible embodiment of the device according to the invention;

[0192] Figure 11 shows a further schematic representation of the embodiment of the device according to the invention according to Figure 10;

[0193] Figure 12 is a schematic representation of another possible embodiment of the device according to the invention;

[0194] Figure 13 is a schematic representation of a possible embodiment of a clean room system according to the invention; Figure 14 is a block diagram representation of a possible embodiment of a method according to the invention; and

[0195] Figure 15 is a schematic representation of a conventional method of component transport.

[0196] In the following, the essential components of an EUV projection exposure system 100 for microlithography are described as an example of a lithography system, with reference to Figure 1. The description of the basic structure of the EUV projection exposure system 100 and its components is not intended to be limiting.

[0197] An illumination system 101 of the EUV projection exposure system 100 comprises, in addition to a radiation source 102, an illumination optics 103 for illuminating an object field 104 in an object plane 105. A reticle 106 arranged in the object field 104 is exposed. The reticle 106 is held by a reticle holder 107. The reticle holder 107 can be displaced, in particular in a scanning direction, via a reticle displacement drive 108.

[0198] Figure 1 shows a Cartesian xyz coordinate system for illustrative purposes. The x-direction runs perpendicular to the drawing plane. The y-direction runs horizontally, and the z-direction runs vertically. The scanning direction in Figure 1 runs along the y-direction. The z-direction runs perpendicular to the object plane 105.

[0199] The EUV projection exposure system 100 comprises a projection optics 109. The projection optics 109 serves to image the object field 104 into an image field 110 in an image plane 111. The image plane 111 runs parallel to the object plane 105. Alternatively, an angle other than 0° between the object plane 105 and the image plane 111 is also possible.

[0200] A structure on the reticle 106 is imaged onto a light-sensitive layer of a wafer 112 arranged in the image plane 111 in the region of the image field 110. The wafer 112 is held by a wafer holder 113. The wafer holder 113 can be displaced, in particular along the y-direction, via a wafer displacement drive 114. The displacement of the reticle 106, on the one hand, via the reticle displacement drive 108, and the wafer 112, on the other hand, via the wafer displacement drive 114, can be synchronized with each other.

[0201] The radiation source 102 is an EUV radiation source. The radiation source 102 emits, in particular, EUV radiation 115, which is also referred to below as useful radiation or illumination radiation. The useful radiation 115 has, in particular, a wavelength in the range between 5 nm and 30 nm. The radiation source 102 can be a plasma source, for example, an LPP source ("Laser Produced Plasma") or a DPP source ("Gas Discharged Produced Plasma"). It can also be a synchrotron-based radiation source. The radiation source 102 can be a free-electron laser ("FEL").

[0202] The illumination radiation 115 emanating from the radiation source 102 is focused by a collector 116. The collector 116 can be a collector with one or more ellipsoidal and / or hyperboloidal reflection surfaces. The at least one reflection surface of the collector 116 can be exposed to the illumination radiation 115 at grazing incidence (Gl), i.e., at angles of incidence greater than 45°, or at normal incidence (NI), i.e., at angles of incidence less than 45°. The collector 116 can be structured and / or coated, on the one hand, to optimize its reflectivity for the useful radiation 115 and, on the other hand, to suppress stray light.

[0203] After the collector 116, the illumination radiation 115 propagates through an intermediate focus in an intermediate focal plane 117. The intermediate focal plane 117 can represent a separation between a radiation source module, comprising the radiation source 102 and the collector 116, and the illumination optics 103.

[0204] The illumination optics 103 comprises a deflecting mirror 118 and, downstream of this in the beam path, a first facet mirror 119. The deflecting mirror 118 can be a flat deflecting mirror or, alternatively, a mirror with a beam-influencing effect beyond the pure deflection effect. Alternatively or additionally, the deflecting mirror 118 can be designed as a spectral filter that separates a useful light wavelength of the illumination radiation 115 from stray light of a different wavelength. If the first facet mirror 119 is arranged in a plane of the illumination optics 103 that is optically conjugated to the object plane 105 as the field plane, it is also referred to as a field facet mirror. The first facet mirror 119 comprises a plurality of individual first facets 120, which are also referred to below as field facets. Only a few of these facets 120 are shown in Figure 1 as examples.

[0205] The first facets 120 can be designed as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or partially circular edge contour. The first facets 120 can be designed as flat facets or, alternatively, as convexly or concavely curved facets.

[0206] As is known, for example, from DE 10 2008 009 600 A1, the first facets 120 themselves can also be composed of a plurality of individual mirrors, in particular a plurality of micromirrors. The first facet mirror 119 can, in particular, be designed as a microelectromechanical system (MEMS system). For details, reference is made to DE 10 2008 009 600 A1.

[0207] Between the collector 116 and the deflection mirror 118, the illumination radiation 115 travels horizontally, i.e., along the y-direction. In the beam path of the illumination optics 103, a second facet mirror 121 is arranged downstream of the first facet mirror 119. If the second facet mirror 121 is arranged in a pupil plane of the illumination optics 103, it is also referred to as a pupil facet mirror. The second facet mirror 121 can also be arranged at a distance from a pupil plane of the illumination optics 103. In this case, the combination of the first facet mirror 119 and the second facet mirror 121 is also referred to as a specular reflector. Specular reflectors are known from US 2006 / 0132747 A1, EP 1 614 008 B1 and US 6,573,978.

[0208] The second facet mirror 121 comprises a plurality of second facets 122. In the case of a pupil facet mirror, the second facets 122 are also referred to as pupil facets.

[0209] The second facets 122 can also be macroscopic facets, which can, for example, be round, rectangular, or hexagonal, or alternatively facets composed of micromirrors. Reference is also made to DE 10 2008 009 600 A1 in this regard.

[0210] The second facets 122 may have planar or alternatively convex or concave curved reflection surfaces.

[0211] The illumination optics 103 thus forms a double-faceted system. This basic principle is also referred to as a fly's-eye integrator.

[0212] It may be advantageous not to arrange the second facet mirror 121 exactly in a plane which is optically conjugated to a pupil plane of the projection optics 109.

[0213] With the help of the second facet mirror 121, the individual first facets 120 are imaged into the object field 104. The second facet mirror 121 is the last beam-forming mirror, or actually the last mirror for the illumination radiation 115 in the beam path before the object field 104.

[0214] In a further, not-shown embodiment of the illumination optics 103, a transmission optics can be arranged in the beam path between the second facet mirror 121 and the object field 104, which transmission optics contributes in particular to the imaging of the first facets 120 into the object field 104. The transmission optics can have exactly one mirror, but alternatively also two or more mirrors arranged one behind the other in the beam path of the illumination optics 103. The transmission optics can in particular comprise one or two mirrors for normal incidence (NI mirrors, "normal incidence" mirrors) and / or one or two mirrors for grazing incidence (GL mirrors, "grazing incidence" mirrors). In the embodiment shown in Figure 1, the illumination optics 103 has exactly three mirrors after the collector 116, namely the deflection mirror 118, the field facet mirror 119 and the pupil facet mirror 121.

[0215] In a further embodiment of the illumination optics 103, the deflection mirror 118 can also be omitted, so that the illumination optics 103 can then have exactly two mirrors after the collector 116, namely the first facet mirror 119 and the second facet mirror 121.

[0216] The imaging of the first facets 120 by means of the second facets 122 or with the second facets 122 and a transmission optics into the object plane 105 is usually only an approximate imaging.

[0217] The projection optics 109 comprises a plurality of mirrors Mi, which are numbered according to their arrangement in the beam path of the EUV projection exposure system 100.

[0218] In the example shown in Figure 1, the projection optics 109 comprises six mirrors M1 to M6. Alternatives with four, eight, ten, twelve, or a different number of mirrors M1 are also possible. The penultimate mirror M5 and the last mirror M6 each have a passage opening for the illumination radiation 115. The projection optics 109 are doubly obscured optics. The projection optics 109 have an image-side numerical aperture that is greater than 0.5 and can also be greater than 0.6, for example, 0.7 or 0.75.

[0219] Reflection surfaces of the mirrors Mi can be designed as freeform surfaces without a rotational symmetry axis. Alternatively, the reflection surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one rotational symmetry axis of the reflection surface shape. The mirrors Mi, like the mirrors of the illumination optics 103, can have highly reflective coatings for the illumination radiation 115. These coatings can be designed as multilayer coatings, in particular with alternating layers of molybdenum and silicon.

[0220] The projection optics 109 has a large object-image offset in the y-direction between a y-coordinate of a center of the object field 104 and a y-coordinate of the center of the image field 110. This object-image offset in the y-direction can be approximately as large as a z-distance between the object plane 105 and the image plane 111.

[0221] The number of intermediate image planes in the x- and y-directions in the beam path between the object field 104 and the image field 110 can be the same or can be different, depending on the design of the projection optics 109. Examples of projection optics with different numbers of such intermediate images in the x- and y-directions are known from US 2018 / 0074303 A1. Each of the pupil facets 122 is assigned to exactly one of the field facets 120 to form a respective illumination channel for illuminating the object field 104. This can result in particular in illumination according to the Köhler principle. The far field is divided into a plurality of object fields 104 with the aid of the field facets 120. The field facets 120 generate a plurality of images of the intermediate focus on the pupil facets 122 assigned to them.

[0222] The field facets 120 are each imaged onto the reticle 106 by an associated pupil facet 122, superimposed on one another, to illuminate the object field 104. The illumination of the object field 104 is, in particular, as homogeneous as possible. It preferably has a uniformity error of less than 2%. Field uniformity can be achieved by superimposing different illumination channels.

[0223] By arranging the pupil facets, the illumination of the entrance pupil of the projection optics 109 can be geometrically defined. By selecting the illumination channels, in particular the subset of the pupil facets that guide light, the intensity distribution in the entrance pupil of the projection optics 109 can be adjusted. This intensity distribution is also referred to as the illumination setting.

[0224] A likewise preferred pupil uniformity in the area of ​​defined illuminated sections of an illumination pupil of the illumination optics 103 can be achieved by redistributing the illumination channels.

[0225] Further aspects and details of the illumination of the object field 104 and in particular of the entrance pupil of the projection optics 109 are described below.

[0226] The projection optics 109 can, in particular, have a homocentric entrance pupil. This can be accessible. It can also be inaccessible.

[0227] The entrance pupil of the projection optics 109 cannot usually be precisely illuminated with the pupil facet mirror 121. When imaging the projection optics 109, which telecentrically images the center of the pupil facet mirror 121 onto the wafer 112, the aperture rays often do not intersect at a single point. However, a surface can be found in which the pairwise determined spacing of the aperture rays is minimized. This surface represents the entrance pupil or a surface conjugate to it in spatial space. In particular, this surface exhibits a finite curvature.

[0228] It is possible that the projection optics 109 have different entrance pupil positions for the tangential and sagittal beam paths. In this case, an imaging element, in particular an optical component of the transmission optics, should be provided between the second facet mirror 121 and the reticle 106. With the help of this optical component, the different positions of the tangential entrance pupil and the sagittal entrance pupil can be taken into account. In the arrangement of the components of the illumination optics 103 shown in Figure 1, the pupil facet mirror 121 is arranged in a surface conjugated to the entrance pupil of the projection optics 109. The first field facet mirror 119 is arranged tilted relative to the object plane 105. The first facet mirror 119 is arranged tilted relative to an arrangement plane defined by the deflection mirror 118.

[0229] The first facet mirror 119 is arranged tilted to an arrangement plane which is defined by the second facet mirror 121.

[0230] Figure 2 shows an exemplary DUV projection exposure system 200. The DUV projection exposure system 200 has an illumination system 201, a device called a reticle stage 202 for receiving and precisely positioning a reticle 203, by means of which the subsequent structures on a wafer 204 are determined, a wafer holder 205 for holding, moving, and precisely positioning the wafer 204, and an imaging device, namely a projection optics system 206, with a plurality of optical elements, in particular lenses 207, which are held via mounts 208 in an objective housing 209 of the projection optics system 206.

[0231] Alternatively or in addition to the lenses 207 shown, various refractive, diffractive and / or reflective optical elements, including mirrors, prisms, end plates and the like, may be provided.

[0232] The basic functional principle of the DUV projection exposure system 200 provides that the structures introduced into the reticle 203 are imaged onto the wafer 204.

[0233] The illumination system 201 provides a projection beam 210 in the form of electromagnetic radiation required for imaging the reticle 203 onto the wafer 204. A laser, a plasma source, or the like can be used as the source for this radiation. The radiation is shaped in the illumination system 201 via optical elements such that the projection beam 210 has the desired properties regarding diameter, polarization, wavefront shape, and the like when it strikes the reticle 203.

[0234] An image of the reticle 203 is generated by the projection beam 210 and transferred to the wafer 204 in a correspondingly reduced size by the projection optics 206. The reticle 203 and the wafer 204 can be moved synchronously, so that regions of the reticle 203 are imaged onto corresponding regions of the wafer 204 practically continuously during a so-called scanning process.

[0235] Optionally, an air gap between the last lens 207 and the wafer 204 can be replaced by a liquid medium having a refractive index greater than 1.0. The liquid medium can be, for example, ultrapure water. Such a setup is also referred to as immersion lithography and has increased photolithographic resolution. The use of the invention is not limited to use in projection exposure systems 100, 200, in particular not with the described setup. The invention is suitable for any lithography systems or microlithography systems, but in particular for projection exposure systems with the described setup. The invention is also suitable for EUV projection exposure systems which have a smaller image-side numerical aperture than that described in connection with Figure 1 and do not have an obscured mirror M5 and / or M6.In particular, the invention is also suitable for EUV projection exposure systems having an image-side numerical aperture of 0.25 to 0.5, preferably 0.3 to 0.4, particularly preferably 0.33. Furthermore, the invention and the following embodiments are not to be understood as being limited to a specific design.

[0236] The following figures represent the invention merely by way of example and in a highly schematic manner.

[0237] Figure 3 shows a schematic representation of a possible embodiment of a device 1 for detachably connecting at least one mobile cleanroom 2 to at least one second cleanroom 3. The device 1 comprises a first lock part 4, which is designed to at least partially form a closed lock room 5 (see Figure 5) between the mobile cleanroom 2 and the second cleanroom 3, wherein cleanroom conditions exist in the mobile cleanroom 2 and / or the at least one second cleanroom 3, wherein a purity corresponds to at least one purity class ISO 4 according to ISO 14644-1

[0238] In addition, one or more, preferably more than two, particularly preferably exactly three, openable closure devices 9 are provided in the first lock part 4 and / or the second lock part 6. The closure devices 9 are preferably designed to tightly seal off the lock chamber 5 (see Figure 5) or an environment from the respective clean room 2, 3.

[0239] As shown in Figure 3, the first lock part 4 is preferably configured to at least partially form the enclosed lock chamber 5 in conjunction with a second lock part 6. The second lock part 6 is preferably part of the device 1.

[0240] In the embodiment shown in Figure 3, the first lock part 4 and the second lock part 6 preferably form the entire lock chamber 5.

[0241] The first lock part 4 and the second lock part 6 can each be arranged on the mobile clean room 2 and / or the second clean room 3.

[0242] Figure 3 thus shows a real docking state.

[0243] Figure 4 shows a schematic representation of another possible embodiment of the device 1 according to the invention. In the embodiment shown in Figure 4, a contact device 7 is preferably present in the first lock part 4 and / or the second lock part 6. The contact device 7 is preferably designed to be brought into contact with another contact device 7 for forming the lock chamber 5 in such a way that an interior atmosphere of the lock chamber 5 is separated from an ambient atmosphere.

[0244] It can also be provided that the contact device 7 is configured to be brought into contact with a wall of the second clean room 6 and / or the mobile clean room 4 to form the lock chamber 5 in such a way that an interior atmosphere of the lock chamber 5 is separated from an ambient atmosphere. In this case, the wall itself can play the role of the contact device 7.

[0245] In the embodiment shown in Figure 4, an approach direction between the mobile clean room 2 and the second clean room 3 is indicated by an arrow 8.

[0246] In the embodiment of the device 1 shown in Figure 4, the at least one closure device 9 is preferably designed as a roller shutter.

[0247] Due to the device 1, the mobile cleanroom 2 and the second cleanroom 3 each have three roller doors 9. Figure 4 shows a state in which the mobile cleanroom 2 is approached to the cleanroom 3 with three closed roller doors 9 each.

[0248] In the embodiment illustrated in Figure 4, a plurality of closure devices 9 are preferably provided in the first lock part 4 and / or the second lock part 6. These are preferably arranged one behind the other in the embodiment illustrated in Figure 4.

[0249] In particular, the plurality of closure devices 9 are preferably arranged on the side facing the mobile clean room 2 and / or the second clean room 3 in the respective lock part 4,6.

[0250] In the embodiment shown in Figure 4, the contact devices 7, which are preferably designed as rubber buffers, seal the lock chamber 5 from the environment.

[0251] In the situation shown in Figure 4, the locking devices 9 are still closed.

[0252] Fig. 5 shows a schematic representation of the embodiment of the device 1 according to Fig. 4, wherein the mobile clean room 2 and the second clean room 3 are brought closer to one another such that the contact devices 7 are in contact with one another and the lock chamber 5 is formed. In the embodiment shown in Fig. 5, a lock chamber cleaning device 10 is preferably present. The lock chamber cleaning device 10 is preferably configured to clean the lock chamber 5 being formed or already formed.

[0253] In the embodiment shown in Figure 5, the airlock cleaning device 10 is arranged on the second cleanroom 3. However, other embodiments are also conceivable. The airlock cleaning device 10 can also be arranged on the side of the mobile cleanroom 2 and moved with it.

[0254] In the embodiment shown in Figure 5, the lock chamber cleaning device 10 is designed to blow out the lock chamber 5 with clean room air.

[0255] In the embodiment shown in Figure 5, an overpressure device 11 is also present and is designed to generate an overpressure in the lock chamber 5 relative to the surroundings.

[0256] In the embodiment shown in Figure 5, the lock chamber cleaning device 10 and the overpressure device 11 coincide.

[0257] However, separate facilities may also be provided.

[0258] Figure 6 shows a schematic representation of the embodiment of the device according to Figure 5, wherein, in comparison to the situation shown in Figure 5, a closure device 9 is open in each of the lock parts 4, 6.

[0259] Figure 6 therefore illustrates that the at least one closure device 9 can preferably be opened in such a way that the lock chamber 5 is enlarged. In the exemplary embodiment shown in Figure 6, the lock chamber cleaning device 10 is further configured to blow clean room air into the enlarging lock chamber 5 as the closure devices 9 are successively opened.

[0260] Figure 7 shows a further schematic representation of the embodiment of the device 1 according to Figure 4.

[0261] The situation shown in Figure 7 differs from the situation shown in Figure 6 in that a further level of the closure devices 9 is removed, the lock chamber 5 is thereby enlarged and the lock chamber cleaning device 10 is designed to clean the now further enlarged lock chamber 5.

[0262] Figure 8 shows a further schematic representation of the embodiment of the device 1 according to Figure 4. In comparison to the situation shown in Figure 7, it is illustrated that the last of the closure devices 9 can be opened in such a way that the lock chamber 5 is connected to the respective clean room 2, 3 to form a passage area 12.

[0263] In the situation shown in Figure 8, it becomes clear that contaminants 13, which are shown as dashed lines in Figure 8, can adhere to a surface of the passage area 12 or the lock chamber 5.

[0264] Figure 9 shows a schematic representation of another possible embodiment of the device 1.

[0265] In the embodiment of the device 1 shown in Figure 9, a tunnel-like insertion device 14 is preferably present and can be inserted into the passage area 12. In particular, in the situation shown in Figure 9, the tunnel-like insertion device 14 is inserted into the passage area 12.

[0266] Preferably, in the embodiment shown in Figure 9, the insertion device 14 is designed as a tube, preferably as a square tube with a square or rectangular cross-section of 0.5 mx 0.5 m to 3 mx 3 m.

[0267] The tunnel-like insertion device 14 is preferably moved from one of the two clean rooms 2, 3 into the passage area 12. This allows any contamination 13 that may be present in the passage area 12 to be covered. In this way, a completely enclosed clean room surface can be achieved in the passage area 12 between the clean rooms 2, 3.

[0268] In the embodiment of the device 1 shown in Figure 9, the insertion device 14 is further preferably made of stainless steel and / or aluminum.

[0269] Figure 10 shows a schematic representation of another possible embodiment of the device 1.

[0270] In the embodiment shown in Figure 10, one or more sealing lips 15 are provided for sealing the insertion device 14 against the passage area 12.

[0271] In the embodiment shown in Figure 10, in particular, one sealing lip 15 is preferably provided on the side of the mobile clean room 2 and two sealing lips 15 on the side of the second clean room 3.

[0272] As can also be seen in connection with the following Figure 11, sealing lips 15 are arranged on the lock parts 4, 6. Furthermore, at least one sealing lip 15 is arranged on the insertion device 14 and is movable with it. Figure 11 shows a further schematic representation of the embodiment of the device 1 according to Figure 10.

[0273] In the situation illustrated in Figure 11, the tunnel-like insertion device 14 is moved into the second clean room 3. Furthermore, for example, after a successful transfer of components 19 (see Fig. 13), the closure devices 9 are closed again.

[0274] Figure 12 shows a schematic representation of another possible embodiment of the device 1.

[0275] In the situation illustrated in Figure 12, the mobile cleanroom 2 is again separated from the second cleanroom 3. In the embodiment of the device 1 illustrated in Figure 12, a secondary container 16 is provided for storing the insertion device 14.

[0276] Here too, the secondary container 16 and the insertion device 14 can be arranged either in the mobile clean room 2 or the second clean room 3.

[0277] However, for reasons of transport economy, the insertion device 14 of the secondary container 16 should preferably be provided in the second clean room 3, provided that this is stationary.

[0278] In the embodiment shown in Figure 12, a tunnel cleaning device 17 is also preferably provided for cleaning the insertion device 14.

[0279] In the separated state shown in Figure 12, it can be seen that the respective contact device 7 preferably has at least one projection or is designed to protrude and / or is arranged on a projection. This allows contact to be established without the two clean rooms 2, 3 colliding with each other. Alternatively or additionally, at least one indentation (not shown) for accommodating the projection can be provided on the side of the mobile clean room 2 or the second clean room 3.

[0280] The clean rooms 2, 3, which were described in connection with Figures 3 to 12, can be designed in particular as a mobile clean room 2 or a stationary clean room 3 and are each provided with at least one embodiment of the device 1.

[0281] Alternatively or additionally, the clean rooms 2, 3 may comprise at least part of the device 1 or together form the device 1.

[0282] The embodiments of the device 1 with which the respective clean room 2, 3 is equipped can differ from one another. In the exemplary embodiments of the clean rooms 2, 3 shown in Figures 3 to 12, the device 1 is arranged in an opening of the respective clean room 2, 3.

[0283] Figure 13 shows a schematic representation of a possible embodiment of a clean room system 18.

[0284] The cleanroom system 18 comprises at least the mobile cleanroom 2 and the second cleanroom 3.

[0285] It is provided that clean room conditions exist in the mobile clean room 2 and / or the at least one second clean room 3, wherein the cleanliness corresponds at least to cleanliness class ISO 4 according to ISO 14644-1.

[0286] In the embodiment shown in Figure 13, the clean room system 18 specifically comprises two stationary clean rooms 3 and three mobile clean rooms 2.

[0287] Here, the at least one mobile clean room 2 comprises the device 1 in at least one of the embodiments illustrated in connection with Figures 3 to 12. Alternatively or additionally, the at least one second clean room 3 comprises the device 1 in one of the embodiments described in connection with Figures 3 to 12.

[0288] Alternatively or additionally, the at least one second clean room 3 comprises the device 1 in one of the embodiments described in connection with Figures 3 to 12.

[0289] Alternatively or additionally, both the mobile cleanroom 2 and the second cleanroom 3 each comprise the device 1 in at least one of its embodiments as described in connection with Figures 3 to 12. Here, the device 1 of the mobile cleanroom 2 and the device 1 of the second cleanroom 3 are each designed to interact to at least partially form the enclosed airlock chamber 5.

[0290] In the embodiment shown in Figure 13, a component 19 to be transported is also depicted. Arrow 20 in Figure 13 indicates a transport flow of the components 19.

[0291] In the situation illustrated in Figure 13, two mobile cleanrooms are docked to the stationary cleanrooms 3, each for exchanging components 19. A mobile cleanroom 2 is in the process of transporting at least one component 19.

[0292] Figure 14 shows a block diagram of a possible embodiment of a method for detachably connecting the at least one mobile clean room 2 to the at least one second clean room 3. In the method, the enclosed lock chamber 5 between the mobile clean room 2 and the second clean room 3 is formed at least temporarily in a lock chamber block 30 by means of the first lock part 4 in cooperation with the second lock part 6. Within the lock chamber block 30, the mobile clean room 2 and the second clean room 3 are tightly sealed off from the closed room 5 and / or the environment by one or more, preferably more than 2, particularly preferably exactly 3 openable closure devices 9.

[0293] It is provided that clean room conditions exist in the mobile clean room 2 and / or the at least one second clean room 3, wherein the cleanliness corresponds at least to cleanliness class ISO 4 according to ISO 14644-1.

[0294] In a contact block 32, the contact devices 7 of the mobile clean room 2 and the contact device 7 of the second clean room 3 are brought into contact to form the lock room 5 in such a way that an internal atmosphere of the lock room 5 is separated from an ambient atmosphere.

[0295] In a connecting block 33, the closure devices 9 are opened sequentially in such a way that first the lock chamber 5 is enlarged and then the lock chamber 5 is connected to the clean rooms 2, 3 to form the passage area 12.

[0296] Within the framework of the connecting block 33, the lock chamber 5 can preferably be cleaned by means of the lock chamber cleaning device 10.

[0297] In an insertion block 34, the tunnel-like insertion device 14 is preferably introduced into the passage area 12, preferably from one of the clean rooms 2, 3.

[0298] Within the frame of the insertion block 34, the insertion device 14 is sealed against the passage area 12 by means of one or more, preferably expandable, in particular inflatable, sealing lips 15.

[0299] Furthermore, within the insertion block 34, the tunnel-like insertion device 14 can also be moved out of the passage area 12. Preferably, the insertion device 14 is moved into one of the clean rooms 2, 3.

[0300] According to this, it can preferably be provided within the scope of the insertion block 34 that the insertion device 14 is cleaned.

[0301] In a transport block 35, preferably through the insertion device 12, the at least one component 19 is transferred from the mobile cleanroom 2 and the second cleanroom 3 and / or transferred from the second cleanroom 3 into the mobile cleanroom 2. The method steps are preferably processed in the chronology explained above.

[0302] The components of the lithography systems shown in Figures 1 and 3, in particular the projection exposure systems 100, 200 for producing a semiconductor component, are preferably partially or entirely manufactured and / or arranged in one of the clean rooms 2, 3 or in the clean room system 18.

[0303] Furthermore, at least one of the components of the lithography system according to Figures 1 or 2 or even the entire lithography system according to Figures 1 or 2 is manufactured or transported by means of the device 1 or by means of the method described in connection with Figure 14.

[0304] The components 19 can in particular be the illumination system 101, 201 with the radiation source 102 and the optics 103, 109, 206, which has at least one optical element 116, 118, 119, 120, 121, 122, Mi, 207.

[0305] Figure 15 shows a schematic representation of a conventional method of transporting the component 19.

[0306] In the conventional transport method shown in Figure 15, the component 19 is transported back and forth between the clean rooms 3 in a transport container 21. In this case, clean room conditions do not prevail in the transport container 21.

[0307] For this reason, the component 19 is wrapped in a packaging 22.

[0308] In the respective unpacking rooms 23, the packaging 22 is removed from the component 19.

[0309] This is time-consuming and carries the risk of re-contamination of component 19, which then has to be cleaned at great expense.

[0310] As in Figure 13, the arrow 20 represents the transport flow of the component 19.

[0311] List of reference symbols

[0312] 1 device

[0313] 2 mobile cleanrooms

[0314] 3 second clean room

[0315] 4 first lock section

[0316] 5 Lock room

[0317] 6 second lock section

[0318] 7 Contact device

[0319] 8 Arrow

[0320] 9 Locking device

[0321] 10 Lock room cleaning device

[0322] 11 Overpressure device

[0323] 12 Passage area

[0324] 13 Pollution

[0325] 14 tunnel-like insertion device

[0326] 15 sealing lips

[0327] 16 secondary containers

[0328] 17 Tunnel cleaning facility

[0329] 18 Cleanroom system

[0330] 19 component

[0331] 20 Arrow

[0332] 21 transport containers

[0333] 22 Packaging

[0334] 23 Unpacking room

[0335] 30 Lock room block

[0336] 32 contact block

[0337] 33 Connection block

[0338] 34 Insert block

[0339] 35 Transport block

[0340] 100 EUV projection exposure system

[0341] 101 Lighting system

[0342] 102 Radiation source

[0343] 103 Lighting optics

[0344] 104 Object field

[0345] 105 Object level

[0346] 106 reticles

[0347] 107 Reticle holder 108 Reticle displacement drive

[0348] 109 Projection optics

[0349] 110 image field

[0350] 111 Image plane

[0351] 112 wafers

[0352] 113 wafer holders

[0353] 114 Wafer relocation drive

[0354] 115 EUV / useful / illumination radiation

[0355] 116 collector

[0356] 117 Intermediate focal plane

[0357] 118 deflecting mirrors

[0358] 119 first facet mirror / field facet mirror

[0359] 120 first facets / field facets

[0360] 121 second facet mirror / pupil facet mirror

[0361] 122 second facets / pupil facets

[0362] 200 DUV projection exposure system

[0363] 201 Lighting system

[0364] 202 reticle days

[0365] 203 reticles

[0366] 204 wafers

[0367] 205 wafer holders

[0368] 206 Projection optics

[0369] 207 lens

[0370] 208 version

[0371] 209 lens housings

[0372] 210 projection beam

[0373] Mi Mirror

Claims

Patent claims:

1. Device (1) for detachably connecting at least one mobile clean room (2) to at least one second clean room (3), comprising a first lock part (4) which is designed to at least partially form a closed lock room (5) between the mobile clean room (2) and the second clean room (3), wherein one or more, preferably more than two, particularly preferably exactly three, openable closure devices (9) are provided in the first lock part (4) and are designed to tightly seal off the lock room (5) from the respective clean room (2, 3), wherein clean room conditions exist in the mobile clean room (2) and / or the at least one second clean room (3), wherein a cleanliness corresponds to at least one cleanliness class ISO 4 according to ISO 14644-1.

2. Device (1) according to claim 1, characterized in that the first lock part (4) is designed to at least partially form the closed lock space (5) in interaction with a second lock part (6), which is preferably part of the device (1).

3. Device (1) according to claim 1 or 2, characterized in that in the first lock part (4) and / or the second lock part (6) several closure devices (9) are arranged one behind the other, preferably in each case on the side facing the mobile clean room (2) and / or the second clean room (3).

4. Device (1) according to one of claims 1 to 3, characterized in that the at least one closure device (9) can be opened in such a way that the lock chamber (5) is enlarged and / or the lock chamber (5) is connected to the clean room (2, 3) to form a passage area (12).

5. Device (1) according to one of claims 1 to 4, characterized in that a lock chamber cleaning device (10) is provided and is designed to clean the lock chamber (5) to be formed.

6. Device (1) according to one of claims 1 to 5, characterized in that in the first lock part (4) a contact device (7) is provided and is designed to be brought into contact with another contact device (7) for forming the lock chamber (5) in such a way that an internal atmosphere of the lock chamber (5) is is separated from the surrounding atmosphere.

7. Device (1) according to one of claims 1 to 6, characterized in that an overpressure device (11) is provided and arranged to generate an overpressure in the lock chamber (5) relative to an environment.

8. Device (1) according to one of claims 4 to 7, characterized in that a tunnel-like insertion device (14) is provided and can be introduced into the passage area (12).

9. Device (1) according to claim 8, characterized in that the insertion device (14) is designed as a tube, preferably as a square tube with a square or rectangular cross-section of 0.5 mx 0.5 m to 3 mx 3 m.

10. Device (1) according to claim 8 or 9, characterized in that the insertion device (14) is made of stainless steel and / or aluminum.

11. Device (1) according to one of claims 8 to 10, characterized in that one or more, preferably expandable, in particular inflatable, sealing lips (15) are provided for sealing the insertion device (14) against the passage area (12).

12. Device (1) according to one of claims 8 to 11, characterized in that a tunnel cleaning device (17) is provided for cleaning the insertion device (14).

13. Clean room (2, 3), in particular a mobile clean room (2) or a stationary clean room with a device (1) according to one of claims 1 to 12, wherein the device (1) is arranged in an opening of the clean room (2, 3) and wherein clean room conditions exist in the clean room (2, 3), wherein a cleanliness corresponds to at least one cleanliness class ISO 4 according to ISO 14644-1.

14. Clean room system (18) with at least one mobile clean room (2) and at least one second clean room (3), characterized in that a) the at least one mobile clean room (2) has a device (1) according to one of claims 1 to 17 or b) the at least one second clean room (3) has a device (1) according to one of claims 1 to 17 or c) the at least one mobile clean room (2) has a device (1) according to one of claims 1 to 17 and the at least one second clean room (3) has a device (1) according to one of claims 1 to 17, wherein the device (1) of the mobile clean room (2) and the device (1) of the second clean room (3) are designed to interact to at least partially form a closed airlock room (5), wherein clean room conditions exist in the mobile clean room (2) and / or the at least one second clean room (3), wherein a cleanliness corresponds to at least one cleanliness class ISO 4 according to ISO 14644-1.

15. A method for detachably connecting at least one mobile clean room (2) to at least one second clean room (3), wherein a closed lock chamber (5) is formed at least temporarily between the mobile clean room (2) and the second clean room (3) by means of a first lock part (4) in cooperation with a second lock part (6), wherein the mobile clean room (2) and the second clean room (3) are tightly sealed off from the lock chamber (5) and / or an environment by one or more, preferably more than two, particularly preferably exactly three, openable closure devices (9), wherein clean room conditions exist in the mobile clean room (2) and / or the at least one second clean room (3), wherein a cleanliness corresponds to at least one cleanliness class ISO 4 according to ISO 14644-1.

16. The method according to claim 15, characterized in that a contact device (7) of the mobile clean room (2) and a contact device (7) of the second clean room (3) are brought into contact to form the lock room (5) in such a way that an internal atmosphere of the lock room (5) is separated from an ambient atmosphere, and / or the lock room (5) is cleaned by means of a lock room cleaning device (10).

17. Method according to claim 15 or 16, characterized in that the closure devices (9) are opened sequentially in such a way that first the lock chamber (5) is enlarged and then the lock chamber (5) is connected to the clean rooms (2, 3) to form a passage area (12).

18. Method according to claim 17, characterized in that a tunnel-like insertion device (14), preferably from one of the clean rooms (2, 3), is introduced into the passage area (12).

19. Method according to claim 18, characterized in that the insertion device (14) is sealed against the passage area (12) by means of one or more, preferably expandable, in particular inflatable, sealing lips (15).

20. Method according to claim 18 or 19, characterized in that at least one component (19) is moved from the mobile clean room (2) into the second clean room (3) and / or is moved from the second clean room (3) into the mobile clean room (2) through the insertion device (12).

21. Lithography system, in particular a projection exposure system (100, 200) for producing a semiconductor component, comprising a plurality of components (19), including in particular an illumination system (101, 201) with a radiation source (102) and an optics system (103, 109, 206) which has at least one optical element (116, 118, 119, 120, 121, 122, 111, 207), characterized in that at least one of the components (19) and / or the entire lithography system is processed and / or manufactured and / or arranged in a clean room (2, 3) according to claim 13 and / or in a clean room system (18) according to claim 14, and / or at least one of the components (19) and / or the entire lithography system by means of a device (1) according to one of claims 1 to 12 and / or by means of a method according to one of claims 15 to 20 processed and / or manufactured and / or transported.

Images