Compound, composition, surface treatment agent, article, and method for producing article

Abstract

The present invention provides: a novel compound which is capable of forming a surface treatment layer that has excellent wear resistance; and the like.　A compound according to the present disclosure contains the group P described below and a fluoropolyether chain. Group P: -[Si(R1)2-X]n1-Si(R1)3 Each X independently represents an oxygen atom or a carbon atom, each R1 independently represents a hydrolyzable group, a group having a hydrolyzable group, a hydroxyl group, or a hydrocarbon group, at least four of R1 among the R1 represent hydrolyzable groups, groups having hydrolyzable groups, or hydroxyl groups, and n1 represents an integer of 1 to 3.

Description

Compound, composition, surface treatment agent, article, and method for manufacturing article

[0001] The present disclosure relates to compounds, compositions, surface treatments, articles, and methods for making articles.

[0002] Fluorine-containing ether compounds having fluorine atoms have excellent properties such as a low refractive index, a low dielectric constant, water and oil repellency, heat resistance, chemical resistance, chemical stability, and transparency, and are used in a wide variety of fields such as electrical and electronic materials, semiconductor materials, optical materials, and surface treatment agents.

[0003] Patent Document 1 discloses that a surface treatment is carried out using a surface treatment agent containing a perfluoropolyether group-containing silane compound.

[0004] Patent Document 2 discloses that a surface treatment is carried out using a surface treatment agent containing a fluorine-containing silane compound and a metal compound containing a transition metal such as tantalum (Ta).

[0005] JP 2014-218639 A International Publication No. 2021 / 010105

[0006] Further improvements in surface treatment agents are required from the viewpoint of abrasion resistance and the like.

[0007] The present disclosure has been made in view of the above circumstances, and aims to provide a novel compound or the like capable of forming a surface treatment layer having excellent abrasion resistance.

[0008] The present disclosure includes the following aspects. [1] A compound comprising the following group P and a fluoropolyether chain: Group P: -[Si(R １ ) ２ -X] ｎ１ -Si(R １ ) ３ wherein each X is independently an oxygen atom or a carbon atom; １ are each independently a hydrolyzable group, a group having a hydrolyzable group, a hydroxyl group, or a hydrocarbon group; １ At least four R １is a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, and n1 is an integer of 1 to 3. [2] The compound according to [1] above, wherein n1 is 1. [3] The group P is —[Si(OR ２ ) ２ -O] ｎ１ -Si(OR ２ ) ３ The compound according to the above [1], wherein R ２ are each independently a hydrocarbon group. [4] The group P is —Si(OR ２ ) ２ —O—Si(OR ２ ) ３ The compound according to the above [2], wherein R ２ are each independently a hydrocarbon group. [5] A compound represented by the following formula (1) or formula (2): (R ｆ１ ) ｎ３ -Q １ - (J １ ) ｎ２ ...Formula (1) (J １ ) ｎ２ -Q ２ -R ｆ２ -Q ２ - (J １ ) ｎ２ ...Equation (2) where J １ are each independently the following group P, group P: -[Si(R １ ) ２ -X] ｎ１ -Si(R １ ) ３ Each X is independently an oxygen atom or a carbon atom; １ are each independently a hydrolyzable group, a group having a hydrolyzable group, a hydroxyl group, or a hydrocarbon group; １ At least four R １ is a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, n1 is an integer of 1 to 3, and R ｆ１ is a monovalent fluoropolyether chain, R ｆ２ is a divalent fluoropolyether chain, and Q １ is an (n3+n2)-valent linking group, and Q２ is a (1+n2)-valent linking group, n2 is each independently an integer of 1 or more, and n3 is an integer of 1 or more. [6] The compound according to [5], wherein n2 is 1 to 6. [7] The compound according to [5], wherein R ｆ１ The compound according to the above [5] or [6], wherein R is represented by the following formula (3): ｆ１１ - (OR ｆ１２ ) ｍ１ - ... Equation (3) where R ｆ１１ is a fluoroalkyl group having 1 to 20 carbon atoms, and R ｆ１１ If there are multiple R ｆ１１ may be the same or different, R ｆ１２ is a fluoroalkylene group having 1 to 6 carbon atoms, and R ｆ１２ If there are multiple R ｆ１２ may be the same or different, and m1 is an integer of 0 to 500. [8] The R ｆ２ The compound according to any one of the above [5] to [7], wherein R is represented by the following formula (4): ｆ２１ - (OR ｆ２２ ) ｍ２ - ... Equation (4) where R ｆ２１ is a fluoroalkylene group having 1 to 6 carbon atoms, and R ｆ２１ If there are multiple R ｆ２１ may be the same or different, R ｆ２２ is a fluoroalkylene group having 1 to 6 carbon atoms, and R ｆ２２ If there are multiple R ｆ２２may be the same or different, and m2 is an integer of 0 to 500. [9] A composition comprising the compound according to any one of [1] to [8] above and a liquid medium.

[10] A surface treatment agent comprising the compound according to any one of [1] to [8] above.

[11] A surface treatment agent comprising the compound according to any one of [1] to [8] above and a liquid medium.

[12] A method for producing an article, comprising surface-treating a substrate with a surface treatment agent comprising the compound according to any one of [1] to [8] above to produce an article having a surface-treated layer formed on the substrate.

[13] An article comprising a substrate and a surface-treated layer disposed on the substrate and surface-treated with a surface treatment agent comprising the compound according to any one of [1] to [8] above.

[14] The article according to

[13] above, which is an optical member.

[15] The article according to

[13] above, which is a display or a touch panel.

[0009] The present disclosure makes it possible to provide a novel compound or the like capable of forming a surface treatment layer having excellent abrasion resistance.

[0010] In the present specification, numerical ranges indicated using "to" include the numerical values ​​before and after "to" as the minimum and maximum values, respectively. In the numerical ranges described in stages in the present specification, the upper or lower limit value described in one numerical range may be replaced with the upper or lower limit value of another numerical range described in stages. Furthermore, in the numerical ranges described in the present specification, the upper or lower limit value of that numerical range may be replaced with a value shown in the Examples. In the present specification, the "surface treatment layer" refers to a layer formed on the surface of a substrate by surface treatment. In the present specification, "Me" may refer to a methyl group. In the present specification, when a compound or group is represented by a specific formula (X), the compound or group represented by the formula (X) may be referred to as compound (X) or compound X, and group (X) or group X, respectively. Note that when the same symbol exists in a single chemical formula, the same symbol may have the same structure or may have different structures within the specified range. The bonding direction of divalent groups described in the present specification is not limited unless otherwise specified. For example, when Y is -COO- in a compound represented by the formula "X-Y-Z", Y may be either -CO-O- or -O-CO-. In addition, the compound may be either "X-CO-O-Z" or "X-O-CO-Z".

[0011] In this specification, the term "fluoroalkyl group" is a general term that includes perfluoroalkyl groups and partial fluoroalkyl groups. The term "perfluoroalkyl group" refers to a group in which all hydrogen atoms of an alkyl group are substituted with fluorine atoms. The term "partial fluoroalkyl group" refers to an alkyl group in which one or more hydrogen atoms are substituted with fluorine atoms and which has one or more hydrogen atoms. In other words, the term "fluoroalkyl group" refers to an alkyl group having one or more fluorine atoms. The "molecular weight" of a fluoropolyether chain is １ H-NMR and １９ It is a number average molecular weight calculated by F-NMR to determine the number (average value) of oxyfluoroalkylene units based on the terminal groups.

[0012] [Compound] The compound according to the present disclosure is a compound containing the following group P and a fluoropolyether chain: Group P: —[Si(R １ ) ２ -X] ｎ１ -Si(R １ ) ３ where each X is independently an oxygen atom or a carbon atom, and R １ are each independently a hydrolyzable group, a group having a hydrolyzable group, a hydroxyl group, or a hydrocarbon group, and R １ At least four R １ represents a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; n1 represents an integer of 1 to 3.

[0013] When the compound of the present disclosure is used as a surface treatment agent, a surface treatment layer with excellent liquid repellency can be formed. The reason for this is unclear, but is presumed to be as follows. The compound containing the group P exhibits high adhesion between the group P and a substrate, and can form a surface treatment layer with excellent abrasion resistance on the substrate.

[0014] <Group P> The compound according to the present disclosure contains the above-mentioned group P. The compound may contain only one group P, or two or more groups P. For example, the number of groups P may be 1 to 18, 2 to 12, or 2 to 8. In addition, since the group P is a monovalent group, it is located at the terminal of the compound.

[0015] When a molecule contains a plurality of groups P, the groups P may be the same or different from each other. From the viewpoint of availability of raw materials and ease of production of the compound, it is preferable that the groups P are the same.

[0016] R １ are each independently a hydrolyzable group, a group having a hydrolyzable group, a hydroxyl group, or a hydrocarbon group.

[0017] The hydrolyzable group is a group that becomes a hydroxyl group through a hydrolysis reaction. １The hydrolyzable silyl group represented by the formula (I) becomes a silanol group represented by Si—OH through a hydrolysis reaction. The silanol groups further react with each other to form Si—O—Si bonds. Furthermore, the silanol groups can undergo a dehydration condensation reaction with silanol groups derived from oxides present on the surface of the substrate to form Si—O—Si bonds.

[0018] Examples of hydrolyzable groups include alkoxy groups, aryloxy groups, halogen atoms, acyl groups, acyloxy groups, isocyanato groups (-NCO), and alkylene oxide-modified alkoxy groups. The alkoxy group preferably has 1 to 6 carbon atoms, and more preferably has 1 to 4 carbon atoms. The aryloxy group is preferably an aryloxy group having 3 to 10 carbon atoms. However, the aryl group of the aryloxy group may be a heteroaryl group. The halogen atom is preferably a chlorine atom. The acyl group is preferably an acyl group having 1 to 6 carbon atoms. The acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms.

[0019] The group having a hydrolyzable group may be, for example, any of the groups having a hydrolyzable group exemplified above. Ａ -L Ｂ is preferred. Ａ is an alkylene group, and L Ｂ is a hydrolyzable group. The alkylene group preferably has 1 to 10 carbon atoms. Ｂ The hydrolyzable group represented by the formula １ The meaning and preferred embodiments are the same as those of the hydrolyzable group represented by the following formula: ２ CH ２ -OCH ３ Examples include:

[0020] Among them, R １ From the viewpoint of ease of production of the compound, the hydrolyzable group or the group having a hydrolyzable group in R is preferably an alkoxy group having 1 to 4 carbon atoms, an alkylene oxide-modified alkoxy group, or a halogen atom. １is preferably an alkoxy group having 1 to 4 carbon atoms, more preferably an ethoxy group or a methoxy group, in terms of less outgassing during application and better storage stability of the compound.

[0021] R １ Examples of the hydrocarbon group include an alkyl group, a cycloalkyl group, an alkenyl group, and an allyl group, and from the viewpoint of ease of synthesis, a saturated hydrocarbon group is preferred, and an alkyl group is more preferred. The number of carbon atoms in the hydrocarbon group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2.

[0022] n1 is an integer of 1 to 3, preferably 1 or 2, and more preferably 1, from the viewpoint of ease of synthesis.

[0023] A single group P has multiple R １ At least four of the R groups are hydrolyzable groups, groups having a hydrolyzable group, or hydroxyl groups. This allows the group P to bond more firmly with the substrate, resulting in a surface treatment layer with excellent abrasion resistance. From this point of view, the number of hydrolyzable groups, groups having a hydrolyzable group, and hydroxyl groups in the group P is preferably 4 to 9, more preferably 4 to 7, and even more preferably 4 to 5. In addition, when multiple R groups exist in one molecule, １ may be the same or different from each other. For example, multiple R １ may be the same hydrolyzable group.

[0024] Each X is independently an oxygen atom or a carbon atom. Here, the carbon atom in X means that Si atoms are connected to each other via one carbon atom, that is, it is a divalent carbon atom, and X is -CH ２ -, -C(CH ３ ) ２ From the viewpoint of the abrasion resistance of the surface treatment layer, X may be an oxygen atom, —CH ２ -, or -C(CH ３ ) ２ - is preferred, and an oxygen atom or -CH ２ - is more preferred, and an oxygen atom is even more preferred.

[0025] The group P is preferably -[Si(OR ２ ) ２ -O]ｎ１ -Si(OR ２ ) ３ is preferred, and among them, -Si(OR ２ ) ２ —O—Si(OR ２ ) ３ is particularly preferred. ２ R are each independently a hydrocarbon group. Examples of the hydrocarbon group include an alkyl group, a cycloalkyl group, an alkenyl group, and an allyl group. From the viewpoint of ease of synthesis, a saturated hydrocarbon group is preferred, and an alkyl group is more preferred. ２ The number of carbon atoms is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2.

[0026] Specific examples of the group P include —Si(OCH ３ ) ２ —O—Si(OCH ３ ) ３ , -Si(OCH ３ ) ２ -CH ２ -Si(OCH ３ ) ３ , -Si(OCH ３ ) ２ -C(CH ３ ) ２ -Si(OCH ３ ) ３ , -Si(OCH ２ CH ３ ) ２ —O—Si(OCH ３ ) ３ , -Si(OCH ３ ) ２ —O—Si(OCH ２ CH ３ ) ３ , -Si(OCH ２ CH ３ ) ２ —O—Si(OCH ２ CH ３ ) ３ , -Si(OCH ２ CH ３ ) ２ -CH ２ -Si(OCH ３ ) ３ , -Si(OCH ３ )２ -CH ２ -Si (O) ２ HH ３ ) ３ ,-Si(OCH ２ HH ３ ) ２ -CH ２ -Si (O) ２ HH ３ ) ３ ,-Si(OCH ２ HH ３ ) ２ -C(CH ３ ) ２ -Si (O) ３ ) ３ ,-Si(OCH ３ ) ２ -C(CH ３ ) ２ -Si (O) ２ HH ３ ) ３ ,-Si(OCH ２ HH ３ ) ２ -C(CH ３ ) ２ -Si (O) ２ HH ３ ) ３ ,-Si(OH) ２ -O-Si (O) ３ ,-Si(OH) ２ -O-Si (OCH) ３ ) ３ ,-Si(OCH ３ ) ２ -O-Si (O) ３ ,-Si(OH) ２ -CH ２ -Si (O) ３ ,-Si(OH) ２ -CH ２ -Si (O) ３ ) ３ ,-Si(OCH ３ ) ２ -CH ２ -Si (O) ３ ,-Si(OH) ２ -C(CH ３ ) ２ -Si (O) ３ ,-Si(OH)２ -C(CH ３ ) ２ -Si(OCH ３ ) ３ , -Si(OCH ３ ) ２ -C(CH ３ ) ２ -Si(OH) ３ , are mentioned.

[0027] <Fluoropolyether Chain> The compound of the present disclosure has a fluoropolyether chain, which allows the formation of a surface treatment layer having excellent abrasion resistance. ｆ１ or R ｆ２ The same can be mentioned.

[0028] <Compound (1) and Compound (2)> The compounds according to the present disclosure are compounds represented by the following formula (1) or (2): (R ｆ１ ) ｎ２ -Q １ - (J １ ) ｎ２ ...Formula (1) (J １ ) ｎ２ -Q ２ -R ｆ２ -Q ２ - (J １ ) ｎ２ ...Equation (2) where J １ are each independently the group P described above, and a repeated explanation will be omitted. ｆ１ is a monovalent fluoropolyether chain, and R ｆ２ is a divalent fluoropolyether chain, and Q １ and Q ２ are each independently a (1+n2)-valent linking group, and n2 is an integer of 1 or more.

[0029] R is a monovalent fluoropolyether chain ｆ１ and R, a divalent fluoropolyether chain. ｆ２ is a group having two or more oxyfluoroalkylene units. ｆ１ and R ｆ２ may have a hydrogen atom, but Q １ or Q ２The carbon atom at the side end has a fluorine atom.

[0030] In a surface treatment layer using the compound according to the present disclosure, the molecular weight per fluoropolyether chain is, from the viewpoint of excellent abrasion resistance, preferably from 2,000 to 20,000, more preferably from 2,500 to 15,000, and even more preferably from 3,000 to 10,000. When the molecular weight of the fluoropolyether chain is 20,000 or less, a surface treatment layer having excellent abrasion resistance can be obtained.

[0031] R ｆ１ The following structure (A1) is preferred as R ｆ１１ - (OR ｆ１２ ) ｍ１ - ... (A1) where R ｆ１１ is a fluoroalkyl group having 1 to 20 carbon atoms, and R ｆ１１ If there are multiple R ｆ１１ may be the same or different, R ｆ１２ is a fluoroalkylene group having 1 to 6 carbon atoms, and R ｆ１２ If there are multiple R ｆ１２ may be the same or different, and m1 is an integer of 0 to 500. m1 is preferably an integer of 1 to 500, more preferably an integer of 2 to 500, still more preferably an integer of 10 to 200, and particularly preferably an integer of 10 to 100.

[0032] Similarly, the divalent fluoropolyether chain R ｆ２ The following structure (A2) is preferred as -R ｆ２１ - (OR ｆ２２ ) ｍ２ - ... (A2) where R ｆ２１ is a fluoroalkylene group having 1 to 6 carbon atoms, and R ｆ２２ is a fluoroalkylene group having 1 to 6 carbon atoms, and R ｆ２２ If there are multiple R ｆ２２ may be the same or different, and m2 is an integer of 0 to 500.

[0033] (OR ｆ１２ ) and (OR ｆ２２) preferably has the following structure (f2): -[(OG ｆ１ ) ｍ１１ (OG ｆ２ ) ｍ１２ (OG ｆ３ ) ｍ１３ (OG ｆ４ ) ｍ１４ (OG ｆ５ ) ｍ１５ (OG ｆ６ ) ｍ１６ ]- …(f2) However, G ｆ１ is a fluoroalkylene group having 1 carbon atom, ｆ２ is a fluoroalkylene group having 2 carbon atoms, ｆ３ is a fluoroalkylene group having 3 carbon atoms, ｆ４ is a fluoroalkylene group having 4 carbon atoms, ｆ５ is a fluoroalkylene group having 5 carbon atoms, ｆ６ is a fluoroalkylene group having 6 carbon atoms, m11, m12, m13, m14, m15, and m16 each independently represent an integer of 0 or 1 or more, and m11+m12+m13+m14+m15+m16 is preferably an integer of 2 to 200. ｆ１ ) ~ (OG ｆ６ The bonding order of m11 to m16 in the structure (f2) is arbitrary. ｆ１ ) ~ (OG ｆ６ ) and does not represent the arrangement. For example, (OG ｆ５ ) ｍ１５ (OG ｆ５ ) represents that the number of m is 15, and (OG ｆ５ ) ｍ１５ Similarly, it does not represent the block arrangement structure of (OG ｆ１ ) ~ (OG ｆ６ The order of the units does not represent the bonding order of the units. The fluoroalkylene group having 3 to 6 carbon atoms may be a linear fluoroalkylene group or a fluoroalkylene group having a branched or cyclic structure.

[0034] G ｆ１ Specific examples of the group include -CF ２-, -CHF-. ｆ２ Specific examples of the group include -CF ２ CF ２ -, -CHFCF ２ -, -CHFCHF-, -CH ２ CF ２ -, -CH ２ CHF- is an example. ｆ３ Specific examples of the group include -CF ２ CF ２ CF ２ -, -CF ２ CHFCF ２ -, -CF ２ CH ２ CF ２ -, -CHFCF ２ CF ２ -, -CHFCHFCF ２ -, -CHFCHFCHF-, -CHFCH ２ CF ２ -, -CH ２ CF ２ CF ２ -, -CH ２ CHFCF ２ -, -CH ２ CH ２ CF ２ -, -CH ２ CF ２ CHF-, -CH ２ CHFCHF-, -CH ２ CH ２ CHF-, -CF (CF ３ )-CF ２ -, -CF(CHF ２ )-CF ２ -, -CF(CH ２ F)-CF ２ -, -CF(CH ３ )-CF ２ -, -CF(CF ３ ) -CHF-, -CF(CHF ２ ) -CHF-, -CF(CH ２ F) -CHF-, -CF(CH ３ ) -CHF-, -CF(CF ３ )-CH ２ -, -CF(CHF ２ )-CH ２ -, -CF(CH２ F)-CH ２ -, -CF(CH ３ )-CH ２ -, -CH(CF ３ )-CF ２ -, -CH(CHF ２ )-CF ２ -, -CH(CH ２ F)-CF ２ -, -CH(CH ３ )-CF ２ -, -CH(CF ３ )-CHF -, -CH(CHF ２ )-CHF -, -CH(CH ２ F)-CHF -, -CH(CH ３ )-CHF -, -CH(CF ３ )-CH ２ -, -CH(CHF ２ )-CH ２ -, -CH(CH ２ F)-CH ２ - are included. G ｆ４ Specific examples of -CF ２ CF ２ CF ２ CF ２ -, -CHFCF ２ CF ２ CF ２ -, -CH ２ CF ２ CF ２ CF ２ -, -CF ２ CHFCF ２ CF ２ -, -CHFCHFCF ２ CF ２ -, -CH ２ CHFCF ２ CF ２ -, -CF ２ CH ２ CF ２ CF ２ -, -CHFCH ２ CF ２ CF ２ -, -CH ２ CH ２ CF ２ CF ２ -, -CHFCF ２ CHFCHF２ -、-CH ２ CF ２ CHFCF ２ -、-CF ２ CHFCHFCF ２ -、-CHFCHFCHFCF ２ -、-CH ２ CHFCHFCF ２ -、-CF ２ CH ２ CHFCF ２ -、-CHFCH ２ CHFCF ２ -、-CH ２ CH ２ CHFCF ２ -、-CF ２ CH ２ CH<000041E>CF ２ -、-CHFCH ２ CH ２ CF ２ -、-CH ２ CH ２ CH ２ CF ２ -、-CHFCH ２ CH ２ CHF-、-CH ２ CH ２ CH ２ CHF-、-cycloC ４ F ６ - are included. G ｆ５ Specific examples of -CF ２ CF ２ CF ２ CF ２ CF ２ -、-CHFCF ２ CF ２ CF ２ CF ２ -、-CH ２ CHFCF ２ CF ２ CF ２ -、-CF ２ CHFCF ２ CF ２ CF ２ -、-CHFCHFCF ２ CF ２ CF ２ -、-CF ２ CH２ CF ２ CF ２ CF ２ -, -CHFCH ２ CF ２ CF ２ CF ２ -, -CH ２ CH ２ CF ２ CF ２ CF ２ -, -CF ２ CF ２ CHFCF ２ CF ２ -, -CHFCF ２ CHFCF ２ CF ２ -, -CH<00C0472>CF ２ CHFCF ２ CF ２ -, -CH ２ CF ２ CF ２ CF ２ CH ２ -, -cycloC ５ F ８ - can be mentioned. G ｆ６ As a specific example of, -CF ２ CF ２ CF ２ CF ２ CF ２ CF ２ -, -CF ２ CF ２ CHFCHFCHFCHFCHFCHF-, -CHFCF ２ CF ２ -, -CHFCF ２ CF ２ CF ２ CF ２ CF ２ -, -CHFCHFCHFCHFCHFCHF-, -CHFCF ２ CF ２ CF ２ CF ２ CH ２ -, -CH ２ CF ２ CF ２ CF ２ CF ２ CH ２ -, -cycloC ６ F１０ Here, -cycloC ４ F ６ - means a perfluorocyclobutanediyl group, and specific examples thereof include a perfluorocyclobutane-1,2-diyl group and a perfluorocyclobutane-1,3-diyl group. ５ F ８ - means a perfluorocyclopentanediyl group, and a specific example thereof is a perfluorocyclopentane-1,3-diyl group. ６ F １０ "-" means a perfluorocyclohexanediyl group, and a specific example thereof is a perfluorocyclohexane-1,4-diyl group.

[0035] - (OR ｆ１２ ) ｍ１ - and - (OR ｆ２２ ) ｍ２ In terms of superior abrasion resistance, it is preferable that the compound has any of the structures represented by the following structures (f3) to (f5), and in terms of superior alkali resistance, it is more preferable that the compound has a structure represented by the structure (f3), and (OCF ２ ) ｍ１１ ・(OCF ２ CF ２ ) ｍ１２ More preferred is a structure represented by (OCF ２ ) ｍ１１ ・(OCF ２ CF ２ ) ｍ１２ In this case, m12 / m11 is preferably 0.1 to 10, more preferably 0.2 to 5.0, even more preferably 0.2 to 2.0, particularly preferably 0.2 to 1.5, and most preferably 0.2 to 0.85, in order to further improve the abrasion resistance and fingerprint removability of the surface layer. ｆ１ ) ｍ１１ ・(OG ｆ２ ) ｍ１２ -...(f3) -(OG ｆ２ ) ｍ１２ ・(OG ｆ４ ) ｍ１４ -...(f4) -(OG ｆ３ ) ｍ１３- (f5) where the symbols in the structures (f3) to (f5) are the same as those in the structure (f2) above.

[0036] In structures (f3) and (f4), (OG ｆ１ ) and (OG ｆ２ ), (OG ｆ２ ) and (OG ｆ４ ) can be bonded in any order. For example, in formula (G2), ｆ１ ) and (OG ｆ２ ) may be alternated, and (OG ｆ１ ) and (OG ｆ２ ) may be arranged in blocks or randomly. The same applies to structure (f5). In structure (f3), m11 is preferably 1 to 30, more preferably 1 to 20. Furthermore, m12 is preferably 1 to 30, more preferably 1 to 20. In structure (f4), m12 is preferably 1 to 30, more preferably 1 to 20. Furthermore, m14 is preferably 1 to 30, more preferably 1 to 20. In structure (f5), m13 is preferably 1 to 30, more preferably 1 to 20.

[0037] The fluoropolyether chain -(OR ｆ１２ ) ｍ１ - and - (OR ｆ２２ ) ｍ２ The proportion of fluorine atoms in the - [{number of fluorine atoms / (number of fluorine atoms+number of hydrogen atoms)}×100(%)] is preferably 60% or more, more preferably 70% or more, and even more preferably 80% or more, from the viewpoint of abrasion resistance. ｆ１２ ) ｍ１ - and - (OR ｆ２２ ) ｍ２ From the viewpoint of abrasion resistance, the molecular weight of the - moiety is preferably from 2,000 to 20,000, more preferably from 2,500 to 15,000, and even more preferably from 3,000 to 10,000.

[0038] Q １ is a (n3+n2)-valent linking group, and Q ２ is a (1+n2)-valent linking group. １ This article explains:

[0039] Q１ is any group that does not impair the effects of the present disclosure, and may be, for example, an alkylene group that may have an etheric oxygen atom or a divalent organopolysiloxane group, a carbon atom, a nitrogen atom, a silicon atom, a divalent to octavalent organopolysiloxane group, or any of the groups (3-1A), (3-1B), and (3-1A-1) to (3-1A-7) described below, １ (i.e., group P) can be mentioned.

[0040] Also, Q １ may be any of the groups (g2-1) to (g2-14) described below.

[0041] n2 is an integer of 1 or more. In order to provide a surface treatment layer with better abrasion resistance, n2 is preferably 1 to 15, more preferably 1 to 6, even more preferably 2 to 4, and particularly preferably 2 or 3.

[0042] n3 is an integer of 1 or more. In order to provide a surface treatment layer with better abrasion resistance, n3 is preferably 1 to 3, and more preferably 1.

[0043] -Q in formula (1) １ - (J １ ) ｎ２ The group represented by the formula (3) is preferably the following group (3-1A) or (3-1B), more preferably the group (3-1A).

[0044] -Q ａ -X ３１ (-Q ｂ -J １ ) ｈ (-R ３１ ) ｉ …(3-1A) -Q ｃ - [CH ２ C (R ３２ ) (-Q ｄ -J １ )] ｙ -R ３３ …(3-1B) Q ａ is a single bond or a divalent linking group. Examples of the divalent linking group include a divalent hydrocarbon group, a divalent heterocyclic group, —O—, —S—, and —SO ２ -, -N(R ｄ)-, -C(O)-, -Si(R ａ ) ２ - and groups obtained by combining two or more of these. The divalent hydrocarbon group may be a divalent saturated hydrocarbon group, a divalent aromatic hydrocarbon group, an alkenylene group, or an alkynylene group. The divalent saturated hydrocarbon group may be linear, branched, or cyclic, and examples thereof include alkylene groups. The alkylene group preferably has 1 to 30 carbon atoms, more preferably 1 to 20, still more preferably 4 to 20, and particularly preferably 5 to 15. Furthermore, the divalent aromatic hydrocarbon group preferably has 5 to 20 carbon atoms, and examples thereof include a phenylene group. In addition, the group may be an alkenylene group having 2 to 20 carbon atoms or an alkynylene group having 2 to 20 carbon atoms. The R ａ is an alkyl group (preferably having 1 to 10 carbon atoms) or a phenyl group. ｄ is a hydrogen atom or an alkyl group (preferably having 1 to 10 carbon atoms). Examples of groups formed by combining two or more of these groups include -OC(O)-, -C(O)O-, -C(O)S-, and -C(O)N(R ｄ ) -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-, -OC(O)N(R ｄ ) -, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -C(O)N(R ｄ an alkylene group having —N(R ｄ )C(O)-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —OC(O)—, an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ an alkylene group having —SO ２ N (R ｄan alkylene group having the alkylene group —Si(R ａ ) ２ -phenylene group -Si(R ａ ) ２ Among them, Q ａ represents a divalent hydrocarbon group other than an alkylene group, a divalent heterocyclic group, —O—, —S—, —SO ２ -, -N(R ｄ )-, -C(O)-, -Si(R ａ ) ２ -, -OC(O)-, -C(O)O-, -C(O)S-, -C(O)N(R ｄ ) -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-, -OC(O)N(R ｄ ) -, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -C(O)N(R ｄ an alkylene group having —N(R ｄ )C(O)-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —OC(O)—, an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ )- or -SO ２ N (R ｄ )- is preferred, and an alkylene group having —OC(O)—, —C(O)N(R ｄ )-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(Rｄ An alkylene group having —C(O)O— or —C(O)N(R ｄ )-containing alkylene groups are more preferred.

[0045] In formula (3-1A), X ３１ is a single bond, an alkylene group, a carbon atom, a nitrogen atom, a silicon atom, a divalent to octavalent organopolysiloxane group, or a group having a (h+i+1)-valent ring. The alkylene group may have -O-, a silphenylene skeleton group, a divalent organopolysiloxane group, or a dialkylsilylene group between carbon atoms. The alkylene group may have a plurality of groups selected from the group consisting of -O-, a silphenylene skeleton group, a divalent organopolysiloxane group, and a dialkylsilylene group. X ３１ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 20, and more preferably 1 to 10. Examples of the divalent to octavalent organopolysiloxane group include a divalent organopolysiloxane group and a (w2+1)-valent organopolysiloxane group described below.

[0046] In formula (3-1A), X ３１ is a group having a (h+i+1)-valent ring, Q ａ , (-Q ｂ -J １ ) and R ３１ is directly bonded to an atom constituting the ring, provided that the ring is a ring other than an organopolysiloxane ring. ３１The ring in may be any of a monocycle, a fused polycycle, a bridged ring, a spiro ring, and an aggregate polycycle, and the atoms constituting the ring may be a carbocycle consisting of only carbon atoms, or a heterocycle consisting of a heteroatom having a valence of divalent or higher and a carbon atom. The bond between the atoms constituting the ring may be a single bond or a multiple bond. Furthermore, the ring may be an aromatic ring or a non-aromatic ring. As the monocycle, a 4- to 8-membered ring is preferred, and a 5- or 6-membered ring is more preferred. As the fused polycycle, a fused polycycle in which two or more 4- to 8-membered rings are fused is preferred, and a fused polycycle in which two or three rings selected from 5- and 6-membered rings are bonded, and a fused polycycle in which one or two rings selected from 5- or 6-membered rings are bonded to one 4-membered ring are more preferred. The bridged ring is preferably a bridged ring having a 5-membered or 6-membered ring as the largest ring, and the spiro ring is preferably a spiro ring consisting of two 4- to 6-membered rings. The assembled polycycle is preferably an assembled polycycle in which two or three rings selected from the 5-membered and 6-membered rings are bonded via a single bond, 1 to 3 carbon atoms, or one heteroatom having a valence of 2 or 3. In the assembled polycycle, each ring may have a Q ａ , (-Q ｂ -J １ ) and R ３１ (when i = 1 or more) is preferably bonded. As heteroatoms constituting the ring, nitrogen atoms, oxygen atoms, and sulfur atoms are preferred, and nitrogen atoms and oxygen atoms are more preferred. The number of heteroatoms constituting the ring is preferably 3 or less. Furthermore, when the number of heteroatoms constituting the ring is 2 or more, those heteroatoms may be different.

[0047] X ３１In terms of ease of production of the compound and further improved abrasion resistance of the surface treatment layer, the ring in the formula (I) is preferably one selected from the group consisting of a 3- to 8-membered aliphatic ring, a benzene ring, a 3- to 8-membered heterocyclic ring, a fused ring in which two or three of these rings are fused, a bridged ring in which the largest ring is a 5- or 6-membered ring, and an assembled polycyclic ring having two or more of these rings and in which the linking group is a single bond, an alkylene group having 3 or less carbon atoms, an oxygen atom, or a sulfur atom. Preferred rings are a benzene ring, a 5- or 6-membered aliphatic ring, a 5- or 6-membered heterocyclic ring having a nitrogen atom or an oxygen atom, and a fused ring of a 5- or 6-membered carbocyclic ring with a 4- to 6-membered heterocyclic ring. Specific examples of the ring include the rings shown below, as well as a 1,3-cyclohexadiene ring, a 1,4-cyclohexadiene ring, an anthracene ring, a cyclopropane ring, a decahydronaphthalene ring, a norbornene ring, a norbornadiene ring, a furan ring, a pyrrole ring, a thiophene ring, a pyrazine ring, a morpholine ring, an aziridine ring, an isoquinoline ring, an oxazole ring, an isoxazole ring, a thiazole ring, an imidazole ring, a pyrazole ring, a pyran ring, a pyridazine ring, a pyrimidine ring, and an indene ring. Rings having an oxo group (═O) are also shown below.

[0048]

[0049] X ３１ The bond that does not constitute the ring of the atom that constitutes the ring in ａ , (-Q ｂ -J １ ) or R ３１ When there are remaining bonds, the remaining bonds are bonded to a hydrogen atom or a substituent. Examples of the substituent include a halogen atom, an alkyl group (which may contain an etheric oxygen atom between carbon atoms), a cycloalkyl group, an alkenyl group, an allyl group, an alkoxy group, and an oxo group (=O). In addition, when one of the carbon atoms constituting the ring is bonded to Q ａ , (-Q ｂ -J １ ) or R ３１ When there are two bonds bonded to one of the carbon atoms, Q ａ and (-Q ｂ -J １) may be bonded to two (-Q ｂ -J １ ) may be bonded to ａ and (-Q ｂ -J １ ) or R ３１ It is preferable that h (-Q ｂ -J １ ) may be bonded to different ring-constituting atoms, and two of them may be bonded to one ring-constituting carbon atom, and two (-Q ｂ -J １ There may be two or more ring-constituting carbon atoms to which i R ３１ may be bonded to different ring-constituting atoms, and two of them may be bonded to one ring-constituting carbon atom, and two R ３１ There may be two or more ring-constituting carbon atoms to which is bonded.

[0050] Among them, X ３１ From the viewpoint of improving the abrasion resistance of the surface treatment layer, is preferably a carbon atom, a nitrogen atom, a silicon atom, a tetravalent to octavalent organopolysiloxane group, or a group having a (h+i+1)-valent ring, and more preferably a carbon atom.

[0051] In formula (3-1A), Q ｂ is a single bond or a divalent linking group. The definition of a divalent linking group is the same as that of Q ａ This is the same as the definition explained in

[0052] Among them, Q ｂ is preferably an alkylene group which may have an etheric oxygen atom. The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10, 2 to 6, or 2 to 5. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10.

[0053] In formula (3-1A), R ３１ is a hydrogen atom, a hydroxyl group, or an alkyl group. The alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and even more preferably 1 carbon atom.

[0054] X３１ When X is a single bond or an alkylene group, h is 1 and i is 0; ３１ is a nitrogen atom, h is an integer of 1 to 2, i is an integer of 0 to 1, and h+i=2 is satisfied; ３１ is a carbon atom or a silicon atom, h is an integer of 1 to 3, i is an integer of 0 to 2, and h+i=3 is satisfied; ３１ When X is a divalent to octavalent organopolysiloxane group, h is an integer of 1 to 7, i is an integer of 0 to 6, and h+i=1 to 7. ３１ is a group having a (h+i+1)-valent ring, h is an integer of 1 to 7, i is an integer of 0 to 6, and h+i=1 to 7 is satisfied. ｂ -J １ If there are two or more (-Q ｂ -J １ ) may be the same or different. ３１ If there are two or more, there are two or more (-R ３１ ) may be the same or different.

[0055] In particular, it is preferable that i is 0 from the viewpoint of improving the abrasion resistance of the surface treatment layer.

[0056] In formula (3-1A), Q ａ , X ３１ , and Q ｂ If is a single bond, J １ is R ｆ１ directly bonded to

[0057] In formula (3-1B), Q ｃ is a single bond or a divalent linking group. ｃ The definition of the divalent linking group in ａ This is the same as the definition explained in

[0058] In formula (3-1B), R ３２ is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and is preferably a hydrogen atom in view of ease of production of the compound. As the alkyl group, a methyl group is preferred.

[0059] In formula (3-1B), Q ｄis a single bond or an alkylene group. The number of carbon atoms in the alkylene group is preferably 1 to 10, more preferably 1 to 6. From the viewpoint of ease of production of the compound, Q ｄ is a single bond or CH ２ It is preferable that −.

[0060] In formula (3-1B), R ３３ is a hydrogen atom or a halogen atom, and is preferably a hydrogen atom in view of ease of producing the compound.

[0061] y is an integer of 1 to 10, preferably an integer of 1 to 6. ２ C (R ３２ ) (-Q ｄ -J １ ) )] may be the same or different.

[0062] As the group (3-1A), the following groups (3-1A-1) to (3-1A-7) are preferred: １ -(X ３２ ) ｓ１ -Q ｂ１ -J １ ...(3-1A-1) -Z １ -(X ３３ ) ｓ２ -Q ａ２ -N[-Q ｂ２ -J １ ] ２ ...(3-1A-2) -Q ａ３ -Si(R ｇ ) [-Q ｂ３ -J １ ] ２ ...(3-1A-3) -Z １ - [Q ｅ ] ｓ４ -Q ａ４ -(O) ｔ４ -C[-(O) ｕ４ -Q ｂ４ -J １ ] ３－ｗ１ (-R ３１ ) ｗ１ ...(3-1A-4) -Q ａ５ -Si[-Q ｂ５ -J １ ] ３ ...(3-1A-5) -Z １- [Q ｅ ] ｖ -Q ａ６ -Z ａ [-Q ｂ６ -J １ ] ｗ２ ...(3-1A-6) -Z １ - [Q ｅ ] ｓ４ -Q ａ４ -(O) ｔ４ -Z ｃ [-(O-Q ｂ４ ) ｕ４ -J １ ] ｗ３ (-OH) ｗ４ …(3-1A-7)

[0063] Among these, the group (3-1A) is preferably the group (3-1A-4).

[0064] In formulas (3-1A-1), (3-1A-2), (3-1A-4), (3-1A-6) and (3-1A-7), Z １ is a single bond or an alkylene group which may have an oxygen atom between carbon atoms. ａ The alkylene groups exemplified as divalent linking groups represented by the following formula (1) are also included, and the preferred embodiments are also the same.

[0065] In the group (3-1A-1), X ３２ is -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )-, or -C(O)N(R ｄ ) - (where N in the formula is Q ｂ１ (Binds to R ｄ The definition of is as described above. s1 is 0 or 1.

[0066] Among them, X ３２ is -O-, -S-, -N(R ｄ)-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )- or -C(O)N(R ｄ )- is preferred, and —O—, —S—, —N(R ｄ )-, -C(O)O-, -C(O)S-, -N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )-, or -C(O)N(R ｄ )- is more preferred, and -C(O)O- or -C(O)N(R ｄ )- is more preferred.

[0067] Q ｂ１ is a single bond or an alkylene group. The alkylene group may have -O-, a silphenylene skeleton group, or a dialkylsilylene group. The alkylene group may have a plurality of groups selected from the group consisting of -O-, a silphenylene skeleton group, a divalent organopolysiloxane group, and a dialkylsilylene group. When the alkylene group has -O-, a silphenylene skeleton group, a divalent organopolysiloxane group, or a dialkylsilylene group, it is preferable that these groups be present between carbon atoms. Q ｂ１ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, still more preferably 2 to 20, and particularly preferably 2 to 6. The number of carbon atoms may also be 1 to 10.

[0068] Among them, Q ｂ１ is preferably an alkylene group having 2 to 6 carbon atoms.

[0069] -(X in the group (3-1A-1) ３２ ) ｓ１ -Q ｂ１ -J １ Specific examples of the group include the following: In the following formula, * represents Z １ represents the bonding position with

[0070] In the group (3-1A-2), X ３３ is -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )-, or -C(O)N(R ｄ )-. R ｄ The definition of is as described above. s2 is 0 or 1. s2 is preferably 0 in view of ease of production of the compound.

[0071] Among them, X ３３ is -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )- or -C(O)N(R ｄ )- is preferred, and -C(O)O-, -C(O)S-, and -SO ２ N (R ｄ )-, or -C(O)N(R ｄ )- is more preferred.

[0072] Q ａ２ represents a single bond, an alkylene group, -C(O)-, or an etheric oxygen atom, -C(O)-, -C(O)O-, -OC(O)-, -C(O)N(R ｄ ) -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-, -OC(O)N(Rｄ ) -, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -C(O)N(R ｄ )- or -NH-. ａ２ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 20, more preferably 1 to 10, still more preferably 1 to 6, and particularly preferably 1 to 3. ａ２ an etheric oxygen atom between carbon atoms of an alkylene group having two or more carbon atoms, represented by —C(O)—, —C(O)O—, —OC(O)—, —C(O)N(R ｄ ) -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-, -OC(O)N(R ｄ ) -, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -C(O)N(R ｄ The group having — or —NH— preferably has 2 to 10 carbon atoms, more preferably 2 to 6 carbon atoms.

[0073] Q ａ２ is preferably a single bond in terms of ease of production of the compound.

[0074] Q ｂ２ is an alkylene group or an alkylene group having two or more carbon atoms and having a divalent organopolysiloxane group, an etheric oxygen atom, or an -NH- group between carbon atoms. ｂ２ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q ｂ２ The number of carbon atoms in the divalent organopolysiloxane group, the group having an etheric oxygen atom or an —NH— group between carbon atoms of the alkylene group having 2 or more carbon atoms, represented by the following formula (I), is preferably 2 to 10, and more preferably 2 to 6.

[0075] Q ｂ２ As the compound, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ OCH ２ CH ２ CH ２ - is preferred (where the right side is bonded to Si).

[0076] Two [-Q ｂ２ -J １ ] may be the same or different.

[0077] -(X ３３ ) ｓ２ -Q ａ２ -N[-Q ｂ２ -J １ ] ２ Specific examples of the group include the following: In the following formula, * represents Z １ In addition, in the formula, J １ (CH ２ ) α In the formula, α is an integer representing the number of methylene groups, and is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20. It may be 2 to 10, or may be 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may be 1 to 10. Multiple α groups contained in the same compound may be the same or different, but are preferably the same. For example, multiple α groups contained in the same compound are all 2, 3, 8, 9, and 11. The same applies hereinafter.

[0078] In the group (3-1A-3), Q ａ３ is a single bond or an alkylene group which may have an etheric oxygen atom. ａ３ The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, and particularly preferably has 2 to 6 carbon atoms.

[0079] R ｇ is a hydrogen atom, a hydroxyl group, or an alkyl group.ｇ From the viewpoint of ease of production of the compound, a hydrogen atom or an alkyl group is preferred. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 4 carbon atoms, and further preferably is a methyl group.

[0080] Q ｂ３ is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane group between carbon atoms of an alkylene group having two or more carbon atoms. ｂ３ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q ｂ３ The number of carbon atoms in the group having an etheric oxygen atom or a divalent organopolysiloxane group between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the formula (I), is preferably 2 to 20, more preferably 2 to 10, and even more preferably 2 to 6. ｂ３ is preferably -CH ２ CH ２ -, -CH ２ CH ２ CH ２ - or -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ - is preferred.

[0081] Two [-Q ｂ３ -J １ ] may be the same or different.

[0082] -Si(R ｇ ) [-Q ｂ３ -J １ ] ２ Specific examples of the group include the following: In the following formula, * represents Q ａ３ represents the bonding position with

[0083] In the group (3-1A-4), Qｅ is -C(O)O-, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -N(R ｄ )C(O)- or -C(O)N(R ｄ )-. R ３１ The definition of is as described above. When w1 is 1 or 2, R ３１ is preferably a hydrogen atom. s4 is 0 or 1. Q ａ４ is a single bond or an alkylene group which may have an etheric oxygen atom. The number of carbon atoms in the alkylene group which may have an etheric oxygen atom is preferably 1 to 20, more preferably 1 to 10, still more preferably 1 to 6, and particularly preferably 1 to 3. t4 is 0 or 1 (provided that Q ａ４ If -Q is a single bond, it is 0. ａ４ -(O) ｔ４ When s4 is 0, a single bond or —CH ２ O-, -CH ２ OCH ２ -, -CH ２ OCH ２ CH ２ O-, -CH ２ OCH ２ CH ２ OCH ２ -, -CH ２ OCH ２ CH ２ CH ２ CH ２ OCH ２ - is preferred (however, the left side is Q ｅ When s4 is 1, it is a single bond, -CH ２ -, -CH ２ CH ２ - is preferred.

[0084] Q ｂ４ is an alkylene group, and the alkylene group is —O—, —C(O)N(R ｄ )-(R ｄThe definition of is as described above. ), may have a silphenylene skeleton group, a divalent organopolysiloxane group, or a dialkylsilylene group. When the alkylene group has -O- or a silphenylene skeleton group, it is preferable that the alkylene group has an -O- or silphenylene skeleton group between carbon atoms. In addition, when the alkylene group is -C(O)N(R ｄ )-, dialkylsilylene group or divalent organopolysiloxane group, carbon atom-carbon atom or (O) ｕ４ It is preferable that these groups are present at the end of the bond with Q. ｂ４ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and still more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10.

[0085] u4 is 0 or 1. -(O) ｕ４ -Q ｂ４ As the -, -CH is preferred from the viewpoint of ease of production of the compound. ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ OCH ２ CH ２ CH ２ -, -CH ２ OCH ２ CH ２ CH ２ CH ２ CH ２ -, -OCH ２ CH ２ CH ２ -, -OSi(CH ３ ) ２ CH ２ CH ２ CH ２ -, -OSi(CH ３ ) ２ OSi(CH ３ ) ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２CH ２ Si(CH ３ ) ２ PhSi(CH ３ ) ２ CH ２ CH ２ - is preferred (where the right side is bonded to Si).

[0086] w1 is an integer of 0 to 2, preferably 0 or 1, and particularly preferably 0. [-(O) ｕ４ -Q ｂ４ -J １ If there are two or more [-(O) ｕ４ -Q ｂ４ -J １ ] may be the same or different. ３１ If there are two or more, there are two or more (-R ３１ ) may be the same or different.

[0087] [Q in group (3-1A-4)] ｅ ] ｓ４ -Q ａ４ -(O) ｔ４ -C[-(O) ｕ４ -Q ｂ４ -J １ ] ３－ｗ１ (-R ３１ ) ｗ１ Specific examples of the group include the following: In the following formula, * represents Z １ represents the bonding position with

[0088] In the group (3-1A-5), Q ａ５ is an alkylene group which may have an etheric oxygen atom. The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, and particularly preferably has 2 to 6 carbon atoms. ａ５ As the compound, -OCH ２ CH ２ CH ２ -, -OCH ２ CH ２ OCH ２ CH ２ CH ２ -, -CH ２ CH ２ -, -CH２ CH ２ CH ２ - is preferred (where the right side is bonded to Si).

[0089] Q ｂ５ is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane group between carbon atoms of an alkylene group having two or more carbon atoms. ｂ５ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q ｂ５ The number of carbon atoms in the group having an etheric oxygen atom or a divalent organopolysiloxane group between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the formula (I), is preferably 2 to 20, more preferably 2 to 10, and even more preferably 2 to 6. ｂ５ As the compound, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ OCH ２ CH ２ CH ２ - is preferred (however, the right side is J １ Bind to. ).

[0090] Three [-Q ｂ５ -J １ ] may be the same or different.

[0091] Specific examples of the group (3-1A-5) include the following groups. In the following formula, * represents R ｆ１ represents the bonding position with

[0092] Q in group (3-1A-6) ｅ is as defined in the above group (3-1A-4). v is 0 or 1.

[0093] Q ａ６is an alkylene group which may have an etheric oxygen atom. The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, and particularly preferably has 2 to 6 carbon atoms. ａ６ As the compound, -CH ２ OCH ２ CH ２ CH ２ -, -CH ２ OCH ２ CH ２ OCH ２ CH ２ CH ２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ - is preferred (however, the right side is Z ａ Bind to. ).

[0094] Z ａ is a (w2+1)-valent organopolysiloxane group, or a (w2+1)-valent group having an alkylene group between the organopolysiloxane groups. w2 is an integer from 2 to 7. Examples of the (w2+1)-valent organopolysiloxane group and the (w2+1)-valent group having an alkylene group between the organopolysiloxane groups include the following groups. However, R in the following formula ａ * indicates a binding site.

[0095] Q ｂ６ is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane group between carbon atoms of an alkylene group having two or more carbon atoms. ｂ６ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q ｂ６The number of carbon atoms in the group having an etheric oxygen atom or a divalent organopolysiloxane group between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the formula (I), is preferably 2 to 20, more preferably 2 to 10, and even more preferably 2 to 6. ｂ６ As the compound, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ - is preferred. w2 [-Q ｂ６ -J １ ] may be the same or different.

[0096] -[Q in group (3-1A-6) ｅ ] ｖ -Q ａ６ -Z ａ [-Q ｂ６ -J １ ] ｗ２ Specific examples of the group include the following: In the following formula, * represents Z １ represents the bonding position with

[0097] In the group (3-1A-7), Z ｃ is a hydrocarbon group having a valence of (w3+w4+1). w3 is an integer of 4 or more. w4 is an integer of 0 or more. Q ｅ , s4, Q ａ４ , t4, Q ｂ４ The definitions and preferred ranges of u4 and u5 are the same as those of the respective symbols in group (3-1A-4).

[0098] Z ｃ may be composed of a hydrocarbon chain, and may have an etheric oxygen atom between carbon atoms in the hydrocarbon chain, and is preferably composed of a hydrocarbon chain. ｃ The valence of Z is preferably from 5 to 20, more preferably from 5 to 10, still more preferably from 5 to 8, and particularly preferably from 5 to 6. ｃThe number of carbon atoms in [-(O-Q ｂ４ ) ｕ４ -J １ If there are two or more [-(O-Q ｂ４ ) ｕ４ -J １ ] may be the same or different.

[0099] -[Q in group (3-1A-7) ｅ ] ｓ４ -Q ａ４ -(O) ｔ４ -Z ｃ [-(O-Q ｂ４ ) ｕ４ -J １ ] ｗ３ Specific examples of the group include the following: In the following formula, * represents Z １ represents the bonding position with

[0100] Q １ may be a group (g2-1) (where n3 = d1 + d3, n2 = d2 + d4), a group (g2-2) (where n3 = e1, n2 = e2), a group (g2-3) (where n3 = 1, n2 = 2), a group (g2-4) (where n3 = h1, n2 = h2), a group (g2-5) (where n3 = i1, n2 = i2), a group (g2-6) (where n3 = 1, n2 = 1), or a group (g2-7) (where n3 = 1, n2 = i3).

[0101]

[0102] (-A １ -Q １２ -) ｅ１ C (R ｅ２ ) ４－ｅ１－ｅ２ (-Q ２２ -) ｅ２ ... (g2-2) -A １ -Q １３-N(-Q ２３ -) ２ ...(g2-3) (-A １ -Q １４ -) ｈ１ Z(-Q ２４ -) ｈ２ ...(g2-4) (-A １ -Q １５ -) ｉ１ Si(R ｅ３ ) ４－ｉ１－ｉ２ (-Q ２５ -) ｉ２ ... (g2-5) -A １ -Q ２６ -...(g2-6) -A １ -Q １２ -CH(-Q ２２ -)-Si(R ｅ３ ) ３－ｉ３ (-Q ２５ -) ｉ３ …(g2-7)

[0103] However, in formulas (g2-1) to (g2-7), A １ Side is R ｆ１ and Q ２２ , Q ２３ , Q ２４ , Q ２５ or Q ２６ Side is J １ Combines with. A １ represents a single bond, -C(O)NR ｅ６ -, -C(O)-, -OC(O)O-, -NHC(O)O-, -NHC(O)NR ｅ６ -, -O- or SO ２ NR ｅ６ - is. １２ represents a single bond, an alkylene group, or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or O-, and Q １２ If there are two or more, there are two or more Q １２ may be the same or different. １３ is a single bond (where Q １ is —C(O)—), an alkylene group, an alkylene group having 2 or more carbon atoms having —C(O)NR between carbon atoms.６ -, -C(O)-, -NR ６ Q is a group having - or O-, or a group having -C(O)- at the N-terminal of the alkylene group. １４ Is, Q １４ When the atom in Z to which is bonded is a carbon atom, Q １２ and Q １４ When the atom in Z to which is bonded is a nitrogen atom, Q １３ and Q １４ If there are two or more, there are two or more Q １４ may be the same or different. １５ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or O-, and Q １５ If there are two or more, there are two or more Q １５ may be the same or different. ２２ represents an alkylene group, an alkylene group having 2 or more carbon atoms, and a —C(O)NR group between carbon atoms. ６ -, -C(O)-, -NR ６ a group having - or O-, and -C(O)NR at the end of the alkylene group not connected to Si; ６ -, -C(O)-, -NR ６ A group having - or O-, or an alkylene group having 2 or more carbon atoms having -C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or O- and -C(O)NR at the end not connected to Si ６ -, -C(O)-, -NR ６ - or O-, and Q ２２ If there are two or more, there are two or more Q ２２ may be the same or different. ２３ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or O-, and two Q ２３ may be the same or different. ２４ Is, Q ２４When the atom in Z to which is bonded is a carbon atom, Q ２２ and Q ２４ When the atom in Z to which is bonded is a nitrogen atom, Q ２３ and Q ２４ If there are two or more, there are two or more Q ２４ may be the same or different. ２５ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or O-, and Q ２５ If there are two or more, there are two or more Q ２５ may be the same or different. ２６ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or O- containing group. ２２ , Q ２３ , Q ２４ , Q ２５ , Q ２６ When Z is an alkylene group, it preferably has 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, and even more preferably 1 to 6 carbon atoms. １４ has a carbon atom or a nitrogen atom to which Q is directly bonded, ２４ is a group having a (h1+h2)-valent ring structure having a carbon atom or nitrogen atom to which R is directly bonded. ｅ１ is a hydrogen atom or an alkyl group, and R ｅ１ When two or more R ｅ１ may be the same or different. ｅ２ is a hydrogen atom, a hydroxyl group, an alkyl group, or an acyloxy group. ｅ３ is an alkyl group. ６ is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group.

[0104] d1 is an integer of 0 to 3, preferably 1 or 2. d2 is an integer of 0 to 3, preferably 1 or 2. d1 + d2 is an integer of 1 to 3. d3 is an integer of 0 to 3, preferably 0 or 1. d4 is an integer of 0 to 3, preferably 2 or 3. d3 + d4 is an integer of 1 to 3. d1 + d3 is an integer of 1 to 5, preferably 1 or 2. d2 + d4 is an integer of 1 to 5, preferably 2 or 3. e1 + e2 is 3 or 4. e1 is an integer of 1 to 3, preferably 1 or 2. e2 is an integer of 1 to 3, preferably 2 or 3. h1 is an integer of 1 or more, preferably 1 or 2. h2 is an integer of 1 or more, preferably 2 or 3. i1 + i2 is 3 or 4. i1 is an integer of 1 to 3, and preferably 1 or 2. i2 is an integer of 1 to 3, and preferably 2 or 3. i3 is 2 or 3.

[0105] Q １２ , Q １３ , Q １４ , Q １５ , Q ２２ , Q ２３ , Q ２４ , Q ２５ and Q ２６ The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, from the viewpoints of ease of production of the compound and further superior abrasion resistance of the surface treatment layer, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10, 1 to 6, or 1 to 4. However, when a specific bond is present between carbon atoms, the lower limit of the number of carbon atoms in the alkylene group is 2.

[0106] Examples of the ring structure in Z include the ring structures described above, and the preferred embodiments are also the same. １４ YaQ ２４ is directly bonded to the ring structure, for example, an alkylene group is linked to the alkylene group, and Q １４ YaQ２４ are never connected.

[0107] R ｅ１ , R ｅ２ or R ｅ３ The number of carbon atoms in the alkyl group of R is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2, from the viewpoint of ease of production of the compound. ｅ２ The number of carbon atoms in the alkyl group portion of the acyloxy group is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2, from the viewpoint of ease of production of the compound. h1 is preferably 1 to 6, more preferably 1 to 4, even more preferably 1 or 2, and particularly preferably 1, from the viewpoint of ease of production of the compound and further excellent abrasion resistance of the surface treatment layer. h2 is preferably 2 to 6, more preferably 2 to 4, and particularly preferably 2 or 3, from the viewpoint of ease of production of the compound and further excellent abrasion resistance of the surface treatment layer.

[0108] Q １ Other forms of the formula include a group (g2-8) (where n3 = d1 + d3, n2 = d2 × k3 + d4 × k3), a group (g2-9) (where n3 = e1, n2 = e2 × k3), a group (g2-10) (where n3 = 1, n2 = 2 × k3), a group (g2-11) (where n3 = h1, n2 = h2 × k3), a group (g2-12) (where n3 = i1, n2 = i2 × k3), a group (g2-13) (where n3 = 1, n2 = k3), or a group (g2-14) (where n3 = 1, n2 = i3 × k3).

[0109]

[0110] (-A １ -Q １２ -) ｅ１ C (R ｅ２ ) ４－ｅ１－ｅ２ (-Q ２２ -G １ ) ｅ２ ... (g2-9) -A １ -Q １３ -N(-Q ２３ -G １ ) ２ ...(g2-10) (-A １ -Q１４ -) ｈ１ Z(-Q ２４ -G １ ) ｈ２ ...(g2-11) (-A １ -Q １５ -) ｉ１ Si(R ｅ３ ) ４－ｉ１－ｉ２ (-Q ２５ -G １ ) ｉ２ ...(g2-12) -A １ -Q ２６ -G １ ...(g2-13) -A １ -Q １２ -CH(-Q ２２ -G １ )-Si(R ｅ３ ) ３－ｉ３ (-Q ２５ -G １ ) ｉ３ …(g2-14)

[0111] However, in formulas (g2-8) to (g2-14), A １ Side is R ｆ１ and G １ Side is J １ and combine.

[0112] G １ is the following group (g3), and Q １ Two or more Gs １ may be the same or different. １ The symbols other than are the same as those in formulas (g2-1) to (g2-7). ８ ) ３－ｋ３ (-Q ３ -) ｋ３ ...(g3) In the group (g3), the Si side is Q ２２ , Q ２３ , Q ２４ , Q ２５ and Q ２６ Connect to Q ３ Side is J １ Connect to R ８ is an alkyl group. ３ represents an alkylene group, an alkylene group having 2 or more carbon atoms, and a —C(O)NR group between carbon atoms.６ -, -C(O)-, -NR ６ - or -O- containing group, or (OSi(R ９ ) ２ ) ｐ -O-, and two or more Q ３ may be the same or different. k3 is 2 or 3. R ６ is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group. ９ is an alkyl group, a phenyl group, or an alkoxy group, and two R ９ may be the same or different. p is an integer of 0 to 5, and when p is 2 or more, there are two or more (OSi(R ９ ) ２ ) may be the same or different.

[0113] Q ３ The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, from the viewpoint of ease of production of the compound and further superior abrasion resistance of the surface treatment layer, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may be 1 to 10, 1 to 6, or 1 to 4. However, when there is a specific bond between carbon atoms, the lower limit of the number of carbon atoms in the alkylene group is 2. R ８ The number of carbon atoms in the alkyl group of R is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of the compound. ９ The number of carbon atoms in the alkyl group of R is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of the compound. ９ In view of excellent storage stability of the compound, the number of carbon atoms in the alkoxy group is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2. p is preferably 0 or 1.

[0114] Examples of the compound of the present disclosure include compounds of the following formula: The compound of the following formula is preferred because it is easy to produce industrially, easy to handle, and provides a surface treatment layer with even better water repellency and abrasion resistance. ｔ is (R ｆ１) and the preferred embodiments are also the same.

[0115] Q in formula (1) １ Examples of compounds in which is group (g2-1) include compounds of the following formula:

[0116] Q in formula (1) １ Examples of compounds in which is a group (g2-2) include compounds of the following formula: In the following formula, Ak represents an alkyl group (for example, an alkyl group having 1 to 15 carbon atoms).

[0117] Q in formula (1) １ Examples of compounds in which is a group (g2-3) include compounds of the following formula:

[0118]

[0119] Q in formula (1) １ Examples of compounds in which is a group (g2-4) include compounds of the following formula:

[0120] Q in formula (1) １ Examples of compounds in which is a group (g2-5) include compounds of the following formula:

[0121] Q in formula (1) １ Examples of compounds in which is a group (g2-6) include compounds of the following formula:

[0122] Q in formula (1) １ Examples of compounds in which is a group (g2-7) include compounds of the following formula:

[0123] Q in formula (1) １ Examples of compounds in which is a group (g2-8) include compounds of the following formula:

[0124] Q in formula (1) １ Examples of compounds in which is a group (g2-9) include compounds of the following formula:

[0125] Q in formula (1) １ Examples of compounds in which is a group (g2-10) include compounds of the following formula:

[0126] Q in formula (1) １ Examples of compounds in which is a group (g2-11) include compounds of the following formula:

[0127] Q in formula (1) １ Examples of compounds in which is a group (g2-12) include compounds of the following formulae:

[0128] Q in formula (1) １ Examples of compounds in which is a group (g2-13) include compounds of the following formulae:

[0129] Q in formula (1) １ Examples of compounds in which is a group (g2-14) include compounds of the following formulae:

[0130] Specific examples of the compound of the present disclosure include, but are not limited to, the compounds shown below. In the formula, n is preferably an integer of 1 to 250, more preferably an integer of 5 to 250, and even more preferably an integer of 5 to 50. It may be an integer of 1 to 50, or an integer of 5 to 30. Examples include 10, 14, 15, 20, 23, and 25.

[0131]

[0132] [Composition] The composition of the present disclosure may contain at least one of a compound represented by formula (1) and a compound represented by formula (2), and components other than the compounds of the present disclosure (hereinafter also referred to as "other components") are not particularly limited. The surface treatment agent of the present disclosure may contain both a compound represented by formula (1) and a compound represented by formula (2). Specific examples of other components include a fluorine-containing compound other than the compounds of the present disclosure, at least one of the following impurities, a liquid medium, etc.

[0133] Examples of the other fluorine-containing compound include a fluorine-containing compound produced as a by-product in the production process of the compound (hereinafter also referred to as a "by-product fluorine-containing compound"), and a known fluorine-containing compound used for the same purpose as the above-mentioned fluorine-containing ether compound. The other fluorine-containing compound is preferably a compound that is unlikely to deteriorate the properties of the compound. To fully exhibit the properties of the compound, the content of the other fluorine-containing compound is preferably less than 70% by mass, more preferably less than 50% by mass, even more preferably less than 20% by mass, particularly preferably less than 10% by mass, and most preferably less than 5% by mass, relative to the total mass of the surface treatment agent.

[0134] Examples of by-product fluorine-containing compounds include unreacted fluorine-containing compounds during the synthesis of the compound. When the composition according to the present disclosure contains a by-product fluorine-containing compound, the purification step for removing the by-product fluorine-containing compound or reducing the amount of the by-product fluorine-containing compound can be simplified.

[0135] Examples of known fluorine-containing compounds include those described in the following documents: perfluoropolyether-modified aminosilanes described in JP 11-029585 A, silicon-containing organic fluorine-containing polymers described in JP 2874715 A, organosilicon compounds described in JP 2000-144097 A, perfluoropolyether-modified aminosilanes described in JP 2000-327772 A, fluorinated siloxanes described in JP 2002-506887 A, organosilicon compounds described in JP 2008-534696 A, fluorinated modified hydrogen-containing polymers described in JP 4138936 A, compounds described in U.S. Patent Application Publication No. 2010 / 0129672, WO 2014 / 126064, and JP 2014-070163 A, Organosilicon compounds described in WO 2011 / 060047 and WO 2011 / 059430; fluorine-containing organosilane compounds described in WO 2012 / 064649; fluorooxyalkylene group-containing polymers described in JP 2012-72272 A; fluorine-containing ether compounds described in WO 2013 / 042732, WO 2013 / 121984, WO 2013 / 121985, WO 2013 / 121986, WO 2014 / 163004, JP 2014-080473 A, WO 2015 / 087902, WO 2017 / 038830, WO 2017 / 038832, and WO 2017 / 187775; perfluoro(poly)ether-containing silane compounds described in JP 2014-218639 A, WO 2017 / 022437, WO 2018 / 079743, and WO 2018 / 143433; Fluoropolyether group-containing polymer-modified silanes described in JP-A-2015-199906, JP-A-2016-204656, JP-A-2016-210854, and JP-A-2016-222859;Fluorine-containing ether compounds described in WO 2018 / 216630, WO 2019 / 039226, WO 2019 / 039341, WO 2019 / 039186, WO 2019 / 044479, JP 2019-44158 A, WO 2019 / 044479, and WO 2019 / 163282. Commercially available fluorine-containing compounds include the KY-100 series (KY-178, KY-185, KY-195, etc.) manufactured by Shin-Etsu Chemical Co., Ltd., the SURECO AF series such as SURECO (registered trademark) 2101S manufactured by AGC, and OPTOOL (registered trademark) DSX, OPTOOL (registered trademark) AES, OPTOOL (registered trademark) UF503, OPTOOL (registered trademark) UD509, and OPTOOL (registered trademark) UD120 manufactured by Daikin Industries, Ltd.

[0136] When the present surface treatment agent contains other fluorine-containing compounds, the content of the other fluorine-containing compounds relative to the total content of the fluorine-containing ether compound and the other fluorine-containing compounds in the present surface treatment agent is preferably 60% by mass or less, more preferably 30% by mass or less, and even more preferably 10% by mass or less. The total content of the fluorine-containing ether compound and the other fluorine-containing compounds in the present surface treatment agent is preferably 0.01% by mass or more, more preferably 0.03% by mass or more. When the content of the fluorine-containing ether compound and the other fluorine-containing compounds is within the above range, the surface layer has excellent water and oil repellency, abrasion resistance, fingerprint removability, lubricity, and appearance.

[0137] The content of the compound of the present disclosure is preferably 0.01 to 50 mass%, more preferably 0.03 to 40 mass%, and even more preferably 0.05 to 30 mass%, relative to the total mass of the composition of the present disclosure. When the content of the compound of the present disclosure is within the above range, the surface treatment layer will have better water and oil repellency, abrasion resistance, fingerprint removability, lubricity, and appearance. The liquid medium contained in the composition of the present disclosure may be one type only, or two or more types.

[0138] The liquid medium is preferably an organic solvent. The organic solvent may be a fluorine-based organic solvent, a non-fluorine-based organic solvent, or a mixture of both.

[0139] Examples of fluorine-based organic solvents include fluorinated alkanes, fluorinated aromatic compounds, fluoroalkyl ethers, fluorinated alkylamines, fluoroalcohols, and hydrofluoroolefins. The fluorinated alkanes are preferably compounds having 4 to 8 carbon atoms. Commercially available products include C ６ F １３ H (manufactured by AGC, Asahiklin (registered trademark) AC-2000), C ６ F １３ C ２ H ５ (AGC, Asahiklin (registered trademark) AC-6000), C ２ F ５ CHFCHFCF ３ (Vertrel (registered trademark) XF, manufactured by Chemours) and the like. Specific examples of fluorinated aromatic compounds include hexafluorobenzene, trifluoromethylbenzene, perfluorotoluene, and bis(trifluoromethyl)benzene. As the fluoroalkyl ether, compounds having 4 to 12 carbon atoms are preferred. Commercially available products include CF ３ CH ２ OCF ２ CF ２ H (manufactured by AGC, Asahiklin (registered trademark) AE-3000), C ４ F ９ OCH ３ (3M Novec (registered trademark) 7100), C ４ F ９ O.C. ２ H ５ (3M Novec (registered trademark) 7200), C ２ F ５ CF (OCH ３ ) C ３ F ７(Novec (registered trademark) 7300, manufactured by 3M Corporation). Specific examples of fluorinated alkylamines include perfluorotripropylamine and perfluorotributylamine. Specific examples of fluoroalcohols include 2,2,3,3-tetrafluoropropanol, 2,2,2-trifluoroethanol, and hexafluoroisopropanol. Specific examples of hydrofluoroolefins include 1-chloro-2,3,3-trifluoro-1-propene (HCFO-1233yd). A commercially available product is Amorea (registered trademark) AS-300, manufactured by AGC. Preferred non-fluorinated organic solvents are compounds consisting only of hydrogen atoms and carbon atoms, and compounds consisting only of hydrogen atoms, carbon atoms, and oxygen atoms, and examples of such non-fluorinated organic solvents include hydrocarbon organic solvents, alcohol organic solvents, ketone organic solvents, ether organic solvents, and ester organic solvents. When the present surface treatment agent contains a liquid medium, the present surface treatment agent preferably contains 60 to 99.999 mass %, more preferably 85 to 99.99 mass %, and even more preferably 90 to 99.9 mass % of the liquid medium.

[0140] The present surface treatment agent may further contain a known additive such as an acid catalyst or a basic catalyst that promotes the hydrolysis and condensation reaction of the group P. The content of the additive is preferably 10% by mass or less, and more preferably 1% by mass or less, based on the total mass of the present surface treatment agent.

[0141] [Surface Treatment Agent] In one embodiment, the surface treatment agent of the present disclosure contains the compound of the present disclosure. Alternatively, the surface treatment agent of the present disclosure may contain the compound of the present disclosure and a liquid medium. The surface treatment agent of the present disclosure may be the composition of the present disclosure. A preferred embodiment of the liquid medium contained in the surface treatment agent is the same as a preferred embodiment of the liquid medium contained in the composition of the present disclosure.

[0142] The compound of the present disclosure contains an alkyl group having two or more carbon atoms, an organopolysiloxane group, and a group P. Therefore, by using a surface treatment agent containing the compound of the present disclosure, a surface treatment layer having excellent water repellency and abrasion resistance can be formed. The surface treatment agent of the present disclosure may contain at least one of a compound represented by formula (1) and a compound represented by formula (2). Note that the surface treatment agent of the present disclosure may contain both a compound represented by formula (1) and a compound represented by formula (2).

[0143] The surface treatment agent of the present disclosure is particularly preferably used for optical members.

[0144] [Article] In one embodiment, the article of the present disclosure includes a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent of the present disclosure.

[0145] The surface treatment layer may be formed on a part of the surface of the substrate, or may be formed on the entire surface of the substrate. The surface treatment layer may be spread in the form of a film on the surface of the substrate, or may be scattered in the form of dots. In the surface treatment layer, the compound of the present disclosure is contained in a state in which the hydrolysis of part or all of the group P has progressed and the dehydration condensation reaction of the silanol groups has progressed.

[0146] The thickness of the surface treatment layer is preferably 1 to 100 nm, more preferably 1 to 50 nm. If the thickness of the surface treatment layer is 1 nm or more, the effect of the surface treatment is likely to be sufficient. If the thickness of the surface treatment layer is 100 nm or less, the utilization efficiency is high. The thickness of the surface treatment layer can be calculated from the oscillation period of the interference pattern obtained by X-ray reflectivity using a thin film analysis X-ray diffractometer (product name "ATX-G", manufactured by RIGAKU Corporation).

[0147] The type of substrate is not particularly limited, and examples thereof include substrates that are required to be water-repellent. Examples of substrates include substrates that may be used by contacting other articles (e.g., stylus) or human fingers; substrates that may be held by human fingers during operation; and substrates that may be placed on other articles (e.g., a mounting table). Examples of substrate materials include metal, resin, glass, sapphire, ceramic, semiconductor, stone, fiber, nonwoven fabric, paper, wood, fur, natural leather, artificial leather, ceramics, and composite materials thereof. Glass may be chemically strengthened.

[0148] Examples of the substrate include glass or resin used for building materials, decorative building materials, interior goods, transportation equipment (e.g., automobiles), signs, bulletin boards, drinking vessels, tableware, aquariums, ornamental equipment (e.g., frames, boxes), laboratory equipment, furniture, textile products, packaging containers, art, sports, games, etc., and glass or resin used for the exterior parts (excluding display parts) of devices such as mobile phones (e.g., smartphones), personal digital assistants, game consoles, remote controls, etc. The shape of the substrate may be a plate or a film.

[0149] The substrate is preferably a substrate for a touch panel, a substrate for a display, or a lens for glasses, and is particularly preferably a substrate for a touch panel.The material of the substrate for a touch panel is preferably glass or a transparent resin.

[0150] The substrate may be a substrate whose one or both surfaces have been subjected to a surface treatment such as corona discharge treatment, plasma treatment, or plasma graft polymerization treatment. A surface-treated substrate has better adhesion to the surface treatment layer and further improved abrasion resistance of the surface treatment layer. Therefore, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the surface treatment layer. Furthermore, when a base layer described below is provided on the surface-treated substrate, it has better adhesion to the base layer and further improved abrasion resistance of the surface treatment layer. Therefore, when a base layer is provided, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the base layer.

[0151] The surface treatment layer may be provided directly on the surface of the substrate, or a primer layer may be provided between the substrate and the surface treatment layer. From the viewpoint of further improving the water repellency and abrasion resistance of the surface treatment layer, the article of the present disclosure preferably includes a substrate, a primer layer disposed on the substrate, and a surface treatment layer surface-treated with the surface treatment agent of the present disclosure, disposed on the primer layer.

[0152] The underlayer is preferably a layer containing an oxide containing silicon and at least one specific element selected from the group consisting of Group 1 elements, Group 2 elements, Group 4 elements, Group 5 elements, Group 13 elements, and Group 15 elements of the periodic table.

[0153] The Group 1 elements of the periodic table (hereinafter also referred to as "Group 1 elements") refer to lithium, sodium, potassium, rubidium, and cesium. As the Group 1 elements, lithium, sodium, and potassium are preferred, and sodium and potassium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 1 elements.

[0154] The Group 2 elements of the periodic table (hereinafter also referred to as "Group 2 elements") refer to beryllium, magnesium, calcium, strontium, and barium. As the Group 2 elements, magnesium, calcium, and barium are preferred, and magnesium and calcium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 2 elements.

[0155] The Group 4 elements of the periodic table (hereinafter also referred to as "Group 4 elements") refer to titanium, zirconium, and hafnium. As the Group 4 elements, titanium and zirconium are preferred, and titanium is more preferred, from the viewpoint of being able to form a surface treatment layer on the underlayer more uniformly without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 4 elements.

[0156] The Group 5 elements of the periodic table (hereinafter also referred to as "Group 5 elements") refer to vanadium, niobium, and tantalum. As the Group 5 element, vanadium is particularly preferred from the viewpoint of providing a surface treatment layer with better abrasion resistance. The underlayer may contain two or more Group 5 elements.

[0157] The Group 13 elements of the periodic table (hereinafter also referred to as "Group 13 elements") refer to boron, aluminum, gallium, and indium. As the Group 13 elements, boron, aluminum, and gallium are preferred, and boron and aluminum are more preferred, from the viewpoint of enabling the surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 13 elements.

[0158] The Group 15 elements of the periodic table (hereinafter also referred to as "Group 15 elements") refer to nitrogen, phosphorus, arsenic, antimony, and bismuth. As the Group 15 elements, phosphorus, antimony, and bismuth are preferred, and phosphorus and bismuth are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 15 elements.

[0159] As the specific element contained in the underlayer, Group 1 elements, Group 2 elements, and Group 13 elements are preferred because they provide better abrasion resistance to the surface treatment layer, and Group 1 elements and Group 2 elements are more preferred, with Group 1 elements being even more preferred. The specific element may contain only one type of element or two or more types of elements.

[0160] The oxide contained in the underlayer may be a mixture of oxides of the above elements (silicon and the specific element) alone (for example, a mixture of silicon oxide and an oxide of the specific element), a composite oxide containing two or more of the above elements, or a mixture of an oxide of the above elements alone and a composite oxide.

[0161] From the viewpoint of achieving superior abrasion resistance of the surface treatment layer, the ratio of the total molar concentration of the specific elements in the underlayer to the molar concentration of silicon in the underlayer (specific elements / silicon) is preferably 0.02 to 2.90, more preferably 0.10 to 2.00, and even more preferably 0.20 to 1.80. The molar concentrations (mol %) of each element in the underlayer can be measured, for example, by depth profile analysis by X-ray photoelectron spectroscopy (XPS) using ion sputtering.

[0162] The underlayer may be a single layer or multiple layers. The underlayer may have an uneven surface. The thickness of the underlayer is preferably 1 to 100 nm, more preferably 1 to 50 nm, and even more preferably 2 to 20 nm. When the thickness of the underlayer is equal to or greater than the above lower limit, the adhesion of the underlayer to the surface treatment layer is further improved, and the surface treatment layer has better abrasion resistance. When the thickness of the underlayer is equal to or less than the above upper limit, the underlayer itself has excellent abrasion resistance. The thickness of the underlayer is measured by observing the cross section of the underlayer using a transmission electron microscope (TEM).

[0163] The underlayer can be formed by, for example, a vapor deposition method using a vapor deposition material or a wet coating method.

[0164] The deposition material used in the deposition method preferably contains an oxide containing silicon and a specific element. Specific examples of the form of the deposition material include powder, melt, sintered body, granules, and crushed body, with melt, sintered body, and granules being preferred from the viewpoint of ease of handling. Here, the melt refers to a solid obtained by melting the powder of the deposition material at a high temperature and then cooling and solidifying it. The sintered body refers to a solid obtained by firing the powder of the deposition material. If necessary, a molded body may be used by press-molding the powder instead of the powder of the deposition material. The granule refers to a solid obtained by kneading the powder of the deposition material with a liquid medium (e.g., water, organic solvent) to obtain particles, and then drying the particles.

[0165] The vapor deposition material can be produced by, for example, the following methods: A method of mixing silicon oxide powder with a powder of an oxide of a specific element to obtain a vapor deposition material powder. A method of kneading the vapor deposition material powder with water to obtain particles, and then drying the particles to obtain granules of the vapor deposition material. A method of mixing a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel), a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element), and water, drying the mixture, and then firing the dried mixture or a compact obtained by pressing the dried mixture to obtain a sintered body. A method of melting a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel) and a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element) at a high temperature, and then cooling and solidifying the melt to obtain a melt.

[0166] A specific example of a vapor deposition method using a vapor deposition material is a vacuum vapor deposition method. The vacuum vapor deposition method is a method in which a vapor deposition material is evaporated in a vacuum chamber and attached to the surface of a substrate. The temperature during vapor deposition (for example, the temperature of the boat in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 100 to 3,000°C, and more preferably 500 to 3,000°C. The pressure during vapor deposition (for example, the pressure in the chamber in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 1 Pa or less, and more preferably 0.1 Pa or less. When forming an underlayer using a vapor deposition material, one vapor deposition material may be used, or two or more vapor deposition materials containing different elements may be used.

[0167] Specific examples of evaporation methods for the deposition material include a resistance heating method, in which the deposition material is melted and evaporated on a resistance heating boat made of a high-melting-point metal, and an electron gun method, in which the deposition material is irradiated with an electron beam to directly heat the deposition material, melting and evaporating the surface. The electron gun method is preferred as an evaporation method for the deposition material because it can evaporate high-melting-point substances due to its ability to locally heat the material, and because areas not irradiated by the electron beam are at low temperatures, eliminating the risk of reaction with the container or the inclusion of impurities. The evaporation method for the deposition material may use multiple boats, or all of the deposition materials may be placed in a single boat. The deposition method may be co-evaporation or alternating deposition. Specific examples include mixing silica and a specific source in the same boat, co-evaporating silica and a specific element source in separate boats, or similarly placing them in separate boats and alternately depositing them. The deposition conditions, order, etc., are appropriately selected depending on the composition of the underlayer.

[0168] In the wet coating method, it is preferable to form an undercoat layer on a substrate by a wet coating method using a coating liquid containing a silicon-containing compound, a compound containing a specific element, and a liquid medium.

[0169] Specific examples of the silicon compound include silicon oxide, silicic acid, partial condensates of silicic acid, alkoxysilanes, and partial hydrolysis condensates of alkoxysilanes.

[0170] Specific examples of compounds containing a specific element include oxides of the specific element, alkoxides of the specific element, carbonates of the specific element, sulfates of the specific element, nitrates of the specific element, oxalates of the specific element, and hydroxides of the specific element.

[0171] Examples of the liquid medium include the same liquid medium as that contained in the composition of the present disclosure.

[0172] The content of the liquid medium is preferably 0.01 to 20% by mass, and more preferably 0.1 to 10% by mass, based on the total amount of the coating liquid used to form the underlayer. Specific examples of wet coating methods for forming the underlayer include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0173] After wet-coating the coating liquid, it is preferable to dry the coating film. The drying temperature for the coating film is preferably 20 to 200°C, more preferably 80 to 160°C.

[0174] The article of the present disclosure may be an optical material having a surface treatment layer as the outermost layer. Examples of the optical material include optical materials related to displays and the like, as well as a wide variety of other optical materials. Examples of the optical material include displays such as cathode ray tubes (CRTs; for example, personal computer monitors), liquid crystal displays, plasma displays, organic electroluminescent displays, inorganic thin-film electroluminescent dot matrix displays, rear projection displays, fluorescent display tubes (VFDs), and field emission displays (FEDs), as well as protective plates for such displays, or displays whose surfaces have been treated with an anti-reflection film.

[0175] The article of the present disclosure is preferably an optical component. Examples of optical components include car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio systems, game consoles, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and anti-reflection films. Examples of optical components include front protective plates, anti-reflection plates, polarizing plates, and anti-glare plates for displays such as PDPs and LCDs; disc surfaces of optical discs such as Blu-ray (registered trademark) discs, DVD discs, CD-Rs, and MO discs; optical fibers; and the display surfaces of watches. In particular, the article of the present disclosure is preferably a display or a touch panel.

[0176] The article of the present disclosure may be a medical device or a medical material. The article of the present disclosure may also be an automobile interior or exterior component. Examples of exterior components include windows, light covers, and exterior camera covers. Examples of interior components include instrument panel covers, navigation system touch panels, and decorative interior components.

[0177] When the article of the present disclosure is an optical component, the material constituting the surface of the substrate is a material for optical components, such as glass or transparent plastic. When the article of the present disclosure is an optical component, a functional layer such as a hard coat layer or an anti-reflection layer may be formed on the surface (outermost layer) of the substrate. The anti-reflection layer may be either a single-layer anti-reflection layer or a multi-layer anti-reflection layer. Examples of inorganic materials that can be used for the anti-reflection layer include SiO ２ , SiO, ZrO ２ , TiO ２ , TiO, Ti ２ O ３ , Ti ２ O ５ , Al ２ O ３ , Ta ２ O ５ , Ta ３ O ５, Nb ２ O ５ , HfO ２ , Si ３ N ４ , CeO ２ , MgO, Y ２ O ３ , SnO ２ , MgF ２ , and W.O. ３ These inorganic substances may be used alone or in combination of two or more (for example, as a mixture). When a multi-layer antireflection layer is formed, the outermost layer may contain SiO ２ and / or SiO is preferably used. When the article of the present disclosure is an optical glass component for a touch panel, a transparent electrode, for example, a thin film using indium tin oxide (ITO) or indium zinc oxide, may be provided on a portion of the surface of the substrate (glass). Furthermore, the substrate may have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomization film layer, a hard coating film layer, a polarizing film, a phase difference film, a liquid crystal display module, or the like, depending on its specific specifications.

[0178] [Method for manufacturing an article] The method for manufacturing an article according to the present disclosure is, for example, a method for manufacturing an article having a surface-treated layer formed on a substrate by performing a surface treatment on a substrate using the surface treatment agent according to the present disclosure. Examples of the surface treatment include a dry coating method and a wet coating method.

[0179] Examples of dry coating methods include vacuum deposition, CVD, and sputtering. Vacuum deposition is preferred as a dry coating method from the viewpoints of suppressing decomposition of the compound and simplicity of the equipment. For vacuum deposition, a pellet-shaped substance obtained by impregnating a metal porous body such as iron or steel with the compound of the present disclosure may be used. A composition containing the compound of the present disclosure and a liquid medium may be impregnated into a metal porous body such as iron or steel, and the liquid medium may be dried to obtain a pellet-shaped substance impregnated with the compound of the present disclosure.

[0180] Examples of wet coating methods include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0181] In order to improve the abrasion resistance of the surface treatment layer, an operation to promote the reaction between the compound of the present disclosure and the substrate may be performed as necessary. Examples of such an operation include heating, humidification, and light irradiation. For example, the substrate on which the surface treatment layer is formed can be heated in a humid atmosphere to promote reactions such as the hydrolysis reaction of hydrolyzable groups, the reaction between hydroxyl groups on the surface of the substrate and silanol groups, and the formation of siloxane bonds through the condensation reaction of silanol groups. After surface treatment, compounds in the surface treatment layer that are not chemically bonded to other compounds or the substrate may be removed as needed. Examples of removal methods include pouring a solvent over the surface treatment layer and wiping with a cloth soaked in the solvent.

[0182] The present disclosure will be described in more detail below using examples, but the present disclosure is not limited to these examples. Examples 1 and 2 are comparative examples, and Examples 3 to 7 are working examples.

[0183] [Synthesis of Compound (11)] Compound (11) was obtained according to the methods described in Synthesis Examples 1 and 2 of WO 2017 / 022437. The average number of repeating units x2 was 21, and the average number of repeating units x3 was 19.

[0184]

[0185] [Synthesis of Compound (12)] Compound (12) was obtained according to the method described in Synthesis Examples 1 to 3 of WO 2017 / 022437. The average number of repeating units x2 was 21, and the average number of repeating units x3 was 19.

[0186]

[0187] [Synthesis of compound (13)] Compound (13) was obtained according to the method described in the synthesis of compound (7-2) in WO 2021 / 251396. The average number of repeating units x1 was 14. The structure of compound (13) was confirmed by the following NMR data.

[0188]

[0189] 1 H-NMR (400MHz, CDCl3) δ(ppm):5.85-5.69(1H),5.29-5.04(2H),4.08-3.98(2H),3.94-3.81(2H). 19 F-NMR (376MHz, CDCl3) δ(ppm):-54.85,-82.34,-86.24,-87.57,-89.70,-118.86,-124.67,-125.97.

[0190] [Synthesis of compound (14)] Compound (14) was obtained according to the method described in the synthesis of compound (7-3) in WO 2021 / 251396. The average number of repeating units x1 was 14.

[0191]

[0192] [Synthesis of Compound (15)] Trimethoxysilane (10 g), tris(triphenylphosphine)rhodium(I) chloride (0.05 g), toluene (30 g), and molecular sieves 5A (20 g) were heated under reflux at 110°C for 24 hours. After removing the molecular sieves by filtration, the mixture was purified by distillation to obtain 2.5 g of compound (15). The structure of compound (15) was confirmed by the following NMR data.

[0193]

[0194] 1 H-NMR (400MHz, CDCl3) δ(ppm):4.31(s,1H),3.68-3.55(m,15H).

[0195] ​​[Synthesis of Compound (16)] AC-2000 (1.8 g), compound (11) (1.0 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3%, 12.9 mg), aniline (2.6 mg), and compound (15) (0.6 g) were stirred at 40°C, and the low-boiling point components were then distilled off under reduced pressure to obtain 1.2 g of compound (16). The average number of repeating units x2 was 21, and the average number of repeating units x3 was 19. The structure of compound (16) was confirmed from the following NMR data.

[0196]

[0197] 1 H-NMR (400MHz, CDCl3) δ(ppm):3.97(t,J=13.0Hz,2H),3.65-3.24(m,63H),1.73-1.47(m,10H),0.78(t,J=9.4Hz,6H).

[0198] [Synthesis of Compound (17)] AC-2000 (1.8 g), compound (13) (1.0 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3%, 12.9 mg), aniline (2.6 mg), and compound (15) (0.4 g) were stirred at 40°C, and the low-boiling point components were then distilled off under reduced pressure to obtain 1.1 g of compound (17). The average number of repeating units x1 was 14. The structure of compound (17) was confirmed from the following NMR data.

[0199]

[0200] 1 H-NMR (400MHz, CDCl3) δ(ppm):4.08(tt,J=13.0,2.8Hz,2H),3.70-3.34(m,17H),1.70-1.41(m,2H),0.78(t,J=9.4Hz,2H).

[0201] [Synthesis of Compound (18)] Compound (18) was obtained according to the method described in Example 3 of WO 2018 / 056413.

[0202]

[0203] ​​[Synthesis of Compound (19)] AC-2000 (1.8 g), compound (18) (1.0 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3%, 12.9 mg), aniline (2.6 mg), and compound (15) (0.5 g) were stirred at 40°C, and then the low-boiling point components were distilled off under reduced pressure to obtain 1.1 g of compound (19). The structure of compound (19) was confirmed from the following NMR data.

[0204]

[0205] 1 H-NMR (400MHz, CDCl3) δ(ppm):4.69(tt,J=12.8,2.6Hz,2H),4.01-3.38(m,34H),1.83-1.50(m,4H),0.80(t,J=9.3Hz,4H).

[0206] [Synthesis of Compound (20)] Compound (20) was obtained according to the method described in Synthesis Example 6 of WO 2018 / 079743.

[0207]

[0208] [Synthesis of compound (21)] AC-2000 (1.8 g), compound (20) (1.0 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3%, 12.9 mg), aniline (2.6 mg), and compound (15) (0.5 g) were stirred at 40°C, and then the low-boiling point components were distilled off under reduced pressure to obtain 1.1 g of compound (21). The structure of compound (21) was confirmed from the following NMR data.

[0209]

[0210] 1 H-NMR (400MHz, CDCl3) δ(ppm):3.56(d,J=16.1Hz,45H),2.11(tt,J=14.2,8.6Hz,2H),1.57-1.24(m,8H),0.81-0.26(m,14H).

[0211] ​​[Synthesis of Compound (22)] Compound (22) was obtained according to the method described in Example 6-5 of WO 2020 / 162371.

[0212]

[0213] [Synthesis of Compound (23)] AC-2000 (1.8 g), compound (22) (1.0 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3%, 12.9 mg), aniline (2.6 mg), and compound (15) (0.5 g) were stirred at 40°C, and then the low-boiling point components were distilled off under reduced pressure to obtain 1.2 g of compound (23). The structure of compound (23) was confirmed from the following NMR data.

[0214]

[0215] 1 H-NMR (400MHz, CDCl3) δ(ppm):3.79-3.18(m,94H),1.61-1.20(m,24H),0.74(t,J=9.0Hz,12H).

[0216] [Production of Articles] Substrates were surface-treated using compound (12), compound (14), compound (16), compound (17), compound (19), compound (21), and compound (23) by the following method to obtain articles of Examples 1 to 7. A dry coating method was used as the surface treatment method. 30 g of silicon oxide was placed as a deposition source in a copper hearth in a vacuum deposition apparatus (VTR-350M manufactured by ULVAC Kiko Co., Ltd.). A glass substrate was placed in the vacuum deposition apparatus, and the interior of the vacuum deposition apparatus was heated to 5 × 10 －３ The hearth was then evacuated to a pressure of 10 Pa or less. The hearth was heated to approximately 2,000°C, and silicon oxide was vacuum-deposited on the surface of the substrate, producing a substrate with a silicon oxide layer having a thickness of approximately 20 nm. Next, 0.5 g of each compound was loaded into a molybdenum boat in a vacuum deposition apparatus (ULVAC, VTR350M), and the interior of the vacuum deposition apparatus was heated to 1 x 10 －３ ​The chamber was evacuated to a pressure of 10 Pa or less. The boat on which the compound was placed was heated at a temperature increase rate of 10°C / min or less, and when the deposition rate measured by a quartz crystal oscillator film thickness meter exceeded 1 nm / sec, the shutter was opened to start film formation on the surface of the silicon oxide layer side of the substrate. When the film thickness reached approximately 50 nm, the shutter was closed to terminate film formation on the surface of the substrate. The substrate on which the compound had been deposited was heat-treated at 200°C for 30 minutes and cleaned with AC-2000 (manufactured by AGC), and evaluation samples (articles) of Examples 1 to 4 were obtained in which the substrate, silicon oxide layer, and surface treatment layer were laminated in this order.

[0217] [Evaluation] <Water repellency> Approximately 2 μL of distilled water was dropped onto the surface treatment layer of the article, and the initial water contact angle was measured using a contact angle measuring device (product name "DM-500", manufactured by Kyowa Interface Science Co., Ltd.). The average value measured at five points on the surface treatment layer was taken as the water contact angle. The water repellency of the surface treatment layer was evaluated based on the following criteria. The 2θ method was used to calculate the water contact angle. The results are shown in Table 1. A: Initial water contact angle of 110° or more C: Initial water contact angle of less than 110°

[0218] <Abrasion Resistance (Steel Wool)> For the surface treatment layer, a reciprocating traverse tester (manufactured by KNT Corporation) was used in accordance with JIS L0849:2013 (ISO 105-X12:2001) to measure the water contact angle after steel wool Bonstar (#0000) was reciprocated 10,000 times at a pressure of 98.07 kPa and a speed of 320 cm / min. The method for measuring the water contact angle after friction was the same as the method for measuring the initial water contact angle in the evaluation method for water repellency. The smaller the decrease in water repellency (water contact angle) after friction, the smaller the decrease in performance due to friction, and the more excellent the abrasion resistance. The evaluation criteria are as follows. The results are shown in Table 1. Decrease in water contact angle = (initial water contact angle) - (water contact angle after friction) A: Decrease in water contact angle after 100,000 reciprocating cycles is 10° or less C: Decrease in water contact angle after 100,000 reciprocating cycles is more than 10°

[0219] <Fingerprint Removability> A 1 kg weight equipped with a 2 cm diameter red rubber stopper to serve as the fingerprint stamp was prepared. Next, 70 μL of artificial fingerprint liquid (manufactured by Isekyu Co., Ltd.) was dropped onto a waste cloth, and the fingerprint stamp was left to adhere to the artificial fingerprint liquid for 1 minute. To remove excess artificial fingerprint liquid from the fingerprint stamp, the fingerprint stamp was left to adhere to a new waste cloth for 20 seconds. The article with the surface treatment layer formed was then placed on a hot plate adjusted to 23°C. The fingerprint stamp was stamped against the surface treatment layer. The article with the artificial fingerprint liquid attached was placed on a sliding device (product name "HHS-2000", manufactured by Shinto Scientific Co., Ltd.). A wiping cloth (Savina Minimax, manufactured by KB Seiren Co., Ltd.) was attached to a flat indenter with an area of ​​1 cm square using double-sided tape, and the article was then placed on the sliding device. The artificial fingerprint liquid attached to the surface treatment layer was wiped off in one direction with the wiping cloth under a load of 100 g. The haze of the wiped area was measured using a haze meter (product name "NDH7000SP", manufactured by Nippon Denshoku Co., Ltd.). The evaluation criteria were as follows. The results are shown in Table 1. A: Haze value less than 0.1% B: Haze value 0.1% or more but less than 1% C: Haze value 1% or more

[0220] <Lightfastness> The surface treatment layer was subjected to a light fastness test using a desktop xenon arc lamp accelerated light fastness tester (SUNTEST XLS+: product name, manufactured by Toyo Seiki Seisakusho) at a black panel temperature of 63°C and a light intensity of 650 W / m ２ , 300 to 700 nm) for 500 hours, and then the water contact angle of the surface treatment layer was measured using the method described above. The smaller the decrease in water contact angle after the accelerated light resistance test, the smaller the decrease in performance due to light, and the more excellent the light resistance of the surface treatment layer. The evaluation criteria are as follows. The results are shown in Table 1. Decrease in water contact angle = (initial water contact angle) - (water contact angle after accelerated light resistance test) A: Decrease in water contact angle after accelerated light resistance test is 3° or less B: Decrease in water contact angle after accelerated light resistance test is more than 3° and 5° or less C: Decrease in water contact angle after accelerated light resistance test is more than 5°

[0221]

[0222] As shown in Table 1, it was confirmed that the compounds of Examples 3 to 7, which have a group P, can form a surface treatment layer having excellent abrasion resistance, compared to the compounds of Examples 1 and 2, which have similar structures but do not have a group P. It was also confirmed that the compounds of Examples 3 to 7 can form a surface treatment layer having excellent light resistance, compared to the compounds of Examples 1 and 2.

[0223] The compounds of the present disclosure are useful as surface treatment agents. The surface treatment agents can be used, for example, for display devices such as touch panel displays, optical elements, semiconductor elements, building materials, automotive parts, and substrates used in nanoimprint technology. The surface treatment agents can also be used for the bodies, window glass (windshields, side glass, rear glass), mirrors, bumpers, and the like of transportation equipment such as trains, automobiles, ships, and aircraft. Furthermore, the surface treatment agents can be used for outdoor items such as building exterior walls, tents, solar power generation modules, soundproofing panels, and concrete; fishing nets, insect nets, and aquariums. The surface treatment agents can also be used for various indoor facilities such as kitchens, bathrooms, sinks, mirrors, and toilet peripherals; ceramics such as chandeliers and tiles; artificial marble, and air conditioners. The surface treatment agents can also be used for antifouling treatment of jigs, interior walls, piping, and the like in factories. The surface treatment agents can also be used for goggles, eyeglasses, helmets, pachinko machines, textiles, umbrellas, playground equipment, and soccer balls. The surface treatment agents can also be used as anti-adhesion agents for various packaging materials such as food packaging, cosmetic packaging, and the inside of pots. The surface treatment agent can also be used for optical components such as car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio equipment, game machines, eyeglass lenses, camera lenses, lens filters, sunglasses, medical devices such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and antireflection films.

[0224] This application claims priority based on Japanese Patent Application No. 2023-166269, filed September 27, 2023, the disclosure of which is incorporated herein in its entirety by reference.

Claims

1. A compound comprising the following group P and a fluoropolyether chain: Group P: -[Si(R １ ) ２ -X] ｎ１ -Si(R １ ) ３ wherein each X is independently an oxygen atom or a carbon atom; １ each independently represents a hydrolyzable group, a group having a hydrolyzable group, a hydroxyl group, or a hydrocarbon group; R １ At least four R １ represents a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and n1 represents an integer of 1 to 3.

2. The compound according to claim 1, wherein n1 is 1.

3. The group P is -[Si(OR ２ ) ２ -O] ｎ１ -Si(OR ２ ) ３ The compound according to claim 1, wherein R ２ are each independently a hydrocarbon group.

4. The group P is -Si(OR ２ ) ２ -O-Si(OR ２ ) ３ The compound according to claim 2, wherein R ２ are each independently a hydrocarbon group.

5. A compound represented by the following formula (1) or formula (2): (R ｆ１ ) ｎ３ -Q １ - (J １ ) ｎ２ ...Formula (1) (J １ ) ｎ２ -Q ２ -R ｆ２ -Q ２ - (J １ ) ｎ２ ...Equation (2) where J １ Each of the groups P is independently the following group P: -[Si(R １ ) ２ -X] ｎ１ -Si(R １ ) ３ Each X is independently an oxygen atom or a carbon atom; １ each independently represents a hydrolyzable group, a group having a hydrolyzable group, a hydroxyl group, or a hydrocarbon group; R １ At least four R １ is a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, n1 is an integer of 1 to 3, R ｆ１ is a monovalent fluoropolyether chain, R ｆ２ is a divalent fluoropolyether chain, Q １ is a (n3+n2)-valent linking group, Q ２ is a (1+n2)-valent linking group, each n2 is independently an integer of 1 or more, and n3 is an integer of 1 or more.

6. The compound according to claim 5, wherein n2 is 1 to 6.

7. The above R ｆ１ The compound according to claim 5, wherein R is represented by the following formula (3): ｆ１１ - (OR ｆ１２ ) ｍ１ - ... Formula (3) where R ｆ１１ is a fluoroalkyl group having 1 to 20 carbon atoms; R ｆ１１ If there are multiple R ｆ１１ may be the same or different, R ｆ１２ is a fluoroalkylene group having 1 to 6 carbon atoms, R ｆ１２ If there are multiple R ｆ１２ may be the same or different, and m1 is an integer of 0 to 500.

8. The above R ｆ２ The compound according to claim 5, wherein R is represented by the following formula (4): ｆ２１ - (OR ｆ２２ ) ｍ２ - ... Formula (4) where R ｆ２１ is a fluoroalkylene group having 1 to 6 carbon atoms; R ｆ２２ is a fluoroalkylene group having 1 to 6 carbon atoms, R ｆ２２ If there are multiple R ｆ２２ may be the same or different, and m2 is an integer of 0 to 500.

9. A composition comprising a compound according to any one of claims 1 to 8 and a liquid medium.

10. A surface treatment agent comprising the compound according to any one of claims 1 to 8.

11. A surface treatment agent comprising the compound according to any one of claims 1 to 8 and a liquid medium.

12. A method for producing an article, comprising: performing a surface treatment on a substrate using a surface treatment agent containing a compound according to any one of claims 1 to 8; and producing an article having a surface treatment layer formed on the substrate.

13. An article comprising a substrate, and a surface treatment layer disposed on the substrate and surface-treated with a surface treatment agent containing the compound according to any one of claims 1 to 8.

14. The article of claim 13 which is an optical component.

15. The article according to claim 13, which is a display or a touch panel.

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