Underfill composition
By integrating a specific epoxy monomer into the epoxy resin system for underfill compositions, the underfill composition achieves enhanced adhesion to copper at high temperatures while maintaining flowability, addressing the challenges of package failure due to cracking.
Patent Information
- Application Number
- PCT/CN2023/139700
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2023-12-19
- Publication Date
- 2025-06-26
AI Technical Summary
Existing underfill compositions for flip chip packages with copper pillar bumps face challenges in achieving high adhesion to copper at high temperatures while maintaining good flowability and avoiding package failure due to cracking.
Incorporating a specific amount of an epoxy monomer of formula (I) into the conventional epoxy resin system, combined with an amine curing agent, non-conductive inorganic filler, coupling agent, and optionally additives, to enhance adhesion to copper at high temperatures without impairing flowability.
The proposed underfill composition achieves excellent adhesion to copper at high temperatures, maintaining good flowability and preventing package failure, as demonstrated by die shear strength tests.
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Figure CN2023139700_26062025_PF_FP_ABST
Abstract
Description
Underfill CompositionTechnical field
[0001] The present invention relates to an underfill composition, especially to an underfill composition suitable for flip chip package using copper pillar bumps.Background of the invention
[0002] Flip chip bonding has been widely used as a semiconductor chip mounting method that provides higher wiring density and higher frequency of electronic devices. With the miniaturization in electronic devices, copper pillar bumps become more commonly used as they offer many advantages over traditional solder joints including smaller pitch, higher I / O density and cost efficient.
[0003] Typically, an underfill material is applied between the chip and substrates to reduce stress in the solder joints and protect the package from environmental damages. The underfill material should have good flowability, high modulus, high Tg, low CTE and good adhesion. A low adhesion to copper joints may cause crack or delamination between underfill and bumps, thus package failure.
[0004] In practice, after reflow soldering, the cracking between the underfill and the copper pillar may lead to chip failure. This cracking phenomenon may be caused by poor heat resistance of the underfill or poor adhesion between the underfill and the copper. Therefore, the adhesion between the underfill and the copper is also particularly important.
[0005] Previous researches have shown that some silane coupling agents can improve adhesion on copper. However, these silanes can only have limited improvement on copper adhesion, and they have poor compatibility with epoxy system. Specifically, in order to improve adhesion to copper bumps at high temperature, JP201037352A proposes to add a silane coupling agent carrying an imidazole structure to the underfill composition, and CN112724899A proposes to add an adhesion promoter, i.e., a compound carrying a triazine structure, to the underfill composition. However, these compounds may shorten storage stability and impair flow ability of the underfill.
[0006] There is a need in practice to improve the adhesion performance of the underfill to copper pillar bumps at high temperature, meanwhile the flow ability of the underfill is not impaired.Summary of the invention
[0007] After intensive study, the inventors of the present invention have found that, by introducing specific amount of a specific epoxy monomer to the conventional epoxy resin system of an underfill composition in combination of an amine curing agent, an improved adhesion to copper at high temperature can be achieved, meanwhile, a good flow ability can be maintained.
[0008] In the first aspect, the present application provides an underfill composition, said underfill composition comprising or consisting of:
[0009] (a) an epoxy component comprising or consisting of:
[0010] (a-1) an epoxy monomer of formula (I) :
[0011] wherein n is 2, 3 or 4; and R is selected from a n-valent benzene group, a n-valent
[0012] naphthalene group and a n-valent anthracene group;
[0013] (a-2) a liquid epoxy resin having at least two glycidoxy groups per molecule;
[0014] (b) an amine curing agent;
[0015] (c) a non-conductive inorganic filler;
[0016] (d) a coupling agent; and
[0017] (e) optionally, an additive;
[0018] wherein
[0019] when R is a n-valent benzene group, the epoxy monomer of formula (I) is comprised in the underfill composition in an amount of less than 10 wt%,
[0020] when R is a n-valent naphthalene group or a n-valent anthracene group, the epoxy monomer of formula (I) is comprised in the underfill composition in an amount of less than 5 wt%,
[0021] each wt%is based on the total weight of the underfill composition.
[0022] In another aspect, the present application provides a flip chip packaged by the underfill composition of the present application.Detailed description of the invention
[0023] It is to be understood by one of ordinary skill in the art that the present discussion is a description of exemplary embodiments only and is not intended as limiting the broader aspects of the present invention. Each aspect so described may be combined with any other aspect (s) unless clearly indicated to the contrary. In particular, any feature indicated as being preferred or advantageous may be combined with any other feature or features indicated as being preferred or advantageous.
[0024] Unless specified otherwise, in the context of the present invention, the terms used are to be construed in accordance with the following definitions.
[0025] Unless specified otherwise, as used herein, the terms “a” , “an” and “the” include both singular and plural referents.
[0026] The terms “comprising” and “comprises” as used herein are synonymous with “including” , “includes” or “containing” , “contains” , and are inclusive or open-ended and do not exclude additional, non-recited members, elements or process steps.
[0027] The term “consisting of” as used herein is close-ended and exclude additional, non-recited intentionally added members, elements or process steps.
[0028] The term “at least one” or “one or more” used herein to define a component refers to the type of the component, and not to the absolute number of molecules.
[0029] The terms “about” , “around” and the like used herein in connection with a numerical value refer to the numerical value ±10%, preferably ±5%. All numerical values herein should be interpreted as being modified by the term “about” .
[0030] Unless specified otherwise, the recitation of numerical end points includes all numbers and fractions subsumed within the respective ranges, as well as the recited end points.
[0031] Unless otherwise defined, all terms used in the present invention, including technical and scientific terms, have the meaning as commonly understood by one of the ordinary skilled in the art to which this invention belongs.
[0032] Hereinafter the underfill composition will be described in detail.
[0033] Component (a) : epoxy component
[0034] The underfill composition of the present application comprises (a) epoxy component as the first necessary ingredient.
[0035] The epoxy component (a) comprises or consists of (a-1) an epoxy monomer of formula (I) and (a-2) a liquid epoxy resin having at least two glycidoxy groups per molecule:
[0036] wherein n is 2, 3 or 4; and R is selected from a n-valent benzene group, a n-valent naphthalene group and a n-valent anthracene group.
[0037] The term “epoxy monomer” used herein has its conventional meaning in the art and refers to an epoxy compound not comprising a repeat unit, and the term “epoxy resin” used herein refers to epoxy oligomers or polymers comprising a repeating unit.
[0038] As for (a-1) an epoxy monomer of formula (I) , preferred examples include those having formula (I-1) :
[0039] wherein R is selected from phenylene, naphthylene and anthrylene.
[0040] The term “phenylene” refers to the group and the asterisk *means the position bonded to the glycidoxy group. That is, the two glycidoxy groups can be bonded to any two carbon atoms on the benzene ring. For example, the epoxy monomer can have the structure of:
[0041] The term “naphthylene” refers to the group and the asterisk *means the position bonded to the glycidoxy group. That is, the two glycidoxy groups can be bonded to any two carbon atoms on the naphthalene ring. For example, the epoxy monomer can have the structure of:
[0042] The term “anthrylene” refers to the group and the asterisk *means the position bonded to the glycidoxy group. That is, the two glycidoxy groups can be bonded to any two carbon atoms on the anthracene ring. For example, the epoxy monomer can have the structure of:
[0043] As for (a-1) an epoxy monomer of formula (I) , usable examples also include those having the following structures:
[0044] Commercially available epoxy monomers suitable for the present invention include, but not limited to, ERISYS RDGE (having the structure of above formula I-11) available from CVC specialities, HP-4032D (having the structure of above formula I-16) available from DIC Corporation, YX-8800 (having the structure of above formula I-18) available from Mitsubishi Chemical.
[0045] In the present invention, it is important to control the amount of the epoxy monomer (a-1) in the underfill composition.
[0046] When R is a n-valent benzene group, the epoxy monomer of formula (I) is comprised in the underfill composition in an amount of less than 10 wt%, such as less than 9.0 wt%, less than 8.0 wt%, less than 7.0 wt%, less than 6.0 wt%, less than 5.0 wt%, less than 4.5 wt%, less than 4.0 wt%, less than 3.5 wt%, less than 3.0 wt%; but preferably more than 0.5 wt%, more than 0.6 wt%, more than 0.7 wt%, more than 0.8 wt%, more than 0.9 wt%, more than 1.0 wt%, more than 1.5 wt%, each based on the total weight of the underfill composition. Preferably, when R is a n-valent benzene group, the epoxy monomer of formula (I) is comprised in the underfill composition in the range of 0.3-9 wt%, 0.4-8.0 wt%, 0.5-5.0 wt%, 0.6-4.5 wt%, 0.8-4.0 wt%, 1.0-3.5 wt%, 1.0-3.0 wt%, each based on the total weight of the underfill composition.
[0047] When R is a n-valent naphthalene group or a n-valent anthracene group, the epoxy monomer of formula (I) is comprised in the underfill composition in an amount of less than 5 wt%, such as less than 4.5 wt%, less than 4.0 wt%, less than 3.5 wt%, less than 3.0 wt%, ; but preferably more than 0.5 wt%, more than 0.6 wt%, more than 0.7 wt%, more than 0.8 wt%, more than 0.9 wt%, more than 1.0 wt%, more than 1.5 wt%, each based on the total weight of the underfill composition. Preferably, when R is a n-valent naphthalene group or a n-valent anthracene group, the epoxy monomer of formula (I) is comprised in the underfill composition in the range of 0.5-4 wt%, 0.7-3.5 wt%, 1.0-3.0 wt%, each based on the total weight of the underfill composition.
[0048] If the amount of the epoxy monomer of formula (I) is higher than the above-mentioned up-limits, a good adhesion to copper at high temperature cannot be achieved.
[0049] As for the liquid epoxy resin (a-2) , any conventional liquid epoxy resins that are suitable for underfill composition can be used herein. As examples, the liquid epoxy resin (a-2) can be one or more epoxy resins selected from bisphenol type epoxy resins such as bisphenol A type epoxy resins and bisphenol F type epoxy resins; novolak type epoxy resins such as phenol novolak type epoxy resins and cresol novolak type epoxy resins; and naphthalene type epoxy resins; biphenyl type epoxy resins; cyclopentadiene type epoxy resins, and mixtures thereof. Among these, bisphenol A type epoxy resins and bisphenol F type epoxy resins are preferable.
[0050] Preferably, the liquid epoxy resin (a-2) may have an Epoxy Equivalent Weight (EEW) of 100-500 g / eq, such as 120 g / eq, 140 g / eq, 160 g / eq, 180 g / eq, 200 g / eq, 220 g / eq, 240 g / eq, 260 g / eq, 280 g / eq, 300 g / eq, 320 g / eq, 340 g / eq, 360 g / eq, 380 g / eq, 400 g / eq, 420 g / eq, 440 g / eq, 460 g / eq, 480 g / eq.
[0051] Preferably, the liquid epoxy resin (a-2) may have a viscosity of from 300 to 8,000 mPa. s, such as 400 to 7,000 mPa. s, 500 to 6,000 mPa. s, for example, 600 mPa. s, 800 mPa. s, 1000 mPa. s, 1200 mPa. s, 1400 mPa. s, 1600 mPa. s, 1800 mPa. s, 2000 mPa. s, 2200 mPa. s, 2500 mPa. s, 2800 mPa. s, 3000 mPa. s, 3500 mPa. s, 4000 mPa. s, 4500 mPa. s, 5000 mPa. s, 5500 mPa. s, 6000 mPa. s, 6500 mPa. s, 7500 mPa. s, each determined by Brookfield HB at 25 ℃ at 5 rpm using spindle CP-51.
[0052] Commercially available epoxy resins suitable for the present invention include, but not limited to, EPICLON EXA-830CRP available from DIC Corporation, EPICLON EXA-850CRP available from DIC Corporation, jERTM 828US available from Mitsubishi Chemical, jERTM 1750 available from Mitsubishi Chemical, EpalloyTM 5200 available from CVC specialities.
[0053] Preferably, the liquid epoxy resin (a-2) can be comprised in the underfill composition in an amount of from 15-30 wt%, such as 17 wt%, 18 wt%, 19 wt%, 20 wt%, 21 wt%, 22 wt%, 23 wt%, 24 wt%, 25 wt%, 26 wt%, 27 wt%, 28 wt%, 29 wt%, or any ranges between two numbers listed above, based on total weight of the underfill composition.
[0054] Component (b) : amine curing agent
[0055] As the second necessary component, the composition of the present application comprises an amine curing agent.
[0056] As for the amine curing agent suitable for the present invention, mentioned include aliphatic amines, polyether amines, cycloaliphatic amines, aromatic amines. From the perspective of the effect of the present invention, aromatic amines are preferred. The amines can be primary amines and secondary amines.
[0057] Specific examples of amine curing agents include, but not limited to, 4, 4'-methylenebis (2, 6- dimethylaniline) , diphenyldiaminosulfone, 4, 4'-diaminodiphenylmethane, 4, 4'-diaminodiphenyl sulfone, 3, 3'-diaminodiphenyl sulfone, m-phenylenediamine, m-xylylenediamine, diethyltoluenediamine, 4, 4'-diamino Diphenyl ether, 3, 3'-dimethyl-4, 4'-diaminobiphenyl, 2, 2'-dimethyl-4, 4'-diaminobiphenyl, 3, 3'-dihydroxy Benzidine, 2, 2-bis (3-amino-4-hydroxyphenyl) propane, 3, 3-dimethyl-5, 5-diethyl-4, 4-diphenylmethanediamine, 2, 2-bis (4-aminophenyl) propane, 2, 2-bis (4- (4-aminophenoxy) phenyl) propane, 1, 3-bis (3-aminophenoxy) benzene, 1, 3-bis (4-aminophenoxy) benzene, 1, 4-bis (4-aminophenoxy) benzene, 4, 4'-bis (4-aminophenoxy) biphenyl, bis (4- (4-aminophenoxy) phenyl) sulfone, bis (4- (3-aminophenoxy) phenyl) sulfone, 4, 4'-Methylenebis (2-ethylaniline) , etc.
[0058] Commercially available amine curing agents include, but not limited to, "KAYABOND C-200S" , "KAYABOND C-100" , "KAYAHARD A-A" , "KAYAHARD A-B" , "KAYAHARD A-S" , "EPIKURE W" manufactured by Mitsubishi Chemical Corporation.
[0059] The amount of the amine curing agent can be adjusted according to the amount of epoxy component (a) , for example, the amine curing agent can be comprised in the underfill composition in an amount of 3-15 wt%, preferably 5-13 wt%, such as 4.0 wt%, 5.5 wt%, 6.0 wt%, 6.5 wt%, 7.0 wt%, 7.5 wt%, 8.0 wt%, 8.5 wt%, 9.0 wt%, 9.5 wt%, 10.0 wt%, 10.5 wt%, 11.0 wt%, 11.5 wt%, 12.0 wt%, 12.5 wt%, 13.0 wt%, 14.0 wt%, or any ranges between two numbers listed above, based on the total weight of the underfill composition.
[0060] In the underfill composition of the present application, it is preferred that an adhesion promoting compound carrying a triazine structure or an imidazole structure (such as a silane coupling agent carrying a triazine structure or an imidazole structure) is not comprised. The term “adhesion promoting compound carrying a triazine structure or an imidazole structure” used herein refers to those compounds capable of improving properties of the surface-to-be-bonded by, for example, coupling with the substrate (s) . However, compounds carrying a triazine structure or an imidazole structure but functioning as the amine curing agent rather than the adhesion promoting agent are not excluded from the present invention. Meanwhile, it is preferred that an acid anhydride curing agent is not comprised. The term “not comprise” used herein means that less than 0.1 wt%, preferably 0 wt%, of the compound / agent is comprised in the underfill composition of the present application, based on the total weight of the underfill composition.
[0061] Component (c) : non-conductive inorganic filler
[0062] As the third necessary component, the underfill composition of the present application comprises a non-conductive inorganic filler. The term “non-conductive” used herein means having no electric conductivity.
[0063] Non-conductive inorganic fillers suitable for the underfill composition of the present application can be those fillers conventionally used in the underfill composition. Specific examples of the filler include, but not limited to, silica, preferably a mixture of silicas having different particle sizes. For example, the filler can be a mixture of silica having a particle size of less than 1 μm and silica having a particle size in the range of 1 μm to 30 μm; or a mixture of silica having a particle size of less than 1 μm, silica having a particle size in the range of 1 μm to 5 μm, and silica having a particle size of more than 5 μm and no more than 30 μm. The particle size mentioned herein is determined by Scanning Electron Microscope (SEM) .
[0064] Commercially available fillers include, but not limited to, Admafine SE 6050, SE 4050. SE 2050, SE 2200, SO-E1, SO-E2, etc. available from Admatechs Co. Ltd; FB-3SDX, FB-310MDX, FB-1MDX, etc. available from Denka Co. Ltd.
[0065] The non-conductive inorganic filler (c) can be comprised in the underfill composition in an amount of 50 to 85 wt%, preferably 60 to 80 wt%, such as 57 wt%, 60 wt%, 62 wt%, 65 wt%, 67 wt%, 70 wt%, 73 wt%, 75 wt%, 77 wt%, 80 wt%, 83 wt%, or any ranges between two numbers listed above, based on total weight of the underfill composition.
[0066] Component (d) : coupling agent
[0067] The coupling agents suitable for the underfill composition of the present application can be those coupling agents conventionally used in the underfill composition. For example, the epoxy group-containing silane coupling agents can be mentioned. Specific examples include, but not limited to, glycidoxypropyltrimethoxysilane, glycidoxypropyltriethoxysilane, epoxycyclohexyl-ethyltrimethoxysilane, glycidoxyethyltrimethoxysilane, glycidoxyethyltriethoxysilane, and mixtures thereof.
[0068] The coupling agent (d) can be comprised in the underfill composition in an amount of 0.01-1.5 wt%, preferably 0.05-1.0 wt%, such as 0.02 wt%, 0.04 wt%, 0.06 wt%, 0.08 wt%, 0.1 wt%, 0.2 wt%, 0.4 wt%, 0.6 wt%, 0.8 wt%, 1.0 wt%, 1.2 wt%, 1.4 wt%, or any ranges between two numbers listed above, based on total weight of the underfill composition.
[0069] Component (e) : additive
[0070] In addition to the above-mentioned components (a) to (d) , the underfill composition of the present application may optionally comprise one or more additives that are conventionally used in the underfill composition, so as to achieve certain properties, as long as the adhesion performance of the underfill is not impaired. For examples, the additives include, but not limited to, colorants, dispersants, antibleeding agents, and flow-promoting agents.
[0071] If present, the additive (e) can be comprised in the underfill composition in an amount of 0.01-3 wt%, preferably 0.1-2 wt%, such as 0.02 wt%, 0.04 wt%, 0.06 wt%, 0.08 wt%, 0.1 wt%, 0.2 wt%, 0.4 wt%, 0.6 wt%, 0.8 wt%, 1.0 wt%, 1.2 wt%, 1.4 wt%, 1.6 wt%, 1.8 wt%, 2.0 wt%, 2.2 wt%, 2.4 wt%, 2.6 wt%, 2.8 wt%, or any ranges between two numbers listed above, each based on total weight of the underfill composition.
[0072] The underfill composition of the present invention is usable and beneficial for packaging a flip chip, especially a flip chip using copper pillar bumps. As for the packaging process, there is no particular limitation, and any conventional packaging processes are suitable for the underfill composition of the present invention. For example, after solder reflow, the underfill composition is dispensed on to a substrate and then it flows into the gap between the die and the substrate via capillary flowing. After the gap is fully covered by the underfill composition, the material will then be cured with a specific cure profile.
[0073] Examples
[0074] The invention will now be described by way of the following examples. The following examples are intended to assist one skilled in the art to better understand and practice the present invention. The scope of the invention is not limited by the examples but is defined in the appended claims.
[0075] All parts and percentages are based on weight unless otherwise stated. In all examples, the same name refers to the same substance.
[0076] Raw materials:
[0077] - EPICLON EXA-830CRP is bisphenol F type liquid epoxy resin, EEW: 155-163 g / eq, viscosity at 25 ℃: 1100-1500 mPa. s, available from DIC corporation.
[0078] - EPICLON EXA-850CRP is bisphenol A type liquid epoxy resin, EEW: 170-175 g / eq, viscosity at 25 ℃: 3500-5500 mPa. s, available from DIC corporation.
[0079] - Epoxy monomer 1 has the structure of:
[0080] - Epoxy monomer 2 has the structure of:
[0081] - Epoxy monomer 3 has the structure of:
[0082] - KAYAHARD A-A is an aromatic amine curing agent, available from Nippon Kayaku.
[0083] - SE 6050 is a silica filler with average particle size of 2μm, available from Admatechs Co. Ltd.
[0084] - SE 2050 is a silica filler with average particle size of 0.5μm, available from Admatechs Co. Ltd.
[0085] - XIAMETER OFS-6040 is a silane coupling agent, glycidoxypropyltrimethoxysilane, available from Dow Chemical.
[0086] - HYPERMER KD-1 is a polyamine dispersant, available from CRODA.
[0087] - MOGUL E is carbon black, available from Cabot.
[0088] - DDSA is a liquid mixture of several isomeric alkenylsuccinic acid anhydrides, available from Milliken Chemicals.
[0089] Test method for Die Shear Strength at High Temperature:
[0090] Die Shear Strength at High Temperature (HTDSS) was measured using DAGE400 at 260℃ with a heater adapter plate capable of reaching 260℃. The compositions were coated onto 3mm x 3mm bare silicon dies and employed to a commercial type of copper lead-frame (CDA151) used in the semiconductor industry. The samples were cured at 5 ℃ / min to 160 ℃ for 2 hour at N2 atmosphere. No pressure was used. Each sample was tested eight times under the same condition and the average die shear strength was calculated and recorded by simplistic average method so as to eliminate error.
[0091] Evaluation criteria for HTDSS:
[0092] - lower than 2.7 kg / die, marked as not good,
[0093] - 2.7-3.0 kg / die, marked as good,
[0094] - more than 3.0 kg / die, marked as excellent.
[0095] Test method for viscosity
[0096] The viscosity of the underfill composition was measured using Brookfield HB at 25℃ at rotating speed of 5 rpm using spindle CP-51.
[0097] Evaluation criteria for viscosity:
[0098] - No more than 80 Pa. s, marked as acceptable,
[0099] - More than 80 Pa. s, marked as unacceptable.
[0100] Preparation method of the underfill composition
[0101] The underfill compositions in the following examples were prepared by the following procedures:
[0102] The epoxy component (a-1) , (a-2) and dispersant (e) (if present) were first mixed at 80 ℃ for 1 hour and then further mixed at 2000r / min for 2minutes at room temperature by using a speed mixer;
[0103] Filler (c) and carbon black (e) (if present) were then added in and mixed using speed mixer at 2000r / min for 2 minutes;
[0104] Amine curing agent (b) and coupling agent (d) were added in and mixed using speed mixer at 1000r / min for 2 minutes.
[0105] The mixture was then milled using a three-roll mill and then degassing with a Thinky mixer at 1000r / min for 2 minutes.
[0106] Examples 1-11 (E1 to E11) and Comparative Examples 1-8 (CE1 to CE8)
[0107] Each underfill composition was formulated according to the preparation method as stated above using the amounts listed in the following Tables 1 and 2, and properties were tested according to the above stated methods, and the results are shown in Tables 1 and 2.
[0108] It can be seen from the above Tables 1 and 2 that when epoxy monomers falling in the range of formula (I) were used, a good or excellent HTDSS can be achieved. Meanwhile, an acceptable viscosity can be maintained. However, when 1, 4-Butanediol-diglycidylether (an epoxy monomer that is conventionally used as a reactive diluent in the underfill composition) was used, a good HTDSS cannot be achieved. Moreover, when an amount of the epoxy monomer of formula (I) higher than the range of the present invention was used, a good HTDSS cannot be achieved. Surprisingly, when the amine curing agent was changed to an acid anhydride curing agent, the desired HTDSS cannot be achieved.
[0109] Although some preferred embodiments have been described, many modifications and variations may be made thereto in light of the above teachings. It is therefore to be understood that the invention may be practiced otherwise than as specifically described without departing from the scope of the appended claims.
Claims
1.An underfill composition, characterized in that said underfill composition comprises:(a) an epoxy component comprising:(a-1) an epoxy monomer of formula (I) :wherein n is 2, 3 or 4; and R is selected from a n-valent benzene group, a n-valent naphthalene group and a n-valent anthracene group;(a-2) a liquid epoxy resin having at least two glycidoxy groups per molecule;(b) an amine curing agent;(c) a non-conductive inorganic filler;(d) a coupling agent; and(e) optionally, an additive;whereinwhen R is a n-valent benzene group, the epoxy monomer of formula (I) is comprised in the underfill composition in an amount of less than 10 wt%,when R is a n-valent naphthalene group or a n-valent anthracene group, the epoxy monomer of formula (I) is comprised in the underfill composition in an amount of less than 5 wt%,each wt%is based on the total weight of the underfill composition.2.The underfill composition according to claim 1, wherein the epoxy monomer (a-1) has the following structure (I-1) : wherein R is selected from phenylene, naphthylene and anthrylene.3.The underfill composition according to claim 1 or 2, wherein the epoxy monomer (a-1) is selected from: 4.The underfill composition according to any one of claims 1 to 3, wherein:when R is a n-valent benzene group, the epoxy monomer of formula (I) is comprised in the underfill composition in an amount of 0.3 to 9.0 wt%, preferably 0.5 to 5.0 wt%, more preferably 0.8 to 4.0 wt%;when R is a n-valent naphthalene group or a n-valent anthracene group, the epoxy monomer of formula (I) is comprised in the underfill composition in an amount of 0.5 to 4.0 wt%, preferably 0.7 to 3.5 wt%, more preferably 1.0 to 3.0 wt%.5.The underfill composition according to any one of claims 1 to 4, wherein the liquid epoxy resin (a-2) is selected from bisphenol A type epoxy resins, bisphenol F type epoxy resins, phenol novolak type epoxy resins, cresol novolak type epoxy resins, naphthalene type epoxy resins, biphenyl type epoxy resins, cyclopentadiene type epoxy resins, and mixtures thereof.6.The underfill composition according to any one of claims 1 to 5, wherein the liquid epoxy resin (a-2) has an Epoxy Equivalent Weight of 100-500 g / eq, such as 120-400 g / eq, and / or the liquid epoxy resin (a-2) has a viscosity of from 300 to 8,000 mPa.s, such as 400 to 6,000 mPa.s, each determined by Brookfield HB at 25 ℃ at 5rpm using spindle CP-51.7.The underfill composition according to any one of claims 1 to 6, wherein the liquid epoxy resin (a-2) is comprised in the underfill composition in an amount of from 15-30 wt%, preferably 17 to 28 wt%, more preferably 18 to 25 wt%, based on total weight of the underfill composition.8.The underfill composition according to any one of claims 1 to 7, wherein the amine curing agent (b) is selected from 4, 4'-methylenebis (2, 6-dimethylaniline) , diphenyldiaminosulfone, 4, 4'-diaminodiphenylmethane, 4, 4'-diaminodiphenyl sulfone, 3, 3'-diaminodiphenyl sulfone, m-phenylenediamine, m-xylylenediamine, diethyltoluenediamine, 4, 4'-diamino Diphenyl ether, 3, 3'-dimethyl-4, 4'-diaminobiphenyl, 2, 2'-dimethyl-4, 4'-diaminobiphenyl, 3, 3'-dihydroxy benzidine, 2, 2-bis (3-amino-4-hydroxyphenyl) propane, 3, 3-dimethyl-5, 5-diethyl-4, 4-diphenylmethanediamine, 2, 2-bis (4-aminophenyl) propane, 2, 2-bis (4- (4-aminophenoxy) phenyl) propane, 1, 3-bis (3-aminophenoxy) benzene, 1, 3-bis (4-aminophenoxy) benzene, 1, 4-bis (4-aminophenoxy) benzene, 4, 4'-bis (4-aminophenoxy) biphenyl, bis (4- (4-aminophenoxy) phenyl) sulfone, bis (4- (3-aminophenoxy) phenyl) sulfone, 4, 4'-Methylenebis (2-ethylaniline) , and mixtures thereof.9.The underfill composition according to any one of claims 1 to 8, wherein the amine curing agent (b) is comprised in the underfill composition in an amount of from 3 to 15 wt%, preferably 5 to 13 wt%, more preferably 6 to 12 wt%, based on total weight of the underfill composition.10.The underfill composition according to any one of claims 1 to 9, wherein the non-conductive inorganic filler (c) is silica, preferably a mixture of silicas having different particle sizes, more preferably a mixture of silica having a particle size of less than 1 μm and silica having a particle size in the range of 1 μm to 30 μm.11.The underfill composition according to any one of claims 1 to 10, wherein the non-conductive inorganic filler (c) is comprised in the underfill composition in an amount of 50-85 wt%, preferably 60 to 80 wt%, based on total weight of the underfill composition.12.The underfill composition according to any one of claims 1 to 11, wherein the coupling agent (d) is selected from glycidoxypropyltrimethoxysilane, glycidoxypropyltriethoxysilane, epoxycyclohexyl-ethyltrimethoxysilane, glycidoxyethyltrimethoxysilane, glycidoxyethyltri-ethoxysilane, and mixtures thereof.13.The underfill composition according to any one of claims 1 to 12, wherein the coupling agent (d) is comprised in an amount of 0.01-1.5 wt%, preferably 0.05-1.0 wt%, based on total weight of the underfill composition.14.The underfill composition according to any one of claims 1 to 13, wherein the additive is selected from colorants, dispersants, antibleeding agents, and flow-promoting agents.15.The composition according to any one of claims 1 to 14, wherein the composition comprises:- 0.3-9.0 wt%, preferably 0.5-5.0 wt%, of the epoxy monomer (a-1) wherein R is a n-valent benzene group, or 0.5 to 4.0 wt%, preferably 0.7 to 3.5 wt%of the epoxy monomer (a-1) wherein R is a n-valent naphthalene group or a n-valent anthracene group,- 15-30 wt%, preferably 17 to 28 wt%, of the liquid epoxy resin (a-2) ,- 3 to 15 wt%, preferably 5 to 13 wt%, of the amine curing agent (b) ,- 50-85 wt%, preferably 60 to 80 wt%, of the non-conductive inorganic filler (c) ,- 0.01-1.5 wt%, preferably 0.05-1.0 wt%, of the coupling agent (d) ,- 0-3 wt%, preferably 0.01-2.0 wt%of the additive (e) ,wherein the weight percentages are all based on total weight of the underfill composition, and add up to 100%.16.A flip chip packaged by the underfill composition according to any one of claims 1 to 15.17.Use of the underfill composition according to any one of claims 1 to 15 in a semiconductor device for packaging a chip, especially a flip chip using copper pillar bumps, on a substrate.
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