Laser processing apparatus, control method and system thereof and readable medium

Abstract

A laser processing apparatus (201), a control method and system (101) thereof, and a readable medium. The control method comprises: acquiring first position information of a plurality of alignment patterns (2013) of a region to be processed on a first region image and actual position information of the plurality of alignment patterns (2013) (S100); and on the basis of the position mapping relationship between the first position information and the actual position information, correcting said region in the first region image, so as to obtain a second region image, and performing processing on the basis of said region in the second region image (S200).

Description

Laser processing equipment, control method, system and readable medium thereof

[0001] This application claims priority to the Chinese patent application filed with the China Patent Office on March 5, 2024, with application number 202410250121.5 and invention name “Laser processing equipment and its control method, control device and readable medium”, the entire contents of which are incorporated by reference into this application. Technical Field

[0002] The present application relates to the field of laser processing, and in particular to a laser processing device and a control method, system and readable medium thereof. Background Art

[0003] Laser processing relies on the thermal or photochemical reaction between the laser beam and the material to accomplish processes such as laser welding, laser engraving, laser cutting, laser drilling, and micromachining. When laser processing equipment creates fine patterns on an object, it typically requires obtaining the precise location of the target area and then adding the pattern to that location. This operation is known as pattern alignment. Technical issues

[0004] How to provide a laser processing equipment and its control method and control device, aiming to improve the accuracy of positioning. Technical Solutions

[0005] To achieve the above objectives, the present application provides a laser processing equipment control method, the laser processing equipment control method comprising:

[0006] Acquire first position information of a plurality of alignment patterns in the area to be processed on the image of the first area and actual position information of the plurality of alignment patterns;

[0007] According to the position mapping relationship between the first position information and the actual position information, the area to be processed in the first area image is corrected to obtain a second area image, and processing is performed based on the area to be processed in the second area image.

[0008] Optionally, the step of obtaining first position information of a plurality of alignment patterns of the area to be processed on the image of the first area includes:

[0009] Acquire a first area image of a to-be-processed area, wherein the to-be-processed area has a plurality of the alignment patterns;

[0010] Acquiring the pre-positions of the plurality of alignment patterns in the first area image based on a preset alignment model;

[0011] Based on the pre-positions of the plurality of alignment patterns, adding a first preset circumscribed graphic on each alignment pattern;

[0012] An area of ​​interest corresponding to a first preset circumscribed graphic of each alignment pattern is determined to determine first position information corresponding to the area of ​​interest.

[0013] Optionally, determining a region of interest corresponding to a first preset circumscribed graphic of each alignment pattern to determine first position information corresponding to the region of interest includes:

[0014] Acquire a region of interest according to a first preset circumscribed pattern of each alignment pattern;

[0015] Acquiring contour information in the region of interest;

[0016] The first position information is acquired according to the contour information.

[0017] Optionally, the contour information includes a plurality of contours corresponding to the alignment pattern, and a hierarchical relationship between the plurality of contours;

[0018] Acquiring the first position information according to the contour information includes:

[0019] determining an innermost contour according to the contour information;

[0020] A second preset circumscribed graphic is added to the innermost contour, and the center coordinates of the second preset circumscribed graphic are obtained to determine the first position information corresponding to the center coordinates.

[0021] Optionally, obtaining the pre-positions of the plurality of alignment patterns in the first area image includes:

[0022] The pre-positions of the plurality of alignment patterns in the first area image are acquired based on a preset alignment model.

[0023] Optionally, after obtaining the pre-positions of the plurality of alignment patterns in the first area image based on a preset alignment model, the method further includes:

[0024] sorting the first circumscribed graphics of the plurality of alignment patterns according to a preset area rule to select the first circumscribed graphics with the smallest area difference;

[0025] Then, the multiple first circumscribed graphics with the smallest area difference that are screened out are sorted according to a preset orientation, so that adjacent first circumscribed graphics are connected to each other to form a preset graphic constraint, so as to filter the alignment pattern in the first area image identified according to the preset alignment model.

[0026] Optionally, the preset alignment model is generated by:

[0027] Acquire a plurality of first area images including alignment patterns;

[0028] performing mask annotation on the plurality of first region images to generate an annotated alignment pattern data set;

[0029] Online data enhancement technology is applied to the alignment pattern dataset to set the flipping condition of the first area image, the hyperparameter batch and the number of iterations according to a preset ratio, and iterative training is performed to generate the preset alignment model.

[0030] Optionally, the alignment pattern includes a first alignment pattern and a plurality of second alignment patterns, and the first alignment pattern and the second alignment pattern are different pattern styles.

[0031] Optionally, the first alignment pattern is a circular target including a first number of concentric circles, and the second alignment pattern is a circular target including a second number of concentric circles; wherein the first number is not equal to the second number.

[0032] Optionally, before correcting the to-be-processed area in the first region image according to the position mapping relationship between the first position information and the actual position information to obtain the second region image, and processing according to the to-be-processed area in the second region image, the method further includes:

[0033] The first area image including the plurality of alignment patterns is rotated so that the direction of the first area image is consistent with a first preset direction.

[0034] Optionally, the correcting the to-be-processed area in the first area image according to the position mapping relationship between the first position information and the actual position information to obtain the second area image includes:

[0035] The plurality of alignment patterns are perspective-transformed according to the plurality of first position information and the plurality of actual position information to obtain a second area image.

[0036] In addition, to achieve the above-mentioned purpose, the present application further provides a laser processing system, comprising: a memory, a processor, and a laser processing equipment control program stored in the memory and executable on the processor, wherein the laser processing equipment control program is configured to implement:

[0037] Acquire first position information of a plurality of alignment patterns in the area to be processed on the image of the first area and actual position information of the plurality of alignment patterns;

[0038] According to the position mapping relationship between the first position information and the actual position information, the area to be processed in the first area image is corrected to obtain a second area image, and processing is performed based on the area to be processed in the second area image.

[0039] Optionally, the laser processing equipment control program is configured to further implement:

[0040] Acquire a first area image of a to-be-processed area, wherein the to-be-processed area has a plurality of the alignment patterns;

[0041] Acquiring the pre-positions of the plurality of alignment patterns in the first area image;

[0042] Based on the pre-positions of the plurality of alignment patterns, adding a first preset circumscribed graphic on each alignment pattern;

[0043] An area of ​​interest corresponding to a first preset circumscribed graphic of each alignment pattern is determined to determine first position information corresponding to the area of ​​interest.

[0044] Optionally, the laser processing equipment control program is configured to further implement:

[0045] The pre-positions of the plurality of alignment patterns in the first area image are acquired based on a preset alignment model.

[0046] Optionally, the laser processing equipment control program is configured to further implement:

[0047] sorting the first circumscribed graphics of the plurality of alignment patterns according to a preset area rule to select the first circumscribed graphics with the smallest area difference;

[0048] Then, the multiple first circumscribed graphics with the smallest area difference that are screened out are sorted according to a preset orientation, so that adjacent first circumscribed graphics are connected to each other to form a preset graphic constraint, so as to filter the alignment pattern in the first area image identified according to the preset alignment model.

[0049] Optionally, the alignment pattern includes a first alignment pattern and a plurality of second alignment patterns, and the first alignment pattern and the second alignment pattern are different pattern styles.

[0050] Optionally, before correcting the to-be-processed area in the first area image based on the position mapping relationship between the first position information and the actual position information to obtain a second area image, and performing processing according to the to-be-processed area in the second area image, the laser processing equipment control program is configured to further implement:

[0051] The first area image including the plurality of alignment patterns is rotated so that the direction of the first area image is consistent with a first preset direction.

[0052] Optionally, the laser processing equipment control program is configured to further implement:

[0053] The plurality of alignment patterns are perspective-transformed according to the plurality of first position information and the plurality of actual position information to obtain a second area image.

[0054] In addition, to achieve the above-mentioned purpose, the present application further provides a laser processing device, the laser processing device comprising: a workbench having an area to be processed;

[0055] a processing head, the processing head being slidably disposed on the workbench, and the processing head being used to process the workpiece on the area to be processed;

[0056] A plurality of alignment patterns, wherein the plurality of alignment patterns are arranged at edge positions of the area to be processed, and lines connecting any two of the plurality of alignment patterns form a closed area;

[0057] A camera device is provided on the workbench, and is used to capture a first area image of the area to be processed and obtain first position information of a plurality of alignment patterns on the first area image;

[0058] an alignment device, the alignment device being mounted on the processing head and being used to obtain actual position information of a plurality of alignment patterns as the processing head moves; and

[0059] A control device is used to correct the area to be processed in the first area image according to the position mapping relationship between the first position information and the actual position information to obtain a second area image; the control device is also used to control the processing head to process the workpiece based on the area to be processed in the second area image.

[0060] In addition, to achieve the above-mentioned purpose, the present application also provides a computer-readable medium on which a computer program is stored. When the computer program is executed by a processor, the control method of the laser processing equipment as described above is implemented. Beneficial effects

[0061] In the present application scheme, the first position information of multiple alignment patterns in the area to be processed on the first area image and the actual position information of multiple alignment patterns are first obtained, that is, the position information of multiple alignment patterns in the area to be processed on the image and the position coordinates in the actual laser processing equipment, and then according to the position mapping relationship between the first position information and the actual position information, the positions of the alignment patterns in the first area image and the actual alignment patterns are mapped to each other, so as to judge the deviation of the area to be processed in the first area image, so as to correct the area to be processed and obtain the corrected image, which is also the second area image. In this way, the second area image can clearly reflect the precise position of the target to be processed in the area to be processed, so as to improve the accuracy of pattern alignment, thereby reducing the inaccuracy caused by human factors and effectively improving the laser processing accuracy. BRIEF DESCRIPTION OF THE DRAWINGS

[0062] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, without paying any creative labor, obtaining other drawings based on these drawings is also within the scope of protection of the present application.

[0063] FIG1 is a flow chart of a method for controlling laser processing equipment according to an embodiment of the present application;

[0064] FIG2 is a schematic flow chart of a laser processing equipment control method according to another embodiment of the present application;

[0065] FIG3 is a flow chart of a laser processing equipment control method according to another embodiment of the present application;

[0066] FIG4 is a flow chart of a laser processing equipment control method according to another embodiment of the present application;

[0067] FIG5 is a flow chart of a method for controlling laser processing equipment according to another embodiment of the present application;

[0068] FIG6 is a flow chart of a method for controlling laser processing equipment according to another embodiment of the present application;

[0069] FIG7 is a flow chart of a laser processing equipment control method according to another embodiment of the present application;

[0070] FIG8 is a flow chart of a method for controlling laser processing equipment according to another embodiment of the present application;

[0071] FIG9 is a flow chart of a method for controlling laser processing equipment according to another embodiment of the present application;

[0072] FIG10 is a schematic diagram of a first alignment pattern according to an embodiment of the present application;

[0073] FIG11 is a schematic diagram of a second alignment pattern according to an embodiment of the present application;

[0074] FIG12 is a schematic diagram of a first alignment pattern according to another embodiment of the present application;

[0075] FIG13 is a schematic diagram of a second alignment pattern according to another embodiment of the present application;

[0076] FIG14 is a schematic diagram of a first region image according to an embodiment of the present application;

[0077] FIG15 is a schematic diagram of a second region image according to an embodiment of the present application;

[0078] FIG16 is a schematic diagram of a laser processing system according to an embodiment of the present application;

[0079] FIG17 is a schematic diagram of a laser processing device according to an embodiment of the present application.

[0080] The realization of the objectives, functional features and advantages of this application will be further explained in conjunction with embodiments and with reference to the accompanying drawings.

[0081] Implementation Methods of the Application

[0082] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with Figures 1 to 17 in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments, and well-known modules, units and their connections, links, communications or operations are not shown or described in detail. In addition, the described features, architectures or functions can be combined in any way in one or more embodiments. It should be understood by those skilled in the art that the various embodiments described below are only for illustration and are not intended to limit the scope of protection of this application. It can also be easily understood that the modules or units or processing methods in each embodiment described herein and shown in the drawings can be combined and designed according to various different configurations. Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of this application.

[0083] The limitations of various nouns or methods referred to in the following embodiments, except for those that are logically untenable, are generally based on the broad concepts that can be implemented under the premise of the disclosure in the embodiments. Under such an understanding, the various specific subordinate specific limitations of the nouns or methods should be regarded as the invention content of this application, and should not be understood narrowly or interpreted in a biased manner on the grounds that the specification does not disclose the specific limitations. Similarly, under the premise that it can be logically implemented, the order of the steps in the method is flexible and changeable, and the specific subordinate specific limitations in the broad concepts of various nouns or methods all fall within the scope of protection of this application.

[0084] Laser processing is a process that uses the thermal or photochemical reaction between the laser beam and the material to perform processes such as laser welding, laser engraving, laser cutting, laser drilling, and micromachining. When laser processing equipment creates fine patterns on an object, it typically requires accurate positioning of the object and then adding the pattern to that location. This process is known as alignment. Existing techniques typically use visual algorithms for alignment, but this method suffers from low accuracy.

[0085] To solve the above problems, the present application proposes a laser processing equipment control method. Referring to FIG1 , in one embodiment of the present application, the laser processing equipment control method includes steps S100-S200, wherein:

[0086] S100, obtaining first position information of a plurality of alignment patterns in an area to be processed on an image of a first area and actual position information of the plurality of alignment patterns;

[0087] S200 , correcting the area to be processed in the first area image according to a position mapping relationship between the plurality of first position information and the actual position information to obtain a second area image, and performing processing based on the area to be processed in the second area image.

[0088] It is understood that the laser processing equipment includes a laser processing head and a workbench, and the laser processing head can emit laser light and process the workpiece to be processed on the workbench. In this embodiment, the area to be processed is included in the area where the workbench is located, which can be a partial area or the entire area of ​​the workbench. The workpiece to be processed can be any material that requires laser processing, such as stone, wood, or metal. The shape of the workpiece to be processed can be a flat surface, a curved surface, or an irregular shape. The specific material and shape of the workpiece to be processed are not limited here. The alignment pattern can be a geometric shape or an irregular shape such as a circle, a triangle, or a rectangle. Multiple alignment patterns can be set at different positions in the area to be processed by the user by pasting, spraying, or other methods. Optionally, the alignment pattern is generally set at the edge of the area to be processed, and adjacent alignment patterns are connected to each other to form a closed area, generally a matrix, a triangle, an irregular quadrilateral, or other polygon. The first position information is the center coordinates of the alignment pattern in the area to be processed in a photo taken by a camera device, such as a mobile phone or an industrial camera, and the center coordinates include multiple alignment patterns.

[0089] It is understandable that the laser processing equipment includes a laser processing head, an alignment device and a workbench. The laser processing head can emit laser and process the consumables on the area to be processed. The alignment device is installed on the laser processing head so that it can move with the movement of the laser processing head. The alignment device is used to project a light spot for alignment. The shape of the light spot can be a cross-shaped light spot, a circular light spot, etc. Here, the alignment light spot is a cross-shaped light spot as an example for explanation. The alignment device is controlled to project the light spot, and then the laser processing head is controlled to move so that the intersection center point of the cross-shaped light spot projected by the alignment device coincides with the center point of the alignment pattern of the area to be processed. At this time, a command to record coordinates is sent to the laser processing equipment, so that the laser processing equipment can record the actual position information of the corresponding alignment pattern. The laser processing equipment is controlled to record the actual position information of the remaining alignment patterns in the same way until the actual position information of all alignment patterns is recorded.

[0090] In laser processing equipment, users can set up a shooting device, such as a mobile phone camera, an industrial camera or a machine camera, to shoot the first area image of the area to be processed. Among them, since the shooting angle of the camera is a conical angle, during the shooting process, there will often be an unbalanced stretching problem at the edge position, just like someone is pulling the edge position of the area to be processed with force. This will easily lead to the problem that the first position information of multiple alignment patterns in the area to be processed on the first area image will be deviated. Therefore, it is necessary to compare the coordinates of the alignment patterns in the actual position, that is, the actual position information, and use the mapping relationship between the two to correct the first area image. Please refer to Figures 14 and 15. After the first area image generally comes out through the shooting device, the alignment patterns in the four corners have certain deviations. Angular deviation, a problem that exists even when the camera is placed directly above the area to be processed, is a problem. Therefore, the actual position information of multiple alignment patterns can be used. This actual position information can be located by a laser positioning device or other positioning device on the laser processing equipment and input into the control device for one-to-one mapping. For example, the lower right corner of Figure 14 is a solid circular target or two concentric circular targets. The corresponding alignment pattern in the actual position information is also a solid circular target or two concentric circular targets. The other three positions are four concentric circular targets or three concentric circular targets. By using circular targets for alignment mapping, the image of the area to be processed can be corrected, thereby ensuring the accuracy of laser processing. In the image of the first area shown in Figure 14, each alignment pattern appears in the form of a different concentric circular target. The precise position information of these targets in reality is captured by the laser processing equipment and matched with the position information in the image. This one-to-one mapping relationship allows accurate calculation of image distortion. Through perspective transformation, flipping, and stretching, a second region image (as shown in Figure 15) is generated, accurately correcting the position of the area to be processed. This process significantly reduces positioning inaccuracies caused by factors such as viewing angle, equipment errors, and human error, ensuring stable alignment in a variety of complex environments.

[0091] Optionally, in one embodiment of the present embodiment, the alignment pattern includes a first alignment pattern and a plurality of second alignment patterns. The first alignment pattern can be a geometric figure such as a circle, triangle, rectangle, or an irregular shape, and the second alignment pattern can also be a geometric figure such as a circle, triangle, rectangle, or an irregular shape, but at least one of the shape and size of the second alignment pattern must be different from the first alignment pattern. Among them, the first alignment pattern and the second alignment pattern can both be circles, the first alignment pattern is a solid circle, a single layer of concentric circles, or multiple layers of concentric circles, and the second alignment pattern is a solid circle, a single layer of concentric circles, or multiple layers of concentric circles; the first alignment pattern and the second alignment pattern are different pattern styles. Among them, as shown in Figure 12, a single layer of concentric circles refers to a solid circle with a ring on the outer ring (i.e., Figure 12 is a circular target with two concentric circles), and as shown in Figures 11 and 13, a combination of a central solid circle and multiple rings is a multi-layer concentric circle (i.e., Figure 11 is a circular target with three concentric circles, and Figure 13 is a circular target with four concentric circles). In this way, by arranging the first alignment pattern and multiple second patterns in the area to be processed in a preset direction, order or graphic, the first area image obtained by shooting, which includes the first alignment pattern and the second alignment pattern, can not only provide position information but also provide direction information, thereby facilitating the recognition of the first area image and enhancing the robustness and accuracy of pattern alignment.

[0092] Optionally, referring to Figures 10 to 13, in another implementation of this embodiment, the first alignment pattern is a circular target including a first number of concentric circles, and the second alignment pattern is a circular target including a second number of concentric circles; wherein the first number and the second number are not equal. Optionally, the first alignment pattern can be a circular target including one concentric circle, or a circular target including two, three, four, or other numbers of concentric circles; the second alignment pattern can also include one, two, three, four, or other numbers of circular targets. The first alignment pattern and the second alignment pattern are circular targets, and the specific number of concentric circles they each include is not limited here, as long as the number of concentric circles they include is unequal.

[0093] In this embodiment, the first alignment pattern and the second alignment pattern include circular targets with different numbers of concentric circles, so that the first alignment pattern and multiple second patterns are arranged in the area to be processed in a preset direction, sequence or graphic. The first area image including the first alignment pattern and the second alignment pattern captured by the camera device can not only provide position information and direction information, which is helpful for the recognition of the first area image, but also optimize the corresponding image recognition algorithm, which is helpful for quickly and accurately obtaining the first position information of the alignment pattern.

[0094] This embodiment obtains the first position information of multiple alignment patterns in the area to be processed on the first area image and the actual position information of multiple alignment patterns, that is, the position information of multiple alignment patterns in the area to be processed on the image and the position coordinates in the actual laser processing equipment, and then maps the positions of the alignment patterns in the first area image and the actual alignment patterns according to the position mapping relationship between the first position information and the actual position information, so as to judge the deviation of the area to be processed in the first area image, thereby correcting the area to be processed and obtaining the corrected image, which is also the second area image. In this way, the second area image can clearly reflect the precise position of the target to be processed in the area to be processed, so as to improve the accuracy of pattern alignment, thereby reducing the inaccuracy caused by human factors and effectively improving the laser processing accuracy.

[0095] Optionally, referring to FIG2 , in another embodiment of the present application, based on the embodiment shown in FIG1 , obtaining first position information of a plurality of alignment patterns of the area to be processed on the image of the first area includes steps S110 to S140 , wherein:

[0096] S110, acquiring a first area image of an area to be processed, where the area to be processed has a plurality of alignment patterns;

[0097] S120, obtaining the pre-positions of a plurality of alignment patterns in the first area image;

[0098] S130, adding a first preset circumscribed graphic to each alignment pattern based on the pre-positions of the plurality of alignment patterns;

[0099] S140 : Determine a region of interest corresponding to a first preset circumscribed graphic of each alignment pattern to determine first position information corresponding to the region of interest.

[0100] Optionally, referring to Figure 15, the first area image includes a first alignment pattern and a second alignment pattern; wherein the first alignment pattern is a circular target including two concentric circles, and the second alignment pattern is a circular target including four concentric circles, and the first alignment pattern is set to one, and the second alignment pattern is set to three, and the first alignment pattern and the second alignment pattern are set in a rectangular shape as a whole.

[0101] In this embodiment, the first region image can be captured by a mobile device with a camera function (such as a mobile phone, smartwatch, iPad, or industrial camera), or by a camera built into the laser processing equipment. After the first region image is captured, it can be processed directly on the mobile device or transmitted to a computer or cloud server via the mobile device for processing by the computer or cloud server.

[0102] In this embodiment, a registration model can be deployed to identify the registration patterns in the first region image using the registration model to obtain the pre-positions of multiple registration patterns in the first region image. Alternatively, the first region image can be processed using an image processing algorithm to identify the approximate positions of the registration patterns as pre-positions. In this embodiment, the first and second registration patterns are circular targets comprising different numbers of concentric circles. Through the above steps, the approximate positions of the center coordinates of the circular targets in the first and second registration patterns can be well identified, i.e., the pre-positions of multiple registration patterns, which also constitutes a coarse positioning process for the multiple registration patterns.

[0103] In this embodiment, after the pre-position is determined, a first preset circumscribed graphic is added to each alignment pattern. This first circumscribed graphic can be a circumscribed circle, rectangle, triangle, or other graphic that differs from the alignment pattern. The first circumscribed graphic can mark the alignment pattern's border, making it easier to identify, track, or measure the alignment pattern. Furthermore, processing the first circumscribed graphic helps reduce the amount of data processed, thereby improving algorithm efficiency. Optionally, the first and second alignment patterns in this embodiment utilize circular targets with different numbers of concentric circles. Therefore, the first circumscribed graphic definition is added to each alignment pattern using a corresponding circumscribed rectangle.

[0104] In this embodiment, the alignment patterns within each alignment pattern are cropped according to the first preset circumscribed pattern, so as to obtain the region of interest.

[0105] It is understood that in the field of image processing, a region of interest (ROI) is a region selected from an image that serves as the focus of image analysis. This region is then delineated for further processing. Using the ROI to delineate a target can reduce processing time and increase accuracy. In this embodiment, the alignment pattern is delineated using a first preset external graphic, so that the ROI selects an area within the first preset external graphic for image analysis.

[0106] In this embodiment, during the processing of the region of interest, the Otsu adaptive threshold algorithm (i.e., the maximum inter-class variance method) can be used to automatically select the optimal threshold value, binarize the region of interest, and convert the region of interest into a binary image to better identify the contour information of the alignment pattern. A morphological closing operation can also be performed first to connect the component parts of the object and fill the object's holes, and then a morphological opening operation can be performed to open up the object's areas, separate the object, and maintain the general shape. Through morphological closing and morphological opening operations, holes in the contour can be filled and small noise can be removed, making the contour smoother and more accurate, thereby obtaining more accurate first position information.

[0107] It should be understood that the contour information includes multiple contours corresponding to the alignment pattern, as well as the hierarchical relationship between the multiple contours. Among them, the contour information in the region of interest is obtained by using the findContours method (a function for detecting contours in a binary image) based on OpenCV (Open Source Computer Vision Library, an open source computer vision and machine learning software library) to obtain the hierarchical relationship between the multiple contours. And when the selected alignment pattern is a circular target including two concentric circles, the contour information is the two concentric circles in the alignment pattern and the inclusion relationship between the above two concentric circles.

[0108] Optionally, referring to FIG4 , in yet another embodiment of the present application, based on the embodiment shown in FIG2 , determining a region of interest corresponding to the first preset circumscribed graphic of each alignment pattern to determine first position information corresponding to the region of interest includes steps S141-S143, wherein:

[0109] S141, obtaining a region of interest according to a first preset circumscribed pattern of each alignment pattern;

[0110] S142, obtaining contour information in the region of interest;

[0111] S143. Obtain first position information according to the contour information.

[0112] In this embodiment, the alignment pattern is circled by using the first preset circumscribed pattern, so that the region of interest (ROI) selects the region of the alignment pattern from the first preset circumscribed pattern for image analysis.

[0113] In this embodiment, the contour information in the area of ​​interest can be obtained based on the findContours method of OpenCV. The contour information includes multiple contours corresponding to the alignment pattern. When the selected alignment pattern is a circular target including two concentric circles, the contour information is the two concentric circles in the alignment pattern, and the center coordinate position of the contour information is obtained based on the contour information. The coordinate position can be used as the first position information.

[0114] In addition, the region of interest can also be subjected to image enhancement processing, conversion to grayscale image, and Gaussian filtering. Through the above processing, the quality of the region of interest can be improved, noise and interference can be reduced, and the contour information of the alignment pattern can be identified more accurately.

[0115] In addition, the acquired contours can be screened to improve the accuracy of identifying the alignment pattern. The screening process can be to exclude contours with a circularity less than 0.8, exclude contours with an area less than 0.2 times the area of ​​the region of interest, and exclude contours whose area to the area of ​​the contour's circumscribed rectangle does not satisfy contour_area / contour_bun_area>(π / 4)+0.1, where contour_area is the area of ​​the contour and contour_bun_area is the area of ​​the contour's circumscribed rectangle.

[0116] Based on the contours corresponding to the aforementioned alignment patterns and the hierarchical relationship between the contours, with reference to FIG5 , in another embodiment of the present application, based on the embodiment shown in FIG4 , obtaining the first position information according to the contour information includes steps S1431-S1432, wherein:

[0117] S1431, determining the innermost contour according to the contour information;

[0118] S1432: Add a second preset circumscribed graphic to the innermost contour, and obtain the center coordinates of the second preset circumscribed graphic to determine first position information corresponding to the center coordinates.

[0119] In this embodiment, when the selected alignment pattern is a circular target including two concentric circles, the contour information is the two concentric circles in the alignment pattern and the inclusion relationship between the two concentric circles. Therefore, the smaller circle is selected as the innermost contour.

[0120] In this embodiment, the second preset circumscribed image can be a circumscribed circle, rectangle, triangle, or other figure that differs from the alignment pattern. This second circumscribed image can mark the alignment pattern's border, making it easier to identify, track, or measure it. Furthermore, processing the second preset circumscribed image helps reduce the amount of data processed, thereby improving algorithm efficiency. In this embodiment, since the alignment pattern uses a concentric circle target, the second preset circumscribed image for the innermost contour is a rectangle circumscribing the innermost contour of the concentric circle target.

[0121] In this embodiment, the coordinates of the center of the second preset circumscribed figure are used as the center coordinates of the alignment pattern to obtain the first position. By using the coordinates of the center of the second preset circumscribed figure as the center coordinates of the alignment pattern, the deviation between the center of mass of the innermost contour and the actual center can be effectively reduced, thereby improving alignment accuracy. Similarly, when the selected alignment pattern is a circular target consisting of four concentric circles, a circular target consisting of one concentric circle, or a circular target consisting of any other number of concentric circles, the first position information of the alignment pattern can be obtained using the above scheme.

[0122] It should be understood that the first area image captured by a mobile device with a camera function (such as a mobile phone, smart watch, iPad, etc.) or by the camera of the laser processing equipment itself may contain other patterns in addition to the alignment pattern, which may affect the accuracy of the alignment pattern recognition.

[0123] To solve the above problem, referring to FIG3 , in another embodiment of the present application, based on the embodiment shown in FIG2 , after obtaining the pre-positions of multiple alignment patterns in the first area image based on the preset alignment model, steps S150-S160 are further included, wherein:

[0124] S150, sorting the first circumscribed graphics of the plurality of alignment patterns according to a preset area rule to select the plurality of first circumscribed graphics with the smallest area difference;

[0125] S160 , sorting the multiple first circumscribed graphics with the smallest area difference according to a preset orientation, so that adjacent first circumscribed graphics are connected to each other to form a preset graphic constraint, so as to filter the alignment pattern in the first region image identified according to the preset alignment model.

[0126] In this embodiment, the alignment pattern in the first area image identified according to the preset alignment model is filtered, which can exclude other patterns in the first area image except the alignment pattern, thereby avoiding interference with the recognition of the alignment pattern, thereby improving the accuracy of alignment pattern recognition.

[0127] The first area image includes a first alignment pattern and a second alignment pattern; the first alignment pattern is a circular target including two concentric circles, the second alignment pattern is a circular target including four concentric circles, and the first alignment pattern is set as one, the second alignment pattern is set as three, and the first alignment pattern and the second alignment pattern are arranged in a rectangular shape as a whole. Therefore, first sorting is performed according to the area rule, and then the circumscribed rectangles with an aspect ratio less than the first preset aspect ratio and the circumscribed rectangles with an aspect ratio greater than the second preset aspect ratio are excluded. The specific values ​​of the first preset aspect ratio and the second preset aspect ratio can be flexibly selected by the user. In this embodiment, the value of the first aspect ratio is 0.8 as an example, and the value of the second aspect ratio is 1.2 as an example.

[0128] The circumscribed rectangles are arranged according to their areas to select four circumscribed rectangles with the smallest area difference, and one of the circumscribed rectangles has a circular target including two concentric circles, and the other three circumscribed rectangles have circular targets including four concentric circles.

[0129] After screening according to the area rule, the center coordinates of the circumscribed rectangle of the circular target and the coordinates of the four vertices of the machinable area are obtained respectively. The four vertex coordinates correspond to the coordinates of the upper left end, the upper right end, the lower right end and the lower left end of the area to be processed respectively. According to the sorting requirements of the preset orientation, the center coordinates of the circumscribed rectangle are compared with the coordinates of the four vertices of the machinable area, and they are arranged according to the position of the circumscribed rectangle. The circular targets closest to the upper left end, upper right end, lower right end and lower left end of the area to be processed are selected respectively.

[0130] Then, connect the centers of adjacent circumscribed rectangles to obtain four vectors. Based on the preset graphic constraints, exclude the circumscribed rectangles where the angle between adjacent vectors is less than a first preset angle, and exclude the circumscribed rectangles where the angle between adjacent vectors is greater than a second preset angle. The first preset angle and the second preset angle can be flexibly selected by the user. In this embodiment, the first preset angle is 60 degrees, and the second preset angle is 120 degrees.

[0131] In addition, when the first alignment pattern and / or the second alignment pattern cannot be normally acquired after filtering through the third preset rule, and a circular target consisting of two concentric circles and / or three circular targets consisting of four concentric circles cannot be acquired, the user is reminded to reacquire the first area image.

[0132] Optionally, referring to FIG6 , in another embodiment of the present application, based on the embodiment shown in FIG2 , obtaining the pre-positions of multiple alignment patterns in the first area image includes step S121, which is executed after step S110 and before step S130, wherein:

[0133] S121 : Acquire preliminary positions of a plurality of alignment patterns in a first region image based on a preset alignment model.

[0134] In this embodiment, the preset alignment model can be a Pytorch model (an open source deep learning framework model) that can recognize alignment patterns, obtained by training a plurality of first region images including alignment patterns using a convolutional neural network. The preset alignment model can be pre-saved by the user in the laser processing equipment, or it can be in a remote cloud, where the user calls the preset alignment model to recognize the alignment pattern in the first region image. The preset alignment model can also be temporarily saved on a mobile device, where the user selects the corresponding preset alignment model to process the first region image according to needs. The preset alignment model can be used to identify the pre-positions of the plurality of alignment patterns in the first region image, where the pre-positions are the approximate positions of the alignment patterns in the first region image.

[0135] In this embodiment, an alignment model is deployed to identify alignment patterns in the first region image, thereby obtaining the pre-positions of multiple alignment patterns in the first region image. These steps effectively identify the approximate positions of the center coordinates of the circular targets in the first and second alignment patterns, i.e., the pre-positions of the multiple alignment patterns, thus achieving coarse positioning of the multiple alignment patterns.

[0136] Optionally, referring to FIG7 , in another embodiment of the present application, based on the embodiment shown in FIG6 , a generation method for obtaining the alignment model is preset, including steps S1211 to S1213, wherein:

[0137] S1211, acquiring a plurality of first area images including alignment patterns;

[0138] S1212, performing mask annotation on the plurality of first region images to generate an annotated alignment pattern data set;

[0139] S1213. Apply online data enhancement technology to the alignment pattern dataset to set the flipping condition of the first region image, the hyperparameter batch, and the number of iterations according to a preset ratio, and perform iterative training to generate a preset alignment model.

[0140] In this embodiment, in order to better identify the alignment pattern in the first area image, a preset alignment model is used. The preset alignment model can be one that has been generated and stored in the laser processing equipment, stored in a computer, or stored in a cloud server, and is run in response to user instructions to identify the alignment pattern of the first area image.

[0141] Alternatively, training and generation can be performed in a control device. The generation process first requires obtaining a registration pattern dataset. This registration pattern dataset is obtained by masking a predetermined number of first region images. Masking is a technique for marking specific regions within an image, which helps identify the target object within the image and distinguish it from other parts.

[0142] In this embodiment, the first area image can be captured by a mobile device with a camera function (such as a mobile phone, smart watch, iPad, etc.), or by a camera built into the laser processing equipment. Optionally, the first area image can also be directly imported.

[0143] In this embodiment, the greater the number of first-region images, the more accurate the alignment model obtained through subsequent convolutional neural network training. The user can flexibly set the preset number based on the desired accuracy of the preset alignment model. Furthermore, the higher the resolution of the first-region images, the more accurate the alignment model obtained through subsequent convolutional neural network training. The resolution of the first-region images can also be flexibly selected based on user needs.

[0144] Optionally, in this embodiment, 500 first area images with a resolution of 1600×900 can be obtained by taking pictures with a mobile phone, and then the 500 first area images with a resolution of 1600×900 can be masked and annotated to obtain the alignment pattern dataset, and then the alignment pattern dataset can be divided into a training set, a verification set, and a test set.

[0145] In this embodiment, after obtaining the alignment pattern data set, the data set is trained using a convolutional neural network to obtain a corresponding preset alignment model.

[0146] During the training process, this example sets the training batch size to 16, the number of training iterations to 250, and the confidence level to a hyperparameter of 0.5. The ratio of images flipped upside down and left-right is set to 50%, and the random rotation angle range is set to 0-360 degrees. Iterative training is then performed based on the alignment pattern dataset, i.e., the divided training, validation, and test sets, to obtain the preset alignment model.

[0147] In this embodiment, a convolutional neural network is used for training to obtain a Pytorch model that can recognize alignment patterns. In this embodiment, a variety of convolutional neural network architectures can be used for training, such as YOLOv8 (a target detection model), Faster R-CNN (a faster region-based convolutional neural network model), SSD (single-shot multi-target detector), Mask R-CNN (mask region convolutional neural network model), etc. This embodiment uses YOLOv8 as an example for training, and the training methods of other convolutional neural network architectures are similar. During the training process, by continuously optimizing the model parameters, the model has higher accuracy and stability when recognizing alignment patterns.

[0148] In this embodiment, training a dataset using a convolutional neural network can improve the accuracy and robustness of the alignment model. During training, hyperparameters such as batch size and number of iterations can be adjusted based on actual conditions to achieve better model performance. Furthermore, various optimization algorithms, such as Adam and RMSProp, can be used to accelerate model convergence and improve model accuracy.

[0149] Optionally, referring to FIG8 , in yet another embodiment of the present application, based on any one of the embodiments shown in FIG1 to FIG7 , before correcting the area to be processed in the first area image according to the position mapping relationship between the first position information and the actual position information to obtain the second area image, and performing processing according to the area to be processed in the second area image, after obtaining the first position information of the plurality of alignment patterns of the area to be processed on the first area image and the actual position information of the plurality of alignment patterns, the process further includes step S300, which is executed after step S100 and before step S200, wherein:

[0150] S300: Rotate a first region image including a plurality of alignment patterns so that a direction of the first region image is consistent with a first preset direction.

[0151] Optionally, in this embodiment, the first area image includes a first alignment pattern and a second alignment pattern; wherein the first alignment pattern is a circular target including a solid circle (as shown in FIG10 ), and the second alignment pattern is a circular target including three concentric circles (as shown in FIG11 ), and the first alignment pattern is set to one, and the second alignment pattern is set to three, and the arrangement of the first alignment pattern and the second alignment pattern is generally rectangular.

[0152] Optionally, in this embodiment, the first area image includes a first alignment pattern and a second alignment pattern; wherein the first alignment pattern is a circular target including two concentric circles (as shown in FIG12 ), and the second alignment pattern is a circular target including four concentric circles (as shown in FIG13 ), and the first alignment pattern is provided as one, and the second alignment pattern is provided as three, and the first alignment pattern and the second alignment pattern are arranged in a rectangular arrangement as a whole. Compared with the circular targets in FIG10 and FIG11 , the centers of the circular targets are marked in FIG12 and FIG13 , and the area of ​​the framed center area is smaller, which can make the determination process of the first position more accurate and reliable. Thus, in steps S161 to S162, the center coordinates of the second preset circumscribed figure obtained are more accurate.

[0153] In this embodiment, as shown in Figure 15, the first predetermined direction is the direction of the first region image when the first alignment pattern is at the lower right end. If the direction of the first region image is inconsistent with the first predetermined direction, the first region image can be rotated 90 degrees, 180 degrees, or 270 degrees to align the direction of the first region image with the first predetermined direction. By adjusting the direction of the first region image, the position and direction of the alignment pattern in the image can be ensured to be consistent, thereby improving alignment accuracy and stability.

[0154] In this embodiment, first, the first position information of multiple alignment patterns in the area to be processed is obtained. Then, based on the multiple first position information and the actual position information corresponding to the multiple alignment patterns, a corresponding position mapping relationship is generated or determined. The actual position information is the position of the multiple alignment patterns within the laser processing equipment. Based on this position mapping relationship, the target area on the workpiece to be processed is then determined. This allows the precise position of the target area within the laser processing equipment to be determined, thereby improving the accuracy of pattern alignment. Adding the pattern to be processed to the target area for laser processing can effectively improve laser processing accuracy.

[0155] Optionally, referring to FIG9 , in another embodiment of the present application, based on the embodiment shown in FIG1 , the area to be processed in the first area image is corrected according to the position mapping relationship between the first position information and the actual position information to obtain a second area image, including step S210, wherein:

[0156] S210: Perform perspective transformation based on the plurality of first position information and the plurality of actual position information to obtain a second area image.

[0157] Perspective transformation is a method for converting an image from one view to another based on the geometric relationship between the two views. In this embodiment, perspective transformation is used to transform the representation of the area to be processed in the first region image to its representation in the second region image based on the relationship between the first position information and the actual position information. This transformation enables a more accurate representation of the area to be processed within the coordinate system of the laser processing equipment. This allows the precise position of the alignment pattern within the laser processing equipment to be determined, thereby improving alignment accuracy. Furthermore, the application of perspective transformation eliminates errors caused by shooting angle, significantly improving alignment precision.

[0158] In addition, to achieve the above-mentioned purpose, please refer to Figure 16. In another embodiment of the present application, the present application also provides a laser processing system 101, and the laser processing system 101 includes: a memory 1011, a processor 1012, and a laser processing equipment control program stored on the memory 1011 and executable on the processor 1012. The laser processing equipment control program is configured to implement the laser processing equipment control method of any of the above-mentioned embodiments.

[0159] It can be understood that the control program of the laser processing equipment is configured to achieve: obtaining the first position information of multiple alignment patterns of the area to be processed on the first area image and the actual position information of multiple alignment patterns; correcting the area to be processed in the first area image according to the position mapping relationship between the first position information and the actual position information to obtain the second area image, and performing processing based on the area to be processed in the second area image.

[0160] It can be understood that the laser processing equipment control program is configured to further implement: obtaining a first area image of the area to be processed, the area to be processed having multiple alignment patterns; obtaining the pre-positions of multiple alignment patterns in the first area image; adding a first preset external graphic to each alignment pattern based on the pre-positions of the multiple alignment patterns; determining the area of ​​interest corresponding to the first preset external graphic of each alignment pattern to determine the first position information corresponding to the area of ​​interest.

[0161] It is understandable that the laser processing equipment control program is configured to further implement: obtaining a region of interest based on a first preset external graphic of each alignment pattern; obtaining contour information in the region of interest; and obtaining first position information based on the contour information.

[0162] It is understood that the contour information includes multiple contours corresponding to the alignment pattern, as well as the hierarchical relationship between the multiple contours. The laser processing equipment control program is configured to further implement: determining the innermost contour based on the contour information; adding a second preset circumscribed graphic to the innermost contour; and obtaining the center coordinates of the second preset circumscribed graphic to determine the first position information corresponding to the center coordinates.

[0163] It is understandable that the laser processing equipment control program is configured to further implement: obtaining the pre-positions of multiple alignment patterns in the first area image based on a preset alignment model.

[0164] It can be understood that after obtaining the pre-positions of multiple alignment patterns in the first area image based on the preset alignment model, the laser processing equipment control program is configured to further implement: sorting the first circumscribed graphics of the multiple alignment patterns according to the preset area rule to screen out multiple first circumscribed graphics with the smallest area difference; and then sorting the multiple first circumscribed graphics with the smallest area difference screened out according to the preset orientation so that adjacent first circumscribed graphics are interconnected to form a preset graphic constraint, so as to filter the alignment patterns in the first area image identified according to the preset alignment model.

[0165] It can be understood that the generation method of obtaining the preset alignment model includes: obtaining multiple first area images containing alignment patterns; masking the multiple first area images to generate an annotated alignment pattern data set; applying online data enhancement technology to the alignment pattern data set to set the flipping condition, hyperparameter batch and number of iterations of the first area image according to a preset ratio, and performing iterative training to generate a preset alignment model.

[0166] It can be understood that the alignment pattern includes a first alignment pattern and a plurality of second alignment patterns, and the first alignment pattern and the second alignment pattern are different pattern styles.

[0167] It can be understood that the first alignment pattern is a circular target including a first number of concentric circles, and the second alignment pattern is a circular target including a second number of concentric circles; wherein the first number is not equal to the second number.

[0168] It can be understood that, based on the position mapping relationship between the first position information and the actual position information, the area to be processed in the first area image is corrected to obtain the second area image, and before processing is performed according to the area to be processed in the second area image, the laser processing equipment control program is configured to further implement: rotating the first area image including multiple alignment patterns so that the direction of the first area image is consistent with the first preset direction.

[0169] It is understandable that the laser processing equipment control program is configured to further implement: performing perspective transformation on the plurality of alignment patterns according to the plurality of first position information and the plurality of actual position information to obtain the second area image.

[0170] It is worth noting that since the laser processing system 101 of the present application is based on the above-mentioned laser processing equipment control method, the embodiments of the laser processing system 101 of the present application include all technical solutions of all embodiments of the above-mentioned laser processing equipment control method, and the technical effects achieved are also exactly the same, which will not be repeated here.

[0171] It is understood that the laser processing system 101 may include a laser processing device and a control terminal. The laser processing device may be provided with the control terminal, and the laser processing device may directly run a control program and perform laser processing. Alternatively, the laser processing device may be connected to the control terminal via a communication link, with the control terminal processing and sending control commands to the laser processing device, which then performs laser processing.

[0172] In addition, to achieve the above-mentioned purpose, the present application further provides a laser processing device 201, which includes a workbench 2011, a processing head 2012, a plurality of alignment patterns 2013, a camera device 2014, an alignment device 2015, and a control device 2016, wherein:

[0173] The workbench 2011 has an area to be processed; the processing head 2012 is slidably arranged on the workbench 2011, and the processing head 2012 is used to process the workpiece to be processed in the area to be processed; multiple alignment patterns 2013 are arranged at the edge position of the area to be processed, and the lines connecting the multiple alignment patterns 2013 constitute a closed area; the camera device 2014 is arranged on the workbench 2011, and the camera device 2014 is used to shoot a first area image of the area to be processed and obtain first position information of the multiple alignment patterns 2013 on the first area image; the alignment device 2015 is installed on the processing head 2012, and as the processing head 2012 moves, the alignment device 2015 is used to obtain actual position information of the multiple alignment patterns 2013; the control device 2016 is used to correct the area to be processed in the first area image according to the position mapping relationship between the first position information and the actual position information to obtain a second area image; the control device 2016 is also used to control the processing head 2012 to process the workpiece to be processed based on the area to be processed in the second area image.

[0174] In this embodiment, the processing head 2012 can be a laser processing head, which can emit laser to process the workpiece to be processed on the workbench 2011. In this embodiment, the area to be processed can be a partial area or the entire area of ​​the workbench 2011. The workpiece to be processed can be any material that requires laser processing, such as stone, wood or metal. The shape of the workpiece to be processed can be a plane, a curved geometric shape or an irregular shape, etc. The specific material and shape of the workpiece to be processed are not limited here. The alignment pattern 2013 can be a geometric shape or an irregular shape such as a circle, a triangle, a rectangle, etc., and multiple alignment patterns 2013 can be set at different positions in the area to be processed by the user by pasting, spraying or other methods. Optionally, the alignment pattern 2013 is generally set at the edge of the area to be processed, and adjacent alignment patterns 2013 are connected to each other in pairs to form a closed area, generally a matrix, a triangle or an irregular quadrilateral, or other polygons. The first position information is the center coordinates of the alignment pattern 2013 in the area to be processed in a photo taken by a shooting device, such as a mobile phone or an industrial camera, and the center coordinates include multiple alignment patterns 2013.

[0175] It is understood that the alignment device 2015 is mounted on the laser processing head so that it can move with the movement of the laser processing head. The alignment device 2015 is used to project a light spot for alignment. The light spot can be in the shape of a cross, a circular spot, etc. Here, the alignment light spot is described as a cross-shaped light spot. The alignment device 2015 is controlled to project the light spot, and then the laser processing head is controlled to move so that the intersection center point of the cross-shaped light spot projected by the alignment device 2015 coincides with the center point of the alignment pattern 2013 in the area to be processed. At this time, a command to record coordinates is sent to the laser processing equipment 201, which causes the laser processing equipment 201 to record the actual position information of the corresponding alignment pattern 2013. The laser processing equipment 201 is controlled to record the actual position information of the remaining alignment patterns 2013 using the same method until the actual position information of all alignment patterns 2013 is recorded.

[0176] In the laser processing equipment 201 , the user may install a photographing device, such as a mobile phone camera, an industrial camera, or a machine camera, to photograph an image of a first area of ​​the area to be processed.

[0177] It can be understood that the camera device 2014 is also used to: obtain a first area image of the area to be processed, the area to be processed has multiple alignment patterns 2013; obtain the pre-positions of multiple alignment patterns 2013 in the first area image; based on the pre-positions of multiple alignment patterns 2013, add a first preset external graphic to each alignment pattern 2013; determine the area of ​​interest corresponding to the first preset external graphic of each alignment pattern 2013 to determine the first position information corresponding to the area of ​​interest.

[0178] It is understandable that the camera device 2014 is further used to: obtain the region of interest according to the first preset circumscribed graphics of each alignment pattern 2013; obtain contour information in the region of interest; and obtain first position information according to the contour information.

[0179] It is understood that the contour information includes multiple contours corresponding to the alignment pattern 2013, as well as the hierarchical relationship between the multiple contours. The camera device 2014 is further configured to: determine the innermost contour based on the contour information; add a second preset circumscribed graphic to the innermost contour; and obtain the center coordinates of the second preset circumscribed graphic to determine the first position information corresponding to the center coordinates.

[0180] It is understandable that the camera device 2014 is further configured to obtain the pre-positions of the plurality of alignment patterns 2013 in the first region image based on a preset alignment model.

[0181] It can be understood that after the camera device 2014 obtains the pre-positions of multiple alignment patterns 2013 in the first area image based on the preset alignment model, the camera device 2014 is also used to: sort the first circumscribed graphics of the multiple alignment patterns 2013 according to the preset area rule to screen out multiple first circumscribed graphics with the smallest area difference; then sort the screened out multiple first circumscribed graphics with the smallest area difference according to the preset orientation, so that adjacent first circumscribed graphics are interconnected to form a preset graphic constraint, so as to filter the alignment patterns in the first area image identified according to the preset alignment model.

[0182] It can be understood that the generation method of obtaining the preset alignment model includes: obtaining multiple first area images containing the alignment pattern 2013; masking the multiple first area images to generate a labeled alignment pattern data set; applying online data enhancement technology to the alignment pattern data set to set the flipping condition, hyperparameter batch and number of iterations of the first area image according to a preset ratio, and performing iterative training to generate the preset alignment model.

[0183] It can be understood that the alignment pattern 2013 includes a first alignment pattern and a plurality of second alignment patterns, and the first alignment pattern and the second alignment pattern are different pattern styles.

[0184] It is understood that the first alignment pattern is a circular target including a first number of concentric circles, and the second alignment pattern is a circular target including a second number of concentric circles, wherein the first number is not equal to the second number.

[0185] It can be understood that the control device 2016 corrects the area to be processed in the first area image according to the position mapping relationship between the first position information and the actual position information to obtain the second area image, and before processing according to the area to be processed in the second area image, it is also used to: rotate the first area image including multiple alignment patterns 2013 so that the direction of the first area image is consistent with the first preset direction.

[0186] It is understandable that the control device 2016 is further configured to perform perspective transformation on the plurality of alignment patterns 2013 according to the plurality of first position information and the plurality of actual position information to obtain a second area image.

[0187] It is worth noting that the steps performed by the camera device 2014 and the alignment device 2015 can also be performed by the control device 2016, that is, the control device 2016 can be configured to implement the laser processing equipment control method of any of the aforementioned embodiments. For example, the camera device 2014 is used to capture a first area image of the area to be processed, and the control device 2016 is used to obtain first position information of multiple alignment patterns of the area to be processed on the first area image and actual position information of multiple alignment patterns; based on the position mapping relationship between the first position information and the actual position information, the area to be processed in the first area image is corrected to obtain a second area image, and processing is performed based on the area to be processed in the second area image. In addition, since the laser processing equipment 201 of the present application is based on the above-mentioned laser processing system 101, the embodiments of the laser processing equipment 201 of the present application include all the technical solutions of all the embodiments of the above-mentioned laser processing system 101, and the technical effects achieved are also exactly the same, and other identical contents are not repeated here.

[0188] In addition, to achieve the above-mentioned purpose, the present application also provides a computer-readable medium on which a computer program is stored. When the computer program is executed by the processor 1012, the control method of the laser processing equipment in all the above embodiments is implemented.

[0189] It is worth noting that since the computer-readable medium of the present application is based on the above-mentioned laser processing system 101, the embodiments of the computer-readable medium of the present application include all technical solutions of all embodiments of the above-mentioned laser processing system 101, and the technical effects achieved are also exactly the same, which will not be repeated here.

[0190] It should be noted that, in this document, the terms "comprises," "includes," or any other variations thereof are intended to encompass non-exclusive inclusion, such that a process, method, article, or system comprising a series of elements includes not only those elements but also other elements not explicitly listed, or elements inherent to such process, method, article, or system. In the absence of further limitations, an element defined by the phrase "comprising a ..." does not exclude the presence of other identical elements in the process, method, article, or system comprising the element.

[0191] The serial numbers of the above embodiments of the present application are for description only and do not represent the advantages or disadvantages of the embodiments.

[0192] Through the description of the above implementation methods, those skilled in the art can clearly understand that the above-mentioned embodiment methods can be implemented by means of software plus the necessary general hardware platform, and of course can also be implemented by hardware, but in many cases the former is a better implementation method. Based on this understanding, the technical solution of the present application, or the part that contributes to the prior art, can be embodied in the form of a software product, which is stored in a storage medium (such as ROM / RAM, magnetic disk, optical disk) as above, and includes a number of instructions for enabling a terminal device (which can be a mobile phone, computer, server, or network device, etc.) to execute the methods of each embodiment of the present application.

[0193] The above are only preferred embodiments of the present application and do not limit the patent scope of the present application. Any equivalent structure or equivalent process transformation made using the contents of the present application specification and drawings, or directly or indirectly applied in other related technical fields, are also included in the patent protection scope of the present application.

Claims

1. A laser processing equipment control method, wherein: The laser processing equipment control method includes: Acquire first position information of a plurality of alignment patterns in the area to be processed on the image of the first area and actual position information of the plurality of alignment patterns; According to the position mapping relationship between the first position information and the actual position information, the area to be processed in the first area image is corrected to obtain a second area image, and processing is performed based on the area to be processed in the second area image.

2. The laser processing equipment control method according to claim 1, wherein: The step of obtaining first position information of a plurality of alignment patterns in the area to be processed on the image of the first area includes: Acquire a first area image of a to-be-processed area, wherein the to-be-processed area has a plurality of the alignment patterns; Acquiring the pre-positions of the plurality of alignment patterns in the first area image; Based on the pre-positions of the plurality of alignment patterns, adding a first preset circumscribed graphic on each alignment pattern; An area of ​​interest corresponding to a first preset circumscribed graphic of each alignment pattern is determined to determine first position information corresponding to the area of ​​interest.

3. The laser processing equipment control method according to claim 2, wherein: The determining of the region of interest corresponding to the first preset circumscribed graphic of each alignment pattern to determine first position information corresponding to the region of interest includes: Acquire a region of interest according to a first preset circumscribed pattern of each alignment pattern; Acquiring contour information in the region of interest; The first position information is acquired according to the contour information.

4. The laser processing equipment control method according to claim 3, wherein: The contour information includes a plurality of contours corresponding to the alignment pattern, and a hierarchical relationship between the plurality of contours; Acquiring the first position information according to the contour information includes: determining an innermost contour according to the contour information; A second preset circumscribed graphic is added to the innermost contour, and the center coordinates of the second preset circumscribed graphic are obtained to determine the first position information corresponding to the center coordinates.

5. The laser processing equipment control method according to claim 2, wherein: The obtaining of the pre-positions of the plurality of alignment patterns in the first area image includes: The pre-positions of the plurality of alignment patterns in the first area image are acquired based on a preset alignment model.

6. The laser processing equipment control method according to claim 5, wherein: After obtaining the pre-positions of the plurality of alignment patterns in the first area image based on the preset alignment model, the method further includes: sorting the first circumscribed graphics of the plurality of alignment patterns according to a preset area rule to select the first circumscribed graphics with the smallest area difference; Then, the multiple first circumscribed graphics with the smallest area difference that are screened out are sorted according to a preset orientation, so that adjacent first circumscribed graphics are connected to each other to form a preset graphic constraint, so as to filter the alignment pattern in the first area image identified according to the preset alignment model.

7. The laser processing equipment control method according to claim 5, wherein: The generation method of obtaining the preset alignment model includes: Acquire a plurality of first area images including alignment patterns; performing mask annotation on the plurality of first region images to generate an annotated alignment pattern data set; Online data enhancement technology is applied to the alignment pattern dataset to set the flipping condition of the first area image, the hyperparameter batch and the number of iterations according to a preset ratio, and iterative training is performed to generate the preset alignment model.

8. The laser processing equipment control method according to claim 1, wherein: The alignment pattern includes a first alignment pattern and a plurality of second alignment patterns, and the first alignment pattern and the second alignment pattern are different pattern styles.

9. The laser processing equipment control method according to claim 8, wherein: The first alignment pattern is a circular target including a first number of concentric circles, and the second alignment pattern is a circular target including a second number of concentric circles; wherein the first number is not equal to the second number.

10. The laser processing equipment control method according to claim 1, wherein: Before correcting the to-be-processed area in the first area image according to the position mapping relationship between the first position information and the actual position information to obtain the second area image and processing according to the to-be-processed area in the second area image, the method further includes: The first area image including the plurality of alignment patterns is rotated so that the direction of the first area image is consistent with a first preset direction.

11. The laser processing equipment control method according to claim 1, wherein: The step of correcting the to-be-processed area in the first area image according to the position mapping relationship between the first position information and the actual position information to obtain a second area image includes: The plurality of alignment patterns are perspective-transformed according to the plurality of first position information and the plurality of actual position information to obtain a second area image.

12. A laser processing system, wherein: The laser processing system includes: a memory, a processor, and a laser processing equipment control program stored in the memory and executable on the processor, wherein the laser processing equipment control program is configured to implement: Acquire first position information of a plurality of alignment patterns in the area to be processed on the image of the first area and actual position information of the plurality of alignment patterns; According to the position mapping relationship between the first position information and the actual position information, the area to be processed in the first area image is corrected to obtain a second area image, and processing is performed based on the area to be processed in the second area image.

13. The laser processing system according to claim 12, wherein: The laser processing equipment control program is configured to further implement: Acquire a first area image of a to-be-processed area, wherein the to-be-processed area has a plurality of the alignment patterns; Acquiring the pre-positions of the plurality of alignment patterns in the first area image; Based on the pre-positions of the plurality of alignment patterns, adding a first preset circumscribed graphic on each alignment pattern; An area of ​​interest corresponding to a first preset circumscribed graphic of each alignment pattern is determined to determine first position information corresponding to the area of ​​interest.

14. The laser processing system according to claim 13, wherein: The laser processing equipment control program is configured to further implement: The pre-positions of the plurality of alignment patterns in the first area image are acquired based on a preset alignment model.

15. The laser processing system according to claim 14, wherein: The laser processing equipment control program is configured to further implement: sorting the first circumscribed graphics of the plurality of alignment patterns according to a preset area rule to select the first circumscribed graphics with the smallest area difference; Then, the multiple first circumscribed graphics with the smallest area difference that are screened out are sorted according to a preset orientation, so that adjacent first circumscribed graphics are connected to each other to form a preset graphic constraint, so as to filter the alignment pattern in the first area image identified according to the preset alignment model.

16. The laser processing system according to claim 12, wherein: The alignment pattern includes a first alignment pattern and a plurality of second alignment patterns, and the first alignment pattern and the second alignment pattern are different pattern styles.

17. The laser processing system according to claim 12, wherein: Before correcting the to-be-processed area in the first area image based on the position mapping relationship between the first position information and the actual position information to obtain a second area image, and performing processing according to the to-be-processed area in the second area image, the laser processing equipment control program is configured to further implement: The first area image including the plurality of alignment patterns is rotated so that the direction of the first area image is consistent with a first preset direction.

18. The laser processing system according to claim 12, wherein: The laser processing equipment control program is configured to further implement: The plurality of alignment patterns are perspective-transformed according to the plurality of first position information and the plurality of actual position information to obtain a second area image.

19. A laser processing device, wherein: The laser processing equipment includes: A workbench, wherein the workbench has an area to be processed; a processing head, the processing head being slidably disposed on the workbench, and the processing head being used to process the workpiece on the area to be processed; A plurality of alignment patterns, wherein the plurality of alignment patterns are arranged at edge positions of the area to be processed, and lines connecting any two of the plurality of alignment patterns form a closed area; A camera device is provided on the workbench, and is used to capture a first area image of the area to be processed and obtain first position information of a plurality of alignment patterns on the first area image; an alignment device, the alignment device being mounted on the processing head and being used to obtain actual position information of a plurality of alignment patterns as the processing head moves; and A control device is used to correct the area to be processed in the first area image according to the position mapping relationship between the first position information and the actual position information to obtain a second area image; the control device is also used to control the processing head to process the workpiece based on the area to be processed in the second area image.

20. A computer-readable medium, wherein: A computer program is stored thereon, and when the computer program is executed by the processor, a control method for a laser processing device is implemented, and the control method for the laser processing device includes: Acquire first position information of a plurality of alignment patterns in the area to be processed on the image of the first area and actual position information of the plurality of alignment patterns; According to the position mapping relationship between the first position information and the actual position information, the area to be processed in the first area image is corrected to obtain a second area image, and processing is performed based on the area to be processed in the second area image.