Liquid treatment device

Abstract

Provided is a gas treatment device for liquid with improved treatment capacity.　A liquid treatment device 100 includes: a treatment liquid guide 14 for introducing a liquid 10 under treatment; a gas introduction part 42 for introducing a gas 40 for treatment; and a rotary plate 120 that is rotated by the rotational force of a rotary drive device 20. A large number of first fine holes 130 penetrating the rotary plate 120 from an upper surface 121 to a lower surface 122 are formed in the rotary plate 120. The liquid 10 under treatment is supplied from above the center of the rotary plate 120 and guided to the upper surface 121 of the rotary plate 120. A part of the liquid 10 under treatment is guided to the lower surface 122 of the rotary plate 120 through the first fine holes 130, and an upper surface liquid film 124 and a lower surface liquid film 128 are formed by the liquid 10 under treatment on the upper surface 121 and the lower surface 122 of the rotary plate 120. The dissolved gas is treated in the upper surface liquid film 124 and the lower surface liquid film 128.

Description

Liquid Treatment Equipment

[0001] The present invention relates to a liquid treatment device equipped with an atomization device for a liquid to be treated, which performs a degassing process to remove gas dissolved in the liquid to be treated, or a substitution process to replace the gas dissolved in the liquid to be treated with a prepared type of gas by dissolving a prepared type of gas in addition to a process to degas the gas dissolved in the liquid to be treated, or a sterilization process to sterilize bacteria present in the liquid to be treated.

[0002] When performing the above-mentioned degassing process to remove gas dissolved in the liquid to be treated, or when performing a substitution process to degas the gas dissolved in the liquid to be treated and then dissolve a prepared type of gas to replace the gas dissolved in the liquid to be treated with the prepared type of gas, or when performing a sterilization process to sterilize bacteria present in the liquid to be treated, the processing efficiency can be improved by atomizing the liquid to be treated.

[0003] Conventionally used devices for atomizing a liquid to be treated are those described in the following Patent Documents 1 and 2. The technology described in these patent documents involves supplying the liquid to be treated to the upper surface of a rotating means rotating at high speed, and then atomizing the liquid by using the rotating means to repel the liquid. This conventional technology atomizes the liquid to be treated, making it possible to perform the degassing, substitution, or sterilization treatment on the liquid to be treated. However, with regard to atomization based on the above-mentioned conventional technology, there is a global need for a significant improvement in processing capacity.

[0004] JP 2001-9206 A JP 2021-90972 A

[0005] In Patent Document 1, a distributor S is provided inside a vacuum chamber C to atomize the liquid to be treated. In order to improve the processing capacity related to the above-mentioned atomization, a method is adopted in which the number of distributors S for thinning the liquid to be treated is increased. By increasing the number of distributors S, the processing capacity increases based on the number of distributors S increased. The technology described in this Patent Document does not improve the processing capacity of the distributors S. It is a method of increasing the processing capacity simply by increasing the number of distributors S, and the processing capacity is increased by increasing the size of the device. This solution does not provide a fundamental solution to meet the needs of the world.

[0006] The technology described in Patent Document 2 involves providing a cylindrical rotor 30, providing a number of holes in the screens 3 and 33 that are the vertical portions of the cylindrical rotor 30, and discharging the liquid to be treated from the inside of the cylindrical screens 3 and 33 to the outside of the screens 3 and 33 through the holes, thereby atomizing the liquid to be treated. In practice, it is difficult to improve the treatment capacity. The method described here has the problems of a complex and large structure, and while it creates many new problems, it also has the problem of not significantly improving the treatment capacity for the actual liquid to be treated.

[0007] An object of the present invention is to provide a liquid treatment apparatus equipped with an atomization device that improves the processing capacity per unit time for atomizing the liquid to be treated.

[0008] [First Invention] The first invention is a liquid treatment device in which an atomization treatment device for atomizing a liquid to be treated introduced into the interior of a sealed container is provided inside the sealed container, and by atomizing the liquid to be treated, degassing treatment, displacing treatment of dissolved gases, or sterilizing treatment is performed on the liquid to be treated, wherein the atomization treatment device comprises a rotating plate having a vertical rotation axis and rotating, and the rotating plate has a number of first fine holes formed therein that penetrate between its upper and lower surfaces, the liquid to be treated introduced into the sealed container is guided to the upper surface of the rotating plate, and due to the rotation of the rotating plate, the liquid to be treated moves along the upper surface of the rotating plate towards the outer circumferential edge of the rotating plate, and part of the liquid to be treated that has been guided to the upper surface of the rotating plate enters the interior of the number of first fine holes formed in the rotating plate, and the liquid to be treated that has entered the interior of the number of first fine holes is guided to the lower surface of the rotating plate, a liquid treatment device characterized in that: the liquid to be treated is continuously guided from inside the numerous first fine holes to the lower surface of the rotating plate due to a mutual attractive force generated between the liquid to be treated guided to the lower surface of the rotating plate and the liquid to be treated present inside the numerous first fine holes; the liquid to be treated guided to the lower surface of the rotating plate moves along the lower surface of the rotating plate toward the outer peripheral edge of the rotating plate due to the rotation of the rotating plate; and the liquid to be treated that moves along the upper surface toward the outer peripheral edge due to the rotation of the rotating plate is also splashed from the outer peripheral edge of the rotating plate.

[0009] [Second Invention] The second invention is a liquid treatment device according to the first invention, characterized in that the atomization treatment device comprises a plurality of the rotating plates, each having the plurality of first pores formed therein, arranged in a vertical direction, an introduction passage for flowing the liquid to be treated, which has a shape extending in the vertical direction, is formed in the center of each of the plurality of rotating plates arranged in the vertical direction, the introduction passage has a plurality of openings for supplying the liquid to be treated to the upper surface of each of the plurality of rotating plates, the liquid to be treated is supplied to the upper surface of each of the plurality of rotating plates from the corresponding openings of the introduction passages, in each of the plurality of rotating plates, a portion of the liquid to be treated is led from the upper surface of the rotating plate to the lower surface of the rotating plate via the plurality of first pores, and in each of the plurality of rotating plates, the liquid to be treated present on the upper surface and the liquid to be treated present on the lower surface move towards the outer circumferential edge of the rotating plate due to the rotation of the rotating plate and are splashed from the outer circumferential edge of the rotating plate.

[0010] [Third Invention] The third invention is a liquid treatment device according to the second invention, wherein a cylindrical first treatment tube is provided inside the sealed container, with the vertical direction being the height direction; the outer circumferential edge of at least one of the plurality of rotating plates is disposed facing an upper part inside the first treatment tube; a large number of fine holes are formed in the first treatment tube, penetrating its inner circumferential surface and its outer circumferential surface; upper surface liquid droplets based on the liquid to be treated that have moved along the upper surface of the rotating plate toward the outer circumferential edge, and lower surface liquid droplets based on the liquid to be treated that have moved along the lower surface of the rotating plate toward the outer circumferential edge are released from the terminal ends and collide with the inner circumferential surface of the first treatment tube, forming an inner liquid film on the inner circumferential surface of the first treatment tube; a portion of the inner liquid film moves to the outer peripheral surface through the numerous pores of the first processing pipe, forming an outer liquid film on the outer peripheral surface of the first processing pipe, and the liquid to be processed forming the inner liquid film and the outer liquid film is subjected to the degassing process, the dissolved gas replacement process, or the sterilization process.

[0011] [Fourth Invention] The fourth invention is a liquid treatment device according to the first invention, characterized in that the atomization treatment device is provided with a second rotating plate, which does not have the numerous first pores, below the rotating plate arranged vertically, and an inlet passage extending vertically for allowing the liquid to be treated to flow is provided in the center of the rotating plate, and the liquid to be treated is supplied from the inlet passage to the upper surface of the rotating plate and also to the upper surface of the second rotating plate, and the liquid to be treated is not supplied from the inlet passage to the lower surface of the second rotating plate.

[0012] [Fifth Invention] The fifth invention is a liquid treatment device according to the first invention, characterized in that a rotary drive device for driving the rotation of the rotating plate provided inside the atomization treatment device is provided above the sealed container, a rotation transmission device for transmitting the rotational force of the rotary drive device to the rotating plate of the atomization treatment device is provided between the atomization treatment device and the rotary drive device, and an introduction passage for guiding the liquid to be treated to the atomization treatment device is formed penetrating the inside of the rotation transmission device.

[0013] [Sixth Invention] The sixth invention is a liquid treatment device according to the first invention, characterized in that a drive chamber is provided inside the sealed container directly below the atomization treatment device, a rotary drive device that drives the rotation of the rotary plate is provided inside the drive chamber, and the rotation of the rotary plate of the atomization treatment device is driven by the rotary drive device provided inside the drive chamber.

[0014] [Seventh Invention] The seventh invention is a liquid treatment device according to the first invention, characterized in that the cross-sectional shape of the numerous first pores formed in the rotating plate, taken at a right angle to the direction from the upper surface to the lower surface of the rotating plate, is circular or elliptical.

[0015] [Eighth Invention] The eighth invention is a liquid treatment device according to the seventh invention, characterized in that the diameter of the circle or the length of the short side of the ellipse of the cross-sectional shape of the first pore formed in the rotating plate is 0.5 mm or more and 10 mm or less.

[0016] [Ninth Invention] The ninth invention is a liquid treatment device according to the third invention, characterized in that the cross-sectional shape of the numerous pores formed in the first treatment pipe, taken at a right angle to the direction from the inner surface to the outer surface of the first treatment pipe, is a circle or an ellipse.

[0017] [10th Invention] The 10th invention is a liquid treatment device according to the 9th invention, characterized in that in the cross-sectional shape of the numerous pores, the diameter of the circle or the length of the short side of the ellipse is 1 mm or more and 10 mm or less.

[0018] [Eleventh Invention] The eleventh invention is a liquid treatment device according to the fourth invention, characterized in that an exhaust device is provided for exhausting gas present inside the sealed container to the outside of the sealed container, the exhaust device has a gas inlet port below the second rotating plate for taking in the gas to be exhausted, and the exhaust device takes in gas present below the second rotating plate from the gas inlet port and exhausts it to the outside of the sealed container.

[0019] According to the present invention, in a liquid treatment device that performs liquid-to-liquid treatment such as degassing, dissolved gas replacement, or sterilization on a liquid to be treated, it is possible to obtain a liquid treatment device that can significantly increase the amount of liquid treatment performed on the liquid to be treated per unit time.

[0020] Fig. 1 is an explanatory diagram illustrating the overall configuration of a liquid treatment device that is an embodiment to which the present invention is applied. Fig. 2 is a partially enlarged view of an atomization treatment device that is an embodiment to which the present invention is applied. Fig. 3 is an explanatory diagram illustrating a rotating plate provided in the atomization treatment device that is an embodiment. Fig. 4 is an explanatory diagram illustrating another embodiment of a liquid treatment device to which the present invention is applied.

[0021] In the following description of the embodiments, components with the same reference numerals have substantially the same functions and effects, and redundant description may be omitted.

[0022] 1. Overview of Liquid Treatment Apparatus 100 (1) Overview of the Overall Structure of Liquid Treatment Apparatus 100 Figure 1 shows a cross-section of the overall structure of a liquid treatment apparatus 100, an embodiment to which the present invention is applied. Figure 2 is a partially enlarged cross-sectional view of an atomization treatment apparatus 110 provided in the liquid treatment apparatus 100. The liquid treatment apparatus 100 is an apparatus for performing treatments (hereinafter referred to as liquid treatments) such as degassing treatment to remove gas dissolved in the liquid 10 to be treated, gas substitution treatment to dissolve a predetermined gas in addition to degassing, or sterilization treatment to sterilize the liquid 10 to be treated. The liquid 10 to be treated may be, for example, a beverage liquid, a pharmaceutical liquid, a liquid used in secondary batteries, or a liquid used in the manufacture of ink, and is not particularly limited.

[0023] 1 and 2 , the liquid to be treated 10 is introduced from a supply amount control device 12, which controls the amount of the liquid to be treated 10 supplied to a sealed container 102, to an introduction passage 16 via a treatment liquid introduction part 14, and further passed through the inside of the introduction passage 16 to be supplied to the center of an atomization treatment device 110 provided inside the sealed container 102. Gas dissolved in the liquid to be treated 10 is liquid-treated by the atomization treatment device 110, the inner peripheral surface 103 of the sealed container 102, or the first treatment pipe 150 or the second treatment pipe 160.

[0024] When performing degassing, which is a liquid treatment that simply removes dissolved gas from the liquid 10 to be treated, the gas inside the sealed container 102 is exhausted using the exhaust device 56 shown in FIG. 1 to lower the pressure inside the sealed container 102, for example, to a vacuum state. In this case, the gas inlet 42 for introducing the replacement processing gas 40 is not used and is closed. By maintaining the sealed container 102 in a vacuum state, the liquid 10 to be treated, introduced into the sealed container 102 from the processing liquid inlet 14 via the inlet passage 16, undergoes degassing, which is one type of liquid treatment, on the atomization treatment device 110, the inner circumferential surface 103 of the sealed container 102, or the inner circumferential surface 165 and outer circumferential surface 163 of the first treatment tube 150 and the second treatment tube 160. In this case, the liquid treatment device 100 functions as a degassing device, and gases such as oxygen dissolved in the liquid 10 to be treated are exhausted through the exhaust device 56.

[0025] When the liquid treatment device 100 is operated as a dissolved gas replacement device for the liquid 10 to be treated, a treatment gas 40, such as nitrogen, to be replaced is supplied from the gas inlet 42. This causes the inside of the sealed container 102 to be filled with the treatment gas 40, such as nitrogen, to be replaced. For example, when the liquid 10 to be treated is milk and oxygen molecules dissolved in the milk are to be replaced with nitrogen molecules, the milk, which is the liquid 10 to be treated, is introduced from the supply amount control device 12 through the introduction passage 16 to the atomization treatment device 110, and nitrogen gas is introduced from the gas inlet 42 into the sealed container 102. The dissolved oxygen molecules are discharged from the milk introduced into the sealed container 102, and instead, nitrogen molecules are dissolved in the milk. The gas discharged from the liquid to be treated 10 by this replacement process and the excess gas among the processing gas 40 introduced from the gas introduction section 42 are sucked through the gas intake port 52, guided to the exhaust device 56 via the exhaust pipe 54, and discharged from the exhaust device 56 as unnecessary gas 50.

[0026] In this embodiment, a gas inlet 52 for taking in gas to be exhausted to the outside of the sealed container 102 is provided below the second rotating plate 140. Since the sealed container 102 does not have a large number of first fine holes 130 as described in Fig. 2, there are almost no liquid droplets formed from the liquid to be treated 10. As a result, it is possible to reduce the amount of the liquid to be treated 10 that is exhausted to the outside of the sealed container 102 by the exhaust device 56.

[0027] When the liquid treatment device 100 is used for sterilization, a high-temperature gas, for example, high-temperature steam, is introduced through the gas inlet 42. The interior of the sealed container 102 is filled with the high-temperature gas, for example, high-temperature steam. In this state, the treatment target liquid 10 to be sterilized is introduced into the sealed container 102 from the treatment liquid inlet 14 via the inlet passage 16 and supplied to the atomization treatment device 110. The liquid is sterilized in the atomization treatment device 110, the inner surface 103 of the sealed container 102, the first treatment pipe 150, and the second treatment pipe 160. As a result, the introduced treatment target liquid 10 is sterilized. The excess high-temperature steam, which is the excess of the treatment gas 40 introduced through the gas inlet 42, is sucked through the gas inlet 52 and exhausted as unwanted gas 50 from the exhaust device 56. As described above, the gas intake port 52 of the exhaust device 56 is provided below the second rotating plate 140, and the discharge of the liquid to be treated 10 by the exhaust device 56 can be reduced.

[0028] (2) Overview of the atomization treatment device 110 of the liquid treatment device 100 The structure of the atomization treatment device 110 is shown in Figures 1 and 2. The atomization treatment device 110 is equipped with a plurality of rotating plates 120 in order to perform the above-mentioned liquid treatment on the treatment target liquid 10 introduced into the sealed container 102, and further equipped with a second rotating plate 140 below the plurality of rotating plates 120. The atomization treatment device 110 is further equipped with a rotating cover 116 in order to rotate the plurality of rotating plates 120 and the second rotating plate 140. The rotating cover 116 and the plurality of rotating plates 120 and the second rotating plate 140 are fixed to each other by a plurality of supports 148, and when the rotating cover 116 rotates, the plurality of rotating plates 120 and the second rotating plate 140 rotate.

[0029] As will be explained below with reference to Figure 3, each of the multiple rotating plates 120 has a large number of first pores 130 formed therein, penetrating between its upper surface 121 and lower surface 122. A portion of the liquid to be treated 10 supplied to the upper surface 121 of the rotating plate 120 is introduced from the upper surface 121 into the large number of first pores 130 and then moves to the lower surface 122. A large amount of the liquid to be treated 10 is held inside the large number of first pores 130. Due to surface tension, the molecules of the liquid to be treated 10 held inside the large number of first pores 130 attract each other between the liquid to be treated 10 that has moved from the large number of first pores 130 to the lower surface 122 and the liquid to be treated 10 located inside the large number of first pores 130, and an action occurs to hold the liquid to be treated 10 on the surface of the lower surface 122. As a result, the liquid to be treated 10 guided to the lower surface 122 from the numerous first fine holes 130 acts to form a lower surface liquid film 128 along the lower surface 122. Because the rotating plate 120 is rotating at high speed, the liquid to be treated 10 guided to the lower surface 122 moves along the lower surface 122 toward the outer circumferential edge 123 of the rotating plate 120. Because molecules of the liquid to be treated 10 located inside the numerous first fine holes 130 and the liquid to be treated 10 guided to the lower surface 122 are attracted to each other, the liquid to be treated 10 located inside the numerous first fine holes 130 moves to the lower surface 122 of the rotating plate 120 in response to the movement of the liquid to be treated 10 along the lower surface 122 of the rotating plate 120 toward the outer circumferential edge 123 of the rotating plate 120, and the liquid to be treated 10 is guided seamlessly from the upper surface 121 of the rotating plate 120 to the lower surface 122 of the rotating plate 120 via the numerous first fine holes 130. Furthermore, the liquid to be treated 10 does not fall downward from the lower surface 122 of the rotating plate 120, but rather most of the liquid to be treated 10 that is guided to the lower surface 122 of the rotating plate 120 moves along the lower surface 122 toward the outer peripheral edge 123 of the rotating plate 120.

[0030] Furthermore, the molecules of the liquid to be treated 10 remaining on the upper surface 121 of the rotating plate 120 and the liquid to be treated 10 held inside the numerous first pores 130 are attracted to each other, which causes the liquid to be treated 10 to remain spread along the upper surface 121 of the rotating plate 120 rather than scattering from the upper surface 121 of the rotating plate 120. As a result, a thin liquid to be treated 10 spreads along the upper surface 121 of the rotating plate 120. In other words, a thin upper surface liquid film 124 is formed. Similarly, a thin liquid to be treated 10, or a lower surface liquid film 128, is formed on the lower surface 122 of the liquid to be treated 10. The upper surface liquid film 124 and the lower surface liquid film 128 have a wide surface area and tend to spread, increasing the effective surface area for the liquid treatment action. Compared to conventional devices, the effective surface area for treating the liquid to be treated 10 is significantly increased. As a result, the amount of liquid to be treated 10 treated per unit time is significantly increased. Furthermore, each rotating plate 120 has a simple structure in which a large number of first fine holes 130 are formed in a disk-shaped plate, and even if the number of rotating plates 120 is increased, the volume of the atomization treatment device 110 does not become so large. For this reason, for example, it is possible to stack five or more plates in the height direction. For example, when compared under the condition of only one rotating plate 120, in this embodiment, both the upper surface 121 and the lower surface 122 of the rotating plate 120 can be effectively used. Compared to conventional devices, the amount of liquid processed per unit time per rotating plate 120 is greatly improved. As mentioned above, the rotating plate 120 is also very easy to process.

[0031] The liquid treatment device 100 includes a rotary drive device 20 for generating a rotational force above the sealed container 102. A rotation transmission device 45 is further provided between the rotary drive device 20 and the atomization treatment device 110 inside the sealed container 102 to transmit the rotational force from the rotary drive device 20 to the atomization treatment device 110. The rotational force from the rotation transmission device 45 is transmitted to the rotary cover 116 of the atomization treatment device 110, and the rotation of the rotary cover 116 rotates the plurality of rotary plates 120 and the second rotary plate 140. As will be described in detail below with reference to FIG. 2 , in this embodiment, the plurality of rotary plates 120 are formed with a large number of first fine holes 130. Due to the action of these multiple first fine holes 130, the atomization treatment device 110 achieves the effect of significantly increasing the amount of liquid treatment per unit time as described above compared to devices based on conventional technology. The first treatment tube 150 and the second treatment tube 160 are also capable of treating a significantly larger amount of liquid per unit time compared to conventional products. As a result, the entire liquid treatment apparatus 100 was able to achieve a processing volume of the target liquid 10 per unit time of at least five times, nearly ten times, that of conventional devices in the prototype. Furthermore, because the target liquid 10 spreads along the upper surface 121 and lower surface 122 of each rotating plate 120, the thicknesses of the upper surface liquid film 124 and lower surface liquid film 128 become thinner, and the upper surface liquid droplets 125 and lower surface liquid droplets 129 are scattered in a spread state in a direction nearly horizontal from the outer peripheral edge 123 of each rotating plate 120. As a result, the particle diameters of the scattered upper surface liquid droplets 125 and lower surface liquid droplets 129 are smaller than the particle diameters of the target liquid 10 produced in conventional devices. This increases the processing volume of the liquid per unit time. In other words, when compared with a treatment device 100 for liquid of approximately the same volume, it is possible to significantly increase the amount of treatment target liquid 10 per unit time supplied from the supply amount control device 12 to the atomization treatment device 110 compared to the supply amount in conventional devices.

[0032] (3) Overview of the First Processing Tube 150 and the Second Processing Tube 160 As shown in Fig. 2, after the above-mentioned liquid processing by the plurality of rotating plates 120 and the second rotating plate 140 constituting the atomization processing device 110, the above-mentioned liquid processing is continued on the inner circumferential surface 103 of the sealed container 102, the inner circumferential surface 165 and the outer circumferential surface 163 of the first processing tube 150, and the inner circumferential surface 165 and the outer circumferential surface 163 of the second processing tube 160. In this embodiment, as shown in Fig. 2, a large number of pores 152 are formed in the first processing tube 150 and the second processing tube 160. Due to the action of the large number of pores 152 in the first processing tube 150 and the large number of pores 152 in the second processing tube 160, an inner liquid film 156 or an outer liquid film 154 is formed on both the inner circumferential surface 165 and the outer circumferential surface 163 of the first processing tube 150 and the second processing tube 160. This significantly increases the effective surface area of ​​the liquid to be treated 10. This significantly improves the liquid treatment capacity, allowing for a significant increase in the amount of liquid to be treated 10 treated per unit time. After being treated in the first treatment pipe 150 or the second treatment pipe 160, the liquid to be treated 10 flows by gravity toward the first lower end 158 of the first treatment pipe 150 or the second lower end 169 of the second treatment pipe 160, where it accumulates at the bottom of the sealed container 102 as treated liquid 70. The accumulated treated liquid to be treated 10 can be removed as needed from the treated liquid removal section 80. The remaining amount of treated liquid 70 is measured by a liquid volume measuring device 72, and the measurement result is output from an output terminal 74. Numerous fine holes 152 are formed in the first treatment pipe 150, and numerous fine holes 152 are also formed in the second treatment pipe 160. It would be extremely complicated to indicate the reference numerals for these numerous fine holes 152 in FIG. 2 . For this reason, reference numerals are given to only some of the pores 152, and the reference numerals for the other many pores 152 are omitted.

[0033] 2. Specific Configuration and Effects of Liquid Treatment Device 100 (1) Structure and Effects of Rotational Drive Device 20 and Rotation Transmission Device 45 The configuration of the rotational drive device 20 will be described using Figure 1. An atomization treatment device 110 is provided inside a sealed container 102, adjacent to an upper edge 104 provided on the upper side of the container. The atomization treatment device 110 has at least one rotating plate 120, preferably multiple rotating plates 120, and a second rotating plate 140 below the rotating plate 120, to efficiently perform liquid treatment such as degassing, replacing dissolved gases, or sterilization of the liquid to be treated 10 introduced from the supply amount control device 12 via the treatment liquid introduction section 14 and introduction passage 16. The rotation speed of the rotating plate 120 and the second rotating plate 140 to efficiently perform the liquid treatment is, for example, between 700 and 2500 revolutions per minute. This rotation speed can be adjusted depending on the type of liquid, thereby forming a stable film of the liquid to be treated 10 on the rotating plate 120 and the second rotating plate 140 .

[0034] A rotary drive device 20 is provided above the sealed container 102 to transmit rotational force to the atomization treatment device 110. An upper support 38 is provided detachably fixed to the sealed container 102 to support the rotary drive device 20. A motor 22 of the rotary drive device 20 is supported on the upper support 38. In this embodiment, the motor 22 is provided outside the sealed container 102, not inside the sealed container 102, from the viewpoints of preventing contamination inside the sealed container 102, preventing the intrusion of unnecessary gases, and preventing the intrusion of bacteria, and is provided above the sealed container 102 in this embodiment. On the other hand, the atomization treatment device 110 that treats the introduced treatment target liquid 10 is provided inside the sealed container 102. Therefore, a configuration is required to transmit the rotational force of the motor 22 to the inside of the sealed container 102. A rotation transmission device 45 is provided for this purpose.

[0035] The sealed container 102 is provided with a partition wall 106 made of a non-magnetic material to separate the inside and outside of the sealed container 102. An upper edge 104 that forms the upper part of the sealed container 102 is connected to the partition wall 106. The upper edge 104 and the lower side of the partition wall 106 form the inside of the sealed sealed container 102 and maintain an airtight state. On the other hand, the upper side of the upper edge 104 and the upper side of the partition wall 106 form the outside of the sealed container 102 and are not maintained in an airtight state. The sealed container 102 is configured to be separable by a connecting portion 105 to facilitate cleaning and maintenance of the inside of the sealed container 102. When separated from the connecting portion 105, the micronization treatment device 110 located inside the sealed container 102 together with the upper edge 104 and the isolation wall 106, which are part of the sealed container 102, the rotation transmission device 45 connecting the inside and outside of the sealed container 102, and the rotation drive device 20 located outside the sealed container 102 can be separated from the sealed container 102 in a single unit.

[0036] The first process tube 150 and the second process tube 160 are supported by the sealed container 102, and when they are separated at the connecting portion 105, the atomization treatment device 110 is supported by the upper edge 104 and the partition wall 106, so that the first process tube 150 and the second process tube 160 can be separated from the atomization treatment device 110. When separated at the connecting portion 105, the opening of the connecting portion 105 is larger than the outer periphery of the atomization treatment device 110, so that the atomization treatment device 110 can be removed from the opening of the connecting portion 105 without being damaged. Furthermore, since the opening of the connecting portion 105 is larger than the outer periphery of the first process tube 150 and the second process tube 160, after separation at the connecting portion 105, the first process tube 150 and the second process tube 160 can be further removed from the sealed container 102 as necessary. In this way, the atomization treatment device 110, the first treatment pipe 150, and the second treatment pipe 160 that perform the above-mentioned liquid treatment can be easily removed, making maintenance and cleaning very easy.

[0037] In this embodiment, an introduction passage 16 for introducing the liquid to be treated 10 is provided in the center of the rotary drive device 20 and the rotation transmission device 45. A supply amount control device 12 for controlling the supply amount of the liquid to be treated 10 is provided on an upper support 38 located at the top of the liquid treatment device 100, and the supply amount of the liquid to be treated 10 to the sealed container 102 is controlled based on the amount of treated liquid 70 accumulated in the sealed container 102 measured by a liquid amount measuring device 72 described below.

[0038] The liquid to be treated 10 based on the supply amount controlled by the supply amount control device 12 is supplied from the treatment liquid inlet 14 to the inlet passage 16, and the liquid to be treated 10 is supplied to the atomization treatment device 110 via the inlet passage 16. The inlet passage 16 is provided in the center of the upper part of the liquid treatment device 100, and an external rotor 28 that transmits the rotational motion of the motor 22 and an external bearing 26 that supports the rotation of the external rotor 28 are provided on the outer periphery of the inlet passage 16. The external rotor 28 and the external bearing 26 are provided outside the isolation wall 106 and on top of the isolation wall 106. The rotation of the motor 22 is transmitted to the external rotor 28 via the belt 24, and the external rotor 28 rotates by the motor 22.

[0039] An internal rotor 36 is provided inside the sealed container 102, below the isolation wall 106, and is mechanically connected to the rotating cover 116 of the atomization treatment device 110. The internal rotor 36 is supported by an internal bearing 34. The upper surface of the internal rotor 36 and the lower surface of the external rotor 28 face each other via the isolation wall 106, and an internal rotary magnet 32 ​​and an external rotary magnet 30 are provided on the opposing surfaces. The external rotary magnet 30 and the internal rotary magnet 32, which face each other via the isolation wall 106, form a magnetic coupling device 33. While this embodiment describes an example in which both are magnets, one of them may be a magnet and the other a magnetic material. What is important is that the external rotor 28 and the internal rotor 36 are configured such that rotational force is transmitted from the external rotor 28 to the internal rotor 36 via the isolation wall 106 by the magnetic coupling device 33. The internal rotor 36, which rotates by the magnetic coupling device 33 in correspondence with the external rotor 28, is rotatably supported with respect to the upper edge 104, the isolation wall 106, or the upper support 38 by an internal bearing 34 provided on the sealed container 102 side of the isolation wall 106. With this configuration, the rotation of the motor 22 provided outside the sealed container 102 can be transmitted to the atomization treatment device 110 provided inside the sealed container 102 with a simple configuration, while maintaining the inside of the sealed container 102 airtight.

[0040] In this embodiment, the liquid to be treated 10 is supplied to the atomization treatment device 110 by passing through the centers of the external bearing 26 and internal bearing 34, as well as the centers of the external rotor 28, magnetic coupling device 33, and internal rotor 36. In the atomization treatment device 110, the multiple rotating plates 120 and the second rotating plate 140 provided below them rotate at speeds ranging from 700 to 2000 or 2500 revolutions per minute. This poses a problem of temperature rise in the rotation transmission device 45. In this embodiment, the liquid to be treated 10 can be used to cool the temperature rise caused by heat generated in the external bearing 26 and internal bearing 34. In this way, the external bearing 26 and internal bearing 34 are cooled by the liquid to be treated 10 flowing through the introduction passage 16, thereby suppressing temperature rise. As a result, the durability of the rotation drive device 20 can be improved.

[0041] In this example, prototype testing revealed that improvements to the atomization treatment device 110 and the first and second treatment pipes 150 and 160 improved the treatment capacity of the liquid treatment device 100 by 5 to 10 times, or even more, compared to conventional devices. This resulted in a 5 to 10 times, or even more, increase in the amount of treatment target liquid 10 introduced into the inlet passage 16 per unit time. This significantly increased the effect of the treatment target liquid 10 in suppressing temperature rise in the rotary drive device 20, particularly in the bearing portions of the external bearing 26 and internal rotor 36. This significantly improved durability. Furthermore, the magnetic characteristics of the magnetic coupling device 33 may deteriorate with increasing temperature. This is another reason why the effect of suppressing temperature rise is important.

[0042] As will be explained below, in this embodiment, increasing the effective surface area of ​​the first processing pipe 150 and the second processing pipe 160 provided inside the sealed container 102 significantly contributes to improving the processing capacity. The surface area contributing to liquid processing can be increased by increasing the height, i.e., the vertical length, of the first processing pipe 150 and the second processing pipe 160. In conventional products, the liquid to be processed 10 was introduced from outside the sealed container 102 at the outer periphery, rather than at the center, of the rotary drive device 20. This required a large space above the atomization treatment device 110, since the liquid to be processed 10 was introduced from outside the sealed container 102 at the outer periphery, rather than at the center, of the rotary drive device 20. This required a large space above the atomization treatment device 110. In other words, in conventional products, the liquid to be processed 10 was introduced from outside the sealed container 102 at the outer periphery, rather than at the center, of the rotary drive device 20. This required a pipe between the atomization treatment device 110 and the upper edge 104 to guide the introduced liquid to the center of the atomization treatment device 110, and required space for the pipe.

[0043] In this embodiment, the treatment liquid inlet 14 and the inlet passage 16 for introducing the treatment liquid 10 are located at the center of the atomization treatment device 110, eliminating the need for piping, as in conventional devices, for directing the treatment liquid 10 introduced into the sealed container 102 to the center of the atomization treatment device 110. This allows the distance between the atomization treatment device 110 and the upper edge 104 to be narrowed. For example, the distance between the atomization treatment device 110 and the upper edge 104 can be narrowed to a maximum of 30 mm or less, preferably 20 mm or less, and more preferably approximately 10 mm. Therefore, when the height of the sealed container 102 is the same, the height of the first treatment pipe 150 and the second treatment pipe 160 can be increased accordingly, thereby increasing the area for liquid treatment.

[0044] As described above, in this embodiment, a connecting portion 105 is provided between the atomization treatment device 110 and the upper edge 104. The connecting portion 105 allows the sealed container 102 side to be separated from the portion of the rotary drive device 20 above the upper edge 104. The atomization treatment device 110 can be separated from the sealed container 102 while being fixed to the rotary drive device 20. Separation at the connecting portion 105 leaves the upper side of the sealed container 102 open, making it possible to clean the inside of the sealed container 102 having the first treatment tube 150 and the second treatment tube 160. In addition, since the opening at the top of the sealed container 102 separated by the connecting portion 105 is larger in diameter than the first treatment tube 150 and the second treatment tube 160, the first treatment tube 150 and the second treatment tube 160 can be removed from the sealed container 102, which also makes cleaning and the like very easy.

[0045] When the liquid treatment device 100 is separated at the connecting portion 105, the atomization treatment device 110 protrudes downward from the connecting portion 105, facilitating cleaning of the rotating cover 116, rotating plate 120, and second rotating plate 140 that constitute the atomization treatment device 110. In particular, as described below, in this embodiment, in order to significantly increase the amount of liquid treated per unit time, at least the rotating plate 120 is formed with a large number of first fine holes 130. Because the liquid to be treated 10 is held inside the first fine holes 130, cleaning of the insides of the large number of first fine holes 130 is important. When the device is separated at the connecting portion 105, the rotating cover 116, rotating plate 120, and second rotating plate 140 protrude downward from the connecting portion 105, as described above, making cleaning easy.

[0046] (2) Structure of the Atomization Treatment Device 110 in the Embodiments The above-described liquid treatment and related effects of the liquid treatment device 100 will be described using FIG. 1 , which shows the overall configuration of the liquid treatment device 100, and FIG. 2 , which is a partial enlarged view of the atomization treatment device 110, the first treatment pipe 150, and the second treatment pipe 160. As described above, the atomization treatment device 110 is mechanically connected to the internal rotor 36, which rotates upon receiving rotational force from the external rotor 28. The rotating cover 116 of the atomization treatment device 110, which is mechanically connected to the internal rotor 36, is mechanically connected to the multiple rotating plates 120 and the second rotating plate 140 via multiple support columns 148. When the motor 22 provided in the rotation drive device 20 rotates, the rotation of the motor 22 is transmitted to the external rotor 28 via the belt 24, causing the internal rotor 36 to rotate, which in turn causes the rotating cover 116, the multiple rotating plates 120, and the second rotating plate 140 to rotate. The rotation speed of the motor 22 is controlled by a control device (not shown), which controls the rotation speeds of the plurality of rotating plates 120 and the second rotating plate 140. In this embodiment, as described above, the plurality of rotating plates 120 and the second rotating plate 140 rotate at a set rotation speed between 700 and 2500 rotations per minute.

[0047] The configuration and operation of the atomization treatment device 110 will be explained using FIG. 2 , and the configurations and effects of the first treatment tube 150 and the second treatment tube 160 will be described below. Note that in FIG. 2 , the configuration above, below, and to the right of the dashed line is omitted. A plurality of rotating plates 120 are arranged vertically, and a second rotating plate 140 is arranged below the rotating plates 120. These rotating plates 120 and the second rotating plate 140 are fixed to the rotating cover 116 shown in FIG. 1 by a plurality of supports 148 and rotate together with the rotating cover 116. Each of the rotating plates 120 has a through-hole 127 formed in its center, and an introduction passage 16 is provided inside the through-hole. The introduction passage 16 has a circular cross section perpendicular to the central axis along the longitudinal direction. The first treatment tube 150 and the second treatment tube 160 are also circular relative to the central axis along the longitudinal direction of the introduction passage 16. Although the rotating plate 120 and the second rotating plate 140 are not shown in FIG. 2, as described above, the rotating plate 120 and the second rotating plate 140 have a circular shape.

[0048] The liquid to be treated 10 supplied from the supply amount control device 12 through the introduction passage 16 is introduced from above the atomization treatment device 110 to the center of each rotating plate 120 and the second rotating plate 140. The introduction passage 16 for supplying the liquid to be treated 10 has a plurality of openings 18 equally spaced circumferentially around the introduction passage 16 at positions corresponding to the upper surface 121 of each rotating plate 120, and the liquid to be treated 10 is supplied through the plurality of openings 18 to the upper surface 121 of the corresponding rotating plate 120. Although the introduction passage 16 is not designed to rotate, each rotating plate 120 rotates at the above-mentioned speed, so that the liquid to be treated 10 supplied through the openings 18 to the upper surface 121 of the rotating plate 120 is supplied over the entire circumferential direction of the upper surface 121 of the rotating plate 120 at its center. The supplied liquid to be treated 10 is subjected to a rotational force by the rotation of the rotating plate 120, and moves from the center of the rotating plate 120 toward the periphery due to the generated centrifugal force while rotating. As the liquid to be treated 10 moves toward the outer periphery, the surface area of ​​the upper surface 121 of the rotating plate 120 expands rapidly, and the liquid to be treated 10 guided to the upper surface 121 forms a thin upper surface liquid film 124, which moves from the center of the upper surface 121 of the rotating plate 120 to the outer peripheral edge 123 due to centrifugal force, and is released from the outer peripheral edge 123 in the form of numerous particles shown as upper surface liquid droplets 125, which collide with the inner surface 103 of the sealed container 102, the inner surface 165 of the upper part of the first processing tube 150, or the inner surface 165 of the second processing tube 160, forming an inner liquid film 156.

[0049] 3 is a view of the rotating plate 120 shown in FIGS. 1 and 2 , viewed from the upper surface 121. A large number of first pores 130 connecting the upper surface 121 and the lower surface 122 of the rotating plate 120 are formed over the entire upper surface 121 of the rotating plate 120. The liquid to be treated 10 supplied to the upper surface 121 of each rotating plate 120 through the plurality of openings 18 formed in the introduction passages 16 spreads along the upper surface 121 from the center toward the outer periphery of the rotating plate 120 as the rotating plate 120 rotates, forming an upper surface liquid film 124. In each of the many first pores 130 formed in the rotating plate 120, a portion of the liquid to be treated 10 present on the upper surface 121 of the rotating plate 120 enters the first pore 130 due to capillary action or the intermolecular adsorptive force with the liquid to be treated 10 that previously entered the first pore 130. The liquid to be treated 10 that has entered the inside of the first fine holes 130 swells due to surface tension at the openings on the lower surface of the many first fine holes 130, and rotates at high speed together with the first fine holes 130. The liquid to be treated 10 that has swelled at the openings on the lower surface of the first fine holes 130 forms a lower surface liquid film 128 that moves along the lower surface 122 of the rotating plate 120 toward the outer periphery of the rotating plate 120 due to the action of a large centrifugal force.

[0050] As the liquid to be treated 10 present on the lower surface 122 of the rotating plate 120 moves toward the outer periphery, the suction force between the liquid to be treated 10 present on the lower surface 122 and the liquid to be treated 10 inside the first fine holes 130 draws the liquid to be treated 10 inside the first fine holes 130 toward the lower surface 122, and the strong adsorption force generated between the liquid to be treated 10 inside the first fine holes 130 and the liquid to be treated 10 on the upper surface 121 draws the liquid to be treated 10 on the upper surface 121 into the first fine holes 130. In this way, part of the liquid to be treated 10 on the upper surface 121 moves to the lower surface 122 through the multiple first fine holes 130. The suction force between the liquid to be treated 10 forming the lower surface liquid film 128 and the liquid to be treated 10 present in the first fine holes 130 is strong, and the lower surface liquid film 128 is formed by the liquid to be treated 10 that has entered the multiple first fine holes 130 formed in the rotating plate 120. Most of the liquid to be treated 10 does not fall but remains adsorbed to the lower surface 122 of the rotating plate 120, forming a liquid film 128 on the lower surface.

[0051] The lower surface 122 of the rotating plate 120 has first micropores 130 arranged in concentric rows from the center to the outer periphery, and the liquid to be treated 10 is supplied from the upper surface 121 to the lower surface 122 in the same manner through each of the first micropores 130. The rotating plate 120 is circular, and its surface area rapidly expands as the diameter of the rotating plate 120 increases. Therefore, as the lower surface liquid film 128 formed along the lower surface 122 of the rotating plate 120 moves toward the outer periphery, the surface area of ​​the lower surface 122 expands significantly, even though the liquid to be treated 10 is constantly being supplied from the first micropores 130. Therefore, even if the liquid to be treated 10 supplied from the multiple first micropores 130 is supplied to the lower surface 122, the liquid to be treated 10 remains adsorbed to the lower surface 122. Furthermore, the effect of centrifugal force increases, accelerating the movement speed of the lower surface liquid film 128 toward the outer periphery. As a result, the upper surface liquid film 124 and the lower surface liquid film 128 form liquid films that become thinner as they move in the circumferential direction. Furthermore, the liquid to be treated 10 inside the numerous first pores 130 and the upper surface liquid film 124 and the lower surface liquid film 128 attract each other, forming stable upper surface liquid films 124 and lower surface liquid films 128. This leads to a significant increase in the amount of liquid treated per unit time.

[0052] In this embodiment, it is possible to utilize a strong suction force generated between the liquid to be treated 10 inside the first fine holes 130 at the openings on the upper surface 121 or lower surface 122 of the liquid to be treated 10 that has entered the inside of the first fine holes 130 and the liquid to be treated 10 present on the upper surface 121 or lower surface 122. The liquid to be treated 10 that has entered the inside of the first fine holes 130 is temporarily held inside the first fine holes 130. A strong adsorption force acts between the held liquid to be treated 10 and the upper surface liquid film 124, attracting each other. Furthermore, a similarly strong adsorption force acts between the liquid to be treated 10 and the lower surface liquid film 128, attracting each other. As a result, the rotational force of the rotating plate 120 is strongly transmitted to the upper surface liquid film 124 and the lower surface liquid film 128. Therefore, even when the upper surface 121 is rotated at high speed, the rotational force is efficiently transmitted to the upper surface liquid film 124 and the lower surface liquid film 128, and thin upper surface liquid films 124 and lower surface liquid films 128 can be formed on the upper surface 121 and lower surface 122 of the rotating plate 120. Furthermore, the mutual attractive force prevents the liquid to be treated 10 from dropping from the lower surface 122, and the lower surface liquid film 128 can be formed along the lower surface 122. Moreover, the upper surface liquid film 124 and the lower surface liquid film 128 spread widely, forming a large surface area. This greatly increases the effective area where liquid treatment can be performed.

[0053] Moreover, looking at the state over a short period of time, the liquid to be treated 10 held in the first fine holes 130 is bound to the upper surface liquid film 124 and the lower surface liquid film 128 by a strong suction force, so that the upper surface liquid film 124 and the lower surface liquid film 128 are held on the upper surface 121 and the lower surface 122 of the rotating plate 120. Furthermore, if the first fine holes 130 were not present, a very high proportion of the liquid to be treated 10 would be repelled from the upper surface 121 by the rotation of the rotating plate 120. In contrast, in this embodiment, the proportion of the liquid to be treated 10 that forms the upper surface liquid film 124 is greatly increased. Furthermore, the lower surface liquid film 128 is formed by the first fine holes 130. As a result, the amount of the liquid to be treated 10 held on the rotating plate 120 is greatly increased. By increasing the amount held by the rotating plate 120, it is possible to significantly increase the capacity of liquid treatments such as degassing of gas dissolved in the liquid 10 to be treated by the rotating plate 120, replacing the dissolved gas dissolved in the liquid 10 to be treated with another gas, and sterilization treatment using high-temperature steam. When improvements to the first treatment pipe 150 and the second treatment pipe 160, which will be described below, are also included, a comparison with a prototype shows that the treatment amount per unit time of the liquid 10 to be treated increases by more than five times, nearly ten times, compared to the conventional liquid treatment device 100.

[0054] The first pores 130 formed in the rotating plate 120 have a circular or elliptical cross section at right angles between the upper surface 121 and the lower surface 122, with the diameter of the circle or the length of the short side of the ellipse being 10 mm or less and preferably 0.1 mm or more. The optimal value for the diameter of the circle or the length of the short side of the ellipse varies depending on the type of liquid 10 to be treated, but considering that the device can be used with various liquids and from the perspective of improving the treatment capacity, it is more preferable that the diameter of the circle or the length of the short side of the ellipse be 5 mm or less and 0.5 mm or more.

[0055] The shape of the opening of the first fine hole 130 may of course be a shape other than a circle or an ellipse, but in consideration of ease of cleaning the atomization treatment device 110, it is desirable that the shape of the opening of the first fine hole 130 be a shape without corners, that is, a circle or an ellipse.

[0056] A second rotating plate 140 is provided below the plurality of rotating plates 120. In this embodiment, the second rotating plate 140 does not have the first fine holes 130 formed therein. However, the second rotating plate 140 may of course have the first fine holes 130 formed therein. In this case, the processing volume per unit time will be further increased. Conceptually, there may be one or more rotating plates 120 positioned above the second rotating plate 140, for example, five to ten. The number of rotating plates 120 can be increased based on the required processing volume.

[0057] In this embodiment, a second rotating plate 140 without first pores 130 is provided below the plurality of rotating plates 120. By providing a large number of first pores 130 in the rotating plate 120, a lower liquid film 128 can be formed along the lower surface 122 of the rotating plate 120. However, the lower liquid film 128 is unstable, and it is desirable to consider the possibility that the liquid to be treated 10 will fall downward from the lower liquid film 128. By providing the second rotating plate 140, the liquid that falls downward from the lower surface 122 of the rotating plate 120 can be received by the second rotating plate 140, allowing processing to continue using the second rotating plate 140.

[0058] 1 and 2. The rotating plate 120 is supported by a plurality of support posts 148 (four support posts 148 in this embodiment) fixed to the rotating cover 116. The support posts 148 support the rotating plate 120 and the second rotating plate 140 on the rotating cover 116. As described above, when the rotating cover 116 is driven to rotate by the motor 22, the rotating plate 120 and the second rotating plate 140 rotate together with the rotating cover 116.

[0059] In Figure 3, the introduction passage 16 and the opening 18 are depicted inside the through-hole 127 of the rotating plate 120 to clearly show the relationship between the introduction passage 16 and the rotating plate 120, and the relationship between the opening 18 formed in the introduction passage 16 and the rotating plate 120. The thickness of the rotating plate 120 and the second rotating plate 140 is 5 mm or less and 0.5 mm or more. A thinner plate is lighter, which reduces the load on bearings such as the external bearing 26 and the internal bearing 34. Stainless steel, which is resistant to corrosion, is desirable as a material.

[0060] The outer peripheral edge 123 of the rotating plate 120 is circular and centered on the center of the introduction passage 16. The diameter of each of the rotating plates 120 is set to maintain a predetermined distance from the inner peripheral surface 103 of the sealed container 102, the inner peripheral surface 165 of the first process tube 150, and the inner peripheral surface 165 of the second process tube 160. As shown in FIGS. 1 and 2, having different diameters for the rotating plates 120 provides the following effects. At the outer peripheral edge 123 of each rotating plate 120, the upper surface liquid film 124 formed on the upper surface 121 of the rotating plate 120 becomes upper surface liquid droplets 125 from the outer peripheral edge 123 and collides with the respective inner peripheral surfaces 165, forming the inner liquid film 156. Furthermore, the lower surface liquid film 128 formed on the lower surface 122 of the rotating plate 120 becomes lower surface liquid droplets 129 and collides with the respective inner peripheral surfaces 165, forming the inner liquid film 156.

[0061] The first process tube 150 and the second process tube 160 described below are provided inside the sealed vessel 102, and their radii gradually decrease by a predetermined length. Therefore, among the multiple rotating plates 120, the rotating plate 120 provided at the bottom in the vertical direction utilizes a process tube located further inward, and the radius of the lower rotating plate 120 decreases depending on the process tube being utilized. The second rotating plate 140 located at the bottom utilizes the process tube located most inward, i.e., the second process tube 160 in the embodiment shown in FIG. 3 . Therefore, the radius of the second rotating plate 140 is determined in accordance with the radius of the second process tube 160, and is the shortest.

[0062] In FIG. 3 , the rotating plate 120 has a large number of first micropores 130 arranged concentrically. The number of first micropores 130 arranged on a concentric circle increases as the distance between the first micropores 130 increases along the concentric circle. By making the spacing between the first micropores 130 arranged on the concentric circle as uniform as possible and the spacing between the first micropores 130 the same as the spacing between the first micropores 130 on the other concentric circles, the suction force generated between the liquid to be treated 10 located inside the first micropores 130 and the liquid to be treated 10 in the upper surface liquid film 124 or the lower surface liquid film 128 on the rotating plate 120 is made uniform. This makes the upper surface liquid film 124 and the lower surface liquid film 128 uniform and stable on the upper surface 121 or the lower surface 122 of the first micropores 130. This improves the efficiency of liquid treatment on the surfaces of the upper surface liquid film 124 and the lower surface liquid film 128.

[0063] (3) Configuration and Effects of the First Process Tube 150 and the Second Process Tube 160 FIGS. 1 and 2 show the arrangement and shape of the first process tube 150 and the second process tube 160. The first process tube 150 and the second process tube 160 have a circular, i.e., tubular, shape. The inner surface of the sealed container 102 has a circular tubular shape, and the inner circumferential surface 103 of the sealed container 102 also has a circular tubular shape. The first process tube 150 and the second process tube 160 are arranged concentrically inside the sealed container 102. The outer circumferential edge 123 of the rotating plate 120 and the outer circumferential edge 123 of the second rotating plate 140 also have a concentric relationship with the inner circumferential surface 103 of the sealed container 102.

[0064] The upper surface liquid film 124 and the lower surface liquid film 128 formed on the upper surface 121 and the lower surface 122 of at least the uppermost rotating plate 120 among the multiple rotating plates 120 become upper surface liquid droplets 125 and lower surface liquid droplets 129 at the outer circumferential edge 123 of the rotating plate 120, and collide with the inner circumferential surface 103 of the sealed container 102 to form an inner liquid film 156. The liquid processing described above is performed in the state of the upper surface liquid droplets 125 and the lower surface liquid droplets 129, and the liquid processing described above is further performed in the state of the formed inner liquid film 156. The upper surface liquid droplets 125 and the lower surface liquid droplets 129 formed by the rotating plate 120 provided below the upper surface liquid droplets 125 and the lower surface liquid droplets 129 provided by the rotating plate 120 provided below the upper surface liquid droplets 125 and the lower surface liquid droplets 129 provided below the upper surface liquid droplets 125 and the lower surface liquid droplets 129 formed by the rotating plate 120 provided below the upper surface liquid droplets 125 and the lower surface liquid droplets 129, which collide with the inner circumferential surface 165 of the first processing tube 150 to form an inner liquid film 156, and the liquid processing described above is performed in the inner liquid film 156.

[0065] A plurality of processing tubes, such as a first processing tube 150 and a second processing tube 160, are provided inside the sealed container 102, and the above-described liquid processing is performed on the inner peripheral surface 103 of the sealed container 102 and in the first processing tube 150 and the second processing tube 160. As an example, in this embodiment, the first processing tube 150 and the second processing tube 160 are provided inside the sealed container 102. The number of these processing tubes can be freely set. Furthermore, one processing tube can process the liquid not only from one rotating plate 120, but also from the upper surface droplets 125 and the lower surface droplets 129 from multiple rotating plates 120.

[0066] A large number of fine holes 152 are formed in the first process pipe 150 and the second process pipe 160 over the entire surface of the first process pipe 150 and the second process pipe 160, which are cylindrical in shape. Upper surface liquid droplets 125 and lower surface liquid droplets 129 flying from the rotating plate 120 and the second rotating plate 140 collide with the inner circumferential surface 165 at the upper end of the first process pipe 150 and the second process pipe 160, forming an inner liquid film 156 that flows along the inner circumferential surface 165 of the first process pipe 150 and the second process pipe 160. The inner liquid film 156 descends due to gravity, and the liquid to be treated 10 enters the numerous fine holes 152 during the descent. The liquid to be treated 10 that has entered the fine holes 152 passes through the fine holes 152 and forms an outer liquid film 154 on the outer circumferential surface 163 of the first process pipe 150 and the second process pipe 160.

[0067] In the first processing pipe 150 and the second processing pipe 160, an inner liquid film 156 and an outer liquid film 154 are formed on the inner peripheral surface 165 and the outer peripheral surface 163, respectively. A suction force acts between the liquid to be processed 10 forming the inner liquid film 156 and the outer liquid film 154 and the liquid to be processed 10 located inside the numerous pores 152, and this suction force suppresses the downward speed of the inner liquid film 156 and the outer liquid film 154.

[0068] The first method for improving the processing capacity of the first processing tube 150 and the second processing tube 160 is to increase the processing area. Increasing the processing area allows for an increase in processing volume as the area increases. The second method is to extend the processing time. In conventional devices, for example, the inner liquid film 156 of the liquid to be processed 10 formed on the inner surface of the first processing tube 150 falls in a short time, making it impossible to ensure sufficient processing time for the inner liquid film 156 to process the liquid. In this embodiment, it is possible to simultaneously solve the problems of increasing the processing area and extending the processing time for the liquid. That is, in this embodiment, a large number of pores 152 are formed over the entire surface of each of the first processing tube 150 and the second processing tube 160. These pores 152 solve the above two problems.

[0069] Conventional products utilize only the inner surface of the first process pipe 150 or the second process pipe 160. In this embodiment, by forming a large number of pores 152 in each of the first process pipe 150 and the second process pipe 160, it is possible to form an inner liquid film 156 and an outer liquid film 154 on both the inner circumferential surface 165 and the outer circumferential surface 163 of the first process pipe 150 or the second process pipe 160. This allows a significant increase in the processing area for liquid processing.

[0070] Another very important effect is that the liquid to be treated 10 is retained inside the pores 152, and this retained liquid to be treated 10 generates a mutual attraction force between the retained liquid to be treated 10 and the inner liquid film 156 and the outer liquid film 154, significantly slowing down the descent speed of the inner liquid film 156 and the outer liquid film 154 at the openings on both the inner circumferential surface 165 and the outer circumferential surface 163 of the pores 152. Specifically, the first treatment pipe 150 and the second treatment pipe 160 have a large number of pores 152 formed therein, and the liquid to be treated 10 is stored inside the pores 152. A strong suction force is generated between the stored liquid to be treated 10 and the liquid to be treated 10 constituting the inner liquid film 156 and the outer liquid film 154. The pores 152 not only have the effect of generating the outer liquid film 154, but also generate a strong adsorption force between the liquid to be treated 10 present inside the pores 152 and the inner liquid film 156 and the outer liquid film 154. This adsorption force significantly slows down the descending speed of the inner liquid film 156 and the outer liquid film 154. The time it takes for the inner liquid film 156 and the outer liquid film 154 to descend and mix with the treated liquid 70 can be extended. Liquid treatment of the liquid to be treated 10 is continued, and the amount of liquid treated is greatly increased compared to the conventional method. From the perspective of achieving the same liquid treatment as the conventional method, the amount of liquid to be treated 10 that can be introduced into the sealed container 102 from the treatment liquid inlet 14 via the introduction passage 16 can be greatly increased. Prototype results show that it is possible to increase this amount by about 5 to 10 times.

[0071] In reality, when liquid treatment such as degassing of the liquid to be treated 10, replacement of dissolved gases, and sterilization reaches a predetermined state, the liquid treatment stops even if the treatment time is long. However, even if the supply amount to the atomization treatment device 110 through the introduction passage 16 is increased in such a state, the target treatment state can be sufficiently ensured. Therefore, with the objective of ensuring the same quality of liquid treatment, the treatment amount of the liquid to be treated 10 per unit time can be greatly increased in the device shown in this embodiment.

[0072] Here, metals such as stainless steel, which have excellent corrosion resistance, can be used for the first process tube 150 and the second process tube 160. Since not much load is applied, the thickness is preferably 0.5 mm or more and 5 mm or less. The cross section perpendicular to the depth direction of the pores 152 may be circular or elliptical. The diameter of the circle or the length of the short side of the ellipse is preferably 10 mm or less and 1 mm or more. The more pores 152 there are, the better.

[0073] (4) Effects of the gas inlet 52 and exhaust device 56 In Fig. 1, in order to remove dissolved gases dissolved in the liquid 10 to be treated, excess processing gas 40 introduced from the gas inlet 42 to replace the dissolved gases, and excess high-temperature steam introduced for sterilization, these gases are taken in through the gas inlet 52 and led to the exhaust device 56 via the exhaust pipe 54 and exhausted. In this embodiment, the gas inlet 52 is located close to the center directly below the atomization treatment device 110.

[0074] The dissolved gases, excess processing gas 40, and high-temperature steam described above exist in a dispersed state within the sealed container 102. Therefore, by providing a gas inlet 52 inside the sealed container 102, it is possible to suck in the gas to be discharged. However, it is desirable to avoid as much as possible the process of sucking the target liquid 10 or the treated liquid through the gas inlet 52 and sending it to the exhaust device 56 via the discharge pipe 54 for discharge. For this reason, it is desirable to provide the gas inlet 52 in a location that minimizes the possibility of mixing in floating target liquid 10 or treated liquid. The second rotating plate 140 at the bottom of the atomization treatment device 110 does not have a first fine hole 130. By locating the gas inlet 52 close to and below the center, it is possible to locate the gas inlet 52 in a location with the fewest fine particles of the target liquid 10 or treated liquid 70, thereby preventing fine particles of the target liquid 10 or treated liquid 70 from being sucked in through the gas inlet 52.

[0075] 3. Description of Features and Effects of the Examples (1) Effects of the Atomization Treatment Device 110 As described above, a large number of first fine holes 130 are formed in the rotating plate 120 of the atomization treatment device 110. In addition to the upper surface liquid film 124, a lower surface liquid film 128 can be formed on the lower surface 122. This increases the effective surface area for liquid treatment of the liquid to be treated 10, improving treatment capacity. Furthermore, by utilizing the liquid to be treated 10 moving from the upper surface 121 to the lower surface 122 via the first fine holes 130, the liquid to be treated 10 inside the first fine holes 130 and the upper surface liquid film 124 and the lower surface liquid film 128 can be stably held. Furthermore, the amount of the liquid to be treated 10 that splashes can be significantly reduced without contributing to the formation of the upper surface liquid film 124 or the lower surface liquid film 128. The amount of the liquid to be treated 10 held on the upper surface 121 and lower surface 122 of the rotating plate 120 and inside the first pores 130 can be increased, and the amount of the liquid to be treated 10 per unit time can be increased. The number of rotating plates 120 can be increased as needed, in which case the amount of treatment can be further increased.

[0076] The first pores 130 are holes with a circular or elliptical cross section perpendicular to the depth direction, making them relatively easy to clean. The rotating plate 120 and the second rotating plate 140 are made of stainless steel with a thickness of 0.5 mm to 5 mm. This provides significant benefits, as well as greater stain resistance and durability.

[0077] In this embodiment, a second rotating plate 140 without first pores 130 is provided below the rotating plate 120 with first pores 130 formed therein. Although the lower surface liquid film 128 is strongly adsorbed by the liquid to be treated 10 located inside the numerous first pores 130, there is still a possibility that some of the liquid to be treated 10 will fall from the lower surface liquid film 128 and fall into the treated liquid 70 below without being sufficiently treated. By providing the second rotating plate 140 at the bottom, the liquid to be treated 10 that falls from the lower surface 122 of the rotating plate 120 can be received by the upper surface 121 of the second rotating plate 140, allowing the liquid to be treated.

[0078] (2) Effects of the First Processing Pipe 150 and the Second Processing Pipe 160 The diameters of the multiple rotating plates 120 and the second rotating plates 140 of the atomization treatment device 110 are gradually reduced toward the bottom. This allows the first processing pipes 150 and the second processing pipes 160 to be provided in correspondence with the multiple rotating plates 120 and the second rotating plates 140, thereby improving the processing capacity of the treatment target liquid 10 after liquid treatment in the atomization treatment device 110. This ultimately increases the processing volume of the treatment target liquid 10 per unit time. When the number of rotating plates 120 and the second rotating plates 140 in the atomization treatment device 110 is increased, the diameters of the rotating plates located at the bottom can be gradually reduced, thereby increasing the number of first processing pipes 150 and the second processing pipes 160 corresponding to the rotating plates 120 constituting the atomization treatment device 110. This method allows the processing capacity to be increased as needed. It is possible to increase the number of corresponding rotating plates 120 and second rotating plates 140 for processing tubes such as the first processing tube 150 and the second processing tube 160. The first processing tube 150 and the second processing tube 160 are provided with a large number of fine holes 152 as described below, which improves the liquid processing capacity of the first processing tube 150 and the second processing tube 160, and can therefore be adequately accommodated even if the number of corresponding rotating plates 120 is increased.

[0079] A large number of fine holes 152 are formed penetrating the first treatment pipe 150 and the second treatment pipe 160. This allows an outer liquid film 154 and an inner liquid film 156 to be formed on both sides of the first treatment pipe 150 and the second treatment pipe 160, greatly increasing the effective treatment area for liquid treatment and therefore the treatment capacity.

[0080] As described above, by retaining the liquid 10 to be treated in the pores 152 for a predetermined time, the molecules of the liquid 10 to be treated constituting the outer liquid film 154 and the inner liquid film 156 attract each other, and the rate at which the outer liquid film 154 and the inner liquid film 156 fall in the first treatment pipe 150 and the second treatment pipe 160 can be significantly reduced. This makes it possible to extend the time for which liquid treatment is carried out. As a result, the treatment capacity of the first treatment pipe 150 and the second treatment pipe 160 is significantly increased.

[0081] The liquid to be treated 10 usually has a high surface tension. That is, the attractive force between the molecules that make up the liquid is strong. A strong attractive force acts between the liquid to be treated 10 present inside the pores 152 and the outer liquid film 154 or inner liquid film 156, significantly suppressing the rate at which the outer liquid film 154 or inner liquid film 156 falls. This increases the time it takes for the liquid to reach the treated liquid 70. This also significantly increases the time the liquid to be treated 10 is treated. Therefore, even if the amount of liquid to be treated 10 introduced into the atomization treatment device 110 via the introduction passage 16 is significantly increased, sufficient treatment is possible. Measurements using a prototype showed that the same treatment quality as conventional products could be maintained even if the amount of liquid to be treated 10 introduced per unit time was increased by 10 times.

[0082] (3) Effects of the treatment liquid introduction section 14 and the rotary drive device 20 The treatment target liquid 10 is introduced into the center of the atomization treatment device 110 from the center of the external bearing 26 or internal bearing 34 in the rotary drive device 20 through the vertically long introduction passage 16. Because the atomization treatment device 110 rotates at high speed, there is a possibility that the temperature of the external bearing 26 or internal bearing 34 may rise. This temperature rise has an adverse effect on durability, etc. As described above, the supply amount of the treatment target liquid 10 can be significantly increased compared to conventional products. Because the external bearing 26 or internal bearing 34 is provided on the outer periphery of the introduction passage 16 through which the treatment target liquid 10 is introduced, the temperature rise of the external bearing 26 or internal bearing 34 can be suppressed by the treatment target liquid 10.

[0083] Conventionally, an inlet for introducing the liquid to be treated 10 was provided on the upper side 104, and a pipe was also provided above the atomization treatment device 110 to guide the introduced liquid to be treated 10 to the center of the atomization treatment device 110. In this embodiment, the above-mentioned pipe is unnecessary, and the atomization treatment device 110 can be disposed close to the upper side 104. This allows the distance between the atomization treatment device 110 and the bottom 109 of the main sealed container 102 to be increased. This allows the vertical length of the first treatment tube 150 and the second treatment tube 160 to be increased, thereby increasing the effective treatment area of ​​the first treatment tube 150 and the second treatment tube 160. As a result, the amount of the liquid to be treated 10 processed by the treatment device 100 per unit time can be increased.

[0084] The rotational force of the motor 22 is transmitted to the atomization treatment device 110 by a magnetic coupling across an isolation wall 106 that separates the sealed container 102 from the outside. The rotary drive device 20, the treatment liquid introduction part 14, and the introduction passage 16 can be integrally arranged in the same direction. Therefore, the overall structure of the liquid treatment device 100 is simplified.

[0085] 4. Method of Using the Liquid Treatment Apparatus 100 of the Present Embodiment (1) When Used as a Treatment Apparatus for Degassing the Liquid 10 to be Treated When the liquid treatment apparatus 100 shown in FIG. 1 is used for degassing the liquid 10 to be treated, the liquid 10 to be degassed is introduced from the supply amount control device 12 into the atomization treatment apparatus 110 via the introduction passage 16. The gas introduction section 42 is closed, and the treatment gas 40 is not introduced. The exhaust device 56 is operated to reduce the air pressure inside the sealed container 102 as much as possible. The liquid 10 to be treated is subjected to a degassing process in which dissolved gases in the atomization treatment apparatus 110, the first treatment pipe 150, and the second treatment pipe 160 are discharged from the liquid 10 to be treated. The degassed treated liquid is stored in the bottom 109 of the sealed container 102 as treated liquid 70 and is taken out from the treated liquid outlet 80.

[0086] (2) Method of use as a replacement device for gas dissolved in the liquid to be treated 10 In the case where other specified gases are to be dissolved in the liquid to be treated 10 in addition to degassing the gas dissolved therein, the gas to be dissolved is supplied as the processing gas 40 from the gas inlet 42 into the sealed container 102. The processing gas 40 fills the sealed container 102. As in the case described above, the liquid to be treated 10 is supplied from the supply amount control device 12 through the inlet passage 16 to the atomization treatment device 110.

[0087] In the atomization treatment device 110, the first treatment pipe 150, and the second treatment pipe 160, gas dissolved in the liquid to be treated 10 is degassed. In addition, liquid treatment is performed in which the treatment gas 40 introduced from the gas introduction part 42 is dissolved in the newly introduced liquid to be treated 10. The gas degassed from the liquid to be treated 10 and the excess of the treatment gas 40 introduced from the treatment gas introduction part 42 are taken in from the gas intake port 52 and discharged as unnecessary gas 50 via the discharge pipe 54. The state in which the dissolved gas in the liquid to be treated 10 has been replaced with the treatment gas 40 is stored in the bottom 109 of the sealed container 102 as treated gas 70 and is discharged from the treated liquid discharge part 80.

[0088] (3) Method of Use as a Sterilization Apparatus High-temperature steam for sterilizing the liquid to be treated 10 is introduced as the processing gas 40 from the gas inlet 42. High-temperature steam fills the sealed container 102. The liquid to be treated 10 is supplied to the atomization treatment device 110, whereby sterilization is carried out in the atomization treatment device 110, the first treatment pipe 150, and the second treatment pipe 160. The sterilized liquid is stored in the bottom 109 of the sealed container 102 as the treated liquid 70 and is taken out from the treated liquid take-out part 80. The high-temperature steam introduced from the gas inlet 42 is taken in from the gas inlet 52 and discharged from the exhaust device 56 via the discharge pipe 54.

[0089] 5. Liquid Treatment Apparatus 100 as Another Embodiment 5.1 Overview of Liquid Treatment Apparatus 100 as Another Embodiment Shown in FIG. 4 FIG. 4 shows another embodiment of the liquid treatment apparatus 100 as shown in FIG. 1. Components with the same reference numerals as those described in FIGS. 1 to 3 operate in substantially the same manner and achieve substantially the same effects. The liquid to be treated 10 is introduced from a treatment liquid introduction portion 14 into a supply amount control device 12, and is led from the supply amount control device 12 to the upper surface of a rotating plate 120 of an atomization treatment apparatus 110. The atomization treatment apparatus 110 is provided at the top inside an airtight container 102.

[0090] Directly below the atomization treatment device 110, there is provided a rotation drive device 20 for rotating a rotating member of the atomization treatment device 110, for example, a rotating plate 120. The rotation drive device 20 is equipped with a motor and a control device that controls the rotation speed of the motor in response to a command from the operation device 90, but the specific structure of these will be omitted. Note that a description of the power supply device that supplies power to the motor will also be omitted.

[0091] A drive chamber 113 for accommodating the rotary drive device 20 therein is formed directly below the atomization treatment device 110, and the treatment chamber 112 of the sealed container 102 and the drive chamber 113 are separated by a sealed outer wall 114. Ventilation air 62 is sent to the drive chamber 113 via a ventilation device 60 to cool the rotary drive device 20. The rotation shaft of the rotary drive device 20 is connected to the center of a rotary plate 120 by the structure shown in FIG. 1, and the rotary plate 120 is rotated at high speed by the rotary drive device 20.

[0092] The rotating plate 120 is formed with a large number of first fine holes 130 as described with reference to Figures 2 and 3, and the liquid to be treated 10 supplied from the supply amount control device 12 to the upper surface 121 of the rotating plate 120 via the introduction passage 16 (which is present inside and not shown in Figure 4) shown in Figure 1 is introduced to the lower surface 122 via the large number of first fine holes 130. The interiors of the large number of first fine holes 130 are filled with the liquid to be treated 10. As described above, the liquid to be treated 10 moving along the upper surface 121 and the liquid to be treated 10 moving along the lower surface 122 are formed on the upper surface 121 and the lower surface 122 of the rotating plate 120. The liquid to be treated 10 moving along the upper surface 121 and the lower surface 122 is very thin and spreads over a wide area, so it is referred to as an upper surface liquid film 124 and a lower surface liquid film 128. The functions and effects of the upper surface liquid film 124 and the lower surface liquid film 128 have already been described using FIGS. 1 to 3 , and the operation and effects of the embodiment shown in FIG. 4 are the same as those described above, so further description will be omitted. Extremely fine droplets of the liquid to be treated 10 are ejected horizontally from the outer peripheral edge 123 of the rotating plate 120 based on the upper surface liquid film 124 and the lower surface liquid film 128 described above, improving the efficiency of liquid treatment as described above. These functions and effects have already been described above. Note that, to avoid complexity of explanation, only one rotating plate 120 is shown in FIG. 4 , but multiple rotating plates 120 may be provided, as shown in FIGS. 1 and 2 . Furthermore, a second rotating plate 140 may be provided below the rotating plate 120. The functions and effects of providing multiple rotating plates 120 or a second rotating plate 140 have already been described above in the embodiments shown in FIGS. 1 to 3 .

[0093] 1 and 2 may be provided on the outer periphery of the rotating plate 120 and inside the sealed container 102. In this case, the shapes and effects of the first processing tube 150 and the second processing tube 160 are as already described with reference to FIGS.

[0094] The exhaust device 56 serves to exhaust gas from the processing chamber 112. As described above, by bringing the internal state of the processing chamber 112 close to a vacuum state, gas dissolved in the liquid to be processed 10 can be removed. Furthermore, by filling the processing chamber 112 with a processing gas 40 via the gas inlet 42, the processing gas 40 can be dissolved in the liquid to be processed 10. Furthermore, by introducing high-temperature steam as the processing gas 40 into the processing chamber 112, the liquid to be processed 10 introduced into the sealed container 102 can be sterilized. Specific operations, actions, and effects related to these are as described above with reference to FIGS. 1 to 3 . The treated liquid 70, which is the liquid to be processed 10 that has undergone the liquid processing, accumulates at the bottom of the processing chamber 112, and the treated liquid 70 can be extracted from the treated liquid extraction section 80.

[0095] 5.2 Effects of the Liquid Treatment Apparatus 100 of Another Embodiment Shown in FIG. 4 Although the atomization treatment apparatus 110 and the illustration thereof are omitted in the embodiment shown in FIG. 4 , when the first treatment tube 150 and the second treatment tube 160 are provided on the outer periphery of the atomization treatment apparatus 110, the effects are the same as those of the embodiment described with reference to FIGS. 1 to 3 . The difference from the embodiment described with reference to FIGS. 1 to 3 is that a drive chamber 113 is provided directly below the atomization treatment apparatus 110, and a rotary drive unit 20 equipped with a motor is provided inside the drive chamber 113. The area directly below the atomization treatment apparatus 110 contributes little to the liquid treatment of the liquid 10 to be treated. By providing the rotary drive unit 20 in this area, the area that does not contribute to the liquid treatment can be effectively utilized. As a result, the utilization efficiency of the interior of the sealed container 102 is improved, and it is no longer necessary to provide the rotary drive unit 20 above the sealed container 102. The liquid treatment apparatus 100 can be made smaller. Furthermore, the shape of the upper part of the sealed container 102 does not need to be complex, but can be simple. The liquid treatment device 100 is easy to handle, and maintenance for management and upkeep is easy.

[0096] 6. Features of the above-described embodiment [First feature] The first feature of the above-described embodiment is that a liquid treatment device 100 is provided in a sealed container 102 with an atomization treatment device 110 for atomizing a liquid to be treated 10 introduced into the inside of the sealed container 102, and performs a degassing treatment, a dissolved gas replacement treatment, or a sterilization treatment on the liquid to be treated 10 by atomizing the liquid to be treated 10, wherein the atomization treatment device 110 is provided with a rotating plate 120 having a vertical rotation axis, the rotating plate 120 is formed with a large number of first fine holes 130 penetrating between its upper surface 121 and lower surface 122, the liquid to be treated 10 introduced into the sealed container 102 is guided to the upper surface 121 of the rotating plate 120, and the rotation of the rotating plate 120 causes the liquid to be treated 10 to move along the upper surface 121 of the rotating plate 120 toward an outer circumferential edge 123 of the rotating plate 120, Furthermore, a portion of the liquid to be treated 10 guided to the upper surface 121 of the rotating plate 120 enters the interior of the numerous first fine holes 130 formed in the rotating plate 120, and the liquid to be treated 10 that has entered the interior of the numerous first fine holes 130 is guided to the lower surface 122 of the rotating plate 120; due to the mutual attractive forces that arise between the liquid to be treated 10 guided to the lower surface 122 of the rotating plate 120 and the liquid to be treated 10 present inside the numerous first fine holes 130, the liquid to be treated 10 is continuously guided from inside the numerous first fine holes 130 to the lower surface 122 of the rotating plate 120; and further, due to the rotation of the rotating plate 120, the liquid to be treated 10 guided to the lower surface 122 of the rotating plate 120 moves along the lower surface 122 of the rotating plate 120 toward the outer circumferential edge 123 of the rotating plate 120; As the rotating plate 120 rotates, in addition to the liquid to be treated 10 moving along the upper surface 121 toward the outer peripheral edge 123, the liquid to be treated 10 moving along the lower surface 122 of the rotating plate 120 toward the outer peripheral edge 123 is scattered from the outer peripheral edge 123 of the rotating plate 120.

[0097] [Effects Based on First Feature] In a liquid treatment device 100 having the first feature, a rotating plate 120 of an atomization treatment device 110 has a plurality of first pores 130 formed therein, penetrating its upper surface 121 and lower surface 122. The liquid to be treated 10 supplied to the center of the upper surface 121 of the rotating plate 120 forms a thin stream of the liquid to be treated 10 on the upper surface 121 of the rotating plate 120, moving toward the outer circumferential edge 123 of the rotating plate 120. Furthermore, in the liquid treatment device 100 having the first feature, the liquid to be treated 10 enters the plurality of first pores 130, passes through the plurality of first pores 130, and forms a thin stream of the liquid to be treated 10 on the lower surface 122 of the rotating plate 120, moving toward the outer circumferential edge 123 of the rotating plate 120. Molecules constituting the liquid to be treated 10 attract each other. This attractive force manifests itself, for example, as surface tension. Due to this mutual attraction generated between the molecules, the thin-shaped liquid to be treated 10 formed on the upper surface 121 of the rotating plate 120, the liquid to be treated 10 located inside the first fine holes 130, and the lower surface liquid film 128 on the lower surface 126 are attracted to each other, and a flow of the liquid to be treated 10 that moves along the lower surface 122 toward the outer circumferential edge 123 is formed on the lower surface 122. In addition, this also acts to stabilize the flow of the liquid to be treated 10 that spreads and moves along the upper surface formed on the upper surface 121 of the rotating plate 120.

[0098] The thin and stable flow of the liquid to be treated 10 along the upper surface 121 and lower surface 122 of the rotating plate 120 has the effect of significantly improving the processing capacity of the above-mentioned liquid treatments, such as degassing, replacing dissolved gases, and sterilization using high-temperature gas. Furthermore, the lower surface 122 of the rotating plate 120, which was previously unavailable, can now be used. Without the numerous first fine holes 130, i.e., in a state based on conventional technology, even if the liquid to be treated 10 is sprayed onto the lower surface 126 of the rotating plate 120, a stable flow of the liquid to be treated 10 along the lower surface 122 cannot be maintained. By providing the numerous first fine holes 130, it is possible to form a thin and stable flow of the liquid to be treated 10 on the lower surface 122 of the rotating plate 120, significantly improving processing capacity compared to conventional methods.

[0099] In the conventional method, when the liquid to be treated 10 is supplied to the rotating plate 120, the adsorption force between the liquid to be treated 10 and the upper surface 121 of the rotating plate 120 prevents the flow of the liquid to be treated 10 along the upper surface 121 of the rotating plate 120 from increasing, which makes the flow extremely unstable in the conventional device. In other words, due to the rotational movement of the rotating plate 120, most of the liquid to be treated 10 is repelled without forming a flow along the upper surface 121. Therefore, in terms of the processing capacity for the entire liquid to be treated 10, the effective processing time for the liquid processing is significantly shorter than that of the device of the present application, making it difficult to ensure sufficient processing time for the liquid to be treated 10.

[0100] In order to improve the efficiency of liquid treatment of the liquid to be treated 10, it is desirable that a flow of the liquid to be treated 10 with a larger surface area be formed on the upper surface 121 of the rotating plate 120, that the flow move from the center of the rotating plate 120 toward the outer peripheral surface 143 due to the rotational movement of the rotating plate 120, and that the flow then scatter as minute upper surface liquid droplets 125 from the outer peripheral surface 143 of the rotating plate 120. However, as described above, in the conventional method, the rotational movement of the rotating plate 120 actually scatters much of the liquid to be treated 10, and it was actually impossible to ensure sufficient time for performing the liquid treatment.

[0101] In the first feature of the liquid treatment device 100 to which the present invention is applied, a large number of first fine holes 130 are formed in the rotating plate 120, and the liquid to be treated 10 is supplied from the upper surface 121 to the lower surface 122 of the rotating plate 120 through the large number of first fine holes 130. Therefore, the liquid to be treated 10 is present on the upper surface 121 and the lower surface 122 of the rotating plate 120, sandwiching the large number of first fine holes 130. The liquid to be treated 10 located inside the large number of first fine holes 130, the upper surface liquid film 124 formed on the upper surface 121 of the rotating plate 120, and the lower surface liquid film 128 formed on the lower surface 122 of the rotating plate 120 are attracted to each other by the attractive force between the molecules of the liquid to be treated 10 itself, and the upper surface liquid film 124 and the lower surface liquid film 128 of the liquid to be treated 10 are formed on the upper surface 121 and the lower surface 122 of the rotating plate 120. The flow of the liquid to be treated 10 along the upper surface 121 and the flow of the liquid to be treated 10 along the lower surface 122 are maintained in a stable state. Therefore, compared to the conventional device, a large amount of the liquid to be treated 10 forms a thin film-like flow on the upper surface 121 and the lower surface 122 of the rotating plate 120, and these flows spread along the upper surface 121 and the lower surface 122, forming a flow of the liquid to be treated 10 with a wide surface area. The amount of the liquid to be treated 10 that splashes without forming the flow can be significantly reduced compared to the conventional device. As a result, the average processing time for the liquid to be treated 10 can be extended.

[0102] [Second Feature] The second feature of the above embodiment is that, in the liquid treatment device 100 of the first feature, the atomization treatment device 110 comprises a plurality of rotating plates 120 in a vertical direction, each having a large number of first fine holes 130 formed therein, an introduction passage 16 for allowing the liquid to be treated 10 to flow in a shape extending in the vertical direction is formed in the center of each of the plurality of rotating plates 120 arranged in the vertical direction, the introduction passage 16 has a plurality of openings 18 for supplying the liquid to be treated 10 to an upper surface 121 of each of the plurality of rotating plates 120, the liquid to be treated 10 is supplied to the upper surface 121 of each of the plurality of rotating plates 120 from the corresponding openings 18 of the introduction passages 16, and in each of the plurality of rotating plates 120, a part of the liquid to be treated 10 is guided from the upper surface 121 of the rotating plate 120 to a lower surface 122 of the rotating plate 120 through the large number of first fine holes 130, In each of the multiple rotating plates 120, the rotation of the rotating plate 120 causes the liquid to be treated 10 present on the upper surface 121 and the liquid to be treated 10 present on the lower surface 122 to move toward the outer peripheral edge 123 of the rotating plate 120 and to be scattered from the outer peripheral edge 123 of the rotating plate 120.

[0103] [Actions and Effects Based on the Second Feature] In the second feature of the above embodiment, in addition to the actions and effects based on the first feature described above, upper surface liquid droplets 125 are scattered from the outer peripheral edge 123 of each rotating plate 120 based on the flow of the liquid to be treated 10 moving along the upper surface 121 of each of the multiple rotating plates 120, and the liquid to be treated 10 moving along the lower surface liquid film 128 is scattered from the outer peripheral edge 123 of the rotating plate 120. Therefore, compared to conventional liquid treatment devices, the liquid treatment device 100 of the second invention can significantly increase the amount of liquid droplets scattered from the outer peripheral edge 123 of each rotating plate 120. This makes it possible to increase the amount of liquid to be treated 10 treated per unit time. Furthermore, the flow of the liquid 10 to be treated moving along the upper surface 121 and the lower surface 122 is much more stable than in the prior art, and as a result of the effect of the first invention, the upper surface liquid droplets 125 and the lower surface liquid droplets 129 are spread out in the direction of the entire circumference of the rotating plate 120, as described above, and the processing capacity of the liquid processing device 100 for the liquid 10 to be treated is greatly improved.

[0104] [Third Feature] A third feature of the above embodiment is that, in the liquid treatment device 100 having the second feature, a cylindrical first treatment pipe 150 is provided inside the sealed container 102, with the vertical direction being the height direction, and an outer circumferential edge 123 of at least one of the plurality of rotating plates 120 is disposed facing an upper part of the inside of the first treatment pipe 150, and a large number of fine holes 152 are formed in the first treatment pipe 150, penetrating its inner circumferential surface 165 and its outer circumferential surface 163, and upper surface liquid droplets 125 based on the liquid to be treated 10 that has moved along the upper surface 121 of the rotating plate 120 toward the outer circumferential edge 123 and lower surface liquid droplets 129 based on the liquid to be treated 10 that has moved along the lower surface 122 of the rotating plate 120 toward the outer circumferential edge 123 are released from the outer circumferential edge 123 and collide with the inner circumferential surface 165 of the first treatment pipe 150, and an inner liquid film 156 is formed on the inner circumferential surface 165 of the first treatment pipe 150, and A portion of the inner liquid film 156 moves to the outer surface 163 through the numerous pores 152 of the first processing tube 150, forming an outer liquid film 154 on the outer surface 163 of the first processing tube 150, and the degassing process, the dissolved gas replacement process, or the sterilization process is performed on the liquid to be processed 10 forming the inner liquid film 156 and the outer liquid film 154.

[0105] [Effects Based on the Third Feature] In the third feature of the above embodiment, a cylindrical first processing tube 150 is provided on the outside of at least one of the plurality of rotating plates 120. The first processing tube 150 is formed with a number of fine holes 152 penetrating its inner circumferential surface 165 and its outer circumferential surface 163. A part of an inner liquid film 156 formed on the inner circumferential surface 165 of the first processing tube 150 forms an outer liquid film 154 on the outer circumferential surface 163 of the first processing tube 150 through the fine holes 152. A phenomenon occurs in which the inner liquid film 156, the outer liquid film 154, and the liquid to be processed 10 located inside the fine holes 152 attract each other. This significantly reduces the falling speed of the inner liquid film 156 and the outer liquid film 154, and each of them is stabilized and spreads out along the inner circumferential surface 165 and the outer circumferential surface 163. As a result, the processing time for the liquid to be processed 10 comprising the inner liquid film 156 and the outer liquid film 154 is extended. Furthermore, the surface area of ​​the liquid to be treated 10 undergoing the above treatment is stabilized, and the surface area where the liquid treatment is performed is expanded, thereby producing the effect of significantly increasing the amount of the liquid to be treated 10 treated per unit time.

[0106] [Fourth Feature] The fourth feature of the above embodiment is that, in the liquid treatment device 100 having the first feature, the atomization treatment device 110 has a second rotating plate 140 that does not have a first pore 130 below the rotating plate 120 that is arranged vertically, an introduction passage 16 that extends vertically for allowing the liquid to be treated 10 to flow is provided in the center of the rotating plate 120, the liquid to be treated 10 is supplied from the introduction passage 16 to the upper surface 121 of the rotating plate 120 and also supplied to the upper surface 121 in the center of the second rotating plate 140, and the liquid to be treated 10 is not supplied from the introduction passage 16 to the lower surface 122 of the second rotating plate 140.

[0107] [Effects Based on the Fourth Feature] When the rotating plate 120 is shaped so that a lower liquid film 128 is formed on the lower surface 122 of the rotating plate 120, the liquid to be treated 10 constituting the lower liquid film 128 splashes laterally from the outer peripheral edge 123 of the rotating plate 120. However, a portion of the liquid to be treated 10 constituting the lower liquid film 128 may fall downward from the lower liquid film 128 and mix with the treated liquid to be treated 10 stored at the bottom of the sealed container 102, with the liquid to be treated 10 remaining in an insufficient state. As described above, most of the liquid to be treated 10 guided to the lower surface 122 of the rotating plate 120 moves along the lower surface 122 toward the outer peripheral edge 123 due to centrifugal force, but the possibility of it falling from the lower surface 122 of the rotating plate 120 cannot be completely ruled out. From the viewpoint of improving quality, it may be desirable to provide a second rotating plate 140.

[0108] In a fourth feature of the above embodiment, a second rotating plate 140 without a first pore 130 is provided below the rotating plate 120. When the insufficiently treated liquid 10 falls from the lower surface 122 of the rotating plate 120, it is received by the upper surface 121 of the second rotating plate 140, and the insufficiently treated liquid 10 is atomized on the upper surface 121 of the second rotating plate 140 for the liquid treatment. Furthermore, the liquid can be connected to the inner circumferential surface 103, the first processing tube 150, or the second processing tube 160 for liquid treatment. This configuration prevents the insufficiently treated liquid 10 falling from the liquid film 128 on the lower surface of the rotating plate 120 from mixing with the already treated liquid 10. As a result, the quality of the treated liquid 70 can be improved.

[0109] [Fifth Feature] The fifth feature of the above embodiment is that in the liquid gas treatment device 100 having the first feature, a rotary drive device 20 for driving the rotation of a rotating plate 120 provided inside the atomization treatment device 110 is provided on the sealed container 102, a rotation transmission device 45 for transmitting the rotational force of the rotary drive device 20 to the rotating plate 120 of the atomization treatment device 110 is provided between the atomization treatment device 110 and the rotary drive device 20, and an introduction passage 16 for guiding the liquid to be treated 10 to the atomization treatment device 110 is formed penetrating the interior of the rotation transmission device 45.

[0110] [Effects Based on the Fifth Feature] In the fifth feature of the above embodiment, the liquid to be treated 10 is introduced through the rotation transmission device 45. This allows the liquid to be cooled by the liquid to be treated 10. The rotation transmission device 45 rotates the rotating plate 120 at high speed. Therefore, being able to cool the rotation transmission device 45 is extremely effective in maintaining safety, operational stability, and the like. Furthermore, increasing the temperature of the liquid to be treated 10 often leads to improved efficiency in liquid treatment of the liquid to be treated 10.

[0111] [Sixth Feature] The sixth feature of the above embodiment is that in the liquid treatment device 100 having the first feature, a drive chamber 113 is provided immediately below the atomization treatment device 110 inside the sealed container 102, a rotation drive device 20 that drives the rotation of the rotating plate 120 is provided inside the drive chamber 113, and the rotation of the rotating plate 120 of the atomization treatment device 110 is driven by the rotation drive device 20 provided inside the drive chamber 113.

[0112] [Effects Based on the Sixth Feature] The area directly below the atomization treatment device 110 inside the sealed container 102 does not contribute much to the liquid treatment of the treatment target liquid 10. By providing the rotation drive device 20 in this area, the overall size of the liquid treatment device 100 can be reduced. Furthermore, by providing the rotation drive device 20 inside the sealed container 102, it is possible to prevent the structure of the introduction portion of the treatment target liquid 10 into the liquid treatment device 100 from becoming complicated.

[0113] [Seventh Feature] The seventh feature of the above embodiment is that in the liquid treatment device 100 of the first feature, the cross-sectional shape of the numerous first pores 130 formed in the rotating plate 120 perpendicular to the direction from the upper surface 121 to the lower surface 122 of the rotating plate 120 is circular or elliptical.

[0114] [Effects Based on Seventh Feature] The seventh feature of the present invention is that the cross-sectional shape of the multiple first micropores 130 is specified. By making the cross-sectional shape of the multiple first micropores 130 circular or elliptical, the mutual attractive force between the liquid to be treated 10 constituting the upper surface liquid film 124 formed on the upper surface 121 of the rotating plate 120 and the liquid to be treated 10 located inside the first micropores 130 can be uniformed and stabilized. The upper surface liquid film 124 moves toward the outer periphery of the rotating plate 120 as the rotating plate 120 rotates. The same phenomenon occurs between the upper surface liquid film 124 and the lower surface liquid film 128 formed on the lower surface 122 of the rotating plate 120. Furthermore, with regard to the lower surface liquid film 128, if the mutual attractive force between the lower surface liquid film 128 and the liquid to be treated 10 inside the multiple first micropores 130 suddenly changes, the liquid to be treated 10 forming the lower surface liquid film 128 may fall. From this perspective, it is desirable that the cross-sectional shape of the multiple first micropores 130 be circular or elliptical.

[0115] [Eighth Feature] The eighth feature of the above embodiment is that in the liquid treatment device 100 having the seventh feature, the diameter of the circle or the length of the short side of the ellipse of the cross-sectional shape of the first pore 130 formed in the rotating plate 120 is 0.5 mm or more and 5 mm or less.

[0116] [Effects Based on Eighth Feature] In the eighth feature, the liquid to be treated 10 can be stably held inside the numerous first fine holes 130 provided in the rotating plate 120. As a result, a stable suction force is generated between the liquid to be treated 10 held inside the numerous first fine holes 130 and the liquid to be treated 10 present on the upper surface 121 of the rotating plate 120 or the liquid to be treated 10 located on the lower surface of the rotating plate 120, and the upper surface liquid film 124 and the lower surface liquid film 128 of the rotating plate 120 are kept stable. As a result, the processing capacity is stably improved.

[0117] [Ninth Feature] The ninth feature of the above embodiment is that in the liquid treatment device 100 having the third feature, the cross-sectional shape of the numerous pores 152 formed in the first treatment tube 150, perpendicular to the direction from the inner surface 165 to the outer surface 163 of the first treatment tube 150, is circular or elliptical.

[0118] [Effects Based on the Ninth Feature] In the ninth feature, the cross-sectional shape of the numerous pores 152 formed in the first processing pipe 150 is circular or elliptical, without any acute corners. This allows the mutual attractive force acting between the liquid to be processed 10 in the inner liquid film 156 of the first processing pipe 150 and the liquid to be processed 10 located inside the pores 152 to change gradually as the inner liquid film 156 moves downward. As a result, the downward velocity of the liquid to be processed 10 forming the inner liquid film 156 and the outer liquid film 154 can be slowed, and the processing time for liquid processing can be extended in a stable manner. This allows the processing volume per unit time to be maintained stable and further increased. Furthermore, quality can be maintained.

[0119] [Tenth Feature] A tenth feature of the above embodiment is that in the liquid treatment device 100 having the ninth feature, in the cross-sectional shape of the numerous pores 152, the diameter of the circle or the length of the short side of the ellipse is 1 mm or more and 10 mm or less.

[0120] [Effects Based on the Tenth Feature] In the tenth feature, the liquid to be treated 10 can be stably held inside the numerous pores 152 provided in the first process pipe 150. As a result, a stable suction force is generated between the liquid to be treated 10 held inside the numerous pores 152, the liquid to be treated 10 in the inner liquid film 156 of the first process pipe 150, and the outer liquid film 154 of the first process pipe 150, so that the inner liquid film 156 and the outer liquid film 154 of the first process pipe 150 are in a stable state. The falling speed of the inner liquid film 156 and the outer liquid film 154 of the first process pipe 150 is reduced, and the liquid treatment time can be extended. This allows the amount of treatment per unit time to be increased, leading to improved quality of liquid treatment.

[0121] [Eleventh Feature] An eleventh feature of the above embodiment is that, in the liquid treatment device 100 having the fourth feature, an exhaust device 56 is provided for exhausting gas present inside the sealed container 102 to the outside of the sealed container 102, the exhaust device 56 has a gas inlet 52 provided below the second rotating plate 140 for taking in the gas to be exhausted, and the exhaust device 56 takes in the gas present below the second rotating plate 140 from the gas inlet 52 and exhausts it to the outside of the sealed container 102.

[0122] An eleventh feature is that a gas intake port 52 of the exhaust device 56 is provided below the second rotating plate 140, and gas present below the second rotating plate 140 is taken in and discarded outside the sealed container 102. The gas present below the second rotating plate 140 contains the smallest proportion of the liquid to be treated 10 in the middle of liquid treatment. Therefore, by adopting a structure in which the gas present below the second rotating plate 140 is discarded outside the sealed container 102, it is possible to achieve the effect of significantly reducing the amount of the liquid to be treated 10 that is being exhausted in the middle of important liquid treatment.

[0123] 10...Liquid to be treated, 12...Supply amount control device, 14...Treatment liquid introduction part, 16...Introduction passage, 18...Opening, 20...Rotation drive device, 22...Motor, 24...Belt, 26...External bearing, 28...External rotating body, 30...External rotating magnet, 32...Internal rotating magnet, 34...Internal bearing, 36...Internal rotating body, 38...Upper support, 40...Processing gas, 42...Gas introduction part, 45...Rotation transmission device, 50...Unwanted gas, 52...Gas intake port, 54...Discharge pipe, 56...Exhaust device, 70...Treated liquid, 72...Liquid amount measuring device, 74...Output terminal, 80...Treated liquid removal part, 90...Operation device, 100...Liquid treatment device, 102...Sealed container, 103...Inner peripheral surface, 104...Upper edge, 105...Connecting part, 10 6: Isolation wall, 109: Bottom, 110: Atomization treatment device, 116: Rotating cover, 120: Rotating plate, 121: Upper surface, 122: Lower surface, 123: Outer peripheral edge, 124: Upper surface liquid film, 125: Upper surface liquid droplets, 128: Lower surface liquid film, 130: First pore, 140: Second rotating plate, 141: Upper surface, 143: Second disc outer peripheral surface, 144: Upper surface liquid film, 146: ...Liquid particles, 148...Support, 150...First processing tube, 152...First circular pipe pore, 153...First outer surface, 154...First outer liquid film, 155...First inner surface, 156...First inner liquid film, 158...First lower end, 160...Second processing tube, 162...Second circular pipe pore, 164...Second outer liquid film, 165...Second inner surface, 166...Second inner liquid film, 169...Second lower end.

Claims

1. A liquid treatment device in which an atomization treatment device for atomizing a liquid to be treated introduced into the interior of a sealed container is provided inside the sealed container, and by atomizing the liquid to be treated, degassing, displacing dissolved gases, or sterilizing the liquid to be treated is performed, wherein the atomization treatment device comprises a rotating plate having a vertical rotation axis, and the rotating plate has a number of first fine holes formed therein that penetrate between its upper and lower surfaces, the liquid to be treated introduced into the sealed container is guided to the upper surface of the rotating plate, and as the rotating plate rotates, the liquid to be treated moves along the upper surface of the rotating plate toward the outer periphery of the rotating plate, and part of the liquid to be treated that has been guided to the upper surface of the rotating plate enters the interior of the number of first fine holes formed in the rotating plate, and the liquid to be treated that has entered the interior of the number of first fine holes is guided to the lower surface of the rotating plate, a liquid treatment device characterized in that a mutual attractive force generated between the liquid to be treated guided to the lower surface of the rotating plate and the liquid to be treated present inside the numerous first fine holes causes the liquid to be treated to be continuously guided from inside the numerous first fine holes to the lower surface of the rotating plate, and the liquid to be treated guided to the lower surface of the rotating plate moves along the lower surface of the rotating plate toward the outer peripheral edge of the rotating plate due to the rotation of the rotating plate, and the liquid to be treated that moves along the upper surface toward the outer peripheral edge due to the rotation of the rotating plate also splashes from the outer peripheral edge of the rotating plate.

2. A liquid treatment device according to claim 1, wherein the atomization treatment device comprises a plurality of the rotating plates, each having the plurality of first pores formed therein, arranged in a vertical direction; an inlet passage for flowing the liquid to be treated, which has a shape extending in the vertical direction, is formed in the center of each of the plurality of rotating plates arranged in the vertical direction; the inlet passage has a plurality of openings for supplying the liquid to be treated to the upper surface of each of the plurality of rotating plates; the liquid to be treated is supplied to the upper surface of each of the plurality of rotating plates from the corresponding openings of the inlet passages; in each of the plurality of rotating plates, a portion of the liquid to be treated is led from the upper surface of the rotating plate to the lower surface of the rotating plate via the plurality of first pores; and in each of the plurality of rotating plates, the rotation of the rotating plate causes the liquid to be treated present on the upper surface and the liquid to be treated present on the lower surface to move towards the outer peripheral edge of the rotating plate and splash from the outer peripheral edge of the rotating plate.

3. A liquid treatment device according to claim 2, wherein a cylindrical first treatment tube, the vertical direction being the height direction, is provided inside the sealed container, the outer peripheral edge of at least one of the plurality of rotating plates is arranged facing an upper part of the inside of the first treatment tube, the first treatment tube is formed with a number of pores penetrating its inner peripheral surface and its outer peripheral surface, upper surface liquid droplets based on the liquid to be treated that have moved along the upper surface of the rotating plate toward the outer peripheral edge and lower surface liquid droplets based on the liquid to be treated that have moved along the lower surface of the rotating plate toward the outer peripheral edge are released from the outer peripheral edge and collide with the inner peripheral surface of the first treatment tube, forming an inner liquid film on the inner peripheral surface of the first treatment tube, a part of the inner liquid film moves to the outer peripheral surface through the many pores of the first treatment tube, forming an outer liquid film on the outer peripheral surface of the first treatment tube, and the degassing treatment, the dissolved gas substitution treatment, or the sterilization treatment is performed on the liquid to be treated that has formed the inner liquid film and the outer liquid film. A liquid treatment device characterized by:

4. A liquid treatment device as defined in claim 1, wherein the atomization treatment device is provided with a second rotating plate that does not have the numerous first pores below the rotating plate that is arranged vertically, and an inlet passage extending vertically for allowing the liquid to be treated to flow is provided in the center of the rotating plate, and the liquid to be treated is supplied from the inlet passage to the upper surface of the rotating plate and also to the upper surface of the second rotating plate, and the liquid to be treated is not supplied from the inlet passage to the lower surface of the second rotating plate.

5. A liquid treatment device as defined in claim 1, characterized in that a rotary drive device for driving the rotation of the rotary plate provided inside the atomization treatment device is provided above the sealed container, a rotation transmission device for transmitting the rotational force of the rotary drive device to the rotary plate of the atomization treatment device is provided between the atomization treatment device and the rotary drive device, and an introduction passage for guiding the liquid to be treated to the atomization treatment device is formed passing through the interior of the rotation transmission device.

6. A liquid treatment device as defined in claim 1, characterized in that a drive chamber is provided inside the sealed container directly below the atomization treatment device, a rotary drive device for driving the rotation of the rotary plate is provided inside the drive chamber, and the rotation of the rotary plate of the atomization treatment device is driven by the rotary drive device provided inside the drive chamber.

7. A liquid treatment device according to claim 1, wherein the cross-sectional shape of the numerous first pores formed in the rotary plate, taken at a right angle to the direction from the upper surface to the lower surface of the rotary plate, is circular or elliptical.

8. A liquid treatment device according to claim 7, characterized in that the diameter of the circle or the length of the short side of the ellipse of the cross-sectional shape of the first pore formed in the rotating plate is 0.5 mm or more and 10 mm or less.

9. A liquid treatment device according to claim 3, characterized in that the cross-sectional shape of the numerous pores formed in the first treatment pipe, taken at right angles to the direction from the inner peripheral surface to the outer peripheral surface of the first treatment pipe, is circular or elliptical.

10. A liquid treatment device according to claim 9, characterized in that the diameter of the circle or the length of the short side of the ellipse in the cross-sectional shape of the numerous pores is 0.5 mm or more and 10 mm or less.

11. A liquid treatment device according to claim 4, further comprising an exhaust device for exhausting gas present inside the sealed container to the outside of the sealed container, the exhaust device having a gas inlet port below the second rotating plate for taking in the gas to be exhausted, and the exhaust device taking in gas present below the second rotating plate through the gas inlet port and exhausting it to the outside of the sealed container.

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