Conveyance device

Abstract

This conveyance device for substrates comprises: a body having an internal space composed of a front part that has linked thereto a load port where a container for accommodating a substrate is placed and that extends in the device width direction, a rear part that has linked thereto a load lock module provided in a processing device and that faces the front part in the device depth direction, a bottom part where a conveyance robot for conveying a substrate is placed, a ceiling part that faces the bottom part, and a pair of lateral parts that face each other in the device width direction; and a structure that is provided to the bottom part and that has a support base to which the conveyance robot is fixed and a structurally characteristic part extending in the device width direction. The lateral parts are each provided with an opening. The structurally characteristic part has a contiguous surface contiguous with a lateral surface, of the support base, that extends in the device width direction.

Description

Conveyor

[0001] The present disclosure relates to a transport device.

[0002] For example, Patent Document 1 discloses an EFEM (Equipment Front End Module) device for transferring an object to and from a processing device using a transfer robot provided inside a housing.

[0003] International Publication No. 2022 / 197951

[0004] In such EFEM transport devices, there is a strong demand for reducing the on-site footprint (occupied area) of the device.

[0005] Furthermore, as shown in Patent Document 1, during maintenance of a transfer robot, the transfer robot is replaced from the front side (load port side) of the housing. In such cases, the load port must be removed, which reduces the workability of replacement and installation. On the other hand, if the transfer robot is replaced from the side of the housing, a guide structure for the replacement work must be provided inside the housing, which increases the footprint in the depth direction of the device.

[0006] From the above, the technology disclosed herein provides a transport device that transports substrates and the like into and out of a processing device that processes the substrates, and that can efficiently replace transport robots while reducing the device footprint.

[0007] One aspect of the present disclosure is a transport device that loads and unloads substrates into and from a processing device that processes the substrates, the transport device comprising: a front portion that is connected to a load port on which a container that stores the substrates is placed and that extends in the width direction of the device; a rear portion that is connected to a load lock module provided in the processing device and that faces the front portion in the depth direction of the device; a main body portion having an internal space that is composed of a bottom portion on which a transport robot that transports the substrates is placed, a ceiling portion that faces the bottom portion, and a pair of side portions that face each other in the width direction of the device; and a structure provided on the bottom, the structure having a support base to which the transport robot is fixed and a structural feature portion that extends in the width direction of the device, the side portion having an opening, and the structural feature portion having a continuous surface that is continuous with a side surface of the support base that extends in the width direction of the device.

[0008] According to the present disclosure, in a transport device that transports substrates into and out of a processing device that processes the substrates, the footprint of the device can be reduced and the transport robot can be replaced efficiently.

[0009] 1 is a plan view showing an outline of a wafer processing system including a transport device according to a first embodiment; FIG. 2 is a cross-sectional side view of the transport device, showing the state when the door is in a closed state; FIG. 3 is a cross-sectional side view of the transport device, showing the state when the door is in an open state; FIG. 4 is a side view of the transport device; FIG. 5 is a cross-sectional plan view of the transport device; FIG. 6 is a cross-sectional side view of the load port; FIG. 7 is a side view of the rear side of the load port; FIG. 8 is a perspective view of the transport robot; FIG. 9 is a perspective view of the transport robot and a support base; FIG. 10 is a partially enlarged view of the lower part of the main body; FIG. 11 is a cross-sectional view of a part of the transport device that is different from the parts shown in FIGS. 2 and 3; FIG. 12 is a perspective view of the transport robot exchanger; FIG. 13 is a front view of the transport robot exchanger; FIG. 14 is a rear view of the transport robot exchanger; FIG. 15 is a side view for explaining the position of the transport robot exchanger relative to the transport robot and the support base; FIG. 16 is a plan view for explaining the position of the transport robot exchanger relative to the transport robot and the support base; FIG. 17 is an explanatory view showing the state when the transport robot is being carried out of the main body; FIG. 18 is an explanatory view showing a state when the transport robot is being carried out of the main body; FIG. 19 is an explanatory view showing a partial configuration of the transport robot exchanger according to a second embodiment.

[0010] The transfer device according to this embodiment will be described below with reference to the drawings. In this specification and the drawings, elements having substantially the same functional configuration are designated by the same reference numerals, and redundant description will be omitted. In the drawings, the X direction is the width direction of the device, in which a plurality of load ports 101 (described later) are arranged. The Y direction is the depth direction of the device, in which a front wall 121 and a rear wall 122 of a main body 102 of the transfer device 20 (described later) are arranged. The negative side of the Y direction is the front side, and the positive side of the Y direction is the rear side. The Z direction is the vertical direction.

[0011] First Embodiment <Wafer Processing System 1> FIG. 1 is a plan view showing an outline of a wafer processing system 1 including a transfer device 20 according to a first embodiment.

[0012] 1, the wafer processing system 1 includes a processing device 10 and a transfer device 20. The processing device 10 and the transfer device 20 are provided adjacent to each other.

[0013] The processing apparatus 10 is an apparatus for processing a semiconductor wafer (hereinafter, simply referred to as a "wafer") W as a substrate, and includes, for example, a processing module 30 and a vacuum transfer module 40.

[0014] For example, a plurality of processing modules 30 are provided. Each processing module 30 processes the wafer W under a reduced pressure atmosphere, i.e., a vacuum atmosphere. The processing performed by the processing module 30 includes, for example, a film formation process, an etching process, an impurity diffusion process, and the like. Each processing module 30 also includes a vacuum processing chamber 31 in which the above processing is performed on the wafer W under a vacuum atmosphere. Each vacuum processing chamber 31 is connected to a vacuum transfer chamber 41 (described later) of the vacuum transfer module 40 via a gate valve G1.

[0015] The vacuum transfer module 40 includes a vacuum transfer chamber 41 whose interior is maintained under a vacuum atmosphere. The vacuum transfer chamber 41 is configured to be sealable and is formed, for example, in a substantially polygonal shape (a square shape in the illustrated example) in a plan view. The vacuum transfer chamber 41, which is connected to each processing module 30, is also connected to a load lock module 50 (described later). Specifically, the vacuum transfer chamber 41 is connected to a load lock chamber 51 (described later) of the load lock module 50 via a gate valve (not shown). A transfer mechanism 42 for transferring a wafer W is provided within the vacuum transfer chamber 41. The vacuum transfer module 40 transfers the wafer W to and from the vacuum transfer chamber 41 with the vacuum processing chamber 31 and the load lock chamber 51 using the transfer mechanism 42.

[0016] Furthermore, the processing apparatus 10 is provided with a load lock module 50 at the end on the transfer device 20 side. For example, a plurality of load lock modules 50 may be provided. Each load lock module 50 is used to transfer the wafer W between a vacuum atmosphere space and a non-reduced atmosphere, i.e., a normal pressure atmosphere space. Each load lock module 50 has a load lock chamber 51 configured so that the interior atmosphere can be switched between a normal pressure atmosphere and a vacuum atmosphere. The load lock chamber 51 is provided to connect the vacuum transfer module 40 and the transfer device 20.

[0017] The transfer device 20 is a device that transfers wafers W into and out of the processing device 10. Specifically, the transfer device 20 is a device configured to be able to transfer wafers W between a FOUP (Front-Opening Unified Pod) 900, which is a container that accommodates a plurality of wafers W, and the processing device 10 without exposing the wafers W to the external atmosphere. The transfer device 20 has a load port 101 and a main body 102, which is also referred to as an EFEM device.

[0018] The load port 101 is configured so that a FOUP 900 can be placed thereon, and a plurality of load ports (five in the illustrated example) are arranged, for example, along the width direction of the device (X direction).

[0019] The main body 102 is disposed on the rear side (positive side in the Y direction) of the load port 101; specifically, the main body 102 is disposed adjacent to the load port 101 on the rear side thereof. A load lock chamber 51 is connected to the main body 102; specifically, the load lock chamber 51 is connected to the rear side (positive side in the Y direction), for example. The interior of the main body 102 is maintained at atmospheric pressure. A transfer robot 110 is also provided inside the main body 102, which supports and transfers a wafer W. This transfer robot 110 can transfer the wafer W between, for example, a FOUP 900 placed on the load port 101 and the load lock chamber 51.

[0020] The wafer processing system 1 described above is provided with at least one control device C. The control device C processes computer-executable instructions that cause the wafer processing system 1 to perform the various processes described in this disclosure. The control device C may be configured to control each element of the wafer processing system 1 to perform the various processes described herein. In one embodiment, some or all of the control device C may be included in the wafer processing system 1. The control device C may include a processing unit, a storage unit, and a communication interface. The control device C may be implemented, for example, by a computer. The processing unit may be configured to read from the storage unit a program that provides logic or routines that enable various control operations and execute the read program to perform various control operations. This program may be stored in the storage unit in advance or may be acquired via a medium when needed. The acquired program is stored in the storage unit and read from the storage unit by the processing unit for execution. The medium may be various computer-readable storage media or a communication line connected to the communication interface. The storage medium may be temporary or non-temporary. The processing unit may be a CPU (Central Processing Unit) or one or more circuits. The storage unit may include a RAM (Random Access Memory), a ROM (Read Only Memory), a HDD (Hard Disk Drive), a SSD (Solid State Drive), or a combination thereof. The communication interface may communicate with the wafer processing system 1 via a communication line such as a LAN (Local Area Network).

[0021] <Wafer Processing> Next, a description will be given of wafer processing by the wafer processing system 1 configured as above. The following wafer processing is performed under the control of the control device C.

[0022] First, the wafer W is taken out of the FOUP 900 by the transfer robot 110 and carried into the load lock chamber 51 of the load lock module 50. Then, the load lock chamber 51 is sealed and a vacuum atmosphere is created.

[0023] Thereafter, a gate valve (not shown) on the vacuum transfer chamber 41 side of the load lock chamber 51 is opened, and the wafer W is transferred from the load lock chamber 51 to the vacuum transfer chamber 41 by the transfer mechanism 42 .

[0024] Next, after the gate valve is closed, the gate valve G1 for the processing module 30 in which the target processing is to be performed is opened. Subsequently, the wafer W is loaded into the vacuum processing chamber 31 of the target processing module 30 by the transfer mechanism 42. Thereafter, the gate valve G1 is closed, and the desired processing is performed on the wafer W in the processing module 30.

[0025] After the desired processing is completed, the wafer W is returned from the vacuum processing chamber 31 to the FOUP 900 in the reverse order of the procedure used to carry the wafer W from the FOUP 900 to the vacuum processing chamber 31. This completes the series of wafer processing steps.

[0026] <Transport Device 20> Figures 2 and 3 are cross-sectional side views of the transport device 20, with Figure 2 showing the state when a door 180, described below, is in a closed state, and Figure 3 showing the state when the door 180, described below, is in an open state. Figure 4 is a side view of the transport device 20. Figure 5 is a cross-sectional plan view of the transport device 20. Figure 6 is a cross-sectional view of the load port 101. Figure 7 is a side view of the rear side of the load port 101. Figure 8 is a perspective view of the transport robot 110. Figure 9 is a perspective view of the transport robot 110 and the support table 240. Figure 10 is a partially enlarged view of the lower part of the main body 102. Figure 11 is a cross-sectional view of a portion of the transport device 20 different from the portions shown in Figures 2 and 3.

[0027] As shown in FIGS. 2 to 5, the transfer device 20 has the above-mentioned load port 101 and main body 102, and further has a lower housing section 103 for housing various components.

[0028] The main body 102 has a substantially rectangular parallelepiped housing 120. The housing 120 has a front wall 121 as a front portion, a rear wall 122 as a rear portion, side walls 123 as a pair of side portions, a bottom wall 124 as a bottom portion, and a ceiling wall 125 as a ceiling portion.

[0029] The front wall 121 extends in the device width direction (X direction) in a plan view on the front side (negative side in the Y direction) of the main body 102. The front wall 121 includes an upper front wall 121A on the upper side and a lower front wall 121B on the lower side. The lower front wall 121B is provided to protrude forward from the upper front wall 121A.

[0030] The load port 101 and the lower accommodation section 103 are connected to the upper front wall 121A. The lower accommodation section 103 is disposed below the load port 101. The upper front wall 121A is provided with an opening 126 through which the load port 101 is installed. The upper front wall 121A also is provided with an opening 127 which is an opening for loading and unloading the wafer W into and from the lower accommodation section 103.

[0031] The rear wall 122 faces the front wall 121 in the depth direction of the apparatus and extends in the width direction of the apparatus in a plan view on the rear side (positive side in the Y direction) of the main body 102. The load lock module 50 is connected to the rear wall 122. An opening 128 is provided in the rear wall 122 at a position corresponding to the load lock chamber 51. The opening 128 is provided in a portion of the rear wall 122 at approximately the same vertical position as the transfer position in the load lock chamber 51. The transfer position in the load lock chamber 51 is the vertical position of the wafer W when the wafer W is transferred between the load lock chamber 51 and the transfer robot 110.

[0032] The pair of side walls 123 face each other in the width direction of the apparatus and extend in the depth direction of the apparatus in a plan view. Each side wall 123 is provided with an opening 129 for performing maintenance on the main body 102. The opening 129 is configured to be large enough to allow the transport robot 110 to be carried in and out so that the transport robot 110 can be replaced, as will be described later. The opening 129 is provided with a door 130 for opening and closing the opening 129.

[0033] The bottom wall 124 and the top wall 125 face each other in the vertical direction and extend in the horizontal direction (X direction and Y direction).

[0034] The main body 102 has an internal space formed by a front wall 121, a rear wall 122, side walls 123, a bottom wall 124, and a ceiling wall 125. The internal space is vertically divided into a lower transfer space S1 and an upper storage space S2 by a partition wall 131 provided between the bottom wall 124 and the ceiling wall 125. As will be described later, purified gas is supplied from the storage space S2 to the transfer space S1, and the partition wall 131 is provided with an opening 132 for supplying the gas.

[0035] As shown in FIGS. 6 and 7, the load port 101 includes a connection plate 140 , an isolation cover 150 , and a main cover 151 .

[0036] When connected to the main body 102, the connecting plate 140 is attached to the front surface of the upper front wall 121A so as to cover the opening 126. The upper side of the connecting plate 140 extends and protrudes from above the main cover 151. An opening 141, which is an opening for loading and unloading the wafer W, is provided on the upper side of the connecting plate 140 above the isolation cover 150 and the main cover 151. The lower side of the connecting plate 140 extends so as to cover the rear surface of the isolation cover 150 and the rear surface of the main cover 151. A slit 142 extending vertically is provided on the lower side of the connecting plate 140 for raising and lowering an arm 192 of a moving mechanism 190, which will be described later.

[0037] The isolation cover 150 forms an accommodation space S3 between itself and the front surface of the connecting plate 140, for accommodating a moving mechanism 190 (described later). The isolation cover 150 also covers the slit 142 from the front. By providing the isolation cover 150, it is possible to prevent gas in the transfer space S1 of the main body 102 from leaking outside the transfer device 20.

[0038] The main cover 151 forms an accommodation space S4 between the connecting plate 140 and the isolation cover 150, for accommodating the advancing / retreating mechanism 170 (described later). The main cover 151 also covers the advancing / retreating mechanism 170 (described later) and the isolation cover 150. In this embodiment, the main cover 151 covers the front wall and top wall of the isolation cover 150, but does not cover the bottom wall.

[0039] The bottom wall of the isolation cover 150 and the bottom wall of the main cover 151 form the bottom surface of the load port 101. A slide member 152 is provided on the bottom surface of the load port 101. When the load port 101 is attached to the main body 102, the slide member 152 is slid on the upper surface of a first storage section 103A (described below) of the lower storage section 103. When the load port 101 is connected to the main body 102, the slide member 152 is positioned away from the upper surface of the first storage section 103A.

[0040] The load port 101 also includes a stage 160 and a reciprocating mechanism 170 .

[0041] The stage 160 includes a mounting surface 160a for the FOUP 900 that accommodates the wafers W. Specifically, the upper surface of the stage 160 serves as the mounting surface 160a for the FOUP 900. The stage 160 supports the FOUP 900 on the mounting surface 160a. The FOUP 900 placed on the mounting surface 160a is disposed such that a lid 901, which is a door of the FOUP 900, faces the opening 141 of the connecting plate 140. The stage 160 is provided on the upper surface of the main cover 151 described above.

[0042] A nozzle 161 is provided on the stage 160 to supply gas to the FOUP 900. Specifically, the nozzle 161 supplies an inert gas such as nitrogen gas into the FOUP 900 placed on the stage 160. The nozzle 161 is movable by the advancing / retracting mechanism 170, and specifically, is movable together with the stage 160 which is moved by the advancing / retracting mechanism 170. The nozzle 161 protrudes from the bottom surface of the stage 160, with its lower portion protruding into the storage space S4 described above.

[0043] The advancing / retracting mechanism 170 advances and retreats the stage 160 in the horizontal direction. Specifically, the advancing / retracting mechanism 170 moves the stage 160 back and forth to advance and retreat relative to the opening 141. More specifically, the advancing / retracting mechanism 170 moves the stage 160 between a front position and a rear position. The front position is a position where the FOUP 900 is transferred between an externally provided transfer device for the FOUP 900 and the stage 160. The rear position is a position where the wafer W is transferred between the FOUP 900 and the inside of the main body 102 via the opening 141.

[0044] The advancing / retreating mechanism 170 has, for example, a guide 171 and a support member 172. The guide 171 guides the movement of the stage 160 in the depth direction of the device. Specifically, the guide 171 guides the movement of the support member 172, which supports the stage 160, in the front-to-rear direction. The support member 172 has an upper end to which the stage 160 is connected, and a lower end to which the guide 171 extends so as to be movable in the depth direction of the device. The advancing / retreating mechanism 170 is housed in the above-mentioned housing space S4.

[0045] The load port 101 also has a door 180 and a moving mechanism 190 .

[0046] The door 180 opens and closes the opening 141. The door 180 is configured to be able to unlock the lid 901 of the FOUP 900 and to hold the lid 901. When the door 180 is set to the open state while holding the unlocked lid 901, the lid 901 is opened. When the door 180 opens or closes, the door 180 moves within the main body 102 (specifically, within the transfer space S1).

[0047] The movement mechanism 190 functions as an elevator mechanism that opens, closes, and raises and lowers the door 180 and the lid 901. The movement mechanism 190 includes, for example, an actuator 191, an arm 192, and an elevator 193.

[0048] The actuator 191 drives the lifting and lowering of the door 180. Specifically, the actuator 191 drives the lifting and lowering of an elevator 193 that supports the door 180 via an arm 192. The actuator 191 is provided inside the load port 101 so as to extend in the vertical direction (Z direction). The actuator 191 may be an electro-pneumatic actuator such as an air cylinder, or an electro-mechanical actuator.

[0049] The arm 192 supports the door 180 and is driven by an actuator 191. For example, as shown in FIG. 7 , a pair of arms 192 are provided along the width direction (X direction) of the apparatus. The upper end of each arm 192 is connected to the door 180, which may be located inside the main body 102 (specifically, inside the transfer space S1), and the lower end of each arm 192 is connected via an elevator 193 to an actuator 191 located inside the load port 101, i.e., outside the main body 102. To enable the arms 192 to be raised and lowered in this connected state, a slit 142 is provided in the upper front wall 121A of the main body 102, as described above. That is, the upper front wall 121A of the main body 102 is provided with a slit 142 configured to allow the arm 192 to be inserted therethrough and through which the arm 192 passes when the arm 192 is raised and lowered. For example, a slit 142 is provided for each arm 192.

[0050] The lifting body 193 moves up and down along the actuator 191, that is, moves vertically.

[0051] The movement mechanism 190 is configured to be able to move the door 180 in the depth direction of the device (Y direction). For example, an arm 192 that supports the door 180 is connected to an elevator 193 so as to be able to move in the front-rear direction.

[0052] The moving mechanism 190 is accommodated in the accommodation space S4 of the above-described main cover 151. Specifically, the accommodation space S4 accommodates the portion of the moving mechanism 190 located outside the main body 102, i.e., the actuator 191 of the moving mechanism 190, part of the arm 192, and the lifting body 193.

[0053] The moving mechanism 190 also has an actuator (not shown) that drives the forward and backward movement of the door 180. The moving mechanism 190 is controlled by a control device C, and more specifically, the actuators of the moving mechanism 190 and the actuator 191 are controlled by the control device C.

[0054] As shown in FIGS. 2 to 4, the lower accommodating section 103 is made up of a plurality of accommodating sections stacked in the vertical direction, and includes, for example, an upper first accommodating section 103A and a lower second accommodating section 103B.

[0055] The first accommodation section 103A accommodates a function expansion module including at least one of a measurement module that measures a film on the wafer W, an inspection module that inspects the wafer W for defects, and an alignment module that adjusts the orientation position of the wafer W. The opening 127 described above is provided in the upper front wall 121A of the main body 102 at a position corresponding to the first accommodation section 103A.

[0056] The measurement module or inspection module accommodated in first accommodation unit 103A includes, for example, a module having a mounting table (not shown) on which wafer W is placed and configured to be movable in the horizontal direction, and an imaging unit (not shown) that images the wafer W placed on the mounting table and moving in the horizontal direction. Instead of or in addition to this module, the measurement module or inspection module may include a module configured to use the imaging unit (not shown) to image the wafer W supported and moved in the horizontal direction by transfer robot 110 inserted therein through opening 127.

[0057] The second accommodation unit 103B accommodates electrical components including a power supply unit, etc. No opening such as the opening 127 is provided in the second accommodation unit 103B. That is, of the first accommodation unit 103A and the second accommodation unit 103B, only the first accommodation unit 103A, which is located on the upper side, is provided with an opening that serves as a loading / unloading port for the wafer W.

[0058] The main body 102 has a door 200 and a lifting mechanism 210 .

[0059] The door 200 opens and closes the opening 128 in the rear wall 122. The lifting mechanism 210 raises and lowers the door 200 to open and close the opening 128. The door 200 and the lifting mechanism 210 are provided inside the main body 102 (specifically, inside the transfer space S1).

[0060] The lifting mechanism 210 has an actuator (not shown) that drives the lifting and lowering of the door 200. The lifting mechanism 210 is controlled by a control device C, and more specifically, the actuator of the lifting mechanism 210 is controlled by the control device C.

[0061] The main body 102 also includes the transfer robot 110 that supports and transfers the wafer W as described above. Specifically, the transfer robot 110 transfers the wafer W between the opening 141 and the opening 128, etc. The transfer robot 110 is housed in the transfer space S1 described above and placed on the bottom wall 124.

[0062] As shown in FIGS. 8 and 9, the transfer robot 110 has a horizontal arm 220 and a vertical articulated arm 230 as transfer arms.

[0063] The horizontal arm 220 is configured to be able to horizontally transport the wafer W. The horizontal arm 220 is, for example, an articulated arm, and includes a fork 221, a first arm 222, and a second arm 223.

[0064] The fork 221 supports the wafer W at its tip end. The fork 221 is connected to the tip end of a first arm 222 at its base end so as to be rotatable about an axis (hereinafter referred to as the "vertical axis") extending in the vertical direction (Z direction). The first arm 222 is connected to the tip end of a second arm 223 so as to be rotatable about the vertical axis on the base end side. The second arm 223 is connected to the tip of a vertical articulated arm 230 so as to be rotatable about the vertical axis.

[0065] The vertical articulated arm 230 is made up of an articulated arm and is configured to be able to at least raise and lower the horizontal arm 220. In this embodiment, the vertical articulated arm 230 is configured to be able to move the horizontal arm 220 in the vertical direction (Z direction) and the device width direction (X direction). The vertical articulated arm 230 has an arm 231 that is provided so as to be able to pivot in the vertical direction, and a base 232 that is connected to the arm 231 and is fixed to a support stand 240, which will be described later.

[0066] The arm 231 includes, for example, a first arm 231A and a second arm 231B. The horizontal arm 220 is connected to the tip end of the first arm 231A. The first arm 231A is connected to the tip end of the second arm 231B at its base end so as to be rotatable about an axis extending in the depth direction of the device (hereinafter referred to as the "front-rear axis"). The second arm 231B is connected to the upper end of the base 232 so as to be rotatable about the front-rear axis on its base end side.

[0067] The base 232 supports the horizontal arm 220 via the arm 231. The base 232 has a pair of plate-like members 233 and a bottom member 234.

[0068] The pair of plate-shaped members 233 are arranged side by side in the device depth direction (Y direction). Specifically, of the pair of plate-shaped members 233, the first plate-shaped member 233A is arranged in the front (negative side in the Y direction), and the second plate-shaped member 233B is arranged in the rear (positive side in the Y direction). The second arm 231B is pivotally supported between the first plate-shaped member 233A and the second plate-shaped member 233B.

[0069] The plate-shaped member 233 extends vertically within the transfer space S1. When viewed from the depth direction of the device, the plate-shaped member 233 has a substantially isosceles triangular shape that includes a pair of long sides extending vertically and a short side connecting the pair of long sides. In this embodiment, the inside of the second plate-shaped member 233B is open, but this is not limiting.

[0070] A transport support member 235 is provided on the lower front surface of the first plate-shaped member 233A. The transport support member 235 is a handle supported by the transport robot exchanger 300, which will be described later, when the transport robot 110 is replaced by the transport robot exchanger 300. The transport support member 235 protrudes from the front surface of the first plate-shaped member 233A in the device depth direction (Y direction) and extends in the device width direction (X direction).

[0071] The bottom member 234 is disposed so as to connect the lower end of the first plate-shaped member 233A and the lower end of the second plate-shaped member 233B. As shown in FIG. 9 , a positioning structure that can be used to position the transport robot 110 is formed on the bottom surface of the bottom member 234. For example, the bottom member 234 is provided with a plurality of, for example, two, positioning pins 236. The positioning pins 236 are inserted into pin holes 241 formed in a support base 240, which will be described later. Although not shown, a positioning pin may be provided on the support base 240 side, a pin hole may be provided on the bottom surface of the bottom member 234, and the positioning pin on the support base 240 side may be inserted into the pin hole on the bottom surface of the bottom member 234. Note that the positioning structure for the transport robot 110 is not limited to that described in this embodiment, and any structure other than positioning pins may be used.

[0072] 2, 3, and 5, the main body 102 has a support base 240 and a pair of exhaust boxes 250 serving as exhaust units. The support base 240 and the exhaust box 250 constitute a structure in the present disclosure, and the exhaust box 250 constitutes a structural feature in the present disclosure.

[0073] The support base 240 and the pair of exhaust boxes 250 are provided on the bottom wall 124 and arranged side by side in the apparatus width direction (X direction). Specifically, the pair of exhaust boxes 250 are arranged side by side on both sides of the support base 240 in the apparatus width direction. The front surface of the support base 240 extending in the apparatus width direction (negative side surface in the Y direction) is continuous with the front surface of the exhaust box 250. Furthermore, the rear surface of the support base 240 extending in the apparatus width direction (positive side surface in the Y direction) is continuous with the rear surface of the exhaust box 250. In other words, the front and rear surfaces of the exhaust box 250 form a structural feature by forming continuous surfaces with the front and rear surfaces of the support base 240, respectively.

[0074] The support base 240 fixes and supports the transfer robot 110. As shown in Fig. 9, a plurality of, for example, two pin holes 241 are provided on the upper surface of the support base 240 at positions corresponding to the positioning pins 236 of the transfer robot 110 described above. When the transfer robot 110 is placed on the support base 240, the positioning pins 236 are inserted into the pin holes 241. As a result, the transfer robot 110 is fixed at a desired position relative to the support base 240.

[0075] As shown in FIG. 10 , in the transfer robot 110 supported by the support base 240, the transfer support member 235 protrudes forward (toward the negative Y direction) from the front surface of the support base 240. Therefore, the lower front wall 121B, which is the lower region of the front wall 121 corresponding to the transfer support member 235, is provided to protrude forward from the upper front wall 121A. This allows the transfer support member 235 to be accommodated while minimizing the wafer transfer distance between the FOUP 900 and the load lock chamber 51 of the transfer device 20. A first lower space T1, part of which is formed by the transfer support member 235, is formed below the plate-like member 233 on which the transfer support member 235 is provided. For example, as shown in FIG. 10 , the first lower space T1 is formed by a space surrounded by the transfer support member 235, the lower front wall 121B, the first plate-like member 233A, the support base 240, and the bottom wall 124.

[0076] Furthermore, in the transfer robot 110 supported by the support base 240, the second plate-shaped member 233B is disposed so as to protrude rearward (positive side in the Y direction) from the rear surface of the support base 240. As a result, a second lower space T2 is formed below the plate-shaped member 233, with a portion of the space being constituted by the second plate-shaped member 233B protruding from the support base 240. For example, as shown in FIG. 10 , the second lower space T2 is formed by a space surrounded by the second plate-shaped member 233B protruding from the support base 240, the rear wall 122, the support base 240, and the bottom wall 124.

[0077] Although not shown, the first lower space T1 and the second lower space T2 may be arranged in reverse in the device depth direction (Y direction) of the transport device 20. That is, the transport support member 235 may be provided on the second plate-shaped member 233B rather than the first plate-shaped member 233A. In this case, a lower front wall 121B protruding forward is not formed at the lower part of the front wall 121, and a lower rear wall protruding rearward is formed at the lower part of the rear wall 122. In this case, the first lower space T1 is formed by a space surrounded by the transport support member 235, the protruding lower rear wall, the second plate-shaped member 233B, the support base 240, and the bottom wall 124. On the other hand, the second lower space T2 does not protrude forward and is formed by a space surrounded by a surface continuous with the upper front wall 121A, the first plate-shaped member 233A, the support base 240, and the bottom wall 124. In this way, by forming the first lower space T1 by protruding the lower portion of at least one wall (the front wall 121 or the rear wall 122) forward or backward, the width in the device depth direction can be minimized while the structural features can be used as guides when replacing the transport robot, ensuring ease of replacement. Although not shown, the first lower space T1 may not be formed in the device depth direction (Y direction) of the transport device 20, and the second lower space T2 may be disposed in either direction. In other words, the transport support member 235 may not be formed, and the first plate-shaped member 233A and the second plate-shaped member 233B may be configured to protrude further in the device depth direction than the support base 240. In this case, the lower portions of the front wall 121 and the rear wall 122 do not need to protrude forward or backward. This minimizes the number of parts, such as the transport support member 235, in the transport robot 110 while allowing the structural features to be used as guides when replacing the transport robot, ensuring ease of replacement. Although not shown, the second lower space T2 may not be formed in the device depth direction (Y direction) of the transport device 20, and the first lower space T1 may be arranged in either direction. In other words, the transport support material 235 may be provided in both the first plate-shaped member 233A and the second plate-shaped member 233B.

[0078] 2, 3, and 5, the exhaust box 250 is configured to receive the downflow gas from the transfer space S1. In this embodiment, the gas that has flowed into the exhaust box 250 may be returned to the accommodation space S2 via a return path B, which will be described later. Alternatively, the gas may be discharged outside the main body 102 (specifically, for example, into a clean room in which the transfer device 20 is installed) without being returned to the accommodation space S2 via the return path B. In this case, a fan filter unit (not shown) may be provided inside the exhaust box 250.

[0079] As described above, the front surface of the support base 240 is continuous with the front surface of the exhaust box 250, and the rear surface of the support base 240 is continuous with the rear surface of the exhaust box 250. Therefore, the first lower space T1 and the second lower space T2 shown in FIG. 10 also extend to positions facing the exhaust box 250.

[0080] As shown in FIGS. 2 and 3, the main body 102 has a fan filter unit (FFU) 260 as an air blowing unit.

[0081] The FFU 260 supplies purified gas, i.e., gas from which particles and / or molecular contaminants have been filtered, from above to below in the transfer space S1. The FFU 260 is provided in the accommodation space S2 and is supported, for example, by the partition wall 131. As described above, the partition wall 131 has an opening 132 formed therein, and the FFU 260 supplies purified gas to the transfer space S1 through the opening 132.

[0082] In this embodiment, one end of a supply pipe 270 that supplies an inert gas such as nitrogen gas to the accommodation space S2 can be connected to the main body 102. The other end of the supply pipe 270 is connected to a gas supply mechanism 271. The gas supply mechanism 271 includes, for example, an inert gas supply source, a switching valve that switches on / off the supply of the inert gas, and a flow rate adjustment valve that adjusts the flow rate of the inert gas.

[0083] Since the supply pipe 270 as described above is provided, in this embodiment, the FFU 260 can supply purified inert gas to the accommodation space S2.

[0084] In this embodiment, as shown in FIG. 11 , a fan provided in the FFU 260 creates a downward air current in the transfer space S1, thereby circulating the inert gas inside the main body 102. The inert gas may be circulated, for example, through a circulation path formed by the transfer space S1, the storage space S2, and the return path B. That is, the purified inert gas is sent downward from the storage space S2 to the transfer space S1 through the opening 132 by the FFU 260, reaches the lower end of the transfer space S1, and then is returned to the storage space S2 by the exhaust box 250 through the return path B. Furthermore, as described above, if the internal gas of the housing 120 is not circulated, the internal gas may be exhausted to the outside of the apparatus through the exhaust box 250.

[0085] When the return path B is provided, it is provided so as to extend vertically through the transfer space S1 and the storage space S2, and its arrangement can be arbitrarily determined. For example, the return path B may be provided along the rear surface of the front wall 121 of the main body 102, or, as shown in FIG. 11 , it may be provided inside the pillars 133 that constitute the main body 102. When the return path B is provided inside the pillars 133 that constitute the main body 102, the footprint of the main body 102 (EFEM device) can be reduced. Therefore, in such a transfer device 20, when the front and rear surfaces of the exhaust box 250 are continuous with the front and rear surfaces of the support base 240, respectively, the footprint reduction effect can be further enhanced.

[0086] In the above example, an inert gas is circulated inside the main body 102. Alternatively, dry air may be circulated inside the main body 102. In this case, for example, dry air is supplied from the gas supply mechanism 271 to the storage space S2 via the supply pipe 270.

[0087] <Transport robot exchanger 300> During maintenance of the above-described transport robot 110, a transport robot exchanger is used to exchange the transport robot 110. Figures 12 to 14 are a perspective view, a front view, and a rear view, respectively, of the transport robot exchanger 300. Figures 15 and 16 are diagrams for explaining the position of the transport robot exchanger 300 relative to the transport robot 110 and the support base 240, respectively.

[0088] 12 to 14, the transport robot exchanger 300 has a lifter unit 310 and a guide roller unit 320. The lifter unit 310 is configured to support the transport robot 110 and to be able to move up and down freely. The guide roller unit 320 is configured to support the lifter unit 310 and to be able to move horizontally freely.

[0089] The lifter section 310 includes a pair of support frames 311 , a vertical frame 312 , a lifting mechanism 313 , a guide plate 314 , and a guide member 315 .

[0090] The pair of support frames 311 are arranged side by side in the depth direction of the device (Y direction). Specifically, of the pair of support frames 311, the first support frame 311A ​​is arranged in the front (negative side in the Y direction), and the second support frame 311B is arranged in the rear (positive side in the Y direction). Furthermore, the first support frame 311A ​​and the second support frame 311B each extend in the width direction of the device (X direction) and have a length sufficient to support the transport robot 110. As shown in FIGS. 15 and 16 , the first support frame 311A ​​supports the transport support member 235, and the second support frame 311B supports the bottom surface of the second plate-shaped member 233B.

[0091] As shown in FIGS. 12 to 14, the vertical frame 312 is supported by a pair of support frames 311 and extends in the vertical direction (Z direction).

[0092] The lifting mechanism 313 raises and lowers the pair of support frames 311 and the vertical frame 312. The configuration of the lifting mechanism 313 is arbitrary. For example, the lifting mechanism 313 may have a screw (not shown) so that an operator can manually raise and lower the pair of support frames 311 and the vertical frame 312. Alternatively, for example, the lifting mechanism 313 may have an actuator (not shown) so that the pair of support frames 311 and the vertical frame 312 can be automatically raised and lowered.

[0093] The guide plate 314 is provided on a lower vertical frame 322 (described later) of the guide roller unit 320 and extends in the vertical direction. The guide plate 314 has slits 316, for example, at two locations, that extend in the vertical direction and allow the guide member 315 to move up and down.

[0094] The guide member 315 is provided on the vertical frame 312. The guide member 315 is provided so as to sandwich the guide plate 314 via the slit 316. In this case, when the pair of support frames 311 and vertical frames 312 are raised and lowered by the lifting mechanism 313, the guide member 315 guides them in the vertical direction along the slit 316, so that the pair of support frames 311 and vertical frames 312 move in the vertical direction.

[0095] The guide roller unit 320 has a pair of horizontal frames 321 , a lower vertical frame 322 , and an upper vertical frame 323 .

[0096] The pair of horizontal frames 321 are arranged side by side in the depth direction (Y direction) of the device. Each of the pair of horizontal frames 321 extends in the width direction (X direction) of the device and supports the first support frame 311A ​​and the second support frame 311B.

[0097] A plurality of, for example, two, wheels 324 are provided on the bottom surface of each horizontal frame 321. With this configuration, the transport robot exchanger 300 is configured to be freely movable in the device width direction (X direction). For example, the transport robot exchanger 300 may be moved manually by an operator, or may be moved automatically by a movement mechanism (not shown).

[0098] A plurality of rollers 325, for example, two rollers 325, are provided on the inner surface of each horizontal frame 321. The rollers 325 slightly protrude from the inner surface of the horizontal frame 321.

[0099] The lower vertical frame 322 is supported by the pair of horizontal frames 321 and extends in the vertical direction. The upper vertical frame 323 is supported by the lower vertical frame 322 and extends in the vertical direction.

[0100] 15 and 16 , when the transport robot exchanger 300 is moved in the apparatus width direction (X direction), the first support frame 311A ​​and the horizontal frame 321 move in the first lower space T1, and the second support frame 311B and the horizontal frame 321 move in the second lower space T2. In addition, because the side surfaces (front and rear surfaces) of the exhaust box 250 are continuous surfaces (structural features) that are continuous with the side surfaces (front and rear surfaces) of the support base 240, the rollers 325 can abut against the continuous surfaces, thereby guiding the movement of the transport robot exchanger 300 in the apparatus width direction without providing a separate guide structure.

[0101] The inner width (distance between inner surfaces) L1 of the pair of support frames 311 is the same as the inner width L1 of the pair of horizontal frames 321. The inner width L1 is larger than the width L2 of the support base 240 (the width L2 of the exhaust box 250) by the amount that the rollers 325 protrude from the inner surfaces of the horizontal frames 321.

[0102] <Method for replacing the transport robot 100> Next, a method for replacing the transport robot 110 using the transport robot exchanger 300 configured as described above will be described. Fig. 17 is an explanatory diagram showing the state in which the transport robot 110 is carried out from the main body 102. Fig. 18 is an explanatory diagram showing the state in which the transport robot 110 is carried out from the main body 102.

[0103] First, the door 130 of the main body 102 is opened, and the transport robot exchanger 300 is inserted from the carriage 400 into the main body 102 through the opening 129 as shown in FIG. 17A. The carriage 400 may have any configuration, but is configured so that the transport robot exchanger 300 can be freely placed thereon. At this time, the transport robot exchanger 300 is moved in the negative X-direction with the rollers 325 in contact with the side surfaces of the exhaust box 250.

[0104] 17(b), the transport robot exchanger 300 is further moved toward the negative side in the X direction and placed at a position corresponding to the support base 240. At this time, since the side surface of the exhaust box 250 and the side surface of the support base 240 are continuous, the rollers 325 abut from the side surface of the exhaust box 250 to the side surface of the support base 240, guiding the transport robot exchanger 300 and allowing the transport robot exchanger 300 to move smoothly. Note that a stopper (not shown) may be provided on the bottom wall 124 of the main body 102 to appropriately stop the transport robot exchanger 300 at a position corresponding to the support base 240.

[0105] Next, the pair of support frames 311 are raised and lowered by the lifting mechanism 313 , and the support frames 311 support the transport robot 110 .

[0106] 17(c), the transport robot exchanger 300 is moved in the positive X direction, passes through the exhaust box 250, and is carried out from the main body 102. Then, as shown in FIG. 18, the transport robot exchanger 300 supporting the transport robot 110 is placed on the carriage 400. In this manner, the transport robot 110 is carried out.

[0107] The space in which the carriage 400 waits is included in the space in which the door 130 opens and closes. Therefore, there is no need to secure a separate space for replacing the transport robot 110, and the footprint of the device can be reduced.

[0108] When a new transfer robot 110 is loaded into the main body 102, the reverse operation of the operation for unloading the transfer robot 110 is performed. That is, the transfer robot exchanger 300 supporting the new transfer robot 110 is entered into the main body 102 and further moved in the negative X-direction to place it at a corresponding position on the support base 240. Next, the support frame 311 is raised and lowered by the lifting mechanism 313, and the new transfer robot 110 is transferred to and placed on the support base 240. At this time, the positioning pins 236 of the new transfer robot 110 are inserted into the pin holes 241 of the support base 240, so that the new transfer robot 110 can be fixed at a desired position on the support base 240. Next, the empty transfer robot exchanger 300 is moved in the positive X-direction to be unloaded from the main body 102.

[0109] Thus, the series of transfer robot 110 replacement operations using the transfer robot exchanger 300 is completed.

[0110] In this embodiment, the transport robot 110 is replaced by moving the transport robot 110 back and forth from the positive side of the X direction of the main body 102, but the same applies when replacing the transport robot 110 from the negative side of the X direction of the main body 102.

[0111] <Major Effects of the Present Embodiment> As described above, the transport device 20 can improve productivity by reducing the footprint of the device and efficiently replacing the transport robot 110. Details of this will be described below.

[0112] In a conventional transfer device, it is known that during maintenance of a transfer robot, the transfer robot is replaced from the front side of the main body (EFEM device).

[0113] For example, in the transfer device 20 of this embodiment, when the transfer robot 110 is replaced from the front side (negative side in the Y direction) of the main body 102, as in the conventional case, rails are required to guide the transfer robot exchanger 300. Furthermore, since the rails are installed in front of the main body 102 each time the transfer robot 110 is replaced, additional space is required for installing the rails, making it impossible to reduce the footprint of the device. Furthermore, when the rails are installed separately from the main body 102, high relative positional accuracy is required, which increases the time-based labor costs. Furthermore, when the transfer robot 110 is replaced from the front side of the main body 102, as in the conventional case, the load port 101 must be removed. In this case, repositioning of the load port 101 is required when connecting the load port 101 to the main body 102. Furthermore, a teaching operation for an overhead hoist transport (OHT) device that places the FOUP 900 on the load port 101 is also required, which reduces operability. Furthermore, for example, if the transfer robot 110 is replaced from the front side of the main body 102 as in the past, the lower housing unit 103 must also be removed. In such a case, since the lower housing unit 103 includes a power supply unit, processing in the wafer processing system 1 must be stopped, resulting in downtime. For these reasons, if the transfer robot 110 is replaced from the front side of the main body 102, the robot replacement workability deteriorates, resulting in a significant decrease in productivity. On the other hand, if the transfer robot 110 is replaced from the side of the main body 102, additional space is required to provide a guide rail structure for transporting the transfer robot 110 into the housing, making it impossible to achieve both ease of robot replacement and a reduced footprint.

[0114] However, according to this embodiment, the main body 102 has a structural feature in which the support base 240 and the exhaust box 250 are connected to the side surfaces (front and rear surfaces) of the support base 240 and the side surfaces (front and rear surfaces) of the exhaust box 250. Therefore, the continuous surfaces formed by the side surfaces of the support base 240 and the exhaust box 250 can function as guides for movement of the transport robot exchanger 300 in the apparatus width direction. In other words, the main body 102 has a configuration in which the apparatus frame (the side surfaces of the support base 240 and the exhaust box 250) and the guide for the transport robot exchanger 300 are integrated into one unit. Furthermore, an opening 129 is formed in the side wall 123 of the main body 102, and the transport robot 110 and the transport robot exchanger 300 can be loaded and unloaded into and from the main body 102 through the opening 129. Because the main body 102 has the above-described configuration, the transport robot 110 and the transport robot exchanger 300 can be loaded and unloaded from the side (X direction) of the main body 102, allowing the transport robot 110 to be replaced. Therefore, according to this embodiment, a continuous surface formed by the side surface of the support base 240 and the side surface of the exhaust box 250 functions as a guide for movement of the transport robot exchanger 300 in the device width direction. Therefore, even when the transport robot 110 is replaced from the side of the main body 102, rails that were previously required for transfer robot replacement are not required. Therefore, by enabling robot replacement work from the side of the main body 102, high workability (productivity) can be ensured while the device footprint of the transport device 20 can be reduced.

[0115] Furthermore, in conventional transfer devices, a transfer robot consisting only of a horizontal articulated arm is often installed inside the main body (EFEM device). In such cases, the arms constituting the horizontal articulated arm are long in the horizontal direction, and the operating range of the transfer robot extends horizontally (X direction and Y direction). Therefore, conventional transfer devices require a large space in the depth direction (Y direction) of the device.

[0116] In contrast, in the transfer device 20 of this embodiment, the transfer robot 110 can be selectively configured as a transfer robot having a vertical articulated arm 230. In this case, the operating range of the vertical articulated arm 230 extends in the vertical direction (Z direction) and the device width direction (X direction), so the length of the main body 102 in the device depth direction (Y direction) can be reduced. Furthermore, although the horizontal arm 220 supported by the vertical articulated arm 230 moves horizontally, the first arm 222 and the second arm 223 constituting the horizontal arm 220 are each short, so the length of the main body 102 in the device depth direction (Y direction) can also be reduced from this perspective. Therefore, in the transfer device 20 of this embodiment, when the transfer robot 110 is equipped with a transfer robot having a vertical articulated arm 230, the length of the main body 102 in the device depth direction can be reduced, thereby further reducing the device footprint.

[0117] In this embodiment, the operating range of the vertical articulated arm 230 of the transfer robot 110 extends in the vertical direction (Z direction) and the width direction of the device (X direction). That is, outside the width direction of the device (positive and negative sides in the X direction) of the vertical articulated arm 230 and the support base 240, the space above the exhaust box 250 is included in the operating range of the vertical articulated arm 230. In other words, when the vertical articulated arm 230 of the transfer robot 110 is employed, the operating range in the vertical direction (Z direction) and the width direction of the device (X direction) is expanded compared to a transfer robot consisting only of horizontal articulated arms. As a result, a component placement prohibition area (= operating area) is formed in a side area of ​​the transfer robot 110, such as the space above the exhaust box 250, where relatively large components cannot be placed. In this embodiment, in an EFEM apparatus employing a vertical articulated arm 230 for the transfer robot 110, the main body 102 has a support base 240 and an exhaust box 250, and has a structural feature in which the side surfaces (front and rear surfaces) of the support base 240 are continuous with the side surfaces (front and rear surfaces) of the exhaust box 250. This eliminates the need for an additional guide structure, while effectively utilizing the component placement prohibition area (the space above the exhaust box 250) to allow the transfer robot 110 to be loaded and unloaded from the side of the main body 102. Therefore, the method for replacing a transfer robot 110 disclosed herein can achieve a greater footprint reduction effect when the transfer robot 110 has a vertical articulated arm 230.

[0118] Furthermore, according to this embodiment, the lower front wall 121B may be provided to protrude forward (toward the negative Y direction) from the upper front wall 121A in the main body 102, thereby forming a first lower space T1. In other words, the space between the upper front wall 121A and the transfer robot 110 in the device depth direction can be reduced, and the overall footprint of the main body 102 can be reduced.

[0119] The position of the transfer support member 235 does not have to be lower in front of the first plate-shaped member 233A of the transfer robot 110, and it may be provided at the upper part. However, if the transfer support member 235 is provided at the lower part, the vertical length of the lower front wall 121B (first lower space T1) can be reduced and the vertical length of the upper front wall 121A can be increased, thereby increasing the component storage space outside the transfer space S1. In other words, the number of components that need to be arranged in the transfer space S1 can be reduced, which contributes to a reduction in the device footprint of the transfer device 20.

[0120] Furthermore, according to this embodiment, in the transport robot exchanger 300, the rollers 325 are provided on the inner surface of the horizontal frame 321, so that the horizontal frame 321 can be provided close to the side surface of the support base 240 and the side surface of the exhaust box 250. In this case, since the support frame 311 can be provided close to the plate-shaped member 233, the bending stress applied to the transport robot 110 when the support frame 311 supports the transport robot 110 can be kept small, which is advantageous in terms of the strength of the transport robot 110.

[0121] Furthermore, according to this embodiment, the transfer robot 110 is replaced from the side (X direction) of the main body 102, eliminating the need to remove the load port 101 as in the conventional system, and eliminating the need to reposition the load port 101 or teach the OHT device, as was previously required. This makes it easy to replace the transfer robot 110. Furthermore, since there is no need to remove the lower accommodation unit 103 as in the conventional system, there is no need to stop processing in the wafer processing system 1 while replacing the transfer robot 110, eliminating the downtime that occurred in the conventional system. This improves product productivity.

[0122] As described above, according to this embodiment, the footprint of the transport device 20 can be reduced, the transport robot 110 can be replaced efficiently, and the maintenance of the transport robot 110 can be performed appropriately.

[0123] Second Embodiment FIG. 19 is an explanatory diagram showing a partial configuration of a transport robot exchanger 300 according to a second embodiment.

[0124] When replacing the transport robot 110 using the transport robot exchanger 300, in the first embodiment, the side surface of the exhaust box 250 has a structural feature in which the side surface is continuous with the side surface of the support base 240. This allows the side surface of the exhaust box 250 to function as a guide for movement of the transport robot exchanger 300 in the apparatus width direction. On the other hand, in the second embodiment, the inner side surface of the main body 102 in the apparatus depth direction, i.e., the rear surface of the lower front wall 121B and the front surface of the rear wall 122 of the main body 102, have a structural feature in which the inner side surface is a surface (opposing surface) that faces the side surface of the support base 240 in parallel at a certain distance. This allows the rear surface of the lower front wall 121B and the front surface of the rear wall 122 of the main body 102 to be used as a guide for movement of the transport robot exchanger 300 in the apparatus width direction.

[0125] As shown in FIG. 19, the transport robot exchanger 300 of the second embodiment has a pair of support frames 330 instead of the pair of support frames 311 of the first embodiment, and also has a pair of horizontal frames 340 instead of the pair of horizontal frames 321 of the first embodiment.

[0126] The pair of support frames 330 are arranged side by side in the depth direction of the device (Y direction). Specifically, of the pair of support frames 330, the first support frame 330A is arranged in the front (negative side in the Y direction), and the second support frame 330B is arranged in the rear (positive side in the Y direction). Furthermore, the first support frame 330A and the second support frame 330B each extend in the width direction of the device (X direction) and have a length sufficient to support the transfer robot 110. The first support frame 330A supports the transfer support member 235, and the second support frame 330B supports the bottom surface of the second plate-shaped member 233B.

[0127] The pair of horizontal frames 340 are arranged side by side in the depth direction (Y direction) of the device. Each of the pair of horizontal frames 340 extends in the width direction (X direction) of the device and supports the first support frame 330A and the second support frame 330B.

[0128] A plurality of, for example, two wheels 341 are provided on the bottom surface of each horizontal frame 340. With this configuration, the transport robot exchanger 300 is configured to be freely movable in the device width direction (X direction).

[0129] A plurality of rollers 342, for example, two rollers 342, are provided on the outer surface of each horizontal frame 340. The rollers 342 slightly protrude from the outer surface of the horizontal frame 340.

[0130] When the transport robot exchanger 300 is moved in the device width direction (X direction), the first support frame 330A and the horizontal frame 340 move in the first lower space T1, and the second support frame 330B and the horizontal frame 340 move in the second lower space T2. In the first lower space T1, the rollers 342 abut against the rear surface of the lower front wall 121B, and in the second lower space T2, the rollers 342 abut against the front surface of the rear wall 122.

[0131] The outer width (distance between outer surfaces) L3 of the pair of support frames 330 is the same as the outer width L3 of the pair of horizontal frames 340. The outer width L3 is smaller than the inner width L4 of the main body 102 in the device depth direction (the distance between the rear surface of the lower front wall 121B and the front surface of the rear wall 122) by the amount that the rollers 342 protrude from the outer surfaces of the horizontal frames 340.

[0132] In this embodiment, the first lower space T1 and the second lower space T2 constitute structural features in the present disclosure. Also, the rear surface of the front wall 121 of the main body 102 and the front surface of the rear wall 122 each constitute opposing surfaces in the present disclosure.

[0133] According to this embodiment, the rear surface of the lower front wall 121B of the main body 102 and the front surface of the rear wall 122 can function as guides for movement of the transport robot exchanger 300 in the device width direction. Therefore, the second embodiment can also achieve the same effects as the first embodiment described above.

[0134] <Other Modifications> In the first and second embodiments, the transport robot 110 has the first plate-shaped member 233A and the second plate-shaped member 233B, but the first plate-shaped members 233A may be provided on both sides in the depth direction of the apparatus, or the second plate-shaped members 233B may be provided on both sides in the width direction of the apparatus. When the transport robot 110 has a pair of first plate-shaped members 233A, the transport robot 110 has a pair of transport supports 235, and a first lower space T1 is formed on both sides in the width direction of the apparatus. When the transport robot 110 has a pair of second plate-shaped members 233B, the pair of second plate-shaped members 233B are arranged to protrude from the support base 240 in the width direction of the apparatus, and a second lower space T2 is formed on both sides in the width direction of the apparatus.

[0135] The embodiments disclosed herein should be considered to be illustrative in all respects and not restrictive. The above-described embodiments may be omitted, substituted, or modified in various ways without departing from the scope and spirit of the appended claims. For example, the components of the above-described embodiments may be arbitrarily combined. Such an arbitrary combination naturally provides the functions and effects of each of the components involved in the combination, and also provides other functions and effects that are apparent to those skilled in the art from the description of this specification.

[0136] Furthermore, the effects described herein are merely descriptive or exemplary and are not limiting. In other words, the technology according to the present disclosure may achieve other effects that are apparent to those skilled in the art from the description of this specification, in addition to or in place of the above-described effects.

[0137] The following configuration examples also fall within the technical scope of the present disclosure: (1) A transport device that loads and unloads substrates into and from a processing device that processes the substrates, comprising: a main body having an internal space including a front part connected to a load port on which a container for accommodating the substrates is placed and extending in the width direction of the device, a rear part connected to a load lock module provided in the processing device and facing the front part in the depth direction of the device, a bottom part on which a transport robot that transports the substrates is placed, a ceiling part facing the bottom part, and a pair of side parts facing each other in the width direction of the device, and a structure provided on the bottom, the structure having a support base to which the transport robot is fixed and a structural feature part extending in the width direction of the device, wherein an opening is provided in the side part, and the structural feature part has a continuous surface that is continuous with a side surface of the support base extending in the width direction of the device. (2) A transport device for loading and unloading substrates into and from a processing device for processing substrates, comprising: a main body having an internal space including a front portion connected to a load port on which a container for accommodating the substrates is placed and extending in the width direction of the device, a rear portion connected to a load lock module provided in the processing device and facing the front portion in the depth direction of the device, a bottom portion on which a transport robot for transporting the substrates is placed, a ceiling portion facing the bottom portion, and a pair of side portions facing each other in the width direction of the device, and a structure provided on the bottom, the structure having a support base to which the transport robot is fixed and a structural feature portion extending in the width direction of the device, wherein an opening is provided in the side portion, and the structural feature portion has an opposing surface facing a side surface of the support base extending in the width direction of the device at a predetermined distance in parallel to the side surface. (3) The transport device according to (1) or (2), wherein the opening is an opening for loading and unloading the transport robot. (4) The conveying device according to (1), wherein the continuous surface of the structural feature is an exhaust section into which gas in the internal space flows in. (5) The conveying device according to (2), wherein the opposing surfaces of the structural feature are lower inner surfaces of the front and rear sections.(6) The transport device according to any one of (1) to (5), wherein the transport robot has a transport support protruding from a side surface of the transport robot in the depth direction of the device, and a lower portion of the front or rear portion protrudes in the depth direction of the device at a position corresponding to the transport support. (7) The transport device according to any one of (1) to (5), wherein the transport robot extends and protrudes from the support base in the depth direction of the device. (8) The transport device according to any one of (1) to (7), wherein the transport robot has: a horizontal arm configured to be able to transport the substrate in the horizontal direction; and a vertical multi-joint arm configured to be able to raise and lower the horizontal arm. (9) The transport device according to (8), wherein the vertical multi-joint arm has: an arm provided so as to be rotatable in the vertical direction and in the width direction of the device; and a base connected to the arm and fixed to the support base. (10) The transport device according to any one of (1) to (9), wherein the transport robot has a transport support protruding from a side surface of the transport robot in the depth direction of the device. (11) The transport device according to any one of (1) to (10), wherein the support base is provided with a positioning structure for fixing the position of the transport robot relative to the support base.

[0138] 10 Processing device 20 Transfer device 50 Load lock module 101 Load port 102 Main body 121 Front wall 122 Rear wall 123 Side wall 124 Bottom wall 125 Ceiling wall 129 Opening 110 Transfer robot 240 Support table 250 Exhaust box 900 FOUP S1 Transfer space S2 Storage space T1 First lower space T2 Second lower space W Wafer

Claims

1. A transport device for loading and unloading substrates into and from a processing device for processing the substrates, comprising: a front part extending in the width direction of the device and connected to a load port on which a container for accommodating the substrates is placed; a rear part connected to a load lock module provided in the processing device and facing the front part in the depth direction of the device; a main body part having an internal space composed of a bottom part on which a transport robot for transporting the substrates is placed, a ceiling part facing the bottom part, and a pair of side parts facing each other in the width direction of the device; and a structure provided on the bottom, the structure having a support base to which the transport robot is fixed and a structural feature part extending in the width direction of the device, wherein an opening is provided in the side part, and the structural feature part has a continuous surface that is continuous with a side surface of the support base extending in the width direction of the device.

2. A transport device for loading and unloading substrates into and from a processing device for processing the substrates, comprising: a main body having an internal space composed of a front part connected to a load port on which a container for accommodating the substrates is placed and extending in the width direction of the device, a rear part connected to a load lock module provided in the processing device and facing the front part in the depth direction of the device, a bottom part on which a transport robot for transporting the substrates is placed, a ceiling part facing the bottom part, and a pair of side parts facing each other in the width direction of the device; and a structure provided on the bottom, the structure having a support base to which the transport robot is fixed and a structural feature part extending in the width direction of the device, wherein an opening is provided in the side part, and the structural feature part has an opposing surface facing parallel to a side surface of the support base extending in the width direction of the device at a predetermined distance.

3. The transport device according to claim 1 or 2, wherein the opening is an opening for loading or unloading the transport robot.

4. The transport device of claim 1, wherein the continuous surface of the structural feature comprises an exhaust portion into which gas within the interior space flows.

5. The transport device of claim 2, wherein the opposing surfaces of the structural feature are comprised of lower interior surfaces of the front and rear portions.

6. A transport device as described in claim 1 or 2, wherein the transport robot has a transport support that protrudes from the side of the transport robot in the depth direction of the device, and the lower part of the front or rear protrudes in the depth direction of the device at a position corresponding to the transport support.

7. The transport device according to claim 1 or 2, wherein the transport robot extends and protrudes from the support base in the depth direction of the device.

8. A transport device according to claim 1 or 2, wherein the transport robot has a horizontal arm configured to be able to transport the substrate in a horizontal direction, and a vertical articulated arm configured to be able to raise and lower the horizontal arm.

9. A conveying device as described in claim 8, wherein the vertical articulated arm has: an arm that is rotatable in the vertical direction and in the width direction of the device; and a base that is connected to the arm and fixed to the support table.

10. The transport device according to claim 1 or 2, wherein the transport robot has a transport support member that protrudes from a side surface of the transport robot in the depth direction of the device.

11. A transport device according to claim 1 or 2, wherein the support base is provided with a positioning structure for fixing the position of the transport robot relative to the support base.

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