Method for manufacturing spectacle lens

Abstract

Provided is a method for manufacturing a spectacle lens including a lens base material and a multilayer film positioned on at least one surface of the lens base material, the spectacle lens further including a base layer between the lens base material and the multilayer film. The method including forming the base layer by performing at least one round of sputtering by a metal target and irradiating a metal film formed by sputtering with oxygen ions and nitrogen ions.

Description

Eyeglass lens manufacturing method

[0001] The present invention relates to a method for manufacturing eyeglass lenses.

[0002] Spectacle lenses are generally manufactured by forming a functional film on the surface of a lens substrate to provide the spectacle lens with a desired function. As such a functional film, a multilayer film is provided on the surface of the lens substrate (see, for example, Patent Document 1).

[0003] Japanese Patent Application Laid-Open No. 2015-007695

[0004] Paragraph 0022 of Patent Document 1 proposes suppressing the occurrence of interference fringes by adjusting the refractive index of a functional thin film disposed between a lens substrate and a multilayer film. Furthermore, the same paragraph lists methods for adjusting the refractive index by selecting the type of resin that constitutes the main component of the functional thin film and the type of microparticles added to the main component resin. Specifically, in the examples of Patent Document 1, the functional thin films (hard coat and primer coat) are formed as cured layers by heat curing (see paragraph 0062 of Patent Document 1). However, while the formation of the cured layer is performed by wet film formation, which requires the application of a curable composition, the formation of the multilayer film is usually performed by dry film formation. Considering the simplicity of the manufacturing process for eyeglass lenses, it is desirable that the layer disposed between the lens substrate and the multilayer film for refractive index adjustment can also be formed by dry film formation.

[0005] An object of one aspect of the present invention is to provide a method for manufacturing a spectacle lens that can form a layer, which is provided between the lens substrate and the multilayer film for refractive index adjustment, by dry film formation.

[0006] One aspect of the present invention is as follows: [1] A method for manufacturing an eyeglass lens including a lens substrate and a multilayer film located on at least one surface of the lens substrate, wherein the eyeglass lens further includes an underlayer between the lens substrate and the multilayer film, and the method includes forming the underlayer by sputtering a metal target and irradiating the metal film formed by sputtering with oxygen ions and nitrogen ions one or more times (hereinafter also simply referred to as the "manufacturing method"). [2] The method for manufacturing an eyeglass lens according to [1], wherein the metal target is a Si target. [3] The method for manufacturing an eyeglass lens according to [1] or [2], wherein the irradiation of the oxygen ions and nitrogen ions is performed using an ion gun. [4] The method for manufacturing an eyeglass lens according to any of [1] to [3], wherein the multilayer film includes one or more high-refractive-index layers and one or more low-refractive-index layers, and at least one of the high-refractive-index layers has a refractive index of 2.00 or more and 2.40 or less. [5] The method for manufacturing a spectacle lens according to any one of [1] to [4], wherein the multilayer film includes one or more high-refractive index layers and one or more low-refractive index layers, and at least one of the low-refractive index layers has a refractive index of 1.44 or more and 1.49 or less. [6] The method for manufacturing a spectacle lens according to [1], wherein the metal target is a Si target, the irradiation of the oxygen ions and nitrogen ions is performed by an ion gun, the multilayer film includes one or more high-refractive index layers and one or more low-refractive index layers, at least one of the high-refractive index layers has a refractive index of 2.00 or more and 2.40 or less, and at least one of the low-refractive index layers has a refractive index of 1.44 or more and 1.49 or less.

[0007] According to a method for manufacturing a spectacle lens according to one aspect of the present invention, a layer to be provided between the lens substrate and the multilayer film for adjusting the refractive index can be formed by sputtering, which is a dry film formation method.

[0008] 1 shows the reflection spectrum (convex side) of each eyeglass lens of Example 1 and Comparative Example 1. FIG. 1 shows the reflection spectrum (concave side) of each eyeglass lens of Example 1 and Comparative Example 1. FIG. 2 shows the reflection spectrum (convex side) of each eyeglass lens of Example 1 and Comparative Example 1. FIG. 3 shows the reflection spectrum (convex side) of each eyeglass lens of Example 2 and Comparative Example 2. FIG. 4 shows the reflection spectrum (concave side) of each eyeglass lens of Example 2 and Comparative Example 2. FIG. 5 shows the reflection spectrum (convex side) of each eyeglass lens of Example 3 and Comparative Example 3. FIG. 6 shows the reflection spectrum (concave side) of each eyeglass lens of Example 3 and Comparative Example 3. FIG. 7 shows the reflection spectrum (convex side) of each eyeglass lens of Example 3 and Comparative Example 3. FIG. 8 shows the reflection spectrum (convex side) of each eyeglass lens of Example 4 and Comparative Example 4. FIG. 9 shows the reflection spectrum (concave side) of each eyeglass lens of Example 4 and Comparative Example 4. FIG. 10 shows the reflection spectrum (convex side) of each eyeglass lens of Example 4 and Comparative Example 4. 1 shows the reflection spectrum (convex side) of each eyeglass lens of Example 5 and Comparative Example 5. 1 shows the reflection spectrum (concave side) of each eyeglass lens of Example 5 and Comparative Example 5. 1 shows the reflection spectrum (enlarged convex side) of each eyeglass lens of Example 5 and Comparative Example 5.

[0009] The method for manufacturing a spectacle lens according to one aspect of the present invention will be described in further detail below.

[0010] <Lens Substrate> The lens substrate used in the above manufacturing method can be a plastic lens substrate or a glass lens substrate. The glass lens substrate can be, for example, a lens substrate made of inorganic glass. As the lens substrate, a plastic lens substrate is preferred from the viewpoints of lightweight and breakage resistance. Examples of plastic lens substrates include (meth)acrylic resins, styrene resins, polycarbonate resins, allyl resins, allyl carbonate resins such as diethylene glycol bisallyl carbonate resin (CR-39), vinyl resins, polyester resins, polyether resins, urethane resins obtained by reacting an isocyanate compound with a hydroxy compound such as diethylene glycol, thiourethane resins obtained by reacting an isocyanate compound with a polythiol compound, and cured products (generally referred to as transparent resins) obtained by curing a curable composition containing a (thio)epoxy compound having one or more disulfide bonds in the molecule. The curable composition can also be referred to as a polymerizable composition. The lens substrate can contain known additives. One example of an additive is an ultraviolet absorber. A lens substrate containing an ultraviolet absorber can reduce the amount of ultraviolet light that enters the object-side surface and then enters the eyes of the spectacle wearer.

[0011] The lens substrate may be either undyed (colorless lens) or dyed (dyed lens). The refractive index of the lens substrate may be, for example, approximately 1.50 to 1.76. However, the refractive index of the lens substrate is not limited to the above range, and may be within the above range or may be above or below the above range. Furthermore, the lens substrate may be a lens with refractive power (so-called prescription lens) or a lens without refractive power (so-called non-prescription lens).

[0012] The spectacle lenses manufactured by the above manufacturing method can be various lenses such as single-vision lenses, multifocal lenses, and progressive-power lenses. The type of lens is usually determined by the surface shapes of both sides of the lens substrate. The surface of the lens substrate may be convex, concave, or flat. In ordinary lens substrates and spectacle lenses, the object-side surface is convex and the eyeball-side surface is concave. However, the present invention is not limited to this. The "object-side surface" refers to the surface that faces the object when spectacles equipped with the spectacle lens are worn by a wearer. The "eyeball-side surface" refers to the opposite surface, i.e., the surface that faces the eyeball when spectacles equipped with the spectacle lens are worn by a wearer.

[0013] <Formation of Underlayer> The underlayer can be formed on the surface of the lens substrate, or on the surface of a layer provided on the lens substrate. Examples of layers that can be provided on the lens substrate include a photochromic layer.

[0014] The underlayer is formed by sputtering a metal target and irradiating the metal film formed by sputtering with oxygen ions and nitrogen ions one or more times. The sputtering and ion irradiation constitute one cycle, and the underlayer may be formed in one cycle or in two or more cycles. The more cycles, the thicker the underlayer formed. Therefore, the number of cycles can be determined so that the underlayer has the desired thickness. The thickness of the underlayer can be, for example, 400.0 nm or more and 3000.0 nm or less, but is not limited to the above range.

[0015] The "film thickness" referred to in this specification is a physical film thickness. The film thickness can be determined by a known film thickness measurement method. For example, the film thickness can be determined by converting the optical film thickness measured by an optical film thickness measurement device into a physical film thickness.

[0016] In the present invention and this specification, the term "metal" refers to a component selected from the group consisting of a simple metal element (pure metal) and an alloy of multiple metal elements. Metal elements include those classified as metal elements as well as those classified as metalloid elements. For example, Si (silicon) is an example of a metalloid element, and is included in the "metal element" in the present invention and this specification.

[0017] In the present invention and this specification, a "metal target" is a sputter target made of metal, excluding impurities that are inevitably mixed in during the preparation of the sputter target and known additives that are optionally used to assist film formation. This also applies to "Si targets," "metal films," and the like described below. The metal content in the metal target can be, for example, in the range of 90 to 100 mass % or 95 to 100 mass %. Examples of metal targets include Si (silicon) targets, Al (aluminum) targets, and Ti (titanium) targets, with Si targets being preferred from the viewpoint of excellent adhesion to the multilayer film.

[0018] In the underlayer formation process, a metal film is formed as a sputtering film by sputtering using a metal target. The inventors believe that the metal film can then be irradiated with oxygen ions and nitrogen ions, thereby oxidizing and nitriding the metal in the metal film to obtain a metal nitride oxide film. Because metal oxides and nitrides have different refractive indices, the refractive index of the formed metal nitride oxide film can be controlled by adjusting the irradiation dose of oxygen ions and nitrogen ions. For example, in the case of Si (silicon), the refractive index of silicon nitride is higher than that of silicon oxide, so the refractive index of the formed silicon nitride oxide film can be lowered by increasing the irradiation dose of oxygen ions, and can be increased by increasing the irradiation dose of nitrogen ions. For example, by adjusting the refractive index of the metal nitride oxide film thus formed to match or approach the refractive index of the lens substrate, it is possible to suppress the occurrence of interference fringes in eyeglass lenses due to the refractive index difference between the lens substrate and the underlayer. Furthermore, by introducing oxygen ions and nitrogen ions into the metal film, the transparency of the film can be increased. Furthermore, the process for forming the underlayer is a dry process that involves sputtering and ion irradiation, and therefore can also contribute to simplifying the manufacturing process of eyeglass lenses.

[0019] Sputtering and ion irradiation for forming the underlayer can be performed in the same film formation apparatus. The configuration of such a film formation apparatus is known. For example, if a commercially available film formation apparatus is equipped with a film formation mechanism using a meta mode process, sputtering and ion irradiation can be performed in the same film formation apparatus. The irradiation of oxygen ions and the irradiation of nitrogen ions can be performed simultaneously, and / or one can be irradiated first and then the other. The irradiation of oxygen ions and the irradiation of nitrogen ions can be performed using a known ion irradiation means such as an ion gun.

[0020] <Formation of Multilayer Film> A multilayer film is formed on the underlayer. The spectacle lens manufactured by the above manufacturing method has a multilayer film on at least one surface of the lens substrate, and has the underlayer between the multilayer film and the lens substrate. The spectacle lens may have a multilayer film only on the object-side surface of the lens substrate, or only on the eyeball-side surface of the lens substrate, or may have a multilayer film on each of the object-side surface and the eyeball-side surface of the lens substrate. When multilayer films are located on both sides of the lens substrate, the multilayer films can be the same or different. The same applies to the underlayer.

[0021] The multilayer film may be located directly on the surface of the underlayer, or may be located indirectly on the surface of the underlayer via one or more other layers. Since the underlayer can exhibit excellent adhesion to the multilayer film, in one embodiment, the underlayer and the multilayer film can be directly laminated without any other layers interposed therebetween.

[0022] The multilayer film may have a laminated structure in which high-refractive index layers and low-refractive index layers are alternately stacked. In the present invention and this specification, the terms "high" and "low" used in relation to the high-refractive index layers and low-refractive index layers contained in the multilayer film are relative to the refractive index of the lens substrate contained in the spectacle lens. A high-refractive index layer refers to a layer with a higher refractive index than the lens substrate. A low-refractive index layer refers to a layer with a lower refractive index than the lens substrate. The multilayer film may contain three or more layers with different refractive indices. In the present invention and this specification, "refractive index" refers to the refractive index for light with a wavelength of 500 nm. The refractive index of the lens substrate of a spectacle lens is generally approximately 1.50 to 1.76, and the low-refractive index layer may be a layer with a refractive index of 1.50 or less, and the high-refractive index layer may be a layer with a refractive index of 1.76 or more. The refractive index of the high-refractive index layer may be, for example, 2.00 to 2.40 or 2.00 to 2.20. The refractive index of the low-refractive index layer may be, for example, 1.44 to 1.49. However, as described above, the terms "high" and "low" used for the high refractive index layer and the low refractive index layer are relative terms with respect to the refractive index of the lens substrate, and therefore the refractive indices of the high refractive index layer and the low refractive index layer are not limited to the above ranges.

[0023] As the high refractive index material constituting the high refractive index layer and the low refractive index material constituting the low refractive index layer, inorganic materials, organic materials, or organic-inorganic composite materials can be used, and inorganic materials are preferred from the viewpoint of film formability, etc. That is, the multilayer film is preferably an inorganic multilayer film. Specifically, as the high refractive index material constituting the high refractive index layer, zirconium oxide (e.g., ZrO ２ ), tantalum oxide (e.g., Ta ２ O ５ ), titanium oxides (e.g., TiO ２ ), aluminum oxide (e.g., Al ２ O ３ ), yttrium oxide (e.g., Y ２ O ３ ), hafnium oxide (e.g., HfO ２ ) and niobium oxide (e.g., Nb ２ O ５ On the other hand, examples of the low refractive index material constituting the low refractive index layer include silicon oxides (e.g., SiO ２ ), magnesium fluoride (e.g., MgF ２ ) and barium fluoride (e.g., BaF ２ In the above examples, the oxides and fluorides are shown in terms of stoichiometric composition for convenience, but oxides and fluorides in a state where oxygen or fluorine is deficient or excessive from the stoichiometric composition can also be used as high refractive index materials or low refractive index materials.

[0024] Preferably, the high-refractive index layer is a film primarily composed of a high-refractive index material, and the low-refractive index layer is a film primarily composed of a low-refractive index material. Here, the "main component" refers to the component that occupies the largest proportion in the film, typically accounting for approximately 50% to 100% by mass, and even approximately 90% to 100% by mass, of the film's mass. Such films (e.g., vapor deposition films, sputtering films) can be formed by depositing a film using a film-forming material (e.g., a vacuum deposition source, a sputtering target, etc.) primarily composed of the high-refractive index material or the low-refractive index material. The same applies to the main components of the film-forming material. Films and film-forming materials may contain unavoidable impurities, and may also contain other components, such as other inorganic substances or known additives that aid in film formation, as long as they do not impair the function of the main component.

[0025] A known film formation method can be used to form the multilayer film. From the viewpoint of ease of film formation, film formation is preferably performed by vapor deposition. That is, each layer included in the multilayer film is preferably a vapor-deposited film. A vapor-deposited film means a film formed by vapor deposition. In the present invention and this specification, "vapor deposition" includes dry methods such as vacuum deposition, ion plating, and sputtering. In the vacuum deposition method, an ion beam assisted method in which an ion beam is irradiated simultaneously during vapor deposition may be used. As the sputtering method, a DC (Direct Current) method, an RF (Radio Frequency) method, or the like may be used.

[0026] The multilayer film can be, for example, a multilayer film in which high-refractive index layers and low-refractive index layers are alternately stacked to a total of three or more layers. The total number of high-refractive index layers and low-refractive index layers can be, for example, 11 or less. The film thicknesses of the high-refractive index layers and the low-refractive index layers can be determined depending on the layer structure. Specifically, the combination of layers included in the multilayer film and the film thickness of each layer can be determined by optical simulation using a known method based on the refractive indexes of the film-forming materials for forming the high-refractive index layers and the low-refractive index layers and the various physical properties that are desired to be imparted to the eyeglass lens by providing the multilayer film.

[0027] Examples of high-refractive index layers included in the multilayer film include layers containing zirconium oxide, niobium oxide, and tantalum oxide, and these layers are preferably layers containing these oxides as the main component. Examples of low-refractive index layers included in the multilayer film include layers containing silicon oxide, and these layers are preferably layers containing silicon oxide as the main component. As described above, in one embodiment, the underlayer and the multilayer film can be directly laminated without any other layer. In this case, from the viewpoint of further improving the adhesion between the underlayer and the multilayer film, the bottom layer in direct contact with the underlayer in the multilayer film is preferably a layer containing an oxide of the same metal as the metal of the underlayer, and more preferably a layer containing an oxide of the same metal as the metal of the underlayer as the main component. For example, when the underlayer is formed using a Si target, the bottom layer in direct contact with the underlayer in the multilayer film can be a layer containing silicon oxide, and preferably a layer containing silicon oxide as the main component. In the multilayer film, the high refractive index layer and the low refractive index layer may be in direct contact with each other, or the multilayer film may include at least one laminate structure in which a conductive oxide layer, which will be described later, is present between the high refractive index layer and the low refractive index layer.

[0028] The film thickness of each of the high refractive index layers and the low refractive index layers included in the multilayer film can be, for example, 1.0 to 500.0 nm, and the total thickness of the multilayer film can be, for example, 100.0 to 900.0 nm (including the thickness of the conductive oxide layer if a conductive oxide layer is included).

[0029] In addition to the high-refractive index layer and low-refractive index layer described above, the multilayer film may also include one or more layers containing a conductive oxide (also referred to as a "conductive oxide layer") at any position in the multilayer film. The conductive oxide layer may be a layer containing a conductive oxide as a main component, and may preferably be a vapor-deposited film of a conductive oxide formed by vapor deposition using a vapor deposition source containing a conductive oxide as a main component. From the viewpoint of the transparency of the eyeglass lens, the conductive oxide layer is preferably an indium tin oxide (tin-doped indium oxide; ITO) layer having a thickness of 10 nm or less, a tin oxide layer having a thickness of 10 nm or less, or a titanium oxide layer having a thickness of 10 nm or less. An indium tin oxide (ITO) layer is a layer containing ITO as a main component. This also applies to tin oxide layers and titanium oxide layers. In the present invention and this specification, the "high refractive index layer" and "low refractive index layer" included in the multilayer film do not include an indium tin oxide (ITO) layer having a thickness of 10 nm or less, a tin oxide layer having a thickness of 10 nm or less, and a titanium oxide layer having a thickness of 10 nm or less. In other words, even if one or more of these layers are included in the multilayer film, these layers are not considered to be "high refractive index layers" or "low refractive index layers." The thickness of the above-mentioned conductive oxide layer having a thickness of 10 nm or less can be, for example, 0.1 nm or more.

[0030] Furthermore, a further functional film can be formed on the multilayer film. Examples of such a functional film include various functional films such as a water-repellent or hydrophilic antifouling film and an antifogging film. Publicly known techniques can be applied to these functional films.

[0031] The present invention will be further described below with reference to examples, although the present invention is not limited to the embodiments shown in the examples.

[0032] Example 1 Formation of Underlayer (1) A lens substrate (refractive index: see Table 1) was set in the deposition dome of a commercially available deposition device equipped with a deposition mechanism using a Meta mode process. －３ (2) The deposition dome was evacuated for 25.0 min until the pressure reached 0.02 Pa or less. －１While rotating at 400° C., the substrate was heated using a heater set at a temperature of 65° C. After reaching a predetermined pressure, Ar gas (flow rate: 200 sccm) and O were sputtered from the sputtering target (Si target). ２ Gas (flow rate: 26 sccm) was introduced from the ion gun. ２ Gas (flow rate: 10 sccm) and N ２ Gas (flow rate: 50 sccm) was introduced. ２ Gas and N ２ The gas flow rate ratio was determined by a preliminary experiment in advance so that the refractive index of the underlayer to be formed would match that of the lens substrate. (3) A power of 2000 W was applied to the sputtering target, and an acceleration voltage of 850 V, an acceleration current of 425 mA, a suppressor voltage of 300 V, and a bias current of 850 mA were applied to the ion gun. As the deposition dome rotated, the following sequence was repeated: metal film deposition → irradiation with oxygen ions and nitrogen ions by the ion gun → metal film deposition → irradiation with oxygen ions and nitrogen ions by the ion gun → ..., thereby forming a film of a predetermined thickness on one surface of the lens substrate. (4) After the formation of the multilayer film described below, the lens substrate was temporarily removed and then re-set in the deposition dome, and steps (1) to (3) above were performed to form a film of a predetermined thickness on the other surface of the lens substrate.

[0033] <Formation of multilayer film> After the formation of the base layer, the formation of the multilayer film on both the convex and concave surfaces was carried out in the same film-forming apparatus without exposing the film to the atmosphere. From the base layer side toward the spectacle lens surface side, the first layer, second layer, etc. were laminated in this order using the evaporation sources shown in the bottom row of Table 1 and the top row, respectively, so that the outermost layer on the spectacle lens surface side was the layer formed by the evaporation source shown in the top row of Table 1. In these examples and comparative examples, evaporation sources made of oxides shown in Table 1, excluding impurities that may be unavoidably mixed in, were used, and each layer with a thickness shown in Table 1 was formed in turn. The film thickness is the physical film thickness, and is expressed in nm. SiO ２ A layer formed using a deposition source consisting of SiO ２ The refractive index of the ZrO ２ A layer formed using a deposition source consisting of ZrO ２ The refractive index of the layer is 2.08.

[0034] The refractive index of each layer can be determined by the following method: A single layer film is formed on a glass substrate under the same film-forming conditions as each layer, to obtain a laminate of the glass substrate and the single layer film. The surface reflectance of the surface of the laminate on which the single layer film is formed is measured using an Olympus USPM-RU lens reflectance measuring instrument, and the refractive index is determined by optical thin film analysis of the obtained spectral reflectance.

[0035] Examples 2 to 5 O introduced from an ion gun ２ Gas and N ２ The gas flow ratio was changed to form an underlayer having the same refractive index as the lens substrate shown in Table 1 or Table 2. ２ Gas and N ２ N in gas flow rate ratio ２ The multilayer films were formed by the same method as in Example 1, except that the items shown in Table 1 for Examples 2 and 3, and the items shown in Table 2 for Examples 4 and 5 were changed as shown in each table.

[0036] [Comparative Examples 1 to 5] Spectacle lenses having the layer configurations shown in Table 3 or Table 4 were prepared. Specifically, a spectacle lens of Comparative Example 1 was prepared as a spectacle lens having the same reflection characteristics as the spectacle lens of Example 1. A spectacle lens of Comparative Example 2 was prepared as a spectacle lens having the same reflection characteristics as the spectacle lens of Example 2. A spectacle lens of Comparative Example 3 was prepared as a spectacle lens having the same reflection characteristics as the spectacle lens of Example 3. A spectacle lens of Comparative Example 4 was prepared as a spectacle lens having the same reflection characteristics as the spectacle lens of Example 4. A spectacle lens of Comparative Example 5 was prepared as a spectacle lens having the same reflection characteristics as the spectacle lens of Example 5. In the spectacle lenses of Comparative Examples 1 to 5, the primer layer and the hard coat layer were cured layers formed by applying and curing a curable composition. The multilayer films were formed by the method described for Example 1, except that the items shown in Table 3 for Comparative Examples 1 to 3 and the items shown in Table 4 for Examples 4 and 5 were changed as shown in each table.

[0037] [Reflection Characteristics] The reflection characteristics at the optical center of each of the convex and concave surfaces of each of the eyeglass lenses in Examples 1 to 5 and Comparative Examples 1 to 5 were measured for normal incidence (i.e., for 0° incident light). Measurements were performed using a Hitachi High-Technologies UH4150 spectrophotometer (measurement pitch: 1 nm, measurement conditions set to normal incidence). Figures 1 to 15 show the reflection spectra measured for the convex and concave sides of the above Examples and Comparative Examples. Figures 3, 6, 9, 12, and 15 show enlarged reflection spectra for the concave side. From the reflection characteristics measured above, the luminous reflectance Rv, dominant wavelength Wd, and excitation purity Pe were calculated. The luminous reflectance Rv was calculated in accordance with JIS T 7334:2011. The dominant wavelength Wd was calculated in accordance with Annex JA of JIS Z 8781-3:2016. The excitation purity Pe was determined in accordance with JIS 8701: 1999. The luminous reflectance Rv, dominant wavelength Wd, and excitation purity Pe of the spectacle lens are not particularly limited, but for example, the luminous reflectance Rv can be 0% or more and 1.50% or less, the dominant wavelength Wd can be 400 nm or more and 600 nm or less, and the excitation purity Pe can be 20.0% or more and 75.0% or less.

[0038] The results are shown in Tables 1 to 4. In the following tables, when the 9th layer is an ITO layer, the 7th layer is an SiO ２ layer, and the eighth layer is ZrO ２ If there is no ninth ITO layer, the seventh layer is an ITO layer and the eighth layer is an SiO ２ In the following table, the material of the underlayer formed in Examples 1 to 5 is denoted as "SiON" for convenience, but this does not limit the composition of the underlayer formed in Examples 1 to 5.

[0039] 1 to 15 and the measured values ​​of the reflection characteristics (luminous reflectance Rv, dominant wavelength Wd, and excitation purity Pe) shown in the table below, it can be confirmed that the spectacle lenses of Examples 1 to 5 have reflection characteristics equivalent to those of the corresponding spectacle lenses of Comparative Examples, and that the occurrence of ripples in the reflection spectra is suppressed compared to the corresponding spectacle lenses of Comparative Examples. The more significant the occurrence of ripples in the reflection spectra, the more easily interference fringes are visible on the spectacle lenses, so it can be said that the occurrence of interference fringes is suppressed in the spectacle lenses of Examples 1 to 5.

[0040]

[0041]

[0042]

[0043]

[0044] The various aspects described herein may be combined in any combination of two or more.

[0045] The embodiments disclosed herein should be considered to be illustrative in all respects and not restrictive. The scope of the present invention is defined by the claims, not by the above description, and is intended to include all modifications within the meaning and scope of the claims.

[0046] The present invention is useful in the field of manufacturing eyeglass lenses and eyeglasses.

Claims

1. A method for manufacturing an eyeglass lens comprising a lens substrate and a multilayer film located on at least one surface of the lens substrate, wherein the eyeglass lens further comprises an underlayer between the lens substrate and the multilayer film, and the underlayer is formed by sputtering a metal target and irradiating the metal film formed by the sputtering with oxygen ions and nitrogen ions, at least once.

2. The method for manufacturing eyeglass lenses according to claim 1, wherein the metal target is a Si target.

3. The method for manufacturing eyeglass lenses according to claim 1, wherein the irradiation of oxygen ions and nitrogen ions is carried out by an ion gun.

4. The method for manufacturing eyeglass lenses according to claim 1, wherein the multilayer film comprises one or more high refractive index layers and one or more low refractive index layers, and at least one of the high refractive index layers has a refractive index of 2.00 or more and 2.40 or less.

5. The method for manufacturing eyeglass lenses according to claim 1, wherein the multilayer film includes one or more high refractive index layers and one or more low refractive index layers, and one or more of the low refractive index layers has a refractive index of 1.44 or more and 1.49 or less.

6. A method for manufacturing eyeglass lenses according to claim 1, wherein the metal target is a Si target, the oxygen ions and nitrogen ions are irradiated using an ion gun, the multilayer film includes one or more high refractive index layers and one or more low refractive index layers, one or more of the high refractive index layers having a refractive index of 2.00 or more and 2.40 or less, and one or more of the low refractive index layers having a refractive index of 1.44 or more and 1.49 or less.

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