Microlens arrangement method

Abstract

Embodiments of the present disclosure provide a microlens arrangement method. The arrangement method comprises: acquiring the position of a central prescription area; acquiring the position of a reference circle; acquiring the position of a reference loop line of an innermost layer; acquiring inter-line distances, and on the basis of the position of the reference loop line of the innermost layer, sequentially accumulating the inter-line distances in the direction moving away from the reference circle to calculate the positions of reference loop lines of the remaining layers; acquiring the number of reference points of reference loop lines of layers, and acquiring the positions of starting reference points; acquiring center distances, and on the basis of the center distances and the positions of the starting reference points, calculating the positions of the remaining reference points on the reference loop lines in the directions of extension of the reference loop lines; and determining corresponding projection points of the reference points on a base body arc surface of a lens base body in the thickness direction of the lens base body, and determining the positions of the microlenses on the basis of the positions of the projection points. According to the microlens arrangement method in the embodiments of the present disclosure, the positions of the microlenses on the lens base body are determined, facilitating two-dimensional coordinate parameterization of the positions of the reference points.

Description

A method for arranging microlenses

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This disclosure is based on and claims the priority of Chinese patent application No. 202410395255.6, filed on April 2, 2024, entitled “A method for arranging microlenses”. The entire contents of the aforementioned Chinese patent application are hereby incorporated into this disclosure by reference. Technical Field

[0003] The present disclosure relates to the technical field of glasses, and in particular to a method for arranging micro lenses. Background Art

[0004] In recent years, people have paid more and more attention to the prevention and control of myopia.

[0005] By arranging multiple micro lenses in the lens to form myopic or hyperopic defocus, it helps to inhibit the growth of the eye axis during the wearing of glasses, thereby inhibiting the deepening of myopic or hyperopic readings.

[0006] During the manufacturing process of a lens with microlenses, it is necessary to first determine the position of the microlenses on the lens substrate before manufacturing the microlenses at the corresponding positions. Therefore, determining the position of each microlens on the lens substrate is directly related to the normal progress of the subsequent manufacturing process. Summary of the Invention

[0007] In view of this, an embodiment of the present disclosure desires to provide a method for arranging microlenses, which is used to determine the arrangement positions of the microlenses on a lens substrate.

[0008] To achieve the above objectives, the technical solution of the embodiment of the present disclosure is implemented as follows:

[0009] The present disclosure provides a method for arranging microlenses, the method comprising:

[0010] Obtaining the position of the central prescription area of ​​the lens base body on the base plane;

[0011] Acquire the position of a reference circle on the base plane so that the central prescription area is located within the range of the reference circle;

[0012] Obtaining the position of the innermost reference loop so that the reference circle is located inside the innermost reference loop;

[0013] Obtaining the distance between the reference loop lines of two adjacent layers, and based on the position of the innermost layer of the reference loop line, sequentially accumulating the distances between the lines in a direction away from the reference circle to obtain the positions of the reference loop lines of the remaining layers;

[0014] Obtaining the number of reference points of the reference loop line of each layer and obtaining the position of the starting reference point;

[0015] Obtaining a center distance between reference projections of two adjacent microlenses on the reference ring line, and calculating positions of the remaining reference points on the reference ring line according to the center distance and the position of the initial reference point along the extension direction of the reference ring line;

[0016] The projection point corresponding to the reference point on the curved surface of the lens substrate along the thickness direction of the lens substrate is determined, and the position of the microlens is determined according to the position of the projection point.

[0017] In some embodiments, the central prescription area is located within the range of the reference circle, specifically including:

[0018] The reference circle is made to coincide with the central prescription area.

[0019] In some embodiments, the innermost reference loop and the reference circle are configured as follows:

[0020] In the reference projections on the innermost reference circle, at least a portion of the reference projections is tangent to the reference circle.

[0021] In some embodiments, the step of obtaining the position of the innermost reference loop line specifically includes:

[0022] Obtaining a first distance between the innermost reference loop line and the reference circle, and calculating the radius of the innermost reference loop line according to the sum of the first distance and the radius of the reference circle;

[0023] The position of the innermost reference loop is determined according to the position of the center of the reference circle.

[0024] In some embodiments, the inter-line distance is configured to be a fixed value not less than the base plane chord length of the microlens;

[0025] The step of sequentially accumulating the distances between the lines in a direction away from the reference circle to calculate the position of the reference loop line of each layer specifically includes:

[0026] According to the radius of the innermost reference ring line, the distances between each line are accumulated from the inside to the outside along the radial direction of the reference circle to calculate the radius of the reference ring lines of the remaining layers;

[0027] The positions of the reference loop lines in the remaining layers are determined according to the position of the reference loop line in the innermost layer and the radius of the reference loop lines in the remaining layers.

[0028] In some embodiments, before calculating the radius of the reference loop lines of the remaining layers, the arrangement method further includes:

[0029] Obtaining the radius of the base plane;

[0030] Calculating a difference between a radius of the base plane and a radius of the reference circle to obtain a first radial dimension;

[0031] The quotient of the first radial dimension and the distance between lines is calculated and rounded down to obtain the total number of layers of the reference loop line.

[0032] In some embodiments, obtaining the number of reference points on the reference loop specifically includes:

[0033] The quotient of the perimeter of the reference loop and the center distance is calculated and rounded down to obtain the number of the reference points on the reference loop.

[0034] In some embodiments, obtaining the position of the starting reference point of the reference loop specifically includes:

[0035] An intersection point of the reference loop line and a straight line passing through the center of the reference circle is determined as the starting reference point.

[0036] In some embodiments, obtaining the position of the starting reference point of the reference loop specifically includes:

[0037] Obtaining a position of a reference curve, wherein the reference curve passes through the innermost reference ring line and a base plane boundary of the lens base;

[0038] An intersection point between the reference loop line and the reference curve is determined as the starting reference point.

[0039] In some embodiments, the reference loop includes a first main arc and a second main arc;

[0040] The steps for obtaining the position of the innermost reference loop include:

[0041] Obtaining initial parameters: obtaining the radius of the first main arc of the innermost reference loop, the radius of the second main arc of the innermost reference loop, the reference spacing, and the preset cutting angle;

[0042] Determining a reference circle: determining the center position and radius of the reference circle according to the reference spacing, the radius of the reference circle, and the center position of the reference circle;

[0043] Determine the first main arc of the innermost reference loop line: set the first main arc of the innermost reference loop line to be symmetrical about a first straight line in a vertical direction passing through the center of the reference circle, and to be tangent to the reference circle;

[0044] Determine the second main arc of the innermost reference loop: set the second main arc to be below the first main arc, and the two second main arcs are symmetrical about the first straight line axis and tangent to the reference circle, obtain the position of the first tangent formed by the first main arc and the reference circle, obtain the position of the second tangent formed by the second main arc and the reference circle, and determine that the angle between the first tangent and the second tangent is equal to the preset tangent angle.

[0045] In some embodiments, determining that the radius of the first main arc is equal to the radius of the second main arc;

[0046] And / or, it is determined that the reference circle is located on the concave side of the first main arc, and the reference circle is located on the concave side of the second main arc.

[0047] In some embodiments, the reference loop further includes a first connecting arc and a second connecting arc, and the step of obtaining the initial parameters further includes: obtaining a radius of the first connecting arc and a radius of the second connecting arc;

[0048] After the step of determining the second main arc of the innermost reference loop, the arrangement method further includes:

[0049] Determine the first connecting arc of the innermost reference loop line: set the first connecting arc of the innermost reference loop line to connect the endpoint of the first main arc and the first endpoint of the second main arc, and to be tangent to the first main arc and the second main arc respectively;

[0050] Determine the second connecting arc of the innermost reference loop line: set the second connecting arc of the innermost reference loop line to connect the second endpoints of its two second main arcs and be tangent to the two second main arcs.

[0051] In some embodiments, the radius of the first connecting arc and the radius of the second connecting arc are determined to be equal;

[0052] And / or, it is determined that the reference circle is located on the concave side of the first connecting arc, and the reference circle is located on the concave side of the second main arc.

[0053] In some embodiments, the step of sequentially accumulating the distances between the lines in a direction away from the reference circle to obtain the reference ring lines of each layer specifically includes:

[0054] Determine the center of the circle: determine that the first main arcs of the reference loop lines of each layer share the same center, and the second main arcs on the same side share the same center;

[0055] Determine the first main arc of the reference loop line of each layer:

[0056] According to the radius of the first main arc of the innermost layer of the reference loop line, the radius of the first main arc of the remaining layers of the reference loop line is calculated by sequentially accumulating the distances between the lines from the inside to the outside along the radial direction of the first main arc;

[0057] Calculating the position of the first main arc of each layer of the reference loop line according to the center of the first main arc of the innermost layer of the reference loop line and the radius of the first main arc of each of the remaining layers of the reference loop line;

[0058] Determine the second main arc of the reference loop line of each layer:

[0059] According to the radius of the second main arc of the innermost layer of the reference loop line, the radius of the second main arc of the remaining layers of the reference loop line is calculated by sequentially accumulating the distances between each line from the inside to the outside along the radial direction of the second main arc;

[0060] The position of the second main arc of each layer of the reference loop line is calculated according to the center of the second main arc of the innermost layer of the reference loop line and the radius of the second main arc of each of the remaining layers of the reference loop line.

[0061] In some embodiments, after the step of determining the second main arc of the reference loop line of each layer, the arrangement method further includes:

[0062] Determine that the radius of the first connecting arc of the reference loop line of each layer is the same, and determine that the radius of the second connecting arc of the reference loop line of each layer is the same;

[0063] Determine the first connecting arc of the reference loop line of each layer: set the first connecting arc of the reference loop line of each layer to connect the endpoint of the first main arc of the layer and the first endpoint of the second main arc of the layer, and to be tangent to the first main arc and the second main arc of the layer respectively;

[0064] Determine the second connecting arc of the reference loop line of each layer: set the second connecting arc of the reference loop line of each layer to connect the second end points of the two second main arcs of the layer and be tangent to the two second main arcs of the layer respectively.

[0065] In some embodiments, obtaining the number of reference points of the reference loop line of each layer specifically includes:

[0066] Calculating the quotient of the arc length of the first main arc and the center distance and rounding down to obtain the number of reference points on the first main arc;

[0067] Calculating the quotient of the arc length of the second main arc and the center distance and rounding down to obtain the number of reference points on the second main arc;

[0068] Calculating the quotient of the arc length of the first connecting arc and the center distance and rounding down to obtain the number of the reference points on the first connecting arc;

[0069] The quotient of the arc length of the second connecting arc and the center distance is calculated and rounded down to obtain the number of the reference points on the second connecting arc.

[0070] In some embodiments, obtaining the position of the starting reference point specifically includes:

[0071] Along the first circumferential direction, the starting end of the first main arc is determined as the starting reference point on the first main arc, the starting end of the second main arc is determined as the starting reference point on the second main arc, the starting end of the first connecting arc is determined as the starting reference point on the first connecting arc, and the starting end of the second connecting arc is determined as the starting reference point on the second connecting arc.

[0072] In some embodiments, obtaining the distance between two adjacent reference loop lines specifically includes:

[0073] Obtaining a base plane chord length and a first proportional coefficient of the microlens, where the first proportional coefficient is greater than 1;

[0074] Calculating the first inter-line distance in a direction away from the reference circle according to the product of the base plane chord length and the first proportional coefficient;

[0075] Along a direction away from the reference circle, the next inter-line distance is calculated according to the product of the previous inter-line distance and the first proportional coefficient.

[0076] In some embodiments, obtaining the distance between two adjacent reference loop lines specifically includes:

[0077] Obtaining a second proportionality coefficient and an inter-mirror distance between two adjacent reference projections of the reference loop line on the same layer, wherein the second proportionality coefficient is greater than 1;

[0078] Obtaining a reference radius of the microlens corresponding to the innermost reference ring line;

[0079] Calculate the product of the radius of the reference projection of the previous layer and the second proportional coefficient in a direction away from the reference circle to obtain the radius of the reference projection of the next layer;

[0080] The inter-line distance is obtained by calculating the sum of the radius of the reference projection of the previous layer of the reference ring line, the radius of the reference projection of the next layer of the reference ring line, and the inter-mirror distance.

[0081] In some embodiments, the reference projection corresponding to each layer of the reference loop line includes a first sub-projection and a second sub-projection, and the radius of the second sub-projection is greater than the radius of the first sub-projection;

[0082] Obtaining the distance between two adjacent reference loop lines specifically includes:

[0083] Obtaining a second proportionality coefficient and an inter-mirror distance between two adjacent reference projections of the reference loop line on the same layer, wherein the second proportionality coefficient is greater than 1;

[0084] Obtaining a reference radius of the second sub-projection corresponding to the innermost reference ring line;

[0085] Calculate the product of the radius of the second sub-projection corresponding to the reference circle of the previous layer and the second proportional coefficient in a direction away from the reference circle to obtain the radius of the second sub-projection corresponding to the reference circle of the next layer;

[0086] The inter-line distance is obtained by calculating the sum of the radius of the second sub-projection corresponding to the previous layer of the reference ring line, the radius of the second sub-projection corresponding to the next layer of the reference ring line, and the inter-mirror distance.

[0087] The microlens placement method disclosed in the present embodiment determines the position of the microlenses on the lens substrate by determining the positions of the reference rings and reference points on the base plane, indirectly determining the positions of the projection points on the curved surface of the lens substrate. Placing the reference rings and reference points on the base plane facilitates parameterization of the reference point positions in two-dimensional coordinates, simplifying the calculation process and improving computational efficiency. Furthermore, the microlenses are arranged around the central prescription area to ensure that the human eye is protected from defocusing during rotation. BRIEF DESCRIPTION OF THE DRAWINGS

[0088] FIG1 is a schematic diagram of steps of a layout method according to an embodiment of the present disclosure;

[0089] FIG2 is a schematic diagram of the arrangement of reference projections on a base plane in the first embodiment of the present disclosure;

[0090] FIG3 is a partial enlarged schematic diagram of position A in FIG2 ;

[0091] FIG4 is a schematic diagram of the arrangement of reference projections on a base plane in a second embodiment of the present disclosure;

[0092] FIG5 is a partial enlarged schematic diagram of position B in FIG4 ;

[0093] FIG6 is a schematic diagram of the innermost reference ring line, the first tangent line, the second tangent line and the reference circle in the embodiment of FIG4 ;

[0094] FIG7 is a schematic diagram of the arrangement of reference projections on a base plane in a third embodiment of the present disclosure;

[0095] FIG8 is a schematic diagram of the arrangement of reference projections on a base plane in a fourth embodiment of the present disclosure;

[0096] FIG9 is a schematic diagram of the arrangement of reference projections on a base plane in a fifth embodiment of the present disclosure;

[0097] FIG10 is a partial enlarged schematic diagram of position C in FIG4 ;

[0098] FIG11 is a schematic cross-sectional view of a lens substrate and microlenses in an embodiment of the present disclosure. DETAILED DESCRIPTION

[0099] It should be noted that, unless there is a conflict, the embodiments and technical features in the embodiments of the present disclosure can be combined with each other, and the detailed description in the specific implementation methods should be understood as an explanation of the purpose of the present disclosure and should not be regarded as an improper limitation on the present disclosure.

[0100] In the description of the embodiments of the present disclosure, the "vertical direction" orientation or position relationship is based on the orientation or position relationship shown in FIG4 , and the "thickness direction" orientation or position relationship is based on the orientation or position relationship shown in FIG11 . It should be understood that these orientation terms are only for the convenience of describing the present disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the embodiments of the present disclosure.

[0101] The present disclosure provides a method for determining the position of a microlens 20 on a lens substrate 10. Referring to FIG1 , the method includes:

[0102] S10: Acquire the position of the central prescription area 10a of the lens base 10 on the base plane 10b.

[0103] The lens base 10 is a light-transmitting structural component for arranging the microlenses 20.

[0104] The specific material of the lens base 10 is not limited, such as glass, resin, etc.

[0105] The base plane 10 b of the lens base 10 refers to a plane perpendicular to the thickness direction of the lens base 10 .

[0106] The base plane 10b of the lens base 10 can be an actual surface of the lens base 10. For example, when the user wears the lens, the surface on the side close to the human eye along the thickness direction of the lens base 10 is the surface of the lens base 10; it can also be a virtual surface inside the lens base 10 that is assumed to exist for reference.

[0107] The central prescription area 10a refers to an area where the diopter of the lens is the diopter of the prescription used to correct vision.

[0108] S20 : ​​Acquire the position of the reference circle 11 on the base plane 10 b so that the central prescription area 10 a is located within the range of the reference circle 11 .

[0109] That is, in a projection perpendicular to the thickness direction of the lens base 10 , the projection of the central prescription area 10 a is located within the projection range of the reference circle 11 .

[0110] The reference circle 11 is used as a reference to determine a boundary between the projection area of ​​the central prescription area 10 a on the base plane 10 b and the out-of-focus area formed by the microlenses 20 .

[0111] S30: Acquire the innermost reference loop line 12 so that the reference circle 11 is located inside the innermost reference loop line 12.

[0112] That is, in the projection perpendicular to the thickness direction of the lens base 10 , the projection of the reference circle 11 is located within the projection range of the innermost reference ring line 12 , so that the microlens 20 can surround the central prescription area 10 a .

[0113] The reference loop line 12 is used as a reference line for arranging reference points 13 in subsequent steps and is located on the base plane 10b.

[0114] It is understandable that in order to allow the human eye to be affected by the refraction of the microlens 20 during the rotation process, the reference ring line 12 is a closed ring line, so that the microlens 20 can surround the central prescription area 10a.

[0115] It is understood that the number of reference loops 12 is multiple layers, and the reference loops 12 are nested one within the other in a direction away from the reference circle 11. That is, of two adjacent layers of reference loops 12, the inner layer of reference loops 12 is located inside the outer layer of reference loops 12. The innermost layer of reference loops 12 is the reference loop 12 closest to the reference circle 11 in the direction approaching the reference circle 11.

[0116] S40: Obtain the distance between two adjacent layers of reference loop lines 12, and according to the position of the innermost layer of reference loop line 12, successively accumulate the distances between the lines in the direction away from the reference circle 11 to calculate the positions of the remaining layers of reference loop lines 12.

[0117] The distance between lines is the distance between two adjacent layers of reference ring lines 12 in a direction away from the reference circle 11. Referring to Figures 3 and 5, the distance between lines is L1.

[0118] S50: Obtain the number of reference points 13 of the reference loop line 12 of each layer and obtain the position of the starting reference point 13.

[0119] The reference point 13 is a point on the reference loop line 12 .

[0120] The initial reference point 13 , that is, the reference points 13 are arranged in a certain direction on the reference loop line 12 , and the first reference point 13 along the direction.

[0121] It is understandable that on the same level reference loop 12 , it is necessary to first determine the position of the first reference point 13 , and then use the position of the first reference point 13 as a reference to determine the positions of the other reference points 13 .

[0122] S60: Obtain the center distance between the reference projections 21 of two adjacent microlenses 20 on the reference ring line 12, and calculate the positions of the remaining reference points 13 on the reference ring line 12 according to the center distance and the position of the starting reference point 13 along the extension direction of the reference ring line 12.

[0123] Reference projection 21 refers to the projection of the microlens 20 on the base plane 10 b along the thickness direction of the lens substrate 10 .

[0124] The center distance refers to the distance between the geometric centers of two adjacent reference projections 21 on the same reference circle line 12, projected along the thickness direction of the lens substrate 10. The center distance is a preset distance. Referring to Figures 3 and 5 , the center distance is L2.

[0125] It can be understood that when the projection of the microlens 20 along the thickness direction of the lens base 10 is circular, the geometric center of the microlens 20 is the center of the circle.

[0126] In this way, on the reference loop line 12 , along the extending direction of the reference loop line 12 , based on the position of one reference point 13 , the position of the next reference point 13 can be obtained at every center distance.

[0127] S70 : determining a projection point 14 corresponding to the reference point 13 on the curved surface 10 c of the lens substrate 10 along the thickness direction of the lens substrate 10 , and determining the position of the microlens 20 according to the position of the projection point 14 .

[0128] 11 , the base curved surface 10 c is the curved surface on the lens base 10 for arranging the microlenses 20 .

[0129] The projection point 14 is a point generated by projecting the reference point 13 onto the curved surface 10 c of the lens substrate 10 along the thickness direction of the lens substrate 10 .

[0130] That is, the microlens 20 is manufactured on the base curved surface 10 c based on the position of the projection point 14 .

[0131] It can be understood that the base curved surface 10 c and the base plane 10 b are respectively located on opposite sides of the lens base 10 along the thickness direction thereof.

[0132] The method for arranging the microlenses 20 in the disclosed embodiments determines the positions of the microlenses 20 on the lens substrate 10 by determining the positions of the reference ring line 12 and reference point 13 on the base plane 10b, thereby indirectly determining the position of the projection point 14 on the base curved surface 10c. Arranging the reference ring line 12 and reference point 13 on the base plane 10b facilitates parameterization of the position of the reference point 13 in two-dimensional coordinates, simplifying the calculation process and improving computational efficiency. Furthermore, the microlenses 20 are arranged around the central prescription area 10a to ensure that the human eye is not defocused by the microlenses 20 during rotation.

[0133] The specific method of determining the position of the microlens 20 by the projection point 14 is not limited.

[0134] Exemplarily, the microlens 20 is the center of a circle, and the center of the microlens 20 is located at the position of the projection point 14 .

[0135] It should be noted that in order to make the final lens meet the refractive power requirements of the usage scenario, the base plane 10b of the lens base 10 can be further processed into a concave or convex surface. The specific method and the required related processes and equipment have been disclosed in the relevant technology and will not be repeated here.

[0136] In some embodiments, the central prescription area 10a is located within the range of the reference circle 11, specifically including:

[0137] The reference circle 11 is made to overlap with the central prescription area 10 a .

[0138] That is, the area enclosed by the reference circle 11 is equal to the central prescription area 10 a .

[0139] In this way, the microlenses 20 are arranged close to the central prescription area 10a, which, on the one hand, improves the space utilization of the lens base 10; on the other hand, the defocus area generated by the microlenses 20 is close to the central prescription area 10a, thereby improving the defocus effect.

[0140] The relative positional relationship between the innermost reference loop line 12 and the reference circle 11 is not limited.

[0141] For example, referring to FIG3 and FIG5 , the innermost reference loop line 12 and the reference circle 11 are configured as follows:

[0142] In the reference projection 21 on the innermost reference ring line 12 , at least a portion of the reference projection 21 is tangent to the reference circle 11 .

[0143] In this way, the microlens 20 is facilitated to be close to the central prescription area 10 a, thereby improving the utilization rate of the upper surface of the lens base 10 and enhancing the defocusing effect of the defocusing area formed by the microlens 20 .

[0144] It can be understood that at least a portion of the boundary of the reference projection 21 is arc-shaped so as to be tangent to the reference circle 11 .

[0145] It can be understood that in some embodiments, the distance between lines is equal to the center distance, that is, L1 = L2.

[0146] Implementation Method 1

[0147] This embodiment can form one or more annular defocus areas on the user's retina to inhibit the tendency of the user's glasses to become more dioptered.

[0148] In some embodiments, referring to FIG. 3 , the step of obtaining the position of the innermost reference loop line 12 specifically includes:

[0149] Obtaining a first distance between the innermost reference loop line 12 and the reference circle 11, and calculating the radius of the innermost reference loop line 12 according to the sum of the first distance and the radius of the reference circle 11;

[0150] The position of the innermost reference loop line 12 is determined based on the position of the center of the reference circle 11 .

[0151] 2 and 3 , the innermost reference loop 12 is circular, the radius of the reference circle 11 is R2 , the first spacing is L5 , and the sum of R2 and L5 is equal to the radius of the innermost reference loop 12 .

[0152] Since the innermost reference ring line 12 is circular, it is advantageous for the reference points 13 set on the innermost reference ring line 12 to also be arranged in a circular array, so that the microlenses 20 correspondingly formed on the base curved surface 10c are also arranged in a circular array, thereby forming an annular defocus area on the user's retina to inhibit the tendency of the user's glasses to deepen.

[0153] The specific method for setting the innermost reference ring line 12 with reference to the center of reference circle 11 is not limited. For example, the center of reference circle 11 can be the center of reference ring line 12. In this way, the shape of reference ring line 12 can be determined based on the position of the center of reference ring line 12 and the radius of reference ring line 12. For another example, the center of reference ring line 12 can be offset from the center of reference circle 11 by a predetermined offset distance to ensure that the formed annular defocused area meets the needs of different users.

[0154] The specific value of the first spacing is not limited. For example, in an embodiment where the microlenses 20 to be prepared are spherical, the reference projection 21 is circular, and the first spacing is the radius of the reference projection 21 on the innermost reference directrix. This allows the microlenses 20 to be placed as close as possible to the central prescription area 10a, thereby improving the utilization of the space on the lens substrate 10.

[0155] In some embodiments, referring to FIG3 , the inter-line distance is configured to be a constant value not less than the chord length of the base plane 10 b of the microlens 20 ;

[0156] The step of successively accumulating the distances between each line in a direction away from the reference circle 11 to calculate the position of each layer of the reference ring line 12 specifically includes:

[0157] According to the radius of the innermost reference ring line 12, the distances between each line are accumulated from the inside to the outside along the radial direction of the reference circle 11 to calculate the radius of the reference ring lines 12 of the remaining layers;

[0158] The positions of the reference loop lines 12 of the remaining layers are determined according to the position of the innermost layer's reference loop line 12 and the radius of the reference loop lines 12 of the remaining layers.

[0159] The chord length of the base plane 10b of the microlens 20, i.e., the dimension indicated by L3 in FIG3 , is equal to the diameter of the reference projection 21 when the reference projection 21 is a circle; and equal to the diameter of the circumscribed circle of the reference projection 21 when the reference projection 21 is a regular polygon.

[0160] The distance between the lines is a constant value so that the spacing between the reference loop lines 12 is equal.

[0161] The distance between the lines is greater than the chord length of the base plane 10 b so that the reference projections 21 on the two adjacent layers of reference loop lines 12 do not overlap.

[0162] By continuously accumulating the distances between the lines, each layer of reference loop lines 12 is made circular.

[0163] The radius of each layer of reference loop lines 12 is equal to the sum of the radius of the previous layer of reference loop lines 12 and the distance between the two layers of reference loop lines 12 .

[0164] In this way, each layer of the reference ring line 12 is circular, so that a plurality of annular defocus areas can be formed on the user's retina, thereby better suppressing the tendency of the user's glasses to deepen.

[0165] It can be understood that the reference loop lines 12 of each layer have the same center.

[0166] In some embodiments, referring to FIG. 2 and FIG. 3 , before calculating the radius of the reference loop lines 12 of the remaining layers, the arrangement method further includes:

[0167] Get the radius of the base plane 10b;

[0168] Calculate the difference between the radius of the base plane 10b and the radius of the reference circle 11 to obtain a first radial dimension;

[0169] The quotient of the first radial dimension and the distance between lines is calculated and rounded down to obtain the total number of layers of the reference loop line 12 .

[0170] The radius of the base plane 10b is the radius when the base plane 10b is located in a circle.

[0171] The first radial dimension is equal to the difference between R1 and R2.

[0172] The quotient of the first radial dimension and the inter-line distance is rounded down. In other words, the quotient of the first radial dimension divided by the inter-line distance is calculated and rounded to the nearest integer. For example, if the quotient of the first radial dimension divided by the inter-line distance is 10.43, and this is rounded down to 10, then the total number of layers of the reference loop 12 is 10.

[0173] In this way, the microlenses 20 are completely located on the lens substrate 10 and each prepared microlens 20 maintains structural integrity, which is conducive to ensuring that the defocus effect of the defocus area formed by the microlens 20 meets the design requirements.

[0174] In some embodiments, obtaining the number of reference points 13 on the reference loop 12 specifically includes:

[0175] The quotient of the perimeter of the reference loop line 12 and the center distance is calculated and rounded down to obtain the number of reference points 13 on the reference loop line 12 .

[0176] The quotient of the circumference of the reference loop 12 and the center distance is rounded down. In other words, the quotient of the circumference of the reference loop 12 divided by the center distance is calculated and rounded to the nearest integer. For example, if the quotient of the circumference of the reference loop 12 divided by the center distance is 20.56, and this is rounded down to 20, then the number of reference points 13 arranged on the reference loop 12 is 20.

[0177] In this way, the microlenses 20 are not overlapped, and as many reference points 13 as possible are arranged on the reference ring line 12 while meeting the center distance requirement, which is beneficial to improving space utilization and enhancing the defocusing effect of the defocusing area formed by multiple microlenses 20.

[0178] The specific method for determining the starting reference point 13 on the reference loop line 12 is not limited.

[0179] For example, referring to FIG2 , obtaining the position of the starting reference point 13 of the reference loop line 12 specifically includes:

[0180] The intersection point of the reference loop line 12 and the straight line passing through the center of the reference circle 11 is determined as the starting reference point 13 .

[0181] That is, the starting reference points 13 on each reference loop line 12 are located on the same straight line.

[0182] In this way, the positions of the starting reference points 13 of the other layers of reference loop lines 12 can be determined through the starting reference point 13 of the innermost layer of reference loop line 12, which is conducive to simplifying the calculation process of determining the positions of the starting reference points 13 of the other layers of reference loop lines 12. The method is simple and intuitive, which is conducive to improving calculation efficiency.

[0183] For another example, referring to FIG7 , obtaining the position of the starting reference point 13 of the reference loop line 12 specifically includes:

[0184] Obtaining the position of the reference curve 15 , where the reference curve 15 passes through the boundary between the innermost reference ring line 12 and the base plane 10 b of the lens base 10 ;

[0185] The intersection point of the reference loop line 12 and the reference curve 15 is determined as the starting reference point 13 .

[0186] That is, the starting reference points 13 on each reference loop line 12 are located on the same curve.

[0187] In this way, the micro lenses 20 are arranged more evenly and the defocused areas formed by the micro lenses 20 have a better defocusing effect.

[0188] The specific form of the curve is not limited, such as conic sections, spiral curves, etc.

[0189] In some embodiments, the radius of the reference circle 11 is R0, the radius of the lens base 10 is D, the chord length of the base plane 10b of the microlens 20 is L3, the center distance is L2=3 / 2*L3, and the line distance is L1=3 / 2*L3.

[0190] The radius of the i-th layer reference loop 12 satisfies: i =R0+((2i-1)*L3) / 2

[0191] In the above formula, r i is the radius of the i-th reference loop line 12, where i = 1, 2, 3, 4…n, and n is the total number of layers of the reference loop line 12.

[0192] The number m of reference points 13 on the i-th layer reference loop line 12 satisfies: m=floor(2*π*r i / L2)

[0193] In the above formula, floor refers to the floor function.

[0194] The total number of floors n of the reference loop 12 satisfies: n = floor ((D - R0) / L1)

[0195] A two-dimensional coordinate system is established on the base plane 10b, and a reference circle 11 is set to coincide with the central prescription area 10a. The center of the reference circle 11 is used as the coordinate origin, and the starting reference point 13 on each reference loop 12 is located on the horizontal axis passing through the coordinate origin. In the first embodiment, the coordinates of the j-th reference point 13 on the i-th layer reference loop 12 are obtained as follows: (r i *cos(j*2π / m),r i *sin(j*2π / m))

[0196] Wherein, j=1, 2, ..., m, and m is the number of reference points 13 on the i-th reference loop line 12 .

[0197] Implementation Method 2

[0198] This embodiment can better adapt to the eye usage habit of moving the eyeball more left and right and less up and down, and increase eye comfort while satisfying the defocus effect.

[0199] In some embodiments, referring to FIG. 4 to FIG. 6 , the reference loop line 12 includes a first main arc 121 and a second main arc 122 .

[0200] The step of obtaining the position of the innermost reference loop line 12 specifically includes:

[0201] Obtaining initial parameters: obtaining the radius of the first main arc 121 of the innermost reference loop line 12 , the radius of the second main arc 122 of the innermost reference loop line 12 , the reference spacing, and the preset cutting angle.

[0202] The reference spacing is the spacing value between the preset reference circle 16 and the reference circle 11 .

[0203] Determine the reference circle 16 : Determine the center position and radius of the reference circle 16 according to the reference spacing, the radius of the reference circle 11 , and the center position of the reference circle 11 .

[0204] Determine the first main arc 121 of the innermost reference loop line 12 : Set the first main arc 121 of the innermost reference loop line 12 to be axisymmetric about the first vertical straight line 17 passing through the center of the reference circle 11 and tangent to the reference circle 16 .

[0205] By setting the reference circle 16 , the position of the first main arc 121 can be obtained through the relevant parameters of the reference circle 11 .

[0206] The vertical direction refers to the straight line direction where the direction of gravity is located when the lens base 10 is worn by the user.

[0207] It can be understood that the center of the first main arc 121 is located on the first straight line 17. When the radius of the first main arc 121 is known, the first main arc 121 can be obtained.

[0208] Determine the second main arc 122 of the innermost reference loop line 12: set the second main arc 122 to be below the first main arc 121, and the two second main arcs 122 are symmetrical about the axis passing through the first straight line 17 and are tangent to the reference circle 16, obtain the position of the first tangent 18 formed by the first main arc 121 and the reference circle 16, obtain the position of the second tangent 19 formed by the second main arc 122 and the reference circle 16, and determine that the angle between the first tangent 18 and the second tangent 19 is equal to the preset tangent angle.

[0209] It can be understood that the first tangent line 18 is perpendicular to the first straight line 17 .

[0210] The preset cutting angle is shown in Figure 6, which is the angle of D1.

[0211] That is, the number of the second main arcs 122 is two, and the two second main arcs 122 are respectively located on both sides of the first main arc 121 in a direction perpendicular to the first straight line 17 .

[0212] The shape of the second main arc 122 is determined by the position of the second tangent 19 according to the reference circle 16 , the first tangent 18 and the preset tangent angle, and then according to the tangent point of the second tangent 19 and the reference circle 16 and the radius of the second main arc 122 .

[0213] The central prescription area 10 a is located inside the area enclosed by the first main arc 121 and the second main arc 122 .

[0214] In this way, through the cooperation of the first main arc 121 and the second main arc 122, the dimension of the innermost reference ring line 12 formed in the direction perpendicular to the vertical direction is larger than the dimension in the vertical direction, thereby making the arrangement of the microlens 20 adapt to the eye habit of moving more left and right and less up and down, thereby increasing eye comfort while satisfying the defocus effect.

[0215] In some embodiments, referring to FIG. 5 , the radius of the first main arc 121 is greater than the radius of the reference circle 16 ; and the radius of the second main arc 122 is greater than the radius of the reference circle 16 .

[0216] In some embodiments, the step of determining the center position and radius of the reference circle 16 specifically includes:

[0217] Determine the center of the reference circle 16 as the center of the reference circle 11;

[0218] The radius of the reference circle 16 is calculated based on the sum of the radius of the reference circle 11 and the radius of the base plane 10 b of the microlens 20 .

[0219] The radius of the base plane 10b is half the chord length of the base plane 10b.

[0220] In this way, the reference circle 16 is brought closer to the base circle 11 , so that the microlenses 20 corresponding to the first main arc 121 and the second main arc 122 can be closer to the central prescription area 10 a , which is beneficial to improving the defocusing effect of the defocused area formed by the microlenses 20 .

[0221] In some embodiments, the radius of the first main arc 121 is equal to the radius of the second main arc 122 .

[0222] This helps reduce calculation parameters and simplify calculation steps.

[0223] In some embodiments, referring to FIG. 5 and FIG. 6 , it is determined that the reference circle 16 is located on the concave side of the first main arc 121 , and the reference circle 16 is located on the concave side of the second main arc 122 .

[0224] In this way, the reference point on the innermost reference ring line is facilitated to be close to the central prescription area 10 a , which helps to improve the defocusing effect of the defocusing area formed by the microlens 20 .

[0225] In some embodiments, referring to FIG5 and FIG6 , the reference loop line 12 further includes a first connecting arc and a second connecting arc 124 , and the step of obtaining the initial parameters further includes: obtaining a radius of the first connecting arc 123 and a radius of the second connecting arc 124 ;

[0226] After the step of determining the second main arc 122 of the innermost reference loop line 12, the arrangement method further comprises:

[0227] Determine the first connecting arc 123 of the innermost reference loop line 12: Set the first connecting arc 123 of the innermost reference loop line 12 to connect the endpoint of the first main arc 121 and the first endpoint of the second main arc 122 thereof, and to be tangent to the first main arc 121 and the second main arc 122 thereof respectively;

[0228] Determine the second connecting arc 124 of the innermost reference loop line 12 : set the second connecting arc 124 of the innermost reference loop line 12 to connect the second end points of the two second main arcs 122 thereof and to be tangent to the two second main arcs 122 .

[0229] That is, the first main arc 121 and the two second main arcs 122 are respectively connected by two first connecting arcs 123 and one second connecting arc 124 , thereby forming a closed reference loop line 12 .

[0230] In this way, a smooth transition is implemented between the first main arc 121 and the second main arc 122 and between the two second main arcs 122 through the first connecting arc 123 and the second connecting arc 124, thereby reducing the adverse effect of the defocus effect of the defocus area of ​​the corresponding microlens 20 caused by the change in the extension direction of the reference ring line 12, which is conducive to improving the user's comfort when using the lens.

[0231] It is understandable that, in order to facilitate the arrangement of the reference points 13 on the first connecting arc 123 and the second connecting arc 124 , the radius of the first connecting arc 123 and the radius of the second connecting arc 124 are both larger than the radius of the base plane 10 b of the microlens 20 .

[0232] It can be understood that the curvature of the first main arc 121 and the curvature of the second main arc 122 are both greater than the curvature of the first connecting arc 123 and the curvature of the second connecting arc 124.

[0233] In some embodiments, the radius of the first connecting arc 123 and the radius of the second connecting arc 124 are determined to be equal.

[0234] This helps reduce calculation parameters and simplify calculation steps.

[0235] In some embodiments, referring to FIG. 5 and FIG. 6 , it is determined that the reference circle 16 is located on the concave side of the first connecting arc 123 , and the reference circle 16 is located on the concave side of the second main arc 122 .

[0236] In this way, sharp points are avoided at the connection positions of the first connecting arc 123 and the first main arc 121, the connection positions of the first connecting arc 123 and the second main arc 122, and the connection positions of the second connecting arc 124 and the second main arc 122, which is beneficial to reducing interference in the arrangement of the microlenses 20 and making the extension angle change of the reference loop line smoother.

[0237] In some embodiments, the step of sequentially accumulating the distances between each line in a direction away from the reference circle 11 to obtain the reference ring line 12 of each layer specifically includes:

[0238] Determine the center of the circle: determine that the first main arcs 121 of the reference loop lines 12 of each layer have the same center, and the second main arcs 122 on the same side have the same center.

[0239] That is, the centers of all the first main arcs 121 are the same point; the centers of all the second main arcs 122 located on the same side of the first main arc 121 perpendicular to the extending direction of the first straight line 17 are the same point.

[0240] Determine the first main arc 121 of the reference loop line 12 of each layer:

[0241] According to the radius of the first main arc 121 of the innermost reference loop line 12, the radius of the first main arc 121 of each of the remaining layers of reference loop lines 12 is calculated by successively accumulating the distances between each line from the inside to the outside along the radial direction of the first main arc 121;

[0242] The position of the first main arc 121 of each layer of the reference loop line 12 is calculated based on the center of the first main arc 121 of the innermost layer of the reference loop line 12 and the radius of the first main arc 121 of the remaining layers of the reference loop line 12 .

[0243] That is, the shapes and positions of the first main arcs 121 of the innermost reference loop line 12 are determined one by one based on the center of the first main arc 121 and the radius of the first main arc 121 .

[0244] Determine the second main arc 122 of the reference loop line 12 of each layer:

[0245] According to the radius of the second main arc 122 of the innermost reference loop line 12, the radius of the second main arc 122 of each of the remaining layers of reference loop lines 12 is calculated by successively accumulating the distances between each line from the inside to the outside along the radial direction of the second main arc 122;

[0246] The position of the second main arc 122 of each layer of the reference loop line 12 is calculated based on the center of the second main arc 122 of the innermost layer of the reference loop line 12 and the radius of the second main arc 122 of the remaining layers of the reference loop line 12 .

[0247] That is, the shapes and positions of the second main arcs 122 of the innermost reference loop line 12 are determined one by one based on the center of the second main arc 122 and the radius of the second main arc 122 .

[0248] In this way, directly using the common center method, it is easy to simplify the calculation steps for obtaining the shape and position of the first main arc 121 and the second main arc 122 of each layer of the reference ring line 12, thereby reducing the probability of interference between the microlenses 20 corresponding to each layer of the reference ring line 12.

[0249] In some embodiments, the inter-line distances between the reference loop lines 12 are the same, that is, the spacing between the first main arcs 121 of the reference loop lines 12 is equal, and the spacing between the second main arcs 122 on the same side of the reference loop lines 12 is equal.

[0250] In some embodiments, the distance between lines is equal to the center distance, so as to reduce calculation parameters and simplify calculation steps.

[0251] In some embodiments, after the step of determining the second main arc 122 of the reference loop line 12 of each layer, the arrangement method further includes:

[0252] The radius of the first connecting arc 123 of each layer of the reference loop line 12 is determined to be the same, and the radius of the second connecting arc 124 of each layer of the reference loop line 12 is determined to be the same.

[0253] That is, the radius of all first connecting arcs 123 is the same as the radius of the first connecting arc 123 of the innermost reference loop line 12 ; the radius of all second connecting arcs 124 is the same as the radius of the second connecting arc 124 of the innermost reference loop line 12 .

[0254] Determine the first connecting arc 123 of the reference loop line 12 of each layer: set the first connecting arc 123 of the reference loop line 12 of each layer to connect the endpoint of the first main arc 121 of the layer and the first endpoint of the second main arc 122 of the layer, and be tangent to the first main arc 121 and the second main arc 122 of the layer respectively.

[0255] That is to say, in any layer of reference loop line 12, when the position and shape of the first main arc 121 and the second main arc 122 are known, the position and shape of the first connecting arc 123 in the layer of reference loop line 12 can be obtained based on the radius of the first connecting arc 123 and its tangency with the two.

[0256] Determine the second connecting arc 124 of the reference loop line 12 of each layer: set the second connecting arc 124 of the reference loop line 12 of each layer to connect the second end points of the two second main arcs 122 of the layer and be tangent to the two second main arcs 122 of the layer respectively.

[0257] That is to say, in any layer of reference loop 12, when the positions and shapes of the two second main arcs 122 are known, the position and shape of the first connecting arc 123 in the layer of reference loop 12 can be obtained based on the radius of the second connecting arc 124 and its tangency with the two.

[0258] In this way, since the radius of each first connecting arc 123 is the same and the radius of each second connecting arc 124 is the same, it is convenient to simplify the calculation steps for obtaining the shape and position of the first main arc 121 and the second main arc 122 of each layer of the reference loop line 12. At the same time, it is beneficial to make more reference points 13 located on the first main arc 121 and the second main arc 122, which is beneficial to make the change of the arrangement extension direction of the microlens 20 corresponding to the same reference loop line 12 smoother, which is beneficial to improve the defocus effect and make it more comfortable for users to use.

[0259] It is understandable that the centers of the first connecting arcs 123 on each layer of the reference loop line 12 are not located at the same position; and the centers of the second connecting arcs 124 on each layer of the reference loop line 12 are not located at the same position.

[0260] It is understandable that the number of reference points 13 on the first main arc 121 , the second main arc 122 , the first connecting arc 123 , and the second connecting arc 124 are different.

[0261] In some embodiments, obtaining the number of reference points 13 of each layer of the reference loop line 12 specifically includes:

[0262] The quotient of the arc length of the first main arc 121 and the center distance is calculated and rounded down to obtain the number of reference points 13 on the first main arc 121 .

[0263] That is, the arc length of the first main arc 121 is calculated and divided by the center distance to obtain the quotient, and the integer digit of the quotient is rounded down. For example, if the arc length of the first main arc 121 divided by the center distance is 6.6, and the quotient is rounded down to 6, then the number of reference points 13 arranged on the first main arc 121 is 6.

[0264] The quotient of the arc length of the second main arc 122 and the center distance is calculated and rounded down to obtain the number of reference points 13 on the second main arc 122 .

[0265] That is, after calculating the arc length of the second main arc 122 and dividing it by the center distance, the quotient is rounded to the integer digit. For example, if the quotient of the arc length of the second main arc 122 divided by the center distance is 4.3, and the result is rounded down to 4, then the number of reference points 13 arranged on the second main arc 122 is 4.

[0266] The quotient of the arc length of the first connecting arc 123 and the center distance is calculated and rounded down to obtain the number of reference points 13 on the first connecting arc 123 .

[0267] That is, after calculating the arc length of the first connecting arc 123 and dividing it by the center distance to obtain the quotient, the integer digit of the quotient is rounded down. For example, if the arc length of the first connecting arc 123 and the center distance to obtain the quotient is 3.1, and the quotient is rounded down to 3, then the number of reference points 13 arranged on the first connecting arc 123 is 3.

[0268] The quotient of the arc length of the second connecting arc 124 and the center distance is calculated and rounded down to obtain the number of reference points 13 on the second connecting arc 124 .

[0269] That is, after calculating the arc length of the second connecting arc 124 and dividing it by the center distance to obtain the quotient, the integer digit of the quotient is rounded down. For example, if the arc length of the second connecting arc 124 and the center distance obtain a quotient of 3.1, and the quotient is rounded down to 3, then the number of reference points 13 arranged on the second connecting arc 124 is 3.

[0270] In this way, by adopting the rounding-down method, the microlenses 20 will not be overlapped, and as many reference points 13 as possible can be arranged on the reference ring line 12, which is beneficial to improving space utilization and enhancing the defocusing effect of the defocusing area formed by multiple microlenses 20.

[0271] In some embodiments, obtaining the position of the starting reference point 13 specifically includes:

[0272] Along the first circumferential direction, the starting end of the first main arc 121 is determined as the starting reference point 13 on the first main arc 121, the starting end of the second main arc 122 is determined as the starting reference point 13 on the second main arc 122, the starting end of the first connecting arc 123 is determined as the starting reference point 13 on the first connecting arc 123, and the starting end of the second connecting arc 124 is determined as the starting reference point 13 on the second connecting arc 124.

[0273] The first circumferential direction refers to any one of the two directions along the extension direction of the reference loop line 12 .

[0274] It can be understood that along the first circumferential direction, the end of the first main arc 121 is the beginning of a first connecting arc 123, the end of the first connecting arc 123 is the beginning of a second main arc 122, the end of the second main arc 122 is the beginning of a second connecting arc 124, the end of the second connecting arc 124 is the beginning of another second main arc 122, the end of another second main arc 122 is connected to the beginning of another first connecting arc 123, and the end of another first connecting arc 123 is connected to the beginning of the first main arc 121.

[0275] In this way, the reference points 13 can be arranged sequentially along the first circumferential direction on the reference ring line 12 , reducing the probability of overlapping arrangement of the microlenses 20 .

[0276] In some embodiments, the radius of the reference circle 16 is R1, the radius of the lens base 10 is D, the chord length of the base plane 10b of the microlens 20 is L3, the center distance is L2=3 / 2*L3, the line distance is L1=3 / 2*L3, the radius of the first main arc 121 of each layer of the reference ring line 12 is equal to the radius of the second main arc 122, and the radius of the first connecting arc 123 and the second connecting arc 124 of each layer of the reference ring line 12 is the same as R. joint The preset cutting angles D1 between the first tangent line 18 and the second tangent line 19 corresponding to the reference loop line 12 of each layer are equal.

[0277] A two-dimensional coordinate system is established on the base plane 10b, and the reference circle 11 is set to coincide with the central prescription area 10a. The center of the first main arc 121 of the innermost reference ring line 12 is used as the coordinate origin, the straight line passing through the coordinate origin and perpendicular to the first straight line 17 is the coordinate horizontal axis, and the straight line where the first straight line 17 is located is the coordinate vertical axis.

[0278] The radius of the first main arc 121 and the radius of the second main arc 122 of each layer of the reference loop line 12 satisfy: R j =R1+(j-1)*L1

[0279] In the above formula, R j are the radius of the first main arc 121 and the radius of the second main arc 122 of the j-th layer, wherein j=1, 2, 3, 4…n, and n is the total number of layers of the reference loop line 12.

[0280] That is, the point of tangency between the first main arc 121 of the innermost reference loop line 12 and the reference circle 16 is (0, R1).

[0281] The total number of floors n of the reference loop 12 satisfies: n = floor ((D - R1) / L1)

[0282] In the above formula, floor refers to the floor function.

[0283] The center coordinates (x p ,y p ) satisfies the following system of equations:

[0284] In the above formula, x k and y k 、x l and y l Respectively represent the coordinates of the two main arcs connected to the connecting arc. For example, if the coordinates of the center of the second connecting arc 124 are to be found, then x k and y k 、x l and y l Respectively represent the coordinates of the two second main arcs 122 .

[0285] The coordinates of the center of an arc in the reference loop line 12 of the i-th layer are (x i ,y i ), the coordinates of its endpoints are (x is ,y is ),(x ie ,y ie ), whose radius is R X Here, the arc refers to any one of the first main arc 121 , the second main arc 122 , the first connecting arc 123 , and the second connecting arc 124 .

[0286] When the arc is the first main arc 121 or the second main arc 122, R x =R j ; When the arc is the first main arc 121 or the second main arc 122, then R x =R joint .

[0287] The number m of reference points 13 of the arc on the i-th layer reference loop line 12 satisfies: i =floor(θ*R x / L2)

[0288] The θ in the above formula satisfies the following relationship:

[0289] The angle between the coordinates of the u-th reference point 13 on the arc and the horizontal axis of the coordinates is:

[0290] In the above formula, u=0,1,2,3,4….,m i -1.

[0291] The coordinates of the reference point 13 are (R x *cosθ u , R x *sinθ u ).

[0292] Implementation Method 3

[0293] Due to the limitation of the field of view of the human eye, the closer the microlenses 20 are to the edge of the lens base 10 , the smaller the defocus effect will be on the human eye. In addition, during the actual fitting process, the edge of the lens base 10 will be ground off.

[0294] In some embodiments, referring to FIG. 7 , obtaining the distance between two adjacent reference loop lines 12 specifically includes:

[0295] Obtaining a chord length of a base plane 10b of the microlens 20 and a first proportional coefficient, where the first proportional coefficient is greater than 1;

[0296] The first line distance in the direction away from the reference circle 11 is calculated according to the product of the chord length of the base plane 10b and the first proportionality coefficient;

[0297] In a direction away from the reference circle 11 , the next line distance is calculated based on the product of the previous line distance and the first proportional coefficient.

[0298] The first inter-line distance refers to the inter-line distance between the innermost reference loop line 12 and another adjacent reference loop line 12 .

[0299] That is to say, along the direction away from the reference circle 11, the distances between the lines are in a geometric progression relationship.

[0300] In this way, the farther away from the reference circle 11 , the larger the distance between lines, and the sparser the arrangement of the reference ring lines 12 , thereby making the arrangement of the microlenses 20 closer to the edge of the lens base 10 sparser, which is beneficial to reducing manufacturing costs.

[0301] It can be understood that the shapes and sizes of the reference projections 21 are the same.

[0302] The first proportionality coefficient has a value range of 1.03 to 1.1, and its specific value is not limited, for example, 1.03, 1.04, 1.05, 1.07, 1.08, 1.09, 1.1, etc.

[0303] The radius of the arc of the i-th layer reference loop line 12 satisfies: R i =R+((1-q i ) / (1-q))*L1

[0304] In the above formula, R i is the radius of the arc of the i-th layer of the reference loop line 12, where i = 1, 2, 3, 4...n, and n is the total number of layers of the reference loop line 12.

[0305] The arc of the reference loop line 12 may be a complete circle when the reference loop line 12 is a circle, or may be the first main arc 121 and the second main arc 122 .

[0306] In some embodiments, the center distance between the reference points 13 in the next layer of reference circle 12 is calculated based on the product of the center distance between the reference points 13 in the previous layer of reference circle 12 and the first proportional coefficient in the direction away from the reference circle 11.

[0307] In this way, the farther away from the reference circle 11 , the sparser the arrangement of the reference points 13 in the reference circle 12 , thereby making the arrangement of the microlenses 20 closer to the edge of the lens base 10 sparser, which is beneficial to reducing manufacturing costs.

[0308] The center distance of the i-th layer reference loop line 12 satisfies: L1 i =L11*q (t-1)

[0309] In the above formula, L1 i It refers to the center distance of the i-th layer, where i = 1, 2, 3, 4….n, n is the total number of layers of the reference loop 12, and L11 is the center distance of the innermost layer.

[0310] Implementation Method 4

[0311] This embodiment is beneficial for increasing the proportion of the microlens 20 on the curved surface 10 c of the substrate, while reducing the difficulty of manufacturing the microlens 20 .

[0312] Specifically, referring to FIG8 , obtaining the distance between two adjacent reference loop lines 12 specifically includes:

[0313] Obtaining a second proportionality coefficient and an inter-mirror distance between two adjacent reference projections 21 of a same-layer reference loop line 12 , wherein the second proportionality coefficient is greater than 1;

[0314] Obtaining the reference radius of the microlens 20 corresponding to the innermost reference ring line 12;

[0315] In a direction away from the reference circle 11, the product of the radius of the previous layer reference projection 21 and the second proportional coefficient is calculated to obtain the radius of the next layer reference projection 21;

[0316] The sum of the radius of the reference projection 21 of the previous layer of reference ring line 12, the radius of the reference projection 21 of the next layer of reference ring line 12, and the inter-mirror distance is calculated to obtain the inter-line distance.

[0317] That is, the projection area of ​​the reference projection 21 of the latter layer is larger than the projection area of ​​the former layer.

[0318] It can be understood that the further away from the reference circle 11 , the greater the distance between the reference loop lines 12 of two adjacent layers.

[0319] In this way, by making the projection area of ​​the reference projection 21 larger as it is further away from the reference circle 11 , the proportion of the microlens 20 on the substrate arc surface 10 c is increased, while reducing the difficulty of manufacturing the microlens 20 .

[0320] In some embodiments, referring to FIG9 and FIG10 , the reference projection 21 corresponding to each layer of the reference loop line 12 includes a first sub-projection 211 and a second sub-projection 212 , and the radius of the second sub-projection 212 is greater than the radius of the first sub-projection 211 ;

[0321] Obtaining the distance between two adjacent reference loop lines 12 specifically includes:

[0322] Obtaining a second proportionality coefficient and an inter-mirror distance between two adjacent reference projections 21 of a same-layer reference loop line 12 , wherein the second proportionality coefficient is greater than 1;

[0323] Obtaining the reference radius of the second sub-projection 212 corresponding to the innermost reference ring line 12;

[0324] In the direction away from the reference circle 11, the product of the radius of the second sub-projection 212 corresponding to the previous layer of the reference circle 12 and the second proportional coefficient is calculated to obtain the radius of the second sub-projection 212 corresponding to the next layer of the reference circle 12;

[0325] The inter-line distance is obtained by calculating the sum of the radius of the second sub-projection 212 corresponding to the previous layer of reference ring line 12, the radius of the second sub-projection 212 corresponding to the next layer of reference ring line 12, and the inter-mirror distance.

[0326] That is, the reference projections 21 corresponding to the same layer of the reference loop line 12 have different sizes and types.

[0327] In this way, there is no interference between reference projections 21 of different sizes and types corresponding to the reference ring lines 12 of different layers, thereby reducing the probability of interference between the corresponding microlenses 20 .

[0328] In order to make the position of the corresponding projection point 14 on the base curved surface 10c more accurate, the number of three-dimensional coordinate points taken on the base curved surface 10c ranges from 8 million to 30 million, so that the position accuracy of the projection point 14 meets the defocusing effect of the defocusing area formed by the microlens 20.

[0329] The specific number of three-dimensional coordinate points is not limited, for example, 8 million, 10 million, 15 million, 20 million, 25 million, 30 million, etc.

[0330] The various embodiments / implementations provided in the present disclosure can be combined with each other without causing any contradiction.

[0331] The foregoing description is merely a preferred embodiment of the present disclosure and is not intended to limit the present disclosure. Those skilled in the art will readily appreciate that various modifications and variations are possible. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of the present disclosure shall be included within the scope of protection of the present disclosure.

Claims

1. A method for arranging microlenses, wherein: The arrangement method comprises: Obtaining the position of the central prescription area of ​​the lens base body on the base plane; Acquire the position of a reference circle on the base plane so that the central prescription area is located within the range of the reference circle; Obtaining the position of the innermost reference loop so that the reference circle is located inside the innermost reference loop; Obtaining the distance between the reference loop lines of two adjacent layers, and based on the position of the innermost layer of the reference loop line, sequentially accumulating the distances between the lines in a direction away from the reference circle to obtain the positions of the reference loop lines of the remaining layers; Obtaining the number of reference points of the reference loop line of each layer and obtaining the position of the starting reference point; Obtaining a center distance between reference projections of two adjacent microlenses on the reference ring line, and calculating positions of the remaining reference points on the reference ring line according to the center distance and the position of the initial reference point along the extension direction of the reference ring line; The projection point corresponding to the reference point on the curved surface of the lens substrate along the thickness direction of the lens substrate is determined, and the position of the microlens is determined according to the position of the projection point.

2. The arrangement method according to claim 1, wherein: The central prescription area is located within the range of the reference circle and specifically includes: The reference circle is made to coincide with the central prescription area.

3. The arrangement method according to claim 1, wherein: The innermost reference loop and the reference circle are configured as follows: In the reference projections on the innermost reference circle, at least a portion of the reference projections is tangent to the reference circle.

4. The arrangement method according to claim 1, wherein: The steps for obtaining the position of the innermost reference loop include: Obtaining a first distance between the innermost reference loop line and the reference circle, and calculating the radius of the innermost reference loop line according to the sum of the first distance and the radius of the reference circle; The position of the innermost reference loop is determined according to the position of the center of the reference circle.

5. The arrangement method according to claim 4, wherein: The inter-line distance is configured to be a fixed value not less than the base plane chord length of the microlens; The step of sequentially accumulating the distances between the lines in a direction away from the reference circle to calculate the position of the reference loop line of each layer specifically includes: According to the radius of the innermost reference ring line, the distances between each line are accumulated from the inside to the outside along the radial direction of the reference circle to calculate the radius of the reference ring lines of the remaining layers; The positions of the reference loop lines in the remaining layers are determined according to the position of the reference loop line in the innermost layer and the radius of the reference loop lines in the remaining layers.

6. The arrangement method according to claim 5, wherein: Before calculating the radius of the reference loop lines of the remaining layers, the layout method further includes: Obtaining the radius of the base plane; Calculating a difference between a radius of the base plane and a radius of the reference circle to obtain a first radial dimension; The quotient of the first radial dimension and the distance between lines is calculated and rounded down to obtain the total number of layers of the reference loop line.

7. The arrangement method according to claim 5, wherein: Obtaining the number of reference points on the reference loop line specifically includes: The quotient of the perimeter of the reference loop and the center distance is calculated and rounded down to obtain the number of the reference points on the reference loop.

8. The arrangement method according to claim 5, wherein: Obtaining the position of the starting reference point of the reference loop line specifically includes: An intersection point of the reference loop line and a straight line passing through the center of the reference circle is determined as the starting reference point.

9. The arrangement method according to claim 5, wherein: Obtaining the position of the starting reference point of the reference loop line specifically includes: Obtaining a position of a reference curve, wherein the reference curve passes through the innermost reference ring line and a base plane boundary of the lens base; An intersection point between the reference loop line and the reference curve is determined as the starting reference point.

10. The arrangement method according to claim 1, wherein: The reference loop line includes a first main arc and a second main arc; The steps for obtaining the position of the innermost reference loop include: Obtaining initial parameters: obtaining the radius of the first main arc of the innermost reference loop, the radius of the second main arc of the innermost reference loop, the reference spacing, and the preset cutting angle; Determining a reference circle: determining the center position and radius of the reference circle according to the reference spacing, the radius of the reference circle, and the center position of the reference circle; Determine the first main arc of the innermost reference loop line: set the first main arc of the innermost reference loop line to be symmetrical about a first straight line in a vertical direction passing through the center of the reference circle, and to be tangent to the reference circle; Determine the second main arc of the innermost reference loop: set the second main arc to be below the first main arc, and the two second main arcs are symmetrical about the first straight line axis and tangent to the reference circle, obtain the position of the first tangent formed by the first main arc and the reference circle, obtain the position of the second tangent formed by the second main arc and the reference circle, and determine that the angle between the first tangent and the second tangent is equal to the preset tangent angle.

11. The arrangement method according to claim 10, wherein: Determining that the radius of the first main arc is equal to the radius of the second main arc; And / or, it is determined that the reference circle is located on the concave side of the first main arc, and the reference circle is located on the concave side of the second main arc.

12. The arrangement method according to claim 10, wherein: The reference loop line further includes a first connecting arc and a second connecting arc, and the step of obtaining the initial parameters further includes: obtaining the radius of the first connecting arc and the radius of the second connecting arc; After the step of determining the second main arc of the innermost reference loop, the arrangement method further includes: Determine the first connecting arc of the innermost reference loop line: set the first connecting arc of the innermost reference loop line to connect the endpoint of the first main arc and the first endpoint of the second main arc, and to be tangent to the first main arc and the second main arc respectively; Determine the second connecting arc of the innermost reference loop line: set the second connecting arc of the innermost reference loop line to connect the second endpoints of its two second main arcs and be tangent to the two second main arcs.

13. The arrangement method according to claim 12, wherein: Determining that the radius of the first connecting arc is equal to the radius of the second connecting arc; And / or, it is determined that the reference circle is located on the concave side of the first connecting arc, and the reference circle is located on the concave side of the second main arc.

14. The arrangement method according to claim 12, wherein: The step of sequentially accumulating the distances between the lines in a direction away from the reference circle to obtain the reference loop lines of each layer specifically includes: Determine the center of the circle: determine that the first main arcs of the reference loop lines of each layer share the same center, and the second main arcs on the same side share the same center; Determine the first main arc of the reference loop line of each layer: According to the radius of the first main arc of the innermost layer of the reference loop line, the radius of the first main arc of the remaining layers of the reference loop line is calculated by sequentially accumulating the distances between the lines from the inside to the outside along the radial direction of the first main arc; Calculating the position of the first main arc of each layer of the reference loop line according to the center of the first main arc of the innermost layer of the reference loop line and the radius of the first main arc of each of the remaining layers of the reference loop line; Determine the second main arc of the reference loop line of each layer: According to the radius of the second main arc of the innermost layer of the reference loop line, the radius of the second main arc of the remaining layers of the reference loop line is calculated by sequentially accumulating the distances between each line from the inside to the outside along the radial direction of the second main arc; The position of the second main arc of each layer of the reference loop line is calculated according to the center of the second main arc of the innermost layer of the reference loop line and the radius of the second main arc of each of the remaining layers of the reference loop line.

15. The arrangement method according to claim 14, wherein: After the step of determining the second main arc of the reference loop line of each layer, the arrangement method further includes: Determine that the radius of the first connecting arc of the reference loop line of each layer is the same, and determine that the radius of the second connecting arc of the reference loop line of each layer is the same; Determine the first connecting arc of the reference loop line of each layer: set the first connecting arc of the reference loop line of each layer to connect the endpoint of the first main arc of the layer and the first endpoint of the second main arc of the layer, and to be tangent to the first main arc and the second main arc of the layer respectively; Determine the second connecting arc of the reference loop line of each layer: set the second connecting arc of the reference loop line of each layer to connect the second end points of the two second main arcs of the layer and be tangent to the two second main arcs of the layer respectively.

16. The arrangement method according to claim 15, wherein: Obtain the number of reference points of the reference loop line of each layer, specifically including: Calculating the quotient of the arc length of the first main arc and the center distance and rounding down to obtain the number of reference points on the first main arc; Calculating the quotient of the arc length of the second main arc and the center distance and rounding down to obtain the number of reference points on the second main arc; Calculating the quotient of the arc length of the first connecting arc and the center distance and rounding down to obtain the number of the reference points on the first connecting arc; The quotient of the arc length of the second connecting arc and the center distance is calculated and rounded down to obtain the number of the reference points on the second connecting arc.

17. The arrangement method according to claim 15, wherein: Get the position of the starting reference point, including: Along the first circumferential direction, the starting end of the first main arc is determined as the starting reference point on the first main arc, the starting end of the second main arc is determined as the starting reference point on the second main arc, the starting end of the first connecting arc is determined as the starting reference point on the first connecting arc, and the starting end of the second connecting arc is determined as the starting reference point on the second connecting arc.

18. The arrangement method according to claim 1, wherein: Obtaining the distance between two adjacent reference loop lines specifically includes: Obtaining a base plane chord length and a first proportional coefficient of the microlens, where the first proportional coefficient is greater than 1; Calculating the first inter-line distance in a direction away from the reference circle according to the product of the base plane chord length and the first proportional coefficient; Along a direction away from the reference circle, the next inter-line distance is calculated according to the product of the previous inter-line distance and the first proportional coefficient.

19. The arrangement method according to claim 1, wherein: Obtaining the distance between two adjacent reference loop lines specifically includes: Obtaining a second proportionality coefficient and an inter-mirror distance between two adjacent reference projections of the reference loop line on the same layer, wherein the second proportionality coefficient is greater than 1; Obtaining a reference radius of the microlens corresponding to the innermost reference ring line; Calculate the product of the radius of the reference projection of the previous layer and the second proportional coefficient in a direction away from the reference circle to obtain the radius of the reference projection of the next layer; The inter-line distance is obtained by calculating the sum of the radius of the reference projection of the previous layer of the reference ring line, the radius of the reference projection of the next layer of the reference ring line, and the inter-mirror distance.

20. The arrangement method according to claim 1, wherein: The reference projection corresponding to each layer of the reference ring line includes a first sub-projection and a second sub-projection, and the radius of the second sub-projection is greater than the radius of the first sub-projection; Obtaining the distance between two adjacent reference loop lines specifically includes: Obtaining a second proportionality coefficient and an inter-mirror distance between two adjacent reference projections of the reference loop line on the same layer, wherein the second proportionality coefficient is greater than 1; Obtaining a reference radius of the second sub-projection corresponding to the innermost reference ring line; Calculate the product of the radius of the second sub-projection corresponding to the reference circle of the previous layer and the second proportional coefficient in a direction away from the reference circle to obtain the radius of the second sub-projection corresponding to the reference circle of the next layer; The inter-line distance is obtained by calculating the sum of the radius of the second sub-projection corresponding to the previous layer of the reference ring line, the radius of the second sub-projection corresponding to the next layer of the reference ring line, and the inter-mirror distance.

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