Electrochromic substrate and preparation method for electrochromic device

Abstract

An electrochromic substrate and a preparation method for an electrochromic device. The method comprises: providing an electrochromic substrate (10), wherein the electrochromic substrate (10) comprises a first base layer (100), a first conductive layer (210), an electrochromic layer (400), an electrolyte layer (220), an ion storage layer (230), a second conductive layer (240) and a second base layer (300), which are stacked in sequence; and emitting preset light rays, wherein the preset light rays penetrate the electrochromic substrate (10) in the stacking direction of the electrochromic substrate (10). The absorbance of the first base layer (100) and of the second base layer (300) for the preset light rays are less than or equal to a preset absorbance threshold; the absorbance of the first conductive layer (210), of the electrolyte layer (220), of the ion storage layer (230) and of the second conductive layer (240) for the preset light rays are greater than the preset absorbance threshold; and the first conductive layer (210), the electrolyte layer (220), the ion storage layer (230) and the second conductive layer (240) are divided into at least two parts, such that color change can be achieved in different regions.

Description

Method for preparing electrochromic substrate and electrochromic device Cross-references

[0001] This application claims priority to Chinese Patent Application No. 202410496781.1, filed on April 24, 2024, entitled “Method for Preparing Electrochromic Substrate and Electrochromic Device”, the entire contents of which are incorporated herein by reference. Technical Field

[0002] This application relates to an electrochromic substrate and a method for preparing an electrochromic device, belonging to the field of electrochromic technology. Background Technology

[0003] An electrochromic device comprises an electrochromic material, which undergoes an electrochemical oxidation-reduction reaction under an applied electric field, gaining or losing electrons or ions, thus changing the material's color. To provide richer display effects, the electrochromic device can be divided into zones, with each zone powered and controlled independently, resulting in different display effects for each zone.

[0004] Currently, when partitioning an electrochromic device, the base layer of the electrochromic device substrate is cut off, which is not conducive to the overall packaging of the electrochromic device. Technical issues

[0005] This application provides an electrochromic substrate and a method for preparing an electrochromic device, which solves the problem in related technologies that the electrochromic device is not conducive to overall packaging after being partitioned and cut. Technical solutions

[0006] In a first aspect, this application provides an electrochromic substrate, comprising a first base layer, a first conductive layer, an electrochromic layer, an electrolyte layer, an ion storage layer, a second conductive layer, and a second base layer stacked sequentially.

[0007] Wherein, the absorbance of the first substrate and the second substrate for the preset light is less than or equal to a preset absorbance threshold, the absorbance of the first conductive layer, the electrolyte layer, the ion storage layer and the second conductive layer for the preset light is greater than the preset absorbance threshold, and the absorbance of the electrochromic layer for the preset light is greater than the preset absorbance threshold, or the absorbance of the electrochromic layer for the preset light is less than or equal to the preset absorbance threshold.

[0008] In some embodiments, when the absorbance of the electrochromic layer to the preset light is greater than the preset absorbance threshold, the electrochromic layer is in an oxidized state with an oxidation degree of 0-100%.

[0009] Preferably, when the absorbance of the electrochromic layer to the preset light is greater than the preset absorbance threshold, the electrochromic layer is in an oxidized state with an oxidation degree of 20%-100%.

[0010] More preferably, when the absorbance of the electrochromic layer to the preset light is greater than the preset absorbance threshold, the electrochromic layer is in an oxidized state with an oxidation degree of 20%-80%.

[0011] Most preferably, when the absorbance of the electrochromic layer to the preset light is greater than the preset absorbance threshold, the electrochromic layer is in an oxidized state with an oxidation degree of 20%-50%.

[0012] In some embodiments, when the absorbance of the electrochromic layer for the preset light is greater than the preset absorbance threshold, the open-circuit voltage of the electrochromic substrate is 0V-2V;

[0013] Preferably, when the absorbance of the electrochromic layer for the preset light is greater than the preset absorbance threshold, the open-circuit voltage of the electrochromic substrate is 0.1V-1.5V;

[0014] More preferably, when the absorbance of the electrochromic layer for the preset light is greater than the preset absorbance threshold, the open-circuit voltage of the electrochromic substrate is 0.1V-1V;

[0015] Most preferably, when the absorbance of the electrochromic layer for the preset light is greater than the preset absorbance threshold, the open-circuit voltage of the electrochromic substrate is 0.1V-0.8V.

[0016] In some embodiments, when the absorbance of the electrochromic layer to the preset light is less than or equal to the preset absorbance threshold, the electrochromic layer is in a reduction state with a reduction degree of 1-100%.

[0017] In some embodiments, when the absorbance of the electrochromic layer to the preset light is less than or equal to the preset absorbance threshold, the open-circuit voltage of the electrochromic substrate is less than 0V;

[0018] Preferably, when the absorbance of the electrochromic layer to the preset light is less than or equal to the preset absorbance threshold, the open-circuit voltage of the electrochromic substrate is less than 0V and greater than or equal to -2V.

[0019] In some implementations, the preset absorbance threshold is 0.1 Abs.

[0020] In some embodiments, the absorbance of the first conductive layer for the preset light is greater than or equal to 0.15 Abs; and / or,

[0021] The absorbance of the second conductive layer for the preset light is greater than or equal to 0.15 Abs; and / or,

[0022] The absorbance of the ion storage layer for the preset light is greater than or equal to 0.4 Abs; and / or,

[0023] The absorbance of the electrolyte layer for the preset light is greater than or equal to 0.3 Abs; and / or,

[0024] The first substrate has an absorbance of less than or equal to 0.05 Abs for the preset light; and / or,

[0025] The absorbance of the second substrate to the preset light is less than or equal to 0.05 Abs.

[0026] In some embodiments, the difference between the absorbance of the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer for the preset light and the absorbance of the first substrate and the second substrate for the preset light is greater than or equal to 0.1 Abs.

[0027] Preferably, the difference between the absorbance of the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer for the preset light and the absorbance of the first substrate and the second substrate for the preset light is greater than or equal to 0.3 Abs.

[0028] In the electrochromic substrate provided by the first aspect of this application, the absorbance of the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer for a preset light is greater than a preset absorbance threshold. This results in a relatively strong absorption effect of the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer for the preset light. Thus, when the electrochromic substrate receives the preset light, the preset light can penetrate the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer, thereby cutting each of the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer into at least two parts. Multiple parts of the first conductive layer and multiple parts of the second conductive layer can be electrically connected to an external power source, thereby allowing the color of different regions of the electrochromic layer corresponding to different parts of the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer to change independently. This enables the electrochromic device made from the electrochromic substrate of this application to have a zoned color-changing function.

[0029] The first and second substrates have absorbance values ​​for the preset light that are less than a preset absorbance threshold, resulting in relatively weak absorption of the preset light by the first and second substrates. Therefore, when the electrochromic substrate receives the preset light, the light will not cut through the first and second substrates as it passes through them. This allows the first and second substrates to maintain structural integrity, sealing the gaps between the first conductive layer, electrolyte layer, ion storage layer, and second conductive layer that would otherwise be cut by the preset light. Consequently, the electrochromic substrate of this application exhibits a better sealing effect.

[0030] By making the absorbance of the electrochromic layer for a preset light greater than a preset absorbance threshold, the absorption effect of the electrochromic layer for the preset light is relatively strong. When the electrochromic substrate receives the preset light, the preset light can penetrate the electrochromic layer and cut it into at least two parts, which correspond to the parts of the first conductive layer, electrolyte layer, ion storage layer and second conductive layer respectively. This achieves overall partitioning of the first conductive layer, electrochromic layer, electrolyte layer, ion storage layer and second conductive layer in the electrochromic substrate, improves the partitioned display effect and avoids color bleeding in adjacent areas.

[0031] Furthermore, by making the absorbance of the electrochromic layer for preset light less than or equal to a preset absorbance threshold, the absorption effect of the electrochromic layer for preset light is relatively weak. When the electrochromic substrate receives preset light, the preset light will not cut through the electrochromic layer when passing through it, thus keeping the electrochromic layer intact and without cutting lines. Therefore, there will be no light leakage due to cutting lines during the color-changing process, thereby improving the aesthetics of the display.

[0032] In some embodiments, the preset light is infrared light with a wavelength of 1064 nm.

[0033] Secondly, this application provides a method for manufacturing an electrochromic device, comprising:

[0034] An electrochromic substrate is provided, the electrochromic substrate comprising a first base layer, a first conductive layer, an electrochromic layer, an electrolyte layer, an ion storage layer, a second conductive layer, and a second base layer stacked sequentially;

[0035] A preset light beam is emitted toward the electrochromic substrate, and the preset light beam passes through the electrochromic substrate along the stacking direction of the electrochromic substrate.

[0036] Wherein, the absorbance of the first substrate and the second substrate for the preset light is less than or equal to a preset absorbance threshold, so that the preset light passes through the first substrate and the second substrate without cutting through them. The absorbance of the first conductive layer, the electrolyte layer, the ion storage layer and the second conductive layer for the preset light is greater than the preset absorbance threshold, so that the preset light cuts through the first conductive layer, the electrolyte layer, the ion storage layer and the second conductive layer along the stacking direction of the electrochromic substrate, and divides the first conductive layer, the electrolyte layer, the ion storage layer and the second conductive layer into at least two parts along a direction perpendicular to the stacking direction of the electrochromic substrate.

[0037] In some embodiments, the electrochromic layer absorbs more than a preset absorbance threshold light to the preset light, so that the preset light divides the electrochromic layer into at least two parts.

[0038] In some embodiments, before emitting a preset light onto the electrochromic substrate, the electrochromic device fabrication method further includes:

[0039] A first voltage is applied to the electrochromic substrate to cause the electrochromic layer to be in an oxidation state with an oxidation degree of 0-100%;

[0040] Preferably, a first voltage is applied to the electrochromic substrate to cause the electrochromic layer to be in an oxidized state with an oxidation degree of 20%-100%;

[0041] More preferably, a first voltage is applied to the electrochromic substrate to cause the electrochromic layer to be in an oxidized state with an oxidation degree of 20%-80%;

[0042] More preferably, a first voltage is applied to the electrochromic substrate to place the electrochromic layer in an oxidized state with an oxidation degree of 20%-50%.

[0043] In some embodiments, before emitting a preset light onto the electrochromic substrate, the electrochromic device fabrication method further includes:

[0044] A first voltage is applied to the electrochromic substrate to make the open-circuit voltage of the electrochromic substrate 0V-2V;

[0045] Preferably, a first voltage is applied to the electrochromic substrate so that the open-circuit voltage of the electrochromic substrate is 0.5V-2V;

[0046] More preferably, a first voltage is applied to the electrochromic substrate so that the open-circuit voltage of the electrochromic substrate is 0.5V-1V;

[0047] Most preferably, a first voltage is applied to the electrochromic substrate so that the open-circuit voltage of the electrochromic substrate is 0.5V-0.7V.

[0048] In some implementations, the first voltage is greater than 0V and less than or equal to 20V;

[0049] Preferably, the first voltage is greater than 0V and less than or equal to 10V;

[0050] More preferably, the first voltage is greater than 0V and less than or equal to 5V;

[0051] Most preferably, the first voltage is greater than 0V and less than or equal to 2V.

[0052] In some embodiments, the absorbance of the electrochromic layer to the preset light is less than or equal to the preset absorbance threshold, so that the preset light does not separate the electrochromic layer.

[0053] In some embodiments, before emitting a preset light onto the electrochromic substrate, the electrochromic device fabrication method further includes:

[0054] A second voltage is applied to the electrochromic substrate to bring the electrochromic layer into a reduction state with a reduction degree of 1-100%.

[0055] In some embodiments, before emitting a preset light onto the electrochromic substrate, the electrochromic device fabrication method further includes:

[0056] A second voltage is applied to the electrochromic substrate to make the open-circuit voltage of the electrochromic substrate less than 0V;

[0057] Preferably, a second voltage is applied to the electrochromic substrate so that the open-circuit voltage of the electrochromic substrate is less than 0V and greater than or equal to -2V.

[0058] In some implementations, the second voltage is less than 0V and greater than or equal to -20V;

[0059] Preferably, the second voltage is less than 0V and greater than or equal to -10V;

[0060] More preferably, the second voltage is less than 0V and greater than or equal to -5V;

[0061] Most preferably, the second voltage is less than 0V and greater than or equal to -2V.

[0062] In some implementations, the preset absorbance threshold is 0.1 Abs.

[0063] In some embodiments, the absorbance of the first conductive layer for the preset light is greater than or equal to 0.15 Abs; and / or,

[0064] The absorbance of the second conductive layer for the preset light is greater than or equal to 0.15 Abs; and / or,

[0065] The absorbance of the ion storage layer for the preset light is greater than or equal to 0.4 Abs; and / or,

[0066] The absorbance of the electrolyte layer for the preset light is greater than or equal to 0.3 Abs; and / or,

[0067] The first substrate has an absorbance of less than or equal to 0.05 Abs for the preset light; and / or,

[0068] The absorbance of the second substrate to the preset light is less than or equal to 0.05 Abs.

[0069] In some embodiments, the difference between the absorbance of the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer for the preset light and the absorbance of the first substrate and the second substrate for the preset light is greater than or equal to 0.1 Abs.

[0070] Preferably, the difference between the absorbance of the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer for the preset light and the absorbance of the first substrate and the second substrate for the preset light is greater than or equal to 0.3 Abs.

[0071] In some embodiments, emitting a preset light onto the electrochromic substrate includes:

[0072] Determine the cutting position of the electrochromic substrate;

[0073] At least one preset ray is emitted toward the cutting position.

[0074] In some embodiments, before emitting a preset light beam at least once toward the cutting position, the electrochromic device fabrication method further includes:

[0075] Adjust the power of the preset light to the preset power, and set the working time of the preset light to the preset time.

[0076] In some implementations, the preset power is 1W-70W and the preset duration is 1ps-100ps.

[0077] In some embodiments, the preset light is infrared light with a wavelength of 1064 nm.

[0078] In some embodiments, the method for preparing the electrochromic device further includes:

[0079] A first conductive region is formed on the edge of the first conductive layer that is displaced from the electrolyte layer, the ion storage layer, the electrochromic layer, the second conductive layer, and the second base layer, so that at least a portion of the first conductive layer is exposed toward the side of the electrolyte layer;

[0080] A second conductive region is formed on the edge of the second conductive layer that is displaced from the electrolyte layer, the ion storage layer, the electrochromic layer, the first conductive layer, and the first base layer, so that at least a portion of the second conductive layer is exposed toward the side of the electrolyte layer.

[0081] In some embodiments, the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer constitute a conductive layer group. The preset light beam divides the conductive layer group into multiple sub-conductive layer groups. The first conductive layer of each of the multiple sub-conductive layer groups has a first conductive region, and the second conductive layer of each of the multiple sub-conductive layer groups has a second conductive region. The electrochromic device fabrication method further includes:

[0082] A first electrical connection element electrically connected to the first conductive layer is disposed on the electrochromic substrate, and the first electrical connection element overlaps the first conductive region of the plurality of sub-conductive layer groups.

[0083] The first electrical connection element is broken into multiple spaced third electrical connections, and the multiple third electrical connections are respectively connected to the first conductive area of ​​different sub-conductive layer groups.

[0084] A second electrical connection element is disposed on the electrochromic substrate and is electrically connected to the second conductive layer. The second electrical connection element overlaps the second conductive region of the plurality of sub-conductive layer groups.

[0085] The second electrical connection element is broken into multiple spaced fourth electrical connections, and the multiple fourth electrical connections are respectively connected to the second conductive region of different sub-conductive layer groups.

[0086] In some embodiments, the first electrical connection element and the second electrical connection element are metal foils;

[0087] Preferably, the first electrical connection element and the second electrical connection element are copper foil.

[0088] In the electrochromic device fabrication method provided in the second aspect of this application, the absorbance of the first conductive layer, electrolyte layer, ion storage layer, and second conductive layer of the electrochromic substrate for a preset light is greater than a preset absorbance threshold. This results in a relatively strong absorption effect of the first conductive layer, electrolyte layer, ion storage layer, and second conductive layer for the preset light, allowing the preset light to penetrate the first conductive layer, electrolyte layer, ion storage layer, and second conductive layer, thereby cutting the first conductive layer, electrolyte layer, ion storage layer, and second conductive layer into at least two parts. Multiple portions of the first conductive layer and multiple portions of the second conductive layer can be electrically connected to an external power source, thereby allowing the color of different regions of the electrochromic layer corresponding to different portions of the first conductive layer, electrochromic layer, electrolyte layer, ion storage layer, and second conductive layer to change independently, so that the electrochromic device of this application has a zoned color-changing function.

[0089] In the electrochromic substrate, the first and second layers have absorbance of preset light less than a preset absorbance threshold, resulting in relatively weak absorption of the preset light by the first and second layers. This prevents the preset light from cutting through the first and second layers. Consequently, the first and second layers maintain structural integrity, sealing the gaps between the first conductive layer, electrolyte layer, ion storage layer, and second conductive layer. This leads to a better sealing effect in the electrochromic device fabricated using the method described in this application. Attached Figure Description

[0090] The above and other objects, features, and advantages of embodiments of this application will become more readily understood through the following detailed description with reference to the accompanying drawings. In the drawings, several embodiments of this application will be described by way of example and non-limitation, wherein:

[0091] Figure 1 is a schematic diagram of the electrochromic substrate of this application;

[0092] Figure 2 is a schematic diagram of an electrochromic device prepared by the electrochromic device preparation method of this application embodiment;

[0093] Figure 3 is a schematic diagram of an electrochromic device according to an embodiment of this application, including three sub-conductive layer groups;

[0094] Figure 4 is a schematic diagram of an electrochromic device according to an embodiment of this application, including four sub-conductive layer groups;

[0095] Figure 5 is a schematic diagram of the first and second conductive regions of the electrochromic device according to an embodiment of this application.

[0096] Figure 6 is a side view of the first conductive region and the second conductive region of the first sub-conductive layer group of the electrochromic device according to an embodiment of this application.

[0097] Figure 7 is a side view of the second conductive region and the fourth conductive region of the second sub-conductive layer group of the electrochromic device according to an embodiment of this application.

[0098] Figure 8A is a schematic diagram of the third electrical connection of the electrochromic device according to an embodiment of this application;

[0099] Figure 8B is a schematic diagram of the fourth electrical connection of the electrochromic device according to an embodiment of this application;

[0100] Figure 9 is a schematic diagram of the first electrical connector and the second electrical connector of the electrochromic device according to an embodiment of this application;

[0101] Figure 10 is a schematic diagram of the first electrode layer of the electrochromic device according to an embodiment of this application;

[0102] Figure 11 is a schematic diagram of the second electrode layer of the electrochromic device according to an embodiment of this application;

[0103] Figure 12 is a schematic diagram of the electrochromic layer in the electrochromic device of this application embodiment, which is separated by a preset light source.

[0104] Figure 13 is a flowchart of steps S100-S200 of the electrochromic device preparation method according to an embodiment of this application;

[0105] Figure 14 is a flowchart of step S300 of the electrochromic device preparation method according to an embodiment of this application;

[0106] Figure 15 is a flowchart of step S400 of the electrochromic device preparation method according to an embodiment of this application.

[0107] Figure label:

[0108] 10-Electrochromic substrate, 100-First base layer, 200-Conductive layer group, 210-First conductive layer, 211-First conductive region, 220-Electrolyte layer, 230-Ion storage layer, 240-Second conductive layer, 241-Second conductive region, 250-First electrode layer, 251-First mesh portion, 260-Second electrode layer, 261-Second mesh portion, 200a-First sub-conductive layer group, 200b-Second sub-conductive layer group, 200c-Gap region, 300-Second base layer, 400-Electrochromic layer, 500-First electrical connector, 600-Second electrical connector. Embodiments of the present invention

[0109] The embodiments of this application are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain this application, and should not be construed as limiting this application.

[0110] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0111] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0112] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a connection that allows communication between components; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

[0113] In this application, unless otherwise expressly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0114] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.

[0115] Electrochromic materials are electrochromic substances that undergo electrochemical oxidation-reduction reactions under an applied electric field, gaining or losing electrons or ions, thus changing the material's color. To provide richer display effects, electrochromic devices can be divided into zones, with each zone receiving its own power supply and control, resulting in different display effects for each zone.

[0116] Currently, due to the break in the base layer, external air, water, and oxygen can easily enter the interior of the electrochromic material through the broken area, affecting the oxidation-reduction reaction inside the electrochromic material and easily leading to color change failure. Furthermore, electrochromic devices are usually bonded between two pieces of glass using adhesives. When the adhesive is a hot melt adhesive that needs to be melted and cured to form a solid, it can easily penetrate the base layer of the electrochromic substrate and enter the electrochromic material during the melting process, also affecting the color change of the material. Therefore, the method of cutting off the base layer of the electrochromic device to achieve partitioning is not conducive to the overall encapsulation and sealing of the electrochromic device, and can easily lead to color change failure of the electrochromic material.

[0117] In the electrochromic substrate and the method for fabricating an electrochromic device including the electrochromic substrate proposed in this application, the absorbance of the first conductive layer, electrolyte layer, ion storage layer, and second conductive layer of the electrochromic substrate for a preset light is greater than a preset absorbance threshold. This results in a relatively strong absorption effect of the first conductive layer, electrolyte layer, ion storage layer, and second conductive layer for the preset light, allowing the preset light to penetrate the first conductive layer, electrolyte layer, ion storage layer, and second conductive layer, thereby cutting the first conductive layer, electrolyte layer, ion storage layer, and second conductive layer into at least two parts. Multiple portions of the first conductive layer and multiple portions of the second conductive layer can be electrically connected to an external power source, thereby allowing the color of different regions of the electrochromic layer corresponding to different portions of the first conductive layer, electrochromic layer, electrolyte layer, ion storage layer, and second conductive layer to change independently, so that the electrochromic device of this application has a zoned color-changing function. Furthermore, the first and second layers in the electrochromic substrate have absorbance of the preset light less than the preset absorbance threshold, resulting in relatively weak absorption of the preset light by the first and second layers. This prevents the preset light from cutting through the first and second layers, thus maintaining the structural integrity of the first and second layers. This allows the first and second layers to seal the gaps between the multiple parts of the first conductive layer, electrolyte layer, ion storage layer, and second conductive layer, thereby giving the electrochromic substrate of this application and the electrochromic device prepared by the electrochromic device preparation method of this application better sealing performance.

[0118] The preparation method of the electrochromic substrate and electrochromic device provided in this application will be described in detail below with reference to specific embodiments.

[0119] This application provides an electrochromic substrate. Referring to FIG1, the electrochromic substrate 10 includes a first base layer 100, a first conductive layer 210, an electrochromic layer 400, an electrolyte layer 220, an ion storage layer 230, a second conductive layer 240, and a second base layer 300, which are stacked sequentially. By applying this electrochromic substrate 10 to the electrochromic device fabrication method of this application, an electrochromic device with a zoned display function can be obtained.

[0120] The first base layer 100 and the second base layer 300 are the basic components of the electrochromic substrate 10 of this application. The first base layer 100 and the second base layer 300 can provide a mounting base for at least some other components of the electrochromic substrate 10 and serve to protect at least some of the other components. The first base layer 100 and the second base layer 300 can be made of polymer materials. Specifically, the material of the first base layer 100 and the second base layer 300 can be polyethylene terephthalate.

[0121] A first base layer 100 and a second base layer 300 are disposed opposite to each other. A first conductive layer 210, an electrolyte layer 220, an ion storage layer 230, a second conductive layer 240, and an electrochromic layer 400 are all located between the first base layer 100 and the second base layer 300. The first base layer 100, the first conductive layer 210, the electrochromic layer 400, the electrolyte layer 220, the ion storage layer 230, the second conductive layer 240, and the second base layer 300 are sequentially stacked. The first conductive layer 210 and the second conductive layer 240 can be electrically connected to an external power source. When the first conductive layer 210 and the second conductive layer 240 are energized, they can drive the insertion or extraction of ions or electrons in the ion storage layer 230 and the electrochromic layer 400, thereby changing the color of the electrochromic layer 400. By applying different voltages to the first conductive layer 210 and the second conductive layer 240, such as applying voltages in different directions, the electrochromic layer 400 can have different color display effects, such as coloring and fading effects, thereby realizing the color-changing function of the electrochromic substrate 10.

[0122] The first substrate 100 and the second substrate 300 have light absorption values ​​for a preset light source that are less than a preset light absorption threshold. The preset light source can be infrared or ultraviolet light, etc. Thus, when the preset light source is incident on the electrochromic substrate, it can pass through the first substrate 100 and the second substrate 300 without cutting them off, thereby maintaining the structural integrity of the first substrate 100 and the second substrate 300. The first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, and the second conductive layer 240 have light absorption values ​​for a preset light source that are greater than a preset light absorption threshold. Thus, when the preset light source is incident on the electrochromic substrate, it can divide each of the first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, and the second conductive layer 240 into at least two parts along the stacking direction of the electrochromic substrate. Specifically, the preset light rays can divide the first conductive layer 210 into at least two parts along the stacking direction of the electrochromic substrate 10, the preset light rays can divide the electrolyte layer 220 into at least two parts along the stacking direction of the electrochromic substrate 10, the preset light rays can divide the ion storage layer 230 into at least two parts along the stacking direction of the electrochromic substrate 10, and the preset light rays can divide the second conductive layer 240 into at least two parts along the stacking direction of the electrochromic substrate 10.

[0123] Specifically, the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240 have a light absorption of more than a preset light absorption threshold, which makes the absorption effect of the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240 on the preset light relatively strong, so that the preset light can penetrate the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240.

[0124] The first substrate 100 and the second substrate 300 have a light absorption of less than a preset light absorption threshold for the preset light emitted by the laser, so that the absorption effect of the first substrate 100 and the second substrate 300 on the preset light is relatively weak. In this way, the preset light will not cut through the first substrate 100 and the second substrate 300 when it passes through them.

[0125] In some embodiments, the absorbance of the electrochromic layer 400 for a preset light source can be set to be greater than a preset absorbance threshold. When the preset light source strikes the electrochromic substrate 10, it passes through the electrochromic layer 400, cutting it into at least two parts. These multiple parts of the electrochromic layer 400 can then be stacked correspondingly with multiple parts of the first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, and the second conductive layer 240, respectively, resulting in a better partitioning effect for the electrochromic device prepared by the method described in this application.

[0126] In some embodiments, the electrochromic layer 400 may be configured to be in an oxidized state with an oxidation degree of 0-100%, such that at least a portion of the electrochromic layer 400 is in an oxidized state. When the electrochromic layer 400 is in an oxidized state, the electrochromic layer 400 has a stronger absorption effect on the preset light, allowing the preset light to pass through the electrochromic layer 400 and cut through it.

[0127] To achieve an oxidation state of 0-100% for the electrochromic layer 400, an electric current can be applied to the electrochromic substrate 10. Consequently, the electrochromic layer 400 is also energized, allowing it to transition to an oxidized state. Specifically, when the electrochromic substrate 10 is not energized, the electrochromic layer 400 is in an equilibrium state, meaning it is neither oxidized nor reduced. Applying an electric current to the electrochromic substrate 10 allows the electrochromic layer 400 to switch from an equilibrium state to an oxidized state, making the process simple and convenient.

[0128] In some embodiments, when the absorbance of the electrochromic layer 400 for a preset light source is greater than a preset absorbance threshold, the open-circuit voltage of the electrochromic substrate 10 is 0V-2V. Therefore, by setting the open-circuit voltage of the electrochromic substrate 10 to 0V-2V, it can be ensured that the absorbance of the electrochromic layer 400 for the preset light source is greater than the preset absorbance threshold. This allows the electrochromic layer 400 to be segmented by the preset light source when the preset light is emitted, thus achieving partitioning of the electrochromic substrate. It should be noted that the open-circuit voltage refers to the voltage corresponding to the electrochromic substrate (electrochromator) in an open-circuit state. The detection of the open-circuit voltage of an electrochromic substrate can be either the voltage value inherent to the electrochromic substrate before it has been charged or discharged; the voltage value obtained immediately after the electrochromic substrate has been charged or discharged; or the voltage value obtained after the electrochromic substrate has been charged or discharged and a certain period of time (e.g., 20s, 1min, or 2min) has been waited for its voltage to stabilize before the voltage is detected.

[0129] In some embodiments, when the electrochromic substrate 10 is energized, causing the electrochromic layer 400 to be in an oxidation state with an oxidation degree of 0-100%, the open-circuit voltage corresponding to the electrochromic substrate 10 is 0V-2V. Therefore, by setting the open-circuit voltage of the electrochromic substrate to 0V-2V, it is more convenient to characterize the oxidation state of the electrochromic layer from 0-100% oxidation; that is, by detecting the overall open-circuit voltage of the electrochromic substrate, it can be determined that the electrochromic layer is in an oxidation state, thereby simplifying the process of fabricating an electrochromic device using this electrochromic substrate.

[0130] In some embodiments, when the absorbance of the electrochromic layer 400 to a preset light is greater than a preset absorbance threshold, the electrochromic layer 400 is in an oxidized state with an oxidation degree of 20%-100%. This allows for a relatively precise oxidation degree of the electrochromic layer 400, thereby enhancing its absorption capacity for the preset light and enabling the preset light to better divide the electrochromic layer 400 into at least two parts.

[0131] In some embodiments, when the absorbance of the electrochromic layer 400 for a preset light is greater than a preset absorbance threshold, the open-circuit voltage of the electrochromic substrate 10 is 0.1V-1.5V. Therefore, by setting the open-circuit voltage of the electrochromic substrate 10 to 0.1V-1.5V, it can be further ensured that the absorbance of the electrochromic layer 400 for the preset light is greater than the preset absorbance threshold. This allows the electrochromic layer 400 to be segmented by the preset light when the preset light is emitted onto the electrochromic substrate 10, thereby achieving partitioning of the electrochromic substrate 10.

[0132] In some embodiments, when the electrochromic substrate 10 is energized to the point that the electrochromic layer 400 is in an oxidation state with an oxidation degree of 20-100%, the open-circuit voltage of the electrochromic substrate 10 is 0.1V-1.5V. Therefore, by setting the open-circuit voltage of the electrochromic substrate 10 to 0.1V-1.5V, it is more convenient to characterize the oxidation state of the electrochromic layer 400 at an oxidation degree of 20-100%. That is, by detecting the overall open-circuit voltage of the electrochromic substrate 10, it can be determined that the electrochromic layer 400 is in an oxidation state, thereby simplifying the process of fabricating an electrochromic device using this electrochromic substrate 10.

[0133] In some embodiments, when the absorbance of the electrochromic layer 400 to a preset light is greater than a preset absorbance threshold, the electrochromic layer 400 is in an oxidized state with an oxidation degree of 20%-80%.

[0134] This allows for a more precise oxidation degree of the electrochromic layer 400, resulting in a stronger absorption capacity of the electrochromic layer 400 for the preset light, which can better divide the electrochromic layer 400 into at least two parts.

[0135] In some embodiments, when the absorbance of the electrochromic layer 400 for a preset light is greater than a preset absorbance threshold, the open-circuit voltage of the electrochromic substrate 10 is 0.1V-1V. Therefore, by setting the open-circuit voltage of the electrochromic substrate 10 to 0.1V-1V, it can be further ensured that the absorbance of the electrochromic layer 400 for the preset light is greater than the preset absorbance threshold. This allows the electrochromic layer 400 to be segmented by the preset light when the preset light is emitted onto the electrochromic substrate 10, thereby achieving partitioning of the electrochromic substrate 10.

[0136] In some embodiments, when the electrochromic substrate 10 is energized to the point that the electrochromic layer 400 is in an oxidation state with an oxidation degree of 20-80%, the open-circuit voltage of the electrochromic substrate 10 is 0.1V-1V. Therefore, by setting the open-circuit voltage of the electrochromic substrate to 0.1V-1V, it is more convenient to characterize the oxidation state of the electrochromic layer 400 at an oxidation degree of 20-80%. That is, by detecting the overall open-circuit voltage of the electrochromic substrate 10, it can be determined that the electrochromic layer 400 is in an oxidation state, thereby simplifying the process of fabricating an electrochromic device using this electrochromic substrate 10.

[0137] In some embodiments, when the absorbance of the electrochromic layer 400 for a preset light is greater than a preset absorbance threshold, the electrochromic layer 400 is in an oxidized state with an oxidation degree of 20%-50%. This allows the oxidation degree of the electrochromic layer 400 to be in an intermediate state, thereby ensuring that while the electrochromic layer 400 has a strong absorption capacity for the preset light, its absorption capacity for the preset light is also closer to that of other layers (such as the first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, and the second conductive layer 240). In this way, the preset light can better cut the electrochromic layer 400 and other layers together, and the energy required for cutting is closer, which can avoid unnecessary cutting damage to the electrochromic layer 400 or other layers, thereby improving the reliability and aesthetics of the electrochromic device prepared in particular.

[0138] In some embodiments, when the absorbance of the electrochromic layer 400 for a preset light is greater than a preset absorbance threshold, the open-circuit voltage of the electrochromic substrate 10 is 0.1V-0.8V. Therefore, by setting the open-circuit voltage of the electrochromic substrate 10 to 0.1V-0.8V, it can be further ensured that the absorbance of the electrochromic layer 400 for the preset light is greater than the preset absorbance threshold. Furthermore, while ensuring that the electrochromic layer 400 has a strong absorption capacity for the preset light, it can also ensure that its absorption capacity for the preset light is closer to that of other layers (e.g., the first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, and the second conductive layer 240). Thus, the preset light can better cut the electrochromic layer 400 and other layers together, and the energy required for cutting is closer, avoiding unnecessary cutting damage to the electrochromic layer 400 or other layers, thereby improving the reliability and aesthetics of the prepared electrochromic device.

[0139] In some embodiments, when the electrochromic substrate 10 is energized to the point that the electrochromic layer 400 is in an oxidation state with an oxidation degree of 20-50%, the open-circuit voltage of the electrochromic substrate 10 is 0.1V-0.8V. Therefore, by setting the open-circuit voltage of the electrochromic substrate 10 to 0.1V-0.8V, it is more convenient to characterize the electrochromic layer 400 as being in an oxidation state of 20-50%, that is, by detecting the overall open-circuit voltage of the electrochromic substrate 10, it can be determined that the electrochromic layer 400 is in an oxidation state, thereby simplifying the process of fabricating an electrochromic device using this electrochromic substrate 10.

[0140] In some embodiments, it should be understood that the oxidation degree of the electrochromic layer 400 in this application can be obtained by the following formula: Oxidation degree of electrochromic layer 400 = (Current transmittance of electrochromic substrate 10 - Transmittance of electrochromic substrate 10 in equilibrium state) / (Transmittance of electrochromic substrate 10 in its highest brightness state - Transmittance of electrochromic substrate 10 in equilibrium state) * 100%. Wherein, the transmittance of the electrochromic substrate 10 is the transmittance of the electrochromic substrate 10 for visible light; the highest brightness state of the electrochromic substrate 10 is the state in which the electrochromic substrate 10 can achieve or is defined as having the highest transmittance; and the transmittance of the electrochromic substrate 10 in its equilibrium state can be the transmittance corresponding to an open-circuit voltage of 0V.

[0141] Furthermore, the oxidation degree of the electrochromic substrate 400 can also be obtained using the following formula: Oxidation degree of the electrochromic substrate 400 = (Current capacitance of the electrochromic substrate 10 - Capacitance of the electrochromic substrate 10 in equilibrium state) / (Capacitance of the electrochromic substrate 10 in its highest brightness state - Capacitance of the electrochromic substrate 10 in its equilibrium state) * 100%. Wherein, the capacitance corresponding to the electrochromic substrate 10 in its highest brightness state is the capacitance corresponding to the state where the electrochromic substrate 10 can achieve, or is custom-defined to achieve, the maximum transmittance. The capacitance of the electrochromic substrate 10 in its equilibrium state can be the capacitance corresponding to the open-circuit voltage of the electrochromic substrate 10 being 0V. Of course, the electrochromic substrate 10 may also be in an equilibrium state when the open-circuit voltage is other values. This application does not limit the specific open-circuit voltage of the electrochromic substrate 10 in its equilibrium state.

[0142] When it is necessary to precisely control the oxidation degree range of the electrochromic substrate 10, the open circuit voltage of the electrochromic substrate 10 can be brought within the corresponding voltage range by applying current to the electrochromic substrate 10. Then, the transmittance and capacitance of the current electrochromic substrate 10 can be detected to confirm whether the electrochromic substrate 10 is within the target oxidation degree range.

[0143] In some embodiments, the absorbance of the electrochromic layer 400 for a preset light source can be set to be less than a preset absorbance threshold, so that the preset light source can pass through the electrochromic layer 400 without cutting the electrochromic layer 400, thus the electrochromic layer 400 can also be a complete structure.

[0144] Referring to Figure 2, the electrochromic layer 400 can also be a single, integral structure. In this case, the portion of the electrochromic layer 400 corresponding to the gap region 200c formed by the first conductive layer 210, the ion storage layer 230, the electrolyte layer 220, and the second conductive layer 240 is seamless, resulting in better overall integrity of the electrochromic layer 400. This avoids light leakage at the gap region 200c during the coloring and fading processes, thus enabling the electrochromic substrate 10 of this application to have a better display effect.

[0145] In some embodiments, when the absorbance of the electrochromic layer 400 for a preset light is less than or equal to a preset absorbance threshold, the electrochromic layer 400 is in a reduction state with a reduction degree of 1-100%. When the electrochromic layer 400 is in the reduction state, the absorption effect of the electrochromic layer 400 for the preset light is weak, so that the preset light cannot pass through the electrochromic layer 400. That is, when the preset light is incident on the electrochromic substrate 10, the electrochromic layer 400 therein may not be cut.

[0146] To achieve a reduction level of 1-100% for the electrochromic layer 400, an electric current can be applied to the electrochromic substrate 10. Consequently, the electrochromic layer 400 is also energized, allowing it to transition to a reduced state. Specifically, when the electrochromic substrate 10 is not energized, the electrochromic layer 400 is in an equilibrium state, meaning it is neither oxidized nor reduced. Applying an electric current to the electrochromic substrate 10 allows the electrochromic layer 400 to switch from an equilibrium state to a reduced state, making the process simple and convenient.

[0147] In some embodiments, when the absorbance of the electrochromic layer 400 to a preset light is less than or equal to a preset absorbance threshold, the open-circuit voltage of the electrochromic substrate 10 is less than 0V.

[0148] That is, by energizing the electrochromic layer 400 and controlling the open-circuit voltage of the electrochromic substrate 10 to be less than 0V, the absorbance of the electrochromic layer 400 for preset light can be made less than or equal to the preset absorbance threshold. In this way, when the preset light is directed toward the electrochromic layer 400, the preset light will not cut the electrochromic layer 400, so that the electrochromic layer 400 can maintain a complete integral structure.

[0149] In some embodiments, when the absorbance of the electrochromic layer 400 to a preset light is less than or equal to a preset absorbance threshold, the open-circuit voltage of the electrochromic substrate 10 is less than 0V and greater than or equal to -2V.

[0150] Specifically, by applying current to the electrochromic substrate 10, the open-circuit voltage of the electrochromic substrate 10 can be made less than 0V and greater than or equal to -2V, thereby making the electrochromic layer 400 a reduction state with a reduction degree of 1-100%.

[0151] In some embodiments, the degree of color reproduction of the electrochromic layer 400 in this application can be obtained by the following formula: Degree of color reproduction of the electrochromic substrate 400 = (Transmittance of the electrochromic substrate 10 in equilibrium state - Transmittance of the electrochromic substrate 10 at present) / (Transmittance of the electrochromic substrate 10 in equilibrium state - Transmittance of the electrochromic substrate 10 in its darkest state) * 100%. Wherein, the transmittance of the electrochromic substrate 10 is the transmittance of the electrochromic substrate 10 for visible light; the transmittance of the electrochromic substrate 10 in equilibrium state can be the transmittance corresponding to an open-circuit voltage of 0V; and the state where the electrochromic substrate 10 is in its darkest state can be the state where the electrochromic substrate 10 can achieve or is customizable as having the lowest possible transmittance.

[0152] Furthermore, the degree of color reproduction of the electrochromic substrate 400 can also be obtained using the following formula: Degree of color reproduction of the electrochromic substrate 400 = (Capacitance of the electrochromic substrate 10 in equilibrium state - Current capacitance of the electrochromic substrate 10) / (Capacitance of the electrochromic substrate 10 in equilibrium state - Capacitance of the electrochromic substrate 10 in its darkest state) * 100%. Wherein, the capacitance of the electrochromic substrate 10 in equilibrium state can be the capacitance corresponding to an open-circuit voltage of 0V, the capacitance corresponding to the darkest state of the electrochromic substrate 10 is the capacitance corresponding to the minimum transmittance that the electrochromic substrate 10 can achieve or is custom-defined to achieve.

[0153] When it is necessary to precisely control the range of the reduction degree of the electrochromic substrate 10, the open circuit voltage of the electrochromic substrate 10 can be brought within the corresponding voltage range by energizing the electrochromic substrate 10. Then, the transmittance and capacitance of the current electrochromic substrate 10 can be detected to confirm whether the electrochromic substrate 10 is within the target reduction degree range.

[0154] In some embodiments, the preset absorbance threshold in this application is 0.1 Abs. This allows the preset light to better separate the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240 into multiple parts, and reduces the impact of the preset light emitted by the laser on the first substrate 100 and the second substrate 300, thereby improving the structural integrity of the first substrate 100 and the second substrate 300.

[0155] In some embodiments, the first conductive layer 210 of this application has an absorbance of 0.15 Abs for a preset light, so that the preset light shining on the first conductive layer 210 can better divide the first conductive layer 210 into at least two parts.

[0156] In some embodiments, the second conductive layer 240 of this application has an absorbance of 0.15 Abs for a preset light, so that the preset light shining on the second conductive layer 240 can better divide the second conductive layer 240 into at least two parts.

[0157] In some embodiments, the ion storage layer 230 of this application has an absorbance of 0.4 Abs for a preset light source, so that the preset light source can better divide the ion storage layer 230 into at least two parts.

[0158] In some embodiments, the absorbance of the electrolyte layer 220 for a preset light is greater than or equal to 0.3 Abs, so that the preset light shining on the electrolyte layer 220 can better divide the electrolyte layer 220 into at least two parts.

[0159] In some embodiments, the first substrate 100 of this application has an absorbance of less than or equal to 0.05 Abs for a preset light source, so that the preset light source has less impact on the first substrate 100 when it is directed at it, thereby improving the structural integrity of the first substrate 100.

[0160] In some embodiments, the absorbance of the second base layer 300 for the preset light is less than or equal to 0.05 Abs, so that the preset light has less impact on the second base layer 300 when it is directed at it, thereby improving the structural integrity of the second base layer 300.

[0161] In some embodiments, the difference between the absorbance of the first conductive layer 210, electrolyte layer 220, ion storage layer 230 and the second conductive layer 240 for the preset light and the absorbance of the first base layer 100 and the second base layer 300 for the preset light is greater than or equal to 0.1 Abs.

[0162] Specifically, the difference between the absorbance of the first conductive layer 210 and the absorbance of the first substrate 100 and the second substrate 300 for the preset light is greater than 0.1 Abs. The difference between the absorbance of the electrolyte layer 220 and the absorbance of the first substrate 100 and the second substrate 300 for the preset light is also greater than 0.1 Abs. The difference between the absorbance of the ion storage layer 230 and the absorbance of the first substrate 100 and the second substrate 300 for the preset light is also greater than 0.1 Abs. The difference between the absorbance of the second conductive layer 240 and the absorbance of the first substrate 100 and the second substrate 300 for the preset light is also greater than 0.1 Abs. Therefore, the light absorption of the first substrate 100 and the second substrate 200, which are not cut by the preset light, can be sufficiently small, while the light absorption of the first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, and the second conductive layer 240, which are cut by the preset light, can be sufficiently large. This increases the difference in light absorption between them, which is more conducive to cutting the first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, and the second conductive layer 240. At the same time, it more effectively prevents the first substrate 100 and the second substrate 300 from being cut, further reducing or preventing damage to the first substrate 100 and the second substrate 300 by the preset light, and improving the overall consistency of the appearance of the electrochromic substrate 10.

[0163] Furthermore, when the absorbance of the electrochromic layer 400 for the preset light is greater than or equal to the preset absorbance, the difference between the absorbance of the electrochromic layer 400 for the preset light and the absorbance of the first substrate 100 and the second substrate 300 for the preset light is greater than 0.1 Abs. Therefore, by making the difference in absorbance of the electrochromic layer 400 and the first substrate 100 and the second substrate 300 for the preset light relatively large, damage to the first substrate 100 and the second substrate 300 can be effectively prevented while the electrochromic layer 400 is being cut, thus improving the appearance consistency of the electrochromic substrate 10.

[0164] Furthermore, when the absorbance of the electrochromic layer 400 for a preset light is less than the preset absorbance, the difference between the absorbance of the electrochromic layer 400 for the preset light and the absorbance of the first substrate 100 and the second substrate 300 for the preset light is less than or equal to 0.1 Abs. Therefore, by minimizing the difference in absorbance of the electrochromic layer 400 and the first substrate 100 and the second substrate 300 for the preset light, i.e., making their absorbance values ​​relatively close, it is possible to cut other layers of the electrochromic substrate 10 without cutting or damaging the electrochromic layer 400, the first substrate 100, and the second substrate 300, thereby improving the reliability and aesthetics of the electrochromic substrate 10.

[0165] In some embodiments, the difference between the absorbance of the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240 to the absorbance of the first substrate 100 and second substrate 300 to the preset light is greater than or equal to 0.3 Abs. This ensures that the absorbance of the first substrate 100 and second substrate 300, which are not cut by the preset light, is sufficiently low, while the absorbance of the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240, which are cut by the preset light, is sufficiently high. This increases the difference in absorbance between them, making it easier to cut the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240, while more effectively preventing the first substrate 100 and second substrate 300 from being cut. This further reduces or prevents damage to the first substrate 100 and second substrate 300 by the preset light, improving the overall consistency of the electrochromic substrate 10's appearance.

[0166] In some embodiments, the preset light in this application may specifically be infrared light with a wavelength of 1064nm, so that the preset light can better separate the first conductive layer 210, the second conductive layer 240, the ion storage layer 230 and the electrolyte layer 220.

[0167] This application provides a method for fabricating an electrochromic device, which can be used to fabricate an electrochromic device with a zoned display effect. Referring to Figures 1 to 3 and Figure 13, the method includes:

[0168] S100 provides an electrochromic substrate. The electrochromic substrate includes a first base layer 100, a first conductive layer 210, an electrochromic layer 400, an electrolyte layer 220, an ion storage layer 230, a second conductive layer 240, and a second base layer 300, which are stacked sequentially.

[0169] The first base layer 100 and the second base layer 300 are the basic components of the electrochromic device of this application. The first base layer 100 and the second base layer 300 can provide a mounting base for at least some other components of the electrochromic device and serve to protect at least some of the other components. The first base layer 100 and the second base layer 300 can be made of polymer materials. Specifically, the material of the first base layer 100 and the second base layer 300 can be polyethylene terephthalate.

[0170] A first base layer 100 and a second base layer 300 are disposed opposite to each other. A first conductive layer 210, an electrolyte layer 220, an ion storage layer 230, a second conductive layer 240, and an electrochromic layer 400 are all located between the first base layer 100 and the second base layer 300. The first base layer 100, the first conductive layer 210, the electrochromic layer 400, the electrolyte layer 220, the ion storage layer 230, the second conductive layer 240, and the second base layer 300 are stacked sequentially. The first conductive layer 210 and the second conductive layer 240 can be electrically connected to an external power source. When the first conductive layer 210 and the second conductive layer 240 are energized, they can drive the movement of ions or electrons in the ion storage layer 230, the electrolyte layer 220, and the electrochromic layer 400, thereby changing the color of the electrochromic layer 400. By applying currents of different voltages to the first conductive layer 210 and the second conductive layer 240, the electrochromic layer 400 can display different colors, thus achieving a color-changing function.

[0171] S200, a preset light is emitted toward the electrochromic substrate, and the preset light passes through the electrochromic substrate along the stacking direction of the electrochromic substrate.

[0172] A laser can emit a preset light beam toward the electrochromic substrate. The laser can emit the preset light beam toward the electrochromic substrate in a direction toward the first substrate 100 and / or the second substrate 300. The absorbance of the first substrate 100 and the second substrate 300 for the preset light beam is less than a preset absorbance threshold, so that the preset light beam passes through the first substrate 100 and the second substrate 300 without cutting through them, thereby maintaining the structural integrity of the first substrate 100 and the second substrate 300. The absorbance of the first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, and the second conductive layer 240 for the preset light beam is greater than a preset absorbance threshold, so that the preset light beam can cut through the first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, and the second conductive layer 240 along the stacking direction of the electrochromic substrate, thereby dividing the first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, and the second conductive layer 240 into at least two parts.

[0173] The first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240 have a light absorption of more than a preset light absorption threshold, which makes the absorption effect of the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240 on the preset light relatively strong. Thus, the preset light can penetrate the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240.

[0174] The first substrate 100 and the second substrate 300 have a light absorption of less than a preset light absorption threshold for the preset light emitted by the laser, so that the absorption effect of the first substrate 100 and the second substrate 300 on the preset light is relatively weak. In this way, the preset light will not cut through the first substrate 100 and the second substrate 300 when it passes through them.

[0175] Specifically, a pre-set light source can form a gap region 200c within the electrochromic substrate. The gap region 200c penetrates the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240, dividing them into at least two parts. Correspondingly, the gap region 200c does not penetrate the first base layer 100 and the second base layer 300, making the first base layer 100 and the second base layer 300 a complete, integrated structure. When the gap region 200c divides the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240 into two parts, a portion of the separated first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240 can correspond to a portion of the first base layer 100, a portion of the second base layer 300, and a portion of the electrochromic layer 400, forming a complete electrochromic structure. The portion of the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240 separated by a partition can correspond to a portion of the first base layer 100, a portion of the second base layer 300, and a portion of the electrochromic layer 400 to form another complete electrochromic structure. The two portions of the first conductive layer 210 separated by the gap region 200c and the two portions of the second conductive layer 240 separated by the back gap region 200c can be electrically connected to an external power source, allowing the external power source to supply power to different portions of the first conductive layer 210 and the second conductive layer 240 respectively. When currents of different parameters are applied to the two portions of the first conductive layer 210 and the two portions of the second conductive layer 240, the areas on the electrochromic layer 400 corresponding to the different portions of the first conductive layer 210 and the second conductive layer 240 can exhibit different color display effects. This allows different parts of the electrochromic device of this application to simultaneously exhibit different color display effects, achieving the function of zoned color changing.

[0176] The first base layer 100 and the second base layer 300 are integrated into one structure, which ensures that there are no gaps in the parts of the first base layer 100 and the second base layer 300 corresponding to the gap region 200c. In this way, the first base layer 100 and the second base layer 300 can completely encapsulate and seal each part of the first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, the second conductive layer 240, and the electrochromic layer 400. This results in a better sealing effect of the first base layer 100 and the second base layer 300 on the first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, the second conductive layer 240, and the electrochromic layer 400, thereby making the structure of the electrochromic device of this application more stable and reliable.

[0177] In some embodiments, referring to FIG1, the electrochromic layer of this application has an absorbance of less than a preset absorbance threshold for the preset light emitted by the laser, allowing the preset light to pass through the electrochromic layer without cutting it. This also allows the electrochromic layer to be a single, integrated structure. Since the electrochromic layer 400 is a single, integrated structure, the portion of the electrochromic layer 400 corresponding to the gap region 200c has no gaps, resulting in better overall integrity of the electrochromic layer 400. This avoids light leakage in the portion of the electrochromic layer 400 corresponding to the gap region 200c during the coloring and fading processes, thus providing a better display effect for the electrochromic device of this application.

[0178] In some embodiments, referring to Figures 1 and 14, in order to make the electrochromic layer in this application a monolithic structure with better structural integrity, the electrochromic device fabrication method of this application further includes the following steps before emitting preset light onto the electrochromic substrate:

[0179] S300, a second voltage is applied to the electrochromic substrate to bring the electrochromic layer into a reduction state with a reduction degree of 1-100%.

[0180] In this method, by applying a voltage to the electrochromic substrate 10, the state of the electrochromic layer 400 can be changed efficiently.

[0181] In some embodiments, referring to Figures 1 and 15, the electrochromic device fabrication method of this application further includes the following steps before emitting a preset light onto the electrochromic substrate:

[0182] S310 applies a second voltage to the electrochromic substrate so that the open-circuit voltage of the electrochromic substrate is less than 0V.

[0183] In some embodiments, step S310 may also involve applying a second voltage to the electrochromic substrate so that the open-circuit voltage of the electrochromic substrate is less than 0V and greater than or equal to -2V.

[0184] Of course, in this application, an electrochromic substrate can also be provided directly, in which the electrochromic layer is in a reduced state. This eliminates the need to apply a second voltage to the electrochromic substrate, thereby reducing the number of steps in the electrochromic device fabrication method of this application.

[0185] In some implementations, in order to make the open-circuit voltage of the electrochromic substrate less than 0V and greater than or equal to -2V, a second voltage less than 0V and greater than or equal to -20V may be set.

[0186] In some implementations, the second voltage is less than 0V and greater than or equal to -10V.

[0187] In some implementations, the second voltage is less than 0V and greater than or equal to -5V.

[0188] In some implementations, the second voltage is less than 0V and greater than or equal to -2V.

[0189] In some embodiments, referring to FIG2, the electrochromic layer 400 of this application has a first portion and a second portion. The first portion of the electrochromic layer 400 is located at the gap region 200c, such that the first portion of the electrochromic layer 400 is opposite to the gap region 200c. The second portion of the electrochromic layer 400 is misaligned with the gap region 200c, such that the second portion of the electrochromic layer 400 can be stacked on the first conductive layer 210.

[0190] The electrochromic layer 400 is stacked on the first conductive layer 210 in the direction of its thickness. The thickness of the first part of the electrochromic layer 400 is smaller than that of the second part, making the portion of the electrochromic layer 400 opposite to the gap region 200c relatively thinner. This can alleviate the color mixing problem of the first part of the electrochromic layer 400 to a certain extent, thus giving the electrochromic device of this application a better display effect.

[0191] In some embodiments, the thickness of the first portion of the electrochromic layer 400 can be 0.5 μm-1 μm, and the thickness of the second portion of the electrochromic layer 400 is greater than 1 μm and not greater than 2 μm. This allows for a relatively simple fabrication process for the electrochromic layer 400 when the thickness of the first portion of the electrochromic layer 400 is smaller than the thickness of the second portion.

[0192] In some embodiments, substances that facilitate the absorption of infrared light may be added to the electrolyte layer 220, and the thickness of the electrolyte layer 220 may be set to 10μm-70μm. The inclusion of substances that facilitate the absorption of infrared light in the electrolyte layer 220 enhances its ability to absorb light within the infrared spectrum. To allow the formation of a gap region 200c within the electrochromic device to separate the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240 into at least two parts, the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240 can be cut using a laser. The inclusion of substances that facilitate the absorption of infrared light in the electrolyte layer 220 allows for better absorption of infrared light when the laser emits infrared laser light towards the conductive layer group 200, making it easier for the infrared laser to cut through the electrolyte layer 220 and ensuring complete separation of the various parts of the conductive layer group 200.

[0193] The thickness of the electrolyte layer 220 can be set to 10μm-70μm, allowing for a relatively smaller thickness while still fulfilling its function. This facilitates the cutting of the electrolyte layer 220 by an infrared laser, simplifying the fabrication process of the electrochromic device of this application. Materials that effectively absorb infrared light can be metal oxide nanoparticles such as TiO. Alternatively, the functional groups of the electrolyte layer 220 can be modified to improve its infrared light absorption. Specifically, the conductive layer assembly 200 can be cut using an infrared laser with a wavelength of 1064nm, resulting in an absorbance of the electrolyte layer 220 for 1064nm infrared light exceeding 0.5 Abs.

[0194] In some embodiments, referring to Figures 2 to 4, the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240 of this application can constitute a conductive layer group 200. A preset light beam emitted by the laser forms a gap region 200c within the conductive layer group 200. The gap region 200c divides the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240 into multiple parts; that is, the gap region 200c can divide the conductive layer group 200 into multiple sub-conductive layer groups. Each sub-conductive layer group of the conductive layer group 200 includes the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240. The gap region 200c can divide the conductive layer group 200 into at least two sub-conductive layer groups. Therefore, depending on the number and specific structure of the gap regions 200c, the gap regions 200c can divide the conductive layer group 200 into a greater number of sub-conductive layer groups. Specifically, when the gap region 200c has a cross-shaped structure, the conductive layer group 200, composed of the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240, can be divided into four parts, resulting in four sub-conductive layer groups. When the gap region 200c has a triangular structure, it can divide the conductive layer group 200 into three parts, resulting in three sub-conductive layer groups. In this application, there is no limitation on the number of sub-conductive layer groups formed by the gap region 200c dividing the conductive layer group 200.

[0195] Specifically, when the gap region 200c divides the conductive layer group 200 into multiple sub-conductive layer groups, two adjacent sub-conductive layer groups can be respectively a first sub-conductive layer group 200a and a second sub-conductive layer group 200b. The following embodiments will specifically describe the structure of the electrochromic device of this application by taking two adjacent sub-conductive layer groups in the conductive layer group 200 as the first sub-conductive layer group 200a and the second sub-conductive layer group 200b.

[0196] The first base layer 100 provides a mounting foundation for both the first sub-conductive layer group 200a and the second sub-conductive layer group 200b, both of which are stacked on the first base layer 100. The second base layer 300 is stacked on the side of the first sub-conductive layer group 200a facing away from the first base layer 100, and also on the side of the second sub-conductive layer group 200b facing away from the first base layer 100. In this way, the first base layer 100 and the second base layer 300 can sandwich the first sub-conductive layer group 200a and the second sub-conductive layer group 200b between them, and also simultaneously seal and protect the first sub-conductive layer group 200a and the second sub-conductive layer group 200b. The portions of the first base layer 100 corresponding to the first sub-conductive layer group 200a and the second sub-conductive layer group 200b are connected to form an integral structure, and the portions of the second base layer 300 corresponding to the first sub-conductive layer group 200a and the second sub-conductive layer group 200b are connected to form an integral structure. This makes the sealing and encapsulation of the first sub-conductive layer group 200a and the second sub-conductive layer group 200b by the first base layer 100 and the second base layer 300 better, so as to make the structure of the electrochromic device of this application more stable.

[0197] The first sub-conductive layer group 200a and the second sub-conductive layer group 200b are arranged alternately. Specifically, the first sub-conductive layer group 200a and the second sub-conductive layer group 200b can be distributed alternately in a direction perpendicular to the direction in which the conductive layer group 200 and the first base layer 100 are stacked. The gap region 200c is located between the first sub-conductive layer group 200a and the second sub-conductive layer group 200b.

[0198] The electrochromic layer 400 is an integral structure, allowing it to be simultaneously disposed within the first sub-conductive layer group 200a and the second sub-conductive layer group 200b. Specifically, the electrochromic layer 400 extends along the arrangement direction of the first and second sub-conductive layer groups 200a and 200b, such that part of the electrochromic layer 400 is located within the first sub-conductive layer group 200a, part within the second sub-conductive layer group 200b, and part within the gap region 200c between the first and second sub-conductive layer groups 200a and 200b. When the first sub-conductive layer group 200a is energized, the electrochromic layer 400 located within it can produce a corresponding color change. When the second sub-conductive layer group 200b is energized, the electrochromic layer 400 located in the second sub-conductive layer group 200b can produce corresponding color changes, thereby enabling different parts of the electrochromic layer 400 to produce different display effects, so that different parts of the electrochromic device of this application can have different display effects, thus the electrochromic device has a zoned display function.

[0199] In some embodiments, referring to Figures 1 to 3, in the plurality of sub-conductive layer groups in this application, the spacing between at least a portion of adjacent sub-conductive layer groups can be set to be less than or equal to 30 μm, that is, the spacing between at least a portion of the first sub-conductive layer group 200a and the second sub-conductive layer group 200b can be set to be less than or equal to 30 μm. In other words, the width of the gap region 200c between the first sub-conductive layer group 200a and the second sub-conductive layer group 200b is less than or equal to 30 μm. This allows for a relatively narrower gap region 200c between the first sub-conductive layer group 200a and the second sub-conductive layer group 200b, further weakening the gap region 200c between the first sub-conductive layer group 200a and the second sub-conductive layer group 200b, resulting in better overall integrity of the electrochromic device of this application, further preventing color cross-contamination, and improving the display effect of the electrochromic device of this application.

[0200] In some embodiments, the electrochromic layer 400 in this application has an absorbance greater than a preset absorbance threshold for a preset light emitted by the laser, so that the preset light divides the electrochromic layer 400 into at least two parts. Specifically, the preset light can pass through the electrochromic layer 400 and divide the electrochromic layer 400 into at least two parts. In this way, multiple parts of the electrochromic layer 400 can be stacked correspondingly with multiple parts of the first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, and the second conductive layer 240, respectively, so that the electrochromic device prepared by the electrochromic device preparation method of this application has a better partitioning effect.

[0201] In some embodiments, referring to Figures 12 and 15, in order to allow the electrochromic layer in this application to be divided into multiple parts by a preset light, the electrochromic device fabrication method of this application further includes the following steps before emitting the preset light onto the electrochromic substrate:

[0202] S400, a first voltage is applied to the electrochromic substrate to place the electrochromic layer in an oxidized state with an oxidation degree of 0-100%. When the electrochromic layer 400 is in an oxidized state, the electrochromic layer 400 has a strong absorption effect on the preset light, so that the preset light can pass through the electrochromic layer 400 to cut the electrochromic layer 400.

[0203] In this application, by applying a voltage to the electrochromic substrate 10, the state of the electrochromic layer 400 can be changed efficiently. Alternatively, this application may directly provide an electrochromic substrate in which the electrochromic layer is in an oxidized state. This eliminates the need to apply a first voltage to the electrochromic substrate, thereby reducing the number of steps in the electrochromic device fabrication method of this application.

[0204] In some embodiments, the electrochromic device fabrication method of this application further includes, before emitting a preset light onto the electrochromic substrate:

[0205] S410, a first voltage is applied to the electrochromic substrate to bring the electrochromic layer to an oxidation state with an oxidation degree of 20-100%. This allows for a relatively precise oxidation degree of the electrochromic layer 400, thereby making the electrochromic layer 400 more resistant to the preset light, and the preset light can better divide the electrochromic layer 400 into at least two parts.

[0206] In some embodiments, the electrochromic device fabrication method of this application further includes, before emitting a preset light onto the electrochromic substrate:

[0207] S420, a first voltage is applied to the electrochromic substrate to bring the electrochromic layer to an oxidation state with an oxidation degree of 20-80%. This allows for a more precise oxidation degree of the electrochromic layer 400, thereby making the electrochromic layer 400 more capable of absorbing preset light, and the preset light can better divide the electrochromic layer 400 into at least two parts.

[0208] In some embodiments, the electrochromic device fabrication method of this application further includes, before emitting a preset light onto the electrochromic substrate:

[0209] S430, a first voltage is applied to the electrochromic substrate to bring the electrochromic layer to an oxidation state of 20-50%. This ensures that the oxidation degree of the electrochromic layer 400 is in an intermediate state, thus guaranteeing that the electrochromic layer 400 has a strong absorption capacity for the preset light while also ensuring that its absorption capacity for the preset light is closer to that of other layers (such as the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240). In this way, the preset light can better cut the electrochromic layer 400 and other layers together, and the energy required for cutting is closer, which can avoid unnecessary cutting damage to the electrochromic layer 400 or other layers, thereby improving the reliability and aesthetics of the prepared electrochromic device.

[0210] In some embodiments, the electrochromic device fabrication method of this application further includes, before emitting a preset light onto the electrochromic substrate:

[0211] S440, a first voltage is applied to the electrochromic substrate so that the open-circuit voltage of the electrochromic substrate is 0V-2V. Therefore, by making the open-circuit voltage of the electrochromic substrate 10 0V-2V, it can be ensured that the absorbance of the electrochromic layer 400 for a preset light is greater than a preset absorbance threshold. Thus, when the preset light is emitted to the electrochromic substrate 10, the electrochromic layer 400 can be segmented by the preset light, thereby achieving partitioning of the electrochromic substrate 10.

[0212] In some embodiments, the electrochromic device fabrication method of this application further includes, before emitting a preset light onto the electrochromic substrate:

[0213] S450, a first voltage is applied to the electrochromic substrate to make the open-circuit voltage of the electrochromic substrate 0.1V-1.5V. Therefore, by making the open-circuit voltage of the electrochromic substrate 10 0.1V-1.5V, it can be further ensured that the absorbance of the electrochromic layer 400 for a preset light is greater than a preset absorbance threshold. This allows the electrochromic layer 400 to be segmented by the preset light when the preset light is emitted to the electrochromic substrate 10, thereby achieving partitioning of the electrochromic substrate 10.

[0214] In some embodiments, the electrochromic device fabrication method of this application further includes, before emitting a preset light onto the electrochromic substrate:

[0215] S460, a first voltage is applied to the electrochromic substrate to make the open-circuit voltage of the electrochromic substrate 0.1V-1V. Therefore, by making the open-circuit voltage of the electrochromic substrate 10 0.1V-1V, it can be further ensured that the absorbance of the electrochromic layer 400 for a preset light is greater than a preset absorbance threshold. This allows the electrochromic layer 400 to be segmented by the preset light when the preset light is emitted to the electrochromic substrate 10, thereby achieving partitioning of the electrochromic substrate 10.

[0216] In some embodiments, the electrochromic device fabrication method of this application further includes, before emitting a preset light onto the electrochromic substrate:

[0217] S470, a first voltage is applied to the electrochromic substrate to make the open-circuit voltage of the electrochromic substrate 0.1V-0.8V. Therefore, by making the open-circuit voltage of the electrochromic substrate 10 0.1V-0.8V, it can be further ensured that the absorbance of the electrochromic layer 400 for the preset light is greater than the preset absorbance threshold. Furthermore, while ensuring that the electrochromic layer 400 has a strong absorption capacity for the preset light, it can also ensure that its absorption capacity for the preset light is closer to that of other layers (e.g., the first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, and the second conductive layer 240). Thus, the preset light can better cut the electrochromic layer 400 and other layers together, and the energy required for cutting is closer, avoiding unnecessary cutting damage to the electrochromic layer 400 or other layers, thereby improving the reliability and aesthetics of the prepared electrochromic device.

[0218] Furthermore, it should be noted that to precisely control the oxidation degree of the electrochromic layer, this can be achieved by adjusting the parameters of the current applied to the electrochromic substrate. Specifically, the current applied to the electrochromic substrate can be controlled to reach a preset current value, thus putting the electrochromic substrate in a cut-off state and allowing the electrochromic layer to reach the target oxidation degree. Alternatively, the amount of charge applied to the electrochromic substrate can be controlled to reach a preset charge amount, thus putting the electrochromic substrate in a cut-off state and allowing the electrochromic layer to reach the target oxidation degree. Finally, the duration of current application to the electrochromic substrate can be controlled to reach a preset duration, thus putting the electrochromic substrate in a cut-off state and allowing the electrochromic layer to reach the target oxidation degree.

[0219] Subsequently, the open-circuit voltage of the electrochromic substrate can be detected to determine whether the open-circuit voltage of the electrochromic substrate matches the open-circuit voltage of the oxidation state at the target oxidation level, thereby determining whether the electrochromic layer is in the oxidation state at the target oxidation level.

[0220] In addition, after applying current to the electrochromic substrate to bring the electrochromic layer to the target oxidation state, the electrochromic substrate can be left to stand for 1-2 minutes before testing the open-circuit voltage of the electrochromic substrate. This allows for a more accurate determination of whether the electrochromic layer is in the target oxidation state.

[0221] In some embodiments, the preset absorbance threshold in this application is 0.1 Abs. This allows the preset light emitted by the laser to better separate the first conductive layer, electrolyte layer, ion storage layer, and second conductive layer into multiple parts, and reduces the impact of the preset light from the laser on the first substrate, second substrate, and electrochromic layer, thereby improving the structural integrity of the first substrate, second substrate, and electrochromic layer.

[0222] In some embodiments, the difference between the absorbance of the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer for the preset light and the absorbance of the first substrate and the second substrate for the preset light is greater than or equal to 0.1 Abs.

[0223] Specifically, the difference between the absorbance of the first conductive layer for the preset light and the absorbance of the first and second substrates for the preset light is greater than 0.1 Abs. The difference between the absorbance of the electrolyte layer for the preset light and the absorbance of the first and second substrates for the preset light is greater than 0.1 Abs. The difference between the absorbance of the ion storage layer for the preset light and the absorbance of the first and second substrates for the preset light is greater than 0.1 Abs. The difference between the absorbance of the second conductive layer for the preset light and the absorbance of the first and second substrates for the preset light is greater than 0.1 Abs. Therefore, the light absorption of the first substrate 100 and the second substrate 200, which are not cut by the preset light, can be sufficiently small, while the light absorption of the first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, and the second conductive layer 240, which are cut by the preset light, can be sufficiently large. This increases the difference in light absorption between them, which is more conducive to cutting the first conductive layer 210, the electrolyte layer 220, the ion storage layer 230, and the second conductive layer 240. At the same time, it more effectively prevents the first substrate 100 and the second substrate 200 from being cut, further reducing or preventing damage to the substrate by the preset light and improving the overall consistency of the electrochromic device's appearance.

[0224] Furthermore, when the absorbance of the electrochromic layer for the preset light is greater than or equal to the preset absorbance, the difference between the absorbance of the electrochromic layer for the preset light and the absorbance of the first and second substrates for the preset light is greater than 0.1 Abs. Therefore, by making the difference in absorbance of the electrochromic layer 400 and the first and second substrates 100 for the preset light also relatively large, damage to the first and second substrates 100 can be effectively prevented while the electrochromic layer 400 is being cut, thus improving the appearance consistency of the electrochromic device prepared in this way.

[0225] Furthermore, when the absorbance of the electrochromic layer 400 for a preset light is less than the preset absorbance, the difference between the absorbance of the electrochromic layer 400 for the preset light and the absorbance of the first substrate 100 and the second substrate 300 for the preset light is less than or equal to 0.1 Abs. Therefore, by minimizing the difference in absorbance of the electrochromic layer 400 and the first substrate 100 and the second substrate 300 for the preset light—that is, making their absorbance values ​​relatively close—it is possible to cut other layers of the electrochromic substrate 10 without cutting or damaging the electrochromic layer 400, the first substrate 100, and the second substrate 300, thereby improving the reliability and aesthetics of the electrochromic device.

[0226] In some embodiments, the difference between the absorbance of the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240 to the absorbance of the first base layer 100 and second base layer 300 to the preset light is greater than or equal to 0.3 Abs. This ensures that the absorbance of the first base layer 100 and second base layer 200, which are not cut by the preset light, is sufficiently low, while the absorbance of the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240, which are cut by the preset light, is sufficiently high. This increases the difference in absorbance between them, making it easier to cut the first conductive layer 210, electrolyte layer 220, ion storage layer 230, and second conductive layer 240, while more effectively preventing the first base layer 100 and second base layer 200 from being cut. This further reduces or prevents damage to the first base layer 100 and second base layer 200 by the preset light, improving the overall consistency of the electrochromic device's appearance.

[0227] In some embodiments, step S200 of this application, emitting a preset light towards the electrochromic substrate, may specifically include:

[0228] S210, Determine the cutting position of the electrochromic substrate;

[0229] S220, emits a preset ray at least once toward the cutting position.

[0230] Specifically, a laser can be used to emit preset light beams multiple times at the cutting position of the electrochromic substrate. This allows the same cutting position on the electrochromic substrate to be cut multiple times. Each preset light beam emitted by the laser can cut a small path on the electrochromic substrate. After multiple cuts are superimposed, the first conductive layer, electrolyte layer, ion storage layer and second conductive layer in the electrochromic substrate can be completely separated.

[0231] The power of the preset light emitted by the laser each time can be set to be relatively small, which can reduce the influence of the preset light on the area around the cutting position on the electrochromic substrate, so as to make the structure of the electrochromic device prepared by the electrochromic device preparation method of this application more stable and reliable.

[0232] In some embodiments, before emitting a preset light beam at least once towards the cutting position in S220, the electrochromic device fabrication method of this application further includes:

[0233] S230, adjust the power of the preset light to the preset power, and set the duration of the preset light to the preset duration.

[0234] By adjusting the power of the preset light to the preset power and the duration of the preset light to the preset duration, the cutting effect of the preset light on the electrochromic substrate can be improved.

[0235] In some embodiments, the power of the preset light beam can be set to 1W-70W, and the preset duration to 1ps-100ps. Specifically, the power of the preset light beam can be changed by adjusting the power of the laser. When the laser emits the preset light beam multiple times towards the cutting position of the electrochromic substrate to cut the electrochromic substrate, the duration of any single cut is 1ps-100ps. Specifically, the duration of any single preset light beam emitted by the laser towards the cutting position of the electrochromic substrate can be 1ps-100ps. This ensures that the intensity of the preset light beam emitted by the laser towards the electrochromic substrate each time is relatively low, effectively preventing damage to the area surrounding the cutting position of the electrochromic substrate. The power range of the laser can be set to be the same as or greater than the power range of the preset light beam; this application does not impose any limitations on this.

[0236] In some embodiments, the preset light source in this application is an infrared laser with a wavelength of 1064 nm. Specifically, the preset light source can be emitted by a laser, which can be a picosecond fixed laser. The picosecond laser pulse emitted by the picosecond fixed laser has a short duration and concentrated energy, which can efficiently complete the fine cutting of the electrochromic substrate without damaging the periphery of the cutting position. This results in electrochromic devices prepared by the method of this application having higher precision and better color-changing performance.

[0237] In some embodiments, referring to Figures 3 to 9, the method for preparing the electrochromic device of this application further includes:

[0238] S500, a first conductive region is formed on the edge of the first conductive layer that is displaced from the electrolyte layer, the ion storage layer, the electrochromic layer, the second conductive layer and the second base layer, so that at least a portion of the first conductive layer is exposed toward the side of the electrolyte layer.

[0239] S600, a second conductive region is formed on the edge of the second conductive layer that is displaced from the electrolyte layer, the ion storage layer, the electrochromic layer, the first conductive layer and the second base layer, so that at least a portion of the second conductive layer is exposed toward the side of the electrolyte layer.

[0240] An external electrical connector can be directly attached to the first conductive region 211 on the first conductive layer 210, so that the external electrical connector can be electrically connected to the first conductive layer 210. An external electrical connector can also be directly attached to the second conductive region 241 on the second conductive layer 240, so that the external electrical connector can be electrically connected to the second conductive layer 240.

[0241] Referring to Figures 2 to 7, in the plurality of sub-conductive layer groups in this application, at least one sub-conductive layer group's first conductive layer 210 has a first conductive region 211 that is displaced from the electrolyte layer 220, the ion storage layer 230, the electrochromic layer 400, the second conductive layer 240, and the second base layer 300 of the sub-conductive layer group. In this way, the first conductive region 211 of the first conductive layer 210 of the sub-conductive layer group is exposed, and external electrical connectors can be conveniently electrically connected to the first conductive layer 210 through the first conductive region 211.

[0242] Specifically, when the first conductive layer 210 of the first sub-conductive layer group 200a has a first conductive region 211 that is misaligned with the electrolyte layer 220, the ion storage layer 230, the electrochromic layer 400, the second conductive layer 240, and the second base layer 300 of the first sub-conductive layer group 200a. The first conductive region 211 on the first conductive layer 210 of the first sub-conductive layer group 200a can expose part of the first conductive layer 210 of the first sub-conductive layer group 200a. Specifically, the portions of the ion storage layer 230, the electrolyte layer 220, the electrochromic layer 400, the second conductive layer 240, and the second base layer 300 of the first sub-conductive layer group 200a corresponding to the first conductive region 211 can be cut to form the exposed first conductive region 211 on the first conductive layer 210. The first conductive region 211 is specifically located on the side of the first conductive layer 210 of the first sub-conductive layer group 200a facing away from the first base layer 100. This allows external electrical connectors to be conveniently electrically connected to the first conductive layer 210 of the first sub-conductive layer group 200a through the first conductive region 211.

[0243] In the plurality of sub-conductive layer groups in this application, at least one sub-conductive layer group has a second conductive layer 240 having a second conductive region 241 that is displaced from the electrolyte layer 220, the ion storage layer 230, the electrochromic layer 400, the first conductive layer 210 and the first base layer 100 of the sub-conductive layer group.

[0244] Specifically, when the second conductive layer 240 of the first sub-conductive layer group 200a has a second conductive region 241 that is misaligned with the electrolyte layer 220, the ion storage layer 230, the electrochromic layer 400, the first conductive layer 210 and the first base layer 100 of the first sub-conductive layer group 200a. The second conductive region 241 on the second conductive layer 240 of the first sub-conductive layer group 200a can expose part of the second conductive layer 240 of the first sub-conductive layer group 200a. Specifically, the portions of the ion storage layer 230, the electrolyte layer 220, the electrochromic layer 400, the first conductive layer 210, and the first base layer 100 of the first sub-conductive layer group 200a corresponding to the second conductive region 241 can be cut to form the second conductive region 241 on the second conductive layer 240. The second conductive region 241 is specifically located on the side of the second conductive layer 240 of the first sub-conductive layer group 200a facing away from the second base layer 300. This allows external electrical connectors to be conveniently electrically connected to the second conductive layer 240 of the first sub-conductive layer group 200a through the second conductive region 241.

[0245] The first conductive region 211 and the second conductive region 241 on the first sub-conductive layer group 200a can be electrically connected to the positive and negative poles of an external power supply, respectively, so that the first sub-conductive layer group 200a can be conveniently electrically connected to an external power supply.

[0246] In this application, the first conductive layer 210 of the second sub-conductive layer group 200b may also be provided with a first conductive region 211 that is displaced from the electrolyte layer 220, the ion storage layer 230, the electrochromic layer 400, the second conductive layer 240, and the second base layer 300 of the second sub-conductive layer group 200b. The first conductive region 211 on the first conductive layer 210 of the second sub-conductive layer group 200b can expose part of the first conductive layer 210 of the second sub-conductive layer group 200b. Specifically, the portions of the ion storage layer 230, the electrolyte layer 220, the electrochromic layer 400, the second conductive layer 240, and the second base layer 300 of the second sub-conductive layer group 200b corresponding to the first conductive region 211 can be cut to form the first conductive region 211 on the first conductive layer 210. The first conductive region 211 is specifically located on the side of the first conductive layer 210 of the second sub-conductive layer group 200b facing away from the first base layer 100. This allows external electrical connectors to be conveniently electrically connected to the first conductive layer 210 of the second sub-conductive layer group 200b through the first conductive region 211.

[0247] The second conductive layer 240 of the second sub-conductive layer group 200b in this application may also have a second conductive region 241 that is displaced from the electrolyte layer 220, the ion storage layer 230, the electrochromic layer 400, the first conductive layer 210 and the first base layer 100 of the second sub-conductive layer group 200b. The second conductive region 241 on the second conductive layer 240 of the second sub-conductive layer group 200b can expose part of the second conductive layer 240 of the second sub-conductive layer group 200b. Specifically, the portions of the ion storage layer 230, the electrolyte layer 220, the electrochromic layer 400, the first conductive layer 210, and the first base layer 100 of the second sub-conductive layer group 200b corresponding to the second conductive region 241 can be cut to form the second conductive region 241. The second conductive region 241 is specifically located on the side of the second conductive layer 240 of the second sub-conductive layer group 200b facing away from the second base layer 300. This allows external electrical connectors to be conveniently electrically connected to the second conductive layer 240 of the second sub-conductive layer group 200b through the second conductive region 241.

[0248] The first conductive region 211 and the second conductive region 241 on the second sub-conductive layer group 200b can be electrically connected to the positive and negative poles of an external power supply, respectively, so that the second sub-conductive layer group 200b can be conveniently electrically connected to an external power supply.

[0249] In some embodiments, referring to Figures 4 to 6, the first conductive region 211 in this application can be disposed at the edge of the first conductive layer 210. Correspondingly, the edges of the electrolyte layer 220, ion storage layer 230, second conductive layer 240, and second base layer 300 can be cut to form the first conductive region 211, thereby improving the structural integrity of the middle part of the electrochromic device of this application and achieving a better color-changing display effect. Specifically, the first conductive region 211 can be disposed at the edge of the first conductive layer 210 of the first sub-conductive layer group 200a, and can be disposed at the edge of the first conductive layer 210 of the second sub-conductive layer group 200b.

[0250] In this application, the second conductive region 241 can be disposed at the edge of the second conductive layer 240. Correspondingly, the edges of the electrolyte layer 220, ion storage layer 230, first conductive layer 210, and first base layer 100 can be cut to form the second conductive region 241, thereby improving the structural integrity of the middle part of the electrochromic device and achieving a better color-changing display effect. Specifically, the second conductive region 241 can be disposed at the edge of the second conductive layer 240 of the first sub-conductive layer group 200a and the edge of the second conductive layer 240 of the second sub-conductive layer group 200b.

[0251] In some embodiments, referring to Figures 3 to 5, in the plurality of sub-conductive layer groups of this application, the gap region 200c between adjacent sub-conductive layer groups may include a first interruption region and a second interruption region. Specifically, the gap region 200c between the first sub-conductive layer group 200a and the second sub-conductive layer group 200b may include a first interruption region and a second interruption region. The first interruption region is located at the edge of the first sub-conductive layer group 200a and the edge of the second sub-conductive layer group 200b. The first conductive region 211 of the first sub-conductive layer group 200a can be connected to the first conductive region 211 of the second sub-conductive layer group 200b through the first interruption region, thereby allowing the two first conductive regions 211 to be relatively close. The second interruption region is located at the edge of the first sub-conductive layer group 200a and the edge of the second sub-conductive layer group 200b. The second conductive region 241 of the second sub-conductive layer group 200b can be connected to the second conductive region 241 of the second sub-conductive layer group 200b through the second interruption region, so that the two second conductive regions 241 can be close to each other.

[0252] In some embodiments, the electrochromic device fabrication method of this application further includes:

[0253] S700, a first electrical connection element electrically connected to a first conductive layer is provided on an electrochromic substrate, and the first electrical connection element overlaps the first conductive region of a plurality of sub-conductive layer groups;

[0254] S800, the first electrical connection element is broken into multiple spaced first electrical connection elements, and the first electrical connection elements overlap with the first conductive area;

[0255] S900, a second electrical connection element electrically connected to the second conductive layer is provided on the electrochromic substrate, and the second electrical connection element overlaps the second conductive region of a plurality of sub-conductive layer groups;

[0256] S1000, the second electrical connection element is broken into multiple spaced second electrical connection elements, and the second electrical connection elements overlap the second conductive area.

[0257] Specifically, referring to Figures 3 to 9, the number of first electrical connectors 500 and second electrical connectors 600 can be multiple, and the number of first electrical connectors 500 and second electrical connectors 600 can correspond to the number of sub-conductive layer groups. Specifically, the first conductive layer 210 in the first sub-conductive layer group 200a can be electrically connected to an external power source through one first electrical connector 500, and the second conductive layer 240 in the first sub-conductive layer group 200a can be electrically connected to an external power source through one second electrical connector 600. The first conductive layer 210 in the second sub-conductive layer group 200b can be electrically connected to an external power source through another first electrical connector 500, and the second conductive layer 240 in the second sub-conductive layer group 200b can be electrically connected to an external power source through another second electrical connector 600.

[0258] Specifically, when the first electrical connector 500 is installed on the first sub-conductive layer group 200a and the second sub-conductive layer group 200b, the first electrical connector can be overlapped with the edge of the first sub-conductive layer group 200a and the edge of the second sub-conductive layer group 200b, so that the first electrical connector is located within two adjacent first conductive regions 211. Then the first electrical connector is cut into two parts, so that the part of the first electrical connector located within the two first conductive regions 211 can serve as two first electrical connectors 500.

[0259] Alternatively, the second electrical connection element can be overlapped with the edge of the first sub-conductive layer group 200a and the edge of the second sub-conductive layer group 200b, so that the second electrical connection element is still located within the adjacent second conductive region 241, and then the second electrical connection element is cut off, so that the part of the second electrical connection element located within the two second conductive regions 241 can serve as two second electrical connections 600.

[0260] The first and second electrical connection elements can specifically be made of copper foil. When cutting the first and second electrical connection elements, the edges of the first sub-conductive layer group 200a and the second sub-conductive layer group 200b can also be cut together to form a first interrupted region and a second interrupted region. This makes the process of setting the first electrical connection element 500 and the second electrical connection element 600 on the first sub-conductive layer group 200a and the second sub-conductive layer group 200b relatively simpler. The distance between two adjacent first conductive regions 211 located at both ends of the first interrupted region is greater than 3mm, and the distance between two adjacent second conductive regions 241 located at both ends of the second interrupted region is greater than 3mm. That is, the width of the first interrupted region and the width of the second interrupted region can both be set to be greater than 3mm. This allows two adjacent first electrical connection elements 500 to maintain a certain distance, avoiding mutual interference between adjacent first electrical connection elements 500. It also allows two adjacent second electrical connection elements 600 to maintain a certain distance, avoiding mutual interference between adjacent second electrical connection elements 600.

[0261] In this way, multiple first electrical connectors 500 can be simultaneously electrically connected to multiple portions of the first conductive layer 210, resulting in a balanced current-carrying rate across different parts of the first conductive layer 210 and a faster overall current-carrying rate. Similarly, multiple second electrical connectors 600 can be simultaneously electrically connected to multiple portions of the second conductive layer 240, resulting in a balanced current-carrying rate across different parts of the second conductive layer 240 and a faster overall current-carrying rate. This allows for a more balanced coloring and fading effect across different portions of the electrochromic layer 400 corresponding to the first sub-conductive layer group 200a, and also results in faster coloring and fading rates.

[0262] In some embodiments, referring to Figures 4, 8A and 8B, the electrochromic device manufacturing method of this application may further include a third electrical connector 700 connected to the first electrical connector 500 and a fourth electrical connector 800 connected to the second electrical connector 600. The third electrical connector 700 and the fourth electrical connector 800 are FPCs (flexible electrical connectors).

[0263] In some embodiments, referring to Figures 8A and 8B, the electrochromic substrate of this application may further be provided with a first electrode layer 250 and a second electrode layer 260. The first electrode layer 250 may be disposed on the side of the first conductive layer 210 facing away from the first base layer 100. Specifically, the number of first electrode layers 250 may be multiple, with one first electrode layer 250 disposed on the side of the first conductive layer 210 of the first sub-conductive layer group 200a facing away from the first base layer 100. Another first electrode layer 250 is disposed on the side of the first conductive layer 210 of the second sub-conductive layer group 200b facing away from the first base layer 100.

[0264] The second electrode layer 260 may be disposed on the side of the second conductive layer 240 facing away from the second base layer 300. Specifically, the number of second electrode layers 260 may be multiple, with one second electrode layer 260 disposed on the side of the second conductive layer 240 of the first sub-conductive layer group 200a facing away from the second base layer 300. Another second electrode layer 260 may be disposed on the side of the second conductive layer 240 of the second sub-conductive layer group 200b facing away from the second base layer 300.

[0265] By setting the first electrode layer 250, the current conduction rate of each part of the first conductive layer 210 is faster, reducing the current conduction delay of each part of the first conductive layer 210, thereby improving the electrical connection effect of the first conductive layer 210. By setting the second electrode layer 260, the current conduction rate of each part of the second conductive layer 240 is faster, reducing the current conduction delay of each part of the second conductive layer 240, thereby improving the electrical connection effect of the second conductive layer 240.

[0266] In some embodiments, the distance between the first electrode layer 250 and the second electrode layer 260 and the gap region 200c is greater than or equal to 0.05 mm, so that the first electrode layer 250 and the second electrode layer 260 are completely located within the sub-conductive layer group, thereby protecting the first electrode layer 250 and the second electrode layer 260.

[0267] In some embodiments, referring to Figures 10 and 11, the first electrode layer 250 includes a plurality of first grid portions 251, which are distributed on the first conductive layer 210 and electrically connected to the first conductive layer 210. The first grid portions 251 may adopt a rectangular frame structure or other polygonal frame structure. The plurality of first grid portions 251 may be spaced apart on the first conductive layer 210, so that the plurality of first grid portions 251 are not directly electrically connected. Adjacent first grid portions 251 may also be connected to each other, so that adjacent first grid portions 251 can be directly electrically connected. Specifically, the plurality of first grid portions 251 may be distributed on the first conductive layer 210 in the form of a rectangular array. In this way, multiple first grid portions 251 can be distributed on various parts of the first conductive layer 210, resulting in a lower energization delay at each part of the first conductive layer 210, thereby increasing the overall energization rate of the first conductive layer 210. This makes the color-changing speed of the electrochromic layer 400 faster and the color-changing effect more uniform, thus giving the electrochromic device of this application a better color-changing effect.

[0268] The second electrode layer 260 includes a plurality of second grid portions 261, which are distributed on the second conductive layer 240 and electrically connected to the second conductive layer 240. The second grid portions 261 can adopt a rectangular frame structure or other polygonal frame structure. The plurality of second grid portions 261 can be spaced apart on the second conductive layer 240, so that the plurality of first grid portions 251 are not directly electrically connected. Adjacent second grid portions 261 can also be connected, so that adjacent second grid portions 261 can be directly electrically connected. Specifically, the plurality of second grid portions 261 can be distributed on the second conductive layer 240 in a rectangular array. Multiple second grid portions 261 can be distributed across various parts of the second conductive layer 240, resulting in lower energization delays at each part of the second conductive layer 240. This increases the overall energization rate of the second conductive layer 240, leading to faster color-changing speed and more uniform color-changing effect of the electrochromic layer 400, thus providing a better color-changing effect for the electrochromic device of this application. When the first grid portion 251 and the second grid portion 261 are rectangular frame structures, the spacing between opposite sides of the first grid portion 251 can be set to 0.2mm-2mm, and the spacing between opposite sides of the second grid portion 261 can also be set to 0.2mm-2mm.

[0269] An insulating layer may also be provided on the first electrode layer 250 to protect the first electrode layer 250 and prevent short circuits caused by electrical contact between the first electrode layer 250 and the second conductive layer 240. Similarly, an insulating layer may be provided on the second electrode layer 260 to protect the second electrode layer 260 and prevent short circuits caused by electrical contact between the second electrode layer 260 and the first conductive layer 210, thereby improving the electrical connection reliability and safety of the electrochromic device of this application. Specifically, the first mesh portion 251 and the second mesh portion 261 may be made of conductive wire, such as metal wire (copper wire, gold wire, or silver wire, etc.). The surfaces of the first mesh portion 251 and the second mesh portion 261 may also be coated with insulating oil (e.g., varnish) to form an insulating layer on the first electrode layer 250 and the second electrode layer 260.

[0270] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. An electrochromic substrate, characterized in that, It includes a first base layer, a first conductive layer, an electrochromic layer, an electrolyte layer, an ion storage layer, a second conductive layer, and a second base layer, which are stacked sequentially. Wherein, the absorbance of the first substrate and the second substrate for the preset light is less than or equal to a preset absorbance threshold, and the absorbance of the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer for the preset light is greater than the preset absorbance threshold, and, The electrochromic layer absorbs more light than the preset absorbance threshold for the preset light, or the electrochromic layer absorbs less light than or equal to the preset absorbance threshold for the preset light.

2. The electrochromic substrate according to claim 1, characterized in that, When the absorbance of the electrochromic layer to the preset light is greater than the preset absorbance threshold, the electrochromic layer is in an oxidation state with an oxidation degree of 0-100%.

3. The electrochromic substrate according to claim 1, characterized in that, When the absorbance of the electrochromic layer to the preset light is greater than the preset absorbance threshold, the electrochromic layer is in an oxidized state with an oxidation degree of 20%-100%.

4. The electrochromic substrate according to claim 1, characterized in that, When the absorbance of the electrochromic layer to the preset light is greater than the preset absorbance threshold, the electrochromic layer is in an oxidized state with an oxidation degree of 20%-80%.

5. The electrochromic substrate according to claim 1, characterized in that, When the absorbance of the electrochromic layer to the preset light is greater than the preset absorbance threshold, the electrochromic layer is in an oxidized state with an oxidation degree of 20%-50%.

6. The electrochromic substrate according to claim 1, characterized in that, When the absorbance of the electrochromic layer to the preset light is greater than the preset absorbance threshold, the open-circuit voltage of the electrochromic substrate is 0V-2V.

7. The electrochromic substrate according to claim 1, characterized in that, When the absorbance of the electrochromic layer to the preset light is greater than the preset absorbance threshold, the open-circuit voltage of the electrochromic substrate is 0.1V-1.5V.

8. The electrochromic substrate according to claim 1, characterized in that, When the absorbance of the electrochromic layer to the preset light is greater than the preset absorbance threshold, the open-circuit voltage of the electrochromic substrate is 0.1V-1V.

9. The electrochromic substrate according to claim 1, characterized in that, When the absorbance of the electrochromic layer to the preset light is greater than the preset absorbance threshold, the open-circuit voltage of the electrochromic substrate is 0.1V-0.8V.

10. The electrochromic substrate according to claim 1, characterized in that, When the absorbance of the electrochromic layer to the preset light is less than or equal to the preset absorbance threshold, the electrochromic layer is in a reduction state with a reduction degree of 1-100%.

11. The electrochromic substrate according to claim 1, characterized in that, When the absorbance of the electrochromic layer to the preset light is less than or equal to the preset absorbance threshold, the open-circuit voltage of the electrochromic substrate is less than 0V.

12. The electrochromic substrate according to claim 1, characterized in that, When the absorbance of the electrochromic layer to the preset light is less than or equal to the preset absorbance threshold, the open-circuit voltage of the electrochromic substrate is less than 0V and greater than or equal to -2V.

13. The electrochromic substrate according to any one of claims 1-12, characterized in that, The preset absorbance threshold is 0.1 Abs.

14. The electrochromic substrate according to claim 13, characterized in that, The first conductive layer has an absorbance of 0.15 Abs for the preset light; and / or, The absorbance of the second conductive layer for the preset light is greater than or equal to 0.15 Abs; and / or, The absorbance of the ion storage layer for the preset light is greater than or equal to 0.4 Abs; and / or, The absorbance of the electrolyte layer for the preset light is greater than or equal to 0.3 Abs; and / or, The first substrate has an absorbance of less than or equal to 0.05 Abs for the preset light; and / or, The absorbance of the second substrate to the preset light is less than or equal to 0.05 Abs.

15. The electrochromic substrate according to claim 13, characterized in that, The difference between the absorbance of the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer for the preset light and the absorbance of the first substrate and the second substrate for the preset light is greater than or equal to 0.1 Abs.

16. The electrochromic substrate according to claim 13, characterized in that, The difference between the absorbance of the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer for the preset light and the absorbance of the first substrate and the second substrate for the preset light is greater than or equal to 0.3 Abs.

17. The electrochromic substrate according to any one of claims 1-12, characterized in that, The preset light is infrared light with a wavelength of 1064nm.

18. A method for preparing an electrochromic device, characterized in that, include: An electrochromic substrate is provided, the electrochromic substrate comprising a first base layer, a first conductive layer, an electrochromic layer, an electrolyte layer, an ion storage layer, a second conductive layer, and a second base layer stacked sequentially; A preset light beam is emitted toward the electrochromic substrate, and the preset light beam passes through the electrochromic substrate along the stacking direction of the electrochromic substrate. Wherein, the absorbance of the first substrate and the second substrate for the preset light is less than or equal to a preset absorbance threshold, so that the preset light passes through the first substrate and the second substrate without cutting through them. The absorbance of the first conductive layer, the electrolyte layer, the ion storage layer and the second conductive layer for the preset light is greater than the preset absorbance threshold, so that the preset light cuts through the first conductive layer, the electrolyte layer, the ion storage layer and the second conductive layer along the stacking direction of the electrochromic substrate, and divides the first conductive layer, the electrolyte layer, the ion storage layer and the second conductive layer into at least two parts along a direction perpendicular to the stacking direction of the electrochromic substrate.

19. The method for preparing an electrochromic device according to claim 18, characterized in that, The electrochromic layer absorbs more light than a preset light absorption threshold, so that the preset light divides the electrochromic layer into at least two parts.

20. The method for preparing an electrochromic device according to claim 19, characterized in that, Before emitting a preset light beam onto the electrochromic substrate, the electrochromic device fabrication method further includes: A first voltage is applied to the electrochromic substrate to cause the electrochromic layer to be in an oxidized state with an oxidation degree of 0-100%.

21. The method for preparing an electrochromic device according to claim 19, characterized in that, A first voltage is applied to the electrochromic substrate to cause the electrochromic layer to be in an oxidized state with an oxidation degree of 20%-100%.

22. The method for preparing an electrochromic device according to claim 19, characterized in that, A first voltage is applied to the electrochromic substrate to place the electrochromic layer in an oxidized state with an oxidation degree of 20%-80%.

23. The method for preparing an electrochromic device according to claim 19, characterized in that, A first voltage is applied to the electrochromic substrate to place the electrochromic layer in an oxidized state with an oxidation degree of 20%-50%.

24. The method for preparing an electrochromic device according to claim 19, characterized in that, Before emitting a preset light beam onto the electrochromic substrate, the electrochromic device fabrication method further includes: A first voltage is applied to the electrochromic substrate so that the open-circuit voltage of the electrochromic substrate is 0V-2V.

25. The method for preparing an electrochromic device according to claim 19, characterized in that, A first voltage is applied to the electrochromic substrate so that the open-circuit voltage of the electrochromic substrate is 0.5V-2V.

26. The method for preparing an electrochromic device according to claim 19, characterized in that, A first voltage is applied to the electrochromic substrate so that the open-circuit voltage of the electrochromic substrate is 0.5V-1V.

27. The method for preparing an electrochromic device according to claim 19, characterized in that, A first voltage is applied to the electrochromic substrate so that the open-circuit voltage of the electrochromic substrate is 0.5V-0.7V.

28. The method for preparing an electrochromic device according to any one of claims 20-27, characterized in that, The first voltage is greater than 0V and less than or equal to 20V.

29. The method for preparing an electrochromic device according to any one of claims 20-27, characterized in that, The first voltage is greater than 0V and less than or equal to 10V.

30. The method for preparing an electrochromic device according to any one of claims 20-27, characterized in that, The first voltage is greater than 0V and less than or equal to 5V.

31. The method for preparing an electrochromic device according to any one of claims 20-27, characterized in that, The first voltage is greater than 0V and less than or equal to 2V.

32. The method for preparing an electrochromic device according to claim 18, characterized in that, The absorbance of the electrochromic layer to the preset light is less than or equal to the preset absorbance threshold, so that the preset light does not separate the electrochromic layer.

33. The method for preparing an electrochromic device according to claim 32, characterized in that, Before emitting a preset light beam onto the electrochromic substrate, the electrochromic device fabrication method further includes: A second voltage is applied to the electrochromic substrate to bring the electrochromic layer into a reduction state with a reduction degree of 1-100%.

34. The method for preparing an electrochromic device according to claim 32, characterized in that, Before emitting a preset light beam onto the electrochromic substrate, the electrochromic device fabrication method further includes: A second voltage is applied to the electrochromic substrate so that the open-circuit voltage of the electrochromic substrate is less than 0V.

35. The method for preparing an electrochromic device according to claim 32, characterized in that, A second voltage is applied to the electrochromic substrate so that the open-circuit voltage of the electrochromic substrate is less than 0V and greater than or equal to -2V.

36. The method for preparing an electrochromic device according to any one of claims 33-35, characterized in that, The second voltage is less than 0V and greater than or equal to -20V.

37. The method for preparing an electrochromic device according to any one of claims 33-35, characterized in that, The second voltage is less than 0V and greater than or equal to -10V.

38. The method for preparing an electrochromic device according to any one of claims 33-35, characterized in that, The second voltage is less than 0V and greater than or equal to -5V.

39. The method for preparing an electrochromic device according to any one of claims 33-35, characterized in that, The second voltage is less than 0V and greater than or equal to -2V.

40. The method for preparing an electrochromic device according to claim 18, characterized in that, The preset absorbance threshold is 0.1 Abs.

41. The method for preparing an electrochromic device according to claim 40, characterized in that, The first conductive layer has an absorbance of 0.15 Abs for the preset light; and / or, The absorbance of the second conductive layer for the preset light is greater than or equal to 0.15 Abs; and / or, The absorbance of the ion storage layer for the preset light is greater than or equal to 0.4 Abs; and / or, The absorbance of the electrolyte layer for the preset light is greater than or equal to 0.3 Abs; and / or, The first substrate has an absorbance of less than or equal to 0.05 Abs for the preset light; and / or, The absorbance of the second substrate to the preset light is less than or equal to 0.05 Abs.

42. The method for preparing an electrochromic device according to claim 40, characterized in that, The difference between the absorbance of the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer for the preset light and the absorbance of the first substrate and the second substrate for the preset light is greater than or equal to 0.1 Abs.

43. The method for preparing an electrochromic device according to claim 40, characterized in that, The difference between the absorbance of the first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer for the preset light and the absorbance of the first substrate and the second substrate for the preset light is greater than or equal to 0.3 Abs.

44. The method for preparing an electrochromic device according to claim 18, characterized in that, The step of emitting a preset light onto the electrochromic substrate includes: Determine the cutting position of the electrochromic substrate; At least one preset ray is emitted toward the cutting position.

45. The method for preparing an electrochromic device according to claim 44, characterized in that, Before emitting a preset light beam at least once toward the cutting position, the electrochromic device fabrication method further includes: Adjust the power of the preset light to the preset power, and set the working time of the preset light to the preset time.

46. ​​The method for preparing an electrochromic device according to claim 45, characterized in that, The preset power is 1W-70W, and the preset duration is 1ps-100ps.

47. The method for preparing an electrochromic device according to claim 18, characterized in that, The preset light is infrared light with a wavelength of 1064nm.

48. The method for preparing an electrochromic device according to claim 18, characterized in that, The method for preparing the electrochromic device further includes: A first conductive region is formed on the edge of the first conductive layer that is displaced from the electrolyte layer, the ion storage layer, the electrochromic layer, the second conductive layer, and the second base layer, so that at least a portion of the first conductive layer is exposed toward the side of the electrolyte layer; A second conductive region is formed on the edge of the second conductive layer that is displaced from the electrolyte layer, the ion storage layer, the electrochromic layer, the first conductive layer, and the first base layer, so that at least a portion of the second conductive layer is exposed toward the side of the electrolyte layer.

49. The method for preparing an electrochromic device according to claim 48, characterized in that, The first conductive layer, the electrolyte layer, the ion storage layer, and the second conductive layer constitute a conductive layer group. The preset light beam divides the conductive layer group into multiple sub-conductive layer groups. The first conductive layer of each of the multiple sub-conductive layer groups has a first conductive region, and the second conductive layer of each of the multiple sub-conductive layer groups has a second conductive region. The electrochromic device fabrication method further includes: A first electrical connection element electrically connected to the first conductive layer is disposed on the electrochromic substrate, and the first electrical connection element overlaps the first conductive region of the plurality of sub-conductive layer groups. The first electrical connection element is broken into multiple spaced third electrical connections, and the multiple third electrical connections are respectively connected to the first conductive area of ​​different sub-conductive layer groups. A second electrical connection element is disposed on the electrochromic substrate and is electrically connected to the second conductive layer. The second electrical connection element overlaps the second conductive region of the plurality of sub-conductive layer groups. The second electrical connection element is broken into multiple spaced fourth electrical connections, and the multiple fourth electrical connections are respectively connected to the second conductive region of different sub-conductive layer groups.

50. The method for preparing an electrochromic device according to claim 49, characterized in that, The first electrical connection element and the second electrical connection element are metal foils; Preferably, the first electrical connection element and the second electrical connection element are copper foil.

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