Electrochromic device and manufacturing method therefor, electrochromic apparatus and terminal product

Abstract

An electrochromic device and a manufacturing method therefor, an electrochromic apparatus and a terminal product. In the electrochromic device manufactured by the manufacturing method for an electrochromic device, a first conductive region (11) and a second conductive region (12) are insulated from each other, and the first conductive region (11) and a second conductive layer (2) are electrically connected by means of a conducting layer (3), so that the electrodes of a first conductive layer (1) and of the second conductive layer (2) can be led out to the same side of the electrochromic device. In this way, lead-out electrodes can be arranged on the same side of the first conductive region (11) and the second conductive region (12) without being respectively led out at two sides, thereby simplifying the electrical connection mode of the electrochromic device and facilitating simplification of production processes.

Description

Electrochromic device and manufacturing method thereof, electrochromic apparatus, and terminal product Cross-reference to related applications

[0001] This application claims priority to the Chinese patent application No. 202410539030.3, filed on April 30, 2024 in the China Patent Office, and entitled "Electrochromic device and manufacturing method thereof, electrochromic apparatus, and terminal product", the content of which is incorporated herein by reference in its entirety. TECHNICAL FIELD

[0002] The present application relates to the technical field of electrochromic technology, and in particular to an electrochromic device, a manufacturing method thereof, an electrochromic apparatus, and a terminal product. BACKGROUND

[0003] Electrochromism is a phenomenon that the optical properties (reflectivity, transmittance, absorptivity, etc.) of a material change stably and reversibly under the action of an applied electric field, which appears as reversible changes in color and transparency in appearance. In recent years, electrochromic technology has been widely applied in products such as vehicle rearview mirrors, vehicle sunroofs, side windows, building curtain walls, door and window systems, display devices, etc.

[0004] In related technologies, an electrochromic device includes two conductive substrates and an electrochromic layer group disposed between the two conductive substrates. When electrodes are led out of the electrochromic device, a recess needs to be formed in each of the conductive substrates on both sides of the electrochromic device in the thickness direction when the leading-out structure is set, the recess penetrates the substrate and the conductive layer on the side conductive substrate and exposes the conductive layer on the opposite conductive substrate at the recessed position. Since the openings of the recesses on the two conductive substrates face in opposite directions, electrodes need to be led out from both sides of the electrochromic device, i.e., the conductive areas on the two conductive layers need to be respectively electrically connected to an external power supply through two FPCs (Flexible Printed Circuit), thus making the electrical connection mode of the electrochromic device more complex. TECHNICAL PROBLEM

[0005] The purpose of the embodiments of the present application is to provide an electrochromic device, a manufacturing method thereof, an electrochromic apparatus, and a terminal product, which can lead out electrodes from one side, so as to solve the problem of complex electrical connection mode of the electrochromic device in related technologies. TECHNICAL SOLUTION

[0006] To achieve the above-mentioned purpose, the technical solution adopted by the first aspect of the present application is: a manufacturing method of an electrochromic device, comprising:

[0007] providing a first conductive layer, forming a first conductive region and a second conductive region which are insulated from each other on the first conductive layer, and forming a first base material layer on at least part of the surface of the second conductive region;

[0008] providing a second conductive layer, and forming a second base material layer on at least part of the surface of the second conductive layer;

[0009] opposing the first base material layer and the second base material layer, wherein at least part of the surface of the first conductive region is opposite to the second conductive layer;

[0010] forming an electro-optic medium layer between the first base material layer and the second base material layer, and forming a conductive layer to conduct the first conductive region and the second conductive layer between the first conductive region and the second conductive layer.

[0011] The method for manufacturing the electrochromic device has the following advantages: the electrochromic device manufactured by the method has the first conductive region and the second conductive region which are insulated from each other, and the first conductive layer and the second conductive layer are electrically connected through the conductive layer, so that the electricity of the first conductive layer and the second conductive layer can be led to the same side of the electrochromic device, and the leading-out electrodes can be arranged on the same side of the first conductive region and the second conductive region, without being led out on both sides. The method solves the technical problem that the leading-out electrodes need to be led out on both sides in the prior art, and has the advantages of simplifying the electrical connection mode of the electrochromic device, facilitating production and simplifying the production process.

[0012] In some embodiments, the electro-optic medium layer and the conductive layer are integrally formed.

[0013] In some embodiments, the step of forming the electro-optic medium layer between the first base material layer and the second base material layer, and forming the conductive layer to conduct the first conductive region and the second conductive layer between the first conductive region and the second conductive layer, comprises:

[0014] arranging a first mixed solution containing conductive particles between at least part of the surface of the first conductive region and the second conductive layer; and arranging an electro-optic medium solution between the first base material layer and the second base material layer;

[0015] or, mixing the conductive particles and the electro-optic medium solution to form a second mixed solution; arranging the second mixed solution between the first base material layer and the second base material layer, and extending the second mixed solution between the first conductive region and the second conductive layer.

[0016] In some embodiments, the distance between the first base material layer and the second base material layer is L, and L>the particle size of the conductive particles.

[0017] In some embodiments, L is greater than or equal to 2 times the particle size of the conductive particles, or L is greater than or equal to the particle size of the conductive particles + 2 um.

[0018] In some embodiments, the distance between the first conductive region and the second conductive layer is H, and H is less than or equal to the particle size of the conductive particles.

[0019] In some embodiments, H is less than the particle size of the conductive particles - 2 um, or H is less than the particle size of the conductive particles / 2.

[0020] In some embodiments, the particle size of the conductive particles is in the range of 7 um to 100 um.

[0021] In some embodiments, the density of the conductive particles in the electro-optical medium layer is 1000 particles / cm 2 - 100000 particles / cm 2 .

[0022] In some embodiments, the method of providing a first conductive layer, forming a first conductive region and a second conductive region insulated from each other on the first conductive layer, and forming a first base material layer on at least part of the surface of the second conductive region, comprises: disposing the first base material layer on the first conductive layer, and removing the first base material layer on at least part of the surface of the first conductive region to expose at least part of the first conductive region.

[0023] And / or, the method of providing a second conductive layer and forming a second base material layer on at least part of the surface of the second conductive layer comprises: disposing the second base material layer on the second conductive layer, and removing part of the second base material layer on the surface of the second conductive layer corresponding to the first conductive region to expose part of the second conductive layer.

[0024] In some embodiments, the method of disposing the first base material layer and the second base material layer relative to each other further comprises:

[0025] disposing a first busbar on at least part of the surface of the first conductive region;

[0026] And / or, disposing a second busbar on at least part of the surface of the second conductive layer corresponding to the first conductive region.

[0027] In some embodiments, the method of forming an electro-optical medium layer between the first base material layer and the second base material layer, and forming a conductive layer between the first conductive region and the second conductive layer to conduct the first conductive region and the second conductive layer, further comprises:

[0028] applying pressure to the first conductive layer at a position corresponding to the conductive layer towards the second conductive layer, and / or applying pressure to the second conductive layer at a position corresponding to the conductive layer towards the first conductive layer.

[0029] In some embodiments, the pressure ranges from 1Mpa to 3Mpa.

[0030] In some embodiments, the method for manufacturing the electrochromic device further comprises:

[0031] forming a conductive slot from the second conductive layer to the surface of the first conductive layer, so that the first conductive region and the second conductive region are exposed through the conductive slot.

[0032] In some embodiments, the method for manufacturing the electrochromic device further comprises:

[0033] forming a sealing slot through the second conductive layer;

[0034] providing a sealing member in the sealing slot; the sealing slot is an annular slot, and the orthogonal projection of the conductive slot on the first conductive layer is located outside the outer contour of the orthogonal projection of the sealing slot on the first conductive layer.

[0035] In some embodiments, the method for manufacturing the electrochromic device further comprises:

[0036] providing a lead-out assembly, the lead-out assembly comprising a first lead-out structure and a second lead-out structure;

[0037] electrically connecting the first lead-out structure to the first conductive region through the conductive slot;

[0038] electrically connecting the second lead-out structure to the second conductive region through the conductive slot.

[0039] To achieve the above object, a second aspect of the present application adopts the technical solution of an electrochromic device, comprising a first conductive layer, a first base material layer, a conductive layer, an electro-optic medium layer, a second base material layer, and a second conductive layer arranged in layers.

[0040] The first conductive layer comprises a first conductive region and a second conductive region insulated from each other, the first base material layer is arranged on the first conductive layer, and at least part of the first conductive region is exposed to the first base material layer; the second conductive layer has a first surface and a second surface facing the first conductive layer, the second base material layer is arranged on the second conductive layer, and at least part of the first surface is exposed to the second base material layer, the first surface exposed to the second base material layer is at least partially opposite to the first conductive region exposed to the first base material layer; the conductive layer is located between part of the surface of the first surface exposed to the second base material layer and part of the surface of the first conductive region exposed to the first base material layer, and the conductive layer conducts the first surface and the first conductive region; the electro-optic medium layer is located between the first base material layer and the second base material layer.

[0041] The electrochromic device provided by the present application has the beneficial effects that: since the first conductive region and the second conductive region are insulated from each other, and the first conductive region and the second conductive layer are electrically connected through the conductive layer, the lead electrodes can be arranged on the same side of the first conductive region and the second conductive region, and do not need to be led out on both sides. The technical problem of needing to be led out on both sides in the prior art is solved, and the electrochromic device has the advantages of simplifying the electrical connection mode, facilitating production, simplifying the production process, and the like.

[0042] In some embodiments, the distance between the first conductive region and the first surface is H, the conductive layer comprises conductive particles, the particle size of the conductive particles is D, and H≤D.

[0043] In some embodiments, H<D-2um, or H<D / 2.

[0044] In some embodiments, the distance between the first base material layer and the second base material layer is L, and L>D.

[0045] In some embodiments, L≥2D, or L≥D+2um.

[0046] In some embodiments, the value of D is in the range of 7um-100um.

[0047] In some embodiments, the electrochromic device further comprises a first busbar layer, and the first busbar layer is located between the first conductive region and the conductive layer.

[0048] And / or, the electrochromic device further comprises a second busbar layer, and the second busbar layer is located between the first surface and the conductive layer.

[0049] In some embodiments, the electrochromic device is provided with a through slot, the through slot penetrating through the second conductive layer, the second base material layer, the conductive layer, the electro-optic medium layer and the first base material layer to expose part of the first conductive region and part of the second conductive region, and the exposed part of the first conductive region and the exposed part of the second conductive region are electrically connected with the positive electrode and the negative electrode of the external power source through the through slot respectively.

[0050] In some embodiments, the electrochromic device further comprises a sealing member, the electrochromic device is provided with a sealing slot, the sealing slot penetrates through at least the second conductive layer, the first base material layer, the electro-optic medium layer and the second base material layer, the sealing member is accommodated in the sealing slot, and the sealing member, the second conductive layer and the second conductive region enclose a closed space to seal the first base material layer, the electro-optic medium layer and the second base material layer located in the closed space.

[0051] In some embodiments, the sealing slot is an annular slot, the through slot is located outside the closed space, and at least part of the conductive layer is located in the closed space.

[0052] In some embodiments, the electrochromic device further comprises a first lead-out structure and a second lead-out structure.

[0053] The first lead-out structure is electrically connected with the first conductive region, and the first lead-out structure is used to be electrically connected with one of the positive electrode and the negative electrode of the external power source.

[0054] The second lead-out structure is electrically connected with the second conductive region, and the second lead-out structure is used to be electrically connected with the other of the positive electrode and the negative electrode of the external power source.

[0055] In some embodiments, the electrochromic device further comprises a carrier plate, and the first lead-out structure and the second lead-out structure are arranged on the same surface of the carrier plate.

[0056] To achieve the above object, a third aspect of the present application adopts the technical solution of an electrochromic device, comprising a substrate layer and the electrochromic device of the second aspect of the present application.

[0057] The substrate layer is located on the side of the second conductive layer away from the first conductive layer, and / or the substrate layer is located on the side of the first conductive layer away from the second conductive layer.

[0058] The electrochromic device provided by the present application has the beneficial effect that by applying the electrochromic device of the first aspect of the present application to the electrochromic device, the electrochromic device can be single-sidedly led out of the electrode, so as to simplify the electrical connection mode of the electrochromic device.

[0059] To achieve the above object, the technical solution of the fourth aspect of the present application is: a product terminal, comprising the electrochromic device of the second aspect of the present application or the electrochromic device of the third aspect of the present application, wherein the terminal product comprises any one of a rearview mirror, a curtain wall, an automobile sunroof, an automobile side window, an automobile windshield, a shell of an electronic product, glasses, a vehicle, and a display panel. Advantages

[0060] The product terminal provided by the present application has the advantages that: by applying the electrochromic device of the first aspect of the present application or the electrochromic device of the second aspect of the present application to the product terminal, the electrical connection mode of the product terminal can be simplified, and all the advantages of the electrochromic device are possessed. BRIEF DESCRIPTION OF DRAWINGS

[0061] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the embodiments or prior art description will be briefly introduced as follows. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can also be obtained by those skilled in the art without creative labor.

[0062] FIG. 1 is a structural schematic diagram of an electrochromic device in one of the embodiments of the present application;

[0063] FIG. 2 is a structural schematic diagram of an electrochromic device in one of the embodiments of the present application;

[0064] FIG. 3 is a sectional structural schematic diagram of an electrochromic device in one of the embodiments of the present application;

[0065] FIG. 4 is a sectional structural schematic diagram of an electrochromic device in one of the embodiments of the present application;

[0066] FIG. 5 is a sectional structural schematic diagram of an electrochromic device in one of the embodiments of the present application;

[0067] FIG. 6 is a sectional structural schematic diagram of an electrochromic device in one of the embodiments of the present application;

[0068] FIG. 7 is a sectional structural schematic diagram of an electrochromic device in one of the embodiments of the present application;

[0069] FIG. 8 is a sectional structural schematic diagram of an electrochromic device in one of the embodiments of the present application;

[0070] FIG. 9 is a sectional structural schematic diagram of an electrochromic device in one of the embodiments of the present application;

[0071] FIG. 10 is a sectional structural schematic diagram of an electrochromic device in one of the embodiments of the present application;

[0072] Fig. 11 is a schematic diagram of a cross-sectional structure of an electrochromic device according to an embodiment of the present application;

[0073] Fig. 12 is a schematic diagram of a structure of a first conductive layer in the electrochromic device shown in Fig. 1;

[0074] Fig. 13 is a flowchart of a method of manufacturing an electrochromic device according to an embodiment of the present application.

[0075] Reference Signs:

[0076] 1, first conductive layer; 11, first conductive region; 111, first exposed surface; 112, electrical connection surface; 12, second conductive region; 121, second exposed surface; 122, electrode surface; 13, first busbar layer; 14, annular etching line;

[0077] 2, second conductive layer; 21, second busbar layer; 22, first surface; 23, second surface;

[0078] 3, conductive layer; 31, conductive particle;

[0079] 4, first substrate; 5, second substrate;

[0080] 61, first base material layer; 62, electro-optical medium layer; 63, second base material layer;

[0081] 7, conductive groove;

[0082] 8, sealing member;

[0083] 9, first lead-out structure;

[0084] 10, second lead-out structure. Embodiments of the present application

[0085] In order to make the objects, technical solutions and advantages of the present application clearer, the present application will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and should not be used to limit the present application.

[0086] It should be noted that when an element is referred to as being "fixed to" or "set on" another element, it can be directly on the other element or indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or indirectly connected to the other element.

[0087] In addition, the terms "first", "second", etc. are used only for descriptive purposes and are not to be construed as indicating or implying relative importance or an ordered ranking of the indicated technical features. Thus, features defined with "first", "second" can include one or more of the features explicitly or implicitly. In the description of the present application, the meaning of "a plurality of" is two or more, unless otherwise explicitly and specifically limited.

[0088] Reference to "one embodiment", "some embodiments" or "an embodiment" in the description of the present application means that a particular feature, structure or characteristic described in connection with the embodiment is included in at least one embodiment of the application. Thus, the appearance of the phrases "in one embodiment", "in some embodiments", "in other some embodiments", "in yet some embodiments" or the like in various places in the specification is not necessarily all referring to the same embodiment, but can mean "one or more but not all embodiments", unless otherwise specifically noted. In addition, in one or more embodiments, specific features, structures or characteristics can be combined in any suitable manner.

[0089] Electrochromism is a phenomenon in which the optical properties (reflectivity, transmittance, absorptivity, etc.) of a material change stably and reversibly under the action of an applied electric field, and in appearance, it shows reversible changes in color and transparency. In recent years, electrochromic technology has been widely used in products such as vehicle rearview mirrors, vehicle sunroofs, side windows, building curtain walls, door and window systems, display devices, etc.

[0090] In the related art, an electrochromic device includes two conductive substrates and an electrochromic layer group arranged between the two conductive substrates. When the electrodes are led out, a recess needs to be formed in the conductive substrate on each side of the electrochromic device in the thickness direction when the leading-out structure is arranged, the recess penetrates the substrate and the conductive layer on the side conductive substrate and exposes the conductive layer on the opposite conductive substrate at the recess. Since the openings of the recesses on the two conductive substrates face opposite directions, electrodes need to be led out on both sides of the electrochromic device, that is, the conductive areas on the two conductive layers need to be respectively electrically connected with an external power supply through two FPCs (Flexible Printed Circuit), so that the electrical connection mode of the electrochromic device is relatively complex.

[0091] In view of the above problems, the present application provides an electrochromic device and a manufacturing method thereof, an electrochromic device and a terminal product. The electrochromic device can lead out electrodes on one side to solve the problem of complex electrical connection mode of the electrochromic device in the related art.

[0092] In order to illustrate the technical solutions of the present application, the specific embodiments and drawings will be described below.

[0093] Referring to FIG. 1, FIG. 2, FIG. 3, FIG. 4 and FIG. 13, the application provides a manufacturing method of an electrochromic device, comprising:

[0094] S100: providing a first conductive layer 1, forming a first conductive area 11 and a second conductive area 12 insulated from each other on the first conductive layer 1, and forming a first base material layer 61 on at least part of the surface of the second conductive area 12.

[0095] S200: providing a second conductive layer 2, and forming a second base material layer 63 on at least part of the surface of the second conductive layer 2.

[0096] It should be noted that the first base material layer 61 is one of an electrochromic layer and an ion storage layer, and the second base material layer 63 is the other of the electrochromic layer and the ion storage layer.

[0097] S300: opposing the first base material layer 61 and the second base material layer 63, wherein at least part of the surface of the first conductive area 11 is opposite to the second conductive layer 2.

[0098] S400: forming an electro-optic medium layer 62 between the first base material layer 61 and the second base material layer 63, and forming a conductive layer 3 between the first conductive area 11 and the second conductive layer 2 to conduct the first conductive area 11 and the second conductive layer 2.

[0099] The electrochromic device manufactured by the manufacturing method of the electrochromic device provided by the application has the advantages that the first conductive area 11 and the second conductive area 12 are electrically insulated, and the first conductive area 11 and the second conductive layer 2 are electrically connected through the conductive layer 3, so that the electrical connection of the first conductive layer 1 and the second conductive layer 2 can be led to the same side of the electrochromic device, and the lead-out electrodes can be arranged on the same side of the first conductive area 11 and the second conductive area 12, without the need to be led out on both sides. The technical problem of the prior art that the lead-out electrodes need to be led out on both sides is solved, and the electrochromic device has the advantages of simplified electrical connection mode, convenient production and simplified production process.

[0100] It should be noted that the first conductive layer 1 and the second conductive layer 2 can be provided by unwinding.

[0101] For example, the first conductive layer 1 is attached to the first substrate 4 to form a first conductive substrate, and the second conductive layer 2 is attached to the second substrate 5 to form a second conductive substrate, and the first conductive substrate and the second conductive substrate are unwound from the unwinding roll, wherein the first conductive substrate comprises the first substrate 4 and the first conductive layer 1. Similarly, the second conductive substrate has the same structure as the first conductive substrate, and the second conductive substrate comprises the second substrate 5 and the second conductive layer 2.

[0102] Exemplarily, the first conductive layer 1 and the second conductive layer 2 are both ITO (Indium-Tin Oxide) conductive films, and in other embodiments, the first conductive layer 1 and the second conductive layer 2 can also be other transparent conductive oxides.

[0103] Exemplarily, the first substrate 4 and the second substrate 5 are both PET (Polyethylene terephthalate) plates, and in other embodiments, the first substrate 4 and the second substrate 5 can also be other flexible transparent materials.

[0104] Optionally, the conductive solution can be disposed on the first substrate 4 by means of blade coating, sheet coating, inkjet printing, transfer printing, drop coating, roll-to-roll coating, etc., and after the conductive solution is solidified, the first conductive layer 1 is formed on the first substrate. The first conductive layer 1 can also be formed on the first substrate 4 by physical vapor deposition, chemical vapor deposition, etc.

[0105] Similarly, optionally, the conductive solution can be disposed on the second substrate 5 by means of blade coating, sheet coating, inkjet printing, transfer printing, drop coating, roll-to-roll coating, etc., and after the conductive solution is solidified, the second conductive layer 2 is formed on the first substrate. The second conductive layer 2 can also be formed on the second substrate 5 by physical vapor deposition, chemical vapor deposition, etc.

[0106] Optionally, in actual production process, the first conductive substrate with the first conductive layer 1 and the second conductive substrate with the second conductive layer 2 can be directly purchased.

[0107] The first conductive substrate and the second conductive substrate are both flexible materials, and after the first base material layer 61 is disposed on the surface of the first conductive layer 1 of the first conductive substrate to form the first base structure and after the second base material 63 is disposed on the surface of the second conductive layer 2 of the second conductive substrate to form the second base structure, they are both rolled up.

[0108] In related art, an electro-optic medium layer 62, such as an electrolyte layer, needs to be disposed between the first base structure and the second base structure, so that the first base material layer 61 and the second base material layer 63 can undergo reversible and stable electrochemical changes after being electrified.

[0109] In related art, the preparation method of the electrochromic device further includes: unwinding the first base structure and the second base structure respectively, and placing the first base material layer 61 and the second base material layer 63 oppositely, and passing the first base structure and the second base structure through a pair of opposite rolling rollers, and drop-coating an electrolyte solution between the first base material layer 61 and the second base material layer 63, and then solidifying the electrolyte solution to form an electrochromic film.

[0110] In the present application, the electro-optic medium layer 62 and the conductive layer 3 are integrally formed, so that the electrochromic device of the embodiment of the present application can be manufactured on the basis of the device and the production process in the above-mentioned related art, by only changing the material arranged between the first base material layer 61 and the second base material layer 63 and adjusting the distance between the first base material layer 61 and the second base material layer 63, without improving too much, thereby reducing the production cost of the electrochromic device of the embodiment of the present application and improving the production efficiency. Specifically, in the embodiment of the present application, the distance between the first base material layer 61 and the second base material layer 63 can be limited by limiting the distance between the two rollers.

[0111] In some embodiments, the electro-optic medium layer 62 is formed between the first base material layer 61 and the second base material layer 63, and the conductive layer 3 is formed between the first conductive region 11 and the second conductive layer 2 to conduct the first conductive region 11 and the second conductive layer 2, comprising:

[0112] The conductive particles 31 are mixed with the electro-optic medium solution to form a second mixed solution; the second mixed solution is arranged between the first base material layer 61 and the second base material layer 63, and the second mixed solution is extended between the first conductive region 11 and the second conductive layer 2.

[0113] Through the above steps, after the second mixed solution is solidified, the conductive layer 3 can be formed between the first conductive region 11 and the second conductive layer 2, the electro-optic medium layer 62 can be formed between the first base material layer 61 and the second base material layer 63, and the electro-optic medium layer 62 and the conductive layer 3 are integrally formed. It can be known from the above analysis that, through the above steps, the electrochromic device of the embodiment of the present application can be manufactured on the basis of the device and the production process in the above-mentioned related art, by only changing the material arranged between the first base material layer 61 and the second base material layer 63 and adjusting the distance between the first base material layer 61 and the second base material layer 63, without improving too much, thereby reducing the production cost of the electrochromic device of the embodiment of the present application and improving the production efficiency.

[0114] In the present embodiment, the conductive particles 31 are added to the electro-optic medium solution, so that the electro-optic medium layer 62 and the conductive layer 3 can be integrally formed by the drop coating roller pressing method, thereby speeding up the production process.

[0115] Optionally, the electro-optic medium solution can be an electrolyte solution.

[0116] In some embodiments, the electro-optic medium layer 62 is formed between the first base material layer 61 and the second base material layer 63, and the conductive layer 3 is formed between the first conductive region 11 and the second conductive layer 2 to conduct the first conductive region 11 and the second conductive layer 2, comprising:

[0117] The first mixed solution containing the conductive particles 31 is disposed between at least part of the surface of the first conductive area 11 and the second conductive layer 2; and the electro-optic medium solution is disposed between the first base material layer 61 and the second base material layer 63.

[0118] Through the above steps, after the first mixed solution is solidified, the conductive layer 3 electrically connected to the first conductive area 11 and the second conductive layer 2 can be formed between at least part of the surface of the first conductive area 11 and the second conductive layer 2; and after the electro-optic medium solution is solidified, the electro-optic medium layer 62 can be formed between the first base material layer 61 and the second base material layer 63; and the conductive layer 3 and the electro-optic medium layer 62 are separately formed. The electro-optic medium layer 62 is not conductive, and short circuiting of the electro-optic medium layer 62 to the first conductive layer 1 and the second conductive layer 2 can be avoided.

[0119] It should be noted that the above two steps are performed separately, and the order of each step is not limited.

[0120] That is, the first mixed solution containing the conductive particles 31 can be drop-coated between at least part of the surface of the first conductive area 11 and the second conductive layer 2, and after the first mixed solution is solidified by ultraviolet or heating, etc., the conductive layer 3 is formed, and then the electro-optic medium solution is drop-coated between the first base material layer 61 and the second base material layer 63, and after the electro-optic medium solution is solidified by ultraviolet or heating, etc., the electro-optic medium layer 62 is formed.

[0121] The electro-optic medium solution can also be drop-coated between the first base material layer 61 and the second base material layer 63, and after the electro-optic medium solution is solidified, the electro-optic medium layer 62 is formed, and then the first mixed solution containing the conductive particles 31 is disposed between at least part of the surface of the first conductive area 11 and the second conductive layer 2, and after the first mixed solution is solidified, the conductive layer 3 is formed.

[0122] In this embodiment, since insulation is required between the first base material layer 61 and the second base material layer 63, the electro-optic medium layer 62 and the conductive layer 3 which require insulation are separately disposed in this embodiment, thereby improving the reliability of production.

[0123] In other embodiments of the present application, the electro-optic medium solution can be drop-coated between the first base material layer 61 and the second base material layer 63, and the first mixed solution can be drop-coated between the first conductive area 11 and the second conductive layer 2, and then the electrochromic film half-finished product is placed in an ultraviolet environment for solidification.

[0124] In one aspect, the conductive layer 3 can conduct the second conductive layer 2 and the first conductive region 11. In another aspect, the layer structure of the conductive layer 3 can serve as a spacer and support, spacing the second conductive layer 2 and the second conductive region 12 to prevent short circuiting due to contact between the second conductive layer 2 and the second conductive region 12, and supporting the first conductive region 11 and part of the second conductive layer 2 to make the structure of the entire device more stable.

[0125] It should be noted that the conductive particles 31 can respectively contact two objects with a distance less than the particle size of the conductive particles 31. When the conductive particles 31 respectively contact the two objects, the two objects can be electrically connected to each other through the conductive particles 31, i.e., the conductive layer 3 can conduct two objects with a distance less than the particle size of the conductive particles 31, but cannot conduct two objects with a distance greater than the particle size of the conductive particles 31.

[0126] Therefore, referring to FIGS. 3, 4, and 5, on the basis of any of the above embodiments, in some embodiments of the present application, the distance between the first base material layer 61 and the second base material layer 63 is controlled to be greater than the particle size (D) of the conductive particles 31 by limiting the distance between the two rollers, so as to prevent the conductive particles 31 in the electro-optic medium layer 62 from contacting the first base material layer 61 and the second base material layer 63, resulting in short circuiting of the second conductive region 12 and the second conductive layer 2.

[0127] In some embodiments, the distance L between the first base material layer 61 and the second base material layer 63 is greater than or equal to 2*D, or L≥D+2um. The distance between the first base material layer 61 and the second base material layer 63 is greater than twice the particle size of the conductive particles 31, reducing the possibility of the conductive particles 31 stacking and conducting the first base material layer 61 and the second base material layer 63, and further improving the reliability of the electrochromic device.

[0128] It should be noted that, referring to FIGS. 3, 4, and 5, the distance between the first conductive layer 1 and the second conductive layer 2 is controlled so that the distance (H) between the first conductive region 11 and the second conductive layer 2 is less than or equal to the particle size (D) of the conductive particles 31, so that the conductive particles 31 in the conductive layer 3 can contact the first conductive region 11 and the second conductive layer 2, and conduct the first conductive region 11 and the second conductive layer 2.

[0129] By the above arrangement, the relationship between the particle size of the conductive particles 31 in the conductive layer 3 and the distance between the first conductive region 11 and the second conductive layer 2 is limited, so that the conductive particles 31 in the conductive layer 3 can respectively contact the surface of the first conductive region 11 and the surface of the second conductive layer 2, so as to electrically connect the first conductive region 11 and the second conductive layer 2.

[0130] It should be noted that, in order to ensure the stability of the electrical connection relationship between the first conductive region 11 and the second conductive layer 2, the distance between the first conductive layer 1 and the second conductive layer 2 can be further reduced to increase the contact area of the conductive particles 31 with the first conductive region 11 and the second conductive layer 2, and improve the probability of conduction.

[0131] Optionally, H < D / 2 um, or H < D / 2.

[0132] The ratio of the particle size of the conductive particles 31 to the distance between the first conductive region 11 and the second conductive layer 2 needs to be kept within a suitable range; generally, the gap between the first conductive region 11 and the second conductive layer 2 is less than half the particle size of the conductive particles 31, or less than a predetermined value (for example, the particle size of the conductive particles 31 -2 um). This allows the conductive particles 31 to effectively conduct the first conductive region 11 and the second conductive layer 2, and also avoids the particle size of the conductive particles 31 being too large to penetrate the second conductive layer 2 and the first conductive region 11, thereby affecting the conductivity.

[0133] In some embodiments, D = 7 um-100 um.

[0134] In an embodiment, L = 30 um, D is 4 um-15 um, and H is 2 um-13 um.

[0135] Optionally, the first mixed solution can be various glue solutions such as an acrylic resin system, an epoxy resin system, and a silica gel system containing the conductive particles 31, or the first mixed solution can be an electro-optic medium solution containing the conductive particles 31, such as an electrolyte solution.

[0136] The conductive particles 31 are conductive spheres, which can be pure metal spheres of good conductive metals such as gold, silver, nickel, and copper or alloys thereof, or can be plastic core plus metal outer layer spheres.

[0137] In some embodiments, the density of the conductive particles 31 in the conductive layer 3 and / or the electro-optic medium layer 62 is 1000-100000 per cm 2 2 .

[0138] It should be noted that the density of the conductive particles 31 refers to the number of conductive particles 31 per square centimeter of the conductive layer 3 or per square centimeter of the electro-optic medium layer 62.

[0139] ​Please refer to FIG. 3. If the density of the conductive particles 31 is too large, the conductive particles 31 will overlap together, which is equivalent to multiple conductive particles 31 being connected together to form a conductor, and thus easily cause the conductive particles 31 to overlap in the electro-optic medium layer 62, so that the electro-optic medium layer 62 will conduct the first base material layer 61 and the second base material layer 63, that is, will conduct the second conductive area 12 and the second conductive layer 2 to cause short circuit. However, if the density of the conductive particles 31 is too small, it will cause the conductive layer 3 to be unable to effectively conduct the first conductive area 11 and the second conductive layer 2.

[0140] Therefore, by limiting the density of the conductive particles 31, the conductive layer 3 can effectively conduct the first conductive area 11 and the second conductive layer 2, and the electro-optic medium layer 62 does not conduct the first base material layer 61 and the second base material layer 63.

[0141] It should be noted that the density of the conductive particles 31 can be adjusted in combination with the particle size of the conductive particles 31 and the thickness of the conductive layer 3 (the distance between the first conductive area 11 and the second conductive layer 2), the thickness of the electro-optic medium layer 62 (the distance between the first base material layer 61 and the second base material layer 63).

[0142] In some embodiments, the first conductive layer 1 is provided, the mutually insulated first conductive area 11 and the second conductive area 12 are formed on the first conductive layer 1 by laser etching, and the first base material layer 61 is formed on at least part of the surface of the second conductive area 12, comprising: disposing the first base material layer 61 on the first conductive layer 1, and removing the first base material layer 61 on at least part of the surface of the first conductive area 11 to expose at least part of the first conductive area 11.

[0143] Please refer to FIG. 12. It should be noted that the method of forming the mutually insulated first conductive area 11 and the second conductive area 12 on the first conductive layer 1 can be: forming at least one closed annular etching line 14 on the first conductive layer 1 of the first conductive substrate by laser etching, and the first conductive layer 1 inside the annular etching line 14 is the first conductive area 11, and the first conductive layer 1 outside the annular etching line 14 is the second conductive area 12.

[0144] In some other embodiments, in order to ensure the insulation between the first conductive area 11 and the second conductive area 12, the width of the annular etching line 14 can be widened, or multiple annular etching lines 14 can be provided to reduce the risk of conduction between the second conductive area 12 and the first conductive area 11.

[0145] Specifically, the width of the annular etching line 14 can be 0.1 um-1000 mm.

[0146] It is worth noting that the order of forming the insulating first conductive region 11 and the second conductive region 12 and forming the first base material layer 61 on part of the surface of the second conductive region 12 is not limited in the present application, and those skilled in the art can adjust it according to actual production needs.

[0147] Specifically, in an embodiment, at least one closed annular etching line 14 is formed on the first conductive layer 1 of the first conductive substrate by laser etching, and then the first base material solution is disposed on the first conductive layer 1. Optionally, the first base material solution on at least part of the surface of the first conductive region 11 can be wiped off, and after the first base material solution is solidified, the first base material layer 61 can be formed on the first conductive layer 1. Optionally, the first base material layer 61 on at least part of the surface of the first conductive region 11 can also be etched and removed after the first base material solution is solidified to form the first base material layer 61.

[0148] Specifically, in an embodiment, the first base material solution is first disposed on the first conductive layer 1 of the first conductive substrate. Part of the first base material solution can be wiped off, and after the first base material solution is solidified, part of the surface of the first conductive layer 1 is exposed to the first base material layer 61. Alternatively, after the first base material solution is solidified to form the first base material layer 61, the corresponding part of the first base material layer 61 of the first conductive region 11 is etched and wiped off, so that part of the surface of the first conductive layer 1 is exposed to the first base material layer 61. The edge of the first conductive layer 1 exposed to the first base material layer 61 is etched to form the annular etching line 14.

[0149] Optionally, the first base material solution can be disposed on the first conductive layer 1 of the first conductive substrate by scraping, sheet coating, inkjet printing, transfer printing, drop coating, roll-to-roll coating, etc.

[0150] In some embodiments, the second conductive layer 2 is provided, and the second base material layer 63 is formed on at least part of the surface of the second conductive layer 2, including: disposing the second base material layer 63 on the second conductive layer 2, and removing part of the second base material layer 63 on part of the surface of the second conductive layer 2 corresponding to the first conductive region 11 to expose part of the second conductive layer 2.

[0151] In an embodiment, the method of disposing the second base material layer 63 on the second conductive layer 2, removing part of the second base material layer 63 on the surface of the second conductive layer 2 corresponding to the first conductive area 11 to expose part of the second conductive layer 2 can be: first, disposing a second base material solution on the second conductive layer 2 of the second conductive substrate. The second base material solution on the surface of the second conductive layer 2 corresponding to the first conductive area 11 is wiped off, and after the second base material solution is solidified, part of the surface of the second conductive layer 2 is exposed to the second base material layer 63. Alternatively, after the second base material solution is solidified to form the second base material layer 63, part of the second base material layer 63 is etched and removed, so that part of the surface of the second conductive layer 2 is exposed to the second base material layer 63. By first disposing an entire base material layer and then removing part of the base material by wiping, the position of the wiped part of the base material is small, and precise instruments are not required for coating, reducing the requirements for equipment.

[0152] Optionally, the method of disposing the second base material solution on the second conductive layer 2 of the second conductive substrate can be to dispose the second base material solution on the second conductive layer 2 by scraping, sheet coating, inkjet printing, transfer printing, drop coating, roll-to-roll coating, etc.

[0153] It should be noted that the electrical connection between the first conductive area 11 and the second conductive layer 2 relies on the conductive particles 31 in the conductive layer 3, that is, the conductive particles 31 respectively contact the first conductive area 11 and the second conductive layer 2, so that the first conductive area 11 and the second conductive layer 2 are electrically connected.

[0154] In order to ensure the stability of the electrical connection between the first conductive area 11 and the second conductive layer 2, the distance between the first conductive layer 1 and the second conductive layer 2 can be further reduced to reduce the distance between the first conductive area 11 and the second conductive layer 2, thereby increasing the contact area of the conductive particles 31 with the first conductive area 11 and the second conductive layer 2.

[0155] However, if the distance between the first conductive layer 1 and the second conductive layer 2 is too small, the thickness of the first base material layer 61, the second base material layer 63 or the electro-optic medium layer 62 disposed between the first conductive layer 1 and the second conductive layer 2 will be too thin, thereby affecting the color changing effect of the electrochromic device.

[0156] In order to solve the above problems, in some embodiments, the first base material layer 61 and the second base material layer 63 further comprise, before the first base material layer 61 and the second base material layer 63 are disposed on the first conductive layer 1 and the second conductive layer 2:

[0157] disposing a first bus layer 13 on at least part of the surface of the first conductive area 11; and / or disposing a second bus layer 21 on at least part of the surface of the second conductive layer 2 corresponding to the first conductive area 11.

[0158] Specifically, the first busbar layer 13 is formed before the first base material layer 61 is set, and the second busbar layer 21 is formed before the second base material layer 63 is set.

[0159] Through the above steps, the thickness of the conducting layer 3 can be reduced while ensuring that the distance between the first conductive layer 1 and the second conductive layer 2 is not too small. Increasing the thickness difference between the conducting layer 3 and the electro-optic medium layer 62 avoids the conducting layer 3 from conducting the first base material layer 61 and the second base material layer 63.

[0160] Please refer to FIG. 7 and FIG. 8, a first busbar layer 13 can be set on the surface of the second conductive layer 2 near the first conductive region 11. The first busbar layer 13 protrudes from the surface of the first conductive layer 1.

[0161] Specifically, when the first base material layer 61 and the second base material layer 63 are opposite, the distance between the first busbar layer 13 and the second conductive layer 2 needs to be controlled so that the distance between the first busbar layer 13 and the second conductive layer 2 is less than or equal to the particle size of the conductive particles 31.

[0162] Alternatively, please refer to FIG. 5 and FIG. 6, a second busbar layer 21 can be set on the second conductive layer 2. The second busbar layer 21 protrudes from the surface of the second conductive layer 2.

[0163] Specifically, when the first base material layer 61 and the second base material layer 63 are opposite, the distance between the first conductive region 11 and the second busbar layer 21 needs to be controlled so that the distance between the first conductive region 11 and the second busbar layer 21 is less than or equal to the particle size of the conductive particles 31.

[0164] Alternatively, please refer to FIG. 3 and FIG. 4, a first busbar layer 13 can be set on the surface of the second conductive layer 2 near the first conductive region 11, and at the same time, a second busbar layer 21 can be set on the second conductive layer 2.

[0165] Specifically, when the first base material layer 61 and the second base material layer 63 are opposite, the distance between the first busbar layer 13 and the second busbar layer 21 needs to be controlled so that the distance between the first conductive region 11 and the second busbar layer 21 is less than or equal to the particle size of the conductive particles 31.

[0166] Optionally, the material of the first busbar layer 13 can be silver, copper, aluminum, etc., or the material of the first busbar layer 13 can be the same as the material of the first conductive layer 1.

[0167] Optionally, the material of the second busbar layer 21 can be silver, copper, aluminum, etc., or the material of the second busbar layer 21 can be the same as the material of the second conductive layer 2.

[0168] In some embodiments, the electro-optical medium layer 62 is formed between the first base material layer 61 and the second base material layer 63, and the conductive layer 3 is formed between the first conductive region 11 and the second conductive layer 2 to conduct the first conductive region and the second conductive layer, further comprising:

[0169] The pressure is applied to the first conductive layer 1 towards the second conductive layer 2 at the position corresponding to the conductive layer 3, and / or the pressure is applied to the second conductive layer 2 towards the first conductive layer 1 at the position corresponding to the conductive layer 3.

[0170] Through the above steps, the thickness of the conductive layer 3 is controlled to be less than or equal to the particle size of the conductive particles 31, so that the electrical connection relationship between the first conductive region 11 and the second conductive layer 2 in the finished electrochromic device is relatively stable.

[0171] In some embodiments, the pressure applied to the first conductive layer 1 and the second conductive layer 2 is in the range of 1Mpa-3Mpa.

[0172] Specifically, the pressure applied to the first conductive layer 1 and the second conductive layer 2 is preferably 2Mpa, and the duration of the pressure is preferably 3 minutes. Through the pressure, the first conductive region 11 and the second conductive layer 2 can be effectively conducted.

[0173] In some embodiments, the method for manufacturing the electrochromic device further comprises:

[0174] The conductive groove 7 is opened from the surface of the second conductive layer 2 to the first conductive layer 1, so that the first conductive region 11 and the second conductive region 12 are exposed through the conductive groove 7.

[0175] Through the above steps, the first conductive region 11 and the second conductive region 12 towards the surface of the second conductive layer 2 can be exposed through the conductive groove 7, and electrically connected to the positive and negative poles of the external power supply through the conductive groove 7, respectively.

[0176] Specifically, the conductive groove 7 is opened on the above-mentioned electrochromic film, and the conductive groove 7 penetrates the second substrate 5, the second conductive layer 2, the second base material layer 63, the electro-optical medium layer 62, the first base material layer 61 and the conductive layer 3.

[0177] In some embodiments, the method for manufacturing the electrochromic device further comprises:

[0178] The sealing groove is opened through the second conductive layer 2.

[0179] A sealing member 8 is arranged in the sealing groove; the sealing groove is an annular groove, the through groove 7 is communicated with the sealing groove, the sealing member is filled in the sealing groove and extends to fill in the through groove 7, covering the first lead-out structure 9 and the second lead-out structure 10. The exposed first conductive area 11 and the second conductive area 12 extend in a direction away from the sealing groove, and the orthographic projection of the through groove 7 on the first conductive layer 1 is located outside the outer contour of the orthographic projection of the sealing groove on the first conductive layer 1.

[0180] Through the above steps, the sealing member 8 is in an annular structure, and part of the first base material layer 61, the electro-optic medium layer 62 and the second base material layer 63 are limited in the closed space enclosed by the sealing member 8, the first conductive layer 1 and the second conductive layer 2, so as to enhance the sealing effect of the electrochromic device.

[0181] Please refer to FIG. 9 and FIG. 10, in particular, the sealing groove penetrates through the second substrate 5, the second conductive layer 2, the second base material layer 63, the electro-optic medium layer 62 and the first base material layer 61.

[0182] It should be noted that there is no order for opening the sealing groove and the through groove 7.

[0183] The sealing groove is opened on the electrochromic film,

[0184] Please refer to FIG. 2, in some embodiments, the method for manufacturing the electrochromic device further comprises: cutting the excess second conductive layer 2, the first base material layer 61, the electro-optic medium layer 62 and the second base material layer 63 along the edge of the sealing member, so as to form the electrochromic device.

[0185] Please refer to FIG. 2, it should be noted that when cutting along the edge of the sealing member, part of the first conductive layer 1 needs to be reserved, so that part of the first conductive area 11 and part of the second conductive area 12 are exposed to the sealing member 8.

[0186] In some embodiments, the method for manufacturing the electrochromic device further comprises:

[0187] A lead-out assembly is provided, which comprises the first lead-out structure 9 and the second lead-out structure 10.

[0188] The first lead-out structure 9 is electrically connected with the first conductive area 11 through the through groove 7.

[0189] The second lead-out structure 10 is electrically connected with the second conductive area 12 through the through groove 7.

[0190] By setting the first lead-out structure 9 and the second lead-out structure 10, the first conductive area 11 and the second conductive area 12 in the first conductive layer 1 are facilitated to be electrically connected with the positive pole and the negative pole of the external power supply. In particular, in the embodiment shown in FIG. 9, part of the surface of the first conductive area 11 and part of the surface of the second conductive area 12 are located inside the through slot 7, and the positive pole and the negative pole of the external power supply are not easy to extend into the through slot 7 to be connected with the first conductive area 11 and the second conductive area 12.

[0191] It should be noted that the first lead-out structure 9 and the second lead-out structure 10 can be separately provided. In the embodiment, the first lead-out structure 9 and the second lead-out structure 10 can be two independent FPCs.

[0192] However, since the electrochromic device of the embodiment of the present application can lead out the electrodes on one side, the first lead-out structure 9 and the second lead-out structure 10 can be provided on the same surface of the same carrier plate (such as a circuit board), and the first lead-out structure and the second lead-out structure are integrally provided. Specifically, the conductive end of the first lead-out structure 9 and the conductive end of the second lead-out structure 10 are provided on the same surface of the same carrier plate, so as to facilitate the first lead-out structure 9 and the second lead-out structure 10 to be taken with the positive pole and the negative pole of the external power supply, and the conductive ends of the first lead-out structure 9 and the second lead-out structure 10 are directed to the same surface, which can be directly bonded on the first conductive area 11 and the second conductive area 12, thereby simplifying the process of producing the electrochromic device of the embodiment of the present application.

[0193] Please refer to FIGS. 1 to 4, the embodiment of the present application provides an electrochromic device, which comprises a first conductive layer 1, a first base material layer 61, a through layer 3, an electro-optic medium layer 62, a second base material layer 63 and a second conductive layer 2 which are stacked; wherein the first conductive layer 1 comprises a first conductive area 11 and a second conductive area 12 which are insulated from each other, the first base material layer 61 is provided on the first conductive layer 1, and at least part of the first conductive area 11 is exposed to the first base material layer 61;

[0194] The second conductive layer 2 has a first surface 22 and a second surface 23 which are directed to the first conductive layer 1, the second base material layer 63 is provided on the second conductive layer 2, and at least part of the first surface 22 is exposed to the second base material layer 63, and the first surface 22 exposed to the second base material layer 63 at least partially opposes the first conductive area 11 exposed to the first base material layer 61;

[0195] The through layer 3 is located between part of the surface of the first surface 22 exposed to the second base material layer 63 and part of the surface exposed to the first base material layer 61, and the through layer 3 connects the first surface 22 and the first conductive area 11;

[0196] The electro-optic medium layer 62 is located between the first base material layer 61 and the second base material layer 63.

[0197] The electrochromic device provided in the present application is electrically insulated between the first conductive region 11 and the second conductive region 12, and the first conductive region 11 and the second conductive layer 2 are electrically connected through the conductive layer 3. The electrical connection of the first conductive layer 1 and the second conductive layer 2 can be led to the same side of the electrochromic device, so that the lead-out electrodes can be arranged on the same side of the first conductive region 11 and the second conductive region 12, without the need to lead out on both sides. The technical problem of needing to lead out on both sides in the prior art is solved, and the electrochromic device has the advantages of simplifying the electrical connection mode, facilitating production and simplifying the production process.

[0198] On the one hand, the conductive layer 3 can conduct the second conductive layer 2 and the first conductive region 11, and on the other hand, the layer structure of the conductive layer 3 plays a role of spacing and supporting, spacing the second conductive layer 2 and the second conductive region 12, avoiding the short circuit caused by the contact between the second conductive layer 2 and the second conductive region 12, and the conductive layer 3 supports the first conductive region 11 and part of the second conductive layer 2, so that the structure of the entire device is more stable.

[0199] The first base material layer 61 is one of the electrochromic layer and the ion storage layer, and the second base material layer 63 is the other of the electrochromic layer and the ion storage layer.

[0200] It is to be noted that the first conductive layer 1 and the second conductive layer 2 are both ITO (Indium-Tin Oxide, Indium-Tin Oxide) conductive films or other transparent conductive oxide films, and the first conductive layer 1 and the second conductive layer 2 are relatively soft and cannot exist alone. Generally, the first conductive layer 1 and the second conductive layer 2 are both arranged on a substrate, which is used to support and protect the first conductive layer 1 and the second conductive layer 2, and facilitate the transportation and storage of the first conductive layer 1 and the second conductive layer 2. Therefore, the electrochromic device of the present application further comprises a first substrate 4 and a second substrate 5; the first conductive layer 1 is arranged on the first substrate 4, and the first conductive layer 1 and the first substrate 4 form a first conductive substrate; the second conductive layer 2 is arranged on the second substrate 5, and the second conductive layer 2 and the second substrate form a second conductive substrate.

[0201] Generally, the substrate is a PET (Polyethylene terephthalate, Polyethylene terephthalate) plate or other transparent flexible substrate.

[0202] Specifically, the first conductive region 11 and the second conductive region 12 are arranged on one surface of the first substrate 4.

[0203] Specifically, one of the partial surfaces of the first conductive region 11 and the second conductive region 12 is used for electrically connecting with the positive pole of the external power supply, and the other is used for electrically connecting with the negative pole of the external power supply.

[0204] It is to be noted that the first conductive layer 1, the first base material layer 61, the electro-optic medium layer 62, the second base material layer 63 and the second conductive layer 2 are arranged in parallel with the X direction in the drawing.

[0205] In some embodiments, in the X direction, the distance H between the first conductive region 11 and the first surface 22, the conductive layer 3 contains conductive particles 31, the particle size of the conductive particles 31 is D, and H≤D.

[0206] It is to be noted that the conductive particles 31 can respectively contact two objects with a distance less than the particle size of the conductive particles 31, and when the conductive particles 31 respectively contact the two objects, the two objects can be electrically connected to each other through the conductive particles 31, that is, the conductive layer 3 can conduct two objects with a distance less than the particle size of the conductive particles 31, but cannot conduct two objects with a distance greater than the particle size of the conductive particles 31.

[0207] Therefore, in the present application, since the distance between the first conductive region 11 and the first surface 22 is less than or equal to the particle size of the conductive particles 31, the conductive particles 31 in the conductive layer 3 can respectively contact the first conductive region 11 and the first surface 22, so that the conductive layer 3 can conduct the first conductive region 11 and the second conductive layer 2.

[0208] Specifically, the conductive layer 3 is formed by curing a solution mixed with conductive particles 31 and insulating material.

[0209] Optionally, the insulating material can be various glue solutions such as acrylic resin system, epoxy resin system, and silica gel system; or the insulating material is an electro-optic medium solution, such as an electrolyte solution.

[0210] It is to be noted that the conductive particles 31 are conductive spheres, and the conductive particles 31 can be pure metal spheres of good conductor metals such as gold, silver, nickel, copper or their alloy materials, or spheres with a plastic core and a metal outer layer.

[0211] It is to be noted that in order to ensure the stability of the electrical connection relationship between the first conductive region 11 and the second conductive layer 2, the distance between the first conductive layer 1 and the second conductive layer 2 can be further reduced to increase the contact area of the conductive particles 31 with the first conductive region 11 and the second conductive layer 2.

[0212] Optionally, H<D-2um, or H<D / 2.

[0213] The ratio between the size of the conductive particles 31 and the distance between the first conductive region 11 and the first surface 22 needs to be kept within a proper range; in general, the gap between the first conductive region 11 and the second conductive layer 2 is less than half the size of the conductive particles 31, or less than a preset value (e.g. the size of the conductive particles 31 - 2um). This allows the conductive particles 31 to effectively conduct the first conductive region 11 and the second conductive layer 2, and also avoids the conductive particles 31 being too large to break through the second conductive layer 2 and the first conductive region 11, thereby affecting the conductive performance.

[0214] In some embodiments, D = 7um - 100um.

[0215] It should be noted that in some embodiments, the electro-optic medium layer 62 and the conductive layer 3 are formed by curing the same material, and the electro-optic medium layer 62 and the conductive layer 3 can be integrally formed during the process of manufacturing the electrochromic device. In this way, only one solution needs to be provided between the first conductive layer 1 and the second conductive layer 2, which can simplify the production process. It should be noted that the conductive layer 3 can conduct the second conductive layer 2 and the first conductive region 11, while the electro-optic medium layer 62 does not conduct the second conductive region 12 and the second conductive layer 2.

[0216] The distance between the first base material layer 61 and the second base material layer 63 needs to be controlled to be greater than the size of the conductive particles 31, so as to achieve the requirement that the electro-optic medium layer 62 does not conduct the second conductive region 12 and the second conductive layer 2. That is, in the X direction, the distance (L) between the first base material layer 61 and the second base material layer 63 > D.

[0217] In some embodiments, L ≥ 2D, or L ≥ D + 2um.

[0218] In an embodiment, L = 30um, D is 4-15um, and H is 2-13um.

[0219] It should be noted that by reducing the distance between the first conductive layer 1 and the second conductive layer 2, the distance between the first conductive region 11 and the first surface 22 can be further reduced, thereby ensuring the stability of the electrical connection relationship between the first conductive region 11 and the second conductive layer 2; however, if the distance between the first conductive layer 1 and the second conductive layer 2 is too small, the thickness of the first base material layer 61, the second base material layer 63 or the electro-optic medium layer 62 provided between the first conductive layer 1 and the second conductive layer 2 will be too thin, thereby affecting the color changing effect of the electrochromic device.

[0220] In view of the above problems, referring to Figs. 3-8, in some embodiments, the electrochromic device further comprises a first busbar layer 13, and the first busbar layer 13 is located between the first conductive region 11 and the conductive layer 3; and / or, the electrochromic device further comprises a second busbar layer 21, and the second busbar layer 21 is located between the first surface 22 and the conductive layer 3.

[0221] Referring to Figs. 7 and 8, a first busbar layer 13 can be provided on the surface of the first conductive region 11 close to the second conductive layer 2; or, referring to Figs. 5 and 6, a second busbar layer 21 can be provided on the first surface 22; or, referring to Figs. 3 and 4, a first busbar layer 13 can be provided on the surface of the first conductive region 11 close to the second conductive layer 2, and at the same time, a second busbar layer 21 can be provided on the first surface 22, so as to reduce the thickness of the conductive layer 3 while ensuring that the distance between the first conductive region 11 and the first surface 22 is not too small.

[0222] Referring to the embodiment shown in Figs. 7 and 8, it should be noted that, in the projection plane perpendicular to the X direction, the orthographic projection of the first busbar layer 13 at least partially overlaps the orthographic projection of the second conductive layer 2. The conductive layer 3 is located between the first busbar layer 13 and the second conductive layer 2, and the two opposite surfaces of the conductive layer 3 are in contact with the first busbar layer 13 and the second conductive layer 2, respectively.

[0223] Referring to the embodiment shown in Figs. 5 and 6, it should be noted that, in the projection plane perpendicular to the X direction, the orthographic projection of the second busbar layer 21 at least partially overlaps the orthographic projection of the first conductive region 11. The conductive layer 3 is located between the second busbar layer 21 and the first conductive region 11, and the two opposite surfaces of the conductive layer 3 are in contact with the second busbar layer 21 and the first conductive region 11, respectively.

[0224] Referring to the embodiment shown in Figs. 3 and 4, it should be noted that, in the projection plane perpendicular to the X direction, the orthographic projection of the first busbar layer 13 at least partially overlaps the orthographic projection of the second busbar layer 21. The first busbar layer 13 and the second busbar layer 21 are provided so that the thickness of the electrochromic device is more uniform and does not protrude too much to affect storage and transportation. The conductive layer 3 is located between the first busbar layer 13 and the second busbar layer 21, and the two opposite surfaces of the conductive layer 3 are in contact with the first busbar layer 13 and the second busbar layer 21, respectively.

[0225] Optionally, the material of the first busbar layer 13 can be silver, copper, aluminum, etc., or the material of the first busbar layer 13 can be the same as that of the first conductive layer 1.

[0226] Optionally, the material of the second busbar layer 21 can be silver, copper, aluminum, etc., or the material of the second busbar layer 21 can be the same as that of the second conductive layer 2.

[0227] The first busbar 13 can extend along the circumference of the first conductive area 11, and the second busbar 21 can also extend along the circumference of the second conductive layer 2 to form a busbar. By arranging the busbar, the current of the external power source is quickly conducted to the conductive layer, which has the beneficial effect of accelerating discoloration.

[0228] Please refer to FIG. 3 and FIG. 4. In other embodiments, the electrochromic device is provided with a through slot 7, which penetrates the second conductive layer 2, the second base material layer 63, the conductive layer 3, the electro-optic medium layer 62, and the first base material layer 61 to expose part of the first conductive area 11 and part of the second conductive area 12, and the exposed part of the first conductive area 11 and the exposed part of the second conductive area 12 are respectively electrically connected to the positive and negative poles of the external power source through the through slot 7.

[0229] By arranging the through slot 7, the part of the first conductive area 11 and the part of the second conductive area 12 facing the surface of the second conductive layer 2 can be exposed outside through the through slot 7, so that the surface of the first conductive area 11 and the surface of the second conductive area 12 facing the second conductive layer 2 can be respectively electrically connected to the positive and negative poles of the external power source.

[0230] Please refer to FIG. 4. Specifically, the through slot 7 can be located at the edge of the electrochromic device. Please refer to FIG. 3. Specifically, the through slot 7 can be located inside the electrochromic device.

[0231] In the embodiments shown in FIG. 3 and FIG. 4, the first conductive area 11 has a first exposed surface 111 facing the second conductive layer 2 and an electrical connection surface 112, and the second conductive area 12 has a second exposed surface 121 facing the second conductive layer 2 and an electrode surface 122. The first exposed surface 111 and the second exposed surface 121 are located in the through slot 7, and the first exposed surface 111 and the second exposed surface 121 are used to be respectively electrically connected to the positive and negative poles of the external power source through the through slot 7.

[0232] The second conductive layer 2 has a first surface 22 facing the first conductive layer 1 and a second surface 23 opposite to the second conductive area 12. The first base material layer 61 is arranged on the second conductive area 12, the second base material layer 63 is arranged on the second surface 23, and the conductive layer 3 is arranged between the first conductive area 11 and the first surface 22.

[0233] The through slot 7 penetrates the second base 5, the second conductive layer 2, the second base material layer 63, the conductive layer 3, the electro-optic medium layer 62, and the first base material layer 61, so that the first exposed surface 111 and the second exposed surface 121 are exposed through the through slot 7, and the first base material layer 61 not penetrated by the through slot 7 is retained on the electrode surface 122, and the conductive layer 3 not penetrated by the through slot 7 is retained on the electrical connection surface 112.

[0234] In some embodiments, the electrochromic device further comprises a sealing member 8, a sealing groove is provided on the electrochromic device, the sealing groove at least penetrates the second conductive layer 2, the first base material layer 61, the electro-optic medium layer 62 and the second base material layer 63, the sealing member 8 is accommodated in the sealing groove, and the sealing member 8, the second conductive layer 2 and the second conductive area 12 enclose a closed space to seal the first base material layer 61, the electro-optic medium layer 62 and the second base material layer 63 in the closed space.

[0235] Through the above arrangement, the water vapor cannot enter the first base material layer 61, the electro-optic medium layer 62 and the second base material layer 63 in the closed space, so that the problems such as failure of the first base material layer 61, the electro-optic medium layer 62 and the second base material layer 63 in the closed space can be avoided, and the electrochromic device is not easy to be damaged.

[0236] Please refer to FIG. 2, FIG. 9, FIG. 10 and FIG. 11, in some embodiments, the sealing groove is an annular groove, the sealing groove penetrates from the second substrate 5 to the surface of the first conductive layer 1, and the sealing member 8 cooperates with the second conductive layer 2 and the first conductive layer 1 to seal part of the first base material layer 61, part of the electro-optic medium layer 62 and part of the second base material layer 63. The sealing member 8 forms the outline of the electrochromic device.

[0237] Please refer to FIG. 1, FIG. 2 and FIG. 11, in some embodiments, the through groove 7 is located outside the closed space, and at least part of the through layer 3 is located in the closed space.

[0238] In other words, the projection of the sealing groove on the plane where the electrochromic device is located passes through the projection of the first conductive area 11 on the plane where the electrochromic device is located, and the through layer 3 between the first conductive area 11 and the second conductive area 12. Part of the through layer 3 is located on the inner side of the sealing groove, that is, the side of the sealing groove towards the center, and the other part of the first conductive area 11 is located on the outer side of the sealing groove, that is, on the edge. Through the above arrangement, at least part of the through layer 3, part of the first base material layer 61, part of the electro-optic medium layer 62 and part of the second base material layer 63 are limited in the closed space between the sealing member 8, the first conductive layer 1 and the second conductive layer 2, and the through groove 7 is located outside the closed space, so that the through layer 3 can realize the through while avoiding the water vapor entering the closed space.

[0239] In some embodiments, the electrochromic device further comprises a first lead-out structure 9 and a second lead-out structure 10; the first lead-out structure 9 is electrically connected with the first conductive area 11, and the first lead-out structure 9 is used for being electrically connected with one of the positive electrode and the negative electrode of an external power supply; the second lead-out structure 10 is electrically connected with the second conductive area 12; and the second lead-out structure 10 is used for being electrically connected with the other of the positive electrode and the negative electrode of the external power supply.

[0240] By setting the lead-out structures, the first conductive region 11 and the second conductive region 12 in the first conductive layer 1 are conveniently electrically connected with the positive and negative poles of the external power supply. In particular, in the illustrated embodiment, the first exposed surface 111 of the first conductive region 11 and the second exposed surface 121 of the second conductive region 12 are both located inside the through groove 7, and the positive and negative poles of the external power supply are not easy to extend into the through groove 7 to be connected with the first exposed surface 111 and the second exposed surface 121.

[0241] It should be noted that the first lead-out structure 9 and the second lead-out structure 10 can be separately provided. In the present embodiment, the first lead-out structure 9 and the second lead-out structure 10 can be two independent FPCs.

[0242] However, since the electrochromic device of the present application can lead out electrodes on one side, the first lead-out structure 9 and the second lead-out structure 10 can be provided on the same surface of the same carrier plate (such as a circuit board). Specifically, the conductive ends of the first lead-out structure 9 and the second lead-out structure 10 are provided on the same surface of the same carrier plate, so as to facilitate the taking of the first lead-out structure 9 and the second lead-out structure 10 and the positive and negative poles of the external power supply, and the conductive ends of the first lead-out structure 9 and the second lead-out structure 10 are directed towards the same surface, which can be directly bonded to the first conductive region 11 and the second conductive region 12, thereby simplifying the process of producing the electrochromic device of the present application.

[0243] The technical solution adopted by the third aspect embodiment of the present application is: an electrochromic device, comprising a substrate layer and the electrochromic device of the first aspect embodiment.

[0244] The substrate layer is located on the side of the second conductive layer 2 away from the first conductive layer 1; and / or, the substrate layer is located on the side of the first conductive layer 1 away from the second conductive layer 2.

[0245] By applying the electrochromic device of the first aspect embodiment to the electrochromic device, the electrochromic device can lead out electrodes on one side, so as to simplify the electrical connection mode of the electrochromic device.

[0246] Specifically, the electrochromic device comprises two substrate layers, namely a first substrate layer and a second substrate layer. The first substrate layer is located on the side of the first conductive layer 1 away from the second conductive layer 2, and the second substrate layer is located on the side of the second conductive layer 2 away from the first conductive layer 1. The second substrate layer is provided with a first through hole communicating with the through groove 7, and is provided with a second through hole communicating with the sealing groove.

[0247] The technical scheme adopted by the fourth aspect embodiment of the present application is: a product terminal, comprising the electrochromic device of the first aspect embodiment or the electrochromic device of the second aspect embodiment, wherein the terminal product comprises any one of a rearview mirror, a curtain wall, an automobile sunroof, an automobile side window, an automobile windshield, a shell of an electronic product, glasses, a vehicle, and a display panel.

[0248] The electrochromic device of the first aspect embodiment or the electrochromic device of the second aspect embodiment is applied to the product terminal, so that the electrical connection mode of the product terminal can be simplified.

[0249] The technical scheme adopted by the third aspect embodiment of the present application is: a product terminal, comprising the electrochromic device of the first aspect embodiment or the electrochromic device of the second aspect embodiment, wherein the terminal product comprises any one of a rearview mirror, a curtain wall, an automobile sunroof, an automobile side window, an automobile windshield, a shell of an electronic product, glasses, a vehicle, and a display panel.

[0250] The electrochromic device of the first aspect embodiment or the electrochromic device of the second aspect embodiment is applied to the product terminal, so that the electrical connection mode of the product terminal can be simplified, and all advantages of the electrochromic device are achieved.

[0251] The above embodiments are only used to illustrate the technical solutions of the present application, but not limit the same; although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that the technical solutions recorded in the foregoing embodiments can be modified, or some technical features can be replaced by equivalent ones; and these modifications or replacements do not make the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the embodiments of the present application, and should be included in the protection scope of the present application.

Claims

1. A method for manufacturing an electrochromic device, characterized in that, The application comprises the following steps: providing a first conductive layer, forming a first conductive area and a second conductive area insulated from each other on the first conductive layer, and forming a first base material layer on at least part of the surface of the second conductive area; providing a second conductive layer, and forming a second base material layer on at least part of the surface of the second conductive layer; opposing the first base material layer and the second base material layer, wherein at least part of the surface of the first conductive area is opposite to the second conductive layer; forming an electro-optic medium layer between the first base material layer and the second base material layer, and forming a conductive layer between the first conductive area and the second conductive layer to conduct the first conductive area and the second conductive layer.

2. The method of claim 1, wherein the method further comprises: The electro-optic medium layer and the conductive layer are integrally formed.

3. The method of claim 1, wherein the method further comprises: The step of forming an electro-optic medium layer between the first base material layer and the second base material layer, and forming a conductive layer between the first conductive area and the second conductive layer to conduct the first conductive area and the second conductive layer comprises the following steps: arranging a first mixed solution containing conductive particles between the first conductive area and the second conductive layer; and arranging an electro-optic medium solution between the first base material layer and the second base material layer; or, mixing conductive particles and an electro-optic medium solution to form a second mixed solution; arranging the second mixed solution between the first base material layer and the second base material layer, and extending the second mixed solution to between the first conductive area and the second conductive layer.

4. The method of claim 3, wherein the method further comprises: The density of the electrically conductive particles in the electro-optical medium layer is 1000 particles / cm 2 - 100 000 particles / cm 2 .

5. The method of producing an electrochromic device according to any one of claims 1 to 4, wherein The step of providing a first conductive layer, forming a first conductive area and a second conductive area insulated from each other on the first conductive layer, and forming a first base material layer on at least part of the surface of the second conductive area comprises the following steps: arranging the first base material layer on the first conductive layer, and removing the first base material layer on at least part of the surface of the first conductive area to expose at least part of the first conductive area. And / or, the step of providing a second conductive layer, and forming a second base material layer on at least part of the surface of the second conductive layer comprises the following steps: arranging the second base material layer on the second conductive layer, and removing part of the second base material layer on the surface of the second conductive layer corresponding to the first conductive area to expose part of the second conductive layer.

6. The method of producing an electrochromic device according to any one of claims 1 to 4, wherein Before the step of opposing the first base material layer and the second base material layer, the following steps are further included: arranging a first busbar layer on at least part of the surface of the first conductive area; And / or, arranging a second busbar layer on at least part of the surface of the second conductive layer corresponding to the first conductive area.

7. The method of producing an electrochromic device according to any one of claims 1 to 4, wherein The step of forming an electro-optic medium layer between the first base material layer and the second base material layer, and forming a conductive layer between the first conductive area and the second conductive layer to conduct the first conductive area and the second conductive layer further comprises the following steps: applying a pressure towards the second conductive layer at a position of the first conductive layer corresponding to the conductive layer, and / or applying a pressure towards the first conductive layer at a position of the second conductive layer corresponding to the conductive layer.

8. The method of claim 7, wherein the method further comprises: The pressure ranges from 1Mpa to 3Mpa.

9. An electrochromic device, characterized in that The application comprises the following steps: The first conductive layer, the first base material layer, the conductive layer, the electro-optic medium layer, the second base material layer and the second conductive layer are stacked. The first conductive layer comprises first and second conductive regions insulated from each other, and the first base material layer is arranged on the first conductive layer, with at least part of the first conductive region exposed to the first base material layer. The second conductive layer has a first surface facing the first conductive layer and a second surface, and the second base material layer is arranged on the second conductive layer, with at least part of the first surface exposed to the second base material layer, and the first surface exposed to the second base material layer is at least partially opposite to the first conductive region exposed to the first base material layer. The conductive layer is located between the part of the first surface exposed to the second base material layer and the part of the first conductive region exposed to the first base material layer, and the conductive layer conducts the first surface and the first conductive region. The electro-optic medium layer is located between the first base material layer and the second base material layer.

10. Electrochromic device according to claim 9, characterized in that The distance between the first conductive region and the first surface is H, the conductive layer comprises conductive particles, the particle size of the conductive particles is D, and H≤D.

11. The electrochromic device of claim 10, wherein, H<D-2um, or H<D / 2.

12. The electrochromic device of claim 11, wherein, The distance between the first base material layer and the second base material layer is L, and L>D.

13. The electrochromic device of claim 12, wherein, L≥2D, or L≥D+2um.

14. Electrochromic device according to any one of claims 9 to 13, characterized in that The value range of D is 7um-100um.

15. The electrochromic device according to any one of claims 9 to 13, characterized in that, The electrochromic device further comprises a first busbar layer, and the first busbar layer is located between the first conductive region and the conductive layer. And / or, the electrochromic device further comprises a second busbar layer, and the second busbar layer is located between the first surface and the conductive layer.

16. The electrochromic device according to any one of claims 9 to 13, characterized in that, The electrochromic device is provided with a conductive groove, which penetrates through the second conductive layer, the second base material layer, the conductive layer, the electro-optic medium layer and the first base material layer to expose part of the first conductive region and part of the second conductive region, and the exposed part of the first conductive region and the exposed part of the second conductive region are respectively electrically connected with the positive and negative poles of the external power supply through the conductive groove.

17. The electrochromic device of claim 16, wherein, The electrochromic device further comprises a sealing member, and the electrochromic device is provided with a sealing groove, which penetrates through at least the second conductive layer, the first base material layer, the electro-optic medium layer and the second base material layer, the sealing member is accommodated in the sealing groove, and the sealing member, the second conductive layer and the second conductive region form a closed space to seal the first base material layer, the electro-optic medium layer and the second base material layer located in the closed space.

18. The electrochromic device according to any one of claims 9 to 13, wherein, The electrochromic device further comprises a first lead-out structure and a second lead-out structure. The first lead-out structure is electrically connected with the first conductive region, and the first lead-out structure is used to be electrically connected with one of the positive and negative poles of the external power supply. The second lead-out structure is electrically connected with the second conductive region, and the second lead-out structure is used to be electrically connected with the other of the positive and negative poles of the external power supply.

19. The electrochromic device of claim 18, wherein, The electrochromic device further comprises a carrier plate, the first lead-out structure and the second lead-out structure are disposed on the same surface of the carrier plate.

20. An electrochromic device, characterized in that, comprising a substrate layer and an electrochromic device according to any one of claims 9 to 19; the substrate layer is located on a side of the second conductive layer facing away from the first conductive layer; and / or, the substrate layer is located on a side of the first conductive layer facing away from the second conductive layer.

21. A terminal product, characterized in that comprising an electrochromic device according to any one of claims 9 to 19 or an electrochromic apparatus according to claim 20, wherein the end product comprises any one of a rearview mirror, a curtain wall, an automotive sunroof, an automotive side window, an automotive windshield, a housing of an electronic product, glasses, a vehicle, and a display panel.

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