X-ray optical device and x-ray photoelectron spectrometer

Abstract

This X-ray photoelectron spectrometer is provided with a sample stage 1 having a movement range such that the whole surface of a semiconductor wafer having a diameter of 300 mm or more can be inspected, and an X-ray optical device 2 having the configuration herein described. The X-ray optical device 2 includes a rotating anticathode X-ray source 20 and an X-ray optical system 30 as components. The X-ray optical system 30 extracts X-rays having a specific bandwidth through used of a flat crystal optical system 32 from X-rays collimated by a collimating optical system 31, condenses the X-rays having the specific bandwidth through use of a condensing optical system 33, and irradiates the surface of a semiconductor wafer.

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