Temperature-control device for controlling the temperature of a position-sensitive component of a lithography system, lithography system and method for producing a temperature-control device

Abstract

The invention relates to a temperature-control device (200) for controlling the temperature of a position-sensitive component (102) of a lithography system (1), having a liquid line (208) for transporting a temperature-control liquid (206), wherein the liquid line (208) has at least one first circumferential section (232) and at least one second circumferential section (234), which together form a closed circumference (U1) of the liquid line (208), and the at least one second circumferential section (234) has an elastic material (220) for damping a pressure fluctuation of the temperature-control liquid (206), which is more elastic than a material (227) of the at least one first circumferential section (232).

Description

[0001] Carl Zeiss SMT GmbH 1 TEMPERATURE CONTROL DEVICE FOR TEMPERING A POSITION-SENSITIVE COMPONENT OF A LITHOGRAPHING PLANT, LITHOGRAPHING PLANT AND METHOD FOR MANUFACTURING A TEMPERATURE CONTROL DEVICE The present invention relates to a temperature control device for tempering a position-sensitive component of a lithography system, a lithography system with such a temperature control device, and a method for manufacturing such a temperature control device. The content of priority application DE 10 2024 205567.0 is fully incorporated by reference. Microlithography is used to manufacture microstructured components, such as integrated circuits. The microlithography process is carried out with a lithography system that has a lighting system and a projection system.The image of a mask (reticule) illuminated by the illumination system is projected by the projection system onto a substrate, for example a silicon wafer, coated with a photosensitive layer (photoresist) and positioned in the image plane of the projection system, in order to transfer the mask structure onto the photosensitive coating of the substrate. Driven by the pursuit of ever smaller structures in the production of integrated circuits, EUV lithography systems are currently being developed that use light with a wavelength in the range of 0.1 nm to 30 nm, particularly 13.5 nm. Since most materials absorb light of this wavelength, such EUV lithography systems must use reflective optics, i.e., mirrors, instead of the previously used refracting optics, i.e., lenses.Carl Zeiss SMT GmbH 2 The demands on the accuracy and precision of the imaging properties of lithography systems are constantly increasing. From a dynamic perspective, it is therefore essential to minimize the influence of disturbances on the movement of various position-sensitive components of the lithography system. For example, very precise positioning of optical components, especially mirrors, is required. Dynamic disturbances of optical components can be generated, for example, by the movement of other components of the lithography system or by acoustic disturbances. Acoustic disturbances can be transmitted as pressure fluctuations of a coolant in the cooling lines of a cooling device of the lithography system to cooled, position-sensitive components of the lithography system. Pressure fluctuations of the coolant are generated, for example, by flow-induced vibrations (FIV).With the increasing complexity of lithography systems, further dynamic disturbances within and outside the system are to be expected, making additional mechanisms for their suppression or compensation desirable and necessary. Conventional solutions for reducing disturbance excitation of mirrors in a lithography system due to flow-induced vibrations are known, for example, from WO 2021013441 A1. Against this background, an object of the present invention is to provide an improved temperature control device for a lithography system, a corresponding lithography system, and an improved method for manufacturing a temperature control device. According to a first aspect, a temperature control device for temperature control of a position-sensitive component of a lithography system is proposed. The temperature control device has a fluid line for transporting a temperature control fluid.Furthermore, the fluid line has at least one first circumferential section and at least one second circumferential section, which together form a closed circumference of the fluid line. The second circumferential section also incorporates an elastic material for damping pressure fluctuations in the temperature control fluid, which is more elastic than the material of the first circumferential section. For example, the elastic material is a viscoelastic material that is more viscoelastic than the material of the first circumferential section. Because the fluid line has the second circumferential section with the (visco-)elastic material, pressure fluctuations in the temperature control fluid can be dampened. The second circumferential section with the (visco-)elastic material also has a sound-dampening effect, i.e., it provides acoustic damping.In particular, the at least one second circumferential section with the (visco-)elastic material is compressed and / or expanded and / or set in motion by an incoming pressure wave, so that the energy of the incoming pressure wave is at least partially converted into deformation energy and / or kinetic energy of the elastic material. In the case of a viscoelastic material that exhibits both elastic and viscous properties, the energy of the incoming pressure wave can also be at least partially damped by the viscous component. This allows the energy of the incoming pressure wave to be dissipated and the amplitude of the outgoing pressure wave to be reduced. The fluid line has, with respect to its circumference, at least one first circumferential section and at least one second circumferential section.One can also say that the Carl Zeiss SMT GmbH 4 fluid line, viewed in cross-section, has at least one first circumferential section and at least one second circumferential section. Here, "cross-section" refers specifically to a cross-section of the fluid line perpendicular to a longitudinal direction of the fluid line, a flow direction of the fluid line, and / or a flow direction of the temperature control fluid within the fluid line. The (visco-)elastic material is thus used only in the second circumferential section, but not in the first circumferential section. In other words, the elastic material—viewed with respect to the circumference of the fluid line—is used only in one or more sub-sections of the fluid line's circumference, while other sub-sections of the fluid line's circumference are free of the (visco-)elastic material.This has the advantage that the second circumferential section with the elastic material can be manufactured more easily, as it does not extend over the entire circumference of the fluid line. Furthermore, a seal (e.g., a liquid-tight and / or gas-tight seal) between the second circumferential section with the elastic material and other sections of the fluid line, such as the first circumferential section, can be achieved more easily, since it is not necessary to provide a seal over an entire cross-section, e.g., a round one. Depending on the geometric design, a seal on a flat and / or quasi-flat surface may suffice.For example, by only partially providing the elastic material with respect to the circumference of the fluid line, the interface between the temperature control fluid and an external gas space can be reduced, thus decreasing permeation of temperature control fluid into the gas space. Carl Zeiss SMT GmbH 5. That the at least one second circumferential section contains the elastic material includes, for example, that the at least one second circumferential section consists predominantly (e.g., over 90%, over 95%, and / or over 99%) of the elastic material and / or that the at least one second circumferential section consists exclusively of the elastic material. By way of example only, the at least one first circumferential section covers 50% or more and / or 70% or more of the total circumference of the fluid line. The fluid line can, for example, also have several first circumferential sections and several second circumferential sections.The multiple first circumferential sections are, for example, arranged at intervals around the circumference. Furthermore, the multiple second circumferential sections can also be arranged at intervals around the circumference. The multiple first circumferential sections and the multiple second circumferential sections are, for example, arranged alternately. The fluid line has, for example, at least one first line section which includes at least one first and at least one second circumferential section. The fluid line has, for example, at least one second line section which is free of the second circumferential section.The first and second pipe sections are, in particular, pipe sections of the liquid pipe with respect to a longitudinal direction of the liquid pipe, with respect to a pipe routing direction of the liquid pipe, and / or with respect to a flow direction of the temperature control fluid in the liquid pipe. This means that the second circumferential section with the elastic material – with respect to the aforementioned longitudinal direction, pipe routing direction, and / or flow direction – is only used in a partial area of ​​the liquid pipe. Furthermore, the liquid pipe can, for example, also have several first pipe sections, each of which has the Carl Zeiss SMT GmbH first and second circumferential sections.In other words, the fluid line can, for example, also have several first line sections in which pressure fluctuations of the temperature control fluid are dampened by means of the second circumferential section with the elastic material. The position-sensitive component of the lithography system can be an optical or a mechanical component of the lithography system, e.g., a projection optic of the lithography system. The position-sensitive component is, in particular, a component that must be held in a precise position with only small tolerances during operation of the lithography system. The position-sensitive component of the lithography system is, for example, a mirror of the lithography system, e.g., a mirror of the projection optic of the lithography system. The mirrors of a projection optic of an EUV lithography system are usually movably attached to a support frame by means of actuators in order to maintain the position of the respective mirror, e.g.,in six degrees of freedom, to be able to adjust precisely. The six degrees of freedom include, in particular, three translational degrees of freedom (e.g., in three mutually perpendicular spatial directions) and three rotational degrees of freedom (e.g., with respect to a rotation about the three mutually perpendicular spatial directions). The position-sensitive component of the lithography system can also be a support structure and / or frame structure that serves as a (e.g., optical) reference. The position-sensitive component can, for example, be a sensor frame of the lithography system, e.g., of the projection optics of the lithography system. A sensor frame typically has a sensor device for measuring the current position of one or more optical components of the lithography system relative to the sensor frame. The sensor frame is, for example, vibration-isolated from a support frame of the optical component(s). The sensor device includes, for example,One or more sensors, such as interferometers and / or other measuring devices, are used to detect the position of the optical component(s). The optical component(s) may, for example, have reflector elements to reflect light emitted by the sensors (e.g., laser light). For example, the one or more sensors serve to detect the position of the optical component(s) in the six degrees of freedom. A temperature control device can be used to influence the thermal condition of the position-sensitive component. In particular, the temperature control device can be used to regulate the temperature of the position-sensitive component, i.e., to cool or heat it. Accordingly, the temperature control device is, for example, a cooling device or a heating device.Furthermore, the temperature control fluid can be, for example, a cooling fluid or a heating fluid. In the following, the temperature control device is usually described as a cooling device. However, in other embodiments, the temperature control device can also be a heating device. Therefore, whenever the present application refers to a cooling device, cooling unit, cooling, cooling fluid, cooling line, method for manufacturing a cooling device, etc., it could just as easily mean a heating device, heating unit, heating, heating fluid, heating line, method for manufacturing a heating device, etc. The cooling device, as an example of a temperature control device, serves in particular to prevent high temperatures and temperature fluctuations of the position-sensitive component.In particular, mirrors in an EUV lithography system (as an example of position-sensitive components) heat up as a result of absorbing high-energy EUV radiation. The resulting high temperatures and temperature fluctuations in the mirror, and the associated thermal deformations of the mirror, can lead to wavefront aberrations and thus impair the imaging properties of the mirrors. To prevent thermally induced deformations, mirrors in the lithography system can be actively cooled. The cooling device, as an example of a temperature control device, can also (additionally or instead) be used to cool, for example, a sensor frame (as an example of a position-sensitive component). This prevents thermal crosstalk (e.g., heating of the sensor frame by thermal radiation).Thermal radiation is primarily caused by ambient light, such as scattered light, absorbed by mirror surfaces or structural elements of the lithography system. Other heat sources can include actuators and heating heads. A cooling device creates a stable temperature environment for the sensor frame. This allows for more accurate position measurement of the mirror or mirrors using the sensor device held by the sensor frame. The cooling device, as an example of a temperature control system, further comprises, for example, a cooling unit for cooling the coolant, one or more pumps for generating the required coolant flow rate, and one or more valves for controlling the coolant flow. A specific coolant flow rate is required for cooling, which is achieved via a pump system.This results in dynamic disturbance excitation, as every pump generates local pressure fluctuations. These are transmitted throughout the entire cooling circuit via coolant noise (water noise, longitudinal water noise wave). Furthermore, any change in cross-section and any deflection of the fluid line, as well as any valve installed in the cooling circuit, can represent a source of disturbance that causes local pressure fluctuations of the fluid. This type of dynamic disturbance excitation is also called flow-induced vibration (FIV). The disturbance excitation is transmitted to the cooled position-sensitive component via water noise. This causes the position of the position-sensitive component to deviate from a target position. In particular, a pressure surge of the coolant acts on surfaces of the cooled position-sensitive component.The pressure surge is converted into a force at the surfaces on which it acts. This force causes the position of the position-sensitive component to deviate from a desired position. Generally speaking, any pressure disturbance, such as one or more pressure surges, a harmonic pressure signal, and / or harmonic pressure fluctuations in the cooling fluid, can cause interference in the cooled position-sensitive component. The proposed temperature control device, e.g., a cooling device, with its second circumferential section made of (visco-)elastic material, can dampen pressure fluctuations in the temperature control fluid, e.g., the cooling fluid, and reduce or prevent their transmission to the position-sensitive component. Consequently, the imaging properties of the lithography system can be improved.Furthermore, interference can be better compensated for in increasingly complex lithography systems with a growing number of interference sources. The lithography system is, for example, an EUV or a DUV lithography system. EUV stands for "extreme ultraviolet" and refers to a wavelength of the working light in the range of 0.1 nm to 30 nm, specifically 13.5 nm. DUV stands for "deep ultraviolet" and refers to a wavelength of the working light between 30 nm and 250 nm. Carl Zeiss SMT GmbH 10. The EUV or DUV lithography system comprises an illumination system and a projection system.In particular, the EUV or DUV lithography system projects the image of a mask (reticule) illuminated by the illumination system onto a substrate, such as a silicon wafer, coated with a photosensitive layer (photoresist) and positioned in the image plane of the projection system. This transfers the mask structure onto the photosensitive coating of the substrate. The fluid line (e.g., cooling line) includes, for example, a fluid pipe (e.g., a metal pipe and / or a stainless steel pipe) with an outer wall. The fluid line (e.g., cooling line) can also include a fluid channel formed within a solid body (e.g., a support frame of the lithography system). The fluid channel can be formed, for example, by machining the solid body (e.g., by cutting, machining, milling, and / or forming).The fluid channel can alternatively be formed, for example, by pre-shaping the solid body (e.g., by casting and / or additive manufacturing). The fluid line serves, for example, to transport the temperature control fluid to and / or from the position-sensitive component. The fluid line serves, for example, to transport the temperature control fluid from a temperature control unit (e.g., cooling unit) of the temperature control device to the position-sensitive component and / or from the position-sensitive component (back) to the temperature control unit. The temperature control device can also have more than one fluid line. The temperature control fluid (e.g., cooling fluid) is or comprises, for example, water. Carl Zeiss SMT GmbH 11 The at least one first circumferential section comprises, for example, a rigid material. The at least one first circumferential section comprises, for example, metal and / or stainless steel.For example, the at least one first circumferential section consists predominantly (e.g., over 90%, over 95%, and / or over 99%) and / or exclusively of metal and / or stainless steel. The at least one second circumferential section with the elastic material is, for example, a (visco-)elastic separating membrane. The at least one second circumferential section with the elastic material is, in particular, (e.g., reversibly) deformable so that pressure fluctuations of the temperature control fluid can be dampened. The at least one second circumferential section with the elastic material is, for example, fluid-tight, liquid-tight, and / or gas-tight. The at least one second circumferential section has, for example, a thin-walled elastic material. The at least one second circumferential section has, for example, a viscoelastic material.The material of at least one second circumferential section comprises, for example, polyurethane, silicone, rubber, natural rubber, silicone rubber, fluororubber, perfluororubber, polynorbornene rubber, perfluoroalcyl vinyl ether, perfluoroalkoxy, polyvinyl chloride, one or more thermoplastic elastomers, and / or another elastic material. Fluororubber is particularly well-suited for vacuum applications due to its resistance to aging and low outgassing. The material of at least one second circumferential section can also comprise, for example, a fluorothermoplastic such as tetrafluoroethylene, polytetrafluoroethylene, hexafluoropropylene, and / or vinylidene fluoride. Carl Zeiss SMT GmbH 12. A material of at least one first circumferential section has, for example, a first modulus of elasticity. Furthermore, the elastic material of at least one second circumferential section has, for example, a second modulus of elasticity.Furthermore, the second modulus of elasticity of the elastic material of at least one second circumferential section is, in particular, lower than the first modulus of elasticity of the first circumferential section. For example, the first modulus of elasticity is in the range of 20 GPa or greater, 50 GPa or greater, or 100 GPa or greater. For instance, the material of the first circumferential section is steel, which has, for example, a modulus of elasticity of 210 GPa. For example, the second modulus of elasticity is in the range of 5 GPa or less, 3 GPa or less, 2 GPa or less, 1 GPa or less, and / or 0.1 GPa or less. For instance, the material of the second circumferential section is rubber, which has, for example, a modulus of elasticity of less than 0.1 GPa. In addition to or instead of different moduli of elasticity, the thickness (e.g., wall thickness) of at least one second circumferential section can, for example, be smaller than a thickness (e.g.,The wall thickness of at least one first circumferential section. In the case of a viscoelastic material, whose behavior corresponds to that of a mixture of an elastic solid and a viscous liquid, a multitude of viscoelastic processes (e.g., rotation of molecules, unfolding of molecular chains, etc.) can occur, resulting in a complex damping spectrum. The viscoelastic behavior of a material can be described using a relaxation modulus, which indicates the resistance to viscoelastic deformation. The total deformation of a viscoelastic material under load is the sum of the elastic, viscous, and viscoelastic deformation components.The at least one second circumferential section with the elastic material is, for example, designed to dampen pressure fluctuations of the temperature control fluid in a frequency range of 1 Hz and above, 10 Hz and above, 1 Hz to 3 kHz, 1 Hz to 1 kHz, 1 Hz to 800 Hz, and / or 1 Hz to 500 Hz. According to one embodiment of the first aspect, the at least one second circumferential section forms at least one separating membrane that separates a liquid space of the liquid line from at least one gas space. This allows the at least one second circumferential section to move and / or deform into the gas space. The gas space contains a gas, e.g., air. The liquid space of the liquid line serves in particular to hold the temperature control fluid. According to another embodiment of the first aspect, the at least one gas space is an open gas space formed by an ambient space of the liquid line.This means that the at least one separating membrane, formed by the at least one second circumferential section, separates the liquid space of the liquid line from the open gas space. The liquid line and / or a section of the liquid line, which has the at least one second circumferential section, is arranged in the surrounding space. For example, if the liquid line has a liquid channel formed in a solid body (e.g., a support frame), then this solid body is also arranged in the surrounding space. Furthermore, in this embodiment, the surrounding space contains a gas, i.e., it is filled with a gas, e.g., air. According to another embodiment of the first aspect, the temperature control device has at least one closed gas chamber for receiving a gas and for providing the at least one gas space.Furthermore, at least one gas chamber is arranged adjacent to at least one second circumferential section on the liquid line, such that the second circumferential section separates the gas chamber from the liquid line. The closed gas chamber allows for damping of pressure fluctuations in the temperature control fluid, in addition to the damping of such fluctuations by means of the elastic material of the second circumferential section itself, due to compression of the separated gas volume. The second circumferential section forms, in particular, an elastic separating membrane that seals the gas chamber from the liquid chamber in a fluid-tight, liquid-tight, and / or gas-tight manner.The gas in the closed gas chamber, separated from the temperature control fluid in the liquid chamber of the fluid line by the elastic separating membrane, provides a compressible gas volume adjacent to the liquid chamber. This compressible gas volume dampens pressure fluctuations in the temperature control fluid, thus significantly reducing the propagation of pressure fluctuations through the fluid. Specifically, the elastic separating membrane is designed to deform, thereby altering the volume of the liquid chamber at the expense of the volume of the gas chamber.For example, an increase in the pressure of the temperature control fluid, viewed in the cross-section of the fluid line, leads to a deformation of the separating membrane into the original gas space, so that the volume of the liquid space increases and the volume of the gas space decreases accordingly. Thus, an increase in the pressure of the temperature control fluid can be dampened by the expansion of the liquid in the liquid space and the compression of the gas in the gas space. One can also say that the gas space stores the energy of an acoustic wave of the temperature control fluid and releases it back to the temperature control fluid when the pressure in the temperature control fluid drops again. The same applies to a decrease in the pressure of the temperature control fluid in the liquid space of the fluid line, which leads to an increase in the volume of the gas space.This allows the gas in the gas chamber to expand and the temperature control fluid in the liquid chamber to be compressed, thus dampening the pressure drop in the temperature control fluid. Similarly, periodic pressure fluctuations of the temperature control fluid can also be dampened by means of the compressible gas volume. One can also say that the closed gas chamber acts as a spring element and / or elastic element, since the gas compressed in the gas chamber expands again as a reaction. Carl Zeiss SMT GmbH 16 Providing at least one closed gas chamber is particularly advantageous when the liquid line and / or a section of the liquid line, which has at least one second circumferential section, is located in a low-pressure environment and / or a vacuum environment.In such a low-pressure and / or vacuum environment, a gas at a predetermined pressure can be supplied via the closed gas chamber. For example, the gas pressure in the at least one gas chamber can optionally be set to a predetermined value ("pre-charge pressure") – e.g., before the initial commissioning of the temperature control device. This allows the compressibility of the gas in the at least one gas chamber, required for sound attenuation by the gas volume, to be preset. Furthermore, the required compressibility of the gas in the at least one gas chamber can also be preset by selecting a volume for the at least one gas chamber and / or by selecting the gas composition. For example, the gas pressure in the at least one gas chamber can optionally be monitored – e.g., during operation of the temperature control device – using one or more sensors.For example, if necessary, the gas pressure in the at least one gas chamber can be readjusted to the predetermined value ("pre-charge pressure") by supplying gas into the at least one gas chamber. The at least one gas chamber comprises, in particular, a container with an interior space that forms the at least one gas space. The at least one gas chamber serves, in particular, to hold a gas. The gas in the gas chamber consists, for example, of air, clean air, nitrogen, helium, and / or another gas. Clean air is, for example, air according to one of the purity classes 1 to 9 of the ISO standard ISO 8573-1:2010. Carl Zeiss SMT GmbH 17 The at least one gas chamber is closed both in the cross-section of the liquid line and overall. The at least one gas chamber is, in particular, closed in a gas-tight and liquid-tight manner. For example, the temperature control device has a gas chamber assigned to every second circumferential section.In other words, the number of gas chambers is equal to the number of second circumferential sections. In embodiments where the at least one gas chamber is provided, the at least one second circumferential section can also comprise a non-damping material (e.g., a steel membrane). In this case, the damping of a pressure fluctuation of the temperature control fluid occurs via the movement of a gas or fluid in the at least one gas chamber (intramolecular friction). According to a further embodiment of the first aspect, the fluid line comprises a fluid pipe with an outer wall, wherein at least one section of the outer wall is replaced by the at least one second circumferential section. For example, in the manufacture of the fluid pipe, a raw fluid pipe is provided which, viewed in cross-section, has a closed outer wall (i.e., an outer wall that forms a closed circumference).For example, at least one section of the outer wall is removed in cross-section (e.g., by cutting, machining, and / or milling) to create at least one opening in the fluid tube. This opening is then covered, for example, by the second circumferential section. Carl Zeiss SMT GmbH 18. By way of example only, more than one opening in the fluid tube can be created, and one of the second circumferential sections can cover more than one of the openings. For example, two openings in the fluid tube are created, and a second circumferential section is provided that covers both openings. However, other numbers of openings and second circumferential sections are also possible.According to a further embodiment of the first aspect, the fluid line has a fluid channel formed within a solid body of the lithography system, open in cross-section to an outer side of the solid body. Furthermore, at least one second circumferential section forms a cover for the fluid channel. This allows the fluid line to be integrated, at least partially, into existing mechanical components of the lithography system. This saves installation space within the lithography system. The solid body is, for example, a mechanical component of the lithography system. The solid body is, for example, a support frame and / or a support structure of the lithography system. For example, the fluid channel in the solid body is formed by cutting, machining, and / or milling. The fluid channel is, in particular, open in cross-section of the fluid line.The fluid channel is open towards the outside of the solid body. For example, the fluid channel is a channel-shaped depression on the outside of the solid body. The fluid channel is, for example, an open groove in the solid body. Carl Zeiss SMT GmbH 19 By designing the fluid channel, at least partially, as a cooling channel formed within the solid body, complex geometries of the fluid channel are possible. For example, such a cooling channel can also have a curved, multiply bent, and / or serpentine shape. For example, several cooling channels can also be run in parallel. For example, the fluid channel also has a supply section, which has a fluid pipe and is fluidly connected to a first end of the cooling channel in the solid body, e.g., connected at the first end.For example, the fluid line also has a discharge section which includes a fluid pipe and is fluidly connected to a second end of the cooling channel in the solid body, e.g., connected at the second end. Furthermore, the fluid line can also have at least one first section with a fluid pipe as described above, including at least one elastic circumferential section, and at least one second section with a fluid channel as described above, including at least one elastic circumferential section. The temperature control device can also have several fluid lines, wherein at least one first line is equipped with a fluid pipe as described above, including at least one elastic circumferential section, and at least one second line is equipped with a fluid channel as described above, including at least one elastic circumferential section.According to a further embodiment of the first aspect, the liquid line, the liquid pipe, a raw liquid pipe from which the liquid pipe is manufactured, and / or the liquid channel each have a cross-section with a circular, oval, polygonal, regular polygonal, rectangular, square, and / or triangular shape. In other examples, the liquid pipe, the raw liquid pipe from which the liquid pipe is manufactured, and / or the liquid channel may each also have a cross-section other than those mentioned. According to a further embodiment of the first aspect, the at least one second circumferential section has a planar shape and / or a plate shape. In other examples, the at least one second circumferential section may also have a different shape.This enables particularly simple manufacturing of the second circumferential section, particularly simple attachment of the second circumferential section to other elements of the fluid line, and particularly simple sealing of the second circumferential section. According to a further embodiment of the first aspect, the at least one second circumferential section is attached to an outer wall of the fluid line, or the at least one second circumferential section is attached to a solid body of the lithography system in which a fluid channel of the fluid line is formed. The outer wall is, in particular, a wall that delimits a fluid chamber of the fluid line from an outer chamber of the fluid line. The outer wall has an inner side facing the fluid chamber and an outer side facing the outer chamber.The at least one second circumferential section can, for example, be attached to the inside and / or outside of the outer wall of the fluid line. Carl Zeiss SMT GmbH 21 The at least one second circumferential section can be attached to the outer wall of the fluid line or to the solid body by means of a form-fit connection (e.g., by grooves), a force-fit connection (e.g., by crimping), and / or a material-fit connection (e.g., by gluing, soldering, and / or welding). The outer wall of the fluid line or the solid body in which the fluid channel of the fluid line is formed has, in particular, one or more fastening sections for attaching the at least one second circumferential section. For example, one or more end sections of the at least one second circumferential section are clamped between the aforementioned fastening sections.For example, one or more end sections of at least one second circumferential section have a projection. Furthermore, said fastening section has one or more recesses in which the projection engages. By way of example only, the at least one second circumferential section can also be attached to the outer wall of the fluid line or to the solid body by adhesive bonding. For this purpose, a suitable adhesive is selected, e.g., with regard to tightness, gas tightness, liquid tightness, and / or adhesive strength. According to a further embodiment of the first aspect, the fluid line has at least one limiting element which is arranged adjacent to the at least one second circumferential section. Furthermore, the at least one limiting element is designed to spatially limit any elastic movement and / or deformation of the at least one second circumferential section.For example, the at least one limiting element is designed to spatially limit elastic movement and / or deformation of the at least one second circumferential section in the direction of the liquid space and / or in the direction of the gas space. The limiting element is, for example, designed and arranged such that it limits (visco-)elastic movement of the at least one second circumferential section directed towards the liquid space of the liquid line. This prevents the at least one second circumferential section from collapsing into the liquid space at high pressure in the gas space (especially much higher than the pressure of the temperature control fluid in the liquid space). A lithography system is proposed according to a second aspect. The lithography system has a position-sensitive component and a temperature control device, as described above, for temperature control of the position-sensitive component.The temperature control device and / or the position-sensitive component is preferably part of the projection system of the lithography system (projection exposure system). However, the lithography system and / or the position-sensitive component can also be part of an illumination system of the lithography system. According to one embodiment of the second aspect, the lithography system has a solid body in which a fluid channel of a fluid line of the temperature control device is formed, wherein the fluid channel, viewed in cross-section, is open to an outside of the solid body, and the at least one second circumferential section forms a cover of the fluid channel. The solid body is, for example, a support frame of the lithography system. More than one fluid channel of a fluid line can also be formed in the solid body.The solid body, for example, is not part of the position-sensitive component and / or is arranged at a distance from the position-sensitive component. According to a third aspect, a method for manufacturing a temperature control device for a lithography system is proposed. The temperature control device is designed to temperature control a position-sensitive component of the lithography system and includes a fluid line for transporting a temperature control fluid. The method comprises the steps of: a) providing a preform of the fluid line, wherein the preform of the fluid line has at least one opening in cross-section, and b) attaching at least one elastic membrane to the preform of the fluid line so that the at least one opening is covered. The method for manufacturing the temperature control device can also be part of a higher-level method for manufacturing the lithography system.In particular, the preform of the fluid line, viewed in cross-section as described in step a), has at least one first and at least one second circumferential section. Furthermore, the preform of the fluid line contains material in the at least one first circumferential section, whereas the second circumferential section contains no material, but rather at least one opening. Additionally, the preform of the fluid line, viewed in cross-section as described in step b), has the (visco-)elastic membrane in the at least one second circumferential section, whereas the at least one first circumferential section is free of the (visco-)elastic membrane.According to one embodiment of the third aspect, in step a), a raw liquid tube with a closed outer wall in cross-section is provided, and at least one section of the outer wall is removed in cross-section to create the at least one opening. Removing the at least one section of the outer wall includes, for example, cutting, blanking, machining, and / or milling material from the solid body. In this embodiment, the preform of the liquid line with the at least one opening is formed by the liquid tube, which has the opening. According to another embodiment of the third aspect, in step a), a solid body of the lithography system is provided, and a liquid channel is formed in the solid body, which, in cross-section, is open to an outer surface of the solid body to form the at least one opening.Carl Zeiss SMT GmbH 25 In this embodiment, the preform of the liquid line is formed with at least one opening through the liquid channel formed in the solid body and open to the outside of the solid body. "One" here is not necessarily to be understood as limiting to exactly one element. Rather, several elements, such as two, three, or more, can also be provided. Likewise, every other term used here is not to be understood as limiting to exactly the stated number of elements. Rather, numerical deviations upwards and downwards are possible unless otherwise specified. The embodiments and features described for the temperature control device apply accordingly to the proposed method and vice versa.Further possible implementations of the invention also include combinations of features or embodiments described previously or subsequently with regard to the exemplary embodiments, even if not explicitly mentioned. In doing so, the person skilled in the art will also add individual aspects as improvements or additions to the respective basic form of the invention. Further advantageous embodiments and aspects of the invention are the subject of the dependent claims and the exemplary embodiments of the invention described below. The invention is further explained below with reference to preferred embodiments and the accompanying figures. Fig. 1 shows a schematic meridional section of a projection exposure system for EUV projection lithography; Carl Zeiss SMT GmbH 26. Fig. 2 shows an optical system with an optical component of the projection exposure system from Fig. 1 according to one embodiment; Fig.Figure 3 shows a cooling device for cooling the optical component from Figure 2 according to one embodiment; Figure 4 shows a fluid line of the cooling device from Figure 3 in a cross-sectional view along line IV-IV according to one embodiment; Figure 5 shows a fluid line of the cooling device from Figure 3 in a cross-sectional view along line IV-IV according to another embodiment; Figure 6 shows a fluid line of the cooling device from Figure 3 in a cross-sectional view along line IV-IV according to another embodiment; Figure 7 shows a fluid line of the cooling device from Figure 3 in a cross-sectional view along line IV-IV according to another embodiment; Figure 8 shows a fluid line of the cooling device from Figure 3 in a cross-sectional view along line IV-IV according to another embodiment; Figure 9 shows a fluid line of the cooling device from Figure 3 in a cross-sectional view along line IV-IV according to another embodiment.3 in a cross-sectional view along line IV-IV according to a further embodiment; Carl Zeiss SMT GmbH 27 Fig. 10 shows a support frame of the lithography system from Fig. 1 according to one embodiment, wherein two fluid lines from Fig. 4 are attached to the support frame; Fig. 11 shows a support frame of the lithography system from Fig. 1 according to a further embodiment, wherein two fluid lines in the form of fluid channels are formed in the support frame; Fig. 12 illustrates an attachment of an elastic membrane of the fluid line according to one embodiment; Fig. 13 illustrates an attachment of an elastic membrane of the fluid line according to a further embodiment; Fig. 14 illustrates an attachment of an elastic membrane of the fluid line according to a further embodiment; Fig.Figure 15 shows a flowchart of a method for manufacturing a temperature control device for a lithography system according to one embodiment; and Figure 16 illustrates process steps of the method from Figure 14 according to one embodiment. In the figures, identical or functionally equivalent elements have been provided with the same reference numerals unless otherwise indicated. Furthermore, it should be noted that the representations in the figures are not necessarily to scale. Carl Zeiss SMT GmbH 28 Figure 1 shows an embodiment of a projection exposure system 1 (lithography system), in particular an EUV lithography system. One embodiment of an illumination system 2 of the projection exposure system 1 has, in addition to a light or radiation source 3, an illumination optic 4 for illuminating an object field 5 in an object plane 6.In an alternative embodiment, the light source 3 can also be provided as a separate module from the rest of the lighting system 2. In this case, the lighting system 2 does not include the light source 3. A reticle 7 arranged in the object field 5 is illuminated. The reticle 7 is held by a reticle holder 8. The reticle holder 8 can be moved, in particular in a scan direction, via a reticle displacement drive 9. For illustrative purposes, Fig. 1 shows a Cartesian coordinate system with an x-direction x, a y-direction y, and a z-direction z. The x-direction x runs perpendicularly into the plane of the drawing. The y-direction y runs horizontally, and the z-direction z runs vertically. In Fig. 1, the scan direction runs along the y-direction y. The z-direction z runs perpendicular to the object plane 6. The projection exposure system 1 includes a projection optic 10.The projection optics 10 serve to image the object field 5 onto an image field 11 in an image plane 12. The image plane 12 runs parallel to the object plane 6. Alternatively, an angle other than 0° between the object plane 6 and the image plane 12 is also possible. A structure on the reticulum 7 is imaged onto a photosensitive layer of a wafer 13 located in the image plane 12 within the image field 11. The wafer 13 is held by a wafer holder 14. The wafer holder 14 can be moved, in particular along the y-direction, via a wafer transfer drive 15. The movement of the reticulum 7 via the reticulum transfer drive 9 and of the wafer 13 via the wafer transfer drive 15 can be synchronized with each other. Light source 3 is an EUV radiation source.The light source 3 emits, in particular, EUV radiation 16, which is also referred to below as useful radiation, illumination radiation, or illumination light. The useful radiation 16 has, in particular, a wavelength in the range between 5 nm and 30 nm. The light source 3 can be a plasma source, for example, an LPP source (Laser Produced Plasma) or a DPP source (Gas Discharged Produced Plasma). It can also be a synchrotron-based radiation source. The light source 3 can be a free-electron laser (FEL). The illumination radiation 16 emitted by the light source 3 is focused by a collector 17. Collector 17 can be a collector with one or more ellipsoidal and / or hyperboloid reflection surfaces.The at least one reflective surface of the collector 17 can be illuminated by the illuminating radiation 16 at grazing incidence (GI), i.e., with angles of incidence greater than 45°, or at normal incidence (NI), i.e., with angles of incidence less than 45°. The collector 17 can be structured and / or coated to optimize its reflectivity for the useful radiation and to suppress stray light. After the collector 17, the illuminating radiation 16 propagates through an intermediate focus in an intermediate focal plane 18. The intermediate focal plane 18 can represent a separation between a radiation source module, comprising the light source 3 and the collector 17, and the illumination optics 4. The lighting optics 4 comprise a deflecting mirror 19 and, downstream of this in the beam path, a first faceted mirror 20.The deflecting mirror 19 can be a planar deflecting mirror or, alternatively, a mirror with a beam-shaping effect in addition to its deflecting function. Alternatively or additionally, the deflecting mirror 19 can be designed as a spectral filter that separates a useful wavelength of the illumination radiation 16 from stray light of a different wavelength. If the first faceted mirror 20 is arranged in a plane of the illumination optics 4 that is optically conjugate to the object plane 6 as a field plane, it is also referred to as a field faceted mirror. The first faceted mirror 20 comprises a plurality of individual first facets 21, which can also be called field facets. Only a few of these first facets 21 are shown as examples in Fig. 1.The first facets 21 can be configured as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or semicircular edge contour. The first facets 21 can be configured as planar facets or alternatively as convexly or concavely curved facets. As is known, for example, from DE 102008009600 A1, the first facets 21 themselves can also each be composed of a plurality of individual mirrors, in particular a plurality of micromirrors. The first facet mirror 20 can in particular be configured as a microelectromechanical system (MEMS system). For details, reference is made to DE 102008009600 A1. Carl Zeiss SMT GmbH 31 Between the collector 17 and the deflecting mirror 19, the illumination radiation 16 runs horizontally, i.e., along the y-direction y. In the beam path of the illumination optics 4, a second faceted mirror 22 is arranged downstream of the first faceted mirror 20.If the second faceted mirror 22 is arranged in a pupil plane of the illumination optics 4, it is also referred to as a pupil faceted mirror. The second faceted mirror 22 can also be arranged at a distance from a pupil plane of the illumination optics 4. In this case, the combination of the first faceted mirror 20 and the second faceted mirror 22 is also referred to as a specular reflector. Specular reflectors are known from US 2006 / 0132747 A1, EP 1614 008 B1, and US 6,573,978. The second faceted mirror 22 comprises a plurality of second facets 23. In the case of a pupil faceted mirror, the second facets 23 are also referred to as pupil facets. The second facets 23 can also be macroscopic facets, which can be round, rectangular or hexagonal, for example, or alternatively facets composed of micromirrors.Reference is also made to DE 102008009600 A1 in this regard. The second facets 23 can have planar or, alternatively, convex or concave curved reflective surfaces. The illumination optics 4 thus forms a doubly faceted system. This basic principle is also known as a honeycomb condenser (English: Fly's Eye Integrator). Carl Zeiss SMT GmbH 32 It can be advantageous not to arrange the second facet mirror 22 exactly in a plane that is optically conjugate to a pupil plane of the projection optics 10. In particular, the second facet mirror 22 can be arranged tilted relative to a pupil plane of the projection optics 10, as is described, for example, in DE 102017220586 A1. With the help of the second facet mirror 22, the individual first facets 21 are imaged into the object field 5.The second faceted mirror 22 is the last beam-shaping, or indeed the last, mirror for the illumination radiation 16 in the beam path before the object field 5. In another embodiment of the illumination optics 4, not shown, a transmission optic can be arranged in the beam path between the second faceted mirror 22 and the object field 5, which contributes in particular to imaging the first facets 21 into the object field 5. The transmission optic can have exactly one mirror, or alternatively two or more mirrors, which are arranged one after the other in the beam path of the illumination optics 4. The transmission optic can, in particular, comprise one or two mirrors for perpendicular incidence (NI mirrors, normal incidence mirrors) and / or one or two mirrors for grazing incidence (GI mirrors, grazing incidence mirrors). The illumination optics 4 has, in the embodiment shown in Fig.As shown in Figure 1, there are exactly three mirrors after the collector 17: the deflecting mirror 19, the first faceted mirror 20, and the second faceted mirror 22. In another embodiment of the illumination optics 4, the deflecting mirror 19 can also be omitted, so that the illumination optics 4 after the collector 17 can then have exactly two mirrors: the first faceted mirror 20 and the second faceted mirror 22. Carl Zeiss SMT GmbH 33 The imaging of the first facets 21 by means of the second facets 23 or with the second facets 23 and a transmission optic into the object plane 6 is regularly only an approximation. The projection optics 10 comprises a plurality of mirrors M1 to M6, which are numbered according to their arrangement in the beam path of the projection exposure system 1. In the example shown in Figure 1, the projection optics 10 comprises six mirrors M1 to M6.Alternatives with four, eight, ten, twelve, or any other number of mirrors Mi are also possible. The projection optics 10 are a double-obscured optic. The penultimate mirror M5 and the last mirror M6 each have a passage for the illumination radiation 16. The projection optics 10 have an image-side numerical aperture greater than 0.5, and which can also be greater than 0.6, for example, 0.7 or 0.75. The reflective surfaces of the mirrors Mi can be designed as freeform surfaces without an axis of rotational symmetry. Alternatively, the reflective surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one axis of rotational symmetry of the reflective surface shape. The mirrors Mi, like the mirrors of the illumination optics 4, can have highly reflective coatings for the illumination radiation 16.These coatings can be designed as multilayer coatings, in particular with alternating layers of molybdenum and silicon. The projection optics 10 have a large object-image offset in the y-direction y between a y-coordinate of the center of the object field 5 and a y-coordinate of the center of the image field 11. This object-image offset in the y-direction y can be approximately as large as a z-distance between the object plane 6 and the image plane 12. The projection optics 10 can, in particular, be anamorphic. It exhibits, in particular, different image scales βx, βy in the x- and y-directions x, y. The two magnification ratios βx, βy of the projection optics 10 are preferably at (βx, βy) = (+ / - 0.25, + / - 0.125). A positive magnification ratio β indicates a projection without image inversion. A negative magnification ratio β indicates a projection with image inversion.The projection optics 10 thus results in a reduction ratio of 4:1 in the x-direction x, that is, in the direction perpendicular to the scan direction. The projection optics 10 results in a reduction ratio of 8:1 in the y-direction y, that is, in the scan direction. Other image scales are also possible. Image scales with the same sign and absolute values ​​in the x and y directions x, y, for example with absolute values ​​of 0.125 or 0.25, are also possible. The number of intermediate image planes in the x and y directions x, y in the beam path between the object field 5 and the image field 11 can be the same or, depending on the design of the projection optics 10, can differ. Examples of projection optics with different numbers of such intermediate images in the x and y directions x, y are known from US 2018 / 0074303 A1.Each of the second facets 23 is assigned to exactly one of the first facets 21 to form an illumination channel for illuminating the object field 5. This can result, in particular, in illumination according to Köhler's principle. The far field is divided into a multitude of object fields 5 with the aid of the first facets 21. The first facets 21 generate a plurality of images of the intermediate focus onto the second facets 23 assigned to them. The first facets 21 are each superimposed by an assigned second facet 23 onto the reticle 7 to illuminate the object field 5. The illumination of the object field 5 is, in particular, as homogeneous as possible. It preferably exhibits a uniformity error of less than 2%. Field uniformity can be achieved by superimposing different illumination channels.The illumination of the entrance pupil of the projection optics 10 can be geometrically defined by arranging the second facets 23. By selecting the illumination channels, in particular the subset of the second facets 23 that carry light, the intensity distribution in the entrance pupil of the projection optics 10 can be adjusted. This intensity distribution is also referred to as the illumination setting or illumination pupil filling. A preferred pupil uniformity in the area of ​​defined illuminated sections of an illumination pupil of the illumination optics 4 can also be achieved by redistributing the illumination channels. Further aspects and details of the illumination of the object field 5, and in particular the entrance pupil of the projection optics 10, are described below. The projection optics 10 can, in particular, have a homocentric entrance pupil. This can be accessible. It can also be inaccessible.Carl Zeiss SMT GmbH 36 The entrance pupil of the projection optics 10 cannot regularly be illuminated exactly by the second faceted mirror 22. When the projection optics 10 image the center of the second faceted mirror 22 telecentrically onto the wafer 13, the aperture rays often do not intersect at a single point. However, a surface can be found where the pairwise determined separation of the aperture rays is minimized. This surface represents the entrance pupil or a surface conjugate to it in spatial space. In particular, this surface exhibits a finite curvature. It is possible that the projection optics 10 has different positions of the entrance pupil for the tangential and sagittal beam paths. In this case, an imaging element, in particular an optical component of the transmission optics, should be provided between the second faceted mirror 22 and the reticule 7.With the aid of this optical element, the different positions of the tangential and sagittal entrance pupils can be taken into account. In the arrangement of the components of the illumination optics 4 shown in Fig. 1, the second faceted mirror 22 is arranged in a plane conjugate to the entrance pupil of the projection optics 10. The first faceted mirror 20 is tilted relative to the object plane 6. The first faceted mirror 20 is tilted relative to an arrangement plane defined by the deflecting mirror 19. The first faceted mirror 20 is tilted relative to an arrangement plane defined by the second faceted mirror 22. Fig. 2 shows an optical system 100 with an optical component 102 (as an example of a position-sensitive component) according to one embodiment.Carl Zeiss SMT GmbH 37 The optical component 102 is, for example, a mirror of the projection exposure system 1 (lithography system), in particular of the projection optics 10, from Fig. 1. The optical component 102 is, for example, one of the mirrors M1–M6. In the following, the position-sensitive component 102 is described as a mirror; however, in other examples, it may also be a different optical or mechanical component of the projection exposure system 1 than a mirror. As shown in Fig. 2, the mirror 102 comprises a coating 104 with an optically active surface 106. The mirror 102 also comprises a substrate 108. Cooling lines 110 are arranged in the substrate 108, through which a cooling fluid 112, such as water, is passed to actively cool the mirror 102. Cooling the mirror 102 serves to prevent thermal deformations of the mirror 102, also known as... B. when exposed to high-energy EUV radiation 16 (Fig.1) to avoid. The mirror 102 is movably attached to a support frame 116 by means of an actuator assembly 114. The actuator assembly 114 has, for example, several actuators 118 and a drive unit (not shown). The actuator assembly 114 serves, for example, to position the mirror 102 with respect to six degrees of freedom (translation in the x, y, and z directions and rotation about the x, y, and z directions in Fig. 2). The optical system 100 also has a sensor device 120 to detect the current position of the mirror 102. The sensor device 120 is only schematically indicated in Fig. 2. The sensor device 120 has one or more sensors, such as interferometers. The sensors of the sensor device 120 are, for example, attached to a sensor frame (not shown). The sensor frame, for example, is vibration-decoupled and attached to the support frame 116.For example, the current position of the Carl Zeiss SMT GmbH 38 mirror 102 is detected using laser beams 122. The sensor device 120 is configured, for example, to detect the position of the mirror 102 in its six degrees of freedom. Figure 3 shows a cooling device 200 (as an example of a temperature control device) for cooling a position-sensitive component 102 (e.g., the mirror 102). The cooling device 200 has a cooling circuit 202. The cooling device 200 comprises a cooling unit 204 for cooling a coolant 206 and a fluid line 208 (cooling line 208) for transporting the coolant 206. The cooling device 200 also includes one or more pumps 210 for generating a required coolant flow rate of the coolant 206. The cooling device 200 further includes one or more valves 212 for controlling the coolant flow.Although not shown in the figures, the cooling device 200 can also be used to cool several position-sensitive components 102 of the lithography system 1. Pumps of the cooling device 200, such as pump 210, cause local pressure fluctuations of the coolant 206. These pressure fluctuations are transmitted throughout the entire cooling circuit 202 via longitudinal water-borne sound waves. Furthermore, changes in cross-section (not shown) of the cooling line 208, bends 214 of the cooling line 208, and valves 212 of the cooling device 200 can also represent sources of disturbance that cause local pressure fluctuations of the coolant 206. Such acoustic disturbances are transmitted to the cooled position-sensitive component 102 (e.g., the mirror 102) via water-borne sound. This can lead to an undesired change in the position of the position-sensitive component 102.Carl Zeiss SMT GmbH 39 To dampen pressure fluctuations of the coolant 206, the cooling device 200 comprises a silencer device 216. The silencer device 216 has a sound-dampening element 218. The sound-dampening element 218 has, in particular, an elastic material 220, which can deform elastically and thus at least partially dissipate the energy of a pressure fluctuation of the coolant 206. The elastic material 220 is, for example, a viscoelastic material. The sound-dampening element 218 is, in particular, arranged such that it provides a liquid-tight seal for a liquid chamber 222 of the liquid line 208 in a line section 224 of the liquid line 208.The pipe section 224 of the liquid line 208 is, in particular, a section of the liquid line 208 with respect to a longitudinal direction of the liquid line 208, a routing direction of the liquid line 208, and / or a flow direction S of the liquid 206 in the liquid line 208. The pipe section 224 of the liquid line 208 has, for example, a length L1 with respect to the longitudinal direction of the liquid line 208, the routing direction of the liquid line 208, and / or the flow direction S of the liquid 206 in the liquid line 208. Figure 4 shows a cross-section of the liquid line 208 along line IV-IV in Figure 3. In this example, the liquid line 208 has a liquid pipe 226. The liquid pipe 226 is made of a rigid material 227, such as metal and / or stainless steel.The liquid pipe 226 has an outer wall 228, which separates the liquid chamber 222 from an outer chamber 230 (i.e., an ambient chamber of the liquid line 208). As can be seen in Fig. 4, the liquid line 208 has a first circumferential section 232 and a second circumferential section 234 with respect to a circumference U1 of the liquid line 208. The first circumferential section 232 and the second circumferential section 234 together form a closed circumference U1 of the liquid line 208. The first circumferential section 232 is formed by the liquid pipe 226. The second circumferential section 234 has the sound-dampening element 218 with the elastic material 220. In the example shown in Fig. 4, the second circumferential section 234 consists exclusively of the elastic material 220. In other examples, the second circumferential section 234 may also consist only essentially (e.g.The second circumferential section 234 consists of more than 80%, more than 90%, more than 95%, and / or more than 99% of the elastic material 220. For example, in addition to the (visco-)elastic material 220, the second circumferential section 234 may also comprise a fabric or similar material integrated into the (visco-)elastic material 220. The elastic material 220 of the second circumferential section 234, i.e., the sound-absorbing element 218, is particularly more elastic than the material 227 of the first circumferential section 232, i.e., the liquid tube 226. The second circumferential section 234, i.e., the sound-absorbing element 218, is in particular a membrane 236 (e.g., a separating membrane) that separates the liquid space 222 from a gas space 238. In the example of Fig. 4, the gas space 238 is an open gas space provided by an ambient space 230 of the liquid line 206. Although in Fig.Not shown in Figure 4, more than one first circumferential section 232 and more than one second circumferential section 234 may also be provided (e.g., Figure 6). The fluid tube 226 in Figure 4 has a circular cross-section Q1, from which a secant is cut off to accommodate the sound-absorbing element 218. It can also be said that a raw fluid tube C (Figure 16), from which the fluid tube 226 shown in Figure 4 is made, has a circular cross-section Q1. In the example of Figure 4, the sound-absorbing element 218 has a planar shape P1 (i.e., a plate shape). Each of the sound-absorbing elements 218 to 818 shown herein may, for example, have a planar shape P1 or may also have another geometric shape. For example, the silencer element 218, 518, 718 can also have a curved and / or bent shape.For example, the silencer element 218, 518, 718 can have a curved and / or bent shape that follows a curvature of the corresponding liquid pipe 226, 526, 726. Figure 5 shows a cross-section along line IV-IV of a liquid line 308 of the cooling device 200 from Figure 2 according to a further embodiment. Similar to the liquid line 208 in Figure 4, the liquid line 308 in Figure 5 also has a liquid pipe 326, which is made of metal, e.g., stainless steel. In contrast to Figure 4, a cross-section Q2 of the liquid pipe 326 is rectangular. B. square.Furthermore, the liquid line 308 in Fig. 5 – similar to the liquid line 208 in Fig. 4 – has a first circumferential section 332 and a second circumferential section 334 with respect to a circumference U2 of the liquid line 308.The first circumferential section 332 and the second circumferential section 334 together form a closed circumference U2 of the liquid line 308. The first circumferential section 332 is formed by the liquid pipe 326. The second circumferential section 334 has – similar to Fig. 4 – a sound-absorbing element 318 with an elastic material 320. The elastic material 320 is, for example, a viscoelastic material. Furthermore, the second circumferential section 334, i.e., the sound-absorbing element 318, in particular a membrane 336 (e.g., a separating membrane), separates a liquid space 322 from a gas space 338. In the example of Fig. 5, the gas space 338 is also an open gas space provided by an ambient space 330 of the liquid line 206. Fig. 6 shows a view similar to Fig. 5, in which a liquid line 408 of the cooling device 200 from Fig. 2 is shown according to a further embodiment.Similar to the liquid line 308 in Fig. 5, the liquid line 408 in Fig. 6 also has a liquid pipe 426, which is made of metal, e.g., stainless steel. A cross-section Q3 of the liquid pipe 426 is rectangular, e.g., square, similar to the cross-section Q2 in Fig. 5. Furthermore, the liquid line 408 in Fig. 6—similar to the liquid line 208 in Fig. 4 and the liquid line 308 in Fig. 5—has several different circumferential sections 432a, 432b, 434a, 434b with respect to a circumference U3 of the liquid line 408. The several circumferential sections 432a, 432b, 434a, 434b together form a closed circumference U3 of the liquid line 408. In contrast to the liquid line 208 in Fig. 4 and the liquid line 308 in Fig. 5, the liquid line 408 in Fig. 6 has two first circumferential sections 432a, 432b, which are formed by the liquid pipe 426.Furthermore, the liquid line 408 in Fig. 6 comprises two second circumferential sections 434a, 434b, each of which has (or consists of) a sound-absorbing element 418a, 418b made of an elastic material 420 (e.g., viscoelastic material 420). The sound-absorbing elements 418a, 418b can also have different (visco-)elastic materials 420. Each of the two second circumferential sections 434a, 434b, i.e., each of the two sound-absorbing elements 418a, 418b, forms a membrane 436a, 436b, Carl Zeiss SMT GmbH 43 which separates a liquid space 422 of the liquid line 408 from a gas space 438. In the example of Fig. 6, the gas space 438 is also an open gas space provided by an ambient space 430 of the liquid line 408. Two first circumferential sections 432a, 432b and two second circumferential sections 434a, 434b are shown by way of example in Fig. 6. However, a liquid line 208, 308, 408 of the cooling device 200 (Fig.3) may also have a different number of first circumferential sections and second circumferential sections. As shown in Figs. 7 and 8, the cooling device 200 (Fig. 3), in particular the silencer device 216, may also have a closed gas chamber 540, 640 associated with each elastic diaphragm 536, 636. The respective gas chamber 540, 640 serves to hold a gas 542, 642. In addition to damping pressure fluctuations of the cooling fluid 206 by means of the elastic material 520, 620 itself, the closed gas chamber 540, 640 can also provide damping of pressure fluctuations of the cooling fluid 206 due to a compressible gas volume. In Fig. 7, a liquid tube 526 is shown similarly to that shown in Fig. 4. Furthermore, a sound damping element 518 can be seen, which is arranged (e.g. attached) to the liquid pipe 526.The sound-absorbing element 518 comprises an elastic material 520, which can deform elastically and thus at least partially dissipate the energy of a pressure fluctuation of the coolant 206. The liquid line 508 in Fig. 7 comprises, with respect to a circumference U4 of the liquid line 508, a first circumferential section 532, which is formed by the liquid tube 526. Furthermore, the liquid line 508 comprises, with respect to circumference U4, a second circumferential section 534, which is formed by the sound-absorbing element 518 with the elastic material 520. Carl Zeiss SMT GmbH 44 The gas chamber 540 has a gas space 544 for receiving the gas 542. The gas 542 in the gas chamber 540 is, for example, adjusted to a predetermined gas pressure (pre-charge pressure) before the cooling device is put into operation. The sound-absorbing element 518 now forms a separating membrane 536, which separates the gas space 544 from a liquid space 522 of the liquid line 508.The separating membrane 536 separates the gas space 544, in particular in a liquid-tight manner, from the liquid space 522. The separating membrane 536 also separates the gas space 544, for example, in a gas-tight manner from the liquid space 522. Fig. 8 shows a liquid line 608 according to a further embodiment. The liquid line 608 is similar to the liquid line 308 in Fig. 5; in particular, it also has a liquid pipe 626 with a rectangular cross-section Q2. In contrast to the liquid line 308 in Fig. 5, the liquid line 608 has a closed gas chamber 640 similar to the gas chamber 540 in Fig. 7. The liquid line 608 in Fig. 8 comprises – similarly to the liquid line 308 in Fig. 5 – a liquid pipe 626 with a rectangular cross-section Q2.5 – with respect to a circumference U5 of the liquid line 608, a first circumferential section 632, which is formed by the liquid pipe 626, and a second circumferential section 634, which is formed by a sound-absorbing element 618 with an elastic material 620. The sound-absorbing element 618 forms a separating membrane 636, which separates a gas space 644 of the gas chamber 640 from a liquid space 622 of the liquid line 608. Fig. 9 shows a liquid line 708 of the cooling device 200 from Fig. 3 according to a further embodiment (in cross-section along line IV-IV in Fig. 3). The liquid line 708 has – similar to the liquid line 208 in Fig. 4 – a silencer element 718 with an elastic material 720, which is arranged (e.g., attached) to a liquid pipe 726 of the liquid line. Carl Zeiss SMT GmbH 45 The liquid line 708 has – similar to the liquid line 208 in Fig.4 – a first circumferential section 732, which is formed by the liquid pipe. Furthermore, the liquid line 708 has a second circumferential section 734, which is formed by the silencer element 718. As illustrated in Fig. 9, the liquid line 708 also includes a limiting element 746, which is arranged adjacent to the at least one second circumferential section 734, i.e., to the silencer element 718. In the example of Fig. 9, the limiting element 746 is also arranged within the liquid space 722 of the liquid line 708. That is, in the example of Fig. 9, the limiting element 746 is arranged in the coolant 206. The limiting element 746, for example, has a rigid grid structure or another rigid structure with openings, so that the limiting element 746 is permeable to the coolant 206.In other examples, the limiting element 746 can also have a flexible grid structure (e.g., threads, wires, and / or fibers) or another flexible structure with openings. The limiting element 746 is designed to spatially limit elastic movement and / or deformation of the second circumferential section 734, i.e., the elastic silencer element 718. By arranging the limiting element 746, the silencer element 718 can only move into the fluid space 722 of the fluid line 708 up to the limiting element 746. In the example of Fig. 9, the silencer element 718 has a planar shape P1 (i.e., a plate shape) with a principal plane of extension that extends into the plane of the drawing. In the example of Fig. 9, the boundary element 746 also has, as an example, a planar shape P2 with a principal extent plane that extends into the drawing plane.Furthermore, the silencer element Carl Zeiss SMT GmbH 46718 and the limiting element 746 are shown arranged parallel to each other (i.e., so that their main planes of extension are parallel to each other). Although not shown in Fig. 9, the fluid line 708 can also have a gas chamber – similar to that shown in Fig. 7. In addition, a limiting element – ​​similar to the limiting element 746 in Fig. 9 – can also be used with one, several, or all of the fluid lines 208, 308, 408, 508, 608, 808 shown in Figs. 4 to 8 and 11. Fig. 10 illustrates the mounting of two fluid lines 208 on a body K1, e.g. B. a support element and / or a support frame, the lithography system 1. Although two fluid lines 208 are shown attached to the body K1 in Fig. 10, there may also be only one fluid line 208 or more than two fluid lines 208 attached to the rigid body K1.Furthermore, the one or more fluid lines 208 attached to the body K1 can be any of the fluid lines 208, 308, 408, 508, 608, 708 shown in Figures 4 to 9. As illustrated in Figure 11, however, a fluid line 808 can also have a fluid channel 848 formed in a solid body K2 instead of a fluid pipe 226, 326, 426, 526, 626, 726 with an outer wall 228 (Figures 4 to 9). Figure 11 shows two fluid lines 808 in cross-section by way of example, the cross-section being perpendicular to a respective longitudinal direction of the fluid lines 808 or to a flow direction S of the cooling fluid in the fluid lines 808. However, it is also possible to provide only one liquid line 808 or more than two liquid lines 808, each having a liquid channel 848 formed in the solid body K2.Carl Zeiss SMT GmbH 47 A respective fluid channel 848 is, for example, cut and / or milled into the solid body K2. However, the respective fluid channel 848 can also be formed in the solid body K2 in another way. In particular, a respective fluid channel 848 is formed in the solid body K2 such that, viewed in cross-section, the fluid channel 848 is open towards an outer surface 850 of the solid body K2. That is, a respective fluid channel 848 has an opening 852 on the outer surface 850. A respective fluid channel 848 can also be described as a channel and / or as a depression with respect to the outer surface 850 of the solid body K2. A first circumferential section 832 of the fluid conduit 808 is formed by the surfaces of the fluid channel 848. A second circumferential section 834 of the fluid line 808 is formed by the silencer element 818 with the elastic membrane.The fluid channel 848 is shown in Fig. 11 with a rectangular cross-section Q3. In other examples, however, a fluid channel 848 formed in the solid body K2 can also have a different cross-sectional shape, e.g., round, with rounded corners, circular, oval, polygonal, etc. Furthermore, each of the fluid lines 808 has a silencer element 818, which covers the corresponding opening 852. In the embodiment of the fluid line 808 as formed in a solid body of the lithography system 1, e.g., milled, installation space in the lithography system 1 can be saved. In particular, in contrast to the example in Fig. 10, essentially no additional installation space is required for the fluid line(s) 808 in Fig. 11. Furthermore, the channels 848 are easy to manufacture (Carl Zeiss SMT GmbH 48) and offer the possibility of realizing even complex geometries of fluid lines 808. The solid body K2 can, for example,a support frame of the lithography system 1. Optionally, a gas chamber 840 – similar to gas chamber 540 in Fig. 7 and gas chamber 640 in Fig. 8 – can be provided on the liquid line 808, as indicated by dashed lines in Fig. 11. Optionally, although not shown in Fig. 11, the liquid line 808 can also have more than one second circumferential section 834 in cross-section, i.e., more than one separating membrane. A spacer can be provided, for example, between each pair of the multiple second circumferential sections 834. Figures 12 to 14 show various embodiments of attaching a silencer element 918, 918', 918" to a liquid line, such as... B. one of the liquid lines 208, 308, 408, 508, 608, 708 and 808, shown at a fastening section 954 of the corresponding liquid line.The mounting section 954 of the corresponding fluid line, to which the silencer element 918, 918', 918" is attached, can, for example, be a section of a wall 228 of a fluid pipe 226, 326, 426, 526, 626, 726 (Figures 4 to 9) or can be a section of a solid body K2 in which a fluid channel 848 is formed (Figure 11). As can be seen in Figure 12, an end section 956 of the silencer element 918 can, for example, be clamped between two mounting sections 954. As can be seen in Figure 13, an end section 956' of the silencer element 918' can, for example, have a section projecting (e.g., curved) from a main extension plane of the silencer element 918'. which engages a recess 958' of a fastening section 954'. As shown in Fig.As can be seen in Figure 14, an end section 956" of the silencer element 918" can, for example, have a section projecting from a main extension plane of the silencer element 918" that engages in a recess 958" of a mounting section 954". Although not shown in Figures 12 to 14, a further end section of the silencer element 918, 918', 918" opposite the respective end section 956, 956', 956" shown can be designed similarly (e.g., mirror-symmetrically) to the end section 956, 956', 956" shown. Furthermore, the further end section can be attached to a corresponding mounting element (similar to the mounting element 954). 954', 954", e.g., mirror-symmetrical) in a similar manner. In the following, a method for manufacturing a temperature control device 200 for a lithography system 1 is described with reference to Fig. 15. The temperature control device 200 (Fig.3) is specifically designed for temperature control of a position-sensitive component 102 of the lithography system 1. Furthermore, the temperature control device 200 has a liquid line 208, 308, 408, 508, 608, 708, 808 for transporting a temperature control fluid 206. In a first step S1 of the process, a preform A (Fig. 16) of the liquid line 208 is provided, wherein the preform A of the liquid line 208 has at least one opening B in cross-section. Carl Zeiss SMT GmbH 50 In a first variant S1' of step S1, a raw liquid tube C with a closed outer wall 228' in cross-section is initially provided, as shown in Fig. 16 above. Next, a section D of the outer wall 228' in cross-section is removed to create the at least one opening B. For example, section D of the outer wall 228' is cut off. In the middle of Fig.Figure 16 shows the preform A of the liquid channel 208 with the created opening B. It should be noted that the section D of the outer wall 228', which is removed to create the at least one opening B, can also be smaller or larger than shown in Figure 16. In other words, the arc length L2 of section D can also be smaller or larger than shown in Figure 16. A smaller arc length L2 of section D is particularly advantageous if a flat membrane 236 is to be used. This is because, with a smaller arc length L2 of section D, the opening B is also smaller in cross-section and can be more easily covered by a flat membrane 236. Furthermore, this flat membrane 236 is easier to attach. In a second variant S2' of step S1, a solid body K2 (Figure 11) of the lithography system 1 is first provided. Then, a liquid channel 848 is formed in the solid body K2.Furthermore, the fluid channel 848 is designed such that, viewed in cross-section, it is open towards an outer surface 850 of the solid body K2 to form the at least one opening 852. The fluid channel 848 is formed, for example, by cutting, machining, and / or milling in the solid body K2. Carl Zeiss SMT GmbH 51. In a second step S2 of the process, at least one elastic membrane 236 is attached to the preform A of the fluid line 208 so that the at least one opening B is covered. This is illustrated in Fig. 16 below. The method can be used to manufacture each of the liquid lines 208, 308, 408, 508, 608, 708, 808 (Figures 4 to 11). This allows for the simple manufacture of a liquid line 206 with an elastic diaphragm 236 as a silencer element 218 for damping pressure fluctuations of the liquid 206.In particular, the fluid line 206 is manufactured such that, with respect to its circumference U1, it has at least a first circumferential section 232 and at least one second circumferential section 234, wherein the elastic membrane 236 is present only in the second circumferential section 234. The temperature control device 200 can, for example, also be used in a DUV lithography system. Although the present invention has been described with reference to exemplary embodiments, it can be modified in many ways.

[0002] Carl Zeiss SMT GmbH 52 REFERENCE SYMBOL LIST 1 Projection exposure system 2 Lighting system 3 Light source 4 Lighting optics 5 Object field 6 Object plane 7 Retikel 8 Reticle holder9 Reticle displacement drive10 Projection optics11 Image field12 Image plane 13 Wafer14 Wafer holder 15 Wafer transfer drive 16 Illumination beam 17 Collector 18 Intermediate focus plane 19 Deflection mirror 20 First facet mirror 21 First facet 22 Second facet mirror 23 Second facet 100 Optical system 102 Position-sensitive component 104 Coating 106 Optically active area 108 Substrate Carl Zeiss SMT GmbH 53110 Cooling line 112 Coolant 114 Actuator assembly 116 Support frame 118 Aktor 120 Sensor device 122 Laser beam 200 Temperature control device (cooling device) 202 Cooling circuit 204 Temperature control unit (cooling unit) 206 Temperature control fluid (cooling fluid) 208 Fluid line 210 Pumpe212 Valve 214 Deflection 216 Silencer device 218 Sound damping element 220 Elastic material 222 Liquid chamber 224 Pipe section 226 Liquid pipe 227 Material 228, 228' Outer wall 230 Outer chamber 232 Circumferential section 234 Circumferential section 236 Membrane 238 Gas chamber 308 Liquid pipe 318 Sound damping element Carl Zeiss SMT GmbH 54320 Elastic material 322 Liquid chamber 326 Liquid pipe 330 Ambient chamber 332 Circumferential section 334 Circumferential section 336 Membrane 338 Gas chamber 408 Liquid pipe 418a Sound damping element 418b Sound damping element 420 Elastic material 422 Liquid chamber 426 Liquid pipe 430 Ambient chamber 432a Circumferential section 432b Circumferential section 434a Circumferential section 434b Circumferential section 436a Membrane 436b Membrane 438 Gas space 508 Liquid line 518 Sound damping element 520 Elastic material 522 Liquid space 526 Liquid pipe 532 Circumferential section 534 Circumferential section 536 Membrane Carl Zeiss SMT GmbH 55540 Gas chamber 542 Gas544 Gas space 608 Liquid line 618 Sound damping element 620 Elastic material 622 Liquid space 626 Liquid pipe 632 Circumferential section 634 Circumferential section 636 Separating membrane 640 Gas chamber 642 Gas 644 Gas space 708 Liquid line 718 Silencer element 720 Elastic material 722 Liquid space 726 Liquid pipe 732 Circumferential section 734 Circumferential section 746 Limiting element 808 Liquid line 818 Silencer element 832 Circumferential section 834 Circumferential section 840 Gas chamber 848 Kanal 850 Outer side 852 Opening Carl Zeiss SMT GmbH 569 18, 918', 918'' Silencer element 954, 954', 954'' Mounting section 956, 956', 956'' End section 958', 958'' Recess A Vorform B Öffnung C Raw-liquid pipe D section K1 Körper K2 Körper L1 Länge L2 arc length M1-M6 mirror P1 Form P2 Form Q1-Q3 Cross-sectionS DirectionS1-S2, S1', S" Process stepsU1-U5 Circumferencex, y, z Directions

Claims

Carl Zeiss SMT GmbH 57 PATENT CLAIMS1. Temperature control device (200) for temperature control of a position-sensitive component (102) of a lithography system (1), comprising a fluid line (208) for transporting a temperature control fluid (206), wherein the fluid line (208) has at least one first circumferential section (232) and at least one second circumferential section (234), which together form a closed circumference (U1) of the fluid line (208), the at least one second circumferential section (234) comprising an elastic material (220) for damping a pressure fluctuation of the temperature control fluid (206), which is more elastic than a material (227) of the at least one first circumferential section (232), and the fluid line (208) comprising a fluid tube (226) with an outer wall (228), and at least one section (D) of the outer wall (228) through the at least one second circumferential section (234) is replaced.2.Temperature control device according to claim 1, wherein the at least one second circumferential section (234, 534) forms at least one separating membrane (236, 536) that separates a liquid space (222, 522) of the liquid line (208, 508) from at least one gas space (238, 544).

3. Temperature control device according to claim 2, wherein the at least one gas space (238) is an open gas space formed by an ambient space (230) of the liquid line (208).

4. Temperature control device according to claim 2, comprising at least one closed gas chamber (540) for receiving a gas (542) and for providing the at least one gas space (544), wherein the at least one gas chamber (540) is arranged on the liquid line (508) adjacent to the at least one second circumferential section (534), so that the at least one second. Carl Zeiss SMT GmbH 58 Circumferential section (534) separates the gas space (544) of the at least one gas chamber (540) from the liquid space (522) of the liquid line (508).

5. Temperature control device according to one of claims 1 to 4, wherein the liquid line (208), a liquid pipe (226) of the liquid line (208) and / or a raw liquid pipe (C) from which the liquid pipe (226) is made each has a cross-section (Q1, Q2, Q3) with a circular, oval, polygonal, regularly polygonal, rectangular, square and / or triangular shape.

6. Temperature control device according to one of claims 1 to 5, wherein the at least one second circumferential section (234) has a planar shape (P1) and / or a plate shape (P1).

7. Temperature control device according to one of claims 1 to 6, wherein at least one second circumferential section (234) is attached to an outer wall (228) of the liquid line (208).8.Temperature control device according to one of claims 1 to 7, wherein the fluid line (708) has at least one limiting element (746) which is arranged adjacent to the at least one second circumferential section (734), and the at least one limiting element (746) is configured to spatially limit elastic movement and / or deformation of the at least one second circumferential section (734).

9. Lithography system (1) with a position-sensitive component (102) and a temperature control device (200) according to one of claims 1 to 8 for temperature control of the position-sensitive component (102). Carl Zeiss SMT GmbH 5910. Method for manufacturing a temperature control device (200) according to one of claims 1 to 8 for a lithography system (1), comprising the steps: a) providing (S1) a preform (A) of the liquid line (208), wherein the preform (A) of the liquid line (208) has at least one opening (B) in cross-section, and b) attaching (S2) at least one elastic membrane (236) to the preform (A) of the liquid line (208) such that the at least one opening (B) is covered.

11. Method according to claim 10, wherein in step a): a raw liquid tube (C) with an outer wall (228') closed in cross-section is provided (S1'), and at least a section (D) of the outer wall (228') is removed in cross-section (S1') to create the at least one opening (B).

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