Garment simulation method and apparatus

Abstract

Disclosed are a method and an apparatus for simulating a garment. According to an embodiment, the garment simulation method for knitwear comprises the steps of: extending a garment pattern by adding a margin mesh to the garment pattern corresponding to knitwear; mapping a vertex of a yarn corresponding to the knitwear to the mesh of the extended garment pattern; and generating rendering information of the knitwear by simulating the garment pattern in which the yarn is disposed, on the basis of a mapping relationship between the vertex and the mesh of the garment pattern.

Description

Clothing simulation method and device

[0001] The following examples relate to a clothing simulation method and device, and more specifically, to a clothing simulation method and device for knitwear.

[0002] Clothing (or garments) appear three-dimensional when worn, but are actually closer to two-dimensional, consisting of pieces of fabric cut according to a two-dimensional pattern. Because the fabric used for clothing is flexible, its shape can change in various ways depending on the wearer's body shape and movements. Furthermore, fabrics can have various physical properties, such as strength, elasticity, and shrinkage, and differences in these properties can result in differences in the appearance and feel of clothing even within the same design. In the fashion industry, computer-based clothing simulation technology is widely used to develop actual clothing designs. Therefore, there is a growing need for the development of clothing simulation technology that can realistically represent clothing depending on the material used.

[0003] A clothing simulation method for knitwear according to one embodiment includes a step of extending a clothing pattern corresponding to the knitwear by adding a margin mesh to the clothing pattern; a step of mapping a vertex of a yarn corresponding to the knitwear to a mesh of the extended clothing pattern; and a step of generating rendering information of the knitwear by simulating the clothing pattern in which the yarn is arranged based on a mapping relationship between the vertex and the mesh of the clothing pattern.

[0004] The step of mapping the vertex to the mesh of the extended clothing pattern may include the step of obtaining a parameter corresponding to a deformation state of a material space corresponding to the clothing pattern; the step of interpolating a displacement calculated in advance based on the parameter corresponding to a deformation state sample to obtain a displacement of the vertex corresponding to the parameter; and the step of determining a position of the vertex corresponding to the deformation state in the material space based on the obtained displacement.

[0005] The step of generating rendering information of the knitwear may include the step of obtaining a position in world space corresponding to the knitwear of the vertex based on a position in the material space of the vertex corresponding to the deformation state; and the step of generating rendering information of the knitwear based on the obtained position in world space.

[0006] The above margin mesh can be added to a certain width in an area outside the boundary of the above clothing pattern.

[0007] The step of extending the above clothing pattern may include a step of adding the margin mesh having a curvature of a certain size to the clothing pattern corresponding to the knitwear.

[0008] The step of extending the garment pattern may include a step of adding the margin mesh to the garment pattern based on the physical property data of the knitwear.

[0009] The physical property data of the above knitwear may include at least one of setting information on whether the margin mesh is added, size information of an area where the margin mesh is generated, and curvature information of the margin mesh.

[0010] The above vertex may include at least one vertex located on the centerline of the yarn.

[0011] The step of generating rendering information of the knitwear may include a step of tessellating the centerline of the yarn into a cylinder mesh; and a step of generating rendering information of the knitwear by simulating the garment pattern in which the tessellated yarn is arranged based on the mapping relationship between the vertices and the mesh of the garment pattern.

[0012] The step of mapping the vertices to the mesh of the extended garment pattern may include the step of copying the vertices of the yarn mapped to the area where the first mesh and the second mesh overlap in the garment pattern, and mapping each of the copied vertices to the first mesh and the second mesh.

[0013] The above first mesh and the above second mesh may be included in the above margin mesh.

[0014] The step of mapping the vertices to the mesh of the extended garment pattern may include the step of moving the vertices of the yarn located outside the extended garment pattern onto the boundary line of the extended garment pattern.

[0015] The step of mapping the vertices to the mesh of the extended garment pattern may include the step of rotating the yarn based on direction information of a knit fabric corresponding to the knitwear; and the step of mapping the vertices of the rotated yarn to the mesh of the extended garment pattern.

[0016] An electronic device according to one embodiment includes at least one processor including processing circuitry; and a memory storing instructions, which, when individually or collectively executed by the at least one processor, cause the electronic device to perform the following operations: extending a garment pattern corresponding to a knitwear by adding a margin mesh to the garment pattern; mapping vertices of yarns corresponding to the knitwear to a mesh of the extended garment pattern; and generating rendering information of the knitwear by simulating the garment pattern in which the yarns are arranged based on a mapping relationship between the vertices and the mesh of the garment pattern.

[0017] The operation of mapping the vertex to the mesh of the extended clothing pattern may include: obtaining a parameter corresponding to a deformation state of a material space corresponding to the clothing pattern; interpolating a displacement calculated in advance based on the parameter corresponding to a deformation state sample to obtain a displacement of the vertex corresponding to the parameter; and determining a location of the vertex corresponding to the deformation state in the material space based on the obtained displacement.

[0018] The operation of generating rendering information of the knitwear may include an operation of obtaining a position in world space corresponding to the knitwear of the vertex based on a position in the material space of the vertex corresponding to the deformation state; and an operation of generating rendering information of the knitwear based on the obtained position in world space.

[0019] The operation of extending the above clothing pattern may include an operation of adding the margin mesh having a curvature of a certain size to the clothing pattern corresponding to the knitwear.

[0020] The operation of extending the above clothing pattern may include an operation of adding the margin mesh to the above clothing pattern based on the physical property data of the knitwear.

[0021] The physical property data of the above knitwear may include at least one of setting information on whether the margin mesh is added, size information of an area where the margin mesh is generated, and curvature information of the margin mesh.

[0022] The operation of generating rendering information of the knitwear may include an operation of tessellating the center line of the yarn into a cylinder mesh; and an operation of generating rendering information of the knitwear by simulating the garment pattern in which the tessellated yarn is arranged based on the mapping relationship between the vertices and the mesh of the garment pattern.

[0023] The operation of mapping the vertices to the mesh of the extended garment pattern may include an operation of copying the vertices of the yarn mapped to an area where the first mesh and the second mesh overlap in the garment pattern, and mapping each of the copied vertices to the first mesh and the second mesh.

[0024] Figure 1 is a flowchart of an operation of a clothing simulation method for knitwear according to one embodiment.

[0025] FIGS. 2A and 2B are drawings for explaining an area where a margin mesh is added in a clothing pattern according to one embodiment.

[0026] FIGS. 3A to 3C are drawings for explaining an operation of mapping each copied vertex to a first mesh and a second mesh that overlap each other according to one embodiment.

[0027] FIGS. 4A and 4B are drawings for explaining an operation of adjusting the position of a vertex of a yarn mapped to the outside of a garment pattern according to one embodiment.

[0028] FIGS. 5A to 5C are drawings illustrating the shape of a knitwear according to the direction information of a knit fabric according to one embodiment.

[0029] FIG. 6 is a drawing illustrating a user interface screen for setting physical property data of knitwear according to one embodiment.

[0030] FIGS. 7A to 12 are drawings for explaining a yarn-based knitting simulation method according to one embodiment.

[0031] Figure 13 is an exemplary diagram of the configuration of an electronic device according to one embodiment.

[0032] Specific structural or functional descriptions of the embodiments are disclosed for illustrative purposes only and may be modified and implemented in various forms. Therefore, the actual implementation is not limited to the specific embodiments disclosed, and the scope of this specification includes modifications, equivalents, or alternatives within the technical concepts described in the embodiments.

[0033] In connection with the description of the drawings, similar reference numerals may be used for similar or related components. The singular form of the noun corresponding to an item may include one or more of said items, unless the context clearly indicates otherwise.

[0034] In this document, each of the phrases "A or B", "at least one of A and B", "at least one of A or B", "A, B, or C", "at least one of A, B, and C", and "at least one of A, B, or C" may include any one of the items listed together in that phrase, or all possible combinations thereof.

[0035] Terms such as "first," "second," or "first" or "second" may be used simply to distinguish one component from another and do not limit the components in any other respect (e.g., importance or order). For example, a first component may be referred to as a second component, and similarly, a second component may also be referred to as a first component.

[0036] When a component (e.g., a first component) is referred to as being “coupled” or “connected” to another component (e.g., a second component), with or without the terms “functionally” or “communicatively,” it means that the component can be connected to the other component directly (e.g., wired), wirelessly, or through a third component.

[0037] Singular expressions include plural expressions unless the context clearly dictates otherwise. In this specification, the terms "comprises" or "has" should be understood to indicate the presence of a described feature, number, step, operation, component, part, or combination thereof, but not to exclude the possibility of the presence or addition of one or more other features, numbers, steps, operations, components, parts, or combinations thereof.

[0038] Unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by a person of ordinary skill in the art. Terms defined in commonly used dictionaries should be interpreted to have a meaning consistent with their meaning in the context of the relevant technology, and will not be interpreted in an idealized or overly formal sense unless explicitly defined herein.

[0039] Hereinafter, embodiments will be described in detail with reference to the attached drawings. In the description with reference to the attached drawings, identical components are assigned the same reference numerals regardless of the drawing numbers, and redundant descriptions thereof will be omitted.

[0040] Figure 1 is a flowchart of an operation of a clothing simulation method for knitwear according to one embodiment.

[0041] The operations of steps (110) to (130) included in the clothing simulation method for knitwear described in FIG. 1 may be performed sequentially, but are not necessarily performed sequentially. For example, the order of steps (110) to (130) may be changed, and at least two steps may be performed in parallel.

[0042] The clothing simulation method for knitwear described in Fig. 1 can be performed on an electronic device. The specific hardware structure of the electronic device is described in detail below.

[0043] The garment simulation method for knitwear according to one embodiment may be briefly referred to as the 'method' or the 'garment simulation method' hereinafter.

[0044] Typically, a garment pattern corresponds to a paper template used to cut materials when making clothing. In this specification, a garment pattern may correspond to a two-dimensional flat garment pattern piece virtually created by a computer program. For example, garment patterns may be used to create a virtual garment that a user wishes to drape on a three-dimensional avatar. One or more garment patterns may be used to create a single garment.

[0045] According to an embodiment, a garment pattern may be a virtual two-dimensional garment pattern modeled as a sum of numerous polygonal meshes for simulating a three-dimensional virtual garment. Each vertex of the mesh is a point mass having a mass, and each edge of the mesh may be represented by springs having elasticity that connect the masses of the vertices. The garment pattern(s) may be modeled by, for example, a mass-spring model. Here, the springs may have respective resistance values ​​for, for example, stretch, shear, and bending depending on the properties of the fabric used. Each vertex may move under the action of an external force, such as gravity, and an internal force of stretch, shear, and bending. By calculating the external and internal forces applied to each vertex, the displacement and velocity of each vertex can be determined. Furthermore, the movement of the mesh vertices at each time step can be used to simulate the movement of a virtual garment. By applying two-dimensional virtual garment patterns made of triangular meshes to a three-dimensional object (e.g., an avatar), a natural-looking three-dimensional virtual garment based on the laws of physics can be created.

[0046] The complex geometry of knitted fabrics can introduce visual and physical complexity during rendering or simulation. A method according to one embodiment may include simulating a virtual garment composed of knitted fabrics made by interweaving or crisscrossing yarns. A virtual garment composed of knitted fabrics may be referred to as knitwear.

[0047] A clothing simulation method according to one embodiment may include a step (110) of extending a clothing pattern by adding a margin mesh to a clothing pattern corresponding to knitwear. The margin mesh may include a mesh added to an area outside the boundary of the clothing pattern. For example, the margin mesh may be added to an area outside the boundary of the clothing pattern with a certain width. The addition of the margin mesh may extend the edge area of ​​the clothing pattern.

[0048] For example, referring to FIG. 2A, a margin mesh may be added to an outer area (220) of a boundary line of a garment pattern (210). The size of the outer area (220) to which the margin mesh is added may be determined to be a certain size. Alternatively, the size of the outer area (220) to which the margin mesh is added may be determined by a user input.

[0049] According to one embodiment, a margin mesh may be added to an outer area of ​​a boundary line of a garment pattern that is sewn with another garment pattern. In other words, a margin mesh may be added to a seam allowance area of ​​a seam line of a garment pattern. For example, referring to FIG. 2B, if a first boundary line (231), a second boundary line (232), and a third boundary line (233) of a garment pattern (230) correspond to a sewing line that is sewn with another garment pattern, and a fourth boundary line (234) does not correspond to a sewing line, a margin mesh may be added to an outer area (240) of the first boundary line (231), the second boundary line (232), and the third boundary line (233). The edge area of ​​the fourth boundary line (234) may not be expanded.

[0050] By adding a margin mesh, the occurrence of gaps or empty spaces in the sewing lines where garment patterns are connected in a virtual garment can be prevented.

[0051] Referring back to FIG. 1, according to one embodiment, the step (110) of extending the garment pattern may include a step of adding a margin mesh having a curvature of a certain size to the garment pattern corresponding to the knitwear. The margin mesh added to the garment pattern may have a curvature of a certain size set. When a garment including the garment pattern is rendered or simulated, the curvature of the margin mesh may be set so that the fabric corresponding to the margin mesh is rolled in the inward direction of the garment. For example, the curvature of the margin mesh may be set so that it bends in the opposite direction to the normal vector of the garment pattern in the simulated virtual garment.

[0052] According to one embodiment, the step (110) of extending a garment pattern may include a step of adding a margin mesh to the garment pattern based on physical data of the knitwear. The physical data of the knitwear is information indicating physical properties of the knitwear, and for example, the physical data of the knitwear may include at least one of stitching type information of the knitwear, gauge information of the knitwear, direction information of the knit fabric, yarn thickness information, yarn color information, setting information on whether to add a margin mesh to the knitwear, size information of an area (or seam allowance area) where a margin mesh is generated, and curvature information of the margin mesh. The physical data of the knitwear will be described in detail below.

[0053] A method for simulating clothing according to an embodiment may include a step (120) of mapping vertices of a yarn corresponding to a knitwear to a mesh of an extended clothing pattern. The vertices of the yarn may include at least one vertex located on a centerline of the yarn. For example, the yarn may be modeled as edges connecting adjacent vertices located at regular intervals on the centerline of the yarn. For example, the yarn may be modeled as a discrete elastic rod. The modeling of the yarn is described in detail below.

[0054] The mesh of the extended garment pattern may include a mesh included in the original garment pattern and a margin mesh added in step (110). Mapping the vertices of the yarn to the mesh of the extended garment pattern may mean determining the position of each vertex of the yarn constituting the knitwear on the garment pattern. Mapping the vertices of the yarn to the mesh of the extended garment pattern may mean storing the position of each vertex of the yarn on the garment pattern as a positional relationship with the mesh of the garment pattern. Each vertex of the yarn may be positioned at the mapped position on the garment pattern. As described in detail below, when a garment including the garment pattern is simulated, the yarn may be positioned at the mapped position on the garment pattern and simulated based on the mesh.

[0055] According to one embodiment, the step (120) of mapping the vertices of a yarn to a mesh of an extended garment pattern may include a step of determining a position of the yarn on a material space corresponding to a deformation state. More specifically, the step of determining the position of the yarn on the material space corresponding to the deformation state may include the step (120) of mapping the vertices of the yarn to a mesh of an extended garment pattern. The step of obtaining a parameter corresponding to a deformation state of the material space corresponding to the garment pattern may include the steps of: obtaining a displacement of a vertex corresponding to the parameter by interpolating a displacement calculated in advance based on the parameter corresponding to a deformation state sample; and determining a position of the vertex corresponding to the deformation state on the material space based on the obtained displacement. Specific operations of the step of determining the position of the yarn on the material space corresponding to the deformation state will be described in detail below.

[0056] In one embodiment, the step (120) of mapping the vertices of the yarn to the mesh of the extended garment pattern may include the step of copying the vertices of the yarn mapped to the area where the first mesh and the second mesh overlap in the garment pattern, and mapping each of the copied vertices to the first mesh and the second mesh. For example, the first mesh and the second mesh may be included in a margin mesh. In other words, since the addition of the margin mesh may cause mesh overlap in the garment pattern, the meshes that overlap each other may correspond to the margin mesh.

[0057] For example, referring to FIG. 3A, a margin mesh may be added to a first region (311) which is an area outside a first boundary line (301) of a garment pattern, and a margin mesh may be added to a second region (312) which is an area outside a second boundary line (302). The first region (311) and the second region (312) to which the margin mesh is added may overlap each other in some areas. A vertex of a yarn may be placed on the garment pattern. A vertex (321) of a yarn may be placed in an area where the first region (311) and the second region (312) overlap. The vertex (321) may be copied into two. When one of the copied vertices (321) is called a first vertex and the other is called a second vertex, the first vertex may be mapped to the mesh of the first region (311), and the second vertex may be mapped to the mesh of the second region (312). For example, referring to FIG. 3b which illustrates only the first region (311) of the garment pattern, a first vertex (322) may be placed in the first region (311), and referring to FIG. 3c which illustrates only the second region (312) of the garment pattern, a second vertex (323) may be placed in the second region (312). In a two-dimensional garment pattern, the first region (311) and the second region (312) overlap, but in a virtual garment, the first region (311) and the second region (312) may not overlap. Since the vertex (321) is copied and each of the copied vertices (321) is mapped to the mesh of the first region (311) and the mesh of the second region (312), yarns may be simulated in both the first region (311) and the second region (312) in the virtual garment.

[0058] Referring back to FIG. 1, according to one embodiment, the step (120) of mapping vertices to the mesh of the extended garment pattern may include the step of moving vertices of yarns located outside the extended garment pattern onto the boundary of the extended garment pattern. For example, in knitwear, yarns may have a periodically repeating shape. When arranging vertices of yarns of a periodically repeating shape onto the garment pattern, some of the vertices may be positioned outside the garment pattern.

[0059] For example, referring to FIG. 4a, when the yarn (401) has a periodically repeating shape, the first vertex (420) among the vertices at regular intervals on the center line of the yarn (401) may be placed outside the clothing pattern (410). The first vertex (420) placed outside the clothing pattern (410) may be moved to a position on the boundary line of the clothing pattern (410). For example, the position of the first vertex (420) may be changed to a position of the intersection of the edge (430) connected to the first vertex (420) and the boundary line of the clothing pattern. For example, referring to FIG. 4b, the position of the first vertex may be changed to a position of the intersection (440) of the edge connected to the first vertex and the boundary line of the clothing pattern.

[0060] Referring back to FIG. 1, according to one embodiment, the step (120) of mapping vertices to a mesh of an extended garment pattern may include a step of rotating a yarn based on direction information of a knit fabric corresponding to the knitwear, and a step of mapping the vertices of the rotated yarn to the mesh of the extended garment pattern. For example, the direction information of the knit fabric may be included in the physical property data of the knitwear. The direction information of the knit fabric is information indicating a direction in which a yarn is arranged on a garment or garment pattern, and may include, for example, a specific angle, a direction vector, or a rotation value. For example, the direction information of the knit fabric may include information indicating a degree and / or a rotation direction of the yarn based on a default state of the yarn. The yarn may be rotated by an amount indicated by the direction information of the knit fabric in the default state and then arranged on the garment pattern. For example, if the direction information of the knit fabric indicates horizontal or 0 degrees, the yarn may be arranged on the garment pattern in the default state. For example, if the direction information of the knit fabric indicates vertical or 90 degrees, the yarn may be rotated 90 degrees from the default state and then arranged on the garment pattern.

[0061] For example, referring to FIGS. 5A to 5C, garments of knitted fabrics having different shapes may be rendered depending on the direction information of the knitted fabric. For example, the knitted fabric (510) of the garment illustrated in FIG. 5A may have a shape corresponding to the direction information of the knitted fabric (510) indicating the default state of the yarn or 0 degrees. Referring to FIG. 5B, when the direction information of the knitted fabric (520) indicates a rotation of 45 degrees, a knitted fabric (520) having a shape of the knitted fabric (510) of FIG. 5A rotated by 45 degrees may be rendered. Referring to FIG. 5C, when the direction information of the knitted fabric (530) indicates a rotation of 90 degrees, a knitted fabric (530) having a shape of the knitted fabric (510) of FIG. 5A rotated by 90 degrees may be rendered.

[0062] A clothing simulation method according to one embodiment may include a step (130) of generating rendering information of a knitwear by simulating a clothing pattern in which yarns are arranged based on a mapping relationship between vertices and a mesh of a clothing pattern. The rendering information of the knitwear may be generated through the simulation of the clothing pattern in which yarns are arranged. The rendering information of the knitwear may include information for outputting the shape of a three-dimensional knit fabric garment in which the clothing pattern in which yarns are arranged is worn on a three-dimensional object.

[0063] According to one embodiment, the step (130) of generating rendering information of a knitwear may include a step of tessellating a centerline of a yarn into a cylinder mesh and a step of generating rendering information of a knitwear by simulating a garment pattern in which the tessellated yarn is arranged based on a mapping relationship between vertices and a mesh of a garment pattern. The centerline of a yarn having no volume may be tessellated into a cylinder mesh having volume. The centerline of the yarn may be tessellated into a cylinder mesh having a predetermined thickness. For example, the thickness of the cylinder mesh may be determined based on material property data of the knitwear.

[0064] According to one embodiment, the step (130) of generating rendering information of a knitwear may include a step of simulating a yarn on a garment pattern in a world space corresponding to a deformation state. More specifically, the step of simulating a yarn on a garment pattern in a world space corresponding to a deformation state may include a step of obtaining a world space position corresponding to a knitwear of a yarn vertex based on a material space position of a vertex of a yarn corresponding to the deformation state, and a step of generating rendering information of the knitwear based on the obtained world space position. The world space may correspond to a space corresponding to a three-dimensional garment in which two-dimensional garment patterns are worn on a three-dimensional object. Two-dimensional mesh information corresponding to the material space of the garment pattern and three-dimensional mesh information corresponding to the world space may be obtained through garment simulation. Specific operations of the step of simulating a yarn on a garment pattern in a world space corresponding to a deformation state will be described in detail below.

[0065] FIG. 6 is a drawing illustrating a user interface screen for setting physical property data of knitwear according to one embodiment.

[0066] Referring to screen (600) of Fig. 6, the setting values ​​of the physical property data of the knitwear can be input through a user interface. For example, a user can input the setting values ​​of the physical property data of the knitwear through a user interface provided on a terminal.

[0067] For example, the physical properties of knitwear may include yarn thickness information. The yarn thickness value may be set through the yarn thickness input window (610) of the user interface. Knitwear including yarn having the set yarn thickness value may be simulated.

[0068] For example, the material properties data of knitwear may include information on whether to add a margin mesh (e.g., "generate seams"). Whether to add a margin mesh may be set through the margin mesh addition setting window (620). If the margin mesh is set to be added, the margin mesh may be added to the garment pattern as described above.

[0069] For example, the material properties data of knitwear may include size information (e.g., seam length) of an area (e.g., a seam area) to which a margin mesh is added. The size of the area to which the margin mesh is added may be set through a size input window (630) for the area to which the margin mesh is added. The size of the area to which the margin mesh of the garment pattern is added may be determined by the size input through the input window (630).

[0070] For example, the physical properties data of knitwear may include curvature information of a margin mesh (e.g., seam curvature). The curvature of the margin mesh may be set through an input window (640) for the curvature of the margin mesh. The curvature of the margin mesh added to the garment pattern may be determined by a value input through the input window (640).

[0071] For example, the physical properties data of knitwear may include knit fabric direction information (e.g., knit direction). The knit fabric direction may be determined through the knit fabric direction input window (650). The knitwear may be simulated with the knit fabric direction input through the input window (650).

[0072] In addition, the physical properties data of knitwear may include information indicating the characteristics of the knitwear. For example, the physical properties data of knitwear may include knit fabric type information (e.g., stitching type), density information (e.g., gauge), and color information (e.g., ply color). The interface may include a knit fabric type setting window (660), a density input window (670), and a color input window (680).

[0073] FIGS. 7A to 12 are drawings for explaining a yarn-based knitting simulation method according to one embodiment.

[0074] A yarn-based knitting simulation method according to one embodiment may be briefly referred to as a knitting simulation method hereinafter. The yarn-based knitting simulation method may correspond to steps (120) to (130) described above. More specifically, it may correspond to a step of determining a location of a yarn in a material space corresponding to the aforementioned deformation state and a step of simulating a yarn in a garment pattern in a world space corresponding to the deformation state.

[0075] A knit simulation method according to one embodiment may include a method for animating (or simulating) a yarn-level fabric (or knitted fabric) geometry on a deforming underlying mesh in a mechanics-aware fashion. The knit simulation method according to one embodiment may be a method for reproducing a phenomenon, such as the tightening effect of a knit loop when stretching, by interpolating a pre-computed yarn geometry using triangle strain. For example, referring to FIG. 7a, the yarn geometry of a knitted fabric before deformation is illustrated. When the knitted fabric is stretched, the simulation result of the knitted fabric without considering the yarn-level deformation may be as shown in FIG. 7b. Referring to FIG. 7b, the knitted fabric may be simulated such that the yarn stretching occurs uniformly due to the knitted fabric stretching regardless of the yarn geometry. Meanwhile, when the knitted fabric is stretched, the simulation result of the knitted fabric considering the yarn-level deformation may be as shown in FIG. 7c. In other words, the simulation results of Fig. 7c may be simulation results of a knitted fabric generated according to a knitting simulation method according to one embodiment. Referring to Fig. 7c, considering the geometric structure of the yarn, the knitted fabric can be simulated such that the loops of the yarn tighten when the knitted fabric is stretched.

[0076] According to one embodiment, a knitting simulation method may be a simulation method that adds yarn-level deformation to mesh-based cloth simulation. The behavior of a periodic yarn pattern may be pre-calculated based on large-scale deformation of an underlying cloth. The yarn pattern may refer to a garment pattern in which yarns are arranged. By interpolating the deformed yarn pattern at runtime based on the deformation state of the cloth mesh, a yarn-level geometric structure that is rearranged according to a yarn-level mechanism can be generated in real time.

[0077] A knitting simulation method according to one embodiment can receive an undeformed yarn pattern and a large-scale surface deformation as input for simulating a deformed geometric structure of a yarn pattern. The large-scale surface deformation can correspond to data encoded through a first fundamental form I and a second fundamental form II. As described in detail below, the large-scale surface deformation can be used to define boundary conditions and to optimize the elastostatic equilibrium configuration of the yarn pattern.

[0078] As mentioned above, a yarn can be modeled as a discrete elastic rod. A yarn can be represented as a linked list of vertices with positions x along the centerline. Each edge connecting the vertices can contain a twist angle θ and a reference director d1. Each vertex is associated with a four-dimensional vector q = (x T , θ) T can be expressed as, where θ corresponds to the twist angle of one adjacent edge. The reference direction vector d1 may not be included in the degrees of freedom. In other words, the reference direction vector d1 of the edge may not be included in the variables that are freely changed or calculated during the optimization or simulation process.

[0079] The kinematics of the positions of the vertices of the yarn during optimization can be expressed as in the following mathematical equations 1 and 2.

[0080]

[0081] In equations 1 and 2, X = (X1, X2, X3) Tare the material-space coordinates of the undeformed yarn pattern, (X1, X2) are the orthogonal and periodic directions along the yarn pattern, and X3 represents the height coordinate. represents a large-scale deformation composed of the first basic shape I and the second basic shape II. The first basic shape can be simply referred to as I and the second basic shape as II. I encodes the in-plane deformation, and II encodes the bending deformation, respectively. From I and II, the midsurface And the normal n of the intermediate surface can be obtained, at this time, am.

[0082] Intermediate surface from I and II This can be defined from a least-squares perspective. To become can be calculated. For example, in the case of a single curvature, can be established. For the calculation, the rotation matrix R and the in-plane deformation matrix S, which indicate the curvature, can be calculated from the two basic shapes I and II. The 3Х2 matrix S can be calculated using the principal square root of I as shown in the following mathematical expression 3.

[0083]

[0084] To calculate the rotation matrix R, the derivative of the normal vector is as shown in Equation 4 below. can be calculated.

[0085]

[0086] As in mathematical expression 5, a, b, and r can be calculated.

[0087]

[0088] As shown in mathematical expression 6, R(X1,X2) can be calculated.

[0089]

[0090] Poisson equation Discretize it on a grid with natural boundary conditions. can be calculated. The constraint according to mathematical formula 7 is can be set to .

[0091] The yarn configuration that minimizes elastic energy can be calculated. The optimization variables are fluctuations that represent local displacements for large-scale deformation. and twist θ. Referring to Fig. 8, when the undeformed twist value is Θ, the concatenated coordinates are undeformed Q=(X T ,Θ) T , large-scale-deformed , optimized q=(x T , θ) T . Θ is assumed to be unaffected by large-scale mapping in the case of pure in-plane deformation. Bending deformation may also induce local twist depending on the orientation of the yarn with respect to the second fundamental shape II and the curvature direction.

[0092] For example, referring to FIG. 8, various large-scale surface deformations are applied to an undeformed yarn pattern Q (810) to produce a deformed (820) can be obtained. Using an optimization technique, the elastostatic rest shape q(830) is optimized for each deformation. q(830) is pulled back into the undeformed material space. (840) can be obtained. Displacement of Q(810) minus the initial state that is not deformed at (840) (850) can be obtained. (850) represents the local yarn level deformation according to the large-scale deformation state, From (850), a mapping relationship between large-scale deformation and the corresponding local yarn-level deformation can be constructed. As described below, corresponding to the sampled deformation state (hereinafter, deformation state sample) (850) can be pre-calculated and stored.

[0093] An optimization process according to one embodiment may include a nullspace in which yarns can slide. In other words, a periodic yarn curve x(s) expressed by a parameter s may be subject to a parametric shift. The elastic energy E does not change even if you slide as much as x. In other words, E(x(s)) = E(x(s + )). Geometrically, the sliding motion can correspond to the tangential sliding of the yarn while maintaining the same periodic shape. In the optimizer, all sliding motion states are considered identical, and the actual result can be determined arbitrarily depending on the internal parameters of the numerical solver. The null space may not affect the homogenized energies by definition. Interpolation between two sliding motion states can produce completely different shapes of the yarn.

[0094] For example, the two curves (910, 930) illustrated in FIGS. 9A and 9C are yarns of the same shape, and when the starting position of the curve (910) of FIG. 9A is shifted by a certain distance, the curve (930) of FIG. 9C becomes. When the curve (910) illustrated in FIG. 9A and the curve (930) illustrated in FIG. 9C are interpolated, a new curve (920) that is very different from the curve (910) illustrated in FIG. 9A and the curve (930) illustrated in FIG. 9C can be generated, as illustrated in FIG. 9B. This is a phenomenon in which distortion occurs during interpolation because the expression method (or parameterization) is different even though the two curves (910, 930) illustrated in FIGS. 9A and 9C have the same shape mathematically.

[0095] Null spaces can introduce discreet interpolation artifacts, even for nearly identical deformation states. By adding constraints to the optimization process, parametric yarn sliding can be eliminated, effectively eliminating null spaces. More specifically, the constraints can be such that one vertex for each periodic yarn is fixed on the boundary of the garment pattern, as in Equation (7).

[0096]

[0097] In Equation 7, N is the undeformed normal vector to the boundary of the clothing pattern, which is N=(1,0). T or N=(0,1) T One of them is a sparse set of vertex constraints that can efficiently and effectively remove interpolation artifacts. The constraints allow physically realistic yarn shapes to be obtained for large-scale deformations described by the first and second basic shapes (I and II).

[0098] For example, if the tangential sliding phenomenon of the yarn is not considered when interpolating the geometric structure of the yarn, unrealistic distortion of the yarn may occur in the knitted fabric, as illustrated in Fig. 9d. For example, distortions such as the yarn colliding with itself or floating loops may occur. On the other hand, if a sliding constraint is introduced, a natural and physically reasonable interpolation result can be obtained, as illustrated in Fig. 9e.

[0099] The geometry of the yarn corresponding to representative deformation state samples can be precomputed, and the geometry of the yarn corresponding to the actual deformation state can be obtained by interpolating the geometry of the yarn corresponding to the precomputed deformation state samples at runtime. Since I and II are 2x2 symmetric tensors, directly parameterizing the deformation by I and II results in a six-dimensional function, which may be expensive to precompute, store, and read at runtime. Therefore, the dimensionality of the deformation can be reduced by parameterizing the deformation with as few variables as possible.

[0100] Using in-plane strains, the first basic shape I can be reparameterized into a three-dimensional function as in Equation 8.

[0101]

[0102] II can be parameterized similarly to Equation 4 by introducing additional curvature variables and increasing the dimensionality of the dataset, but we show below that the bending deformation can be reasonably approximated by stretching variables alone. The entire large-scale deformation space is modeled by three variables s x , s a , s y can be sampled only on a regular 3D grid, which can significantly reduce memory and computational overhead. The deformation state samples can be sampled on a regular 3D grid.

[0103] At runtime, the geometry of the yarn obtained through interpolation can be mapped to a deformed mesh (e.g., a triangle mesh). The deformation of the mapped mesh can be naturally inherited by the geometry of the yarn. During the precomputation phase, the deformation state samples can be stored as material-space displacements.

[0104] The geometry of the optimized yarn q is the geometry of the yarn in the material space To pull back or convert to, large-scale transformation Modified material space coordinates that yield the desired world space transformation x when applied In other words, the geometry q of the optimized yarn is the geometry of the yarn in the material space. The problem with fullback is Satisfying This may correspond to the problem of finding .

[0105] Satisfying The problem of finding can be solved using Newton's method or Newton iteration. Function Newton's iteration method can be applied to this, where the gradient is is needed.

[0106] Mapping can be defined as in mathematical formula 9.

[0107]

[0108] In mathematical equation 9 is the deformed midsurface, and n is the normal vector of the midsurface.

[0109] The gradient can be defined as in mathematical equation 10.

[0110]

[0111] By definition can be expressed as in mathematical formula 11.

[0112]

[0113] and can be calculated using mathematical expression 4. Newton's iteration method can be expressed as mathematical expression 12, and the initial value is a rest configuration , in other words, It could be.

[0114]

[0115] Within three iterations, the results obtained by Newton's iteration method can converge to a value of a fraction of the yarn radius. The computational cost of Newton's iteration method is negligible compared to elastostatic optimization. For pure in-plane deformations, II = 0, so R = Id, In this case, the pullback becomes a simplified constant expression as in mathematical expression 13.

[0116]

[0117] After concatenating, Displacement by subtracting the initial material state from can be obtained. In other words, can be expressed as mathematical expression 14.

[0118]

[0119] In the rest pose, I=Id, II=0, and am.

[0120] For each vertex i of the yarn pattern, and various in-plane deformation state samples j: (s xj ,s aj ,s yj ) displacement of yarn in material space A database can be built. The database may correspond to a grid of example deformations, or The database can correspond to a 3D displacement texture for each yarn vertex. Interpolating the displacements of the deformation state samples yields a deformation s within a given plane. xj ,s aj ,s yj A yarn-level displacement map can be obtained. For strains sampled directly from the database, accurate yarn patterns can be reconstructed, and for intermediate strains of the sampled strains, approximate patterns can be generated.

[0121] A database of displacements of yarn patterns for various deformation states can be applied to tiled yarn patterns over an animated triangle mesh.

[0122] For example, referring to Fig. 10, Q(1010) is the undeformed coordinate (in material space), (1030) may correspond to the coordinates transformed by the local displacement, and q(1040) may correspond to the final world space coordinates. The material displacement is applied to the undeformed yarn-level geometry Q(1010) tiled on a triangle mesh in the material space. Geometry of the deformed yarn by applying (1020) (1030) can be obtained. (1030) can be mapped to a mesh and transformed into a deformation q(1040) in world space.

[0123] As an example, Algorithm 1 illustrated in Fig. 11 is a mesh animation, yarn pattern and displacement In response to an input containing , the process of rendering q may be included.

[0124] An initial undeformed yarn mesh can be generated corresponding to an undeformed mesh (e.g., a triangle mesh) by precomputation. A 2D background grid can be generated on the UV coordinate system of the mesh, with cell sizes equal to the size of the periodic pattern. For example, the geometry of the yarn can be copied to all cells that overlap the undeformed mesh. For example, yarn vertices that do not exist within the mesh can be removed. For example, yarn pieces shorter than a user-specified length can be deleted for aesthetic purposes. The material space barycentric coordinates for each yarn vertex can be precomputed.

[0125] For each animation frame, discrete fundamental forms I and II for each mesh can be computed as shown in Equation 15 below.

[0126]

[0127] In Equation 15, F is the deformation gradient of the mesh, and Λ is the triangle-averaged shape operator. Using modified Shepard weights, I and II can be distributed to the vertices of the triangular mesh. Finally, by interpolating the I and II values ​​of the vertices of the triangular mesh where the yarn vertices are located, the actual deformation state of the yarn vertices can be estimated.

[0128] In one embodiment, the effect of bending behavior can be approximated by adding stretching and compression depending on the surface curvature.

[0129] Intermediate surface with normal vector n The full domain of the thin shell x expressed as is shown in the following mathematical expression 16.

[0130]

[0131] In mathematical expression 16, is the normal coordinate for the thickness H of the shell. At this time, the Cauchy-Green deformation tensor can be expressed as in mathematical equation 17 below.

[0132]

[0133] Equation (17) can be interpreted as the first basic shape I(h) that is quadratically dependent on h. The quadratic term in Equation (17) can generally be ignored. In addition, The basic shapes of and similarly As a result, the linearized expression is as shown in Equation 18.

[0134]

[0135] And, pre-computed data for the in-plane deformation s Using , the linearized bending model can be expressed as in mathematical equation 19 below.

[0136]

[0137] In other words, as explained through mathematical expression 18, the first basic shape I can be improved as in mathematical expression 20 below in a form that changes along the surface normal direction.

[0138]

[0139] As an example, referring to FIG. 12, the extruded volume (1220) around the middle surface (1210) bent by the bending model can be approximated by a linearized volume (1230) in which the upper portion of the middle surface (1210) is stretched and the lower portion is compressed.

[0140] Like most elastic materials, fabrics can buckle (or twist) out of plane when compressed. To prevent abnormal yarn deformation (buckling) due to compression, the eigenvalues ​​of the first fundamental shape I are used before querying the yarn displacements. can be clamped to a lower limit value, allowing buckling to be reduced in a user-adjustable manner.

[0141] For example, the minimum value for the eigenvalues ​​of I(Z) (e.g. 0.8) can be set. Eigenvalue < 1 can mean a compressed state. As I converges to the identity matrix (Id), Since converges to 0, the clamping technique only reduces local deformation, while the overall large-scale deformation along the triangle mesh can be maintained.

[0142] After clamping I, I is the strain s according to Equation 8 x , s a , s z can be converted to displacement of yarn (s x , s a , s z ) can be trilinear interpolation. The coordinates of the yarn in the transformed material space can be calculated as in mathematical equation 21 below.

[0143]

[0144] Strain outside the sampled range is (s x , s a , s z ) can be clamped to the nearest neighbors in the dataset. Similar to compressive clamping, constant extrapolation limits local deformations while still allowing large-scale deformations from the mesh embedding.

[0145] Equation 22 can be used to map the vertices of the yarn to world space x.

[0146]

[0147] Mathematical expression 22 is a mesh surface in world space. may correspond to extruding along the normal vector n. To avoid piecewise linear embedding artifacts, we use the Phong deformation and the normal vectors of the interpolated vertices. and shell volumes can be generated more smoothly.

[0148] The mapping of yarn twist is simply the updated twist value. can be processed by copying the edge normals can be co-transformed using an approximate mapping to the Jacobian of Equation 22.

[0149] Since the transformation of Yarn's vertices and their mapping into world space can be trivially parallelized, they can be implemented as GPU compute shaders. Interpolation of can be performed with a single 3D texture interpolation operation per vertex of the yarn.

[0150] The deformed yarn can be tessellated into a cylinder mesh in the geometry shader. Ply- and fiber-level details can be approximated by sequentially using twistable normal maps and ambient occlusion maps. Volume preservation can be approximated by locally rescaling the yarn radius during stretching.

[0151] Figure 13 is an exemplary diagram of the configuration of an electronic device according to one embodiment.

[0152] Referring to FIG. 13, an electronic device (1300) according to an embodiment may include a processor (1301), a memory (1303), and an input / output device (I / O) (1305). The electronic device (1300) according to an embodiment may include a device that performs the clothing simulation method for knitwear described above through FIGS. 1 to 12. For example, the electronic device (1300) may include at least one of a server and a user's terminal (e.g., a personal PC, a mobile phone, a tablet, a wearable device, etc.).

[0153] A processor (1301) according to one embodiment may include at least one processor including processing circuitry.

[0154] A processor (1301) according to an embodiment may perform at least one operation included in the clothing simulation method for knitwear described above through FIGS. 1 to 12. For example, the processor (1301) may perform at least one operation of adding a margin mesh to a clothing pattern corresponding to the knitwear to extend the clothing pattern, an operation of mapping vertices of yarns corresponding to the knitwear to a mesh of the extended clothing pattern, and an operation of generating rendering information of the knitwear by simulating a clothing pattern in which yarns are arranged based on a mapping relationship between vertices and the mesh of the clothing pattern.

[0155] The memory (1303) according to one embodiment may be a volatile memory or a non-volatile memory, and may store data related to the clothing simulation method for knitwear described above through FIGS. 1 to 12. For example, the memory (1003) may store data generated during the process of performing the clothing simulation method for knitwear described above through FIGS. 1 to 12, or data required to perform the clothing simulation method for knitwear described above through FIGS. 1 to 12.

[0156] According to one embodiment, the memory (1303) may not be a component of the electronic device (1300), but may be included in an external device accessible from the electronic device (1300). In this case, the electronic device (1300) may receive data stored in the memory (1303) included in the external device through a communication device, and may transmit data to be stored in the memory (1303).

[0157] According to one embodiment, the memory (1303) may store a program implementing the clothing simulation method for knitwear described above through FIGS. 1 to 12. The processor (1301) may execute the program stored in the memory (1303) and control the electronic device (1300). The code of the program executed by the processor (1301) may be stored in the memory (1303).

[0158] For example, the memory (1303) may store command(s). The command(s) stored in the memory (1303), when individually or collectively executed by the processor (1301), may cause the electronic device (1300) to perform an operation of extending a garment pattern corresponding to the knitwear by adding a margin mesh to the garment pattern, an operation of mapping vertices of yarns corresponding to the knitwear to the mesh of the extended garment pattern, and an operation of generating rendering information of the knitwear by simulating a garment pattern in which yarns are arranged based on the mapping relationship between the vertices and the mesh of the garment pattern.

[0159] An input / output device (1305) according to one embodiment may include an input device and an output device. For example, user input regarding physical property data of a knitwear may be received through the input / output device (1305). For example, rendering information of a knitwear may be output through the input / output device (1305).

[0160] The electronic device (1300) according to one embodiment may further include other components not shown. For example, the electronic device (1300) may further include a communication device for communicating with other devices (e.g., a server, a terminal, a network, etc.). In addition, for example, the electronic device (1300) may further include other components such as a transceiver, various sensors, a database, etc.

[0161] The embodiments described above may be implemented using hardware components, software components, and / or a combination of hardware components and software components. For example, the devices, methods, and components described in the embodiments may be implemented using a general-purpose computer or a special-purpose computer, such as, for example, a processor, a controller, an arithmetic logic unit (ALU), a digital signal processor, a microcomputer, a field programmable gate array (FPGA), a programmable logic unit (PLU), a microprocessor, or any other device capable of executing instructions and responding to them. The processing device may execute an operating system (OS) and software applications running on the operating system. Furthermore, the processing device may access, store, manipulate, process, and generate data in response to the execution of the software. For ease of understanding, the processing device is sometimes described as being used alone; however, one of ordinary skill in the art will recognize that the processing device may include multiple processing elements and / or multiple types of processing elements. For example, a processing unit may include multiple processors, or a processor and a controller. Other processing configurations, such as parallel processors, are also possible.

[0162] Software may include a computer program, code, instructions, or a combination of one or more of these, and may configure a processing device to perform a desired operation or may independently or collectively command the processing device. The software and / or data may be stored on any type of machine, component, physical device, virtual equipment, computer storage medium, or device for interpretation by the processing device or for providing instructions or data to the processing device. The software may also be distributed over networked computer systems and stored or executed in a distributed manner. The software and data may be stored on a computer-readable recording medium.

[0163] The method according to the embodiment may be implemented in the form of program commands that can be executed through various computer means and recorded on a computer-readable medium. The computer-readable medium may store program commands, data files, data structures, etc., alone or in combination, and the program commands recorded on the medium may be those specially designed and configured for the embodiment or may be known and available to those skilled in the art of computer software. Examples of the computer-readable recording medium include magnetic media such as hard disks, floppy disks, and magnetic tapes, optical media such as CD-ROMs and DVDs, magneto-optical media such as floptical disks, and hardware devices specially configured to store and execute program commands, such as ROMs, RAMs, and flash memories. Examples of program commands include not only machine language codes such as those generated by a compiler, but also high-level language codes that can be executed by a computer using an interpreter, etc.

[0164] The hardware device described above may be configured to operate as one or more software modules to perform the operations of the embodiment, and vice versa.

[0165] Although the embodiments described above have been described with limited drawings, those skilled in the art will appreciate that various technical modifications and variations can be applied based on the described embodiments. For example, appropriate results can still be achieved even if the described techniques are performed in a different order than described, and / or components of the described systems, structures, devices, circuits, etc. are combined or combined in a different manner than described, or are replaced or substituted with other components or equivalents.

[0166] Therefore, other implementations, other embodiments, and equivalents to the claims also fall within the scope of the claims described below.

Claims

In a clothing simulation method for knitwear, A step of extending the garment pattern by adding a margin mesh to the garment pattern corresponding to the knitwear; A step of mapping the vertices of the yarn corresponding to the knitwear to the mesh of the extended garment pattern; and A step of generating rendering information of the knitwear by simulating the clothing pattern in which the yarn is placed based on the mapping relationship between the vertex and the mesh of the clothing pattern. including, method. In the first paragraph, The step of mapping the above vertices to the mesh of the extended clothing pattern is A step of obtaining parameters corresponding to a deformation state of a material space corresponding to the above clothing pattern; A step of interpolating a pre-calculated displacement based on a parameter corresponding to a deformation state sample to obtain a displacement of the vertex corresponding to the parameter; and A step of determining the position of the material space of the vertex corresponding to the deformation state based on the displacement obtained above. including, method. In the second paragraph, The step of generating the rendering information of the above knitwear is A step of obtaining a position in world space corresponding to the knitwear of the vertex based on the position in the material space of the vertex corresponding to the deformation state; and A step of generating rendering information of the knitwear based on the position of the world space obtained above. including, method. In the first paragraph, The above margin mesh is added with a certain width to the area outside the boundary of the above clothing pattern. method. In the first paragraph, The step of extending the above clothing pattern is A step of adding the margin mesh with a certain curvature set to the clothing pattern corresponding to the knitwear. including, method. In the first paragraph, The step of extending the above clothing pattern is A step of adding the margin mesh to the clothing pattern based on the physical property data of the knitwear. Including, The physical properties data of the above knitwear are Including at least one of setting information on whether the margin mesh is added, size information of the area where the margin mesh is generated, and curvature information of the margin mesh. method. In the first paragraph, The above vertex includes at least one vertex located on the centerline of the yarn, method. In the first paragraph, The step of generating the rendering information of the above knitwear is A step of tessellating the center line of the above yarn into a cylinder mesh; and A step of generating rendering information of the knitwear by simulating the clothing pattern in which the tessellated yarn is placed based on the mapping relationship between the vertices and the mesh of the clothing pattern. including, method. In the first paragraph, The step of mapping the above vertices to the mesh of the extended clothing pattern is A step of copying the vertices of the yarn mapped to the area where the first mesh and the second mesh overlap in the above clothing pattern, and mapping each of the copied vertices to the first mesh and the second mesh. including, method. In paragraph 9, The first mesh and the second mesh are included in the margin mesh, method. In the first paragraph, The step of mapping the above vertices to the mesh of the extended clothing pattern is A step of moving the vertex of the yarn located outside the extended garment pattern onto the boundary line of the extended garment pattern. including, method. In the first paragraph, The step of mapping the above vertices to the mesh of the extended clothing pattern is A step of rotating the yarn based on the direction information of the knit fabric corresponding to the knitwear; and A step of mapping the vertices of the above rotated yarn to the mesh of the above extended garment pattern. including, method. A computer program stored on a computer-readable medium for executing the method of claim 1 in combination with hardware. In electronic devices, At least one processor comprising processing circuitry; and Memory that stores instructions Including, The above instructions, when individually or collectively executed by the at least one processor, cause the electronic device to: An action of extending a garment pattern by adding a margin mesh to the garment pattern corresponding to knitwear; An operation of mapping the vertices of the yarn corresponding to the above knitwear to the mesh of the extended garment pattern; and An operation of generating rendering information of the knitwear by simulating the clothing pattern in which the yarn is placed based on the mapping relationship between the vertex and the mesh of the clothing pattern. to perform, Electronic devices. In Article 14, The operation of mapping the above vertices to the mesh of the extended clothing pattern is An operation of obtaining a parameter corresponding to a deformation state of a material space corresponding to the above clothing pattern; An operation of interpolating a pre-calculated displacement based on a parameter corresponding to a deformation state sample to obtain a displacement of the vertex corresponding to the parameter; and An operation of determining the position of the material space of the vertex corresponding to the deformation state based on the displacement obtained above. including, Electronic devices. In Article 15, The action of generating rendering information for the above knitwear is An operation of obtaining a position in world space corresponding to the knitwear of the vertex based on a position in the material space of the vertex corresponding to the deformation state; and An operation of generating rendering information of the knitwear based on the position of the world space acquired above. including, Electronic devices. In Article 14, The action of extending the above clothing pattern is An action of adding a margin mesh with a certain curvature set to a clothing pattern corresponding to the above knitwear. including, Electronic devices. In Article 14, The action of extending the above clothing pattern is An operation of adding the margin mesh to the clothing pattern based on the physical property data of the knitwear. Including, The physical properties data of the above knitwear are Including at least one of setting information on whether the margin mesh is added, size information of the area where the margin mesh is generated, and curvature information of the margin mesh. Electronic devices. In Article 14, The action of generating rendering information for the above knitwear is An operation of tessellating the center line of the above yarn into a cylinder mesh; and An operation of generating rendering information of the knitwear by simulating the clothing pattern in which the tessellated yarn is placed based on the mapping relationship between the vertices and the mesh of the clothing pattern. including, Electronic devices. In Article 14, The operation of mapping the above vertices to the mesh of the extended clothing pattern is An operation of copying the vertices of the yarn mapped to the area where the first mesh and the second mesh overlap in the above clothing pattern, and mapping each of the copied vertices to the first mesh and the second mesh. including, Electronic devices.

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